Method of manufacturing an optical assembly with a graded transmittance and optical assembly

Abstract

The application relates to the technical field of optical element manufacturing, and particularly provides a preparation method of an optical assembly with a gradually changing transmittance and the optical assembly, the preparation method comprising the following steps: covering at least part of an outer edge area of one side surface of an optical element with a light extinction material; covering the light extinction material with a mask material; processing the mask material to form a duty cycle pattern with a duty cycle gradually increasing from the edge of the optical element; and exposing the outer edge area with an ion beam to transfer the duty cycle pattern to the light extinction material, so as to obtain a gradually changing transmittance layer with a transmittance gradually increasing from the edge of the optical element. The embodiment has the advantages of controllable processing yield, high stability, high processing precision and the like, and is suitable for batch production of the optical assembly with the gradually changing transmittance.

Description

Technical Field

[0001] This application relates to the field of optical component manufacturing technology, and more specifically, to a method for preparing an optical component with gradient transmittance and the optical component itself. Background Technology

[0002] In sophisticated systems composed of optical components, such as camera lenses, AR / VR components, and imaging modules, the edge regions, non-effective light-transmitting areas, chamfered areas, and film boundaries of optical components are prone to scattering and reflecting light under light-transmitting conditions. This can cause imaging problems such as glare, ghosting, hazy bright spots, and reduced contrast. Therefore, existing optical components utilize gradient transmittance structures at their edges to achieve a smooth optical transition effect, suppress light scattering or reflection, and improve image quality.

[0003] In existing technologies, the gradient transmittance structure of optical components is prepared using either ink-coating or shadow coating methods. Ink-coating involves coating a surface area with black light-absorbing ink at the edge of a lens, followed by processes such as scraping, spraying, and dispensing to form an approximate gradient absorption layer within a certain range at the lens edge. Shadow coating, on the other hand, uses metal masks or shielding sheets to partially block the lens surface, ensuring the absorption film is deposited only in designated areas. By controlling parameters such as the distance and shape between the shielding material and the lens surface, a thickness transition is achieved at the shielding edge, thus realizing an approximate gradient transmittance. However, ink-coating is limited by the properties of the ink, resulting in poor reproducibility, low yield control, and short lifespan. Shadow coating, influenced by the clamping precision of the shielding material and the boundary thickness, suffers from limited applicability and low stability. Therefore, there is an urgent need for a technical solution that allows for precise control of gradient transmittance, high reproducibility, stable extinction effects, and suitability for mass production. Summary of the Invention

[0004] This application addresses the shortcomings of existing methods by proposing a method for fabricating an optical component with gradient transmittance and an optical component in general, thereby solving at least one technical problem in related technologies, namely, uncontrollable gradient transmittance, poor fabrication stability, and difficulty in mass production.

[0005] In a first aspect, embodiments of this application provide a method for fabricating an optical component with graded transmittance, comprising: At least a portion of the outer edge region of one side of the optical element is covered with an matte material; The matte material is covered with a masking material; The mask material is processed to form a duty cycle pattern in which the duty cycle gradually increases from the edge of the optical element; By exposing the outer edge region with an ion beam, the duty cycle pattern is transferred to the matting material, thereby obtaining a gradient transmittance layer with transmittance gradually increasing from the edge of the optical element.

[0006] Specifically, the main technical concept of this application embodiment lies in achieving a gradient transmittance layer by using a duty cycle pattern with varying duty cycle coefficient in conjunction with ion beam exposure. This makes the processing of this application embodiment reliable, with a high yield rate, and easy for mass production. Simultaneously, the gradient transmittance layer is formed by covering optical elements with an matting material, resulting in high material bonding strength and a long service life. Therefore, this application embodiment has advantages such as controllable processing yield, high stability, and high processing precision.

[0007] Furthermore, after completing the preparation of the gradient transmittance layer, the process further includes: An antireflective coating is applied to one side of the optical element.

[0008] Specifically, another technical concept of this application embodiment is to simultaneously reduce the light reflectance of the gradient transmittance layer by using an antireflection film, so that the gradient transmittance layer has both low transmittance and low reflectance characteristics.

[0009] Furthermore, the method for fabricating an optical component with graded transmittance provided in this application embodiment further includes: Based on the relationship between the transmittance and the duty cycle, a mapping function is established; The transmittance is pre-defined as having a transmittance curve that is positively correlated with the spacing. Based on the transmittance curve and the mapping function, determine the duty cycle curve between the duty cycle and the spacing; Based on the duty cycle curve, confirm the duty cycle graph; The spacing refers to the minimum distance between any point in the outer edge region and the edge of the optical element.

[0010] Furthermore, the gradient transmittance layer includes: Configure blank and overlay areas as complementary fills; The duty cycle factor refers to the ratio of the sum of the number of blank areas included in the region composed of points with the same spacing in the duty cycle graph to the sum of the number of blank areas and the number of covered areas. The blank area or the covered area includes: at least one unit graphic.

[0011] Furthermore, the size of the unit graphic in the blank area gradually increases from the edge of the optical element inwards, or the number of the unit graphics in the blank area gradually increases from the edge of the optical element inwards; Alternatively, the size of the unit pattern in the coverage area gradually decreases from the edge of the optical element inwards, or the number of the unit patterns in the coverage area gradually decreases from the edge of the optical element inwards.

[0012] Specifically, another technical concept of this application embodiment is that by setting the unit graphic, the occupancy coefficient of the area composed of points at any spacing can be adjusted, making the embodiment of this application easy to implement.

[0013] Furthermore, the unit graphics are arranged in an array in the outer edge region.

[0014] Furthermore, the size or offset position of the unit graphic in the array distribution is adjusted by a deviation coefficient.

[0015] Specifically, another technical concept of this application embodiment is to disturb the unit pattern of the array by setting the deviation coefficient, reduce the diffraction between the points, lines and other structures of the unit pattern of the array, and ensure the extinction effect of this application embodiment.

[0016] In some optional embodiments, the method for fabricating an optical component with graded transmittance provided in this application further includes: When the transmittance is less than or equal to 50%, the coverage area fills around the blank area; When the transmittance is greater than 50%, the blank area is filled around the covered area.

[0017] Secondly, embodiments of this application provide an optical component with gradient transmittance, fabricated according to a method for fabricating an optical component with gradient transmittance provided in any optional embodiment of the first aspect, comprising: Optical components; A gradient transmittance layer is disposed on at least a portion of the outer edge region of one side of the optical element to gradually increase the transmittance from the edge of the optical element.

[0018] It is understood that the beneficial effects provided by any optional embodiment of the second aspect can be understood with reference to the beneficial effects provided by any optional embodiment of the first aspect.

[0019] Furthermore, the width of the outer edge region is less than or equal to 1.5 mm.

[0020] The beneficial technical effects of the technical solutions provided in this application include: This application embodiment can, according to the design requirements of the gradient transmittance of the outer edge region of the optical element, preset a duty cycle pattern with the duty cycle gradually increasing from the edge of the optical element. Then, an extinction material is used to cover the outer edge region of the optical element, and a mask material is used to cover the extinction material. The preset duty cycle pattern is then obtained by processing the mask material. Finally, one side of the optical element is exposed by ion beam exposure, which removes the extinction material without mask protection, while retaining the extinction material with mask protection. This transfers the duty cycle pattern to the extinction material, causing the duty cycle of the extinction material to gradually increase from the edge of the optical element, thereby gradually increasing the transmittance from the edge of the optical element. Because the fabrication method provided in this application embodiment can transfer the duty cycle pattern using a mask material, it has a defined process flow and controllable process means, allowing for reliable reproduction of the gradient transmittance layer. This results in a high yield rate for the optical component and suitability for mass production. Furthermore, the transmittance of the optical component can be adjusted by adjusting the duty cycle, allowing control over the gradient transmittance layer and ensuring the extinction effect of the optical component. Therefore, the embodiments of this application have the advantages of precise control of gradient transmittance, high reproducibility of preparation, stable extinction effect, and ease of mass production.

[0021] Additional aspects and advantages of this application will be set forth in part in the description which follows, and will become apparent from the description or may be learned by practice of this application. Attached Figure Description

[0022] The above and / or additional aspects and advantages of this application will become apparent and readily understood from the following description of the embodiments taken in conjunction with the accompanying drawings, wherein: Figure 1 A schematic flowchart illustrating a method for fabricating an optical component with gradient transmittance, provided in an embodiment of this application; Figure 2 A cross-sectional schematic diagram of the mask material covering step provided in the embodiments of this application; Figure 3 A top view schematic diagram of the mask material covering step provided in an embodiment of this application; Figure 4 A cross-sectional schematic diagram of the mask material processing steps provided in the embodiments of this application; Figure 5 A top view schematic diagram of the mask material processing steps provided in the embodiments of this application; Figure 6 A cross-sectional schematic diagram of the layer for obtaining gradient transmittance provided in an embodiment of this application; Figure 7 A cross-sectional schematic diagram of the layer for obtaining gradient transmittance provided in an embodiment of this application; Figure 8A partially enlarged view of a circular unit graphic provided in an embodiment of this application; Figure 9 A partially enlarged view of a triangular unit graphic provided in yet another embodiment of this application; Figure 10 A partially enlarged view of a hybrid unit graphic provided in yet another embodiment of this application; Figure 11 A schematic diagram illustrating the calculation of the duty cycle provided in an embodiment of this application; Figure 12 A schematic diagram of transmittance curves provided in an embodiment of this application; Figure 13 A partially enlarged view of the deviation coefficient adjustment unit graph provided in an embodiment of this application; Figure 14 A schematic diagram of an experiment for a deviation coefficient adjustment unit graph provided in another embodiment of this application; Figure 15 Provided for the embodiments of this application Figure 14 A schematic diagram showing the deviation of the transmittance curve; Figure 16 A schematic diagram of the operation of an optical element without a gradient transmittance layer, provided for related technologies; Figure 17 A schematic diagram of the operation of an optical component provided in one embodiment of this application; Figure label: 1. Optical element; 2. Extinction material; 3. Mask material; 21. Gradient transmittance layer; 31. Duty cycle pattern; 211. Covered area; 212. Blank area. Detailed Implementation The embodiments of this application are described below with reference to the accompanying drawings. It should be understood that the embodiments described below with reference to the accompanying drawings are exemplary descriptions for explaining the technical solutions of the embodiments of this application, and do not constitute a limitation on the technical solutions of the embodiments of this application.

[0023] Those skilled in the art will understand that, unless specifically stated otherwise, the terms "described" and "the" as used herein may also include plural forms. It should be further understood that the term "comprising" as used in the specification of this application means the presence of the stated features, integers, steps, operations, elements, and / or components, but does not exclude other features, information, data, steps, operations, elements, components, and / or combinations thereof supported by the art. The term "and / or" as used herein refers to at least one of the items defined by the term; for example, "A and / or B" can be implemented as "A," or as "B," or as "A and B."

[0024] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.

[0025] In related technologies, optical components with graded transmittance are widely used in periscope telephoto lenses for mobile phones, camera lenses, and other precision imaging optical systems. In these systems, some light emitted from point light sources or high-brightness areas may undergo unexpected reflection, scattering, or diffraction between optical elements such as lenses, prisms, and lens barrels, forming stray light. Stray light manifests in the image as flare, ghosting, glare, and starbursts, reducing image contrast, sharpness, and shadow detail, thus affecting the imaging quality of these optical systems. This is particularly true for periscope telephoto lenses, where light is refracted by prisms and propagates along a longer optical path; edge rays and large-angle rays within the optical system are more likely to form non-imaging light, increasing the difficulty of controlling stray light. To suppress imaging problems caused by stray light, related technologies incorporate apodization filters (APDs) in localized areas of optical elements. Apodization filters selectively attenuate edge rays, large-angle rays, or other unwanted light rays in the optical system by continuously or progressively varying the transmittance of a specific area from low to high, while minimizing the impact on the effective imaging beam. This improves phenomena such as starbursts, glare, and ghosting around point light sources. Apodization filters typically require the formation of a gradient absorption region with a specific contour, size, and optical density distribution. The transmittance variation range, gradient width, pattern boundaries, and repeatability all directly affect the stray light suppression effect and image quality. Related technologies can fabricate apodization filters using ink scraping and shadow coating methods. However, the following limitations exist: If the relevant technology uses the ink-coating method, the thickness, edge morphology, and coverage of the ink layer are significantly affected by factors such as ink viscosity, leveling properties, curing shrinkage, doctor blade condition, coating pressure, and ambient temperature and humidity. This makes it difficult to accurately design and reproduce the transmittance distribution of the gradient layer formed by the ink. Secondly, the adhesion and spreading effect between the ink and the optical element are highly dependent on the surface condition of the optical element, especially affected by surface hydrophilicity, cleanliness, surface energy, and pre-treatment processes. When the surface conditions of different batches of optical elements differ, the ink spreading boundary and thickness distribution are prone to change, thus affecting the molding effect. Thirdly, ink materials are easily affected by environmental factors such as humidity, ultraviolet radiation, cleaning agents, and temperature during long-term use, posing risks such as weather resistance, adhesion, aging discoloration, or localized peeling, leading to a reduction in the service life of the transmittance gradient layer prepared by the ink. Therefore, the ink-coating method has technical problems such as uncontrollable process, low reliability of processing reproduction, unsuitability for mass production, and short service life.

[0026] If the relevant technology employs the shadow coating method: First, the shadow coating method defines the gradient transmittance area through mechanical fixtures and masking components. When preparing a narrow, highly consistent gradient transmittance area with a spacing of 0.5mm-1.5mm inward from the edge of the optical element using the shadow coating method, extremely high precision is required in the processing of the masking components, the concentricity of the masking component installation, the repeatability of the fixture, and the clamping precision of the optical element, resulting in a complex manufacturing process. Second, the gap between the masking component and the surface of the optical element causes the deposited particles to have an angular distribution in the outer edge region of the optical element, resulting in a shadowing effect at the masking edge. This makes the actual deposition boundary and gradient width susceptible to the influence of the deposition source position, workpiece rotation, cavity geometry, and clamping status, making it difficult to apply to yield control in mass production. Third, the shadow coating method is more suitable for masking continuous film thickness gradients or wide-spacing areas. Therefore, the shadow coating method suffers from shadowing at the edges of the masking components and poor light-masking effect. Furthermore, it cannot be used for masking narrow spacing of 0.5mm-1.5mm, resulting in low processing reliability.

[0027] The research and development concept of this application includes: In this embodiment, the transmittance of the outer edge region of an optical element is varied by changing the duty cycle of the matting material, thus solving the technical problems of difficulty in thickness control and low yield in ink coating methods. Simultaneously, the matting material does not require the support of a masking element in the shadow coating method, making it suitable for setting the outer edge region of optical elements with narrow spacing. Furthermore, this embodiment combines a mask material with a duty cycle pattern, enabling the matting material to form a gradient transmittance layer based on the duty cycle pattern after ion beam exposure. This provides an effective method for processing gradient transmittance layers, and the transmittance can be controlled by adjusting the duty cycle, further improving the processing accuracy and reliability of the gradient transmittance layer. In addition, the ion beam exposure process is applicable to various types of matting materials, offering wide applicability and diverse application scenarios. Therefore, the method for fabricating an optical component with gradient transmittance and the optical component provided in this application solve the above-mentioned technical problems existing in related technologies.

[0028] The technical solution of this application and how it solves the above-mentioned technical problems are described in detail below with specific embodiments. It should be noted that the following embodiments can be referenced, borrowed, or combined with each other, and the same terms, similar features, and similar implementation steps in different embodiments will not be described again.

[0029] In some alternative embodiments, this application provides a method for fabricating an optical component with gradient transmittance; please refer to [reference needed]. Figure 1 A schematic flowchart illustrating a method for fabricating an optical component with gradient transmittance, provided for embodiments of this application, includes: S10. Covering at least a portion of the outer edge region of one side of the optical element 1 with the matting material 2 includes: According to the design requirements of the optical component, a region requiring a gradual increase in transmittance is first defined on one side of the optical element 1. In this embodiment, the optical component has a region with progressively increasing transmittance. Therefore, this embodiment first covers at least a portion of the outer edge region of one side of the optical element 1 with an anti-reflection material 2. The position and area ratio of the at least portion of the outer edge are determined according to design requirements; this embodiment mainly uses full coverage as an example. The anti-reflection material 2 includes ink, metal, or optical thin film, such as common metal absorbing films, conductive absorbing films, composite black films, or ink-type black films. The anti-reflection material 2 can be configured with a multilayer structure, where the materials of each layer can be different; for example, a low-reflection absorbing film composed of a metal absorbing film and a dielectric layer. The anti-reflection material 2 can be coated using common film preparation processes such as vacuum evaporation, magnetron sputtering, ion beam sputtering, chemical coating, spin coating, and spray coating. Furthermore, the optical element 1 includes any one of the following: a glass lens, an optical window, a filter, a protective film, or other transparent optical substrate. The outer periphery shape of the optical element 1 can be circular, square, or irregular. Therefore, one side of the optical element 1 is cleaned before it is covered to remove residual particles, organic contaminants or water vapor on the surface of the optical element 1, so as to ensure the adhesion and uniformity of the matting material 2 coating deposition.

[0030] S20. Covering the matting material 2 with the masking material 3 includes: A mask material 3, such as photoresist, inorganic mask, or metal mask, is then deposited onto the matte material 2. This mask material 3 can be applied using deposition or spin-coating processes to protect the matte material 2 from etching. Please refer to [reference needed]. Figure 2 and Figure 3 , Figure 2 This is a cross-sectional schematic diagram of the mask material 3 covering step provided in the embodiments of this application. Figure 3 This is a top view schematic diagram of the mask material 3 covering step provided in the embodiment of this application. After the mask material 3 is covered, a three-layer structure of optical element 1, matting material 2 and mask material 3 is formed. The matting material 2 and mask material 3 are stacked on at least a portion of the outer edge region of optical element 1.

[0031] S30. Process the mask material 3 to form a duty cycle pattern 31 where the duty cycle gradually increases from the edge of the optical element 1, including: Based on the function of the mask material 3 and the change in the duty cycle of the gradient transmittance layer 21 formed by the extinction material 2, the mask material 3 is processed to form a duty cycle pattern 31 in which the duty cycle gradually increases from the edge of the optical element 1. Please refer to... Figure 4 and Figure 5, Figure 4 This is a cross-sectional schematic diagram of the three steps for processing the mask material provided in the embodiments of this application. Figure 5 This is a top view schematic diagram illustrating the mask material 3 processing step provided in an embodiment of this application. Example: The mask material 3 is configured as photoresist. After exposure and development, the photoresist in the exposed areas is removed, while the photoresist in the unexposed areas is retained, thereby forming... Figure 5 The mask structure with duty cycle pattern 31 is shown in the figure. The black area is the photoresist retention area, and the blank area 212 is the photoresist removal area.

[0032] S40. The outer edge region is exposed by ion beam exposure, causing the duty cycle pattern 31 to transfer to the extinction material 2, thereby obtaining a gradient transmittance layer 21 with transmittance gradually increasing from the edge of the optical element 1, including: By exposing the outer edge region with an ion beam, the matting material 2 without photoresist protection is removed, forming a blank area 212. The matting material 2 with photoresist protection is retained, forming a cover area 211. That is, the duty cycle pattern 31 is transferred to the matting material 2, forming a gradient transmittance layer 21 with a duty cycle that gradually increases from the edge of the optical element 1. In other words, a gradient transmittance layer 21 with transmittance gradually increasing from the edge of the optical element 1 is obtained. Please refer to... Figures 6 to 8 As shown, Figure 6 This is a cross-sectional schematic diagram of the gradient transmittance layer 21 provided in an embodiment of this application. Figure 7 This is a cross-sectional schematic diagram of the gradient transmittance layer 21 provided in an embodiment of this application. Figure 8 This is a partially enlarged view of a circular unit pattern provided in an embodiment of this application. After the ion beam exposes the outer edge region, the photoresist covering the matting material 2 is essentially removed. Through photoresist removal and drying operations, the gradient transmittance layer 21 with the duty cycle pattern 31 is retained, i.e. Figure 6 The diagram shows a double-layer structure formed by the gradient transmittance layer 21 and the optical element 1. Figure 8 right Figure 7 The upper left corner of the image is magnified. The matting material 2 corresponding to the black area is preserved due to the protection of the mask material 3, forming a coverage area 211 deposited on the surface of the optical element 1. The matting material 2 corresponding to the white area is removed by ion beam exposure because it is not protected by the mask material 3, and the exposed optical element 1 forms a blank area 212.

[0033] In summary, the working principle of this application embodiment is as follows: First, the transmittance variation of the gradient transmittance layer 21 is designed according to the transmittance curve of the gradient transmittance layer 21. Then, a corresponding duty cycle pattern 31 is designed according to the transmittance curve. This allows the application embodiment to first obtain a duty cycle pattern 31 with the duty coefficient gradually increasing from the edge of the optical element 1 through mask material 3 treatment (photoresist exposure and development) to temporarily protect the matting material 2. Then, the duty cycle pattern 31 is obtained through ion beam exposure and transferred to the gradient transmittance layer 21 of the matting material 2. The gradient transmittance layer 21 has a coverage area 211 and a blank area 212 corresponding to the duty cycle pattern 31. The duty coefficient of the gradient transmittance layer 21 also gradually increases from the edge of the optical element 1. Based on the relationship between transmittance and duty cycle, the transmittance of the gradient transmittance layer 21 gradually increases from the edge of the optical element 1. In summary, the fabrication method for an optical component with gradient transmittance provided in this application achieves reliable reproduction of the gradient transmittance layer 21 by reproducing the pre-set duty cycle pattern 31 on the gradient transmittance layer 21, thereby improving the fabrication yield of the optical component with gradient transmittance and making this application suitable for mass production. Simultaneously, the transmittance is confirmed through the duty cycle, allowing the embodiments of this application to adjust the transmittance by adjusting the duty cycle. This provides an adjustable gradient transmittance for the optical component, facilitating adaptability of the optical component with gradient transmittance in different application scenarios and improving the applicability of this application.

[0034] Optionally, in this embodiment of the application, after the gradient transmittance layer 21 is prepared, an antireflection film is also coated on one side of the gradient transmittance layer 21 and the optical element 1. The antireflection film refers to an AR film (Anti-Reflection Coating), used to improve the transmittance of the light-transmitting area and reduce surface reflection. Therefore, the antireflection film covering the gradient transmittance layer 21 and the optical element 1 can, on the one hand, improve the transmittance of the central region of the optical element 1 (the regions of the optical element 1 other than the outer edge region), reducing the reflection effect; on the other hand, it can reduce the surface reflection of the gradient transmittance layer 21, simultaneously achieving reflection suppression and extinction suppression.

[0035] Optionally, embodiments of this application employ the following steps to design the correlation between the duty cycle graphic 31 and the duty cycle coefficient: Based on the relationship between transmittance and duty cycle, a mapping function is established, including: F t :T c =F t ×T c +(1-F t )×T b Among them, F tT refers to the light transmittance of an area composed of points with equal spacing. c T refers to the light transmittance of the blank area 212 in a region composed of points with equal spacing. b It refers to the light transmittance of the covered area 211 in a region composed of points with equal spacing.

[0036] Since the duty cycle factor is the ratio of the sum of the number of blank areas 212 included in the region composed of points with the same spacing in the duty cycle diagram 31 to the sum of the number of blank areas 212 and the number of covered areas 211 included, please refer to [reference needed]. Figure 11 This is a schematic diagram illustrating the calculation of the duty cycle in one embodiment of this application (the black fill in the covered area 211 has been removed to show the composition of the dashed lines). It shows dashed lines with the same spacing *d* at the outer edge of the optical element 1. Each point on the dashed line is at a distance *d* from the edge of the optical element 1, allowing the dashed lines with spacing *d* to pass through different covered areas 211 and blank areas 212. The points on the dashed lines are distinguished by their location within the covered areas 211 and blank areas 212, indicating points located in the blank areas 212 and points located in the covered areas 211. The ratio of the sum of the number of points in the blank areas 212 to the total number of points in both the blank areas 212 and the covered areas 211 indicates the proportion of the dashed line containing blank areas 212, which is the duty cycle of the blank areas 212. Similarly, by progressively shrinking the dashed lines, the outer edge of the optical element 1 can be divided into n sets of dashed lines with the same spacing, thus obtaining a duty cycle curve related to the spacing. Since the transmittance of the blank area 212 of any dashed line's duty cycle is T c The transmittance of the coverage area 211 is T b Therefore, the average transmittance of any dashed line can be calculated using the above formula. It is understood that, based on the thickness and extinction properties of the extinction material 2, the extinction rate of the covered area 211 is close to 100% (transmittance is close to 0, transmittance = 1 - extinction rate). Therefore, the covered area 211 also has transmittance. In this embodiment, the transmittance of the covered area 211 is selected as 1%-0.5%, that is, the extinction rate is 99%-99.5%.

[0037] Based on the above description of the mapping function, this embodiment of the application can set a transmittance curve that is positively correlated with the spacing according to the design requirements of the gradient transmittance of the optical component. This allows the transmittance to increase as the spacing between the dashed line and the edge of the optical element 1 increases (the extinction rate to decrease as the spacing between the dashed line and the edge of the optical element 1 increases). Thus, based on the preset transmittance curve and mapping function, a duty cycle curve related to the spacing is determined. Each point on the duty cycle curve has a definite duty cycle on each of the successively inward dashed lines of the gradient transmittance layer 21, thereby having a definite number of points in the blank area 212 and the number of points in the covered area 211. This allows the duty cycle pattern 31 to be confirmed, ensuring that the gradient transmittance layer 21 obtained by transferring the duty cycle pattern 31 to the extinction material 2 has a definite gradient transmittance, thereby achieving the design requirements of the gradient transmittance of the optical component.

[0038] Furthermore, the transmittance curve preset in the embodiments of this application can be a linear curve, please refer to... Figure 12 This is a schematic diagram of a transmittance curve provided in an embodiment of this application. The vertical axis Tr represents the transmittance of any cross-section of the optical component. (Refer to...) Figure 12 The gradient diagram below illustrates the distance between a point on the optical component on this cross-section and one edge of optical element 1. The rising curve on the left represents the transmittance curve of one outer edge of the optical component, and the falling curve on the right represents the transmittance curve of the other outer edge of the optical component. The transmittance curves on both sides are symmetrical. It is understood that the transmittance curves preset in this embodiment may be non-linear curves, which can be referenced... Figure 12 Use the provided linear curves for understanding. Furthermore, the transmittance curves on both sides can be strictly symmetrical or configured as asymmetrical.

[0039] Furthermore, based on the proportional relationship between the blank area 212 and the covered area 211 at the same spacing, this application allows the blank area 212 and the covered area 211 to be configured as complementary filled unit graphics, simplifying the design of the duty cycle graphic 31. Wherein, Figure 8 An example is shown where the covered area 211 and the blank area 212 can be configured as a circular unit graphic. Also, please refer to... Figure 9 and Figure 10 , Figure 9 A partially enlarged view of a triangular unit graphic provided in another embodiment of this application. Figure 10 This is a partial enlarged view of a mixed unit graphic provided in another embodiment of this application. The covered area 211 and the blank area 212 can also be configured as triangles or a mixture of triangles and circles. It is understood that the embodiments of this application aim to provide an implementation concept of a duty cycle graphic 31 with a gradual change in duty coefficient through a unit graphic. In fact, any graphic that can be used to implement a duty cycle graphic 31 with a gradual change in duty coefficient can be used in this application.

[0040] In some optional embodiments, in this application embodiment, when the transmittance is less than or equal to 50%, the covered area 211 fills around the blank area 212, thereby achieving a larger extinction rate (lower transmittance) through the covered area 211. Simultaneously, when the transmittance is greater than 50%, the blank area 212 fills around the covered area 211, thereby achieving a larger transmittance (lower extinction rate) through the blank area 212. It is understood that this application embodiment can use two spliced ​​templates to respectively achieve the following: when the transmittance is less than or equal to 50%, the covered area 211 fills around the blank area 212; and when the transmittance is greater than 50%, the blank area 212 fills around the covered area 211.

[0041] Furthermore, in this embodiment of the application, the size of the unit graphic in the blank area 212 can be gradually increased from the edge of the optical element 1 inwards, thereby increasing the duty cycle. Please refer to [reference needed]. Figure 11 Indication, Figure 11 The number of triangular unit shapes in the central coverage area 211 remains constant, but their size gradually decreases, causing the size of the unit shapes in the blank area 212 to gradually increase. Alternatively, the number of unit shapes in the blank area 212 gradually increases from the edge of the optical element 1 inwards; please refer to [reference needed]. Figures 8-10 As illustrated, the number of unit patterns in the blank area 212 gradually increases from 2 groups to 3 groups, and then to 4 groups, thereby increasing the blank area 212 and consequently increasing the duty cycle. Similarly, the logic of the covering area 211 is the opposite of that of the blank area 212. The size of the unit patterns in the covering area 211 gradually decreases from the edge of the optical element 1 inwards, or the number of unit patterns in the covering area 211 gradually decreases from the edge of the optical element 1 inwards, thereby gradually increasing the duty cycle.

[0042] Optionally, the unit graphics are arranged in an array in the outer region; please refer to [reference needed]. Figures 8-11 .

[0043] Further, please refer to Figure 13 This is a partially enlarged view of the deviation coefficient adjustment unit pattern provided in an embodiment of this application. In this embodiment, the array-distributed unit pattern is perturbed (the black fill of the coverage area 211 is removed for ease of illustration), causing the unit pattern to shift from the array position indicated by the dashed lines, thereby perturbing the transmittance curve. Example: Please refer to Figure 14 and Figure 15 , Figure 14 This is an experimental schematic diagram of the deviation coefficient adjustment unit graph provided in another embodiment of this application. Figure 15 Provided for the embodiments of this application Figure 14 The transmittance curve deviates from the schematic diagram. Figure 14By perturbing the circular unit shape, the transmittance curve of the gradient transmittance layer 21 is significantly disturbed, causing its preset transmittance curve to change from... Figure 15 The schematic linear curve transforms into a gradually changing transmittance perturbation curve with multiple local convexities. Because the embodiments of this application achieve a gradual change in duty cycle through regular unit patterns, diffraction may occur between the line segments of the array, resulting in a diffraction effect at the edges of the optical components, affecting the final extinction effect. Therefore, the embodiments of this application use perturbation of the unit patterns to break the diffraction effect caused by the regular unit patterns of the array, ensuring the extinction effect of the embodiments of this application. It is understood that... Figures 8-11 The diagram illustrates the settings for the blank area 212 and the covered area 211. In essence, to achieve precise control of the transmittance curve, the unit image size of the blank area 212 and the covered area 211 is extremely small, resulting in a higher number of unit images distributed at the outer edges. Please refer to [reference needed]. Figure 14 .

[0044] Based on the same inventive concept, this application also provides an optical component with gradient transmittance, including: an optical element 1 and a gradient transmittance layer 21, wherein the gradient transmittance layer 21 is disposed on at least a portion of the outer edge region of one side of the optical element 1, and the transmittance of the gradient transmittance layer 21 gradually increases from the edge of the optical element 1.

[0045] Optionally, the width of the outer edge region of the optical element 1 is less than or equal to 1.5 mm. It is understood that the outer edge region of the optical element 1 is used to cover the matting material, reserving an area for deposition. In other words, the distance from any point in the outer edge region to the edge of the optical element 1 is less than 1.5 mm. Furthermore, the maximum distance can be set between 0.5 mm and 1.5 mm.

[0046] Optionally, the material used to prepare the gradient transmittance layer 21 can be a black film, an absorption film, a metal film, a conductive film, a multilayer optical film, or a composite film composed of two materials. The gradient transmittance layer 21 can also be configured as a multilayer structure according to process requirements.

[0047] Alternatively, please refer to Figure 16 and Figure 17 , Figure 16 A schematic diagram of the operation of an optical element without a gradient transmittance layer, provided for related technologies. Figure 17 This is a schematic diagram illustrating the operation of an optical component provided in one embodiment of this application. Figure 16 The diagram illustrates an optical component without a gradient transmittance layer. Because this layer is absent, light passing through the component generates uncontrolled refracted and scattered light. This stray light, after converging within the optical element, causes interference such as glare, ghosting, and bright spots during the imaging process, thus affecting the final image quality. Figure 17 This illustration shows an optical component with gradient transmittance provided in an embodiment of this application. When light passes through the optical component, the gradient transmittance layer on one side of the component causes the transmittance in a specific area to change continuously or in stages from low to high. This selectively attenuates edge rays, high-angle rays, or other unwanted rays in the optical system, reducing their impact on the effective imaging beam and thus improving starburst, glare, and ghosting phenomena around the point light source. It is understood that the gradient transmittance layer provided in this embodiment can cover part of the outer edge of the optical element 1, or it can cover the entire side of the optical element 1 as needed. Furthermore, this embodiment can be applied to… Figures 2-7 The rectangular optical element shown can also be applied to Figure 17 The circular or elliptical optical elements shown are not subject to excessive restrictions on the shape of the optical element 1 in this embodiment of the application.

[0048] By applying the embodiments of this application, at least the following beneficial effects can be achieved: This embodiment of the application achieves a change in transmittance of the outer edge region of the optical element 1 by varying the duty cycle of the matting material 2, thus solving the technical problems of difficulty in thickness control and low yield in ink coating methods. Simultaneously, the matting material 2 does not require the support of a masking element in the shadow coating method, making it suitable for setting narrow-spacing outer edge regions of the optical element 1. Furthermore, this embodiment of the application, by combining the mask material 3 with the duty cycle pattern 31, enables the matting material 2 to form a gradient transmittance layer 21 based on the duty cycle pattern 31 after ion beam exposure, providing an effective processing method for the gradient transmittance layer 21. The transmittance can be controlled by adjusting the duty cycle, further improving the processing accuracy and reliability of the gradient transmittance layer 21. In addition, the ion beam exposure process is applicable to various types of matting materials 2, offering wide applicability and diverse application scenarios.

[0049] In the description of this application, the terms "center," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate directions or positional relationships based on the exemplary directions or positional relationships shown in the accompanying drawings. They are used to facilitate the description or simplification of the embodiments of this application and are not intended to indicate or imply that the device or component referred to must have a specific orientation or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0050] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0051] In the description of this specification, specific features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments or examples.

[0052] The above description is only a partial implementation of this application. It should be noted that for those skilled in the art, other similar implementation methods based on the technical concept of this application, without departing from the technical concept of this application, also fall within the protection scope of the embodiments of this application.

Claims

1. A method for fabricating an optical component with graded transmittance, characterized in that, include: At least a portion of the outer edge region of one side of the optical element is covered with an matte material; The matte material is covered with a masking material; The mask material is processed to form a duty cycle pattern in which the duty cycle gradually increases from the edge of the optical element; By exposing the outer edge region with an ion beam, the duty cycle pattern is transferred to the matting material, thereby obtaining a gradient transmittance layer with transmittance gradually increasing from the edge of the optical element.

2. The method for fabricating an optical component with graded transmittance according to claim 1, characterized in that, After completing the preparation of the gradient transmittance layer, the process further includes: An antireflective coating is applied to one side of the optical element.

3. The method for fabricating an optical component with graded transmittance according to claim 1 or 2, characterized in that, Also includes: Based on the relationship between the transmittance and the duty cycle, a mapping function is established; The transmittance is pre-defined as having a transmittance curve that is positively correlated with the spacing. Based on the transmittance curve and the mapping function, determine the duty cycle curve between the duty cycle and the spacing; Based on the duty cycle curve, confirm the duty cycle graph; The spacing refers to the minimum distance between any point in the outer edge region and the edge of the optical element.

4. The method for fabricating an optical component with graded transmittance according to claim 3, characterized in that, The gradient transmittance layer includes: Configure blank and overlay areas as complementary fills; The duty cycle factor refers to the ratio of the sum of the number of blank areas included in the region composed of points with the same spacing in the duty cycle graph to the sum of the number of blank areas and the number of covered areas. The blank area or the covered area includes: at least one unit graphic.

5. The method for fabricating an optical component with graded transmittance according to claim 4, characterized in that, The size of the unit graphic in the blank area gradually increases from the edge of the optical element inwards, or the number of the unit graphics in the blank area gradually increases from the edge of the optical element inwards. Alternatively, the size of the unit pattern in the coverage area gradually decreases from the edge of the optical element inwards, or the number of the unit patterns in the coverage area gradually decreases from the edge of the optical element inwards.

6. The method for fabricating an optical component with graded transmittance according to claim 5, characterized in that, The unit graphics are arranged in an array in the outer edge region.

7. The method for fabricating an optical component with graded transmittance according to claim 6, characterized in that, The size or offset position of the unit graphic in the array distribution is adjusted by a deviation coefficient.

8. The method for fabricating an optical component with graded transmittance according to claim 4, characterized in that, Also includes: When the transmittance is less than or equal to 50%, the coverage area fills around the blank area; When the transmittance is greater than 50%, the blank area is filled around the covered area.

9. An optical component with graded transmittance, manufactured according to the method for manufacturing an optical component with graded transmittance according to any one of claims 1-8, characterized in that, include: Optical components; A gradient transmittance layer is disposed on at least a portion of the outer edge region of one side of the optical element to gradually increase the transmittance from the edge of the optical element.

10. The optical component with graded transmittance according to claim 9, characterized in that, The width of the outer edge region is less than or equal to 1.5 mm.

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