Microstructure observation device and high-purity metal microstructure observation method

Abstract

The application provides a microstructure observation device and a high-purity metal microstructure observation method. The microstructure observation device comprises a light source assembly, a box assembly, a shooting assembly and a lifting assembly. The box assembly has an observation cavity inside. The observation cavity is used for accommodating a test object and an observation medium. The observation medium is a liquid, and the test object is located in the observation medium. The observation medium is used for at least suppressing the reflection of the upper surface of the test object for observation. The light source assembly is arranged above the opening of the observation cavity of the box assembly in a lifting manner. The light source assembly is used for providing a light source for the observation cavity and the test object. The shooting assembly is arranged below the light source assembly. The lifting assembly is arranged inside the observation cavity of the box assembly. Through the technical scheme provided by the application, the problem of imaging blur of crystal grains and crystal boundaries caused by bubbles, impurities and surface reflection in the prior art microstructure observation device for observing the microstructure of high-purity metal can be solved.

Description

Technical Field

[0001] This invention relates to the field of metallographic observation technology, and more specifically, to a microstructure observation device and a method for observing the microstructure of high-purity metals. Background Technology

[0002] Currently, high-purity metals (typically exceeding 99.999% purity) have crucial applications in semiconductors, integrated circuits, aerospace, and new energy fields due to their excellent physicochemical properties. Traditional methods for observing their microstructure primarily rely on metallographic sample preparation techniques, including cutting, polishing, chemical etching, and optical microscopy. This method utilizes the reaction of an etchant with trace impurity phases in the metal to create contrast differences between grain boundaries and defects, thereby achieving microstructural imaging under a microscope.

[0003] However, high-purity metals contain extremely low levels of impurities, making it difficult to form effective corrosion contrast. This results in blurred grain boundaries, indistinct grain outlines, and even the inability to reveal internal defects, severely impacting the reliability of observation results. Furthermore, due to the high surface smoothness of high-purity metals, specular reflection easily occurs during direct observation in air, further interfering with image quality. To overcome corrosion difficulties, operators often need to extend polishing time, try various corrosion reagents, and even replicate samples, which is not only time-consuming and material-intensive but also prone to introducing human defects or contamination due to improper operation, leading to poor repeatability of results.

[0004] Therefore, existing microstructure observation devices for observing the microstructure of high-purity metals suffer from blurred grain and grain boundary imaging due to bubbles, impurities, and surface reflections, which severely reduces the accuracy of observation and imaging of high-purity metals and urgently needs to be solved. Summary of the Invention

[0005] This invention provides a microstructure observation device and a method for observing the microstructure of high-purity metals, so as to at least solve the problem of blurred grain and grain boundary imaging caused by bubbles, impurities and surface reflection in existing microstructure observation devices for observing the microstructure of high-purity metals.

[0006] To address the aforementioned problems, according to one aspect of the present invention, a microscopic tissue observation device is provided, comprising: a light source assembly, a housing assembly, an imaging assembly, and a lifting assembly; the housing assembly has an observation cavity for accommodating a test object and an observation medium, the observation medium being a liquid, and the test object being located within the observation medium, the observation medium being used at least to suppress reflection from the upper surface of the test object used for observation; the light source assembly is vertically and flexibly disposed above the opening of the observation cavity of the housing assembly, and the light source assembly is used to provide a light source to the observation cavity and the test object; the imaging assembly is disposed below the light source assembly, and the imaging assembly is used to observe the test object located within the observation medium; the lifting assembly is disposed inside the observation cavity of the housing assembly, and the lifting assembly is used to carry the test object and move the test object up and down to adjust the distance between the test object and the imaging assembly.

[0007] Furthermore, the microstructure observation device also includes a purification component, which comprises a vibration structure and a purging structure; there are at least two vibration structures, which are spaced apart at the bottom of the observation chamber, and both vibration structures are used to apply vibration to the observation medium in the observation chamber to remove impurities and air bubbles from the surface of the object to be measured; the purging structure is disposed on the inner wall of the observation chamber and faces the upper surface of the object to be measured for observation; the purging structure is used to spray the observation medium onto the upper surface of the object to be measured to remove impurities and air bubbles from the upper surface.

[0008] Furthermore, the box assembly is a box-shaped structure with an open top, and the bottom of the observation chamber is a sloping structure with a low center and high sides, and the slope of the slope is not less than 5°; a drain port is set at the center of the bottom of the box assembly, which is connected to the observation chamber and is used to discharge the observation medium in the observation chamber; a liquid inlet is set on the outer side wall of the box assembly near the top, which is connected to the observation chamber and is used to discharge the observation medium into the observation chamber through the liquid inlet; a scale is set on the inner side wall of the observation chamber, which is used to display the liquid level of the observation medium and the height of the lifting component.

[0009] Furthermore, the lifting assembly includes a lifting platform, a lifting structure, and a buffer structure; one end of the lifting structure is fixedly installed at the bottom of the observation cavity, and the other end of the lifting structure is connected to the lifting platform. The lifting structure is used to drive the lifting platform to rise and fall; the lifting platform is used to carry the object to be measured and adjust the height of the object to be measured in the observation cavity so that the object to be measured is located in the observation medium; the surface of the lifting platform used to carry the object to be measured is provided with a grid scale, which is used to provide positioning marks when the object to be measured is placed on the lifting platform; the buffer structure includes a buffer plate and buffer wheels. The buffer plate is fixedly installed at the bottom of the housing assembly and is used to carry the housing assembly. There are at least four buffer wheels, four of which are respectively installed at the four corners of the bottom of the buffer plate. The buffer wheels are used to drive the buffer plate to move.

[0010] Furthermore, the light source assembly includes a shielding structure and an illumination structure; the shielding structure is suspended above the opening of the observation cavity, and is vertically adjustable on the upper part of the housing assembly, while the imaging component is centrally located at the bottom of the shielding structure. The shielding structure is used to block light from outside the observation cavity; there are at least two illumination structures, which are evenly spaced at the bottom of the shielding structure and are oriented towards the object under test; the illumination structures are used to provide a parallel light source to illuminate the object under test.

[0011] Furthermore, the imaging components include a coaxial light source and a camera; the camera is centrally located at the bottom of the obstruction structure, and observes the microstructure of the object under test through a telephoto objective lens; the coaxial light source is located at the front of the camera and faces the object under test; the coaxial light source is used to provide coaxial light to the camera.

[0012] Furthermore, the microstructure observation device also includes a control component and a cleaning component. The control component is electrically connected to the light source component, the imaging component, the lifting component, and the cleaning component, respectively. The control component is used to control the coordinated operation of the light source component, the imaging component, the lifting component, and the cleaning component. The control component also includes a display screen, which is used to display the microscopic image obtained from observing the object under test.

[0013] According to another aspect of the present invention, a method for observing the microstructure of high-purity metals is also provided. This method is applied to the aforementioned microstructure observation apparatus. The lifting assembly includes a lifting platform with a grid scale on its surface. The method includes an initial step, comprising: cutting the object to be measured into block-shaped, sheet-shaped, or strip-shaped structures with flush upper and lower surfaces; designating the upper surface of the object to be measured as the observation surface; performing precision milling on the observation surface to make it flat; and fixing the bottom surface of the object to be measured at a designated position on the lifting platform using the grid scale on the lifting platform, and positioning the object according to the grid scale.

[0014] Furthermore, the microstructure observation device also includes a control component and a purification component. The control component is used to control the coordinated operation of the light source component, the imaging component, the lifting component, and the purification component. The control component also includes a display screen, which is used to display the microscopic image obtained from observing the object under test. The purification component is used to remove impurities and bubbles attached to the surface of the object under test. The high-purity metal microstructure observation method also includes observation steps, which are as follows: adjust the height of the light source component relative to the housing component and turn on the light source component to provide light to the object under test; inject an appropriate amount of observation medium into the housing component; adjust the height of the object under test by controlling the lifting component, so that the object under test is completely immersed in the observation medium, and control that there is no reflective phenomenon that interferes with the observation under visual observation; control the purification component to remove impurities and bubbles attached to the surface under test; control the imaging component to select the imaging point for the object under test, magnify and focus the surface under test, and complete the observation of the surface under test by combining the microscopic image displayed on the display screen; record the height of the object under test in the observation chamber and the position coordinates on the surface of the lifting component to record the position of the object under test in this observation.

[0015] Furthermore, pure water is used as the observation medium, and the vertical distance between the surface of the pure water and the surface to be observed is greater than or equal to 1 mm and less than or equal to 50 mm.

[0016] The present invention provides a microscopic tissue observation device, comprising: a light source assembly, a housing assembly, an imaging assembly, and a lifting assembly; the housing assembly has an observation cavity inside, which is used to contain the object to be tested and an observation medium, the observation medium being a liquid, and the object to be tested being located within the observation medium, the observation medium being used at least to suppress reflection from the upper surface of the object to be tested used for observation; the light source assembly is vertically and flexibly disposed above the opening of the observation cavity of the housing assembly, and the light source assembly is used to provide a light source to the observation cavity and the object to be tested; the imaging assembly is disposed below the light source assembly, and the imaging assembly is used to observe the object to be tested located within the observation medium; the lifting assembly is disposed inside the observation cavity of the housing assembly, and the lifting assembly is used to carry the object to be tested and move the object to be tested up and down to adjust the distance between the object to be tested and the imaging assembly.

[0017] This invention provides a relatively sealed observation environment by using a liquid observation medium and placing the object under test within it. This effectively suppresses surface reflection, bubble interference, and impurity scattering problems encountered in traditional microscopy. Immersing the object under test in the observation medium not only reduces specular reflection from its surface but also minimizes interference from bubbles and impurities, ensuring uniform illumination of the object's surface and improving image contrast. The light source assembly is positioned above the opening of the enclosure assembly and can be raised and lowered, allowing for flexible adjustment of its position to provide stable and uniform supplementary illumination for the imaging assembly, avoiding image blurring caused by uneven illumination. The imaging assembly is located at the bottom of the light source assembly, directly facing the object under test within the observation medium, achieving unobstructed, high-resolution imaging. The raising and lowering assembly inside the enclosure assembly controls the vertical position of the object under test, facilitating focusing of the imaging assembly and ensuring clear imaging of the grain and grain boundary structures of the object. This invention achieves clear, stable, and repeatable observation of high-purity metal microstructures by completely immersing the object under test in the observation medium, combining an independently adjustable light source component, and a centered coaxial imaging component. The invention is simple in structure, low in cost, highly reliable, easy to assemble and maintain, and solves the problem of blurred grain and grain boundary imaging caused by bubbles, impurities, and surface reflections in existing microstructure observation devices for high-purity metals. It improves the observation and imaging accuracy of high-purity metals and is suitable for large-scale application. Attached Figure Description

[0018] The accompanying drawings, which form part of this application, are used to provide a further understanding of the invention. The illustrative embodiments of the invention and their descriptions are used to explain the invention and do not constitute an undue limitation of the invention. In the drawings:

[0019] Figure 1 A partial structural schematic diagram of the microscopic tissue observation device provided in an embodiment of the present invention is shown;

[0020] Figure 2 This diagram illustrates the object to be observed using the high-purity metal microstructure observation method provided in an embodiment of the present invention.

[0021] Figure 3 This diagram illustrates the imaging effect of observing the test object using the high-purity metal microstructure observation method of the present invention, as provided in an embodiment of the present invention.

[0022] Figure 4 The illustration shows a schematic diagram of the imaging effect of the test object observed without applying the high-purity metal microstructure observation method of the present invention, provided by an embodiment of the present invention.

[0023] The above figures include the following reference numerals:

[0024] 10. The object to be tested;

[0025] 20. Light source assembly; 21. Shielding structure; 22. Lighting structure;

[0026] 30. Shooting components;

[0027] 40. Box assembly; 41. Liquid inlet; 42. Liquid outlet; 43. Scale; 44. Observation chamber;

[0028] 50. Lifting assembly; 51. Lifting platform; 52. Lifting structure; 53. Buffer structure;

[0029] 60. Impurity removal components; 61. Vibration structure; 62. Purging structure;

[0030] 70. Control components. Detailed Implementation

[0031] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the present invention or its application or use. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0032] like Figures 1 to 4 As shown, an embodiment of the present invention provides a microscopic tissue observation device, including: a light source assembly 20, a housing assembly 40, an imaging assembly 30, and a lifting assembly 50; the housing assembly 40 has an observation cavity 44 inside, which is used to accommodate the object to be tested 10 and an observation medium, the observation medium being a liquid, and the object to be tested 10 being located within the observation medium, the observation medium being used at least to suppress reflection from the upper surface of the object to be tested 10 used for observation; the light source assembly 20 is vertically and vertically disposed above the opening of the observation cavity 44 of the housing assembly 40, and the light source assembly 20 is used to provide a light source for the observation cavity 44 and the object to be tested 10; the imaging assembly 30 is disposed below the light source assembly 20, and the imaging assembly 30 is used to observe the object to be tested 10 located within the observation medium; the lifting assembly 50 is disposed inside the observation cavity 44 of the housing assembly 40, and the lifting assembly 50 is used to carry the object to be tested 10 and move the object to be tested 10 up and down to adjust the distance between the object to be tested 10 and the imaging assembly 30.

[0033] This invention provides a relatively sealed observation environment by setting the observation medium as a liquid and placing the object under test 10 within the observation medium. This effectively suppresses surface reflection, bubble interference, and impurity scattering problems of the object under test 10 in traditional microscopic observation. Immersing the object under test 10 in the observation medium not only reduces specular reflection on the surface of the object under test 10 but also reduces interference from bubbles and impurities, ensuring uniform illumination of the surface of the object under test 10 and improving imaging contrast. The light source assembly 20 is positioned above the opening of the housing assembly 40 and can be raised and lowered. Its position can be flexibly adjusted according to observation needs, providing stable and uniform supplementary illumination for the imaging assembly 30 and avoiding image blurring caused by uneven illumination. The imaging assembly 30 is positioned at the bottom of the light source assembly 20, facing the object under test 10 within the observation medium, achieving unobstructed, high-resolution imaging. The lifting assembly 50 controls the vertical position of the object under test 10 inside the housing assembly 40, facilitating focusing of the imaging assembly 30 and ensuring clear imaging of the grain and grain boundary structures of the object under test 10. This invention achieves clear, stable, and repeatable observation of high-purity metal microstructures by completely immersing the test object 10 in the observation medium, combining an independently adjustable light source component 20 suspended in the air, and a centrally coaxial imaging component 30. The invention is simple in structure, low in cost, highly reliable, easy to assemble and maintain, and solves the problem of blurred grain and grain boundary imaging caused by bubbles, impurities, and surface reflections in existing microstructure observation devices for high-purity metals. It improves the observation and imaging accuracy of high-purity metals and is suitable for large-scale application.

[0034] like Figure 1 As shown, the microstructure observation device also includes a cleanup assembly 60, which includes a vibration structure 61 and a purging structure 62. There are at least two vibration structures 61, which are spaced apart at the bottom of the observation cavity 44. Both vibration structures 61 are used to apply vibration to the observation medium in the observation cavity 44 to remove impurities and air bubbles from the surface of the object to be tested 10. The purging structure 62 is disposed on the inner wall of the observation cavity 44 and faces the upper surface of the object to be tested 10 for observation. The purging structure 62 is used to spray the observation medium onto the upper surface of the object to be tested 10 to remove impurities and air bubbles from the upper surface.

[0035] At least two vibration structures 61 are provided and spaced apart at the bottom of the observation cavity 44. By applying high-frequency vibration to the observation medium, they effectively cause suspended bubbles in the observation medium to detach from the surface of the object to be tested 10 and float to the surface, while loosening impurity particles attached to the upper surface of the object to be tested 10, thus achieving preliminary impurity removal of the inside of the observation medium and the surface of the object to be tested 10. The purging structure 62 is set on the inner wall of the observation cavity 44 and faces the upper surface of the object to be tested 10 used for observation. By spraying the observation medium, it directly washes away the residual bubbles and impurities on the surface of the object to be tested 10, thus achieving supplementary cleaning of the areas not completely removed by the vibration structure 61. The vibration structure 61 and the purging structure 62 work together to form a secondary impurity removal of vibration and loosening combined with liquid rinsing, improving the removal efficiency of bubbles and impurities on the surface of the object to be tested 10. This solves the problem of blurred microstructure imaging caused by the inability to remove interference substances on the surface of the object to be tested 10 that may affect the observation effect, thereby improving the clarity and contrast of the grains and grain boundaries of the object to be tested 10 in the microscopic image.

[0036] like Figure 1 As shown, the box assembly 40 is a box-shaped structure with an open top. The bottom of the observation chamber 44 is a sloping structure with a low center and high sides, and the slope of the slope is not less than 5°. A drain port 42 is provided at the center of the bottom of the box assembly 40. The drain port 42 is connected to the observation chamber 44 and is used to discharge the observation medium in the observation chamber 44. A liquid inlet 41 is provided on the outer side wall of the box assembly 40 near the top. The liquid inlet 41 is connected to the observation chamber 44 and is used to discharge the observation medium into the observation chamber 44. A scale 43 is provided on the inner side wall of the observation chamber 44. The scale 43 is used to display the liquid level of the observation medium and the height of the lifting assembly 50.

[0037] The housing assembly 40 adopts a box-shaped structure with an open top. The observation chamber 44 formed inside is designed with a sloping structure at the bottom, lower in the center and higher around the edges, with a slope of not less than 5°. This allows the observation medium to naturally gather towards the center under gravity. Combined with the drain port 42 located at the center of the bottom of the housing assembly 40, this facilitates the rapid discharge of the observation medium. Simultaneously, the inlet 41 is located on the outer wall of the housing assembly 40 near the top, allowing the observation medium to be injected laterally into the observation chamber 44 from a higher position, avoiding direct impact on the surface of the object 10 and the introduction of air bubbles. This is further enhanced by the design of the inlet 41 on the inner wall of the observation chamber 44. The scale 43 can quantitatively display the liquid level of the observation medium and the vertical position of the lifting component 50, ensuring that the test object 10 is completely immersed in the observation medium and that there is no reflective interference on the upper surface. This ensures the consistency of immersion depth and repeatability of positioning during repeated observations. The above structures work together to achieve a unified system of uniform injection and convenient discharge of the observation medium and quantitative control of the observation position, based on the observation medium suppressing the reflection on the surface of the test object 10 and the lifting component 50 driving the test object 10 to rise and fall. This improves the imaging clarity and experimental repeatability of high-purity metal microstructure observation.

[0038] like Figure 1 As shown, the lifting assembly 50 includes a lifting platform 51, a lifting structure 52, and a buffer structure 53. One end of the lifting structure 52 is fixedly installed at the bottom of the observation chamber 44, and the other end of the lifting structure 52 is connected to the lifting platform 51. The lifting structure 52 is used to drive the lifting platform 51 to rise and fall. The lifting platform 51 is used to carry the object to be tested 10 and adjust the height of the object to be tested 10 in the observation chamber 44 so that the object to be tested 10 is located in the observation medium. The surface of the lifting platform 51 used to carry the object to be tested 10 is provided with a grid scale, which is used to provide positioning marks when the object to be tested 10 is placed on the lifting platform 51. The buffer structure 53 includes a buffer plate and buffer wheels. The buffer plate is fixedly installed at the bottom of the housing assembly 40 and is used to carry the housing assembly 40. There are at least four buffer wheels, of which four buffer wheels are respectively installed at the four corners of the bottom of the buffer plate and are used to drive the buffer plate to move.

[0039] The lifting platform 51, which supports the object 10 to be measured, has a grid scale on its surface. This grid scale provides a positioning reference for the object 10 to be measured on the lifting platform 51. Combined with the lifting structure 52 driving the lifting of the lifting platform 51, the height of the object 10 to be measured in the observation medium can be adjusted and repeatedly positioned, improving the consistency and reproducibility of the observation position. At the same time, the buffer structure 53 includes a buffer plate and at least four buffer wheels. The buffer plate is fixedly set at the bottom of the housing assembly 40, serving as the supporting foundation of the overall device. The four buffer wheels are respectively arranged at the four corners of the bottom of the buffer plate. They can effectively absorb and isolate external vibrations during the observation of the object 10 to be measured, preventing vibrations from being transmitted to the observation cavity 44. This ensures that the observation medium and the object 10 to be measured remain relatively stationary, thereby ensuring the stability and clarity of the imaging assembly 30 during high-magnification imaging. It also avoids blurring of grain and grain boundary imaging caused by displacement deviation or structural vibration, improving the accuracy and reliability of microstructure observation.

[0040] like Figure 1 As shown, the light source assembly 20 includes a shielding structure 21 and an illumination structure 22. The shielding structure 21 is suspended above the opening of the observation cavity 44 and is vertically adjustable on the upper part of the housing assembly 40. The imaging assembly 30 is centrally located at the bottom of the shielding structure 21. The shielding structure 21 is used to shield the light outside the observation cavity 44. There are at least two illumination structures 22, which are evenly spaced at the bottom of the shielding structure 21 and are oriented towards the object under test 10. The illumination structure 22 is used to provide a parallel light source to illuminate the object under test 10.

[0041] The light source assembly 20 includes a shielding structure 21 and an illumination structure 22. The shielding structure 21 is suspended above the opening of the observation cavity 44 and is vertically mounted on the upper part of the housing assembly 40. Its function is to effectively block light from outside the observation cavity 44 from entering the imaging area, thus preventing external light sources from interfering with the imaging of the imaging assembly 30. The imaging assembly 30 is centrally located at the bottom of the shielding structure 21, ensuring that its optical axis is aligned with the center of the observation cavity 44, thereby improving the stability and clarity of the imaging. At least two illumination structures 22 are evenly spaced on the shielding structure 21. The bottom of the light source 1 faces the object under test 10. By symmetrically arranging multiple points, a ring-shaped uniform illumination is formed, which ensures that the light illuminating the upper surface of the object under test 10 has good parallelism and directional consistency. This effectively suppresses the presence of bright spots and dark areas on the surface of the object under test 10 caused by uneven surface reflection, and enhances the imaging contrast of grains and grain boundaries. At the same time, the introduction of parallel light source reduces diffuse reflection interference. Combined with the suppression effect of the observation medium on the reflection of the upper surface, the microstructure details are clearly presented under high signal-to-noise ratio conditions, thereby achieving stable and high-resolution observation of the microstructure of high-purity metals.

[0042] In one specific embodiment of the present invention, the illumination structure 22 has a built-in standard illuminator that can generate a parallel light source to illuminate the sample and provides four standard configuration light sources: D65, TL84, F, and UV, to simulate average sunlight, fluorescent lamp, colorimetric reference, and ultraviolet light source, so as to be applied to the surface state and tissue morphology of different test objects 10.

[0043] like Figure 1 As shown, the imaging component 30 includes a coaxial light source and a camera; the camera is centrally located at the bottom of the shielding structure 21, and the camera observes the microstructure of the object under test 10 through a telephoto objective lens; the coaxial light source is located at the front of the camera and faces the object under test 10; the coaxial light source is used to provide coaxial light to the camera.

[0044] The imaging assembly 30 includes a coaxial light source and a camera. The camera is centrally located at the bottom of the shielding structure 21 and uses a telephoto objective to observe the microstructure of the object 10 located in the observation medium. The coaxial light source is located at the front of the camera and faces the object 10, providing the camera with illumination light that is collinear with the optical axis. This structure allows the illumination light to be incident perpendicularly to the surface of the object 10 along the objective lens optical path, and the reflected light returns to the camera along the original optical path, effectively eliminating the interference of shadows, scattering and surface reflection caused by oblique incident light, and improving the imaging contrast and grain boundary clarity of the microstructure. At the same time, the shielding structure 21 is suspended above the opening of the observation cavity 44, isolating external stray light. Combined with the suppression effect of the observation medium on surface reflection, it further ensures the stability of the imaging environment, so that the grain and grain boundary structure of high-purity metal in the observation medium can be clearly captured at high resolution.

[0045] In one specific embodiment of the present invention, the camera is a CCD camera. The CCD camera can transmit the acquired graphic data information to the control component 70 in real time. The CCD camera can also realize the functions of finding the object to be measured 10, shooting from multiple angles (0° to 120°), selecting local areas, magnifying (0 to 10X), and focusing.

[0046] like Figure 1 As shown, the microstructure observation device also includes a control component 70 and a cleaning component 60. The control component 70 is electrically connected to the light source component 20, the imaging component 30, the lifting component 50, and the cleaning component 60, respectively. The control component 70 is used to control the coordinated operation of the light source component 20, the imaging component 30, the lifting component 50, and the cleaning component 60. The control component 70 also includes a display screen, which is used to display the microscopic image obtained from observing the object 10.

[0047] The control component 70 is electrically connected to the light source component 20, the imaging component 30, the lifting component 50, and the impurity removal component 60, enabling coordinated control of each component. The impurity removal component 60 can directly act on the liquid medium and the surface of the object 10 in the observation cavity 44, effectively removing attached bubbles and impurities to avoid optical interference to imaging. At the same time, the light source component 20 provides stable and uniform illumination, the imaging component 30 acquires microscopic images of the surface of the object 10 in real time, the lifting component 50 adjusts the distance between the object 10 and the imaging component 30 to obtain the optimal focal length, and the control component 70 integrates the above actions and drives them synchronously to ensure the stability and repeatability of the observation process. Its display screen presents high-definition microscopic images in real time, allowing operators to observe the clear structure of grains and grain boundaries in real time, thereby solving the imaging blurring problem caused by bubbles, impurities, and surface reflection, and improving the accuracy and efficiency of high-purity metal microstructure observation.

[0048] The present invention also provides a method for observing the microstructure of high-purity metals. The method is applied to the microstructure observation device described above. The lifting assembly 50 includes a lifting platform 51, and the surface of the lifting platform 51 is provided with a grid scale. The method for observing the microstructure of high-purity metals includes an initial step, which includes: cutting the object to be tested 10 into a block, sheet, or strip structure with flat upper and lower surfaces, and setting the upper surface of the object to be tested 10 as the observation surface; performing precision milling on the observation surface to make it flat; fixing the bottom surface of the object to be tested 10 at a designated position on the lifting platform 51 with reference to the grid scale on the surface of the lifting platform 51, and positioning the object to be tested 10 according to the grid scale.

[0049] The high-purity metal microstructure observation method sets the upper surface of the test object 10 as the observation surface and ensures its flatness through precision milling. Then, based on the grid scale set on the surface of the lifting platform 51, the bottom surface of the test object 10 is positioned and fixed on the lifting component 50. This ensures that the relative position of the observation surface of the test object 10 with respect to the imaging component 30 and the light source component 20 is repeatable during the subsequent immersion in the observation medium and observation process. Combined with the suppression effect of the observation medium inside the box component 40 on the surface reflection of the test object 10, the microstructure features can still be clearly imaged through light refraction and dispersion effects under non-corrosive conditions. This improves the consistency of observation positioning and the comparability of results, and is especially suitable for multi-point repeated observation and standardized analysis of large-size high-purity metal samples.

[0050] like Figure 1 and Figure 2 As shown, the microstructure observation device also includes a control component 70 and a purification component 60. The control component 70 is used to control the coordinated operation of the light source component 20, the imaging component 30, the lifting component 50, and the purification component 60. The control component 70 also includes a display screen, which is used to display the microscopic image obtained from the observation of the object 10. The purification component 60 is used to remove impurities and bubbles attached to the surface of the object 10 to be observed. The high-purity metal microstructure observation method also includes observation steps, which are as follows: adjusting the height of the light source component 20 relative to the housing component 40 and turning on the light source component 20 to provide a light source for the object 10; and providing light to the housing component 40. An appropriate amount of observation medium is injected into the cavity; the height of the object to be measured 10 is adjusted by controlling the lifting component 50 so that the object to be measured 10 is completely immersed in the observation medium, and the surface to be observed is controlled to be free of reflective phenomena that would interfere with the observation under visual observation; the impurity removal component 60 is controlled to remove impurities and air bubbles attached to the surface to be observed; the imaging component 30 is controlled to select the imaging point, magnify and focus the surface to be observed, and combine the microscopic image displayed on the screen to complete the observation of the surface to be observed; the height of the object to be measured 10 in the observation cavity 44 and the position coordinates on the surface of the lifting component 50 are recorded to record the position of the object to be measured 10 in this observation.

[0051] The microscopic tissue observation device also includes a control component 70 and a purification component 60. The control component 70 is electrically connected to the light source component 20, the imaging component 30, the lifting component 50, and the purification component 60, enabling the coordinated operation of multiple components. The display screen of the control component 70 can display the microscopic image of the object 10 acquired by the imaging component 30 in real time, allowing the operator to adjust the observation parameters immediately according to the image quality. The purification component 60 acts on the surface of the object 10 to be observed, removing impurities and air bubbles adhering to the surface of the object 10 through vibration or purging, eliminating the light path obstructed by bubble refraction and impurity scattering. Interference is eliminated, thereby improving the imaging clarity of grains and grain boundaries. During the observation process, the lifting component 50 immerses the object under test 10 in the observation medium. Subsequently, the impurity removal component 60 starts the impurity removal process. Under the instruction of the control component 70, the imaging component 30 selects an appropriate shooting point, completes magnification and focusing, and projects the imaging results onto the display screen simultaneously. This not only avoids the inefficiency and unreliable results caused by traditional manual repeated adjustments, but also records the observation position of the object under test 10 through the grid scale and the position coordinates of the lifting component 50 surface, ensuring the stability and repeatability of high-purity metal microstructure observation.

[0052] like Figure 1 As shown, the observation medium is pure water, and the vertical distance between the surface of the pure water and the surface to be observed is greater than or equal to 1 mm and less than or equal to 50 mm.

[0053] The observation medium is pure water, and the vertical distance between the pure water surface and the surface to be observed is limited to greater than or equal to 1 mm and less than or equal to 50 mm. This distance range is set in conjunction with the light emitted by the light source component 20, the imaging path of the imaging component 30, and the removal of bubbles and impurities by the impurity removal component 60. This allows the light to undergo controllable secondary refraction and primary reflection at the air-pure water interface, effectively avoiding total internal reflection interference caused by too close a distance or scattering attenuation and dispersion effects caused by too far a distance. This avoids the blurring of grain and grain boundary imaging caused by reflection and optical path distortion on the surface to be observed. At the same time, the grid scale on the surface of the lifting platform 51 is used to position the object to be measured 10, ensuring that the surface to be observed is completely immersed in pure water and in a stable observation state. This allows the operator to focus and select points based on the real-time feedback of the microscopic image on the display screen, ultimately achieving clear, stable, and repeatable observation of high-purity metal microstructures.

[0054] The working process and principle of a specific embodiment of the present invention will now be described in detail as follows:

[0055] First, the sample 10 is pre-treated: the 5N high-purity aluminum ingot is cut into a cylindrical structure with flat upper and lower surfaces, a thickness of 5cm, and a diameter of 10cm for the observation surface; the observation surface is precision milled to ensure flatness and cleanliness; the bottom surface of the high-purity aluminum ingot sample is attached to an appropriate position on the lifting platform 51.

[0056] Next, observation and shooting operations are performed: the external power supply is turned on, the obstruction structure 21 is lowered, and the D65 light source of the illumination structure 22 is turned on; pure water is injected into the observation chamber 44 through the liquid inlet 41 until the liquid level is 30cm; the lifting platform 51 is controlled to completely immerse the high-purity aluminum ingot in the pure water, and the distance between the pure water surface and the observation surface of the high-purity aluminum ingot is 10mm, and there is no reflection on the observation surface of the high-purity aluminum ingot under visual observation; the impurity removal component 60 is turned on to remove impurities and bubbles attached to the pure water and the observation surface of the high-purity aluminum ingot, including using the vibration structure 61 to remove excess bubbles in the water and the blowing structure to remove impurities and bubbles that may be attached to the observation surface; the shooting component 30 is turned on, and the real-time operation of the CCD camera and the display screen of the control component 70 is used to select, magnify, focus, and shoot the observation point of the observation surface of the high-purity aluminum ingot.

[0057] Finally, perform positioning and shutdown operations: use the scale 43 and the grid scale on the surface of the lifting platform 51 to record the position of the high-purity aluminum sample; sequentially control and shut down the imaging component 30, the impurity removal component 60, and the illumination structure 22; drain the pure water in the observation chamber 44 through the drain port 42; raise the shielding structure 21; remove the high-purity aluminum sample; turn off the external control power supply; and end the observation.

[0058] like Figure 3 The image shows the microstructure of a high-purity aluminum sample taken using the microstructure observation device and high-purity metal microstructure observation method of this invention. It can be seen that the microstructure captured using the technical solution of this invention has clear grains, distinct grain boundaries, and significant internal defects. Furthermore, by utilizing the refraction, reflection, and dispersion of light in air and pure water, grains with different orientations exhibit various contrasts and color differences, facilitating observation and analysis. These results demonstrate that the microstructure observation device and high-purity metal microstructure observation method provided by this invention have excellent application effects.

[0059] As a comparative example of the above embodiments:

[0060] The comparative example provides a sample imaging process and results without using the microstructure observation device and high-purity metal microstructure observation method of the present invention, to illustrate the comparative effect of using the microstructure observation device and high-purity metal microstructure observation method of the present invention.

[0061] The specific method for observing the microstructure of high-purity metals in comparative studies is as follows:

[0062] First, the object to be tested is pre-treated: the 5N high-purity aluminum ingot is cut into a cylindrical structure with flat upper and lower surfaces, a thickness of 5cm, and a diameter of 10cm for the observation surface; the observation surface is then precision milled to ensure the flatness and cleanliness of the observation surface.

[0063] Next, observation and imaging operations were carried out: the high-purity aluminum sample was placed in an industrial color matching light box and the D65 light source was turned on; the same CCD camera as the microstructure observation device of this invention was used to select the site of observation, magnify, focus and shoot the image.

[0064] Finally, as Figure 4 The above describes the microstructure of the high-purity aluminum sample to be observed, as captured in comparative photographs. It can be seen that the microstructure photographed in this embodiment has unclear grains, blurred grain boundaries, and no defects. The observation and photographing effects are poor and not conducive to reflecting the true material structure.

[0065] In summary, this invention provides a microstructure observation device and a method for observing the microstructure of high-purity metals. The microstructure observation device uses a liquid observation medium, with the sample 10 located within it, providing a relatively sealed observation environment. This effectively suppresses surface reflection, bubble interference, and impurity scattering problems associated with traditional microscopy. Immersing the sample 10 in the observation medium not only reduces specular reflection from its surface but also minimizes interference from bubbles and impurities, ensuring uniform illumination of the sample 10 surface and improving image contrast. The light source assembly 20 is positioned above the opening of the housing assembly 40 and can be raised and lowered, allowing for flexible adjustment of its position to provide stable and uniform supplementary illumination for the imaging assembly 30, avoiding image blurring caused by uneven illumination. The imaging assembly 30 is located at the bottom of the light source assembly 20, directly facing the sample 10 within the observation medium, achieving unobstructed, high-resolution imaging. The lifting component 50 controls the vertical position of the object under test 10 inside the housing component 40, facilitating focusing of the imaging component 30 and ensuring clear imaging of the grain and grain boundary structures of the object under test 10. This invention achieves clear, stable, and repeatable observation of high-purity metal microstructures by completely immersing the object under test 10 in the observation medium, combined with the height-adjustable light source component 20 and the centered coaxial observation of the imaging component 30. This invention has a simple structure, low cost, high reliability, and is easy to assemble and maintain. It solves the problem of blurred grain and grain boundary imaging caused by bubbles, impurities, and surface reflections in existing microstructure observation devices for high-purity metals, improving the observation and imaging accuracy of high-purity metals and making it suitable for large-scale application.

[0066] The technical features of the embodiments described above can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as the combination of these technical features does not contradict each other, it should be considered to be within the scope of this specification.

[0067] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0068] Unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps set forth in these embodiments do not limit the scope of the invention. It should also be understood that, for ease of description, the dimensions of the various parts shown in the drawings are not drawn to actual scale. Techniques, methods, and devices known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and devices should be considered part of the specification. In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters in the following drawings denote similar items; therefore, once an item is defined in one drawing, it need not be further discussed in subsequent drawings.

[0069] In the description of this invention, it should be understood that the orientation or positional relationship indicated by directional terms such as "front, back, up, down, left, right", "horizontal, vertical, horizontal" and "top, bottom" is generally based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing this invention and simplifying the description. Unless otherwise stated, these directional terms do not indicate or imply that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the scope of protection of this invention; the directional terms "inner" and "outer" refer to the inner and outer contours relative to the outline of each component itself.

[0070] For ease of description, spatial relative terms such as "above," "on top of," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation beyond the orientation of the device as described in the figures. For example, if the device in the figures were inverted, a device described as "above" or "on top of" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein will be interpreted accordingly.

[0071] Furthermore, it should be noted that the use of terms such as "first" and "second" to define components is merely for the purpose of distinguishing the corresponding components. Unless otherwise stated, the above terms have no special meaning and therefore should not be construed as limiting the scope of protection of this invention.

[0072] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A microscopic tissue observation device, characterized in that, include: The package includes a light source assembly (20), a housing assembly (40), an imaging assembly (30), and a lifting assembly (50). The housing assembly (40) has an observation cavity (44) inside, which is used to contain the object to be tested (10) and an observation medium. The observation medium is a liquid, and the object to be tested (10) is located within the observation medium. The observation medium is used to suppress reflections from the upper surface of the object to be tested (10) for observation. The light source assembly (20) is vertically and vertically positioned above the opening of the observation cavity (44) of the housing assembly (40). The component (20) is used to provide a light source for the observation cavity (44) and the object under test (10); the imaging component (30) is disposed below the light source component (20), and the imaging component (30) is used to observe the object under test (10) located in the observation medium; the lifting component (50) is disposed inside the observation cavity (44) of the housing component (40), and the lifting component (50) is used to carry the object under test (10) and drive the object under test (10) to rise and fall, so as to adjust the distance between the object under test (10) and the imaging component (30).

2. The microscopic tissue observation device according to claim 1, characterized in that, The microscopic tissue observation device further includes a cleanup component (60), which includes a vibration structure (61) and a purging structure (62). There are at least two vibration structures (61), which are spaced apart at the bottom of the observation cavity (44). Both vibration structures (61) are used to apply vibration to the observation medium in the observation cavity (44) to remove impurities and bubbles from the surface of the object to be tested (10). The purging structure (62) is disposed on the inner wall of the observation cavity (44) and faces the upper surface of the object to be tested (10) for observation. The purging structure (62) is used to spray the observation medium onto the upper surface of the object to be tested (10) to remove impurities and bubbles from the upper surface.

3. The microscopic tissue observation device according to claim 1, characterized in that, The box assembly (40) is a box-shaped structure with an open top. The bottom of the observation chamber (44) is a sloping structure with a low center and high sides, and the slope of the sloping structure is not less than 5°. A drain port (42) is provided at the center of the bottom of the box assembly (40). The drain port (42) is connected to the observation chamber (44) and is used to discharge the observation medium in the observation chamber (44). An inlet port (41) is provided on the outer side wall of the box assembly (40) near the top. The inlet port (41) is connected to the observation chamber (44) and is used to discharge the observation medium in the observation chamber (44) through the inlet port (41). A scale (43) is provided on the inner side wall of the observation chamber (44). The scale (43) is used to display the liquid level of the observation medium and the height of the lifting assembly (50).

4. The microscopic tissue observation device according to claim 1, characterized in that, The lifting assembly (50) includes a lifting platform (51), a lifting structure (52), and a buffer structure (53); one end of the lifting structure (52) is fixedly disposed at the bottom of the observation cavity (44), and the other end of the lifting structure (52) is connected to the lifting platform (51). The lifting structure (52) is used to drive the lifting platform (51) to lift; the lifting platform (51) is used to carry the object to be tested (10) and adjust the height of the object to be tested (10) in the observation cavity (44) so ​​that the object to be tested (10) is located in the observation cavity (44). The lifting platform (51) is used to support the object to be tested (10) and has a grid scale on its surface. The grid scale is used to provide positioning marks when the object to be tested (10) is placed on the lifting platform (51). The buffer structure (53) includes a buffer plate and buffer wheels. The buffer plate is fixedly set at the bottom of the box assembly (40) and is used to support the box assembly (40). There are at least four buffer wheels, which are respectively set at the four corners of the bottom of the buffer plate. The buffer wheels are used to drive the buffer plate to move.

5. The microscopic tissue observation device according to claim 1, characterized in that, The light source assembly (20) includes a shielding structure (21) and an illumination structure (22); the shielding structure (21) is suspended above the opening of the observation cavity (44), and the shielding structure (21) is vertically and vertically mounted on the upper part of the housing assembly (40). The imaging assembly (30) is centrally located at the bottom of the shielding structure (21), and the shielding structure (21) is used to shield the light outside the observation cavity (44); there are at least two illumination structures (22), and at least two illumination structures (22) are evenly spaced at the bottom of the shielding structure (21), and the illumination structures (22) are positioned facing the object to be tested (10); the illumination structure (22) is used to provide a parallel light source to illuminate the object to be tested (10).

6. The microscopic tissue observation device according to claim 5, characterized in that, The imaging assembly (30) includes a coaxial light source and a camera; the camera is centrally located at the bottom of the shielding structure (21), and the camera observes the microstructure of the object under test (10) through a telephoto objective lens; the coaxial light source is located at the front end of the camera and faces the object under test (10); the coaxial light source is used to provide coaxial light to the camera.

7. The microscopic tissue observation device according to claim 1, characterized in that, The microscopic tissue observation device further includes a control component (70) and a cleaning component (60). The control component (70) is electrically connected to the light source component (20), the imaging component (30), the lifting component (50), and the cleaning component (60), respectively. The control component (70) is used to control the cooperative operation of the light source component (20), the imaging component (30), the lifting component (50), and the cleaning component (60). The control component (70) also includes a display screen, which is used to display the microscopic image obtained from observing the object under test (10).

8. A method for observing the microstructure of high-purity metals, characterized in that, The high-purity metal microstructure observation method is applied to the microstructure observation device according to any one of claims 1 to 7, wherein the lifting assembly (50) includes a lifting platform (51), and the surface of the lifting platform (51) is provided with a grid scale; the high-purity metal microstructure observation method includes an initial step, the initial step including: The object to be tested (10) is cut into a block, sheet or strip structure with the upper and lower surfaces flush, and the upper surface of the object to be tested (10) is set as the observation surface; The surface to be observed is precision milled to make it flat. Referring to the grid scale on the surface of the lifting platform (51), the bottom surface of the object to be tested (10) is fixed at the designated position of the lifting platform (51), and the object to be tested (10) is positioned according to the grid scale.

9. The method for observing the microstructure of high-purity metals according to claim 8, characterized in that, The microstructure observation device further includes a control component (70) and a purification component (60). The control component (70) is used to control the light source component (20), the imaging component (30), the lifting component (50), and the purification component (60) to work together. The control component (70) also includes a display screen, which is used to display the microscopic image obtained by observing the test object (10). The purification component (60) is used to remove impurities and bubbles attached to the surface of the test object (10) to be observed. The high-purity metal microstructure observation method further includes an observation step, which is as follows: Adjust the height of the light source assembly (20) relative to the housing assembly (40), and turn on the light source assembly (20) to provide a light source for the object under test (10); Inject an appropriate amount of the observation medium into the housing assembly (40); By controlling the lifting component (50) to adjust the height of the object to be measured (10), the object to be measured (10) is completely immersed in the observation medium, and the surface to be observed is controlled to be free of reflective phenomena that interfere with the observation under visual observation. The impurity removal component (60) is controlled to remove impurities and bubbles attached to the surface to be observed; Control the shooting component (30) to select the shooting point, magnify and focus the surface to be observed for the object to be tested (10), and complete the observation of the surface to be observed by combining the microscopic image displayed on the display screen. Record the height of the object under test (10) in the observation cavity (44) and the position coordinates on the surface of the lifting assembly (50) to record the position of the object under test (10) in this observation.

10. The method for observing the microstructure of high-purity metals according to claim 9, characterized in that, The observation medium is pure water, and the vertical distance between the liquid surface of the pure water and the surface to be observed is greater than or equal to 1 mm and less than or equal to 50 mm.

Images