A high capacity horizontal wet process apparatus for cleaning photovoltaic silicon wafers

Abstract

The present application relates to photovoltaic crystalline silicon cell production equipment field, especially a kind of high capacity horizontal wet method equipment for photovoltaic silicon wafer cleaning, including shell, main groove, liquid tank, main groove is located in the inside of shell, liquid tank is located at the top of shell, liquid head is installed in the bottom of liquid tank, main groove is realized active regulation by temperature self-regulating structure, concentration self-regulating structure, liquid level self-regulating structure, temperature, concentration, liquid level, the bottom of shell is located below main groove and is provided with auxiliary groove, filter structure is provided on the side of auxiliary groove, filter structure is used to filter the liquid discharged in main groove, temperature sensor monitors temperature in tank in real time, cooperate with the water supplement passage of heater and pure water tank to realize accurate temperature control;Concentration detector is detected by branch pipe circulation sampling, PLC controller automatically controls the opening and closing of liquid head of liquid tank according to concentration feedback signal, realizes concentration dynamic balance;Liquid level sensor cooperates overflow port and drainage port design, ensure that liquid level is stable in set range.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic crystalline silicon cell production equipment technology, and in particular to a high-capacity horizontal wet cleaning equipment for photovoltaic silicon wafers. Background Technology

[0002] In the production of crystalline silicon solar cells, the cleanliness of the silicon wafers directly affects the yield and conversion efficiency. Currently, the photovoltaic industry commonly uses chain-type wet cleaning equipment, which uses drive rollers to move the silicon wafers through a high-capacity tank for cleaning.

[0003] A search revealed that Chinese invention patent CN109346425A proposes a multi-channel chain wet cleaning equipment. By placing the exhaust system directly above the main tank group, the auxiliary tank group directly below the main tank, and the replenishment system at the top, the equipment structure becomes more compact, increasing production capacity without significantly increasing the floor space. However, it lacks a precise active control mechanism for the temperature, concentration, and level of the cleaning solution in each tank, failing to create optimal cleaning conditions and affecting product yield. Furthermore, it lacks a circulating filtration device to actively remove suspended particles and reaction byproducts from the cleaning solution, relying solely on adding fresh cleaning solution to dilute and compensate for the decrease in solution cleanliness, significantly increasing solution consumption and wastewater discharge, thus raising production costs. Summary of the Invention

[0004] The purpose of this invention is to address the shortcomings of the prior art by proposing a high-capacity horizontal wet cleaning device for photovoltaic silicon wafers.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: a high-capacity horizontal wet cleaning device for photovoltaic silicon wafers, comprising a shell, a main tank, and a chemical solution tank. The main tank is located inside the shell, and the chemical solution tank is located at the top of the shell. A liquid inlet head is installed at the bottom of the chemical solution tank. The main tank achieves active control of temperature, concentration, and liquid level through a temperature self-regulating structure, a concentration self-regulating structure, and a liquid level self-regulating structure. A secondary tank is set at the bottom of the shell below the main tank. A filter structure is set on one side of the secondary tank. The filter structure is used to filter the chemical solution discharged from the main tank. The temperature self-regulating structure includes a pure water tank installed on the side wall of the shell. The pure water tank is equipped with a No. 1 drain pipe, which passes through the back of the shell and faces the top of the main tank. A temperature sensor and a heater are installed inside the main tank.

[0006] As a further embodiment of the present invention, the concentration self-adjusting structure includes a liquid tank and a concentration detector. The concentration detector is installed on the back of the outer casing. A branch pipe is connected inside the main tank and the branch pipe is divided into two sections. The two sections of the branch pipe are respectively connected to the inlet and outlet of the concentration detector.

[0007] As a further embodiment of the present invention, the self-regulating liquid level structure includes a medicine tank, a pure water tank, and a liquid level sensor. The liquid level sensor is installed in the main tank. The main tank is divided into four horizontally distributed tanks, and an empty tank is provided between every two main tanks. An overflow port is provided above the empty tank and a drain port is provided below it. The drain port is located in the secondary tank.

[0008] As a further embodiment of the present invention, the filtration structure includes a support base installed at the bottom of the outer shell, a filter element filter installed on the support base, a baffle installed below the outer shell, a water pipe connected to the secondary tank, a second section of the branch pipe connected to the water inlet, a second section of the branch pipe connected to the water inlet, a booster water pump installed on the back of the outer shell, the booster water pump being connected to a pumping pipe and a second drain pipe, and the end of the pumping pipe being connected to the drain end below the filter element filter.

[0009] As a further embodiment of the present invention, a hollow box is connected to the top of the medicine tank, and a through pipe is connected to the bottom of the hollow box. The through pipe passes through the medicine tank and comes above the main tank, and the top of the second drain pipe is located inside the hollow box.

[0010] As a further embodiment of the present invention, the filter structure further includes a filter lifting assembly, which includes a first shaft rotating inside a hollow box, rectangular blades arranged in an array outside the first shaft, a second shaft rotatably connected to the bottom of the outer shell, and pulleys fixed to the ends of both the first and second shafts and driven by belts.

[0011] As a further embodiment of the present invention, the secondary groove is provided with a symmetrical first sliding groove and a second sliding groove. The first sliding groove is located on the outer wall of the secondary groove, and the second sliding groove is located on the inner wall of the secondary groove. A magnet is slidably connected in the first sliding groove. The magnet is connected to the bottom of the main groove through a spring. A bent plate is fixed to the magnet. An impact block is fixed below the bent plate. An eccentric wheel is fixed to the outside of the second shaft. The eccentric wheel acts on the bent plate.

[0012] As a further embodiment of the present invention, an iron block is slidably connected in the second sliding groove on the inner wall of the secondary groove, and a cutting disc is fixed to the iron block by a bent rod. An anti-turbulence plate is fixed below the secondary groove, and an inlet is passed through the anti-turbulence plate. A water pipe passes through the anti-turbulence plate and is then fixed to a receiving plate. The cutting disc is located directly above the receiving plate.

[0013] As a further embodiment of the present invention, the inner wall of the main groove is provided with a third sliding groove, and a movable plate is slidably connected to the inside of the main groove through the third sliding groove. A vertical rod is fixed below the movable plate, and the bottom end of the vertical rod passes through the bottom of the main groove and then reaches the top of the second shaft. A second eccentric wheel is fixed to the outside of the second shaft, and the second eccentric wheel cooperates with the second shaft.

[0014] As a further embodiment of the present invention, a control box is installed on one side of the housing.

[0015] The beneficial effects of this invention are as follows: 1. This invention achieves precise and proactive control of the temperature, concentration, and level of the chemical solution in each main tank by setting up self-regulating structures for temperature, concentration, and level. Temperature sensors monitor the tank temperature in real time, achieving precise temperature control in conjunction with the water supply path between the heater and the pure water tank. A concentration detector uses a branch pipe for circulating sampling and detection, and a PLC controller automatically controls the opening and closing of the liquid filling head in the chemical solution tank based on the concentration feedback signal, achieving dynamic concentration balance. A level sensor, along with overflow and drain ports, ensures the liquid level remains stable within the set range. It allows for independent setting of optimal process parameters for four different functional tanks, consistently maintaining optimal cleaning conditions in each tank, significantly improving the cleanliness of photovoltaic silicon wafers and effectively reducing product defect rates. 2. This invention receives the overflow liquid from the main tank in a secondary tank. Large particles are naturally separated by a turbulence-prevention plate. The clear liquid in the upper and middle layers enters a filter cartridge for deep purification via a water pipe. The filtered clean liquid is then pumped back to the hollow tank via a second drain pipe and returned to the main tanks, achieving liquid recycling. This significantly reduces liquid consumption and waste discharge, thereby lowering production costs and reducing the frequency of manual cleaning and maintenance, effectively improving the overall operating efficiency and capacity of the equipment. Simultaneously, the high-pressure water flow from the pump drives the blades to rotate the first shaft, which in turn drives the second shaft to rotate synchronously via belt transmission. This, in turn, drives the cutting disc to pre-crush medium-sized impurities and drives the impact block to periodically strike the inlet pipe to prevent blockage. Attached Figure Description

[0016] Figure 1 This is a frontal perspective view of the device proposed in this invention; Figure 2 This is a rear-view perspective view of the device proposed in this invention; Figure 3 The present invention proposes Figure 1 A schematic diagram after the cover plate has been cut off in the middle; Figure 4 The present invention proposes Figure 3 Enlarged view of point A; Figure 5 The present invention proposes Figure 1 Side section view; Figure 6 This is a schematic diagram of the main groove proposed in this invention; Figure 7 The present invention proposes Figure 5 Schematic diagram of a partial structure; Figure 8 The present invention proposes Figure 7 Display image after rotation; Figure 9 The present invention proposes Figure 8 Enlarged view of point B in the image; Figure 10 The present invention proposes Figure 7 Schematic diagram of a partial structure; Figure 11 The present invention proposes Figure 10 Enlarged view of point C in the image.

[0017] 1. Outer shell; 2. Main tank; 3. Medicine tank; 4. Filler head; 5. Secondary tank; 6. Pure water tank; 7. Drain pipe No. 1; 8. Temperature sensor; 9. Heater; 10. Concentration detector; 11. Branch pipe; 12. Liquid level sensor; 13. Empty tank; 14. Overflow port; 15. Drain port; 16. Support base; 17. Filter cartridge; 18. Water pipe; 19. Water inlet; 20. Booster pump; 21. Pumping pipe; 22. Drain pipe No. 2; 23. Hollow tank; 24. 1. Shaft No. 1; 25. Blade; 26. Shaft No. 2; 27. Belt; 28. Slide No. 1; 29. ​​Slide No. 2; 30. Spring; 31. Bending plate; 32. Impact block; 33. Eccentric wheel No. 1; 34. Iron block; 35. Bending rod; 36. Cutting disc; 37. Anti-turbulence plate; 38. Inlet; 39. Receiving plate; 40. Slide No. 3; 41. Movable plate; 42. Vertical rod; 43. Eccentric wheel No. 2; 44. Control box; 45. Magnet; 46. Through pipe; 47. Baffle. Detailed Implementation

[0018] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0019] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In the description of this invention, it should be noted that unless otherwise explicitly specified and limited, the terms "installed," "connected," "linked," and "set up" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances. The following describes embodiments of the invention based on its overall structure.

[0020] The invention patent CN109346425A discloses the following: "Silicon wafers are transported from the loading section to the unloading section by the rotation of the transmission roller. The main tank group includes several main tanks arranged sequentially from the loading section to the unloading section. The liquid level in the main tank should submerge the bottom of the transmission roller. The transmission roller rotates with liquid and contacts the silicon wafer for processing. Alternatively, the liquid level in the main tank can submerge the entire transmission roller, and the silicon wafer is transported by the transmission roller while immersed in the liquid." The conveying of photovoltaic silicon wafers during cleaning is prior art, and this invention will not elaborate on it.

[0021] Example 1: Focus on reference Figure 1-3 5-7. This embodiment 1 proposes a high-capacity horizontal wet cleaning device for photovoltaic silicon wafers, including a shell 1, a main tank 2, and a chemical tank 3. A control box 44 is installed on one side of the shell 1. The main tank 2 is located inside the shell 1. The chemical tank 3 is located on the top of the shell 1. A liquid filling head 4 is installed at the bottom of the chemical tank 3.

[0022] Main tank 2 is a four-way horizontal cascaded tank, namely: alkaline washing tank (removing oil, damaged layer and metal impurities from the silicon wafer surface), pure water pre-rinsing tank (rinsing off alkaline solution to prevent alkali from being carried into the next tank), acid washing tank (removing oxide layer, neutralizing residual alkali, and stripping trace metal ions), and final pure water rinsing tank (clean replacement to reduce residual acid on the surface).

[0023] The main tank 2 achieves active control of temperature, concentration, and liquid level through a temperature self-regulating structure, a concentration self-regulating structure, and a liquid level self-regulating structure. The bottom of the outer shell 1 is located below the main tank 2 and a secondary tank 5 is set. A filter structure is set on one side of the secondary tank 5. The filter structure is used to filter the medicine discharged from the main tank 2.

[0024] Both the main tank 2 and the secondary tank 5 are made of corrosion-resistant materials.

[0025] It should be noted that a PLC controller is installed inside the control box 44. The PLC controller uses a multi-channel digital acquisition module and a multi-channel relay output module to complete signal interface. The temperature sensor 8, concentration detector 10, and liquid level sensor 12 in each main tank 2 are individually connected to different analog input channels of the PLC. The PLC distinguishes the real-time temperature, drug concentration, and liquid level data of the four main tanks 2 through the analog signals collected by each channel. The program sets independent threshold judgment logic for the data of the four channels.

[0026] The heaters 9 corresponding to the four main tanks 2 are controlled by relay output points with different numbers from the PLC. When a certain channel detects that the temperature of the corresponding main tank is lower than the set threshold, the PLC identifies the channel number and outputs the corresponding point switch signal to drive the heater 9 of the corresponding circuit to power the heating.

[0027] Each of the liquid filling head 4 and the No. 1 drain pipe 7 is equipped with an independent electric valve. Each main tank has a dedicated liquid filling electric valve and a water replenishment electric valve. The control signal lines of all electric valves are individually connected to the digital output terminals of the PLC. Based on the liquid level signals fed back from the channels of the four liquid level sensors 12, the PLC determines that the liquid level of the corresponding main tank is lower than the standard value and outputs the corresponding terminal drive signal to open the electric valve of the liquid filling head 4 matched to that tank to replenish the medicine into the main tank 2.

[0028] The above system uses a wiring method that allows independent acquisition of data from each channel and independent output from each point, enabling the PLC to accurately distinguish the sensor data and actuators of the four main tanks, and realize independent temperature control, concentration adjustment, and liquid level replenishment for each tank.

[0029] Furthermore, the temperature self-regulating structure includes a pure water tank 6 installed on the side wall of the outer casing 1, a first drain pipe 7 installed in the pure water tank 6, the first drain pipe 7 passing through the back of the outer casing 1 and facing the top of the main tank 2, and a temperature sensor 8 and a heater 9 installed in the main tank 2.

[0030] Specifically: the temperature sensor 8 is model RKC FR-100, and the heater 9 is model Sakaguchi Electric Heating PTFENH-2, which is designed specifically for measuring the temperature of corrosive chemical solutions in wet processes.

[0031] Taking an alkaline washing tank as an example, when the temperature sensor 8 detects that the temperature inside the alkaline washing tank is too high, it transmits the signal to the PLC controller. The PLC controller then accurately identifies the tank with the high temperature as an alkaline washing tank, and controls the electric valve of the liquid filling head 4 above the alkaline washing tank to open. Then, the alkaline washing solution in the corresponding chemical solution tank 3 above the alkaline washing tank is added to the alkaline washing tank through the liquid filling head 4, thereby reducing the temperature inside the alkaline washing tank.

[0032] When the temperature sensor 8 detects that the temperature in the alkaline washing tank is too low, it transmits the signal to the PLC controller. Then, the PLC controller controls the heater 9 in the alkaline washing tank to start, thereby raising the temperature of the alkaline washing liquid in the alkaline washing tank. When the temperature reaches the set temperature, the PLC controller controls the heater 9 to turn off the power.

[0033] Furthermore, the concentration self-adjusting structure includes a medicine tank 3 and a concentration detector 10. The concentration detector 10 is installed on the back of the outer casing 1. A branch pipe 11 is connected inside the main tank 2 and the branch pipe 11 is divided into two sections. The first section is connected to the main tank 2, and the second section is connected to the water inlet 19 of the filter cartridge 17. The two sections of the branch pipe 11 are respectively connected to the liquid inlet and liquid outlet of the concentration detector 10.

[0034] Specifically: the model of the concentration detector 10 is Horiba CS-153N.

[0035] In addition, taking the pure water pre-rinsing tank as an example, the water in the four tanks all comes to the concentration detector 10 through the first branch pipe 11. The concentration detector 10 realizes the concentration detection based on the absorption spectroscopy method and the temperature-compensated multivariate analysis principle. Then the PLC controller receives the analog signal representing the concentration value.

[0036] When the concentration value in the pure water pre-rinsing tank exceeds the specified threshold, the No. 1 drain pipe 7 on the pure water tank 6 corresponding to the pure water pre-rinsing tank is opened. Specifically, the electric valve on the No. 1 drain pipe 7 is opened by the PLC controller, and then pure water is added to the pure water pre-rinsing tank to dilute and reduce the concentration of the medicine.

[0037] When the concentration value in the pure water pre-rinsing tank is lower than the specified threshold, the PLC controller controls and opens the liquid filling head 4 on the corresponding liquid tank 3 of the pure water pre-rinsing tank, and then adds liquid to the pure water pre-rinsing tank to increase the concentration.

[0038] The next step is to include a liquid level self-regulating structure, which includes a medicine tank 3, a pure water tank 6, and a liquid level sensor 12. The liquid level sensor 12 is installed in the main tank 2. The main tank 2 is divided into four horizontally distributed tanks, and an empty tank 13 is set between every two main tanks 2. An overflow port 14 is set above the empty tank 13 and a drain port 15 is set below it. The drain port 15 is located in the secondary tank 5.

[0039] Specifically: the liquid level sensor model 12 is Nohken OLH-3P.

[0040] Furthermore, taking the pickling tank as an example, when the liquid level in the pickling tank is too high, due to the presence of the overflow port 14, the liquid above the overflow port 14 will enter the interior of the empty tank 13 through the overflow port 14, and then be discharged into the auxiliary tank 5 through the drain port 15 at the bottom, thereby achieving the adjustment when the liquid level is too high.

[0041] When the liquid level in the pickling tank becomes too low due to the consumption of silicon wafers during cleaning, the liquid level sensor 12 detects a low-level signal. Then, the PLC controller receives the analog signal of the liquid level value and controls the liquid filling head 4 above the pickling tank to open in the same way as described above. Then, the pickling solution in the corresponding chemical tank 3 is added into the pickling tank, thereby compensating for the low liquid level and achieving active regulation. When the liquid level is detected to reach the specified level, the PLC controls the liquid filling head 4 to close.

[0042] This equipment adopts a horizontal cascaded tank layout, abandoning the traditional single large tank and vertical tank structure. It sets up four horizontally distributed, functionally independent main tanks 2 connected in series, which can actively adjust the temperature, liquid level and concentration in the tank.

[0043] Example 2: Focus on reference Figure 3-5 7-11. In this embodiment 2, the filter structure includes a support base 16 installed at the bottom of the outer shell 1, a filter element filter 17 installed on the support base 16, a baffle 47 installed below the outer shell 1, a water pipe 18 connected to the secondary tank 5, the water pipe 18 connected to the water inlet 19 above the filter element filter 17, the first section of the branch pipe 11 connected to the main tank 2, and the second section of the branch pipe 11 connected to the water inlet 19.

[0044] A booster water pump 20 is installed on the back of the outer casing 1. The booster water pump 20 is connected to a water pumping pipe 21 and a second drain pipe 22. The end of the water pumping pipe 21 is connected to the drain end below the filter cartridge 17. A hollow box 23 is connected to the top of the medicine tank 3.

[0045] The bottom of the hollow box 23 is connected to a through pipe 46, which passes through the liquid tank 3 and comes above the main tank 2. The top of the second drain pipe 22 is located inside the hollow box 23.

[0046] The filter structure also includes a filter lifting assembly, which includes a first shaft 24 rotating inside a hollow box 23. Rectangular blades 25 are arranged in an array outside the first shaft 24. A second shaft 26 is rotatably connected to the bottom of the outer shell 1. Both the ends of the first shaft 24 and the second shaft 26 are fixed with pulleys and are driven by a belt 27.

[0047] The secondary groove 5 is provided with a symmetrical first slide groove 28 and a second slide groove 29. The first slide groove 28 is located on the outer wall of the secondary groove 5, and the second slide groove 29 is located on the inner wall of the secondary groove 5. A magnet 45 is slidably connected inside the first slide groove 28, and the magnet 45 is connected to the bottom of the main groove 2 by a spring 30.

[0048] A bent plate 31 is fixed to a magnet 45, and an impact block 32 is fixed below the bent plate 31. An eccentric wheel 33 is fixed to the outside of the second shaft 26, and the eccentric wheel 33 acts on the bent plate 31.

[0049] An iron block 34 is slidably connected in the second slide groove 29 on the inner wall of the secondary trough 5. The iron block 34 is fixed with a cutting disc 36 by a bent rod 35. An anti-turbulence plate 37 is fixed below the secondary trough 5. An inlet 38 passes through the anti-turbulence plate 37. A water pipe 18 passes through the anti-turbulence plate 37 and is fixed with a receiving plate 39. The cutting disc 36 is located directly above the receiving plate 39.

[0050] The inner wall of the main tank 2 is provided with a third sliding groove 40. The interior of the main tank 2 is slidably connected to a movable plate 41 through the third sliding groove 40. A vertical rod 42 is fixed below the movable plate 41. A sealing ring is provided at the connection between the vertical rod 42 and the main tank 2 to prevent leakage.

[0051] The bottom end of the vertical rod 42 passes through the bottom of the main groove 2 and then comes to the top of the second shaft 26. The second eccentric wheel 43 is fixed to the outside of the second shaft 26, and the second eccentric wheel 43 cooperates with the second shaft 26.

[0052] In this embodiment 2: the liquid medicine in the main tank 2 is always kept at half the height of the overflow port 14. The purpose is to allow the liquid medicine in the main tank 2 to circulate through the overflow port 14 to the empty tank 13, and then through the drain port 15 to the interior of the secondary tank 5. The large particles of impurities carried by the liquid medicine settle naturally by their own gravity. The liquid medicine falls to the bottom of the secondary tank through the inlet 38 opened on the anti-turbulence plate 37. The anti-turbulence plate 37 can isolate the turbulent impact of the liquid medicine continuously flowing in from above, and prevent the large impurities that have settled at the bottom from being washed up and floated to the surface, so as to stably achieve solid-liquid stratification.

[0053] Since the water pipe 18 passes through the anti-turbulence plate 37 and is connected to the receiving tray 39 at the end and is located at two-thirds of the height of the secondary tank 5, this design only extracts the clean liquid with lower impurity content in the upper part of the secondary tank. The sediment and high impurity bottom liquid at the bottom of the secondary tank 5 cannot enter the water pipe 18, thus completing the pre-separation of coarse impurities, reducing the filtration pressure of the downstream filter cartridge 17, and extending the service life of the filter cartridge.

[0054] Meanwhile, the four main tanks 2 lead out the medicine in sections through the branch pipes 11. The medicine is first sent to the concentration detector 10 through the first branch pipe 11 to complete the real-time concentration detection. After the detection is completed, the medicine comes to the water inlet 19 above the filter cartridge 17 through the second branch pipe 11. It enters the filter cartridge 17 together with the medicine transported by the water pipe 18 to achieve deep purification filtration.

[0055] The filtered clean liquid is drawn by the booster pump 20 through the pumping pipe 21, and then sprayed under high pressure into the hollow box 23 through the second drain pipe 22. The high-pressure water flow impacts the blades 25 arranged in the outer ring of the first shaft 24 and drives the first shaft 24 to rotate. The first shaft 24 drives the second shaft 26 to rotate synchronously through the belt 27. The entire linkage mechanism operates autonomously by relying on the water pressure.

[0056] During the rotation of the second shaft 26, the first eccentric wheel 33 fixed externally is driven to rotate continuously. The first eccentric wheel 33 periodically squeezes the bent plate 31, thereby driving the bent plate 31 and the magnet 45 to slide downward along the first sliding groove 28 on the outer wall of the secondary groove 5, and simultaneously stretching the spring 30. After the first eccentric wheel 33 is released from the squeeze, the spring 30 rebounds and pulls the magnet 45 and the bent plate 31 to reset. The spring 30 provides the reset force for the magnet 45.

[0057] When the curved plate 31 moves downward, the impact block 32 at the bottom moves downward in sync, periodically impacting the water inlet 19 to generate continuous micro-vibration, effectively preventing impurities in the liquid from adhering and clogging the inner wall of the water inlet 19 pipe. When the magnet 45 moves downward, it pulls the iron block 34 in the second slide groove 29 downward in sync with the magnetic attraction. The iron block 34 drives the cutting disc 36 to descend into the receiving disc 39 together through the curved rod 35.

[0058] The cutting disc 36 is arranged with equidistant cutting blades in a circumferential array. Medium impurities floating in the liquid first flow into the disc through the gap between the cutting disc 36 and the receiving disc 39. As the cutting disc 36 descends, the impurities will be intercepted by the cutting blades during their upward movement. They will be chopped and refined as the cutting disc 36 descends, preventing medium impurities from accumulating and clogging the water pipe 18, thus achieving pre-treatment of impurities before filtration.

[0059] When the second shaft 26 rotates, it synchronously drives the outer second eccentric wheel 43 to rotate. The second eccentric wheel 43 intermittently pushes the vertical rod 42, thereby raising the movable plate 41 along the third slide groove 40 in the main groove 3. After the second eccentric wheel 43 rotates away from the bottom of the vertical rod 42, the movable plate 41 falls back due to its own gravity. This realizes the reciprocating lifting and lowering of the movable plate 41 and generates water flow. The water flow impacts the surface of the photovoltaic silicon wafer in a small amplitude to avoid dead zones and ensure the consistency of the cleaning rate.

[0060] In addition, the movement of the movable plate 41 in the main tank will agitate the liquid medicine in the tank, which can accelerate the uniform mixing of the liquid medicine in the tank. When the PLC controls the water replenishment, dosing and adjusting the temperature and concentration, it can quickly complete the heat exchange, liquid medicine dilution or drug fusion, shortening the response time of temperature rise and fall and concentration adjustment.

[0061] The clean medicine solution delivered to the hollow box 23 by the booster pump 20 is returned to each main tank 2 through the pipe 46 to continuously maintain the liquid level balance inside the main tank 2. If the liquid level sensor 12 detects that the liquid level of the corresponding main tank is lower than the set standard, the equipment will activate the liquid level self-adjustment structure to complete the automatic liquid level compensation.

[0062] The entire circulation system is synchronized with the temperature self-regulating structure and the concentration self-regulating structure, and is combined with the impurity classification and precipitation, crushing, and pipeline anti-clogging linkage design. While ensuring the uniformity and stability of silicon wafer cleaning solution parameters, it realizes solution circulation filtration and reuse, impurity treatment, and automatic pipeline anti-clogging.

[0063] The above are merely preferred embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers, characterized in that: The system includes an outer shell (1), a main tank (2), and a liquid tank (3). The main tank (2) is located inside the outer shell (1), and the liquid tank (3) is located on top of the outer shell (1). A liquid inlet head (4) is installed at the bottom of the liquid tank (3). The main tank (2) achieves active control of temperature, concentration, and liquid level through a temperature self-regulating structure, a concentration self-regulating structure, and a liquid level self-regulating structure. A secondary tank (5) is set at the bottom of the outer shell (1) below the main tank (2). A filter structure is set on one side of the secondary tank (5). The filter structure is used to filter the liquid discharged from the main tank (2). The temperature self-regulating structure includes a pure water tank (6) installed on the side wall of the outer shell (1). A first drain pipe (7) is installed in the pure water tank (6). The first drain pipe (7) passes through the back of the outer shell (1) and faces the top of the main tank (2). A temperature sensor (8) and a heater (9) are installed inside the main tank (2).

2. The high-capacity horizontal wet cleaning equipment for photovoltaic silicon wafers according to claim 1, characterized in that, The concentration self-adjusting structure includes a liquid tank (3) and a concentration detector (10). The concentration detector (10) is installed on the back of the outer shell (1). The main tank (2) is connected to a branch pipe (11), and the branch pipe (11) is divided into two sections. The two sections of the branch pipe (11) are respectively connected to the inlet and outlet of the concentration detector (10).

3. The high-capacity horizontal wet cleaning equipment for photovoltaic silicon wafers according to claim 1, characterized in that, The self-regulating liquid level structure includes a medicine tank (3), a pure water tank (6), and a liquid level sensor (12). The liquid level sensor (12) is installed in the main tank (2). The main tank (2) is divided into four horizontally distributed tanks, and an empty tank (13) is set between every two main tanks (2). An overflow port (14) is set above the empty tank (13), and a drain port (15) is set below it. The drain port (15) is located in the secondary tank (5).

4. The high-capacity horizontal wet cleaning equipment for photovoltaic silicon wafers according to claim 1, characterized in that, The filter structure includes a support base (16) installed at the bottom of the outer shell (1), a filter element filter (17) installed on the support base (16), a baffle (47) installed below the outer shell (1), a water pipe (18) connected to the secondary tank (5), the water pipe (18) being connected to the water inlet (19) above the filter element filter (17), the second branch pipe (11) being connected to the water inlet (19), a booster water pump (20) installed on the back of the outer shell (1), the booster water pump (20) being connected to a water pumping pipe (21) and a second drain pipe (22), and the end of the water pumping pipe (21) being connected to the drain end below the filter element filter (17).

5. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers according to claim 4, characterized in that, The top of the liquid medicine tank (3) is connected to a hollow box (23), and the bottom of the hollow box (23) is connected to a through pipe (46). The through pipe (46) passes through the liquid medicine tank (3) and comes to the top of the main tank (2). The top of the second drain pipe (22) is located inside the hollow box (23).

6. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers according to claim 4, characterized in that, The filter structure also includes a filter lifting assembly, which includes a first shaft (24) rotating inside a hollow box (23), rectangular blades (25) arranged in an array on the outside of the first shaft (24), and a second shaft (26) rotatably connected to the bottom of the outer shell (1). The ends of the first shaft (24) and the second shaft (26) are both fixed with pulleys and driven by belts (27).

7. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers according to claim 6, characterized in that, The secondary groove (5) is provided with a symmetrical first slide groove (28) and a second slide groove (29). The first slide groove (28) is located on the outer wall of the secondary groove (5), and the second slide groove (29) is located on the inner wall of the secondary groove (5). A magnet (45) is slidably connected in the first slide groove (28). The magnet (45) is connected to the bottom of the main groove (2) above by a spring (30). A bent plate (31) is fixed to the magnet (45). An impact block (32) is fixed below the bent plate (31). An eccentric wheel (33) is fixed to the outside of the second shaft (26). The eccentric wheel (33) acts on the bent plate (31).

8. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers according to claim 7, characterized in that, An iron block (34) is slidably connected in the second slide groove (29) on the inner wall of the sub-groove (5). The iron block (34) is fixed with a cutting disc (36) by a bent rod (35). An anti-turbulence plate (37) is fixed below the sub-groove (5). An inlet (38) passes through the anti-turbulence plate (37). The water pipe (18) passes through the anti-turbulence plate (37) and is fixed with a receiving plate (39). The cutting disc (36) is located directly above the receiving plate (39).

9. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers according to claim 8, characterized in that, The inner wall of the main groove (2) is provided with a third sliding groove (40). The interior of the main groove (2) is slidably connected to a movable plate (41) through the third sliding groove (40). A vertical rod (42) is fixed below the movable plate (41). The bottom end of the vertical rod (42) passes through the bottom of the main groove (2) and then reaches the top of the second shaft (26). A second eccentric wheel (43) is fixed to the outside of the second shaft (26). The second eccentric wheel (43) cooperates with the second shaft (26).

10. A high-capacity horizontal wet cleaning device for photovoltaic silicon wafers according to claim 1, characterized in that, A control box (44) is installed on one side of the outer casing (1).

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