A low-temperature plasma exhaust gas purification device for a pig slaughtering line

Abstract

The application provides a live pig slaughtering line low-temperature plasma waste gas purification device, relates to the technical field of slaughtering waste gas purification, and comprises a front droplet gathering and separating tank, a low-temperature plasma reaction tank, a tail end catalytic purification tank, an induced draft fan and two communication covers which are sequentially communicated along the flow direction of waste gas. High-frequency high-voltage power supply boxes are mounted on the outer sides of the front droplet gathering and separating tank, and a plurality of heat dissipation air ducts are formed in the outer sides of the front droplet gathering and separating tank. Support cross bars are mounted between the top and bottom of the medium conducting plates, and the medium conducting plates are inserted into the inner sides of the side ends of the medium packaging plates. The positive pressure warm air generated in the high-frequency high-voltage power supply boxes is unidirectionally discharged from the gaps to the main channel in the low-temperature plasma reaction tank, heat protection and air seal protection are realized, the influence of the humidity in the waste gas on the medium packaging assembly is reduced, and the problem that the high-pressure wiring end of the plasma may be in the same space as the high-humidity waste gas and the equipment maintenance cycle is shortened is solved.

Description

Technical Field

[0001] This invention relates to the field of waste gas environmental protection and purification technology, and in particular to a low-temperature plasma waste gas purification device for pig slaughtering lines. Background Technology

[0002] The malodorous exhaust gas from pig slaughtering lines is typically close to the ambient temperature of the workshop but has high relative humidity. This exhaust gas easily carries fine particles formed from washing water mist, blood droplets, grease aerosols, proteins, and tissue debris. It also contains odorous components such as ammonia, hydrogen sulfide, sulfur-containing organic compounds, amines, and small amounts of volatile organic compounds. Therefore, exhaust gas purification equipment is required. Current slaughterhouse exhaust gas treatment uses spray washing to remove some water-soluble malodorous substances. However, the exhaust gas after spraying is saturated with humidity. Although existing anti-condensation methods mostly involve separately configuring electric heating structures for insulators or introducing external hot air, this not only increases the overall energy consumption of the equipment but also requires additional supporting components, increasing the complexity of the purification equipment. The high-voltage terminals of the plasma treatment system may be in the same space as the high-humidity exhaust gas, causing contamination and moisture damage to the insulation components of the plasma high-voltage terminals, which will shorten the equipment maintenance cycle. Summary of the Invention

[0003] To address the shortcomings of existing technologies, this invention provides a low-temperature plasma exhaust gas purification device for pig slaughtering lines, thereby solving the problems mentioned in the background section.

[0004] To solve the above-mentioned technical problems, the present invention is achieved through the following technical solution: This invention relates to a low-temperature plasma exhaust gas purification device for a pig slaughtering line, specifically comprising a pre-droplet separation box, a low-temperature plasma reaction box, a tail-end catalytic purification box, and an induced draft fan, all connected sequentially along the exhaust gas flow direction, as well as two connecting hoods. Connecting hoods are installed between the pre-droplet separation box and the low-temperature plasma reaction box, and between the low-temperature plasma reaction box and the tail-end catalytic purification box. Insulating protective cavities are installed on both sides of the interior of the low-temperature plasma reaction box. Several purge ports are opened on the sides of the insulating protective cavities, and a dielectric encapsulation assembly is installed inside the insulating protective cavities. Multiple dielectric encapsulation plates are installed on the sides of the dielectric encapsulation assembly. The dielectric encapsulation plates penetrate the interior of the purge ports, and a micro-slit structure is formed between the outer side of the dielectric encapsulation plates and the purge ports. The exterior of the pre-droplet separation box... All are equipped with a high-frequency, high-voltage power supply box, and multiple heat dissipation ducts are opened on both sides of the outer side of the pre-droplet separation box; the high-frequency, high-voltage power supply box is equipped with a power supply module inside, and the high-frequency, high-voltage power supply box is located at the outer end of the heat dissipation duct; the top of the pre-droplet separation box is closed with a pull-out maintenance frame, and an ozone-resistant elastic sealing strip is set between the side of the pull-out maintenance frame and the pre-droplet separation box, and a traction plate is installed at the bottom of the pull-out maintenance frame; a dielectric conduction plate is installed at the bottom of both ends of the traction plate; a support crossbar is installed between the top and bottom of the two dielectric conduction plates, and the dielectric conduction plate is inserted into the side end of the dielectric encapsulation plate; dielectric discharge plate assemblies are evenly distributed on the upper and lower support crossbars, wherein adjacent dielectric discharge plate assemblies form parallel processing gaps.

[0005] Furthermore, a detachable primary filter is slidably inserted into the top of the pre-droplet separation box; the detachable primary filter is located inside the input end of the pre-droplet separation box; and a droplet collection box is installed on the inner bottom of the pre-droplet separation box.

[0006] Furthermore, the bottom of the droplet collection box is provided with a drain pipe, which runs through the bottom of the pre-droplet separation box. Positioning side plates are installed on both sides of the interior of the pre-droplet separation box.

[0007] Furthermore, the two positioning side plates are installed on the top of the droplet collection box, and multiple baffle plates and droplet collection covers are installed between the two positioning side plates.

[0008] Furthermore, the multiple baffle plates and droplet collection hoods are staggered from top to bottom, with the top edge of the lower droplet collection hood higher than the bottom edge of the upper baffle plate; a porous flow equalization plate is installed inside the pre-droplet separation box.

[0009] Furthermore, the porous flow equalization plate is located at the rear end of the exhaust gas after passing through the baffle plate and the droplet collection hood, and the porous flow equalization plate is provided with multiple evenly distributed guide holes; the guide holes have a conical structure, and the end with the larger diameter of the guide hole faces the direction of exhaust gas flow.

[0010] Furthermore, the bottom of the dielectric discharge plate assembly is provided with a non-discharge liquid guiding plate, and the edge of the dielectric discharge plate assembly is provided with a turbulence rod, wherein the bottom of the turbulence rod is connected to the non-discharge liquid guiding plate.

[0011] Furthermore, a second collection box is installed at the bottom inner side of the low-temperature plasma reaction chamber, and a drain pipe is installed at the bottom of the second collection box, with the bottom of the drain pipe penetrating through the bottom of the low-temperature plasma reaction chamber.

[0012] Furthermore, an induced draft fan is installed at the outer end of the tail-end catalytic purification box, wherein a fan blade drive module is installed inside the induced draft fan.

[0013] Furthermore, the interior of the tail-end catalytic purification box is equipped with a honeycomb catalytic unit, wherein the honeycomb catalytic unit includes a manganese oxide catalytic layer and a copper-manganese composite oxide catalytic layer for promoting ozone decomposition and further conversion of low-molecular-weight oxidation intermediates.

[0014] This invention provides a low-temperature plasma exhaust gas purification device for pig slaughtering lines, which has the following beneficial effects: In use, the high-voltage terminals and non-discharge insulated ends of the dielectric encapsulation assembly used for the discharge of the dielectric discharge board assembly are located in an independent insulating protection cavity. The exhaust gas only comes into contact with the interior of the insulating protection cavity through the gap formed by the purge port and the dielectric encapsulation plate, reducing the area of ​​direct contact between the exhaust gas and the high-voltage insulating components. The positive pressure warm air generated in the high-frequency high-voltage power supply box is discharged unidirectionally from the gap to the main channel inside the low-temperature plasma reaction chamber, realizing thermal protection and gas seal protection, reducing the backflow and deposition of moisture, protein aerosols and oil mist into the insulating protection cavity, reducing the impact of moisture in the exhaust gas on the dielectric encapsulation assembly, and ensuring the normal power supply operation of the dielectric discharge board assembly.

[0015] In addition, a non-discharge liquid guiding plate that does not participate in strong discharge is set at the bottom of the dielectric discharge plate assembly, so that a small amount of condensate is discharged along the path of the low non-discharge liquid guiding plate, reducing the probability of the liquid crossing the high field strength area and causing electric arc and carbonization traces, and reducing the moisture content in the exhaust gas.

[0016] In addition, when the exhaust gas flows through the baffle plate, the tiny droplets rely on inertial impact to converge on the surface of the baffle plate. Under the action of gravity, they flow into the droplet collection hood for centralized collection. The droplets carried by the exhaust gas are removed by separation, which does not increase the moisture content of the airflow and effectively solves the problem of excessive droplet load in the downstream plasma discharge zone. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings of the embodiments will be briefly described below.

[0018] The accompanying drawings described below are only related to some embodiments of the invention and are not intended to limit the invention.

[0019] In the attached diagram: Figure 1 A schematic diagram of the overall structure of the present invention is shown; Figure 2 A cross-sectional view of the pre-droplet separation chamber of the present invention is shown; Figure 3 A schematic diagram of the distribution structure of the baffled droplet collecting plate and the droplet collecting hood of the present invention is shown; Figure 4 A cross-sectional view of the porous flow equalization plate of the present invention is shown; Figure 5 A schematic diagram of the retractable maintenance frame and dielectric discharge plate assembly of the present invention in an unfolded state is shown. Figure 6 A cross-sectional view of the low-temperature plasma reaction chamber of the present invention is shown; Figure 7 A three-dimensional structural diagram of the dielectric encapsulation board of the present invention is shown; Figure 8 A three-dimensional structural schematic diagram of the dielectric discharge plate assembly of the present invention is shown; Figure 9 A cross-sectional view of the tail-end catalytic purification box of the present invention is shown.

[0020] List of reference numerals 1. Pre-filter for droplet separation; 101. Detachable pre-filter; 102. Droplet collection box one; 103. Positioning side plate; 104. Baffle plate for droplet formation; 105. Droplet collection cover; 106. Porous flow equalization plate; 107. Flow guide hole; 2. Low-temperature plasma reaction chamber; 201. Insulated protective cavity; 202. Purge port; 203. Dielectric encapsulation assembly; 204. Dielectric encapsulation plate; 205. High-frequency high-voltage power supply box; 206. Heat dissipation duct; 207. Pull-out maintenance frame; 208. Traction plate; 209. Dielectric conduction plate; 2010. Support crossbar; 2011. Dielectric discharge plate assembly; 2012. Non-discharge liquid guiding plate; 2013. Baffle bar; 2014. Collection box II; 3. Tail-end catalytic purification box; 301. Exhaust fan; 302. Honeycomb catalytic unit; 4. Connecting cover. Detailed Implementation

[0021] Please refer to Figures 1 to 9 : Example 1: This invention proposes a low-temperature plasma exhaust gas purification device for a pig slaughtering line, comprising a pre-droplet separation box 1, a low-temperature plasma reaction box 2, a tail-end catalytic purification box 3, and an induced draft fan 301 connected sequentially along the exhaust gas flow direction, as well as two connecting covers 4. Connecting covers 4 are installed between the pre-droplet separation box 1 and the low-temperature plasma reaction box 2, and between the low-temperature plasma reaction box 2 and the tail-end catalytic purification box 3. A detachable primary filter 101 is slidably inserted into the top of the pre-droplet separation box 1; the detachable primary filter 101 is located inside the input end of the pre-droplet separation box 1; a droplet collection box 102 is installed at the bottom inner side of the pre-droplet separation box 1; a drain pipe is provided at the bottom of the droplet collection box 102, which penetrates the bottom of the pre-droplet separation box 1. The two internal parts of the pre-droplet separation box 1... Positioning side plates 103 are installed on both sides; two positioning side plates 103 are installed on the top of the droplet collection box 102, and multiple baffle droplet plates 104 and droplet collection covers 105 are installed between the two positioning side plates 103; the multiple baffle droplet plates 104 and droplet collection covers 105 are staggered from top to bottom, and the top edge of the lower droplet collection cover 105 is higher than the bottom edge of the upper baffle droplet plate 104; a porous flow equalization plate 106 is installed inside the pre-droplet separation box 1; the porous flow equalization plate 106 is located at the rear end of the exhaust gas after passing through the baffle droplet plates 104 and droplet collection covers 105, and the porous flow equalization plate 106 is provided with multiple evenly distributed guide holes 107; the guide holes 107 have a conical structure, and the end with the larger diameter of the guide hole 107 faces the direction of exhaust gas flow.

[0022] In this embodiment of the invention, a detachable primary filter 101 is inserted and installed inside the pre-droplet separation box 1, facilitating maintenance and replacement of the detachable primary filter 101. After the detachable primary filter 101 is inserted into the pre-droplet separation box 1, the exhaust gas flows through the input end of the pre-droplet separation box 1 and continuously flows through the detachable primary filter 101. The detachable primary filter 101 traps larger solids and lint in the exhaust gas. After the initial filtration, the exhaust gas passes through the baffle plate 104 and the droplet collection hood 105 fixed by two positioning side plates 103, and then passes through multiple baffles to collect the droplets. The drip plate 104 causes tiny droplets to gather on the baffle plate 104 due to inertial impact, and then the aggregated liquid is guided by gravity to the droplet collection hood 105, which does not increase the moisture content of the exhaust gas. After the liquid is collected by multiple droplet collection hoods 105, it is guided to the interior of the droplet collection box 102, and the drain pipe at the bottom of the box discharges the collected liquid. The guide holes 107 on the porous flow equalization plate 106 guide the exhaust gas. The conical structure of the guide holes 107 makes the airflow evenly dispersed, and the exhaust gas flow rate is the same in each part of the plasma area, resulting in a more uniform purification effect.

[0023] In Example 2, based on Example 1, an insulating protective cavity 201 is installed on both sides of the interior of the low-temperature plasma reaction chamber 2. Several purge ports 202 are opened on the sides of the insulating protective cavity 201, and a dielectric encapsulation assembly 203 is installed inside the insulating protective cavity 201. Multiple dielectric encapsulation plates 204 are installed on the sides of the dielectric encapsulation assembly 203. The dielectric encapsulation plates 204 penetrate the interior of the purge ports 202, and a micro-slit structure is formed between the outer side of the dielectric encapsulation plates 204 and the purge ports 202. High-frequency high-voltage power supply boxes 205 are installed on both sides of the exterior of the pre-droplet separation chamber 1, and multiple heat dissipation ducts 206 are opened on both sides of the exterior of the pre-droplet separation chamber 1. A power supply module is installed inside the high-frequency high-voltage power supply box 205, and the high-frequency high-voltage power supply box 205 is located at the outer end of the heat dissipation duct 206. A pull-out maintenance frame is closed on the top of the pre-droplet separation chamber 1. The frame 207 is a retractable maintenance frame. An ozone-resistant elastic sealing strip is provided between the side of the retractable maintenance frame 207 and the front droplet separation box 1. A traction plate 208 is installed at the bottom of the retractable maintenance frame 207. A medium conduction plate 209 is installed at the bottom of both ends of the traction plate 208. A support crossbar 2010 is installed between the top and bottom of the two medium conduction plates 209, and the medium conduction plates 209 are inserted into the side end of the medium encapsulation plate 204. A uniformly distributed medium discharge plate assembly 2011 is installed on the upper and lower support crossbars 2010, wherein a parallel processing gap is formed between adjacent medium discharge plate assemblies 2011. A non-discharge non-discharge liquid guiding plate 2012 is provided at the bottom of the medium discharge plate assembly 2011, and a turbulence rod 2013 is provided at the edge of the medium discharge plate assembly 2011, wherein the bottom of the turbulence rod 2013 is connected to the non-discharge liquid guiding plate 2012.A collection box 2014 is installed at the bottom inner side of the low-temperature plasma reaction chamber 2. A drain pipe is installed at the bottom of the collection box 2014, and the bottom of the drain pipe runs through the bottom of the low-temperature plasma reaction chamber 2. The exhaust gas, after being treated inside the pre-droplet separation chamber 1, flows into the interior of the low-temperature plasma reaction chamber 2 through the connecting hood 4. Temperature and humidity sensors are installed at the exhaust gas inlet and outlet of the low-temperature plasma reaction chamber 2. The pull-out maintenance frame 207 drives the dielectric conduction plates 209 at both ends of the traction plate 208 to be inserted into the side end of the dielectric encapsulation plate 204. This causes the dielectric conduction plate 209 to drive the dielectric discharge plate assembly 2011 on the support crossbar 2010 to be positioned in the main processing channel inside the low-temperature plasma reaction chamber 2. Meanwhile, the insulating protection cavity 201 protects the dielectric encapsulation assembly 203. By controlling the dielectric encapsulation assembly 203 through the dielectric encapsulation plate 204, the dielectric conduction plate 209, and the support crossbar 2010, the dielectric discharge plate assembly 2011 discharges, generating high-energy electrons, free radicals, excited-state particles, and ozone, which cause various odor molecules to break bonds and oxidize. Simultaneously, the heat generated by the power supply module inside the high-frequency high-voltage power supply box 205 enters the interior of the insulating protection cavity 201 through the heat dissipation duct 206. The hot air then flows out through the gap between the dielectric encapsulation plate 204 and the purge port 202, causing the hot air to blow away the exhaust gas. The high-voltage terminals and non-discharge plate tails of the dielectric discharge plate assembly 2011 are all hidden inside the insulating protection cavity 201, avoiding direct contact with the high-humidity and odorous exhaust gas. The hot air forms a positive pressure barrier to prevent moisture intrusion and reduce the amount of exhaust gas entering the insulating protection cavity 201. To prevent internal corrosion and ensure the normal operation of the dielectric encapsulation component 203, which is unaffected by moisture in the exhaust gas, the baffle rod 2013 on the dielectric discharge plate assembly 2011 turbulently turbulently controls the exhaust gas flow, preventing excessively fast flow that could lead to poor purification. Some of the water vapor generated during purification, as well as the condensate on the dielectric discharge plate assembly 2011 due to temperature differences, is guided through the non-discharge liquid guiding plate 2012 to the inside of the collection box 2014. This facilitates the centralized discharge of the liquid through the bottom drain pipe for further treatment.

[0024] In Example 3, based on Example 1, an induced draft fan 301 is installed at the outer end of the tail-end catalytic purification box 3. The induced draft fan 301 has a fan blade drive module installed inside. The tail-end catalytic purification box 3 has a honeycomb catalytic unit 302 installed inside. The honeycomb catalytic unit 302 includes a manganese oxide catalytic layer and a copper-manganese composite oxide catalytic layer for promoting ozone decomposition and further conversion of low-molecular-weight oxidation intermediates. The negative pressure generated by the operation of the induced draft fan 301 causes the exhaust gas to flow through the pre-droplet separation box 1 and the low-temperature plasma reaction box 2. The exhaust gas after plasma treatment flows into the interior of the tail-end catalytic purification box 3 through another connecting hood 4. The honeycomb catalytic unit 302 consumes the residual ozone after the plasma reaction and promotes the continued conversion of some oxidation intermediates such as aldehydes, ketones, and organic acids, reducing the risk of by-product emissions when using low-temperature plasma alone and facilitating the discharge of purified exhaust gas.

[0025] The working principle of this embodiment is as follows: The negative pressure generated by the operation of the induced draft fan 301 causes the exhaust gas to flow through the input end of the pre-filter 1 and continuously flow through the detachable primary filter 101. The detachable primary filter 101 traps larger solids and lint in the exhaust gas. Multiple baffles 104 cause fine droplets to accumulate due to inertial impact. Then, gravity guides the agglomerated liquid into the droplet collection hood 105. The conical guide holes 107 on the porous flow equalization plate 106 ensure uniform airflow. The waste gas is dispersed and evenly flows through the connecting hood 4 into the low-temperature plasma reaction chamber 2. The pull-out maintenance frame 207 drives the dielectric conduction plates 209 at both ends of the traction plate 208 to be inserted into the side end of the dielectric encapsulation plate 204. The dielectric conduction plates 209 drive the dielectric discharge plate assembly 2011 on the support crossbar 2010 to be positioned on the main processing channel inside the low-temperature plasma reaction chamber 2. The insulating protection cavity 201 protects the dielectric encapsulation assembly 203 and controls the dielectric encapsulation assembly 203 to pass through the dielectric encapsulation plate 204. 4. The dielectric conduction plate 209 and the supporting crossbar 2010 cause the dielectric discharge plate assembly 2011 to generate high-energy electrons, causing various odor molecules to break bonds, oxidize, and recombine. At the same time, the heat generated by the power supply module inside the high-frequency high-voltage power supply box 205 enters the insulating protection cavity 201 through the heat dissipation duct 206 and then flows out through the gap between the dielectric encapsulation plate 204 and the purge port 202. The hot airflow blows the exhaust gas, and the dielectric encapsulation assembly 203 is not affected by the moisture in the exhaust gas. The turbulence rod 2013 turbulents the exhaust gas. The condensate generated on the dielectric discharge plate assembly 2011 due to the temperature difference is guided to the collection box 2014 through the non-discharge liquid guide plate 2012. The exhaust gas after plasma treatment flows to the tail-end catalytic purification box 3 through another connecting cover 4. The honeycomb catalytic unit 302 consumes the residual ozone after the plasma reaction and promotes the continued conversion of some oxidation intermediates such as aldehydes, ketones, and organic acids, reducing the risk of by-product emissions when using low-temperature plasma alone. The purified exhaust gas is discharged.

Claims

1. A low-temperature plasma exhaust gas purification device for a pig slaughtering line, comprising a pre-droplet separation box (1), a low-temperature plasma reaction box (2), a tail-end catalytic purification box (3), and an induced draft fan (301) connected sequentially along the exhaust gas flow direction, and two connecting hoods (4), wherein connecting hoods (4) are installed between the pre-droplet separation box (1) and the low-temperature plasma reaction box (2) and between the low-temperature plasma reaction box (2) and the tail-end catalytic purification box (3); characterized in that, The low-temperature plasma reaction chamber (2) has insulating protective cavities (201) installed on both sides of its interior. Several purge ports (202) are provided on the side of the insulating protective cavity (201), and a dielectric encapsulation assembly (203) is installed inside the insulating protective cavity (201). Several dielectric encapsulation plates (204) are installed on the side of the dielectric encapsulation assembly (203). The dielectric encapsulation plate (204) penetrates the interior of the purge port (202), and a micro-slit structure is formed between the outer side of the dielectric encapsulation plate (204) and the purge port (202). The pre-droplet separation chamber (1) has high-frequency high-voltage power supply boxes (205) installed on both sides of its exterior. Several heat dissipation ducts (206) are provided on both sides of the pre-droplet separation chamber (1). The high-frequency high-voltage power supply box (205) has a power supply module installed inside, and the high-frequency high-voltage power supply box (205) has multiple heat dissipation ducts (206) on both sides of its exterior. 205) Located at the outer end of the heat dissipation duct (206); the top of the pre-droplet separation box (1) is closed and equipped with a pull-out maintenance frame (207), and an ozone-resistant elastic sealing strip is provided between the side of the pull-out maintenance frame (207) and the pre-droplet separation box (1), and a traction plate (208) is installed at the bottom of the pull-out maintenance frame (207); a dielectric conduction plate (209) is installed at the bottom of both ends of the traction plate (208); a support crossbar (2010) is installed between the top and bottom of the two dielectric conduction plates (209), and the dielectric conduction plate (209) is inserted into the side end of the dielectric encapsulation plate (204); a uniformly distributed dielectric discharge plate assembly (2011) is installed on the upper and lower support crossbars (2010), wherein a parallel processing gap is formed between adjacent dielectric discharge plate assemblies (2011).

2. The low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 1, characterized in that, A detachable primary filter (101) is slidably inserted into the top of the pre-droplet separation box (1); the detachable primary filter (101) is located inside the input end of the pre-droplet separation box (1); a droplet collection box (102) is installed on the bottom inner side of the pre-droplet separation box (1).

3. The low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 2, characterized in that, The bottom of the droplet collection box (102) is provided with a drain pipe, which runs through the bottom of the pre-droplet separation box (1). Positioning side plates (103) are installed on both sides of the interior of the pre-droplet separation box (1).

4. The low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 3, characterized in that, The two positioning side plates (103) are installed on the top of the droplet collection box (102), and multiple baffle plates (104) and droplet collection covers (105) are installed between the two positioning side plates (103).

5. The low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 4, characterized in that, The multiple baffles and droplet collecting plates (104) and droplet collecting hoods (105) are staggered from top to bottom, and the top edge of the droplet collecting hood (105) is higher than the bottom edge of the baffles and droplet collecting plates (104) above; the interior of the pre-droplet separation box (1) is equipped with a porous flow equalization plate (106).

6. The low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 5, characterized in that, The porous flow equalization plate (106) is located at the rear end of the exhaust gas after passing through the baffle plate (104) and the droplet collection hood (105), and the porous flow equalization plate (106) is provided with a plurality of evenly distributed guide holes (107); the guide holes (107) are conical structures, and the end with the larger diameter of the guide hole (107) faces the direction of exhaust gas flow.

7. A low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 6, characterized in that, The dielectric discharge plate assembly (2011) has a non-discharge non-discharge liquid guiding plate (2012) at its bottom, and a turbulence rod (2013) is provided at the edge of the dielectric discharge plate assembly (2011), wherein the bottom of the turbulence rod (2013) is connected to the non-discharge liquid guiding plate (2012).

8. The low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 7, characterized in that, The inner bottom of the low-temperature plasma reaction chamber (2) is equipped with a collection box 2 (2014), and a drain pipe is installed at the bottom of the collection box 2 (2014). The bottom of the drain pipe penetrates the bottom of the low-temperature plasma reaction chamber (2).

9. A low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 8, characterized in that, The outer end of the tail-end catalytic purification box (3) is equipped with an induced draft fan (301), wherein the induced draft fan (301) is equipped with a fan blade drive module.

10. A low-temperature plasma exhaust gas purification device for a pig slaughtering line according to claim 9, characterized in that, The tail-end catalytic purification box (3) is equipped with a honeycomb catalytic unit (302), wherein the honeycomb catalytic unit (302) includes a manganese oxide catalytic layer and a copper-manganese composite oxide catalytic layer for promoting ozone decomposition and further conversion of low molecular weight oxidation intermediates.

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