Implant machining method, conical electrode and implant internal taper machining device

Abstract

The application relates to the technical field of implant processing, and provides an implant processing method, a conical electrode and an implant inner conical surface processing device, which comprises the following processing steps: step S1: preparing a to-be-processed implant with electric conductivity; step S2: processing a guide hole on an end face of the to-be-processed implant, the guide hole extending along the axial direction of the to-be-processed implant and forming an opening on the end face; step S3: processing a preliminary inner conical surface at the opening of the guide hole by using a grinding tool, the preliminary inner conical surface being communicated with the guide hole; step S4: providing a conical electrode; the conical electrode comprises an insulating guide column and a conductive outer conical part connected with the insulating guide column, the insulating guide column is inserted into the guide hole, and the conductive outer conical part is inserted into a hole cavity surrounded by the preliminary inner conical surface; and step S5: connecting the to-be-processed implant and the conical electrode to two poles of a pulse power source respectively.

Description

Technical Field

[0001] This invention belongs to the technical field of implant processing, and more specifically, relates to an implant processing method, a conical electrode, and an implant internal conical surface processing device. Background Technology

[0002] In the prior art, dental implants typically include an implant body (i.e., an implant) and an abutment. The implant body is inserted into the alveolar bone, and the abutment is mounted on top of the implant body. The crown restoration structure can be mounted onto the implant body through the abutment. To improve the stability of the connection between the implant body and the abutment, the upper end of the implant body is usually provided with an inner conical cavity, and the lower part of the abutment is provided with an outer conical part, which can be inserted into the inner conical cavity (see the cavity in Chinese Patent CN224269471U). When the outer conical part of the lower part of the abutment is inserted into the inner conical cavity at the upper end of the implant body, the outer conical surface of the outer conical part can fit with the inner conical surface of the inner conical cavity, so that the abutment can be positioned, limited, and supported through the cooperation between the inner conical cavity and the outer conical part. For example, Chinese patent CN203029412U discloses a three-segment dental implant, which includes an implant body, an abutment, and a central bolt connecting the implant body and the abutment. The implant body has an internal cavity, and a connecting structure is provided in the internal cavity. The connecting structure includes a conical hole starting from the neck, and an outer conical surface matching the conical hole is provided at the lower part of the abutment.

[0003] The inner wall of the existing internal conical cavity typically requires a machine tool to insert a cutting tool into the implant (see Chinese Patent (Publication No.) CN104523342A, which describes the machining of implants using a CNC machine tool). The tool then cuts along a predetermined path. However, due to the small size of dental implants and the fact that the internal conical cavity is located inside the implant, the actual space for the cutting tool to enter and move is limited. Furthermore, the clamping of the implant and the cutting of the tool are difficult to control during machining. Therefore, using conventional machine tool cutting methods to machine the internal conical surface of the implant is not only cumbersome in terms of machine tool setup and actual machining difficulty of the internal conical cavity, but also results in long processing times per piece and low processing efficiency, which is detrimental to the stable mass production of dental implants. Summary of the Invention

[0004] The purpose of this invention is to provide an implant processing method to solve the technical problems of high processing difficulty and low efficiency when processing the conical cavity inside the implant using machine tools in the prior art.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is: to provide an implant processing method, comprising the following processing steps: Step S1: Prepare a conductive implant for processing; Step S2: A guide hole is machined on the end face of the implant to be processed. The guide hole extends along the axial direction of the implant to be processed and forms an opening on the end face. Step S3: A preliminary inner conical surface is machined at the opening of the guide hole using a grinding tool. The preliminary inner conical surface is connected to the guide hole. The guide hole, the preliminary inner conical surface, and the target inner conical surface to be formed are coaxially arranged. The preliminary inner conical surface is located radially inside the target inner conical surface to be formed, and a pre-reserved machining allowance is formed between the preliminary inner conical surface and the target inner conical surface to be formed. Step S4: Provide a conical electrode; the conical electrode includes an insulating guide post and a conductive outer cone connected to the insulating guide post, the insulating guide post is inserted into the guide hole, and the conductive outer cone is inserted into the cavity formed by the preliminary inner cone surface; adjust the position of the insulating guide post in the guide hole so that there is a discharge gap between the conductive outer cone and the preliminary inner cone surface, and fill the discharge gap with insulating liquid; Step S5: Connect the implant to be processed and the conical electrode to the two poles of the pulse power supply respectively, and remove the reserved processing allowance by spark discharge between the conductive outer cone and the preliminary inner cone to form the target inner cone; wherein, the taper of the conductive outer cone is consistent with the taper of the target inner cone.

[0006] Furthermore, the guide hole is a threaded hole.

[0007] Furthermore, the step of machining the preliminary inner conical surface in step S3 includes: using one or more grinding tools to grind the opening of the guide hole multiple times to gradually form the preliminary inner conical surface.

[0008] Furthermore, the conductive outer cone portion is coaxially arranged with the insulating guide post, and the axis of the conductive outer cone portion coincides with the axis of the guide hole when the insulating guide post is inserted into the guide hole.

[0009] Furthermore, during the spark discharge process between the conductive outer cone and the preliminary inner cone, the conical electrode is fed in a predetermined direction to process the preliminary inner cone by the conductive outer cone; the predetermined direction is: along the axial direction of the guide hole and from the opening of the guide hole toward the interior of the implant to be processed.

[0010] Furthermore, the grinding tool is a tapered forming tool, which grinds the initial inner tapered surface at the opening of the guide hole.

[0011] Furthermore, the implant to be processed is a single piece made of elemental titanium or titanium alloy.

[0012] Further, after step S5, the target inner conical surface is polished.

[0013] The present invention also provides a conical electrode for processing the conical surface of an implant, the conical electrode being used to implement the implant processing method; the conical electrode includes: an insulating guide post and a conductive outer cone portion; The insulating guide post is used to be inserted into the guide hole of the implant to be processed; The conductive outer cone is connected to one end of the insulating guide post; the conductive outer cone is used to insert into the cavity formed by the preliminary inner cone surface of the implant to be processed and remove the reserved processing allowance by spark discharge. The taper of the conductive outer cone is consistent with the taper of the target inner cone surface of the implant to be processed.

[0014] The present invention also provides an in-plant conical surface processing device, comprising: a pulse power supply, a fixture, a feed mechanism, and the conical electrode; The clamp is used to fix the implant to be processed; the feeding mechanism is used to drive the tapered electrode to feed relative to the implant along the axial direction of the guide hole of the implant to be processed. The two poles of the pulse power supply are electrically connected to the implant to be processed and the conical electrode, respectively. The pulse power supply can generate spark discharge between the conductive outer cone of the conical electrode and the preliminary inner cone surface of the implant to be processed.

[0015] The beneficial effects of the implant processing method provided by this invention are as follows: Compared with the prior art, the implant processing method provided by this invention first processes a guide hole on the end face of the implant to be processed, and extends the guide hole along the axial direction of the implant to be processed, with the guide hole forming an opening on the end face, which provides a clear entry position and reference for subsequent processing; a preliminary inner conical surface is processed at the opening of the guide hole using a grinding tool, and the space within the cavity enclosed by the preliminary inner conical surface is connected to the guide hole; the preliminary inner conical surface and the guide hole are coaxially arranged; in the axial direction of the preliminary inner conical surface, in a cross section at any position on the axis passing through the preliminary inner conical surface and perpendicular to the axis of the preliminary inner conical surface, the radial dimension of the preliminary inner conical surface is smaller than the radial dimension of the target inner conical surface, thereby reserving an electrical discharge machining allowance (i.e., a machining allowance) on the preliminary inner conical surface; the preliminary inner conical surface retains a machining allowance in the radial direction perpendicular to the axis of the preliminary inner conical surface relative to the target inner conical surface; the grinding tool only needs to process the basic shape of the preliminary inner conical surface first, without needing to process the entire size of the target inner conical surface at once, reducing the reliance on the grinding tool for fine cutting. The difficulty lies in providing a tapered electrode, which includes an insulating guide post and a conductive outer cone connected to the insulating guide post. The insulating guide post is inserted into a guide hole, and the conductive outer cone is inserted into the cavity formed by the initial inner cone surface. The insulating guide post provides stable guidance for the conductive outer cone to enter the initial inner cone surface, and the cooperation between the insulating guide post and the guide hole guides the movement of the conductive outer cone, allowing it to approach the area corresponding to the inner cone surface to be formed. The position of the insulating guide post within the guide hole is adjusted to allow discharge between the conductive outer cone and the initial inner cone surface. The gap is filled with insulating liquid; the implant to be processed and the conical electrode are then connected to the two poles of the pulse power supply respectively. The electrical discharge finishing allowance is removed by spark discharge between the conductive outer cone and the preliminary inner cone, and the target inner cone is finally formed. Since the taper of the conductive outer cone is consistent with the taper of the target inner cone, the shape of the target inner cone can be directly formed by the conductive outer cone during the discharge process, instead of relying on the grinding tool to repeatedly cut at local points to gradually approach it. The processing process is more direct, reduces the processing difficulty, and improves the processing efficiency. Attached Figure Description

[0016] Figure 1 A flowchart of an implant processing method provided in an embodiment of the present invention; Figure 2 This is a three-dimensional schematic diagram of the processed implant provided in an embodiment of the present invention; Figure 3 This is a front view of the processed implant provided in an embodiment of the present invention; Figure 4 for Figure 3 Sectional view of AA; Figure 5A three-dimensional schematic diagram of a cutting tool for machining a guide hole provided in an embodiment of the present invention; Figure 6 A cross-sectional view of a tapered electrode inserted into a cavity formed by a preliminary inner tapered surface, as provided in an embodiment of the present invention; Figure 7 A cross-sectional view of the tapered electrode provided in an embodiment of the present invention; Figure 8 A perspective view of the implant to be processed and polished according to an embodiment of the present invention; Figure 9 This is a cross-sectional view of the implant to be processed and its fit with the abutment, provided in an embodiment of the present invention. Figure 10 The actual cut surface of the implant to be processed according to the embodiments of the present invention. Figure 1 ; Figure 11 The actual cut surface of the implant to be processed according to the embodiments of the present invention. Figure 2 .

[0017] The following are the labeling elements in the figure: 1-Implant to be processed; 11-Guide hole; 12-Target inner conical surface; 12a-Preliminary inner conical surface; 2-Conical electrode; 21-Insulating guide post; 22-Conductive outer conical part. Detailed Implementation

[0018] It should be noted that the specific embodiments are only used to explain the present invention and are not intended to limit the present invention.

[0019] It should be noted that, in the description of the embodiments of this application, unless otherwise stated, " / " means "or". For example, A / B can mean A or B. The "and / or" in this document is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Here, A and B can be singular or plural, respectively.

[0020] It should be noted that when a component is referred to as "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as "connected to" or "attached to" another component, it can be directly connected to or indirectly connected to that other component. When a component is referred to as "fixed to" or "set on" another component, it can be directly on or indirectly on that other component.

[0021] It should be noted that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0022] It should be noted that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include one or more of that feature.

[0023] It should be noted that the term "multiple" means two or more, unless otherwise explicitly specified.

[0024] Please refer to the following: Figures 1 to 7 The implant processing method provided by the present invention will now be described. The implant processing method includes the following processing steps: Step S1: Prepare an implant 1 to be processed that has electrical conductivity; Step S2: Process a guide hole 11 on the end face of the implant 1 to be processed, the guide hole 11 extends along the axial direction of the implant 1 to be processed and forms an opening on the end face; Step S3: Use a grinding tool to process a preliminary inner conical surface 12a at the opening of the guide hole 11, the preliminary inner conical surface 12a is connected to the guide hole 11; the guide hole 11, the preliminary inner conical surface 12a and the target inner conical surface 12 to be formed are coaxially arranged; the preliminary inner conical surface 12a is located radially inside the target inner conical surface 12 to be formed, and a pre-reserved processing allowance is formed between the preliminary inner conical surface 12a and the target inner conical surface 12 to be formed; Step S4: Provide a tapered shape Electrode 2; The conical electrode 2 includes an insulating guide post 21 and a conductive outer cone portion 22 connected to the insulating guide post 21. The insulating guide post 21 is inserted into the guide hole 11, and the conductive outer cone portion 22 is inserted into the cavity formed by the preliminary inner cone surface 12a. The position of the insulating guide post 21 in the guide hole 11 is adjusted so that there is a discharge gap between the conductive outer cone portion 22 and the preliminary inner cone surface 12a, and the discharge gap is filled with insulating liquid. Step S5: The implant to be processed 1 and the conical electrode 2 are respectively connected to the two poles of the pulse power supply. The reserved processing allowance is removed by spark discharge between the conductive outer cone portion 22 and the preliminary inner cone surface 12a to form the target inner cone surface 12. The taper of the conductive outer cone portion 22 is consistent with the taper of the target inner cone surface 12.

[0025] Thus, a guide hole 11 is first machined on the end face of the implant 1 to be processed, and the guide hole 11 extends along the axial direction of the implant 1 to be processed, and the guide hole 11 forms an opening on the end face, which provides a clear entry position and reference for subsequent processing; a preliminary inner conical surface 12a is machined at the opening of the guide hole 11 using a grinding tool (in one embodiment, the grinding tool is mounted on a CNC machine tool), and the space inside the cavity enclosed by the preliminary inner conical surface 12a is connected to the guide hole 11; the preliminary inner conical surface 12a and the guide hole 11 are coaxially arranged; on the axial direction of the preliminary inner conical surface 12a, at any position on the axis passing through the preliminary inner conical surface 12a and perpendicular to the axis of the preliminary inner conical surface 12a... Within the cross-section, the radial dimension of the preliminary inner conical surface 12a is smaller than that of the target inner conical surface 12, thus reserving an electrical discharge finishing allowance (i.e., a machining allowance) on the preliminary inner conical surface 12a; relative to the target inner conical surface 12, the preliminary inner conical surface 12a retains a machining allowance in the radial direction perpendicular to the axis of the preliminary inner conical surface 12a; the grinding tool only needs to machine the basic shape of the preliminary inner conical surface 12a first, without needing to machine all the dimensions of the target inner conical surface 12 at once, reducing the difficulty of fine cutting solely relying on the grinding tool; then a conical electrode 2 is provided, the conical electrode 2 including an insulating guide post 21 and a conductive outer conical portion 22 connected to the insulating guide post 21, the insulating The guide post 21 is inserted into the guide hole 11, and the conductive outer cone 22 is inserted into the cavity formed by the preliminary inner cone surface 12a. The insulating guide post 21 provides stable guidance for the conductive outer cone 22 to enter the preliminary inner cone surface 12a, and the cooperation between the insulating guide post 21 and the guide hole 11 guides the movement of the conductive outer cone 22, allowing the conductive outer cone 22 to approach the area corresponding to the inner cone surface to be formed. The position of the insulating guide post 21 in the guide hole 11 is adjusted to create a discharge gap between the conductive outer cone 22 and the preliminary inner cone surface 12a. The discharge gap is filled with insulating liquid. Then, the implant to be processed 1 and the conical electrode 2 are connected to the two poles of the pulse power supply, respectively, and the discharge is achieved through the guide post 21. The spark discharge between the conductive outer cone 22 and the preliminary inner cone surface 12a removes the spark finishing allowance, ultimately forming the target inner cone surface 12. (In one embodiment, the user can adjust the position of the conductive outer cone 22 to change the size of the discharge gap while simultaneously discharging through the conductive outer cone 22 to process the preliminary inner cone surface 12a via spark discharge.) Since the taper of the conductive outer cone 22 is consistent with the taper of the target inner cone surface 12, the shape of the target inner cone surface 12 can be directly formed by the conductive outer cone 22 during the discharge process, rather than relying on repeated cutting at local points by a grinding tool to gradually approximate it. This makes the processing more direct, reduces processing difficulty, and improves processing efficiency.

[0026] In one embodiment, the discharge gap is 0.01 to 0.1 mm.

[0027] Taper refers to the ratio of the diameter of the base of a cone to its height.

[0028] In one embodiment, the insulating liquid is kerosene. In another embodiment, after a predetermined time has electrified the conductive outer cone 22, debris can be removed by replacing the insulating liquid.

[0029] In one embodiment, the pulse power supply is a power supply device that outputs intermittent pulse voltage or pulse current to the discharge gap between the tool electrode and the workpiece. In one embodiment, the pulse power supply can be found in Chinese Patent CN201211583Y or Chinese Patent CN100357053C.

[0030] In one embodiment, the processing of a conductive object by electrode discharge can be found in: (US Patent No.: US3167631A; Subject: Method of and apparatus for electroerosiongrinding; Publication Date: 1965-01-26), (Chinese Patent No.: CN1810427A; Subject: Method and apparatus for electro-discharge machining of turbine blades; Publication Date: 2006-08-02), and (Chinese Patent No.: CN104736284A; Subject: Method for electro-discharge machining; Publication Date: 2015-06-24).

[0031] In one embodiment, the outer cone 22 has multiple spirally extending grooves on its conical surface, filled with an insulating layer. Adjacent grooves form conical ridges that participate in electrical spark discharge. The outer contour taper of the conical ridges matches the taper of the target inner cone 12 of the implant 1 to be processed. The user can rotate the conical electrode 2 to orient the conical ridges towards different positions on the initial inner cone 12a. Thus, the outer cone 22 is divided by grooves to form multiple discrete conical ridges, providing multiple separate discharge surfaces during electrical spark discharge, allowing the user to control the specific discharge location. Furthermore, the spirally extending grooves create spiral edges on the conical ridges, which disperse the heat generated by the electrical spark along a curved path, facilitating heat dissipation and reducing the risk of cracking due to thermal expansion and contraction at the edges of the conical ridges during discharge. The insulating layer within the grooves allows the conical ridges to become the primary area participating in electrical spark discharge. Since the outer contour taper of the conical ridge is consistent with the taper of the target inner conical surface 12 of the implant to be processed, the conical ridge can ensure the taper of the target inner conical surface 12 during electrical discharge machining.

[0032] In one embodiment, the width of the groove alternately widens and narrows along its extension direction. This allows the inner wall of the groove to release its own stress during heating.

[0033] In one embodiment, the insulating layer is an elastic layer, and the outer surface of the insulating layer is lower than the ridge of the conical surface. In this way, the elastic insulating layer provides elastic support during the heating of the inner wall of the groove, and the insulating layer does not rigidly impede the deformation of the inner wall of the groove itself; the lower insulating layer is less likely to scrape against the initial inner conical surface 12a to prevent discharge at the ridge of the conical surface.

[0034] In one embodiment, after processing the target inner conical surface 12 of a batch of implants 1, the conductive outer conical portion 22 of the conical electrode 2 is inspected. Since the target inner conical surface 12 is processed using the conductive outer conical portion 22 via electrical discharge machining, the taper of the target inner conical surface 12 matches the size of the conductive outer conical portion 22. When the taper size of the conductive outer conical portion 22 is qualified and there are no damages or surface quality issues, it indicates that the size and quality of this batch of target inner conical surfaces 12 are qualified. This greatly improves the inspection efficiency of implants, easily ensures the accuracy and processing speed of the inner conical portion of the implant, and makes the outer conical portion easier to measure, reducing implant loss during the inspection process.

[0035] In one embodiment, the guide hole 11 is a columnar hole. In another embodiment, the guide hole 11 and the implant 1 to be processed are coaxially arranged.

[0036] Further, please refer to Figures 1 to 7 In one specific embodiment of the implant processing method provided by the present invention, the guide hole 11 is a threaded hole. Thus, the guide hole 11 can both cooperate with the insulating guide post 21 to provide guidance, and can also be threadedly connected to the subsequent abutment to fix the abutment.

[0037] Further, please refer to Figures 1 to 7 As a specific embodiment of the implant processing method provided by the present invention, the step of processing the preliminary inner conical surface 12a in step S3 includes: using one or more grinding tools to grind the opening of the guide hole 11 multiple times to gradually form the preliminary inner conical surface 12a. In this way, multiple grinding tools can be used to grind sequentially, so that each grinding carries a portion of the processing volume, and the formation process of the preliminary inner conical surface 12a will be more stable.

[0038] In one embodiment, the preliminary inner conical surface 12a and the target inner conical surface 12 to be formed are coaxially arranged. This facilitates the sequential machining of the preliminary inner conical surface 12a and the target inner conical surface 12.

[0039] In one embodiment, the reserved machining allowance is the radial machining allowance reserved by the preliminary inner conical surface 12a relative to the target inner conical surface 12 along the guide hole 11. In this way, the preliminary inner conical surface 12a retains a radial reserved machining allowance relative to the axis of the guide hole 11 relative to the target inner conical surface 12, avoiding direct machining to the final size during the grinding stage, and preventing the target inner conical surface 12 from being unable to be corrected by spark discharge due to grinding errors.

[0040] Further, please refer to Figures 1 to 7 In one specific embodiment of the implant processing method provided by the present invention, the conductive outer cone portion 22 is coaxially arranged with the insulating guide post 21, and the axis of the conductive outer cone portion 22 coincides with the axis of the guide hole 11 when the insulating guide post 21 is inserted into the guide hole 11. Thus, after the insulating guide post 21 is inserted into the guide hole 11, the guide hole 11 can restrict the radial position of the insulating guide post 21, and since the conductive outer cone portion 22 is coaxially arranged with the insulating guide post 21, the conductive outer cone portion 22 will not be misaligned relative to the insulating guide post 21. Therefore, when removing the electrical discharge finishing allowance through spark discharge between the conductive outer cone portion 22 and the preliminary inner cone surface 12a, the target inner cone surface 12 is less likely to experience excessive removal on one side and insufficient removal on the other side due to the conductive outer cone portion 22 deviating from the axis of the guide hole 11.

[0041] Further, please refer to Figures 1 to 7 As a specific embodiment of the implant processing method provided by the present invention, during the spark discharge process between the conductive outer cone 22 and the preliminary inner cone surface 12a, the conical electrode 2 is fed in a predetermined direction to process the preliminary inner cone surface 12a by the conductive outer cone 22; the predetermined direction is: along the axial direction of the guide hole 11 and from the opening of the guide hole 11 toward the interior of the implant 1 to be processed. Thus, during the electrical discharge finishing process, by feeding the conical electrode 2 along the axial direction of the guide hole 11 relative to the implant 1 to be processed, the movement direction of the conical electrode 2 can be kept in correspondence with the axial direction of the guide hole 11; since the guide hole 11 itself is set along the axial direction of the implant 1 to be processed, when the conical electrode 2 is fed along the axial direction of the guide hole 11, the direction in which the conductive outer cone 22 enters the preliminary inner cone surface 12a is clearer, and there is no need to frequently adjust the complex feed angle during the processing; as the conical electrode 2 is fed relative to the implant 1 to be processed, the conductive outer cone 22 can gradually approach and act on the preliminary inner cone surface 12a, and the shaping and finishing are completed by electrical discharge finishing.

[0042] Further, please refer to Figures 1 to 7 In one specific embodiment of the implant processing method provided by the present invention, the grinding tool is a conical forming tool, which grinds at the opening of the guide hole 11 to form a preliminary inner conical surface 12a. Thus, since the conical forming tool itself is used to form a conical shape, when the conical forming tool grinds at the opening of the guide hole 11, it can quickly process a preliminary inner conical surface 12a corresponding to the subsequent target inner conical surface 12.

[0043] Further, please refer to Figures 1 to 7 In one specific embodiment of the implant processing method provided by the present invention, the implant 1 to be processed is a one-piece component made of elemental titanium or titanium alloy. Thus, elemental titanium or titanium alloy possesses good biocompatibility and corrosion resistance.

[0044] Further, please refer to Figures 1 to 7 As a specific embodiment of the implant processing method provided by the present invention, after step S5, the inner conical surface 12 of the target is polished. Thus, polishing is used to remove any burrs that may exist on the inner conical surface.

[0045] Please see Figures 1 to 7 The present invention also provides a conical electrode 2 for processing the conical surface of an implant, the conical electrode 2 being used to implement the above-described implant processing method; the conical electrode 2 being used to perform spark discharge processing on the preliminary inner conical surface 12a of the implant 1 to be processed to form the target inner conical surface 12; the conical electrode 2 includes: an insulating guide post 21 and a conductive outer conical part 22; the insulating guide post 21 being used to insert into the guide hole 11 of the implant 1 to be processed; the conductive outer conical part 22 being connected to one end of the insulating guide post 21; the conductive outer conical part 22 being used to insert into the cavity formed by the preliminary inner conical surface 12a of the implant 1 to be processed and remove the reserved processing allowance by spark discharge; wherein, the taper of the conductive outer conical part 22 is consistent with the taper of the target inner conical surface 12 of the implant 1 to be processed. Thus, the insulating guide post 21 is inserted into the guide hole 11 of the implant 1 to be processed, so that the conical electrode 2 has a clear insertion position when entering the implant, without relying entirely on repeated external adjustments to determine the position of the conductive outer cone 22; the conductive outer cone 22 is connected to one end of the insulating guide post 21, and is used to remove the material on the preliminary inner cone 12a by means of spark discharge as the insulating guide post 21 is inserted into the cavity formed by the preliminary inner cone surface 12a of the implant 1 to be processed. The conductive outer cone 22 can directly face the preliminary inner cone surface 12a to be processed and complete the material removal by means of spark discharge; since the taper of the conductive outer cone 22 is consistent with the taper of the target inner cone surface 12 of the implant 1 to be processed, the conductive outer cone 22 can make the preliminary inner cone surface 12a form the target inner cone surface 12 by means of spark discharge, making it easier to ensure the taper of the target inner cone surface 12.

[0046] Please see Figures 1 to 7 The present invention also provides an implant conical surface processing device, comprising: a pulse power supply, a clamp, a feeding mechanism, and a conical electrode 2; the clamp is used to fix the implant 1 to be processed; the feeding mechanism is used to drive the conical electrode 2 to feed relative to the implant 1 along the axial direction of the guide hole 11 of the implant 1 to be processed; wherein, the two poles of the pulse power supply are electrically connected to the implant 1 to be processed and the conical electrode 2 respectively, and the pulse power supply can generate spark discharge between the conductive outer conical portion 22 of the conical electrode 2 and the preliminary inner conical surface 12a of the implant 1 to be processed.

[0047] Thus, after the fixture fixes the implant 1 to be processed, the implant 1 is not prone to positional changes during processing; the feed mechanism drives the conical electrode 2 to feed relative to the implant 1 to be processed, so that the conical electrode 2 can stably approach the preliminary inner conical surface 12a of the implant 1 to be processed; after the two poles of the pulse power supply are electrically connected to the implant 1 to be processed and the conical electrode 2 respectively, a spark discharge can be generated between the conductive outer conical part 22 of the conical electrode 2 and the preliminary inner conical surface 12a of the implant 1 to be processed.

[0048] In one embodiment, the feeding mechanism includes a motor, a lead screw, and a sliding table. The motor drives the lead screw to rotate, and the lead screw is threadedly connected to the sliding table. The rotating lead screw causes the sliding table to move along the lead screw, and the tapered electrode 2 is disposed on the sliding table and moves with the sliding table. In one embodiment, the lead screw is parallel to the axis of the implant 1 to be processed. In another embodiment, the tapered electrode 2 moves along the axis of the implant 1 to be processed.

[0049] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and substitutions can be made without departing from the technical principles of the present invention, and these improvements and substitutions should also be considered within the scope of protection of the present invention.

Claims

1. A method for processing implants, characterized in that, The processing steps include the following: Step S1: Prepare a conductive implant for processing; Step S2: A guide hole is machined on the end face of the implant to be processed. The guide hole extends along the axial direction of the implant to be processed and forms an opening on the end face. Step S3: A preliminary inner conical surface is machined at the opening of the guide hole using a grinding tool. The preliminary inner conical surface is connected to the guide hole. The guide hole, the preliminary inner conical surface, and the target inner conical surface to be formed are coaxially arranged. The preliminary inner conical surface is located radially inside the target inner conical surface to be formed, and a pre-reserved machining allowance is formed between the preliminary inner conical surface and the target inner conical surface to be formed. Step S4: Provide a conical electrode; the conical electrode includes an insulating guide post and a conductive outer cone connected to the insulating guide post, the insulating guide post is inserted into the guide hole, and the conductive outer cone is inserted into the cavity formed by the preliminary inner cone surface; adjust the position of the insulating guide post in the guide hole so that there is a discharge gap between the conductive outer cone and the preliminary inner cone surface, and fill the discharge gap with insulating liquid; Step S5: Connect the implant to be processed and the conical electrode to the two poles of the pulse power supply respectively, and remove the reserved processing allowance by spark discharge between the conductive outer cone and the preliminary inner cone to form the target inner cone; wherein, the taper of the conductive outer cone is consistent with the taper of the target inner cone.

2. The implant processing method as described in claim 1, characterized in that, The guide hole is a threaded hole.

3. The implant processing method as described in claim 1, characterized in that, The step of machining the preliminary inner conical surface in step S3 includes: grinding the opening of the guide hole multiple times with a grinding tool to gradually form the preliminary inner conical surface.

4. The implant processing method as described in claim 1, characterized in that, The conductive outer cone is coaxially arranged with the insulating guide post, and the axis of the conductive outer cone coincides with the axis of the guide hole when the insulating guide post is inserted into the guide hole.

5. The implant processing method as described in claim 1, characterized in that, During the spark discharge process between the conductive outer cone and the preliminary inner cone, the conical electrode is fed in a predetermined direction to process the preliminary inner cone by the conductive outer cone; the predetermined direction is: along the axial direction of the guide hole and from the opening of the guide hole toward the interior of the implant to be processed.

6. The implant processing method as described in claim 1, characterized in that, The grinding tool is a tapered forming tool, which grinds the initial inner tapered surface at the opening of the guide hole.

7. The implant processing method as described in claim 1, characterized in that, The implant to be processed is a single piece made of elemental titanium or titanium alloy.

8. The implant processing method as described in claim 1, characterized in that, After step S5, the target inner conical surface is polished.

9. A conical electrode for processing the conical surface of an implant, characterized in that, The conical electrode is used to implement the implant processing method according to any one of claims 1 to 8; the conical electrode is used to perform spark discharge processing on the preliminary inner conical surface of the implant to be processed to form a target inner conical surface; the conical electrode includes: an insulating guide post and a conductive outer conical portion; The insulating guide post is used to be inserted into the guide hole of the implant to be processed; The conductive outer cone is connected to one end of the insulating guide post; the conductive outer cone is used to insert into the cavity formed by the preliminary inner cone surface of the implant to be processed and remove the reserved processing allowance by spark discharge. The taper of the conductive outer cone is consistent with the taper of the target inner cone surface of the implant to be processed.

10. An implant conical surface processing device, characterized in that, include: A pulse power supply, a fixture, a feed mechanism, and the tapered electrode as described in claim 9; The clamp is used to fix the implant to be processed; the feeding mechanism is used to drive the tapered electrode to feed relative to the implant along the axial direction of the guide hole of the implant to be processed. The two poles of the pulse power supply are electrically connected to the implant to be processed and the conical electrode, respectively. The pulse power supply can generate spark discharge between the conductive outer cone of the conical electrode and the preliminary inner cone surface of the implant to be processed.

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