Spacer, method for manufacturing the same, and liquid crystal display panel

Abstract

The present disclosure provides a spacer, a preparation method thereof and a liquid crystal display panel, the spacer comprising a first spacer part and a second spacer part, the first spacer part being in a strip shape extending along a first direction, and the second spacer part being in a strip shape extending along a second direction; wherein a surface of the first spacer part facing the second spacer part is provided with a first arc-shaped recess, and a surface of the second spacer part facing the first spacer part is provided with a first arc-shaped protrusion, the two being in a concave-convex matching structure; or a surface of the first spacer part facing the second spacer part is provided with a first groove, and a surface of the second spacer part facing the first spacer part is provided with a second groove, in a cross section perpendicular to the second direction, a groove wall of the first groove is in an inwardly recessed arc-shaped curve, in a cross section perpendicular to the first direction, a groove wall of the second groove is in an inwardly recessed arc-shaped curve, and the arc-shaped wall surface of the first groove and the arc-shaped wall surface of the second groove abut in an overlapping area.

Description

Technical Field

[0001] This disclosure relates to the field of liquid crystal display technology. More specifically, it relates to a spacer material and its preparation method, and a liquid crystal display panel. Background Technology

[0002] A liquid crystal display (LCD) panel typically includes two substrates arranged opposite each other and a liquid crystal layer sandwiched between the two substrates. To maintain uniform cell thickness between the two substrates, a photo spacer (PS) is usually placed between them. Existing photo spacers are mostly cylindrical or prismatic in shape, with one end fixed to one substrate and the other end abutting against the opposite substrate. They absorb external impacts and maintain cell thickness stability through their own compressive elastic deformation.

[0003] However, existing cylindrical spacer solutions are prone to problems such as spot defects and uneven display brightness when the LCD panel is subjected to external pressure during transportation, touch pressing, or assembly. Summary of the Invention

[0004] The purpose of this disclosure is to provide a spacer material and a method for preparing the same, as well as a liquid crystal display panel, to solve at least one of the above-mentioned technical problems.

[0005] To achieve the above objectives, the present disclosure adopts the following technical solution: This disclosure provides a spacer disposed between a first substrate and a second substrate of a liquid crystal display panel. The spacer includes a first spacer portion disposed on the first substrate and a second spacer portion disposed on the second substrate. The first spacer portion is an elongated strip extending along a first direction, and the second spacer portion is an elongated strip extending along a second direction. The first direction is perpendicular to the second direction. The orthographic projections of the first spacer portion and the second spacer portion in a first plane overlap. The first plane is a plane parallel to the first substrate. Within the overlapping area, the surface of the first spacer portion facing the second spacer portion is provided with a first arc-shaped recess, and the surface of the second spacer portion facing the first spacer portion is provided with a first arc-shaped protrusion. The first arc-shaped recess and the first arc-shaped protrusion form a concave-convex mating structure; or The first septum portion has a first groove on its surface facing the second septum portion, and the second septum portion has a second groove on its surface facing the first septum portion. The first groove passes through the two end faces of the first septum portion along the second direction. In a cross-section perpendicular to the second direction, the groove wall of the first groove is an inwardly concave arc curve. The second groove passes through the two end faces of the second septum portion along the first direction. In a cross-section perpendicular to the first direction, the groove wall of the second groove is an inwardly concave arc curve. The line connecting the center point of the bottom of the first groove and the center point of the bottom of the second groove is perpendicular to the first plane. The arc-shaped wall of the first groove and the arc-shaped wall of the second groove abut against each other in the overlapping area.

[0006] Optionally, the inner wall of the first arc-shaped recess is provided with a protective layer, or the inner walls of the first groove and the second groove are provided with a protective layer; The ratio of the hardness of the protective layer to the hardness of the spacer is greater than three-half.

[0007] Optionally, the depth of the first arc-shaped recess is greater than or equal to the maximum compressibility of the septum portion with the first arc-shaped protrusion in a third direction, the opening width of the first arc-shaped recess is greater than the top outer diameter of the first arc-shaped protrusion, and the third direction is perpendicular to the first plane.

[0008] Optionally, the difference between the opening width and the top outer diameter is in the range of 2~4μm, and the depth of the first arc-shaped recess is 0.2~0.5μm.

[0009] Optionally, the radius of curvature of the first arc-shaped recess, the first groove, and the second groove is 100~500μm.

[0010] Optionally, the first arc-shaped recess, the first groove, and the second groove all satisfy: R=H / (1-cosA) max ), where R represents the radius of curvature of the first arc-shaped recess, the first groove, or the second groove, H represents the depth of the first arc-shaped recess, the first groove, or the second groove, and A max This represents the maximum angle of inclination among the angles of inclination between each point on the sidewall of the first arc-shaped recess, the first groove, or the second groove and the first plane.

[0011] Optionally, the thickness of the protective layer is 0.1~0.3μm.

[0012] This disclosure also provides a method for preparing a spacer, comprising the following steps: Provide a first substrate and a second substrate; A first spacer portion is formed on the first substrate, and a second spacer portion is formed on the second substrate. The first spacer portion is an elongated strip extending along a first direction, and the second spacer portion is an elongated strip extending along a second direction. The first direction is perpendicular to the second direction. After the first substrate and the second substrate are aligned, the orthographic projections of the first spacer portion and the second spacer portion in a first plane overlap. The first plane is a plane parallel to the first substrate. Within the overlapping area, the surface of the first spacer portion facing the second spacer portion is provided with a first arc-shaped recess, and the surface of the second spacer portion facing the first spacer portion is provided with a first arc-shaped protrusion. The first arc-shaped recess and the first arc-shaped protrusion form a concave-convex mating structure; or The first septum portion has a first groove on its surface facing the second septum portion, and the second septum portion has a second groove on its surface facing the first septum portion. The first groove passes through the two end faces of the first septum portion along the second direction. In a cross-section perpendicular to the second direction, the groove wall of the first groove is an inwardly concave arc curve. The second groove passes through the two end faces of the second septum portion along the first direction. In a cross-section perpendicular to the first direction, the groove wall of the second groove is an inwardly concave arc curve. The line connecting the center point of the bottom of the first groove and the center point of the bottom of the second groove is perpendicular to the first plane. The arc-shaped wall of the first groove and the arc-shaped wall of the second groove abut against each other in the overlapping area.

[0013] Optionally, the step of forming a first spacer portion on the first substrate and a second spacer portion on the second substrate includes: A first initial spacer portion is formed on a first substrate, and a second initial spacer portion is formed on a second substrate. Both the first initial spacer portion and the second initial spacer portion are made of photoresist material. A first arc-shaped recess is formed on the first initial spacer portion, and a first arc-shaped protrusion is formed on the second initial spacer portion, using a first molding process or a second molding process; or A first groove is formed on the first initial spacer portion and a first groove is formed on the second initial spacer portion using a first molding process or a second molding process; The first forming process involves adjusting the exposure spacing to form an arc-shaped structure in the photoresist layer after development. The second forming process involves using the gradient transmittance of a grayscale mask to form an arc-shaped structure in the photoresist layer after development. The arc-shaped structure includes a first arc-shaped depression, a first arc-shaped protrusion, a first groove, or a second groove.

[0014] This disclosure also provides a liquid crystal display panel, including a first substrate, a second substrate, and a spacer as described above, wherein the first substrate and the second substrate are disposed opposite each other, and the spacer is disposed between the first substrate and the second substrate.

[0015] The beneficial effects of this disclosure are as follows: The spacer in this embodiment is configured as a long strip with the first spacer portion and the second spacer portion extending perpendicularly to each other, and with mutually cooperating arc-shaped recesses and arc-shaped protrusions, or arc-shaped wall surfaces abutting each other, in the overlapping area. This allows the arc-shaped wall surface to generate a restoring force pointing towards the center of the overlapping area when the spacer portion undergoes horizontal relative displacement, driving the spacer portion back to its initial equilibrium position. At the same time, the inclined sidewall of the arc-shaped wall increases the equivalent frictional resistance, enhances the anti-slip capability, effectively restricts the relative sliding of the spacer portion, avoids scratches on the alignment film and changes in pixel aperture ratio, and improves the display uniformity and reliability of the liquid crystal display panel. Attached Figure Description

[0016] The specific embodiments of this disclosure will be described in further detail below with reference to the accompanying drawings.

[0017] Figure 1 A schematic diagram of a structure of an embodiment of the spacer provided in this disclosure used in a liquid crystal display panel; Figure 2 This is a top view of an embodiment of the spacer provided in this disclosure; Figure 3 This is a schematic diagram illustrating the relative sliding process between the first spacer and the second spacer when the liquid crystal display panel is subjected to force. Figure 4 A perspective structural schematic diagram of another embodiment of the spacer provided in this disclosure; Figure 5 for Figure 4 Cross-sectional view of the diaphragm along the D-D' direction; Figure 6 A structural diagram of the spacer when setting up a protective layer; Figure 7 This is a schematic diagram showing the tilt angle and depth of the first arc-shaped depression. Detailed Implementation

[0018] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. All other embodiments obtained by those skilled in the art based on the described embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0019] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Similarly, the terms “an,” “a,” or “the,” and similar terms do not indicate a quantity limitation, but rather indicate the presence of at least one. The terms “including,” “comprising,” or “containing,” and similar terms mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. The terms “connected,” “linked,” or similar terms are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. The terms “upper,” “lower,” “left,” and “right,” etc., are used only to indicate relative positional relationships, and these relative positional relationships may change accordingly when the absolute position of the described objects changes.

[0020] The inventors discovered through research that the main reason why existing cylindrical spacer designs cause problems such as spot defects and uneven display brightness in display panels is: Firstly, the top of the spacer (i.e., the end in contact with the opposite substrate) is usually in static frictional contact with the opposite substrate. When the horizontal pressure is large enough, the top of the spacer can easily slide horizontally relative to the opposite substrate. This sliding can scratch the alignment film on the lower array substrate or the upper color filter substrate, causing the liquid crystal molecules in that area to lose their orientation control. During display, light leakage will occur at the scratched area, forming spot defects, which belong to PS Mura defects.

[0021] Secondly, to prevent the aforementioned scratches, improvement solutions typically position the spacer above the opaque Black Matrix (BM) area. However, once the top of the spacer slides beyond the occlusion range of the BM, the edge of the spacer may encroach into the light-transmitting pixel aperture area, permanently blocking part of the light and causing a difference in brightness between that pixel and surrounding pixels. This change in aperture ratio caused by spacer misalignment or improper structural design is a significant cause of uniformity issues such as DNU (Dark State Unevenness).

[0022] Based on the above findings, embodiments of this application provide a spacer material and its preparation method, as well as a liquid crystal display panel.

[0023] Please refer to Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of one embodiment of the spacer provided in this disclosure used in a liquid crystal display panel. Figure 2 A top view of the spacer provided in this disclosure, such as Figure 1 and Figure 2As shown, a spacer 1 is disposed between a first substrate 2 and a second substrate 3 of a liquid crystal display panel. The spacer 1 includes a first spacer portion 11 disposed on the first substrate 2 and a second spacer portion 12 disposed on the second substrate 3. The first spacer portion 11 is an elongated strip extending along a first direction, and the second spacer portion 12 is an elongated strip extending along a second direction. The orthographic projection of the first spacer portion 11 in a first plane and the orthographic projection of the second spacer portion 12 in a first plane have an overlapping area. The first direction is perpendicular to the second direction, and the first plane is a plane parallel to the first substrate.

[0024] To facilitate the description of the technical solution of this application, the following directions are first defined: A plane parallel to the first substrate 2 and the second substrate 3 is defined as the first plane (XY plane, which can also be represented as a horizontal plane). Within the first plane, mutually perpendicular directions X and Y are defined. The first direction is one of X and Y, and the second direction is the other of X and Y. For example, in this embodiment, the first direction is defined as the X direction, the second direction as the Y direction, and the direction perpendicular to the first plane is defined as the third direction Z, which is also the cell thickness direction of the liquid crystal display panel.

[0025] In this context, "elongated" refers to the first septum portion 11 or the second septum portion 12 having a length greater than its width in a plane perpendicular to the extension direction. For example, as shown... Figure 2 As shown, the first spacer portion 11 is an elongated strip extending along the first direction X, and its width in the second direction Y is smaller than its length in the first direction X. The second spacer portion 12 is an elongated strip extending along the second direction Y, and its width in the first direction X is smaller than its length in the second direction Y.

[0026] The first septum 11 and the second septum 12 have an overlapping area in the first plane. Since their extension directions are perpendicular to each other, the first septum 11 and the second septum 12 are arranged in a cross shape in the horizontal plane.

[0027] It is understood that, in the third direction Z, the first spacer portion 11 and the second spacer portion 12 also have certain dimensions. For the first spacer portion 11 and the second spacer portion 12, the cross-sectional shape of their cross-sections perpendicular to their own extension direction is not limited. They can be rectangular or trapezoidal cross-sections. For example, when it is a rectangular cross-section, the first spacer portion 11 and the second spacer portion 12 can be cuboid structures. When it is a trapezoidal cross-section, for example, the bottom (closer to the first substrate 2) width of the first spacer portion 11 is greater than the top (away from the first substrate 2) width. At this time, the cross-section is a regular trapezoid. The first spacer portion 11 can be understood as a column structure with a regular trapezoidal cross-section.

[0028] In this embodiment of the disclosure, the main technical concept for improving uniformity issues such as PS Mura and DNU is to establish a lateral constraint for the spacer 1 to restrict its sliding within a first plane. Specifically, a spacer with anti-slip function is provided, which consists of a first spacer portion 11 and a second spacer portion 12. By constructing an arc-shaped concave-convex fit structure or a double concave fit structure at the contact portion of the two, the anti-slip capability and sliding return force of the spacer 1 within the first plane are increased.

[0029] For concave-convex mating structures, in some embodiments, such as Figure 1 and Figure 2 As shown, in the overlapping area, the surface of the first spacer portion 11 facing the second spacer portion 12 is provided with a first arc-shaped recess 11a, and the surface of the second spacer portion 12 facing the first spacer portion is provided with a first arc-shaped protrusion 12a. The first arc-shaped recess 11a and the first arc-shaped protrusion 12a form a concave-convex mating structure.

[0030] The surface of the first spacer portion 11 facing the second spacer portion 12 is used to represent the surface of the first spacer portion 11 that is away from the first substrate 2 and close to the second substrate 3. For ease of description, the surface of the first spacer portion 11 that is away from the first substrate 2 will be referred to as the upper surface and the surface that is close to the first substrate 2 as the lower surface. Similarly, the surface of the second spacer portion 12 that is away from the first substrate 2 will be referred to as the upper surface and the surface that is close to the first substrate 2 as the lower surface.

[0031] In specific implementation, the first arc-shaped recess 11a is a spherical or ellipsoidal crown-shaped curved surface structure with the upper surface of the first spacer portion 11 recessed inward, and the first arc-shaped protrusion 12a is a spherical or ellipsoidal crown-shaped curved surface structure with the lower surface of the second spacer portion 12 protruding outward. The shapes of the first arc-shaped recess 11a and the first arc-shaped protrusion 12a match each other. When the first substrate 2 and the second substrate 3 are aligned, the first arc-shaped protrusion 12a is at least partially accommodated in the first arc-shaped recess 11a, forming a concave-convex fitting structure. This concave-convex fitting structure has a guiding and limiting function in the horizontal direction (parallel to the first plane), which can effectively limit the relative sliding between the first spacer portion 11 and the second spacer portion 12.

[0032] For example, please refer to Figure 3 , Figure 3This is a schematic diagram of the relative sliding process between the first spacer portion and the second spacer portion when the liquid crystal display panel is subjected to force. In Figure (a), it is shown that when the liquid crystal display panel is subjected to external force, the second spacer portion 12 slides relative to the first spacer portion 11. Specifically, the first arc-shaped protrusion 12a slides within the first arc-shaped recess 11a. When the external force is removed, the first arc-shaped protrusion 12a can quickly return to its initial position under the action of the restoring force generated by the arc-shaped wall surface, that is, return to the state shown in Figure (b), so that the screen brightness in the dark state can be quickly restored to uniformity.

[0033] For the double-concave mating structure, in some embodiments, such as Figure 4 and Figure 5 As shown, Figure 4 This is a three-dimensional structural diagram of another embodiment of the spacer provided in this disclosure. Figure 5 for Figure 4 A cross-sectional view of the spacer along the D-D' direction shows that the surface of the first spacer portion 11 facing the second spacer portion 12 has a first groove 11b, and the surface of the second spacer portion 12 facing the first spacer portion 11 has a second groove 12b. The first groove 11b penetrates the two end faces of the first spacer portion 11 along the second direction. In a cross-section perpendicular to the second direction, the groove wall of the first groove 11b is an inwardly concave arc curve. The second groove 12b penetrates the two end faces of the second spacer portion 12 along the first direction. In a cross-section perpendicular to the first direction, the groove wall of the second groove 12b is an inwardly concave arc curve. The line connecting the center point of the bottom of the first groove 11b and the center point of the bottom of the second groove 12b is perpendicular to the first plane. The arc-shaped wall of the first groove 11b and the arc-shaped wall of the second groove 12b abut against each other in the overlapping area.

[0034] It should be noted that, Figure 4 This is a schematic diagram showing the positions of the first spacer portion 11 and the second spacer portion 12 before the first substrate and the second substrate are assembled. Therefore, in the third direction Z, the two are in a separated state, which does not represent the actual engagement state of the two in the third direction Z in the liquid crystal display panel after assembly.

[0035] In this embodiment, taking the first direction as the X direction and the second direction as the Y direction as an example, the first groove 11b penetrates both end faces of the first spacer portion 11 along the second direction Y. That is, the first groove 11b penetrates the entire first spacer portion 11 in the second direction Y, and the first groove 11b has a through-groove structure in the second direction Y. Similarly, the second groove 12b has a through-groove structure in the first direction X.

[0036] In a cross-section perpendicular to the second direction Y (i.e., the plane defined by the first direction X and the third direction Z), the wall of the first groove 11b is an inwardly concave arc shape, meaning that the wall of the first groove 11b, viewed in cross-section, is an inwardly concave arc shape that smoothly transitions from the upper surface of the first septum portion 11 to the bottom of the groove, with the bottom being the lowest point of the arc. Similarly, in a cross-section perpendicular to the first direction X (i.e., the plane defined by the second direction Y and the third direction Z), the wall of the second groove 12b is an inwardly concave arc shape, meaning that the wall of the second groove 12b, viewed in cross-section, is an inwardly concave arc shape that smoothly transitions from the lower surface of the second septum portion 12 to the bottom of the groove.

[0037] It should be noted that both the first groove 11b and the second groove 12b are grooves with equal cross sections. That is, the first groove 11b maintains its contour shape on the cross section perpendicular to the second direction Y during its extension along the second direction Y; the second groove 12b maintains its contour shape on the cross section perpendicular to the first direction X during its extension along the first direction X. This equal cross section design makes the arc-shaped wall of the groove have a uniform curvature in the extension direction.

[0038] In the cross-section perpendicular to the second direction Y, the wall of the first groove 11b is an inwardly concave arc curve. If this arc curve is considered as a circular arc, the center of the circle containing this arc is the center of curvature of the first groove 11b at that cross-section. Furthermore, since the first groove 11b is a groove with a uniform cross-section extending along the second direction Y, its centers of curvature at each cross-section together form a center of curvature axis L1 extending along the second direction Y. Similarly, the centers of curvature of the arc-shaped wall of the second groove 12b at each cross-section together form a center of curvature axis L2 extending along the first direction X.

[0039] L1 extends along the second direction Y, and L2 extends along the first direction X. The orthographic projections of L1 and L2 in the first plane are orthogonal, and the line connecting the intersection point P with the center point of the bottom of the first groove and the center point of the bottom of the second groove is on a straight line. That is, on the cross section passing through the intersection point P and perpendicular to the second direction Y, the bottom of the first groove 11b has a lowest point, which is the center point of the bottom; on the cross section passing through the intersection point P and perpendicular to the first direction X, the bottom of the second groove 12b has a lowest point, which is the center point of the bottom.

[0040] The arc-shaped wall surface of the first groove 11b and the arc-shaped wall surface of the second groove 12b abut against each other in the overlapping area. Specifically, when the first substrate 2 and the second substrate 3 are assembled, there is a contact point between the arc-shaped wall surface of the first groove 11b and the arc-shaped wall surface of the second groove 12b. When the liquid crystal display panel is subjected to an external force parallel to the first plane, a relative horizontal displacement occurs between the first spacer portion 11 and the second spacer portion 12. The arc-shaped wall surfaces slide against each other along the curved surface. The contact force is decomposed into a reverse restoring force to offset the horizontal displacement. When the sliding reaches the limit position, the edges of the arc-shaped wall surfaces are rigidly locked against each other, limiting the maximum relative displacement, thereby limiting the maximum relative displacement between the first spacer portion 11 and the second spacer portion 12 and preventing the spacer portion from sliding out of the black matrix area.

[0041] Compared with the concave-convex mating structure, the double concave mating structure not only restricts the relative sliding of the septum, but also the arc-shaped walls of the two grooves abut against each other, the force is symmetrical, the two arc-shaped walls share the contact stress, the stress distribution is more uniform, and the arc-shaped walls on both sides jointly generate the reset force, resulting in higher reset efficiency. In addition, since both sides are grooves, the arc-shaped walls cooperate with each other, reducing the risk of jamming.

[0042] Compared with related technologies, the spacer in this embodiment of the present disclosure is configured as a long strip with the first spacer portion and the second spacer portion extending perpendicularly to each other, and with mutually cooperating arc-shaped recesses and arc-shaped protrusions, or arc-shaped wall surfaces abutting each other, in the overlapping area, such that when the spacer portion undergoes horizontal relative displacement, the arc-shaped wall surface generates a restoring force pointing towards the center of the overlapping area, driving the spacer portion back to the initial equilibrium position; at the same time, the inclined sidewall of the arc-shaped wall surface increases the equivalent frictional resistance, enhances the anti-slip ability, effectively restricts the relative sliding of the spacer portion, avoids alignment film scratches and pixel aperture ratio changes, and improves the display uniformity and reliability of the liquid crystal display panel.

[0043] In some embodiments, to improve the wear resistance and compressive hardness of the spacer and to prevent deformation or wear of the arc-shaped depressions or protrusions during long-term repeated contact, a protective layer may be provided on the relevant arc-shaped surface.

[0044] Optionally, the inner wall of the first arc-shaped recess is provided with a protective layer, or the inner walls of the first groove and the second groove are provided with a protective layer; the ratio of the hardness of the protective layer to the hardness of the spacer is greater than three-half.

[0045] For example, such as Figure 6As shown, when the spacer adopts a concave-convex mating structure, a protective layer 13 is provided on the inner wall of the first arc-shaped recess 11a. Specifically, the protective layer 13 covers the entire inner wall surface of the first arc-shaped recess 11a. When the first arc-shaped protrusion 12a on the second spacer portion 12 slides within the first arc-shaped recess 11a, the protective layer 13 directly bears the sliding friction and compression of the first arc-shaped protrusion 12a, effectively preventing the inner wall of the first arc-shaped recess 11a from being worn or crushed.

[0046] For example, when the spacer adopts a double-concave mating structure, a protective layer is provided on the inner surface of both the first groove 11b and the second groove 12b. Specifically, the protective layer covers the arc-shaped wall surface of each of the first groove 11b and the second groove 12b. When the arc-shaped wall surfaces of the two grooves abut against each other and slide relative to each other in the overlapping area, the protective layer directly bears the contact stress, preventing the arc-shaped wall surfaces from being worn or dented due to repeated friction.

[0047] The ratio of the hardness of the protective layer to the hardness of the spacer is greater than three-half, that is, the ratio of the hardness of the protective layer material to the hardness of the spacer body material is greater than 3 / 2. By setting a protective layer with higher hardness, the protective layer bears the main wear during the contact friction process of the arc-shaped wall surface, while the base material of the spacer (usually an organic photoresist material with lower hardness) is effectively protected. This slows down the overall wear of the spacer, ensures that the arc curvature remains unchanged during long-term use, stably maintains the sliding limit and buffering effect, and reduces the occurrence of defects such as PS Mura and uneven display brightness.

[0048] Optionally, the thickness of the protective layer is 0.1~0.3μm. For example, the thickness of the protective layer is 0.1μm, 0.15μm, 0.2μm, 0.3μm, etc. This thickness range ensures sufficient compressive strength while avoiding stress concentration or film peeling caused by an excessively thick protective layer, and does not significantly affect the overall height of the spacer.

[0049] Optionally, the protective layer is a hardened layer, which uses insulating materials such as silicon nitride or silicon oxide. These materials have excellent hardness and wear resistance, and are compatible with the inorganic insulating layer process commonly used in LCD panels, without the need to introduce additional process steps.

[0050] Specifically, in order to simplify the process and reduce costs, a hardening layer can be prepared only on the spacer portion on one side of the array substrate. For example, when the first substrate is an array substrate and the second substrate is a color filter substrate, a protective layer can be coated only in the first arc-shaped recess or the first groove, while a protective layer is set inside the first arc-shaped protrusion or the second groove, thus avoiding additional processes.

[0051] For example, on the array substrate side (taking the array substrate as the first substrate as an example), a first spacer portion 11 is first formed on the first substrate 2 by photolithography, and a first arc-shaped recess 11a or a first groove 11b is formed on the surface of the first spacer portion 11 facing the second substrate 3. Then, a silicon oxide or silicon nitride thin film with a thickness of 0.1μm to 0.3μm is deposited on the entire surface of the first substrate 2 by chemical vapor deposition (CVD) or physical vapor deposition (PVD). Afterwards, the deposited thin film is patterned by photolithography and etching processes, retaining only the inner wall portion covering the first arc-shaped recess 11a or the first groove 11b. It is understood that a protective layer can also be prepared on the color filter substrate side, but in order to reduce process costs, the color filter substrate needs to be pulled into the array substrate process line for fabrication.

[0052] The relative sliding suppression effect between the first septum portion 11 and the second septum portion 12 is related to parameters such as the depth of the arc-shaped recess / groove, the opening width, the radius of curvature, and the tilt angle.

[0053] Optionally, the depth H of the first arc-shaped recess 11a is greater than or equal to the maximum compressibility of the septum portion provided with the first arc-shaped protrusion 12a in the third direction Z, the opening width of the first arc-shaped recess 11a is greater than the top outer diameter of the first arc-shaped protrusion 12a, and the third direction Z is perpendicular to the first plane.

[0054] The maximum compressibility refers to the maximum elastic deformation of the second spacer portion 12 in the third direction Z when the liquid crystal display panel is subjected to external force. This maximum compressibility is determined by parameters such as the material and size of the spacer portion. When the recess depth H is less than the maximum compressibility, the top of the first arc-shaped protrusion 12a will contact the bottom of the first arc-shaped recess 11a during compression, resulting in a hard impact that may damage the underlying film layer. In this embodiment, by setting the recess depth H to be greater than or equal to the maximum compressibility, a gap is always maintained between the top of the first arc-shaped protrusion 12a and the bottom of the first arc-shaped recess 11a during compression, thus avoiding the aforementioned hard impact.

[0055] Wherein, the opening width W1 refers to the straight-line distance between the two edges of the first arc-shaped recess 11a, i.e., the junction point between the first arc-shaped recess 11a and the upper surface of the first septum 11, on a cross section passing through the center of the first arc-shaped recess 11a and parallel to the third direction Z. The top outer diameter D1 refers to the dimension at the widest point of the top of the first arc-shaped protrusion 12a on the same cross section. The opening width W1 affects the free travel of the second septum 12. The opening width W1 is slightly larger than the top outer diameter D1, which allows for small displacement of the septum.

[0056] In some embodiments, the difference between the opening width and the top outer diameter is in the range of 2~4μm, and the depth of the first arc-shaped recess is 0.2~0.5μm.

[0057] For example, the difference values ​​are 2μm, 2.5μm, 3μm, 4μm, etc. For example, the depth of the first arc-shaped depression is 0.2μm, 0.3μm, 0.4μm, 0.5μm, etc.

[0058] Specifically, when the difference is less than 2μm, the first arc-shaped protrusion 12a has too little space to move within the first arc-shaped recess 11a, and the relative displacement between the first septum 11 and the second septum 12 is limited. When the difference is greater than 4μm, the first arc-shaped protrusion 12a has too much space to move within the recess, and it may deviate too far from the center position under the action of external force. Setting it to 2~4μm can avoid excessive displacement beyond the area where the black matrix is ​​located while achieving small displacement.

[0059] In some embodiments, the radius of curvature of the first arcuate recess, the first groove, and the second groove is 100~500μm.

[0060] When the spacer adopts a concave-convex mating structure, the radius of curvature of the first arc-shaped recess 11a is 100μm~500μm. When the spacer adopts a double-concave mating structure, the radii of curvature of the first groove 11b and the second groove 12b are also 100μm~500μm.

[0061] For example, the radii of curvature are 100μm, 160μm, 200μm, 300μm, 400μm, 500μm, etc.

[0062] For concave-convex mating structures, when the radius of curvature is less than 100 μm, the curvature of the arc-shaped wall is too large, and the resistance experienced by the first arc-shaped protrusion 12a changes drastically during sliding. When the radius of curvature is greater than 500 μm, the arc-shaped wall is close to a plane, and the limiting effect on the first arc-shaped protrusion 12a is weak. Setting the radius of curvature within the range of 100~500 μm can provide both good limiting effect and ensure smooth movement. Similarly, for a double-concave mating structure, when the radius of curvature is too small, the curvature of the corresponding arc-shaped wall is too large, and the contact stress of the two arc-shaped walls in the abutment area is concentrated. The resistance changes drastically during relative sliding, which may cause jamming or local wear on the arc-shaped wall. When the radius of curvature is too large, the corresponding arc-shaped wall is too flat, and the fit between the two arc-shaped walls is close to a planar fit, with weak horizontal limiting effect. By setting the radius of curvature in the range of 100~500μm, the two arc-shaped walls can form a smooth arc-shaped fit in the overlapping area. The sliding resistance changes smoothly with the displacement, which not only ensures the smoothness of sliding, but also provides sufficient horizontal limiting force.

[0063] Optionally, the first arc-shaped recess, the first groove, and the second groove all satisfy: R=H / (1-cosA) max ), where R represents the radius of curvature of the first arc-shaped recess, the first groove, or the second groove, H represents the depth of the first arc-shaped recess, the first groove, or the second groove, and A max This represents the maximum angle of inclination among the angles of inclination between each point on the sidewall of the first arc-shaped recess, the first groove, or the second groove and the first plane.

[0064] In this embodiment, R=H / (1-cosA) max The parameter relationship applies to the first arc-shaped recess 11a, and can also be applied to the first groove 11b and the second groove 12b. This embodiment takes the first arc-shaped recess 11a as an example to explain the above formula in detail.

[0065] Specifically, such as Figure 7 As shown, the contour line of the groove wall of the first arc-shaped recess 11a on any plane passing through its lowest point (where the recess depth is the greatest) and perpendicular to the first plane is an arc curve. The angle between the tangent line at each point on this arc curve and the first plane is different. Specifically, at the bottom of the groove, the tangent line is parallel to the first plane, and the inclination angle θ is 0°. From the bottom of the groove towards the edge of the groove opening, this angle (i.e., the inclination angle θ) gradually increases. At the edge of the groove opening, the inclination angle θ reaches its maximum value. For clarity, the maximum inclination angle θ is denoted as the maximum inclination angle Amax.

[0066] The magnitude of the maximum tilt angle Amax affects the sliding resistance and rebound characteristics of the first arc-shaped protrusion 12a. Specifically, when the maximum tilt angle Amax is small, the sidewall is relatively gentle, the resistance encountered by the first arc-shaped protrusion 12a when sliding along the sidewall is small, and it is easy to rebound to the center position after the external force is removed, but the horizontal limiting effect on the first arc-shaped protrusion 12a is weak; when the maximum tilt angle Amax is large, the sidewall is relatively steep, the horizontal limiting effect on the first arc-shaped protrusion 12a is enhanced, but after the first arc-shaped protrusion 12a slides into the sidewall area, it is difficult to rebound to the center position after the external force is removed.

[0067] In this embodiment, the maximum tilt angle Amax ranges from 5° to 30°. This is because: when the maximum tilt angle Amax is less than 5°, the sidewall is close to a plane, and the horizontal restraining effect on the first arc-shaped protrusion 12a is weak, which is not conducive to limiting the extreme sliding of the first arc-shaped protrusion 12a; while when the maximum tilt angle Amax is greater than 30°, the sidewall is too steep, and the sidewall of the first arc-shaped recess 11a provides a large lateral restraining force. After the first arc-shaped protrusion 12a slides into the sidewall area, it is not easy to get out. After the external force is removed, it is difficult to bounce back to the center position, which may cause the second spacer portion 12 to be in an eccentric support state, resulting in uneven box thickness (Mura).

[0068] In this embodiment, by setting the maximum tilt angle Amax to 5°~30°, the sidewall of the first arc-shaped recess 11a can be provided with sufficient horizontal restraint and ensure that it can smoothly rebound after the external force is removed.

[0069] When the first arc-shaped protrusion 12a is subjected to an external force and undergoes a horizontal displacement x relative to the first arc-shaped recess 11a, the horizontal restoring force F exerted by the first arc-shaped recess 11a on the first arc-shaped protrusion 12a is... re satisfy:

[0070] Wherein, N is the vertical pressure between the first septum portion 11 and the second septum portion 12 (this vertical pressure corresponds to the compression of the septum material, which is affected by the cell thickness of the liquid crystal display panel), R is the radius of curvature of the first arc-shaped recess 11a, and x is the horizontal displacement of the first arc-shaped protrusion 12a relative to the first arc-shaped recess 11a.

[0071] According to the above relationship, when the vertical pressure N and horizontal displacement x are constant, the larger the radius of curvature R, the greater the restoring force F. re The smaller the radius of curvature R, the smoother the sliding of the first arc-shaped protrusion 12a; the smaller the radius of curvature R, the stronger the restoring force F. re The larger the radius of curvature R, the stronger the anti-slip capability of the first arc-shaped recess 11a against the first arc-shaped protrusion 12a. Therefore, by setting the radius of curvature R to 100μm~500μm and the maximum tilt angle Amax to 5°~30°, sufficient horizontal limiting can be provided while ensuring smooth sliding.

[0072] In this embodiment, the first arc-shaped recess 11a, the first arc-shaped protrusion 12b, the first groove 11b, and the second groove 12b can all be formed by photolithography, and their arc-shaped contours are controlled by adjusting the exposure intensity (exposure dose) distribution of the photomask. Specifically, by setting a grayscale photomask with a gradient transmittance pattern on the photomask, or by controlling the exposure spacing and exposure energy distribution, the photoresist material can form a concave or convex structure with a predetermined arc-shaped contour after development.

[0073] To further facilitate the implementation of the exposure process and ensure minimal deformation of the concave / convex morphology after external compression, in this embodiment, the horizontal distance between the starting position of the first arc-shaped concave 11a, the first groove 11b, or the second groove 12b and the edge of the septum portion is set to 3~5μm. That is, the distance d1 between the groove edge of the first arc-shaped concave 11a or the first groove 11b and the sidewall edge of the first septum portion 11 is greater than or equal to 3μm and less than or equal to 5μm (e.g., ...). Figure 1 and Figure 4As shown); the distance d2 between the groove edge of the second groove 12b and the sidewall edge of the second spacer portion 12 is greater than or equal to 3μm and less than or equal to 5μm (as shown). Figure 4 (As shown).

[0074] In this embodiment, the distance between the starting position of the arc-shaped recess or groove and the edge of the septum is set to 3~5μm. On the one hand, this provides sufficient space for the arc-shaped recess / groove on the surface of the septum, which is beneficial for the accurate transfer of the photomask pattern in the exposure process. On the other hand, it avoids material accumulation or stress concentration between the arc-shaped area and the edge of the septum, so that the deformation of the arc shape of the septum is small after being compressed, thereby improving the stability and reliability of the septum.

[0075] The spacer provided in this disclosure has the following advantages compared to traditional spacers: Firstly, the anti-slip capability is enhanced. Specifically, by setting the first arc-shaped recess 11a and the first arc-shaped protrusion 12a to cooperate with each other, when the first arc-shaped protrusion 12a slides along the arc-shaped sidewall of the first arc-shaped recess 11a, it needs to overcome the normal component force generated by the arc-shaped curved surface, and the equivalent frictional resistance increases, making it more difficult for the first spacer portion 11 and the second spacer portion 12 to slide relative to each other.

[0076] Secondly, the self-centering characteristic; when the first arc-shaped protrusion 12a deviates from the center position of the first arc-shaped recess 11a, the curvature of the arc-shaped sidewall generates a restoring force pointing towards the center position. This restoring force drives the first arc-shaped protrusion 12a back to the initial equilibrium position, improving the reset capability of the spacer after being disturbed by external forces and the stability of the system.

[0077] Thirdly, the stress distribution is optimized; by setting the sidewall of the first arc-shaped recess 11a as an arc-shaped curved surface, when the first arc-shaped protrusion 12a contacts the first arc-shaped recess 11a, the contact area increases and the contact stress decreases, reducing the risk of local wear or pressure damage and extending the service life of the spacer.

[0078] Fourthly, buffering and damping: Under dynamic load, when the first arc-shaped protrusion 12a slides along the arc-shaped sidewall of the first arc-shaped recess 11a, the arc-shaped surface absorbs part of the energy and converts it into elastic potential energy, which plays a role in buffering and damping, reducing the impact of the impact force on the liquid crystal display panel.

[0079] It should be noted that the structure in which the first groove 11b and the second groove 12b cooperate with each other also has the above-mentioned advantages.

[0080] Based on the same inventive concept, a second aspect of this disclosure provides a method for preparing a spacer as shown above, comprising the following steps: Step 1: Provide a first substrate and a second substrate; Step 2: A first spacer portion is formed on the first substrate, and a second spacer portion is formed on the second substrate. The first spacer portion is an elongated strip extending along a first direction, and the second spacer portion is an elongated strip extending along a second direction. The first direction and the second direction are perpendicular. After the first substrate and the second substrate are aligned, the orthographic projections of the first spacer portion and the second spacer portion in a first plane overlap. The first plane is a plane parallel to the first substrate. Wherein: Within the overlapping area, the surface of the first spacer portion facing the second spacer portion is provided with a first arc-shaped recess, and the surface of the second spacer portion facing the first spacer portion is provided with a first arc-shaped protrusion. The first arc-shaped recess and the first arc-shaped protrusion form a concave-convex mating structure; or The first septum portion has a first groove on its surface facing the second septum portion, and the second septum portion has a second groove on its surface facing the first septum portion. The first groove passes through the two end faces of the first septum portion along the second direction. In a cross-section perpendicular to the second direction, the groove wall of the first groove is an inwardly concave arc curve. The second groove passes through the two end faces of the second septum portion along the first direction. In a cross-section perpendicular to the first direction, the groove wall of the second groove is an inwardly concave arc curve. The line connecting the center point of the bottom of the first groove and the center point of the bottom of the second groove is perpendicular to the first plane. The arc-shaped wall of the first groove and the arc-shaped wall of the second groove abut against each other in the overlapping area.

[0081] Optionally, the step of forming a first spacer portion on the first substrate and a second spacer portion on the second substrate includes: A first initial spacer portion is formed on a first substrate, and a second initial spacer portion is formed on a second substrate. Both the first initial spacer portion and the second initial spacer portion are made of photoresist material. A first arc-shaped recess is formed on the first initial spacer portion, and a first arc-shaped protrusion is formed on the second initial spacer portion, using a first molding process or a second molding process; or A first groove is formed on the first initial spacer portion and a first groove is formed on the second initial spacer portion using a first molding process or a second molding process.

[0082] The first initial spacer portion can be understood as a spacer precursor structure that has been pre-baked but not yet subjected to final patterning exposure and development after a photoresist layer has been coated on the first substrate 2; or it refers to an intermediate structure on the first substrate 2 where the basic outline of the spacer portion has been formed, but the first arc-shaped recess 11a or the first groove 11b has not yet been formed in the overlapping area. The main material of the first initial spacer portion is photoresist. Similarly, the second initial spacer portion can be understood as a spacer precursor structure that has been pre-baked but not yet subjected to final patterning exposure and development after a photoresist layer has been coated on the second substrate 3; or it refers to an intermediate structure on the second substrate 3 where the basic outline of the spacer portion has been formed, but the first arc-shaped protrusion 12a or the second groove 12b has not yet been formed in the overlapping area. The main material of the second initial spacer portion is photoresist. That is, the first initial septum part and the second initial septum part are intermediate septum parts that have not yet formed an arc-shaped structure. Their materials are the same as those of the final septum part. After forming an arc-shaped structure through the first molding process or the second molding process, the first initial septum part becomes the first septum part 11 with a first arc-shaped depression 11a or a first groove 11b, and the second initial septum part becomes the second septum part 12 with a first arc-shaped protrusion 12a or a second groove 12b.

[0083] The first forming process involves adjusting the exposure spacing to form an arc-shaped structure in the photoresist layer after development. The second forming process involves using the gradient transmittance of a grayscale mask to form an arc-shaped structure in the photoresist layer after development. The arc-shaped structure includes a first arc-shaped depression, a first arc-shaped protrusion, a first groove, or a second groove.

[0084] Specifically, the first forming process can also be referred to as the exposure gap control method. In the existing lithography system of TFT-LCDs, by adjusting the exposure gap of the lithography machine (i.e., the gap between the mask and the photoresist layer), the contour morphology after photoresist curing can be precisely controlled. Specifically, whether the top morphology of the spacer portion (e.g., the first spacer portion and the second spacer portion) is concave or convex, and whether it is a gentle slope or a steep slope, is strongly correlated with the exposure gap.

[0085] The principle of forming the arc-shaped structure using the first process is the same for both the first initial septum portion and the second initial septum portion. For the sake of simplification, the first initial septum portion and the second initial septum portion are uniformly referred to as the initial septum portion.

[0086] In practice, the first molding process includes the following steps: Step A1: Place a mask above the initial septum portion and adjust the exposure distance between the mask and the initial septum portion to 150μm~250μm.

[0087] Step A2 involves exposing the initial spacer portion using the photomask. When the exposure spacing is small (e.g., 150 μm), the diffraction intensity distribution at the top of the photoresist layer changes, resulting in higher exposure energy received at the top of the photoresist, which tends to form arc-shaped protrusions after development. When the exposure spacing is large (e.g., 250 μm), the exposure energy received at the top of the photoresist is lower, which tends to form arc-shaped depressions after development. By selecting an appropriate exposure spacing within this range, the surface morphology of the spacer portion with either a concave or convex arc-shaped profile can be obtained, respectively.

[0088] Step A3: Develop the exposed initial spacer portion to remove uncured or insufficiently cured photoresist, retain the cured portion, form a first arc-shaped depression 11a or a first groove 11b on the first initial spacer portion, and form a first arc-shaped protrusion 12a or a second groove 12b on the second initial spacer portion.

[0089] Step A4: Dry and cure the initial septum portion after development to obtain the first septum portion 11 or the second septum portion 12 with an arc-shaped structure.

[0090] In this embodiment, the first forming process does not require additional equipment. The arc contour can be controlled simply by optimizing the exposure spacing parameters of the lithography machine. This method is commonly used by panel manufacturers to adjust the PS morphology. It has good process compatibility and low cost.

[0091] Specifically, the second forming process can be represented as a grayscale photomask method, which may include the following steps: Step B1: A grayscale mask is set above the initial spacer portion, that is, a photomask with gradient transmittance or special graphic design. The transmittance of the grayscale mask is continuously and gradually distributed in the horizontal direction, for example, the transmittance gradually changes from the center to the edge, so that the exposure received by the photoresist layer during exposure is distributed in a stepped or continuous manner.

[0092] Step B2 involves exposing the initial spacer portion using the grayscale mask. By utilizing the difference in solubility of photoresist in different transmittance regions (i.e., different exposure dose regions), a smooth slope or arc-shaped pit contour is formed after development.

[0093] Step B3 involves developing the exposed initial spacer portion to remove areas with high photoresist solubility and retain areas with low solubility. A first arc-shaped depression 11a and a first groove 11b are formed on the first initial spacer portion, or a first arc-shaped protrusion 12a and a second groove 12b are formed on the second initial spacer portion.

[0094] Step B4: Dry and cure the initial septum portion after development to obtain a first septum portion 11 or a second septum portion 12 with an arc-shaped structure.

[0095] Compared with the first forming process, the second forming process requires the design of a special grayscale mask. However, once the mask design is completed, it can be replicated in batches, making it suitable for mass production. At the same time, the transmittance distribution of the grayscale mask can be precisely controlled, and the obtained arc contour has high precision and good consistency, making it particularly suitable for application scenarios with strict requirements on the radius of curvature and the depth of the recess.

[0096] Furthermore, based on the aforementioned first or second molding process, the arc-shaped profile can be further optimized by utilizing the material's own fluidity.

[0097] Specifically, in selecting photoresist materials, resin materials with specific flow properties can be used. During the high-temperature baking (post-baking) process, the photoresist material melts and flows, and its surface tension causes sharp edges to become rounded, naturally forming a certain curvature, thereby helping to eliminate stress concentration and improve the mechanical reliability of the spacer. This auxiliary method can be implemented during the post-baking process after the formation of the first arc-shaped recess 11a, the first arc-shaped protrusion 12a, the first groove 11b, or the second groove 12b.

[0098] Based on the same inventive concept, this disclosure also provides a liquid crystal display panel, including a first substrate, a second substrate, and a spacer as described above, wherein the first substrate and the second substrate are disposed opposite each other, and the spacer is disposed between the first substrate and the second substrate.

[0099] Obviously, the above embodiments of this disclosure are merely examples for clearly illustrating this disclosure, and are not intended to limit the implementation of this disclosure. For those skilled in the art, other variations or modifications can be made based on the above description. It is impossible to exhaustively list all implementation methods here. Any obvious variations or modifications derived from the technical solutions of this disclosure are still within the protection scope of this disclosure.

Claims

1. A spacer disposed between a first substrate and a second substrate of a liquid crystal display panel, characterized in that, The spacer includes a first spacer portion disposed on the first substrate and a second spacer portion disposed on the second substrate. The first spacer portion is an elongated strip extending along a first direction, and the second spacer portion is an elongated strip extending along a second direction. The first direction is perpendicular to the second direction. The orthographic projections of the first spacer portion and the second spacer portion in a first plane overlap. The first plane is a plane parallel to the first substrate. Within the overlapping area, the surface of the first spacer portion facing the second spacer portion is provided with a first arc-shaped recess, and the surface of the second spacer portion facing the first spacer portion is provided with a first arc-shaped protrusion. The first arc-shaped recess and the first arc-shaped protrusion form a concave-convex mating structure; or The first septum portion has a first groove on its surface facing the second septum portion, and the second septum portion has a second groove on its surface facing the first septum portion. The first groove passes through the two end faces of the first septum portion along the second direction. In a cross-section perpendicular to the second direction, the groove wall of the first groove is an inwardly concave arc curve. The second groove passes through the two end faces of the second septum portion along the first direction. In a cross-section perpendicular to the first direction, the groove wall of the second groove is an inwardly concave arc curve. The line connecting the center point of the bottom of the first groove and the center point of the bottom of the second groove is perpendicular to the first plane. The arc-shaped wall of the first groove and the arc-shaped wall of the second groove abut against each other in the overlapping area.

2. The spacer according to claim 1, characterized in that, The inner wall of the first arc-shaped recess is provided with a protective layer, or the inner walls of the first groove and the second groove are provided with a protective layer; The ratio of the hardness of the protective layer to the hardness of the spacer is greater than three-half.

3. The spacer according to claim 1 or 2, characterized in that, The depth of the first arc-shaped depression is greater than or equal to the maximum compressibility of the septum portion with the first arc-shaped protrusion in the third direction, the opening width of the first arc-shaped depression is greater than the top outer diameter of the first arc-shaped protrusion, and the third direction is perpendicular to the first plane.

4. The spacer according to claim 3, characterized in that, The difference between the opening width and the top outer diameter is in the range of 2~4μm, and the depth of the first arc-shaped recess is 0.2~0.5μm.

5. The spacer according to claim 1 or 2, characterized in that, The radius of curvature of the first arc-shaped recess, the first groove, and the second groove is 100~500μm.

6. The spacer according to claim 5, characterized in that, The first arc-shaped depression, the first groove, and the second groove all satisfy: R=H / (1-cosA) max ), where R represents the radius of curvature of the first arc-shaped recess, the first groove, or the second groove, H represents the depth of the first arc-shaped recess, the first groove, or the second groove, and A max This represents the maximum angle of inclination among the angles of inclination between each point on the sidewall of the first arc-shaped recess, the first groove, or the second groove and the first plane.

7. The spacer according to claim 2, characterized in that, The thickness of the protective layer is 0.1~0.3μm.

8. A method for preparing a spacer material, characterized in that, Includes the following steps: Provide a first substrate and a second substrate; A first spacer portion is formed on the first substrate, and a second spacer portion is formed on the second substrate. The first spacer portion is an elongated strip extending along a first direction, and the second spacer portion is an elongated strip extending along a second direction. The first direction is perpendicular to the second direction. After the first substrate and the second substrate are aligned, the orthographic projections of the first spacer portion and the second spacer portion in a first plane overlap. The first plane is a plane parallel to the first substrate. Within the overlapping area, the surface of the first spacer portion facing the second spacer portion is provided with a first arc-shaped recess, and the surface of the second spacer portion facing the first spacer portion is provided with a first arc-shaped protrusion. The first arc-shaped recess and the first arc-shaped protrusion form a concave-convex mating structure; or The first septum portion has a first groove on its surface facing the second septum portion, and the second septum portion has a second groove on its surface facing the first septum portion. The first groove passes through the two end faces of the first septum portion along the second direction. In a cross-section perpendicular to the second direction, the groove wall of the first groove is an inwardly concave arc curve. The second groove passes through the two end faces of the second septum portion along the first direction. In a cross-section perpendicular to the first direction, the groove wall of the second groove is an inwardly concave arc curve. The line connecting the center point of the bottom of the first groove and the center point of the bottom of the second groove is perpendicular to the first plane. The arc-shaped wall of the first groove and the arc-shaped wall of the second groove abut against each other in the overlapping area.

9. The method for preparing the spacer material according to claim 8, characterized in that, The steps of forming a first spacer portion on the first substrate and forming a second spacer portion on the second substrate include: A first initial spacer portion is formed on a first substrate, and a second initial spacer portion is formed on a second substrate. Both the first initial spacer portion and the second initial spacer portion are made of photoresist material. A first arc-shaped recess is formed on the first initial spacer portion, and a first arc-shaped protrusion is formed on the second initial spacer portion, using a first molding process or a second molding process; or A first groove is formed on the first initial spacer portion and a first groove is formed on the second initial spacer portion using a first molding process or a second molding process; The first forming process involves adjusting the exposure spacing to form an arc-shaped structure in the photoresist layer after development. The second forming process involves using the gradient transmittance of a grayscale mask to form an arc-shaped structure in the photoresist layer after development. The arc-shaped structure includes a first arc-shaped depression, a first arc-shaped protrusion, a first groove, or a second groove.

10. A liquid crystal display panel, characterized in that, It includes a first substrate, a second substrate, and a spacer as described in any one of claims 1 to 7, wherein the first substrate and the second substrate are disposed opposite each other, and the spacer is disposed between the first substrate and the second substrate.

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