Display panel, display panel manufacturing method, display module and display device

Abstract

The present application relates to the field of display device, specifically provides a kind of display panel, the preparation method of display panel, display module and display device, to solve how to improve the light transmittance of the blind hole light transmission area of display panel Problem.For this purpose, the display panel of the present application, by setting first functional layer on the side of first substrate towards array substrate and second functional layer on the side of second substrate towards color film substrate, and at least one of the first functional layer and the second functional layer in the thickness of blind hole light transmission area is less than its thickness in blind hole edge area, thereby effectively reducing the absorption and reflection of light in the functional layer in the blind hole light transmission area, in turn improve the light transmittance of blind hole light transmission area, provide sufficient optical performance guarantee for under-screen camera, meet high-quality shooting requirements.

Description

Technical Field

[0001] This invention relates to the field of display device technology, specifically to a display panel, a method for manufacturing the display panel, a display module, and a display device. Background Technology

[0002] With the pursuit of high screen-to-body ratios in smartphones, tablets, and other display devices, full-screen displays have become a mainstream trend. To achieve this effect, a punch-hole area is typically set in the display panel, with the front-facing camera positioned under the screen in the corresponding punch-hole area. Therefore, the light transmittance of the punch-hole area in the display panel becomes crucial. However, currently, the light transmittance in this area is insufficient to support the demands of high-quality photography.

[0003] Accordingly, a new technical solution is needed in this field to solve the above problems. Summary of the Invention

[0004] This invention aims to solve the aforementioned technical problem, namely, how to improve the light transmittance of the blind aperture light-transmitting area of ​​a display panel. Based on this, this application provides a display panel comprising a color filter substrate, an array substrate, and a display layer. The color filter substrate and the array substrate are disposed opposite to each other, with the display layer disposed between them. The display panel further includes a blind aperture area and a display area surrounding the blind aperture area. The blind aperture area includes a blind aperture light-transmitting area and a blind aperture edge area surrounding the blind aperture light-transmitting area. The color filter substrate includes a first substrate and a first functional layer disposed on the side of the first substrate facing the array substrate; the array substrate includes a second substrate and a second functional layer disposed on the side of the second substrate facing the color filter substrate. Wherein, at least one of the first functional layer and the second functional layer has a thickness in the light-transmitting area of ​​the blind hole that is less than its thickness in the edge area of ​​the blind hole.

[0005] In the preferred embodiment of the above-mentioned display panel, the first functional layer includes: A photoresist layer, wherein the photoresist layer is disposed on the first substrate located in the display area; A planarization layer, the planarization layer covering the photoresist layer of the display area and the first substrate of the blind aperture light-transmitting area and the blind aperture edge area; and The second functional layer includes: A gate, the gate being disposed on a second substrate located in the display area; The device comprises a gate protection layer, an active device, and an insulating layer. The gate protection layer covers the gate and a second substrate covering the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device and the second substrate covering the blind via light-transmitting area. Alternatively, the gate protection layer covers the gate and the second substrate covering the blind via light-transmitting area and the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device. Alternatively, the gate protection layer covers the gate and the second substrate covering the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device.

[0006] In the preferred embodiment of the above-mentioned display panel, the first functional layer includes: A photoresist layer, wherein the photoresist layer is disposed on the first substrate located in the display area; A planarization layer, the planarization layer covering the photoresist layer of the display area and the first substrate of the blind aperture edge region; and The second functional layer includes: A gate, the gate being disposed on a second substrate located in the display area; The device comprises a gate protection layer, an active device, and an insulating layer. The gate protection layer covers the gate and a second substrate covering the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device and the second substrate covering the blind via light-transmitting area. Alternatively, the gate protection layer covers the gate and a second substrate covering the blind via light-transmitting area and the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device. Alternatively, the gate protection layer covers the gate and a second substrate covering the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device. Alternatively, the gate protection layer covers the gate and a second substrate covering the blind via light-transmitting area and the blind via edge region. The active device is disposed on the gate protection layer located in the display area and the blind via edge region. The insulating layer covers the active device and the gate protection layer covering the blind via light-transmitting area.

[0007] In the preferred embodiment of the above-mentioned display panel, the first functional layer includes: A photoresist layer, wherein the photoresist layer is disposed on the first substrate located in the display area; A planarization layer, the planarization layer covering the photoresist layer of the display area and the first substrate of the blind aperture light-transmitting area and the blind aperture edge area; and The second functional layer includes: A gate, the gate being disposed on a second substrate located in the display area; The system comprises a gate protection layer, an active device, and an insulating layer. The gate protection layer covers the gate and a second substrate covering the blind aperture transparent region and the blind aperture edge region. The active device is disposed on the gate protection layer located in the display area and the blind aperture edge region. The insulating layer covers the active device and the gate protection layer covering the blind aperture transparent region. At least one of the planarization layer, the gate protection layer, and the insulating layer has a thickness in the light-transmitting region of the blind hole that is less than its thickness in the edge region of the blind hole.

[0008] In the preferred embodiment of the above-mentioned display panel, the first functional layer includes: A light-shielding layer is disposed on the first substrate in the same layer as the photoresist layer and is located in the edge region of the blind hole.

[0009] In the preferred embodiment of the above-mentioned display panel, the display panel further includes: A support member is located in the edge region of the blind hole and is disposed between the first functional layer and the second functional layer.

[0010] In the preferred embodiment of the above-described display panel, the display layer is a liquid crystal layer; and The display panel also includes: A first alignment layer is disposed on the side of the first functional layer opposite to the first substrate; The second alignment layer is disposed on the side of the second functional layer opposite to the second substrate, and the liquid crystal layer is disposed between the first alignment layer and the second alignment layer.

[0011] This application also provides a method for manufacturing a display panel, the method comprising: A first substrate and a second substrate are provided, wherein the first substrate and the second substrate respectively have a blind hole light-transmitting area, a blind hole edge area and a display area corresponding to the display panel, the display area surrounds the blind hole edge area and the blind hole edge area surrounds the blind hole light-transmitting area; A color filter substrate is obtained by forming a first functional layer on the first substrate and an array substrate is obtained by forming a second functional layer on the second substrate, such that at least one of the first functional layer and the second functional layer has a thickness in the blind aperture light-transmitting region that is less than its thickness in the blind aperture edge region. A display panel is obtained by aligning the color filter substrate and the array substrate using a cell alignment process, with the display layer positioned between them.

[0012] In the preferred embodiment of the above preparation method, the specific steps for forming the color filter substrate include: A photoresist layer is formed on a first substrate located in the display area; A planarization layer is formed on the first substrate, including the photoresist layer of the display area and the light-transmitting area and edge area of ​​the blind aperture; and The specific steps for forming the array substrate include: A gate is formed on a second substrate located in the display area; A gate protection layer is formed on the gate and the second substrate of the blind hole edge region. An active device is formed on the gate protection layer of the display area and the blind hole edge region. An insulating layer is formed on the active device and the second substrate of the blind hole light-transmitting area. Alternatively, a gate protection layer is formed on the gate and the second substrate of the blind hole light-transmitting area and the blind hole edge region. An active device is formed on the gate protection layer of the display area and the blind hole edge region. An insulating layer is formed on the active device. Alternatively, a gate protection layer is formed on the gate and the second substrate of the blind hole edge region. An active device is formed on the gate protection layer of the display area and the blind hole edge region. An insulating layer is formed on the active device.

[0013] In the preferred embodiment of the above preparation method, the specific steps for forming the color filter substrate include: A photoresist layer is formed on the first substrate located in the display area; A planarization layer is formed on the photoresist layer in the display area and on the first substrate in the blind hole edge region; The specific steps for forming the array substrate include: A gate is formed on a second substrate located in the display area; A gate protection layer is formed on the gate and the second substrate of the blind aperture edge region. An active device is formed on the gate protection layer of the display area and the blind aperture edge region. An insulating layer is formed on the active device and the second substrate of the blind aperture light-transmitting area. Alternatively, a gate protection layer is formed on the gate and the second substrate of the blind aperture light-transmitting area and the blind aperture edge region. An active device is formed on the gate protection layer of the display area and the blind aperture edge region. An insulating layer is formed on the active device. Alternatively, a gate protection layer is formed on the gate and the second substrate of the blind aperture edge region. An active device is formed on the gate protection layer of the display area and the blind aperture edge region. An insulating layer is formed on the active device. Alternatively, a gate protection layer is formed on the gate and the second substrate of the blind aperture light-transmitting area and the blind aperture edge region. An active device is formed on the gate protection layer of the display area and the blind aperture edge region. An insulating layer is formed on the active device and the gate protection layer of the blind aperture light-transmitting area.

[0014] In the preferred embodiment of the above preparation method, the specific steps for forming the color filter substrate include: A photoresist layer is formed on a first substrate located in the display area; A planarization layer is formed on the first substrate, including the photoresist layer of the display area and the light-transmitting area and edge area of ​​the blind aperture; and The specific steps for forming the array substrate include: A gate is formed on a second substrate located in the display area; A gate protection layer is formed on the second substrate of the gate, the blind aperture light-transmitting area, and the blind aperture edge area; an active device is formed on the gate protection layer of the display area and the blind aperture edge area; and an insulating layer is formed on the active device and the gate protection layer of the blind aperture light-transmitting area. When forming at least one of the planarization layer, the gate protection layer, and the insulating layer, its thickness in the light-transmitting region of the blind hole is less than its thickness in the edge region of the blind hole.

[0015] In a preferred embodiment of the above preparation method, while forming a photoresist layer on the first substrate located in the display area, the method further includes: A light-shielding layer is formed in the same layer as the edge area of ​​the blind hole.

[0016] In a preferred embodiment of the above preparation method, after forming the first functional layer on the first substrate or the second functional layer on the second substrate, the method further includes: A support member is formed on the first functional layer or the second functional layer.

[0017] In a preferred embodiment of the above preparation method, after forming the first functional layer on the first substrate and the second functional layer on the second substrate, the method further includes: A first orientation layer is formed on the first functional layer, and a second orientation layer is formed on the second functional layer; The color filter substrate and the array substrate are assembled using a cell-fitting process, and then filled with liquid crystal to obtain a display panel.

[0018] This application also provides a display module, which includes the display panel described in the preferred embodiment above, or the display panel prepared by the preparation method described in the preferred embodiment above.

[0019] This application also provides a display device, which includes the display module described in the preferred embodiment above.

[0020] Those skilled in the art will understand that the display panel of this application, by providing a first functional layer on the side of the first substrate facing the array substrate and a second functional layer on the side of the second substrate facing the color filter substrate, and by making the thickness of at least one of the first functional layer and the second functional layer in the blind aperture light-transmitting area less than its thickness in the blind aperture edge area, can effectively reduce the absorption and reflection of light in the blind aperture light-transmitting area, significantly improve the light transmittance of the blind aperture light-transmitting area, provide sufficient optical performance guarantee for the under-display camera, and meet the requirements of high-quality shooting.

[0021] Furthermore, by changing the structure of the second functional layer located in the blind aperture light-transmitting area, the thickness of the second functional layer in the blind aperture light-transmitting area is made smaller than its thickness in the blind aperture edge area, thereby effectively reducing the absorption and reflection of light by the functional layer in the blind aperture light-transmitting area and significantly improving the light transmittance of the blind aperture light-transmitting area.

[0022] Furthermore, by adjusting the structure of the first and second functional layers located in the blind aperture light-transmitting area, the thickness of at least one of the first and second functional layers in the blind aperture light-transmitting area is less than its thickness in the blind aperture edge area, thereby effectively reducing the absorption and reflection of light in the blind aperture light-transmitting area and significantly improving the light transmittance of the blind aperture light-transmitting area.

[0023] Furthermore, by setting at least one of the planarization layer in the first functional layer and the gate protection layer and insulating layer in the second functional layer to have a thickness in the blind aperture light-transmitting region that is less than its thickness in the blind aperture edge region, the film layer in the blind aperture light-transmitting region can be effectively thinned while ensuring the continuity and integrity of each film layer, thereby effectively improving the light transmittance of the blind aperture light-transmitting region.

[0024] Furthermore, by setting a light-shielding layer on the first substrate in the blind aperture edge area, stray light leakage in the blind aperture edge area can be effectively blocked, avoiding light leakage problems in the blind aperture edge area, thereby improving the optical performance consistency and imaging quality of the blind aperture area.

[0025] Furthermore, by setting a support between the first and second functional layers in the edge area of ​​the blind hole, stable support can be provided for the blind hole area, preventing deformation of the blind hole area and thus ensuring the shooting quality of the camera.

[0026] Furthermore, by setting the display layer as a liquid crystal layer and setting the first alignment layer and the second alignment layer on opposite sides of the first functional layer and the second functional layer respectively, it is possible to meet the high transmittance requirements of the blind hole light-transmitting area while ensuring the normal display function of the liquid crystal display panel.

[0027] Those skilled in the art will understand that the method for manufacturing the display panel of this application, by forming a first functional layer and a second functional layer on a first substrate and a second substrate respectively, and making the thickness of at least one of the first functional layer and the second functional layer in the blind aperture light-transmitting area less than its thickness in the blind aperture edge area, can effectively reduce the absorption and reflection of light by the blind aperture light-transmitting area, significantly improve the light transmittance of the blind aperture light-transmitting area, provide sufficient optical performance guarantee for the under-display camera, and meet the requirements for high-quality shooting.

[0028] Furthermore, by defining the steps for forming the array substrate, the thickness of the second functional layer in the blind aperture light-transmitting area is made smaller than its thickness in the blind aperture edge area, thereby effectively reducing the absorption and reflection of light by the blind aperture light-transmitting area and improving the light transmittance of the blind aperture light-transmitting area.

[0029] Furthermore, by defining the steps of forming the color filter substrate and the array substrate, the thickness of at least one of the first functional layer and the second functional layer in the blind aperture light-transmitting area is less than its thickness in the blind aperture edge area, thereby effectively reducing the absorption and reflection of light by the blind aperture light-transmitting area and significantly improving the light transmittance of the blind aperture light-transmitting area.

[0030] Furthermore, when forming the planarization layer of the color filter substrate and the gate protection layer and insulating layer of the array substrate, by making the thickness of at least one of the planarization layer, the gate protection layer and the insulating layer in the blind aperture light-transmitting area less than its thickness in the blind aperture edge area, the thickness of the blind aperture light-transmitting area can be reduced while ensuring the continuity and integrity of each film layer, thereby effectively improving the light transmittance of the blind aperture light-transmitting area.

[0031] Furthermore, by preparing a light-shielding layer in the edge area of ​​the blind aperture, it is possible to achieve the effect of preventing light leakage in the edge area of ​​the blind aperture while improving the optical performance consistency and imaging quality of the blind aperture area.

[0032] Furthermore, after the first or second functional layer is prepared, a support is formed on it, and after the box-forming process, the other end of the support layer abuts against another functional layer, thereby providing stable support for the blind hole area, avoiding deformation of the blind hole area, and ensuring the shooting quality of the camera.

[0033] Furthermore, by forming a first alignment layer on the first functional layer and a second alignment layer on the second functional layer after the functional layer is prepared, and then performing cell alignment and liquid crystal filling, high transmittance of the blind aperture light-transmitting area can be achieved while ensuring the performance of the liquid crystal display. Attached Figure Description

[0034] The preferred embodiments of the present invention are described below with reference to the accompanying drawings, in which: Figure 1 This is a cross-sectional schematic diagram of the first embodiment of the display panel of this application. Figure 1; Figure 2 This is a cross-sectional schematic diagram of the first embodiment of the display panel of this application. Figure 2 ; Figure 3 This is a cross-sectional schematic diagram of the first embodiment of the display panel of this application. Figure 3 ; Figure 4 This is a cross-sectional schematic diagram of the second embodiment of the display panel of this application. Figure 1 ; Figure 5 This is a cross-sectional schematic diagram of the second embodiment of the display panel of this application. Figure 2 ; Figure 6 This is a cross-sectional schematic diagram of the second embodiment of the display panel of this application. Figure 3 ; Figure 7 This is a cross-sectional schematic diagram of the second embodiment of the display panel of this application. Figure 4 ; Figure 8 This is a cross-sectional schematic diagram of the third embodiment of the display panel of this application.

[0035] The reference numerals in the attached figures are as follows: 100, display panel; 101, display area; 102, blind aperture area; 1021, blind aperture light-transmitting area; 1022, blind aperture edge area; 1, color filter substrate; 11, first substrate; 12, first functional layer; 121, photoresist layer; 122, planarization layer; 123, light-shielding layer; 2, array substrate; 21, second substrate; 22, second functional layer; 221, gate; 222, gate protection layer; 223, active device; 224, insulating layer; 3, support member; 4, liquid crystal layer; 5, first alignment layer; 6, second alignment layer. Detailed Implementation

[0036] Preferred embodiments of this application will now be described with reference to the accompanying drawings. Those skilled in the art should understand that these embodiments are merely illustrative of the technical principles of this application and are not intended to limit the scope of protection of this application. For example, although this embodiment is described in conjunction with a liquid crystal display panel, this is not intended to limit the scope of protection of this application. Those skilled in the art can apply this application to other types of display panels without departing from the principles of this application.

[0037] It should be noted that in the description of this application, the terms "upper", "lower", "inner", "top", "bottom", etc., indicating the direction or positional relationship are based on the direction or positional relationship shown in the drawings. This is only for the convenience of description and is not intended to indicate or imply that the device or element must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this application.

[0038] Furthermore, it should be noted that, in the description of this application, unless otherwise explicitly specified and limited, the terms "set" and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection, a direct connection, or an indirect connection through an intermediate medium; or they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0039] like Figure 1-8 The liquid crystal display panel of this application will be described as shown.

[0040] To address the problem of improving the light transmittance of the blind aperture light-transmitting area 1021 of a liquid crystal display panel 100, this application provides a display panel 100 including a color filter substrate 1, an array substrate 2, and a display layer. The color filter substrate 1 and the array substrate 2 are disposed opposite to each other, with the display layer disposed between them. The display panel 100 also includes a blind aperture area 102 and a display area 101 surrounding the blind aperture area 102. The blind aperture area 102 includes a blind aperture light-transmitting area 1021 and a blind aperture edge area 1022 surrounding the blind aperture light-transmitting area 1021. The color filter substrate 1 includes a first substrate 11 and a first functional layer 12 disposed on the side of the first substrate 11 facing the array substrate 2. The array substrate 2 includes a second substrate 21 and a second functional layer 22 disposed on the side of the second substrate 21 facing the color filter substrate 1. At least one of the first functional layer 12 and the second functional layer 22 has a thickness in the blind aperture light-transmitting area 1021 that is less than its thickness in the blind aperture edge area 1022.

[0041] This application provides a first functional layer 12 on the side of the first substrate 11 facing the array substrate 2 and a second functional layer 22 on the side of the second substrate 21 facing the color filter substrate 1. The thickness of at least one of the first functional layer 12 and the second functional layer 22 in the blind aperture light-transmitting area 1021 is less than its thickness in the blind aperture edge area 1022. This effectively reduces the absorption and reflection of light by the blind aperture light-transmitting area 1021, significantly improves the light transmittance of the blind aperture light-transmitting area 1021, provides sufficient optical performance guarantee for the under-display camera, and meets the requirements for high-quality shooting.

[0042] The following is further reference Figure 1-8 A preferred embodiment of the liquid crystal display panel 100 of this application will be described.

[0043] like Figure 1-8As shown, the liquid crystal display panel 100 includes a color filter substrate 1, an array substrate 2, a display layer, a support member 3, a first alignment layer 5, and a second alignment layer 6. The liquid crystal display panel 100 also includes a blind aperture region 102 and a display area 101 surrounding the blind aperture region 102. The blind aperture region 102 includes a blind aperture light-transmitting area 1021 and a blind aperture edge area 1022 surrounding the blind aperture light-transmitting area 1021, allowing light from the front of the liquid crystal display panel 100 to pass through the blind aperture light-transmitting area 1021 and reach the camera on the back of the liquid crystal display panel 100. The color filter substrate 1 and the array substrate 2 are disposed opposite each other along the thickness direction of the display panel 100. The color filter substrate 1 includes a first substrate 11 and a first functional layer 12, with the first functional layer 12 disposed on the side of the first substrate 11 facing the array substrate 2 along the thickness direction of the display panel 100. The array substrate 2 includes a second substrate 21 and a second functional layer 22, with the second functional layer 22 disposed on the side of the second substrate 21 facing the color filter substrate 1 along the thickness direction of the display panel 100.

[0044] In order to improve the light transmittance of the blind aperture light-transmitting area 1021, thereby providing sufficient optical performance guarantee for the under-display camera and meeting the requirements of high-quality shooting, this application provides three implementation methods of the display panel 100, which are described below.

[0045] In the first implementation, such as Figure 1-3 As shown, the first functional layer 12 includes a photoresist layer 121, a planarization layer 122, and a light-shielding layer 123. The photoresist layer 121 and the light-shielding layer 123 are disposed on the same layer of the first substrate 11 along the thickness direction of the display panel 100, close to the array substrate 2. The photoresist layer 121 is disposed in the display area 101, and the light-shielding layer 123 is disposed in the blind aperture edge area 1022. Along the thickness direction of the display panel 100, the orthogonal projection of the light-shielding layer 123 onto the first substrate 11 completely covers the blind aperture edge area 1022 of the first substrate 11, thereby effectively blocking stray light leakage from the blind aperture edge area 1022, avoiding light leakage problems at the blind aperture edge, and thus improving the optical performance consistency and imaging quality of the blind aperture area 102. The planarization layer 122 covers the photoresist layer 121 of the display area 101, the first substrate 11 of the blind aperture light-transmitting area 1021, and the light-shielding layer 123 of the blind aperture edge area 1022.

[0046] In the blind aperture light-transmitting area 1021, the planarization layer 122 has a dimension of less than or equal to 2.5 μm and greater than 0 μm in the thickness direction of the display panel 100. The photoresist layer 121 includes a BM matrix (i.e., a black matrix) and a color filter layer. The color filter layer includes R, G, and B sub-pixels, and the BM matrix can serve as the color boundary between the R, G, and B sub-pixels in the color filter layer.

[0047] For example, along the thickness direction of the display panel 100, the orthogonal projection of the light-shielding layer 123 onto the first substrate 11 can also partially cover the blind hole edge region 1022 of the first substrate 11. In this case, the planarization layer 122 of the blind hole edge region 1022 covers the light-shielding layer 123 and the first substrate 11 not covered by the light-shielding layer 123. Furthermore, in other embodiments, the provision of the light-shielding layer 123 is not mandatory, and those skilled in the art can choose it as needed. Without the light-shielding layer 123, the planarization layer 122 of the blind hole edge region 1022 covers the first substrate 11.

[0048] See next Figure 1-3 The second functional layer 22 has three structures. All three structures of the second functional layer 22 can effectively reduce the thickness of the functional layer within the blind aperture light-transmitting area 1021, thereby reducing the absorption and reflection of light by the blind aperture light-transmitting area 1021, and thus improving the light transmittance of the blind aperture light-transmitting area 1021. The first structure, such as... Figure 1 As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221 and the second substrate 21 of the blind hole edge region 1022. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223, the gate protection layer 222 of the display area 101 and the blind hole edge region 1022, and the second substrate 21 of the blind hole light-transmitting region 1021. In the above configuration, the gate protection layer 222 is only disposed in the display area 101 and the blind hole edge area 1022, while the blind hole light-transmitting area 1021 does not have this film layer stack. Combined with the planarization layer 122 retained in the blind hole light-transmitting area 1021 in the color filter substrate 1, the display panel 100 achieves the purpose of improving the light transmittance of the blind hole light-transmitting area 1021 by eliminating the gate protection layer 222 in the blind hole light-transmitting area 1021.

[0049] In the blind aperture light-transmitting area 1021, the insulating layer 224 has a dimension of less than or equal to 0.5 μm and greater than 0 μm in the thickness direction of the display panel 100.

[0050] The second structure, such as Figure 2As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221, the blind hole edge region 1022, and the blind hole light-transmitting region 1021 of the second substrate 21. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223, the gate protection layer 222 of the display area 101 and the blind hole edge region 1022. In the above configuration, the insulating layer 224 is only disposed in the display area 101 and the blind hole edge area 1022, while the blind hole light-transmitting area 1021 does not have this film layer stacked. Combined with the planarization layer 122 retained in the blind hole light-transmitting area 1021 in the color filter substrate 1, the display panel 100 achieves the purpose of improving the light transmittance of the blind hole light-transmitting area 1021 by having no insulating layer in the blind hole light-transmitting area 1021.

[0051] In the blind aperture light-transmitting area 1021, the gate protection layer 222 has a dimension of less than or equal to 0.5 μm and greater than 0 μm in the thickness direction of the display panel 100.

[0052] The third structure, such as Figure 3 As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221 and the second substrate 21 of the blind hole edge region 1022. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223 and the gate protection layer 222 of the display area 101 and the blind hole edge region 1022. In the above configuration, the insulating layer 224 and the gate protection layer 222 are only disposed in the display area 101 and the blind hole edge region 1022. Combined with the planarization layer 122 retained in the blind hole light-transmitting area 1021 in the color filter substrate 1, the display panel 100 achieves the purpose of improving the light transmittance of the blind hole light-transmitting area 1021 by eliminating the second functional layer 22 in the blind hole light-transmitting area 1021.

[0053] The third structure corresponds to a display panel with a light transmittance of 95.3%. In contrast, the existing technology has an insulating layer 224 and a gate protection layer 222 in the blind aperture light-transmitting area 1021, and its other structures and thicknesses are exactly the same as those of the third structure display panel, with a light transmittance of 93.0%. Compared to the third structure, the light transmittance is increased by 2.1%.

[0054] In all three structures described above, the active device 223 includes an active layer and a source-drain layer. The active layer is disposed on the gate protection layer 222 of the display area 101 and the blind hole edge area 1022, the source-drain layer is disposed on the active layer, and the insulating layer 224 covers the source-drain layer.

[0055] In the second implementation, such as Figure 4-7 As shown, the first functional layer 12 includes a photoresist layer 121, a planarization layer 122, and a light-shielding layer 123. The photoresist layer 121 and the light-shielding layer 123 are disposed on the same layer of the first substrate 11 along the thickness direction of the display panel 100, close to the array substrate 2. The photoresist layer 121 is disposed in the display area 101, and the light-shielding layer 123 is disposed in the blind aperture edge area 1022. Along the thickness direction of the display panel 100, the orthogonal projection of the light-shielding layer 123 onto the first substrate 11 completely covers the blind aperture edge area 1022 of the first substrate 11, thereby effectively blocking stray light leakage from the blind aperture edge area 1022, avoiding light leakage problems at the blind aperture edge, and improving the optical performance consistency and imaging quality of the blind aperture area 102. The planarization layer 122 covers the photoresist layer 121 of the display area 101 and the light-shielding layer 123 of the blind aperture edge area 1022. In the above configuration, the planarization layer 122 is only disposed in the display area 101 and the blind hole edge area 1022, while the blind hole light-transmitting area 1021 does not have this film layer stacked, thereby reducing the thickness of the first functional layer 12 in the blind hole light-transmitting area 1021 and improving the light transmittance of the blind hole light-transmitting area 1021.

[0056] The photoresist layer 121 is the same as in the first embodiment, and will not be described again here.

[0057] See next Figure 4-7 The second functional layer 22 has four structures. The first structure is as follows: Figure 4As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221, the blind aperture edge region 1022, and the blind aperture light-transmitting region 1021 of the second substrate 21. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind aperture edge region 1022. The insulating layer 224 covers the active device 223 and the gate protection layer 222 of the display area 101, the blind aperture light-transmitting region 1021, and the blind aperture edge region 1022. Through the above arrangement, the display panel 100 achieves the purpose of increasing the light transmittance of the blind aperture light-transmitting region 1021 by reducing the thickness of the first functional layer 12 within the blind aperture light-transmitting region 1021. In the above configuration, the blind aperture light-transmitting area 1021 retains the insulating layer 224 and the gate protection layer 222. Combined with the fact that the blind aperture light-transmitting area 1021 in the color filter substrate 1 does not have a planarization layer 122, the display panel 100 achieves the purpose of improving the light transmittance of the blind aperture light-transmitting area 1021 by eliminating the first functional layer 12 in the blind aperture light-transmitting area 1021.

[0058] In the blind aperture light-transmitting area 1021, the thicknesses of the insulating layer 224 and the gate protection layer 222 are the same as in the first embodiment, and will not be described again here.

[0059] The second structure, such as Figure 5 As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221 and the second substrate 21 of the blind hole edge region 1022. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223, the gate protection layer 222 of the display area 101 and the blind hole edge region 1022, and the second substrate 21 of the blind hole light-transmitting region 1021. By using the above configuration, the gate protection layer 222 and the planarization layer 122 in the display panel 100 are only disposed in the display area 101 and the blind hole edge area 1022, while the array substrate 2 of the blind hole light-transmitting area 1021 has no gate protection layer 222 and the color filter substrate 1 has no planarization layer 122. This allows the display panel 100 to improve the light transmittance of the blind hole light-transmitting area 1021 by eliminating the first functional layer 12 and the gate protection layer 222.

[0060] In the blind aperture light-transmitting area 1021, the thickness of the insulating layer 224 is the same as in the first embodiment, and will not be described again here.

[0061] The third structure, such as Figure 6As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221, the blind hole edge region 1022, and the blind hole light-transmitting region 1021 of the second substrate 21. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223, the gate protection layer 222 of the display area 101 and the blind hole edge region 1022. In the above configuration, the insulating layer 224 and the planarization layer 122 in the display panel 100 are only disposed in the display area 101 and the blind hole edge area 1022, while the array substrate 2 of the blind hole light-transmitting area 1021 has no insulating layer 224 and the color filter substrate 1 has no planarization layer 122. This allows the display panel 100 to improve the light transmittance of the blind hole light-transmitting area 1021 by eliminating the first functional layer 12 and the insulating layer 224.

[0062] In the blind aperture light-transmitting area 1021, the thickness of the gate protective layer 222 is the same as in the first embodiment, and will not be described again here.

[0063] The fourth structure, such as Figure 7 As shown, the second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221 and the second substrate 21 of the blind hole edge region 1022. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223 and the gate protection layer 222 of the display area 101 and the blind hole edge region 1022. By using the above configuration, the insulating layer 224, gate protection layer 222, and planarization layer 122 in the display panel 100 are only disposed in the display area 101 and the blind hole edge area 1022. The array substrate 2 of the blind hole light-transmitting area 1021 has no insulating layer 224 and gate protection layer 222, and the color filter substrate 1 has no planarization layer 122. This allows the display panel 100 to improve the light transmittance of the blind hole light-transmitting area 1021 by eliminating the first functional layer 12 and the second functional layer 22.

[0064] Among them, the active device 223 in the array substrate 2 of the above four structures is the same as above, and will not be described again here.

[0065] In the third implementation method, such as Figure 8As shown, the first functional layer 12 includes a photoresist layer 121, a planarization layer 122, and a light-shielding layer 123. The photoresist layer 121 and the light-shielding layer 123 are disposed on the same layer of the first substrate 11 along the thickness direction of the display panel 100, close to the array substrate 2. The photoresist layer 121 is disposed in the display area 101, and the light-shielding layer 123 is disposed in the blind aperture edge area 1022. The planarization layer 122 covers the photoresist layer 121 in the display area 101, the first substrate 11 in the blind aperture light-transmitting area 1021, and the light-shielding layer 123 in the blind aperture edge area 1022. In the thickness direction of the display panel 100, the size of the planarization layer 122 in the blind aperture light-transmitting area 1021 is smaller than its corresponding size in the blind aperture edge area 1022 and the display area 101. The second functional layer 22 includes a gate 221, a gate protection layer 222, an active device 223, and an insulating layer 224. The gate 221 is disposed on the second substrate 21 located in the display area 101. The gate protection layer 222 covers the gate 221, the blind hole edge region 1022, and the blind hole light-transmitting region 1021 of the second substrate 21. The active device 223 is disposed on the gate protection layer 222 located in the display area 101 and the blind hole edge region 1022. The insulating layer 224 covers the active device 223 and the gate protection layer 222 of the display area 101, the blind hole light-transmitting region 1021, and the blind hole edge region 1022. Specifically, in the thickness direction of the display panel 100, the size of the gate protection layer 222 in the blind hole light-transmitting region 1021 is smaller than its size in the blind hole edge region 1022 and the display area 101, and the size of the insulating layer 224 in the blind hole light-transmitting region 1021 is smaller than its size in the blind hole edge region 1022 and the display area 101. The above configuration can reduce the size of the insulating layer 224, the gate protection layer 222, and the planarization layer 122 in the blind aperture light-transmitting area 1021, thereby reducing the absorption and reflection of light in this area and improving the light transmittance of the blind aperture light-transmitting area 1021.

[0066] Compared to the first embodiment, this embodiment thins the planarization layer 122, gate protection layer 222, and insulating layer 224 in the blind aperture light-transmitting area 1021. This results in the dimensions of these three layers in the thickness direction of the display panel 100 being smaller than the corresponding dimensions in the first and second embodiments, and the thinning ratio of each layer is greater than 0 and less than 100%. By thinning the planarization layer 122, gate protection layer 222, and insulating layer 224, the light transmittance of the blind aperture light-transmitting area 1021 can be effectively improved. Specifically, in this embodiment, in the blind aperture light-transmitting area 1021, the dimension of the planarization layer 122 in the thickness direction of the display panel 100 is greater than 0 μm and less than 2.5 μm, the dimension of the gate protection layer 222 in the thickness direction of the display panel 100 is greater than 0 μm and less than 0.5 μm, and the dimension of the insulating layer 224 in the thickness direction of the display panel 100 is greater than 0 μm and less than 0.5 μm.

[0067] Furthermore, in this embodiment, the photoresist layer 121 and the active device 223 are the same as in the first embodiment, and will not be described again here.

[0068] For example, this application may also reduce the size of the insulating layer 224, the gate protection layer 222 or the planarization layer 122 in the blind hole light transmission area 1021, or reduce the size of any two of the three, which can also achieve the effect of reducing the absorption and reflection of light by the blind hole light transmission area 1021 and improving the light transmittance of the blind hole light transmission area 1021.

[0069] In the first to third embodiments described above, the planarization layer 122 is made of an amphiphilic resin material containing both hydrophilic and hydrophobic groups. This allows the planarization layer 122 to form good adhesion with adjacent film layers, reducing interfacial recombination, and also prevents external moisture and other substances from intruding, thus acting as a protective barrier. Furthermore, both the gate protection layer 222 and the insulating layer 224 can be made of SiNx to provide excellent electrical insulation and dense protection.

[0070] See next Figure 1-8 The liquid crystal display panel 100 also includes a first alignment layer 5 and a second alignment layer 6. The first alignment layer 5 is disposed on the side of the color filter substrate 1 facing the array substrate 2 along the thickness direction of the display panel 100, and the second alignment layer 6 is disposed on the side of the array substrate 2 facing the color filter substrate 1 along the thickness direction of the display panel 100. The two are disposed opposite to each other along the thickness direction of the display panel 100, and a liquid crystal layer 4 is disposed between the first alignment layer 5 and the second alignment layer 6. This allows the liquid crystal display panel 100 to meet the high transmittance requirements of the blind aperture light-transmitting area 1021 while ensuring the normal display function of the liquid crystal display panel 100.

[0071] It should be noted that the above-mentioned first alignment layer 5 and second alignment layer 6 are mainly for the liquid crystal display panel 100. For example, when the display panel 100 is of other types, such as an organic light-emitting diode (OLED) display panel 100, the first alignment layer 5 and second alignment layer 6 are not necessary.

[0072] For example, since the first functional layer 12 in the color filter substrate 1 has two structures, the covering method of the first alignment layer 5 is also different. Specifically, when the planarization layer 122 covers the photoresist layer 121 of the display area 101 and the first substrate 11 of the blind aperture light-transmitting area 1021 and the blind aperture edge area 1022, the first alignment layer 5 is disposed on the side of the planarization layer 122 facing away from the first substrate 11 along the thickness direction of the display panel 100. When the planarization layer 122 covers the photoresist layer 121 of the display area 101 and the first substrate 11 of the blind aperture edge area 1022, the first alignment layer 5 is disposed on the planarization layer 122 of the display area 101 and the blind aperture edge area and the first substrate 11 of the blind aperture light-transmitting area.

[0073] For example, since there are four structures for the second functional layer 22 in the array substrate 2, the covering method of the second alignment layer 6 is also different. Specifically, when the insulating layer 224 covers the gate protection layer 222 of the active device 223, the display area 101, and the blind hole edge region 1022, as well as the second substrate 21 or gate protection layer 222 of the blind hole light-transmitting region 1021, the second alignment layer 6 is disposed on the insulating layer 224. When the insulating layer 224 covers the gate protection layer 222 of the active device 223, the display area 101, and the blind hole edge region 1022, as well as the second substrate 21 of the blind hole light-transmitting region, and a gate protection layer 222 is disposed thereon, the second alignment layer 6 is disposed on the insulating layer 224 of the display area 101 and the blind hole edge region 1022, as well as the gate protection layer 222 of the blind hole light-transmitting region 1021. When the insulating layer 224 covers the active device 223 and the gate protection layer 222 of the display area 101 and the blind hole edge area 1022, the second alignment layer 6 is disposed on the insulating layer 224 of the display area 101 and the blind hole edge area 1022 and the second substrate 21 of the blind hole light-transmitting area 1021.

[0074] See next Figure 1-8 The liquid crystal display panel 100 also includes a plurality of support members 3, which are all located in the blind hole edge region 1022 and are spaced apart circumferentially along the blind hole edge region 1022. Each support member 3 is disposed between the planarization layer 122 and the second alignment layer 6, thereby providing stable support for the blind hole region 102, preventing deformation of the blind hole region 102, and thus ensuring the shooting quality of the camera.

[0075] For example, the support member 3 can also be disposed between the insulating layer 224 and the first alignment layer 5 to provide stable support for the blind hole area 102. When the display panel 100 is of other types, since the first alignment layer 5 and the second alignment layer 6 are not necessary, the support member 3 is disposed between the planarization layer 122 and the insulating layer 224.

[0076] In addition, this application also provides a method for manufacturing a display panel 100, the method comprising: S1. Provide a first substrate 11 and a second substrate 21. The first substrate 11 and the second substrate 21 respectively have a blind hole light-transmitting area 1021, a blind hole edge area 1022 and a display area 101 corresponding to the display panel 100. The display area 101 surrounds the blind hole edge area 1022 and the blind hole edge area surrounds the blind hole light-transmitting area 1021. S2. A first functional layer 12 is formed on a first substrate 11 to obtain a color filter substrate 1, and a second functional layer 22 is formed on a second substrate 21 to obtain an array substrate 2, such that at least one of the first functional layer 12 and the second functional layer 22 has a thickness in the blind aperture light transmission region 1021 that is less than its thickness in the blind aperture edge region 1022. S3. The color filter substrate 1 and the array substrate 2 are aligned using a cell alignment process, and the display layer is placed between the two to obtain the display panel 100.

[0077] This application forms a first functional layer 12 and a second functional layer 22 on a first substrate 11 and a second substrate 21, respectively, and makes the thickness of at least one of the first functional layer 12 and the second functional layer 22 in the blind aperture light-transmitting area 1021 less than its thickness in the blind aperture edge area 1022. This effectively reduces the absorption and reflection of light by the blind aperture light-transmitting area 1021, significantly improves the light transmittance of the blind aperture light-transmitting area 1021, provides sufficient optical performance guarantee for the under-display camera, and meets the requirements for high-quality shooting.

[0078] This application provides three embodiments of the display panel 100. The preparation methods of each of the three embodiments of the display panel 100 are described below.

[0079] In the first implementation, such as Figure 1-3 As shown, the specific steps for forming the color filter substrate 1 include: forming a photoresist layer 121 on a first substrate 11 located in the display area 101 and forming a light-shielding layer 123 on the first substrate 11 located in the blind aperture edge region 1022. A planarization layer 122 is formed on the photoresist layer 121 in the display area 101, the light-shielding layer 123 in the blind aperture edge region 1022, and the first substrate 11 in the blind aperture edge region 1022.

[0080] The photoresist layer 121 and the light-shielding layer 123 are the same as above, and will not be described again here.

[0081] See next Figure 1-3 The second functional layer 22 has three structures. The first structure is as follows: Figure 1 As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221 and the second substrate 21 of the blind aperture edge region 1022; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind aperture edge region 1022; and forming an insulating layer 224 on the active device, the gate protection layer 222 of the display area 101 and the blind aperture edge region 1022, and the second substrate 21 of the blind aperture light-transmitting region 1021. In the array substrate 2 obtained through the above steps, the blind aperture light-transmitting region 1021 does not have a gate protection layer 222. Combined with the planarization layer 122 retained in the blind aperture light-transmitting region 1021 in the color filter substrate 1, the display panel 100 achieves the purpose of improving the light transmittance of the blind aperture light-transmitting region 1021 by eliminating the gate protection layer 222 in the blind aperture light-transmitting region 1021.

[0082] The second structure, such as Figure 2As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221, the blind aperture edge region 1022, and the blind aperture light-transmitting region 1021 on the second substrate 21; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind aperture edge region 1022; and forming an insulating layer 224 on the active device, the display area 101, and the gate protection layer 222 of the blind aperture edge region 1022. In the array substrate 2 obtained through the above steps, the blind aperture light-transmitting region 1021 does not have an insulating layer 224. Combined with the planarization layer 122 retained in the blind aperture light-transmitting region 1021 in the color filter substrate 1, the display panel 100 achieves the purpose of improving the light transmittance of the blind aperture light-transmitting region 1021 by eliminating the insulating layer 224 in the blind aperture light-transmitting region 1021.

[0083] The third structure, such as Figure 3 As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221 and the second substrate 21 of the blind aperture edge region 1022; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind aperture edge region 1022; and forming an insulating layer 224 on the active device, the display area 101, and the gate protection layer 222 of the blind aperture edge region 1022. In the array substrate 2 obtained through the above steps, the blind aperture light-transmitting region 1021 does not have an insulating layer 224 and a gate protection layer 222 formed. Combined with the planarization layer 122 retained in the blind aperture light-transmitting region 1021 in the color filter substrate 1, the display panel 100 achieves the purpose of improving the light transmittance of the blind aperture light-transmitting region 1021 by eliminating the second functional layer 22 in the blind aperture light-transmitting region 1021.

[0084] In all three structures described above, the active device 223 is the same as above, and will not be described again here.

[0085] In the second implementation, such as Figure 4-7 As shown, the specific steps for forming the color filter substrate 1 include: forming a photoresist layer 121 on a first substrate 11 located in the display area 101 and forming a light-shielding layer 123 on the first substrate 11 located in the blind aperture edge region 1022. A planarization layer 122 is formed on the photoresist layer 121 in the display area 101, the light-shielding layer 123 in the blind aperture edge region 1022, and the first substrate 11 in the blind aperture light-transmitting region 1021. In the color filter substrate 1 obtained through the above steps, the planarization layer 122 is not formed in the blind aperture light-transmitting region 1021, thus improving the light transmittance of the blind aperture light-transmitting region 1021 by eliminating the first functional layer 12 in this area.

[0086] See next Figure 4-7 The second functional layer 22 has four structures. The first structure is as follows: Figure 4As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221, the blind aperture edge region 1022, and the blind aperture light-transmitting region 1021 on the second substrate 21; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind aperture edge region 1022; and forming an insulating layer 224 on the active device, the gate protection layer 222 of the display area 101 and the blind aperture edge region 1022, and the second substrate 21 of the blind aperture light-transmitting region 1021. In the array substrate 2 obtained through the above steps, the blind aperture light-transmitting region 1021 retains the insulating layer 224 and the gate protection layer 222. Combined with the fact that the blind aperture light-transmitting region 1021 in the color filter substrate 1 does not have a planarization layer 122, the display panel 100 achieves the purpose of improving the light transmittance of the blind aperture light-transmitting region 1021 by eliminating the first functional layer 12 in the blind aperture light-transmitting region 1021.

[0087] The second structure, such as Figure 5 As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221 and the second substrate 21 of the blind hole edge region 1022; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind hole edge region 1022; and forming an insulating layer 224 on the active device, the gate protection layer 222 of the display area 101 and the blind hole edge region 1022, and the second substrate 21 of the blind hole light-transmitting region 1021. In the array substrate 2 obtained through the above steps, the blind aperture light-transmitting region 1021 does not have a gate protection layer 222 formed. Combined with the fact that the blind aperture light-transmitting region 1021 in the color filter substrate 1 does not have a planarization layer 122 formed, the thickness of the first functional layer 12 in the blind aperture light-transmitting region 1021 is zero and the second functional layer 22 in the blind aperture light-transmitting region 1021 does not have a gate protection layer 222. This reduces the thickness of the functional layer in the blind aperture light-transmitting region 1021, thereby reducing the absorption and reflection of light by the blind aperture light-transmitting region 1021 and improving the light transmittance of the blind aperture light-transmitting region 1021.

[0088] The third structure, such as Figure 6As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221, the second substrate 21 as well as the blind hole edge region 1022 and the blind hole light-transmitting region 1021; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind hole edge region 1022; and forming an insulating layer 224 on the active device, the display area 101, and the gate protection layer 222 of the blind hole edge region 1022. The array substrate 2 obtained through the above steps has no insulating layer 224 formed in the blind aperture light-transmitting area 1021. Combined with the fact that no planarization layer 122 is formed in the blind aperture light-transmitting area 1021 in the color filter substrate 1, the thickness of the first functional layer 12 in the blind aperture light-transmitting area 1021 is zero and the second functional layer 22 has no insulating layer 224 in the blind aperture light-transmitting area 1021. This reduces the thickness of the functional layer in the blind aperture light-transmitting area 1021, thereby reducing the absorption and reflection of light by the blind aperture light-transmitting area 1021 and improving the light transmittance of the blind aperture light-transmitting area 1021.

[0089] The fourth structure, such as Figure 7 As shown, the specific steps for forming the second functional layer 22 include: forming a gate 221 on the second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221, the second substrate 21 as well as the blind hole edge region 1022 and the blind hole light-transmitting region 1021; forming an active device 223 on the gate protection layer 222 of the display area 101 and the blind hole edge region 1022; and forming an insulating layer 224 on the active device, the display area 101, and the gate protection layer 222 of the blind hole edge region 1022. The array substrate 2 obtained through the above steps does not have a gate protection layer 222 and an insulating layer 224 formed in the blind aperture light-transmitting region 1021. Combined with the fact that the blind aperture light-transmitting region 1021 in the color filter substrate 1 does not have a planarization layer 122 formed, the thickness of the first functional layer 12 and the second functional layer 22 in the blind aperture light-transmitting region 1021 is zero, thereby minimizing the absorption and reflection of light by the blind aperture light-transmitting region 1021 and improving the light transmittance of the blind aperture light-transmitting region 1021.

[0090] In the first and second embodiments, the thickness and material of the planarization layer 122, the gate protection layer 222 and the insulating layer 224 are the same as described above, and will not be repeated here.

[0091] In the third implementation, such as Figure 8As shown, the specific steps for forming the color filter substrate 1 include: forming a photoresist layer 121 on a first substrate 11 located in the display area 101 and forming a light-shielding layer 123 on a first substrate 11 located in the blind aperture edge region 1022. A planarization layer 122 is formed on the photoresist layer 121 in the display area 101, the light-shielding layer 123 in the blind aperture edge region 1022, and the first substrate 11 in the blind aperture edge region 1022. The thickness of the planarization layer 122 in the blind aperture light-transmitting region 1021 is less than its thickness in the blind aperture edge region 1022. The specific steps for forming the second functional layer 22 include: forming a gate 221 on a second substrate 21 located in the display area 101; forming a gate protection layer 222 on the gate 221, the second substrate 21 containing the blind aperture edge region 1022 and the blind aperture light-transmitting region 1021; forming an active device 223 on the gate protection layer 222 in the display area 101 and the blind aperture edge region 1022; and forming an insulating layer 224 on the active device, the gate protection layer 222 in the display area 101 and the blind aperture edge region 1022, and the second substrate 21 containing the blind aperture light-transmitting region 1021. The thickness of the gate protection layer 222 in the blind aperture light-transmitting region 1021 is less than its thickness in the blind aperture edge region 1022, and the thickness of the insulating layer 224 in the blind aperture light-transmitting region 1021 is less than its thickness in the blind aperture edge region 1022. By adopting the above configuration method, while ensuring the continuity and integrity of each film layer, the light transmittance of the blind hole light-transmitting area 1021 is improved by reducing the thickness of the insulating layer 224, the gate protection layer 222, and the planarization layer 122 in the blind hole light-transmitting area 1021.

[0092] Compared to the first embodiment, this embodiment thins the planarization layer 122, gate protection layer 222, and insulating layer 224 formed in the blind aperture light-transmitting area 1021. This results in the dimensions of these three layers in the thickness direction of the display panel 100 being smaller than the corresponding dimensions in the first and second embodiments, and the thinning ratio of each layer being greater than 0 and less than 100%. By thinning the planarization layer 122, gate protection layer 222, and insulating layer 224, the light transmittance of the blind aperture light-transmitting area 1021 can be effectively improved.

[0093] For example, this application may also reduce the size of the insulating layer 224, the gate protection layer 222 or the planarization layer 122 in the blind hole light transmission area 1021, or reduce the size of any two of the three, which can also achieve the effect of reducing the absorption and reflection of light by the blind hole light transmission area 1021 and improving the light transmittance of the blind hole light transmission area 1021.

[0094] See next Figure 1-8After forming a planarization layer 122 in the blind aperture edge region 1022, a plurality of support members 3 are formed on the planarization layer 122 in the blind aperture edge region 1022, and the plurality of support members 3 are spaced apart circumferentially along the blind aperture edge region 1022. After forming the support members 3, a first alignment layer 5 is formed on the first functional layer 12. After forming a second functional layer 22 on the second substrate 21, a second alignment layer 6 is formed on the second functional layer 22. Then, a cell assembly process is used to assemble the color filter substrate 1 and the array substrate 2, and liquid crystal is filled to obtain the display panel 100. Through the above steps, stable support can be provided for the blind aperture region 102, avoiding deformation of the blind aperture region 102, thereby ensuring the shooting quality of the camera.

[0095] In an exemplary embodiment, the support member 3 can also be formed on the insulating layer 224 of the blind hole edge region 1022. After forming the support member 3, a second orientation layer 6 is formed on the second functional layer 22, which can also provide stable support for the blind hole region 102. Furthermore, in other embodiments, the support member 3 is not mandatory, and those skilled in the art can choose it according to the requirements. Without the support member 3, after forming the planarization layer 122 and the insulating layer 224, a first orientation layer 5 is formed on the first functional layer 12, and a second orientation layer is formed on the second functional layer 22.

[0096] In an exemplary embodiment, since the first functional layer 12 in the color filter substrate 1 has two structures, the covering method of the first alignment layer 5 is also different. Specifically, when the planarization layer 122 covers the photoresist layer 121 of the display area 101 and the first substrate 11 of the blind aperture light-transmitting area 1021 and the blind aperture edge area 1022, the first alignment layer 5 is formed on the side of the planarization layer 122 facing away from the first substrate 11 along the thickness direction of the display panel 100. When the planarization layer 122 covers the photoresist layer 121 of the display area 101 and the first substrate 11 of the blind aperture edge area 1022, the first alignment layer 5 is formed on the planarization layer 122 of the display area 101 and the blind aperture edge area, and on the first substrate 11 of the blind aperture light-transmitting area.

[0097] In exemplary embodiments, since the second functional layer 22 in the array substrate 2 has four different structures, the covering method of the second alignment layer 6 is also different. Specifically, when the insulating layer 224 covers the gate protection layer 222 of the active device 223, the display area 101, and the blind hole edge region 1022, as well as the second substrate 21 or gate protection layer 222 of the blind hole light-transmitting region 1021, the second alignment layer 6 is formed on the insulating layer 224. When the insulating layer 224 covers the gate protection layer 222 of the active device 223, the display area 101, and the blind hole edge region 1022, and the second substrate 21 of the blind hole light-transmitting region, and a gate protection layer 222 is disposed thereon, the second alignment layer 6 is formed on the insulating layer 224 of the display area 101 and the blind hole edge region 1022, and the gate protection layer 222 of the blind hole light-transmitting region 1021. When the insulating layer 224 covers the active device 223 and the gate protection layer 222 of the display area 101 and the blind hole edge area 1022, the second alignment layer 6 is formed on the insulating layer 224 of the display area 101 and the blind hole edge area 1022 and the second substrate 21 of the blind hole light-transmitting area 1021.

[0098] In addition, this application also provides a display module, which includes the display panel of any of the above embodiments, and the display panel is prepared by the preparation method of any of the above embodiments.

[0099] In addition, this application also provides a display device, which includes the above-mentioned display module.

[0100] Those skilled in the art will understand that although some embodiments herein include certain features included in other embodiments but not others, combinations of features from different embodiments are intended to be within the scope of this application and form different embodiments. For example, any of the claimed embodiments in the claims of this application can be used in any combination.

[0101] The technical solution of the present invention has been described above with reference to the preferred embodiments shown in the accompanying drawings. However, it will be readily understood by those skilled in the art that the scope of protection of the present invention is obviously not limited to these specific embodiments. Without departing from the principles of the present invention, those skilled in the art can make equivalent changes or substitutions to the relevant technical features, and the technical solutions after such changes or substitutions will all fall within the scope of protection of the present invention.

Claims

1. A display panel, characterized in that, The display panel (100) includes a color filter substrate (1), an array substrate (2), and a display layer. The color filter substrate (1) and the array substrate (2) are disposed opposite to each other, and the display layer is disposed between them. The display panel (100) also includes a blind hole area (102) and a display area (101) surrounding the blind hole area (102). The blind hole area (102) includes a blind hole light-transmitting area (1021) and a blind hole edge area (1022) surrounding the blind hole light-transmitting area (1021). The color filter substrate (1) includes a first substrate (11) and a first functional layer (12) disposed on the side of the first substrate (11) facing the array substrate (2). The array substrate (2) includes a second substrate (21) and a second functional layer (22) disposed on the side of the second substrate (21) facing the color filter substrate (1). Wherein, at least one of the first functional layer (12) and the second functional layer (22) has a thickness in the light-transmitting area of ​​the blind hole (1021) that is less than its thickness in the edge area of ​​the blind hole (1022).

2. The display panel according to claim 1, characterized in that, The first functional layer (12) includes: A photoresist layer (121) is disposed on the first substrate (11) located in the display area (101); A planarization layer (122) covering the photoresist layer (121) of the display area (101) and the first substrate (11) of the blind aperture light-transmitting area (1021) and the blind aperture edge area (1022); and The second functional layer (22) includes: A gate (221) is disposed on a second substrate (21) located in the display area (101); The device comprises a gate protection layer (222), an active device (223), and an insulating layer (224). The gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind aperture edge region (1022). The active device (223) is disposed on the gate protection layer (222) located on the display area (101) and the blind aperture edge region (1022). The insulating layer (224) covers the active device (223) and the second substrate (21) of the blind aperture light-transmitting region (1021). Alternatively, the gate protection layer (222) covers the gate (221) and the blind aperture light-transmitting region (1021) and the blind aperture edge region (1022). The second substrate (21) of the hole edge region (1022) has the active device (223) disposed on the gate protection layer (222) located in the display area (101) and the blind hole edge region (1022), and the insulating layer (224) covers the active device (223); or, the gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind hole edge region (1022), the active device (223) is disposed on the gate protection layer (222) located in the display area (101) and the blind hole edge region (1022), and the insulating layer (224) covers the active device (223).

3. The display panel according to claim 1, characterized in that, The first functional layer (12) includes: A photoresist layer (121) is disposed on the first substrate (11) located in the display area (101); A planarization layer (122) covering the photoresist layer (121) of the display area (101) and the first substrate (11) of the blind aperture edge region (1022); and The second functional layer (22) includes: A gate (221) is disposed on a second substrate (21) located in the display area (101); The device comprises a gate protection layer (222), an active device (223), and an insulating layer (224). The gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind aperture edge region (1022). The active device (223) is disposed on the gate protection layer (222) located in the display area (101) and the blind aperture edge region (1022). The insulating layer (224) covers the active device (223) and the second substrate (21) of the blind aperture light-transmitting region (1021). Alternatively, the gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind aperture light-transmitting region (1021) and the blind aperture edge region (1022). The active device (223) is disposed on the gate protection layer (222) located in the display area (101) and the blind aperture edge region (1022). The insulating layer (224) covers the gate (222) and the second substrate (21) of the blind aperture edge region (1022). The active device (223) is covered; or, the gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind hole edge region (1022), the active device (223) is disposed on the gate protection layer (222) located in the display area (101) and the blind hole edge region (1022), and the insulating layer (224) covers the active device (223); or, the gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind hole light-transmitting region (1021) and the blind hole edge region (1022), the active device (223) is disposed on the gate protection layer (222) located in the display area (101) and the blind hole edge region (1022), and the insulating layer (224) covers the active device (223) and the gate protection layer (222) of the blind hole light-transmitting region (1021).

4. The display panel according to claim 1, characterized in that, The first functional layer (12) includes: A photoresist layer (121) is disposed on the first substrate (11) located in the display area (101); A planarization layer (122) covering the photoresist layer (121) of the display area (101) and the first substrate (11) of the blind aperture light-transmitting area (1021) and the blind aperture edge area (1022); and The second functional layer (22) includes: A gate (221) is disposed on a second substrate (21) located in the display area (101); The device comprises a gate protection layer (222), an active device (223), and an insulating layer (224). The gate protection layer (222) covers the gate (221) and the second substrate (21) of the blind aperture transparent region (1021) and the blind aperture edge region (1022). The active device (223) is disposed on the gate protection layer (222) located in the display area (101) and the blind aperture edge region (1022). The insulating layer (224) covers the active device (223) and the gate protection layer (222) of the blind aperture transparent region (1021). At least one of the planarization layer (122), the gate protection layer (222), and the insulating layer (224) has a thickness in the blind aperture light-transmitting region (1021) that is less than its thickness in the blind aperture edge region (1022).

5. The display panel according to any one of claims 2-4, characterized in that, The first functional layer (12) includes: A light-shielding layer (123) is disposed on the first substrate (11) in the same layer as the photoresist layer (121), and the light-shielding layer (123) is located in the edge region (1022) of the blind hole.

6. The display panel according to claim 1, characterized in that, The display panel (100) also includes: Support member (3) is located in the blind hole edge area (1022) and is disposed between the first functional layer (12) and the second functional layer (22).

7. The display panel according to claim 1, characterized in that, The display layer is a liquid crystal layer (4); and The display panel (100) also includes: The first orientation layer (5) is disposed on the side of the first functional layer (12) away from the first substrate (11); The second alignment layer (6) is disposed on the side of the second functional layer (22) away from the second substrate (21), and the liquid crystal layer (4) is disposed between the first alignment layer (5) and the second alignment layer (6).

8. A method for manufacturing a display panel, characterized in that, The preparation method includes: A first substrate (11) and a second substrate (21) are provided. The first substrate (11) and the second substrate (21) respectively have a blind hole light-transmitting area (1021), a blind hole edge area (1022) and a display area (101) corresponding to the display panel (100). The display area (101) surrounds the blind hole edge area (1022) and the blind hole edge area surrounds the blind hole light-transmitting area (1021). A color filter substrate (1) is obtained by forming a first functional layer (12) on the first substrate (11), and an array substrate (2) is obtained by forming a second functional layer (22) on the second substrate (21), such that at least one of the first functional layer (12) and the second functional layer (22) has a thickness in the blind aperture light transmission area (1021) less than its thickness in the blind aperture edge area (1022); The color filter substrate (1) and the array substrate (2) are aligned using a cell assembly process, with the display layer positioned between them, to obtain a display panel (100).

9. The preparation method according to claim 8, characterized in that, The specific steps for forming the color filter substrate (1) include: A photoresist layer (121) is formed on a first substrate (11) located in the display area (101). A planarization layer (122) is formed on the first substrate (11) of the photoresist layer (121) in the display area (101) and the blind aperture light-transmitting area (1021) and the blind aperture edge area (1022); and The specific steps for forming the array substrate (2) include: A gate (221) is formed on a second substrate (21) located in the display area (101). A gate protection layer (222) is formed on the second substrate (21) of the gate (221) and the blind hole edge region (1022), an active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223) and the second substrate (21) of the blind hole light-transmitting region (1021); or, a gate protection layer is formed on the second substrate (21) of the gate (221) and the blind hole light-transmitting region (1021) and the blind hole edge region (1022). A layer (222) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223); or, a gate protection layer (222) is formed on the second substrate (21) of the gate (221) and the blind hole edge region (1022), and an active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223).

10. The preparation method according to claim 8, characterized in that, The specific steps for forming the color filter substrate (1) include: A photoresist layer (121) is formed on the first substrate (11) located in the display area (101). A planarization layer (122) is formed on the photoresist layer (121) of the display area (101) and the first substrate (11) of the blind hole edge area (1022). The specific steps for forming the array substrate (2) include: A gate (221) is formed on a second substrate (21) located in the display area (101). A gate protection layer (222) is formed on the second substrate (21) of the gate (221) and the blind hole edge region (1022), an active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223) and the second substrate (21) of the blind hole light-transmitting region (1021); or, a gate protection layer (222) is formed on the second substrate (21) of the gate (221) and the blind hole light-transmitting region (1021) and the blind hole edge region (1022), an active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223); or A gate protection layer (222) is formed on the second substrate (21) of the gate (221) and the blind hole edge region (1022), an active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223); or, a gate protection layer (222) is formed on the second substrate (21) of the gate (221) and the blind hole light-transmitting region (1021) and the blind hole edge region (1022), an active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge region (1022), and an insulating layer (224) is formed on the active device (223) and the gate protection layer (222) of the blind hole light-transmitting region (1021).

11. The preparation method according to claim 8, characterized in that, The specific steps for forming the color filter substrate (1) include: A photoresist layer (121) is formed on a first substrate (11) located in the display area (101). A planarization layer (122) is formed on the first substrate (11) of the photoresist layer (121) in the display area (101) and the blind aperture light-transmitting area (1021) and the blind aperture edge area (1022); and The specific steps for forming the array substrate (2) include: A gate (221) is formed on a second substrate (21) located in the display area (101); A gate protection layer (222) is formed on the gate (221) and the second substrate (21) of the blind hole light-transmitting area (1021) and the blind hole edge area (1022). An active device (223) is formed on the gate protection layer (222) of the display area (101) and the blind hole edge area (1022). An insulating layer (224) is formed on the active device (223) and the gate protection layer (222) of the blind hole light-transmitting area (1021). When forming at least one of the planarization layer (122), the gate protection layer (222), and the insulating layer (224), its thickness in the blind hole light-transmitting region (1021) is less than its thickness in the blind hole edge region (1022).

12. The preparation method according to any one of claims 9-11, characterized in that, In addition to forming a photoresist layer (121) on the first substrate (11) located in the display area (101), the following are also included: A light-shielding layer (123) is formed in the same layer as the edge region (1022) of the blind hole.

13. The preparation method according to claim 8, characterized in that, After forming the first functional layer (12) on the first substrate (11) or forming the second functional layer (22) on the second substrate (21), the method further includes: A support member (3) is formed on the first functional layer (12) or the second functional layer (22).

14. The preparation method according to claim 8, characterized in that, After forming the first functional layer (12) on the first substrate (11) and the second functional layer (22) on the second substrate (21), the method further includes: A first orientation layer (5) is formed on the first functional layer (12), and a second orientation layer (6) is formed on the second functional layer (22). The color filter substrate (1) and the array substrate (2) are assembled using a cell assembly process and filled with liquid crystal to obtain a display panel (100).

15. A display module, characterized in that, The display module includes the display panel according to any one of claims 1-7, or the display panel prepared by the preparation method according to any one of claims 8-14.

16. A display device, characterized in that, The display device includes the display module as described in claim 15.

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