Flexible multifunctional antireflection film based on high-entropy alloy oxide and its preparation and application

Abstract

The application discloses a flexible multifunctional antireflection film based on high-entropy alloy oxide and a manufacturing method and application thereof. The flexible multifunctional antireflection film comprises a flexible substrate, a hard coating layer and a functional layer, and the functional layer is formed by alternately stacking high-refractive-index material layers and low-refractive-index material layers; wherein the hard coating layer comprises a photocuring resin material layer; the high-refractive-index material layer is a high-entropy alloy oxide layer prepared by using a physical vapor deposition technology with high-entropy alloy as raw material, and the high-entropy alloy is formed by any five or more than five combinations of Ti, Zr, Nb, Mo, Al, V, Hf and Ta; and the low-refractive-index material layer comprises a silicon dioxide layer. The flexible multifunctional antireflection film has excellent wear resistance and bending resistance, a wide refractive index control range and precise stress control.

Description

Technical Field

[0001] This invention belongs to the field of flexible display technology, specifically relating to a flexible multifunctional antireflective film based on high-entropy alloy oxides, its preparation method, and its application. Background Technology

[0002] With the rapid development of flexible display technology, anti-reflective films, as one of its core components, have received increasing attention. Currently, flexible anti-reflective films on the market mainly adopt a multilayer film structure, achieving the anti-reflective effect by alternately stacking high and low refractive index materials.

[0003] The current development trend of flexible display antireflective film technology mainly focuses on material innovation, multilayer structure optimization, and process improvement. Specifically: Multilayer film structure design: such as the combination of common low-refractive-index materials like silicon dioxide (SiO2) with some high-refractive-index materials. This multilayer structure can reduce light reflection on the surface of the flexible display screen through the principle of light interference, improving the display effect. Many patents revolve around the design and optimization of this multilayer structure. Material innovation: In addition to traditional optical materials, some new materials such as nanomaterials and organic-inorganic hybrid materials are also applied to flexible display antireflective films to improve their performance, such as increasing hardness, improving optical performance, and enhancing environmental stability. Organic-inorganic hybrid raw materials: Dexerials' related patents involve organic-inorganic hybrid raw materials for optical films. These raw materials can be used to form hard coatings, antireflective layers, or low-refractive-index layers for antireflective films, optical protective films, etc. By combining organic and inorganic components, the hardness, wear resistance, and transparency of the material can be improved, enhancing the durability and reliability of the film while ensuring optical performance. However, existing technologies face a series of unresolved issues, specifically in their insufficient wear and bending resistance to fully meet the stringent requirements of foldable displays. These limitations restrict their further application in high-end foldable displays and other fields. Specifically: First, traditional flexible inorganic antireflective films are primarily based on small-grain crystalline materials with numerous grain boundaries. During use, especially during repeated bending, these grain boundaries become weak points, prone to fracture, thus severely impacting the film's lifespan and reliability. While organic-inorganic hybrid material systems exhibit better bending resistance, wear resistance remains a concern. Second, the range of refractive index control in existing technologies is relatively limited, making it difficult to meet the increasingly diverse display demands. For example, some special display scenarios require higher refractive indices to achieve specific optical effects, which traditional materials struggle to achieve. Furthermore, stress control is also a challenge in the fabrication of flexible antireflective films. Due to differences in thermal expansion coefficients and mechanical properties between different material layers, stress mismatch can easily occur during deposition and use. This not only leads to a decrease in the flatness of the film but may also cause phenomena such as film cracking and peeling, greatly affecting the performance and stability of the anti-reflection film. In summary, current flexible anti-reflection film technology still has many shortcomings. How to develop an anti-reflection film that has both excellent anti-reflection effect and good flexibility and durability has become an important issue in the field of flexible display technology. Summary of the Invention

[0004] The main objective of this invention is to provide a flexible multifunctional antireflective film based on high-entropy alloy oxides, its preparation method and application, in order to overcome the shortcomings of the prior art.

[0005] To achieve the aforementioned objectives, the technical solution adopted by this invention includes: This invention provides a flexible multifunctional antireflective film based on a high-entropy alloy oxide, comprising: a flexible substrate, a hard coating layer, and a functional layer. The functional layer is formed by alternating layers of high-refractive-index material and low-refractive-index material. The hard coating layer includes a photocurable resin material layer. The high-refractive-index material layer is a high-entropy alloy oxide layer prepared by physical vapor deposition using a high-entropy alloy as raw material. The high-entropy alloy is formed by any five or more combinations of Ti, Zr, Nb, Mo, Al, V, Hf, and Ta. The low-refractive-index material layer includes a silicon dioxide layer.

[0006] This invention also provides a method for preparing the aforementioned flexible multifunctional antireflective film based on high-entropy alloy oxides, comprising: Provide flexible substrates; A hard coating is prepared on the surface of the flexible substrate by coating. Furthermore, a high-entropy alloy oxide layer and a low-refractive-index material layer are alternately deposited on the surface of the hard coating using physical vapor deposition technology until a functional layer is formed, thereby obtaining a flexible multifunctional antireflection film based on high-entropy alloy oxide.

[0007] This invention also provides the application of the aforementioned flexible multifunctional antireflective film based on high-entropy alloy oxide in the field of flexible displays.

[0008] This invention uses high-entropy alloy oxide as the high-refractive-index layer component. Due to the complex structure and slow crystallization kinetics of high-entropy alloy oxide, it is easy to form an amorphous structure under low-temperature magnetron sputtering deposition without grain boundary formation. This means that the film is subjected to more uniform stress when bent, is less prone to cracking, and is more suitable for flexible anti-reflective coating applications. By using a variety of high-refractive-index elements to form a high-entropy alloy target, not only is its high refractive index characteristic retained, but also the columnar crystal defects that are easily generated by single-component oxides are eliminated. The high-entropy effect and solid solution strengthening effect of high-entropy alloy oxide provide the film with a certain degree of hardness, which can more effectively resist daily wear.

[0009] Compared with the prior art, the beneficial effects of the present invention are as follows: (1) Wear resistance: The high-entropy alloy oxide layer used in this invention has high hardness and wear resistance, which can effectively protect the flexible substrate and extend the service life of the antireflection film. (2) Bending resistance: This invention introduces the unique multi-principal element disordered structure and stress regulation of high-entropy alloy materials (making the overall stress of the anti-reflection film approach 0), so that it can still maintain good optical and mechanical properties after multiple bending. (3) Wide range of refractive index control: The high-entropy alloy oxide in this invention can combine high refractive index materials with different ionic radii to achieve a wide range of refractive index control and meet the needs of different application scenarios; (4) Precise stress control: Through the optimization of the sputtering process, this invention can achieve precise control of the stress of the anti-reflective film, avoiding problems such as film cracking caused by excessive stress. Attached Figure Description

[0010] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0011] Figure 1 This is a schematic diagram of the structure of a flexible multifunctional antireflection film based on high-entropy alloy oxide in a typical embodiment of the present invention; Figure 2 This is the XRD pattern of the high-entropy alloy oxide layer prepared in Example 1 of this invention.

[0012] Figure description: 1-Flexible substrate, 2-Hard coating, 3-High refractive index material layer, 4-Low refractive index material layer. Detailed Implementation

[0013] In view of the deficiencies of the prior art, the inventors of this case, through long-term research and extensive practice, have proposed the technical solution of this invention. The technical solution of this invention will be clearly and completely described below. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0014] Specifically, as one aspect of the technical solution of this invention, a flexible multifunctional antireflective film based on high-entropy alloy oxide includes: a flexible substrate, a hard coating layer, and a functional layer. The functional layer is formed by alternating layers of high-refractive-index material and low-refractive-index material. The hard coating layer includes a photocurable resin material layer. The high-refractive-index material layer is a high-entropy alloy oxide layer prepared by physical vapor deposition using a high-entropy alloy as raw material. The high-entropy alloy is formed by any five or more combinations of Ti, Zr, Nb, Mo, Al, V, Hf, and Ta. The low-refractive-index material layer includes a silicon dioxide layer.

[0015] In some preferred embodiments, the functional layer comprises two or more alternating stacked periodic layers, wherein each alternating stacked periodic layer comprises a high refractive index material layer and a low refractive index material layer.

[0016] Furthermore, the functional layer comprises 2 to 5 alternating stacked periodic layers.

[0017] In some preferred embodiments, the refractive index of the high refractive index material layer is 1.9 to 2.3.

[0018] Furthermore, the refractive index of the high refractive index material layer is 2.2~2.3.

[0019] In some preferred embodiments, the refractive index of the low-refractive-index material layer is 1.4 to 1.5.

[0020] Furthermore, the refractive index of the low-refractive-index material layer is 1.45~1.48.

[0021] In some preferred embodiments, the physical vapor deposition technique includes any one of magnetron sputtering, vapor deposition, and atomic layer deposition.

[0022] In some preferred embodiments, the flexible substrate is made of a flexible polymer material, which includes any one or more combinations of polyimide (PI), polyethylene terephthalate (PET), polycarbonate (PC), and cellulose acetate (TAC), and is not limited thereto.

[0023] In some preferred embodiments, the material of the photocurable resin layer includes any one or more combinations of epoxy resin, polyurethane acrylate resin, acrylic resin, and vinyl ether resin, and is not limited thereto.

[0024] In some preferred embodiments, the hard coating comprises a hard coating having a planar structure and / or a hard coating with a predetermined microstructure.

[0025] In some preferred embodiments, the thickness of the flexible substrate is 20~250μm.

[0026] In some preferred embodiments, the thickness of the hard coating is 0.5~10μm.

[0027] In some preferred embodiments, the thickness of the high refractive index material layer is 5~50 nm.

[0028] In some preferred embodiments, the thickness of the low-refractive-index material layer is 5~250 nm.

[0029] In some preferred embodiments, the thickness ratio of the high refractive index material layer to the low refractive index material layer is 1:1 to 1:20.

[0030] In some preferred embodiments, the thickness of the flexible multifunctional antireflective film is 100~1000nm.

[0031] In some more specific implementation schemes, the structural schematic diagram of the flexible multifunctional antireflective film based on high-entropy alloy oxide is as follows: Figure 1 As shown, it includes a flexible substrate 1, a hard coating 2, a high refractive index material layer 3, and a low refractive index material layer 4.

[0032] Another aspect of the present invention provides a method for preparing the aforementioned flexible multifunctional antireflective film based on high-entropy alloy oxides, comprising: Provide flexible substrates; A hard coating is prepared on the surface of the flexible substrate by coating. Furthermore, a high-entropy alloy oxide layer and a low-refractive-index material layer are alternately deposited on the surface of the hard coating using physical vapor deposition technology until a functional layer is formed, thereby obtaining a flexible multifunctional antireflection film based on high-entropy alloy oxide.

[0033] In some preferred embodiments, the preparation method specifically includes: using magnetron sputtering technology, with a high-entropy alloy as the target material and Ar and O2 as the working gases, to deposit a high-entropy alloy oxide layer on the surface of the hard coating; wherein the volume ratio of Ar to O2 is 100:1 to 1:100, and the power density is 1-4 W / cm³. 2 The sputtering pressure is 0.1-2.0 Pa, and the sputtering temperature is 0-80℃.

[0034] Furthermore, the flow rate of Ar is 10~100 sccm, and the flow rate of O2 is 10~50 sccm.

[0035] Furthermore, the volume ratio of Ar to O2 introduced is 1:1 to 1:5.

[0036] Furthermore, the high-entropy alloy comprises TiVNbZrMo.

[0037] Furthermore, the atomic percentage of each metal element in the high-entropy alloy is 5-35%.

[0038] Furthermore, the atomic percentage of each metal element in the high-entropy alloy is the same.

[0039] Furthermore, the sputtering time is 10-60 min, preferably 30-40 min.

[0040] In some preferred embodiments, the preparation method specifically includes: using magnetron sputtering technology, with Si as the target material and Ar and O2 as the working gases, depositing a low-refractive-index material layer on the surface of the high-entropy alloy oxide layer; wherein the flow rate of Ar is 30~80 sccm, the flow rate of O2 is 10~100 sccm, and the power density is 1-4 W / cm³. 2 The sputtering pressure is 0.1-2.0 Pa, the sputtering temperature is 0-80℃, and the sputtering time is 20-50 min.

[0041] Furthermore, the flow rate of Ar is 30~80 sccm, and the flow rate of O2 is 10~100 sccm.

[0042] Furthermore, the volume ratio of Ar to O2 introduced is 1:2 to 1:5.

[0043] Furthermore, the sputtering time is 20-50 minutes, preferably 20-25 minutes.

[0044] Another aspect of this invention provides the application of the aforementioned flexible multifunctional antireflective film based on high-entropy alloy oxides in the field of flexible displays.

[0045] The technical solution of the present invention will be further described in detail below with reference to several preferred embodiments and accompanying drawings. This embodiment is implemented on the premise of the technical solution of the invention, and provides detailed implementation methods and specific operation processes. However, the protection scope of the present invention is not limited to the following embodiments.

[0046] Unless otherwise specified, the experimental materials used in the examples below can be purchased from conventional biochemical reagent companies.

[0047] Example 1 In this embodiment, a typical pentagonal high-entropy alloy oxide is used as a high-refractive-index layer and SiO2 is used as a low-refractive-index layer to fabricate an antireflection film on a polyimide (PI) flexible substrate.

[0048] Step 1: Select polyimide (PI) as the flexible substrate with a thickness of 50 micrometers.

[0049] Step 2: The substrate is ultrasonically cleaned sequentially with acetone, ethanol, and deionized water for 10 minutes each, and then dried with a nitrogen gun for later use. An acrylic resin hard coating with a thickness of 1 micrometer is prepared on the substrate surface using a blade coating method. Step 3: Select five high-refractive-index elements (Ti, V, Nb, Zr, and Mo) (atomic ratio, Ti:V:Nb:Zr:Mo = 37:22:5:22:3) to prepare a 3-inch high-entropy alloy target; deposit the high-entropy alloy oxide layer on the acrylic resin hard coating using magnetron sputtering technology, with a base vacuum of 8 × 10⁻⁶. -4 Pa, Ar is introduced at 20 sccm, O2 is introduced at 30 sccm, Ar:O2 = 2:3, power density is 2 W / cm². 2 The sputtering pressure was 0.4 Pa, and the sputtering time was 25 minutes. This resulted in a refractive index of 2.2 at 550 nm for the thin film sample. The XRD pattern of the prepared high-entropy alloy oxide layer is shown below. Figure 2 As shown.

[0050] Step 4: Prepare a silicon dioxide (SiO2) low-refractive-index material layer on a high-entropy alloy oxide layer using magnetron sputtering with a Si target. Ar is introduced at 10 sccm, and O2 at 30 sccm, with an Ar:O2 ratio of 1:3 and a power density of 2 W / cm². 2 The sputtering pressure was 0.4 Pa, the sputtering time was 150 minutes, and the sputtering parameters were adjusted so that the refractive index of the silicon dioxide layer was 1.46.

[0051] Step 5: Repeat the above preparation process of the high-entropy alloy oxide layer and silicon dioxide layer to form a structure with alternating stacks of one high-entropy alloy oxide layer and one silicon dioxide layer. The thickness of the high-entropy alloy oxide layer is 20 nanometers, and the thickness of the silicon dioxide layer is 120 nanometers.

[0052] Step Six: Abrasion resistance testing was conducted using a steel wool abrasion tester. The steel wool type was #0000, the load was 1 kg, the contact area was 2 cm × 2 cm, the abrasion cycle rate was 40 r / min, and failure was defined as ≤5 visually observable scratches. The film was then subjected to an ultimate bending test using the round bar bending method to determine the ultimate bending radius, which characterizes the film's bending resistance. The results showed that it could withstand 5000 steel wool abrasion cycles, with an ultimate bending radius of 0.15 mm.

[0053] Comparative Example 1 The method is the same as in Example 1, except that Nb2O5 is selected as the high refractive index oxide.

[0054] Comparative Example 2 The method is the same as in Example 1, except that TiO2 is chosen as the high refractive index oxide.

[0055] Comparative Example 3 The method is the same as in Example 1, except that Ti and Nb, two high refractive index elements, are selected to prepare the high entropy alloy.

[0056] Comparative Example 4 The method is the same as in Example 1, except that Ti and Zr, two high-refractive-index elements, are selected to prepare the high-entropy alloy.

[0057] Comparative Example 5 The method is the same as in Example 1, except that four high-refractive-index elements, Ti, V, Nb, and Zr, are selected to prepare the high-entropy alloy.

[0058] Comparative Example 6 The method is the same as in Example 1, except that the thickness ratio of the high-entropy alloy oxide layer to the silicon dioxide layer is 2:1.

[0059] Comparative Example 7 The method is the same as in Example 1, except that the thickness ratio of the high-entropy alloy oxide layer to the silicon dioxide layer is 1:30.

[0060] Example 2 In this embodiment, an antireflective film is fabricated on a polyethylene terephthalate (PET) flexible substrate using a pentagonal high-entropy alloy oxide as a high-refractive-index layer and SiO2 as a low-refractive-index layer.

[0061] Step 1: Select polyethylene terephthalate (PET) as the flexible substrate, with a thickness of 50 micrometers.

[0062] Step 2: The substrate is ultrasonically cleaned sequentially with acetone, ethanol, and deionized water for 10 minutes each, and then dried with a nitrogen gun for later use. An acrylic resin hard coating with a thickness of 1 micrometer is prepared on the substrate surface using a blade coating method. Step 3: Select five elements (Al, Co, Cr, Fe, Ni) (atomic ratio: Al:Co:Cr:Fe:Ni = 30:20:10:20:20) to prepare a 3-inch high-entropy alloy target; deposit a high-entropy alloy oxide layer on a flexible polyethylene terephthalate substrate using physical vapor deposition (PVD) at a base vacuum of 8 × 10⁻⁶. -4 Pa, Ar is introduced at 20 sccm, O2 is introduced at 20 sccm, Ar:O2 = 1:1, power density is 1 W / cm³. 2 The sputtering pressure was 0.4 Pa, and the sputtering time was 60 minutes.

[0063] Step 4: Prepare a silicon dioxide (SiO2) low-refractive-index material layer on a high-entropy alloy oxide layer using magnetron sputtering with a Si target. Ar is introduced at 10 sccm, and O2 at 30 sccm, with an Ar:O2 ratio of 1:3 and a power density of 2 W / cm². 2 The sputtering pressure was 0.4 Pa, and the sputtering time was 150 minutes. Step 5: Repeat the above preparation process of the high-entropy alloy oxide layer and silicon dioxide layer to form a structure with 5 layers of high-entropy alloy oxide layer and 5 layers of silicon dioxide layer stacked alternately. The thickness of the high-entropy alloy oxide layer is 30 nanometers, and the thickness of the silicon dioxide layer is 100 nanometers.

[0064] Step 6: Abrasion resistance test was conducted using a steel wool abrasion tester. The steel wool model was #0000, the load was 1 kg, the contact area was 2 cm × 2 cm, and the abrasion cycle rate was 55 r / min. Bending performance test was conducted using a flexibility fatigue tester. The bending radius was 2 mm and the bending angle was 180°. The results showed that it could withstand 5000 steel wool abrasion cycles without damage, and after 3000 bending cycles, the optical and mechanical properties of the anti-reflective film did not show a significant decrease.

[0065] Example 3 In this embodiment, an antireflective film is fabricated on a polycarbonate (PC) flexible substrate using a pentagonal high-entropy alloy oxide as a high-refractive-index layer and SiO2 as a low-refractive-index layer.

[0066] Step 1: Select polyethylene terephthalate (PET) as the flexible substrate, with a thickness of 50 micrometers.

[0067] Step 2: The substrate is ultrasonically cleaned sequentially with acetone, ethanol, and deionized water for 10 minutes each, and then dried with a nitrogen gun for later use. An acrylic resin hard coating with a thickness of 1 micrometer is prepared on the substrate surface using a blade coating method. Step 3: Select five elements (Ti, Zr, Nb, Mo, and Al) in an atomic ratio of 20:20:20:20:20 to prepare a 3-inch high-entropy alloy target. Deposit the high-entropy alloy oxide layer on a flexible polyethylene terephthalate substrate using physical vapor deposition (PVD) at a base vacuum of 8 × 10⁻⁶. -4 Pa, Ar is introduced at 10 sccm, O2 is introduced at 50 sccm, Ar:O2 = 1:5, power density is 4 W / cm³. 2 The sputtering pressure was 0.4 Pa, and the sputtering time was 10 minutes.

[0068] Step 4: Prepare a silicon dioxide (SiO2) low-refractive-index material layer on a high-entropy alloy oxide layer using magnetron sputtering with a Si target. Ar is introduced at 10 sccm, and O2 at 30 sccm, with an Ar:O2 ratio of 1:3 and a power density of 2 W / cm². 2 The sputtering pressure was 0.4 Pa, and the sputtering time was 150 minutes. Step 5: Repeat the above preparation process of the high-entropy alloy oxide layer and silicon dioxide layer to form a structure with three layers of high-entropy alloy oxide layer and three layers of silicon dioxide layer stacked alternately. The thickness of the high-entropy alloy oxide layer is 18 nanometers, and the thickness of the silicon dioxide layer is 60 nanometers.

[0069] Step 6: Abrasion resistance test was conducted using a steel wool abrasion tester. The steel wool model was #0000, the load was 1 kg, the contact area was 2 cm × 2 cm, and the abrasion cycle rate was 55 r / min. Bending performance test was conducted using a flexibility fatigue tester. The bending radius was 2 mm and the bending angle was 180°. The results showed that it could withstand 5000 steel wool abrasion cycles without damage, and after 3000 bending cycles, the optical and mechanical properties of the anti-reflective film did not show a significant decrease.

[0070] The characterization data of Examples 1-2 and Comparative Examples 1-7 are shown in Table 1.

[0071] Table 1 In addition, the inventors of this case also conducted experiments with other raw materials, process operations, and process conditions described in this specification, referring to the aforementioned embodiments, and obtained relatively ideal results in all cases.

[0072] It should be understood that the technical solutions of the present invention are not limited to the specific embodiments described above. Any technical modifications made to the technical solutions of the present invention without departing from the spirit and scope of the claims are within the scope of protection of the present invention.

Claims

1. A flexible, multifunctional antireflective film based on high-entropy alloy oxides, characterized in that, include: The invention comprises a flexible substrate, a hard coating layer, and a functional layer, wherein the functional layer is formed by alternating layers of high-refractive-index material and low-refractive-index material; and the hard coating layer includes a photocurable resin material layer. The high refractive index material layer is a high entropy alloy oxide layer prepared by physical vapor deposition technology using a high entropy alloy as raw material. The high entropy alloy is formed by any five or more combinations of Ti, Zr, Nb, Mo, Al, V, Hf, and Ta. The low refractive index material layer includes a silicon dioxide layer.

2. The flexible multifunctional antireflective film according to claim 1, characterized in that: The functional layer comprises two or more alternating stacked periodic layers, wherein each alternating stacked periodic layer comprises a high refractive index material layer and a low refractive index material layer; preferably, the functional layer comprises two to five alternating stacked periodic layers. And / or, the refractive index of the high refractive index material layer is 1.9 to 2.3, preferably 2.2 to 2.3; And / or, the refractive index of the low refractive index material layer is 1.4 to 1.5, preferably 1.45 to 1.48; And / or, the physical vapor deposition technique includes any one of magnetron sputtering, vapor deposition, and atomic layer deposition.

3. The flexible multifunctional antireflective film according to claim 1, characterized in that: The flexible substrate is made of a flexible polymer material, which includes any one or more combinations of polyimide, polyethylene terephthalate, polycarbonate, and cellulose acetate. And / or, the material of the photocurable resin layer includes any one or more combinations of epoxy resin, polyurethane acrylate resin, acrylic resin, and vinyl ether resin; And / or, the hard coating includes a hard coating with a planar structure and / or a hard coating with a predetermined microstructure.

4. The flexible multifunctional antireflective film according to claim 1, characterized in that: The thickness of the flexible substrate is 20~250μm; And / or, the thickness of the hard coating is 0.5~10μm; And / or, the thickness of the high refractive index material layer is 5~50nm; and / or, the thickness of the low refractive index material layer is 5~250nm; and / or, the thickness ratio of the high refractive index material layer to the low refractive index material layer is 1:1~1:20; And / or, the thickness of the flexible multifunctional antireflective film is 100~1000nm.

5. The method for preparing a flexible multifunctional antireflective film based on high-entropy alloy oxides as described in any one of claims 1-4, characterized in that, include: Provide flexible substrates; A hard coating is prepared on the surface of the flexible substrate by coating. Furthermore, a high-entropy alloy oxide layer and a low-refractive-index material layer are alternately deposited on the surface of the hard coating using physical vapor deposition technology until a functional layer is formed, thereby obtaining a flexible multifunctional antireflection film based on high-entropy alloy oxide.

6. The preparation method according to claim 5, characterized in that, Specifically, it includes: Using magnetron sputtering technology, a high-entropy alloy oxide layer is deposited on the surface of the hard coating using a high-entropy alloy as the target material and Ar and O2 as the working gases. The volume ratio of Ar to O2 is 100:1 to 1:100, and the power density is 1-4 W / cm³. 2 The sputtering pressure is 0.1-2.0 Pa, and the sputtering temperature is 0-80℃.

7. The preparation method according to claim 6, characterized in that: The high-entropy alloy includes TiVNbZrMo; And / or, the atomic percentage of each metal element in the high-entropy alloy is 5-35%; And / or, the atomic percentage of each metal element in the high-entropy alloy is the same; And / or, the sputtering time is 10-60 min, preferably 30-40 min.

8. The preparation method according to claim 5, characterized in that, Specifically, it includes: A low-refractive-index material layer was deposited on the surface of the high-entropy alloy oxide layer using magnetron sputtering technology, with Si as the target material and Ar and O2 as the working gases. The Ar flow rate was 30–80 sccm, the O2 flow rate was 10–100 sccm, and the power density was 1–4 W / cm³. 2 The sputtering pressure is 0.1-2.0 Pa, and the sputtering temperature is 0-80℃.

9. The preparation method according to claim 8, characterized in that: The sputtering time is 20-50 minutes, preferably 20-25 minutes.

10. The application of the flexible multifunctional antireflective film based on high-entropy alloy oxide as described in any one of claims 1-4 in the field of flexible displays.

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