Gas supply device and method

Abstract

The application provides a gas supply device and method. The gas supply device is used for outputting a first gas to a reaction furnace to reduce the concentration of a second gas in the reaction furnace. The gas supply device comprises: a gas inlet pipe configured to access the first gas; a gas outlet pipe configured to be connected to the reaction furnace and communicate with the reaction furnace, and configured to introduce the first gas into the reaction furnace; a plurality of gas passage assemblies connected between the gas inlet pipe and the gas outlet pipe, each of the gas passage assemblies being in communication with the gas inlet pipe and the gas outlet pipe, and the plurality of gas passage assemblies having different diameters of passages through which the first gas passes; a gas detection member configured to be arranged in the reaction furnace, and configured to detect the concentration of the second gas in the reaction furnace and generate a corresponding concentration detection value; and a controller in communication connection with the gas detection member and the plurality of gas passage assemblies, and configured to acquire the concentration detection value and control the corresponding gas passage assembly to be turned on according to the concentration detection value.

Description

Technical Field

[0001] This application relates to the technical field of electronic product manufacturing, and in particular to a gas supply device and method. Background Technology

[0002] In the manufacturing process of electronic products, some processing steps for components (such as reflow soldering) require the oxygen concentration to be reduced in the processing environment before they can be carried out. The components can be placed in a reactor, which can have an inlet and an outlet. The inlet can be used to introduce a first gas (such as nitrogen), which can flow into the reactor and drive the gases, including oxygen, to be discharged from the reactor through the outlet, thereby reducing the oxygen concentration in the reactor.

[0003] Currently, in order to minimize the oxygen content in the reactor, the amount of primary gas introduced into the reactor often exceeds the theoretical amount required to completely expel oxygen, resulting in waste of the primary gas. Therefore, how to reduce the amount of primary gas used while ensuring that the processing flow is not affected by oxygen concentration remains a pressing problem to be solved in the field of electronics manufacturing. Summary of the Invention

[0004] In view of the above, it is necessary to provide a gas supply device and method to solve the above-mentioned defects.

[0005] In a first aspect, embodiments of this application provide a gas supply device for outputting a first gas to a reactor to reduce the concentration of a second gas within the reactor. The gas supply device includes: an inlet pipe for receiving the first gas; an outlet pipe for connecting and communicating with the reactor, and for introducing the first gas into the reactor; multiple ventilation components connected between the inlet pipe and the outlet pipe, each ventilation component communicating with both the inlet pipe and the outlet pipe, wherein the diameter of the channel through which the first gas passes in the multiple ventilation components is different; a gas detector for being disposed within the reactor, for detecting the concentration of the second gas within the reactor and generating a corresponding concentration detection value; and a controller communicatively connected to the gas detector and the multiple ventilation components, for acquiring the concentration detection value and controlling the corresponding ventilation component to be activated based on the concentration detection value.

[0006] Optionally, the gas supply device further includes: a flow regulator, which is connected to and communicates with the air inlet pipe and is communicatively connected to the controller. The flow regulator is used to receive a flow setpoint and adjust the gas flow rate in the air inlet pipe according to the flow setpoint. The controller is used to output the corresponding flow setpoint according to the concentration detection value.

[0007] Optionally, the intake pipe is used to connect to a gas source device, which outputs a first gas to the intake pipe; the controller is used to communicate with the gas source device, and the controller outputs a corresponding flow rate setpoint to the gas source device according to the concentration detection value, so as to adjust the flow rate of the first gas output by the gas source device.

[0008] Optionally, each ventilation component includes: a connecting pipe, which is connected and communicates with an inlet pipe and / or an outlet pipe; and a ventilation valve, which is connected and communicates with the connecting pipe and is communicatively connected to a controller, which controls the opening or closing of the ventilation valve to control the corresponding ventilation component to be on or off.

[0009] Optionally, the gas supply device further includes: an auxiliary pipe, one end of which is connected to the inlet pipe and the other end of which is connected to the outlet pipe, and the auxiliary pipe is connected to both the inlet pipe and the outlet pipe; and a valve assembly, which is connected to and communicates with the auxiliary pipe, and is communicatively connected to the controller, which outputs a control signal to the valve assembly to open the valve assembly and thus enable the auxiliary pipe to conduct.

[0010] Optionally, the valve assembly includes: a pneumatic valve connected to and communicating with an auxiliary pipe, the pneumatic valve having a first interface; and a control valve connected to the first interface and communicating with a controller, the control valve receiving a control signal and outputting the first gas to the first interface to open the pneumatic valve.

[0011] Optionally, the control valve is connected to the intake pipe, and the control valve is used to receive the first gas from the intake pipe and transmit the first gas to the first interface.

[0012] Optionally, the gas supply device further includes: a housing, in which a receiving space is provided, and an air inlet pipe, an air outlet pipe and a plurality of ventilation components are all housed in the receiving space; an opening is provided on the housing, and a cover is movably connected to the housing for covering the opening.

[0013] Secondly, embodiments of this application provide a gas supply method applied to a gas supply device. The gas supply device is used to output a first gas to a reactor to reduce the concentration of a second gas inside the reactor. The gas supply device includes: an inlet pipe for receiving the first gas; an outlet pipe for connecting and communicating with the reactor and for introducing the first gas into the reactor; multiple ventilation components connected between the inlet pipe and the outlet pipe, each ventilation component communicating with both the inlet pipe and the outlet pipe, wherein the diameters of the channels through which the first gas passes in the multiple ventilation components are different; and a gas detection element for being installed in the reactor. Inside the furnace, a gas detector is used to detect the concentration of the second gas inside the reactor and generate a corresponding concentration detection value; a flow regulator is connected to and communicates with the inlet pipe, and is used to regulate the gas flow rate inside the inlet pipe; the gas supply method includes: obtaining the concentration detection value from the gas detector; determining the flow setpoint and the ventilation component that needs to be adjusted based on the concentration detection value; outputting an open signal and / or a close signal to the ventilation component that needs to be adjusted, wherein the open signal is used to instruct the ventilation component receiving the open signal to open, and the close signal is used to instruct the ventilation component receiving the close signal to close; and outputting the flow setpoint to the flow regulator.

[0014] Optionally, the gas supply device further includes an auxiliary pipe and a valve assembly. One end of the auxiliary pipe is connected to the inlet pipe, and the other end is connected to the outlet pipe. The auxiliary pipe is connected to both the inlet and outlet pipes. The valve assembly is connected to and communicates with the auxiliary pipe. The gas supply method further includes: in response to the number of consecutive adjustment anomalies exceeding a threshold value, outputting a control signal to the valve assembly and multiple ventilation components, and outputting a flow setpoint equal to a preset flow rate value to the flow regulator. The adjustment anomaly indicates that the concentration difference between the currently acquired concentration detection value and the preset concentration value is greater than the concentration difference between the most recently acquired concentration detection value and the preset concentration value. The control signal is used to instruct the valve assembly to open and to instruct the ventilation components to close. In response to an abnormal situation in the gas supply device, outputting a control signal to the valve assembly and multiple ventilation components, and outputting a flow setpoint equal to a preset flow rate value to the flow regulator. The abnormal situation includes the number of consecutive identical acquired concentration detection values ​​exceeding a preset threshold value, and / or interruption of communication with the gas detection element.

[0015] The gas supply device and method provided in this application, through the cooperation of gas detection element, controller and multiple ventilation components, can realize the dynamic adjustment of the inlet flow rate of the first gas in the reactor. While maintaining the stable processing in the reactor, the amount of the first gas can be reduced without affecting the processing effect of the workpiece when the concentration of the second gas in the reactor does not affect the processing effect of the workpiece, thereby reducing the waste of the first gas and saving costs. Attached Figure Description

[0016] Figure 1This is a schematic diagram of the processing equipment in the embodiments of this application.

[0017] Figure 2 This is a first structural schematic diagram of the gas supply device in the embodiments of this application.

[0018] Figure 3 This is a schematic diagram of the gas supply device in the embodiments of this application.

[0019] Figure 4 This is a partial structural schematic diagram of the gas supply device in the embodiments of this application.

[0020] Figure 5 This is a schematic diagram of the second structure of the gas supply device in the embodiments of this application.

[0021] Figure 6 This is the first flowchart of the gas supply method in the embodiments of this application.

[0022] Figure 7 This is the second flowchart of the gas supply method in the embodiments of this application.

[0023] Explanation of key component symbols: 100. Processing equipment; 101. Gas supply device; 102. Reactor; 103. Gas source device; 104. Exhaust device; 10. Inlet connector; 20. Outlet connector; 30. Inlet pipe; 40. Outlet pipe; 50. Ventilation assembly; 51. Connecting pipe; 52. Ventilation valve; 60. Gas detection device; 70. Controller; 80. Flow regulator; 90. Auxiliary pipe; 110. Valve assembly; 111. Pneumatic valve; 112. Control valve; 120. Display; 130. Housing; 131. Reception space; 132. Opening; 133. Cover. Detailed Implementation

[0024] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments.

[0025] The term "multiple" in this application refers to two or more. Furthermore, it should be understood that the terms "first," "second," etc., used in the description of this application are used only for descriptive purposes and should not be construed as indicating or implying relative importance, nor as indicating or implying order.

[0026] In the description of the embodiments in this application, the words "exemplary" or "for example" are used to indicate that they are examples, illustrations, or descriptions. Any embodiment or design that is described as "exemplary" or "for example" in the embodiments of this application should not be construed as being more preferred or advantageous than other embodiments or design options. Specifically, the use of the words "exemplary" or "for example" is intended to present the relevant concepts in a specific manner.

[0027] Please see Figure 1 , Figure 1 A processing device 100 provided in this application is shown.

[0028] In one embodiment, the processing equipment 100 includes a gas supply device 101. The processing equipment 100 may also include a reactor 102 and a gas source device 103. The reactor 102 can accommodate workpieces (not shown) to be processed. The gas supply device 101 includes an inlet connector 10 (…). Figure 2 (shown in the image) and air outlet connector 20 ( Figure 2 (As shown in the diagram). The inlet connector 10 can be connected to the gas source device 103 to achieve connection and communication between the gas supply device 101 and the gas source device 103. The outlet connector 20 can be connected to the reactor 102 to achieve connection and communication between the gas supply device 101 and the reactor 102.

[0029] The gas source device 103 can generate or contain a first gas and drive the first gas to flow towards the gas inlet connector 10. The gas supply device 101 can receive the first gas through the gas inlet connector 10, the first gas flows within the gas supply device 101, and is removed from the gas supply device 101 through the gas outlet connector 20. The reactor 102 has a gas inlet (not shown) and a gas outlet (not shown). The gas inlet can communicate with the gas inlet connector 10, and the first gas can enter the reactor 102 through the gas inlet, driving the second gas located in the reactor 102 to be removed from the reactor 102 through the gas outlet. In this way, the gas supply device 101, the gas source device 103, and the reactor 102 cooperate to continuously replenish the first gas into the reactor 102, thereby reducing the concentration of the second gas in the reactor 102. The reactor 102 can process the workpiece located in the reactor 102 when the concentration of the second gas inside is lower than a preset value. During the process of processing the workpiece in the reactor 102, the process of the first gas entering the reactor 102 and driving the second gas to move out of the reactor 102 is continuous.

[0030] It is understood that an air pump can be installed inside the air source device 103. The air pump inside the air source device 103 can drive the first gas from the air source device 103 to the air inlet connector 10, and drive the first gas in the air supply device 101 from the air inlet connector 10 to the air outlet connector 20.

[0031] For example, both the inlet connector 10 and the outlet connector 20 have external threads on their peripheral walls. The gas source device 103 can be threadedly connected to the inlet connector 10, and the gas inlet of the reactor 102 can be threadedly connected to the outlet connector 20.

[0032] In the embodiments of this application, the type of reactor 102 is not specifically limited. For example, reactor 102 may be, but is not limited to, a reflow soldering machine; wherein the first gas may be an inert gas and the second gas may be oxygen.

[0033] It is understandable that during reflow soldering, the reflow soldering machine heats the workpiece within the reactor 102, causing the temperature inside the reflow soldering machine to rise. Since the flux in the solder paste decomposes and produces oxygen at elevated temperatures, it is necessary to reduce the oxygen concentration inside the reflow soldering machine to minimize oxidation of the workpiece during the process. This can be achieved by continuously supplying inert gas into the reflow soldering machine, filling it with inert gas and thus driving oxygen out, thereby reducing the oxygen concentration. For example, the inert gas can be, but is not limited to, nitrogen.

[0034] In some embodiments, the processing apparatus 100 may further include an exhaust device 104. The exhaust device 104 may be connected to the reactor 102 and communicate with a gas outlet. The exhaust device 104 may drive the gas inside the reactor 102 to be discharged through the gas outlet.

[0035] In the embodiments of this application, the type of exhaust device 104 is not specifically limited. For example, exhaust device 104 may be, but is not limited to, an air pump, etc.

[0036] Please refer to the following: Figure 2 In embodiments of this application, the length, width, and height directions of the gas supply device 101 can be defined as a first horizontal direction, a second horizontal direction, and a vertical direction, respectively. For example, the first horizontal direction can be... Figure 2 The X direction and its opposite direction are shown. The second horizontal direction can be... Figure 2 The Y-direction and its opposite direction are shown; the vertical direction can be... Figure 2 The Z direction and its opposite direction are shown.

[0037] Please refer to the following: Figure 3 and Figure 4 In some embodiments, the gas supply device 101 may further include an inlet pipe 30, an outlet pipe 40, a ventilation assembly 50, a gas detection element 60, and a controller 70.

[0038] The air inlet pipe 30 can be fixedly connected to and communicate with the air inlet connector 10. The air outlet pipe 40 can be fixedly connected to and communicate with the air outlet connector 20. Multiple ventilation assemblies 50 can be arranged at intervals in the vertical direction; each ventilation assembly 50 can be fixedly connected to both the air outlet pipe 40 and the air inlet pipe 30, and each ventilation assembly 50 has a channel for gas passage, which communicates with both the air outlet pipe 40 and the air inlet pipe 30. The diameter of the gas passage in each ventilation assembly 50 is different.

[0039] In this design, a portion of the intake pipe 30 extends along a first horizontal direction, while the remaining portion extends vertically. Similarly, a portion of the exhaust pipe 40 extends along a first horizontal direction, while the remaining portion extends vertically. The vertically extending portions of the intake pipe 30 and the vertically extending portions of the exhaust pipe 40 are spaced apart in the first horizontal direction. Multiple ventilation components 50 can be located within the space between the vertically extending portions of the intake pipe 30 and the exhaust pipe 40.

[0040] A gas detector 60 can be installed inside the reactor 102. A controller 70 can communicate with the gas detector 60 and each ventilation assembly 50. The gas detector 60 can detect the concentration of the second gas inside the reactor 102 and generate a corresponding concentration detection value. The controller 70 can obtain the concentration detection value from the gas detector 60 and control the opening and closing of the corresponding ventilation assembly 50 based on the concentration detection value, thereby adjusting the flow rate of the first gas flowing from the inlet pipe 30 to the outlet pipe 40, and thus adjusting the flow rate of the first gas entering the reactor 102.

[0041] It is understandable that gas flow rate can indicate the volume or mass of gas passing through a channel per unit time.

[0042] In the embodiments of this application, the method of fixing and connection is not specifically limited. For example, the fixing method may include, but is not limited to, welding fixing, bolt fixing, etc.

[0043] In the embodiments of this application, the method of communication connection is not specifically limited. For example, the communication connection can be a wired communication connection implemented through a device such as a bus. As another example, the communication connection can be a wireless communication connection implemented through technologies such as 3G, 4G, 5G, Bluetooth, wireless LAN, and cellular network.

[0044] In the embodiments of this application, the type of gas detection element 60 is not specifically limited. For example, when the second gas is oxygen, the gas detection element 60 may be, but is not limited to, an oxygen analyzer.

[0045] For example, the gas detection element 60 can be an oxygen analyzer. The gas detection element 60 may include multiple detection probes and a processing unit. The processing unit is communicatively connected to the multiple detection probes. The multiple detection probes are located at different positions within the reactor 102 to detect the concentration of the second gas at different positions within the reactor 102, and transmit the detection results to the processing unit. The processing unit can analyze and process the multiple detection results to obtain a concentration detection value that indicates the concentration of the second gas within the reactor 102. The principle by which the processing unit analyzes and processes the multiple detection results is not specifically limited.

[0046] It is understood that when the gas detection element 60 is an oxygen analyzer, a commonly used oxygen analyzer in the relevant field can be used, and the working principle of the embodiments in this application will not be described in detail.

[0047] In the embodiments of this application, the type of controller 70 is not specifically limited. For example, controller 70 may be, but is not limited to, a general-purpose central processing unit (CPU), a microprocessor, a programmable logic controller (PLC), an application-specific integrated circuit (ASIC), or one or more integrated circuits used to process the execution of the above-mentioned program scheme.

[0048] It can be understood that the controller 70 is used to calculate the difference between the concentration detection value and the preset concentration value after obtaining the concentration detection value from the gas detector 60, and output an opening signal to the ventilation component 50 that needs to be opened and a closing signal to the ventilation component 50 that needs to be closed according to the calculated difference and the preset adjustment rules. In this way, the diameter of the channel connecting the inlet pipe 30 and the outlet pipe 40 changes, thereby adjusting the flow rate of the first gas flowing from the outlet pipe 40 to the inlet pipe 30, and thus adjusting the flow rate of the first gas entering the reactor 102.

[0049] It is understood that the concentration preset value can be a value preset in the controller 70 before the gas supply device 101 starts working. The concentration preset value can be less than the upper limit of the concentration of the second gas in the reactor 102 when the processing of the workpiece in the reactor 102 is continuously carried out.

[0050] For example, when processing is carried out in reactor 102, the concentration of the second gas needs to be less than or equal to N VOL%, where N is a value greater than 0. That is, when the concentration of the second gas is in the interval (0, N], the preset concentration value can be the median value in the interval (0, N].

[0051] It is understood that the preset rules can be rules preset in the controller 70 before the gas supply device 101 starts working. The content of the preset rules can be related to the diameter of the channel through which gas can pass in each venting component 50.

[0052] In each venting assembly 50, the cross-sectional area of ​​the channel through which gas can pass can be known, that is, the cross-sectional area of ​​the channel is also known; the sum of the cross-sectional areas of the channels opened in multiple venting assemblies 50 is related to the volume of the first gas introduced into the reactor 102 per unit time, that is, when the venting assembly 50 that is opened changes, the cross-sectional area of ​​the channel opened will change, thereby affecting the volume of the first gas entering the reactor 102 per unit time and the concentration of the second gas in the reactor 102.

[0053] Therefore, when the difference calculated from the concentration detection value and the concentration preset value is positive, that is, when the concentration detection value is greater than the concentration preset value, the controller 70 can increase the number of open ventilation components 50, or close the ventilation components 50 with small channel cross-sectional area and open the ventilation components 50 with large channel cross-sectional area, thereby increasing the volume of the first gas that can enter the gas outlet pipe 40 through the open ventilation components 50 per unit time, that is, increasing the volume of the first gas entering the reactor 102 per unit time, thereby reducing the concentration of the second gas in the reactor 102, and reducing the difference between the concentration of the second gas in the reactor 102 and the concentration preset value.

[0054] When the difference between the concentration detection value and the concentration preset value is negative, that is, when the concentration detection value is less than the concentration preset value, the controller 70 can reduce the number of open ventilation components 50, or close the ventilation components 50 with a large channel cross-sectional area and open the ventilation components 50 with a small channel cross-sectional area, thereby reducing the volume of the first gas that can enter the outlet pipe 40 through the open ventilation components 50 per unit time, that is, reducing the volume of the first gas entering the reactor 102 per unit time. In this way, the amount of the first gas used can be reduced without affecting the processing of the workpiece in the reactor 102, thus reducing waste and saving costs.

[0055] For example, the controller 70 can have a pre-set encoding table. This table can record the cross-sectional area of ​​the channels in each ventilation component 50, the area difference between the cross-sectional areas of the channels in each ventilation component 50 and those in other ventilation components 50, and the area differences corresponding to different concentration differences. The controller 70 can retrieve the corresponding area difference from the encoding table based on the calculated concentration difference, and then, based on the area difference and the information of the currently active ventilation components 50, close some of the active ventilation components 50 and open some of the inactive ventilation components, thereby adjusting the ventilation components 50 and adjusting the volume of the first gas that can pass through multiple ventilation components 50 per unit time.

[0056] In some embodiments, the gas supply device 101 may further include a flow regulator 80. The flow regulator 80 may be fixedly installed on and communicate with the inlet pipe 30. The flow regulator 80 may be located between the inlet connector 10 and the plurality of ventilation assemblies 50, and may regulate the flow rate of the first gas flowing from the inlet pipe 30 to the plurality of ventilation assemblies 50, i.e., may regulate the inlet flow rate of the plurality of ventilation assemblies 50. The flow regulator 80 may be communicatively connected to the controller 70. The controller 70 may generate a flow rate setpoint and output the flow rate setpoint to the flow regulator 80 while controlling the opening or closing of the corresponding ventilation assembly 50 based on the acquired concentration detection value. The flow regulator 80 may adjust the inlet flow rate of the plurality of ventilation assemblies 50 according to the flow rate setpoint.

[0057] It is understood that the controller 70 can synchronously adjust the inlet gas velocity of the activated venting component 50 and multiple venting components 50 according to the concentration difference. This can increase the cross-sectional area of ​​the opened channels in multiple venting components 50 while increasing the flow velocity of the first gas flowing into the opened channels, so that the activated venting components 50 and the flow regulator 80 cooperate to increase the inlet gas velocity of the reactor 102. Conversely, it can decrease the cross-sectional area of ​​the opened channels in multiple venting components 50 while decreasing the flow velocity of the first gas flowing into the opened channels, so that the activated venting components 50 and the flow regulator 80 cooperate to decrease the inlet gas velocity of the reactor 102. In this way, the ventilation assembly 50 and the flow regulator 80 can work together to regulate the concentration of the second gas entering the reactor 102. When it is necessary to increase the mass or volume of the first gas entering the reactor 102 per unit time, sufficient first gas can pass through the open channels while increasing the cross-sectional area of ​​the open channels in the multiple ventilation assemblies 50, thereby improving the efficiency of reducing the concentration of the second gas in the reactor 102. At the same time, when it is necessary to reduce the mass or volume of the first gas entering the reactor 102 per unit time, sufficient first gas can pass through the open channels while reducing the cross-sectional area of ​​the open channels in the multiple ventilation assemblies 50. This also reduces the redundant first gas between the flow regulator 80 and the multiple ventilation assemblies 50, reduces the possibility of damage to the inlet pipe 30 and ventilation assembly 50 due to increased gas pressure in the inlet pipe 30, and reduces the waste of first gas, thus saving costs.

[0058] In the embodiments of this application, the type of flow regulator 80 is not specifically limited. For example, the flow regulator 80 may be, but is not limited to, a mass flow controller (MFC), etc.

[0059] In the embodiments of this application, the method by which the controller 70 generates the flow setpoint is not specifically limited. For example, the controller 70 may obtain the flow setpoint based on a PID algorithm.

[0060] It can be understood that a PID control algorithm is an algorithm that calculates the deviation value of the input algorithm according to the functional relationship corresponding to the preset PID control parameters (such as proportional parameters, integral parameters, and derivative parameters), and obtains a calculation result that can adjust the deviation value.

[0061] In the embodiments of this application, the deviation value input to the PID algorithm can be the concentration difference calculated from the current concentration detection value and the preset concentration value. The calculated result is the flow rate proportionality coefficient. The controller 70 can input the current concentration difference value into the PID algorithm, and then the PID algorithm can execute to obtain the flow rate proportionality coefficient. The flow rate proportionality coefficient is located in the interval (0,1).

[0062] Then, the controller 70 can calculate the flow setpoint based on the flow preset value and the flow ratio coefficient, and output the flow setpoint to the flow regulator 80, so that the flow regulator 80 can adjust the airflow rate of the multiple ventilation components 50 according to the flow setpoint.

[0063] It is understood that the preset flow rate value can be a value preset in the controller 70 during the operation of the gas supply device 101. The preset flow rate value can indicate the upper limit of the volume or mass of gas allowed to flow through the flow regulator 80 per unit time, and the preset flow rate value can be less than or equal to the upper limit of the volume or mass of gas passing through the flow regulator 80 per unit time that can be actually handled. The preset flow rate value can be obtained based on the rated parameters of the flow regulator 80 and the experimental results or experience of the operator. The embodiments of this application do not limit the specific value of the preset flow rate value.

[0064] It is understandable that the principle used by the controller 70 in obtaining the flow setpoint through the PID algorithm can be a common principle in related fields, and will not be elaborated here.

[0065] In other embodiments, the gas supply device 101 may be communicatively connected to the gas source device 103. The controller 70 may generate a flow rate setpoint and output the flow rate setpoint to the gas source device 103 while controlling the corresponding ventilation component 50 to open or close based on the acquired concentration detection value.

[0066] It is understood that the gas source device 103 can adjust the flow rate of the first gas by adjusting its output power. The gas source device 103 can adjust its output power according to the received flow rate setpoint, thereby cooperating with the ventilation component 50 to regulate the concentration of the second gas entering the reactor 102.

[0067] It is understood that the principle by which the controller 70 generates a flow rate setpoint based on the concentration detection value and outputs the flow rate setpoint to the gas source device 103 is the same as or similar to the principle by which the controller 70 generates a flow rate setpoint based on the concentration detection value and outputs the flow rate setpoint to the flow regulator 80, and will not be elaborated here.

[0068] In some embodiments, each venting assembly 50 may include a connecting pipe 51 and a venting valve 52. One end of the connecting pipe 51 may be fixedly connected and communicate with a vertically extending pipe body in the air inlet pipe 30, and the other end may be fixedly connected and communicate with a vertically extending pipe body in the air outlet pipe 40. The venting valve 52 may be fixedly connected to and communicate with the connecting pipe 51. Opening the venting valve 52 can conduct the corresponding connecting pipe 51, and closing the venting valve 52 can disconnect the corresponding connecting pipe 51. The venting valve 52 may be communicatively connected to the controller 70 and receive opening and closing signals from the controller 70.

[0069] It is understood that in the multiple venting assemblies 50, the diameters of the channels through which the first gas passes in the multiple venting valves 52 can be different, and the inner diameters of the multiple connecting pipes 51 can be different, thus resulting in different diameters and cross-sectional areas of the channels through which the first gas passes in the multiple venting assemblies 50. In the embodiments of this application, the diameter of the channel in each venting valve 52 is not specifically limited. For example, the number of venting assemblies 50 can be six, and the diameters of the channels through which the first gas passes in the six venting valves 52 are 1mm, 2mm, 3mm, 4mm, 5mm, and 6mm, respectively; the inner diameter of the connecting pipe 51 corresponding to each venting valve 52 can be the same as the diameter of the channel in the venting valve 52.

[0070] It is understood that the inner diameters of both the intake pipe 30 and the outlet pipe 40 can be larger than the diameter of the channel in any ventilation assembly 50. In the embodiments of this application, the inner diameters of the intake pipe 30 and the outlet pipe 40 are not specifically limited. For example, the inner diameters of both the intake pipe 30 and the outlet pipe 40 can be 20 mm.

[0071] In some cases, each connecting pipe 51 may include two sub-pipes, which are fixedly connected to and communicate with the air inlet pipe 30 and the air outlet pipe 40, respectively. A vent valve 52 is located between the two sub-pipes, and both ends of the vent valve 52 are fixedly connected to and communicate with the two sub-pipes in the first horizontal direction.

[0072] In other cases, one end of each connecting pipe 51 may be fixedly connected to and connected to one of the pipes in the air inlet pipe 30 and the air outlet pipe 40, and the other end may be fixedly connected to and connected to the vent valve 52; the vent valve 52 may be fixedly connected to and connected to the other pipe in the air inlet pipe 30 and the air outlet pipe 40.

[0073] In the embodiments of this application, the type of vent valve 52 is not specifically limited. For example, vent valve 52 may be, but is not limited to, a solenoid valve.

[0074] In some embodiments, the air supply device 101 may further include an auxiliary pipe 90 and a valve assembly 110. One end of the auxiliary pipe 90 may be fixedly connected to the air inlet pipe 30, and the other end may be fixedly connected to the air outlet pipe 40. The auxiliary pipe 90 may communicate with the air inlet pipe 30 and the air outlet pipe 40.

[0075] Valve assembly 110 may include a pneumatic valve 111 and a control valve 112. The pneumatic valve 111 may be fixedly connected to an auxiliary pipe 90. Opening the pneumatic valve 111 allows the auxiliary pipe 90 to conduct, and closing the pneumatic valve 111 disconnects the auxiliary pipe 90. The pneumatic valve 111 may have a first interface and a second interface. Neither the first nor the second interface is connected to the channel through which the first gas passes in the pneumatic valve 111, and both the first and second interfaces are used to introduce or discharge gas to achieve the opening and closing actions of the pneumatic valve 111. The two control interfaces of the control valve 112 can be connected to the first and second interfaces respectively through pipes, and the air inlet of the control valve 112 can be connected to the air inlet pipe 30. On the air inlet pipe 30, the position where the air inlet of the control valve 112 connects to the air inlet pipe 30 is located between the flow regulator 80 and the air inlet connector 10.

[0076] Control valve 112 can obtain gas from intake pipe 30 through intake port, and then transmit gas to first port or second port through control port, thereby controlling the opening and closing of pneumatic valve 111. Control valve 112 can be communicatively connected to controller 70. Controller 70 can output control signals to control valve 112, thereby causing control valve 112 to drive pneumatic valve 111 to open, making auxiliary pipe 90 open; at the same time, controller 70 can output control signals to multiple vent valves 52. After receiving the control signals, vent valve 52 closes, disconnecting the path of the first gas flowing through vent assembly 50 to outlet pipe 40, and allowing the first gas to enter outlet pipe 40 through auxiliary pipe 90.

[0077] It is understandable that when the concentration difference corresponding to the currently acquired concentration detection value is greater than the concentration difference corresponding to the most recently acquired concentration detection value, the controller 70 can record this situation as an adjustment anomaly. When the second gas is oxygen and the first gas is an inert gas, since the concentration difference calculated by the controller 70 can be positive or negative, when the concentration difference is positive, the current concentration detection value is greater than the preset concentration value. At this time, it is necessary to increase the inlet flow rate of the first gas in the reactor 102 to reduce the concentration of the second gas in the reactor 102, so as to avoid the continuous increase in the concentration of the second gas, which would cause oxidation of some workpieces being processed or the mechanisms in the reactor 102. When the concentration difference is negative, the current concentration detection value is less than the preset concentration value. At this time, the inlet flow rate of the first gas in the reactor 102 can be maintained or reduced, so that the concentration of the second gas in the reactor 102 is kept below the lower limit of the second gas concentration that would cause oxidation of the workpieces or the mechanisms in the reactor 102, while reducing the amount of the first gas used to save costs. Therefore, when the concentration difference is positive, the probability of the second gas causing oxidation of the workpiece or the mechanism inside the reactor 102 is greater than when the concentration difference is negative. Furthermore, the probability of oxidation increases with increasing concentration difference. When an adjustment anomaly occurs, it indicates that even with automatic adjustment of the inlet gas flow rate in the reactor 102 via the controller 70, flow regulator 80, and multiple ventilation components 50, the probability of oxidation of the workpiece or the mechanism inside the reactor 102 is still increasing; in this case, some ventilation components 50 may be blocked or malfunctioning.

[0078] Therefore, when the number of consecutive abnormal adjustments exceeds a preset threshold, the controller 70 outputs a control signal to the control valve 112 and multiple vent valves 52, thereby closing all vent valves 52 and opening the control valve 112. In this way, when there is a risk of blockage or malfunction in some venting components 50, the first gas can bypass the venting components 50 and enter the outlet pipe 40 via the auxiliary pipe 90, preventing malfunctions of the venting components 50 from affecting the ongoing processing in the reactor 102 and the service life of the reactor 102, thus improving the pass rate and processing safety of the workpieces processed in the reactor 102.

[0079] In the embodiments of this application, the numerical value of the frequency threshold is not specifically limited. Operators can adjust the frequency threshold based on factors such as the period during which the controller 70 acquires concentration detection values.

[0080] In the embodiments of this application, the inner diameter of the auxiliary pipe 90 is not specifically limited. For example, the inner diameter of the auxiliary pipe 90 may be the same as the inner diameter of the air inlet pipe 30 and the air outlet pipe 40.

[0081] In some embodiments, while the controller 70 outputs a control signal, the controller 70 is also used to output a flow rate setpoint equal to the flow rate preset value to the flow rate regulator 80, thereby increasing the flow rate of the first gas flowing from the intake pipe 30 to the auxiliary pipe 90.

[0082] It is understandable that when the number of consecutive abnormal adjustments exceeds a threshold, the controller 70 can output a flow rate setpoint equal to the preset flow rate value to the flow regulator 80. This makes the flow rate of the first gas passing through the flow regulator 80 approximately equal to the upper limit of the volume or mass of gas allowed to flow through the flow regulator 80 per unit time. This ensures that the flow rate of the first gas output from the gas supply device 101 to the reactor 102 is close to the upper limit of the first gas output flow rate from the gas supply device 101, thereby increasing the inlet flow rate of the first gas in the reactor 102 to near the upper limit of the inlet flow rate of the first gas in the reactor 102. In this way, even if the ventilation component 50 may malfunction or become blocked, the stability and safety of processing in the reactor 102 can be improved, and the probability of oxidation of the processed workpiece and the mechanisms within the reactor 102 can be reduced.

[0083] It is understood that the controller 70 is also used to output a control signal to the control valve 112 and multiple vent valves 52 when it is determined that there is an abnormality in the gas supply device 101, and to output a flow rate setpoint equal to the preset flow rate value to the flow regulator 80. In the embodiments of this application, the content of the abnormality is not specifically limited. For example, the abnormality may include the number of consecutive identical concentration detection values ​​exceeding a preset threshold, and / or the communication connection between the controller 70 and the gas detector 60 being interrupted.

[0084] It is understandable that, since the first gas is continuously input into the reactor 102, and the flow rate of the first gas entering the reactor 102 is constantly changing due to the coordination of the gas detector 60, controller 70, flow regulator 80, and multiple ventilation components 50, it is difficult for multiple consecutive concentration detection values ​​to be the same. However, if the controller 70 continuously acquires multiple identical concentration detection values, the gas detector 60 may malfunction. In this case, the reliability of the concentration detection value generated by the gas detector 60 decreases, and continuing to adjust the concentration of the first gas entering the reactor 102 based on the concentration detection value will increase the risk of decreased processing yield and reactor 102 malfunction. Therefore, when the number of consecutive identical concentration detection values ​​exceeds a preset threshold, the controller 70 outputs a control signal to the ventilation valve 52 and multiple control valves 112, and outputs a flow rate setpoint equal to the preset flow rate value to the flow regulator 80, increasing the inlet flow rate of the first gas in the reactor 102 to near the upper limit of the inlet flow rate of the first gas in the reactor 102.

[0085] Simultaneously, when the communication connection between the gas detector 60 and the controller 70 is interrupted, the gas supply device 101 cannot regulate the inlet flow rate of the first gas in the reactor 102 through the cooperation of the gas detector 60, controller 70, flow regulator 80, and multiple ventilation components 50. At this time, the controller 70 outputs a control signal to the ventilation valve 52 and multiple control valves 112, and outputs a flow setpoint value equal to the preset flow rate value to the flow regulator 80, thereby increasing the inlet flow rate of the first gas in the reactor 102 to near the upper limit of the inlet flow rate of the first gas in the reactor 102.

[0086] In this way, when the gas detector 60 may malfunction or the communication connection between the gas detector 60 and the controller 70 is interrupted, the inlet flow rate of the first gas in the reactor 102 can be increased to near the upper limit of the inlet flow rate of the first gas in the reactor 102, thereby improving the stability and safety of processing in the reactor 102, reducing the probability of oxidation of the processed workpiece and the mechanism in the reactor 102, and allowing processing in the reactor 102 to continue.

[0087] In the embodiments of this application, no specific limitation is made on the quantity threshold. The operator can adjust the quantity threshold according to factors such as the period during which the controller 70 obtains the preset concentration value.

[0088] In the embodiments of this application, the method by which the controller 70 determines the interruption of the communication connection with the gas detector 60 is not specifically limited. For example, when the controller 70 and the gas detector 60 are connected by wired communication, the controller 70 can determine whether the communication connection between the controller 70 and the gas detector 60 is interrupted by the level change of some pins of the socket connected to the gas detector 60, and / or whether the handshake of the communication protocol with the gas detector 60 is successful; the above methods are all common methods in the relevant art, and will not be described in detail here.

[0089] For example, when the controller 70 is wirelessly connected to the gas detector 60, the controller 70 can determine whether the communication connection between the controller 70 and the gas detector 60 is interrupted by whether the gas detector 60 replies with feedback information within a preset time after sending the request information to the gas detector 60. The above methods are all common methods in the relevant fields and will not be described in detail here.

[0090] In some embodiments, the gas supply device 101 may further include a display 120. The display 120 is communicatively connected to the controller 70. The controller 70 can output the operating status information of the gas supply device 101 to the display 120, and the display 120 can display the operating status information of the gas supply device 101. The operating status information may include, but is not limited to, concentration detection values, preset concentration values, concentration difference values, flow rate set values, preset flow rate values, operating duration, the maintenance and interruption status of communication connections between the controller 70 and various mechanisms, the number of adjustment anomalies, and whether any anomalies exist.

[0091] In the embodiments of this application, the type of display 120 is not specifically limited. For example, display 120 may be, but is not limited to, a touch screen.

[0092] It is understandable that staff can monitor the operation of the gas supply device 101 by viewing the contents of the monitor 120, and repair the gas supply device 101 when there are any abnormalities in the adjustment or the gas supply device 101 has any abnormalities.

[0093] Please refer to the following: Figure 5In some embodiments, the gas supply device 101 may further include a housing 130. A receiving space 131 is provided within the housing 130, housing the inlet pipe 30, the outlet pipe 40, multiple ventilation components 50, the auxiliary pipe 90, and the valve assembly 110. The inlet pipe 30, the outlet pipe 40, and / or the auxiliary pipe 90 may be fixedly connected to the side wall of the receiving space 131, and the control valve 112 and multiple ventilation valves 52 may also be fixedly connected to the side wall of the receiving space 131. The inlet connector 10 and the outlet connector 20 extend through the housing 130 along a first horizontal direction, and the ends of the inlet connector 10 and the outlet connector 20 protruding from the housing 130 may be connected to the gas source device 103 and the reactor 102, respectively.

[0094] Multiple openings 132 can be formed on the outer casing 130, each opening 132 communicating with the receiving space 131. Multiple covers 133 are movably connected to the outer casing 130, each cover 133 covering the corresponding opening 132. Personnel can open the cover 133 when inspecting the gas supply device 101.

[0095] It is understandable that the cover 133 and the outer shell 130 can be movably connected on the outer shell 130 through connecting parts such as hinges and linear guide pairs.

[0096] The implementation principle of the gas supply device 101 provided in the embodiments of this application includes: The gas source device 103 outputs the first gas to the gas supply device 101. The first gas passes through the inlet connector 10, the inlet pipe 30, the open ventilation component 50, the outlet pipe 40 and the outlet connector 20 and enters the reactor 102.

[0097] After acquiring a concentration detection value related to the concentration of the second gas in the reactor 102 from the gas detector 60, the controller 70 subtracts a preset concentration value from the detected concentration value to obtain a concentration difference. The controller 70 can adjust the open and closed ventilation components 50 according to preset rules. Simultaneously, the controller 70 outputs the concentration difference value to a PID algorithm to calculate a flow rate proportionality coefficient. The calculated flow rate proportionality coefficient is then multiplied by the preset flow rate value to obtain a flow rate setpoint, which is output to the flow rate regulator 80. The flow rate regulator 80 can adjust the flow rate of the first gas in the pipeline from the flow rate regulator 80 to the multiple ventilation components 50 according to the flow rate setpoint. Thus, by means of the gas detection element 60, controller 70, multiple ventilation components 50 and flow regulating element 80, the inlet flow rate of the first gas in the reactor 102 can be increased when the concentration of the second gas in the reactor 102 increases, thereby reducing the concentration of the second gas; and the inlet flow rate of the first gas in the reactor 102 can be reduced or maintained when the concentration of the second gas in the reactor 102 decreases, thereby reducing the amount of the first gas used while ensuring stable processing in the reactor 102.

[0098] When the controller 70 determines that the number of abnormal adjustments exceeds the threshold, or when the gas supply device 101 malfunctions, the controller 70 can output a control signal to the vent valves 52 and control valves 112 of all venting components 50, causing all vent valves 52 to close and the pneumatic valve 111 to open, thus connecting the auxiliary pipe 90. At the same time, the controller 70 can output a flow rate setpoint equal to the preset flow rate to the flow regulator 80, thereby increasing the inlet flow rate of the first gas in the reactor 102 to near the upper limit of the inlet flow rate of the first gas in the reactor 102, maintaining stable processing within the reactor 102.

[0099] The gas supply device 101 provided by the embodiments of this application, along with the gas detection element 60, controller 70, multiple ventilation components 50, and flow regulator 80, can dynamically adjust the inlet flow rate of the first gas in the reactor 102. This allows for maintaining stable processing within the reactor 102 while reducing the amount of the first gas used, ensuring that the concentration of the second gas in the reactor 102 does not affect the processing effect of the workpiece. This reduces waste of the first gas and saves costs.

[0100] Please see Figure 6 , Figure 6 An embodiment of this application provides a gas supply method. This gas supply method can be applied to the controller 70 in the aforementioned gas supply device 101.

[0101] The gas supply method may include the following steps S61 to S64: Step S61: Obtain the concentration detection value from the gas detection element 60.

[0102] It is understandable that the principle by which controller 70 obtains concentration detection values ​​from the gas detection workshop can be referred to... Figures 1 to 5 The relevant textual descriptions will not be repeated here.

[0103] It is understandable that the controller 70 records the acquired concentration detection values ​​and sorts the acquired concentration detection values ​​according to the time sequence of acquisition.

[0104] Step S62: Determine the flow rate setpoint and the ventilation component 50 that needs to be adjusted based on the concentration detection value.

[0105] It is understandable that the controller 70 can calculate the concentration difference between the detected concentration value and the preset concentration value, and then determine the ventilation component 50 that needs adjustment according to preset rules. Simultaneously, the controller 70 can input the concentration difference into a PID algorithm and execute the PID algorithm to obtain a flow rate proportionality coefficient, and calculate the product of the flow rate proportionality coefficient and the preset flow rate value to obtain the flow rate setpoint. The specific principle by which the controller 70 obtains the flow rate setpoint and the ventilation component 50 that needs adjustment can be found in [reference needed]. Figures 1 to 5 The relevant textual descriptions will not be repeated here.

[0106] Among them, the ventilation components 50 that need to be adjusted include ventilation components 50 that have been turned on but need to be turned off, and ventilation components 50 that have been turned off but need to be turned on.

[0107] It is understandable that the controller 70 can also record the calculated concentration difference and sort the multiple concentration differences according to the time sequence of the concentration detection values ​​corresponding to the concentration difference.

[0108] Step S63: Output an open signal and / or a close signal to the corresponding ventilation component 50.

[0109] It can be understood that the controller 70, based on the ventilation components 50 requiring adjustment obtained in step S62, outputs an opening signal to the ventilation components 50 that need to be opened and a closing signal to the ventilation components 50 that need to be closed. The ventilation valve 52 in the ventilation component 50 can accept the opening or closing signal and perform the corresponding opening or closing action. The specific principle of the controller 70 outputting opening and closing signals to the ventilation components 50 can be found in [reference needed]. Figures 1 to 5 The relevant textual descriptions will not be repeated here.

[0110] Step S64: Output the flow rate set value to the flow rate regulator 80.

[0111] It is understood that after receiving the flow setting value, the flow regulator 80 can set the gas flow rate allowed to pass through the flow regulator 80 to be equal to the flow setting value, thereby adjusting the flow rate of the first gas in the intake pipe 30 in response to the flow setting value output by the controller 70.

[0112] It is understood that after steps S61 to S64 are completed, the controller 70 can execute steps S61 to S64 again so that the gas supply device 101 can continuously adjust the concentration of the second gas in the reactor 102.

[0113] Please refer to the following: Figure 7 In some embodiments, the gas supply method may include steps S71 to S77. Specifically, step S71 and... Figure 6 Step S61 is the same as or similar to step S75 to step S77. Figure 6 Steps S62 to S64 are the same or similar, and will not be repeated here. The following is combined with... Figure 7 The steps S72 to S74 are described in detail.

[0114] Step S72: Determine if there is any abnormality in the gas supply device 101.

[0115] It is understandable that the principle by which the controller 70 determines whether there is an abnormality in the gas supply device 101 can be referred to... Figures 1 to 5 The controller 70, after acquiring a concentration detection value from the gas detector 60, can determine whether the communication connection between the controller 70 and the gas detector 60 is interrupted based on whether a concentration detection value that can be recognized by the controller 70 is successfully acquired. Furthermore, the controller 70 can compare the recorded concentration detection values ​​with the currently acquired concentration detection values ​​to determine the number of consecutive identical concentration detection values, and compare whether the number of consecutive identical values ​​exceeds a quantity threshold.

[0116] It is understood that when there is no abnormality in the gas supply device 101, the process proceeds to step S73; when there is an abnormality in the gas supply device 101, the process proceeds to step S74.

[0117] Step S73: Determine whether the number of connection adjustment anomalies exceeds the threshold.

[0118] It is understood that an adjustment anomaly refers to a concentration difference between the currently acquired concentration detection value and the preset concentration value being greater than the concentration difference between the most recently acquired concentration detection value and the preset concentration value. The controller 70 can determine whether an adjustment anomaly exists by calculating the concentration difference corresponding to the currently acquired concentration detection value and comparing the current concentration difference with the concentration difference corresponding to the most recently acquired concentration detection value, and record any such adjustment anomalies.

[0119] The controller 70 can determine whether there are consecutive concentration anomalies and the number of consecutive concentration anomalies by sorting the concentration detection values ​​corresponding to the adjustment anomalies among the recorded concentration detection values.

[0120] It is understood that when the number of connection adjustment anomalies is less than or equal to the number threshold, the process proceeds to step S75; when the number of connection adjustment anomalies is greater than the number threshold, the process proceeds to step S74.

[0121] Step S74: Output control signals to valve assembly 110 and multiple venting assemblies 50, and output flow setpoint equal to the flow preset value to flow regulator 80.

[0122] It is understandable that the principle behind the controller 70's output control signal and flow setpoint can be found in [reference needed]. Figures 1 to 5 The relevant textual descriptions will not be repeated here.

[0123] It is understood that after step S74 is completed, the gas supply method process ends, and the gas supply device 101 can continuously supply the first gas to the reactor 102 through the valve assembly 110 and the auxiliary pipe 90 to reduce the concentration of the second gas in the reactor 102.

[0124] Understandable. Figure 6 and Figure 7 The beneficial effects of the gas supply method shown are, and Figures 1 to 5 The beneficial effects of the gas supply device 101 shown are the same or similar, and will not be described again here.

[0125] It will be apparent to those skilled in the art that this application is not limited to the details of the exemplary embodiments described above, and that this application can be implemented in other specific forms without departing from the spirit or essential characteristics of this application. Therefore, the embodiments described above should be considered exemplary and non-limiting in all respects, and the scope of this application is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within this application.

Claims

1. A gas supply device for supplying a first gas to a reactor to reduce the concentration of a second gas within the reactor, characterized in that, The gas supply device includes: The intake pipe is used to connect to the first gas; A gas outlet pipe is used to connect and communicate with the reactor, and the gas outlet pipe is used to introduce the first gas into the reactor; Multiple ventilation components are provided, each of which is connected between the air inlet pipe and the air outlet pipe. Each ventilation component is in communication with both the air inlet pipe and the air outlet pipe. The diameters of the channels through which the first gas passes through the multiple ventilation components are different. A gas detection device is provided inside the reactor to detect the concentration of the second gas inside the reactor and generate a corresponding concentration detection value. The controller is communicatively connected to the gas detection device and the plurality of ventilation components. The controller is used to acquire the concentration detection value and control the corresponding ventilation component to be turned on according to the concentration detection value.

2. The gas supply device as described in claim 1, characterized in that, The gas supply device also includes: A flow regulator is connected and communicates with the air intake pipe and is communicatively connected with the controller. The flow regulator is used to receive a flow rate setpoint and adjust the gas flow rate in the air intake pipe according to the flow rate setpoint. The controller is used to output the corresponding flow rate setpoint according to the concentration detection value.

3. The gas supply device as described in claim 1, characterized in that, The air intake pipe is used to connect to an air source device, and the air source device is used to output the first gas to the air intake pipe; The controller is used to communicate with the gas source device, and the controller is used to output a corresponding flow rate setting value to the gas source device according to the concentration detection value, so as to adjust the flow rate of the first gas output by the gas source device.

4. The gas supply device as described in claim 1, characterized in that, Each of the ventilation components includes: A connecting pipe, which is connected to and communicates with the air inlet pipe and / or the air outlet pipe; A vent valve is connected to and communicates with the connecting pipe. The vent valve is also communicatively connected to the controller, which controls the vent valve to open or close, thereby controlling the corresponding vent assembly to be connected or disconnected.

5. The gas supply device as described in claim 1, characterized in that, The gas supply device also includes: An auxiliary pipe, one end of which is connected to the air inlet pipe and the other end of which is connected to the air outlet pipe, and the auxiliary pipe is connected to both the air inlet pipe and the air outlet pipe; A valve assembly is connected and communicates with the auxiliary pipe and is communicatively connected with the controller. The controller outputs a control signal to the valve assembly to open the valve assembly and thus enable the auxiliary pipe to conduct.

6. The gas supply device as described in claim 5, characterized in that, The valve assembly includes: A pneumatic valve, which is connected to and communicates with the auxiliary pipe, and a first interface is provided on the pneumatic valve; A control valve is connected to the first interface and communicates with the controller. The control valve is used to receive the control signal and output the first gas to the first interface to open the pneumatic valve.

7. The gas supply device as described in claim 6, characterized in that, The control valve is connected to the intake pipe, and the control valve is used to receive the first gas from the intake pipe and transmit the first gas to the first interface.

8. The gas supply device as described in claim 1, characterized in that, The gas supply device also includes: The outer casing has a receiving space therein, and the air inlet pipe, the air outlet pipe and the plurality of the ventilation components are all received in the receiving space; the outer casing has an opening, and a cover is movably connected to the outer casing to cover the opening.

9. A gas supply method, applied to a gas supply device, the gas supply device being used to output a first gas to a reactor to reduce the concentration of a second gas inside the reactor, characterized in that, The gas supply device includes: The intake pipe is used to connect to the first gas; A gas outlet pipe is used to connect and communicate with the reactor, and the gas outlet pipe is used to introduce the first gas into the reactor; Multiple ventilation components are provided, each of which is connected between the air inlet pipe and the air outlet pipe. Each ventilation component is in communication with both the air inlet pipe and the air outlet pipe. The diameters of the channels through which the first gas passes through the multiple ventilation components are different. A gas detection device is provided inside the reactor to detect the concentration of the second gas inside the reactor and generate a corresponding concentration detection value. A flow regulator is connected to and communicates with the intake pipe, and the flow regulator is used to regulate the gas flow rate in the intake pipe; The gas supply method includes: The concentration detection value is obtained from the gas detection device; The flow rate setpoint and the ventilation components that need to be adjusted are determined based on the concentration detection value. Output an on signal and / or a off signal to the ventilation component that needs adjustment, wherein the on signal is used to instruct the ventilation component receiving the on signal to open, and the off signal is used to instruct the ventilation component receiving the off signal to close; The flow rate setting value is output to the flow rate regulator.

10. The gas supply method as described in claim 9, characterized in that, The gas supply device further includes an auxiliary pipe and a valve assembly. One end of the auxiliary pipe is connected to the gas inlet pipe, and the other end is connected to the gas outlet pipe. The auxiliary pipe is connected to both the gas inlet pipe and the gas outlet pipe. The valve assembly is connected to and communicates with the auxiliary pipe. The gas supply method also includes: In response to the number of consecutive adjustment anomalies exceeding a threshold, a control signal is output to the valve assembly and the plurality of ventilation assemblies, and a flow rate setpoint equal to a flow rate preset value is output to the flow regulator. The adjustment anomaly indicates that the concentration difference between the currently acquired concentration detection value and the concentration preset value is greater than the concentration difference between the most recently acquired concentration detection value and the concentration preset value. The control signal instructs the valve assembly to open and the ventilation assembly to close. In response to an abnormality in the gas supply device, the control signal is output to the valve assembly and the plurality of the ventilation assemblies, and the flow rate setting value, which is equal to the preset flow rate value, is output to the flow rate regulator; wherein, the abnormality includes the number of consecutive identical concentration detection values ​​being greater than a preset quantity threshold, and / or the communication connection with the gas detection element being interrupted.

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