Welding tension structure of sensing diaphragm of thin film vacuum gauge for semiconductor manufacturing

Abstract

This invention relates to the field of diaphragm welding technology, and more particularly to a welding tensioning structure for the sensing diaphragm of a thin-film vacuum gauge used in semiconductor manufacturing. The structure includes a working chamber and a tensioning structure, with the tensioning structure located inside the working chamber. The tensioning structure includes a support assembly, a clamping assembly, and a tensioning assembly. The support assembly includes a support base and a limiting plate. The support base is located above the limiting plate. This invention employs a lifting rotary drum linked to a flexible horn cover and a circumferentially distributed slider to synchronously tension the diaphragm. This multi-point uniform radial stretching eliminates wrinkles and warping of the ultra-thin sensing diaphragm. The flexible contact throughout the tensioning process prevents scratches on the diaphragm. After welding, the diaphragm exhibits uniform tension distribution, significantly reducing zero-point drift and temperature drift in the vacuum gauge. Simultaneously, airflow is generated by the downward movement of the rotary drum linked to the air box. This positive pressure airflow corrects the coaxiality of the pressure ring. The rotary disc drives the diaphragm and pressure ring to rotate synchronously, eliminating pressure ring eccentricity and ensuring consistent width of the annular weld.

Description

Technical Field

[0001] This invention relates to the field of diaphragm welding technology, and more particularly to the welding tensioning structure of the sensing diaphragm of a thin-film vacuum gauge for semiconductor manufacturing. Background Technology

[0002] In semiconductor wafer manufacturing, etching, PVD, and CVD process chambers require capacitive thin-film vacuum gauges to monitor the high vacuum environment in real time. The core sensing element of the vacuum gauge is a micron-level ultrathin alloy circular diaphragm. The flatness of the diaphragm and the uniformity of circumferential tension directly determine the accuracy and long-term stability of vacuum measurement. However, existing traditional diaphragm welding fixtures have many technical defects and cannot meet the stringent manufacturing standards of high-end semiconductor equipment. First, traditional tensioning fixtures mostly use single-sided or a small number of jaws to hold the tensioned diaphragm, resulting in few tensioning stress points. Ultra-thin metal diaphragms are prone to local stress concentration and residual wrinkles. During the tensioning process, rigid clamps are very easy to scratch the diaphragm surface, resulting in serious zero-point drift of the finished product. After long-term high and low temperature cycling, the tension decays rapidly. Second, the alignment of the pressure ring and the cavity relies on manual visual calibration, resulting in large coaxiality errors. The width of the welded annular weld is uneven, and there is a risk of incomplete welding and false welding. The vacuum leakage rate does not meet the standards and cannot be used for monitoring semiconductor clean vacuum chambers. In addition, traditional fixtures not only cannot achieve integrated tensioning and welding positioning, but also lack automatic airflow correction and synchronous rotation mechanisms. The eccentricity of the pressure ring cannot be dynamically corrected, making it difficult to meet the stringent requirements of high-precision parts in terms of processing accuracy. Summary of the Invention

[0003] The purpose of this invention is to solve the problems in the prior art by proposing a welding and tensioning structure for the sensing diaphragm of a thin-film vacuum gauge for semiconductor manufacturing.

[0004] To achieve the above objectives, the present invention adopts the following technical solution: A welding and tensioning structure for the sensing diaphragm of a thin-film vacuum gauge for semiconductor manufacturing includes a working chamber and a tensioning structure, wherein the tensioning structure is located inside the working chamber. The tensioning structure includes a support assembly, a clamping assembly, and a tensioning assembly; The support assembly includes a support base and a limiting plate; The support base is located above the limiting plate, and the limiting plate is fixedly placed at the bottom of the inner side of the work box; The clamping assembly is located between the support base and the limiting plate, and includes an upper clamping plate and a lower clamping plate; The upper clamping plate is fixedly installed at the bottom of the support base, and the lower clamping plate is fixedly installed at the top of the limiting plate; The tensioning assembly includes a rotating cylinder, a pressure cylinder, and a turntable; The rotating cylinder is movably sleeved on the outside of the support base, the top of the pressure cylinder abuts against the inside of the rotating cylinder, the pressure cylinder is located above the upper clamping plate, and the rotating plate is rotatably installed on the inside of the lower clamping plate. The basic components, located between the support base and the limiting plate, include a diaphragm and a pressure ring; The welding assembly is located at the bottom of the work box.

[0005] Preferably, the inner side of the rotating drum is provided with an internal thread, and the outer side of the support seat is provided with an external thread; The rotating drum and the support base are connected by threads; A second spring is provided between the top of the pressure cylinder and the upper clamping plate, and a second rotating ring is rotatably installed at the bottom of the pressure cylinder; A horn cover is fixedly installed at the bottom of the second rotating ring. The horn cover is made of flexible material and abuts against the top of the first diaphragm.

[0006] Preferably, the sidewall of the turntable is integrally formed with a plurality of evenly distributed support plates; Each of the support plates has a slider slidably mounted on its sidewall, the top of the slider abutting against the bottom of the diaphragm. The bottom of the slider has a slide plate integrally formed; The side wall of the support plate is provided with a sliding groove, and the sliding plate is slidably installed on the inner side of the sliding groove. A spring is provided between the bottom of the skateboard and the side wall of the turntable.

[0007] Preferably, an air box is fixedly installed on the top of the support base; A rotating ring is rotatably mounted on the side wall of the rotating cylinder. A support plate is integrally formed on the side wall of the rotating ring. Two support rods are integrally formed on the top of the support plate. A piston plate is fixedly mounted on the top of the two support rods. The piston plate is slidably mounted inside the air box; Air tube one and air tube two are fixedly installed on the inner sides of the two support rods; The air tube passes through the piston plate and is connected to the space above the piston plate. One of the support rods has an air groove on its side wall, and the air groove is connected to the space below the piston plate.

[0008] Preferably, both the upper and lower clamping plates have air holes on their side walls, and the air pipe is slidably installed inside the air hole. The inner sides of both the upper and lower clamping plates are provided with annular grooves and air chambers. The annular groove is connected to the air chamber, and a branch hole is provided between the air hole and the air chamber. A clamping ring is slidably installed on the inner side of the annular groove on the inner side of the upper clamping plate; A second clamping ring is slidably installed on the inner side of the annular groove on the inner side of the lower clamping plate; Both clamping ring one and clamping ring two are provided with spring three between them and the inner side of the corresponding ring groove.

[0009] Preferably, a fixing plate is fixedly installed on the inner side of the lower clamping plate, and a support cylinder is fixedly installed on the inner side of the fixing plate; The pressure ring is placed above the support cylinder, the first diaphragm is placed above the fixed plate, and the pressure ring is located below the first diaphragm. Several circumferentially distributed air grooves are provided between the fixed plate and the support cylinder, and the air grooves are located on the outside of the pressure ring.

[0010] Preferably, the turntable is rotatably mounted on the side wall of the fixed disk, and the side wall of the fixed disk is provided with an air ring; The turntable has a number of evenly distributed inclined plates integrally formed on its side wall, and the inclined plates are located inside the air ring. An air hole three is provided between the bottom of the air ring and the air groove two; The upper and lower clamping plates are each provided with a second air hole on their sidewalls, and the second air pipe is slidably installed inside the second air hole. A second branch hole is provided between the second air hole and the side wall of the air ring.

[0011] Preferably, the welding assembly includes a welding torch; A laser generator is fixedly installed at the bottom of the work box, and the welding torch is rotatably mounted on the output end of the laser generator; The welding torch penetrates from the bottom of the work box to the interior of the work box; A gear is fixedly installed on the outside of the welding torch; A driver is fixedly installed at the bottom of the working box, and a gear is fixedly connected to the output end of the driver. Gear 1 meshes with Gear 2.

[0012] Preferably, a limit ring is fixedly installed on the top of the support base; A sliding cylinder is movably installed on the inner side of the pressure cylinder, and a limiting screw one and a limiting screw two are provided between the top of the sliding cylinder and the limiting ring. A vacuum gauge cavity is fixedly installed on the inner side of the slide cylinder, and the vacuum gauge cavity is located above the diaphragm. Limiting holes are provided on the side wall of the limiting plate; A limiting platform is fixedly installed at the bottom inside the work box, and a limiting post is integrally formed at the top of the limiting platform. The limiting hole is slidably inserted into the outside of the limiting post.

[0013] Compared with existing technologies, the beneficial effects of this invention are as follows: This invention employs a threaded lifting rotary drum linked with a flexible horn cover and a circumferentially distributed slider to synchronously tension the diaphragm. This multi-point, uniform radial stretching completely eliminates wrinkles and warping of the ultra-thin induction diaphragm. The flexible contact throughout the tensioning process prevents scratches on the diaphragm. After welding, the diaphragm exhibits uniform tension distribution, significantly reducing zero-point drift and temperature drift in the vacuum gauge. Simultaneously, the downward movement of the rotary drum, linked with an air box, generates negative and positive pressure airflow. The positive pressure airflow corrects the coaxiality of the pressure ring, and the turntable drives the diaphragm and pressure ring to rotate synchronously, eliminating pressure ring eccentricity and ensuring the correct width of the annular weld. Consistent performance, lower vacuum sealing leakage rate, suitable for high-cleanliness vacuum conditions in semiconductors, positive pressure airflow enables automatic release of clamping rings one and two, eliminating multiple sets of independent pneumatic components, simplifying the air path layout, reducing equipment size and production costs, the whole machine integrates tensioning, centering, positioning and laser welding into one structure, the welding process continuously locks the pre-tightening stress of the diaphragm, no need for secondary tooling transfer, high product consistency, avoids diaphragm shifting and loosening after tensioning, meeting the needs of high-volume high-precision production of vacuum gauges for wafer etching and thin film deposition equipment. Attached Figure Description

[0014] Figure 1 This is a three-dimensional structural diagram of the present invention; Figure 2 This is a cross-sectional view of the working box and welding assembly in this invention; Figure 3 This is a schematic diagram of the tensioning mechanism in this invention; Figure 4 This is a cross-sectional view of the tensioning mechanism in this invention; Figure 5 For the present invention Figure 4 Enlarged schematic diagram of the structure at point A; Figure 6 This is a cross-sectional view of the structure of vent hole one and branch hole one in this invention; Figure 7 This is a cross-sectional view of the structure of pore two and branch pore two in this invention; Figure 8 This is a schematic diagram of the structure of the rotating cylinder and the rotating ring in this invention; Figure 9 This is a schematic diagram of the installation of the pressure cylinder, upper clamping plate, and lower clamping plate in this invention; Figure 10 This is a schematic diagram of the bottom structure of the pressure cylinder in this invention; Figure 11 This is a cross-sectional view of the upper and lower clamping plates in this invention; Figure 12 This is a schematic diagram of the structure of clamping ring one and clamping ring two in this invention; Figure 13 This is a schematic diagram of the structure of the turntable and slider in this invention.

[0015] In the diagram: 1. Work box; 11. Limiting stage; 12. Laser generator; 121. Welding torch; 122. Gear 1; 123. Driver 1; 124. Gear 2; 21. Support base; 211. Limiting ring; 212. Limiting screw one; 213. Limiting screw two; 214. Slide cylinder; 215. Vacuum gauge cavity; 216. Diaphragm one; 217. Pressure ring; 22. Rotating cylinder; 221. Air box; 222. Rotating ring one; 223. Piston plate; 224. Support plate; 225. Air pipe one; 226. Air pipe two; 227. Air groove one; 228. Support rod; 23. Limiting plate; 231. Limiting hole; 232. Limiting post; 24. Pressure cylinder; 241. Rotary ring II; 242. Horn cover; 243. Spring II; 31. Upper clamping plate; 311. Air hole one; 312. Air hole two; 313. Annular groove; 314. Air chamber one; 315. Clamping ring one; 316. Support hole one; 317. Support hole two; 32. Lower clamping plate; 321. Support cylinder; 322. Fixed plate; 323. Air groove two; 324. Air ring; 325. Clamping ring two; 326. Air hole three; 327. Spring three; 33. Turntable; 331. Inclined plate; 332. Slide 1; 333. Slider; 334. Slide plate; 335. Spring 1; 336. Support plate. Detailed Implementation

[0016] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0017] In the description of this invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0018] The welding tensioning mechanism in the relevant technology has at least the following problems when in use: First, traditional tensioning fixtures often use single-sided or a small number of jaws to hold the tensioning diaphragm, resulting in fewer tensioning stress points. Ultra-thin metal diaphragms are prone to localized stress concentration and residual wrinkles. During the tensioning process, rigid clamps are very easy to scratch the diaphragm surface, leading to severe zero-point drift in the finished product. After long-term high and low temperature cycles, the tension decreases rapidly.

[0019] Secondly, the alignment of the pressure ring and the cavity relies on manual visual calibration, resulting in large coaxiality errors. The width of the welded annular seam is uneven, and there are potential risks of incomplete or false welds. The vacuum leakage rate does not meet the standards, making it unsuitable for monitoring semiconductor clean vacuum cavities.

[0020] Finally, traditional tooling not only fails to achieve integrated tensioning and welding positioning, but also lacks automatic airflow correction and synchronous rotation mechanisms, making it impossible to dynamically correct the eccentricity of the pressure ring, resulting in machining accuracy that cannot meet the stringent requirements of high-precision parts.

[0021] To address the aforementioned technical problems, this application provides a welding and tensioning structure for the sensing diaphragm of a thin-film vacuum gauge for semiconductor manufacturing, thereby resolving the problems mentioned above.

[0022] Reference Figure 1 - Figure 13 As shown, the welding and tensioning structure of the sensing diaphragm of a thin-film vacuum gauge for semiconductor manufacturing includes a working box 1 and a tensioning structure, with the annular groove tensioning structure located inside the working box 1. The annular groove tensioning structure includes a support assembly, a clamping assembly, and a tensioning assembly. The annular groove support assembly includes a support base 21 and a limiting plate 23. The annular groove support base 21 is located above the limiting plate 23, and the annular groove limiting plate 23 is fixedly placed at the bottom of the inner side of the working box 1. The annular groove clamping assembly is located between the support base 21 and the limiting plate 23, and includes an upper clamping plate 31 and a lower clamping plate 32. The annular groove upper clamping plate 31 is fixedly installed. At the bottom of the support base 21, the annular groove lower clamping plate 32 is fixedly installed on the top of the limiting plate 23; the annular groove tensioning assembly includes a rotating cylinder 22, a pressure cylinder 24, and a rotating plate 33; the annular groove rotating cylinder 22 is interlocked on the outside of the support base 21, the top of the annular groove pressure cylinder 24 abuts against the inside of the rotating cylinder 22, the annular groove pressure cylinder 24 is located above the upper clamping plate 31, and the annular groove rotating plate 33 is rotatably installed on the inside of the lower clamping plate 32; the base assembly, located between the support base 21 and the limiting plate 23, includes a diaphragm 216 and a pressure ring 217; the welding assembly is located at the bottom of the work box 1; After placing the pressure ring 217 and diaphragm 216 above the lower clamping plate 32, the operator lifts the lower clamping plate 32 and aligns it with the lower clamping plate 31 below. The operator then uses screws to lock the upper clamping plate 32 and lower clamping plate 31. After the clamping assembly is locked, the operator rotates the rotating drum 22, which drives the pressure cylinder 24 downwards. This causes the pressure cylinder 24 to work with the rotating plate 33 to tension the diaphragm 216, simultaneously aligning the pressure ring 217 with the axis of the rotating plate 33. After the diaphragm 216 is tensioned, the tensioning mechanism is placed inside the work box 1. At this time, the welding assembly is started. The welding assembly welds the base assembly from the inside of the limiting plate 23. The circumferential continuous laser sealing of the diaphragm 216, the pressure ring 217 and the vacuum gauge cavity 215 is achieved by the internal rotating welding gun 121. The uniform tension of the diaphragm 216 after tensioning is locked at the same time, ensuring the flatness of the diaphragm 216 and the coaxiality of the pressure ring 217 after welding, and reducing the zero-point drift of the finished vacuum gauge.

[0023] like Figure 4 , Figure 5 and Figures 8-10 As shown, the inner side of the annular groove rotating cylinder 22 is provided with internal threads, and the outer side of the annular groove support 21 is provided with external threads; the annular groove rotating cylinder 22 and the support 21 are connected by threads. A spring 243 is provided between the top of the annular groove pressure cylinder 24 and the upper clamping plate 31. A rotating ring 241 is rotatably installed at the bottom of the annular groove pressure cylinder 24. A horn cover 242 is fixedly installed at the bottom of the annular groove rotating ring 241. The horn cover 242 is made of flexible material and abuts against the top of the diaphragm 216. After the upper clamping plate 31 and the lower clamping plate 32 are fixedly connected by screws, the operator inserts a torque tool into the top of the rotating drum 22 and drives the rotating drum 22 to rotate. The rotating drum 22 slides downward through the cooperation of the internal and external threads. The pressure cylinder 24 drives the rotating ring 241 and the horn cover 242 to slide downward with the rotating drum 22, so that the horn cover 242 is evenly attached to the upper surface of the diaphragm. The diaphragm 216 is expanded and flattened outward by relying on the flexible contact surface, while avoiding scratching the diaphragm 216 during the tensioning process.

[0024] like Figure 4 , Figure 5 and Figure 13 As shown, the sidewall of the annular groove turntable 33 is integrally formed with several evenly distributed support plates 336; each annular groove support plate 336 has a slider 333 slidably mounted on its sidewall, the top of the annular groove slider 333 abutting against the bottom of the diaphragm 216; the bottom of the annular groove slider 333 is integrally formed with a sliding plate 334; the sidewall of the annular groove support plate 336 has a groove 332, and the annular groove sliding plate 334 is slidably mounted on the inner side of the groove 332; a spring 335 is provided between the bottom of the annular groove sliding plate 334 and the sidewall of the turntable 33; When the pressure cylinder 24 drives the horn cover 242 to slide downward, the position where the horn cover 242 contacts the diaphragm 216 is located at the top of the slider 333, so that the slider 333 and the horn cover 242 clamp the diaphragm 216, causing the horn cover 242 and the slider 333 to stretch the diaphragm 216 outward. Multiple sliders 333 slide outward radially in sync, so that the diaphragm 216 obtains uniform in-plane tensile stress throughout its entire area, completely eliminating the local wrinkles and wave deformations caused by the cutting and transportation of the diaphragm 216, and ensuring that the diaphragm 216 is completely flattened after tensioning.

[0025] like Figure 3 and Figures 6-8 As shown, an air box 221 is fixedly installed on the top of the annular groove support 21; a rotating ring 222 is rotatably installed on the side wall of the annular groove rotating cylinder 22; a support plate 224 is integrally formed on the side wall of the annular groove rotating ring 222; two support rods 228 are integrally formed on the top of the annular groove support plate 224; a piston plate 223 is fixedly installed on the top of the two annular groove support rods 228; the annular groove piston plate 223 is slidably installed inside the air box 221; an air pipe 225 and an air pipe 226 are fixedly installed on the inner side of the two annular groove support rods 228; the annular groove air pipe 225 passes through the piston plate 223 and is connected to the space above the piston plate 223; an air groove 227 is opened on the side wall of one of the annular groove support rods 228; the annular groove air groove 227 is connected to the space below the piston plate 223; As the rotating drum 22 rotates and slides downward, it drives the rotating ring 222 to slide downward. At this time, the space above the piston plate 223 increases and becomes negative pressure, so the air pipe 225 draws air, and the space below the piston plate 223 decreases and becomes positive pressure, so the air pipe 226 exhausts air. The rotating drum 22 moves downward and the air box 221 is linked to complete the synchronous negative and positive pressure air supply. There is no need to add an extra pneumatic drive cylinder, which simplifies the pneumatic control circuit of the whole machine.

[0026] like Figure 6 , Figure 9 , Figure 11 and Figure 12 As shown, both the upper and lower clamping plates 31 and 32 of the annular groove have air holes 311 on their side walls, and an annular groove air pipe 225 is slidably installed inside the air hole 311. Both the upper and lower clamping plates 31 and 32 have annular grooves 313 and air chambers 314 on their inner sides. The annular groove 313 is connected to the air chamber 314, and a support hole 316 is provided between the annular groove air hole 311 and the air chamber 314. A clamping ring 315 is slidably installed on the inner side of the annular groove 313 on the inner side of the upper clamping plate 31. A clamping ring 325 is slidably installed on the inner side of the annular groove 313 on the inner side of the lower clamping plate 32. A spring 327 is provided between the clamping ring 315 and the corresponding inner side of the annular groove 313. When the upper clamping plate 31 and the lower clamping plate 32 are fixedly connected by screws, clamping ring 315 and clamping ring 325 clamp the diaphragm 216, completing the pre-positioning of the diaphragm 216 during the assembly stage, preventing the diaphragm 216 from shifting or slipping during assembly. When the air tube 225 is drawing air, the inside of the branch hole 316, the air chamber 314 and the annular groove 313 are all under negative pressure, causing clamping ring 315 and clamping ring 325 to contract towards the inside of the annular groove 313, causing clamping ring 315 and clamping ring 325 to release the clamping of the diaphragm 216, thereby allowing the diaphragm 216 to be completely released from the edge restraint, and can be freely stretched outward radially by the horn cover 242 and the slider 333, avoiding the clamping rings from hindering the uniform tension of the diaphragm.

[0027] like Figures 4-7 As shown, a fixed plate 322 is fixedly installed on the inner side of the annular groove lower clamping plate 32, and a support cylinder 321 is fixedly installed on the inner side of the annular groove fixed plate 322; the annular groove pressure ring 217 is placed above the support cylinder 321, the annular groove diaphragm 216 is placed above the fixed plate 322, and the annular groove pressure ring 217 is located below the diaphragm 216; a number of circumferentially evenly distributed air grooves 323 are opened between the annular groove fixed plate 322 and the support cylinder 321, and the annular groove air grooves 323 are located on the outer side of the pressure ring 217; When the gas groove 2 323 exhausts gas outward, the exhaust gas blows to the outside of the pressure ring 217, causing the axis of the pressure ring 217 to move closer to the axis of the support cylinder 321. After the axis of the pressure ring 217 and the axis of the support cylinder 321 coincide, the gas exhausted by the gas groove 2 323 is evenly distributed on the outside of the pressure ring 217, ensuring that the pressure ring 217 is accurately aligned and avoiding uneven weld width caused by the eccentricity of the pressure ring 217 during the welding process.

[0028] like Figure 7 , Figure 11 and Figure 13 As shown, the annular groove turntable 33 is rotatably mounted on the side wall of the fixed plate 322, and the side wall of the annular groove fixed plate 322 is provided with an air ring 324; the side wall of the annular groove turntable 33 is integrally formed with several evenly distributed inclined plates 331, and the annular groove inclined plates 331 are located inside the air ring 324; an air hole 326 is provided between the bottom of the annular groove air ring 324 and the air groove 323; the side walls of the upper clamping plate 31 and the lower clamping plate 32 of the annular groove are both provided with air holes 312, and the annular groove air pipe 226 is slidably installed inside the air hole 312; a support hole 317 is provided between the annular groove air hole 312 and the side wall of the air ring 324. The diameters of the second branch hole 317, the third vent 326, and the second vent groove 323 are much smaller than those of the second branch hole 317 and the first branch hole 316. When the second vent pipe 226 exhausts air, the second branch hole 317 exhausts air into the inner side of the air ring 324, causing the gas to drive the turntable 33 to rotate through the inclined plate 331. The turntable 33 drives the first diaphragm 216 and the horn cover 242 to rotate synchronously through the slider 333, causing the first diaphragm 216 to drive the pressure ring 217 to rotate. This makes the outer side of the pressure ring 217 more fully contact the gas discharged from the second vent groove 323, further improving the centering and correction effect of the airflow on the pressure ring 217, while eliminating the slight wobble caused by the local force on the pressure ring 217. The gas inside the air ring 324 is discharged to the inner side of the second vent groove 323 through the third vent 326, causing the second vent groove 323 to discharge gas outward.

[0029] like Figure 1 and Figure 2 As shown, the annular groove welding assembly includes a welding torch 121; a laser generator 12 is fixedly installed at the bottom of the annular groove working box 1, and the annular groove welding torch 121 is rotatably installed at the output end of the laser generator 12; the annular groove welding torch 121 penetrates through the bottom of the working box 1 to the interior of the working box 1; a gear 122 is fixedly installed on the outside of the annular groove welding torch 121; a driver 123 is fixedly installed at the bottom of the annular groove working box 1, and a gear 124 is fixedly connected to the output end of the annular groove driver 123; the annular groove gear 122 meshes with the gear 124. The welding torch 121 is located inside the support cylinder 321. After the tensioning mechanism is fixedly placed inside the working box 1, the operator starts the laser generator 12 and the driver 123. The driver 123 drives the welding torch 121 to rotate through the gear 122 and the gear 2 124. The laser generator 12 drives the welding torch 121 to weld the basic components inside the support cylinder 321, so that the diaphragm 216, the pressure ring 217 and the bottom of the vacuum gauge cavity 215 form a continuous, uniform and uninterrupted annular sealing weld, and simultaneously permanently locks the stress after the diaphragm 216 is tensioned, improving the sealing performance and long-term measurement stability of the vacuum gauge.

[0030] like Figures 2-4As shown, a limiting ring 211 is fixedly installed on the top of the annular groove support 21; a sliding cylinder 214 is movably installed on the inner side of the annular groove pressure cylinder 24, and a limiting screw 212 and a limiting screw 213 are provided between the top of the annular groove sliding cylinder 214 and the limiting ring 211. The limiting screw 212 is used to drive the sliding cylinder 214 to move downward, and the limiting screw 213 is used to drive the sliding cylinder 214 to move upward; a vacuum gauge cavity 215 is fixedly installed on the inner side of the annular groove sliding cylinder 214, and the annular groove vacuum gauge cavity 215 is located above the diaphragm 216; a limiting hole 231 is opened on the side wall of the annular groove limiting plate 23; a limiting platform 11 is fixedly installed on the bottom of the inner side of the annular groove working box 1, and a limiting post 232 is integrally formed on the top of the annular groove limiting platform 11, and the annular groove limiting hole 231 is slidably inserted into the outer side of the limiting post 232; After the tensioning of diaphragm 216 and the alignment of pressure ring 217 are completed, the operator drives slide cylinder 214 downward by limiting screw 212 and limiting screw 213, causing slide cylinder 214 to drive the bottom of vacuum gauge cavity 215 to contact diaphragm 216. After vacuum gauge cavity 215 contacts the top of diaphragm 216, the operator places the tensioning mechanism inside the work box 1, and then performs welding operations.

[0031] To further clarify, the aforementioned fixed connection should be interpreted broadly unless otherwise explicitly specified and limited. For example, it may be welding, gluing, or integral molding, or other conventional methods well known to those skilled in the art.

[0032] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A welding and tensioning structure for the sensing diaphragm of a thin-film vacuum gauge for semiconductor manufacturing, characterized in that: It includes a working box (1) and a tensioning structure, the tensioning structure being located inside the working box (1); The tensioning structure includes a support assembly, a clamping assembly, and a tensioning assembly; The support assembly includes a support base (21) and a limiting plate (23); The support base (21) is located above the limiting plate (23), and the limiting plate (23) is fixedly placed at the bottom of the inner side of the work box (1); The clamping assembly is located between the support base (21) and the limiting plate (23), and includes an upper clamping plate (31) and a lower clamping plate (32). The upper clamping plate (31) is fixedly installed at the bottom of the support base (21), and the lower clamping plate (32) is fixedly installed at the top of the limiting plate (23); The tensioning assembly includes a rotating cylinder (22), a pressure cylinder (24), and a turntable (33); The rotating cylinder (22) is interlocked on the outside of the support base (21), the top of the pressure cylinder (24) abuts against the inside of the rotating cylinder (22), the pressure cylinder (24) is located above the upper clamping plate (31), and the rotating plate (33) is rotatably installed on the inside of the lower clamping plate (32). The basic components, located between the support base (21) and the limiting plate (23), include a diaphragm (216) and a pressure ring (217). Welding components are located at the bottom of the work box (1).

2. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 1, characterized in that: The inner side of the rotating drum (22) is provided with an internal thread, and the outer side of the support seat (21) is provided with an external thread; The rotating drum (22) and the support base (21) are connected by threads; A second spring (243) is provided between the top of the pressure cylinder (24) and the upper clamping plate (31), and a second rotating ring (241) is rotatably installed at the bottom of the pressure cylinder (24). The bottom of the rotating ring two (241) is fixedly installed with a horn cover (242), which is made of flexible material and abuts against the top of the diaphragm one (216).

3. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 1, characterized in that: The sidewall of the turntable (33) is integrally formed with several evenly distributed support plates (336). Each of the support plates (336) has a slider (333) slidably mounted on its sidewall, the top of the slider (333) abutting against the bottom of the diaphragm (216); The bottom of the slider (333) is integrally formed with a sliding plate (334). The side wall of the support plate (336) is provided with a sliding groove (332), and the sliding plate (334) is slidably installed on the inner side of the sliding groove (332); A spring (335) is provided between the bottom of the skateboard (334) and the side wall of the turntable (33).

4. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 1, characterized in that: An air box (221) is fixedly installed on the top of the support base (21). The rotating cylinder (22) has a rotating ring (222) rotatably mounted on its side wall. The rotating ring (222) has a support plate (224) integrally formed on its side wall. The support plate (224) has two support rods (228) integrally formed on its top. The top of the two support rods (228) is fixedly mounted with a piston plate (223). The piston plate (223) is slidably mounted inside the air box (221); Air tube one (225) and air tube two (226) are fixedly installed on the inner side of the two support rods (228). The first air tube (225) passes through the piston plate (223) and is connected to the space above the piston plate (223); One of the support rods (228) has an air groove (227) on its side wall, and the air groove (227) is connected to the space below the piston plate (223).

5. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 4, characterized in that: The side walls of the upper clamping plate (31) and the lower clamping plate (32) are provided with air holes (311), and the air pipe (225) is slidably installed inside the air hole (311). The inner sides of the upper clamping plate (31) and the lower clamping plate (32) are provided with annular grooves (313) and air chambers (314). The annular groove (313) is connected to the air chamber (314), and a branch hole (316) is provided between the air hole (311) and the air chamber (314). A clamping ring (315) is slidably installed on the inner side of the annular groove (313) on the inner side of the upper clamping plate (31). A second clamping ring (325) is slidably installed on the inner side of the annular groove (313) on the inner side of the lower clamping plate (32). Both the first clamping ring (315) and the second clamping ring (325) are provided with a third spring (327) between them and the inner side of the corresponding annular groove (313).

6. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 4, characterized in that: A fixing plate (322) is fixedly installed on the inner side of the lower clamping plate (32), and a support cylinder (321) is fixedly installed on the inner side of the fixing plate (322). The pressure ring (217) is placed above the support cylinder (321), the first diaphragm (216) is placed above the fixed plate (322), and the pressure ring (217) is located below the first diaphragm (216). A number of circumferentially distributed air grooves (323) are provided between the fixed plate (322) and the support cylinder (321), and the air grooves (323) are located on the outside of the pressure ring (217).

7. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 6, characterized in that: The turntable (33) is rotatably mounted on the side wall of the fixed plate (322), and the side wall of the fixed plate (322) is provided with an air ring (324). The sidewall of the turntable (33) is integrally formed with several evenly distributed inclined plates (331), and the inclined plates (331) are located inside the air ring (324). A third air hole (326) is provided between the bottom of the air ring (324) and the second air groove (323). The side walls of the upper clamping plate (31) and the lower clamping plate (32) are provided with air holes two (312), and the air pipe two (226) is slidably installed inside the air holes two (312); A branch hole (317) is provided between the second air hole (312) and the side wall of the air ring (324).

8. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 1, characterized in that: The welding assembly includes a welding torch (121); A laser generator (12) is fixedly installed at the bottom of the work box (1), and the welding gun (121) is rotatably installed at the output end of the laser generator (12). The welding torch (121) penetrates the bottom of the work box (1) to the interior of the work box (1); A gear (122) is fixedly installed on the outside of the welding torch (121). The bottom of the work box (1) is fixedly installed with a driver (123), and the output end of the driver (123) is fixedly connected with a gear (124). The first gear (122) meshes with the second gear (124).

9. The welding and tensioning structure of the sensing diaphragm of the thin-film vacuum gauge for semiconductor manufacturing according to claim 1, characterized in that: A limiting ring (211) is fixedly installed on the top of the support base (21). A slide cylinder (214) is movably installed on the inner side of the pressure cylinder (24). A first limiting screw (212) and a second limiting screw (213) are provided between the top of the slide cylinder (214) and the limiting ring (211). A vacuum gauge cavity (215) is fixedly installed on the inner side of the slide (214), and the vacuum gauge cavity (215) is located above the diaphragm (216). The side wall of the limiting plate (23) is provided with a limiting hole (231). A limiting platform (11) is fixedly installed on the bottom of the inner side of the work box (1). A limiting post (232) is integrally formed on the top of the limiting platform (11). The limiting hole (231) is slidably inserted into the outside of the limiting post (232).

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