A waste gas treatment device for electronic special material research and development production

Abstract

The application discloses an electronic special material research and development production waste gas treatment device, and relates to the technical field of waste gas treatment, which comprises a filtering mechanism for intercepting silicon powder and resin particles in waste gas; the device comprises a shell which is fixedly arranged and in which an arc surface one and an arc surface two are arranged respectively; a fan is installed in the air outlet end of the shell; a frame body is rotatably arranged in the shell and is matched with the arc surface one at the upper end and with the arc surface two at the lower end; and a filter screen is installed on the frame body. The differential pressure linkage self-adapting regulation and control can automatically clean and reduce the shutdown frequency, save energy and reduce consumption. The frame body is deflected by the pressure difference before and after the filter screen, the circuit resistance is synchronously adjusted, the fan and the spraying pump load are dynamically matched with the dust content, the power is automatically reduced under the low dust condition, the equipment operation energy consumption is significantly reduced, the linkage brush automatically scrapes the surface dust when the frame body rotates, the frequency of manually disassembling and washing the filter screen is greatly reduced, the continuous operation of the electronic production line waste gas treatment is ensured, and the production continuity is improved.

Description

Technical Field

[0001] This invention relates to the field of waste gas treatment technology, and in particular to a waste gas treatment device for the research and production of electronic special materials. Background Technology

[0002] The synthesis and processing of electronic special materials will generate mixed waste gas containing silicon powder, resin sticky dust, acid and alkali mist and organic volatile solvents. Waste gas treatment equipment is required to filter, spray and adsorb the waste gas.

[0003] However, in practical applications, there are still some unresolved problems. The following are some common problems of waste gas treatment devices used in the research and production of electronic special materials: After the traditional filter screen accumulates dust, the wind resistance continues to increase, and the fan and spray still operate at a constant power, resulting in a decrease in the waste gas throughput and untimely treatment; the filter screen has no automatic cleaning structure, and dust accumulates and blocks it quickly, requiring frequent shutdowns for disassembly and cleaning, which affects the continuous production of the production line; there is no differential pressure linkage speed regulation system, and the air volume and spray flow are insufficient when there is a lot of dust, resulting in the waste gas purification not meeting the standards. Summary of the Invention

[0004] The purpose of this section is to outline some aspects of embodiments of the present invention and to briefly describe some preferred embodiments. Simplifications or omissions may be made in this section, as well as in the abstract and title of this application, to avoid obscuring the purpose of these documents; however, such simplifications or omissions should not be construed as limiting the scope of the invention.

[0005] In view of the problems existing in the above and / or existing waste gas treatment devices for the research and production of electronic special materials, the present invention is proposed.

[0006] Therefore, the problem to be solved by this invention is how to solve the problems of increased wind resistance after dust accumulation on the filter screen, inability of the fan and spray pump to automatically adjust power, inability of the filter screen to be cleaned automatically, easy clogging by silicon powder and resin dust, and frequent shutdowns for disassembly and cleaning.

[0007] To solve the above-mentioned technical problems, the present invention provides the following technical solution: a waste gas treatment device for the research and production of electronic special materials, comprising: a filtration mechanism for intercepting silicon powder and resin particles in the waste gas; comprising: a housing, fixedly installed, with an arc surface one and an arc surface two respectively disposed inside the housing; a fan installed in the outlet end of the housing; a frame, rotating inside the housing, with the upper end of the frame engaging with the arc surface one and the lower end engaging with the arc surface two; a filter screen installed on the frame for intercepting silicon powder and resin particles in the waste gas; when the filter screen accumulates dust and its resistance increases, the filter screen and the frame rotate under the pressure difference of the fan to change the windward state of the filter screen; and a variable resistance component installed in... The system includes: a housing and frame, connected to the fan in the same circuit; a cleaning assembly, installed on the frame and housing, used to clean floating dust when the filter screen rotates and changes its windward position; a manual backflushing component, installed on the housing and frame, with one end connected to an external water supply device via a pipe; two ash discharge frames, symmetrically connected to the bottom of the housing, each with a removable cover; a spray mechanism, connected to the air outlet of the housing via a pipe, used to wash away aerosols and soluble impurities in the exhaust gas, with the spray pump and variable resistance assembly connected to the same circuit; and an adsorption mechanism, connected to the air outlet of the spray mechanism via a pipe, used to adsorb organic solvents in the exhaust gas.

[0008] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the frame body is provided with a channel, the inner surface of the frame body is provided with liquid outlet holes distributed in a circumferential manner for rinsing the filter screen, the outer surface of the frame body is provided with circular holes distributed in a circumferential manner, and a valve sleeve is fixed in the circular hole, the valve sleeve having a micropore in the middle.

[0009] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the variable resistance assembly includes: a rotating column, which is rotatably connected to the housing via a sealed bearing, and one end of which is fixed to the upper half of one side of the frame. The rotating column is concentric with arc surface one and arc surface two; a variable resistor, which is insulated and installed on one side of the housing; an insulating rod, which is fixed to the end of the rotating column located outside the housing; and a conductive ring, which is fixed to one end of the insulating rod and cooperates with the variable resistor. The variable resistor and the conductive ring are connected to the same circuit as the spray pump used by the fan and the spray mechanism.

[0010] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the variable resistance assembly further includes: a short block one, fixed to one side of the housing; a short block two, fixed to one side of the housing; an arc rod, with its two ends fixed between the surfaces of the short block one and the short block two, respectively; a connecting plate, with one end fixed to the surface of the rotating column and the other end slidably sleeved on the surface of the arc rod; and a spring one, sleeved on the surface of the arc rod, with its two ends fixed between the surface of the short block two and the surface of one end of the connecting plate, respectively.

[0011] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the cleaning component includes: four fixing blocks, symmetrically distributed and fixed at the four corners of one side of the frame; two guide rods, symmetrically distributed and fixed between the corresponding two fixing blocks; two sliding sleeves, slidably fitted onto the surfaces of the two guide rods; a mounting plate, with both ends fixed between the surfaces of the two sliding sleeves; a cleaning brush, fixed to one side of the mounting plate by screws, used for cleaning the filter screen side; and two springs, fitted onto the surfaces of the guide rods, with both ends fixed between the surfaces of the fixing blocks and the sliding sleeves, respectively.

[0012] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the inner wall of the housing is provided with an arc groove, and the cleaning component further includes: a baffle one, fixed to the bottom of one side of the frame; a baffle two, fixed to the bottom of the other side of the frame, and both baffle one and baffle two cooperate with the arc groove; a fixed pulley, fixed to the top of one side of the frame; a rope, the two ends of which are respectively fixed to the surface of the mounting plate and the inner wall of the arc groove, and the rope passes through baffle one, the frame and baffle two respectively, and each of baffle one, the frame and baffle two is provided with a slot hole to cooperate with the movement of the rope, and the rope passes around the fixed pulley and cooperates with it; a round rod, the two ends of which are fixed between the surfaces of the two fixed blocks below, and cooperate with the rope.

[0013] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the manual backflushing component includes: a cylinder, which rotates on one side of the housing via a sealed bearing, and one end is fixed to the upper half of one side of the frame and connected to the channel; the cylinder is concentric with arc surface one and arc surface two; a circular shell, which is fixed to one side of the housing and sleeved on the surface of the cylinder via a sealed bearing; a water inlet pipe, one end of which is fixed to the circular shell and connected to the circular shell; a valve column, which slides inside the cylinder; through holes, which are arranged in a circumferential array on the surface of the cylinder; valve holes, which are arranged in a circumferential array on the surface of the valve column and cooperate with the through holes; and a valve stem, which slides through the cylinder and one end is fixed to the surface of the valve column.

[0014] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the manual backflush component further includes: a permanent magnet, which is fixedly sleeved on the surface of the valve stem by a support rod; an electromagnet, which is fixed to one side of the cylindrical shell and sleeved on the surface of the cylinder, and connected to the fan in the same circuit; a spring three, which is sleeved on one end of the valve stem and whose two ends are respectively fixed between the inner wall of the cylinder and the surface of the valve column; and a guide bar, which is fixed to the surface of the valve stem and slides through the cylinder.

[0015] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, wherein: limit blocks are fixed at all four corners on one side of the frame, and the limit blocks abut against the filter screen; a fixing mechanism is installed at all four corners on the other side of the frame for limiting and fixing the filter screen on the frame; the fixing mechanism includes: a short column, fixed to one side of the frame; a stop block, rotatably sleeved on the surface of the short column, for limiting and fixing the filter screen; a torsion spring, sleeved on the surface of the short column, with its two ends respectively fixed between the surface of the stop block and the surface of the short column; a square column, fixed to one side of the frame; a retaining plate, slidably sleeved on the surface of the square column and cooperating with the stop block; a square block, fixed to one end of the square column; and a spring four, sleeved on the surface of the square column, with its two ends respectively fixed between the surface of the retaining plate and the surface of the square block.

[0016] As a preferred embodiment of the waste gas treatment device for the research and production of electronic special materials described in this invention, the inner wall of the housing is fixed with a limiting plate, which cooperates with the upper end of the frame, and a detachable door is installed on one side of the housing.

[0017] The beneficial effects of this invention are as follows: 1. Differential pressure linkage adaptive control, automatic cleaning reduces the frequency of shutdowns, saves energy and reduces consumption. The frame is driven to deflect by the differential pressure before and after the filter screen, and the circuit resistance is adjusted synchronously to realize the dynamic matching of the load of the fan and spray pump with the dust content. The power is automatically reduced in low dust conditions, which significantly reduces the energy consumption of the equipment. When the frame rotates, the linkage brush automatically scrapes off the surface dust, which greatly reduces the number of times the filter screen is manually disassembled and cleaned, ensures the continuous operation of the exhaust gas treatment of the electronic production line, and improves the continuity of production.

[0018] 2. Integrated high-pressure backwashing and linkage purification ensure stable cleaning and purification. It is equipped with an independent external high-pressure water circuit manual backwashing system, which can thoroughly rinse the deep adhesive resin and dust accumulation on the filter screen when the machine is stopped, solving the problem that dry sweeping cannot remove the sticky dust and extending the service life of the filter screen. The filtration and spraying units are electrically linked, and the spraying water volume is increased synchronously when the dust load increases, ensuring stable removal of acid and alkali mists and soluble impurities. Attached Figure Description

[0019] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the following description of the embodiments will be briefly introduced. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 A scene depicting a waste gas treatment device used in the research and development and production of electronic special materials.

[0021] Figure 2 Partial three-dimensional cross-section of a waste gas treatment device for the research and production of electronic special materials Figure 1 .

[0022] Figure 3 A partial sectional perspective view of the enclosure of a waste gas treatment device for the research and production of electronic special materials.

[0023] Figure 4 Partial sectional three-dimensional view of the waste gas treatment device for the research and production of electronic special materials Figure 2 .

[0024] Figure 5 Partial sectional perspective view of the shell and cylinder of the waste gas treatment device for the research and production of electronic special materials.

[0025] Figure 6 Partial sectional perspective view of the filter screen and baffle of the waste gas treatment device for the research and production of electronic special materials.

[0026] Figure 7 A diagram showing the filter screen of an exhaust gas treatment device used in the research and production of electronic special materials in a certain windward state.

[0027] Figure 8 Waste gas treatment device for the research and development and production of electronic special materials Figure 2 Enlarged view of point A in the middle.

[0028] In the diagram: 1. Filtering mechanism; 11. Housing; 12. Fan; 13. Frame; 14. Filter screen; 15. Variable resistance assembly; 16. Cleaning assembly; 17. Manual backflushing component; 18. Ash discharge frame; 19. Door; 2. Spraying mechanism; 3. Adsorption mechanism; 111. Arc surface one; 112. Arc surface two; 113. Arc groove; 114. Limiting plate; 131. Channel; 132. Liquid outlet; 133. Valve sleeve; 134. Limiting block; 151. Rotating column; 152. Variable resistance; 153. Insulating rod; 154. Conductive ring; 155. Short block one; 156. Short block two; 157. Arc rod; 158. Connecting plate; 159. Spring one; 1510. Cover; 161. Fixing block; 162. Guide rod; 163. Sliding sleeve; 164. Mounting plate; 165. Cleaning brush; 166. Spring 2; 167. Baffle 1; 168. Baffle 2; 169. Fixed pulley; 1610. Round rod; 1611. Rope; 171. Cylinder; 172. Round shell; 173. Water inlet pipe; 174. Valve column; 175. Through hole; 176. Valve hole; 177. Valve stem; 178. Permanent magnet; 179. Electromagnet; 1710. Spring 3; 1711. Guide bar; 1712. Abutment ring; 1713. Handwheel; 181. Cover; 4. Fixing mechanism; 41. Short column; 42. Stop block; 43. Torsion spring; 44. Square column; 45. Clamping plate; 46. Square block; 47. Spring 4. Detailed Implementation

[0029] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0030] Many specific details are set forth in the following description in order to provide a full understanding of the invention. However, the invention may also be practiced in other ways different from those described herein, and those skilled in the art can make similar extensions without departing from the spirit of the invention. Therefore, the invention is not limited to the specific embodiments disclosed below.

[0031] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The phrase "in one embodiment" appearing in different places in this specification does not necessarily refer to the same embodiment, nor is it a single or selective embodiment that is mutually exclusive with other embodiments.

[0032] Example 1, referring to Figures 1-4 This is the first embodiment of the present invention. This embodiment provides a waste gas treatment device for the research and development and production of electronic special materials. The waste gas treatment device for the research and development and production of electronic special materials includes a filtration mechanism 1, a spraying mechanism 2 and an adsorption mechanism 3.

[0033] Specifically, the filter mechanism 1 is used to intercept silicon powder and resin particles in the exhaust gas; it includes: a housing 11, which is fixedly installed, and an arc surface 111 and an arc surface 112 are respectively provided inside the housing 11; a fan 12, which is installed in the exhaust end of the housing 11; and a frame 13, which rotates inside the housing 11, with the upper end of the frame 13 cooperating with the arc surface 111 and the lower end cooperating with the arc surface 112. The exhaust gas pipeline of the material research and development production line is connected to the air inlet end of the housing 11. The arc surface 111 and the arc surface 112 serve as the upper and lower limit guides for the rotation of the frame 13. The frame 13 is sealed with the inner wall of the housing 11.

[0034] The filter screen 14, installed on the frame 13, is used to trap silicon powder and resin particles in the exhaust gas. When the filter screen 14 accumulates dust and its resistance increases, the filter screen 14 and the frame 13 rotate under the pressure difference of the fan 12 to change the windward state of the filter screen 14. The fan 12 provides negative pressure suction power for the entire exhaust gas system, generating a pressure difference. The exhaust gas passes through the filter screen 14, forming a pressure difference. The more dust accumulates on the filter screen 14, the greater the pressure difference. The filter screen 14 is laid flat and fixed on the frame 13. The clean filter screen 14 has low wind resistance, and the frame 13 remains vertical and windward. After the filter screen 14 accumulates silicon powder and resin particles, the wind resistance increases, and the pressure difference pushes the frame 13 to automatically deflect and switch the windward angle. The filter screen 14 is made of PTFE membrane corrosion-resistant filter screen, which is suitable for silicon powder and sticky resin dust. It has both air permeability and trapping capacity. It achieves passive rotation and windward face change by relying on the pressure difference of the fan 12 and the rotational eccentric design of the frame 13, without the need for a separate motor drive.

[0035] The variable resistance component 15 is installed on the housing 11 and the frame 13 and is connected to the fan 12 in the same circuit. The variable resistance component 15 is an electrically linked component. The frame 13 rotates synchronously to adjust the resistance, synchronously control the power of the fan 12 and the flow rate of the delivery pump of the spray mechanism 2. The filter screen 14 accumulates dust. The greater the deflection of the frame 13, the greater the resistance adjustment range, and automatically matches the air volume and spray water volume.

[0036] The cleaning component 16, installed on the frame 13 and housing 11, is used to clean floating dust when the filter screen 14 rotates and changes its windward orientation. The cleaning component 16 is a purely mechanical linkage structure. When the frame 13 rotates and changes its windward orientation, it simultaneously scrapes and cleans the floating dust on the surface of the filter screen 14, removing loose silica powder from the surface. It requires no additional power and relies on the rotation stroke of the frame 13 to trigger the cleaning. After the filter screen 14 dynamically rotates and tilts, the floating dust is less likely to accumulate on one side of the filter screen 14. With the tilted posture, the floating dust is easily collected at the tilted end of the filter screen 14 with the airflow, which reduces the overall blockage of the filter screen 14. Furthermore, during the rotation of the frame 13 and the filter screen 14 after the machine is stopped and the power is turned off, the lower end of the frame 13 can push and sweep the accumulated dust on one side of the frame 13 into the dust discharge frame 18.

[0037] The manual backflushing component 17 is installed on the housing 11 and the frame 13, and one end is connected to the water supply equipment through a pipe. There are two ash discharge frames 18, which are symmetrically connected to the bottom of the housing 11. The bottom of the ash discharge frame 18 is equipped with a detachable cover 181. With the setting of the manual backflushing component 17, when the power is off for maintenance, the cover 181 on the ash discharge frame 18 can be opened to manually switch the high-pressure water to flush the filter screen 14 to deeply bond the resin and silica powder, and deeply clean the filter screen 14. The water flow channel is integrated inside the rotating frame 13 and rotates synchronously with the frame 13 without water leakage interference. All the dust and sewage that are swept and backflushed fall into the ash discharge frame 18. The cover is opened regularly to remove sludge and dust, and the seal is sealed to prevent exhaust gas from leaking out.

[0038] Specifically, the spray mechanism 2 is connected to the air outlet of the shell 11 through a pipe, and is used to wash away the aerosol and soluble impurities in the exhaust gas. The spray delivery pump used in the spray mechanism 2 is connected to the variable resistance component 15 in the same circuit. The spray mechanism 2 directly adopts the industrial general exhaust gas spray scrubbing tower. The internal packing, spray pipe, atomizing nozzle, circulating water tank, liquid level monitoring, and demisting layer are all existing mature structures and existing technologies. The working principle of this part is also existing technology, which can be clearly understood by those skilled in the art, and will not be described in detail here. The spray liquid can be pure water or neutralized liquid to wash away soluble salts, acid and alkali aerosols, and fine dust in the exhaust gas. The spray delivery pump and the variable resistance component 15 are connected in series in the same circuit, and the spray flow rate is automatically adjusted according to the degree of dust accumulation on the filter screen 14.

[0039] Specifically, the adsorption mechanism 3 is connected to the air outlet of the spray mechanism 2 through a pipe and is used to adsorb organic solvents in the waste gas. The adsorption mechanism 3 receives the dehumidified waste gas after spraying. The adsorption mechanism 3 is a drawer-type activated carbon adsorption device, which is existing technology. The working principle of this part is also existing technology, which can be clearly understood by those skilled in the art, and will not be described in detail here. It adsorbs organic solvents such as toluene and xylene in electronic manufacturing processes in the waste gas. The drawer type allows the activated carbon to be pulled out and replaced. The activated carbon drawer needs to be pulled out and replaced regularly to avoid losing its adsorption capacity after the organic solvents become saturated.

[0040] Example 2, refer to Figures 2-8 This is the second embodiment of the present invention, which is based on the previous embodiment.

[0041] Specifically, a channel 131 is provided inside the frame 13, which serves as the main channel for high-pressure backwash water. The channel 131 surrounds the inner side of the frame 13. The inner surface of the frame 13 has liquid outlet holes 132 distributed around the periphery for rinsing the filter screen 14. The outer surface of the frame 13 has circular holes distributed around the periphery, and a valve sleeve 133 is fixed inside the circular holes. The valve sleeve 133 has micropores in the middle.

[0042] The liquid outlet 132 is directly opposite the center of the outer ring of the filter screen 14. The diameter and density of the liquid outlet 132 are balanced to ensure that the flushing intensity of the filter screen 14 is consistent from top to bottom and left to right, with no dead corners. When the machine is stopped for maintenance and cleaning, high-pressure water is sprayed outward from the liquid outlet 132 to achieve reverse flushing of the filter screen 14. When the valve sleeve 133 is not under water pressure, that is, in the normal state, the size of the micropores on it cannot allow silicon powder and resin particles to pass through. When the flushing water pressure is too high, the excess water flow applies pressure to the valve sleeve 133 and releases it from the micropores to balance the water pressure inside the frame 13 and prevent the filter screen 14 from being deformed by excessive water pressure. At the same time, water is discharged from the micropores on the valve sleeve 133. When the frame 13 and the filter screen 14 are manually rotated back and forth, the discharged water can flush the inner wall of the housing 11 and the accumulated dust, and is discharged along the dust discharge frame 18.

[0043] After the manual backflushing component 17 is filled with high-pressure cleaning water, the water enters the internal channel 131 of the frame 13. Part of the water directly flushes the filter screen 14 through the liquid outlet 132 on the inner wall, and part of the water is discharged from the micro-holes on the valve sleeve 133 to rinse the inner wall and structural parts of the housing 11. When the water pressure in the channel 131 continues to rise, the excess water will pass through the valve sleeve 133 to expand the micro-holes to release pressure and stabilize the water pressure.

[0044] Specifically, the variable resistor assembly 15 includes: a rotating column 151, which is rotatably connected to the housing 11 via a sealed bearing, and one end is fixed to the upper half of one side of the frame 13. The rotating column 151 is concentric with the first arc surface 111 and the second arc surface 112. The sealed bearing is a corrosion-resistant sealed bearing. The rotation of the frame 13 synchronously drives the rotating column 151 to rotate coaxially. The sealed bearing prevents exhaust gas and water vapor from leaking out from the gap of the rotating shaft; a variable resistor 152, which is insulated and installed on one side of the housing 11; an insulating rod 153, which is fixed to one end of the rotating column 151 located outside the housing 11; and a conductive ring 154, which is fixed to one end of the insulating rod 153 and cooperates with the variable resistor 152. The variable resistor 152 and the conductive ring 154 are connected to the same circuit as the fan 12 and the spray delivery pump used by the spray mechanism 2.

[0045] The rheostat 152 is a linear sliding adjustable resistor, and the insulation isolation prevents the housing 11 from conducting short circuits. This is existing technology, and the working principle of this part is also existing technology, which can be clearly understood by those skilled in the art, so it will not be described in detail here. The conductive ring 154 slides and fits against the resistive contact surface of the rheostat 152. The rotation of the frame 13 drives the insulating rod 153 and the conductive ring 154 to swing synchronously, changing the effective resistance length of the rheostat 152 connected to the circuit. The rheostat 152, the conductive ring 154, the fan 12 and the spray pump are connected in series in the same power supply circuit. The change in resistance synchronously adjusts the working power of the two devices.

[0046] The filter screen 14 is clean and the frame 13 is vertical. The deflection angle of the rotating column 151 is small, the conductive ring 154 is in the high resistance region of the rheostat 152, the total resistance of the circuit is large, and there are few particles at this time. This indicates that the content of substances that need to be treated in the exhaust gas is small at this stage. The fan 12 and the spray pump operate at low power, and the exhaust gas is treated with small air volume and small spray flow, which is suitable for low ventilation load and reduces energy consumption.

[0047] Dust accumulates on the filter screen 14, and the frame 13 rotates and deflects: the rotating column 151 rotates synchronously, and the insulating rod 153 drives the conductive ring 154 to slide towards the low resistance zone of the rheostat 152, reducing the circuit resistance and increasing the circuit current. The fan 12 automatically increases the air volume, and the spray pump automatically increases the spray flow. The large air volume and large spray flow treat the exhaust gas, avoiding the filter screen 14 from being clogged and insufficient air volume leading to untimely exhaust gas discharge.

[0048] Specifically, the variable resistance assembly 15 also includes: a short block 155, fixed to one side of the housing 11; a short block 156, fixed to one side of the housing 11; an arc rod 157, with its two ends fixed between the surfaces of the short block 155 and the short block 156 respectively, the arc center of the arc rod 157 coinciding with the rotation center of the rotating column 151 and matching the swing trajectory of the conductive ring 154; a connecting plate 158, one end of which is fixed to the surface of the rotating column 151, and the other end is slidably sleeved on the surface of the arc rod 157, the connecting plate 158 sliding along the arc of the arc rod 157 when the rotating column 151 rotates; a spring 159, sleeved on the surface of the arc rod 157, with its two ends fixed between the surface of the short block 156 and one end of the connecting plate 158 respectively; and a cover 1510, fixed to one side of the housing 11 by screws.

[0049] Under normal conditions, spring 159 provides a reset force, pushing frame 13 to rotate to a vertical, windward position. Cover 1510 completely encloses all electrical adjustment parts, including rheostat 152, conductive ring 154, arc rod 157, and spring 159, preventing workshop dust and acid / alkali mist from corroding electrical components and facilitating disassembly, inspection, and replacement of resistors.

[0050] The pressure difference caused by the accumulated dust pushes the frame 13 to deflect. The rotating column 151 drives the connecting plate 158 to slide along the arc rod 157. The connecting plate 158 moves towards the short block 156 to compress the spring 159. The spring 159 stores elastic potential energy. After the filter screen 14 is cleaned or the fan 12 is stopped, the pressure difference decreases. The spring 159 releases its elastic force to push the connecting plate 158 back along the arc rod 157, causing the rotating column 151 and the frame 13 to rotate back to the vertical windward position. The conductive ring 154 synchronously resets to the high resistance range.

[0051] Specifically, the cleaning component 16 includes: four fixing blocks 161, symmetrically distributed and fixed at the four corners of one side of the frame 13; two guide rods 162, symmetrically distributed and fixed between the corresponding two fixing blocks 161; two sliding sleeves 163, slidably fitted on the surfaces of the two guide rods 162, and the sliding sleeves 163 can slide horizontally back and forth along the guide rods 162; a mounting plate 164, with both ends fixed between the surfaces of the two sliding sleeves 163; a cleaning brush 165, fixed to one side of the mounting plate 164 by screws, used for cleaning one side of the filter screen 14, the cleaning brush 165 is a PP corrosion-resistant soft brush, suitable for cleaning silicon powder and resin dust; and a second spring 166, fitted on the surface of the guide rod 162, with both ends fixed between the surfaces of the fixing blocks 161 and the sliding sleeves 163 respectively. Under normal conditions, the second spring 166 pushes the sliding sleeves 163 to retract the cleaning brush 165 to the lower side of the frame 13, and the brush does not contact the filter screen 14.

[0052] The inner wall of the housing 11 is provided with an arc groove 113, the arc of which is consistent with the rotation trajectory of the frame 13. The cleaning component 16 also includes: a first baffle 167, fixed to the bottom of one side of the frame 13; a second baffle 168, fixed to the bottom of the other side of the frame 13, and both the first baffle 167 and the second baffle 168 cooperate with the arc groove 113; a fixed pulley 169, fixed to the top of one side of the frame 13, which changes the direction of the tension of the rope 1611; and a rope 1611, the two ends of which are respectively fixed to the surface of the mounting plate 164 and the inner wall of the arc groove 113. The first baffle 167, the frame 13, and the second baffle 168 are respectively passed through. Each of the three baffles has a slot for the movement of the rope 1611. The rope 1611 passes over the fixed pulley 169 and engages with it. The round rod 1610 has its two ends fixed between the surfaces of the two fixed blocks 161 below and engages with the rope 1611. When the frame 13 rotates, the frame 13 and the arc groove 113 are relatively displaced, pulling the rope 1611. The round rod 1610 serves as a support and guide for the middle part of the rope 1611 to prevent the rope 1611 from sagging and getting stuck.

[0053] Both baffle 167 and baffle 218 are sealed to the arc surface 212 on the housing 11. Both baffle 167 and baffle 218 are arc-shaped and fit with the arc surface 212. When the baffle 167 and baffle 218 rotate with the frame 13, they act to shield the arc groove 113 and prevent dust particles from entering the arc groove 113. The rope 1611 is sealed to the slot on the frame 13 that allows it to move, so as to prevent exhaust gas from passing through between them. The rope 1611 is made of acid and alkali resistant and corrosion resistant nylon rope. The edges of the slots on baffle 167 and baffle 218 are rounded to prevent cutting and abrasion of the rope 1611.

[0054] Dust accumulation on the filter screen 14 creates a pressure difference, causing the frame 13 to rotate along the arc surface. The frame 13 and the arc groove 113 on the housing 11 generate relative displacement, continuously tightening the rope 1611. The rope 1611 passes around the fixed pulley 169, pulling the mounting plate 164 and the sliding sleeve 163 to slide along the guide rod 162. The cleaning brush 165 moves horizontally against the surface of the filter screen 14, scraping off the loose silica powder dust on the surface of the filter screen 14. When the frame 13 returns to its original position and rotates back, the tension of the rope 1611 is released, and the spring 166 pushes the cleaning brush 165 to retract, completing dynamic cleaning under dynamic conditions.

[0055] Example 3, referring to Figures 1 to 8 This is the third embodiment of the present invention, which is based on the first two embodiments.

[0056] Specifically, the manual backflush component 17 includes: a cylinder 171, which rotates on one side of the housing 11 via a sealed bearing, and one end is fixed to the upper half of one side of the frame 13 and connected to the channel 131. The cylinder 171 is concentric with the first arc surface 111 and the second arc surface 112. The sealed bearing is a corrosion-resistant sealed bearing, and the cylinder 171 rotates synchronously and coaxially with the frame 13; a circular shell 172, which is fixed to one side of the housing 11 and sleeved on the surface of the cylinder 171 via a sealed bearing; a water inlet pipe 173, one end of which is fixed to the circular shell 172 and connected to the circular shell 172; a valve stem 174, which slides inside the cylinder 171; through holes 175, which are arranged in a circumferential array on the surface of the cylinder 171; valve holes 176, which are arranged in a circumferential array on the surface of the valve stem 174 and cooperate with the through holes 175; and a valve stem 177, which slides through the cylinder 171 and one end is fixed to the surface of the valve stem 174.

[0057] Under manual operation, continuous water supply can be achieved in a rotating state. The circular shell 172 covers the outer wall of the cylindrical cylinder 171 through a sealed bearing, and an annular water supply cavity is formed inside the circular shell 172. The water inlet pipe 173 is connected to a pure water supply device, and water is introduced into the annular cavity of the circular shell 172. The valve column 174 is sealed with the cylindrical cylinder 171. Through the setting of the through hole 175 and the valve hole 176, the axial movement of the valve column 174 can align / misalign the through hole 175 and the valve hole 176 to realize the water circuit opening and closing. Pushing and pulling the valve rod 177 can control the water supply switch.

[0058] The manual backflush component 17 also includes: a permanent magnet 178, which is fixedly sleeved on the surface of the valve stem 177 by a support rod, and the permanent magnet 178 moves axially synchronously with the valve stem 177; an electromagnet 179, which is fixed on one side of the cylindrical shell 172 and sleeved on the surface of the cylindrical cylinder 171, and is connected to the same circuit as the fan 12. When the fan 12 starts and generates negative pressure, the electromagnet 179 is synchronously energized to generate a magnetic field, which repels the permanent magnet 178 and pulls the valve stem 177 and valve column 174 outward, so that the water circuit is in a disconnected state, avoiding accidental contact or backflush water circuit opening during operation.

[0059] Spring 1710 is sleeved on one end of valve stem 177, with both ends fixed between the inner wall of cylinder 171 and the surface of valve column 174, respectively. Normally, spring 1710 pulls valve column 174 to block the water passage. Guide bar 1711 is fixed to the surface of valve stem 177 and slides through cylinder 171. Guide bar 1711 restricts the rotation of valve column 174, ensuring precise alignment of through hole 175 and valve hole 176 when the water passage is open. Simultaneously, when the handwheel 1713 rotates to rotate valve stem 177... It can drive the rotation of the cylinder 171 and the frame 13, and the water discharged from the valve sleeve 133 can wash the inner wall of the housing 11 and the accumulated dust; the abutment ring 1712 is fixed to the inner wall of the cylinder 171 and cooperates with the valve column 174; the handwheel 1713 is fixed to one end of the valve stem 177 located outside the cylinder 171, and the abutment ring 1712 limits the initial position of the valve column 174 so that when the electromagnet 179 is energized to generate a magnetic field to repel the permanent magnet 178, the valve stem 177 and the valve column 174 will not move.

[0060] When the blower 12 is powered on, the electromagnet 179 is simultaneously energized and generates magnetic force, which repels and pushes the permanent magnet 178 to pull the valve rod 177 and valve column 174 outward. Under the action of the retaining ring 1712, the valve column 174 does not move, and the valve hole 176 and the through hole 175 are misaligned, the water circuit is closed, and the blower 12 stops. Manually turn the handwheel 1713 to push and pull the valve rod 177, which drives the valve column 174 to move axially, overcoming the elastic force of the spring 1710. When the through hole 175 on the cylinder 171 is completely aligned with the valve hole 176 on the valve column 174, the high-pressure water in the shell 172 passes through the hole and enters the cylinder 171, flowing into the internal channel 131 of the frame 13, realizing the backwashing of the filter screen 14. Releasing the handwheel 1713 will automatically shut off the water circuit under the rebound action of the spring 1710, stopping the backwashing.

[0061] Specifically, each of the four corners on one side of the frame 13 is fixed with a limiting block 134, and the limiting block 134 abuts against the filter screen 14, thereby positioning the filter screen 14 on one side. Each of the four corners on the other side of the frame 13 is equipped with a fixing mechanism 4 for limiting and fixing the filter screen 14 on the frame 13. The fixing mechanism 4 includes: a short column 41, fixed to one side of the frame 13; and a stop block 42, rotatably sleeved on the surface of the short column 41, for limiting and fixing the filter screen 14. The stop block 42 is rotatably connected to the short column 41 through a bearing, and the stop block 42 can rotate around the short column 41 and abut against the edge of the filter screen 14. A torsion spring 43 is sleeved on the surface of the short post 41, and its two ends are respectively fixed between the surface of the stop block 42 and the surface of the short post 41. In normal operation, the torsion spring 43 pushes one end of the stop block 42 to rotate towards the filter screen 14 to abut against the limit position. A square post 44 is fixed to one side of the frame 13. A retaining plate 45 is slidably sleeved on the surface of the square post 44 and cooperates with the stop block 42. A block 46 is fixed to one end of the square post 44. A spring 47 is sleeved on the surface of the square post 44, and its two ends are respectively fixed between the surface of the retaining plate 45 and the surface of the block 46. A stop post is fixed at each of the four corners of one side of the frame 13, and the stop post cooperates with the stop block 42.

[0062] The surface of the stop block 42 is chamfered, and one end of the clamping plate 45 is provided with an integrally formed protrusion with a bevel. With this design, when the filter screen 14 needs to be removed, the stop block 42 is rotated so that one end of it is detached from the surface of the filter screen 14. At the same time, the torsion spring 43 deforms, and the chamfer on the stop block 42 contacts the bevel on the protrusion on the clamping plate 45, thereby squeezing the clamping plate 45 as a whole to move. At the same time, the spring 47 is compressed. After the one end of the stop block 42 is misaligned with the protrusion of the clamping plate 45, the clamping plate 45 is reset under the action of the spring 47. The protrusion locks the stop block 42 in place, thus releasing the fixation of the filter screen 14. After the filter screen 14 is placed on the frame 13, the clamping plate 45 is pulled to disengage the protrusion from the stop block 42. Under the action of the torsion spring 43's deformation recovery, the stop block 42 rotates back to its original position, completing the installation and fixation of the filter screen 14.

[0063] Specifically, a limiting plate 114 is fixed to the inner wall of the housing 11 and cooperates with the upper end of the frame 13. The limiting plate 114 limits the maximum deflection angle of the frame 13. A detachable door 19 is installed on one side of the housing 11 to prevent the filter screen 14 from completely flipping over and losing its filtering function. The door 19 is equipped with a sealing strip. Opening the door 19 allows for direct disassembly and assembly of the filter screen 14, inspection and maintenance of the internal cleaning components 16 and the structure of the frame 13.

[0064] It should be noted that the structure and materials used in this device meet the safety and corrosion prevention standards for waste gas treatment and the requirements for high temperature and temperature change resistance. The main materials of the components that come into contact with waste gas, spray water, and cleaning water are PP polypropylene, FRP fiberglass or 316L stainless steel, which are resistant to corrosion from silicon dust, resin volatiles, and acid and alkali mist in electronic waste gas. There are no problems of rust, cracking or leakage after long-term use.

[0065] All seals, valve sleeve 133 microporous gaskets, brush mounting buffer pads, door 19 sealing strips, and valve column 174 sealing rings are made of fluororubber FKM material, which is resistant to organic solvents and weak acid and weak alkali immersion, preventing air and water leakage. Spring parts are made of 316 stainless steel spring wire, which is not easy to rust and break in the high humidity and corrosion environment of the workshop, and its elasticity is stable for a long time.

[0066] During use, the differential pressure adaptive linkage adjustment is implemented: the fan 12 draws air and creates a differential pressure on both sides of the filter screen 14. When the filter screen 14 is clean, the resistance is low, the frame 13 remains vertical, the variable resistance component 15 is connected to a large resistor, and the fan 12 and spray pump operate at low power, saving energy. As silicon powder and resin dust accumulate, the differential pressure increases, pushing the frame 13 to automatically deflect along the arc surface. The rotating column 151 simultaneously drives the conductive ring 154 to slide, reducing the circuit resistance. The air volume of the fan 12 and the water supply flow of the spray are increased simultaneously to match the high dust exhaust gas treatment requirements. After cleaning and shutdown, the spring 159 pulls the frame 13 to automatically reset, and the power drops.

[0067] Rotary synchronous automatic dry cleaning: During the deflection process of the frame 13, the rope 1611 is pulled, and the cleaning brush 165 moves laterally through the change of direction of the fixed pulley 169, which scrapes the loose floating dust on the surface of the filter screen 14 repeatedly. After the filter screen 14 is tilted, the dust automatically gathers to the bottom. When it is reset and rotated, the dust is swept into the bottom dust discharge frame 18.

[0068] High-pressure backwashing cleaning during shutdown: After the production line is shut down, manually push the rotating handwheel 1713 to open the water circuit. High-pressure cleaning water enters the annular channel 131 inside the frame 13 and is evenly sprayed out from each liquid outlet 132 to backwash the deep bonding resin of the filter screen 14. The micropores of the valve sleeve 133 can release and stabilize the pressure to prevent the water pressure from damaging the filter screen 14. Excess flushing water simultaneously washes the dust accumulated on the inner wall of the shell 11. Sewage and dust fall into the ash discharge frame 18 for regular cleaning. When the fan 12 is running, the electromagnet 179 locks the water circuit to prevent accidental flushing from affecting production.

[0069] Complete waste gas treatment process: The waste gas from the production line first enters the filtration mechanism 1 to intercept silicon powder and resin solid particles; then it is sent to the spray mechanism 2, where the spray liquid washes away the mist and soluble impurities; finally, it is passed into the drawer activated carbon adsorption device to adsorb toluene and other volatile organic compounds, and is discharged after meeting the standards.

[0070] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, and all such modifications or substitutions should be covered within the scope of the claims of the present invention.

Claims

1. A waste gas treatment device for the research and production of electronic special materials, characterized in that: include, Filter mechanism (1) is used to intercept silicon powder and resin particles in exhaust gas; It includes: a housing (11), which is fixedly installed, and an arc surface one (111) and an arc surface two (112) are respectively provided inside the housing (11); a fan (12), which is installed in the air outlet end of the housing (11); a frame (13), which rotates inside the housing (11), and the upper end of the frame (13) is engaged with the arc surface one (111), and the lower end is engaged with the arc surface two (112); a filter screen (14), which is installed on the frame (13) and is used to intercept silicon powder and resin particles in the exhaust gas. When the filter screen (14) accumulates dust and the resistance increases, the filter screen (14) and the frame (13) rotate under the action of the pressure difference of the fan (12). Change the windward state of the filter screen (14); the variable resistance component (15) is installed on the housing (11) and the frame (13) and is connected to the fan (12) in the same circuit; the cleaning component (16) is installed on the frame (13) and the housing (11) and is used to clean the floating dust when the windward state of the filter screen (14) changes; the manual backflushing component (17) is installed on the housing (11) and the frame (13) and one end is connected to the water supply equipment through a pipe; there are two ash discharge frames (18), which are symmetrically connected to the bottom of the housing (11) and the bottom of the ash discharge frame (18) is equipped with a detachable cover (181); The spray mechanism (2) is connected to the air outlet of the housing (11) through a pipe to wash away the mist and soluble impurities in the exhaust gas. The spray pump used by the spray mechanism (2) is connected to the variable resistance component (15) in the same circuit. The adsorption mechanism (3) is connected to the air outlet of the spray mechanism (2) through a pipe and is used to adsorb organic solvents in the waste gas.

2. The waste gas treatment device for the research and production of electronic special materials as described in claim 1, characterized in that: The frame (13) has a channel (131) inside, and the inner surface of the frame (13) has liquid outlet holes (132) distributed around the periphery for rinsing the filter screen (14). The outer surface of the frame (13) has circular holes distributed around the periphery, and a valve sleeve (133) is fixed inside the circular hole. The valve sleeve (133) has micropores in the middle.

3. The waste gas treatment device for the research and production of electronic special materials as described in claim 1 or 2, characterized in that: The variable resistance assembly (15) includes: a rotating column (151), which is rotatably connected to the housing (11) through a sealed bearing, and one end is fixed to the upper half of one side of the frame (13). The rotating column (151) is concentric with the first arc surface (111) and the second arc surface (112); a variable resistor (152), which is insulated and installed on one side of the housing (11); an insulating rod (153), which is fixed to one end of the rotating column (151) located outside the housing (11); and a conductive ring (154), which is fixed to one end of the insulating rod (153) and cooperates with the variable resistor (152). The variable resistor (152) and the conductive ring (154) are connected to the same circuit as the fan (12) and the spray pump used by the spray mechanism (2).

4. The waste gas treatment device for the research and production of electronic special materials as described in claim 3, characterized in that: The variable resistance assembly (15) further includes: a short block one (155), fixed to one side of the housing (11); a short block two (156), fixed to one side of the housing (11); an arc rod (157), whose two ends are respectively fixed between the surface of the short block one (155) and the surface of the short block two (156); a connecting plate (158), one end of which is fixed to the surface of the rotating column (151), and the other end is slidably sleeved on the surface of the arc rod (157); a spring one (159), sleeved on the surface of the arc rod (157), and whose two ends are respectively fixed between the surface of the short block two (156) and the surface of one end of the connecting plate (158).

5. The waste gas treatment device for the research and development and production of electronic special materials as described in any one of claims 1, 2 and 4, characterized in that: The cleaning component (16) includes: four fixing blocks (161) symmetrically distributed and fixed at the four corners of one side of the frame (13); two guide rods (162) symmetrically distributed and fixed between the corresponding two fixing blocks (161); two sliding sleeves (163) slidably sleeved on the surfaces of the two guide rods (162); a mounting plate (164) with both ends fixed between the surfaces of the two sliding sleeves (163); a cleaning brush (165) fixed to one side of the mounting plate (164) by screws for cleaning one side of the filter screen (14); and a second spring (166) sleeved on the surface of the guide rod (162) with both ends fixed between the surfaces of the fixing blocks (161) and the sliding sleeves (163).

6. The waste gas treatment device for the research and production of electronic special materials as described in claim 5, characterized in that: The inner wall of the housing (11) is provided with an arc groove (113). The cleaning component (16) further includes: a baffle (167) fixed to the bottom of one side of the frame (13); a baffle (168) fixed to the bottom of the other side of the frame (13), and both baffles (167) and (168) cooperate with the arc groove (113); a fixed pulley (169) fixed to the top of one side of the frame (13); and a rope (1611) with its two ends fixed to the surface of the mounting plate (164) and the... The inner wall of the arc groove (113) and the rope (1611) pass through the first baffle (167), the frame (13) and the second baffle (168) respectively. The first baffle (167), the frame (13) and the second baffle (168) are all provided with slots to cooperate with the movement of the rope (1611). The rope (1611) passes around the fixed pulley (169) and cooperates with it. The round rod (1610) has its two ends fixed between the surfaces of the two fixed blocks (161) below and cooperates with the rope (1611).

7. The waste gas treatment device for the research and production of electronic special materials as described in claim 2, characterized in that: The manual backflush component (17) includes: a cylinder (171), which rotates on one side of the housing (11) via a sealed bearing, and one end is fixed to the upper half of one side of the frame (13) and connected to the channel (131). The cylinder (171) is concentric with the first arc surface (111) and the second arc surface (112); a circular shell (172), which is fixed on one side of the housing (11) and sleeved on the surface of the cylinder (171) via a sealed bearing; and a water inlet pipe (173). One end of it is fixed to the cylindrical shell (172) and connected to the cylindrical shell (172); the valve column (174) slides inside the cylinder (171); the through hole (175) is opened in a circumferential array on the surface of the cylinder (171); the valve hole (176) is opened in a circumferential array on the surface of the valve column (174) and cooperates with the through hole (175); the valve stem (177) slides through the cylinder (171) and one end is fixed to the surface of the valve column (174).

8. The waste gas treatment device for the research and production of electronic special materials as described in claim 7, characterized in that: The manual backflush component (17) further includes: a permanent magnet (178), which is fixedly sleeved on the surface of the valve stem (177) by a support rod; an electromagnet (179), which is fixed on one side of the round shell (172) and sleeved on the surface of the cylinder (171), and connected to the fan (12) in the same circuit; a spring (1710), which is sleeved on one end of the surface of the valve stem (177), and both ends are fixed between the inner wall of the cylinder (171) and the surface of the valve column (174); and a guide bar (1711), which is fixed on the surface of the valve stem (177) and slides through the cylinder (171).

9. The waste gas treatment device for the research and production of electronic special materials as described in any one of claims 1, 2, 4, 6, 7 and 8, characterized in that: Limiting blocks (134) are fixed at each of the four corners on one side of the frame (13), and the limiting blocks (134) abut against the filter screen (14); fixing mechanisms (4) are installed at each of the four corners on the other side of the frame (13) for limiting and fixing the filter screen (14) on the frame (13); the fixing mechanism (4) includes: a short column (41) fixed to one side of the frame (13); a stop block (42) rotatably sleeved on the surface of the short column (41) for limiting and fixing the filter screen (14); a torsion spring (4 3) Sleeve on the surface of the short column (41), and fix both ends between the surface of the stop block (42) and the surface of the short column (41); square column (44), fixed on one side of the frame (13); card plate (45), slidably sleeved on the surface of the square column (44), and cooperate with the stop block (42); block (46), fixed on one end of the square column (44); spring four (47), sleeved on the surface of the square column (44), and fix both ends between the surface of the card plate (45) and the surface of the block (46).

10. The waste gas treatment device for the research and production of electronic special materials as described in any one of claims 1, 2, 4, 6, 7 and 8, characterized in that: The inner wall of the housing (11) is fixed with a limiting plate (114) and cooperates with the upper end of the frame (13). A detachable door (19) is installed on one side of the housing (11).

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