Diffusion assembly and reactor

Abstract

The application provides a diffusion assembly, comprising a base body and a gas inlet member, the base body is provided with a diffusion member, the diffusion member comprises a gas inlet end and a blocking end, the length of the diffusion member gradually increases from the gas inlet end to the blocking end, the shape of the blocking end is arc-shaped, the diffusion member comprises at least one area surface, the height of the area surface in the length direction remains unchanged; the gas inlet member is connected with the gas inlet end and is used for injecting gas into the diffusion member. The application solves the problem of uneven gas distribution in the diffusion assembly in the prior art. The application also provides a reactor.

Description

Technical Field

[0001] This invention relates to the field of semiconductor vapor phase equipment technology, and more particularly to a diffusion component and reactor. Background Technology

[0002] Semiconductor vapor phase equipment includes atomic layer deposition (ALD), a known process for forming thin films of materials on substrates such as silicon wafers. In an ALD process, gaseous molecules of one or more compounds (precursors) of a material to be deposited are supplied to a substrate or wafer to form a thin film of that material on the substrate or wafer. Within one pulse, the first precursor material is adsorbed fairly completely onto the substrate during a self-confining process. The precursor material can be decomposed in subsequent reactant pulses to form a monolayer of the compound. Thicker films are produced through repeated growth cycles until the target thickness is reached.

[0003] A typical reaction chamber for ALD processes includes a top plate and a bottom plate, with a slot formed through the top plate. This slot allows process gas to be introduced into the reaction chamber, and the slot is an opening configured as a generally straight line perpendicular to the main gas flow path. However, because the process gas introduced into the reaction chamber via the slot typically has the same flow rate across the entire width of the slot, the time it takes for the process gas to contact the leading edge of the wafer as it flows through the reaction chamber varies across the width of the chamber. Although the velocity of the process gas introduced into the reaction chamber via the slot is substantially constant across the width of the slot, the time it takes for the gas introduced into the reaction chamber near the edge to contact the leading edge of the substrate is greater than the time it takes for the gas introduced into the reaction chamber near the centerline to contact the leading edge of the substrate. Therefore, the leading edge of the substrate near the centerline of the reaction chamber is exposed to a larger amount of process gas before the outermost edge of the substrate closest to the sidewalls of the reaction chamber is exposed to the process gas. This typically results in a larger deposition thickness at the leading edge of the substrate near the centerline of the reaction chamber than at the side edges of the substrate after many ALD cycles, leading to uneven film thickness across the entire substrate.

[0004] Therefore, it is necessary to provide a novel diffusion component and reactor to address the aforementioned problems in the prior art. Summary of the Invention

[0005] The purpose of this invention is to provide a diffusion component that solves the problem of uneven gas distribution in the diffusion component in the prior art.

[0006] To achieve the above objectives, the diffusion component of the present invention includes: The substrate has a diffuser, which includes an air inlet end and a blocking end. The length of the diffuser gradually increases from the air inlet end to the blocking end. The blocking end is arc-shaped. The diffuser includes at least one area surface. The height of the area surface remains constant in the length direction. An air inlet component, connected to the air inlet end, is used to inject gas into the diffuser component.

[0007] The beneficial effects of the diffusion assembly described in this invention are as follows: the air inlet is connected to the air inlet end for injecting gas into the diffusion assembly; the substrate has a diffusion assembly, which includes an air inlet end and a blocking end. The length of the diffusion assembly gradually increases from the air inlet end to the blocking end, and the blocking end is arc-shaped. When gas enters the diffusion assembly from the air inlet, it passes through the diffusion assembly. The length of each region remains constant, promoting uniform diffusion of the gas to both sides during the diffusion process, thereby allowing the gas to quickly and uniformly fill the entire diffusion assembly. This invention solves the problem of uneven gas distribution in diffusion assemblies in the prior art.

[0008] Optionally, the diffuser includes a plurality of diffuser portions disposed on the surface of the region, and the line connecting the centers of the plurality of diffuser portions forms a first arc. Its beneficial effect is that the plurality of diffuser portions guide and diffuse the gas.

[0009] Optionally, the diffuser includes a middle section disposed on the surface of the region, the longitudinal cross-sectional dimension of which gradually decreases from the air inlet end to the blocking end. Its beneficial effect is to accelerate gas diffusion.

[0010] Optionally, the diffuser includes a first air guide section located at the middle section near the air inlet end. The longitudinal cross-sectional dimension of the first air guide section gradually increases from the air inlet end to the blocking end, and the side surface of the first air guide section is curved. The advantage is that by providing the first air guide section, gas is guided to smoothly enter the gap between the diffusers.

[0011] Optionally, the diffuser includes a second air guide section located at the middle section near the blocking end. The longitudinal cross-sectional dimension of the second air guide section gradually decreases from the air inlet end to the blocking end, and the side surface of the second air guide section is curved. The advantage is that by providing the second air guide section, gas is smoothly discharged from the gap between the diffusers.

[0012] Optionally, the side of the diffuser furthest from the region is a horizontal plane. The advantage of this is that the horizontal plane allows for smooth and uniform gas diffusion.

[0013] Optionally, the side of the diffuser away from the area is an inclined surface, and the height of the inclined surface gradually decreases or increases from the air inlet end to the blocking end. The advantage is that the inclined surface creates a guiding slope, facilitating airflow.

[0014] Optionally, the diffuser includes a first sidewall and a second sidewall located on both sides of the area surface, and the first sidewall and the second sidewall are both connected between the air inlet and the blocking end; The angle between the first sidewall and the central axis of the substrate is 5~60°; and / or, The angle between the second sidewall and the central axis of the substrate is 5~60°.

[0015] Its beneficial effects are as follows: Based on the gas flow rate, the size of the diffuser, etc., the angle between the first sidewall and the central axis of the substrate and the angle between the second sidewall and the central axis of the substrate are reasonably set. On the one hand, the angle is too large, which will cause uneven gas diffusion; on the other hand, the angle is too small, which will cause the gas to not diffuse quickly and fully.

[0016] Optionally, the at least one region surface includes N diffusion surfaces and M transition surfaces, wherein the diffusion surfaces and the transition surfaces are alternately disposed on the substrate, wherein N is a positive integer greater than or equal to 3, and M is a positive integer greater than or equal to 2.

[0017] Optionally, the at least one region surface includes three diffusion surfaces and two transition surfaces. The three diffusion surfaces are a first diffusion surface, a second diffusion surface, and a third diffusion surface, respectively. The two transition surfaces are a first transition surface and a second transition surface, respectively. The inlet end, the first diffusion surface, the first transition surface, the second diffusion surface, the second transition surface, the third diffusion surface, and the blocking end are sequentially disposed on the substrate. The advantage is that the diffusion surfaces and transition surfaces are alternately disposed on the substrate, allowing the gas to diffuse more quickly throughout the entire diffuser.

[0018] Optionally, the length of the first diffuser surface gradually increases from the air inlet end to the blocking end; and / or, the height of the first diffuser surface remains constant from the air inlet end to the blocking end.

[0019] Optionally, the length of the second diffuser surface gradually increases from the air inlet end to the blocking end; and / or, the height of the second diffuser surface gradually increases from the air inlet end to the blocking end.

[0020] Its beneficial effects are: the length of the first diffusion surface and the second diffusion surface gradually increases, allowing the gas to quickly cover the entire first diffusion surface and the second diffusion surface; the height of the first diffusion surface and the second diffusion surface remains unchanged, allowing the gas to diffuse evenly on the first diffusion surface and the second diffusion surface.

[0021] Optionally, it also includes two first parting surfaces, which are respectively disposed on both sides of the first diffusion surface, the first transition surface, the second diffusion surface, and the second transition surface. Its beneficial effect is to guide the gas to diffuse at a uniform speed.

[0022] Optionally, the angle between the extension line of the first diffusion surface and the extension line of the second diffusion surface is 14°~24°. The advantage is that the angle between the extension lines of the first and second diffusion surfaces can be understood as the tilt angle of the second diffusion surface relative to the first diffusion surface. By reasonably setting the tilt angle of the first diffusion surface, it is ensured that the gas can flow smoothly and unimpeded along the second diffusion surface.

[0023] Optionally, the third diffusion surface includes an enlarging section, the length of which gradually increases from the inlet end to the blocking end; and / or, the height of the enlarging section remains constant from the inlet end to the blocking end. The advantages are that the gradually increasing length of the enlarging section allows gas to quickly cover the entire enlarging section, while the constant height allows gas to diffuse evenly within the enlarging section.

[0024] Optionally, the diffuser further includes two second parting surfaces respectively disposed on both sides of the enlarged section. Its advantage is that it guides the gas to diffuse at a uniform speed.

[0025] Optionally, the third diffusion surface further includes a smooth section, the length and height of which remain constant from the inlet end to the stop end. The advantage of this is that the constant length and height of the smooth section allow gas to diffuse uniformly and rapidly within it.

[0026] Optionally, the diffuser further includes two third parting surfaces respectively disposed on both sides of the smooth section. Its advantage is that it guides the gas to diffuse at a uniform speed.

[0027] Optionally, the angle between the central axis of the second parting surface and the central axis of the third parting surface is 32.5°~42.5°. The beneficial effect is that the second parting surface is the wall surface on both sides of the enlarged section, and the third parting surface is the wall surface on both sides of the smooth section. By reasonably setting the angle between the central axes of the second and third parting surfaces, on the one hand, it avoids the angle being too large, which would cause uneven gas diffusion; on the other hand, it avoids the angle being too small, which would prevent the gas from diffusing quickly and fully.

[0028] Optionally, the angle between the central axis of the blocking end and the extension line of the third diffusion surface is 112°~122°. The advantage is that the angle between the central axis of the blocking end and the extension line of the third diffusion surface can be understood as the tilt angle of the blocking end relative to the third diffusion surface. Since the blocking end is the gas outlet, by reasonably setting the tilt angle of the third diffusion surface, it is ensured that the gas can flow smoothly and unimpeded out of the diffuser along the blocking end.

[0029] Another object of the present invention is to provide a reactor including an inlet assembly, the diffusion assembly, a reaction chamber and an exhaust assembly, wherein the inlet assembly, the reaction chamber and the exhaust assembly are respectively connected to the diffusion assembly, and the reaction chamber is used to place a substrate.

[0030] The beneficial effect of the reactor described in this invention is that the diffusion component allows the gas to be uniformly dispersed in the diffusion component, thereby enabling the gas in the reaction chamber to deposit a film on the substrate almost simultaneously, resulting in a uniform film thickness on the substrate surface, which solves the problem of uneven film thickness on the substrate surface in the prior art. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the structure of a diffusion component according to some embodiments of the present invention; Figure 2 This is a schematic diagram of the structure of a diffusion component according to some embodiments of the present invention; Figure 3 for Figure 2 A three-dimensional structural diagram of the diffusion component; Figure 4 for Figure 2 A schematic diagram of the structure of the diffuser section; Figure 5 This is a schematic diagram of the structure of a diffusion component according to other embodiments of the present invention; Figure 6 for Figure 5 A cross-sectional structural diagram of the diffusion component. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art to which this invention pertains. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but does not exclude other elements or objects.

[0033] Figure 1 This is a schematic diagram of the structure of a diffusion component according to some embodiments of the present invention; Figure 2 This is a schematic diagram of the structure of a diffusion component according to some embodiments of the present invention; Figure 3 for Figure 2 A three-dimensional structural diagram of the diffusion component; Figure 4 for Figure 2 A schematic diagram of the structure of the diffuser section.

[0034] An embodiment of the present invention provides a diffusion component, comprising: The substrate has a diffuser, which includes an air inlet end and a blocking end. The length of the diffuser gradually increases from the air inlet end to the blocking end. The blocking end is arc-shaped. The diffuser includes at least one area surface. The height of the area surface remains constant in the length direction. The air inlet component, connected to the air inlet end, is used to inject gas into the diffuser.

[0035] Specifically, the inlet component is connected to the inlet end and is used to inject gas into the diffuser. The substrate has a diffuser, which includes an inlet end and a blocking end. The length of the diffuser gradually increases from the inlet end to the blocking end, and the blocking end is arc-shaped. The diffuser includes at least one area surface, and the height of the area surface remains constant in the length direction. When gas enters the diffuser from the inlet component, it passes through the diffuser. The length of the diffuser gradually increases from the inlet end to the blocking end, the blocking end is arc-shaped, and the height of each area surface remains constant in the length direction, which promotes the gas to diffuse evenly to both sides during the diffusion process, thereby allowing the gas to quickly and evenly fill the entire diffuser. This invention solves the problem of uneven gas distribution in the diffusion assembly in the prior art.

[0036] Some embodiments of the present invention are described with reference to Figure 3 The length direction is indicated by arrow A, and the height direction is indicated by arrow B.

[0037] Some embodiments of the present invention are described with reference to Figure 1 A diffusion assembly 100 includes a base 1 and an air inlet 2. The base 1 has a diffuser 3, which includes an air inlet end 33 and a blocking end 34. The length of the diffuser 3 gradually increases from the air inlet end 33 to the blocking end 34. The blocking end 34 is arc-shaped. The diffuser 3 includes at least one area surface, and the height of the area surface remains constant in the length direction. The air inlet 2 is connected to the air inlet end 33 and is used to inject gas into the diffuser 3.

[0038] Some embodiments of the present invention are described with reference to Figure 2 and Figure 3 The diffuser 3 includes a plurality of diffuser portions 31 disposed on the area surface, and the lines connecting the centers of the plurality of diffuser portions 31 form a first arc 32. In some specific embodiments, the diffuser 3 includes 17 diffuser portions 31 disposed on the area surface, and the lines connecting the centers of the 17 diffuser portions 31 form a first arc 32. Specifically, when gas enters the diffuser 3 from the inlet 2, the gas is guided and dispersed throughout the diffuser 3 by the plurality of diffuser portions 31, and the lines connecting the centers of the plurality of diffuser portions 31 form a first arc 32, thereby allowing the gas to quickly and uniformly fill the entire diffuser 3.

[0039] Some embodiments of the present invention are described with reference to Figure 2 and Figure 4 The diffuser 31 includes an intermediate section 313 disposed on the area surface. The longitudinal cross-sectional dimension of the intermediate section 313 gradually decreases from the inlet end 33 to the stop end 34. The shape and size of the intermediate section 313 are not limited here; for example, the intermediate section 313 may be trapezoidal to facilitate air guidance. The gradual decrease in the longitudinal cross-sectional dimension of the intermediate section 313 from the inlet end 33 to the stop end 34 means that the distance between two adjacent intermediate sections 313 gradually increases from the inlet end 33 to the stop end 34, effectively guiding the gas to diffuse uniformly.

[0040] Some embodiments of the present invention are described with reference to Figure 2 and Figure 4 The diffuser section 31 includes a first air guide section 311 located at the middle section 313 near the air inlet end 33. The longitudinal cross-sectional dimension of the first air guide section 311 gradually increases from the air inlet end 33 to the blocking end 34, and the side surface of the first air guide section 311 is curved. The gradually changing longitudinal cross-sectional dimension of the first air guide section 311 and the smooth curved side surface of the first air guide section 311 help to guide the gas smoothly and unimpeded into the gap between the diffusers 31.

[0041] Some embodiments of the present invention are described with reference to Figure 2 and Figure 4The diffuser section 31 includes a second air guide section 312 located at the end of the intermediate section 313 near the blocking end 34. The longitudinal cross-sectional dimension of the second air guide section 312 gradually decreases from the air inlet end 33 to the blocking end 34, and the side surface of the second air guide section 312 is curved. The gradually changing longitudinal cross-sectional dimension of the second air guide section 312 and the smooth curved side surface design of the second air guide section 312 help to guide the gas to flow smoothly and unimpeded out of the gap between the diffusers 31.

[0042] Some embodiments of the present invention are described with reference to Figure 4 The first gas guiding section 311 and the second gas guiding section 312 are semi-circular or semi-elliptical in shape. The diameter of the first gas guiding section 311 is larger than the diameter of the second gas guiding section 312, so that the gas can diffuse smoothly and uniformly.

[0043] One embodiment of the present invention, referring to Figure 4 The side of the diffuser 31 that is away from the region surface is a horizontal surface.

[0044] Some embodiments of the present invention are described with reference to Figure 4 The top of the first air guide section 311, the top of the second air guide section 312, and the top of the middle section 313 are all horizontal.

[0045] Some embodiments of the present invention are described with reference to Figure 4 The top ends of the first air guide section 311, the second air guide section 312, and the middle section 313 are located on the same horizontal plane.

[0046] In other embodiments of the present invention, the side of the diffuser 31 away from the region surface is an inclined surface, and the height of the inclined surface gradually decreases or increases along the air inlet end 33 to the blocking end 34.

[0047] In another embodiment of the present invention, the height of the top end of the first air guide section 311 is greater than the height of the top end of the middle section 313, and the height of the top end of the middle section 313 is greater than the height of the top end of the second air guide section 312.

[0048] In another embodiment of the present invention, the height of the top end of the first air guide section 311 is less than the height of the top end of the middle section 313, and the height of the top end of the middle section 313 is less than the height of the top end of the second air guide section 312.

[0049] Some embodiments of the present invention are described with reference to Figure 2 The substrate 1 and the diffuser 3 are integrally molded structures. This integral molding process involves completing the material in a single step, eliminating the need for secondary or additional processing. Products manufactured using this process exhibit no welding marks, resulting in higher quality and a longer lifespan.

[0050] Some embodiments of the present invention are described with reference to Figure 3 The air inlet 2 includes a first air inlet 21, a second air inlet 22, and a third air inlet 23. The first air inlet 21, the second air inlet 22, and the third air inlet 23 are respectively connected to the base 1. The central axis of the second air inlet 22 coincides with the central axis of the base 1. This allows the gas to diffuse quickly and evenly into the diffuser 3.

[0051] Some specific embodiments of the present invention are described below. Figure 2 The diffuser 3 includes several arc-shaped structures on the side near the air inlet end 33, and these arc-shaped structures are connected together. The diffuser 3 near the blocking end 34 is also arc-shaped. This allows the gas to diffuse evenly into the diffuser 3.

[0052] Some embodiments of the present invention are described with reference to Figure 2 and Figure 3 The diffuser 3 near the intake 2 includes a first arc-shaped structure 331, a second arc-shaped structure 332 and seven third arc-shaped structures, which are connected to form an arc-shaped structure.

[0053] Some embodiments of the present invention are described with reference to Figure 2 and Figure 3 The diffuser 3 includes a first sidewall and a second sidewall located on both sides of the region surface. The first sidewall and the second sidewall are connected between the air inlet end 33 and the blocking end 34. The angle between the first sidewall and the central axis of the substrate 1 is 5~60°. And / or, the angle between the second sidewall and the central axis of the substrate 1 is 5~60°.

[0054] Some embodiments of the present invention are described with reference to Figure 3 The first sidewall is L3, and the angle between the first sidewall L3 and the central axis of the substrate 1 is α, with the angle α being 5~60°. The second sidewall is L4, and the angle between the second sidewall L4 and the central axis of the substrate 1 is β, with the angle β being 5~60°.

[0055] In some more specific embodiments, the included angle α is equal to the included angle β, and the included angle α is 45°, that is, α=β=45°.

[0056] In some other more specific embodiments, the included angle α and included angle β are not equal, with included angle α being 30° and included angle β being 60°.

[0057] Some embodiments of the present invention are described with reference to Figure 1 and Figure 2 The first side wall L3 has a chamfer at the connection with the blocking end, the first side wall L3 has a chamfer at the connection with the air intake end, the second side wall L4 has a chamfer at the connection with the blocking end, and the second side wall L4 has a chamfer at the connection with the air intake end.

[0058] Some embodiments of the present invention are described with reference to Figure 1 The shape of several arc-shaped structures is semi-circular.

[0059] Some embodiments of the present invention are described with reference to Figure 1 The first endpoint of the first arc 32 and the second endpoint of the first arc 32 are on the same horizontal line.

[0060] Some specific embodiments of the present invention are described below. Figure 1 The line connecting the first endpoint of the first arc 32 and the second endpoint of the first arc 32 is the first connecting line, and the first connecting line is L1. The line connecting the first endpoint of the arc and the second endpoint of the arc is the second connecting line, and the second connecting line is L2. The first connecting line L1 and the second connecting line L2 are parallel.

[0061] Figure 5 This is a schematic diagram of the structure of a diffusion component according to other embodiments of the present invention; Figure 6 for Figure 5 A cross-sectional structural diagram of the diffusion component.

[0062] Some embodiments of the present invention are described with reference to Figure 1 , Figure 5 and Figure 6 At least one region surface includes N diffusion surfaces and M transition surfaces, which are alternately arranged on the substrate 1, so that the gas is more evenly distributed in the diffuser 3.

[0063] Some embodiments of the present invention are described with reference to Figure 5 The length direction is indicated by arrow A, the height length direction is indicated by arrow B, and the direction of the central axis of base 1 is indicated by arrow C.

[0064] Some embodiments of the present invention are described with reference to Figure 1 and Figure 5 The air inlet 33 is provided with an air inlet 331, and the gas flowing out from the air inlet 2 flows into the diffuser 3 through the air inlet 331.

[0065] Some embodiments of the present invention are described with reference to Figure 5 The substrate 1 includes a front side and a back side. The length of the substrate 1 gradually decreases from the air inlet end 33 to the blocking end 34. The back side of the substrate 1 is provided with an air inlet end 33, a first diffuser surface 35, a first transition surface 36, a second diffuser surface 37, a second transition surface 38, a third diffuser surface 39 and a blocking end 34.

[0066] Some embodiments of the present invention are described with reference to Figure 1 and Figure 5At least one area surface includes three diffusion surfaces (not shown in the figure) and two transition surfaces (not shown in the figure). The three diffusion surfaces (not shown in the figure) are a first diffusion surface 35, a second diffusion surface 37, and a third diffusion surface 39, respectively. The two transition surfaces (not shown in the figure) are a first transition surface 36 and a second transition surface 38, respectively. The inlet end 33, the first diffusion surface 35, the first transition surface 36, the second diffusion surface 37, the second transition surface 38, the third diffusion surface 39, and the blocking section 34 are sequentially arranged on the base 1. The diffusion surfaces (not shown in the figure) and the transition surfaces (not shown in the figure) are alternately arranged on the base 1, so that the gas can diffuse more quickly into the entire diffuser (not shown in the figure).

[0067] Some embodiments of the present invention are described with reference to Figure 5 and Figure 6 The length of the first diffusion surface 35 gradually increases from the inlet end 33 to the stop end 34, while the height of the first diffusion surface 35 remains constant from the inlet end 33 to the stop end 34. The gradual increase in the length of the first diffusion surface 35 allows the gas to quickly cover the entire first diffusion surface 35, while the constant height of the first diffusion surface 35 allows the gas to diffuse evenly on the first diffusion surface 35.

[0068] Some embodiments of the present invention are described with reference to Figure 5 and Figure 6 The length of the second diffuser surface 37 gradually increases from the inlet end 33 to the stop end 34, and the height of the second diffuser surface 37 also gradually increases from the inlet end 33 to the stop end 34. The gradual increase in the length of the second diffuser surface 37 allows the gas to quickly cover the entire second diffuser surface 37, and the gradual increase in the height of the second diffuser surface 37 allows the gas to quickly diffuse across the second diffuser surface 37.

[0069] Some embodiments of the present invention are described with reference to Figure 5 and Figure 6 The third diffusion surface 39 includes an enlarging section 391. The length of the enlarging section 391 gradually increases from the inlet end 33 to the blocking end 34, while the height of the enlarging section 391 remains constant from the inlet end 33 to the blocking end 34. The gradual increase in the length of the enlarging section 391 allows the gas to quickly cover the entire enlarging section 391, while the constant height of the enlarging section 391 allows the gas to diffuse evenly within the enlarging section 391.

[0070] Some embodiments of the present invention are described with reference to Figure 5 and Figure 6 The third diffusion surface 39 also includes a smooth section 392, which is located on the side of the enlargement section 391 away from the second transition surface 38. The length and height of the smooth section 392 remain constant from the inlet end 33 to the stop end 34. The constant length and height of the smooth section 392 allow the gas to diffuse evenly and rapidly in the smooth section 392.

[0071] Some embodiments of the present invention are described with reference to Figure 6 The angle between the extension of the first diffusion surface 35 and the extension of the second diffusion surface 36 is 14°~24°.

[0072] Some specific embodiments of the present invention are described below. Figure 6 The angle between the extension line of the first diffusion surface 35 and the extension line of the second diffusion surface 36 is δ, that is, the angle δ between the extension line of the first diffusion surface 35 and the extension line of the second diffusion surface 36 is 14°~24°. In some specific embodiments, the angle δ between the extension line of the first diffusion surface 35 and the extension line of the second diffusion surface 36 is 19°.

[0073] Some embodiments of the present invention are described with reference to Figure 5 Both the first transition surface 36 and the second transition surface 38 are arc-shaped structures. One end of the first transition surface 36 is connected to the first diffusion surface 35, and the other end of the first transition surface 36 is connected to the second diffusion surface 37. One end of the second transition surface 38 is connected to the second diffusion surface 37, and the other end of the second transition surface 38 is connected to the third diffusion surface 39. The arrangement of the first transition surface 36 and the second transition surface 38 allows the gas to diffuse evenly onto the diffusion surface.

[0074] Some embodiments of the present invention are described with reference to Figure 5 Both the first transition surface 36 and the second transition surface 38 are arc-shaped structures.

[0075] Some embodiments of the present invention are described with reference to Figure 5 The diffusion component 100 also includes a first parting surface 51, which includes two first parting surfaces 51. The two first parting surfaces 51 are disposed on the substrate 1, and the two first parting surfaces 51 are respectively disposed on both sides of the first diffusion surface 35, the first transition surface 36, the second diffusion surface 37, and the second transition surface 38.

[0076] In some embodiments of the present invention, the first parting surface 51 is an arc-shaped structure.

[0077] Some embodiments of the present invention are described with reference to Figure 5 The diffusion assembly (not shown in the figure) also includes a second parting surface 52 and a third parting surface 53. There are two of each second parting surface 52 and third parting surface 53. Both second parting surfaces 52 and third parting surfaces 53 are disposed on the substrate 1. The two second parting surfaces 52 are respectively disposed on both sides of the enlarged section 391, and the two third parting surfaces 53 are disposed on both sides of the smooth section 392. The third parting surfaces 53 are parallel to the air inlet 2. The arrangement of the second parting surfaces 52 and third parting surfaces 53 allows the gas to diffuse uniformly on the third diffusion surface 39.

[0078] Some embodiments of the present invention are described with reference to Figure 5Both the second parting surface 52 and the third parting surface 53 are straight-line structures, and the angle between the central axis of the second parting surface 52 and the central axis of the third parting surface 53 is 32.5°~42.5°. This allows the gas to diffuse uniformly on the third diffusion surface 35.

[0079] Some specific embodiments of the present invention are described below. Figure 5 The angle between the central axis of the second parting surface 52 and the central axis of the third parting surface 53 is θ, that is, the angle θ between the central axis of the second parting surface 52 and the central axis of the third parting surface 53 is 32.5°~42.5°. In some specific embodiments, the angle θ between the central axis of the second parting surface 52 and the central axis of the third parting surface 53 is 37.5°.

[0080] Some embodiments of the present invention are described with reference to Figure 6 The blocking end 34 has an arc-shaped structure.

[0081] Some embodiments of the present invention are described with reference to Figure 6 In some embodiments, the angle between the central axis of the blocking end 34 and the extension line of the third diffusion surface 39 is 112° to 122°. In other embodiments, the angle between the central axis of the blocking end 34 and the extension line of the third diffusion surface 39 is γ, that is, the angle γ between the central axis of the blocking end 34 and the extension line of the third diffusion surface 39 is 112° to 122°. In some specific embodiments, the angle γ between the central axis of the blocking end 34 and the extension line of the third diffusion surface 39 is 117°.

[0082] Reference Figure 5 and Figure 6 The diffuser is a groove structure, which can be understood as follows: the first diffuser surface 35, the first transition surface 36, the second diffuser surface 37, the second transition surface 38, and the third diffuser surface 39 are the bottom walls of the groove, and the first parting surface 51, the second parting surface 52, and the third parting surface 53 are the side walls of the groove. The groove depth H1 of the diffuser 3 located at the first diffuser surface 35 is greater than the groove depth H2 of the diffuser 3 located at the third diffuser surface 39. The groove depth of the diffuser 3 located at the second diffuser surface 37 gradually decreases from the end near the first diffuser surface 35 to the end near the third diffuser surface 39, so that the slope of the bottom of the groove increases smoothly, so that the gas flows smoothly and evenly.

[0083] An embodiment of the present invention provides a reactor, including an inlet assembly, a diffusion assembly, a reaction chamber, and an exhaust assembly, wherein the inlet assembly, the reaction chamber, and the exhaust assembly are respectively connected to the diffusion assembly, and the reaction chamber is used to place a substrate.

[0084] Specifically, the diffusion component allows the gas to be uniformly dispersed within it, enabling the gas in the reaction chamber to deposit film on the substrate almost simultaneously. This results in a uniform film thickness on the substrate surface, solving the problem of uneven film thickness on the substrate surface in existing technologies.

[0085] While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the invention as defined in the claims. Furthermore, the invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A diffusion component, characterized in that, include: The substrate has a diffuser, which includes an air inlet end and a blocking end. The length of the diffuser gradually increases from the air inlet end to the blocking end. The blocking end is arc-shaped. The diffuser includes at least one area surface, and the height of the area surface remains constant in the length direction. An air inlet component, connected to the air inlet end, is used to inject gas into the diffuser component.

2. The diffusion component according to claim 1, characterized in that, The diffuser includes a plurality of diffuser portions disposed on the surface of the region, and the line connecting the centers of the plurality of diffuser portions forms a first arc.

3. The diffusion component according to claim 2, characterized in that, The diffuser includes a middle section disposed on the surface of the region, the longitudinal cross-sectional dimension of which gradually decreases from the air intake end to the blocking end.

4. The diffusion component according to claim 3, characterized in that, The diffuser includes a first air guide section located at one end of the middle section near the air inlet end. The longitudinal cross-sectional dimension of the first air guide section gradually increases from the air inlet end to the blocking end, and the side of the first air guide section is an arc surface.

5. The diffusion component according to claim 3, characterized in that, The diffuser includes a second air guide section located at one end of the middle section near the blocking end. The longitudinal cross-sectional dimension of the second air guide section gradually decreases from the air inlet end to the blocking end, and the side of the second air guide section is an arc surface.

6. The diffusion assembly according to claim 2, characterized in that, The side of the diffuser that is away from the area is a horizontal surface.

7. The diffusion assembly according to claim 2, characterized in that, The side of the diffuser that is away from the area is an inclined surface, and the height of the inclined surface gradually decreases or increases along the air intake end to the blocking end.

8. The diffusion assembly according to claim 2, characterized in that, The diffuser includes a first sidewall and a second sidewall located on both sides of the area surface, and the first sidewall and the second sidewall are both connected between the air intake end and the blocking end; The angle between the first sidewall and the central axis of the substrate is 5~60°; and / or, The angle between the second sidewall and the central axis of the substrate is 5~60°.

9. The diffusion assembly according to claim 1, characterized in that, The at least one region surface includes N diffusion surfaces and M transition surfaces, the diffusion surfaces and the transition surfaces are alternately disposed on the substrate, where N is a positive integer greater than or equal to 3 and M is a positive integer greater than or equal to 2.

10. The diffusion assembly according to claim 9, characterized in that, The at least one region surface includes three diffusion surfaces and two transition surfaces. The three diffusion surfaces are a first diffusion surface, a second diffusion surface, and a third diffusion surface, respectively. The two transition surfaces are a first transition surface and a second transition surface, respectively. The air inlet end, the first diffusion surface, the first transition surface, the second diffusion surface, the second transition surface, the third diffusion surface, and the blocking end are sequentially disposed on the substrate.

11. The diffusion assembly according to claim 10, characterized in that, The length of the first diffuser surface gradually increases from the air inlet end to the blocking end; and / or, the height of the first diffuser surface remains constant from the air inlet end to the blocking end.

12. The diffusion assembly according to claim 10, characterized in that, The length of the second diffuser surface gradually increases from the air inlet end to the blocking end; and / or, the height of the second diffuser surface gradually increases from the air inlet end to the blocking end.

13. The diffusion component according to any one of claims 10 to 12, characterized in that, It also includes two first parting surfaces, which are respectively disposed on both sides of the first diffusion surface, the first transition surface, the second diffusion surface, and the second transition surface.

14. The diffusion component according to any one of claims 10 to 12, characterized in that, The angle between the extension line of the first diffusion surface and the extension line of the second diffusion surface is 14°~24°.

15. The diffusion assembly according to claim 10, characterized in that, The third diffuser surface includes an enlarging section whose length gradually increases from the intake end to the blocking end; and / or, whose height remains constant from the intake end to the blocking end.

16. The diffusion assembly according to claim 15, characterized in that, The diffuser also includes two second parting surfaces respectively disposed on both sides of the enlarged section.

17. The diffusion assembly according to claim 16, characterized in that, The third diffuser surface also includes a smooth section, the length of which and the height of which remain constant from the intake end to the blocking end.

18. The diffusion assembly according to claim 17, characterized in that, The diffuser also includes two third parting surfaces respectively disposed on both sides of the smooth section.

19. The diffusion assembly according to claim 18, characterized in that, The angle between the central axis of the second parting surface and the central axis of the third parting surface is 32.5°~42.5°.

20. The diffusion assembly according to any one of claims 10-12, 15-19, characterized in that, The angle between the central axis of the blocking end and the extension line of the third diffusion surface is 112°~122°.

21. A reactor, characterized in that, It includes an air intake assembly, a diffusion assembly as described in any one of claims 1 to 20, a reaction chamber, and an exhaust assembly, wherein the air intake assembly, the reaction chamber, and the exhaust assembly are respectively connected to the diffusion assembly, and the reaction chamber is used to place a substrate.

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