Exposure apparatus and component

Abstract

The present disclosure provides an exposure apparatus and an element, which includes a liquid immersion chamber, a liquid circulation flow channel assembly, a liquid inlet pipe and at least one liquid outlet pipe. The liquid immersion chamber includes a housing including a connected objective lens opening and a substrate opening, and the liquid circulation flow channel assembly is disposed in an internal cavity, which divides the internal cavity into a first flow region, a second flow region and a circulation flow region between the first flow region and the second flow region. The circulation flow region corresponds to the liquid circulation flow channel assembly and is configured to allow the exposure liquid in the first flow region and the second flow region to flow into each other. The circulation flow region limits at least one liquid flow channel, and the first flow region is close to the substrate opening, and the second flow region is close to the objective lens opening. In the exposure apparatus, the liquid circulation flow channel assembly can reduce the flow speed of the exposure liquid containing impurities and extend the flow path, thereby improving the problem of reducing the exposure effect due to the pollution of the optical element of the exposure apparatus by impurities.

Description

Technical Field

[0001] This disclosure relates to the field of display technology, and more specifically, to an exposure apparatus and element. Background Technology

[0002] In the manufacturing of display panels, such as Organic Light-Emitting Diode (OLED) display panels, photolithography is one of the key technologies, especially the exposure step, which determines the accuracy and quality of pattern transfer. Through the exposure process, the fine patterns on the photomask can be accurately copied onto a substrate coated with photoresist, providing an accurate mask for subsequent etching, coating, and other processes. This enables the precise fabrication of key structures such as OLED pixel electrodes and thin-film transistors (TFTs), which is crucial for improving the resolution, aperture ratio, and display performance of the display panel.

[0003] Immersion lithography is an evolution of traditional lithography techniques. During the photolithography process, a high-refractive-index liquid (the exposure solution) is placed between the optical system of the exposure equipment and the photoresist. According to optical principles, light wavelengths shorten when propagating through a high-refractive-index medium. This shortened wavelength means smaller lithographic feature sizes can be achieved, enabling the fabrication of finer circuit patterns, thus meeting the high-resolution requirements of OLED display panels.

[0004] However, during immersion exposure, impurities may be generated on the substrate to be exposed, and these impurities may enter the surrounding exposure solution, thereby affecting the exposure effect. Summary of the Invention

[0005] This disclosure provides an exposure apparatus and element, the exposure apparatus including a liquid immersion chamber, a liquid circulation channel assembly, an inlet pipe, and at least one outlet pipe. The liquid immersion chamber includes a housing having an internal cavity for containing exposure liquid and a substrate to be exposed. The housing includes a communicating objective lens port and a substrate port. The objective lens port is used to mount a projection objective lens, and the substrate port is configured to allow the substrate to be exposed to be placed into the internal cavity, whereby the substrate is immersed in the exposure liquid when the internal cavity contains exposure liquid. The liquid circulation channel assembly is disposed within the internal cavity, dividing the internal cavity into a first flow zone, a second flow zone, and a circulating flow zone located between the first and second flow zones. The circulating flow zone corresponds to the liquid circulation channel assembly and is configured to allow the exposure liquid in the first and second flow zones to flow into each other. The circulating flow zone defines at least one liquid channel. The first flow zone is adjacent to the substrate port, and the second flow zone is adjacent to the objective lens port. The inlet pipe is disposed on the outer wall of the housing and communicates with the internal cavity of the housing for introducing exposure liquid into the internal cavity. At least one drain pipe is provided on the outer wall of the housing and communicates with the internal cavity of the housing, for discharging the exposure liquid in the internal cavity to the outside of the internal cavity.

[0006] In the above scheme, during the use of the exposure equipment, after impurities are generated on the substrate to be exposed corresponding to the substrate port and enter the corresponding first flow zone, they need to pass through the liquid flow channel in the circulation flow zone before entering the second flow zone. During this process, the liquid flow channel corresponding to the circulation flow zone increases the flow path of impurities from the first flow zone to the projection lens corresponding to the objective lens port, thereby allowing more impurities to be discharged from the drain pipe, reducing the impurity content, and thus improving the problem of the exposure effect being affected by impurities contaminating the projection lens.

[0007] In one specific embodiment of the first aspect of this disclosure, the liquid circulation channel assembly includes at least two channel plates, wherein one end of the channel plate is connected to the inner wall of the housing, and the other end of the channel plate is suspended in the internal cavity to form a channel opening. The sides of adjacent channel plates connected to the inner wall of the housing are respectively located on different sides of the inner wall of the housing, and the orthographic projections of different channel plates on the plane of the housing overlap.

[0008] In the above scheme, the liquid flow channel in the circulating flow channel is formed by using a flow channel plate, which facilitates processing and reduces the cost of exposure equipment.

[0009] Optionally, the flow channel plate is a non-refractive transparent component. Thus, when the exposure equipment is in use, exposure light shines onto the flow channel plate, for example, perpendicularly. Because the flow channel plate is a non-refractive transparent component, the exposure light will not be refracted at the interface of the flow channel plate, thereby avoiding the influence of the flow channel plate on the distribution of exposure light and improving the stability of the exposure effect of the exposure equipment.

[0010] Optionally, the flow channel plate is a transparent flat plate.

[0011] Optionally, the minimum distance between adjacent flow channel plates is greater than a preset value, where the preset value is the coherence length of the exposure light corresponding to the exposure device. Thus, by limiting the distance between adjacent flow channel plates to be greater than the coherence length of the exposure light, diffraction of light passing through adjacent flow channel plates is avoided, thereby improving the uniformity of the exposure light distribution during use and enhancing the performance stability of the exposure device.

[0012] Optionally, the number of flow channel plates is greater than or equal to 2 and less than or equal to 6.

[0013] Optionally, adjacent flow channel plates form a liquid flow channel, and the liquid circulation flow channel assembly includes at least two liquid flow channels, with adjacent liquid flow channels interconnected and non-linear. This forms a non-linear overall liquid flow channel, limiting the exposure liquid to flow along a non-linear path in the circulation zone. This allows more impurities to be discharged through the drain pipe, reducing the impact of impurities on the optical system of the exposure equipment and improving the exposure effect of the exposure equipment.

[0014] In one specific embodiment of the first aspect of this disclosure, the flow channel plates are arranged parallel to each other.

[0015] Optionally, the flow channel plate is arranged parallel to the plane of the housing.

[0016] Optionally, the angle between the flow channel plate and the plane containing the housing is an acute angle.

[0017] In one specific embodiment of the first aspect of this disclosure, the distance between adjacent flow channel plates decreases in the direction from the substrate aperture to the objective lens aperture. This further effectively prevents diffraction of exposure light as it passes between adjacent flow channel plates.

[0018] In one specific embodiment of the first aspect of this disclosure, the distance between adjacent flow channel plates is equal. This facilitates the assembly of the flow channel plates and saves production costs.

[0019] In one specific embodiment of the first aspect of this disclosure, adjacent flow channel plates are arranged at an angle relative to each other, and the included angle between them is an acute angle.

[0020] In the above scheme, the relative volume of the circulating flow zone in the immersion chamber is increased, which can further extend the flow path of the exposure liquid and extend the time for the exposure liquid containing impurities to reach the objective lens opening corresponding to the projection lens, so that more impurities are discharged within this time, effectively improving the exposure effect.

[0021] Optionally, in two adjacent flow channel plates, one flow channel plate is arranged parallel to the plane where the shell is located, and the other flow channel plate is arranged at an angle to the plane where the shell is located, and the angle between the two is an acute angle.

[0022] Optionally, two adjacent flow channel plates are respectively inclined to the plane where the shell is located, and the inclination angle formed between the flow channel plate and the plane where the shell is located is an acute angle.

[0023] In one specific embodiment of the first aspect of this disclosure, the flow path of the exposure liquid in the internal cavity of the housing from the substrate port to the objective lens port is a first flow path, and adjacent flow channel plates form a liquid flow channel, the width of which gradually decreases along the direction of the first flow path.

[0024] In the above scheme, the width of the liquid channel decreases along the flow path of the exposure liquid, which helps to reduce the content of impurities in the exposure liquid, thereby effectively improving the exposure effect.

[0025] In one specific embodiment of the first aspect of this disclosure, the liquid inlet pipe is close to the objective lens port, and the liquid outlet pipe is close to the substrate port.

[0026] In the above scheme, the design of the inlet pipe and outlet pipe helps to increase the flow path of the exposure liquid in the internal cavity of the shell, thereby reducing impurities in the exposure liquid reaching the second flow zone and thus improving the exposure effect.

[0027] Optionally, the drain pipe includes a filter chamber and a drain cavity. The filter chamber is connected to the internal cavity of the housing, one end of the drain cavity is connected to the filter chamber, and the other end is connected to the atmosphere. The volume of the filter chamber decreases from the housing towards the drain cavity. This prevents impurities from clogging the drain pipe and improves the user experience of the exposure equipment.

[0028] Optionally, the drain pipe also includes a filter device disposed between the filter chamber and the drain chamber.

[0029] Optionally, the filtration chamber and the drainage chamber can be detachably connected.

[0030] In one specific embodiment of the first aspect of this disclosure, a drain pipe is provided, the inlet pipe is provided corresponding to the second flow zone, and the drain pipe is provided corresponding to the first flow zone. Thus, by placing the drain pipe in the first flow zone where impurities enter the exposure solution, the generated impurities can be promptly discharged into the immersion chamber, thereby reducing the impact of impurities on the optical system in the exposure equipment.

[0031] In one specific embodiment of the first aspect of this disclosure, a drain pipe is provided, the inlet pipe is provided corresponding to the second flow zone, and the drain pipe is provided corresponding to the circulation flow zone. Thus, by providing a drain pipe in the circulation flow zone and adjusting its position according to the arrangement of the flow channel plate in the circulation flow zone, the impurity content in the exposure solution can be effectively reduced, thereby improving the exposure effect.

[0032] Optionally, the drain pipe and the inlet pipe are located on opposite sides of the outer wall of the housing. In this way, the inlet and drain pipes are diagonally distributed, which can effectively extend the flow path of the exposure liquid.

[0033] In one specific embodiment of the first aspect of this disclosure, multiple drain pipes are provided, with an inlet pipe corresponding to the second flow zone, at least one drain pipe corresponding to the first flow zone, and at least one drain pipe corresponding to the circulation flow zone. Thus, by providing multiple drain pipes, the impurity content in the exposure solution can be reduced promptly and effectively.

[0034] In one specific embodiment of the first aspect of this disclosure, multiple drain pipes are provided, with an inlet pipe corresponding to the second flow zone, at least one drain pipe corresponding to the first flow zone, and at least one drain pipe corresponding to the second flow zone. Thus, providing drain pipes in the second flow zone can provide some protection for the projection lens located near the second flow zone, reducing the risk of impurities contaminating the projection lens and improving exposure performance.

[0035] In one specific embodiment of the first aspect of this disclosure, multiple drain pipes are provided, an inlet pipe is provided corresponding to a second flow zone, at least one drain pipe is provided corresponding to a first flow zone, at least one drain pipe is provided corresponding to a circulation flow zone, and at least one drain pipe is provided corresponding to a second flow zone.

[0036] In one specific embodiment of the first aspect of this disclosure, multiple drain pipes are provided, the inlet pipe is provided corresponding to the second flow zone, and the drain pipe is provided corresponding to the circulation flow zone.

[0037] In one specific embodiment of the first aspect of this disclosure, multiple drain pipes are provided, and at least one drain pipe is provided corresponding to the second flow zone and the other corresponding to the circulation flow zone.

[0038] Optionally, multiple drain pipes are located on different sides of the housing opposite to the inlet pipe.

[0039] Optionally, the inlet pipe and part of the outlet pipe are located on the same side of the shell, and the outlet pipe corresponding to the second flow zone is located on a different side of the shell from the inlet pipe.

[0040] In one specific embodiment of the first aspect of this disclosure, the exposure apparatus further includes an impurity adsorption layer that covers at least a portion of the inner sidewall of the housing.

[0041] Optionally, the impurity adsorption layer covers the inner sidewall of the shell corresponding to the first flow zone and the circulating flow zone.

[0042] Optionally, the housing includes at least two detachably connected sub-housings, and at least one of the sub-housings has an impurity adsorption layer on its inner sidewall.

[0043] Optionally, the shell includes a first sub-shell and a second sub-shell, the first sub-shell corresponding to the first flow region and the circulating flow region, and the second sub-shell corresponding to the second flow region. Attached Figure Description

[0044] Figure 1 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0045] Figure 2 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0046] Figure 3 This is a partial structural schematic diagram of another exposure device provided in an embodiment of the present disclosure.

[0047] Figure 4 This is a partial structural schematic diagram of another exposure device provided in an embodiment of the present disclosure.

[0048] Figure 5This is a partial structural schematic diagram of an exposure device provided in another embodiment of the present disclosure.

[0049] Figure 6 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0050] Figure 7 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0051] Figure 8 This is a partial structural schematic diagram of an exposure device provided in another embodiment of the present disclosure.

[0052] Figure 9 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0053] Figure 10 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0054] Figure 11 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0055] Figure 12 This is a schematic diagram of the structure of the drain pipe of an exposure device provided in one embodiment of the present disclosure.

[0056] Figure 13 This is a schematic diagram of the structure of the drain pipe of an exposure device provided in one embodiment of the present disclosure.

[0057] Figure 14 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0058] Figure 15 This is a partial structural schematic diagram of an exposure device provided in one embodiment of the present disclosure.

[0059] Explanation of reference numerals in the attached figures:

[0060] 1-Exposure equipment; 10-Immersion chamber; 11-Housing; 11a-First sub-housing; 11b-Second sub-housing; S1-Internal cavity; 12-Objective lens port; 13-Substrate port; 20-Liquid circulation channel assembly; A1-First flow zone; A2-Second flow zone; A3-Circulation flow zone; 21-Flow channel plate; 21a-First flow channel plate; 21b-Second flow channel plate; 21c-Third flow channel plate; 21d-Fourth flow channel plate; B1-Flow channel port; L1-First distance; L2-Second distance; L3-Third distance; α-First included angle; β-Second included angle; γ-Third included angle; δ-Fourth included angle; θ-Fifth included angle; 22-Liquid flow channel; C1-First flow path; 30-Inlet pipe; 40-Outlet pipe; 41-Filter chamber; 42-Outlet chamber; 43-Filter device; 50-Impurity adsorption layer. Detailed Implementation

[0061] The technical solutions in the embodiments of this specification will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this specification, and not all embodiments. Based on the embodiments in this specification, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this specification.

[0062] During immersion exposure, the substrate to be exposed is in the exposure solution, and impurities generated on the substrate will enter the exposure solution and affect the exposure effect.

[0063] For example, during exposure, exposure light, such as ultraviolet light, passes through a photomask and illuminates the photoresist layer formed by the photoresist coated on the substrate to be exposed. Photoresist is a light-sensitive material; under light of a specific wavelength, the photosensitizer within it undergoes a photochemical reaction. For instance, in the case of positive photoresist, the exposed portion decomposes, causing a change in the photoresist's chemical structure, transforming it from insoluble or poorly soluble to soluble. During this process, the change in the photosensitizer's molecular structure may produce small decomposition products, which enter the surrounding exposure solution as impurities.

[0064] For example, during the exposure process, ultraviolet light irradiation may cause localized temperature increases in the photoresist on the substrate to be exposed, generating a thermal effect. This may lead to thermal decomposition or thermal denaturation of some components in the photoresist, resulting in substances that differ from normal photochemical reaction products. These sites, caused by the thermal effect, also become impurities that enter the surrounding exposure solution.

[0065] Impurities entering the exposure solution can have multiple effects, impacting the exposure results. Firstly, impurities may affect the optical properties of the exposure solution. For example, impurities can alter the solution's composition, potentially changing its refractive index. This change affects the light propagation characteristics within the solution, causing wavelength variations that no longer meet expectations, thus reducing the resolution of the photolithography and the accuracy of pattern transfer. Secondly, impurities in the exposure solution can increase light absorption and scattering, leading to energy loss during exposure and uneven light intensity reaching the substrate. This uneven light intensity can result in jagged or uneven edges on the developed photoresist pattern, affecting its quality and precision.

[0066] On the other hand, impurities may contaminate the optical system. For example, impurities that enter the exposure solution may adhere to optical components such as lenses in the exposure equipment as the solution flows. These impurity particles scatter and absorb light, reducing the light transmittance and imaging quality of the optical components. Over time, this will gradually degrade the quality of the exposed pattern, reduce the overlay accuracy, and affect the production yield of OLED display panels.

[0067] In addition, impurities may increase the difficulty of cleaning exposure equipment, for example, by increasing the number of cleaning cycles or complicating the cleaning process.

[0068] In view of this, the present disclosure provides an exposure apparatus and component to at least solve the above-mentioned technical problems. The exposure apparatus includes a liquid immersion chamber, a liquid circulation channel assembly, an inlet pipe, and at least one outlet pipe. The liquid immersion chamber includes a housing having an internal cavity for containing exposure liquid and a substrate to be exposed. The housing includes a communicating objective lens port and a substrate port. The objective lens port is used to mount a projection objective lens, and the substrate port is configured to allow the substrate to be exposed to be placed into the internal cavity. When the internal cavity contains exposure liquid, the substrate to be exposed is immersed in the exposure liquid. The liquid circulation channel assembly is disposed in the internal cavity, dividing the internal cavity into a first flow zone, a second flow zone, and a circulating flow zone located between the first and second flow zones. The circulating flow zone corresponds to the liquid circulation channel assembly and is configured to allow the exposure liquid in the first and second flow zones to flow into each other. The circulating flow zone limits at least one liquid channel. The first flow zone is adjacent to the substrate port, and the second flow zone is adjacent to the objective lens port. An inlet pipe is located on the outer wall of the housing and communicates with the internal cavity of the housing, for introducing the exposure solution into the internal cavity. At least one outlet pipe is located on the outer wall of the housing and communicates with the internal cavity of the housing, for discharging the exposure solution in the internal cavity out of the internal cavity.

[0069] Thus, by placing the liquid circulation channel assembly inside the immersion chamber, the exposure liquid in the first flow zone must pass through the liquid channel of the circulation flow zone before entering the second flow zone. Therefore, after impurities generated on the substrate to be exposed near the first flow zone enter the exposure liquid in the first flow zone, the path of the exposure liquid containing impurities from its source to the second flow zone corresponding to the objective lens port is extended, delaying the movement time of the impurities. During the extended time period, more exposure liquid containing impurities can be discharged from the immersion chamber through the drain pipe, i.e., more impurities are discharged, thereby reducing the impurity content at the optical element corresponding to the objective lens port, and thus improving the problem of impurities contaminating the optical element and affecting the exposure effect.

[0070] The structure of the exposure apparatus 1 according to at least one embodiment of the present disclosure will now be described in detail with reference to the accompanying drawings.

[0071] In at least one embodiment of this disclosure, such as Figure 1 and Figure 2 As shown, the exposure device 1 includes a liquid immersion chamber 10, a liquid circulation channel assembly 20, a liquid inlet pipe 30, and at least one liquid outlet pipe 40.

[0072] The main function of the immersion chamber 10 is to create a stable liquid environment between the projection lens and the substrate to be exposed during the photolithography process. By filling the immersion chamber 10 with an exposure solution with a refractive index higher than air, such as deionized water, the effective numerical aperture of the projection lens, which performs the projection function, can be increased, thereby improving the exposure resolution without replacing it with a shorter wavelength light source.

[0073] Specifically, the liquid immersion chamber 10 includes a housing 11, which has an internal cavity S1 for containing the exposure liquid and the substrate to be exposed. The housing 11 includes a communicating objective lens port 12 and a substrate port 13. The objective lens port 12 is configured to allow exposure light to enter the internal cavity S1 of the housing 11, and the substrate port 13 is configured to allow the substrate to be exposed to be placed into the internal cavity S1. When the internal cavity S1 contains the exposure liquid, the substrate to be exposed is immersed in the exposure liquid.

[0074] For example, the immersion chamber 10 also includes a device for fixing and supporting the projection lens and the substrate to be exposed, as well as a liquid circulation and control system. The device for fixing and supporting the projection lens and the substrate to be exposed fixes the projection lens and the substrate to be exposed at the corresponding lens opening 12 and substrate opening 13, ultimately forming a sealed cavity with the housing 11 to prevent leakage of the exposure liquid. At the same time, the housing 11 is also capable of withstanding certain pressure and temperature changes to ensure the stability of the exposure liquid environment during the exposure process. In addition, the housing 11 must also ensure good optical transmittance so as not to affect the propagation of the exposure light.

[0075] For example, the shell 11 of the liquid immersion chamber 10 is a quartz glass shell 11, which is rectangular or cubic in shape, or other irregular shapes, such as irregular shapes with arc-shaped structures at both ends of the shell 11.

[0076] A liquid circulation channel assembly 20 is disposed in the internal cavity S1 of the housing 11, dividing the internal cavity S1 into a first flow zone A1, a second flow zone A2, and a circulation flow zone A3 located between the first flow zone A1 and the second flow zone A2. The circulation flow zone A3 corresponds to the liquid circulation channel assembly 20 and is configured to allow the exposure liquid in the first flow zone A1 and the second flow zone A2 to flow between each other. The circulation flow zone A3 limits at least one liquid flow channel 22. The first flow zone A1 is close to the substrate opening 13, and the second flow zone A2 is close to the objective lens opening 12. The exposure liquid in the first flow zone A1 and the second flow zone A2 must pass through the liquid flow channel 22 in the circulation flow zone A3 to flow between each other.

[0077] The liquid inlet pipe 30 is disposed on the outer wall of the housing 11 and communicates with the internal cavity S1 of the housing 11, and is used to introduce the exposure liquid into the internal cavity S1.

[0078] For example, the exposure apparatus 1 also includes a liquid supply system. The inlet pipe 30 is connected to the pipeline of the liquid supply system to introduce the exposure solution stored in the liquid supply system, such as deionized water located in the storage tank of the liquid supply system, into the immersion chamber 10, i.e., the internal cavity S1 of the housing 11. The liquid supply system may also include a pump and a filter. The pump can draw deionized water from the storage tank and pump it into the immersion chamber 10, and the filter can filter the deionized water pumped into the immersion chamber 10 to remove any possible small particles and impurities, thereby avoiding the adverse effects of impurities in the deionized water on the exposure effect.

[0079] At least one drain pipe 40 is disposed on the outer wall of the housing 11 and communicates with the internal cavity S1 of the housing 11, for discharging the exposure liquid in the internal cavity S1 to the outside of the internal cavity S1.

[0080] For example, the drain pipe 40 is connected to a liquid collection system to collect the deionized water that participates in the exposure process.

[0081] For example, the drain pipe 40 can use the action of the exposure liquid to drain the exposure liquid from the immersion chamber 10, i.e., the internal cavity S1 of the housing 11.

[0082] For example, the drain pipe 40 can also use a pump to drain the exposure liquid from the immersion chamber 10, i.e., the internal cavity S1 of the housing 11. Specifically, the power of the pump used is determined by the amount of exposure liquid to be drained.

[0083] For example, the exposure device 1 can also be equipped with a circulation system. This system can collect the exposure solution from the collection system, filter and purify it, and then return it to the storage tank of the liquid supply system for use in the next exposure. This not only improves the utilization rate of the exposure solution and reduces waste, but also helps maintain the purity and stability of the exposure solution.

[0084] During the exposure process, the substrate to be exposed is placed at the substrate port 13, and an optical element, such as a projection lens, is correspondingly positioned at the objective port 12. The exposure light passes through the projection lens and enters the exposure liquid in the immersion chamber 10, eventually distributing onto the optical adhesive layer of the substrate to be exposed. During the exposure process, impurities may be generated on the substrate to be exposed. These impurities enter the surrounding exposure liquid and move with it in the internal cavity S1 of the immersion chamber 10. If the impurities need to enter the second flow zone A2 near the objective port 12, they must pass through the circulation flow zone A3 between the second flow zone A2 and the first flow zone A1. The circulation of the exposure liquid containing impurities in the liquid circulation channel assembly 20 can be understood as a non-linear flow, such as a curved flow. This increases the movement path of the impurities. Furthermore, the walls of the liquid circulation channel assembly 20 provide resistance to the exposure liquid containing impurities, which also reduces the movement rate of the impurities. As a result, more exposure liquid containing impurities is discharged through the drain pipe, thereby reducing the impurity content reaching the optical element corresponding to the objective port 12 and improving the exposure effect.

[0085] It should be noted that the exposure device 1 in this embodiment is not limited to the above examples. For example, the liquid circulation channel assembly 20 may have other structural components, such as transparent injection molded parts; for example, the number of channel plates 21 and the spacing between adjacent channel plates 21 may be designed according to actual needs. All of these can be designed according to actual needs and will not be elaborated here.

[0086] Based on the above embodiments, the following is a detailed description of the design scheme of the liquid circulation channel assembly 20 in the exposure equipment 1.

[0087] In at least one embodiment of this disclosure, the liquid circulation channel assembly 20 includes at least two channel plates 21, wherein one end of the channel plate 21 is connected to the inner sidewall of the housing 11, and the other end of the channel plate 21 is suspended in the internal cavity S1 to form a channel opening B1. The sides of adjacent channel plates 21 connected to the inner sidewall of the housing 11 are respectively located on different sides of the inner sidewall of the housing 11, and the orthographic projections of different channel plates 21 on the plane where the housing 11 is located overlap.

[0088] For example, such as Figure 1As shown, in this exposure apparatus 1, the liquid circulation channel assembly 20 includes two channel plates 21, namely a first channel plate 21a and a second channel plate 21b. One end of the first channel plate 21a is connected to the inner wall of the housing 11, and the other end of the first channel plate 21a extends to the opposite side of the inner wall of the housing 11, with the other end of the first channel plate 21a suspended in the internal cavity S1 of the immersion chamber 10. One end of the second channel plate 21b is connected to the inner wall of the housing 11, and the second channel plate 21b... The other end extends to the opposite side of the inner wall of the housing 11 at the connection point, and the other end of the second flow channel plate 21b is suspended in the internal cavity S1 of the liquid immersion chamber 10. The first flow channel plate 21a and the second flow channel plate 21b partially overlap in the internal cavity S1 of the liquid immersion chamber 10. The overlapping area forms a flow channel, which constitutes a circulating flow zone A3 that allows the exposure liquid of the first flow zone A1 to flow through into the second flow zone A2, and also allows the exposure liquid of the second flow zone A2 to flow through into the first flow zone A1.

[0089] For example, such as Figure 2As shown, in the exposure apparatus 1, the liquid circulation channel assembly 20 includes four channel plates 21, namely the first channel plate 21a, the second channel plate 21b, the third channel plate 21c, and the fourth channel plate 21d. The first channel plate 21a, the second channel plate 21b, the third channel plate 21c, and the fourth channel plate 21d are sequentially and spaced apart in the internal cavity S1 of the liquid immersion chamber 10 in the direction from the substrate port 13 to the objective lens port 12. Adjacent channel plates 21 are staggered, that is, each of the adjacent channel plates 21 is connected to the opposite side of the inner wall of the liquid immersion chamber 10. Multiple channel plates 21 form multiple channels to constitute a circulation flow zone A3. Specifically, the first flow channel 21a and the second flow channel 21b form a first flow channel. The distance between the extension of the first flow channel 21a and the inner wall of the internal cavity S1 serves as a flow channel opening B1 to allow the exposure liquid to flow. The second flow channel 21b and the third flow channel 21c form a second flow channel. The distance between the extension of the second flow channel 21b and the inner wall of the internal cavity S1 serves as a flow channel opening B1, making the second flow channel and the first flow channel a connected flow channel. The third flow channel 21c and the fourth flow channel 21d form a third flow channel. The distance between the extension of the third flow channel 21c and the inner wall of the internal cavity S1 serves as a flow channel opening B1, making the third flow channel and the second flow channel a connected flow channel. The distance between the extension of the third flow channel 21c and the inner wall of the internal cavity S1 serves as a flow channel opening B1, making the third flow channel connected to the second flow zone A2. Thus, the flow path of the exposure liquid from the first flow zone A1 to the second flow zone A2 needs to pass through multiple channels, which extends the flow path of the exposure liquid. Furthermore, the first flow channel plate 21a, the second flow channel plate 21b, the third flow channel plate 21c, and the fourth flow channel plate 21d will block the exposure liquid, thereby reducing the flow rate of the exposure liquid. This effectively extends the flow time of the exposure liquid, increases the amount of exposure liquid discharged per unit time, removes more impurities, and improves the exposure effect.

[0090] The present invention does not limit the size of the flow channel plate 21. The dimensions of different flow channel plates 21, such as length, width and thickness, may be equal or unequal. This can be designed according to actual needs, and will not be elaborated here.

[0091] In at least one embodiment of this disclosure, the flow channel plate 21 is a non-refractive transparent component. In at least one embodiment of this disclosure, the flow channel plate 21 is a transparent planar plate. When the exposure apparatus 1 is in use, the exposure light is incident, for example, perpendicularly into the immersion chamber 10 filled with the exposure liquid. When the exposure light passes through the flow channel plate 21, it will not be refracted, thereby avoiding increasing the influence of the flow channel plate 21 on the uniformity of the exposure light distribution of the exposure apparatus 1, and improving the exposure effect and exposure stability.

[0092] In at least one embodiment of this disclosure, the minimum distance between adjacent flow channel plates 21 is greater than a preset value, which is the coherence length of the exposure light corresponding to the exposure device 1. The coherence length refers to the maximum distance at which light can maintain its coherence characteristics during propagation. When the minimum distance between adjacent flow channel plates 21, i.e., the optical path difference, exceeds the coherence length, the phase difference between the two beams of light passing through the two adjacent flow channel plates 21 becomes unstable, the visibility of the interference fringes decreases significantly, and stable alternating bright and dark interference fringes cannot be formed; in fact, the interference phenomenon may not even be observed. Therefore, setting the minimum distance between adjacent flow channel plates 21 to be greater than the coherence length of the exposure light can reduce the adverse effects of the increased flow channel plates 21 on the exposure light distribution of the exposure device 1.

[0093] In at least one embodiment of this disclosure, the number of flow channel plates 21 is greater than or equal to 2 and less than or equal to 6.

[0094] In at least one embodiment of this disclosure, such as Figure 2 As shown, adjacent flow channel plates 21 form a liquid flow channel 22. The liquid circulation flow channel assembly 20 includes at least two liquid flow channels 22, and adjacent liquid flow channels 22 are interconnected and non-linear. When three or more flow channel plates 21 are provided, at least two liquid flow channels 22 are formed, and multiple liquid flow channels 22 are connected to form a non-linear total flow channel. The exposure liquid needs to pass through the non-linear total flow channel to flow into the first flow zone A1 or the second flow zone A2, thereby effectively extending the path of impurities to reach the objective lens opening 12 corresponding to the projection objective lens, allowing more impurities to be discharged from the immersion chamber 10, and effectively improving the adverse effects of impurities on the exposure effect.

[0095] For example, the liquid circulation channel assembly 20 in the immersion chamber 10 of the exposure apparatus 1 includes any number of channel plates 21, such as two, three, four, five, or six. The number of channel plates 21 can be varied according to actual needs, such as the size of the internal cavity S1 of the immersion chamber 10. Where conditions permit, providing more channel plates 21 can facilitate the removal of more impurities, effectively mitigating the problem of impurities contaminating optical elements, such as projection lenses, and affecting the exposure effect.

[0096] Based on the above embodiments, this disclosure also designs the tilt angle between the flow channel plates 21 and the tilt angle between the flow channel plates 21 and the plane where the housing 11 is located, and the specific scheme is as follows.

[0097] In one embodiment of this disclosure, such as Figure 1 and Figure 2 As shown, in this exposure device 1, multiple flow channel plates 21 are arranged parallel to each other in the internal cavity S1 of the housing 11 of the liquid immersion chamber 10.

[0098] In at least one embodiment of this disclosure, such as Figure 1 and Figure 2 As shown, the flow channel plate 21 is arranged parallel to the shell 11 in the plane.

[0099] In at least one embodiment of this disclosure, the flow channel plate 21 is inclined relative to the plane on which the housing 11 is located.

[0100] In at least one embodiment of this disclosure, such as Figure 3 As shown, the angle between the plane containing the flow channel plate 21 and the shell 11 is an acute angle.

[0101] For example, taking the liquid circulation channel assembly 20 of the exposure device 1, which includes two channel plates 21, namely a first channel plate 21a and a second channel plate 21b, as an example, the first channel plate 21a and the second channel plate 21b are respectively disposed in the internal cavity S1 of the liquid immersion chamber 10. The first channel plate 21a and the second channel plate 21b are parallel to each other, and the first channel plate 21a and the second channel plate 21b respectively form an equal first included angle α with the plane where the housing 11 is located, and the first included angle α is an acute angle. Specifically, the first included angle α is equal to any one of 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, and 85°.

[0102] Based on the above embodiments, in addition to the flow channel plates 21 being arranged in parallel with each other, the spacing between the multiple flow channel plates 21 was also designed, and the specific scheme is as follows.

[0103] In one embodiment of this disclosure, the distance between adjacent flow channel plates 21 decreases from the substrate port 13 to the objective lens port 12.

[0104] For example, such as Figure 4 As shown, in this exposure apparatus 1, the liquid circulation channel assembly 20 includes a first channel plate 21a, a second channel plate 21b, a third channel plate 21c, and a fourth channel plate 21d. The first channel plate 21a, the second channel plate 21b, the third channel plate 21c, and the fourth channel plate 21d are arranged sequentially at intervals in the direction from the substrate port 13 to the objective lens port 12, and the spacing between adjacent channel plates 21 decreases. Specifically, the first distance L1 from the first channel plate 21a to the second channel plate 21b is greater than the second distance L2 from the second channel plate 21b to the third channel plate 21c, and the second distance L2 from the second channel plate 21b to the third channel plate 21c is greater than the third distance L3 from the third channel plate 21c to the fourth channel plate 21d; that is, the first distance L1 is greater than the second distance L2, and the second distance L2 is greater than the third distance L3.

[0105] In another embodiment of this disclosure, the distance between adjacent flow channel plates 21 is equal.

[0106] For example, such as Figure 5 As shown, in this exposure apparatus 1, the liquid circulation channel assembly 20 includes a first channel plate 21a, a second channel plate 21b, a third channel plate 21c, and a fourth channel plate 21d. The first channel plate 21a, the second channel plate 21b, the third channel plate 21c, and the fourth channel plate 21d are arranged sequentially at intervals in the direction from the substrate opening 13 to the objective lens opening 12, and the spacing between adjacent channel plates 21 is equal. Specifically, the first distance L1 from the first channel plate 21a to the second channel plate 21b is equal to the second distance L2 from the second channel plate 21b to the third channel plate 21c, and also equal to the third distance L3 from the third channel plate 21c to the fourth channel plate 21d; that is, the first distance L1 equals the second distance L2 equals the third distance L3.

[0107] Besides the design scheme in which the flow channel plates 21 are parallel to each other, the flow channel plates 21 in the exposure device 1 can also be configured in other ways, as detailed below.

[0108] In another embodiment of this disclosure, adjacent flow channel plates 21 are arranged at an angle relative to each other, and the included angle between them is an acute angle.

[0109] There are various specific implementation methods for the relative tilting of adjacent flow channel plates 21, and the specific design schemes are as follows.

[0110] For example, in at least one embodiment of this disclosure, in two adjacent flow channel plates 21, one flow channel plate 21 is arranged parallel to the plane where the housing 11 is located, and the other flow channel plate 21 is arranged at an angle to the plane where the housing 11 is located, and the angle of inclination formed between the two is an acute angle.

[0111] like Figure 6 As shown, in this exposure apparatus 1, the liquid circulation channel assembly 20 located in the internal cavity S1 of the housing 11 of the immersion chamber 10 includes a first channel plate 21a and a second channel plate 21b. The first channel plate 21a, near the substrate opening 13, is arranged parallel to the plane of the housing 11 of the exposure apparatus 1. The second channel plate 21b, near the objective lens opening 12, is arranged at an angle to the plane of the housing 11 of the exposure apparatus 1, forming a second included angle β. The second included angle β is an acute angle, for example, the second included angle β is equal to any one of 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, and 85°. At this time, since the first channel plate 21a is arranged parallel to the plane of the housing 11, the included angle between the second channel plate 21b and the first channel plate 21a is equal to the second included angle β.

[0112] For example, in at least one embodiment of this disclosure, two adjacent flow channel plates 21 are respectively inclined to the plane where the housing 11 is located, and the inclination angle formed between the flow channel plate 21 and the plane where the housing 11 is located is an acute angle.

[0113] like Figure 7 As shown, in the exposure apparatus 1, the liquid circulation channel assembly 20 located in the internal cavity S1 of the housing 11 of the liquid immersion chamber 10 includes a first channel plate 21a and a second channel plate 21b arranged at intervals and in an alternating manner. The first channel plate 21a and the plane containing the housing 11 are inclined to form a third included angle γ. The second channel plate 21b is inclined to the plane containing the housing 11 of the exposure apparatus 1 to form a fourth included angle δ. The first channel plate 21a and the second channel plate 21b are inclined relative to each other to form a fifth included angle θ. The third included angle γ, the fourth included angle δ, and the fifth included angle θ are all acute angles. For example, the third included angle γ, the fourth included angle δ, and the fifth included angle θ are all equal to any one of 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, and 85°, respectively.

[0114] It should be noted that the angle values ​​of any two of the third included angle γ, the fourth included angle δ, and the fifth included angle θ can be equal or unequal. This can be designed according to actual needs, and will not be elaborated here.

[0115] In at least one embodiment of this disclosure, the flow path of the exposure liquid in the internal cavity S1 of the housing 11 from the substrate port 13 to the objective lens port 12 is a first flow path C1. Adjacent flow channel plates 21 form a liquid flow channel 22, the width of which gradually decreases along the direction of the first flow path C1. Thus, as the exposure liquid containing impurities flows through the narrowing liquid flow channel 22, the pressure and velocity gradients of the exposure liquid containing impurities change due to the influence of the liquid flow channel 22. This increases the collision frequency between impurities and between impurities and the flow channel plates 21, reducing the flow velocity of the impurities and facilitating the removal of more impurities. Simultaneously, the change in pressure and velocity gradients also exerts an additional force on the impurities, pushing them against the corresponding inner wall of the housing 11. This allows the impurities to be adsorbed by other structures on the corresponding inner wall, such as the impurity adsorption layer 50, thereby reducing the impurity content in the exposure liquid. Alternatively, the impurities can be discharged by the corresponding drain pipe 40 on the inner wall of the housing 11, further reducing the impurity content in the exposure liquid and effectively improving the exposure effect.

[0116] For example, such as Figure 8As shown, in this exposure apparatus 1, a plurality of flow channel plates 21, such as three (a first flow channel plate 21a, a second flow channel plate 21b, and a third flow channel plate 21c), are disposed in the internal cavity S1 of the immersion chamber 10. The three flow channel plates 21 are spaced apart and staggered in the direction from the substrate opening 13 to the objective lens opening 12. A liquid flow channel 22 is formed between adjacent flow channel plates 21, such as the first flow channel plate 21a and the second flow channel plate 21b, and the second flow channel plate 21b and the third flow channel plate 21c, allowing the exposure liquid to pass through. The different liquid flow channels 22 are identical to each other. In the direction of the first flow path C1 of the exposure liquid from the substrate opening 13 to the objective lens opening 12, the width of the liquid flow channel 22 gradually decreases.

[0117] It should be noted that the exposure apparatus 1 in this embodiment includes not only the exposure liquid flow path in the direction of the first flow path C1, but also the exposure liquid flow path opposite to the first flow path C1, that is, the exposure liquid flow path from the objective lens port 12 to the substrate port 13.

[0118] Based on the above embodiments, and in addition to limiting the liquid circulation channel assembly 20 in the exposure device 1, this disclosure also limits the relative positions and number of the liquid inlet pipe 30 and the liquid outlet pipe 40 in the exposure device 1.

[0119] Based on the above embodiments, in one embodiment of this disclosure, such as Figure 2 As shown, the inlet pipe 30 is close to the objective lens port 12, and the outlet pipe 40 is close to the substrate port 13. This design of the inlet pipe 30 and outlet pipe 40 allows the outlet pipe 40 to be closer to the area where the exposure liquid generates impurities, thus enabling timely and effective removal of impurities. Furthermore, the relatively large distance between the inlet pipe 30 and outlet pipe 40 increases the flow path of the exposure liquid within the internal cavity S1 of the immersion chamber 10, extending the flow time of the exposure liquid containing impurities. This facilitates the removal of more impurities before they contaminate the projection objective lens at the objective lens port 12, effectively mitigating the problem of impurities contaminating optical elements such as the projection objective lens corresponding to the objective lens port 12 and affecting the exposure effect.

[0120] In at least one embodiment of this disclosure, reference continues to be made to Figure 2 It is known that there is one drain pipe 40, which corresponds to the first flow zone A1, and the inlet pipe 30 corresponds to the second flow zone A2. Thus, since impurities on the substrate to be exposed directly enter the first flow zone A1, and the drain pipe 40 is directly positioned in the first flow zone A1, the drain pipe 40 can promptly discharge the generated impurities, reducing the amount of impurities that enter the second flow zone A2 through the circulation flow zone A3. This reduces the amount of impurities that may contaminate the projection lens, thereby improving the exposure effect.

[0121] In at least one embodiment of this disclosure, such as Figure 3 As shown, a drain pipe 40 is provided, corresponding to the circulation flow zone A3, and the inlet pipe 30 corresponds to the second flow zone A2. Thus, after the exposure solution containing impurities passes through the circulation flow zone A3, the flow rate of the exposure solution containing impurities decreases due to the obstruction effect of the flow channel plate 21. This allows more impurities to be discharged through the drain pipe 40, thereby improving the problem of impurities affecting the exposure effect.

[0122] In at least one embodiment of this disclosure, such as Figure 3 As shown, the drain pipe 40 and the inlet pipe 30 are located on different sides of the outer wall of the housing 11.

[0123] This disclosure does not specifically describe the design scheme where the drain pipe 40 and the inlet pipe 30 are located on different sides relative to the housing 11. Other schemes are also possible. For example, based on the design where the drain pipe 40 corresponds to the first flow region A1 and the inlet pipe 30 corresponds to the second flow region A2, the drain pipe 40 and the inlet pipe 30 can also be designed to be located on opposite sides of the housing 11. For example, the inlet pipe 30 is not limited to one unit, nor is it limited to one unit corresponding to the second flow region A2. All of these can be adjusted according to specific needs and will not be elaborated upon here.

[0124] In addition to describing in detail the design scheme of setting a liquid inlet pipe 30 in the exposure device 1, this disclosure also describes the design scheme of setting a liquid outlet pipe 40, as follows.

[0125] For example, in one embodiment of this disclosure, such as Figure 4 As shown, the exposure device 1 has multiple drain pipes 40, for example, three. On the outer wall of the housing 11 of the immersion chamber 10, the inlet pipe 30 is set to correspond to the second flow zone A2, at least one drain pipe 40, for example, one drain pipe 40 is set to correspond to the first flow zone A1, and at least one drain pipe 40, for example, two drain pipes 40 are set to correspond to the circulation flow zone A3.

[0126] For example, in one embodiment of this disclosure, multiple drain pipes 40 are provided, an inlet pipe 30 is provided corresponding to the second flow zone A2, at least one drain pipe 40 is provided corresponding to the first flow zone A1, and at least one drain pipe 40 is provided corresponding to the second flow zone A2.

[0127] For example, such as Figure 5 As shown, in this exposure device 1, there is one liquid inlet pipe 30, which is located on the outer wall of the housing 11 corresponding to the second flow zone A2. There are two liquid outlet pipes 40, one of which is located on the outer wall of the housing 11 and corresponds to the first flow zone A1, and the other of which is located on the outer wall of the housing 11 and corresponds to the second flow zone A2.

[0128] For example, such as Figure 8 As shown, in this exposure device 1, there is one liquid inlet pipe 30, which is positioned on the outer wall of the housing 11 corresponding to the second flow zone A2. There are three liquid outlet pipes 40: one is positioned on the outer wall of the housing 11 corresponding to the first flow zone A1, one is positioned on the outer wall of the housing 11 corresponding to the second flow zone A2, and the remaining one is positioned on the outer wall of the housing 11 corresponding to the circulation flow zone A3 between the first flow zone A1 and the second flow zone A2.

[0129] For example, such as Figure 9 As shown, in this exposure device 1, there is one liquid inlet pipe 30, which is located on the outer wall of the housing 11 corresponding to the second flow zone A2. There are four liquid outlet pipes 40: one is located on the outer wall of the housing 11 corresponding to the first flow zone A1, one is located on the outer wall of the housing 11 corresponding to the second flow zone A2, and the remaining two are located on the outer wall of the housing 11 corresponding to the circulation flow zone A3 between the first flow zone A1 and the second flow zone A2.

[0130] Continue to refer to Figure 9 It is known that the drain pipe 40 located in the circulating flow zone A3 is set on the side where the liquid flow channel 22 formed between adjacent flow channel plates 21 on the first flow path C1 narrows. This makes it more convenient for the immersion liquid containing impurities in the liquid flow channel 22 to be discharged from the corresponding drain pipe.

[0131] For example, in at least one embodiment of this disclosure, multiple drain pipes 40 are provided, the inlet pipe 30 is provided corresponding to the second flow zone A2, and the drain pipe 40 is provided corresponding to the circulation flow zone A3.

[0132] For example, such as Figure 10 As shown, in this exposure apparatus 1, there is one liquid inlet pipe 30, which is positioned on the outer wall of the housing 11 corresponding to the second flow zone A2. There are two liquid outlet pipes 40, which are respectively positioned on the outer wall of the housing 11 and correspond to different liquid channels 22 in the circulating flow zone A3 between the first flow zone A1 and the second flow zone A2. For example, continuing to refer to... Figure 10 It can be seen that the two drain pipes 40 corresponding to the circulating flow zone A3 are located on different sides of the shell 11.

[0133] In one embodiment of this disclosure, multiple drain pipes 40 are provided, and at least one drain pipe 40 is provided corresponding to the second flow zone A2 and the circulation flow zone A3 is provided.

[0134] For example, such as Figure 11As shown, in this exposure device 1, there is one liquid inlet pipe 30, which is located on the outer wall of the housing 11 corresponding to the second flow zone A2. There are three liquid outlet pipes 40. Specifically, two liquid outlet pipes 40 are located on the outer wall of the housing 11 and corresponding to the circulation flow zone A3, and the remaining liquid outlet pipe 40 is located on the outer wall of the housing 11 and corresponding to the second flow zone A2.

[0135] In at least one embodiment of this invention, such as Figure 5 , Figure 6 , Figure 7 As shown, multiple drain pipes 40 are located on different sides of the housing 11 opposite to the inlet pipe 30.

[0136] In at least one embodiment of this invention, such as Figure 8 and Figure 9 As shown, the inlet pipe 30 and part of the outlet pipe 40 are located on the same side of the housing 11, and the outlet pipe 40 and the inlet pipe 30 corresponding to the second flow zone A2 are located on different sides of the housing 11.

[0137] Based on the above embodiments, this disclosure also designs the structure of the drain pipe 40 to avoid the problem of impurities blocking the drain pipe 40 and affecting the use of the exposure equipment 1.

[0138] For example, in one embodiment of this disclosure, the drain pipe 40 includes a filter chamber 41 and a drain chamber 42. The filter chamber 41 communicates with the internal cavity S1 of the housing 11, and one end of the drain chamber 42 communicates with the filter chamber 41 and the other end communicates with the atmosphere. The volume of the filter chamber 41 decreases from the housing 11 to the drain chamber 42. In this way, the filter chamber 41 is used to contain impurities, reducing the risk of impurities clogging the drain pipe 40.

[0139] For example, such as Figure 12 As shown, in the exposure device 1, the drain pipe 40 includes a filter chamber 41 and a drain chamber 42. The cross-sectional shape of the drain chamber 42 in the direction perpendicular to the housing 11 of the immersion chamber 10 is a triangular shape, such as a funnel shape. This increases the area of ​​the exposure liquid and impurities entering the filter chamber 41, reduces the possibility of clogging, and also helps to guide the exposure liquid to the drain chamber 42.

[0140] In at least one embodiment of this disclosure, such as Figure 13 As shown, the drain pipe 40 also includes a filter device 43, which is disposed between the filter chamber 41 and the drain chamber 42.

[0141] For example, a removable filter screen is provided between the filter chamber 41 and the drain chamber 42. The filter screen reduces the amount of impurities entering the drain chamber 42, thereby reducing the risk of impurities clogging the drain pipe 40.

[0142] In at least one embodiment of this disclosure, the filter chamber 41 and the drain chamber 42 are detachably connected. For example, the drain chamber 42 and the filter chamber 41 are detachably connected by a snap-fit ​​or threaded connection. This detachable connection of the drain chamber 42 and the filter chamber 41 facilitates the cleaning of impurities in the filter chamber 41, thereby simplifying the cleaning operation of the exposure apparatus.

[0143] In one embodiment of this disclosure, the exposure apparatus 1 further includes an impurity adsorption layer 50, which covers at least a portion of the inner sidewall of the housing 11.

[0144] For example, such as Figure 14 As shown, in this exposure device 1, the impurity adsorption layer 50 covers the entire inner wall of the housing 11. Specifically, the inner wall covered by the impurity adsorption layer 50 corresponds to the first flow zone A1, the second flow zone A2, and the circulating flow zone A3. Thus, some of the impurities in the exposure liquid passing through these zones will be adsorbed by the impurity adsorption layer 50, which helps to improve the problem of impurities contaminating the projection lens and affecting the exposure effect.

[0145] In at least one embodiment of this disclosure, the impurity adsorption layer 50 covers the inner sidewall of the housing 11 corresponding to the first flow zone A1 and the circulating flow zone A3.

[0146] For example, such as Figure 15 As shown, in this exposure device 1, the impurity adsorption layer 50 covers part of the inner wall of the housing 11. Specifically, the inner wall covered by the impurity adsorption layer 50 corresponds to the first flow zone A1 and the circulating flow zone A3. This can reduce the amount of impurities in the exposure solution entering the second flow zone A2, thereby reducing the impurity content and improving the exposure effect.

[0147] In one embodiment of this disclosure, the housing 11 includes at least two detachably connected sub-housings 11, and at least one of the sub-housings 11 has an impurity adsorption layer 50 disposed on its inner sidewall.

[0148] In at least one embodiment of this disclosure, such as Figure 15 As shown, the housing 11 includes a first sub-housing 11a and a second sub-housing 11b. The first sub-housing 11a corresponds to the first flow zone A1 and the circulating flow zone A3, and the second sub-housing 11b corresponds to the second flow zone A2. This facilitates the disassembly of the housing 11, thereby enabling the cleaning of the interior of the housing 11, such as the impurity adsorption layer 50 and the flow channel plate 21, reducing the difficulty of cleaning the exposure equipment 1.

[0149] It should be noted that the exposure equipment in this disclosure is not limited to the examples above, and can be designed according to actual needs. For example, parameters such as the number of flow channel plates and their tilt angles; the positions of the inlet and outlet pipes, and their relative positions, as well as the relative positions of the inlet and outlet pipes and the flow channel plates; the extent to which the impurity adsorption layer covers the inner wall of the housing, and the number and connection scheme of the detachable sub-housings included in the housing. Furthermore, all connections mentioned in this disclosure are sealed connections. All of these can be designed according to actual needs and will not be elaborated upon here.

[0150] This disclosure also provides an element obtained by exposure using the exposure equipment provided in the above embodiments.

[0151] For example, the component includes, but is not limited to, thin-film transistors, electrodes of OLED pixels, and light-emitting layers in a display panel. Thus, during exposure, the liquid immersion chamber partition plate with multiple through holes in the exposure equipment effectively reduces the contamination of optical components in the exposure solution by impurities, thereby improving the exposure effect, increasing the accuracy of the shape and size of the exposed components, and ultimately improving the corresponding performance of the components.

[0152] This disclosure also provides a display panel that includes the elements described in the above embodiments. Thus, the exposure effect of the elements in the display panel is improved, the performance of the resulting elements is enhanced, thereby improving the display quality of the display panel having the elements, such as display effect and luminous efficiency.

[0153] For example, the display panel can be any product or component with a display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, or navigator.

[0154] The specific embodiments described above do not constitute a limitation on the scope of protection of this invention. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this invention should be included within the scope of protection of this invention.

[0155] The above description is merely a preferred embodiment of this specification and is not intended to limit this specification. Any modifications or equivalent substitutions made within the spirit and principles of this specification should be included within the scope of protection of this specification.

Claims

1. An exposure apparatus, characterized in that, include: An immersion chamber includes a housing having an internal cavity for containing an exposure liquid and a substrate to be exposed. The housing includes a communicating objective lens port and a substrate port, wherein the objective lens port is used to mount a projection objective lens, and the substrate port is configured to allow the substrate to be exposed to be placed into the internal cavity, wherein the substrate to be exposed is immersed in the exposure liquid when the internal cavity contains the exposure liquid. A liquid circulation channel assembly is disposed in the internal cavity, dividing the internal cavity into a first flow zone, a second flow zone, and a circulation flow zone located between the first flow zone and the second flow zone. The circulation flow zone corresponds to the liquid circulation channel assembly and is configured to allow the exposure liquid in the first flow zone and the second flow zone to flow into each other. The circulation flow zone limits at least one liquid channel. The first flow zone is close to the substrate port, and the second flow zone is close to the objective lens port. An inlet pipe, disposed on the outer wall of the housing and communicating with the internal cavity of the housing, is used to introduce the exposure solution into the internal cavity; and At least one drain pipe is disposed on the outer wall of the housing and communicates with the internal cavity of the housing, for discharging the exposure liquid in the internal cavity to the outside of the internal cavity.

2. The exposure apparatus according to claim 1, characterized in that, The liquid circulation channel assembly includes at least two channel plates, wherein one end of the channel plate is connected to the inner wall of the housing, and the other end of the channel plate is suspended in the internal cavity to form a channel opening. The sides of adjacent channel plates connected to the inner wall of the housing are located on different sides of the inner wall of the housing, and the orthographic projections of different channel plates on the plane of the housing overlap. Preferably, the flow channel plate is a transparent component without refractive power; Preferably, the flow channel plate is a transparent flat plate; Preferably, the minimum distance between adjacent flow channel plates is greater than a preset value, where the preset value is the coherence length of the exposure light corresponding to the exposure device; Preferably, the number of flow channel plates is greater than or equal to 2 and less than or equal to 6; Preferably, adjacent flow channel plates form a liquid flow channel, and the liquid circulation flow channel assembly includes at least two liquid flow channels, and the adjacent liquid flow channels are interconnected and non-linear.

3. The exposure apparatus according to claim 2, characterized in that, The flow channel plates are arranged parallel to each other; Preferably, the flow channel plate is arranged parallel to the plane on which the housing is located; Preferably, the flow channel plate is inclined relative to the plane where the housing is located; More preferably, the angle between the flow channel plate and the plane containing the housing is an acute angle.

4. The exposure apparatus according to claim 3, characterized in that, The distance between adjacent flow channel plates decreases from the substrate opening to the objective lens opening; or The distance between adjacent flow channel plates is equal.

5. The exposure apparatus according to claim 2, characterized in that, The adjacent flow channel plates are arranged at an angle relative to each other, and the included angle between them is an acute angle; Preferably, in two adjacent flow channel plates, one flow channel plate is arranged parallel to the plane where the housing is located, and the other flow channel plate is arranged at an angle to the plane where the housing is located, and the angle of inclination formed between the two is an acute angle; Preferably, two adjacent flow channel plates are respectively inclined to the plane where the housing is located, and the inclination angle formed between the flow channel plate and the plane where the housing is located is an acute angle.

6. The exposure apparatus according to claim 5, characterized in that, The flow path of the exposure liquid in the internal cavity of the housing from the substrate port to the objective lens port is a first flow path, and the width of the liquid flow channel gradually decreases along the direction of the first flow path.

7. The exposure apparatus according to claims 1 to 5, characterized in that, The liquid inlet pipe is located near the objective lens port, and the liquid outlet pipe is located near the substrate port; Preferably, the drain pipe includes a filter chamber and a drain chamber, the filter chamber is connected to the internal cavity of the housing, one end of the drain chamber is connected to the filter chamber, and one end of the drain chamber is connected to the atmosphere, wherein the volume of the filter chamber decreases from the housing to the drain chamber. Preferably, the drain pipe further includes a filter device, which is disposed between the filter chamber and the drain chamber; Preferably, the filtration chamber and the drainage chamber are detachably connected.

8. The exposure apparatus according to claim 7, characterized in that, One drain pipe is provided, and the inlet pipe is provided corresponding to the second flow zone. The drain pipe is configured corresponding to the first flow zone; or... The drain pipe is provided corresponding to the circulating flow zone; Preferably, the drain pipe and the inlet pipe are located on different sides of the outer wall of the housing.

9. The exposure apparatus according to claim 7, characterized in that, Multiple drain pipes are provided, and the inlet pipe is provided corresponding to the second flow zone. At least one of the drain pipes is configured corresponding to the first flow zone, at least one of the drain pipes is configured corresponding to the circulating flow zone, or at least one drain pipe is configured corresponding to the second flow zone; or... The drain pipe is configured corresponding to the circulating flow zone; or At least one of the drain pipes is provided corresponding to the circulating flow zone, and at least one drain pipe is provided corresponding to the second flow zone; Preferably, the plurality of drain pipes are located on different sides of the housing opposite to the inlet pipe; or, Preferably, the inlet pipe and part of the outlet pipe are located on the same side of the housing, and the outlet pipe corresponding to the second flow zone is located on a different side of the housing from the inlet pipe; Preferably, it further includes an impurity adsorption layer that covers at least a portion of the inner sidewall of the housing; Preferably, the impurity adsorption layer covers the inner sidewalls of the housing corresponding to the first flow zone and the circulating flow zone; Preferably, the housing includes at least two detachably connected sub-housings, and at least one of the sub-housings has an impurity adsorption layer on its inner sidewall; Preferably, the housing includes a first sub-housing and a second sub-housing, the first sub-housing corresponding to the first flow region and the circulating flow region, and the second sub-housing corresponding to the second flow region.

10. An element, characterized in that, It is obtained by exposure using the exposure apparatus according to any one of claims 1 to 9.

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