Mobile phone screen glass etching device

Abstract

The application discloses a kind of mobile phone screen glass etching device, it is related to electronic processing technical field, including shell, linear conveying module and moving frame, the linear conveying module is fixedly installed on shell, the shell is sequentially provided with activation cavity, etching cavity and flushing cavity along workpiece conveying direction, and the seal transition door of lift is equipped between adjacent chamber;The bottom of both sides of the moving frame is fixedly installed with mould seat, and mould seat is driven by linear conveying module, workpiece carrier frame and flow guide cover plate are slidably arranged in the moving frame, and flow guide cover plate is arranged above workpiece carrier frame, and gap between flow guide cover plate and workpiece carrier frame constitutes liquid film passage, the etching liquid of the present application is continuously sheared, breaks concentration and temperature gradient, so that etching liquid evenly covers workpiece surface, effectively improves the uniformity of whole surface etching, simultaneously cooperates with the disturbance seat and continuously disturbs liquid film, further strengthens liquid film turbulent mixing effect, and makes reaction generated by-product promptly separate from workpiece surface.

Description

Technical Field

[0001] This invention relates to the field of electronic processing technology, and in particular to a mobile phone screen glass etching apparatus. Background Technology

[0002] With the rapid development of the consumer electronics industry and the iterative upgrades of full-screen smartphones, under-display camera technology has become the mainstream display solution for high-end smartphones. To achieve precise separation between the screen's light-shielding area and the camera's light-transmitting area, an ultra-thin titanium alloy coating needs to be deposited on the inner side of the phone screen's glass cover as a light-shielding layer, and high-precision patterning is completed through photolithography combined with chemical etching processes. Titanium alloy has become the mainstream light-shielding layer material due to its excellent light-shielding performance, scratch resistance, and structural stability. However, its surface is prone to naturally forming a dense inert oxide film, and the coating thickness is usually only tens to two hundred nanometers. This places stringent nanometer-level requirements on etching uniformity, side etching control precision, and thickness consistency. The processing quality of the etching process directly determines the optical performance and product yield of the under-display camera area.

[0003] At present, the etching equipment commonly used in industrial production is mainly divided into two types: spray type and immersion type. Both of them have the defect of poor etching effect in practical applications, which makes it difficult to meet the high-precision processing requirements: (1) Traditional direct spray etching device relies on array nozzles to spray etching liquid onto the surface of the workpiece. Due to the inherent influence of nozzle pressure distribution and edge flow attenuation, there is a significant difference in the etching liquid renewal rate between the center and edge areas of the workpiece. The spray uniformity is poor, and local over-etching or under-etching is easy to occur, resulting in a large deviation in the etching rate of the whole surface; (2) Immersion etching device completes the reaction by immersing the entire workpiece in the etching liquid. The overall fluidity of the etching liquid is weak, and a stable concentration gradient and temperature gradient are easily formed in the reaction area on the workpiece surface. The byproducts generated by the reaction are difficult to diffuse and detach quickly, resulting in the etching rate gradually decreasing with the processing process. Therefore, it is urgent to design a mobile phone screen glass etching device to solve the above problems. Summary of the Invention

[0004] The purpose of this invention is to address the shortcomings of existing technologies by providing a mobile phone screen glass etching apparatus. Its advantages lie in the continuous shearing of the etching solution, breaking down concentration and temperature gradients, allowing the etching solution to uniformly cover the workpiece surface, and effectively improving the uniformity of the entire etching process.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A mobile phone screen glass etching apparatus includes a housing, a linear conveyor module, and a moving frame, wherein the linear conveyor module is fixedly mounted on the housing.

[0007] The machine housing is provided with an activation chamber, an etching chamber and a rinsing chamber arranged sequentially along the workpiece conveying direction, and each adjacent chamber is provided with a liftable sealed transition door.

[0008] Both sides of the bottom of the movable frame are fixedly installed with mold bases, and the mold bases are driven by a linear conveying module. A workpiece carrier and a flow guide cover are slidably arranged inside the movable frame, and the flow guide cover is located above the workpiece carrier. The gap between the flow guide cover and the workpiece carrier forms a liquid film channel. The workpiece carrier has a built-in vacuum adsorption fixing component.

[0009] A U-shaped enclosure is fixedly installed on the top of the movable frame, and a reciprocating shearing mechanism is provided on the U-shaped enclosure and the movable frame to drive the workpiece frame and the guide cover to move in opposite directions. The reciprocating shearing mechanism is provided with a cover-closing mechanism for driving the guide cover to open and close.

[0010] An activation mechanism is provided on the activation chamber;

[0011] The etching chamber is equipped with a spraying mechanism;

[0012] The rinsing chamber is equipped with a rinsing mechanism.

[0013] Through the above technical solutions, the workpiece can complete the activation, etching, and rinsing processes sequentially along the linear conveying module, achieving continuous processing. At the same time, the reverse movement of the guide cover and the workpiece frame generates a continuous shearing effect on the etching solution, breaking the concentration and temperature gradient and solving the problem of poor etching uniformity in traditional spraying and immersion methods.

[0014] The invention is further configured such that the top of the housing has an inlet and outlet for the sealing transition door to pass through, and the top of the housing is fixedly installed with a first electric push rod for driving the sealing transition door to rise and fall.

[0015] The above technical solutions can precisely control the opening and closing sequence of each chamber, ensure the airtightness of the chamber when it is closed, and avoid cross-contamination of media from different processes.

[0016] The present invention is further configured such that the vacuum adsorption fixing component includes a plurality of adsorption holes opened on the top of the workpiece frame, and a vacuum pump is fixedly installed on one side of the outer wall of the workpiece frame, and the vacuum end of the vacuum pump is connected to the interior of the workpiece frame through a pipeline.

[0017] The above technical solution uses vacuum adsorption to fix the workpiece, ensuring that the workpiece does not shift or move during reciprocating motion.

[0018] The invention is further configured such that the reciprocating shearing mechanism includes a rack seat fixedly installed on the top of the other side of the workpiece carrier and hinged to one side of the guide cover plate, and an installation plate fixed to the inner wall of the moving frame. A transmission gear is rotatably connected to the middle of the installation plate, and two rack seats are respectively meshed above and below the transmission gear. A motor is fixedly installed on one outer wall of the U-shaped enclosure, and a rotating plate is fixedly installed on the output shaft of the motor. A push frame is fixedly installed on one side of the rack seat above, and a drive rod fitted inside the push frame is fixedly installed on the top of the rotating plate. A guide block is fixedly installed on one side of the workpiece carrier, and guide holes are provided on the guide block and the two rack seats. Guide rods passing through the guide holes are fixedly installed on the inner walls of the moving frame and the U-shaped enclosure.

[0019] The above technical solution involves synchronously driving the guide cover plate and the workpiece frame to perform opposite synchronous reciprocating motions, thereby forcibly homogenizing the concentration and temperature of the liquid film through the shearing effect generated by the reverse motion.

[0020] The present invention is further configured such that the closing mechanism includes a fixed frame fixedly installed on the top of the upper rack seat, and a second electric push rod is hinged to the inner wall of the fixed frame. A U-shaped connecting rod is fixedly installed on the piston end of the second electric push rod. A traction frame is fixedly installed on the top of the guide cover plate, and a slide rod that slides along the inner wall of the traction frame is rotatably connected to the inner wall of the U-shaped connecting rod via a pin.

[0021] The above technical solution involves closing the flow guide plate during etching and raising the flow guide plate during loading and unloading, which facilitates the etching process and the handling of workpieces.

[0022] The present invention is further configured such that a plurality of fiber optic spectral probes are embedded in the flow guide cover, and the fiber optic spectral probes are perpendicularly oriented toward the workpiece surface.

[0023] The above technical solution allows for in-situ online detection of the etching thickness of the titanium alloy layer, eliminating the need to stop the machine and remove the workpiece for offline measurement.

[0024] The present invention is further configured such that a plurality of flow-disrupting seats are fixedly arranged on the top surface of the workpiece carrier and the bottom surface of the flow-disrupting cover, and the positions of the upper and lower sets of flow-disrupting seats are staggered.

[0025] The above technical solutions continuously cut the liquid film, enhance the turbulent mixing effect inside the liquid film, and promote the timely removal of by-products generated by the reaction from the workpiece surface.

[0026] The invention is further configured such that the activation mechanism includes a vacuum pump fixedly installed at the top of the activation chamber, and a vacuum pipe fixedly installed at the vacuum pump's vacuum end, through which an argon-hydrogen mixed gas is introduced. An exhaust pipe extending into the activation chamber is fixedly installed at the vacuum pump's exhaust end, and a U-shaped pipe is fixedly installed at the bottom end of the exhaust pipe. Both ends of the U-shaped pipe are fixedly connected to jet frames, and two sets of discharge electrodes are fixedly installed inside the jet frames for ionizing the introduced argon-hydrogen mixed gas into plasma. The bottom of the jet frames is fixedly connected to inclined jet nozzles that are evenly distributed.

[0027] The above technical solutions effectively break through the dense oxide film on the surface of titanium alloys, thereby increasing the initiation speed of the etching reaction.

[0028] The invention is further configured such that a liquid storage tank is fixedly installed at the bottom of the housing, and the interior of the liquid storage tank is divided into a cleaning liquid storage chamber and an etching liquid storage chamber. The spraying mechanism includes a pump fixedly installed on one side of the etching liquid storage chamber, and a pumping pipe is fixedly installed at the pumping end. A filter cover is fixedly installed at one end of the pumping pipe. A drain pipe extending into the etching chamber is fixedly installed at the draining end of the pump, and a spray frame corresponding to the feed opening side of the U-shaped enclosure is fixedly installed at the top of the drain pipe. An etching liquid nozzle is fixedly connected to one side of the spray frame, and the position of the etching liquid nozzle corresponds to the position of the liquid film channel.

[0029] The above technical solution employs separate storage tanks to store etching solution and cleaning solution, along with independent supply pipelines, ensuring stable operation of the etching process.

[0030] The present invention is further configured such that the rinsing mechanism and the spraying mechanism have the same structural composition, and the rinsing mechanism is connected to the cleaning fluid storage chamber.

[0031] The above technical solutions effectively remove residual etching solution and reaction byproducts from the workpiece surface.

[0032] The beneficial effects of this invention are as follows:

[0033] 1. In this invention, a reciprocating shearing mechanism is used in conjunction with a flow guide cover and a workpiece frame to form a liquid film channel. During operation, the motor drives the upper rack seat to reciprocate through a rotating plate, a drive rod, and a push frame. Through the meshing of transmission gears, the upper and lower rack seats move synchronously in opposite directions, thereby driving the flow guide cover and the workpiece frame to move in opposite directions. This generates a continuous shearing effect on the etching solution in the channel, which can break the concentration and temperature gradient inside the liquid film, allowing the etching solution to uniformly cover the workpiece surface, effectively improving the uniformity of the entire surface etching and avoiding local over-etching or under-etching problems. At the same time, in conjunction with the turbulence seat structure with the workpiece frame top surface and the flow guide cover bottom surface arranged alternately, the turbulence seat moves relative to the two in opposite directions during the reverse movement, continuously disturbing the liquid film, further enhancing the turbulent mixing effect inside the liquid film, and promoting the timely removal of by-products generated by the reaction from the workpiece surface, ensuring a stable etching rate throughout the process.

[0034] 2. In this invention, an activation mechanism structure is adopted, which uses a jet frame with built-in discharge electrodes and an inclined jet nozzle. Argon-hydrogen mixed gas is transported to the jet frame through the gas path. After being ionized by the discharge electrodes to form plasma, it is uniformly sprayed onto the surface of the workpiece through the jet nozzles arranged at the bottom. This can directly break the dense oxide film on the surface of the titanium alloy and improve the start-up speed and consistency of the etching reaction.

[0035] 3. In this invention, an optical fiber spectral probe structure is embedded in the flow guide cover. During the etching process, the probe is vertically aligned with the workpiece surface. The thickness data of the titanium alloy layer is collected in real time through the principle of optical interference and transmitted to the control system. This enables in-situ online detection of the etching endpoint without stopping the machine to remove the workpiece for offline detection. It can accurately control the etching thickness, avoid over-etching and under-etching, and improve product yield and processing efficiency.

[0036] 4. In this invention, a three-zone layout structure of activation chamber, etching chamber and rinsing chamber is formed by four sealed transition doors. The workpiece flows along the linear conveyor module with the moving frame station by station. Each chamber can be independently sealed through the sealed transition doors. This can realize continuous production line processing of activation, etching and rinsing processes, improve production efficiency, avoid cross-contamination of different process media, and allow independent adjustment of parameters for each process to adapt to different processing needs. Attached Figure Description

[0037] Figure 1 This is a perspective view of a mobile phone screen glass etching apparatus proposed in this invention;

[0038] Figure 2 This is a perspective cross-sectional view of a mobile phone screen glass etching apparatus proposed in this invention;

[0039] Figure 3 This is a schematic diagram of the activation mechanism structure of a mobile phone screen glass etching device proposed in this invention;

[0040] Figure 4 This is a schematic diagram of the discharge electrode structure of a mobile phone screen glass etching device proposed in this invention;

[0041] Figure 5 This is a schematic diagram of the workpiece carrier and flow guide cover structure of a mobile phone screen glass etching device proposed in this invention;

[0042] Figure 6 This is a schematic diagram of the spraying mechanism structure of a mobile phone screen glass etching device proposed in this invention;

[0043] Figure 7 This is a cross-sectional view of the moving frame and U-shaped enclosure of a mobile phone screen glass etching device proposed in this invention;

[0044] Figure 8 This is a schematic diagram of the reciprocating shearing mechanism structure of a mobile phone screen glass etching device proposed in this invention.

[0045] Figure 9 This is a schematic diagram of the adsorption hole structure of the vacuum pump in a mobile phone screen glass etching device proposed in this invention.

[0046] Figure 10 This is a schematic diagram of the closing mechanism of a mobile phone screen glass etching device proposed in this invention.

[0047] In the diagram: 1. Housing; 2. Linear conveyor module; 3. Sealed transition door; 4. Activation mechanism; 41. Air pump; 42. Air extraction pipe; 43. Exhaust pipe; 44. U-shaped pipe; 45. Air jet frame; 46. Inclined jet nozzle; 47. Discharge electrode; 5. Liquid storage tank; 6. Flushing mechanism; 7. Spraying mechanism; 71. Liquid pump; 72. Filter cover; 73. Drain pipe; 74. Spray frame; 75. Etching solution nozzle; 8. Mold base; 9. Moving frame; 10. Workpiece carrier frame; 11. Guide cover plate; 12. Activation chamber; 13. Etching chamber; 14. Flushing chamber; 5. First electric push rod; 16. Cleaning fluid reservoir; 17. Etching fluid reservoir; 18. U-shaped enclosure; 19. Fiber optic spectral probe; 20. Baffle seat; 21. Reciprocating shearing mechanism; 211. Motor; 212. Mounting plate; 213. Guide rod; 214. Guide block; 215. Rack seat; 216. Rotating plate; 217. Drive rod; 218. Push frame; 219. Transmission gear; 22. Cover closing mechanism; 221. Fixing frame; 222. Second electric push rod; 223. Traction frame; 224. U-shaped connecting rod; 23. Vacuum pump; 24. Adsorption hole. Detailed Implementation

[0048] The technical solution of the present invention will be further described in detail below with reference to specific embodiments.

[0049] Reference Figures 1-10This invention provides a mobile phone screen glass etching apparatus, including a housing 1, a linear conveying module 2, and a moving frame 9. The linear conveying module 2 is fixedly installed on the housing 1. An activation chamber 12, an etching chamber 13, and a rinsing chamber 14 are sequentially arranged inside the housing 1 along the workpiece conveying direction. Each adjacent chamber is separated by a liftable sealed transition door 3, forming three independent sealed workstations. The top of the housing 1 has an inlet / outlet for the sealed transition doors 3 to pass through, and a first electric push rod 15 for driving the sealed transition doors 3 to rise and fall is fixedly installed on the top of the housing 1. The sealed transition doors 3 and the housing 1... The inlet / outlet and the linear conveyor module 2 are kept in a sealed fit. The first electric push rod 15 drives the corresponding sealed transition door 3 to move up and down along the inlet / outlet. When the door is lowered, it closes, separating the corresponding chamber from the adjacent workstation to form a sealed space. When the door is raised, it opens, allowing the moving frame 9 to carry the workpiece through the linear conveyor module 2, completing the flow and switching between workstations. Thus, the structure of three independent workstations is formed by separating four sealed transition doors. This can realize continuous production line operation of activation, etching and rinsing processes, improve the production efficiency of batch processing, and avoid cross-contamination of different process media through sealed isolation.

[0050] Mold bases 8 are fixedly installed on both sides of the bottom of the moving frame 9, and the mold bases 8 are driven by the linear conveying module 2. A workpiece carrier frame 10 and a flow guide plate 11 are slidably arranged inside the moving frame 9, with the flow guide plate 11 positioned above the workpiece carrier frame 10. The gap between the flow guide plate 11 and the workpiece carrier frame 10 forms a liquid film channel. The workpiece carrier frame 10 has a built-in vacuum adsorption fixing assembly for adsorbing and fixing mobile phone screen glass workpieces. The vacuum adsorption fixing assembly includes several adsorption holes 24 opened on the top of the workpiece carrier frame 10, and a vacuum pump 23 is fixedly installed on one outer wall of the workpiece carrier frame 10. The vacuum end of the vacuum pump 23 is connected to the workpiece carrier frame 10 via a pipeline. The internal structure is interconnected. The workpiece frame 10 is driven by the linear conveyor module 2 and can be moved and switched between the activation chamber 12, etching chamber 13 and rinsing chamber 14 in a step-by-step manner. Before processing, the glass workpiece is placed on the top surface of the workpiece frame 10. After the vacuum pump 23 is started, the air inside the workpiece frame 10 is extracted through the pipeline to form a negative pressure. The negative pressure is applied to the bottom surface of the workpiece through the adsorption holes 24 distributed in the top surface, which stably adsorbs and fixes the workpiece. The linear conveyor module 2 drives the entire moving frame 9 to move along the conveying direction through the drive mold base 8, so as to realize the flow of the workpiece between different chambers. This ensures that the workpiece does not shift or move during subsequent reciprocating motion, and ensures the etching position accuracy.

[0051] A U-shaped enclosure 18 is fixedly installed on the top of the movable frame 9. A reciprocating shearing mechanism 21, which drives the workpiece carrier 10 and the guide plate 11 to move in opposite directions, is provided on the U-shaped enclosure 18 and the movable frame 9. The reciprocating shearing mechanism 21 includes a rack seat 215 fixedly installed on the top of the other side of the workpiece carrier 10 and hinged to one side of the guide plate 11. A mounting plate 212 is fixedly installed on the inner wall of the movable frame 9. A transmission gear 219 is rotatably connected to the middle of the mounting plate 212. Two rack seats 215 are respectively meshed above and below the transmission gear 219. A motor 211 is fixedly installed on one outer wall of the U-shaped enclosure 18. A rotating plate 216 is fixedly installed on the output shaft of the motor 211. A pusher frame 2 is fixedly installed on one side of the upper rack seat 215. 18. A drive rod 217 is fixed to the top of the rotating plate 216 and fits inside the push frame 218. A guide block 214 is fixedly installed on one side of the workpiece frame 10. Guide holes are provided on the guide block 214 and the two rack seats 215. Guide rods 213 passing through the guide holes are fixedly installed on the inner walls of the moving frame 9 and the U-shaped enclosure 18. The rotating plate 216 at the output end is driven to rotate circumferentially by the motor 211. The drive rod 217 on the rotating plate 216 rotates synchronously with the rotating plate 216 and slides against the inner wall of the push frame 218, converting the rotational motion into the horizontal reciprocating motion of the push frame 218. This, in turn, drives the rack seat 215 above to slide horizontally along the guide rod 213. When the rack seat 215 moves, it drives the transmission. Gear 219 rotates around its axis, driving the rack seat 215 below to reciprocate in opposite directions along the guide rod 213 via gear meshing. This ultimately achieves the reverse synchronous movement of the guide cover 11 and the workpiece frame 10, thereby generating a continuous shearing effect on the etching solution within the liquid film channel. This breaks the concentration and temperature gradients within the liquid film, allowing the etching solution to uniformly cover the workpiece surface, significantly improving the uniformity of the entire surface etching and avoiding local over-etching or under-etching problems. The reciprocating shearing mechanism 21 simultaneously drives the guide cover 11 and the workpiece frame 10 to reciprocate in opposite directions in the horizontal direction, causing the etching solution within the liquid film channel to form a uniform dynamic liquid film under shearing action. This film adheres to the titanium alloy layer on the workpiece surface to complete the etching reaction. The upper part is provided with a cover-closing mechanism 22 for driving the flow guide cover 11 to open and close. The cover-closing mechanism 22 includes a fixed frame 221 fixedly installed on the top of the upper rack seat 215, and a second electric push rod 222 is hinged to the inner wall of the fixed frame 221. A U-shaped connecting rod 224 is fixedly installed on the piston end of the second electric push rod 222. A traction frame 223 is fixedly installed on the top of the flow guide cover 11, and a sliding rod that slides along the inner wall of the traction frame 223 is rotatably connected to the inner wall of the U-shaped connecting rod 224 through a pin. When loading and unloading, the piston end of the second electric push rod 222 retracts, and the traction frame 223 is lifted upward through the cooperation of the U-shaped connecting rod 224 and the sliding rod, which drives the flow guide cover 11 to flip upward around the hinge point and open, exposing the top surface of the workpiece carrier frame 10 for loading and unloading workpieces.Before etching, the piston end of the second electric push rod 222 extends and pushes the guide cover 11 to flip down and close, forming a closed liquid film channel with the workpiece frame 10 below. The U-shaped barrier 18 simultaneously forms a barrier constraint on the side of the channel, so that the guide cover 11 can be closed during etching to form a channel that constrains the liquid film, and the guide cover 11 can be completely raised during loading and unloading to leave sufficient space for workpiece loading and unloading.

[0052] The activation chamber 12 is equipped with an activation mechanism 4 for activating the surface of the titanium alloy workpiece.

[0053] The etching chamber 13 is provided with a spraying mechanism 7 for spraying etching solution into the liquid film channel;

[0054] The rinsing chamber 14 is equipped with a rinsing mechanism 6 for rinsing the surface of the workpiece.

[0055] To facilitate the detection of titanium alloy layer thickness, refer to Figure 7 Several fiber optic spectral probes 19 are embedded on the flow guide cover 11, and the fiber optic spectral probes 19 are perpendicular to the workpiece surface. During the etching process, the fiber optic spectral probes 19 emit light to the workpiece surface. After the light is reflected by the upper and lower interfaces of the titanium alloy layer, an interference light signal is formed. The probes transmit the collected interference spectral signal to the control system in real time. The system calculates the remaining thickness of the titanium alloy layer through spectral changes, realizing in-situ online detection of etching thickness without stopping the machine to remove the workpiece for offline measurement.

[0056] To enhance liquid film uniformity, refer to Figure 5 and Figure 9 Several flow-disrupting seats 20 are fixedly arranged on the top surface of the workpiece frame 10 and the bottom surface of the flow guide cover 11. The positions of the upper and lower sets of flow-disrupting seats 20 are staggered. The flow-disrupting seats 20 are designed as triangular prisms. When the flow guide cover 11 and the workpiece frame 10 move in opposite directions, the upper and lower staggered flow-disrupting seats 20 move synchronously relative to each other, continuously cutting the boundary layer of the liquid film, disturbing the flow field state inside the liquid film, further enhancing the turbulent mixing effect inside the liquid film, and prompting the by-products generated by the reaction to detach from the workpiece surface in time.

[0057] To improve the etching reaction rate, refer to Figure 1 , Figure 3 and Figure 4The activation mechanism 4 includes a vacuum pump 41 fixedly installed at the top of the activation chamber 12, with a vacuum pipe 42 fixedly installed at the vacuum end of the vacuum pump 41. Argon-hydrogen mixed gas is introduced through the vacuum pipe 42. An exhaust pipe 43 extending into the activation chamber 12 is fixedly installed at the exhaust end of the vacuum pump 41, and a U-shaped pipe 44 is fixedly installed at the bottom end of the exhaust pipe 43. Both ends of the U-shaped pipe 44 are fixedly connected to jet frames 45, and two sets of discharge electrodes 47 are fixedly installed inside the jet frames 45 for ionizing the introduced argon-hydrogen mixed gas into plasma. An evenly spaced inclined jet nozzle 46 is fixedly connected to the bottom of the jet frame 45. After the process starts, the vacuum pump 41 draws argon-hydrogen mixed gas through the vacuum pipe 42, delivers it to the U-shaped pipe 44 through the exhaust pipe 43, and evenly distributes it into the jet frames 45 on both sides. After the discharge electrode 47 is connected to the high-frequency power supply, a discharge effect is generated, which ionizes the argon-hydrogen mixed gas flowing through the inner cavity of the jet frame 45 into plasma. Under the drive of air pressure, the ionized plasma gas is obliquely sprayed onto the titanium alloy surface of the workpiece through the inclined jet nozzles 46 that are evenly distributed at the bottom of the jet frame 45, completing the surface oxide film removal and activation treatment. This can effectively remove the dense oxide film on the surface of the titanium alloy, improve the start-up speed of the etching reaction and the uniformity of the whole surface.

[0058] To ensure liquid supply, refer to Figure 1 and Figure 6 A liquid storage tank 5 is fixedly installed at the bottom of the housing 1, and the interior of the liquid storage tank 5 is divided into a cleaning liquid storage chamber 16 and an etching liquid storage chamber 17. The cleaning liquid storage chamber 16 and the etching liquid storage chamber 17 are respectively connected to the rinsing chamber 14 and the etching chamber 13. The spraying mechanism 7 includes a pump 71 fixedly installed on one side of the etching liquid storage chamber 17, and a pump pipe is fixedly installed at the pumping end of the pump 71. A filter cover 72 is fixedly installed at one end of the pump pipe. A drain pipe 73 extending into the etching chamber 13 is fixedly installed at the draining end of the pump 71, and a spray frame 74 corresponding to the feed opening side of the U-shaped enclosure 18 is fixedly installed at the top of the drain pipe 73. An etching liquid is fixedly connected to one side of the spray frame 74 at equal intervals. The nozzle 75 is positioned corresponding to the position of the liquid film channel. The rinsing mechanism 6 and the spraying mechanism 7 have the same structure. The rinsing mechanism 6 is connected to the cleaning liquid storage chamber 16. During the etching operation, the pump 71 is started and the etching liquid is drawn from the etching liquid storage chamber 17 through the suction pipe with the filter cover 72. The filter cover 72 filters out impurity particles in the liquid. The etching liquid is transported to the spray frame 74 through the drain pipe 73 and then injected into the liquid film channel at a uniform speed through the equidistantly distributed etching liquid nozzles 75 for use in the etching reaction. During the rinsing operation, the rinsing mechanism 6 draws the cleaning liquid from the cleaning liquid storage chamber 16 and sprays it onto the surface of the workpiece in the same way to complete the rinsing of residual etching liquid and by-products.

[0059] It also includes a control system, which is electrically connected to the linear conveying module 2, the first electric push rod 15, the vacuum pump 23, the air pump 41, the discharge electrode 47, the motor 211, the second electric push rod 222, the liquid pump 71, and the fiber optic spectral probe 19. The control system is used to control the lifting and lowering of the sealing transition door 3, the translation of the moving frame 9 between the chambers, the vacuum adsorption and fixation of the workpiece, the start and stop of the activation process, the opening and closing of the guide cover 11, the start and stop of the reciprocating shearing mechanism 21, the spraying of the etching solution, and the start and stop of the rinsing process. It also receives the titanium alloy layer thickness detection signal collected by the fiber optic spectral probe 19. When the etching thickness is detected to reach the preset value, it controls the spraying mechanism 7 and the reciprocating shearing mechanism 21 to stop running, thus terminating the etching process.

[0060] Working principle: During operation, the guide cover 11 is in the open state, and the mobile phone screen glass workpiece to be etched is placed on the top surface of the workpiece frame 10. The control system controls the vacuum pump 23 to start and generates negative pressure through the adsorption hole 24 on the top surface of the workpiece frame 10 to vacuum adsorb and fix the workpiece.

[0061] Subsequently, the control system controls the linear conveying module 2 to work, driving the mold base 8 and the moving frame 9 to move along the conveying direction. They first enter the activation chamber 12 inside the housing 1. The first electric push rod 15 drives the sealing transition door 3 to descend and close, making the activation chamber 12 a sealed space. The vacuum pump 41 of the activation mechanism 4 draws argon-hydrogen mixed gas through the vacuum pipe 42, and delivers it to the U-shaped pipe 44 through the exhaust pipe 43 and diverts it to the jet frames 45 on both sides. After the two sets of discharge electrodes 47 inside the jet frame 45 are energized, the argon-hydrogen mixed gas is ionized into plasma. The ionized plasma gas is then sprayed obliquely onto the titanium alloy surface of the workpiece through the inclined jet nozzles 46 that are evenly distributed at the bottom of the jet frame 45, breaking the dense oxide film on the surface and completing the activation treatment.

[0062] After activation, the sealing transition door 3 opens, and the moving frame 9 moves into the etching chamber 13. The sealing transition door 3 at the corresponding position closes again. At this time, the second electric push rod 222 of the closing mechanism 22 is activated, and the guide cover 11 is driven to fall and close through the cooperation of the U-shaped connecting rod 224, the sliding rod and the traction frame 223, so that the gap between the guide cover 11 and the workpiece frame 10 forms a liquid film channel. The U-shaped barrier 18 simultaneously forms a barrier on the side of the channel to prevent the etching solution from leaking. Then, the pump 71 and the pumping pipe of the spraying mechanism 7 draw the etching solution from the etching solution storage chamber 17 of the storage tank 5, and deliver it to the spraying frame 74 through the drain pipe 73. Then, the etching solution is injected into the liquid film channel at a uniform speed by the etching solution nozzle 75. Immediately afterwards, the reciprocating shearing machine... When the mechanism 21 is started, the motor 211 drives the rotating plate 216 to rotate. The drive rod 217 on the rotating plate 216 slides in the push frame 218, which drives the upper rack seat 215 to move horizontally and reciprocally along the guide rod 213. The transmission gear 219 on the mounting plate 212 rotates synchronously with the upper rack seat 215, and then meshes to drive the lower rack seat 215 to move in the opposite direction and synchronously along the guide rod 213. Finally, it drives the guide cover plate 11 and the workpiece frame 10 to produce a reverse synchronous reciprocating shearing action. The turbulence seat 20 arranged alternately on the top surface of the workpiece frame 10 and the bottom surface of the guide cover plate 11 enhances the liquid film turbulence effect, so that the etching liquid in the channel forms a uniform dynamic liquid film, which continuously acts on the workpiece surface to achieve high-precision uniform etching.

[0063] During the etching process, the fiber optic spectral probe 19 embedded on the guide cover plate 11 detects the remaining thickness of the titanium alloy layer in real time through the principle of optical interference and transmits the detection signal to the control system. After receiving the thickness data, the control system compares it with the preset target value. When the etching thickness is detected to reach the preset value, the control system controls the spraying mechanism 7 and the reciprocating shearing mechanism 21 to stop running and terminate the etching process.

[0064] After etching, the closing mechanism 22 drives the guide cover plate 11 to lift and open, the sealing transition door 3 opens, the moving frame 9 moves into the rinsing chamber 14, and the corresponding sealing transition door 3 closes. The rinsing mechanism 6 draws cleaning liquid from the cleaning liquid storage chamber 16 and sprays it on the surface of the workpiece to remove residual etching liquid and reaction by-products. After rinsing, the sealing transition door 3 on the discharge side opens, the moving frame 9 moves out of the material chamber, the control system controls the vacuum pump 23 to release the vacuum adsorption, and the workpiece is taken out, completing the entire continuous processing cycle of activation, etching and rinsing.

[0065] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A mobile phone screen glass etching apparatus, comprising a housing (1), a linear conveying module (2), and a moving frame (9), wherein the linear conveying module (2) is fixedly mounted on the housing (1), characterized in that: The housing (1) is provided with an activation chamber (12), an etching chamber (13) and a rinsing chamber (14) in sequence along the workpiece conveying direction, and a liftable sealed transition door (3) is provided between adjacent chambers. The bottom of both sides of the movable frame (9) is fixedly installed with a mold base (8), and the mold base (8) is driven by the linear conveying module (2). The movable frame (9) is slidably arranged with a workpiece carrier frame (10) and a flow guide plate (11), and the flow guide plate (11) is arranged above the workpiece carrier frame (10). The gap between the flow guide plate (11) and the workpiece carrier frame (10) forms a liquid film channel. The workpiece carrier frame (10) has a built-in vacuum adsorption fixing component. The top of the movable frame (9) is fixedly installed with a U-shaped enclosure (18), and the U-shaped enclosure (18) and the movable frame (9) are provided with a reciprocating shearing mechanism (21) that drives the workpiece carrier (10) and the guide cover (11) to move in opposite directions. The reciprocating shearing mechanism (21) is provided with a cover closing mechanism (22) for driving the guide cover (11) to open and close. An activation mechanism (4) is provided on the activation chamber (12); The etching chamber (13) is provided with a spraying mechanism (7); The flushing chamber (14) is provided with a flushing mechanism (6).

2. The mobile phone screen glass etching apparatus according to claim 1, characterized in that: The top of the housing (1) is provided with an inlet and outlet for the sealing transition door (3) to pass through, and the top of the housing (1) is fixedly installed with a first electric push rod (15) for driving the sealing transition door (3) to rise and fall.

3. The mobile phone screen glass etching apparatus according to claim 1, characterized in that: The vacuum adsorption fixing assembly includes several adsorption holes (24) opened on the top of the workpiece frame (10), and a vacuum pump (23) is fixedly installed on one side of the outer wall of the workpiece frame (10). The vacuum end of the vacuum pump (23) is connected to the inside of the workpiece frame (10) through a pipeline.

4. The mobile phone screen glass etching apparatus according to claim 1, characterized in that: The reciprocating shearing mechanism (21) includes a rack seat (215) fixedly installed on the top of the other side of the workpiece frame (10) and hinged to one side of the guide cover plate (11). The inner wall of the moving frame (9) is fixed with a mounting plate (212). A transmission gear (219) is rotatably connected to the middle of the mounting plate (212). The two rack seats (215) are respectively meshed above and below the transmission gear (219). A motor (211) is fixedly installed on one side of the outer wall of the U-shaped enclosure (18), and the output of the motor (211) is... A rotating plate (216) is fixedly installed on the shaft. A push frame (218) is fixedly installed on one side of the rack seat (215) above. A drive rod (217) is fixedly attached to the top of the rotating plate (216) and fits inside the push frame (218). A guide block (214) is fixedly installed on one side of the workpiece carrier frame (10). Guide holes are opened on the guide block (214) and the two rack seats (215). A guide rod (213) passing through the guide hole is fixedly installed on the inner wall of the moving frame (9) and the U-shaped enclosure (18).

5. The mobile phone screen glass etching apparatus according to claim 4, characterized in that: The closing mechanism (22) includes a fixed frame (221) fixedly installed on the top of the upper rack seat (215), and a second electric push rod (222) is hinged to the inner wall of the fixed frame (221). A U-shaped connecting rod (224) is fixedly installed on the piston end of the second electric push rod (222). A traction frame (223) is fixedly installed on the top of the guide cover (11), and a slide rod that slides along the inner wall of the traction frame (223) is rotatably connected to the inner wall of the U-shaped connecting rod (224) through a pin.

6. The mobile phone screen glass etching apparatus according to claim 5, characterized in that: The flow guide cover (11) is equipped with several fiber optic spectral probes (19), and the fiber optic spectral probes (19) are perpendicular to the surface of the workpiece.

7. The mobile phone screen glass etching apparatus according to claim 6, characterized in that: The top surface of the workpiece frame (10) and the bottom surface of the flow guide cover (11) are both fixedly arranged with several flow deflectors (20), and the positions of the upper and lower sets of flow deflectors (20) are staggered.

8. The mobile phone screen glass etching apparatus according to claim 1, characterized in that: The activation mechanism (4) includes a vacuum pump (41) fixedly installed on the top of the activation chamber (12), and a vacuum pipe (42) is fixedly installed at the vacuum end of the vacuum pump (41). The vacuum pipe (42) is used to introduce argon-hydrogen mixed gas. An exhaust pipe (43) extending into the activation chamber (12) is fixedly installed at the exhaust end of the vacuum pump (41). A U-shaped pipe (44) is fixedly installed at the bottom end of the exhaust pipe (43). Both ends of the U-shaped pipe (44) are fixedly connected to a jet frame (45). Two sets of discharge electrodes (47) are fixedly installed inside the jet frame (45) for ionizing the introduced argon-hydrogen mixed gas into plasma. An inclined jet nozzle (46) with equal spacing is fixedly connected to the bottom of the jet frame (45).

9. The mobile phone screen glass etching apparatus according to claim 1, characterized in that: The bottom of the housing (1) is fixedly installed with a liquid storage tank (5), and the interior of the liquid storage tank (5) is divided into a cleaning liquid storage chamber (16) and an etching liquid storage chamber (17). The spraying mechanism (7) includes a pump (71) fixedly installed on one side of the etching liquid storage chamber (17), and a pump pipe is fixedly installed at the pumping end of the pump (71). A filter cover (72) is fixedly installed at one end of the pump pipe. A drain pipe (73) extending into the etching chamber (13) is fixedly installed at the draining end of the pump (71), and a spray frame (74) corresponding to the feed opening side of the U-shaped enclosure (18) is fixedly installed at the top of the drain pipe (73). An etching liquid nozzle (75) is fixedly connected to one side of the spray frame (74) at equal distances, and the position of the etching liquid nozzle (75) corresponds to the position of the liquid film channel.

10. The mobile phone screen glass etching apparatus according to claim 9, characterized in that: The flushing mechanism (6) and the spraying mechanism (7) have the same structure, and the flushing mechanism (6) is connected to the cleaning fluid reservoir (16).

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