Exposure apparatus and control method of exposure apparatus

Abstract

The application discloses an exposure device and a control method thereof. The exposure device comprises an exposure light source, an optical assembly comprising at least one lens, the lens comprising a first surface and a second surface arranged oppositely, a rotating device fixedly connected with the optical assembly, the rotating device being used to drive the lens in the optical assembly to rotate around a rotating shaft, so that a plurality of parts of each lens enter a working area successively, at least one part of the lens is in the working area, and at least another part of the lens is outside the working area, and the part of the lens in the working area is used to refract and process light emitted by the exposure light source, wherein the rotating shaft is located outside the lens, and the first surface is located between the second surface and the rotating shaft; a cooling device arranged on one side of the optical assembly; and a controller used to control the rotating device to drive the lens in the optical assembly to rotate around the rotating shaft. The design can guarantee the level of the exposure process.

Description

Technical Field

[0001] This application relates to the field of exposure equipment technology, and in particular to an exposure device and a method for controlling the exposure device. Background Technology

[0002] Exposure is a key process in display panel manufacturing. Light from an exposure source strikes a photomask to form a mask pattern, which is then projected onto the photoresist on the substrate, causing the photoresist to deform. After passing through the photomask, the light needs to be scaled down proportionally by a projection optics system. This system includes lenses and other optical components. After prolonged exposure, the temperature of these components rises, leading to uneven temperature distribution—for example, higher temperatures at the center and lower temperatures at the edges. This causes changes in the refractive power of the optical components, resulting in decreased imaging characteristics and ultimately a decline in the quality of the exposure process. Summary of the Invention

[0003] This application provides an exposure device and a method for controlling the exposure device, which can ensure the quality of the exposure process.

[0004] This application provides an exposure apparatus, comprising: an exposure light source for emitting light into a preset working area; an optical assembly including at least one lens, the lens including a first surface and a second surface disposed opposite to each other; a rotating device fixedly connected to the optical assembly, the rotating device being used to drive the lens in the optical assembly to rotate simultaneously around a rotation axis, such that multiple portions of each lens sequentially enter the working area, and at least one portion of the lens is in the working area, and at least another portion of the lens is outside the working area, so as to refract the light emitted by the exposure light source using the portion of the lens in the working area, wherein the rotation axis is located outside the lens, and the first surface is located between the second surface and the rotation axis; a cooling device disposed on one side of the optical assembly; wherein the cooling device is used to cool the portion of the lens outside the working area; and a controller for controlling the rotating device to drive the lens in the optical assembly to rotate around the rotation axis.

[0005] In one embodiment, the rotating device includes a connecting part, a rotating shaft, and a motor. The connecting part connects one end of the lens to the rotating shaft, and the motor drives the rotating shaft to rotate, thereby causing the lens to rotate around the rotating shaft.

[0006] Preferably, the connecting part is a transparent connecting part.

[0007] In one embodiment, the lens has a ring structure, and the rotation axis coincides with the central axis of the lens.

[0008] In one embodiment, the lens includes a plurality of lens portions spaced apart, the plurality of lens portions being arranged around the rotation axis.

[0009] Preferably, the lens includes two lens portions, which are symmetrically arranged about the rotation axis.

[0010] In one embodiment, the first surface is concave and the second surface is convex.

[0011] Preferably, the number of lenses is multiple, and the multiple lenses are nested from the inside out.

[0012] In one embodiment, the cooling device is located on the backlight side of the optical component.

[0013] Preferably, the cooling device includes an air conditioner.

[0014] In one embodiment, the exposure light source is located on the side of the first surface away from the second surface, and the exposure light source emits light toward the working area, which is transmitted sequentially through the first surface and the second surface of the lens; or, the exposure device further includes a first reflecting mirror, which is located on the side of the first surface away from the second surface, and the exposure light source is located on the side of the first surface away from the second surface, and the exposure light source emits light toward the first reflecting mirror and is reflected to the lens, and is transmitted sequentially through the first surface and the second surface; or, the exposure device further includes a second reflecting mirror, which is located on the side of the first surface away from the second surface, and the exposure light source is located on the side of the second surface away from the first surface, and the exposure light source emits light toward the working area, which is transmitted sequentially through the second surface and the first surface of the lens, and the light is reflected by the second reflecting mirror; or, the exposure device further includes a third reflecting mirror, which is located on the side of the first surface away from the second surface, and the exposure light source is located on the side of the second surface away from the first surface, and the exposure light source emits light toward the working area, which is transmitted sequentially through the second surface and the first surface of the lens, and the light is reflected by the third reflecting mirror to the lens, and is transmitted sequentially through the first surface and the second surface.

[0015] In one embodiment, the exposure apparatus further includes: a first temperature monitoring element electrically connected to the controller, used to monitor the temperature of the portion of the lens located in the working area; wherein the controller is used to: control the exposure light source to stop emitting light to the lens when the first temperature monitoring element detects that the temperature of the portion of the lens located in the working area is greater than a first temperature threshold, and control the rotating device to drive the lens in the optical assembly to rotate so that the other part of the lens enters the working area.

[0016] Preferably, the exposure apparatus further includes: a second temperature monitoring element electrically connected to the controller, used to monitor the temperature of the portion of the lens outside the working area; wherein the controller is used to: when the second temperature monitoring element detects that the temperature of the portion of the lens outside the working area is less than a second temperature threshold, control the cooling device to stop cooling the portion of the lens outside the working area and / or control the rotating device to rotate the lens in the optical assembly so that the portion of the lens outside the working area enters the working area, the second temperature threshold being less than the first temperature threshold.

[0017] A second aspect of this application provides a control method for an exposure apparatus, the method being applied to the exposure apparatus as described in any of the above embodiments, the method comprising: controlling the exposure light source to stop emitting light toward a portion of the lens located in the working area; rotating the lens in the optical assembly to cause a portion of the lens located outside the working area to enter the working area and a portion of the lens located in the working area to move outside the working area; controlling the exposure light source to emit light toward the working area; and controlling the cooling device to cool the portion of the lens located outside the working area.

[0018] In one embodiment, the exposure device includes a first temperature monitoring element electrically connected to the controller. The first temperature monitoring element is used to monitor the temperature of the portion of the lens located in the working area. The method further includes: when the temperature of the portion of the lens located in the working area is detected to be greater than a first temperature threshold, controlling the exposure light source to stop emitting light into the working area and controlling the rotating device to rotate the lens in the optical assembly, so that the portion of the lens located outside the working area enters the working area and the portion of the lens located in the working area moves out of the working area.

[0019] Preferably, the exposure apparatus further includes a second temperature monitoring element, which is electrically connected to the controller and is used to monitor the temperature of the portion of the lens outside the working area. The method includes: when the temperature of the portion of the lens outside the working area is detected to be less than a second temperature threshold, controlling the cooling device to stop cooling the portion of the lens outside the working area and / or controlling the rotating device to rotate the lens in the optical assembly so that the portion of the lens outside the working area enters the working area, wherein the second temperature threshold is less than the first temperature threshold.

[0020] The advantages of this application, which differ from the prior art, are as follows: The exposure equipment of this application includes an exposure light source, an optical component, a rotating device, a cooling device, and a controller. The rotating device rotates around a rotating axis to drive the lens in the optical component to rotate, thereby causing the part of the lens that is in the working area to rotate out of the working area to be cooled by the cooling device, and causing the part of the lens that is out of the working area to rotate into the working area to be continuously used for the exposure process. The whole process is carried out synchronously, which ensures both the level and efficiency of the exposure process. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein:

[0022] Figure 1 This is a schematic diagram of the structure of the first embodiment of the exposure device of this application;

[0023] Figure 2 yes Figure 1 A top view of one embodiment of the structure;

[0024] Figure 3 This is a schematic diagram of the structure of the second embodiment of the exposure device of this application;

[0025] Figure 4 yes Figure 3 A top view of one embodiment of the structure;

[0026] Figure 5 This is a schematic diagram of the third embodiment of the exposure device of this application;

[0027] Figure 6 This is a schematic diagram of the fourth embodiment of the exposure device of this application;

[0028] Figure 7 This is a schematic diagram of the fifth embodiment of the exposure device of this application;

[0029] Figure 8 This is a schematic diagram of the sixth embodiment of the exposure device of this application;

[0030] Figure 9 This is a flowchart illustrating one embodiment of the control method for the exposure equipment of this application. Detailed Implementation

[0031] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0032] It should be noted that the terms "first" and "second" in this application are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products, or apparatuses.

[0033] In this document, the term "implementation" means that a specific feature, structure, or characteristic described in connection with an implementation may be included in at least one implementation of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same implementation, nor is it a separate or alternative embodiment mutually exclusive with other implementations. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0034] In the description of the embodiments in this application, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0035] In the description of the embodiments of this application, the term "multiple" refers to two or more (including two), similarly, "multiple sets" refers to two or more (including two sets), and "multiple pieces" refers to two or more (including two pieces).

[0036] In the description of the embodiments of this application, unless otherwise expressly specified and limited, technical terms such as "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. For those skilled in the art, the specific meaning of the above terms in the embodiments of this application can be understood according to the specific circumstances.

[0037] In existing technologies, the continuous irradiation by the exposure light source causes the temperature of the optical components to rise. More light passes through the center of the optical components, while less light passes through the edges. Furthermore, the heat dissipation at the center of the optical components is poor, while the edges dissipate heat more easily. Therefore, under the influence of various factors, the optical components exhibit a phenomenon where the temperature at the center is higher than that at the edges. Uneven temperature also causes uneven expansion of the optical components, resulting in changes in the refractive power of the optical components, thereby affecting imaging characteristics. Ultimately, as the exposure time increases, the level of the exposure process decreases.

[0038] See Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the structure of the first embodiment of the exposure device of this application. Figure 2 yes Figure 1 A top view of one embodiment of the present application provides an exposure device 10, which includes an exposure light source 100, an optical component 200, a rotating device 300, a cooling device 400, and a controller (not shown).

[0039] Exposure light source 100 is used to emit light into the preset work area A.

[0040] Specifically, the exposure light source 100 can be a high-pressure mercury lamp, excimer laser, ultraviolet lamp, deep ultraviolet lamp, or extreme ultraviolet lamp, etc. The preset working area A refers to the entire area through which the light emitted by the exposure light source 100 illuminates the substrate after refraction or other forms during the exposure process, such as the projection optical system described in the background art of this application. Typically, an optical component 200 is provided in the working area A, which refracts the light emitted by the exposure light source 100 to achieve proportional reduction of the mask pattern.

[0041] The optical component 200 includes at least one lens 201, which includes a first surface S1 and a second surface S2 disposed opposite to each other.

[0042] Specifically, the optical component 200 can be one lens 201 or multiple lenses 201. The form of the lens 201 is not limited. For example, the lens 201 can be a lens with both sides convex, a lens with both sides concave, or a lens with one side convex and the other side concave. The first surface S1 and the second surface S2 are two surfaces arranged opposite to each other. When the first surface S1 is the light-inlet surface, the second surface S2 is the light-outlet surface. Alternatively, when the second surface S2 is the light-inlet surface, the first surface S1 is the light-outlet surface.

[0043] The rotating device 300 is fixedly connected to the optical component 200. The rotating device 300 is used to drive the lens 201 in the optical component 200 to rotate around a rotating axis R at the same time, so that multiple parts of each lens 201 enter the working area A in sequence, and at least one part of the lens 201 is in the working area A, and at least another part of the lens 201 is outside the working area A, so as to use the part of the lens 201 in the working area A to refract the light emitted by the exposure light source 100. The rotating axis R is outside the lens 201, and the first surface S1 is between the second surface S2 and the rotating axis R.

[0044] Specifically, the lens 201 in the optical assembly 200 comprises multiple parts, wherein at least one part of the lens 201 is located in the working area A, and at least another part is located outside the working area A. The part located in the working area A is used for the normal exposure process, while the part located outside the working area A is not used for the exposure process. The optical assembly 200 is fixedly connected to the rotating device 300, which has a rotation axis R. The rotating device 300 rotates around the rotation axis R, causing the lens 201 to rotate, thereby changing the position of the lens 201. Specifically, the position change during the rotation process involves the rotating device 300 rotating the part of the lens 201 located in the working area A to outside the working area A, and simultaneously rotating the part of the lens 201 located outside the working area A into the working area A. Understandably, after prolonged exposure, the temperature of the portion of lens 201 within working area A will inevitably rise. Before this temperature affects the exposure process, the rotating device 300 rotates the portion of lens 201 within working area A to outside of it, while simultaneously rotating the portion outside of working area A into it. The original temperature of the portion of lens 201 outside working area A is now at room temperature, ensuring the stability of the exposure process. The portion of lens 201 that was rotated out of working area A will not be exposed immediately and can be cooled naturally. After cooling, the rotating device 300 rotates the cooled portion of lens 201 back into working area A. Thus, by sequentially introducing the room-temperature portions of lens 201 into working area A while removing the hot portions, it's possible to achieve this. It should be noted that lens 201 can consist of two or more portions.

[0045] A cooling device 400 is disposed on one side of the optical assembly 200; wherein, the cooling device 400 is used to cool the part of the lens 201 outside the working area A.

[0046] Specifically, relying on natural cooling typically takes a long time, while the portion of lens 201 within working area A usually heats up quickly during the exposure process. To ensure continuous operation of the exposure process and reduce cooling waiting time, multiple portions of lens 201 outside working area A need to be cooled simultaneously, which increases costs. This application further employs a cooling device 400 to cool the portion of lens 201 outside working area A, thereby improving cooling efficiency and reducing or even eliminating cooling waiting time. The portion of lens 201 outside working area A is cooled before it reaches the temperature required for rotation, ensuring both the quality and efficiency of the exposure process.

[0047] The controller is used to control the rotating device 300 to drive the lens 201 in the optical component 200 to rotate around the rotating axis R.

[0048] Specifically, the controller includes a CPU (Central Processing Unit), an integrated circuit chip, a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), or other programmable logic devices, discrete gate or transistor logic devices, or discrete hardware components. The controller can control the rotation of the rotating device 300, thereby causing the lens 201 to rotate around the rotation axis R, which in turn allows the lens 201 to be cooled.

[0049] As can be seen from the above, the exposure equipment 10 of this application includes an exposure light source 100, an optical component 200, a rotating device 300, a cooling device 400, and a controller. The rotating device 300 rotates around the rotation axis R to drive the lens 201 in the optical component 200 to rotate, thereby causing the part of the lens 201 that is in the working area A to rotate out of the working area A and be cooled by the cooling device 400, and causing the part of the lens 201 that is outside the working area A to rotate back into the working area A for continuous use in the exposure process. The whole process is carried out synchronously, which ensures both the level and efficiency of the exposure process.

[0050] In one embodiment, see further. Figure 1 and Figure 2 The rotating device 300 includes a connecting part 310, a rotating shaft 320 and a motor 330. The connecting part 310 connects one end of the lens 201 to the rotating shaft 320. The motor 330 is used to drive the rotating shaft 320 to rotate, thereby causing the lens 201 to rotate around the rotating shaft.

[0051] Specifically, the connecting part 310 connects to one end of the lens 201, connecting multiple parts of the lens 201 together, including connecting the part of the lens 201 within the working area A and the part outside the working area A. Simultaneously, the rotating shaft 320 is fixedly connected to the connecting part 310, and the central axis of the rotating shaft 320 is the rotation axis R. The rotating shaft 320 is then connected to the rotor in the motor 330, so that the motor 330 can drive the rotating shaft 320 to rotate, ultimately driving the lens 201 in the optical assembly 200 to rotate. The connecting part 310 can be a connecting plate or a connecting bracket. The rotating shaft 320 can be simply located between the motor 330 and the connecting part 310, or it can extend further to the side of the connecting part 310 opposite to the motor 330.

[0052] Preferably, the connecting part 310 is a transparent connecting part, that is, the connecting part 310 and the lens 201 can be made of the same material, so that they can be integrally formed during manufacturing, reducing the fixing process between the connecting part 310 and the lens 201.

[0053] In one embodiment, see further. Figure 1 and Figure 2 The lens 201 includes a plurality of lens portions 2011 spaced apart, and the plurality of lens portions 2011 are arranged around the rotation axis R.

[0054] Specifically, the multiple lens sections 2011 are spaced apart to avoid heat transfer between them. Specifically, this prevents the lens section 2011 in the working area A from transferring heat to the lens section 2011 outside the working area A, thus preventing a widening of the temperature difference between the center and edge of the lens section 2011 in the working area A and premature changes in refractive power. The arrangement of the multiple lens sections 2011 around the rotation axis R allows them to be sequentially inserted into the working area A for exposure processing via rotation of the shaft 320, and subsequently cooled by the cooling device 400.

[0055] Preferably, the lens 201 includes two lens portions 2011, which are symmetrically arranged about the rotation axis R. This design maximizes the distance between the two lens portions 2011, reducing their mutual influence. Furthermore, the symmetrical arrangement ensures that the connecting portion 310 and the rotating shaft 320 bear balanced forces, preventing the motor 330 from becoming eccentric due to uneven force distribution, thereby extending the service life of the rotating device 300.

[0056] In one embodiment, see Figure 2 The cooling device 400 is located on the backlight side of the optical component 200.

[0057] Specifically, the cooling device 400 includes an air cooler, etc. While providing a cooling effect to the lens 201, if the cooling device 400 is placed too close to the working area A, the cooling gas may blow into the working area A, thereby causing the part of the lens 201 in the working area A to also be cooled, thus increasing the temperature difference of the part of the lens 201 in the working area A, resulting in a more serious change in refractive power. In this embodiment, the cooling device 400 is placed on the backlight side of the optical component 200, which can effectively prevent the cooling gas from blowing into the working area A and avoid the impact of the cooling device 400 on the working area A when cooling.

[0058] Of course, it should be noted that the lens 201 may also include more lens parts 2011, with one of them located in the working area A and the rest located outside the working area A.

[0059] In one embodiment, combined with Figure 3 and Figure 4 , Figure 3 This is a schematic diagram of the second embodiment of the exposure device of this application. Figure 4 yes Figure 3 A top view of one embodiment shows that the lens 201 has a ring structure and the rotation axis R coincides with the central axis of the lens 201.

[0060] Specifically, the annular structure means that the lens 201 is the same size everywhere in the 360-degree direction around the rotation axis R. At the same temperature, rotating the lens 201 at any angle will result in the same shape as before the rotation. When the part of the lens 201 in the working area A has been exposed for a long time and the temperature rises, the rotating device 300 needs to rotate the lens 201 to move the part of the lens 201 in the working area A out of the working area A and move the part of the lens 201 outside the working area A into the working area A. This ensures the normal operation of the exposure process. At the same time, since the lens 201 has an annular structure, that is, the entire lens 201 is a continuous structure, the light from the exposure light source 100 does not need to be stopped from shining into the working area A. The exposure light source 100 can still continue to emit light into the working area A, and rotating the lens 201 will not affect the normal operation of the exposure process.

[0061] Furthermore, in one application scenario, refer to Figure 4 The rotating device 300 is set to rotate at a fixed speed. Each part of the lens 201 takes the same amount of time to pass through the working area A, and each part of the lens 201 is cooled by the cooling device 400 for the same amount of time. Maintaining this state ensures that the part of the lens 201 in the working area A can always be kept at a low and constant temperature, thereby ensuring the level and stability of the exposure process.

[0062] In one embodiment, see Figure 2 and Figure 4 The first surface S1 is concave, and the second surface S2 is convex. There are multiple lenses 201, which are nested from the inside out.

[0063] Specifically, the first surface S1 is the surface of lens 201 near the rotation axis R, and the second surface S2 is the surface of lens 201 away from the rotation axis R. Multiple lenses 201 have this structure, and the concave and convex surfaces of multiple lenses 201 can be nested with each other to form a stable connection structure.

[0064] In one embodiment, see Figure 5 , Figure 5This is a schematic diagram of the third embodiment of the exposure apparatus of this application. The exposure apparatus 10 also includes a first temperature monitoring element 510, which is electrically connected to the controller and is used to monitor the temperature of the portion of the lens 201 located in the working area A. The controller is used to: control the exposure light source 100 to stop emitting light to the lens 201 when the first temperature monitoring element 510 detects that the temperature of the portion of the lens 201 located in the working area A is greater than a first temperature threshold, and control the rotating device 300 to drive the lens 201 in the optical assembly 200 to rotate so that the other part of the lens 201 enters the working area A.

[0065] Specifically, the first temperature monitoring component 510 includes a non-contact temperature sensor, such as an infrared thermometer. This non-contact temperature sensor avoids contact with the lens 201, thus ensuring the cleanliness of the lens 201 and reducing damage to it. The first temperature monitoring component 510 monitors the temperature of the lens 201, for example, by monitoring the center position of the lens 201. When the temperature exceeds a first temperature threshold, the exposure process should be stopped, and the portion of the lens 201 in working area A needs to be replaced. The position of the lens 201 is adjusted by rotating the rotating device 300, ensuring that the temperature of the adjusted portion of the lens 201 in working area A is significantly lower than the first temperature threshold. The first temperature threshold can be determined based on the specifications of the exposure process and parameters such as the lens's refractive power.

[0066] In another embodiment, there are multiple first temperature monitoring elements 510, which monitor the center position and the edge position of the lens 201 respectively. By monitoring the temperature of different positions of the part of the lens 201 in the working area A, the temperature difference between the different positions is calculated. When the temperature difference is greater than the first temperature difference threshold, the part of the lens 201 in the working area A needs to be moved out of the working area A, and the part of the lens 201 outside the working area A needs to be moved into the working area A.

[0067] Of course, in some other implementations, a timer can be set to adjust the position of the lens 201 in a timed manner, so as to ensure that the temperature of the lens 201 in the working area A is not too high and affects the exposure process.

[0068] In one embodiment, see Figure 5The exposure apparatus 10 also includes a second temperature monitoring element 520, which is electrically connected to the controller and is used to monitor the temperature of the portion of the lens 201 outside the working area A. The controller is used to: control the cooling device 400 to stop cooling the portion of the lens 201 outside the working area A when the second temperature monitoring element 520 detects that the temperature of the portion of the lens 201 outside the working area A is less than a second temperature threshold, and / or control the rotating device 300 to drive the lens 201 in the optical assembly 200 to rotate so that the portion of the lens 201 outside the working area A enters the working area A, and the second temperature threshold is less than the first temperature threshold.

[0069] Specifically, the second temperature monitoring device 520 also includes a non-contact temperature sensor, such as an infrared thermometer. This non-contact temperature sensor avoids contact with the lens 201, thus ensuring the cleanliness of the lens 201 and reducing damage to it. The second temperature monitoring device 520 monitors the temperature of the lens 201. For example, it can monitor the center position of the lens 201. When the temperature is lower than a second temperature threshold, the cooling device 400 can be stopped from cooling the lens 201 outside the working area A. Alternatively, the cooled portion of the lens 201 outside the working area A can be moved into the working area A, and the position of the lens 201 can be adjusted by rotating the rotating device 300. This ensures that the temperature of the adjusted portion of the lens 201 within the working area A is lower than the second temperature threshold, and therefore also lower than the first temperature threshold. The second temperature threshold can be determined based on the ambient temperature of the exposure equipment 10.

[0070] In another embodiment, there are multiple second temperature monitoring elements 520, which monitor the center position and the edge position of the lens 201 respectively. By monitoring the temperature of different positions of the part of the lens 201 outside the working area A, the temperature difference between the different positions is calculated. When the temperature difference is less than the second temperature difference threshold, the cooling device 400 needs to be stopped to cool the part of the lens 201 outside the working area A / or the part of the lens 201 outside the working area A needs to be moved into the working area A.

[0071] In one embodiment, see Figure 1 The exposure light source 100 is located on the side of the first surface S1 away from the second surface S2. The exposure light source 100 emits light into the working area A and transmits it through the first surface S1 and the second surface S2 of the lens in sequence.

[0072] Specifically, the first surface S1 is the inner surface of the optical component 200, the second surface S2 is the outer surface of the optical component 200, and the exposure light source 100 is located on the inner side of the optical component 200. This embodiment provides a structure in which the exposure light source 100 is disposed inside the optical component 200. This structure saves space and has a compact layout.

[0073] In one embodiment, see Figure 6 , Figure 6 This is a schematic diagram of the fourth embodiment of the exposure device of this application. The exposure device 10 also includes a first reflector 610. The first reflector 610 is located on the side of the first surface S1 away from the second surface S2. The exposure light source 100 is located on the side of the first surface S1 away from the second surface S2. The exposure light source 100 emits light towards the first reflector 610 and reflects it to the lens 201, and transmits it through the first surface S1 and the second surface S2 in sequence.

[0074] Specifically, both the first reflecting mirror 610 and the exposure light source 100 are located on the inner side of the optical assembly 200. The first reflecting mirror 610 can reflect the light emitted by the exposure light source 100 to the lens 201. Because the first reflecting mirror 610 is located on the inner side of the optical assembly 200, the exposure light source 100 can be moved out of the inner side of the optical assembly 200 due to the placement of the first reflecting mirror 610. This design is mainly to accommodate situations where the exposure light source 100 is too large to be placed inside the optical assembly 200; in such cases, the exposure light source 100 is placed on the outside, with only the smaller first reflecting mirror 610 placed inside. The first reflecting mirror 610 can be a plane mirror, a convex mirror, or a concave mirror.

[0075] Both of the above embodiments involve the light from the exposure light source 100 propagating from the inside of the optical component 200 to the outside.

[0076] In one embodiment, see Figure 7 , Figure 7 This is a schematic diagram of the fifth embodiment of the exposure device of this application. The exposure device 10 also includes a second reflector 620. The second reflector 620 is located on the side of the first surface S1 away from the second surface S2. The exposure light source 100 is located on the side of the second surface S2 away from the first surface S1. The exposure light source 100 emits light towards the working area A, which is transmitted sequentially through the second surface S2 and the first surface S1 of the lens 201, and the light is reflected by the second reflector 620.

[0077] Specifically, the exposure light source 100 is located outside the optical component 200, and the second reflector 620 is located inside the optical component 200. In this embodiment, the light emitted by the exposure light source 100 first passes through the lens 201 and is then reflected by the second reflector 620. This design takes into account that the exposure light source 100 is relatively large and cannot be placed inside the optical component 200. Instead, the light is further reflected from inside the optical component 200 by the second reflector 620. The second reflector 620 may be a plane reflector, a convex reflector, or a concave reflector.

[0078] In one embodiment, see Figure 8 , Figure 8 This is a schematic diagram of the sixth embodiment of the exposure device of this application. The exposure device 10 also includes a third reflector 630. The third reflector 630 is located on the side of the first surface S1 away from the second surface S2. The exposure light source 100 is located on the side of the second surface S2 away from the first surface S1. The exposure light source 100 emits light towards the working area A and transmits it through the second surface S2 and the first surface S1 of the lens 201 in sequence. The light is reflected by the third reflector 630 to the lens 201 and then transmits it through the first surface S1 and the second surface S2 in sequence.

[0079] Specifically, the exposure light source 100 is located outside the optical component 200, and the third reflecting mirror 630 is located inside the optical component 200. In this embodiment, the light emitted by the exposure light source 100 first passes through the lens 201, is then reflected by the third reflecting mirror 630, and finally refracts through the lens 201. This design takes into account the relatively large size of the exposure light source 100, and also utilizes the secondary refraction of the lens 201 to improve the utilization rate of the lens 201. The third reflecting mirror 630 may be a plane reflecting mirror, a convex reflecting mirror, or a concave reflecting mirror.

[0080] Combination Figure 1 , Figure 2 and Figure 9 , Figure 9 This is a flowchart illustrating one embodiment of the control method for the exposure equipment of this application. A second aspect of this application provides a control method for an exposure equipment 10, which is applied to the exposure equipment 10 as described in any of the above embodiments. The method includes:

[0081] S100: Controls the exposure light source 100 to stop emitting light to the portion of lens 201 located in working area A.

[0082] Specifically, when the temperature of the portion of lens 201 in working area A is too high and affects the exposure process, the controller controls the exposure light source 100 to stop emitting light to the portion of lens 201 in working area A, in order to avoid the problem of a decrease in the exposure process level caused by imaging problems.

[0083] S200: Drive the lens 201 in the optical assembly 200 to rotate so that the part of the lens 201 outside the working area A enters the working area A and the part of the lens 201 in the working area A enters outside the working area A.

[0084] Specifically, the rotating device 300 rotates to drive the lens 201 in the optical assembly 200 to rotate, so that the part of the lens 201 in the working area A, that is, the higher temperature part of the lens 201, moves out of the working area A, and the part of the lens 201 outside the working area A, that is, the lower temperature part of the lens 201, moves into the working area A, thereby realizing the rotational adjustment of the position of the lens 201.

[0085] S300: Controls the exposure light source 100 to emit light into the working area A, and controls the cooling device 400 to cool the portion of the lens 201 outside the working area A.

[0086] Specifically, after the above steps are adjusted, the temperature of the part in the working area A is no longer high. Therefore, the exposure light source 100 can be controlled to emit light into the working area A again to repeat the exposure process. At the same time, the cooling device 400 is turned on to cool down the high-temperature part of the lens 201 outside the working area A, so that it can be used for the next rotation.

[0087] In one embodiment, see Figure 5 The exposure apparatus 10 includes a first temperature monitoring element 510, which is electrically connected to the controller. The first temperature monitoring element 510 is used to monitor the temperature of the portion of the lens 201 located in the working area A. The method of this application further includes:

[0088] When the temperature of the portion of lens 201 in working area A is detected to be greater than the first temperature threshold, the exposure light source 100 is controlled to stop emitting light into working area A and the rotating device 300 is controlled to drive the lens 201 in the optical assembly 200 to rotate, so that the portion of lens 201 outside working area A enters working area A and the portion of lens 201 in working area A enters outside working area A.

[0089] Specifically, this embodiment further includes a first temperature monitoring device 510, which monitors the temperature of the portion of the lens 201 located in the working area A. If the temperature is higher than the first temperature threshold, the position of the lens 201 will be adjusted by rotation to prevent the portion of the lens 201 in the working area A from becoming too hot. The first temperature monitoring device 510 works in conjunction with the controller to achieve automated monitoring and control, thereby reducing manual operation costs.

[0090] In one embodiment, see further. Figure 5The exposure apparatus 10 also includes a second temperature monitoring element 520, which is electrically connected to the controller and is used to monitor the temperature of the portion of the lens 201 outside the working area A, by means of:

[0091] When the temperature of the portion of lens 201 outside working area A is detected to be lower than the second temperature threshold, the cooling device 400 is controlled to stop cooling the portion of lens 201 outside working area A and / or the rotating device 300 is controlled to rotate the lens 201 in the optical assembly 200 so that the portion of lens 201 outside working area A enters working area A, and the second temperature threshold is lower than the first temperature threshold.

[0092] Specifically, this embodiment further includes a second temperature monitoring device 520, which monitors the temperature of the portion of the lens 201 outside the working area A. As long as the temperature is below the second temperature threshold, the cooling device 400 will be stopped to reduce energy waste. The position of the lens 201 can be adjusted by rotation to prevent the portion of the lens 201 in the working area A from becoming too hot. The second temperature monitoring device 520 works in conjunction with the controller to achieve automated monitoring and control, reducing manual operation costs.

[0093] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. An exposure apparatus, characterized in that, The exposure equipment includes: An exposure light source is used to emit light onto a preset work area; An optical component includes at least one lens, the lens including a first surface and a second surface disposed opposite to each other; A rotating device is fixedly connected to the optical assembly. The rotating device is used to drive the lenses in the optical assembly to rotate simultaneously around a rotating axis, so that multiple parts of each lens enter the working area sequentially, and at least one part of the lens is in the working area, and at least another part of the lens is outside the working area, so as to use the part of the lens in the working area to refract the light emitted by the exposure light source. The rotating axis is located outside the lens, and the first surface is located between the second surface and the rotating axis. A cooling device is disposed on one side of the optical component; wherein the cooling device is used to cool the portion of the lens outside the working area; A controller is used to control the rotating device to drive the lens in the optical assembly to rotate around the rotating axis.

2. The exposure apparatus according to claim 1, characterized in that, The rotating device includes a connecting part, a rotating shaft, and a motor. The connecting part connects one end of the lens to the rotating shaft, and the motor drives the rotating shaft to rotate, thereby causing the lens to rotate around the rotating shaft. Preferably, the connecting part is a transparent connecting part.

3. The exposure apparatus according to claim 1, characterized in that, The lens has a ring structure, and the rotation axis coincides with the central axis of the lens.

4. The exposure apparatus according to claim 1, characterized in that, The lens includes a plurality of lens portions spaced apart, and the plurality of lens portions are arranged around the rotation axis; Preferably, the lens includes two lens portions, which are symmetrically arranged about the rotation axis.

5. The exposure apparatus according to claim 3 or 4, characterized in that, The first surface is concave, and the second surface is convex. Preferably, the number of lenses is multiple, and the multiple lenses are nested from the inside out.

6. The exposure apparatus according to claim 1, characterized in that, The cooling device is located on the backlight side of the optical component; Preferably, the cooling device includes an air conditioner.

7. The exposure apparatus according to claim 1, characterized in that, The exposure light source is located on the side of the first surface opposite to the second surface, and the exposure light source emits light into the working area, which is transmitted sequentially through the first surface and the second surface of the lens; or, The exposure apparatus further includes a first reflector located on the side of the first surface opposite to the second surface, and an exposure light source located on the side of the first surface opposite to the second surface. The exposure light source emits light towards the first reflector, which reflects it to the lens and then transmits it sequentially through the first surface and the second surface; or, The exposure device further includes a second reflector located on the side of the first surface away from the second surface, and the exposure light source located on the side of the second surface away from the first surface. The exposure light source emits light toward the working area, which is transmitted sequentially through the second surface and the first surface of the lens, and the light is reflected by the second reflector. or, The exposure device further includes a third reflecting mirror located on the side of the first surface away from the second surface. The exposure light source is located on the side of the second surface away from the first surface. The exposure light source emits light into the working area, which is transmitted sequentially through the second surface and the first surface of the lens. The light is also reflected by the third reflecting mirror to the lens and then transmitted sequentially through the first surface and the second surface.

8. The exposure apparatus according to claim 1, characterized in that, The exposure device also includes: A first temperature monitoring device, electrically connected to the controller, is used to monitor the temperature of the portion of the lens located in the working area; The controller is configured to: when the first temperature monitoring device detects that the temperature of the portion of the lens in the working area is greater than a first temperature threshold, control the exposure light source to stop emitting light to the lens, and control the rotating device to rotate the lens in the optical assembly so that the other parts of the lens enter the working area; Preferably, the exposure apparatus further includes: A second temperature monitoring device, electrically connected to the controller, is used to monitor the temperature of the portion of the lens outside the working area; The controller is configured to: when the second temperature monitoring device detects that the temperature of the portion of the lens outside the working area is less than a second temperature threshold, control the cooling device to stop cooling the portion of the lens outside the working area and / or control the rotating device to rotate the lens in the optical assembly so that the portion of the lens outside the working area enters the working area, and the second temperature threshold is less than the first temperature threshold.

9. A method for controlling an exposure device, characterized in that, Applied to the exposure apparatus as described in any one of claims 1 to 8, the method comprises: Control the exposure light source to stop emitting light onto the portion of the lens located in the working area; The lens in the optical assembly is rotated so that the portion of the lens outside the working area enters the working area and the portion of the lens in the working area moves out of the working area. The exposure light source is controlled to emit light into the working area, and the cooling device is controlled to cool the portion of the lens outside the working area.

10. The method according to claim 9, characterized in that, The exposure device includes a first temperature monitoring element, which is electrically connected to the controller. The first temperature monitoring element is used to monitor the temperature of the portion of the lens located in the working area. The method further includes: When the temperature of the portion of the lens in the working area is detected to be greater than a first temperature threshold, the exposure light source is controlled to stop emitting light into the working area and the rotating device is controlled to rotate the lens in the optical assembly, so that the portion of the lens outside the working area enters the working area and the portion of the lens in the working area enters the working area. Preferably, the exposure apparatus further includes a second temperature monitoring element, which is electrically connected to the controller and is used to monitor the temperature of the portion of the lens outside the working area. The method includes: When the temperature of the portion of the lens outside the working area is detected to be less than the second temperature threshold, the cooling device is controlled to stop cooling the portion of the lens outside the working area and / or the rotating device is controlled to rotate the lens in the optical assembly so that the portion of the lens outside the working area enters the working area, wherein the second temperature threshold is less than the first temperature threshold.

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