A developing liquid supply device control method, an electronic device, and a computer storage medium

Abstract

The application provides a developing liquid supply device control method, electronic equipment and computer storage medium. The developing liquid supply device comprises a plurality of liquid supply tanks. In a liquid supply process, one of the plurality of liquid supply tanks is used to supply liquid to a developing chamber to coat a substrate carried into the developing chamber. The method comprises: when a first liquid supply tank in a liquid supply state among the plurality of liquid supply tanks meets a switching condition, stopping liquid supply of the first liquid supply tank, and simultaneously starting liquid supply of a second liquid supply tank among the plurality of liquid supply tanks, wherein the first liquid supply tank and the second liquid supply tank are different liquid supply tanks; and draining the remaining liquid in the first liquid supply tank, and adding developing liquid to the first liquid supply tank after the liquid is drained. By stopping liquid supply of the first liquid supply tank when the first liquid supply tank meets the switching condition, and starting liquid supply of the second liquid supply tank among the plurality of liquid supply tanks, the liquid supply to the developing chamber can be maintained, so that the production rhythm will not be interrupted.

Description

Technical Field

[0001] This application relates to the technical field of apparatus for processing organic electroluminescent devices, and more particularly to an electronic device and computer storage medium for a developing solution supply device control method. Background Technology

[0002] With the in-depth research of organic semiconductor technology, the application of organic devices is becoming more and more widespread, including organic field-effect transistors (OTFTs), organic electroluminescent devices (OLEDs), organic laser devices, etc. In the production process, due to different materials and process limitations, it is usually necessary to planarize uneven surfaces.

[0003] However, during the planarization process, the liquid supplied to the liquid supply device of the developing machine needs to be switched. During the switching process, the liquid supply cannot be carried out, which affects the production cycle. Summary of the Invention

[0004] This invention provides a developing solution supply device control method, electronic device, and computer storage medium to solve or alleviate technical problems in the prior art.

[0005] The technical solution adopted in this invention is as follows:

[0006] In a first aspect, embodiments of this application provide a control method for a developing liquid supply device. The developing liquid supply device includes multiple supply tanks. During the liquid supply process, one of the multiple supply tanks supplies liquid to a developing chamber to coat a substrate transported into the developing chamber. After the coated substrate is removed from the developing chamber, an uncoated substrate is transported into the developing chamber. The method includes: when a first supply tank in the liquid supply state among the multiple supply tanks meets a switching condition, stopping the liquid supply of the first supply tank, and simultaneously starting a second supply tank among the multiple supply tanks to supply liquid, draining the remaining liquid in the first supply tank, and adding developing liquid to the first supply tank after draining the liquid, wherein the first supply tank and the second supply tank are different supply tanks; or, when the first supply tank in the liquid supply state among the multiple supply tanks does not meet the switching condition, maintaining the liquid supply of the first supply tank.

[0007] Optionally, the switching conditions include at least one of the following conditions: Condition 1: After the first liquid supply tank supplies liquid, the number of substrates processed in the developing chamber is greater than or equal to a quantity threshold; Condition 2: The liquid supply duration of the first liquid supply tank is greater than or equal to a duration threshold; Condition 3: The conductivity of the developing solution in the first liquid supply tank is less than or equal to a conductivity threshold.

[0008] Optionally, the first supply tank is connected to the main supply pipeline via a first supply line, and the second supply tank is connected to the main supply pipeline via a second supply line. A first valve is installed on the first supply line, a second valve is installed on the second supply line, and a third valve is installed on the main supply pipeline. The third valve is located in the main supply pipeline near the supply end relative to the pipeline connection point. Correspondingly, stopping the supply of liquid from the first supply tank while simultaneously starting the supply of liquid from one of the multiple supply tanks (the second supply tank) includes: closing the first valve on the supply line of the first supply tank, opening the second valve on the supply line of one of the multiple supply tanks (the second supply tank), and simultaneously keeping the third valve on the main supply pipeline open.

[0009] Optionally, the developing solution supply device is connected to the developing chamber via the main supply pipeline.

[0010] Optionally, the first includes a first drain line; correspondingly, the step of removing the remaining liquid in the first supply tank includes: after closing the first valve on the supply line of the first supply tank, opening the first drain line of the first supply tank to remove the remaining liquid in the first supply tank.

[0011] Optionally, the first liquid supply tank is connected to the main liquid drainage pipeline via a first drainage pipeline, and the second liquid supply tank is connected to the main liquid drainage pipeline via a second drainage pipeline.

[0012] Optionally, one end of the main drainage pipeline is connected to the waste liquid recovery tank, and the other ends are closed; or, multiple ends of the main drainage pipeline are all connected to the waste liquid recovery tank.

[0013] Optionally, each first supply tank includes a first liquid filling line; correspondingly, adding developer to the first supply tank after draining the liquid includes: after draining the remaining liquid in the first supply tank, closing the first drain line of the first supply tank; and opening the first liquid filling line of the first supply tank to add developer to the first supply tank.

[0014] Secondly, embodiments of this application provide an electronic device having a computer program stored thereon, which, when executed by a processor, implements the developing solution supply device control method as described in any one of the first aspects of the embodiments.

[0015] The processor, communication interface, memory, and communication bus are provided. The processor, memory, and communication interface communicate with each other through the communication bus. The memory is used to store at least one executable instruction, which causes the processor to perform the operation corresponding to the developing liquid supply device control method as described in any of the first aspects of the embodiments.

[0016] Thirdly, embodiments of this application provide a computer storage medium storing a computer program thereon, which, when executed by a processor, implements the developing solution supply device control method as described in any one of the first aspects of the embodiments.

[0017] As can be seen from the above scheme, by stopping the liquid supply of the first liquid supply tank when the switching conditions are met, and starting the liquid supply of one of the multiple liquid supply tanks, the liquid supply to the developing chamber can be maintained, so as to ensure that the production cycle is not interrupted. Attached Figure Description

[0018] Figure 1 This is a flowchart of a developing solution supply device control method according to an embodiment of this application;

[0019] Figure 2 This is a flowchart of a developing solution supply device control method according to another embodiment of this application;

[0020] Figure 3 This is a schematic diagram of a developing solution supply device according to an embodiment of this application;

[0021] Figure 4 This is a schematic diagram of a developing solution supply device according to another embodiment of this application;

[0022] Figure 5 This is a schematic diagram of an electronic device according to an embodiment of this application. Detailed Implementation

[0023] To make the technical problems, technical solutions and advantages of the present invention clearer, a detailed description will be given below in conjunction with the accompanying drawings and specific embodiments.

[0024] Figure 1 This is a flowchart of a developing solution supply device control method according to an embodiment of this application, such as... Figure 1 As shown, the control method for the developer supply device includes the following steps:

[0025] Step 102: When the first liquid supply tank in the liquid supply state among the multiple liquid supply tanks meets the switching conditions, stop the liquid supply of the first liquid supply tank, and at the same time start the liquid supply of one of the multiple liquid supply tanks, the second liquid supply tank.

[0026] Step 104: Drain the remaining liquid from the first supply tank and add developing solution to the first supply tank after draining the liquid.

[0027] Photolithography is frequently used in the manufacturing of electronic devices. Its main steps include: cleaning, photoresist coating, pre-baking, exposure, development, post-baking, etching, and photoresist removal. Development removes the photoresist from the photosensitive areas using a developer solution, typically compatible with the photoresist. The photoresist coating process involves uniformly coating a layer of photosensitive material—photoresist—on the front side of a glass substrate. Exposure causes the photoresist exposed to light to dissolve in the developer at a different rate than the unexposed portion, thus transferring the pattern from the photomask.

[0028] Before the cleaning step, the glass substrate needs to be coated. This involves using an electric field to accelerate inert element ions in a near-vacuum environment, bombarding a metal target, and sputtering a thin metal film onto the glass substrate. The target is connected to the cathode, and the glass is connected to the positive electrode or grounded, with xenon gas introduced. Electrons, accelerated by the electric field, collide with argon (Ar) atoms, ionizing a large number of Ar+ and e-, forming plasma. Ar+ ions are then accelerated by the electric field to bombard the target, sputtering a large number of target atoms, which are then deposited as neutral target atoms (or molecules) into the glass film. This deposition process is called chemical vapor deposition (CVD), which involves introducing vapors of gaseous or liquid reactants containing the elements constituting the film, along with other gases required for the reaction, into a reaction chamber, where a chemical reaction occurs on the substrate surface to form the film.

[0029] In the LCD industry, the development process for glass substrates mainly involves: placing the glass substrate to be developed in a developing chamber, and then using a developer to spray developing solution onto the substrate by moving a rocker arm with a nozzle up and down. The developing process involves dissolving the exposed portion of the (positive) photoresist in a fast developing solution (the opposite is true for negative photoresist, where the unexposed portion dissolves). The unexposed portion of the photoresist dissolves slowly, and by controlling the developing time, the pattern on the photomask can be revealed. This developing process typically needs to be repeated 2-4 times to gradually remove a portion of the photoresist from the target area.

[0030] The developing solution supply device includes multiple supply tanks. During the supply process, one of the supply tanks supplies solution to the developing chamber to coat the substrates transported into the developing chamber. After the coated substrates are removed from the developing chamber, uncoated substrates are transported into the developing chamber. However, during production, the first supply tank supplying solution to the developing chamber may need to be replenished or replaced. If a substrate is already transported into the developing chamber at this time, the substrate needs to wait for the first supply tank to switch, causing a brief pause in the substrate. This not only affects the production cycle but may also cause production quality problems. Therefore, when the first supply tank in the supply state meets the switching conditions, the supply of solution from the first supply tank is stopped, and simultaneously, the supply of solution from the second supply tank in the supply tank begins to start, so as to ensure that the supply of solution to the developing chamber is not interrupted. At this time, the coating process of the substrates in the developing chamber is not interrupted. Then, the remaining liquid in the first supply tank is drained and the developing solution is refilled to facilitate subsequent switching of the supply solution.

[0031] In this embodiment of the application, by stopping the liquid supply of the first liquid supply tank when the switching conditions are met, and starting the liquid supply of one of the multiple liquid supply tanks, the liquid supply to the developing chamber can be maintained so as to ensure that the production cycle is not interrupted.

[0032] Optionally, Figure 2 This is a flowchart of a developing solution supply device control method according to another embodiment of this application, such as... Figure 2 As shown, the control method for the developer supply device includes the following steps:

[0033] Step 202: Determine whether the first liquid supply tank in the liquid supply state among the multiple liquid supply tanks meets the switching conditions. If yes, proceed to step 204; otherwise, proceed to step 208.

[0034] Step 204: Stop the liquid supply from the first liquid supply tank and start the liquid supply from the second liquid supply tank among the multiple liquid supply tanks.

[0035] Step 206: Drain the remaining liquid in the first supply tank, add developer to the drained first supply tank, and end the current process.

[0036] Step 208: Maintain the liquid supply to the first liquid supply tank and proceed with step 202.

[0037] During production, the first liquid supply tank in the liquid supply state among multiple supply tanks can be continuously monitored. If the first liquid supply tank meets the switching conditions, its liquid supply is stopped, and the second liquid supply tank among the multiple supply tanks begins supplying liquid. Then, the remaining liquid in the first liquid supply tank is drained, and developing solution is added to the drained first liquid supply tank. At this point, the second liquid supply tank that has started supplying liquid becomes the first liquid supply tank, and the first liquid supply tank after adding developing solution becomes the second liquid supply tank among the multiple supply tanks that is not in a liquid supply state. If the first liquid supply tank does not meet the switching conditions, it can continue to supply liquid to maintain production.

[0038] In this embodiment of the application, by continuously monitoring the liquid supply tank during the production process, the liquid supply tank can be switched in a timely manner to ensure that the production cycle is not interrupted.

[0039] Specifically, the switching conditions include at least one of the following conditions:

[0040] Condition 1: After the first liquid supply tank supplies liquid, the number of substrates processed in the developing chamber is greater than or equal to the quantity threshold.

[0041] During the processing, the amount of liquid consumed to coat each substrate is roughly the same. Therefore, the amount of liquid supplied by the first liquid supply tank can be deduced from the number of substrates processed in the developing chamber, and it can be determined whether the liquid supply tank needs to be switched.

[0042] Specifically, a counter can be installed in the developing chamber to count when the substrate is transported into the developing chamber, or to count when the substrate is transported out of the developing chamber.

[0043] Specifically, the counter may include an image acquisition device that continuously acquires images within the developing chamber. By performing image recognition on the acquired images, it can be determined whether a substrate has been moved into or out of the developing chamber. The image acquisition device can acquire one image per second, or one image per 10 seconds. Alternatively, to save power and memory, the acquisition frequency can be set according to the substrate production cycle. For example, if the developing chamber processes substrates for 50 seconds, the image acquisition device can be set to acquire one image every 50 seconds.

[0044] Condition 2: The liquid supply duration of the first liquid supply tank is greater than or equal to the duration threshold.

[0045] During the processing, the first liquid supply tank continuously supplies liquid to the developing chamber, and its supply rate is relatively stable. Therefore, the amount of liquid supplied by the first liquid supply tank can be deduced from the supply time of the first liquid supply tank, and it can be determined whether the liquid supply tank needs to be switched.

[0046] Specifically, a timer can be set in the developing liquid supply device. When the first liquid supply tank starts supplying liquid, the timer starts counting down to obtain the liquid supply duration of the first liquid supply tank.

[0047] Specifically, a flow rate detector can be installed in the developing liquid supply device. When the flow rate detector detects a change in the flow rate of the liquid in the channel from the first supply tank to the developing chamber, it sends a timing signal to the timer to start the timer.

[0048] A flow velocity detector can be a Doppler velocimeter. When detecting liquid flow velocity, a Doppler velocimeter first emits ultrasonic waves, for example, by emitting ultrasonic waves into the fluid through a high-frequency ultrasonic transducer. These ultrasonic waves are scattered when they encounter suspended particles in the fluid. The Doppler velocimeter then receives the scattered waves, such as the emitted ultrasonic waves being scattered back after encountering particles in the fluid and captured by the receiver. The received signal is then filtered, amplified, and digitized to extract frequency shift information. Finally, the flow velocity is calculated. The Doppler velocimeter measures the frequency difference between the scattered and emitted waves (i.e., the Doppler frequency shift), and combines this with parameters such as the propagation path and angle of the sound waves to calculate the fluid velocity. Based on the detected fluid velocity and the supply time, the amount of liquid supplied by the supply tank can be determined. The flow rate detector can also be a cup flow meter. A cup flow meter consists of a rotor composed of six conical cups symmetrical about the center of a rotating disk. When the cup flow meter is placed in a liquid, the different shapes of the six cups facing the direction of liquid flow cause different water pressures on both sides of the rotating shaft, thus causing the rotating disk to rotate. The counter records the number of rotations of the cups, and then the liquid flow rate is determined based on the number of rotations and the rotation time. At the same time, the cup flow meter can also be equipped with a tail fin to keep the instrument facing the water flow, so as to ensure that the instrument maintains the correct orientation and position in the water.

[0049] Condition 3: The conductivity of the developer in the first supply tank is less than or equal to the conductivity threshold.

[0050] If the developer comes into contact with ambient gases such as air, carbon dioxide and other gases in the environment can easily react with the developer to form various carbonates, which then accumulate. For example, there are carbonates of TMA (tetramethylamine). This shortens the developer's lifespan, rapidly degrades its chemical properties, and affects the quality of the photolithographically produced pattern. Furthermore, partial dissociation of carbonates in the developer increases its conductivity, making it difficult to maintain a constant conductivity and impacting imaging performance.

[0051] When the conductivity of the developer in the first supply tank is less than or equal to the conductivity threshold, using this liquid to supply the developing chamber will cause production quality problems. Therefore, it is necessary to switch the first supply tank and drain the developer in the first supply tank.

[0052] Specifically, to monitor the developer in the first supply tank, an online developer monitoring device can be installed. This device includes a developer storage tank, a sampling module, and a detection module. The inlet of the sampling module is connected to the supply port of the supply tank. The detection module includes a density detector and a concentration detector connected in parallel, with both inlets connected to the outlet of the sampling module. During the development process of the substrate in the developing chamber, the sampling module can transfer the developer from the supply tank to the detection module. The density detector can detect the density of the current developer to obtain the concentration of carbonate ions. The concentration detector can detect the alkali concentration and photoresist salt concentration of the current developer. When the density of the developer in the supply tank and / or the salt concentration of the photoresist are not within a preset threshold range, it indicates a problem with the conductivity of the developer. In this case, the supply tank needs to be switched to ensure the developing effect of the substrate in the developing chamber.

[0053] Specifically, the concentration detector is a near-infrared detector. The developer flows through the spectral probe of the near-infrared detector, which can collect the near-infrared spectral data of the developer. Then, a standard model can be established by using principal component analysis combined with partial least squares regression to obtain the current alkali concentration of the developer and the photoresist concentration.

[0054] Specifically, the density detector is an ultrasonic detector. The principle of using an ultrasonic detector to detect the density of the developer is as follows: the ultrasonic transmitter emits ultrasonic waves, which pass through the liquid in the fixed-gap slits and are reflected back. Since ultrasonic waves travel at different speeds in liquids of different concentrations, the concentration of carbonate ions in the current developer can be calculated by measuring the speed of ultrasonic wave reflection. Of course, in other embodiments, the density detector can also be a vibration-type density meter to obtain the current concentration of carbonate ions in the developer.

[0055] In one example of this embodiment, the concentration detector is a refractometer and an ultraviolet spectrometer arranged in series. In another example of this embodiment, the concentration detector is a conductivity meter and an ultraviolet spectrometer arranged in series. In yet another example of this embodiment, the concentration detector is a refractometer, a conductivity meter, and an ultraviolet spectrometer arranged in series. Both the refractometer and the conductivity meter can be used to detect the alkali concentration of the current developer, and the ultraviolet spectrometer can be used to detect the photoresist salt concentration of the current developer. These examples also enable accurate detection of both the alkali concentration and the photoresist salt concentration of the developer.

[0056] Figure 3 This is a schematic diagram of a developing solution supply device according to an embodiment of this application, as shown below. Figure 3As shown, the developing liquid supply device 300 includes: multiple liquid supply tanks 301, a first liquid supply tank 301A connected to a main liquid supply pipeline 303 via a first liquid supply pipeline 302A, a second liquid supply tank 301B connected to the main liquid supply pipeline 303 via a second liquid supply pipeline 302B, a first valve 304A provided on the first liquid supply pipeline 302A, a second valve 304B provided on the second liquid supply pipeline 302B, and a third valve 305 provided on the main liquid supply pipeline 303, the third valve 305 being located in the main liquid supply pipeline 303 near the liquid supply end relative to the pipeline connection.

[0057] Specifically, the developing liquid supply device 300 is connected to the developing chamber 40 through the main liquid supply pipeline 303. The developing chamber 40 is a device independent of the developing liquid supply device 300.

[0058] The main liquid supply line 303 can be integrally formed with the developing chamber 40, or a through hole matching the diameter of the main liquid supply line 303 can be opened on the developing chamber 40, and the liquid outlet end of the main liquid supply line 303 can be welded to the through hole opened on the developing chamber 40. Alternatively, an interface protruding to the outside of the developing chamber 40 can be provided on the developing chamber 40, and this interface can communicate with the inside of the developing chamber 40. The main liquid supply line 303 can be sleeved on the outside of this interface, that is, the diameter of the main liquid supply line 303 is larger than the diameter of the interface. The main liquid supply line 303 can also be sleeved on the inside of this interface, that is, the diameter of the main liquid supply line 303 is smaller than the diameter of the interface, and communicate with the inside of the developing chamber 40 by sleeve connection.

[0059] In this scenario, the process of stopping the liquid supply from the first liquid supply tank and starting the liquid supply from one of the multiple liquid supply tanks, the second liquid supply tank, may also include:

[0060] Close the first valve 304A on the first supply line 302A of the first supply tank 301A, open the second valve 304B on the second supply line 302B of the second supply tank 301B (one of the multiple supply tanks 301), and keep the third valve 305 on the main supply line 303 in the open state.

[0061] After closing the first valve 304A on the first supply line 302A of the first supply tank 301A, the main supply line 303 will supply at least part of the liquid to the developing chamber 40 because the third valve 305 is open, causing a change in the pressure inside the pipe. If it is necessary to continue supplying liquid after the pressure change, the third valve 305 on the main supply line 303 must be closed first, and then the second valve 304B on the second supply line 302B of the second supply tank 301B must be opened for a period of time to stabilize the pressure. To prevent pressure changes in the main liquid supply line 303, while closing the first valve 304A on the first liquid supply line 302A of the first liquid supply tank 301A, the second valve 304B on the second liquid supply line 302B of the second liquid supply tank 301B (one of the multiple liquid supply tanks 301) is opened. At this time, the liquid supply will not be interrupted, so the pressure inside the main liquid supply line 303 is stable, ensuring that the production process is uninterrupted and that the liquid supply is not unstable due to pressure changes in the main liquid supply line 303, thus affecting product quality.

[0062] Figure 4 This is a schematic diagram of a developing solution supply device according to another embodiment of this application, as shown below. Figure 4 As shown, the first liquid supply tank 301A includes a first drain pipe 306A.

[0063] Correspondingly, the process of draining the remaining liquid from the first supply tank may also include:

[0064] After closing the first valve 304A on the first supply line 302A of the first supply tank 301A, open the first drain line 306A of the first supply tank 301A to drain the remaining liquid in the first supply tank 301A.

[0065] The first drain pipe 306A is located at the bottom of the first supply tank 301A. When the first drain pipe 306A is opened, the liquid inside the first supply tank 301A will flow to the first drain pipe 306A under the action of gravity and then be discharged from the first supply tank 301A.

[0066] Specifically, the second liquid supply tank 301B includes a second drain pipe 306B, which is located at the bottom of the second liquid supply tank 301B. When the second drain pipe 306B is opened, the liquid inside the second liquid supply tank 301B will flow to the second drain pipe 306B under the action of gravity, and then be discharged from the second liquid supply tank 301B. The first drain pipe 306A and the second drain pipe 306B can be connected as follows: Figure 4 All of them are connected to the main drainage pipeline 50, or they can be connected to the waste liquid recovery tank respectively.

[0067] A wastewater recovery tank is a facility used to collect and treat wastewater generated during production processes. Its main function is to collect and treat this wastewater. A wastewater recovery tank typically includes the following components: an inlet gate valve, normally closed but activated during filter backwashing to recover backwash wastewater; an overflow gate valve, normally closed to increase the recovery water level; an interconnecting gate valve to maintain level balance between the two tanks; a lift pump to raise the recovered water to a distribution well or sedimentation tank; a submersible jet pump, activated when sedimentation blocks the lift pump to prevent turbidity of the settled water; and an ultrasonic level gauge to monitor the water level in the recovery tank.

[0068] Specifically, one end of the main drainage pipe 50 is connected to the waste liquid recovery tank, while the other end is closed. Waste liquid flowing through the first drainage pipe 306A and the second drainage pipe 306B can flow to the waste liquid recovery tank via the main drainage pipe 50, and is ultimately discharged into the waste liquid recovery tank through the end of the main drainage pipe 50 connected to the waste liquid recovery tank. When the main drainage pipe 50 has only one outlet, it is convenient to collect information such as waste liquid flow rate.

[0069] Alternatively, multiple ends of the main drain pipe 50 can be connected to the waste liquid recovery tank. When multiple ends of the main drain pipe 50 are connected to the waste liquid recovery tank, the efficiency of waste liquid flow can be improved, avoiding problems such as pipe blockage or excessive pressure caused by excessive discharge of waste liquid at the same time.

[0070] Specifically, the first liquid supply tank 301A includes a first liquid filling pipeline. The first liquid filling pipeline can be located at the top of the first liquid supply tank 301A, or on the side of the first liquid supply tank 301A near the top of the first liquid supply tank 301A, such that the distance between the side of the first liquid supply tank 301A and the top of the first liquid supply tank 301A is within the range of 0-10cm.

[0071] Specifically, a fourth valve can be installed on the first liquid filling line to control the opening and closing of the first liquid filling line.

[0072] Correspondingly, developer is added to the first supply tank after the liquid has been drained, including:

[0073] After the remaining liquid in the first supply tank 301A is drained, the first drain line 306A of the first supply tank 301A is closed, and then the first liquid filling line of the first supply tank 301A is opened to add developer to the first supply tank 301A.

[0074] After the remaining liquid in the first liquid supply tank 301A is drained, the first drain pipe 306A of the first liquid supply tank 301A needs to be closed to prevent the liquid injected into the first liquid supply tank 301A through the first liquid filling pipe from flowing out of the first drain pipe 306A, thus causing a waste of production raw materials.

[0075] Specifically, the second liquid supply tank 301B may include a second liquid filling line. The second liquid filling line can be located at the top of the second liquid supply tank 301B, or on the side of the second liquid supply tank 301B near the top, such as within a distance of 0-5 cm between the side and the top of the second liquid supply tank 301B. After the remaining liquid in the second liquid supply tank 301B is drained, the second drain line 306B of the second liquid supply tank 301B needs to be closed to prevent liquid injected into the second liquid supply tank 301B through the second liquid filling line from flowing out through the second drain line 306B. Alternatively, if the second drain line 306B cannot be completely closed, the flow rate of the second liquid filling line can be increased to ensure that there is sufficient liquid in the second liquid supply tank 301B for liquid supply.

[0076] Specifically, a fifth valve can be installed on the second liquid filling line to control the on / off state of the second liquid filling line.

[0077] In this embodiment of the application, by stopping the liquid supply of the first liquid supply tank when the switching conditions are met, and starting the liquid supply of one of the multiple liquid supply tanks, the liquid supply to the developing chamber can be maintained so as to ensure that the production cycle is not interrupted.

[0078] Figure 5 This is a schematic diagram of an electronic device according to one embodiment of this application. The specific embodiments of this application do not limit the specific implementation of the electronic device. Figure 5 As shown, the electronic device 500 may include: a processor 501, a communications interface 502, a memory 503, and a communications bus 504. Wherein:

[0079] The processor 501, communication interface 502, and memory 503 communicate with each other through the communication bus 504.

[0080] Communication interface 502 is used for communication with other electronic devices or servers.

[0081] The processor 501 is used to execute program 505, which can specifically execute the relevant steps in any of the aforementioned method embodiments.

[0082] Specifically, program 505 may include program code that includes computer operation instructions.

[0083] The processor 501 may be a CPU, an application-specific integrated circuit (ASIC), or one or more integrated circuits configured to implement the embodiments of this application. The smart device includes one or more processors, which may be processors of the same type, such as one or more CPUs; or processors of different types, such as one or more CPUs and one or more ASICs.

[0084] Memory 503 is used to store program 505. Memory 503 may include high-speed RAM memory, and may also include non-volatile memory, such as at least one disk storage device.

[0085] Specifically, program 505 can be used to cause processor 501 to execute any of the methods in the foregoing embodiments.

[0086] The specific implementation of each step in procedure 505 can be found in the corresponding steps and units described in the aforementioned embodiments of the developing solution supply device control method, and will not be repeated here. Those skilled in the art will understand that, for the sake of convenience and brevity, the specific working processes of the devices and modules described above can be referred to the corresponding process descriptions in the aforementioned method embodiments, and will not be repeated here.

[0087] The electronic device in this application embodiment can maintain the liquid supply to the developing chamber by stopping the liquid supply of the first liquid supply tank when the switching conditions are met, and starting the liquid supply of one of the multiple liquid supply tanks, thereby ensuring that the production cycle is not interrupted.

[0088] This application also provides a computer-readable storage medium storing instructions for causing a machine to perform any of the methods described in the plurality of method embodiments herein. Specifically, a system or apparatus equipped with a storage medium storing software program code that implements the functions of any of the embodiments described above, and enabling the computer (or CPU or MPU) of the system or apparatus to read and execute the program code stored in the storage medium.

[0089] In this case, the program code read from the storage medium can itself implement the function of any of the above embodiments, and therefore the program code and the storage medium storing the program code constitute part of this application.

[0090] Examples of storage media used to provide program code include floppy disks, hard disks, magneto-optical disks, optical disks (such as CD-ROM, CD-R, CD-RW, DVD-ROM, DVD-RAM, DVD-RW, DVD+RW), magnetic tapes, non-volatile memory cards, and ROMs. Alternatively, program code can be downloaded from a server computer via a communication network.

[0091] This application also provides a computer program product, including computer instructions that instruct a computing device to perform any corresponding operation in the above-described plurality of method embodiments.

[0092] It should be noted that, depending on the implementation needs, the various components / steps described in the embodiments of this application can be broken down into more components / steps, or two or more components / steps or parts of the operation of components / steps can be combined into new components / steps to achieve the purpose of the embodiments of this application.

[0093] The methods described in the embodiments of this application can be implemented in hardware, firmware, or as software or computer code that can be stored in a recording medium (such as a CD-ROM, RAM, floppy disk, hard disk, or magneto-optical disk), or as computer code downloaded over a network that is originally stored in a remote recording medium or a non-transitory machine-readable medium and will be stored in a local recording medium. Thus, the methods described herein can be processed by software stored on a recording medium using a general-purpose computer, a dedicated processor, or programmable or dedicated hardware (such as an ASIC or FPGA). It is understood that the computer, processor, microprocessor controller, or programmable hardware includes storage components (e.g., RAM, ROM, flash memory, etc.) capable of storing or receiving software or computer code that, when accessed and executed by the computer, processor, or hardware, implements the methods described herein. Furthermore, when a general-purpose computer accesses code used to implement the methods shown herein, the execution of the code transforms the general-purpose computer into a dedicated computer for executing the methods shown herein.

[0094] It should be noted that not all steps and modules in the above processes and system structure diagrams are necessary; some steps or modules can be omitted as needed. The execution order of each step is not fixed and can be adjusted as required. The system structure described in the above embodiments can be a physical structure or a logical structure. That is, some modules may be implemented by the same physical entity, or some modules may be implemented by multiple physical entities, or they may be jointly implemented by certain components in multiple independent devices.

[0095] In the above embodiments, the hardware modules can be implemented mechanically or electrically. For example, a hardware module may include permanent dedicated circuitry or logic (such as a dedicated processor, FPGA, or ASIC) to perform the corresponding operation. The hardware module may also include programmable logic or circuitry (such as a general-purpose processor or other programmable processor), which can be temporarily configured by software to perform the corresponding operation. The specific implementation method (mechanical, dedicated permanent circuitry, or temporarily configured circuitry) can be determined based on cost and time considerations.

[0096] The present application has been shown and described in detail above with reference to the accompanying drawings and preferred embodiments. However, the present application is not limited to these disclosed embodiments. Based on the above multiple embodiments, those skilled in the art will know that more embodiments of the present application can be obtained by combining the code review methods in the different embodiments above. These embodiments are also within the protection scope of the present application.

Claims

1. A control method for a developer supply device, characterized in that, The developing solution supply device includes multiple supply tanks. During the supply process, one of the multiple supply tanks supplies solution to the developing chamber to coat the substrate transported into the developing chamber. After the coated substrate is removed from the developing chamber, the uncoated substrate is transported into the developing chamber. The method includes: When the first liquid supply tank in the liquid supply state among the plurality of liquid supply tanks meets the switching condition, the liquid supply of the first liquid supply tank is stopped, and at the same time, the second liquid supply tank among the plurality of liquid supply tanks starts to supply liquid, the remaining liquid in the first liquid supply tank is drained, and the developer is added to the first liquid supply tank after the liquid is drained, wherein the first liquid supply tank and the second liquid supply tank are different liquid supply tanks. Alternatively, when the first liquid supply tank in the liquid supply state among the plurality of liquid supply tanks does not meet the switching conditions, the liquid supply of the first liquid supply tank is maintained.

2. The method according to claim 1, characterized in that, The switching conditions include at least one of the following conditions: Condition 1: After the first liquid supply tank supplies liquid, the number of substrates processed in the developing chamber is greater than or equal to the quantity threshold. Condition 2: The liquid supply duration of the first liquid supply tank is greater than or equal to the duration threshold; Condition 3: The conductivity of the developer in the first supply tank is less than or equal to the conductivity threshold.

3. The method according to claim 1, characterized in that, The first liquid supply tank is connected to the main liquid supply pipeline through the first liquid supply pipeline, and the second liquid supply tank is connected to the main liquid supply pipeline through the second liquid supply pipeline. A first valve is provided on the first liquid supply pipeline, a second valve is provided on the second liquid supply pipeline, and a third valve is provided on the main liquid supply pipeline. The third valve is located in the main liquid supply pipeline near the liquid supply end relative to the pipeline connection. Correspondingly, stopping the liquid supply from the first liquid supply tank while simultaneously starting the liquid supply from one of the multiple liquid supply tanks (the second liquid supply tank) includes: Close the first valve on the supply line of the first supply tank, open the second valve on the supply line of one of the multiple supply tanks, and keep the third valve on the main supply line open.

4. The method according to claim 3, characterized in that, The developing solution supply device is connected to the developing chamber via the main supply pipeline.

5. The method according to claim 3, characterized in that, The first liquid supply tank includes a first drain pipe; Correspondingly, the step of removing the remaining liquid from the first supply tank includes: After closing the first valve on the supply line of the first liquid supply tank, open the first drain line of the first liquid supply tank to drain the remaining liquid in the first liquid supply tank.

6. The method according to claim 5, characterized in that, The first liquid supply tank is connected to the main liquid drainage pipeline through the first drainage pipeline, and the second liquid supply tank is connected to the main liquid drainage pipeline through the second drainage pipeline.

7. The method according to claim 6, characterized in that, One end of the main drainage pipeline is connected to the waste liquid recovery tank, and the other end is closed. Alternatively, all ends of the main drainage pipeline may be connected to the waste liquid recovery tank.

8. The method according to claim 5, characterized in that, The first liquid supply tank includes a first liquid filling pipeline; Correspondingly, adding developer to the first supply tank after the liquid has been drained includes: After the remaining liquid in the first supply tank is drained, the first drain line of the first supply tank is closed. Open the first liquid supply line of the first liquid supply tank to add developer to the first liquid supply tank.

9. An electronic device, comprising: The processor, communication interface, memory, and communication bus communicate with each other through the communication bus. The memory is used to store at least one executable instruction that causes the processor to perform the operation corresponding to the developing liquid supply device control method as described in any one of claims 1-8.

10. A computer storage medium having a computer program stored thereon, which, when executed by a processor, implements the developing solution supply device control method as described in any one of claims 1-8.

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