Exposure apparatus and cleaning method for exposure apparatus

Abstract

This application discloses an exposure apparatus and a cleaning method for the exposure apparatus. The exposure apparatus includes: an exposure platform with a support surface for supporting a substrate; a cleaning device including at least one air port, the cleaning device being located on one side of the support surface of the exposure platform and the air port facing the support surface of the exposure platform, the cleaning device extending along a first direction, and the cleaning device being used at least to generate a suction airflow or a purge airflow through the air port to remove particulate matter from the support surface of the exposure platform; a first driving component connected to the exposure platform; a second driving component connected to the exposure platform; and a controller for activating the cleaning device upon receiving a target command and controlling the second driving component to drive the exposure platform to move in a second direction. The design of this application can improve the substrate fabrication yield.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to an exposure device and a method for cleaning the exposure device. Background Technology

[0002] During the substrate production process, large particles may fall onto the exposure platform of the exposure equipment due to their presence on the back side of the substrate. These large particles accumulate between the exposure platform and the substrate, lifting the substrate and causing a protrusion during exposure. This protrusion affects the exposure accuracy and causes severe misalignment between film layers near the protrusion (overlapping deviation), which visually appears as a butterfly-shaped mura (display unevenness). In current technology, this problem can only be detected at a subsequent inspection station. Once the problem is discovered at the inspection station, the large batch of substrates produced between the exposure equipment and the inspection station will be abnormal, resulting in a decrease in substrate yield. Summary of the Invention

[0003] This application provides an exposure apparatus and a cleaning method for the exposure apparatus, which can improve the substrate preparation yield.

[0004] This application provides an exposure apparatus, comprising: an exposure platform having a bearing surface for supporting a substrate; a cleaning device including at least one air port, the cleaning device being located on one side of the bearing surface of the exposure platform and the air port being disposed facing the bearing surface of the exposure platform, the cleaning device extending along a first direction, the cleaning device being at least used to generate a suction airflow or a purge airflow through the air port to remove particulate matter from the bearing surface of the exposure platform; a first driving component connected to the exposure platform, the first driving component being used to drive the exposure platform to move in the first direction to adjust the relative position of the exposure platform and the cleaning device in the first direction; a second driving component connected to the exposure platform, the second driving component being used to drive the exposure platform to move in a second direction, wherein the first direction intersects the second direction, and when the cleaning device is in an open state, the second driving component drives the exposure platform to move in the second direction to clean the bearing surface of the exposure platform; and a controller being used to activate the cleaning device and control the second driving component to drive the exposure platform to move in the second direction upon receiving a target instruction.

[0005] In one embodiment, the exposure device includes a third drive component connected to the cleaning device or the exposure platform, the third drive component being used to adjust the distance between the cleaning device and the exposure platform in a third direction, wherein the third direction is a direction perpendicular to the bearing surface.

[0006] Preferably, the distance between the air vent and the exposure platform is between 5mm and 30mm.

[0007] Preferably, the exposure device includes a fourth driving component connected to the cleaning device, the fourth driving component being used to drive the cleaning device to rotate around the first direction to adjust the angle of the air inlet relative to the exposure platform.

[0008] Preferably, the air inlet generates a purge airflow, and the angle between the airflow direction of the air inlet and the bearing surface ranges from 30° to 80°.

[0009] Preferably, the air inlet generates a suction airflow, and the angle between the airflow direction of the air inlet and the bearing surface ranges from 0° to 30°.

[0010] In one embodiment, the cleaning device includes an air knife, and the air outlet surface of the air knife is provided with at least one of the air ports.

[0011] Preferably, the air inlet is elongated and extends along the first direction.

[0012] Preferably, the width of the air vent in the first direction is greater than or equal to the width of the exposure platform in the first direction.

[0013] Preferably, the width of the air outlet in the fourth direction perpendicular to the first direction on the air outlet surface is less than or equal to 0.5 mm.

[0014] Preferably, the air outlet surface of the air knife is provided with a plurality of air ports, and the plurality of air ports are arranged at intervals on the air outlet surface along a fourth direction perpendicular to the first direction.

[0015] In one embodiment, the cleaning device further includes an ultrasonic generator that generates ultrasonic waves toward the exposure platform to cause the exposure platform to vibrate; and / or, the cleaning device generates a purge airflow through the air inlet, while the exposure device further includes an adsorption element for generating a suction airflow to absorb particulate matter when the cleaning device is turned on.

[0016] In one embodiment, the cleaning device includes a plurality of air knives, including a first air knife and a second air knife arranged along the second direction, wherein the air inlets of the first air knife and the air inlets of the second air knife are arranged opposite to each other, and both the air inlets of the first air knife and the air inlets of the second air knife face the bearing surface of the exposure platform.

[0017] In one embodiment, the exposure device includes: an optical element and an exposure light source arranged sequentially on a support surface in a third direction away from the exposure platform, wherein a photomask may be disposed between the optical element and the exposure light source, and wherein the third direction is a direction perpendicular to the support surface.

[0018] Preferably, there are multiple air knives, including a third air knife and a fourth air knife spaced apart along the third direction. The third air knife is located between the photomask and the exposure platform and is fixedly connected to the optical component. The fourth air knife is located between the optical component and the exposure light source. The air inlet of the third air knife faces the bearing surface of the exposure platform, and the air inlet of the fourth air knife faces the photomask.

[0019] In one embodiment, the air outlet is an air outlet, and the cleaning device is further provided with at least one air inlet. The cleaning device generates a purging airflow through the air inlet, and the purging airflow flows from the air inlet to the air outlet.

[0020] Preferably, a filter is provided between the air inlet and the air outlet to filter the purge airflow.

[0021] Preferably, the air inlet is equipped with a flow regulating valve.

[0022] In one embodiment, the exposure device includes: a counting unit electrically connected to the controller, the counting unit being used to generate the target instruction when the accumulated time reaches a preset time and / or the accumulated number of substrates reaches a preset number; and / or, the exposure device includes: an image capturing unit, the image capturing unit being used to capture a target image of the bearing surface of the exposure platform; and an analysis unit electrically connected to the image capturing unit and the controller, the analysis unit being used to send a target instruction to the controller when it is determined that particulate matter exists on the bearing surface of the exposure platform based on the target image captured by the image capturing unit.

[0023] A second aspect of this application provides a cleaning method for an exposure apparatus, the exposure apparatus including an exposure platform, a cleaning device, a first driving component, a second driving component, and a controller. The exposure platform has a bearing surface for supporting a substrate. The cleaning device includes at least one air port, the cleaning device is located on one side of the bearing surface of the exposure platform, and the air port faces the bearing surface of the exposure platform. The cleaning device extends along a first direction. The first driving component is connected to the exposure platform. The second driving component is also connected to the exposure platform. The method includes: responding to receiving a target command, controlling the first driving component to drive the exposure platform to move along the first direction to adjust the relative position of the air port and the exposure platform in the first direction; controlling the second driving component to drive the exposure platform to move along a second direction and activating the cleaning device, thereby generating a suction airflow or a purge airflow through the air port to remove particulate matter from the bearing surface of the exposure platform, wherein the first direction intersects the second direction.

[0024] In one embodiment, the step of responding to receiving a target instruction further includes: determining that the target instruction has been received in response to the cumulative duration reaching a preset duration and / or the cumulative number of substrates reaching a preset number; and / or determining that the target instruction has been received in response to the presence of particulate matter on the bearing surface of the exposure platform in the target image, wherein the target image is obtained by photographing the bearing surface of the exposure device.

[0025] The advantages of this application, which differ from the prior art, are as follows: The exposure equipment of this application includes an exposure platform, a cleaning device, a first driving component, a second driving component, and a controller. The air port of the cleaning device is arranged facing the bearing surface of the exposure platform. The controller controls the second driving component to move in a second direction and to turn on the cleaning device, so that the suction airflow or purging airflow generated by the air port of the cleaning device removes the particulate matter on the bearing surface of the exposure platform. Therefore, there are no particulate matter on the bearing surface that affects the exposure process, thereby improving the yield of the substrate. Attached Figure Description

[0026] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein:

[0027] Figure 1 This is a schematic diagram of one embodiment of the exposure device of this application;

[0028] Figure 2 yes Figure 1 A top view of the structure of the first embodiment;

[0029] Figure 3 yes Figure 1 A top view of the second embodiment;

[0030] Figure 4 yes Figure 1 A schematic diagram of the front view structure of the first embodiment;

[0031] Figure 5 yes Figure 4 A schematic diagram of the right-side structure of one embodiment;

[0032] Figure 6 yes Figure 1 A top view of the third embodiment;

[0033] Figure 7 yes Figure 1 A schematic diagram of the main structure of the second embodiment;

[0034] Figure 8 yes Figure 1 A schematic diagram of the main structure of the third embodiment;

[0035] Figure 9 yes Figure 1 A schematic diagram of the main structure of the fourth embodiment;

[0036] Figure 10 This is a schematic flowchart of one embodiment of the cleaning method for the exposure equipment of this application;

[0037] Figure 11 This is a flowchart illustrating another embodiment of the cleaning method for the exposure equipment of this application. Detailed Implementation

[0038] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0039] See Figure 1 , Figure 2 and Figure 3 , Figure 1 This is a schematic diagram of one embodiment of the exposure device of this application. Figure 2 yes Figure 1 A top view of the structure of the first embodiment. Figure 3 yes Figure 1The second embodiment is shown in the top view. In the first aspect of this application, an exposure device 10 is provided. The exposure device 10 includes an exposure platform 100, a cleaning device 200, a first drive component 310, a second drive component 320, and a controller (not shown).

[0040] The exposure platform 100 is provided with a bearing surface S, which is used to support the substrate (not shown).

[0041] Specifically, during the normal exposure process of the exposure equipment 10, the substrate needs to be placed on the bearing surface S of the exposure platform 100 before the exposure process is performed. The solution provided in this application is to clean the exposure platform 100, so the substrate will not be placed on the bearing surface S of the exposure platform 100 at this time, thus avoiding contamination of the substrate during cleaning.

[0042] The cleaning device 200 includes at least one air port W. The cleaning device 200 is located on one side of the bearing surface S of the exposure platform 100, and the air port W is disposed facing the bearing surface S of the exposure platform 100. The cleaning device 200 extends along a first direction X. The cleaning device X is at least used to generate a suction airflow or a purging airflow through the air port W to remove particulate matter from the bearing surface S of the exposure platform 100.

[0043] Specifically, the cleaning device 200 includes at least one air port W facing the bearing surface S of the exposure platform 100. The air port W allows gas to flow through it. The air port W can provide positive pressure to blow a purge airflow onto the bearing surface S, thereby blowing away particulate matter on the bearing surface S and achieving the effect of cleaning the exposure platform 100. Alternatively, the air port W can provide negative pressure to draw a suction airflow onto the bearing surface S, thereby drawing away particulate matter on the bearing surface S and achieving the effect of cleaning the exposure platform 100. Furthermore, the cleaning device 200 extends along a first direction X and has a longer width in the first direction X, thereby increasing the cleaning area per unit time.

[0044] The first drive assembly 310 is connected to the exposure platform 100 and is used to drive the exposure platform 100 to move in the first direction X to adjust the relative position of the exposure platform 100 and the cleaning device 200 in the first direction X. The second drive assembly 320 is connected to the exposure platform 100 and is used to drive the exposure platform 100 to move in the second direction Y. The first direction X and the second direction Y intersect, and when the cleaning device 200 is in the open state, the second drive assembly 320 drives the exposure platform 100 to move in the second direction Y to clean the bearing surface S of the exposure platform 100.

[0045] Specifically, both the first driving component 310 and the second driving component 320 are connected to the exposure platform 100, enabling the exposure platform 100 to move in two different directions. Preferably, the first direction X is perpendicular to the second direction Y. The cleaning device 200 extends in the first direction X. When cleaning the exposure platform 100, the second driving component 320 drives the exposure platform 100 to move along the second direction Y, thereby creating relative movement between the cleaning device 200 and the exposure platform 100. The airflow in the air port W of the cleaning device 200 cleans the bearing surface S of the exposure platform 100. It can be understood that during cleaning, as long as the second driving component 320 drives the exposure platform 100 from one end along the second direction Y through the cleaning device 200 to the other end along the second direction Y, the cleaning of the bearing surface S in the second direction Y can be completed. The first driving component 310 is used to adjust the relative position of the cleaning device 200 and the exposure platform 100 in the first direction X to ensure that the air port W is aligned with the target area to be cleaned. Optionally, the first drive assembly 310 includes a drive motor and a linear guide rail, and the second drive assembly 320 includes a drive motor and a linear guide rail.

[0046] The controller is used to activate the cleaning device 200 and control the second drive assembly 320 to drive the exposure platform 100 to move in the second direction Y after receiving the target instruction.

[0047] Specifically, the controller is communicatively connected to the first drive component 310, the second drive component 320, and the cleaning device 200. Upon receiving a target instruction, the controller can control the second drive component 320 to drive the exposure platform 100 to move in the second direction Y, while simultaneously activating the cleaning device 200. The two work together to complete the cleaning of the exposure platform 100. The target instruction refers to a user-provided instruction to clean the exposure platform 100 or an instruction automatically issued by the exposure device 10 to clean the exposure platform 100.

[0048] The exposure apparatus 10 of this application includes an exposure platform 100, a cleaning device 200, a first drive assembly 310, a second drive assembly 320, and a controller. The air port W of the cleaning device 200 is positioned facing the bearing surface S of the exposure platform 100. The controller controls the second drive assembly 320 to move along the second direction Y and simultaneously activates the cleaning device 200. This allows the suction or purging airflow generated by the air port W of the cleaning device 200 to remove particulate matter from the bearing surface S of the exposure platform 100. Therefore, there are no particulate matter on the bearing surface S that could affect the exposure process, thereby improving the substrate yield.

[0049] In one embodiment, see Figure 1 and Figure 4 , Figure 4 yes Figure 1The first embodiment is shown in the main view structural diagram. The exposure device 10 includes a third drive component 330, which is connected to the exposure platform 100. The third drive component 330 is used to adjust the distance between the cleaning device 200 and the exposure platform 100 in the third direction Z, where the third direction Z is the direction perpendicular to the bearing surface S.

[0050] Specifically, the third drive component 330 can be used to adjust the distance between the cleaning device 200 and the exposure platform 100 in the third direction Z. This adjustment allows the cleaning effect of the cleaning device 200 on the exposure platform 100 to be optimized. It is understood that if the distance is too close, it will affect the flow path and speed of the airflow in the air inlet W, thus reducing the cleaning effect. Conversely, if the distance is too far, it will reduce the speed at which the airflow in the air inlet W reaches the bearing surface S of the exposure platform 100, also reducing the cleaning effect. Therefore, the third drive component 330 can better adjust the cleaning effect of the cleaning device 200. Optionally, the third drive component 330 includes a drive motor and a linear guide rail.

[0051] In another embodiment, the third drive component 330 is connected to the cleaning device 200. The third drive component 330 can also be used to adjust the distance between the cleaning device 200 and the exposure platform 100 in the third direction Z, where the third direction Z is the direction perpendicular to the bearing surface S.

[0052] In another embodiment, the cleaning device 200 is fixed on a bracket, and the distance between the air vent W and the exposure platform 100 is adjusted manually. This method has relatively poor adjustment accuracy, but lower cost.

[0053] Preferably, the distance d between the air vent W and the exposure platform 100 is between 5 mm and 30 mm. For example, the distance d is 5 mm, 10 mm, 15 mm, 20 mm, or 30 mm. More preferably, the distance d is between 10 mm and 15 mm.

[0054] In one embodiment, see further. Figure 4 The exposure device 10 includes a fourth drive assembly 340, which is connected to the cleaning device 200. The fourth drive assembly 340 is used to drive the cleaning device 200 to rotate around a first direction X to adjust the angle of the air port W relative to the exposure platform 100.

[0055] Specifically, the fourth drive assembly 340 can drive the cleaning device 200 to rotate clockwise around the first direction X, or it can drive the cleaning device 200 to rotate counterclockwise around the first direction X, thereby adjusting the tilt angle of the air outlet W relative to the exposure platform 100. The adjustable angle can be adjusted to achieve a better angle for better cleaning effect, so that particulate matter can be better removed. Optionally, the fourth drive assembly 340 includes a drive motor and a rotating shaft.

[0056] Preferably, the air inlet W generates a purge airflow, and the angle between the airflow direction of the air inlet W and the bearing surface S ranges from 30° to 80°. For example, the angle between the airflow direction of the air inlet W and the bearing surface S is 30°, 60°, or 80°, etc.

[0057] Preferably, the air inlet W generates a suction airflow, and the angle between the airflow direction of the air inlet W and the bearing surface S ranges from 0° to 30°. For example, the angle between the airflow direction of the air inlet W and the bearing surface S can be 0°, 10°, or 30°.

[0058] It is evident that different angles should be set when the airflow generated by the air inlet W varies in order to achieve the best cleaning effect.

[0059] In one embodiment, combined with Figure 4 and Figure 5 , Figure 5 yes Figure 4 A schematic diagram of the right side of one embodiment shows that the cleaning device 200 includes an air knife 2000, and the air outlet surface M of the air knife 2000 is provided with at least one air port W.

[0060] Specifically, the air knife 2000 is elongated and extends along the first direction X. The air knife 2000 has at least one air port W set on the air outlet surface M. Since the area occupied by the air port W on the air outlet surface M is small, the airflow velocity blown out by the air port W can be larger, thereby improving the cleaning effect of the air knife 2000 on the bearing surface S of the exposure platform 100.

[0061] For a better option, see [link / reference] Figure 5 The air inlet W is elongated and extends along the first direction X. The extension direction of the opening of the air inlet W is the same as the extension direction of the cleaning device 200, thus ensuring the uniformity of the airflow blown out by the air inlet W.

[0062] Preferably, the width of the air vent W in the first direction X is greater than or equal to the width of the exposure platform 100 in the first direction X. This design ensures that the air vent W can completely cover the area of ​​the exposure platform 100 in the first direction X, so that when cleaning the bearing surface S of the exposure platform 100, the entire bearing surface S of the exposure platform 100 can be cleaned by moving once in the second direction Y.

[0063] Better, combined Figure 4 and Figure 5 The width of the air outlet W on the air outlet surface M in the fourth direction V, perpendicular to the first direction X, is less than or equal to 0.5 mm.

[0064] Specifically, the air outlet M is located on the plane formed by the first direction X and the fourth direction V. The air inlet W extends along the first direction X and has a certain width in the fourth direction V, which is perpendicular to the first direction X. This width should not be too large, otherwise the airflow speed will be reduced, affecting the cleaning effect. Generally, this width is 0.5mm, 0.25mm, 0.1mm, or 0.05mm, etc.

[0065] In one embodiment, the air knife 2000 has a plurality of air ports W on its air outlet surface M, which are spaced apart along a fourth direction V perpendicular to the first direction X. By using the spaced-apart air ports W, the number of times the bearing surface S of the exposure platform 100 is cleaned is increased, thereby improving the cleaning effect of the exposure platform 100.

[0066] It should be noted that this application does not impose specific restrictions on the specific shape, number, or arrangement of the air inlets W in the air knife 2000. The above embodiments are merely preferred technical solutions.

[0067] Of course, in some other embodiments, in addition to the air knife design described above, the cleaning device 200 can also be other blowing mechanisms, and this application does not impose any specific limitations.

[0068] In one embodiment, the cleaning device 200 further includes an ultrasonic generator (not shown) that generates ultrasonic waves toward the exposure platform 100 to cause the exposure platform 100 to vibrate.

[0069] Specifically, the ultrasonic generator can emit high-frequency sound waves, which causes the bearing surface S of the exposure platform 100 to vibrate slightly. The particles on the bearing surface S will also be vibrated at the same time. The ultrasonic waves will reduce the adhesion of the particles on the bearing surface S, making it easier for the particles to separate from the bearing surface S. Thus, the particles can be easily removed by the airflow in the air port W.

[0070] In one embodiment, see Figure 6 , Figure 6 yes Figure 1 The top view of the third embodiment shows that the cleaning device 200 generates a purge airflow through the air port W, and the exposure device 10 also includes an adsorption member 400, which is used to generate a suction airflow so that when the cleaning device 200 is turned on, the adsorption member 400 is used to absorb particulate matter.

[0071] Specifically, the cleaning device 200 generates a purge airflow through the air outlet W and purges along the second direction Y. Considering that the particulate matter is easily stirred up when it is purged, there is still a possibility of secondary contamination of the exposure platform 100. By setting an adsorption element 400 in front of the purge airflow from the air outlet W and on the outer side of the end of the exposure platform 100, the adsorption element 400 can remove the blown-up particulate matter by sucking up the airflow in front, thereby ensuring the cleanliness of the exposure equipment 10.

[0072] Of course, in some other embodiments, an adsorption component may not be provided, but a dust-adhesive component may be provided. The cleaning device 200 blows away the particulate matter, and then the dust-adhesive component picks up and removes the particulate matter.

[0073] In one embodiment, see Figure 7 , Figure 7 yes Figure 1 The second embodiment is shown in the main view of the structure. The cleaning device 200 includes a plurality of air knives 2000. The plurality of air knives 2000 include a first air knife 2001 and a second air knife 2002 arranged along the second direction Y. The air outlets W of the first air knife 2001 and the second air knife 2002 are arranged opposite to each other, and the air outlets W of the first air knife 2001 and the second air knife 2002 are both facing the bearing surface S of the exposure platform 100.

[0074] Specifically, the first air knife 2001 and the second air knife 2002 are arranged along the second direction Y and are positioned opposite each other. Both air outlets W face the bearing surface S of the exposure platform 100, but the directions of the air outlets W are opposite. That is, in this design of the cleaning device 200, the first air knife 2001 and the second air knife 2002 can be activated simultaneously to clean the cleaning device 200. The first air knife 2001 and the second air knife 2002 provide completely opposite blowing directions, which is beneficial for blowing away particles with different attachment forms. Alternatively, the first air knife 2001 can be activated and the second air knife 2002 closed once along the positive direction of the second direction Y, and then the second air knife 2002 can be activated and the first air knife 2001 closed once along the negative direction of the second direction Y, achieving two cleaning operations in different directions on the entire bearing surface S. Alternatively, one can choose to activate the first air knife 2001 and deactivate the second air knife 2002 in the positive direction of the second direction Y for one cleaning cycle, and then activate the first air knife 2001 and deactivate the second air knife 2002 in the positive direction of the second direction Y for another cleaning cycle. The cleaning device 200 can perform cleaning work directly regardless of which side of the exposure equipment 10 it is located on, avoiding the need to reset the exposure platform 100 and the cleaning device 200 before cleaning each time. This can reduce the movement time of the exposure platform 100, thereby providing more time for exposure preparation.

[0075] In one embodiment, see Figure 8 , Figure 8 yes Figure 1 The third embodiment is shown in the main view structural diagram. The exposure device 10 includes an optical element 500 and an exposure light source 600, which are located on the side of the bearing surface S away from the exposure platform 100 in the third direction Z. A photomask 700 can be disposed between the optical element 500 and the exposure light source 600. The third direction Z is the direction perpendicular to the bearing surface S.

[0076] Specifically, the exposure light source 600 is the light source required in the exposure process, the photomask 700 is used to pattern and block the light from the exposure light source 600, and the optical component 500 is used to scale the size of the light pattern transmitted through the photomask 700, thereby meeting the patterned film requirements of the substrate.

[0077] In one embodiment, see further. Figure 8 There are multiple air knives 2000, including a third air knife 2003 and a fourth air knife 2004 spaced apart along the third direction Z. The third air knife 2003 is located between the photomask 700 and the exposure platform 100 and is fixedly connected to the optical component 500. The fourth air knife 2004 is located between the optical component 500 and the exposure light source 600. The air outlet W of the third air knife 2003 faces the bearing surface S of the exposure platform 100, and the air outlet W of the fourth air knife 2004 faces the photomask 700.

[0078] Specifically, considering that particulate matter can easily accumulate on the photomask 700 during long-term use, and that once the particulate matter accumulates on the photomask 700, it can easily affect the patterned pattern therein, thereby affecting the substrate fabrication, this application uses a third air knife 2003 to clean the bearing surface S of the exposure platform 100 and a fourth air knife 2004 to clean the photomask 700, so that both can be cleaned simultaneously, which can save a lot of time.

[0079] In one embodiment, see Figure 1 The air outlet W is the air outlet (not shown in the figure). The cleaning device 200 is also provided with at least one air inlet (not shown in the figure). The cleaning device 200 generates a purging airflow through the air inlet, and the purging airflow flows from the air inlet to the air outlet.

[0080] Specifically, the air inlets ensure the supply of gas to the cleaning device 200. Preferably, multiple air inlets are arranged at intervals along the first direction X, which ensures that the gas at the outlet is relatively uniform, and the degree of uniformity is positively correlated with the number of air inlets.

[0081] Preferably, a filter is also provided between the air inlet and the air outlet to filter the purge airflow. The filter can filter the gas entering from the air inlet to prevent the presence of particulate matter in the gas entering from the air inlet from reducing the cleaning effect of the cleaning device 200. The filter can be a filter element.

[0082] Preferably, the air inlet is equipped with a flow regulating valve. The flow regulating valve can be used to control the flow rate of the gas entering from the air inlet, and facilitates the control of the flow rate of the purge gas blown out from the air inlet W.

[0083] In one embodiment, see Figure 1 The exposure device 10 includes a counting unit (not shown), which is electrically connected to the controller. The counting unit is used to generate a target instruction when the cumulative duration reaches a preset duration and / or the cumulative number of substrates reaches a preset number.

[0084] Specifically, the counting unit can be a timer used to time the exposure process in the exposure equipment 10. When the accumulated time reaches a preset time, a target instruction is generated. The controller, according to the target instruction, controls the second drive component 320 to drive the exposure platform 100 to move and controls the cleaning device 200 to start, that is, to clean the bearing surface S of the exposure equipment 10 at regular intervals. This has a better cleaning effect on the accumulation of particulate matter caused by long-term exposure. Alternatively, the counting unit can be a counter used to count the cumulative number of substrates in the exposure process in the exposure equipment 10. When the cumulative number of substrates reaches a preset number, a target instruction is generated. The controller, according to the target instruction, controls the second drive component 320 to drive the exposure platform 100 to move and controls the cleaning device 200 to start, that is, to clean the bearing surface S of the exposure equipment 10 quantitatively. This has a better cleaning effect on the accumulation of particulate matter caused by the exchange of a large number of substrates. Either of the above two solutions can be implemented, or a combination of both can be implemented.

[0085] In one embodiment, see Figure 9 , Figure 9 yes Figure 1 The fourth embodiment is shown in the front view structural diagram. The exposure device 10 includes an image capturing unit 800 and an analysis unit 900. The image capturing unit 800 is used to capture a target image of the bearing surface S of the exposure platform 100. The analysis unit 900 is electrically connected to the image capturing unit 800 and the controller. The analysis unit 900 is used to send a target command to the controller when it is determined that there are particulate matter on the bearing surface S of the exposure platform 100 based on the target image captured by the image capturing unit 800.

[0086] Specifically, the image capturing unit 800 can capture a target image of the bearing surface S of the exposure platform 100 before the cleaning device 200 cleans it, or it can capture a target image of the bearing surface S of the exposure platform 100 after the cleaning device 200 cleans it. Alternatively, it can capture multiple images of the bearing surface S during the cleaning process and stitch them together to obtain the target image. The analysis unit 900 analyzes the target image, specifically by comparing it with a reference image of the bearing surface S. Based on the comparison results, if the difference between the two is greater than a preset range (i.e., particulate matter exceeds the standard), it indicates that the bearing surface S needs cleaning, and a target command is sent to the controller. If the difference is less than or equal to the preset range (i.e., particulate matter does not exceed the standard), it indicates that the bearing surface S does not need cleaning, and no target command is sent to the controller. As can be seen from the above, capturing a target image before cleaning confirms whether cleaning is necessary, and capturing a target image after cleaning confirms whether cleaning is complete. If cleaning is incomplete, further cleaning is required until it is complete. Of course, you can also set up alarms to notify the user if multiple cleaning attempts fail to achieve the desired cleaning results.

[0087] See Figure 1 and Figure 10 , Figure 10 This is a schematic flowchart illustrating one embodiment of the cleaning method for the exposure equipment of this application. A second aspect of this application provides a cleaning method for an exposure equipment 10. The exposure equipment 10 includes an exposure platform 100, a cleaning device 200, a first driving component 310, a second driving component 320, and a controller. The exposure platform 100 has a bearing surface S for supporting a substrate. The cleaning device 200 includes at least one air port W, is located on one side of the bearing surface S of the exposure platform 100, and the air port W faces the bearing surface S of the exposure platform 100. The cleaning device 200 extends along a first direction X. The first driving component 310 is connected to the exposure platform 100. The second driving component 320 is connected to the exposure platform 100.

[0088] Specifically, the structural configuration of the exposure device 10 described above can be found in the embodiments described above, and will not be repeated here.

[0089] The method of this application includes:

[0090] S100: In response to receiving the target instruction, control the first drive component 310 to drive the exposure platform 100 to move along the first direction X, so as to adjust the relative position of the air port W and the exposure platform 100 in the first direction X.

[0091] Specifically, the method in this application is executed by the main controller in the exposure device 10, and the target instruction refers to the user-provided instruction to clean the exposure platform 100 or the instruction automatically issued by the exposure device 10 to clean the exposure platform 100. After receiving the target instruction, it is necessary to first adjust the relative position of the air port W and the exposure platform 100 in the first direction X to ensure that the air port W is facing the target area of ​​the bearing surface S of the exposure platform 100. In this step, it should be noted that controlling the first drive component 310 to drive the exposure platform 100 to move along the first direction X does not necessarily require displacement. If the air port W is not facing the target area of ​​the bearing surface S of the exposure platform 100, it is necessary to control the first drive component 310 to drive the exposure platform 100 to move along the first direction X. If the air port W is already facing the target area of ​​the bearing surface S of the exposure platform 100, it is necessary to control the first drive component 310 to drive the exposure platform 100 to move along the first direction X with a displacement of 0.

[0092] S200: Control the second drive component 320 to drive the exposure platform 100 to move along the second direction Y and turn on the cleaning device 200, thereby generating a suction airflow or a purge airflow through the air port W to remove particulate matter on the bearing surface S of the exposure platform 100, wherein the first direction X intersects the second direction Y.

[0093] Specifically, the controller activates the cleaning device 200, causing the air outlet W to generate a negative pressure suction airflow or a positive pressure purge airflow towards the bearing surface S. Simultaneously, the controller controls the second drive assembly 320 to drive the exposure platform 100 to move along the second direction Y. This application cleans the bearing surface S of the exposure platform 100 using airflow, removing particulate matter from the bearing surface S and avoiding physical scratches. The suction airflow draws particulate matter directly from the bearing surface S into the cleaning device 200 through the air outlet W, while the purge airflow blows the particulate matter away directly. Different air outlet types can be selected for different particulate matter conditions.

[0094] In one embodiment, the step S100 above, in response to receiving the target instruction, further includes:

[0095] When the cumulative duration reaches the preset duration, it is determined that the target instruction has been received.

[0096] Specifically, over time, some particles may accumulate on the bearing surface S of the exposure platform 100. If not cleaned in time, these particles may accumulate and cause severe local protrusions on the substrate, ultimately affecting the substrate manufacturing process. When the accumulated time reaches a preset time, a counting unit can generate a target instruction, and then a controller can control the cleaning of the bearing surface S of the exposure platform 100. The counting unit includes a timer.

[0097] In another embodiment, the step of responding to receiving the target instruction in step S100 above further includes:

[0098] In response to the cumulative number of substrates reaching a preset number, it is determined that a target instruction has been received.

[0099] Specifically, after exchanging multiple substrates, some particulate matter may remain on the bearing surface S of the exposure platform 100. If not cleaned in time, it may accumulate, causing severe local protrusions on subsequent substrates and ultimately affecting the substrate manufacturing process. When the cumulative number of substrates reaches a preset number, a target instruction can be generated by a counting unit, and then a controller can control the cleaning of the bearing surface S of the exposure platform 100. The counting unit includes a counter.

[0100] In another embodiment, the step of responding to receiving the target instruction in step S100 above further includes:

[0101] In response to the presence of particulate matter on the bearing surface of the exposure platform in the target image, it is determined that a target instruction has been received, wherein the target image is obtained by photographing the bearing surface of the exposure device.

[0102] Specifically, in some cases, occasional particulate matter may accumulate on the bearing surface S of the exposure platform 100. In such cases, the image capturing unit can capture a target image of the bearing surface S, and the analysis unit can analyze whether the particulate matter on the bearing surface S exceeds the standard. Specifically, this can be done by comparing the image with a reference image of the bearing surface S. If the comparison result does not exceed a preset range, cleaning is unnecessary; if the comparison result exceeds the preset range, cleaning is required. After cleaning, the image capturing unit can be used again to capture images of the bearing surface S of the exposure platform 100, and the analysis unit can analyze whether the particulate matter on the bearing surface S exceeds the standard. Cleaning continues until the standard is met. Furthermore, a threshold can be set for the number of cleaning cycles. When the number of cleaning cycles exceeds the threshold within a short period, an alarm should be triggered to indicate that the particulate matter is difficult to remove.

[0103] The above three implementation methods can be implemented by any one of them, or multiple of them can be combined together.

[0104] In one embodiment, combined with Figure 7 and Figure 11 , Figure 11This is a schematic flowchart illustrating another embodiment of the cleaning method for the exposure equipment of this application. The cleaning device 200 includes a first air knife 2001 and a second air knife 2002 arranged along a second direction Y. The air inlets W of the first air knife 2001 and the second air knife 2002 are arranged opposite to each other, and both the air inlets W of the first air knife 2001 and the second air knife 2002 face the bearing surface S of the exposure platform 100. The above structure can be referred to in the same embodiments described above, and will not be repeated here.

[0105] The method of this application includes:

[0106] S110: In response to receiving the target instruction, control the first drive component 310 to drive the exposure platform 100 to move along the first direction X, so as to adjust the relative position of the air port W and the exposure platform 100 in the first direction X.

[0107] Specifically, this step is the same as step S100 above and will not be repeated here.

[0108] S210: Control the second drive component 320 to drive the exposure platform 100 to move along the second direction Y and open the first air knife 2001 and / or the second air knife 2002 of the cleaning device 200, so that the air blown out by the air port W blows away the particulate matter on the bearing surface S of the exposure platform 100, thereby cleaning the bearing surface S of the exposure platform 100.

[0109] Specifically, this step can have several options. When controlling the second drive component 320 to drive the exposure platform 100 to move along the second direction Y, only one of the first air knife 2001 and the second air knife 2002 can be activated. For example, the first air knife 2001 can be activated to clean the bearing surface S, and the second air knife 2002 can be activated to clean the bearing surface S next time. Since the air inlets W of the first air knife 2001 and the second air knife 2002 are set opposite to each other, the two movement directions are exactly opposite, thus avoiding the need for the exposure platform 100 to reset after each cleaning of the bearing surface S. Alternatively, the first air knife 2001 and the second air knife 2002 can be activated simultaneously, so that air coming out from both sides can improve the removal effect of particles on the bearing surface S. Alternatively, the platform can first move along the positive direction of the second direction Y, in which case only the first air knife 2001 is activated, and after cleaning, it can then move along the negative direction of the second direction Y, in which case only the second air knife 2002 is activated, thus achieving two cleanings of the bearing surface S.

[0110] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. An exposure apparatus, characterized in that, The exposure equipment includes: An exposure platform is provided with a support surface, which is used to support a substrate; A cleaning device includes at least one air inlet, the cleaning device is located on one side of the bearing surface of the exposure platform and the air inlet is disposed toward the bearing surface of the exposure platform, the cleaning device extends along a first direction, and the cleaning device is at least used to generate a suction airflow or a purge airflow through the air inlet to remove particulate matter from the bearing surface of the exposure platform. A first driving component is connected to the exposure platform. The first driving component is used to drive the exposure platform to move in the first direction to adjust the relative position of the exposure platform and the cleaning device in the first direction. A second driving component is connected to the exposure platform. The second driving component is used to drive the exposure platform to move in a second direction, wherein the first direction intersects the second direction, and when the cleaning device is in the open state, the second driving component drives the exposure platform to move in the second direction to clean the bearing surface of the exposure platform. The controller is used to activate the cleaning device upon receiving a target instruction and to control the second drive component to drive the exposure platform to move in the second direction.

2. The exposure apparatus according to claim 1, characterized in that, The exposure equipment includes: A third drive component is connected to the cleaning device or the exposure platform. The third drive component is used to adjust the distance between the cleaning device and the exposure platform in a third direction, wherein the third direction is a direction perpendicular to the bearing surface. Preferably, the distance between the air vent and the exposure platform is between 5mm and 30mm; Preferably, the exposure device includes a fourth driving component connected to the cleaning device, the fourth driving component being used to drive the cleaning device to rotate around the first direction to adjust the angle of the air inlet relative to the exposure platform; Preferably, the air inlet generates a purge airflow, and the angle between the airflow direction of the air inlet and the bearing surface ranges from 30° to 80°. Preferably, the air inlet generates a suction airflow, and the angle between the airflow direction of the air inlet and the bearing surface ranges from 0° to 30°.

3. The exposure apparatus according to claim 1, characterized in that, The cleaning device includes an air knife, and the air outlet surface of the air knife is provided with at least one of the air ports; Preferably, the air inlet is elongated and extends along the first direction; Preferably, the width of the air vent in the first direction is greater than or equal to the width of the exposure platform in the first direction; Preferably, the width of the air outlet in the fourth direction perpendicular to the first direction on the air outlet surface is less than or equal to 0.5 mm; Preferably, the air outlet surface of the air knife is provided with a plurality of air ports, and the plurality of air ports are arranged at intervals on the air outlet surface along a fourth direction perpendicular to the first direction.

4. The exposure apparatus according to claim 3, characterized in that, The cleaning device further includes an ultrasonic generator that generates ultrasonic waves toward the exposure platform to cause the exposure platform to vibrate; and / or The cleaning device generates a purge airflow through the air inlet, while the exposure equipment also includes an adsorption element for generating a suction airflow to absorb particulate matter when the cleaning device is turned on.

5. The exposure apparatus according to claim 3, characterized in that, The cleaning device includes a plurality of air knives, including a first air knife and a second air knife arranged along the second direction. The air inlets of the first air knife and the second air knife are arranged opposite to each other, and the air inlets of the first air knife and the second air knife both face the bearing surface of the exposure platform.

6. The exposure apparatus according to claim 3, characterized in that, The exposure equipment includes: An optical component and an exposure light source are sequentially positioned on the side of the bearing surface away from the exposure platform in a third direction. A photomask may be disposed between the optical component and the exposure light source. The third direction is a direction perpendicular to the bearing surface. Preferably, there are multiple air knives, including a third air knife and a fourth air knife spaced apart along the third direction. The third air knife is located between the photomask and the exposure platform and is fixedly connected to the optical component. The fourth air knife is located between the optical component and the exposure light source. The air inlet of the third air knife faces the bearing surface of the exposure platform, and the air inlet of the fourth air knife faces the photomask.

7. The exposure apparatus according to claim 1, characterized in that, The air outlet is an air outlet, and the cleaning device is also provided with at least one air inlet. The cleaning device generates a purge airflow through the air inlet, and the purge airflow flows from the air inlet to the air outlet. Preferably, a filter is provided between the air inlet and the air outlet for filtering the purge airflow; Preferably, the air inlet is equipped with a flow regulating valve.

8. The exposure apparatus according to claim 1, characterized in that, The exposure equipment includes: A counting unit, electrically connected to the controller, is used to generate the target instruction when the accumulated time reaches a preset time and / or the accumulated number of substrates reaches a preset number. And / or, The exposure equipment includes: An image capturing unit is used to capture a target image of the bearing surface of the exposure platform; The analysis unit is electrically connected to the image capturing unit and the controller. The analysis unit is used to send a target command to the controller when it is determined that there are particulate matter on the bearing surface of the exposure platform based on the target image captured by the image capturing unit.

9. A method for cleaning an exposure device, characterized in that, The exposure equipment includes an exposure platform, a cleaning device, a first driving component, a second driving component, and a controller. The exposure platform is provided with a bearing surface for supporting a substrate. The cleaning device includes at least one air port, the cleaning device is located on one side of the bearing surface of the exposure platform and the air port faces the bearing surface of the exposure platform, and the cleaning device extends along a first direction; The first driving component is connected to the exposure platform; The second driving component is connected to the exposure platform, and the method includes: In response to receiving a target instruction, the first driving component is controlled to drive the exposure platform to move along the first direction, so as to adjust the relative position of the air inlet and the exposure platform in the first direction; The second drive component is controlled to drive the exposure platform to move along the second direction and to activate the cleaning device, thereby generating a suction airflow or a purge airflow through the air port to remove particulate matter from the bearing surface of the exposure platform, wherein the first direction intersects the second direction.

10. The method according to claim 9, characterized in that, The step of responding to receiving the target instruction further includes: In response to the cumulative duration reaching a preset duration and / or the cumulative number of substrates reaching a preset number, it is determined that the target instruction has been received; and / or, In response to the presence of particulate matter on the bearing surface of the exposure platform in the target image, it is determined that the target instruction has been received, wherein the target image is obtained by photographing the bearing surface of the exposure device.

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