Visualizing system for spatial visualization

Abstract

This invention provides a technique for observing airflow during welding with higher precision. The visualization system (100) includes an imaging device (21), a backlight (22), a first liquid crystal shutter (23), a second liquid crystal shutter (24), and an image processing device (25). A gap is provided between the first and second liquid crystal shutters, allowing airflow to flow along both shutters. The imaging device (21) acquires a first image and a second image. The first image is an image with the first liquid crystal shutter in pattern display mode and the second liquid crystal shutter in transmission mode. The second image is an image with the second liquid crystal shutter in pattern display mode and the first liquid crystal shutter in transmission mode. The image processing device (25) performs image processing on the first and second images to acquire an image of the airflow flowing between the first liquid crystal shutter (23) and the second liquid crystal shutter (24).

Description

Technical Field

[0001] This invention relates to a visualization system for spatial visualization. Background Technology

[0002] Japanese Patent Application Publication No. 2014-44154 discloses a fluid visualization imaging device for observing objects in high-brightness environments or shielding gases during arc welding, utilizing the schlieren phenomenon. This fluid visualization imaging device blocks light outside the observation optical path using an aperture member and performs observation via a bandpass filter that transmits light of the wavelength of the observation light illuminating the light source. According to Japanese Patent Application Publication No. 2014-44154, the influence of light from the observed object can be minimized, thereby enabling the observation of the observed object.

[0003] Furthermore, Japanese Patent Application Publication No. 2017-181067 discloses a gas visualization system and method capable of visualizing low-concentration leaked gas and obtaining effective information for determining the leak location. In this gas visualization system and method, a background panel and a measurement image are captured. For each pixel, the difference between the pixel value constituting the background panel and the pixel value constituting the measurement image is calculated, and a difference measurement image composed of the differences of each pixel is generated. According to Japanese Patent Application Publication No. 2017-181067, low-concentration leaked gas can be visualized, and effective information for determining the leak location can be obtained.

[0004] Furthermore, Japanese Patent Application Publication No. 2012-145430 discloses a method and apparatus for visualizing the density gradient of airflow through simple image processing. In this method and apparatus, a background panel is positioned behind the measurement area, and a digital camera is positioned in front. The difference between each pixel and the density gradient are calculated based on two images: a reference image taken of the measurement area in a state without density distribution and a measurement image taken in a state where density distribution has occurred. According to Japanese Patent Application Publication No. 2012-145430, airflow visualization can be achieved with a simple apparatus that does not require a large optical system.

[0005] Patent Document 1: Japanese Patent Application Publication No. 2014-44154

[0006] Patent Document 2: Japanese Patent Application Publication No. 2017-181067

[0007] Patent Document 3: Japanese Patent Application Publication No. 2012-145430 Summary of the Invention

[0008] The inventors believe that, during welding, the traditional schlieren method superimposes images of the airflow in the space along the observation direction, while the inventors hope to perform local and high-precision observation of the airflow at any location within the airflow.

[0009] The spatial visualization system disclosed herein includes an imaging device, a backlight, a first liquid crystal shutter, a second liquid crystal shutter, and an image processing device. The imaging device has an imaging surface. The backlight illuminates the imaging surface of the imaging device. The first liquid crystal shutter is flat and is disposed between the imaging device and the backlight on one side of the imaging device. The second liquid crystal shutter is flat and is disposed between the imaging device and the backlight on the side closer to the backlight than the first liquid crystal shutter. The first and second liquid crystal shutters are opposite each other in the direction from the backlight towards the imaging device. A gap is provided between the first and second liquid crystal shutters, allowing airflow to pass along them. The first and second liquid crystal shutters are respectively configured to switch between a transmission mode that allows light from the backlight to pass through and a pattern display mode that displays a predetermined pattern through the light from the backlight. The imaging device acquires a first image and a second image. The first image is an image in a state where the first liquid crystal shutter is in pattern display mode and the second liquid crystal shutter is in transmission mode. The second image is an image in a state where the second liquid crystal shutter is in pattern display mode and the first liquid crystal shutter is in transmission mode. The image processing device performs image processing on the first image and the second image to acquire an image of the airflow flowing between the first liquid crystal shutter and the second liquid crystal shutter. This configuration allows for more precise observation of the localized airflow during welding. Attached Figure Description

[0010] Figure 1 This is a three-dimensional view of the energy storage device 10.

[0011] Figure 2 This is an exploded perspective view of the energy storage device 10.

[0012] Figure 3 This is a perspective view showing the welding of the shell 11 and the sealing plate 12.

[0013] Figure 4 It is a 3D view of the visualization system 100.

[0014] Figure 5 This is a top view of the visualization system 100.

[0015] Figure 6 This is a schematic diagram illustrating the acquisition of the first image.

[0016] Figure 7 This is a schematic diagram illustrating the acquisition of the second image.

[0017] Figure 8This is a flowchart of spatial visualization methods.

[0018] Figure 9 It is a 3D view of the visualization system 100.

[0019] Explanation of reference numerals in the attached figures:

[0020] 1…Electric storage module; 10…Electric storage device; 11…Housing; 12…Sealing plate; 13, 14…Electrode terminals; 15…Busbar; 16A…Laser beam; 17…Protective gas; 21…Picture device; 21a…Picture surface; 22…Backlight; 23…First LCD shutter; 24…Second LCD shutter; 25…Image processing device; 26…Control device; 100…Visualization system. Detailed Implementation

[0021] The embodiments of the present disclosure are described below with reference to the accompanying drawings. The embodiments described herein are not intended to limit the technology of this disclosure. The drawings are schematic depictions and do not necessarily reflect actual objects. Components and parts that perform the same function are appropriately labeled with the same reference numerals, and redundant descriptions are omitted where appropriate. In the drawings, reference numerals X, Y, and Z represent the front-back direction, left-right direction, and up-down direction, respectively. The Y direction is orthogonal to the X direction. The Z direction is orthogonal to both the X and Y directions. In the drawings, reference numerals F, Rr, L, R, U, and D represent front, back, left, right, up, and down, respectively. However, these are merely directions for ease of explanation and are not intended to limit the arrangement of the energy storage device in any way.

[0022] In this specification, "energy storage device" refers to a device capable of charging and discharging. Energy storage devices include not only batteries such as lithium-ion batteries and lithium secondary batteries, but also batteries such as lithium polymer batteries and nickel-metal hydride batteries. A secondary battery is a battery that can be repeatedly charged and discharged due to the movement of charge carriers between its positive and negative electrodes. Energy storage devices can use either electrolytes or solid electrolytes. Secondary batteries can be either electrolyte-based or solid-state batteries using solid electrolytes. Energy storage devices also include capacitors such as double-layer capacitors and lithium-ion capacitors.

[0023] Figure 1 This is a three-dimensional view of the energy storage device 10. Figure 2 This is an exploded perspective view of the energy storage device 10. (For example...) Figure 1 As shown, the energy storage device 10 includes a housing 11, a sealing plate 12, and a pair of electrode terminals 13 and 14. Figure 2As shown, the housing 11 has an opening 11a on one side. The sealing plate 12 is a component that seals the opening 11a of the housing 11. A pair of electrode terminals 13 and 14 are provided on the sealing plate 12. The pair of electrode terminals 13 and 14 are disposed at both ends of the sealing plate 12 in the width direction Y. The method of mounting the electrode terminals 13 and 14 to the sealing plate 12 is not particularly limited. For example, the electrode terminals 13 and 14 can also be mounted to the sealing plate 12 by riveting. The electrode terminals 13 and 14 can also be integrally formed with the sealing plate 12. In addition, the energy storage device 10 includes electrode bodies (not shown).

[0024] Figure 3 This is a perspective view showing the welding of the shell 11 and the sealing plate 12. Figure 3 The diagram schematically illustrates the process of laser welding a sealing plate 12, which is installed at the opening 11a of the housing 11, to the housing 11. For example... Figure 3 As shown, in the welding of the housing 11 and the sealing plate 12, firstly, the sealing plate 12 is installed in the opening 11a of the housing 11. Next, a laser beam 16A is irradiated from the laser welding machine 16 to weld the opening 11a of the housing 11 and the sealing plate 12. In this embodiment, the laser beam 16A irradiates the periphery of the sealing plate 12 installed in the opening 11a on one side of the housing 11.

[0025] At this time, in order to prevent oxidation of the molten metal, the housing 11 and the sealing plate 12 are welded while a protective gas 17 is blown from the nozzle 17A to the welding area. The protective gas 17 is ejected, for example, from a slit-shaped nozzle 17A along the long side of one side of the housing 11. The direction in which the protective gas 17 is blown can be any of the following: front-back, left-right, or up-down. Figure 3 The shielding gas 17 is shown being blown in the front-to-back direction. The shielding gas 17 can be appropriately selected depending on the type of metal being welded and the purpose. Examples include inert gases such as argon, helium, and nitrogen, carbon dioxide, and mixtures of these gases.

[0026] Incidentally, when laser welding metal parts together, a protective gas is blown onto the welding area, for example, to fill the vicinity of the welding area with protective gas. Therefore, for example, it is possible to suppress the effect of oxygen in the air on the welding area and suppress the formation of pores, pinholes, spatter, etc. at the welding area. The inventors aim to ensure welding quality by accurately analyzing the airflow of the protective gas blown during welding. However, until now, a method has not been established that can spatially analyze the direction, speed, etc., of the airflow of the protective gas blown during welding. Therefore, the inventors have researched a spatial visualization system as follows.

[0027] Figure 4 It is a 3D view of the visualization system 100. Figure 4The illustration shows the use of a visualization system 100 during the laser welding of the sealing plate 12 to the housing 11 of the energy storage device 10. Figure 5 This is a top view of the visualization system 100. Figure 5 Shown from the top side of the sealing plate 12 (refer to) Figure 4 ) Observe a top view of a portion of the devices and components included in the visualization system 100. In Figure 5 The illustration of sealing plate 12 is omitted in the text. (See example...) Figure 4 As shown, the visualization system 100 can be used to observe the state of the protective gas 17 during the welding process in the manufacture of the energy storage device 10.

[0028] like Figure 4 and Figure 5 As shown, the visualization system 100 includes an imaging device 21, a backlight 22, a first liquid crystal shutter 23, a second liquid crystal shutter 24, an image processing device 25, and a control device 26. Airflow occurs between the backlight 22 and the second liquid crystal shutter 24, between the second liquid crystal shutter 24 and the first liquid crystal shutter 23, and between the first liquid crystal shutter 23 and the imaging device 21. Typically, in the BOS schlieren method, the superposition of the flow in the space between the imaging device 21 and the pattern is calculated. In this embodiment, the visualization object space based on the visualization system 100 is the gap 101 between the first liquid crystal shutter 23 and the second liquid crystal shutter 24. Here, the airflow in the gap 101 is captured using the BOS schlieren method. In the BOS schlieren method, the density difference of gases, liquids (or transparent substances), etc., can be visualized.

[0029] The imaging device 21 captures patterns displayed on the first liquid crystal shutter 23 and patterns displayed on the second liquid crystal shutter 24. In this embodiment, the imaging device 21 acquires a first image and a second image. The first image and the second image will be described further later. The imaging device 21 has an imaging surface 21a. The imaging surface 21a is the surface facing the object to be photographed and is equipped with a lens. Figure 4 and Figure 5 As shown, the imaging device 21 is configured such that the imaging surface 21a faces the first liquid crystal shutter 23 and the second liquid crystal shutter 24. As the imaging device 21, for example, any imaging device used for this purpose can be used without particular limitation. From the viewpoint of achieving more accurate visualization through the visualization system 100, the imaging device 21 preferably has a telecentric lens. Although not particularly limited, for example, a BOS digital schlieren camera from La Vision Corporation can also be used as the imaging device 21.

[0030] The backlight 22 illuminates the imaging surface 21a of the imaging device 21. Figure 4 and Figure 5In the illustrated configuration, the backlight 22 is arranged facing the imaging surface 21a of the imaging device 21. In this embodiment, the backlight 22 is independent of and not integrated with the second liquid crystal shutter 24. The first liquid crystal shutter 23 and the second liquid crystal shutter 24 are sandwiched between the backlight 22 and the imaging device 21.

[0031] The first liquid crystal shutter 23 is a flat panel. The first liquid crystal shutter 23 is disposed on one side of the shooting device 21, between the shooting device 21 and the backlight 22. The first liquid crystal shutter 23 is positioned opposite the shooting device 21 and is arranged at an arbitrary distance from it. For example, a conventionally known liquid crystal shutter that can switch between a display mode and a transmission mode (described later) can be used as the first liquid crystal shutter 23 without any particular limitations.

[0032] The second LCD shutter 24 is a flat panel. The second LCD shutter 24 is positioned between the shooting device 21 and the backlight 22, closer to the backlight 22 than the first LCD shutter 23. One side of the second LCD shutter 24 faces the backlight 22 and is positioned at an arbitrary distance from it. The other side of the second LCD shutter 24 faces the first LCD shutter 23 and is positioned at an arbitrary distance from it. Figure 5 The configuration is performed with a gap of 101 in the middle. As the second LCD shutter 24, a known LCD shutter that can be switched to the display mode and transmission mode described later can be used without any particular limitation.

[0033] like Figure 4 and Figure 5 As shown, the first liquid crystal shutter 23 and the second liquid crystal shutter 24 are positioned opposite each other in the direction from the backlight 22 toward the imaging device 21. In this embodiment, from Figure 4 and Figure 5 Starting from the right side, arbitrary intervals are provided between the shooting device 21, the first LCD shutter 23, the second LCD shutter 24, and the backlight 22. Therefore, a gap 101 is provided between the first LCD shutter 23 and the second LCD shutter 24. Figure 5 As shown, airflow flows along the first liquid crystal shutter 23 and the second liquid crystal shutter 24 in the gap 101. Here, the airflow is the airflow of protective gas 17 ejected from the nozzle 17A.

[0034] The first liquid crystal shutter 23 and the second liquid crystal shutter 24 are respectively configured to switch between a transmission mode in which light from the backlight 22 passes through, and a pattern display mode in which a predetermined pattern is displayed by light from the backlight 22. The pattern in the pattern display mode is not particularly limited; it can be any pattern suitable for acquiring a schlieren image, such as a dot pattern, a grid pattern, or a stripe pattern. In this embodiment, when the first liquid crystal shutter 23 is ON, it is in the pattern display mode. When the first liquid crystal shutter 23 is OFF, it is in the transmission mode. When the second liquid crystal shutter 24 is ON, it is in the pattern display mode. When the second liquid crystal shutter 24 is OFF, it is in the transmission mode. Here, the switching between the pattern display mode (ON) and the transmission mode (OFF) in the first liquid crystal shutter 23 and the second liquid crystal shutter 24 is controlled by the control device 26 described later.

[0035] Figure 6 This is a schematic diagram illustrating the acquisition of the first image. In this embodiment, the first image is acquired when the first liquid crystal shutter 23 is in pattern display mode and the second liquid crystal shutter 24 is in transmission mode. At this time, as... Figure 6 As shown, since the second liquid crystal shutter 24 is in transmission mode, the light from the backlight 22 passes through the second liquid crystal shutter 24 and then enters the first liquid crystal shutter 23. Figure 6 Arrow A1). Since the first liquid crystal shutter 23 is in pattern display mode, a pattern is displayed on the first liquid crystal shutter 23 when it receives incident light from the backlight 22. The imaging device 21 acquires the pattern displayed on the first liquid crystal shutter 23 as the first image. Figure 6 Arrow A2).

[0036] Figure 7 This is a schematic diagram illustrating the acquisition of the second image. In this embodiment, the second image is acquired when the second liquid crystal shutter 24 is in pattern display mode and the first liquid crystal shutter 23 is in transmission mode. At this time, as... Figure 7 As shown, since the second liquid crystal shutter 24 is in pattern display mode, the second liquid crystal shutter 24 displays a pattern when it receives incident light from the backlight 22. Figure 7 Arrow B1). Since the first LCD shutter 23 is in transmission mode, the imaging device 21 acquires the pattern displayed on the second LCD shutter 24 as the second image. Figure 7 Arrow B2).

[0037] Image processing device 25 (reference) Figures 5-7The image processing device 25 is configured at any position within the visualization system 100. It processes the first and second images to acquire an image of the airflow flowing between the first liquid crystal shutter 23 and the second liquid crystal shutter 24 (here, gap 101). In this embodiment, the image processing device 25 processes the first image to acquire a first schlieren image caused by the flow of airflow in the space between the first liquid crystal shutter 23 and the imaging device 21 (here, gap 102). The image processing device 25 processes the second image to acquire a second schlieren image caused by the flow of airflow in the space between the second liquid crystal shutter 24 and the imaging device 21. Then, the image processing device 25 obtains the difference between the first and second schlieren images to acquire an image of the airflow flowing between the first liquid crystal shutter 23 and the second liquid crystal shutter 24 (here, gap 101). For example, any image processing device used for this purpose can be used without particular limitation as the image processing device 25.

[0038] Control device 26 (refer to) Figures 5-7 The control device 26 is configured to be located anywhere within the visualization system 100. It is configured to communicate with the imaging device 21, backlight 22, first LCD shutter 23, second LCD shutter 24, and image processing device 25, and to switch the devices on / off, adjust the output levels of each device, etc. Each function of the control device 26 can be implemented by a computer driven according to a predetermined program. The functions of the control device 26 are processed, for example, by the arithmetic unit (also called processor, CPU, MPU) and storage device (memory, hard disk, etc.) of the computer constituting the control device 26. The processing of the control device 26 can also be executed via sequence control of a microcomputer or the like.

[0039] In this embodiment, the control device 26 can alternately switch the state of the imaging device 21 for acquiring a first image and the state for acquiring a second image. In this case, the control device 26 can switch the subject of the imaging device 21 and switch the on / off state of the first liquid crystal shutter 23 and the second liquid crystal shutter 24. Here, when the first liquid crystal shutter 23 is in pattern display mode and the second liquid crystal shutter 24 is in transmission mode, the control device 26 causes the imaging device 21 to capture the pattern displayed on the first liquid crystal shutter 23, thereby acquiring the first image. On the other hand, when the first liquid crystal shutter 23 is in transmission mode and the second liquid crystal shutter 24 is in pattern display mode, the control device 26 causes the imaging device 21 to capture the pattern displayed on the second liquid crystal shutter 24, thereby acquiring the second image.

[0040] Figure 8This is a flowchart of a spatial visualization method. For example... Figure 8 As shown, this spatial visualization method includes a configuration step S1, a blowing step S2, an illumination step S3, a first switching step S4, a first imaging step S5, a second switching step S6, a second imaging step S7, an image processing step S8, and an airflow image acquisition step S9. Hereinafter, reference will be made as appropriate. Figures 4-8 Explain each step of this method.

[0041] In the configuration step S1, the various devices of the visualization system 100 and the object to be welded (here, the housing 11) are positioned at predetermined locations. In configuration step S1, the imaging device 21, backlight 22, first liquid crystal shutter 23, and second liquid crystal shutter 24 can be positioned relative to the object to be welded at predetermined locations. In this embodiment, the backlight 22, first liquid crystal shutter 23, and second liquid crystal shutter 24 can be configured such that their respective surface directions are along the direction of the protective gas 17 flow (see reference). Figure 3 ).

[0042] In the blowing process S2, shielding gas 17 is blown onto the workpiece to be welded. In this embodiment, in the blowing process S2, the control device 26 switches the supply source of the shielding gas 17 to on. Shielding gas 17 is blown onto the workpiece to be welded from nozzle 17A. Furthermore, the flow rate, speed, direction, etc., of the shielding gas 17 can be appropriately set.

[0043] In the illumination process S3, light is irradiated from the backlight 22. In this embodiment, during the illumination process S3, the control device 26 switches the backlight 22 to on. Furthermore, the output of the backlight 22 can be appropriately set.

[0044] In the first switching step S4, the modes of the first liquid crystal shutter 23 and the second liquid crystal shutter 24 are switched so that the imaging device 21 can acquire the first image. In this embodiment, in the first switching step S4, the control device 26 turns on the first liquid crystal shutter 23 to become a pattern display mode and turns off the second liquid crystal shutter 24 to become a transmission mode.

[0045] In the first shooting step S5, a first image is acquired. In this embodiment, in the first shooting step S5, the control device 26 causes the shooting device 21 to capture the pattern displayed on the first liquid crystal shutter 23. Based on the difference in the acquired images, the first shooting step S5 is preferably performed immediately after the first switching step S4 (i.e., immediately after becoming in a state where the first image can be acquired). For example, assuming the observed wind speed is 1 m / s and the calculated resolution of the captured image is 1 mm, a period of approximately 1 / 1000 of a second is preferred.

[0046] In the second switching step S6, the modes of the first liquid crystal shutter 23 and the second liquid crystal shutter 24 are switched so that the imaging device 21 can acquire the second image. In this embodiment, in the second switching step S6, the control device disconnects the first liquid crystal shutter 23 to enter the transmission mode and connects the second liquid crystal shutter 24 to enter the pattern display mode.

[0047] In the second shooting step S7, a second image is acquired. In this embodiment, in the second shooting step S7, the control device 26 causes the shooting device 21 to capture the pattern displayed on the second liquid crystal shutter 24. The second shooting step S7 is preferably performed immediately after the second switching step S6 (i.e., immediately after becoming in a state where the second image can be acquired).

[0048] In the image processing step S8, image processing is performed on the first image and the second image. In this embodiment, in the image processing step S8, the control device 26 causes the image processing device 25 to perform image processing on the first image and the second image to obtain a first schlieren image and a second schlieren image.

[0049] In the airflow image acquisition step S9, an image of the airflow flowing between the first liquid crystal shutter 23 and the second liquid crystal shutter 24 is acquired. In this embodiment, in the airflow image acquisition step S9, the control device 26 causes the image processing device 25 to obtain the difference between the first schlieren image and the second schlieren image obtained in the image processing step S8, thereby acquiring an image of the airflow flowing between the first liquid crystal shutter 23 and the second liquid crystal shutter 24 (here, gap 101).

[0050] Based on the airflow image acquired in the airflow image acquisition step S9, for example, the flow rate, speed, direction, etc. of the protective gas 17 determined in the blowing step S2 can be appropriately reset as needed.

[0051] The spatial visualization method described above can be suitably applied to an object being laser-welded. In this case, laser welding can begin, for example, after the blowing step S2. Furthermore, the order of the steps in the spatial visualization method can be appropriately changed as needed, provided that the effects of the present disclosure can be achieved. For example, the second image can be acquired before the first image is acquired.

[0052] As described above, the spatial visualization system 100 includes an imaging device 21, a backlight 22, a first liquid crystal shutter 23, a second liquid crystal shutter 24, and an image processing device 25. The imaging device 21 has an imaging surface 21a. The backlight 22 illuminates the imaging surface 21a of the imaging device 21. The first liquid crystal shutter 23 is flat and is disposed between the imaging device 21 and the backlight 22 on one side where the imaging device 21 is located. The second liquid crystal shutter 24 is flat and is disposed between the imaging device 21 and the backlight 22 on the side closer to the backlight 22 than the first liquid crystal shutter 23.

[0053] The first liquid crystal shutter 23 and the second liquid crystal shutter 24 are positioned opposite each other in the direction from the backlight 22 toward the imaging device 21. A gap 101 is provided between the first liquid crystal shutter 23 and the second liquid crystal shutter 24, allowing airflow to pass along both. The first liquid crystal shutter 23 and the second liquid crystal shutter 24 are configured to switch between a transmission mode that allows light from the backlight 22 to pass through and a pattern display mode that displays a predetermined pattern through the light from the backlight 22. The imaging device 21 acquires a first image and a second image. The first image is an image in a state where the first liquid crystal shutter 23 is in pattern display mode and the second liquid crystal shutter 24 is in transmission mode. The second image is an image in a state where the second liquid crystal shutter 24 is in pattern display mode and the first liquid crystal shutter 23 is in transmission mode. The image processing device 25 performs image processing on the first image and the second image to acquire an image of the airflow between the first liquid crystal shutter 23 and the second liquid crystal shutter 24 (here, the gap 101).

[0054] The visualization system 100 configured in this way can acquire a first image from the first liquid crystal shutter 23 constituting the visualization object space (gap 101) and a second image from the second liquid crystal shutter 24, and obtain the difference between the schlieren images based on the two images. Therefore, the movement of local airflow can be analyzed with higher precision in the visualization object space. As a result, for example, it can be confirmed that the protective gas 17 blown onto the welding object has been blown to the expected position, thereby improving the welding quality.

[0055] The visualization system 100 may also include a control device 26. The control device 26 may be configured to cause the imaging device 21 to alternately switch between acquiring a first image and acquiring a second image. Thus, for example, the first and second images can be acquired alternately. Therefore, it is possible to perform time-series analysis of the temporal changes in airflow in the visualized object space with higher precision.

[0056] The first liquid crystal shutter 23 and the second liquid crystal shutter 24 can also display different patterns. While not particularly limited, this method may include situations where the first liquid crystal shutter 23 displays a dot pattern and the second liquid crystal shutter 24 displays a stripe pattern, or where the first liquid crystal shutter 23 displays a vertical stripe pattern and the second liquid crystal shutter 24 displays a horizontal stripe pattern, etc. This improves the accuracy of differential calculations during image processing.

[0057] Alternatively, the first liquid crystal shutter 23 and the second liquid crystal shutter 24 can also display the same pattern. In this way, the effects of the technology disclosed herein can also be appropriately achieved.

[0058] The visualization system 100 may also include an interval adjustment mechanism (not shown) for adjusting the interval between the first liquid crystal shutter 23 and the second liquid crystal shutter 24. Therefore, since the interval between the first liquid crystal shutter 23 and the second liquid crystal shutter 24 can be appropriately adjusted, the effects of the technology disclosed herein can be appropriately achieved, for example, regardless of the size of the object being welded, the welding area, etc.

[0059] The visualization system 100 may also include a support member (not shown) that supports the shooting device 21, the backlight 22, the first LCD shutter 23, and the second LCD shutter 24. This allows the relative positions of the shooting device 21, the backlight 22, the first LCD shutter 23, and the second LCD shutter 24 to be fixed. Therefore, since the airflow at different locations can be analyzed simply by moving the position of the support member as needed, the analysis accuracy can be further improved.

[0060] The backlight 22 may also have a flat light-emitting surface that covers the display pattern in the second liquid crystal shutter 24. The light-emitting surface may also be mounted on the side opposite to the surface opposite the first liquid crystal shutter 23. This allows light to be irradiated onto the entire surface of the second liquid crystal shutter. Therefore, the shooting range of the airflow can be further expanded.

[0061] The imaging device 21 can also be equipped with a telecentric lens. This allows for the acquisition of a clearer image, thereby improving the accuracy of differential calculations.

[0062] The above describes the implementation methods of the technology disclosed herein, but the technology disclosed herein is not limited to the above-described implementation methods. The technology disclosed herein can include various modifications as long as they can achieve the desired effects.

[0063] For example, in the above embodiment, the backlight 22 and the second liquid crystal shutter 24 are independent. However, the technology disclosed herein is not limited to this. The backlight 22 and the second liquid crystal shutter 24 may also be integrated. In this case, there may be no gap between the backlight 22 and the second liquid crystal shutter 24.

[0064] Alternatively, in the above embodiments, the visualization system 100 is used for welding the housing 11 to the sealing plate 12. However, the technology disclosed herein is not limited to this. The visualization system 100 can also be used when constructing energy storage modules. Figure 9 It is a 3D view of the visualization system 100. Figure 9 This illustrates the use of the visualization system 100 to construct the energy storage module 1. For example... Figure 9 As shown, in the energy storage module 1, multiple energy storage devices 10 are arranged such that electrode terminals 13 and 14 mounted on the sealing plate 12 are adjacent to each other. A busbar 15 is provided between the electrode terminals 13 and 14. A laser welding machine 16 irradiates the busbar 15 with a laser beam 16A to weld the busbar 15, electrode terminals 13, and electrode terminals 14. During laser welding, a protective gas 17 is blown from a nozzle 17B. Figure 9 In the manner shown, the backlight 22, the first liquid crystal shutter 23, and the second liquid crystal shutter 24 can be configured such that their surface orientation is along the direction of the blowing protective gas 17.

[0065] The technology disclosed herein includes the contents described in the following items.

[0066] Item 1:

[0067] A visualization system for spatial visualization, comprising:

[0068] A shooting device, which has a shooting surface;

[0069] A backlight that illuminates the shooting surface of the shooting device.

[0070] The first LCD shutter is flat and is disposed on the side where the shooting device is located, between the shooting device and the backlight.

[0071] The second liquid crystal shutter, which is flat, is disposed between the aforementioned imaging device and the aforementioned backlight, on a side closer to the backlight than the aforementioned first liquid crystal shutter; and

[0072] Image processing device

[0073] The first liquid crystal shutter and the second liquid crystal shutter are positioned opposite each other in the direction from the backlight toward the shooting device.

[0074] A gap is provided between the first liquid crystal shutter and the second liquid crystal shutter, allowing airflow to flow along both the first and second liquid crystal shutters.

[0075] The first liquid crystal shutter and the second liquid crystal shutter are respectively configured to switch between a transmission mode in which light from the backlight passes through, and a pattern display mode in which light from the backlight displays a predetermined pattern.

[0076] The aforementioned imaging device acquires a first image in a state where the first liquid crystal shutter is in the pattern display mode and the second liquid crystal shutter is in the transmission mode, and a second image in a state where the second liquid crystal shutter is in the pattern display mode and the first liquid crystal shutter is in the transmission mode.

[0077] The image processing apparatus performs image processing on the first image and the second image to obtain an image of the airflow flowing between the first liquid crystal shutter and the second liquid crystal shutter.

[0078] Item 2:

[0079] According to the spatial visualization system described in item 1, among which,

[0080] It also has a control device.

[0081] The control device is configured to alternately switch the shooting device between acquiring the first image and acquiring the second image.

[0082] Item 3:

[0083] According to the spatial visualization system described in item 1 or 2, wherein,

[0084] The first LCD shutter and the second LCD shutter mentioned above display different patterns.

[0085] Item 4:

[0086] According to any one of items 1 to 3, a spatial visualization system is used, wherein,

[0087] It also includes an interval adjustment mechanism that adjusts the interval between the first LCD shutter and the second LCD shutter.

[0088] Item 5:

[0089] According to any one of items 1 to 4, a spatial visualization system is used, wherein,

[0090] It also includes a support component that supports the aforementioned shooting device, the aforementioned backlight, the aforementioned first LCD shutter, and the aforementioned second LCD shutter.

[0091] Item 6:

[0092] According to any one of items 1 to 5, a spatial visualization system is used, wherein,

[0093] The aforementioned backlight has a flat light-emitting surface that covers the surface in the second liquid crystal shutter where the pattern is displayed.

[0094] The aforementioned light-emitting surface is mounted on the side opposite to the surface opposite to the aforementioned first liquid crystal shutter.

[0095] Item 7:

[0096] According to any one of items 1 to 6, a spatial visualization system is used, wherein,

[0097] The aforementioned imaging device is equipped with a telecentric lens.

Claims

1. A visualization system for spatial visualization, characterized in that, have: A shooting device, which has a shooting surface; A backlight that illuminates the shooting surface of the shooting device; The first liquid crystal shutter is flat and is disposed on one side of the shooting device, between the shooting device and the backlight. A second liquid crystal shutter, which is flat, is disposed between the shooting device and the backlight, on a side closer to the backlight than the first liquid crystal shutter; and Image processing device The first liquid crystal shutter and the second liquid crystal shutter are positioned opposite each other in the direction from the backlight toward the shooting device. A gap is provided between the first liquid crystal shutter and the second liquid crystal shutter, allowing airflow to flow along both the first and second liquid crystal shutters. The first liquid crystal shutter and the second liquid crystal shutter are respectively configured to switch between a transmission mode in which light from the backlight passes through, and a pattern display mode in which light from the backlight displays a predetermined pattern. The imaging device acquires a first image in a state where the first liquid crystal shutter is in the pattern display mode and the second liquid crystal shutter is in the transmission mode, and a second image in a state where the second liquid crystal shutter is in the pattern display mode and the first liquid crystal shutter is in the transmission mode. The image processing device performs image processing on the first image and the second image to obtain an image of the airflow flowing between the first liquid crystal shutter and the second liquid crystal shutter.

2. The spatial visualization system according to claim 1, characterized in that, It also has a control device. The control device is configured to alternately switch the shooting device between acquiring the first image and acquiring the second image.

3. The spatial visualization system according to claim 1 or 2, characterized in that, The first LCD shutter and the second LCD shutter display different patterns.

4. The spatial visualization system according to claim 1 or 2, characterized in that, It also has an interval adjustment mechanism that adjusts the interval between the first LCD shutter and the second LCD shutter.

5. The spatial visualization system according to claim 1 or 2, characterized in that, It also includes a support component that supports the shooting device, the backlight, the first LCD shutter, and the second LCD shutter.

6. The spatial visualization system according to claim 1 or 2, characterized in that, The backlight has a flat light-emitting surface that covers the surface in the second liquid crystal shutter that displays the pattern. The light-emitting surface is mounted on the side opposite to the surface opposite the first liquid crystal shutter.

7. The spatial visualization system according to claim 1 or 2, characterized in that, The imaging device is equipped with a telecentric lens.

Images