Chemical vapor deposition equipment tail gas gas path system

Abstract

The application discloses a kind of chemical vapor deposition equipment tail gas gas path systems, it is related to chemical vapor deposition technical field, solve the existing tail gas gas path system has been unable to simultaneously meet the use demand technical problem of safety transportation, accurate purging, integrated emergency disposal, including connecting pipeline, one end of the connecting pipeline is connected with the cavity pipeline for being communicated with cavity, the other end is connected with KF50 pipeline for being communicated with dry pump;Manual valve, stop valve and butterfly valve are sequentially provided on the connecting pipeline from the cavity pipeline to KF50 pipeline direction.The application considers process adaptability and emergency ability of sudden condition, can realize the independent evacuation of front section gas disc gas, accurately adapt process special shunt demand;Meanwhile, for power failure, dry pump outage and other emergency situations, configure exclusive emergency exhaust path, quickly evacuate the accumulated gas in air pipeline, avoid pressure anomaly and gas residue, improve the reliability and risk resistance of system operation.The application has the advantages of process adaptability and emergency ability of sudden condition, can realize the independent evacuation of front section gas disc gas, accurately adapt process special shunt demand;Meanwhile, for power failure, dry pump outage and other emergency situations, configure exclusive emergency exhaust path, quickly evacuate the accumulated gas in air pipeline, avoid pressure anomaly and gas residue, improve the reliability and risk resistance of system operation.

Description

Technical Field

[0001] This invention relates to the field of chemical vapor deposition technology, and more specifically to a tail gas path system for a chemical vapor deposition equipment. Background Technology

[0002] Chemical vapor deposition (CVD) equipment is a core process equipment in the fields of semiconductor integrated circuits, photovoltaics, display panels, and advanced materials fabrication. Its processes typically utilize reactant gases such as silanes, phosphines, arsines, ammonia, hydrogen chloride, hydrogen fluoride, and various organometallic precursors. After the thin film deposition reaction is complete, the exhaust gas usually contains unreacted toxic, flammable, and corrosive gases, as well as dust, particulate matter, and easily condensable byproducts, posing significant risks such as flammability, explosiveness, high toxicity, strong corrosion, and easy crystallization and blockage.

[0003] Traditional CVD equipment exhaust gas treatment systems mostly adopt a decentralized structure, transporting exhaust gas to downstream processing units solely through vacuum pump sets and simple pipelines. With the increasing demands for production safety, equipment reliability, and environmental compliance in high-end manufacturing, existing exhaust gas path systems can no longer simultaneously meet the integrated needs of safe delivery, precise purging, and emergency response. Therefore, developing a CVD equipment exhaust gas path system that integrates safe exhaust gas delivery, automatic pipeline purging, and emergency response functions to achieve end-to-end safe control, stable operation, and intelligent protection has become a pressing technical problem to be solved in this field. Summary of the Invention

[0004] The purpose of this invention is to provide a tail gas path system for chemical vapor deposition equipment, which solves the following technical problem: existing tail gas path systems can no longer simultaneously meet the integrated needs of safe delivery, precise purging, and emergency response.

[0005] The objective of this invention can be achieved through the following technical solutions: A tail gas path system for a chemical vapor deposition (CVD) equipment includes a connecting pipeline. One end of the connecting pipeline is connected to a cavity pipe for communication with a cavity, and the other end is connected to a KF50 pipe for communication with a dry pump. A manual valve, a shut-off valve, and a butterfly valve are sequentially arranged on the connecting pipeline from the cavity pipe to the KF50 pipe. The shut-off valve is an automatic shut-off valve for automatically cutting off the gas path when the dry pump stops.

[0006] As a further aspect of the present invention: a return gas pipeline is also connected to the cavity pipeline, and a pressure gauge, a first normally open pneumatic valve and a one-way valve are installed sequentially on the return gas pipeline. A KF40 pipeline is connected to one end of the return gas pipeline near the one-way valve. When the dry pump is not evacuating, the exhaust gas flows through the return gas pipeline, passes sequentially through the first normally open pneumatic valve and the one-way valve, and then flows to the KF40 pipeline.

[0007] As a further aspect of the present invention: a first branch pipe is connected to the return gas pipeline located between the first normally open pneumatic valve and the one-way valve, a first normally closed pneumatic valve is installed on the first branch pipe, and the first branch pipe is connected to a high-pressure nitrogen source.

[0008] As a further aspect of the present invention: a second branch pipe is connected to the return air pipe located between the pressure gauge and the first normally open pneumatic valve, and a second normally closed pneumatic valve is provided on the second branch pipe.

[0009] As a further embodiment of the present invention: a third branch pipe is connected to the connecting pipeline between the shut-off valve and the butterfly valve, and a third normally closed pneumatic valve is provided on the third branch pipe. One end of the third branch pipe is connected to the first air inlet pipe and the fourth branch pipe respectively through a tee. The fourth branch pipe is equipped with a second normally open pneumatic valve, and the fourth branch pipe is connected to the KF40 pipe.

[0010] As a further aspect of the present invention: a second air inlet pipe is connected to the connecting pipe between the butterfly valve and the KF50 pipe, and a fifth branch pipe is also connected to the second air inlet pipe, the fifth branch pipe being connected to the KF40 pipe.

[0011] As a further aspect of the present invention: both the first air inlet pipe and the second air inlet pipe are used to transport nitrogen.

[0012] The beneficial effects of this invention are: This invention has the ability to prevent backflow in the event of power failure or dry pump shutdown. It achieves rapid isolation between the vacuum pipeline and the cavity by automatically shutting off the valve, thereby avoiding cavity contamination caused by gas backflow from the source, eliminating safety hazards caused by collision of gases under different pressures, and ensuring the cleanliness and stability of the process environment inside the cavity.

[0013] This invention designs a multi-stage exhaust gas delivery and unblocking mechanism. Through the orderly switching of three-stage processes—conventional top opening, nitrogen assistance, and high-pressure emergency—it ensures that exhaust gas can still be smoothly delivered to the designated pipeline even under conditions such as one-way valve jamming and abnormal pipeline pressure. This effectively avoids exhaust gas accumulation and pipeline blockage, ensuring the continuity of exhaust gas emissions.

[0014] This invention achieves full-cycle protection of the cavity and self-cleaning of the pipeline. During process intervals, a protective air curtain is formed by continuous gas flow to prevent the backflow of residual waste gas in the pipeline. A dedicated purging pipeline is provided to perform directional purging of the main pipeline and butterfly valve, reducing the adhesion of impurities and component jamming, extending the service life of core components such as valve groups and pipelines, and reducing the equipment failure rate.

[0015] This invention balances process adaptability with emergency response capabilities for sudden operating conditions. It enables independent venting of gas from the front-end gas plate, precisely adapting to specific process diversion requirements. Simultaneously, it is equipped with a dedicated emergency venting path for emergencies such as power outages and dry pump shutdowns, quickly venting accumulated gas in the air pipeline, avoiding abnormal pressure and gas residue, and improving the reliability and risk resistance of system operation.

[0016] This invention adopts a modular segmented pipeline design, with each segment having independent functions and clear linkage logic, which facilitates daily inspection, fault location and component replacement. Furthermore, individual pipeline segments can be optimized and modified according to process upgrade requirements without overall adjustment, significantly reducing the difficulty of later operation and maintenance and upgrade costs of the equipment. Attached Figure Description

[0017] The invention will now be further described with reference to the accompanying drawings.

[0018] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a frontal structural schematic diagram of the present invention; Figure 3 This is a side view of the structure of the present invention; Figure 4 This is a rear view structural schematic diagram of the present invention; Figure 5 This is a top view of the structure of the present invention.

[0019] In the diagram: 1. Connecting pipe; 2. Cavity pipe; 3. Manual valve; 4. Shut-off valve; 5. Butterfly valve; 6. KF50 pipe; 7. Return air pipe; 8. Pressure gauge; 9. First normally open pneumatic valve; 10. Check valve; 11. KF40 pipe; 12. First branch pipe; 13. First normally closed pneumatic valve; 14. Second branch pipe; 15. Second normally closed pneumatic valve; 16. Third branch pipe; 17. Third normally closed pneumatic valve; 18. First inlet pipe; 19. Second normally open pneumatic valve; 20. Fourth branch pipe; 21. Second inlet pipe; 22. Fifth branch pipe. Detailed Implementation

[0020] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0021] Example 1 Please see Figure 1-3As shown, this invention relates to a tail gas path system for a chemical vapor deposition (CVD) equipment, comprising a connecting pipe 1. One end of the connecting pipe 1 is connected to a water-cooled heat exchanger, and one end of the water-cooled heat exchanger is connected to a cavity pipe 2, which is connected to a cavity. The other end of the connecting pipe 1 is connected to a KF50 pipe 6, which is connected to a dry pump. A manual valve 3, a shut-off valve 4, and a butterfly valve 5 are sequentially installed on the connecting pipe 1 from the cavity pipe 2 to the KF50 pipe 6. This set of pipes is mainly used for vacuuming, and the gas in the cavity is drawn away by the dry pump through this pipe.

[0022] During vacuuming: the gas passes through the water-cooled heat exchanger, manual valve 3, shut-off valve 4, butterfly valve 5, and finally flows to the dry pump through KF50 pipeline 6.

[0023] The function of shut-off valve 4: In special circumstances, such as power outages or dry pump shutdowns, the valve will be directly shut off.

[0024] When the dry pump fails to create a vacuum, KF50 pipe 6 is in a vacuum state, while the tail end (outlet) of the dry pump is at near atmospheric pressure. Due to the pressure difference, the gas at the tail end of the dry pump will flow back (backflow) into the front end of KF50 pipe 6. This will cause contamination of the cavity and collisions between a large amount of gas and the gas in the cavity, posing an unpredictable risk (potentially an explosion). The shut-off valve 4 automatically closes the moment the power is cut off and the dry pump stops, preventing backflow of gas.

[0025] Example 2 Based on Example 1, see [link / reference] Figure 4 As shown, a return air pipe 7 is also connected to the cavity pipe 2. A pressure gauge 8, a first normally open pneumatic valve 9 (a 1 / 2 normally open pneumatic valve) and a one-way valve 10 are installed sequentially on the return air pipe 7. A KF40 pipe 11 is connected to one end of the return air pipe 7 near the one-way valve 10. When the dry pump is not drawing a vacuum, the exhaust gas passes through the return gas pipe 7 and the first normally open pneumatic valve 9. When it reaches a certain pressure, it will open the check valve 10 and flow to the KF40 pipe 11.

[0026] The function of this set of pipelines is as follows: when the process is completed and no vacuum is applied, the entire cavity needs to be continuously circulated with gas. This is to prevent residual exhaust gas in the subsequent pipelines from contaminating the inside of the cavity. This structure is designed to ensure that the exhaust gas flows stably to KF40 pipeline 11, protecting the internal environment of the cavity from the influence of exhaust gas.

[0027] Example 3 Based on Example 2, see [link / reference] Figure 4As shown, a first branch pipe 12 is connected to the return gas pipeline 7 located between the first normally open pneumatic valve 9 and the one-way valve 10. A first normally closed pneumatic valve 13 (a 1 / 4 normally closed pneumatic valve) is installed on the first branch pipe 12. The first branch pipe 12 is connected to a high-pressure nitrogen source.

[0028] When check valve 10 cannot be opened by gas, the process is as follows: the normally open 1 / 2 pneumatic valve closes, and the normally closed 1 / 4 pneumatic valve opens for 1 second and then closes. At the moment of opening, high-pressure nitrogen enters the pipeline, and the immense pressure opens check valve 10. Then, the normally open 1 / 2 pneumatic valve opens, at which point check valve 10 can be opened by the exhaust gas, continuing to flow into KF40 pipeline 11. This ensures the overall pipeline remains unobstructed, protecting the internal environment of the chamber from the influence of exhaust gas.

[0029] Example 4 Based on Embodiment 2, a second branch pipe 14 is connected to the return air pipe 7 located between the pressure gauge 8 and the first normally open pneumatic valve 9, and a second normally closed pneumatic valve 15 (a 1 / 2 normally closed pneumatic valve) is provided on the second branch pipe 14.

[0030] When the front-end pressure reaches 800 torr, and neither of the two processes in Example 3 and Example 4 can work properly, the 1 / 2 normally closed pneumatic valve will open, and the exhaust gas will flow directly to the KF40 pipeline 11.

[0031] Example 5 Based on Example 1, see [link / reference] Figure 5 As shown, a third branch pipe 16 is connected to the connecting pipe 1 between the shut-off valve 4 and the butterfly valve 5. A third normally closed pneumatic valve 17 (1 / 2 normally closed pneumatic valve) is installed on the third branch pipe 16. One end of the third branch pipe 16 is connected to the first air inlet pipe 18 (which mainly transports nitrogen) and the fourth branch pipe 20 respectively through a tee. The fourth branch pipe 20 is equipped with a second normally open pneumatic valve 19 (1 / 2 normally open pneumatic valve), and the fourth branch pipe 20 is connected to the KF40 pipe 11.

[0032] Normal condition: The first intake pipe 18 supplies nitrogen to the connecting pipe 1 located to the left of the butterfly valve 5. It passes through the 1 / 2 normally closed pneumatic valve and flows to the KF50 pipe 6. Special circumstances: such as power failure, dry pump shutdown, gas in the connecting pipe 1 located to the left of butterfly valve 5 flows along the first inlet pipe 18 and the fourth branch pipe 20, through the second normally open pneumatic valve 19 to KF40 pipe 11. At this time, the first inlet pipe 18 is also continuously supplying nitrogen, and its gas also flows to KF40 pipe 11 through the fourth branch pipe 20.

[0033] This set of exhaust gas pipelines is used for purging pipelines and butterfly valves.

[0034] Example 6 Based on Example 1, see [link / reference] Figure 5 As shown, a second air inlet pipe 21 is connected to the connecting pipe 1 between the butterfly valve 5 and the KF50 pipe 6. It mainly transports nitrogen. A fifth branch pipe 22 is also installed on the second air inlet pipe 21. The fifth branch pipe 22 is connected to the KF40 pipe 11.

[0035] Normal condition: The second intake pipe 21 supplies nitrogen to the connecting pipe 1 located to the right of the butterfly valve 5, and then flows to the vacuum-evacuated KF50 pipe 6; Special circumstances: In the event of a power outage or dry pump failure, the gas in its connecting pipe 1 will flow out to the KF40 pipe 11 through the fifth branch pipe 22. At this time, the second air inlet pipe 21 is also continuously supplying nitrogen, and its gas also flows to the KF40 pipe 11 through the fifth branch pipe 22.

[0036] The function of this exhaust pipe is to allow the gas in the front gas plate to be directly vented during vacuuming, as required by the process and cannot pass through the cavity.

[0037] The above embodiments one to six are all for emergency situations to treat the gas in the connecting pipe 1. They can effectively remove the gas in the connecting pipe 1 and avoid backflow and interference from impurities, which could lead to danger.

[0038] The foregoing has provided a detailed description of one embodiment of the present invention, but this description is merely a preferred embodiment and should not be construed as limiting the scope of the invention. All equivalent variations and modifications made within the scope of the claims of this invention should still fall within the patent coverage of this invention.

Claims

1. A tail gas path system for a chemical vapor deposition (CVD) apparatus, characterized in that, The system includes a connecting pipe (1), one end of which is connected to a cavity pipe (2) for communicating with the cavity, and the other end is connected to a KF50 pipe (6) for communicating with the dry pump. A manual valve (3), a shut-off valve (4) and a butterfly valve (5) are sequentially arranged on the connecting pipe (1) from the cavity pipe (2) to the KF50 pipe (6). The shut-off valve (4) is an automatic shut-off valve for automatically cutting off the gas path when the dry pump stops running.

2. The tail gas path system of a chemical vapor deposition equipment according to claim 1, characterized in that, The cavity pipe (2) is also connected to a return gas pipe (7). A pressure gauge (8), a first normally open pneumatic valve (9) and a one-way valve (10) are installed on the return gas pipe (7) in sequence. A KF40 pipe (11) is connected to one end of the return gas pipe (7) near the one-way valve (10). When the dry pump is not vacuumed, the exhaust gas flows through the return gas pipe (7) through the first normally open pneumatic valve (9) and the one-way valve (10) in sequence to the KF40 pipe (11).

3. The tail gas path system of a chemical vapor deposition equipment according to claim 2, characterized in that, A first branch pipe (12) is connected to the return gas pipe (7) located between the first normally open pneumatic valve (9) and the one-way valve (10). A first normally closed pneumatic valve (13) is installed on the first branch pipe (12). The first branch pipe (12) is connected to a high-pressure nitrogen source.

4. The tail gas path system of a chemical vapor deposition equipment according to claim 2, characterized in that, A second branch pipe (14) is connected to the return air pipe (7) located between the pressure gauge (8) and the first normally open pneumatic valve (9), and a second normally closed pneumatic valve (15) is provided on the second branch pipe (14).

5. The tail gas path system of a chemical vapor deposition equipment according to claim 1, characterized in that, A third branch pipe (16) is connected to the connecting pipe (1) between the stop valve (4) and the butterfly valve (5). A third normally closed pneumatic valve (17) is installed on the third branch pipe (16). One end of the third branch pipe (16) is connected to the first air inlet pipe (18) and the fourth branch pipe (20) respectively through a tee. The fourth branch pipe (20) is equipped with a second normally open pneumatic valve (19), and the fourth branch pipe (20) is connected to the KF40 pipe (11).

6. The tail gas path system of a chemical vapor deposition equipment according to claim 5, characterized in that, A second air inlet pipe (21) is connected to the connecting pipe (1) between the butterfly valve (5) and the KF50 pipe (6). A fifth branch pipe (22) is also connected to the second air inlet pipe (21), and the fifth branch pipe (22) is connected to the KF40 pipe (11).

7. The exhaust gas path system of a chemical vapor deposition equipment according to claim 6, characterized in that, Both the first air inlet pipe (18) and the second air inlet pipe (21) are used to transport nitrogen.

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