Plasma device

Abstract

The embodiment of the present disclosure provides a kind of plasma equipment, it is related to semiconductor equipment technical field.The plasma equipment includes: medium tube, it has opposite first end and second end along its axial direction;Gas inlet cover plate is located at the first end of medium tube;Inner liner tube is located at the inner side of medium tube, and it has first gap between medium tube;Inner liner tube includes multiple ring bodies arranged along the axial direction of medium tube;Gas inlet cover plate is provided with first fixed part;First fixed part cooperates with the ring body close to first end, to compress multiple ring bodies;Annular fixing part is located at the second end of medium tube;Annular fixing part has fixing part main part and limiting part, and fixing part main part is used to shield the first gap between medium tube and inner liner tube;Limiting part is connected with fixing part main part, and limiting part cooperates with the ring body close to second end;Processing chamber, the second end of medium tube is inserted into the opening of processing chamber, and processing chamber is detachably connected with annular fixing part.

Description

Technical Field

[0001] This disclosure relates to the field of semiconductor equipment technology, and more particularly to a plasma device. Background Technology

[0002] The plasma reaction chamber, as the primary area for plasma generation, is a key component in ICP (Inductively Coupled Plasma) etching machines and resist strippers used in semiconductor chip manufacturing processes. In related technologies, the plasma reaction chamber typically includes a dielectric tube and an inductor coil positioned around its outer periphery. During the process, radio frequency energy is fed into the inductor coil, and the resulting changing magnetic field passes through the dielectric tube, exciting the process gas inside into plasma. To reduce wafer contamination from byproducts generated within the chamber during the process, quartz is typically chosen as the material for the dielectric tube. However, when the process gas is excited into plasma, the plasma bombards the inner wall of the dielectric tube. Summary of the Invention

[0003] This disclosure provides a plasma device.

[0004] As one aspect of this disclosure, an embodiment provides a plasma device, comprising: a dielectric tube having a first end and a second end opposite to each other along its axial direction; an inlet cover plate located at the first end of the dielectric tube; an inner liner tube located inside the dielectric tube and having a first gap with the dielectric tube; the inner liner tube including a plurality of rings arranged along the axial direction of the dielectric tube; wherein the inlet cover plate is provided with a first fixing portion; the first fixing portion cooperates with the rings near the first end to press the plurality of rings together; an annular fixing member located at the second end of the dielectric tube; the annular fixing member having a fixing member main body and a limiting portion, the fixing member main body being used to block the first gap between the dielectric tube and the inner liner tube; the limiting portion being connected to the fixing member main body, the limiting portion cooperating with the rings near the second end to restrict the movement of the inner liner tube along the radial direction of the dielectric tube; and a processing chamber, the second end of the dielectric tube being inserted into the opening of the processing chamber, and the processing chamber being detachably connected to the annular fixing member.

[0005] In some embodiments, at least one of the annular bodies includes: an annular body main portion; at least one of a first extension portion and a second extension portion; the first extension portion is connected to and extends toward the air intake cover portion of the annular body main portion; the outer wall of the first extension portion is located inside the outer wall of the annular body main portion, and a first stepped surface is connected between the outer wall of the first extension portion and the outer wall of the annular body main portion; the second extension portion is connected to and extends toward the processing chamber portion of the annular body main portion; the inner wall of the second extension portion is located outside the inner wall of the annular body main portion, and a second stepped surface is connected between the inner wall of the second extension portion and the inner wall of the annular body main portion; wherein, in two adjacent annular bodies, the second extension portion of the annular body closer to the air intake cover portion overlaps the first stepped surface of the annular body closer to the processing chamber.

[0006] In some embodiments, at least one of the ring bodies has a first extension and a second extension along the axial direction of the medium tube, the first extension having a first height, the ring body having a second height, and the ratio b1 of the first height to the second height satisfying: 0.25≤b1≤0.34; the third height of the second extension is less than or equal to the first height of the first extension.

[0007] In some embodiments, the annulus near the first end extends from the first end of the medium tube in a direction toward the air intake cover.

[0008] In some embodiments, the first fixing portion includes a first mounting groove and a first sealing member mounted in the first mounting groove; wherein, a ring near the first end abuts against the first sealing member, such that the first sealing member presses against a plurality of the rings in a direction toward the processing chamber.

[0009] In some embodiments, the first mounting groove is a dovetail groove.

[0010] In some embodiments, the air inlet cover is provided with a first boss on the side facing the inner liner tube. The first boss is located inside the first mounting groove, such that the first boss covers the first seal and restricts the radial movement of the inner liner tube along the medium tube.

[0011] In some embodiments, the first fixing portion includes a second mounting groove; the width of the second mounting groove gradually increases along the direction toward the processing chamber; wherein the width direction of the second mounting groove is parallel to the radial direction of the medium tube; the thickness of the first end of the inner liner tube gradually decreases along the direction away from the processing chamber to cooperate with the second mounting groove; wherein the thickness direction of the inner liner tube is parallel to the radial direction of the medium tube.

[0012] In some embodiments, the air intake cover is further provided with at least one first exhaust hole, which communicates with the second mounting groove to discharge air from the second mounting groove.

[0013] In some embodiments, the limiting portion includes: a limiting pin; a limiting groove that cooperates with the limiting pin is provided on the ring body near the second end; wherein the limiting groove extends through the ring body in the direction toward the processing chamber.

[0014] In some embodiments, the limiting groove also penetrates the inner wall of the ring.

[0015] In some embodiments, the height of the limiting pin along the axial direction of the medium tube is less than or equal to the height of the limiting groove; the cross-section of the limiting groove along the radial direction of the medium tube is U-shaped.

[0016] In some embodiments, the limiting portion includes: a limiting ring, the outer wall of which is located inside the outer wall of the main body of the fixing member; a ring body near the second end overlaps the main body of the fixing member, and / or the limiting ring is inserted into the ring body near the second end.

[0017] In some embodiments, a second gap exists between the medium tube and the processing chamber; the annular fixing member is provided with at least one second vent hole, which is connected to the first gap and the second gap respectively, for discharging air from the first gap and the second gap during vacuuming.

[0018] In some embodiments, a third gap exists between the second end of the medium tube and the main body of the fixing member, the third gap communicating with the first gap and the second gap, and the third gap also communicating with the second vent hole; at least a portion of the second vent hole is offset from the first gap; or, at least a portion of the second vent hole is offset from the second gap.

[0019] In some embodiments, the main body of the fastener is detachably connected to the processing chamber by a plurality of screws; the annular fastener and screws are both made of aluminum or aluminum alloy.

[0020] In some embodiments, the inner liner is made of ceramic material.

[0021] The above overview is for illustrative purposes only and is not intended to be limiting in any way. Further aspects, embodiments, and features of this disclosure will become readily apparent from the accompanying drawings and the following detailed description, in addition to the illustrative aspects, embodiments, and features described above. Attached Figure Description

[0022] In the accompanying drawings, unless otherwise specified, the same reference numerals throughout the various drawings denote the same or similar parts or elements. These drawings are not necessarily drawn to scale. It should be understood that these drawings depict only some embodiments disclosed in this disclosure and should not be construed as limiting the scope of this disclosure.

[0023] Figure 1 This is a partial structural schematic diagram of a plasma device provided in an exemplary embodiment; Figure 2 yes Figure 1 An enlarged schematic diagram of part A in the middle; Figure 3 It is Figure 2 A schematic diagram of the concealed first seal in the middle; Figure 4 yes Figure 1 Enlarged schematic diagram of part B; Figure 5 yes Figure 1 An enlarged schematic diagram of section C; Figure 6 This is a bottom view of the bottom mounting structure of the inner liner tube provided in an exemplary embodiment; Figure 7 yes Figure 6 Partial sectional view along the DD direction; Figure 8 This is a schematic diagram of the structure of a ring-shaped fastener provided in an exemplary embodiment; Figure 9 yes Figure 8 Partial sectional view along the EE direction; Figure 10 This is a schematic diagram of the structure of the lowest ring provided in an exemplary embodiment; Figure 11 yes Figure 10 An enlarged schematic diagram of part F; Figure 12 This is a cross-sectional view of the lowest ring body and the annular fastener provided in an exemplary embodiment; Figure 13 yes Figure 12 A partial sectional view along the GG direction; Figure 14 yes Figure 13 An enlarged schematic diagram of the H section; Figure 15 This is a partial structural schematic diagram of a plasma device provided in another exemplary embodiment; Figure 16 yes Figure 15 An enlarged schematic diagram of part I; Figure 17 This is a schematic diagram of the installation of the air intake cover and inner liner pipe; Figure 18 yes Figure 15 An enlarged schematic diagram of part J; Figure 19 This is a schematic diagram of the structure of an air intake cover provided in an exemplary embodiment; Figure 20 It is along the air intake hood. Figure 19 A partial sectional view along the KK direction; Figure 21 This is a bottom view of the bottom mounting structure of the inner liner tube provided in an exemplary embodiment; Figure 22 It is a ring-shaped fastener along Figure 21 A partial sectional view along the LL direction; Figure 23 This is a schematic diagram of the structure of a ring-shaped fastener provided in another exemplary embodiment; Figure 24 It is a ring-shaped fastener along Figure 25 A partial sectional view along the MM direction; Figure 25 This is a schematic diagram of the installation scenario of the bottom ring and the ring-shaped fastener.

[0024] Explanation of reference numerals in the attached drawings: 10, air intake cover; 11, first fixing part; 111, first mounting groove; 112, first seal; 113, second mounting groove; 114, first exhaust port; 12, first boss; 20, medium pipe; 30, inner liner pipe; 31, ring body; 311, annular main body; 312, first extension; 313, second extension; 314, limiting groove; 40, annular fixing part; 41, fixing part main body; 42, limiting part; 421, limiting pin; 422, limiting ring; 43, screw; 44, second exhaust port; 50, processing chamber. Detailed Implementation

[0025] In the following description, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments can be modified in various ways without departing from the spirit or scope of this disclosure. Therefore, the drawings and description are to be considered exemplary in nature and not restrictive.

[0026] Please refer to Figures 1 to 25This embodiment provides a plasma device, including: a dielectric tube 20 having a first end and a second end opposite to each other along its axial direction; an inlet cover plate 10 located at the first end of the dielectric tube 20; an inner liner tube 30 located inside the dielectric tube 20 and having a first gap with the dielectric tube 20; the inner liner tube 30 includes a plurality of rings 31 arranged along the axial direction of the dielectric tube 20; wherein, the inlet cover plate 10 is provided with a first fixing part 11; the first fixing part 11 cooperates with the rings 31 near the first end to press the plurality of rings 31 together; and an annular fixing member. 40, located at the second end of the medium tube 20; the annular fastener 40 has a fastener body 41 and a limiting part 42, the fastener body 41 is used to block the first gap between the medium tube 20 and the inner liner tube 30; the limiting part 42 is connected to the fastener body 41, and the limiting part 42 cooperates with the ring body 31 near the second end to limit the radial movement of the inner liner tube 30 along the medium tube 20; the processing chamber 50, the second end of the medium tube 20 is inserted into the opening of the processing chamber 50, and the processing chamber 50 is detachably connected to the annular fastener 40.

[0027] For ease of description, we will take the direction from the processing chamber 50 toward the air inlet cover 10 as the top, the direction from the air inlet cover 10 toward the processing chamber 50 as the bottom, the vertical direction as the vertical direction, and the axial direction of the medium cylinder 20 as the example.

[0028] The plasma device includes an inlet cover plate 10, a dielectric tube 20, an inner liner tube 30, an annular fixing member 40, and a processing chamber 50. The inlet cover plate 10 is installed at the upper end of the dielectric tube 20. A second sealing member is provided between the inlet cover plate 10 and the dielectric tube 20. The inlet cover plate 10 and the dielectric tube 20 enclose a plasma generation space. The dielectric tube 20 is preferably a quartz tube; quartz material has good dielectric and wave transmission properties, which can meet the requirements of electromagnetic field coupling in the plasma device. The dielectric tube 20 has a first end (i.e., the upper end) and a second end (i.e., the lower end) arranged opposite each other along the axial direction; the second end is connected to the processing chamber 50. A third sealing member may be provided between the dielectric tube 20 and the processing chamber 50. The processing chamber 50 encloses a semiconductor workpiece processing space.

[0029] An inner liner 30 is provided inside the dielectric tube 20. The inner liner 30 is coaxially arranged with the dielectric tube 20. A first annular gap exists between the inner liner 30 and the dielectric tube 20 to allow for manufacturing errors and thermal expansion deformation. The wall thickness of the inner liner 30 is similar to that of the quartz dielectric tube 20. The inner liner 30 is made of corrosion-resistant material, such as high-purity alumina ceramic, aluminum nitride ceramic, or other materials that can withstand plasma corrosion.

[0030] The inner liner tube 30 is composed of multiple rings 31 stacked sequentially along the axial direction of the medium tube 20. In this way, when the induction coil is input with high power, each ring 31 can absorb and release thermal stress separately, reducing the accumulation of overall thermal stress in the entire inner liner tube 30 caused by excessive axial temperature difference, thereby reducing the risk of cracking of the inner liner tube 30 due to uneven heating and cooling.

[0031] The adjacent rings 31 are connected by a labyrinthine connection structure. This labyrinthine connection structure has a high axial step, which improves the guiding length and fit stability between the two adjacent rings 31, reducing the possibility of radial displacement, axial movement, or disengagement of the rings 31 during equipment opening, closing, and operation. The adjacent rings 31 are fitted with a high-precision, small-clearance fit, with the clearance controlled within a small range, for example, a tolerance of less than 0.02 mm. This also ensures that the labyrinthine connection structure has good cylindricity, coaxiality, and perpendicularity, thereby improving overall assembly accuracy and operational stability.

[0032] During the process, the plasma first acts on the inner wall of the inner liner tube 30. The inner liner tube 30 bears the main plasma bombardment and chemical corrosion, thus effectively preventing the plasma from directly acting on the dielectric tube 20. This protects the dielectric tube 20 from high-energy particle bombardment and hydrogen-based plasma chemical corrosion, significantly reducing the consumption rate of the dielectric tube 20 and significantly extending its service life. At the same time, since the dielectric tube 20 retains its excellent dielectric properties and electromagnetic field coupling ability, the double-layer tube structure can ensure stable plasma excitation under high power while also taking into account corrosion resistance and structural reliability.

[0033] The air intake cover 10 is provided with a first fixing part 11 for pressing the inner liner tube 30. In some examples, the first fixing part 11 includes a first mounting groove 111 provided on the air intake cover 10 and a first sealing member 112 installed in the first mounting groove 111. After the air intake cover 10 is installed, the first sealing member 112 presses the uppermost ring 31 axially and transmits the pressing force downward through the uppermost ring 31, so that the multiple rings 31 always remain in a stable and fitted state.

[0034] In other examples, the first fixing part 11 adopts a wedge-shaped clamping structure. The upper end of the uppermost ring 31 is conical, and the air intake cover 10 is provided with a corresponding conical groove. During the installation of the air intake cover 10, the upper end of the uppermost ring 31 gradually enters the conical groove to form a wedge fit, thereby achieving axial clamping and fixing of multiple rings 31. In other examples, the first sealing element 112 can also be directly fixed on the lower surface of the air intake plate 10 or on the top surface of the uppermost ring 31.

[0035] An annular fastener 40 is installed at the second end of the medium tube 20 and is detachably connected to the processing chamber 50. The annular fastener 40 includes a fastener body 41 and a limiting part 42. The fastener body 41 can be connected to the upper cover plate of the processing chamber 50, specifically to the lower surface of the upper cover plate. The inner circumference of the fastener body 41 can be flush with the inner wall of the lowest ring 31, or the inner circumference of the fastener body 41 is recessed outward relative to the inner wall of the lowest ring 31. The outer circumference of the fastener body 41 is located outside the outer wall of the lowest ring 31, or the outer circumference of the fastener body 41 is flush with the outer wall of the lowest ring 31. In this way, the fastener body 41 can block the first gap between the medium tube 20 and the inner liner tube 30, thereby preventing plasma from entering the first gap to form a plasma sheath layer, reducing the direct bombardment of the plasma on the inner wall of the medium tube 20, and improving the service life of the medium tube 20.

[0036] The main body 41 of the fastener is relatively thin to reduce the area exposed to the plasma region, thereby further reducing the possibility of contamination particles being generated from the metal material by plasma bombardment. For example, the thickness of the main body 41 of the fastener can be 2 mm, 2.5 mm, or 3 mm.

[0037] The limiting part 42 is integrally formed with or fixedly connected to the main body 41 of the fixing part, and cooperates with the lowest ring 31 to radially position the inner liner tube 30. In some examples, the limiting part 42 includes multiple pins evenly distributed along the circumference, and the lowest ring 31 is provided with multiple holes. The pins are inserted into the holes to achieve radial positioning of the inner liner tube 30, while maintaining an appropriate fitting clearance to accommodate dimensional changes during disassembly, assembly, and thermal expansion. In other examples, the limiting part 42 adopts a ring structure, and the lowest ring 31 is inserted into the ring structure to form a labyrinth fit, and radial positioning of the lowest ring 31 is achieved, improving the installation accuracy and stability of the entire inner liner tube 30.

[0038] During installation, the lower end of the medium tube 20 is installed into the opening of the upper cover plate of the processing chamber 50. The annular fastener 40 is fixed to the lower side of the upper cover plate of the processing chamber 50. The lowest ring 31 is installed onto the annular fastener 40. Multiple rings 31 are stacked in sequence to form a complete inner liner tube 30 assembly. Finally, the air inlet cover plate 10 is installed so that the first fixing part 11 applies axial clamping force to multiple rings 31, thereby achieving stable fixation of the inner liner tube 30 in the axial and radial directions. This ensures that the inner liner tube 30 does not loosen, shift, or fall off during long-term operation of the equipment, while effectively protecting the medium tube 20 from plasma bombardment, improving the reliability of equipment operation and the service life of the medium tube 20.

[0039] This application constructs a double-layer tube structure by setting an inner liner tube 30 composed of multiple stacked rings 31 inside the dielectric tube 20 and forming a first gap between the inner liner tube 30 and the dielectric tube 20. The inner liner tube 30 first withstands the plasma bombardment and chemical corrosion of hydrogen-based plasma, effectively blocking the plasma from directly acting on the inner wall of the dielectric tube 20, significantly reducing the corrosion and consumption of the dielectric tube 20, and extending the service life of the dielectric tube 20. Moreover, the inner liner tube 30 is composed of multiple stacked rings 31, and each ring 31 can absorb and release thermal stress separately, effectively alleviating the local high temperature and axial temperature difference caused by uneven plasma concentration distribution when the induction coil is fed at high power, and reducing the risk of cracking and damage of the entire inner liner tube 30 due to uneven heating and cooling. Multiple rings 31 are stacked axially and axially pressed together by the first fixing part 11 of the air inlet cover 10. They are radially limited by the limiting part 42 of the annular fixing member 40, ensuring that each ring 31 maintains a stable assembly state during equipment opening, closing, and long-term operation. This effectively prevents displacement, shifting, or detachment of the rings 31, improving the overall structural stability and assembly accuracy of the inner liner tube 30. The fixing body 41 of the annular fixing member 40 shields the first gap between the medium tube 20 and the inner liner tube 30, preventing plasma from entering the gap and forming a plasma sheath layer. This further avoids plasma bombardment of the inner wall of the medium tube 20, improving the protective effect and service life of the medium tube 20. Simultaneously, the annular fixing member 40 and the processing chamber 50 are detachably connected, facilitating the installation, replacement, and maintenance of the inner liner tube 30, and ensuring long-term stable operation of the equipment, balancing structural reliability, maintenance convenience, and process cleanliness.

[0040] Please refer to Figures 1 to 4 and reference Figure 15 In some embodiments, at least one annular body 31 includes: an annular main body 311; at least one of a first extension 312 and a second extension 313; the first extension 312 is connected to and extends toward the air intake cover 10 of the annular main body 311; the outer wall of the first extension 312 is located inside the outer wall of the annular main body 311, and a first stepped surface is connected between the outer wall of the first extension 312 and the outer wall of the annular main body 311; the second extension 313 is connected to and extends toward the processing chamber 50 of the annular main body 311; the inner wall of the second extension 313 is located outside the inner wall of the annular main body 311, and a second stepped surface is connected between the inner wall of the second extension 313 and the inner wall of the annular main body 311; wherein, in two adjacent annular bodies 31, the second extension 313 of the annular body 31 closer to the air intake cover 10 overlaps the first stepped surface of the annular body 31 closer to the processing chamber 50.

[0041] For example, each ring 31 includes an annular body portion 311, the axial direction of which is parallel to the axial direction of the medium tube 20. The wall thickness of the annular body portion 311 is approximately equal to the wall thickness of the medium tube 20.

[0042] At least one of the ring bodies 31 further includes a first extension 312; the first extension 312 is disposed at the upper end of the annular main body 311 and extends upward. The outer diameter of the first extension 312 is smaller than the outer diameter of the annular main body 311, thereby forming an annular first stepped surface between the first extension 312 and the annular main body 311. The inner diameter of the first extension 312 is equal to the inner diameter of the annular main body 311.

[0043] At least one of the rings 31 further includes a second extension 313; the second extension 313 is disposed at the lower end of the annular main body 311 and extends downward. The inner diameter of the second extension 313 is larger than the inner diameter of the annular main body 311, so that the second extension 313 forms a downwardly extending sleeve structure, and an annular second step surface is formed between the second extension 313 and the annular main body 311. The outer diameter of the second extension 313 is equal to the outer diameter of the annular main body 311.

[0044] For example, the uppermost ring 31 may include an annular main body 311 and a second extension 313 connected to the lower end of the annular main body 311 and extending downward. The lowermost ring 31 may include an annular main body 311 and a first extension 312 connected to the upper end of the annular main body 311 and extending upward. Other rings 31 may include an annular main body 311, a first extension 312, and a second extension 313. Of course, all rings 31 may include an annular main body 311, a first extension 312, and a second extension 313.

[0045] The outer wall of the first extension 312 is recessed inward relative to the outer wall of the annular main body 311 to facilitate engagement with the second extension 313 of the adjacent annular body 31. The inner wall of the second extension 313 is recessed outward relative to the inner wall of the annular main body 311 to facilitate engagement with the first extension 312 of the adjacent annular body 31. Along the radial direction of the medium tube 20, the sum of the thickness of the first extension 312 and the thickness of the second extension 313 is approximately equal to the thickness of the annular main body 311.

[0046] When assembling two adjacent rings 31, the second extension 313 of the upper ring 31 is fitted downwards onto the outside of the first extension 312 of the lower ring 31, so that the second extension 313 overlaps the first step surface of the lower ring 31, thereby forming an axially interlaced labyrinth connection structure. The inner wall of the second extension 313 and the outer wall of the first extension 312 are fitted with a small clearance, exhibiting high cylindricity, coaxiality, and perpendicularity to ensure stable guidance and positioning of adjacent rings 31. For example, the tolerance between the inner wall of the second extension 313 and the outer wall of the first extension 312 is less than 0.02 mm to reduce radial wobble between the rings 31 and improve overall assembly accuracy.

[0047] The mating surfaces of the first extension 312 and the second extension 313 are precision machined to have low surface roughness, thereby reducing friction between adjacent ceramic rings during assembly and thermal expansion, and lowering the risk of particle generation. At the same time, each ring 31 has high coaxiality and overall shape and position accuracy, providing a reliable assembly basis for the top clamping structure and the bottom limiting structure.

[0048] Both the first extension 312 and the second extension 313 have a large axial height to form a high labyrinth step (i.e., a labyrinth connection structure). As the height of the labyrinth step increases, the guide length between adjacent rings 31 increases accordingly, which can further improve the connection stability between each ring 31, making it less likely for the inner liner tube 30 to undergo radial displacement, axial movement, or detachment during equipment opening, closing, and operation.

[0049] In some examples, along the axial direction of the medium tube 20, the first extension 312 has a first height, and the annular body 31 has a second height, with the ratio b1 of the first height to the second height satisfying: 0.25 ≤ b1 ≤ 0.34. The height of the first extension 312 is approximately one-quarter to one-third of the height of the annular body 311. Thus, the first extension 312 has sufficient axial guide length without reducing the overall strength of the annular body 311 due to excessive extension length. For example, b1 can be 0.25, 0.30, or 0.34, or any value between two of these values, to balance the stability of the labyrinth connection, manufacturing difficulty, and assembly performance.

[0050] The third height of the second extension 313 is less than or equal to the first height of the first extension 312. Thus, after adjacent rings 31 are assembled, the second extension 313 can completely overlap the first step surface of the lower ring 31, forming a relatively long labyrinthine mating area with the first extension 312. The height of the second extension 313 can be equal to that of the first extension 312; alternatively, the height of the second extension 313 can be slightly less than that of the first extension 312 to ensure a stable overlap length between adjacent rings 31, while also providing adequate axial movement space for thermal expansion of each ring 31 to avoid interference after thermal expansion.

[0051] like Figure 1 and Figure 15 In some embodiments, along the direction toward the air intake cover 10, the annulus 31 near the first end extends out of the first end of the medium tube 20.

[0052] The top end of the uppermost ring 31 extends beyond the first end of the medium tube 20 to facilitate its engagement with the first fixing part 11. The height at which the uppermost ring 31 extends beyond the medium tube 20 is determined according to the structure of the first fixing part 11, ensuring a reliable engagement with the first fixing part 11 without affecting the normal installation and removal of the air intake cover 10.

[0053] like Figures 1 to 14 In some embodiments, the first fixing part 11 includes a first mounting groove 111 and a first sealing member 112 mounted in the first mounting groove 111. The ring 31 near the first end abuts against the first sealing member 112, such that the first sealing member 112 presses against the plurality of rings 31 in a direction toward the processing chamber 50.

[0054] The first mounting groove 111 is arranged in a ring shape and is used to position and fix the first seal 112, so that the first seal 112 remains stable during installation and disassembly and is not easy to fall off.

[0055] Optionally, the first mounting groove 111 adopts a dovetail groove with a dovetail-shaped cross section, and the first sealing element 112 is embedded in the dovetail groove. In this way, even during the process of flipping, disassembling or maintaining the air intake cover 10, the first sealing element 112 can still be reliably kept in the first mounting groove 111, without the need for repeated manual adjustment of its position, thus improving the convenience of equipment maintenance.

[0056] The dovetail groove includes a groove bottom and two inwardly tapering sidewalls arranged opposite each other, forming a limiting structure with an opening width smaller than the internal width of the groove. The limiting structures on both sides of the dovetail groove form a radial constraint on the first seal 112, which can prevent the first seal 112 from loosening due to vibration, repeated disassembly and assembly or thermal cycling during long-term operation, ensuring that the first seal 112 always remains in the predetermined installation position, improving the reliability of the inner liner tube 30 clamping structure, and eliminating the need for additional pressure plates, adhesives or other fixing components.

[0057] Furthermore, after the intake cover 10 is installed, the first seal 112 is elastically compressed by the ring 31 near the first end. The dovetail groove can restrict the first seal 112 from moving radially outward, so that the elastic deformation of the first seal 112 is mainly released along the axial direction, thereby applying axial clamping force to the multiple rings 31 more stably, improving the clamping effect and connection stability between the rings 31.

[0058] The first seal 112 is made of a high-temperature resistant and plasma-corrosion resistant elastic material, such as perfluoroether rubber. For example, the first seal 112 is an O-ring. After the intake cover 10 is installed, the first seal 112 presses the uppermost ring 31 axially and transmits the pressing force downward through the uppermost ring 31, so that the multiple rings 31 always maintain a stable fit.

[0059] During assembly, multiple rings 31 are stacked sequentially from bottom to top to form an inner liner 30. Then, the first sealing element 112 is installed in the first mounting groove 111, and finally, the air inlet cover 10 is installed. As the air inlet cover 10 is gradually installed into place, the uppermost ring 31 comes into contact with the first sealing element 112, causing the first sealing element 112 to be compressed and elastically deformed. This results in the first sealing element 112 continuously applying a downward elastic clamping force to the ring 31. This elastic clamping force is transmitted layer by layer from the uppermost ring 31 to the remaining rings 31, ensuring that the multiple rings 31 always remain in a tight fit, preventing axial loosening, displacement, or detachment during equipment opening, closing, and operation.

[0060] Because the first seal 112 is elastic and compressible, it can absorb the dimensional changes of each component due to thermal expansion, reserving thermal expansion compensation space for each ring 31 and avoiding cracking or damage of the ceramic rings due to thermal stress concentration when using rigid clamping. When the operating temperature of the equipment increases, the compression of the first seal 112 increases accordingly, and the elastic clamping force it generates increases, making the connection between multiple rings 31 more stable, thereby further improving the structural reliability of the stacked inner liner tube 30 under high-power plasma conditions.

[0061] Furthermore, the first seal 112 and the ring 31 near the first end have an elastic contact. Compared to rigid clamping methods such as metal pressure plates, this effectively reduces contact friction and impact, decreases ceramic material wear and particle generation, and helps maintain a clean environment inside the processing chamber. Simultaneously, after the first seal 112 presses against the ring 31 near the first end, it also seals the gap between the top of the media tube 20 and the inner liner tube 30, reducing the amount of plasma entering the space between the media tube 20 and the inner liner tube 30 through the top gap. This further improves the protection of the media tube 20 and extends its service life.

[0062] In some examples, the air intake cover 10 is provided with a first boss 12 on the side facing the inner liner tube 30. The first boss 12 is located inside the first mounting groove 111, such that the first boss 12 covers the first seal 112 and restricts the radial movement of the inner liner tube 30 along the medium tube.

[0063] The intake cover 10 has a downwardly extending first boss 12 on the side facing the inner liner tube 30. The first boss 12 can be a circular boss. The first boss 12 is located radially inside the first mounting groove 111. For example, the lower end of the inner groove wall of the first mounting groove 111 can be flush with the side wall of the first boss 12; or, the side wall of the first boss 12 is located inside the lower end of the inner groove wall of the first mounting groove 111. In this way, it can ensure reliable contact between the uppermost ring 31 and the first seal 112, and avoid rigid interference between the first boss 12 and the ring 31, leaving a gap for the thermal expansion of each component. The axial height and radial dimension of the first boss 12 are set according to actual needs.

[0064] The outer diameter of the first boss 12 is slightly smaller than the inner diameter of the upper ring 31. The uppermost ring 31 extends into the annular space formed by the outer periphery of the first boss 12. This can not only radially limit the uppermost ring 31 and further restrict the radial swing of the inner liner tube 30, but also shield the elastic seal, reduce the direct bombardment of the first seal by plasma, and improve the service life of the first seal.

[0065] An annular clearance fit is formed between the outer wall of the first boss 12 and the inner wall of the uppermost ring 31. This clearance is smaller than the radial cumulative tolerance of the assembled rings 31. The first boss 12 and the ring 31 near the first end have a small clearance fit with high coaxiality and high cylindricity, which enables the first boss 12 to radially guide and position the ring 31 near the first end. Through the labyrinth connection structure between the multiple stacked rings 31, the radial positioning effect is transmitted to the entire inner liner tube 30, thereby limiting the inner liner tube 30 from radial displacement or swaying along the medium tube 20, and improving the overall installation accuracy and operational stability of the inner liner tube 30.

[0066] After the air intake cover 10 is installed, the first boss 12 is located radially inside the first seal 112, shielding the first seal 112 and preventing it from being directly exposed to the plasma environment. Because the first boss 12 can prevent plasma from directly entering the area where the first seal 112 is located along the top gap, it reduces the direct bombardment of the first seal 112 by plasma, especially high-energy ions and active free radicals, thereby reducing the corrosion rate of the first seal 112, increasing its service life, and maintaining a long-term stable elastic clamping effect.

[0067] Furthermore, the first protrusion 12 and the ring 31 near the first end together form a labyrinth-type sealing channel. When plasma or process gas attempts to enter the first gap between the medium tube 20 and the inner liner tube 30 from the top of the medium tube 20, it needs to flow in a meandering manner along the labyrinth channel, which increases the flow resistance and effectively suppresses the plasma from entering the first gap, further reducing the possibility of the medium tube 20 being bombarded by plasma and improving the protection effect of the medium tube 20.

[0068] like Figures 15 to 25 In some embodiments, the first fixing part 11 includes a second mounting groove 113; the width of the second mounting groove 113 gradually increases along the direction toward the processing chamber 50; wherein the width direction of the second mounting groove 113 is parallel to the radial direction of the medium tube 20. Along the direction away from the processing chamber 50, the thickness of the first end of the inner liner tube 30 gradually decreases to mate with the second mounting groove 113; wherein the thickness direction of the inner liner tube 30 is parallel to the radial direction of the medium tube 20.

[0069] The second mounting groove 113 is annularly arranged. The cross-section of the second mounting groove 113 is V-shaped or trapezoidal; along the direction toward the processing chamber 50, the width of the second mounting groove 113 gradually increases, that is, the second mounting groove 113 forms a downwardly expanding structure. The width direction of the second mounting groove 113 is parallel to the radial direction of the medium pipe 20, and the groove wall forms an inclined mating surface with opposite sides.

[0070] Corresponding to the second mounting groove 113, the top of the uppermost ring 31 forms a wedge-shaped structure that matches the second mounting groove 113, enabling a stable surface contact fit between the two. For example, the thickness of the top of the uppermost ring 31 gradually decreases along the direction away from the processing chamber 50, thereby forming a V-shaped or trapezoidal surface on the outer periphery of the uppermost ring 31, the thickness direction of which is also parallel to the radial direction of the media tube 20.

[0071] During equipment assembly, the multiple rings 31 are first stacked and installed, and then the air inlet cover 10 is installed axially downward along the medium pipe 20. As the air inlet cover 10 gradually approaches the inner liner pipe 30, the top of the uppermost ring 31 gradually enters the second mounting groove 113 and slowly slides along the inclined surface of the second mounting groove 113 until the two form a wedge fit. As the top of the uppermost ring 31 continuously wedges into the second mounting groove 113, the air inlet cover 10 applies a downward axial clamping force to the rings 31, and through the labyrinth connection structure between the multiple rings 31, the clamping force is transferred layer by layer to the entire inner liner pipe 30, thereby achieving the overall fixation of the inner liner pipe 30.

[0072] The wedge-shaped fit between the uppermost ring 31 and the second mounting groove 113 not only provides axial clamping force, but also utilizes the radial component of the inclined surface to achieve radial automatic centering of the uppermost ring 31, thereby improving the coaxiality and installation accuracy of the entire inner liner tube 30.

[0073] It is understandable that an appropriate fit allowance is maintained between the second mounting groove 113 and the top of the uppermost ring 31 to accommodate the machining errors of each component and the dimensional changes after thermal expansion. When the temperature rises during equipment operation, each component undergoes thermal expansion, and the top of the uppermost ring 31 further weds into the second mounting groove 113, so that the clamping force increases appropriately with the temperature rise, thereby further improving the connection stability between the multiple rings 31.

[0074] Optionally, an elastic layer can be provided on the top of the uppermost ring 31 to prevent rigid friction between the ring 31 and the air intake cover 10 from generating particles. Moreover, the elastic layer has the ability to deform elastically, which can better adapt to the machining errors of the parts and the dimensional changes after thermal expansion.

[0075] In some examples, to ensure the smooth wedge clamping process, the air intake cover 10 is also provided with a first exhaust hole 114, which can be connected to the bottom or wall of the second mounting groove 113. The opening of the first exhaust hole 114 is located on the surface of the air intake cover 10, for example, on the lower surface of the air intake cover 10. For example, the opening of the first exhaust hole 114 and the opening of the second mounting groove 113 are both located on the lower surface of the air intake cover 10, and the opening of the first exhaust hole 114 is located outside the opening of the second mounting groove 113. When the top of the uppermost ring 31 gradually enters the second mounting groove 113, the air inside the second mounting groove 113 can be discharged in time through the first exhaust hole 114, avoiding air stagnation that would create back pressure and affect the top of the uppermost ring 31 from wedging into the second mounting groove 113, so that the top of the uppermost ring 31 can smoothly enter the second mounting groove 113 and achieve a stable wedging state.

[0076] When there are multiple first exhaust holes 114, the multiple first exhaust holes 114 are evenly distributed along the circumference of the second mounting groove 113. For example, eight first exhaust holes 114 can be provided, and each first exhaust hole 114 is evenly spaced around the second mounting groove 113, so that air in all positions of the second mounting groove 113 can be discharged in time, thereby avoiding local air stagnation. The orifice diameter of the multiple first exhaust holes 114 can be designed according to the size of the second mounting groove 113 and the vacuuming capacity of the equipment, so as to ensure exhaust efficiency without affecting the overall structural strength of the air intake cover 10.

[0077] like Figures 1 to 14In some embodiments, the limiting part 42 includes: a limiting pin 421; and a limiting groove 314 that cooperates with the limiting pin 421 on the ring body 31 near the second end.

[0078] Multiple limiting pins 421 are evenly distributed along the circumference of the main body 41 of the fastener. For example, four limiting pins 421 are provided, and the included angle between any two adjacent limiting pins 421 is equal, so that the inner liner tube 30 is subjected to uniform force in the circumferential direction, thereby improving the overall installation stability. The limiting pins 421 can be made of aluminum and integrally formed or fixedly connected to the main body 41 of the fastener to reduce the risk of metal contamination in the plasma environment.

[0079] Corresponding to the limiting pin 421, the lowest ring body 31 is provided with multiple limiting grooves 314. Each limiting groove 314 is evenly distributed along the circumference of the ring body 31 and cooperates with the corresponding limiting pin 421. The limiting grooves 314 are provided to penetrate the ring body 31 downwards, so as to facilitate the insertion of the limiting pin 421 into the limiting groove 314 from bottom to top to complete the positioning and installation.

[0080] Optionally, the limiting groove 314 also penetrates the inner wall of the ring body 31, which can realize the radial guiding and positioning and circumferential limiting functions of the annular fastener 40 to the inner liner tube 30, and also provide space for the limiting pin 421 to move inward relative to the limiting groove 314, taking into account both assembly convenience and thermal expansion compensation capability.

[0081] The first distance between the opening of the limiting groove 314 on the inner wall of the ring 31 and the opposite groove wall is greater than the diameter of the limiting pin 421. The ratio of the diameter of the limiting groove to the first distance is greater than or equal to 0.5 and less than 1. For example, the diameter of the limiting groove is approximately one-half or two-thirds of the first distance.

[0082] Optionally, the cross-section of the limiting groove 314 along the radial direction of the medium pipe 20 is U-shaped. The distance between the two opposite sidewalls of the limiting groove 314 can be slightly larger than the outer diameter of the limiting pin 421. The limiting groove 314 and the limiting pin 421 adopt a clearance fit. This clearance can compensate for the machining errors of each component and fully accommodate the thermal expansion differences between the ceramic ring 31 and the annular fixing part 40 due to different materials during equipment operation. This avoids interference or jamming between the limiting pin 421 and the limiting groove 314 due to thermal expansion, ensuring that the inner liner pipe 30 can maintain a stable installation state for a long time.

[0083] In this embodiment, the limiting pin 421 and the limiting groove 314 provide radial limiting for the inner liner tube 30, while the first fixing part provides axial fixing. The two work together to ensure that the inner liner tube 30 remains stably installed in both the axial and radial directions. In addition, since multiple limiting pins 421 are evenly distributed on the main body 41 of the fixing member, they can restrict the circumferential rotation of the inner liner tube 30 around the axis of the medium tube 20.

[0084] Optionally, when the height of the limiting pin 421 is slightly less than the height of the limiting groove 314 along the axial direction of the medium pipe 20, after the limiting pin 421 is inserted into the limiting groove 314, a certain axial gap is maintained between the top of the limiting pin 421 and the top of the limiting groove 314. This axial gap can compensate for the manufacturing error of the equipment and the dimensional changes caused by the thermal expansion of each component, and avoid the local stress concentration caused by the limiting pin 421 pressing against the bottom of the limiting groove 314 during the high-temperature operation of the equipment, thereby reducing the risk of cracking or damage to the ring 31.

[0085] like Figures 15 to 25 In some embodiments, the limiting portion 42 includes a limiting ring 422, the outer wall of which is located inside the outer wall of the main body portion 41 of the fastener. The ring body 31 near the second end overlaps the main body portion 41 of the fastener, and / or the limiting ring 422 is inserted into the ring body 31.

[0086] The limiting ring 422 extends along the axial direction of the main body of the fixing member 41 toward the air intake cover 10 and is coaxially arranged with the main body of the fixing member 41. The outer wall of the limiting ring 422 is located inside the outer wall of the main body of the fixing member 41, that is, the limiting ring 422 extends outward from the main body of the fixing member 41.

[0087] In some examples, when the lowest ring 31 is mounted on the annular fastener 40, its second extension 313 overlaps with the portion of the fastener body 41 that extends outwards to form a limiting ring 422. The limiting ring 422 is inserted into the lowest ring 31, thereby providing radial positioning and circumferential limiting for the lowest ring 31. A small gap may be present between the top of the limiting ring 422 and the second stepped surface of the ring 31 to accommodate manufacturing errors and provide thermal expansion compensation.

[0088] In other examples, the limiting ring 422 is inserted into the bottommost ring 31, the second step surface of the bottommost ring 31 overlaps the top of the limiting ring 422, and there is a small gap between the second extension 313 of the bottommost ring 31 and the main body of the fastener 41.

[0089] Optionally, the outer diameter of the limiting ring 422 is slightly smaller than the inner diameter of the second extension 313 of the bottom ring 31, forming a small annular gap fit between the two, which ensures smooth assembly while achieving reliable guiding and positioning of the inner liner tube 30.

[0090] Understandably, the axial height of the limiting ring 422 is set according to actual needs, so that after the limiting ring 422 is inserted into the ring body 31, it forms a longer guide fit length, thereby improving the positioning accuracy and support stability near the bottommost ring body 31. Optionally, the limiting ring 422 and the ring body 31 adopt a small clearance fit with high coaxiality and high cylindricity to ensure that the inner liner tube 30 as a whole has a high coaxiality, providing a reliable positioning reference for the stacked installation of multiple ring bodies 31 above.

[0091] By employing a positioning method where the limiting ring 422 is inserted into the lowest ring 31, the limiting ring 422 can form a longer guide length while ensuring reliable radial positioning, resulting in high positioning accuracy and good overall rigidity. Combined with the axial support of the fixing body 41 on the ring 31 and the pressing action of the first fixing part 11 on the ring 31, the inner liner tube 30 can maintain a stable installation state during equipment opening and closing and long-term high-power plasma operation, preventing radial displacement, circumferential rotation, or loosening and falling off, thereby further improving the operational reliability and service life of the entire plasma equipment.

[0092] like Figures 1 to 25 In some embodiments, a second gap exists between the medium tube 20 and the processing chamber; the annular fixing member 40 is provided with at least one second vent hole 44, which is connected to the first gap and the second gap respectively, and is used to discharge air from the first gap and the second gap during vacuuming.

[0093] A second gap is formed between the outer wall of the medium pipe 20 and the inner wall of the opening of the processing chamber 50, and a first gap is formed between the inner wall of the medium pipe 20 and the outer wall of the inner liner pipe 30. The first gap is used to reserve compensation space for dimensional changes of the medium pipe 20 and the inner liner pipe 30 due to thermal expansion during equipment operation, so as to avoid rigid contact or thermal expansion interference between the two; the second gap is used to meet the installation tolerance and thermal expansion compensation requirements between the medium pipe 20 and the processing chamber 50.

[0094] The annular fastener 40 has at least one second vent hole 44 on its main body 41. The second vent hole 44 passes through the main body 41 of the fastener, with one end connected to the first gap and the second gap respectively, and the other end connected to the interior of the processing chamber 50 or the vacuum channel, thereby forming a connecting passage for venting.

[0095] Multiple second exhaust holes 44 are provided and evenly distributed along the circumference of the annular fastener 40. For example, four second exhaust holes 44 can be provided, each distributed at an equal angle along the circumference of the annular fastener 40, so that air in all positions within the first and second gaps can be discharged in a timely manner, avoiding gas stagnation in local areas. The diameter of the second exhaust holes 44 can be designed according to the vacuuming capacity of the equipment and the structural dimensions of the annular fastener 40, ensuring exhaust efficiency without affecting the overall mechanical strength of the annular fastener 40.

[0096] The exhaust direction of the second exhaust port 44 avoids the high-density plasma region, or is set as an inclined hole structure, so as to further reduce the probability of plasma entering the first gap or the second gap along the second exhaust port 44 and improve the protection effect of the dielectric tube 20.

[0097] By providing at least one second vent hole 44 on the annular fixing member 40 that communicates with the first gap and the second gap, on the one hand, air in the first gap and the second gap can be discharged in time during the vacuuming process of the equipment, so as to avoid residual air affecting the vacuum degree and process stability of the processing chamber 50; on the other hand, the annular fixing member 40 can still effectively shield the annular gap at the second end of the medium tube 20, preventing plasma from entering the first gap to form a plasma sheath layer, and preventing the medium tube 20 from being bombarded by plasma, thereby taking into account both the vacuum exhaust performance and the protection performance of the medium tube 20, and improving the operational stability and service life of the entire plasma equipment.

[0098] In some examples, the second end of the medium tube 20 has a third gap between it and the main body of the fixing member 41. The third gap communicates with the first gap and the second gap, and also communicates with the second vent hole 44. At least a portion of the second vent hole 44 is offset from the first gap; or, at least a portion of the second vent hole 44 is offset from the second gap.

[0099] By forming a third gap between the second end of the medium pipe 20 and the main body 41 of the fixing member, and the third gap communicating with the first gap and the second gap respectively, air in both the first gap and the second gap can enter the second exhaust port 44 through the third gap. This allows for more flexible placement of the second exhaust port 44.

[0100] Optionally, at least a portion of the second exhaust port 44 is offset from the first gap. Specifically, the second exhaust port 44 is not directly corresponding to the first gap, but rather communicates with the first gap through a third gap. That is, the inlet of the second exhaust port 44 is located in the third gap, so that air in the first gap must pass through a turning flow channel before entering the second exhaust port 44. Since there is no straight-line connection between the second exhaust port 44 and the first gap, the possibility of plasma directly entering the first gap along the second exhaust port 44 can be effectively reduced, thus improving the protection effect of the dielectric tube 20 while ensuring vacuum performance.

[0101] Optionally, at least a portion of the second exhaust port 44 is offset from the second gap. Specifically, the second exhaust port 44 is also connected to the second gap through a third gap, rather than being directly corresponding to the second gap, so that air in the second gap is collected through the third gap before entering the second exhaust port 44. This structure also avoids the formation of a straight channel between the second gap and the second exhaust port 44, thereby reducing the probability of plasma or high-energy particles entering the second gap along the second exhaust port 44.

[0102] The second exhaust port 44 can be a straight hole. In other examples, the second exhaust port 44 can be an inclined hole, a zigzag hole, or an offset hole structure, so that the axis of the second exhaust port 44 does not coincide with the first gap and the second gap, but forms a detour connecting path through the third gap. This ensures that the gas can flow smoothly during the vacuuming process, but also increases the flow resistance of the plasma into the gap space, making it difficult for the plasma to enter the first gap or the second gap along the second exhaust port 44.

[0103] The dimensions of the third gap are designed based on the assembly tolerances of the medium tube 20, the annular fastener 40, and the inner liner tube 30. While meeting the thermal expansion compensation requirements, it ensures sufficient flow capacity between the first gap, the second gap, and the second exhaust port 44, so that no local stagnant gas areas are formed in each gap during the vacuuming process.

[0104] like Figures 1 to 25 In some embodiments, the main body 41 of the fastener extends outward by a predetermined distance to facilitate a detachable connection between the main body 41 and the processing chamber 50. The main body 41 of the fastener is detachably connected to the processing chamber 50 by a plurality of screws 43; both the annular fastener 40 and the screws 43 are made of aluminum or aluminum alloy. The screws 43 are located outside the limiting pin or limiting ring.

[0105] For example, multiple screws 43 are provided and evenly distributed along the circumference of the annular fastener 40. For instance, four screws 43 may be provided, each screw 43 being distributed at equal angles along the circumference to ensure that the annular fastener 40 is subjected to uniform force, so that the annular fastener 40 can be stably fixed to the bottom of the processing chamber 50 and provide reliable support and positioning for the inner liner tube 30.

[0106] Each screw 43 is a countersunk screw, with the head of the screw 43 embedded in the corresponding countersunk mounting hole of the annular fastener 40. After installation, the head of the screw 43 is not higher than the surface of the annular fastener 40. Preferably, a 90° conical countersunk structure is used so that the screw 43 forms a flush surface after installation, thereby preventing the screw 43 from protruding from the surface of the annular fastener 40.

[0107] The annular fastener 40 is made of aluminum or aluminum alloy, as is the screw 43. The screw 43 is made of the same or similar material as the annular fastener 40 to ensure they have similar coefficients of thermal expansion. In a plasma environment, even if the annular fastener 40 is subjected to a small amount of plasma bombardment, it can effectively avoid contamination from metals such as iron, chromium, and nickel that might occur when using materials like stainless steel. This reduces the risk of particulate contamination within the processing chamber and improves the cleanliness and product yield of the semiconductor process.

[0108] The exposed edges of the annular fastener 40 and screw 43 can be chamfered or rounded to reduce the phenomenon of local electric field enhancement caused by sharp edges, and further reduce the possibility of material sputtering caused by plasma bombardment.

[0109] During equipment assembly, the annular fastener 40 is first placed in the mounting position below the upper cover plate of the processing chamber 50, and then secured with multiple screws 43 in sequence to reliably install the annular fastener 40 onto the processing chamber 50. Next, the bottommost ring 31 is installed onto the annular fastener 40, and the remaining rings 31 are then installed in sequence. Finally, the air inlet cover plate 10 is installed to complete the fixing of the entire inner liner tube 30 assembly. During equipment maintenance, the annular fastener 40 can be removed from the processing chamber 50 simply by removing multiple screws 43, facilitating the overall disassembly and replacement of the inner liner tube 30 and improving equipment maintenance efficiency.

[0110] Please refer to Figures 1 to 14In some applications, the air intake cover 10 is provided with a first mounting groove 111, in which a first seal 112 is installed. The air intake cover 10 is also provided with a first boss 12, which is located inside the first mounting groove 111. The first boss 12 is inserted into the uppermost ring 31, and the top of the uppermost ring 31 abuts against the first seal 112. The first boss 12 provides radial circumferential restraint to the uppermost ring 31 and even the entire inner liner tube 30, while simultaneously shielding the first seal 112 to reduce its impact from plasma. To prevent the first seal 112 from easily falling off during disassembly, the first mounting groove 111 uses a dovetail groove. The elasticity and compressibility of the first seal 112 allow for dimensional changes in each component due to thermal expansion, preventing the ceramic ring from cracking or breaking due to rigid contact. The first seal 112 and the ring 31 have elastic friction, which is less likely to generate particles compared to the rigid contact friction between metal and ceramic ring. When thermally expanded, the compression of the first seal 112 increases, the elastic force increases, and the clamping and stabilizing effect becomes more significant. After the first seal 112 and the ring 31 are pressed into contact, they can effectively block the plasma from bombarding the medium tube 20, thus protecting the medium tube 20 more effectively.

[0111] The annular fastener 40 includes a main body 41 and multiple limiting pins 421. The main body 41 blocks the entire circumferential gap between the medium tube 20 and the inner liner tube 30 at the bottom, preventing plasma from entering the gap space and forming a plasma sheath, thus avoiding plasma bombardment of the inner wall of the medium tube 20. The lowest ring 31 is provided with multiple limiting grooves 314 that cooperate with the limiting pins 421. Through the cooperation of the limiting pins 421 and the limiting grooves 314, the inner liner tube 30 is radially and circumferentially guided and positioned. The main body 41 is fixedly connected to the upper cover plate of the processing chamber 50 by countersunk screws 43. (The annular fastener 40 and screws are also mentioned.) All components 43 are made of aluminum. Multiple second vent holes 44 are provided on the main body 41 of the fixing component. These holes are used to remove air from the gaps between the medium tube 20 and the inner liner tube 30, and between the medium tube 20 and the inner wall of the opening of the upper cover plate of the processing chamber, during vacuuming, ensuring a high vacuum level. The limiting groove 314 extends downwards and inwards, and its cross-section is U-shaped. This allows for a large fit between the limiting groove 314 and the limiting pin, improving the convenience of disassembly and maintenance. Furthermore, the different thermal expansion rates of the components during heating will not cause interference.

[0112] During assembly, the medium tube 20 is sealed to the processing chamber via a sealing ring; the annular fastener 40 is installed to the bottom of the upper cover plate of the processing chamber via screws 43, and then the bottom ring 31 is placed on the annular fastener 40 according to the matching of the limiting pin 421 and the limiting groove 314. Then, each ring 31 is placed layer by layer through the labyrinth structure until the top ring 31 is installed; finally, the first sealing element 112 is installed in the dovetail groove of the air intake cover plate 10, and then the air intake cover plate 10 is installed to press the inner liner tube 30 through the first sealing element 112.

[0113] Please refer to Figures 15 to 25 In other application scenarios, the difference from the previous scenario is that the air intake cover 10 is provided with a second mounting groove 113, the cross-section of which is V-shaped or trapezoidal; the width of the second mounting groove 113 gradually increases along the direction toward the processing chamber 50, that is, the second mounting groove 113 forms a downwardly expanding structure. Corresponding to the second mounting groove 113, the outer periphery of the uppermost ring 31 forms a V-shaped or trapezoidal surface, and the thickness of the top of the uppermost ring 31 gradually decreases along the direction away from the processing chamber 50. The air intake cover 10 is also provided with a plurality of first exhaust holes 114, which are connected to the second mounting groove 113. As the top of the uppermost ring 31 gradually enters the second mounting groove 113, the air inside the second mounting groove 113 can be discharged in time through the first exhaust hole 114, preventing air from accumulating and forming back pressure that would affect the top of the uppermost ring 31 from wedging into the second mounting groove 113, so that the top of the uppermost ring 31 can smoothly enter the second mounting groove 113 and achieve a stable wedging state.

[0114] The annular fastener 40 includes a fastener body 41 and a limiting ring 422. When the lowest ring 31 is installed on the annular fastener 40, its second extension 313 overlaps with the portion of the fastener body 41 that extends outward from the limiting ring 422. The limiting ring 422 is inserted into the lowest ring 31, thereby radially positioning and circumferentially limiting the lowest ring 31; or, the limiting ring 422 is inserted into the lowest ring 31, and the second stepped surface of the lowest ring 31 overlaps with the top of the limiting ring 422.

[0115] During the assembly process, the medium pipe 20 is sealed to the processing chamber through a sealing ring; the annular fastener 40 is installed to the bottom of the upper cover plate of the processing chamber by screws 43, and then the bottom ring 31 is placed on the annular fastener 40 according to the matching of the limiting pin 421 and the limiting groove 314. Then, each ring 31 is placed layer by layer through the labyrinth structure until the top ring 31 is installed; finally, the air intake cover plate 10 is installed.

[0116] Other configurations of the plasma device in the above embodiments can be derived from various technical solutions now and in the future known to those skilled in the art, and will not be described in detail here.

[0117] In the description of this specification, it should be understood that the terms "length", "width", "thickness", "upper", "lower", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this disclosure and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure.

[0118] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this disclosure, "multiple" means two or more, unless otherwise explicitly specified.

[0119] In this disclosure, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0120] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0121] The foregoing disclosure provides many different implementations or examples for carrying out different structures of this disclosure. To simplify the disclosure, specific examples of components and arrangements have been described above. Of course, these are merely examples and are not intended to limit the scope of this disclosure. Furthermore, reference numerals and / or letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various implementations and / or arrangements discussed.

[0122] The above description is merely a specific embodiment of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any person skilled in the art can easily conceive of various variations or substitutions within the technical scope disclosed in this disclosure, and these should all be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A plasma device, characterized in that, include: A medium tube having a first end and a second end opposite each other along its axial direction; The air intake cover is located at the first end of the medium pipe; The inner liner tube is located inside the medium tube and has a first gap with the medium tube; the inner liner tube includes a plurality of rings arranged along the axial direction of the medium tube; wherein the air inlet cover is provided with a first fixing part; the first fixing part cooperates with the rings near the first end to press the plurality of rings together. An annular fastener is located at the second end of the medium tube; the annular fastener has a fastener body and a limiting part, the fastener body is used to cover the first gap between the medium tube and the inner liner tube; the limiting part is connected to the fastener body and the limiting part cooperates with the ring body near the second end to restrict the movement of the inner liner tube along the radial direction of the medium tube; The processing chamber has a second end of the medium tube inserted into its opening, and the processing chamber is detachably connected to the annular fixing member.

2. The plasma device according to claim 1, characterized in that, At least one of the ring bodies includes: Ring-shaped main body; At least one of a first extension and a second extension; the first extension is connected to and extends toward the air intake cover of the main body of the ring; the outer wall of the first extension is located inside the outer wall of the main body of the ring, and a first stepped surface connects the outer wall of the first extension and the outer wall of the main body of the ring; the second extension is connected to and extends toward the processing chamber of the main body of the ring; the inner wall of the second extension is located outside the inner wall of the main body of the ring, and a second stepped surface connects the inner wall of the second extension and the inner wall of the main body of the ring; wherein, in two adjacent rings, the second extension of the ring closer to the air intake cover overlaps the first stepped surface of the ring closer to the processing chamber.

3. The plasma device according to claim 2, characterized in that, At least one of the ring bodies has a first extension and a second extension; Along the axial direction of the medium tube, the first extension has a first height, the annulus has a second height, and the ratio b1 of the first height to the second height satisfies: 0.25≤b1≤0.34; The third height of the second extension is less than or equal to the first height of the first extension.

4. The plasma device according to claim 1, characterized in that, Along the direction toward the air intake cover, the annulus near the first end extends out of the first end of the medium tube.

5. The plasma device according to claim 1, characterized in that, The first fixing part includes a first mounting groove and a first sealing member installed in the first mounting groove; The ring near the first end abuts against the first seal, such that the first seal presses against the plurality of rings in the direction toward the processing chamber.

6. The plasma device according to claim 5, characterized in that, The first mounting groove is a dovetail groove.

7. The plasma device according to claim 5, characterized in that, The air inlet cover is provided with a first protrusion on the side facing the inner liner tube. The first protrusion is located inside the first mounting groove, so that the first protrusion covers the first seal and restricts the radial movement of the inner liner tube along the medium tube.

8. The plasma device according to claim 1, characterized in that, The first fixing part includes a second mounting groove; the width of the second mounting groove gradually increases along the direction toward the processing chamber; wherein the width direction of the second mounting groove is parallel to the radial direction of the medium tube; Along the direction away from the processing chamber, the thickness of the first end of the liner tube gradually decreases to mate with the second mounting groove; wherein the thickness direction of the liner tube is parallel to the radial direction of the medium tube.

9. The plasma device according to claim 8, characterized in that, The air intake cover is also provided with at least one first exhaust hole, which is connected to the second mounting groove to discharge the air in the second mounting groove.

10. The plasma device according to claim 1, characterized in that, The limiting part includes: a limiting pin; The ring near the second end is provided with a limiting groove that cooperates with the limiting pin; wherein, the limiting groove extends through the ring in the direction toward the processing chamber.

11. The plasma device according to claim 10, characterized in that, The limiting groove also penetrates the inner wall of the ring.

12. The plasma device according to claim 11, characterized in that, Along the axial direction of the medium tube, the height of the limiting pin is less than or equal to the height of the limiting groove; The limiting groove has a U-shaped cross-section along the radial direction of the medium tube.

13. The plasma device according to claim 1, characterized in that, The limiting part includes: a limiting ring, the outer wall of which is located inside the outer wall of the main body of the fixing member; The ring near the second end overlaps the main body of the fastener, and / or the limiting ring is inserted into the ring near the second end.

14. The plasma device according to claim 1, characterized in that, A second gap exists between the medium tube and the processing chamber; The annular fastener is provided with at least one second vent hole, which is connected to the first gap and the second gap respectively, and is used to discharge the air in the first gap and the second gap during vacuuming.

15. The plasma device according to claim 14, characterized in that, There is a third gap between the second end of the medium tube and the main body of the fixing member. The third gap is connected to the first gap and the second gap, and the third gap is also connected to the second exhaust hole. At least a portion of the second vent is offset from the first gap; or, at least a portion of the second vent is offset from the second gap.

16. The plasma device according to claim 1, characterized in that, The main body of the fastener is detachably connected to the processing chamber by multiple screws; The ring-shaped fastener and screws are all made of aluminum or aluminum alloy.

17. The plasma device according to claim 1, characterized in that, The inner lining tube is made of ceramic material.

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