Compensation method and device for monitoring dynamic of glass chemical etching after ultrafast laser induction

Abstract

The application provides a kind of ultrafast laser induced glass chemical corrosion dynamic monitoring compensation method and device, to solve the existing ultrafast laser induced glass chemical corrosion technology in chemical corrosion process There are problems such as corrosion liquid concentration attenuation, corrosion liquid temperature fluctuation, corrosion process invisible, and various problems when contact sensor is used to monitor the concentration and temperature of corrosion liquid.The ultrafast laser induced glass chemical corrosion dynamic monitoring compensation method of the application innovatively integrates the spectral measurement technology into the ultrafast laser induced glass chemical corrosion process, according to the spectral measurement technology and the quantitative model of chemometrics, the real-time concentration and real-time temperature of the corrosion liquid are monitored synchronously, and the originally unstable corrosion environment is maintained in a constant state through the dynamic compensation of the real-time concentration and real-time temperature of the corrosion liquid, so that the corrosion rate is predictable and repeatable, which greatly improves the consistency and reliability of glass chemical corrosion.

Description

Technical Field

[0001] This invention relates to a method and apparatus for ultrafast laser-induced chemical corrosion of glass, specifically to a method for dynamic monitoring and compensation of chemical corrosion of glass after ultrafast laser induction, and an apparatus for implementing this method. Background Technology

[0002] Ultrafast laser (picosecond / femtosecond laser) induced chemical etching is an advanced three-dimensional micromachining technique for glass. This technique first uses an ultrafast laser to selectively modify the interior of the glass, then uses an etching solution (such as hydrofluoric acid HF solution) to preferentially etch away the modified areas, thereby creating glass workpieces with complex three-dimensional structures. However, this technique faces three major challenges during the chemical etching process that significantly impact workpiece machining accuracy, repeatability, and reliability:

[0003] (1) Problem of corrosion solution concentration decay: During the corrosion process, the corrosion solution is continuously consumed by the glass through reaction, resulting in a continuous decrease in the concentration of the corrosion solution and a corresponding decrease in the corrosion rate. This makes the corrosion process an unsteady and nonlinear process, making it difficult to predict the corrosion endpoint.

[0004] (2) Problem of temperature fluctuation of corrosion solution: Chemical corrosion reaction is usually exothermic reaction, and the ambient temperature will also fluctuate. The corrosion rate is very sensitive to temperature. Small temperature changes will lead to significant changes in the corrosion rate, which seriously affects the consistency of the process and the repeatability between different batches.

[0005] (3) Problem of invisible corrosion process: The corrosion process is usually carried out in a closed acid and alkali resistant container, and it is impossible to directly observe the corrosion state of the internal workpiece. It is difficult to judge the corrosion progress and the corrosion endpoint, which can easily lead to under-corrosion (corrosion is not fully formed) or over-corrosion (structural damage). At present, the common method is to interrupt the corrosion at timed intervals and take out the workpiece to check the corrosion process. This method is inefficient, prone to human error, and repeated handling can easily damage the delicate and fragile glass workpiece.

[0006] In addition, contact sensors, such as pH electrodes, fluoride ion selective electrodes, and temperature sensors, are often used to monitor the concentration and temperature of corrosive solutions. However, these methods have the following drawbacks: First, contact sensors need to be in direct contact with the corrosive solution, making them prone to damage in highly corrosive environments, resulting in short sensor lifespans and requiring frequent replacement and calibration; second, traditional contact sensors cannot simultaneously acquire information such as concentration and temperature, leading to low system integration; and third, they cannot achieve truly non-contact, in-situ, real-time, and multi-parameter synchronous monitoring. Summary of the Invention

[0007] The purpose of this invention is to solve the technical problems of existing ultrafast laser-induced chemical corrosion technology for glass, such as corrosion solution concentration decay, corrosion solution temperature fluctuation, and lack of visibility of the corrosion process, as well as the problems of short sensor life, low system integration, and inability to achieve non-contact, in-situ, real-time, and multi-parameter synchronous monitoring when using contact sensors to monitor corrosion solution concentration and temperature. The invention provides a method and device for dynamic monitoring and compensation of ultrafast laser-induced chemical corrosion of glass.

[0008] To achieve the above objectives, the technical solution provided by this invention is as follows:

[0009] A method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser, characterized by the following steps:

[0010] Step 1: Acquire the initial spectrum of the corrosive solution, and invert the initial spectrum of the corrosive solution using a chemometric quantitative model to obtain the initial concentration C0 and initial temperature T0 of the corrosive solution; Based on the initial concentration C0 and initial temperature T0 of the corrosive solution, set the concentration threshold range and temperature threshold range; The chemometric quantitative model is obtained by correlation modeling of standard spectral samples of corrosive solutions with different concentrations and temperatures.

[0011] Step 2: Immerse the glass workpiece modified by ultrafast laser in the etching solution;

[0012] Step 3: Collect the real-time spectrum of the etching solution, and invert the real-time spectrum of the etching solution according to the chemometric quantitative model to obtain the real-time concentration C and real-time temperature T of the etching solution; at the same time, detect the corrosion depth of the modified area of ​​the glass workpiece in real time.

[0013] Step 4: In real time, determine whether the glass workpiece has reached the corrosion endpoint, whether the real-time concentration C of the etchant is less than the minimum value of the concentration threshold range, and whether the real-time temperature T of the etchant exceeds the temperature threshold range, and perform the following processing based on the determination results:

[0014] A. If the glass workpiece reaches the corrosion endpoint, proceed directly to step 5;

[0015] B. If the glass workpiece has not reached the corrosion endpoint, the real-time concentration C of the etchant is not less than the minimum value of the concentration threshold range, and the real-time temperature T of the etchant does not exceed the temperature threshold range, then return to step 3.

[0016] C. If the glass workpiece has not reached the corrosion endpoint, the real-time concentration C of the etching solution is less than the minimum value of the concentration threshold range, and the real-time temperature T of the etching solution has not exceeded the temperature threshold range, then add etching solution with a concentration higher than the initial concentration C0 to the etching solution until the real-time concentration C of the etching solution stabilizes within the concentration threshold range, and then return to step 3.

[0017] D. If the glass workpiece has not reached the corrosion endpoint, the real-time concentration C of the etchant is not less than the minimum value of the concentration threshold range, and the real-time temperature T of the etchant exceeds the temperature threshold range, then the etchant is heated or cooled until the real-time temperature T of the etchant stabilizes within the temperature threshold range, and then the process returns to step 3.

[0018] E. If the glass workpiece has not reached the corrosion endpoint, the real-time concentration C of the etching solution is less than the minimum value of the concentration threshold range, and the real-time temperature T of the etching solution exceeds the temperature threshold range, then add etching solution with a concentration higher than the initial concentration C0 to the etching solution until the real-time concentration C of the etching solution stabilizes within the concentration threshold range. At the same time, heat or cool the etching solution until the real-time temperature T of the etching solution stabilizes within the temperature threshold range, and then return to step 3.

[0019] In the process of adding a higher concentration of corrosive liquid than the initial concentration C0 to the corrosive liquid until the real-time concentration C of the corrosive liquid stabilizes within the concentration threshold range, and heating or cooling the corrosive liquid until the real-time temperature T of the corrosive liquid stabilizes within the temperature threshold range, the process of continuously judging whether the glass workpiece has reached the corrosion endpoint does not stop. If it is judged that the glass workpiece has reached the corrosion endpoint, step 5 is executed directly.

[0020] Step 5: Stop the chemical corrosion of the glass workpiece and complete the dynamic monitoring and compensation of the chemical corrosion of the glass workpiece after ultrafast laser induction.

[0021] Furthermore, in step 1, partial least squares method is used to correlate and model the spectral information of the standard spectral sample of the corrosive liquid with its corresponding concentration and temperature parameters to obtain a chemometric quantitative model.

[0022] In step 1, the initial spectrum of the corrosive solution is acquired using Raman spectroscopy;

[0023] In step 3, the real-time spectrum of the corrosive liquid is acquired using a preset frequency based on Raman spectroscopy.

[0024] Furthermore, in step 1, the corrosive liquid is a hydrofluoric acid solution;

[0025] The concentration threshold range is 19.7% to 20.3%, and the temperature threshold range is 24.9°C to 25.1°C.

[0026] Furthermore, in step 3, ultrasonic technology is used to detect the corrosion depth of the modified area of ​​the glass workpiece in real time;

[0027] In step 4, the corrosion depth of the modified area of ​​the glass workpiece is used to determine whether the glass workpiece has reached the corrosion endpoint, and the spectral data of the etching solution and the amplitude of the ultrasonic echo signal are used for verification.

[0028] In addition, the present invention also provides a dynamic monitoring and compensation device for glass chemical corrosion induced by ultrafast laser, which is used to realize the above-mentioned dynamic monitoring and compensation method for glass chemical corrosion induced by ultrafast laser. Its special feature is that it includes a sealed cavity, a spectral measurement unit, a corrosion process measurement unit, a control system, and a dynamic compensation execution system.

[0029] The sealed cavity includes a reaction cavity and a sealing cover disposed on the reaction cavity; both the reaction cavity and the sealing cover are made of corrosion-resistant materials; the reaction cavity is used to hold the corrosive liquid and the glass workpiece modified by ultrafast laser induction; a jacket is provided on the outside of the reaction cavity;

[0030] The spectral measurement unit includes a spectral probe, an optical fiber, and a spectrometer host. The probe's detection end is immersed in the corrosive liquid to emit a laser to irradiate the corrosive liquid and collect the scattered light signal within it. The spectral probe is connected to the spectrometer host via an optical fiber to transmit the scattered light signal collected by the probe to the spectrometer host. The spectrometer host analyzes and processes the collected scattered light signal to obtain the spectrum of the corrosive liquid.

[0031] The corrosion process measurement unit is used to detect the corrosion depth of the modified area of ​​the glass workpiece in real time.

[0032] The dynamic compensation execution system includes a concentration compensation unit and a temperature compensation unit;

[0033] The control system stores a chemometric quantitative model. Its first input is connected to the output of the spectrometer host and is used to invert the real-time spectrum of the corrosive liquid according to the chemometric quantitative model to obtain the real-time concentration C and real-time temperature T of the corrosive liquid. The first output of the control system is used to control the concentration compensation unit to replenish the reaction chamber with corrosive liquid of a higher concentration C0 than the initial concentration C0 when the real-time concentration C of the corrosive liquid is less than the minimum value of the concentration threshold range. Its second output is used to control the temperature compensation unit to inject heating liquid or cooling liquid into the jacket when the real-time temperature T of the corrosive liquid exceeds the temperature threshold range. The second input of the control system is connected to the output of the corrosion process measurement unit and is used to determine whether the corrosion endpoint of the glass workpiece has been reached based on the corrosion depth of the modified area of ​​the glass workpiece.

[0034] Furthermore, the corrosion process measurement unit includes an ultrasonic transmitting probe, an ultrasonic receiving probe, and an ultrasonic thickness gauge main unit;

[0035] The ends of the ultrasonic transmitting probe and the ultrasonic receiving probe are covered with acid and alkali resistant corrosion material. The ultrasonic transmitting probe and the ultrasonic receiving probe are coupled and installed on both sides of the side wall of the reaction chamber, and the ends of the probes extend into the interior of the reaction chamber to align the ultrasonic transmitting probe and the ultrasonic receiving probe with the modified area of ​​the glass workpiece. The ultrasonic transmitting probe is used to emit ultrasonic pulses that penetrate the glass workpiece, and the ultrasonic receiving probe is used to receive the ultrasonic echo signal of the glass workpiece.

[0036] The main unit of the ultrasonic thickness gauge is electrically connected to the ultrasonic transmitting probe and the ultrasonic receiving probe, respectively. It is used to control the ultrasonic transmitting probe to emit ultrasonic pulses and receive the ultrasonic echo signal sent by the ultrasonic receiving probe. Based on the ultrasonic transmission and reception time difference and the propagation speed of ultrasonic waves in the glass workpiece, the ultrasonic travel in the glass workpiece is calculated in real time, thereby obtaining the corrosion depth of the modified area of ​​the glass workpiece.

[0037] The output terminal of the ultrasonic thickness gauge host is used as the output terminal of the corrosion process measurement unit and is connected to the second input terminal of the control system.

[0038] Furthermore, the spectral probe is an immersion fiber optic probe, and the housing material is PTFE, PFA, or Hastelloy.

[0039] The spectral probe is equipped with a sapphire window at its detection end, and an optical fiber output port is configured inside the sapphire window. The optical fiber output port is used to emit laser light to irradiate the corrosion solution, and the detection end of the spectral probe is used to collect the scattered light signal in the corrosion solution.

[0040] The main unit of the spectrometer is a Raman spectrometer, which is configured for multi-channel spectral acquisition.

[0041] Furthermore, the concentration compensation unit includes a storage tank and a precision metering pump; the storage tank contains a corrosive liquid with a concentration higher than the initial concentration C0, and a corrosive liquid injection port is provided on the outer wall of the reaction chamber; the input end of the precision metering pump is connected to the suction port of the storage tank, and its output end is connected to the corrosive liquid injection port.

[0042] The first output terminal of the control system is connected to the control signal port of the precision metering pump, which is used to control the precision metering pump to pump the corrosive liquid in the storage tank into the reaction chamber through the corrosive liquid injection port when the real-time concentration C of the corrosive liquid is less than the minimum value of the concentration threshold range.

[0043] The temperature compensation unit includes a constant temperature water bath system, and a water bath inlet is provided on the outer wall of the jacket.

[0044] The second output terminal of the control system is connected to the control signal port of the constant temperature water bath system. When the real-time temperature T of the corrosive liquid is greater than the maximum value of the temperature threshold range, the constant temperature water bath system is controlled to pump coolant into the jacket through the water bath inlet. When the real-time temperature T of the corrosive liquid is less than the minimum value of the temperature threshold range, the constant temperature water bath system is controlled to pump heating liquid into the jacket through the water bath inlet.

[0045] Furthermore, the dynamic compensation execution system also includes a process control unit;

[0046] The process control unit includes a cleaning fluid storage system, a corrosion fluid drain valve, a water bath drain valve, and a waste liquid collection tank;

[0047] The cleaning fluid storage system stores cleaning fluid, and a cleaning fluid injection port is provided on the outer wall of the reaction chamber; the corrosion fluid drain valve is located at the bottom of the reaction chamber and extends to the outside of the jacket; the water bath drain valve is located at the bottom of the jacket.

[0048] The third and fourth output terminals of the control system are respectively connected to the control ports of the corrosion liquid drain valve and the water bath drain valve. When the corrosion endpoint of the glass workpiece is reached, the control system opens the corrosion liquid drain valve and the water bath drain valve, allowing the corrosion liquid in the reaction chamber and the liquid in the jacket to be discharged into the waste liquid collection tank. The fifth output terminal of the control system is connected to the control signal port of the cleaning liquid storage system. After the corrosion liquid in the reaction chamber is emptied, the control system pumps the cleaning liquid into the reaction chamber through the cleaning liquid injection port to clean the reaction chamber. The waste liquid after cleaning is discharged into the waste liquid collection tank through the corrosion liquid drain valve.

[0049] Furthermore, one-way valves are installed on the corrosion liquid injection port, water bath injection port, and cleaning liquid injection port respectively to prevent the corresponding liquids from overflowing.

[0050] Compared with the prior art, the present invention has the following beneficial technical effects:

[0051] 1. The method for dynamic monitoring and compensation of ultrafast laser-induced chemical corrosion of glass provided by this invention innovatively integrates spectral measurement technology into the ultrafast laser-induced chemical corrosion process. Based on spectral measurement technology and chemometric quantitative models, it simultaneously monitors the real-time concentration and temperature of the corrosive solution. Through dynamic compensation of the real-time concentration and temperature of the corrosive solution, the originally unstable corrosion environment is maintained in a constant state, making the corrosion rate predictable and repeatable, which greatly improves the consistency and reliability of glass chemical corrosion. At the same time, it detects the corrosion depth of the modified area of ​​the glass workpiece in real time, ultimately realizing intelligent and steady-state control of the corrosion process, thereby ensuring high-precision and high-reliability manufacturing of three-dimensional glass workpieces.

[0052] 2. The method for dynamic monitoring and compensation of glass chemical corrosion after ultrafast laser induction provided by the present invention can achieve measurement accuracy comparable to that of traditional titration by combining chemometric modeling and spectral measurement technology. Moreover, the stability of the spectral signal is better than that of the electrode signal, and it has strong anti-interference ability and is not easily affected by factors such as suspended particles and bubbles in the solution.

[0053] 3. This invention uses spectral measurement technology to replace traditional contact sensors such as pH electrodes, fluoride ion selective electrodes, and temperature sensors. On the one hand, it eliminates the need to directly immerse electronic components in highly corrosive liquids, effectively solving the problems of poor reliability, short lifespan, and inability to simultaneously measure multiple parameters in highly corrosive environments. On the other hand, spectral measurement technology has a fast response speed, ranging from a few seconds to a minute, which is much faster than traditional sampling-offline analysis methods. Moreover, it does not require sample pretreatment and can achieve true in-situ, real-time, and continuous monitoring.

[0054] 4. The method for dynamic monitoring and compensation of glass chemical corrosion after ultrafast laser induction provided by the present invention is not only applicable to single-component corrosion solutions, but can also be extended to complex corrosion solution systems containing multiple acids (such as mixed acid systems such as HF / HNO3 / H3PO4). By simultaneously inverting the concentration of each component through multidimensional spectral information, it provides technical reserves for more complex glass corrosion processes.

[0055] 5. Compared with the concentration and temperature acquisition methods of traditional single-parameter sensors, this invention acquires the real-time spectrum of the corrosive liquid based on Raman spectroscopy. It can simultaneously obtain concentration and temperature information by analyzing the spectral frequency shift and peak width changes in the same measurement, thus realizing multi-parameter synchronous monitoring.

[0056] 6. The method for dynamic monitoring and compensation of glass chemical corrosion after ultrafast laser induction provided by the present invention adopts non-destructive monitoring with ultrasonic technology, which can monitor the corrosion process inside the glass workpiece in real time, realize the transformation from experience guessing to data-driven, and accurately determine the corrosion endpoint, avoiding errors and workpiece damage risks caused by manual intervention.

[0057] 7. The method for dynamic monitoring and compensation of glass chemical corrosion after ultrafast laser induction provided by the present invention uses the spectral data of the corrosion liquid and the amplitude of the ultrasonic echo signal to verify the corrosion endpoint of the glass workpiece, ensuring the accuracy of the judgment of the corrosion endpoint of the glass workpiece and effectively avoiding the occurrence of under-corrosion and over-corrosion.

[0058] 8. The ultrafast laser-induced glass chemical corrosion dynamic monitoring and compensation device provided by the present invention constructs a non-contact, in-situ, multi-parameter synchronous monitoring closed-loop dynamic compensation system, which can effectively eliminate under-corrosion and over-corrosion defects caused by the concentration decay of the corrosive liquid and temperature fluctuations. It is particularly suitable for manufacturing complex three-dimensional microstructure glass devices and can effectively improve the dimensional accuracy and manufacturing yield of products.

[0059] 9. The ultrafast laser-induced glass chemical corrosion dynamic monitoring and compensation device provided by this invention automatically completes the entire monitoring, compensation, corrosion process judgment and control process, realizing automated operation, greatly reducing the difficulty of operation and dependence on skilled workers, and laying a technical foundation for industrial mass production. Attached Figure Description

[0060] Figure 1 This is a schematic diagram of an embodiment of the glass chemical corrosion dynamic monitoring and compensation device induced by ultrafast laser according to the present invention;

[0061] Figure 2 This is a flowchart of the method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser according to the present invention.

[0062] Explanation of reference numerals in the attached figures:

[0063] 1-Reaction chamber; 2-Sealed cover; 3-Etching solution; 4-Glass workpiece; 5-Spectrometer probe; 6-Sapphire window; 7-Fiber optic output port; 8-Fiber optic cable; 9-Spectrometer main unit; 10-Storage tank; 11-Precision metering pump; 12-Etching solution inlet; 13-Jacket; 14-Constant temperature water bath system; 15-Water bath inlet; 16-Water bath drain valve; 17-Ultrasonic transmitting probe; 18-Ultrasonic receiving probe; 19-Ultrasonic thickness gauge main unit; 20-Etching solution drain valve; 21-Cleaning solution storage system; 22-Cleaning solution inlet; 23-Waste liquid collection tank; 24-Control system. Detailed Implementation

[0064] To make the objectives, advantages, and features of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Those skilled in the art should understand that these embodiments are merely used to explain the technical principles of the present invention and are not intended to limit the scope of protection of the present invention.

[0065] like Figure 1 As shown, a dynamic monitoring and compensation device for glass chemical corrosion induced by ultrafast laser includes a sealed cavity, a spectral measurement unit, a corrosion process measurement unit, a dynamic compensation execution system, and a control system 24.

[0066] The sealed cavity includes a reaction chamber 1 and a sealing cap 2 disposed on the reaction chamber 1. Both the reaction chamber 1 and the sealing cap 2 are made of polytetrafluoroethylene (PTFE) material, which has acid and alkali corrosion resistance, and are mainly used to hold the etching solution 3 and the glass workpiece 4 modified by ultrafast laser induction. In this embodiment, the etching solution 3 is a hydrofluoric acid (HF) solution with an initial concentration C0 of 20% and an initial temperature T0 of 25°C. The glass workpiece 4 is a molten silica microchannel glass workpiece modified by ultrafast laser induction.

[0067] The spectral measurement unit includes a spectral probe 5, an optical fiber 8, and a spectrometer main unit 9. The spectral probe 5 is an immersion-type optical fiber probe, and its shell is made of PTFE (polytetrafluoroethylene), allowing it to operate stably for extended periods in a hydrofluoric acid environment, significantly extending its lifespan compared to traditional sensors. Furthermore, the probe tip of the spectral probe 5 can be directly immersed in the corrosive solution 3 for in-situ measurement. To achieve complete sealing of the sealed cavity, a sealing interface is provided on the top of the sealing cover 2. The probe tip of the spectral probe 5 is inserted into the corrosive solution 3 in the reaction chamber 1 through this sealing interface.

[0068] In addition, the detection end of the spectral probe 5 is equipped with a sapphire window 6 resistant to hydrofluoric acid solution corrosion, and the sapphire window 6 contains an optical fiber output port 7. The optical fiber output port 7 is used to emit laser light, which passes through the sapphire window 6 to irradiate the corrosive solution 3, thereby exciting the corrosive solution 3 to generate scattering. The detection end of the spectral probe 5 is used to collect the scattered light signal within the corrosive solution 3. The spectral probe 5 is connected to the spectrometer host 9 via an optical fiber 8 to transmit the collected scattered light signal to the spectrometer host 9, enabling remote, non-contact measurement and avoiding exposure of electronic components to the corrosive environment. The spectrometer host 9 is used to analyze and process the collected scattered light signal to obtain the spectrum of the corrosive solution 3.

[0069] The spectral measurement unit can employ Raman spectroscopy, near-infrared spectroscopy, or ultraviolet-visible absorption spectroscopy. In this embodiment, Raman spectroscopy is used, which has the following advantages: (1) The spectral characteristic peaks correspond one-to-one with the molecular vibration modes. HF molecules have significant characteristic Raman peaks and are not affected by water molecules, so they can be directly used for quantitative concentration analysis; (2) The frequency shift information of the spectrum is sensitive to temperature, and temperature information can be obtained synchronously in the same measurement to achieve in-situ monitoring of multiple parameters; (3) It can work stably for a long time in a strong hydrofluoric acid environment and can withstand temperatures up to 200℃; (4) It has a fast response speed (second level) and can achieve real-time monitoring. Therefore, in this embodiment, the spectrometer host 9 is a Raman spectrometer, which can be equipped with a 785nm or 1064nm laser light source. The scattered light signal collected by the spectral probe 5 is a Raman scattered light signal, and the obtained spectrum is a Raman spectrum. In addition, the spectrometer host 9 can be configured with single-channel or multi-channel spectral acquisition. Preferably, the spectrometer host 9 is configured with multi-channel (such as four-channel) spectral acquisition to achieve multi-point synchronous monitoring of the corrosive liquid 3.

[0070] The corrosion process measurement unit includes an ultrasonic transmitting probe 17, an ultrasonic receiving probe 18, and an ultrasonic thickness gauge main unit 19. The probe tips of the ultrasonic transmitting probe 17 and the ultrasonic receiving probe 18 are covered with acid and alkali corrosion-resistant material. The ultrasonic transmitting probe 17 and the ultrasonic receiving probe 18 are coupled and installed on both sides of the sidewall of the reaction chamber 1, with the probe tips extending into the interior of the reaction chamber 1. The ultrasonic transmitting probe 17 is used to emit ultrasonic pulses that penetrate the glass workpiece 4, and the ultrasonic receiving probe 18 is used to receive the ultrasonic echo signal from the glass workpiece 4. It is worth noting that when the ultrafast laser-induced modified glass workpiece 4 is placed in the reaction chamber 1, the modified area of ​​the glass workpiece 4 must be aligned with the ultrasonic transmitting probe 17 and the ultrasonic receiving probe 18. The ultrasonic thickness gauge host 19 is electrically connected to the ultrasonic transmitting probe 17 and the ultrasonic receiving probe 18 respectively. It is used to control the ultrasonic transmitting probe 17 to emit ultrasonic pulses and receive the ultrasonic echo signal sent by the ultrasonic receiving probe 18. Then, based on the ultrasonic transmission and reception time difference and the propagation speed of ultrasonic waves in the glass workpiece 4, the ultrasonic travel in the glass workpiece 4 is calculated in real time, thereby obtaining the corrosion depth of the modified area of ​​the glass workpiece 4, which is convenient for subsequent determination of the corrosion process of the glass workpiece 4.

[0071] The dynamic compensation execution system includes a concentration compensation unit, a temperature compensation unit, and a process control unit. The concentration compensation unit includes a storage tank 10 and a precision metering pump 11. The storage tank 10 stores a corrosive solution with a concentration higher than the initial concentration C0; in this embodiment, it is a 50% hydrofluoric acid solution. A corrosive solution injection port 12 is provided on the outer wall of the reaction chamber 1. The input end of the precision metering pump 11 is connected to the suction port of the storage tank 10, and its output end is connected to the corrosive solution injection port 12. The temperature compensation unit includes a constant temperature water bath system 14. A jacket 13 is provided on the outer side of the reaction chamber 1, and a water bath injection port 15 is provided on the outer wall of the jacket 13. The process control unit includes a cleaning fluid storage system 21, a corrosion fluid drain valve 20, a water bath drain valve 16, and a waste liquid collection tank 23. The cleaning fluid storage system 21 stores cleaning fluid, and a cleaning fluid inlet 22 is provided on the outer wall of the reaction chamber 1. The corrosion fluid drain valve 20 is located at the bottom of the reaction chamber 1 and extends to the outside of the jacket 13. The water bath drain valve 16 is located at the bottom of the jacket 13. The waste liquid collection tank 23 is used to receive the liquid discharged through the corrosion fluid drain valve 20 and the water bath drain valve 16. In this embodiment, the hydrofluoric acid storage tank 10 and the waste liquid collection tank 23 are both made of polytetrafluoroethylene (PTFE), and the corrosion fluid inlet 12 and the corrosion fluid drain valve 20 are both encapsulated with PTFE, which has acid and alkali corrosion resistance. Preferably, one-way valves are installed on the corrosion liquid injection port 12, the water bath injection port 15, and the cleaning liquid injection port 22 to prevent liquid overflow. In other embodiments of the present invention, corresponding solenoid valves may also be provided on the corrosion liquid injection port 12, the water bath injection port 15, and the cleaning liquid injection port 22 for control, which is not limited here.

[0072] The control system 24 is the core system of the device. It stores a chemometric quantitative model. Its first input is connected to the output of the spectrometer host 9, and is used to invert the real-time spectrum of the etching solution 3 according to the chemometric quantitative model to obtain the real-time concentration C and real-time temperature T of the etching solution 3. The second input of the control system 24 is connected to the output of the ultrasonic thickness gauge host 19, and is used to determine the corrosion process of the glass workpiece 4 in real time according to the corrosion depth of the modified area. When the corrosion depth of the modified area of ​​the glass workpiece 4 reaches the preset depth, the corrosion endpoint of the glass workpiece 4 can be determined.

[0073] Since the spectral data of the etching solution 3 itself implicitly contains information about the corrosion process of the glass workpiece 4, the intensity changes of the spectral characteristic peaks of the reaction byproducts of the etching solution 3, such as fluorosilicates, tend to stabilize when the corrosion endpoint of the glass workpiece 4 is reached. Furthermore, since the amplitude change of the ultrasonic echo signal can indirectly reflect the corrosion process of the glass workpiece 4, when the modified region of the glass workpiece 4 is completely corroded through, the amplitude of the ultrasonic echo signal will undergo a step change upon reaching the corrosion endpoint. Therefore, the spectral data of the etching solution 3 and the amplitude of the ultrasonic echo signal can be used to further verify the corrosion endpoint of the glass workpiece 4 to ensure the accuracy of the determination of the corrosion endpoint and avoid under-corrosion and over-corrosion phenomena.

[0074] The first output of the control system 24 is connected to the control signal port of the precision metering pump 11. When the real-time concentration C of the corrosive liquid 3 is less than the minimum value of the concentration threshold range, the control system 24 controls the precision metering pump 11 to pump the corrosive liquid from the storage tank 10 into the reaction chamber 1 through the corrosive liquid injection port 12, thus stabilizing the concentration of the corrosive liquid 3 within the concentration threshold range. The second output of the control system 24 is connected to the control signal port of the constant temperature water bath system 14. When the real-time temperature T of the corrosive liquid 3 is greater than the maximum value of the temperature threshold range, the control system 14 controls the constant temperature water bath system 14 to inject coolant into the jacket 13 through the water bath injection port 15. When the real-time temperature T of the corrosive liquid 3 is less than the minimum value of the temperature threshold range, the control system 14 controls the constant temperature water bath system 14 to inject heating liquid into the jacket 13 through the water bath injection port 15. The coolant or heating liquid injected into the jacket 13 is used to cool or heat the temperature of the corrosive liquid 3 in the reaction chamber 1, maintaining the temperature of the corrosive liquid 3 within the temperature threshold range.

[0075] The third and fourth output terminals of the control system 24 are respectively connected to the control port of the corrosion liquid drain valve 20 and the control signal port of the water bath drain valve 16. These are used to control the opening of the corrosion liquid drain valve 20 and the water bath drain valve 16 when the corrosion endpoint of the glass workpiece 4 is reached, allowing the corrosion liquid in the reaction chamber 1 and the liquid in the jacket 13 to be discharged into the waste liquid collection tank 23. The fifth output terminal of the control system 24 is connected to the control signal port of the cleaning liquid storage system 21. After the corrosion liquid in the reaction chamber 1 is emptied, the cleaning liquid storage system 21 is used to control the pumping of cleaning liquid into the reaction chamber 1 through the cleaning liquid injection port 22 to clean the reaction chamber 1. Simultaneously, the waste liquid after cleaning is also discharged into the waste liquid collection tank 23 through the corrosion liquid drain valve 20.

[0076] In this invention, the control system 24 receives data monitored by the spectrometer host 9 and the ultrasonic thickness gauge host 19, processes and analyzes the data to obtain the concentration and temperature of the etching solution 3 and the corrosion depth of the modified area of ​​the glass workpiece 4. Then, it outputs control commands to the dynamic compensation execution system to realize closed-loop dynamic compensation control of the etching solution concentration and temperature, thereby ensuring that the entire corrosion process is carried out in a stable and reliable environment, providing technical support for the high-precision and high-consistency manufacturing of the glass workpiece 4.

[0077] A method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser, employing the aforementioned device for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser, such as... Figure 2 As shown, the specific steps include:

[0078] Step 1: Obtain the concentration threshold range and temperature threshold range.

[0079] Before the chemical etching begins, a series of etching solutions 3 with different concentrations (5%~30%) and temperatures (20°C~50°C) are prepared in advance. In this embodiment, the etching solution 3 used is a hydrofluoric acid solution. Then, Raman spectra of etching solutions 3 with different concentrations and temperatures are collected based on Raman spectroscopy as standard spectral samples. Finally, partial least squares method is used to correlate and model the frequency shift, peak intensity, peak width, and other characteristics in the collected Raman spectra with their corresponding concentration and temperature parameters to obtain a chemometric quantitative model. The obtained chemometric quantitative model is stored in the control system 24.

[0080] First, a preset volume of chemical etching solution 3 is injected into the reaction chamber 1. Then, the initial spectrum of the etching solution 3 is acquired by the spectral measurement unit. The control system 24 performs inversion on the initial spectrum of the etching solution 3 according to the chemometric quantitative model to obtain the initial concentration C0 and initial temperature T0 of the etching solution 3. In this embodiment, the initial concentration C0 of the etching solution 3 is 20%, and the initial temperature T0 is 25°C. Finally, based on the initial concentration C0 and initial temperature T0 of the etching solution 3, a concentration threshold range and a temperature threshold range are set and stored in the control system 24. In this embodiment, the set concentration threshold range is 19.7%~20.3%, and the set temperature threshold range is 24.9°C~25.1°C. In other embodiments of the present invention, the concentration threshold range and temperature threshold range of the etching solution 3 can be determined according to the initial concentration C0, initial temperature T0 of the etching solution 3, and specific process requirements, and are not limited here.

[0081] Step 2: Place the glass workpiece 4, which has undergone ultrafast laser-induced modification, into the etching solution 3 within the reaction chamber 1 and secure it. Cover it with the sealing cap 2, and insert the probe end of the spectral probe 5 into the etching solution within the reaction chamber 1 through the sealing interface on the sealing cap 2. After the glass workpiece 4 is placed in the etching solution 3, chemical etching begins immediately. It is worth noting that the volume of the etching solution 3 within the reaction chamber 1 should ensure that its liquid level covers the surface of the glass workpiece 4.

[0082] Step 3: In-situ dynamic monitoring and inversion of the spectrum.

[0083] Based on Raman spectroscopy, the spectrometer host 9 is set to continuously acquire the real-time spectrum of the corrosive liquid 3 at a frequency of once every 30 seconds and transmit it to the control system 24. The control system 24 performs preprocessing on the acquired spectrum of the corrosive liquid 3, including noise reduction, baseline correction, and normalization, and analyzes the frequency shift information of the HF characteristic Raman peak of the preprocessed corrosive liquid 3 according to the chemometric quantitative model, thereby retrieving the real-time concentration C and real-time temperature T of the corrosive liquid 3.

[0084] Simultaneously, the corrosion depth of the modified area of ​​the glass workpiece 4 is detected in real time. Specifically, the ultrasonic thickness gauge host 19 controls the ultrasonic transmitting probe 17 to emit ultrasonic pulses to the glass workpiece 4 at a frequency of once every 30 seconds. The ultrasonic receiving probe 18 receives the ultrasonic echo signal and sends the ultrasonic echo signal to the ultrasonic thickness gauge host 19. The ultrasonic thickness gauge host 19 calculates the ultrasonic travel distance in the glass workpiece 4 and the corrosion depth of the modified area of ​​the glass workpiece 4 in real time based on the ultrasonic transmission and reception time difference and the propagation speed of the ultrasonic wave in the glass workpiece 4, and transmits the corrosion depth of the modified area of ​​the glass workpiece 4 to the control system 24 in real time.

[0085] Step 4: Dynamic closed-loop compensation control.

[0086] First, the control system 24 determines in real time whether the glass workpiece 4 has reached the corrosion endpoint based on the corrosion depth of the modified area. When the corrosion depth of the modified area of ​​the glass workpiece 4 reaches the preset depth, it indicates that the glass workpiece 4 has reached the corrosion endpoint; otherwise, it indicates that the glass workpiece 4 has not reached the corrosion endpoint. Then, the control system 24 performs dynamic closed-loop compensation for concentration and dynamic closed-loop compensation for temperature based on the real-time concentration C and real-time temperature T of the etching solution 3. The specific processing flow is as follows:

[0087] A. If glass workpiece 4 reaches the corrosion endpoint, proceed directly to step 5.

[0088] B. If the glass workpiece 4 has not reached the corrosion endpoint, the real-time concentration C of the etchant 3 is not less than the minimum value of the concentration threshold range, and the real-time temperature T of the etchant 3 does not exceed the temperature threshold range, then return to step 3.

[0089] C. If the glass workpiece 4 has not reached the corrosion endpoint, the real-time concentration C of the etchant 3 is less than the minimum value of the concentration threshold range, and the real-time temperature T of the etchant 3 has not exceeded the temperature threshold range, then the control system 24 controls the precision metering pump 11 to start, pumping the 50% concentration hydrofluoric acid solution in the storage tank 10 into the reaction chamber 1 through the etchant injection port 12 until the concentration of the etchant 3 stabilizes within the concentration threshold range, and then returns to step 3.

[0090] D. If the glass workpiece 4 has not reached the corrosion endpoint, and the real-time concentration C of the etching solution 3 is not less than the minimum value of the concentration threshold range, but the real-time temperature T of the etching solution 3 exceeds the temperature threshold range, then the etching solution 3 is heated or cooled until the real-time temperature T of the etching solution 3 stabilizes within the temperature threshold range, and then the process returns to step 3. Specifically, if the real-time temperature T of the etching solution 3 is greater than the maximum value of the temperature threshold range, such as when it rises to 25.3°C, the control system 24 drives the constant temperature water bath system 14 to inject coolant into the jacket 13 through PID control until the real-time temperature T of the etching solution 3 quickly drops and stabilizes within the temperature threshold range; if the real-time temperature T of the etching solution 3 is less than the minimum value of the temperature threshold range, the control system 24 controls the constant temperature water bath system 14 to inject heating liquid into the jacket 13 until the real-time temperature T of the etching solution 3 stabilizes within the temperature threshold range.

[0091] E. If the glass workpiece 4 has not reached the corrosion endpoint, the real-time concentration C of the etching solution 3 is less than the minimum value of the concentration threshold range, and the real-time temperature T of the etching solution 3 exceeds the temperature threshold range, then the control system 24 controls the precision metering pump 11 to start, pumping the 50% concentration hydrofluoric acid solution in the storage tank 10 into the reaction chamber 1 through the etching solution injection port 12 until the concentration of the etching solution 3 stabilizes within the concentration threshold range. At the same time, the control system 24 drives the constant temperature water bath system 14 to inject coolant or heating liquid into the jacket 13 through PID control to cool or heat the etching solution 3 until the real-time temperature T of the etching solution 3 stabilizes within the temperature threshold range, and then returns to step 3.

[0092] During the process of adding a higher concentration of etching solution C0 to etching solution 3 until the real-time concentration C of etching solution 3 stabilizes within the concentration threshold range, and heating or cooling etching solution 3 until the real-time temperature T of etching solution 3 stabilizes within the temperature threshold range, the process of continuously judging whether the glass workpiece 4 has reached the etching endpoint does not stop. If it is judged that the glass workpiece 4 has reached the etching endpoint, step 5 is executed directly.

[0093] Step 5: Complete the dynamic monitoring and compensation of chemical corrosion of the glass workpiece 4 after ultrafast laser induction.

[0094] When the glass workpiece 4 reaches the corrosion endpoint, the control system 24 immediately shuts down all monitoring and compensation systems and controls the opening of the corrosion liquid drain valve 20 and the water bath drain valve 16, allowing the corrosion liquid in the reaction chamber 1 and the liquid in the jacket 13 to be discharged into the waste liquid collection tank 23, thereby stopping the chemical corrosion of the glass workpiece 4. After the corrosion liquid in the reaction chamber 1 is emptied, the corroded glass workpiece 4 is removed. At this time, the cleaning liquid storage system 21 starts the cleaning program, pumping the cleaning liquid in the cleaning liquid storage system 21 into the reaction chamber 1 through the cleaning liquid injection port 22 to clean the reaction chamber 1. The waste liquid after cleaning is discharged into the waste liquid collection tank 23 through the corrosion liquid drain valve 20, thus completing the dynamic monitoring and compensation of the chemical corrosion of the glass workpiece 4 after ultrafast laser induction.

[0095] The fused silica glass workpieces subjected to chemical corrosion using the ultrafast laser-induced dynamic monitoring and compensation method of this invention were inspected. The results showed that the microchannel structure was intact, the dimensions were uniform, and there were no under-corrosion or over-corrosion phenomena, with high batch repeatability. Simultaneously, the ultrasonic transmitting probe 17, the ultrasonic receiving probe 18, and the spectral probe 5 operated stably throughout the corrosion process without any corrosion damage, verifying the reliability and superiority of the spectral measurement technology in this highly corrosive environment.

[0096] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the present invention.

Claims

1. A method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser, characterized in that, Includes the following steps: Step 1: Collect the initial spectrum of the corrosive liquid (3), and invert the initial spectrum of the corrosive liquid (3) using a chemometric quantitative model to obtain the initial concentration C0 and initial temperature T0 of the corrosive liquid (3); Based on the initial concentration C0 and initial temperature T0 of the corrosive liquid (3), set the concentration threshold range and temperature threshold range; The chemometric quantitative model is obtained by correlation modeling of standard spectral samples of corrosive liquids with different concentrations and temperatures. Step 2: Place the glass workpiece (4) modified by ultrafast laser into the etching solution (3); Step 3: Collect the real-time spectrum of the etching solution (3), and invert the real-time spectrum of the etching solution (3) according to the chemometric quantitative model to obtain the real-time concentration C and real-time temperature T of the etching solution (3); at the same time, detect the corrosion depth of the modified area of ​​the glass workpiece (4) in real time. Step 4: In real time, determine whether the glass workpiece (4) has reached the corrosion endpoint, whether the real-time concentration C of the etchant (3) is less than the minimum value of the concentration threshold range, and whether the real-time temperature T of the etchant (3) exceeds the temperature threshold range, and perform the following processing based on the judgment results: A. If the glass workpiece (4) reaches the corrosion endpoint, then proceed directly to step 5; B. If the glass workpiece (4) has not reached the corrosion endpoint, the real-time concentration C of the etchant (3) is not less than the minimum value of the concentration threshold range, and the real-time temperature T of the etchant (3) does not exceed the temperature threshold range, then return to step 3. C. If the glass workpiece (4) has not reached the corrosion endpoint, the real-time concentration C of the etching solution (3) is less than the minimum value of the concentration threshold range, and the real-time temperature T of the etching solution (3) has not exceeded the temperature threshold range, then add etching solution higher than the initial concentration C0 to the etching solution (3) until the real-time concentration C of the etching solution (3) is stable within the concentration threshold range, and then return to step 3. D. If the glass workpiece (4) has not reached the corrosion endpoint, the real-time concentration C of the etchant (3) is not less than the minimum value of the concentration threshold range, and the real-time temperature T of the etchant (3) exceeds the temperature threshold range, then the etchant (3) is heated or cooled until the real-time temperature T of the etchant (3) stabilizes within the temperature threshold range, and then the process returns to step 3. E. If the glass workpiece (4) has not reached the corrosion endpoint, the real-time concentration C of the etching solution (3) is less than the minimum value of the concentration threshold range, and the real-time temperature T of the etching solution (3) exceeds the temperature threshold range, then add etching solution higher than the initial concentration C0 to the etching solution (3) until the real-time concentration C of the etching solution (3) is stable within the concentration threshold range. At the same time, heat or cool the etching solution (3) until the real-time temperature T of the etching solution (3) is stable within the temperature threshold range, and then return to step 3. In the process of adding a higher concentration of corrosive liquid than the initial concentration C0 to the corrosive liquid (3) until the real-time concentration C of the corrosive liquid (3) stabilizes within the concentration threshold range, and heating or cooling the corrosive liquid (3) until the real-time temperature T of the corrosive liquid (3) stabilizes within the temperature threshold range, the process of judging whether the glass workpiece (4) has reached the corrosion endpoint does not stop. If it is judged that the glass workpiece (4) has reached the corrosion endpoint, step 5 is executed directly. Step 5: Stop the chemical corrosion of the glass workpiece (4) and complete the dynamic monitoring and compensation of the chemical corrosion of the glass workpiece (4) after ultrafast laser induction.

2. The method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser according to claim 1, characterized in that: In step 1, partial least squares method is used to correlate the spectral information of the standard spectral sample of the corrosive liquid with its corresponding concentration and temperature parameters to obtain a chemometric quantitative model. In step 1, the initial spectrum of the corrosive liquid (3) is acquired based on Raman spectroscopy; In step 3, the real-time spectrum of the corrosive liquid (3) is collected using a preset frequency based on Raman spectroscopy.

3. The method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser according to claim 2, characterized in that: In step 1, the corrosive liquid (3) is a hydrofluoric acid solution; The concentration threshold range is 19.7% to 20.3%, and the temperature threshold range is 24.9°C to 25.1°C.

4. The method for dynamic monitoring and compensation of glass chemical corrosion induced by ultrafast laser according to any one of claims 1-3, characterized in that: In step 3, ultrasonic technology is used to detect the corrosion depth of the modified area of ​​the glass workpiece (4) in real time; In step 4, the corrosion depth of the modified area of ​​the glass workpiece (4) is used to determine whether the glass workpiece (4) has reached the corrosion endpoint, and the spectral data of the etching solution (3) and the amplitude of the ultrasonic echo signal are used for verification.

5. A dynamic monitoring and compensation device for ultrafast laser-induced chemical corrosion of glass, used to implement the dynamic monitoring and compensation method for ultrafast laser-induced chemical corrosion of glass as described in any one of claims 1-4, characterized in that: It includes a sealed cavity, a spectral measurement unit, a corrosion process measurement unit, a control system (24), and a dynamic compensation execution system; The sealed cavity includes a reaction cavity (1) and a sealing cover (2) disposed on the reaction cavity (1); both the reaction cavity (1) and the sealing cover (2) are made of corrosion-resistant materials; the reaction cavity (1) is used to hold the corrosive liquid (3) and the glass workpiece (4) modified by ultrafast laser; a jacket (13) is provided on the outside of the reaction cavity (1). The spectral measurement unit includes a spectral probe (5), an optical fiber (8), and a spectrometer host (9); the probe end of the spectral probe (5) is immersed in the corrosive liquid (3) to emit a laser to irradiate the corrosive liquid (3) and collect the scattered light signal in the corrosive liquid (3); the spectral probe (5) is connected to the spectrometer host (9) through the optical fiber (8) to transmit the scattered light signal collected by the spectral probe (5) to the spectrometer host (9); the spectrometer host (9) is used to analyze and process the collected scattered light signal to obtain the spectrum of the corrosive liquid (3); The corrosion process measurement unit is used to detect the corrosion depth of the modified area of ​​the glass workpiece (4) in real time; The dynamic compensation execution system includes a concentration compensation unit and a temperature compensation unit; The control system (24) stores a chemometric quantitative model. Its first input is connected to the output of the spectrometer host (9) and is used to invert the real-time spectrum of the corrosive liquid (3) according to the chemometric quantitative model to obtain the real-time concentration C and real-time temperature T of the corrosive liquid (3). The first output of the control system (24) is used to control the concentration compensation unit to replenish the reaction chamber (1) with a corrosive liquid higher than the initial concentration C0 when the real-time concentration C of the corrosive liquid (3) is less than the minimum value of the concentration threshold range. Its second output is used to control the temperature compensation unit to inject heating liquid or cooling liquid into the jacket (13) when the real-time temperature T of the corrosive liquid (3) exceeds the temperature threshold range. The second input of the control system (24) is connected to the output of the corrosion process measurement unit and is used to determine whether the corrosion endpoint of the glass workpiece (4) has been reached according to the corrosion depth of the modified area of ​​the glass workpiece (4).

6. The dynamic monitoring and compensation device for ultrafast laser-induced chemical corrosion of glass according to claim 5, characterized in that: The corrosion process measurement unit includes an ultrasonic transmitting probe (17), an ultrasonic receiving probe (18), and an ultrasonic thickness gauge main unit (19). The ends of the ultrasonic transmitting probe (17) and ultrasonic receiving probe (18) are covered with acid and alkali resistant corrosion material. The ultrasonic transmitting probe (17) and ultrasonic receiving probe (18) are coupled and installed on both sides of the side wall of the reaction chamber (1), and the ends of the probes extend into the interior of the reaction chamber (1) to align the ultrasonic transmitting probe (17) and ultrasonic receiving probe (18) with the modified area of ​​the glass workpiece (4) after ultrafast laser-induced modification. The ultrasonic transmitting probe (17) is used to emit ultrasonic pulses that penetrate the glass workpiece (4), and the ultrasonic receiving probe (18) is used to receive the ultrasonic echo signal of the glass workpiece (4). The ultrasonic thickness gauge host (19) is electrically connected to the ultrasonic transmitting probe (17) and the ultrasonic receiving probe (18) respectively. It is used to control the ultrasonic transmitting probe (17) to emit ultrasonic pulses and receive the ultrasonic echo signal sent by the ultrasonic receiving probe (18). Based on the ultrasonic transmission and reception time difference and the propagation speed of ultrasonic waves in the glass workpiece (4), the travel distance of ultrasonic waves in the glass workpiece (4) is calculated in real time, thereby obtaining the corrosion depth of the modified area of ​​the glass workpiece (4). The output end of the ultrasonic thickness gauge host (19) is used as the output end of the corrosion process measurement unit and is connected to the second input end of the control system (24).

7. The dynamic monitoring and compensation device for ultrafast laser-induced chemical corrosion of glass according to claim 5 or 6, characterized in that: The spectral probe (5) is an immersion fiber optic probe, and the shell material is PTFE, PFA or Hastelloy. The end of the spectral probe (5) is provided with a sapphire window (6), and the sapphire window (6) is provided with an optical fiber output port (7); the optical fiber output port (7) is used to emit laser light and irradiate the etching solution (3) after passing through the sapphire window (6); the detection end of the spectral probe (5) is used to collect the scattered light signal in the etching solution (3). The main unit of the spectrometer (9) is a Raman spectrometer, which is configured for multi-channel spectral acquisition.

8. The dynamic monitoring and compensation device for ultrafast laser-induced chemical corrosion of glass according to claim 7, characterized in that: The concentration compensation unit includes a storage tank (10) and a precision metering pump (11); the storage tank (10) contains a corrosive liquid with a concentration higher than the initial concentration C0, and a corrosive liquid injection port (12) is provided on the outer wall of the reaction chamber (1); the input end of the precision metering pump (11) is connected to the suction port of the storage tank (10), and its output end is connected to the corrosive liquid injection port (12). The first output terminal of the control system (24) is connected to the control signal port of the precision metering pump (11) and is used to control the precision metering pump (11) to pump the corrosive liquid in the storage tank (10) into the reaction chamber (1) through the corrosive liquid injection port (12) when the real-time concentration C of the corrosive liquid (3) is less than the minimum value of the concentration threshold range. The temperature compensation unit includes a constant temperature water bath system (14), and a water bath inlet (15) is provided on the outer wall of the jacket (13). The second output terminal of the control system (24) is connected to the control signal port of the constant temperature water bath system (14). When the real-time temperature T of the corrosive liquid (3) is greater than the maximum value of the temperature threshold range, the constant temperature water bath system (14) is controlled to pump coolant into the jacket (13) through the water bath inlet (15). When the real-time temperature T of the corrosive liquid (3) is less than the minimum value of the temperature threshold range, the constant temperature water bath system (14) is controlled to pump heating liquid into the jacket (13) through the water bath inlet (15).

9. The dynamic monitoring and compensation device for ultrafast laser-induced chemical corrosion of glass according to claim 8, characterized in that: The dynamic compensation execution system also includes a process control unit; The process control unit includes a cleaning fluid storage system (21), a corrosion fluid drain valve (20), a water bath drain valve (16), and a waste liquid collection tank (23). The cleaning fluid storage system (21) stores cleaning fluid, and a cleaning fluid injection port (22) is provided on the outer wall of the reaction chamber (1); the corrosion fluid drain valve (20) is located at the bottom of the reaction chamber (1) and extends to the outside of the jacket (13); the water bath drain valve (16) is located at the bottom of the jacket (13); The third and fourth output terminals of the control system (24) are respectively connected to the control ports of the corrosion liquid drain valve (20) and the water bath drain valve (16), and are used to control the corrosion liquid drain valve (20) and the water bath drain valve (16) to open when the corrosion endpoint of the glass workpiece (4) is reached, so that the corrosion liquid in the reaction chamber (1) and the liquid in the jacket (13) are discharged into the waste liquid collection tank (23); the fifth output terminal of the control system (24) is connected to the control signal port of the cleaning liquid storage system (21), and is used to control the cleaning liquid storage system (21) to pump the cleaning liquid into the reaction chamber (1) through the cleaning liquid injection port (22) after the corrosion liquid in the reaction chamber (1) is drained, so as to clean the reaction chamber (1), and the waste liquid after cleaning is discharged into the waste liquid collection tank (23) through the corrosion liquid drain valve (20).

10. The dynamic monitoring and compensation device for glass chemical corrosion induced by ultrafast laser according to claim 9, characterized in that: One-way valves are installed on the corrosion liquid injection port (12), water bath injection port (15), and cleaning liquid injection port (22), respectively.

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