Pump arrangement, pump method and radiation generator thereof

Abstract

A pump device, a pump method and a radiation generator thereof are disclosed. The pump device includes a first chamber, a second chamber and a third chamber. The second chamber is located downstream of the first chamber. The second chamber is connected between the first chamber and the third chamber. A passage structure divides the third chamber into a first compartment and a second compartment. The first compartment is enclosed between the second chamber and the second compartment. The first compartment is communicated to the second chamber via at least one hole of the first compartment and an open end. The open end and the at least one hole are oriented at different angles. A pressure in the second chamber is lower than a pressure in the first chamber, a pressure in the first compartment and a pressure in the second compartment.

Description

Technical Field

[0001] The present invention relates to a pump device, a pumping method and a radiation generator thereof, and more particularly to a pump device, a pumping method and a radiation generator thereof that can reduce leakage. Background Technology

[0002] Maintaining a significant pressure difference between two regions is crucial and challenging. For example, in differential pressure pump systems for extreme ultraviolet (EUV) generation, high efficiency (or a high photon number) can be achieved when one compartment is maintained at a pressure below 2 Torr (equivalent to a vacuum condition without helium). However, the high pressure within one compartment drives helium flow to the other compartment and into an efficiency-determining region. Since the two streams from the two compartments may converge in the efficiency-determining region, the flow field there becomes unstable. Therefore, as the helium pressure in the compartment increases and helium flows into the efficiency-determining region, efficiency decreases, leading to poor performance of the EUV generator system. Thus, the flow instability problem in differential pressure pumping is a pressing issue that needs to be addressed. Summary of the Invention

[0003] Therefore, the present invention mainly provides a pump device, a pump method and a radiation generator thereof to improve the shortcomings of the prior art.

[0004] This invention provides a pump device, including a first chamber; a second chamber located downstream of the first chamber; and a third chamber, wherein the second chamber is connected between the first chamber and the third chamber; wherein a channel structure divides the third chamber into a first compartment and a second compartment; wherein the first compartment is surrounded between the second chambers; wherein the first compartment is connected to the second chamber via at least one hole and an open end; wherein the open end and the at least one hole are oriented at different angles; wherein the pressure in the second chamber is lower than the pressure in the first chamber, the pressure in the first compartment, and the pressure in the second compartment.

[0005] This invention provides a pumping method for a pumping device, wherein the pumping device includes a first chamber, a second chamber, and a third chamber, the second chamber being connected between the first chamber and the third chamber, and the pumping method includes maintaining the pressure in the second chamber lower than the pressure in the first chamber, the pressure in a first compartment of the third chamber, and the pressure in a second compartment of the third chamber; and maintaining communication between the first compartment and the second chamber through at least one hole and an open end of the first compartment; wherein a channel structure divides the third chamber into the first compartment and the second compartment; wherein the first compartment is enclosed between the second chamber and the second compartment; and wherein the open end and the at least one hole face different angles.

[0006] This invention provides a radiation generator, including a first chamber; a second chamber connected to the first chamber via a first opening; and a third chamber connected to the second chamber via a second opening. In the first chamber or between the first and second openings, input radiation is converted into extreme ultraviolet radiation through at least one nonlinear process. A channel structure divides the third chamber into a first compartment and a second compartment. The first compartment is connected to the second chamber via at least one hole and an opening. The opening and the at least one hole face different angles. Attached Figure Description

[0007] Figures 1 to 4 This is a schematic diagram of an apparatus according to an embodiment of the present invention.

[0008] Figure 5 This is a schematic diagram of an apparatus according to an embodiment of the present invention.

[0009] Figure 6 Draw Figure 5 Simulation results of the non-solid material flow lines of the device shown.

[0010] Figures 7 to 8 This is a schematic diagram of the apparatus according to an embodiment of the present invention.

[0011] Figure 9 Draw Figure 8 Simulation results of the non-solid material flow lines of the device shown.

[0012] Figure 10 The simulation results of the flow lines of non-solid materials under different pressure conditions are illustrated.

[0013] The reference numerals in the attached figures are explained as follows:

[0014] 10, 50, 70, 80: Device

[0015] 110, 120, 130, 510, 520, 530, 710, 720, 730, 810, 820, 830: Chambers

[0016] 110E, 130E, 530E, 730E, 830E: Open end

[0017] 110F1, 110F2, 110F3, 130F1, 130F2: Fasteners

[0018] 110G, 130G: Non-solid substances

[0019] 110W, 120W, 130W, 530W, 730W: Frame

[0020] 130H, 530H, 730H, 830H: Holes

[0021] 130N: Open

[0022] 130P, 830P: Pipes

[0023] 130PP, 830PP: Restricting parts

[0024] 130T, 530T, 730T, 830T: Channel Structure

[0025] 130U, 530U, 730U, 830U: Adapters

[0026] 131, 132, 133, 531, 532, 533, 731, 732, 733, 831, 832: Compartments

[0027] 141, 142: Film

[0028] 141C, 142C: Orifice Hole

[0029] 530N, 730N: Pipe opening

[0030] 530V: Valve

[0031] 730B: Extension Section

[0032] EDR: Area

[0033] LL: Radiation

[0034] SX: Axis of symmetry

[0035] X, Y, Z: Axes Detailed Implementation

[0036] like Figure 1 As shown, the present invention proposes an apparatus 10 (e.g., a pump device, a radiation generator, a detection device, a photolithography light source, a plasma etching machine, a chemical vapor deposition (CVD) machine, or a particle accelerator) that can maintain a pressure difference between different regions. Figure 2 Presentation Figure 1 A partially enlarged schematic diagram of the device 10, which is outlined with a dashed line. Figure 4 Draw Figure 3 Exploded view of device 10 shown.

[0037] In terms of pressure, device 10 can be divided into different zones, such as chambers 110 to 130. Chamber 110 is connected to a tank containing a non-solid substance 110G and can withstand the highest pressure (e.g., 100 to 500 Torr). The pressure in chamber 120 can be lower than the pressure in chambers 110 or 130. Figure 1 As indicated by the bold arrow, chamber 120 can be (almost) evacuated to maintain low pressure or create a vacuum (e.g., less than e). -3 Or 0.2 Torr, but greater than 10 -3 (mbar). Chamber 130 is connected to a reservoir containing a non-solid substance 130G, and the pressure of chamber 130 (e.g., 2 to 50 Torr) is different from the pressure of chamber 110.

[0038] like Figure 2 As shown, device 10 may include membranes 141 and 142 to separate the three pressure zones. For example, membrane 141 is disposed between and near an opening 110E of chamber 120 and chamber 110, and may include only an orifice 141C to reduce leakage of non-solid material 110G. Similarly, membrane 142 is disposed between and near an opening 130E of chamber 120 and chamber 130, and may also include only an orifice 142C to limit leakage of non-solid material 130G. Using membranes 141 and 142, each chamber can maintain its predetermined pressure, thereby creating a pressure difference between the chambers without interfering with each other.

[0039] However, the non-solid material 130G may leak into the EDR region between membranes 141 and 142. The high pressure within chamber 130 may push the non-solid material 130G outwards, driving it towards or into the EDR region, resulting in unstable flow. The higher the pressure within chamber 130, the greater the likelihood of leakage. Such leakage may increase the pressure within the EDR region and impair the effectiveness of differential pumping.

[0040] To prevent the non-solid substance 130G from escaping into the region EDR via the open end 130E, the chamber 130 may include a channel structure 130T. The channel structure 130T divides the chamber 130 into compartments 131 and 132 for accommodating the non-solid substance 130G. A confiner 130PP may form a narrow passage 130P within the channel structure 130T. The length of the passage 130P is substantially greater than the width or diameter of its cross-section; the cross-section of the passage 130P is much smaller than the cross-section of compartments 131 or 132. This configuration of the channel structure 130T substantially confines the non-solid substance 130G to compartment 132, such that the pressure within compartment 132 (e.g., 2 to 20 Torr) is higher than the pressure within compartment 131 (e.g., less than 10 Torr). Even if non-solid substances 110G and 130G diffuse, the mixing of non-solid substances 110G and 130G should occur within compartment 131, not within the regional EDR. In other words, although non-solid substance 110G may cross the regional EDR, the design of the channel structure 130T prevents non-solid substance 130G from leaking into the regional EDR. Therefore, device 10 achieves optimal differential pressure pumping performance and provides excellent isolation performance to limit gas flow to adjacent areas.

[0041] Alternatively, to prevent non-solid material 130G from escaping into the region EDR via the opening 130E, compartment 131 may include holes (e.g., two holes 130H). Compartment 131 communicates not only with chamber 120 via the opening 130E but also with chamber 120 via the holes 130H. Therefore, the pressure in compartment 131 can be further reduced. Furthermore, even if the pressure in the region EDR adjacent to the opening 130E is below 1 Torr, non-solid material 130G is more likely to flow into chamber 120 via the holes 130H than via the opening 130E because it first encounters the holes 130H. Moreover, even if the reduced pressure within compartment 131 causes non-solid material 110G to cross the region EDR or enter compartment 131, the mixing of non-solid materials 110G and 130G may still occur within compartment 131, rather than within the region EDR. In other words, the orifice 130H prevents non-solid material 130G from leaking into the area EDR through the opening 130E. The device 10 can thus achieve differential pressure pumping with excellent isolation and restrict gas flow to adjacent areas.

[0042] On the other hand, since chamber 130 can be designed to prevent leakage, chambers 110 and 130 can have different structures and be asymmetrical to each other. Specifically, when the pressure in compartment 131 is low, non-solid material 110G may leak into the regional EDR or even compartment 131. However, the effect of non-solid material 110G on photon absorption rate is less than that of non-solid material 130G, so non-solid material 110G is acceptable. On the other hand, chamber 130 has a special structure to prevent non-solid material 130G from escaping into the regional EDR through the opening end 130E. For example, a funnel-shaped section of compartment 131 (e.g., 110F1) substantially tapers toward chamber 120 and is enclosed by chamber 120; a funnel-shaped section of chamber 110 substantially tapers toward chamber 120 but is only adjacent to chamber 120. Alternatively, as previously described, although chamber 110 and compartment 131 include open ends 110E and 130E, compartment 131 also includes a hole 130H (or bypass hole) whose orientation is different from or perpendicular to that of the open end 130E. Alternatively, as previously described, chamber 130 includes an extension section (e.g., 130U or 130W) to accommodate channel structure 130T.

[0043] Device 10 can use a single vacuum pump to maintain the pressure in chambers 110 and 130 (especially within the regional EDR) and also stabilize the flow of non-solid substances 110G and 130G. Specifically, chamber 120 can be (e.g., by using...) Figure 4 (The boxed arrows indicate) vacuum pumps, turbomolecular pumps, or roughing pumps are used to maintain a lower operating pressure to facilitate differential pressure pumping. On the other hand, chambers 110 or 130 are not directly connected to any vacuum pump, thus reducing costs. However, increasing (e.g., with) the number of vacuum pumps in chambers 110…or 130… Figure 4 (The dashed arrow indicates that) More pumps are also a viable option.

[0044] Device 10 can be used as a radiation generator. Within chamber 110 or regional EDR, device 10 may include media or optical components (e.g., separators, polarizers, mirrors, or lenses) for frequency conversion to convert radiation LL (e.g., a laser beam) from the infrared (IR) range to the extreme ultraviolet (XUV) range. For example, using non-solid material 110G, one or more nonlinear processes (e.g., second harmonic generation (SHG), third harmonic generation (THG), sum frequency generation (SFG), optical parametric amplification (OPA), spectral broadening, or other nonlinear effects) may occur within chamber 110 or regional EDR. While non-solid material 110G may be a nonlinear medium, non-solid material 130G may not be a nonlinear medium. Therefore, it is crucial to confine non-solid materials (such as 110G or 130G) to their corresponding areas (such as 110, 130 or EDR) and prevent leakage.

[0045] When device 10 functions as a radiation generator, leakage of the non-solid material 130G into the regional EDR may weaken the intensity of the radiation LL output by device 10. Specifically, the radiation LL may be focused within the regional EDR (which may be referred to as the efficiency-determining region) or have a narrow or minimal beamwidth. Due to the high radiation intensity within the regional EDR, if the pressure within the regional EDR also increases, the photon absorption rate within the regional EDR may be quite significant (leading to a reduction in the photon count). For example, when the pressure of the non-solid material 130G exceeds 2 Torr, it may increase the pressure within the regional EDR, resulting in a decrease in luminous efficiency. However, device 10 can prevent the non-solid material 130G from leaking into the regional EDR to reduce the pressure within the regional EDR, thereby increasing the photon count.

[0046] Contamination is another issue with differential pressure pumping. While diaphragms 141 or 142 can substantially isolate directly connected chambers to create a pressure difference, orifices 141C or 142C of diaphragms 141 or 142 not only allow gas leakage but also allow contaminants to diffuse. For example, during laser drilling to form orifices 141C or 142C, portions of the material of diaphragms 141 or 142 may become contaminants due to radiation (e.g., laser or XUV light). Alternatively, any component of the device may generate debris (e.g., particles generated by O-ring outgassing) after prolonged use. These contaminants can damage components of device 10.

[0047] The material of the retainer 130PP (or an adapter 130U) can be appropriately selected to reduce contaminants entering compartment 133. For example, if the film 141 or 142 is made of a metal (e.g., copper) or a magnetic material, the material of the retainer 130PP can be a magnetic material to attract such contaminants generated by the laser. Alternatively, the material of the retainer 130PP can be adhesive to capture non-magnetic, non-ionizing contaminants. In this way, device 10 can intercept contaminants and prevent them from entering compartment 133.

[0048] Alternatively, to reduce contaminants, especially when the retainer 130PP cannot attract them, the device 10 may optionally include a valve (e.g., 530V). The valve (e.g., 530V) divides chamber 130 into compartments 132 and 133, with compartment 133 connected to a reservoir containing non-solid material 130G. During laser drilling (or maintenance), the valve (e.g., 530V) is closed to isolate compartments 132 and 133 from each other, effectively blocking contaminants. Furthermore, chamber 120 may be maintained under vacuum (e.g., using a vacuum pump) to draw contaminants into chamber 120. This prevents contaminants from entering compartment 133. Once the contaminants have been drained or blocked (or maintenance is complete), the valve (e.g., 530V) is opened. Additionally, non-solid material (e.g., 110G or 130G) may be pumped into the corresponding chamber (e.g., 110 or 130) before laser drilling (or maintenance).

[0049] When device 10 is used as a detection device or a photolithography light source, these contaminants or debris may damage optical components or degrade performance. Specifically, within compartment 133, device 10 may include an illuminator (e.g., an optical component) for manipulating or emitting output radiation LL, or for detecting minute defects or features on an object (e.g., patterned features of a wafer after development or etching, or during development or etching, transistors, drains or sources, metal contacts(s), metal-zero (M0), or metal-one (M1) layers). Alternatively, mirrors, lenses, or other optical components may be disposed within compartment 133. When device 10 is used to emit output radiation LL, the valve (e.g., 530V) is open. Conversely, when device 10 is not emitting any output radiation, the valve (e.g., 530V) is closed; in this case, contaminants that may be heated by high-power radiation LL (e.g., radiation exceeding 50 milliwatts) or moved by the propagation of high-power radiation LL can be intercepted or removed. Since contaminants may be affected by radiation LL and damage optical components if they diffuse downstream, minimizing contaminants in compartment 133 will help protect objects or optical components from contamination.

[0050] The structure of device 10 is described below. For example... Figure 3 As shown, device 10 may include frames 110W to 130W. Frame 130W may form a funnel-shaped section of compartment 131, an extension section of compartment 132, and a step-like section corresponding to a valve (e.g., 530V) or fastener(s). The funnel-shaped section is wider at one end and narrower at the other, and its size or angle may be related to the radiation beamwidth or radiation divergence angle (e.g., the size or angle exceeds the beamwidth or divergence angle). The diameter or width of the extension section may vary along its length or remain constant. Similarly, frame 120W may form a funnel-shaped section and a cross-shaped section, which cover a portion of the conical compartment 131, the channel structure 130T, and compartment 132.

[0051] like Figure 2As shown, device 10 may include fasteners 110F1 to 110F3 and 130F1 to 130F2. Fasteners 110F1 to 110F3 are used to secure or remove diaphragm 141, thereby allowing diaphragm 141 to be replaced during maintenance. Similarly, fasteners 130F1 and 130F2 are used to secure or remove diaphragm 142. Fastener 110F1 forms a funnel-shaped section of chamber 110; fastener 110F3 forms a funnel-shaped section of region EDR of chamber 120, region EDR being connected to chambers 110 and 130. The size or angle of the funnel-shaped section may be related to the radiation beamwidth or radiation convergence angle (e.g., the size or angle exceeds the beamwidth or convergence angle). The distance of the regional EDR between films 141 and 142 is relatively short (e.g., less than twice the Rayleigh length), especially when the apertures 141C to 142C of films 141–142 are small. Films 141–142 are relatively thin, especially when apertures 141C to 142C are used as pinholes. Apertures 141C to 142C are likely the smallest compared to other apertures, openings, or channel structures 830T, which are all related to the radiation beamwidth (e.g., larger than the beamwidth).

[0052] like Figure 4 As shown, the device 10 may include an adapter 130U. An opening 130N of the adapter 130U is wider than the conduit 130P of the restrictor 130PP, such that the restrictor 130PP and the adapter 130U together form a stepped channel structure 130T.

[0053] Figure 5 This is a schematic diagram of a device 50 according to an embodiment of the present invention. Device 50 can be implemented by device 10.

[0054] As previously described, device 50 may include a valve 530V adjacent to compartment 532. In other words, channel structure 530T is disposed between orifice 530H and valve 530V.

[0055] and Figure 1 Compared to chamber 130 shown, chamber 530 of device 50 does not contain restraint 130PP. In other words, the narrow conduit 130P may not be necessary. Alternatively, device 50 may not require two separate parts (i.e., 130PP and 130U) made of different materials.

[0056] and Figure 1Compared to the adapter 130U shown, an adapter 530U of device 50 substantially narrows from compartment 532 toward compartment 531, thus forming a nozzle 530N of channel structure 530T. The narrowed opening of nozzle 530N prevents non-solid material 130G from leaking into area EDR, thereby enhancing differential pressure pumping performance. The size or angle of the opening of nozzle 530N may be related to the radiation beamwidth, radiation divergence angle, or pressure difference (e.g., the size or angle is greater than the beamwidth, divergence angle, or pressure difference).

[0057] and Figure 4 Compared to the frame 130W shown, the frame 530W of the device 50 is thicker. For example, the thickness of the frame 530W is substantially similar to the diameter of the compartment 532. The thickness of the frame 530W allows the adapter 530U to include a protrusion extending radially outward (i.e., from an axis of symmetry SX toward the frame 530W).

[0058] and Figure 1 Compared to the hole 130H shown, which is located on an inclined wall of compartment 131, the two holes 530H of device 50 are provided on a tubular wall of compartment 531. However, the invention is not limited thereto; in another embodiment, one or more holes may also be provided on a flat wall of a compartment.

[0059] Figure 6 Draw Figure 5 The simulation results of the 110G and 130G streamlines of the non-solid material in the apparatus 50 shown. Figure 6 The darker arrows represent the streamlines of non-solid materials at 130G, and the lighter arrows represent the streamlines of non-solid materials at 110G. Furthermore, the grayscale generally darkens as the pressure decreases. Figure 6 The pressures of 110G of non-solid matter and 130G of non-solid matter are approximately 143 Torr (represented by the brightest white) and 10 Torr (represented by the darkest black), respectively.

[0060] like Figure 6 As shown, the streamlines of the non-solid material 130G are uniformly distributed (e.g., substantially parallel) in compartments 531-532. After diffusing into compartment 531, the non-solid material 130G is drawn into chamber 520 through orifice 530H without flowing into region EDR. Similarly, the streamlines of the non-solid material 110G are uniformly distributed (e.g., substantially parallel) in chamber 510. The non-solid material 110G diffuses not only into chamber 520 but also into region EDR and compartment 531. The non-solid material 110G in compartment 531 is drawn into chamber 520 through orifice 530H. In other words, device 50 effectively stabilizes the flow field and prevents the non-solid material 130G from entering region EDR.

[0061] Figure 7 This is a schematic diagram of a device 70 according to an embodiment of the present invention. Device 70 can be implemented by device 10. Figure 5 Compared to the two openings 530H in the shown compartment 531, compartment 731 includes more openings 730H (e.g., 16 openings). These openings 730H surround the axis of symmetry SX, and the opening end 530E, compartments 731, 732, channel structure 730T, chambers 710, 720, or region EDR are symmetrical with respect to the axis of symmetry SX.

[0062] exist Figure 7 The orifice 730H is located closer to the channel structure 730T than the opening end 730E. Alternatively, one or more orifices may be arranged away from the inlet of the reservoir (e.g., the inlet of a reservoir containing non-solid substances 110G or 130G). Alternatively, the orifice may be positioned approximately equidistant from the channel structure 730T and the opening end 730E. Alternatively, the orifice may be located further away from the channel structure 730T than the opening end 730E. The orifice may not be located in an extension section 730B of compartment 731 because an orifice near the opening end 730E may not effectively reduce the pressure in compartment 731 and could cause non-solid substances 130G to leak into the area EDR. The optimal location of the orifice may be a function of the pressure and mass of the non-solid substances 130G.

[0063] exist Figure 7 The holes 730H are arranged around the axis of symmetry SX. Alternatively, some of the holes in compartment 731 may be arranged in one or more straight lines along the axis of symmetry SX. Alternatively, the holes in compartment 731 may form two or more concentric circles around the axis of symmetry SX.

[0064] exist Figure 7 All holes (730H) are the same size. Alternatively, some holes may have different sizes. The area of ​​a single hole can exceed 50 square millimeters.

[0065] exist Figure 7 Each hole is circular. Alternatively, the holes can be triangular, quadrilateral, polygonal, or irregular in shape.

[0066] Figure 7 There may be multiple holes 730H. Alternatively, the device may include only a single hole.

[0067] Figure 8 This is a schematic diagram of a device 80 according to an embodiment of the present invention. Device 80 can be implemented by device 10. Figure 1 Compared to the pipe 130P enclosed by the limiting member 130PP shown, the pipe 830P enclosed by the limiting member 830PP is longer.

[0068] Figure 9 Draw Figure 8Simulation results of the 110G and 130G streamlines of non-solid matter in the apparatus 80 shown. Figure 9 The pressures of 110g of non-solid matter and 130g of non-solid matter are approximately 143 Torr (represented by the brightest white) and 10 Torr (represented by the darkest black), respectively. Figure 9 As shown, the streamlines of the non-solid material 110G are uniformly distributed (e.g., substantially parallel) in chamber 810. Similarly, the streamlines of the non-solid material 130G are uniformly distributed (e.g., substantially parallel) in compartments 831 to 832 and channel structure 830T, and do not flow into the region EDR. After diffusing into compartment 831, the non-solid material 110G or 130G is drawn into chamber 820 through orifice 830H without entering the region EDR. In other words, device 80 effectively stabilizes the flow field and prevents the non-solid material 130G from entering the region EDR.

[0069] Figure 10 Simulation results of 110G and 130G streamlines for non-solid materials under different pressure conditions are plotted. Figure 10 In (a), (c), and (e), the pressure of 130G of non-solid matter is approximately 2 Torr, and it is mainly distributed in... Figure 10 (a), (c), and (e) are the streamlines of non-solid matter 110G. Figure 10 In (b), (d), and (f), the pressure of the non-solid substance 130G is approximately 10 Torr. This higher pressure may push the non-solid substance 130G (i.e., the streamline indicated by the arrow) towards an open end 830E (as shown in the diagram). Figure 10 (as shown in (d)), and even pushed into the region EDR (such as Figure 10 As shown in (b), this leads to unstable flow or low XUV generation efficiency.

[0070] Figure 10 Simulation results of 110G and 130G streamlines of non-solid materials under different pore sizes are also shown. Figure 10 (f) can be an enlarged schematic diagram of device 80, which can correspond to Figure 9 The area enclosed by the thick dashed line. Figure 10 In (a) and (b), the cone-shaped compartment has no holes, therefore the diameter of the holes can be considered 0 mm. Figure 10 In (c) and (d), the diameter of the hole is approximately 2 millimeters. (The last two sentences appear to be fragments and don't translate directly.) Figure 10 Compared to (a), Figure 10 The two openings in the conical compartment shown in (c) provide escape paths for non-solid substances 110G and 130G. Therefore, non-solid substance 110G does not flow upwards or downwards, while non-solid substance 130G flows along the axis of symmetry or the central axis SX. However, Figure 10(c) or (d) has limited effectiveness in reducing flow instability. Figure 10 In (e) and (f), the diameter of the hole (e.g., 830H) is approximately 5 mm. Figure 10 Compared to (d), Figure 10 (f) A larger orifice 830H can effectively prevent non-solid material 130G from leaking into the region EDR through the open end 830E. However, increasing the orifice size will also lead to an increase in the dissipation of non-solid material 130G. Therefore, the optimal orifice size depends on the pressure, pressure difference (e.g., the pressure difference between compartments 131 and 132), or the overall structure.

[0071] The term "non-solid matter" essentially means that it is in a gaseous or plasma state, and may include, for example, gases, gas mixtures (e.g., a ratio of heavy to light atomic weights between 1:1 and 1:300), plasma plasmas, plasma plasma mixtures, or combinations thereof. For example, non-solid matter 110G (used, for example, to optimize phase matching of harmonic generation) may include a gaseous mixture of argon (Ar) and xenon (Xe), while non-solid matter 130G (used, for example, to enhance heat dissipation or reduce pollution) may include helium (He), low XUV absorption gases, or gases with higher ionization energies.

[0072] The pressure within compartment 133 affects particle motion or light transmission. Higher pressure within compartment 133 results in a shorter mean free path for particles. This prevents particles (such as contaminants) from damaging optical or mechanical components within compartment 133. Furthermore, the low pressure and low absorptivity of the non-solid material 130G ensure an attenuation length (i.e., the propagation distance at which power drops to 1 / e) exceeding 20 cm, allowing the output radiation LL to propagate further without excessive attenuation.

[0073] The selection of materials can be carefully considered. For example, the frame 110W to 130W used to form the chambers 110 to 130 can be made of metal (e.g., steel) or a high-rigidity material, while the fasteners 110F2 and 130F2 (e.g., O-rings) can be made of rubber or other flexible materials.

[0074] The membrane used for differential pressure pumping can be carefully designed. Membranes 141 or 142 can be fabricated by laser drilling or mechanical drilling. Alternatively, the plate-like structure of membranes 141 or 142 can be replaced by a nozzle-like design.

[0075] This apparatus is designed to avoid gas mixing, gas exchange, and component contamination caused by differential pressure pumping. Gas mixing between chambers can disrupt gas composition or pressure, altering experimental conditions and affecting the reliability and reproducibility of results. Gas exchange can reduce the efficiency of specific chamber functions (such as phase matching optimization or heat dissipation), thus degrading performance. Furthermore, contaminants can diffuse from one chamber to another, increasing the risk of contamination of optical or mechanical components.

[0076] In summary, this invention relates to a dual-chamber vacuum system designed to optimize the independence of the gas environment within each chamber and prevent gas exchange (e.g., gas leakage) between chambers. This design ensures the functional stability of each chamber and allows for precise control of experimental conditions.

[0077] The foregoing outlines the features of several embodiments, enabling those skilled in the art to fully understand the various aspects of the invention. Those skilled in the art should recognize that the invention provides a basis for designing or modifying other processes and structures to achieve substantially the same functionality and / or results as the embodiments described above. Furthermore, such equivalent configurations do not depart from the spirit and scope of the invention, and various changes, substitutions, and modifications can be made without departing from that spirit and scope.

Claims

1. A pump device, characterized in that, include: First chamber; A second chamber; as well as A third chamber, wherein the second chamber is connected between the first chamber and the third chamber; The passage structure divides the third chamber into a first compartment and a second compartment; The first compartment is surrounded between the second chamber and the second compartment; The first compartment is connected to the second chamber via at least one hole and an open end of the first compartment; The opening end and the at least one hole face different angles; The pressure in the second chamber is lower than the pressure in the first chamber, the pressure in the first compartment, and the pressure in the second compartment.

2. The pump device as claimed in claim 1, characterized in that, The channel structure includes a pipe, the cross-section of which is smaller than a first cross-section of the first compartment and a second cross-section of the second compartment; The length of the pipe is substantially greater than the width or diameter of the cross-section.

3. The pump device as described in claim 1, characterized in that, The channel structure includes an opening that substantially narrows from the second compartment toward the first compartment.

4. The pump device as claimed in claim 1, characterized in that, The at least one hole is closer to the channel structure than the opening end; One of the at least one holes is located in an inclined wall, a flat wall, or a tubular wall of the first compartment.

5. The pump device as claimed in claim 1, characterized in that, The at least one hole surrounds an axis of symmetry around the opening end.

6. The pump device as claimed in claim 1, characterized in that, Also includes: A valve is disposed adjacent to the second compartment; and A first membrane is disposed between the first chamber and the second chamber; The channel structure is disposed between the at least one hole and the valve; The valve is closed when the first membrane is drilled through a radial hole; The valve is opened after the first film is drilled by radiation.

7. The pump device as claimed in claim 6, characterized in that, Also includes: A second membrane is disposed between the second chamber and the first compartment; The minimum beamwidth of the radiation is located between the first thin film and the second thin film; The width or diameter of the channel structure or the opening end is greater than the corresponding beamwidth of the radiation.

8. The pump device as claimed in claim 1, characterized in that, A second diaphragm of the pump device is formed with an orifice by radial drilling, and the formation of the orifice generates contaminants. The contaminant is attracted by a limiting element of the channel structure or drawn into the second chamber; The limiting element includes a magnetic material.

9. The pump device as claimed in claim 1, characterized in that, The first chamber contains a first non-solid material to induce a nonlinear effect; The second compartment contains a second non-solid material with low radiation absorptivity; The pressure in the first chamber is higher than the pressure in the second compartment; Neither the first chamber nor the second compartment is directly connected to any vacuum pump.

10. The pump device as claimed in claim 1, characterized in that, The first chamber includes a funnel-shaped section that substantially narrows toward the second chamber; or The second chamber or the first compartment includes a funnel-shaped section that substantially narrows toward the first chamber.

11. A pumping method for a pumping device, characterized in that, The pumping device includes a first chamber, a second chamber, and a third chamber, wherein the second chamber is connected between the first chamber and the third chamber, and the pumping method includes: Maintaining the pressure in the second chamber lower than the pressure in the first chamber, the pressure in a first compartment of the third chamber, and the pressure in a second compartment of the third chamber; and The communication between the first compartment and the second chamber is maintained by at least one hole and an open end of the first compartment; The third chamber is divided into the first compartment and the second compartment by a channel structure. The first compartment is enclosed between the second chamber and the second compartment; The opening end and the at least one hole face different angles.

12. The pump method as claimed in claim 11, characterized in that, Also includes: When a first diaphragm of the pump device is drilled through a radial borehole, a valve of the pump device is closed. or After the first film is drilled by the radiation, the valve is opened; The first membrane is disposed between the first chamber and the second chamber; The valve is located adjacent to the second compartment; The channel structure is disposed between the at least one hole and the valve.

13. The pump method as claimed in claim 12, characterized in that, The pump device further includes a second diaphragm disposed between the second chamber and the first compartment; The minimum beamwidth of the radiation is located between the first thin film and the second thin film; The width or diameter of the opening or the channel structure is greater than the corresponding beamwidth of the radiation.

14. The pump method as claimed in claim 11, characterized in that, Also includes: The pump device of the radiation drilling device has a second diaphragm to form an orifice on the second diaphragm, the formation of which generates contaminants; The contaminant is attracted or drawn into the second chamber by a limiting element of the channel structure; The limiting element includes a magnetic material.

15. The pump method as claimed in claim 11, characterized in that, Also includes: A first non-solid material is filled into the first chamber to induce a nonlinear effect; A second non-solid material with low radiation absorption rate is filled into the second compartment; The pressure in the first chamber is higher than the pressure in the second compartment. Neither the first chamber nor the second compartment is directly connected to any vacuum pump.

16. A radiation generator, characterized in that, include: First chamber; A second chamber is connected to the first chamber via a first opening end; as well as A third chamber is connected to the second chamber via a second opening end; In the first chamber or between the first opening and the second opening, an input radiation is converted into extreme ultraviolet radiation through at least one nonlinear process. The passage structure divides the third chamber into a first compartment and a second compartment; The first compartment is connected to the second chamber via at least one hole and an open end of the first compartment; The opening end and the at least one hole face different angles.

17. The radiation generator as claimed in claim 16, characterized in that, Also includes: A valve is located adjacent to the second compartment; as well as A first thin film is disposed adjacent to the first opening end; The channel structure is disposed between the at least one hole and the valve; The valve is opened after the first diaphragm is drilled by the input radiation.

18. The radiation generator as claimed in claim 17, characterized in that, Also includes: A second thin film is disposed adjacent to the second opening end; The minimum beamwidth of the extreme ultraviolet radiation is located between the first thin film and the second thin film; The width or diameter of the opening or the channel structure is greater than the corresponding beam width of the extreme ultraviolet radiation.

19. The radiation generator as claimed in claim 16, characterized in that, A second film of the radiation generator is formed with an opening by radiation drilling, and the formation of the opening generates contaminants. The contaminant is attracted by a limiting element of the channel structure or drawn into the second chamber; The limiting element includes a magnetic material.

20. The radiation generator as claimed in claim 16, characterized in that, The channel structure includes: A pipe, wherein a cross-section of the pipe is smaller than a first cross-section of the first compartment and a second cross-section of the second compartment, and the length of the pipe is substantially greater than the width or diameter of the cross-section; or The opening of the tube gradually narrows from the second compartment toward the first compartment.

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