A control method for a cleaning system

Abstract

The application provides a control method of a cleaning system. The cleaning system comprises a pool cleaning robot and a base station. The pool cleaning robot comprises: a first filter configured to filter liquid flowing through the first filter; a cleaning opening arranged on the first filter; the base station comprises: a driving assembly; the driving assembly comprises a gas delivery device; a second filter configured to filter liquid flowing through the second filter; a dirty inlet opening arranged on the second filter; wherein the dirty inlet opening is located in the air before the gas delivery device is operated; a second controller; the method is applied to the second controller, and the method comprises: when the base station performs cleaning on the first filter, controlling the gas delivery device to operate so that garbage and liquid in the first filter enter the second filter through the cleaning opening and the dirty inlet opening. The self-cleaning of the cleaning device is realized, the participation of the user is reduced, and the cleaning endurance of the cleaning device is improved.

Description

[0001] This disclosure claims application number PCT / CN2025 / 107590, filed on July 8, 2025, entitled "Cleaning System, Cleaning Equipment, Base Station and Cleaning System Control Method", the entire contents of which are incorporated herein by reference.

[0002] This disclosure claims application number PCT / CN2025 / 107787, filed on July 9, 2025, entitled "Cleaning System, Cleaning Equipment, Base Station and Cleaning System Control Method", the entire contents of which are incorporated herein by reference. Technical Field

[0003] This application relates to the field of cleaning system control technology, and in particular to a control method for a cleaning system. Background Technology

[0004] As people's living standards improve, the popularity of private and public pools is gradually increasing. Pool cleaning robots, as devices capable of automatically completing underwater cleaning tasks, have been widely used. However, due to the limited capacity of the filter components in these cleaning devices, users need to repeatedly retrieve the device from the pool and manually remove the filter components for cleaning. After cleaning, the filter components are then placed back into the device for future use. Because the cleaning devices are not lightweight and the process of cleaning the filter components is complex, the operation is quite inconvenient.

[0005] Therefore, a method is needed that allows base stations to self-clean cleaning equipment, reducing the need for manual intervention by users. Summary of the Invention

[0006] This application provides a control method for a cleaning system to improve the technical problem that existing cleaning equipment requires users to clean the filter components.

[0007] This application provides a control method for a cleaning system. The cleaning system includes a pool cleaning robot and a base station. The pool cleaning robot includes: a first filter configured to filter liquid flowing through the first filter; a cleaning opening disposed on the first filter; the base station includes: a drive assembly including a gas delivery device; a second filter configured to filter liquid flowing through the second filter; a waste inlet disposed on the second filter; wherein the waste inlet is located in the air before the gas delivery device operates; a second controller; and the method is applied to the second controller, the method comprising: When the base station cleans the first filter, it controls the gas delivery device to operate so that the waste and liquid in the first filter enter the second filter through the cleaning opening and the sludge inlet opening.

[0008] In an exemplary embodiment of this application, the driving component includes a second conveying device in fluid communication with a second filter; the method includes: controlling the second conveying device to operate so as to drive the liquid filtered by the second filter to be discharged outside the base station.

[0009] In an exemplary embodiment of this application, a base station is provided with a first clean water outlet; the method includes: controlling a gas delivery device to operate, so as to form a negative pressure in a second filter, such that the liquid level in the second filter is higher than the lowest point of the first clean water outlet; controlling a second delivery device to operate, so as to drive the liquid filtered by the second filter to be discharged outside the base station through the first clean water outlet.

[0010] In an exemplary embodiment of this application, the method includes: First, control the gas delivery device to operate; After the gas delivery device has been operating for a first preset time, and / or after the liquid level in the second filter is higher than the lowest point of the first clean water outlet, the second delivery device is controlled to operate so as to drive the liquid filtered by the second filter to be discharged from the base station through the first clean water outlet.

[0011] In an exemplary embodiment of this application, the method includes: When the liquid level in the second filter reaches the maximum liquid level line, the control gas delivery device stops working; Alternatively, in a gas delivery device including an air pump, the power of the air pump can be reduced when the liquid level in the second filter reaches the maximum liquid level line.

[0012] In an exemplary embodiment of this application, the base station includes a first nozzle, which is configured to spray water onto the filter surface of the first filter when the base station cleans the first filter of the pool cleaning robot. The methods include: Control the operation of the gas delivery device so that the filter surface in the first filter is at least partially above the liquid surface; Control the water flow from the first nozzle to clean the filter surface of the first filter.

[0013] In an exemplary embodiment of this application, the method includes: The gas delivery device is controlled to operate at a first power, and when the gas delivery device is operating at the first power, the liquid level in the first filter is at a first height; The gas delivery device is controlled to operate at a second power so that the liquid level in the first filter drops to a second height, and the filter surface in the first filter is at least partially above the liquid level; wherein the second power is greater than the first power.

[0014] In an exemplary embodiment of this application, the drive assembly includes a second conveying device, which is in fluid communication with a second filter; The methods include: When the gas conveying device is controlled to operate at the first power, the second conveying device is controlled to operate at the third power; When the gas conveying device is controlled to operate at a second power, the second conveying device is controlled to operate at a fourth power; wherein the fourth power is greater than the third power.

[0015] In an exemplary embodiment of this application, the method includes: Control the gas delivery device to operate at a first power, and control the first nozzle to either not operate or operate at a first water spray volume; The gas delivery device is controlled to operate at a second power, and the first nozzle is controlled to operate at a second water spray volume to clean the filter surface of the first filter; wherein the second water spray volume is greater than the first water spray volume.

[0016] In an exemplary embodiment of this application, the first filter includes a first frame, and a cleaning opening is disposed on the first frame; a drain baffle is disposed at the cleaning opening, and the drain baffle is disposed on the first frame and located on the outside of the first frame; The pool cleaning robot includes a first controller. When the pool cleaning robot cleans the pool, the first controller controls the impeller of the main water pump to rotate in a first direction so that the sewage baffle abuts against the outside of the first frame and blocks the cleaning opening, preventing the garbage in the first filter from flowing out of the cleaning opening. The method also includes: When the base station cleans the water tank cleaning robot, the gas delivery device is controlled to work so that the sewage discharge baffle moves away from the receiving cavity of the first filter under the action of the gas delivery device, so as to open the cleaning opening and allow the garbage and liquid in the first filter to flow out through the cleaning opening.

[0017] In an exemplary embodiment of this application, the first filter includes a first frame, and a bottom water inlet is provided at the bottom of the first frame; a second inlet baffle is provided at the bottom water inlet of the filter, and the second inlet baffle is provided on the first frame and located inside the first frame. The pool cleaning robot includes a first controller. When the pool cleaning robot cleans the pool, the first controller controls the impeller of the main water pump to rotate in a first direction, so that the second inlet baffle moves into the receiving cavity of the first filter and opens the bottom water inlet of the filter. Alternatively, when the base station is cleaning the water tank cleaning robot, the first controller is used to control the impeller of the main water pump to rotate in a second direction, so that the second inlet baffle abuts against the inside of the first frame and blocks the bottom water inlet of the filter, wherein the second direction is opposite to the first direction; The method also includes: When the base station is cleaning the water tank cleaning robot, the gas delivery device is controlled to work so that the second inlet baffle moves into the receiving cavity of the first filter, opens the bottom water inlet of the filter, and the liquid in the water tank enters the first filter through the bottom water inlet of the filter and flows out of the water tank cleaning robot through the sewage inlet. Alternatively, when the base station is cleaning the water tank cleaning robot, the gas delivery device is controlled to work so that the second inlet baffle abuts against the inside of the first frame, blocking the bottom water inlet of the filter.

[0018] In an exemplary embodiment of this application, the base station includes a first nozzle, which is configured to spray water onto the filter surface of the first filter when the base station cleans the first filter of the pool cleaning robot. Before the water tank cleaning robot docks with the base station, the first baffle at the first opening of the water tank cleaning robot is opened so that when the water tank cleaning robot docks with the base station, the first nozzle extends into the first filter through the first opening.

[0019] In an exemplary embodiment of this application, the base station includes a first nozzle, which is configured to spray water onto the filter surface of the first filter when the base station cleans the first filter of the pool cleaning robot; the first nozzle has a retracted position and an extended position. Before the pool cleaning robot docks with the base station, the first nozzle is controlled to be in the retracted position to avoid interfering with the pool cleaning robot. After the pool cleaning robot docks with the base station, the first baffle at the first opening of the pool cleaning robot is opened so that the first nozzle can extend into the first filter through the first opening and switch to the extended position.

[0020] In an exemplary embodiment of this application, a water tank cleaning robot is controlled to dock with a base station in a floating posture on the water surface; The water tank cleaning robot is controlled to dock with the base station in an orientation where its bottom is in contact with the pool wall and / or with the base station.

[0021] In combination with existing technologies, the beneficial effects of this application are as follows: Existing cleaning equipment requires human intervention to clean the first filter. The method of this application, by installing a drive component in the base station, including a gas delivery device, allows the gas delivery device to operate when the base station performs a cleaning task on the first filter. This enables waste and liquid in the first filter to enter the second filter through the cleaning opening and the waste inlet opening, achieving self-cleaning of the cleaning equipment, reducing human intervention, and improving the cleaning equipment's operating time.

[0022] The inlet is located in the air. A negative pressure is created at the inlet by the operation of the gas delivery device, which can draw the garbage and liquid in the first filter into the second filter, thereby transferring the garbage in the first filter and cleaning the first filter. Attached Figure Description

[0023] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application. It is obvious that the drawings described below are merely some embodiments of this application, and those skilled in the art can obtain other drawings based on these drawings without any inventive effort.

[0024] In the attached diagram: Figure 1 A schematic diagram of a cleaning device provided in an embodiment of this application; Figure 2 This is a perspective view of the cleaning equipment provided in one embodiment of this application; Figure 3 This is a cross-sectional view of the cleaning equipment provided in one embodiment of this application; Figure 4 This is a schematic diagram of the cleaning equipment provided in one embodiment of this application being connected to a base station; Figure 5 This is a cross-sectional schematic diagram of the cleaning equipment provided in one embodiment of this application when it is connected to a base station. Figure 6 This is a schematic diagram of the structure of a base station according to an embodiment of the present disclosure; Figure 7 yes Figure 6 A schematic diagram of the structure of another state of the base station provided; Figure 8 yes Figure 6 A schematic diagram of the self-cleaning sewage inlet of the provided base station; Figure 9 yes Figure 7 A cross-sectional view at position D1-D1; Figure 10 yes Figure 7 A cross-sectional view at position E1-E1; Figure 11 This is a schematic diagram of an embodiment of the cleaning equipment disclosed herein being connected to a base station; Figure 12 This is a schematic diagram of the structure of one embodiment of the base station support component disclosed herein; Figure 13 This is a schematic diagram of a structural embodiment of the cleaning equipment and the carrier component disclosed herein. Figure 14This is another structural schematic diagram of an embodiment of the base station support component disclosed herein; Figure 15 This is an exemplary schematic diagram of a base station disclosed herein; Figure 16 This is a schematic diagram of the structure of one embodiment of the cleaning equipment disclosed herein; Figure 17 yes Figure 16 A schematic diagram of the structure of the cleaning equipment after the first filter has been removed; Figure 18 yes Figure 16 Schematic diagram of the first filter and first dust bin structure of the cleaning equipment; Figure 19 yes Figure 16 Schematic diagram of the third flow channel structure of the cleaning equipment; Figure 20 This is a schematic diagram of an embodiment of the internal heating structure of the base station disclosed herein; Figure 21 This is an exploded structural diagram of an embodiment of the base station disclosed herein; Figure 22 yes Figure 21 Overall schematic diagram of the base station; Figure 23 This is a first cross-sectional view of an embodiment of the cleaning equipment and base station docked in a water tank; Figure 24 yes Figure 23 Second cross-sectional view of the base station in the image; Figure 25 This is a schematic diagram of one embodiment of the base station disclosed herein; Figure 26 This is a schematic diagram of one embodiment of the base station disclosed herein; Figure 27 This is a schematic diagram of one embodiment of the base station disclosed herein; Figure 28 This is a schematic diagram of one embodiment of the base station disclosed herein; Figure 29 This is a schematic diagram of an embodiment of the internal heating structure of the base station disclosed herein; Figure 30 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 31 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 32 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 33 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 34 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 35 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 36 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 37 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 38 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 39 This is a schematic diagram of an embodiment of the docking of the cleaning equipment and the carrier component disclosed herein; Figure 40 This is a schematic diagram of an embodiment of the base station's location and the movement of the cleaning equipment in the form of a water tank disclosed herein; Figure 41 This is a schematic diagram of an embodiment of the base station's location and the movement of the cleaning equipment in the form of a water tank disclosed herein; Figure 42 This is a schematic diagram of an embodiment of the base station's location and the movement of the cleaning equipment in the form of a water tank disclosed herein; Figure 43 This is a schematic diagram of an embodiment of the base station's location and the movement of the cleaning equipment in the form of a water tank disclosed herein; Figure 44 This is a schematic diagram of an embodiment of the base station's location and the movement of the cleaning equipment in the form of a water tank disclosed herein; Figure 45 This is a schematic cross-sectional view of the first dust box in one embodiment of this disclosure; Figure 46 This is a cross-sectional schematic diagram of the first dust box and the first dust hopper in one embodiment of this disclosure; Figure 47 This is a cross-sectional schematic diagram of the first dust box and the first dust hopper in one embodiment of this disclosure; Figure 48 This is a first state diagram of an embodiment of the cleaning equipment and base station docking in a water tank; Figure 49 This is a second state diagram of an embodiment of the cleaning equipment and base station of this disclosure docking in a water pool; Figure 50 This is a third state diagram of an embodiment of the cleaning equipment and base station docking in a water tank; Figure 51 This is a fourth state diagram of an embodiment of the cleaning equipment and base station docking in a water tank; Figure 52 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 53This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 54 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 55 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 56 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 57 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 58 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure 59 This is a schematic diagram of one embodiment of the process by which the cleaning equipment returns to the base station according to this disclosure; Figure label: 1. First water flow; 2. Second water flow; 3. Third water flow; 4. Fourth water flow; 5. First liquid level; 6. Second liquid level; 10. Cleaning system; 100. Cleaning equipment; 101. Water surface; 200, Shell; 201, First water inlet; 202, First baffle; 203, First water outlet; 208, First receiving cavity; 213, Second water inlet / floating suction inlet; 220, Water surface inlet; 230, Bottom water inlet; 240, Loading / unloading port; 300. First dust chamber; 301. Seventh opening; 302. Eighth opening; 400, First filter; 401, First dust box; 403, Fifth opening; 404, Cleaning opening; 407, Filter cleaning assembly; 4071, Scraper; 4072, Drive unit; 430, Inner filter layer; 440, Outer filter layer; 450, First filter chamber; 460, Second filter chamber; 470, Drainage baffle; 471, First elastic element; 472, Adsorption element; 800, Third Flow Channel; 1200, Main cleaning component; 1010, First docking assembly; 1017, First water inlet pipe; 1300, Self-cleaning drain outlet; 2000, Base station; 2001, Docking auxiliary component; 2002, Fourth receiving cavity; 2003, Fifth receiving cavity; 2006, Adapter; 2007, Sewage inlet; 2008, First one-way valve; 2009, Thirteenth opening; 2010, Drainage channel; 2011, Second conveying device; 2012, Gas conveying device; 2013, First gas outlet; 2039, Ramp; 2015, Third filter; 2016, Sixth receiving cavity; 2017, Fourteenth opening; 2018. 2019. First sidewall; 2020. First gas channel; 2021. Waterproof and breathable device; 2022. First cover plate; 2023. First protrusion; 2024. Second protrusion; 2025. First connector; 2026. Seventh one-way valve; 2030. Second docking assembly; 2040. Bearing member; 2050. Support member; 2041. First main body; 2042. Second main body; 2043. Self-cleaning drain outlet; 2044. First nozzle; 2045. First support arm; 2046. First plate; 2100. Self-cleaning inlet; 2102. First heating element; 2105. First sterilizer; 2103. First fan; 2108. First condenser; 2110. Second filter; 2111. Top surface; 2112. Bottom surface; 2200. First flow channel; 20009. Suction channel; 3303. First equilibrium water surface; 20004. First docking surface; 2300. Propulsion unit; 310. Bottom wall; 320. Side wall; 320a. First side wall; 349. Second side wall; 350. Third side wall; 351. Fourth side wall. Detailed Implementation

[0025] The following specific examples illustrate the implementation of this application. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. This application can also be implemented or applied through other different specific embodiments. Various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this application. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0026] It should be noted that the illustrations provided in the following embodiments are only schematic representations of the basic concept of this application. The drawings only show the components related to this application and are not drawn according to the actual number, shape and size of the components in the actual implementation. In the actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and the layout of the components may also be more complex.

[0027] In the following description, numerous details are explored to provide a more thorough explanation of embodiments of the present application. However, it will be apparent to those skilled in the art that embodiments of the present application may be practiced without these specific details. In other embodiments, well-known structures and devices are shown in block diagram form rather than in detail to avoid obscuring embodiments of the present application.

[0028] It should be noted that the terms such as "upper," "lower," "left," "right," "middle," and "one" used in this specification are merely for clarity of description and are not intended to limit the scope of this application. Any changes or adjustments to their relative relationships, without substantially altering the technical content, shall also be considered as part of the scope of this application.

[0029] This application provides a control method for a cleaning system 10, which includes a pool cleaning robot and a base station 2000.

[0030] The pool cleaning robot includes a first filter 400 and a cleaning opening. The first filter 400 filters the liquid flowing through it and can intercept and collect debris when cleaning the pool. The cleaning opening is located on the first filter 400, through which liquid inside the first filter 400 can flow out.

[0031] The base station 2000 includes a drive component, a second filter 2110, and a second controller.

[0032] The drive assembly includes a gas delivery device 2012, which can discharge gas inside the base station 2000 to the outside of the base station 2000. The gas delivery device 2012 can be a component such as an air pump or a vacuum pump.

[0033] The second filter 2110 is used to filter the liquid flowing through it. A sludge inlet 2007 is provided in the second filter 2110, through which liquid can flow into the second filter 2110.

[0034] Before the gas conveying device 2012 is in operation, the inlet 2007 is in the air. Since the inlet 2007 is in the air, the gas conveying device 2012 can create a negative pressure at the inlet 2007, thereby allowing the liquid and waste in the first filter 400 to flow into the second filter 2110.

[0035] The control method of the cleaning system 10 is applied at least in part to the second controller. The control method of the cleaning system 10 includes controlling the gas delivery device 2012 to operate when the base station 2000 performs cleaning on the first filter 400, so that the garbage and liquid in the first filter 400 enter the second filter 2110 through the cleaning opening and the sewage inlet opening 2007.

[0036] The gas delivery device 2012 discharges the gas inside the base station 2000 and creates a negative pressure at the sewage inlet 2007, which allows the liquid and waste in the first filter 400 to enter the second filter 2110 through the cleaning opening and the sewage inlet 2007, thereby cleaning the first filter 400.

[0037] In some embodiments, the drive assembly includes a second delivery device 2011, which is in fluid communication with a second filter 2110.

[0038] The second conveying device 2011 can be a device such as a water pump that drives the movement of fluids such as water flow. The second conveying device 2011 can discharge the liquid filtered by the second filter 2110 outside the base station 2000.

[0039] The control method of the cleaning system 10 includes controlling the second conveying device 2011 to operate so as to drive the filtered liquid from the second filter 2110 to be discharged outside the base station 2000.

[0040] By controlling the operation of the second conveying device 2011, the liquid filtered by the second filter 2110 is discharged outside the base station 2000, thereby improving the liquid discharge efficiency and further promoting or maintaining the negative pressure environment at the second filter 2110 or the sewage inlet 2007, ensuring the suction efficiency of liquid and garbage in the first filter 400.

[0041] In some embodiments, the base station 2000 is provided with a first clean water outlet, which is connected to discharge the liquid filtered by the second filter 2110 to a pool, the bank, or an external drainage system. The external drainage system includes, but is not limited to, household drainage pipes, floor drains, municipal drainage networks, sewage collection devices, etc.

[0042] The control methods for the cleaning system 10 include: The gas delivery device 2012 is operated to create a negative pressure in the second filter 2110, so that the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet.

[0043] By controlling the liquid level in the second filter 2110 to be higher than the lowest point of the first clean water outlet, the liquid in the second filter 2110 can flow from the second filter 2110 to the first clean water outlet.

[0044] The second conveying device 2011 is controlled to operate so as to drive the liquid filtered by the second filter 2110 to be discharged from the base station 2000 through the first clean water outlet.

[0045] By controlling the operation of the second conveying device 2011, the liquid at the first clean water outlet can be discharged outside the base station 2000. The liquid can be discharged into the pool, the shore outside the pool, or the external drainage system, etc.

[0046] In some embodiments, the control method for the cleaning system 10 includes: First, control the gas delivery device 2012 to work. Controlling the gas delivery device 2012 to work can create a negative pressure environment in the second filter 2110, so that liquid flows into the second filter 2110.

[0047] After the gas delivery device 2012 has been operating for a first preset time, and / or after the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet, the second delivery device 2011 is controlled to operate so as to drive the liquid filtered by the second filter 2110 to be discharged from the base station 2000 through the first clean water outlet.

[0048] In some embodiments, after the gas delivery device 2012 has been operating for a first preset period of time, the second controller controls the second delivery device 2011 to operate, and discharges the liquid filtered by the second filter 2110 out of the base station 2000 through the first clean water outlet.

[0049] After the gas delivery device 2012 has been operating for a first preset time, a sufficient negative pressure environment is generated in the second filter 2110 and some liquid is drawn into the second filter 2110, so that the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet.

[0050] In some embodiments, after the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet, the second controller controls the second conveying device 2011 to operate, so as to drive the liquid filtered by the second filter 2110 to be discharged from the base station 2000 through the first clean water outlet.

[0051] By monitoring the liquid level in the second filter 2110, it can be directly determined whether the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet. When the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet, the second conveying device 2011 is controlled to discharge the liquid out of the base station 2000 through the first clean water outlet.

[0052] In some embodiments, after the gas delivery device 2012 has been operating for a first preset period of time and after one of the following conditions is met—that the liquid level in the second filter 2110 is higher than the lowest point of the first clean water outlet—the second controller controls the second delivery device 2011 to operate, thereby driving the liquid filtered by the second filter 2110 to be discharged outside the base station 2000 through the first clean water outlet.

[0053] In some embodiments, the control method for the cleaning system 10 includes: When the liquid level in the second filter 2110 reaches the highest liquid level line, the control gas delivery device 2012 stops working.

[0054] If the liquid level in the second filter 2110 reaches the maximum level line, and water flow exceeding the outlet flow rate of the first clean water outlet continues to be drawn, water from the second filter 2110 will enter the gas delivery device 2012, causing damage to the gas delivery device 2012. By controlling the gas delivery device 2012 to stop working, the liquid in the second filter 2110 continues to be discharged from the base station 2000 through the first clean water outlet, thereby reducing the liquid level in the second filter 2110 and preventing impact on the gas delivery device 2012, thus avoiding damage.

[0055] In some embodiments, the gas delivery device 2012 includes an air pump that reduces the power of the air pump when the liquid level in the second filter 2110 reaches the maximum liquid level line.

[0056] Reducing the power of the air pump can reduce the water flow rate into the second filter 2110. While keeping the water output of the first clean water outlet constant, it can reduce the liquid level in the second filter 2110, thus preventing liquid from overflowing from the second filter 2110 or causing damage to the gas delivery device 2012.

[0057] In some embodiments, the base station 2000 includes a first nozzle 2044, which is used to spray water onto the filter surface of the first filter 400 when the base station 2000 cleans the first filter 400 of the pool cleaning robot.

[0058] The first nozzle 2044 sprays water onto the filter surface, which can wash the filter surface and wash away the debris adhering to it.

[0059] The control methods for the cleaning system 10 include: The gas delivery device 2012 is operated so that the filter surface in the first filter 400 is at least partially above the liquid surface.

[0060] The operation of the gas delivery device 2012 creates a negative pressure in the second filter 2110, drawing the liquid in the first filter 400 into the second filter 2110, thereby reducing the liquid level in the first filter 400 and causing the filter surface to be at least partially exposed above the water surface.

[0061] Control the first nozzle 2044 to spray water to clean the filter surface of the first filter 400.

[0062] The first nozzle 2044 sprays water to flush the filter surface, improving the cleanliness of the first filter 400. The fact that the filter surface is exposed above the water surface enhances the flushing and cleaning effect.

[0063] In some embodiments, the control method for the cleaning system 10 includes: After the gas delivery device 2012 operates at a first power for a second preset time, the gas delivery device 2012 is controlled to operate at a second power so that the filter surface in the first filter 400 is at least partially above the liquid surface; wherein the second power is greater than the first power.

[0064] And, after the gas delivery device 2012 operates at the first power for a second preset time, the first nozzle 2044 is controlled to spray water at the second spray volume.

[0065] In the initial cleaning stage, the first filter 400 may contain a large amount of loose debris and a relatively full volume of liquid. If high-power suction and high-volume water spray are used from the beginning, it can easily lead to turbulent internal flow, and sewage may splash out from the joints. Therefore, the second controller first performs a gentle pretreatment, controlling the gas delivery device 2012 to operate at a lower initial power to smoothly suction away free liquid and light debris; at the same time, the first nozzle 2044 is not working or only operates with a small initial water spray volume.

[0066] After a pretreatment period of the second preset duration, the liquid level has initially decreased, and the system enters the powerful flushing stage: the second controller increases the power of the gas delivery device 2012 to a higher second power, rapidly reducing and maintaining the liquid level at a low level. Simultaneously with the increase in negative pressure, the valve opening of the first nozzle 2044 is increased, allowing for a larger second water spray volume to flush the filter surface. This effectively improves the initial problem of easy splashing and ensures sufficient flushing energy during stages requiring greater kinetic energy, thus enhancing the cleaning effect.

[0067] In some embodiments, the control method for the cleaning system 10 includes: When the first nozzle 2044 is not working or is working at the first water spray volume, the control gas delivery device 2012 is working at the first power; wherein, the second water spray volume is greater than the first water spray volume; When the first nozzle 2044 is operating at a second water spray rate, the control gas delivery device 2012 is operating at a second power so that the filter surface in the first filter 400 is at least partially above the liquid surface; wherein the second power is greater than the first power.

[0068] When the system enters the high-pressure rinsing phase, the first nozzle 2044 sprays a large amount of water to flush the filter surface. If the output power of the gas delivery device 2012 does not increase accordingly, the input flow rate inside the cleaning device 100 will be greater than the output flow rate, causing the liquid level in the first filter 400 to rise rapidly, re-submerging the filter surface and affecting the cleaning effect.

[0069] To mitigate this issue, when the first nozzle 2044 sprays a smaller volume of water, the second conveying device 2011 only needs to operate at a lower first power. When the first nozzle 2044 operates with a larger second volume of water, the second conveying device 2011 operates at a larger second power.

[0070] In some embodiments, the control method for the cleaning system 10 includes: After the filter surface in the first filter 400 is at least partially above the liquid surface, the first nozzle 2044 is controlled to spray water to clean the filter surface of the first filter 400.

[0071] When part of the filter surface is exposed above the water surface, water is sprayed through the first nozzle 2044 to clean the filter surface.

[0072] In some embodiments, the control method for the cleaning system 10 includes: The gas delivery device 2012 is controlled to operate at a first power. When the gas delivery device 2012 is operating at the first power, the liquid level in the first filter 400 is at a first height.

[0073] The control gas delivery device 2012 operates at a second power so that the liquid level in the first filter 400 drops to a second height, and the filter surface in the first filter 400 is at least partially above the liquid level; wherein the second power is greater than the first power.

[0074] The liquid level in the first filter 400 can be adjusted by controlling the output power of the gas delivery device 2012.

[0075] In some embodiments, the drive assembly includes a second conveying device 2011, which is in fluid communication with a second filter 2110. The second conveying device 2011 and the second filter 2110 may be directly connected or in fluid communication through other channels.

[0076] The control methods for the cleaning system 10 include: When the gas conveying device 2012 is operating at the first power, the second conveying device 2011 is operated at the third power.

[0077] When the gas conveying device 2012 is controlled to operate at the second power, the second conveying device 2011 is controlled to operate at the fourth power; wherein the fourth power is greater than the third power.

[0078] When the gas delivery device 2012 operates at a lower first power, the inflow of liquid into the second filter 2110 is smaller. The second delivery device 2011 is controlled to operate at a lower third power to prevent the liquid level in the second filter 2110 from dropping or to prevent the liquid level from dropping too quickly, and to prevent the liquid level in the second filter 2110 from falling below the first clean water outlet.

[0079] When the second conveying device 2011 operates at a higher second power, the second filter 2110 is at a higher inflow rate. By controlling the second conveying device 2011 to operate at a higher fourth power through the second controller, the liquid in the second filter 2110 can be discharged from the second filter 2110 as soon as possible, so as to avoid the liquid level in the second filter 2110 rising too quickly and to prevent the liquid level from exceeding the highest point.

[0080] In some embodiments, the control method for the cleaning system 10 includes: The gas delivery device 2012 is controlled to operate at a first power, and the first nozzle 2044 is controlled to either not operate or operate at a first water spray volume. The gas delivery device 2012 is controlled to operate at a second power, and the first nozzle 2044 is controlled to operate at a second water spray volume to clean the filter surface of the first filter 400; wherein the second water spray volume is greater than the first water spray volume.

[0081] When the gas delivery device 2012 operates at low power, the first filter 400 is at a high liquid level, the filter surface is less exposed above the water surface, and the first nozzle 2044 does not work or operates with a small water volume.

[0082] When the gas delivery device 2012 operates at high power, the water level inside the first filter 400 is relatively low, and more of the filter surface is exposed above the water surface. The first nozzle 2044 operates with a large water volume to improve the cleaning effect on the filter surface.

[0083] In some embodiments, the first filter 400 includes a first frame, with a cleaning opening disposed on the first frame; a drain baffle is disposed at the cleaning opening, located on the first frame and outside the first frame. The drain baffle can open and close the cleaning opening, enabling communication or closure between the cleaning opening and the outside.

[0084] The pool cleaning robot includes a first controller. When the robot cleans the pool, the first controller controls the impeller of the main water pump to rotate in a first direction, causing a drain baffle to abut against the outside of the first frame and block the cleaning opening, preventing debris from the first filter 400 from flowing out of the cleaning opening. The main water pump impeller rotates in the first direction, drawing water from the pool through the housing. The first inlet 201 of the filter 200 draws water into the first filter 400 and discharges it through the first outlet 203. The drain baffle is pressed against the outside of the first frame and blocks the cleaning opening under the action of the water flow driven by the main water pump.

[0085] The control method for the cleaning system 10 also includes: When the base station 2000 cleans the pool cleaning robot, it controls the gas delivery device 2012 to work, so that the sewage discharge baffle moves away from the receiving cavity of the first filter 400 under the action of the gas delivery device 2012, so as to open the cleaning opening, thereby allowing the garbage and liquid in the first filter 400 to flow out through the cleaning opening.

[0086] When the water tank cleaning robot is cleaning, the gas delivery device 2012 can also create a negative pressure at the cleaning opening, which in turn drives the drain baffle to move away from the first filter 400, causing the cleaning opening to open. The garbage and liquid in the first filter 400 flow out through the cleaning opening into the second filter 2110.

[0087] In some embodiments, the first filter 400 includes a first frame, and a filter bottom inlet 230 is provided at the bottom of the first frame; a second inlet baffle is provided at the filter bottom inlet 230, and the second inlet baffle is provided on the first frame and located inside the first frame.

[0088] The pool cleaning robot includes a first controller. When the pool cleaning robot cleans the pool, the first controller controls the impeller of the main water pump to rotate in a first direction, so that the second inlet baffle moves into the receiving cavity of the first filter 400 and opens the bottom water inlet 230 of the filter.

[0089] Alternatively, when the base station 2000 is cleaning the pool cleaning robot, the first controller is used to control the impeller of the main water pump to rotate in a second direction, so that the second inlet baffle abuts against the inside of the first frame, blocking the bottom water inlet 230 of the filter, wherein the second direction is opposite to the first direction.

[0090] The control method for the cleaning system 10 also includes: When the base station 2000 cleans the pool cleaning robot, the control gas delivery device 2012 is activated so that the second inlet baffle moves into the receiving cavity of the first filter 400, opening the bottom water inlet 230 of the filter. The liquid in the pool enters the first filter 400 through the bottom water inlet 230 of the filter and flows out of the pool cleaning robot through the sewage inlet 2007.

[0091] Alternatively, when the base station 2000 is cleaning the pool cleaning robot, the gas delivery device 2012 is controlled to work so that the second inlet baffle abuts against the inside of the first frame, blocking the bottom water inlet 230 of the filter.

[0092] In some embodiments, the base station 2000 includes a first nozzle 2044 connected to a clean water source. The first nozzle 2044 is configured to spray water onto the filter surface of the first filter 400 when the base station 2000 cleans the first filter 400 of the pool cleaning robot. Before the pool cleaning robot docks with the base station 2000, the first baffle 202 at the first opening of the pool cleaning robot is opened so that when the pool cleaning robot docks with the base station 2000, the first nozzle 2044 extends into the first filter 400 through the first opening.

[0093] In some embodiments, the clean water source originates from a water tank on the base station 2000. The base station 2000 is also equipped with a water tank, which can be located within the cavity of the support member 2050, on its surface, beside its side wall, or in other suitable locations. The water tank stores a certain amount of liquid, such as water, detergent, or disinfectant, used as a clean water source for cleaning the first filter assembly. This invention is not limited to the aforementioned liquids; any liquid capable of cleaning and harmless to humans falls within the scope of this invention.

[0094] In some embodiments, the cleaning water source can also be liquid from the float cavity. The cleaning device 100 is provided with a first water outlet channel, which can be directly or indirectly connected to the float cavity, for example, by connecting the float cavity through a first connecting pipe, so that the liquid in the float cavity can flow out of the cleaning device 100 through the first water outlet channel. When the cleaning device 100 is docked on the support member 2040 for self-cleaning operation, when a liquid level difference is formed in the first receiving cavity 208, the liquid in the float cavity is driven to be sprayed towards the filter surface of the first filter assembly through the second nozzle, thereby cleaning the filter surface of the first filter assembly.

[0095] In some embodiments, the cleaning water source can also be water from a pool. In this case, the second nozzle is connected to the water in the pool through a water path. In this embodiment, a filter device can be installed at the water path to prevent dirt from the pool from being sucked into the second nozzle.

[0096] In some embodiments, the cleaning water source can also be an external water source, where external refers to the area outside the pool and base station 2000. In this case, the second nozzle can be connected to an external water source through a water path, such as connecting to an external tap water pipe or an external cleaning solution, etc., to clean the filter surface of the first filter component using the external water source.

[0097] In some embodiments, the cleaning water source can be liquid from the drainage channel 2010. For example, the second support arm can be disposed on the drainage channel 2010, or the second nozzle can be connected to the drainage channel 2010 through a water passage. The liquid filtered by the second and third filter components can enter the second nozzle through the water passage and be sprayed from the second nozzle onto the filter surface of the first filter component, thereby cleaning the filter surface of the first filter component.

[0098] In some embodiments, the base station 2000 includes a first nozzle 2044, which is configured to spray water onto the filter surface of the first filter 400 when the base station 2000 cleans the first filter 400 of the pool cleaning robot; the first nozzle 2044 has a retractable position and an extended position.

[0099] Before the pool cleaning robot docks with the base station 2000, the first nozzle 2044 is controlled to be in the storage position to avoid interfering with the pool cleaning robot.

[0100] After the pool cleaning robot docks with the base station 2000, the first baffle 202 at the first opening of the pool cleaning robot is opened, allowing the first nozzle 2044 to extend into the first filter 400 through the first opening and switch to the extended position. This allows liquid to be sprayed onto the filter surface of the first filter 400 for rinsing.

[0101] In some embodiments, the pool cleaning robot is controlled to dock with the base station 2000 in a floating posture on the water surface; Control the pool cleaning robot to dock with the base station 2000 with the bottom of the robot in contact with the pool wall and / or with the base station 2000.

[0102] The following describes the docking process between the cleaning equipment and the base station through some examples. See also Figures 30-38 For ease of explanation, some irrelevant and optional components, such as the support and the first support arm, have been omitted from the figure. Figures 30-36 The cleaning equipment 100 in the picture is drawn in a simplified style, and its posture is similar to... Figure 12 The cleaning equipment in the middle is in a similar posture, that is, the cleaning equipment is in a horizontal or near-horizontal posture, with the first water inlet 201 in front and the second water inlet facing downwards. Figure 12 , 30In -35, the final docking posture of the cleaning equipment is roughly horizontal, that is, in the height direction of the cleaning equipment (i.e., the Z-axis direction), the top of the cleaning equipment faces the positive Z-axis direction and the bottom faces the negative Z-axis direction. After docking, the cleaning equipment will also be in a roughly horizontal state.

[0103] See Figure 30 The cleaning device 100 docks with the carrier of the base station in water. At this time, the length of the carrier is adjusted to be suitable for docking in water. The first connector is in the shape of an "I". The self-cleaning inlet 2100 is perpendicular to the surface of the carrier. The self-cleaning outlet is located on the front side of the cleaning device and below the first inlet 201. The cleaning device moves from the water to the carrier 2040 of the base station. When the cleaning device moves towards the carrier in a parallel posture facing or approximately facing the front of the carrier (i.e., the cleaning device moves towards the front of the carrier along the positive X-axis), since the first connector can be made of flexible material, the self-cleaning inlet and the self-cleaning outlet can be docked well by relying only on the suction between the first docking component and the second docking component and / or the thrust of the first drive mechanism, without the cleaning device itself needing to perform too much rotation.

[0104] When the cleaning equipment approaches the carrier in a parallel, edge-to-edge manner, or when the equipment first contacts the side of the carrier or travels towards its side, it needs to rotate or turn as it approaches or contacts the carrier to adjust its posture to face the carrier directly for docking. For example, when the cleaning equipment approaches the carrier in water using a right-side-edge approach, and the carrier is positioned as follows... Figure 40 When the cleaning device is positioned at position A of the carrier, and it is in contact with or close to the side of the carrier at a certain distance, it controls the state of the first drive mechanism on both sides to first rotate 90 degrees to the left, travel a certain distance, and then rotate 90 degrees to the right, and then travel a certain distance and then rotate 90 degrees to the right again, thereby achieving the posture of the cleaning device facing the front of the carrier. At this time, the thrust of the first drive mechanism and / or the suction between the first docking component and the second docking component are used to dock the cleaning device with the carrier, thereby achieving the docking of the self-cleaning drain port and the self-cleaning inlet port.

[0105] In some embodiments, see Figure 31The cleaning device 100 docks with the base station's carrier in water. The first connector is L-shaped, with the self-cleaning inlet facing parallel to the carrier. The length of the carrier is adjusted for underwater docking. The cleaning device's self-cleaning outlet is located at the bottom; for example, a second inlet can be used as the self-cleaning outlet, or a separate self-cleaning outlet can be provided at the bottom of the cleaning device. The underwater docking process in this embodiment is basically similar to the above embodiments and will not be described in detail here.

[0106] In another embodiment, see Figure 32 The cleaning device 100 docks with the base station's carrier in water. The first connector is L-shaped, and the self-cleaning inlet faces parallel to the carrier. The orientation of the self-cleaning inlet in this embodiment is opposite to that in the previous embodiment. The self-cleaning outlet of the cleaning device is located at the top of the cleaning device. Other structures and docking methods are basically similar to those in the previous embodiment and will not be described again here.

[0107] In some embodiments, see Figure 33 , Figure 33 As shown Figure 31 Another way to achieve underwater docking of the self-cleaning equipment is to adjust the length of the carrier component to be suitable for docking with the cleaning equipment in the water. When the cleaning equipment receives the back-to-base station command, it is located on the water surface, i.e., in the water surface state. At this time, the cleaning equipment can first travel on the water surface to directly above the self-cleaning drain port of the carrier component, control the mode switching component, so that the cleaning equipment starts to sink from the water surface state in an almost parallel posture. During the sinking process, docking is achieved through the suction between the first docking component and the second docking component.

[0108] Similarly, Figure 32 The self-cleaning device in the middle can also adopt another docking method, see Figure 34 The length of the carrier is adjusted to be suitable for docking with the cleaning equipment in the water. When the cleaning equipment receives the return command from the base station, it is located at the bottom of the pool, that is, in the state at the bottom of the pool. At this time, the cleaning equipment can first travel at the bottom of the pool to the direct below the self-cleaning sewage outlet of the carrier. At this time, by adjusting the operation mode of the cleaning equipment drive device, the cleaning equipment is raised from the bottom of the pool in a parallel posture. During the raising process, docking is achieved by the suction between the first docking component and the second docking component.

[0109] In some embodiments, the cleaning equipment is docked with the support at the bottom of the pool, see [reference]. Figure 35 The length of the support component is adjusted to be suitable for docking with the cleaning equipment at the bottom of the pool. The self-cleaning drain outlet is located on the front side of the cleaning equipment, below the first inlet 201. This embodiment is similar to... Figure 30 The only difference between this embodiment and the previous one is that in this embodiment, the cleaning equipment ultimately moves from the bottom of the pool to the carrier 2040 of the base station. Figure 30 The cleaning equipment ultimately travels from the water surface to the carrier 2040 of the base station. For example, in this embodiment, when the cleaning equipment receives a command to return to the base station while cleaning the water surface, it can switch from a surface state to a bottom state via a mode switching component, i.e., from a surface state to a bottom pool state. At this point, the cleaning equipment travels from the bottom of the pool to the carrier. Other methods in this embodiment are similar. Figure 30 The methods are basically similar, so I won't go into too much detail here.

[0110] Similarly, see Figure 36 In this embodiment, the cleaning equipment and the carrier are also docked at the bottom of the pool. The length of the carrier is adjusted to suit the docking of the cleaning equipment at the bottom of the pool. The self-cleaning drain outlet is located at the top of the cleaning equipment. The cleaning equipment moves from the bottom of the pool to the carrier for docking. The docking method in this embodiment is similar to... Figure 32 The docking methods are basically similar, so I won't go into too much detail here.

[0111] In some embodiments, the cleaning equipment and the carrier dock at the water surface; see [reference needed]. Figure 37 , 38 The length of the carrier is adjusted to suit the docking of the cleaning device and the carrier on the water surface. The first connector is "L"-shaped. In this embodiment, the cleaning device ultimately docks with the carrier in a water-surface state. The state of the cleaning device when it receives the return-to-base station command is not limited in this embodiment; it can receive the return-to-base station signal at the bottom of the pool or in the water. In this case, a mode switching component is needed to adjust the movement state of the cleaning device to the water-surface state. The docking method in this embodiment is similar to... Figure 31 , 32 The docking methods are basically similar; the difference lies in the final motion state of the cleaning equipment during docking. Figure 31 , 32 The cleaning equipment ultimately docks with the support structure in a horizontal position while operating in the water. Figure 37 , 38 The cleaning equipment ultimately docks with the carrier in a water-surface state. Other docking processes are basically similar and will not be elaborated on here.

[0112] In the above docking methods, when the base station is equipped with a first support arm that is non-retractable, the cleaning equipment needs to move towards the carrier in a direction facing or approximately facing the front of the carrier. This allows the first support arm to drive the first nozzle from the first water inlet into the first filter 400 simultaneously with the docking of the first and second docking components. When the base station is not equipped with a first support arm or is equipped with a retractable first support arm, the cleaning equipment can move towards the carrier to dock, either facing the front of the carrier or not facing the front of the carrier. After contacting or approaching the carrier, the cleaning equipment can be rotated or turned to achieve docking.

[0113] The direction approximately facing the front of the support in the above text refers to the direction whose angle with the front of the support is within a certain range. The specific range depends on objective conditions such as the size of the pool and the speed of the cleaning equipment.

[0114] In some embodiments, such as Figure 39 When the cleaning equipment returns to the carrier, it will be in a roughly vertical position (roughly perpendicular to the water surface), with its head (the side with the first water inlet also referred to as the head) facing upwards. If this method is used to return to the base station, the cleaning equipment will be in a roughly vertical position after docking.

[0115] See Figure 39 The self-cleaning drain outlet is located on the front side of the cleaning equipment. The length of the support component is adjusted to be suitable for the cleaning equipment to connect with it in the water. Depending on the location of the self-cleaning drain outlet on the cleaning equipment, the first connector can be set to a straight line, an "L" shape, or other suitable shape to ensure that the distance from the self-cleaning drain outlet to the pool wall is equal to the distance from the self-cleaning drain outlet to the pool wall when the cleaning equipment is climbing the wall in a vertical state. Figure 39Taking an "L"-shaped configuration as an example, when the cleaning device receives a return-to-base command, it is at the bottom of the pool, for example, during pool bottom cleaning. If the battery level is detected to be below a certain threshold, or the first filter 400 is full and requires return to the base station for self-cleaning, the cleaning device first travels to the area projected onto the carrier at the bottom of the pool. Then, it performs a wall-climbing operation, rotating approximately 90° to climb the wall perpendicular to the water surface. At this point, the self-cleaning drain port 1300 faces the positive direction of the Z-axis, driving the cleaning device upwards along the wall to dock with the carrier. Using the thrust of the first drive mechanism and / or the suction between the first and second docking components, the cleaning device docks with the carrier, achieving docking between the self-cleaning drain port and the self-cleaning inlet. After docking, the cleaning device is in a roughly vertical position. At this point, the first drive mechanism can be closed, and the cleaning device is fixed to the carrier by the combination of the first and second docking components for subsequent operations, such as charging or self-cleaning.

[0116] In some embodiments, depending on the distance the cleaning equipment travels on the pool wall and the location of the carrier, the docking can also be performed near the water surface. For example, the cleaning equipment travels on the pool wall until its self-cleaning drain is near the water surface, and the self-cleaning inlet of the carrier is also near the water surface. Thus, the docking of the first docking assembly and the second docking assembly is fixed near the water surface.

[0117] Figure 39 The docking method and Figure 34 The difference in the docking methods is that, Figure 34 It moves upwards from the bottom of the pool and connects with the support structure without relying on the wall to climb it. Figure 34 The middle section is ascending in a roughly horizontal posture. And... Figure 39 The upward movement of the cleaning equipment from the bottom of the pool is achieved using the wall as a support. The equipment climbs the wall to move upwards, requiring a 90° rotation during this process. Figure 34 The cleaning equipment can rise directly from the bottom of the pool into the water without rotating. For example, the first suction component of the cleaning equipment can be reversed to provide power so that the cleaning equipment can rise from the bottom of the pool into the water.

[0118] The above are just some of the many ways for cleaning equipment to return to the base station. Those skilled in the art can choose a specific way to return to the base station based on actual conditions, such as battery power, location of the cleaning equipment, etc., as long as the first docking component and the second docking component can be docked.

[0119] In some embodiments, the cleaning device 100 includes a control unit (not shown), which is at least adapted to control the cleaning device to travel along the edge to a carrier based on a received back-to-base station signal, and to fix the cleaning device to the carrier to perform a target operation. The target operation refers to an operational task corresponding to the back-to-base station signal. For example, when the back-to-base station signal is triggered by the cleaning device 100's battery level falling below a preset value, the target operation could be to charge the cleaning device 100.

[0120] In some embodiments, edge travel includes at least one of the following: the cleaning device 100 travels along the bottom or wall of the pool, or the cleaning device 100 travels along the waterline of the pool. Edge travel means that the cleaning device 100 always keeps one side close to or against the inner wall of the pool and moves along the inner wall of the pool.

[0121] The cleaning equipment also features a waterline cleaning function, allowing it to climb the pool wall and clean the waterline using its main cleaning component. However, the equipment frequently falls off the wall during its ascent, resulting in incomplete cleaning and poor performance. In some embodiments, the cleaning equipment also has a one-key return function, allowing it to stop at a designated water surface after cleaning, awaiting further user input. During this process, the equipment climbs back up to the waterline, but as mentioned above, it often falls, leading to poor return performance. To address these issues, this embodiment provides a method for controlling the cleaning equipment's ascent up to the waterline, improving its success rate and thus enhancing the waterline cleaning effect or the return success rate.

[0122] In some embodiments, the control unit may be a general-purpose central processing unit (CPU), a general-purpose processor, a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), or other programmable logic devices, transistor logic devices, hardware components, or any combination thereof. It can implement or execute the various exemplary control functions described in this disclosure. The controller may also be a combination of control processing functions, such as a combination of one or more microprocessors, a combination of a DSP and a microprocessor, etc.

[0123] Therefore, this application effectively overcomes some practical problems in the prior art and thus has high utilization value and significance.

[0124] The above embodiments are merely illustrative of the principles and effects of this application and are not intended to limit this application. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this application. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this application should still be covered by the claims of this application.

Claims

1. A control method for a cleaning system, the cleaning system comprising a pool cleaning robot and a base station, characterized in that, The pool cleaning robot includes: A first filter, configured to filter liquid flowing through the first filter; A cleaning opening is provided on the first filter; The base station includes: Drive assembly; the drive assembly includes a gas delivery device; A second filter is configured to filter liquid flowing through it; the inlet is located in the second filter; wherein the inlet is in the air before the gas delivery device is operational. Second controller; The method is applied to the second controller, and the method includes: When the base station performs cleaning on the first filter, it controls the gas delivery device to operate so that the waste and liquid in the first filter enter the second filter through the cleaning opening and the sludge inlet opening.

2. The method according to claim 1, characterized in that, The drive assembly includes a second conveying device, which is in fluid communication with the second filter; The method includes: The second conveying device is controlled to operate so as to drive the liquid filtered by the second filter to be discharged outside the base station.

3. The method according to claim 2, characterized in that, The base station is equipped with a first clean water outlet; The method includes: The gas delivery device is controlled to operate so as to create a negative pressure in the second filter, so that the liquid level in the second filter is higher than the lowest point of the first clean water outlet; The second conveying device is controlled to operate so as to drive the liquid filtered by the second filter to be discharged outside the base station through the first clean water outlet.

4. The method according to claim 2, characterized in that, The method includes: First, control the operation of the gas delivery device; After the gas delivery device has been operating for a first preset time, and / or after the liquid level in the second filter has been higher than the lowest point of the first clean water outlet, the second delivery device is controlled to operate so as to drive the liquid filtered by the second filter to be discharged from the base station through the first clean water outlet.

5. The method according to claim 2, characterized in that, The method includes: When the liquid level in the second filter reaches the highest liquid level line, the gas delivery device is controlled to stop working; Alternatively, the gas delivery device may include an air pump, the power of which is reduced when the liquid level in the second filter reaches the maximum liquid level line.

6. The method according to claim 1, characterized in that, The base station includes a first nozzle, which is configured to spray water onto the filter surface of the first filter when the base station cleans the first filter of the pool cleaning robot. The method includes: The gas delivery device is controlled to operate such that the filter surface in the first filter is at least partially above the liquid surface; Control the first nozzle to spray water to clean the filter surface of the first filter.

7. The method according to claim 6, characterized in that, The method includes: The gas delivery device is controlled to operate at a first power, and when the gas delivery device operates at the first power, the liquid level in the first filter is at a first height; The gas delivery device is controlled to operate at a second power so that the liquid level in the first filter drops to a second height, and the filter surface in the first filter is at least partially above the liquid level; wherein the second power is greater than the first power.

8. The method according to claim 7, characterized in that, The drive assembly includes a second conveying device, which is in fluid communication with the second filter; The method includes: When the gas delivery device is controlled to operate at a first power, the second delivery device is controlled to operate at a third power; When the gas delivery device is controlled to operate at a second power, the second delivery device is controlled to operate at a fourth power; wherein the fourth power is greater than the third power.

9. The method according to claim 7 or 8, characterized in that, The method includes: Control the gas delivery device to operate at a first power, and control the first nozzle to either not operate or operate at a first water spray volume; The gas delivery device is controlled to operate at a second power, and the first nozzle is controlled to operate at a second water spray volume to clean the filter surface of the first filter; wherein the second water spray volume is greater than the first water spray volume.

10. The method according to claim 1, characterized in that, The first filter includes a first frame, and the cleaning opening is disposed on the first frame; a drain baffle is disposed at the cleaning opening, and the drain baffle is disposed on the first frame and located on the outside of the first frame; The pool cleaning robot includes a first controller. When the pool cleaning robot cleans the pool, the first controller controls the impeller of the main water pump to rotate in a first direction so that the sewage baffle abuts against the outside of the first frame and blocks the cleaning opening, preventing the garbage in the first filter from flowing out of the cleaning opening. The method further includes: When the base station cleans the pool cleaning robot, it controls the gas delivery device to work, so that the sewage discharge baffle moves away from the receiving cavity of the first filter under the action of the gas delivery device, so as to open the cleaning opening, thereby allowing the garbage and liquid in the first filter to flow out through the cleaning opening.

11. The method according to claim 1, characterized in that, The first filter includes a first frame, and a bottom water inlet is provided at the bottom of the first frame; a second inlet baffle is provided at the bottom water inlet of the filter, and the second inlet baffle is provided on the first frame and located inside the first frame; The pool cleaning robot includes a first controller. When the pool cleaning robot cleans the pool, the first controller controls the impeller of the main water pump to rotate in a first direction, so that the second inlet baffle moves into the receiving cavity of the first filter and opens the bottom water inlet of the filter. Alternatively, when the base station cleans the pool cleaning robot, the first controller controls the impeller of the main water pump to rotate in a second direction, so that the second inlet baffle abuts against the inner side of the first frame, blocking the bottom inlet of the filter, wherein the second direction is opposite to the first direction; The method further includes: When the base station cleans the pool cleaning robot, it controls the gas delivery device to work so that the second inlet baffle moves into the receiving cavity of the first filter, opens the bottom water inlet of the filter, and the liquid in the pool enters the first filter through the bottom water inlet of the filter and flows out of the pool cleaning robot through the sewage inlet. Alternatively, when the base station is cleaning the pool cleaning robot, the gas delivery device is controlled to operate so that the second inlet baffle abuts against the inside of the first frame, blocking the bottom water inlet of the filter.

12. The method according to claim 1, characterized in that, The base station includes a first nozzle, which is configured to spray water onto the filter surface of the first filter when the base station cleans the first filter of the pool cleaning robot. Before the pool cleaning robot docks with the base station, the first baffle at the first opening of the pool cleaning robot is opened so that when the pool cleaning robot docks with the base station, the first nozzle extends into the first filter through the first opening.

13. The method according to claim 1, characterized in that, The base station includes a first nozzle, which is configured to spray water onto the filter surface of the first filter when the base station cleans the first filter of the pool cleaning robot. The first nozzle has a retractable position and an extended position; Before the pool cleaning robot docks with the base station, the first nozzle is controlled to be in a retracted position to avoid interfering with the pool cleaning robot. After the pool cleaning robot docks with the base station, the first baffle at the first opening of the pool cleaning robot is opened so that the first nozzle extends into the first filter through the first opening and switches to the extended position.

14. The method according to claim 1, characterized in that, The water tank cleaning robot is controlled to dock with the base station in a floating posture on the water surface; The water tank cleaning robot is controlled to dock with the base station in an orientation where its bottom is in contact with the pool wall and / or with the base station.

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