A high-purity copper rotating target outer circle polishing device

Abstract

The application discloses a high-purity copper rotating target outer circle polishing device, which comprises a workbench, a moving mechanism one and a moving mechanism two are sequentially arranged on the workbench; a polishing mechanism for polishing is arranged on the moving mechanism one; a second limiting mechanism for clamping the rotating target is arranged on the moving mechanism two; a driving mechanism is further arranged on the workbench, and a first limiting mechanism for clamping the rotating target is driven on the driving mechanism. The application adopts an inner expansion clamping structure, the first limiting mechanism and the second limiting mechanism are expanded tightly from the inner walls of both ends of the rotating target, so that clamping is realized; meanwhile, the clamping force acts on the inner wall of the target material, so that the outer circle surface of the processed rotating target is avoided from being scratched or extruded. In addition, the first limiting mechanism and the second limiting mechanism are the same in structure and are arranged in mirror image symmetry, the hollow pipes at both ends are coaxially arranged, and the expansion forces are symmetrically distributed on the inner walls of both ends of the target material, so that the rotating target is uniformly stressed as a whole, and the eccentric swing or vibration caused by the uneven stress at both ends can be avoided.

Description

Technical Field

[0001] This invention relates to the field of rotary target processing equipment technology, and in particular to a polishing device for the outer circle of a high-purity copper rotary target. Background Technology

[0002] The dimensional accuracy, form and position tolerances, and surface roughness of the outer cylindrical surface of a high-purity copper rotating target directly determine the film formation speed and uniformity of the coating layer. Therefore, precision polishing of the outer cylindrical surface is an indispensable key process in the precision machining of high-purity copper rotating targets.

[0003] In existing technologies, polishing equipment used for machining the outer diameter of high-purity copper rotating targets often employs external clamping fixtures such as three-jaw chucks to clamp and fix the two ends of the high-purity copper rotating target. A drive mechanism rotates the target around its axis, and a polishing mechanism with axial feed completes the outer diameter machining. However, in the machining of high-purity copper rotating targets, this type of external clamping method results in clamping force acting directly on the outer surface of the target. Since high-purity copper is relatively soft, during clamping, the contact area between the chuck and the target's outer diameter may produce clamping marks or indentations, damaging the surface integrity of the machined outer diameter and leading to a decrease in product yield or the need for rework. Furthermore, external clamping requires dedicated clamping sections at both ends of the target. After polishing, these sections must be cut off and discarded, resulting in unnecessary waste of high-purity copper material and increasing material costs. Summary of the Invention

[0004] The purpose of this invention is to provide a polishing device for the outer circle of a high-purity copper rotating target, so as to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] A polishing device for the outer circle of a high-purity copper rotating target includes a worktable, on which a first moving mechanism and a second moving mechanism are sequentially arranged; the first moving mechanism is provided with a polishing mechanism for polishing; the second moving mechanism is provided with a second limiting mechanism for clamping the rotating target; the worktable is also provided with a driving mechanism, which drives a first limiting mechanism for clamping the rotating target.

[0007] In a preferred embodiment, the first limiting mechanism includes a housing, on which a first double-row bearing is provided, and a hollow tube is provided on the first double-row bearing; a side plate is provided at one end of the hollow tube, and a second double-row bearing is provided on the side plate, with a guide rod provided on the second double-row bearing; a trapezoidal thread is provided on the guide rod, and a limiting block is provided on the trapezoidal thread; a threaded hole is provided on the limiting block to engage with the trapezoidal thread for transmission; a connecting rod is movably connected to the limiting block, and a support block is movably connected to the connecting rod; a slider is provided on the support block; a baffle is provided at the other end of the hollow tube, and a sliding groove is provided on the baffle, with a recess in the sliding groove; one end of the support block is located on the sliding groove, and the slider is located on the recess.

[0008] In a preferred embodiment, the side plate is provided with bolt through holes.

[0009] In a preferred embodiment, the guide rod is provided with a rotating handle, and the rotating handle is provided with a pre-drilled hole.

[0010] In a preferred embodiment, a hand-tightening bolt is provided between the reserved hole and the bolt through hole.

[0011] In a preferred embodiment, a driven pulley is connected to the hollow tube.

[0012] In a preferred embodiment, the drive mechanism includes a base plate on which a rotary motor is mounted; the output end of the rotary motor is connected to a drive pulley, and a belt is provided between the drive pulley and the driven pulley.

[0013] In a preferred embodiment, the moving mechanism includes a support frame, on which a rotary motor and a bearing housing are mounted. A lead screw is mounted on the bearing housing, and the output end of the rotary motor is connected to the lead screw. A nut is mounted on the lead screw, and a fixed seat is mounted on the nut. A connecting plate is mounted on the fixed seat, and a support plate is mounted on the connecting plate. At least three sets of synchronous pulleys are mounted on one end of the support plate, and each of the three sets of synchronous pulleys has a frosted belt. A second rotary motor is mounted on the other end of the support plate, and the output end of the second rotary motor is connected to a synchronous pulley. A slider is mounted at the bottom of the fixed seat. A sliding rod is also mounted on the support frame, and the slider slides on the sliding rod.

[0014] In a preferred embodiment, the moving mechanism two includes a support two, on which a rotary motor three and a bearing seat two are mounted, on which a lead screw two is mounted, the output end of the rotary motor three is connected to the lead screw two, on which a nut two is mounted, and on which a second limiting mechanism is connected; the bottom of the second limiting mechanism is provided with a slider two; the support two is also provided with a sliding rod two, on which the slider two slides.

[0015] In a preferred embodiment, the second limiting mechanism has the same structure as the first limiting mechanism, and the second limiting mechanism and the first limiting mechanism are arranged in a mirror-symmetric manner.

[0016] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0017] 1. This invention employs an internal expansion clamping structure. The first and second limiting mechanisms expand radially outward from the inner walls of both ends of the rotating target to achieve clamping. Simultaneously, the clamping force acts on the inner wall of the target material, preventing scratches or compression of the already machined outer cylindrical surface of the rotating target. Furthermore, the first and second limiting mechanisms have identical structures and are arranged in a mirror-symmetrical manner, with the hollow tubes at both ends coaxially positioned, and the expansion force symmetrically distributed at both ends of the inner wall of the rotating target. During polishing, the drive mechanism only drives the first limiting mechanism at one end to rotate actively, while the second limiting mechanism at the other end rotates synchronously through double-row bearings, ensuring uniform force on the rotating target as a whole. This avoids swaying or vibration caused by uneven force at both ends, guaranteeing the uniformity of the outer cylindrical polishing.

[0018] 2. The guide rod of the present invention is supported on the side plate by a double row bearing and can rotate independently relative to the hollow tube and the side plate. During the clamping operation, only the guide rod needs to be rotated to complete the tightening or loosening action. The hollow tube remains stationary during the clamping process, realizing complete separation of the clamping operation and the polishing rotation drive, making the operation process more convenient.

[0019] 3. The second moving mechanism of the present invention can adjust the axial distance between the second limiting mechanism and the first limiting mechanism through the lead screw drive. With the internal expansion clamping structure that can be operated independently by the limiting mechanisms at both ends, it can clamp rotating targets of different lengths. In addition, during the polishing process, the first moving mechanism drives the polishing mechanism to feed at a uniform speed along the axial direction, which can complete the uniform polishing of the outer circle of the entire length of the rotating target.

[0020] 4. The drive mechanism of the present invention uses belt drive to transmit the power of the rotary motor to the first limit mechanism. The belt drive has a certain elastic buffering capacity. On the one hand, it can slide under abnormal overload conditions to protect the motor and transmission components from damage. On the other hand, it can absorb some vibration, making the operation of the rotating target more stable. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. In the drawings:

[0022] The accompanying drawings described herein are for illustrative purposes only and are not intended to limit the scope of the invention in any way. Furthermore, the shapes and proportions of the components in the drawings are merely illustrative to aid in understanding the invention and do not specifically limit the shapes and proportions of the components. Those skilled in the art, guided by the teachings of this invention, can select various possible shapes and proportions to implement the invention according to specific circumstances.

[0023] Figure 1 This is a three-dimensional structural schematic diagram of the outer circle polishing device for a high-purity copper rotating target proposed in this invention;

[0024] Figure 2 This is a schematic diagram of the moving mechanism and the polishing mechanism of the outer circle polishing device for a high-purity copper rotating target proposed in this invention.

[0025] Figure 3 This is a schematic diagram of the moving mechanism 2 and the second limiting mechanism of the outer circle polishing device for a high-purity copper rotating target proposed in this invention.

[0026] Figure 4 A schematic diagram of the driving mechanism and the first limiting mechanism of the outer circle polishing device for a high-purity copper rotating target proposed in this invention;

[0027] Figure 5 A schematic diagram of the first limiting mechanism structure of the outer circle polishing device for a high-purity copper rotating target proposed in this invention. Figure 1 ;

[0028] Figure 6 A schematic diagram of the first limiting mechanism structure of the outer circle polishing device for a high-purity copper rotating target proposed in this invention. Figure 2 .

[0029] Figure label:

[0030] 1. Workbench; 2. Support 1; 3. Rotary motor 1; 4. Bearing housing 1; 5. Lead screw 1; 6. Nut 1; 7. Fixed base; 8. Slide rod 1; 9. Slider 1; 10. Connecting plate; 11. Support plate; 12. Rotary motor 2; 13. Synchronous pulley; 14. Frosted belt; 15. Support 2; 16. Rotary motor 3; 17. Lead screw 2; 18. Bearing housing 2; 19. Slide rod 2; 20. Slider 2; 21. Nut 2; 22. Base plate;

[0031] 23. First limiting mechanism; 230. Housing; 231. Double row bearing I; 232. Hollow tube; 233. Guide rod; 234. Limiting block; 235. Threaded hole; 236. Connecting rod; 237. Support block; 238. Baffle; 239. Slide groove; 240. Groove; 241. Slider III; 242. Side plate; 243. Double row bearing II; 244. Bolt through hole; 245. Rotating handle; 246. Reserved hole; 247. Hand-tightening bolt;

[0032] 24. Rotary motor four; 25. Driving pulley; 26. Driven pulley; 27. Belt; 28. Second limit mechanism; 29. ​​Rotating target. Detailed Implementation

[0033] To make the objectives, features, and advantages of this invention more apparent and understandable, the technical solutions of the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the embodiments described below are only some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this invention.

[0034] In the description of the embodiments of the present invention, it should be noted that the terms "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "top," "long," "short," "inner," "outer," and "bottom," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the embodiments of the present invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the embodiments of the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In addition, in the description of the present invention, unless otherwise stated, "a plurality of" means two or more.

[0035] In the description of this invention, it should be understood that when a component is considered to be "connected" to another component, it can be directly connected to the other component or there may be an intermediate component present simultaneously. When a component is considered to be "set" on another component, it can be directly set on the other component or there may be an intermediate component present simultaneously. It should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "installed," and "connected" should be interpreted broadly. For example, it can refer to a fixed connection, a detachable connection, or an integral connection; it can refer to a mechanical connection or an electrical connection; it can refer to a direct connection or an indirect connection through an intermediate medium; it can refer to the internal communication between two elements. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0036] The present invention will now be described in detail with reference to the specific embodiments shown in the accompanying drawings. However, these embodiments do not limit the present invention, and any structural, methodological, or functional modifications made by those skilled in the art based on these embodiments are included within the scope of protection of the present invention.

[0037] See Figure 1 The high-purity copper rotating target outer circle polishing device provided in this embodiment includes a worktable 1, on which a first moving mechanism and a second moving mechanism are sequentially arranged.

[0038] The first moving mechanism is equipped with a polishing mechanism for polishing the outer circle of the rotating target 29; the second moving mechanism is equipped with a second limiting mechanism 28 for clamping one end of the rotating target 29; the worktable 1 is also equipped with a driving mechanism, which drives a first limiting mechanism 23 for clamping the other end of the rotating target 29.

[0039] It should be noted that the material of the rotating target 29 processed in this embodiment includes, but is not limited to, high-purity copper.

[0040] The first limiting mechanism 23 includes a housing 230, and a double row bearing 231 is embedded in the inner wall of the housing 230. A hollow tube 232 is fixedly inserted through the inner ring of the double row bearing 231, so that the hollow tube 232 can be rotatably supported in the housing 230.

[0041] One end of the hollow tube 232 is provided with a side plate 242, and a double row bearing 243 is embedded in the center of the side plate 242. A guide rod 233 is fixedly inserted through the inner ring of the double row bearing 243.

[0042] The guide rod 233 has a trapezoidal threaded section on its body. A limiting block 234 is fitted on the trapezoidal threaded section. The limiting block 234 has a threaded hole 235 that is in transmission cooperation with the trapezoidal threaded section. Several connecting rods 236 are hinged to the outer periphery of the limiting block 234. A support block 237 is hinged to the other end of each connecting rod 236. A slider 241 is provided on the support block 237.

[0043] See Figures 5-6 In this embodiment, a trapezoidal threaded section is machined on the guide rod 233, and the thread angle of the threaded section is 30°. A threaded hole 235, which mates with the trapezoidal threaded section, is provided at the center of the limiting block 234. When the handle 245 is rotated clockwise, the guide rod 233 drives the trapezoidal threaded section to rotate, and through threaded transmission, the limiting block 234 moves along the axis of the guide rod 233 towards the baffle 238. When the handle 245 is rotated counterclockwise, the limiting block 234 moves away from the baffle 238. A bolt through hole 244 is provided on the side plate 242, and a reserved hole 246 corresponding to the bolt through hole 244 is provided on the rotating handle 245. After the support block 237 is fully tightened, the hand-tightened bolt 247 is passed through the pre-drilled hole 246 and screwed into the bolt through hole 244. After tightening the hand-tightened bolt 247, a rigid connection is formed between the rotating handle 245 and the side plate 242, and the rotating handle 245 can no longer rotate relative to the side plate 242, thereby locking the circumferential position of the guide rod 233. During the polishing process, even if there is equipment vibration or cutting force fluctuation, the guide rod 233 will not loosen due to the trapezoidal thread clearance, ensuring the tightening force of the support block 237.

[0044] The other end of the hollow tube 232 is provided with a baffle 238, the baffle 238 is provided with a sliding groove 239, and the sliding groove 239 is provided with a groove 240.

[0045] One end of the support block 237 is located on the slide groove 239, and the slider 241 is located on the groove 240.

[0046] Specifically, a baffle 238 is fixedly installed at the other end of the hollow tube 232. The baffle 238 has a radial groove 239 that corresponds to the support block 237. The bottom of the groove 239 has a radial groove 240. The end of the support block 237 is slidably embedded in the groove 239, and the slider 241 is slidably engaged in the groove 240, forming a radial movement guide structure for the support block 237.

[0047] See Figures 4-6In this embodiment, the baffle 238 is fixed to the end face of the hollow tube 232 away from the side plate 242. Several grooves 239 are radially formed on the baffle 238, and these grooves 239 are evenly distributed circumferentially. A groove 240 is radially inwardly formed at the bottom of each groove 239, and the cross-sectional shape of the groove 240 matches the cross-sectional shape of the slider 241. Slider 241 is fixed to the inner side of each support block 237. The end of the support block 237 is slidably embedded in the groove 239, and the slider 241 is synchronously slidably engaged in the groove 240. The groove 239 constrains the circumferential displacement of the support block 237, and the engagement of the groove 240 and the slider 241 constrains the axial movement of the support block 237. Together, they ensure that the support block 237 can only move radially, guaranteeing that each support block 237 extends synchronously and equidistantly during the tightening process, thus achieving the clamping of the rotating target 29.

[0048] Among them, the support block 237 and the connecting rod 236 are provided in at least three sets.

[0049] The side plate 242 is provided with bolt through holes 244.

[0050] The guide rod 233 is provided with a rotating handle 245, and the rotating handle 245 is provided with a reserved hole 246.

[0051] A hand-tightening bolt 247 is provided between the reserved hole 246 and the bolt through hole 244.

[0052] Specifically, a bolt through hole 244 is provided on the side plate 242; a rotating handle 245 is fixedly provided at one end of the guide rod 233 extending out of the side plate 242, and a reserved hole 246 corresponding to the position of the bolt through hole 244 is provided on the rotating handle 245; a hand-tightening bolt 247 is passed between the reserved hole 246 and the bolt through hole 244 to lock the circumferential position of the guide rod 233 and prevent the guide rod 233 from loosening by self-rotation during the polishing process.

[0053] A driven pulley 26 is connected to the hollow tube 232.

[0054] See Figures 5-6 In this embodiment, the side plate 242 is fixedly installed on one end face of the hollow tube 232 by bolts. A double-row bearing 243 is embedded in the central hole of the side plate 242, and a guide rod 233 is fixedly inserted through the inner ring of the double-row bearing 243. The guide rod 233 can rotate freely relative to the side plate 242 and the hollow tube 232. The operator can independently drive the guide rod 233 to rotate by rotating the handle 245 to complete the tightening or loosening action, while the hollow tube 232 remains stationary during the process. The rotational movement of the guide rod 233 and the rotational movement of the hollow tube 232 are independent of each other and do not interfere with each other.

[0055] The drive mechanism includes a base plate 22, on which a rotary motor 24 is mounted;

[0056] The output end of the rotary motor 24 is connected to the drive pulley 25, and a belt 27 is provided between the drive pulley 25 and the driven pulley 26.

[0057] See Figure 4 In this embodiment, the base plate 22 is fixedly mounted on the workbench 1, and the rotary motor 24 is fixed to the upper surface of the base plate 22. A drive pulley 25 is keyed to the end of the output shaft of the rotary motor 24, and a driven pulley 26 is keyed to the hollow tube 232 of the first limiting mechanism 23. A belt 27 is tensioned and wound between the drive pulley 25 and the driven pulley 26. The belt 27 is a V-belt or a synchronous toothed belt, capable of transmitting rotational torque while providing overload protection. After the rotary motor 24 is started, power is transmitted to the hollow tube 232 via the drive pulley 25, the belt 27, and the driven pulley 26, driving the hollow tube 232 to rotate around its own axis, thereby causing the rotating target 29 clamped on it to rotate at a uniform speed.

[0058] The moving mechanism includes a bracket 2, on which a rotary motor 3 and a bearing seat 4 are mounted. A lead screw 5 is mounted on the bearing seat 4. The output end of the rotary motor 3 is connected to the lead screw 5. A nut 6 is mounted on the lead screw 5. A fixed seat 7 is mounted on the nut 6. A connecting plate 10 is mounted on the fixed seat 7. A support plate 11 is mounted on the connecting plate 10. At least three sets of synchronous pulleys 13 are mounted on one end of the support plate 11. Each of the three sets of synchronous pulleys 13 is equipped with a frosted belt 14. A rotary motor 2 12 is mounted on the other end of the support plate 11. The output end of the rotary motor 2 12 is connected to the synchronous pulleys 13.

[0059] The bottom of the fixed base 7 is equipped with a slider 9;

[0060] The bracket 12 is also equipped with a slide bar 18, and a slider 19 slides on the slide bar 18.

[0061] See Figure 2 In this embodiment, bracket 2 is fixed to the worktable 1, and rotary motor 3 and bearing seat 4 are both fixedly mounted on bracket 2. One end of lead screw 5 is connected to the output end of rotary motor 3 via a coupling, and the other end is rotatably supported in bearing seat 4 via a bearing. Nut 6 is threadedly fitted onto lead screw 5, and a fixed seat 7 is fixedly connected to the outside of nut 6. A slider 9 is fixed to the bottom of fixed seat 7, and a slide rod 8 parallel to lead screw 5 is fixedly mounted on bracket 2, with slider 9 slidably fitted onto slide rod 8. When rotary motor 3 drives lead screw 5 to rotate, nut 6 drives fixed seat 7 and the entire polishing mechanism to translate axially along lead screw 5. The cooperation of slide rod 8 and slider 9 provides linear guidance and overturning moment support for fixed seat 7, ensuring smooth movement of the polishing mechanism during feeding.

[0062] The second moving mechanism includes a second bracket 15, on which a third rotary motor 16 and a second bearing seat 18 are mounted. A second lead screw 17 is mounted on the second bearing seat 18. The output end of the third rotary motor 16 is connected to the second lead screw 17. A second nut 21 is mounted on the second lead screw 17. A second limiting mechanism 28 is connected to the second nut 21.

[0063] The bottom of the second limiting mechanism 28 is provided with a slider 20;

[0064] The bracket 215 is also equipped with a slide bar 219, on which a slider 20 slides.

[0065] See Figure 3 In this embodiment, bracket 2 15 is fixed on the workbench 1, and rotary motor 3 16 and bearing seat 2 18 are both fixedly installed on bracket 2 15. One end of lead screw 2 17 is connected to the output end of rotary motor 3 16, and the other end is rotatably supported in bearing seat 2 18. Nut 2 21 is threadedly fitted onto lead screw 2 17, and the outer side of nut 2 21 is fixedly connected to the housing of second limiting mechanism 28. Slider 2 20 is fixed to the bottom of the housing of second limiting mechanism 28, and slide rod 2 19 is fixedly provided on bracket 2 15. Slider 2 20 is slidably fitted onto slide rod 2 19. When rotary motor 3 16 drives lead screw 2 17 to rotate, nut 2 21 drives second limiting mechanism 28 to translate axially along slide rod 2 19, precisely adjusting the distance between second limiting mechanism 28 and first limiting mechanism 23 to adapt to the clamping requirements of rotary targets 29 of different lengths.

[0066] See Figure 1 The second limiting mechanism 28 has the same structure as the first limiting mechanism 23, and the second limiting mechanism 28 and the first limiting mechanism 23 are arranged in a mirror symmetrical manner.

[0067] By employing an internal expansion clamping structure, the first limiting mechanism 23 and the second limiting mechanism 28 expand radially outward from the inner walls at both ends of the rotating target 29 to achieve clamping. Simultaneously, the clamping force acts on the inner wall of the rotating target 29, preventing scratches or compression of the machined outer cylindrical surface of the rotating target 29. Furthermore, the first limiting mechanism 23 and the second limiting mechanism 28 have identical structures and are arranged in a mirror-symmetrical manner, with coaxially arranged hollow tubes at both ends, and the expansion force is symmetrically distributed at both ends of the inner wall of the rotating target 29.

[0068] In this mirror-symmetrical arrangement, the hollow tube 232 of the first limiting mechanism 23 and the hollow tube of the second limiting mechanism 28 are coaxially arranged, with their axes coinciding. When the rotating handle 245 of the first limiting mechanism 23 is rotated, its limiting block 234 moves axially along the guide rod 233 towards the baffle 238, pushing the support block 237 to extend radially outward, achieving tightening from one end of the inner wall of the rotating target 29; similarly, when the rotating handle of the second limiting mechanism 28 is rotated, its support block 237 extends radially outward, achieving tightening from the other end of the inner wall of the rotating target 29. The tightening force of both limiting mechanisms acts radially outward from the inside to the outside on the inner wall of the target material, and the force is symmetrically distributed, ensuring that the rotating target 29 is clamped after installation. During the polishing process, the drive mechanism drives the hollow tube 232 of the first limiting mechanism 23 to rotate actively through the driven pulley 26. The hollow tube of the second limiting mechanism 28 rotates synchronously with the rotating target 29 under the support of the double row bearing. The hollow tubes at both ends rotate around the same axis to ensure that the rotating target 29 maintains a stable rotational motion during the processing and will not wobble or vibrate due to uneven force at both ends.

[0069] The specific implementation of this embodiment is as follows:

[0070] Before processing, one end of the rotating target 29 is fitted onto the outside of the limiting block 234 and support block 237 of the first limiting mechanism 23. The rotating handle 245 is rotated to drive the guide rod 233 to rotate synchronously. Through the transmission cooperation of the trapezoidal thread and the threaded hole 235, the limiting block 234 moves axially along the guide rod 233. The connecting rod 236 pushes each support block 237 to extend radially outward along the slide groove 239 until the outer wall of the support block 237 tightly abuts against the inner wall of the rotating target 29, realizing internal expansion clamping. After clamping in place, the hand-tightened bolt 247 is inserted into the reserved hole 246 and the bolt through hole 244 and locked to lock the circumferential position of the guide rod 233 and prevent loosening during polishing.

[0071] Next, based on the length of the rotating target 29, the rotary motor 316 drives the lead screw 217 to rotate, causing the second limiting mechanism 28 to move axially along the slide bar 29 to a suitable position. The same operation is then performed to clamp the other end, achieving synchronous internal expansion and tightening at both ends. The rotary motor 316 is started, driving the lead screw 21 to rotate, which in turn drives the nut 21 to transmit power, thereby causing the second limiting mechanism 28 to move axially along the slide bar 29 to adapt to rotating targets 29 of different lengths, ensuring stable target clamping. Following the same operation as the first limiting mechanism 23, the other end of the rotating target 29 is clamped to the second limiting mechanism 28. During polishing, the drive mechanism only drives the first limiting mechanism 23 to rotate actively at one end, while the second limiting mechanism 28 at the other end rotates synchronously supported by double-row bearings.

[0072] After the workpiece is clamped, the rotary motor 3 of the moving mechanism is started, driving the lead screw 5 to rotate. This, via the nut 6, moves the entire polishing mechanism axially along the slide bar 8, adjusting the abrasive belt 14 to the starting position where it contacts the outer circle of the rotating target 29. After the internal expansion clamping of the rotating target 29 is completed by the first limiting mechanism 23 and the second limiting mechanism 28, the rotary motor 3 of the moving mechanism is started again. The output end of the rotary motor 3 drives the lead screw 5 to rotate, which in turn drives the transmission of the nut 6, thereby moving the entire polishing mechanism axially along the slide bar 8, adjusting the abrasive belt 14 to the starting position where it contacts the outer circle of the rotating target 29.

[0073] Simultaneously, rotary motor 4 (24) and rotary motor 2 (12) are started. Rotary motor 4 (24) drives the drive pulley 25 to rotate. The drive pulley 25 drives the belt 27 and the driven pulley 26 to rotate, thereby causing the hollow tube 232 of the first limiting mechanism 23 to rotate around the axis. Since the rotating target 29 is tightened and fixed by the limiting mechanisms at both ends, the hollow tube of the second limiting mechanism 28 rotates synchronously, thereby causing the rotating target 29 to rotate at a uniform speed. At the same time, rotary motor 2 (12) drives the abrasive belt 14 to circulate through the synchronous pulley 13 to continuously polish the outer surface of the rotating target 29. During the polishing process, the moving mechanism 1 drives the polishing mechanism to feed at a uniform speed along the axial direction, completing the uniform polishing of the entire outer circle of the rotating target 29.

[0074] After polishing, rotary motor 24 and rotary motor 12 stop running, and the rotating target 29 stops rotating. Loosen the hand-tightening bolt 247, rotate the handle 245 in the opposite direction, drive the guide rod 233 to rotate in the opposite direction, and make the limiting block 234 move axially in the opposite direction. Through the connecting rod 236, the support block 237 is pulled radially inward to release the tension support on the inner wall of the rotating target 29. After releasing the limiting mechanisms at both ends in sequence, the high-purity copper rotating target that has been processed can be removed, and each mechanism is reset to wait for the next processing.

[0075] It is understood that the motor drive and sequential control involved in this application can be implemented using PLC or microcontroller control systems known in the art. The specific control program can be compiled according to the action flow disclosed in this specification, which falls within the scope of conventional design capabilities of those skilled in the art and is not the focus of protection of this invention, so it will not be described in detail.

[0076] It should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This way of describing the specification is only for clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

[0077] The detailed descriptions listed above are merely specific descriptions of feasible embodiments of the present invention, and are not intended to limit the scope of protection of the present invention. All equivalent embodiments or modifications made without departing from the spirit of the present invention should be included within the scope of protection of the present invention.

Claims

1. A polishing device for the outer circle of a high-purity copper rotating target, comprising a worktable (1), characterized in that, The workbench (1) is provided with a first moving mechanism and a second moving mechanism in sequence; The moving mechanism is equipped with a polishing mechanism for polishing; The second moving mechanism is provided with a second limiting mechanism (28) for clamping the rotating target (29); The worktable (1) is also provided with a drive mechanism, which drives a first limiting mechanism (23) for clamping a rotating target (29).

2. The outer circle polishing device for a high-purity copper rotating target according to claim 1, characterized in that, The first limiting mechanism (23) includes a housing (230), on which a double row bearing (231) is provided, and on which a hollow tube (232) is provided. One end of the hollow tube (232) is provided with a side plate (242), and a double row bearing (243) is provided on the side plate (242), and a guide rod (233) is provided on the double row bearing (243). The guide rod (233) is provided with a trapezoidal thread, the trapezoidal thread is provided with a limiting block (234), the limiting block (234) is provided with a threaded hole (235), the limiting block (234) is movably connected with a connecting rod (236), the connecting rod (236) is movably connected with a support block (237), and the support block (237) is provided with a slider three (241). The other end of the hollow tube (232) is provided with a baffle (238), the baffle (238) is provided with a sliding groove (239), and the sliding groove (239) is provided with a groove (240); One end of the support block (237) is located on the slide groove (239), and the slider three (241) is located on the groove (240).

3. The outer circle polishing device for a high-purity copper rotating target according to claim 2, characterized in that, The side plate (242) is provided with bolt through holes (244).

4. The outer circle polishing device for a high-purity copper rotating target according to claim 2, characterized in that, The guide rod (233) is provided with a rotating handle (245), and the rotating handle (245) is provided with a reserved hole (246).

5. The outer circle polishing device for a high-purity copper rotating target according to claim 4, characterized in that, A hand-tightening bolt (247) is provided between the reserved hole (246) and the bolt through hole (244).

6. The outer circle polishing device for a high-purity copper rotating target according to claim 2, characterized in that, A driven pulley (26) is connected to the hollow tube (232).

7. The outer circle polishing device for a high-purity copper rotating target according to claim 1, characterized in that, The driving mechanism includes a base plate (22), on which a rotary motor (24) is provided. The output end of the rotary motor four (24) is connected to the drive pulley (25), and a belt (27) is provided between the drive pulley (25) and the driven pulley (26).

8. The outer circle polishing device for a high-purity copper rotating target according to claim 1, characterized in that, The moving mechanism includes a support (2), on which a rotary motor (3) and a bearing seat (4) are provided. A lead screw (5) is provided on the bearing seat (4). The output end of the rotary motor (3) is connected to the lead screw (5). A nut (6) is provided on the lead screw (5). A fixed seat (7) is provided on the nut (6). A connecting plate (10) is provided on the fixed seat (7). A support plate (11) is provided on the connecting plate (10). At least three sets of synchronous pulleys (13) are provided at one end of the support plate (11). Each of the three sets of synchronous pulleys (13) is provided with a frosted belt (14). A rotary motor (12) is provided at the other end of the support plate (11). The output end of the rotary motor (12) is connected to the synchronous pulley (13). The bottom of the fixed base (7) is provided with a slider (9); The bracket (2) is also provided with a slide bar (8), and a slider (9) slides on the slide bar (8).

9. The outer circle polishing device for a high-purity copper rotating target according to claim 1, characterized in that, The second moving mechanism includes a second support (15), on which a third rotary motor (16) and a second bearing seat (18) are provided. On the second bearing seat (18) a second lead screw (17) is provided. The output end of the third rotary motor (16) is connected to the second lead screw (17). On the second lead screw (17) a second nut (21) is provided. On the second nut (21) a second limiting mechanism (28) is connected. The bottom of the second limiting mechanism (28) is provided with a slider two (20); The bracket two (15) is also provided with a slide rod two (19), and a slider two (20) slides on the slide rod two (19).

10. The outer circle polishing device for a high-purity copper rotating target according to claim 9, characterized in that, The second limiting mechanism (28) has the same structure as the first limiting mechanism (23), and the second limiting mechanism (28) and the first limiting mechanism (23) are arranged in a mirror symmetrical manner.

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