Vacuum evaporation apparatus and control method thereof
Patent Information
- Application Number
- CN202611237248.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-08-14
- Publication Date
- 2026-10-20
AI Technical Summary
齿轮咬合面、丝杠螺纹等密闭且连续的机械啮合空间,以及结构复杂、受力分散的多向万向铰接件内部,极易大量沉积膜材而引发干摩擦和机械卡滞,导致传动失效
[0040]1.连接板一端与滚轮转动连接,另一端与安装座铰接,使承载盘可绕铰接点改变相对蒸发源的倾斜角度,进而通过调整蒸镀入射角来适应不同曲率的基底,改善边缘膜厚不均的问题;同时,承载盘的姿态维持与动力传递依靠连接板的简单铰接以及滚轮与轨道的滚动配合来实现;该结构配合面少且无复杂机械啮合间隙,减少了气态膜材在运动部件间隙中的沉积残留,防止设备在真空蒸镀时发生卡滞,承载盘通过滚轮直接支撑于固定的环形轨道上,其自重及转动产生的偏心力直接向下传递至轨道进行卸力;此种底部支撑结构改变了原有的侧方悬臂受力状态,增强了承载机构的整体支撑刚性,抑制了运行过程中的机械颤振。
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Abstract
Description
Technical Field
[0001] This application relates to the field of vacuum coating technology, specifically to a vacuum evaporation equipment and its control method. Background Technology
[0002] When vacuum evaporation equipment prepares thin films on a substrate surface, the traditional support plate is usually in a fixed horizontal position. This results in a small relative incident angle of vapor molecules at the edge region when facing substrates with complex curvature, which easily leads to blind spots such as insufficient film thickness and uneven coverage.
[0003] To address this issue, several tilt-adjustable load-bearing mechanisms have emerged in the prior art. Common deflection methods for these mechanisms include: utilizing spatial multi-directional / universal movable hinges to achieve deflection of the central transmission hub; employing gear transmission sets such as worm gears or bevel gears to drive the disk to rotate; or adding a continuous multi-tooth meshing structure such as a lead screw on the side to push and pull to change the base tilt angle.
[0004] However, in actual high-vacuum, high-temperature evaporation environments, this type of structure has significant limitations: First, the evaporation environment is extremely lacking in lubrication and contains a large amount of gaseous film material. The closed and continuous mechanical meshing spaces such as gear meshing surfaces and lead screw threads, as well as the complex structures and dispersed forces within multi-directional universal joints, are prone to large-scale film deposition, leading to dry friction and mechanical jamming, resulting in transmission failure. Second, this type of structure relies excessively on local node forces or lateral single-point support, and the operating framework is often cantilevered. When the equipment undergoes high-speed combined revolution and rotation, the overall rigidity is insufficient, making it susceptible to chattering due to eccentric torque, which in turn deteriorates the density and adhesion quality of the microscopic film. Summary of the Invention
[0005] In order to solve the technical problems in the prior art, this application provides a vacuum evaporation equipment.
[0006] The vacuum evaporation equipment provided in this application adopts the following technical solution:
[0007] A vacuum evaporation deposition apparatus, comprising:
[0008] A vapor deposition mechanism includes a deposition chamber, a heating assembly, and an evaporation source, wherein the heating assembly and the evaporation source are housed within the deposition chamber; and
[0009] The support mechanism includes a drive assembly, a support assembly, and multiple angle adjustment assemblies. The drive assembly includes a rotating frame and a drive member for driving the rotating frame to rotate. The drive member is fixed to the coating cavity.
[0010] The bearing assembly includes an annular track, multiple rollers, and multiple bearing disks. The annular track is fixed inside the coating cavity, the rollers are in rolling cooperation with the annular track, and each bearing disk is coaxially fixed with the corresponding roller.
[0011] Multiple angle adjustment components are provided in a one-to-one correspondence with multiple rollers. Each angle adjustment component includes a mounting base and a connecting plate. One end of the connecting plate is rotatably connected to the roller, and the other end is hinged to the mounting base. The mounting base is installed on the rotating frame.
[0012] By adopting the above technical solution, one end of the connecting plate is rotatably connected to the roller, and the other end is hinged to the mounting base, allowing the bearing plate to change its tilt angle relative to the evaporation source around the hinge point. This allows for adjustment of the evaporation incident angle to adapt to substrates with different curvatures, improving the problem of uneven film thickness at the edges. Simultaneously, the bearing plate's posture maintenance and power transmission rely on the simple hinge of the connecting plate and the rolling cooperation between the roller and the track. This structure has few mating surfaces and no complex mechanical meshing gaps, reducing the deposition residue of gaseous film material in the gaps between moving parts and preventing the equipment from jamming during vacuum evaporation. The bearing plate is directly supported on a fixed circular track by the roller, and its own weight and the eccentric force generated by rotation are directly transmitted downwards to the track for stress relief. This bottom support structure changes the original side cantilever stress state, enhances the overall support rigidity of the bearing mechanism, and suppresses mechanical chatter during operation.
[0013] Preferably, the drive assembly further includes an adjustment frame, which includes a connecting frame body and a plurality of telescopic rods fixed to the connecting frame body, wherein one end of the telescopic rods facing away from the connecting frame body is fixed to the rotating frame.
[0014] By adopting the above technical solution, the connecting frame is fixedly connected to the rotating frame via a telescopic rod. During the angle adjustment stage, the telescopic rod changes the axial relative position between the connecting frame and the rotating frame through its telescopic movement. This compensates for the change in the assembly spacing between the rotating frame and the annular track caused by the hinge deflection when changing the tilt angle of the connecting plate and the bearing plate. It also avoids the problem of components being jammed due to the fixed distance between the upper and lower ends of the mechanism when adjusting the incident angle of the base, or the rollers not being able to accurately fit the annular track after adjustment.
[0015] Preferably, the rotating frame has multiple mounting slots, each mounting slot extending radially along the rotating frame. Each angle adjustment component further includes a first fastener, and the bottom surface of each mounting base has a first threaded hole. The first fastener passes through the mounting slot and engages with the first threaded hole.
[0016] By adopting the above technical solution, the first fastener passes through the radial mounting groove on the rotating frame and engages with the first threaded hole at the bottom of the mounting base; this allows the operator to slide the mounting base radially and lock it in place, changing the radius of the rotation trajectory of the bearing plate, and avoiding deviation of the coaxial rotation trajectory caused by radial sliding of the mounting base due to centrifugal force during equipment operation.
[0017] Preferably, the side wall of the mounting base is provided with an arc-shaped groove centered at the hinge point with the connecting plate, and each angle adjustment component further includes a second fastener. The side of the connecting plate is provided with a second threaded hole that engages with the thread of the second fastener; the second fastener passes through the arc-shaped groove and is screwed into the second threaded hole.
[0018] By adopting the above technical solution, the second fastener passes through the arc groove on the side wall of the mounting base and is screwed into the second threaded hole of the connecting plate to generate a locking force; the connecting plate and the bearing plate, after being adjusted, are fixed at a specific tilt angle relative to the mounting base, so that the roller and the bearing plate can maintain a stable angle when rotating.
[0019] Preferably, the heating assembly includes a plurality of heating lamps, which are arranged in a circumferential array along the rotation direction of the rotating frame, with each heating lamp facing the side of the support plate away from the roller.
[0020] By adopting the above technical solution, the heating lamps arranged in a circular array provide heat radiation to the side of the bearing plate away from the roller; in conjunction with the rotation of the rotating frame, each bearing plate that moves with the rotating frame can continuously receive uniform heat from the back, avoiding excessive temperature gradient and increased internal stress in the substrate caused by local heat sources.
[0021] Preferably, the rotating frame has multiple sliding grooves, each of which extends radially along the rotating frame. The mounting base is slidably connected to the sliding grooves. The top surface of the annular track is undulating and has multiple protrusions spaced apart along its circumference. The number of protrusions is equal to the number of rollers, and both the protrusions and the rollers are evenly distributed along the circumference of the annular track.
[0022] By adopting the above technical solution, the rotating frame drives the mounting base to slide in the groove, and the roller passively generates undulating displacement when it rolls on the annular track with protrusions; relying on the hinge structure, this undulating displacement is converted into the continuous periodic up and down swing of the bearing plate, so that the substrate faces the evaporation source at a continuously changing angle, reducing the evaporation dead angle during three-dimensional surface processing and improving the film layer step coverage of complex three-dimensional structure substrates.
[0023] Preferably, each of the angle adjustment components further includes multiple reset seats, each of the multiple reset seats being configured in a one-to-one correspondence with a multiple of the rollers. Each reset seat includes a seat body and an elastic element. The reset seat is fixed to the rotating frame, one end of the elastic element is fixed to the rotating frame, and the other end is fixed to the mounting base. The elastic element extends along the length direction of the slide groove.
[0024] By adopting the above technical solution, the elastic element applies a continuous tension and compression feedback force to the mounting seat that slides inside along the length of the slide groove; so that the roller rolling along the circular track always obtains a pressure that keeps it close to the track surface when it encounters a protrusion and causes undulation, thus avoiding the roller from jumping off the track due to inertia and hard contact impact caused by the high rotation speed of the rotating frame.
[0025] Preferably, the reset seat further includes a telescopic component and a pressure sensor. The telescopic component is disposed on the seat body, and the two ends of the pressure sensor abut against the telescopic end of the telescopic component and the elastic component, respectively. The vapor deposition mechanism further includes a power regulator electrically connected to the evaporation source. The vacuum vapor deposition equipment further includes a control unit located outside the deposition cavity. The pressure sensor, the telescopic component, and the power regulator are all electrically connected to the control unit.
[0026] By adopting the above technical solution, the pressure sensing element is clamped between the telescopic end of the telescopic element and the elastic element, which can obtain the compressive deformation force of the elastic element in real time and transmit it to the control unit. This establishes a hardware foundation for sensing the force state of mechanical motion and controlling the heating power of the evaporation source, thus avoiding the defect of the pure mechanical motion mechanism in the evaporation cavity lacking feedback of operating parameters to the outside.
[0027] A control method for a vacuum evaporation deposition equipment, comprising the following steps:
[0028] S1. The control unit performs clamping force compensation control based on the pressure value collected by the pressure sensor, so as to control the telescopic member to apply clamping force to the elastic member;
[0029] S2. The control unit calls the pre-established mapping relationship between pressure value and vertical distance to convert the real-time collected pressure value into the vertical distance from the support plate to the evaporation source;
[0030] S3. The control unit determines the target evaporation power based on the calculated vertical distance from the support plate to the evaporation source, wherein the target evaporation power increases as the distance increases and decreases as the distance decreases;
[0031] S4. The control unit controls the power regulator to adjust the evaporation power of the evaporation source to the target evaporation power.
[0032] By adopting the above technical solution, the control unit uses a pre-established mapping relationship to convert the real-time pressure value into the real-time spatial distance of the carrier plate, and executes the operation logic of increasing power when the distance increases and decreasing power when the distance decreases; it compensates in real time for the influence of spatial distance changes caused by the undulation and swing of the carrier plate on the density of the vaporized material received on the substrate surface, avoids the local film thickness difference caused by the undulation distance change, and maintains the stability of the overall deposition rate during dynamic movement.
[0033] Preferably, in step S1, the clamping force compensation control specifically includes:
[0034] S11. The control unit acquires a preset safety threshold for the clamping force;
[0035] S12. The control unit uses the minimum value of the pressure value within a single rotation cycle of the rotating frame as a comparison value, and compares the comparison value with the safety threshold.
[0036] S13. When the comparison value is lower than the safety threshold, the control unit controls the telescopic member to extend towards the elastic member to increase the clamping force until the comparison value reaches the safety threshold;
[0037] S14. When the comparison value reaches the safety threshold, the control unit controls the telescopic component to maintain its current state.
[0038] By adopting the above technical solution, the control unit extracts the minimum pressure value within the rotation cycle. When the comparison value representing the most relaxed state of the elastic element is lower than the safety threshold, the telescopic element is driven to extend outward to actively compensate for the clamping force. This realizes automatic intervention on the elastic decay of the underlying mechanical structure of the equipment, avoiding failure of the elastic element due to long-term high temperature and high-frequency fatigue deformation of the cavity, thereby preventing the risk of mechanical jamming caused by insufficient elastic force leading to the roller leaving the circular track during normal speed operation.
[0039] In summary, this application includes at least one of the following beneficial technical effects:
[0040] 1. One end of the connecting plate is rotatably connected to the roller, and the other end is hinged to the mounting base, allowing the carrier plate to change its tilt angle relative to the evaporation source around the hinge point. This allows for adjustment of the evaporation incident angle to adapt to substrates with different curvatures, improving the problem of uneven film thickness at the edges. Simultaneously, the carrier plate's posture maintenance and power transmission rely on the simple hinge of the connecting plate and the rolling cooperation between the roller and the track. This structure has few mating surfaces and no complex mechanical meshing gaps, reducing the deposition residue of gaseous film material in the gaps between moving parts and preventing the equipment from jamming during vacuum evaporation. The carrier plate is directly supported on a fixed circular track by the roller, and its own weight and the eccentric force generated by rotation are directly transmitted downwards to the track for stress relief. This bottom support structure changes the original lateral cantilever stress state, enhances the overall support rigidity of the carrier mechanism, and suppresses mechanical chatter during operation.
[0041] 2. The rotating frame drives the mounting base to slide in the groove. When the roller rolls on the annular track with protrusions, it passively generates undulating displacement. The hinge structure converts this undulating displacement into the continuous periodic up-and-down swing of the bearing plate, so that the substrate faces the evaporation source at a continuously changing angle, reducing the dead angle of evaporation during three-dimensional surface processing and improving the step coverage of the film layer on the complex three-dimensional structure substrate.
[0042] 3. The control unit calculates the real-time spatial distance of the carrier plate based on the pressure value and executes the operation logic of increasing power when the distance increases and decreasing power when the distance decreases. It compensates in real time for the impact of spatial distance changes caused by the undulation and sway of the carrier plate on the density of the vaporized material received on the substrate surface, avoids local film thickness differences caused by undulation distance changes, and maintains the stability of the overall deposition rate during dynamic movement.
[0043] 4. The control unit extracts the minimum pressure value within the rotation cycle. When the comparison value representing the most relaxed state of the elastic element is lower than the safety threshold, the telescopic component is driven to extend outward to actively compensate for the clamping force. This realizes automatic intervention on the elastic decay of the underlying mechanical structure of the equipment, avoiding failure of the elastic element due to long-term high temperature and high frequency fatigue deformation in the cavity, thereby preventing the risk of mechanical jamming caused by insufficient elastic force leading to the roller leaving the circular track during normal speed operation. Attached Figure Description
[0044] Figure 1 This is a schematic diagram of the vacuum evaporation equipment provided in Embodiment 1 of this application;
[0045] Figure 2 This is a schematic diagram of the structure of the load-bearing mechanism in Embodiment 1 of this application;
[0046] Figure 3 yes Figure 2 Enlarged view of region A in the middle;
[0047] Figure 4 yes Figure 2 Enlarged view of region B in the middle;
[0048] Figure 5 This is a schematic diagram of the vacuum evaporation equipment provided in Embodiment 2 of this application;
[0049] Figure 6 yes Figure 5 Enlarged view of region C in the middle;
[0050] Figure 7 This is a partial cross-sectional view of the load-bearing mechanism in an embodiment of this application.
[0051] Explanation of reference numerals in the attached drawings: 1. Evaporation mechanism; 11. Coating chamber; 12. Heating assembly; 121. Heating lamp; 13. Evaporation source; 14. Power regulator; 2. Supporting mechanism; 21. Drive assembly; 211. Rotating frame; 2111. Mounting groove; 2112. Slide groove; 212. Drive component; 213. Adjusting frame; 2131. Connecting frame; 2132. Telescopic rod; 22. Supporting assembly; 221. Circular track; 2211 222. Protrusion; 223. Roller; 224. Bearing plate; 235. Angle adjustment assembly; 236. Mounting base; 237. First threaded hole; 238. Arc groove; 239. Connecting plate; 230. Second threaded hole; 231. First fastener; 232. Second fastener; 233. Reset base; 2351. Base body; 2352. Elastic element; 2353. Telescopic element; 2354. Pressure sensing element; 3. Control unit. Detailed Implementation
[0052] The following is in conjunction with the appendix Figures 1-7 This application will be described in further detail.
[0053] Example 1
[0054] Please see Figure 1 The vacuum evaporation equipment provided in this application includes an evaporation mechanism 1 and a support mechanism 2. The evaporation mechanism 1 includes a coating chamber 11, a heating component 12, and an evaporation source 13, which are housed within the coating chamber 11. The support mechanism 2 includes a driving component 21, a support component 22, and multiple angle adjustment components 23. When the equipment is in operation, the coating chamber 11 is evacuated to a high vacuum. The two components work together to complete the vacuum evaporation process. By adjusting the angle of the support plate 223 through the support mechanism 2, vapor molecules can adhere to the substrate, thus solving the problem of uneven film thickness on complex substrates.
[0055] Specifically, the vapor deposition mechanism 1 includes a heating component 12 and an evaporation source 13. The heating component 12 includes multiple heating lamps 121, which are halogen lamps or infrared heating lamps. The multiple heating lamps 121 are arranged in a circumferential array along the rotation direction of the rotating frame 211. This circumferential array structure allows the heat radiation emitted by each heating lamp 121 to cover the carrier plate 223. Each heating lamp 121 faces the side of the carrier plate 223 away from the roller 222. With this arrangement, in conjunction with the rotation of the rotating frame 211, each carrier plate 223 rotating with the rotating frame 211 can continuously receive uniform heat from the back. In practical applications, this avoids excessive temperature gradients and increased internal stress on the substrate caused by localized heat sources, ensuring the stability of the substrate temperature during the coating process.
[0056] The evaporation source 13 uses a structure consisting of a crucible and a heating element. The heating element employs either resistance wire heating or electron beam heating. Resistance wire heating is less expensive and easier to control, while electron beam heating provides higher energy density and is suitable for the evaporation of high-melting-point materials. The heating element heats the coating material inside the crucible to vaporize it. The vaporized film vapor then flies towards the substrate on the support plate 223 and deposits as a film.
[0057] Please see Figure 2 Specifically, the drive assembly 21 includes a rotating frame 211, a drive component 212 for driving the rotating frame 211 to rotate, and an adjusting frame 213. The drive component 212 is fixed in the coating chamber 11 and is a motor. The output shaft of the motor is connected to the rotating frame 211 through a coupling to realize the transmission of power. The adjusting frame 213 includes a connecting frame body 2131 and multiple telescopic rods 2132 fixed to the connecting frame body 2131. The telescopic rods 2132 are electric telescopic rods or hydraulic telescopic rods. The end of the telescopic rod 2132 facing away from the connecting frame body 2131 is fixed to the rotating frame 211. The connecting frame 2131 is fixedly connected to the rotating frame 211 via the telescopic rod 2132. During the angle adjustment stage, the telescopic rod 2132 changes the axial relative position between the connecting frame 2131 and the rotating frame 211 through its telescopic movement. This compensates for the change in the assembly spacing between the rotating frame 211 and the annular track 221 caused by the hinge deflection when the tilt angle of the connecting plate 232 and the bearing plate 223 is changed. This avoids the problem of the components being jammed due to the fixed distance between the upper and lower ends of the mechanism when adjusting the incident angle of the base, or the roller 222 failing to accurately fit the annular track 221 after adjustment.
[0058] The rotating frame 211 has multiple mounting slots 2111, each extending radially along the rotating frame 211. The mounting slots 2111 are used to mount the angle adjustment assembly 23. The support assembly 22 includes an annular track 221, multiple rollers 222, and multiple support discs 223. The annular track 221 is fixed within the coating cavity 11 and supports and guides the movement of the rollers 222. The rollers 222 cooperate with the annular track 221, rolling on it. The contact between them uses rolling friction, which reduces energy loss and wear. Each support disc 223 is coaxially fixed to its corresponding roller 222; when the roller 222 rotates, it drives the support disc 223 to rotate as well.
[0059] Please see Figure 3-4 Multiple angle adjustment components 23 are correspondingly arranged with multiple rollers 222. Each angle adjustment component 23 includes a mounting base 231, a connecting plate 232, a first fastener 233, and a second fastener 234. One end of the connecting plate 232 is rotatably connected to the roller 222, and the other end is hinged to the mounting base 231. The mounting base 231 is mounted on the rotating frame 211, so that the bearing plate 223 can change its tilt angle relative to the evaporation source 13 around the hinge point while rotating with the roller 222 to meet process requirements. The first fastener 233 and the second fastener 234 are hexagon socket head cap screws with anti-loosening washers. The bottom surface of the mounting base 231 has a first threaded hole 2311. The first fastener 233 passes through the radial mounting groove 2111 on the rotating frame 211 and engages with the first threaded hole 2311. The operator can use the clamping force of the bolt head on the edge of the mounting groove 2111 to slide the mounting base 231 radially and lock it in place, thereby changing the radius of the rotation trajectory of the bearing plate 223 and avoiding the deviation of the coaxial rotation trajectory caused by the radial sliding of the mounting base 231 due to centrifugal force during equipment operation. The side wall of the mounting base 231 has an arc-shaped groove 2312 centered at the hinge point with the connecting plate 232. The side of the connecting plate 232 has a second threaded hole 2321 that engages with the second fastener 234. The second fastener 234 passes through the arc-shaped groove 2312 and is screwed into the second threaded hole 2321. The axial preload generated by tightening the hexagon socket bolts fixes the adjusted connecting plate 232 and the bearing plate 223 at a specific tilt angle relative to the mounting base 231, so that the roller 222 and the bearing plate 223 can maintain an angle stability when they rotate.
[0060] The implementation principle of this embodiment is as follows: When the equipment is working, the motor of the drive component 212 drives the rotating frame 211 to rotate via the coupling. The rotating frame 211 drives the angle adjustment components 23, rollers 222 and bearing disk 223 installed on it to revolve around the center of the coating cavity 11. Each roller 222 rolls along the circular track 221, and the bearing disk 223 rotates synchronously with the rollers 222, so that the substrate evenly passes over the evaporation source 13 under the combined motion of revolution and rotation. The tilt angle of the bearing plate 223 is determined by the angle adjustment component 23: one end of the connecting plate 232 is rotatably connected to the roller 222, and the other end is hinged to the mounting base 231. When the operator loosens the second fastener 234, the connecting plate 232 can rotate around the hinge point, and the second fastener 234 slides in the arc groove 2312. After rotating to the target angle, the second fastener 234 is tightened, and its axial preload is used to press the connecting plate 232 firmly onto the mounting base 231, so that the bearing plate 223 is fixed at the angle of attack.
[0061] The revolution radius of the bearing plate 223 is determined by the radial position of the mounting seat 231 within the mounting groove 2111: after loosening the first fastener 233, the mounting seat 231 can slide along the radial mounting groove 2111. After sliding to the target radius, the first fastener 233 is tightened, and the mounting seat 231 is locked by the clamping force of the bolt head on the groove edge. When the angle changes, causing the lower hinge point of the connecting plate 232 to shift vertically, and thus causing the axial distance between the rotating frame 211 and the annular track 221 to change, the telescopic rod 2132 of the adjusting frame 213 compensates by changing the axial relative position of the connecting frame 2131 and the rotating frame 211 through its own telescopic movement, so that the roller 222 can still fit the track at the new angle. The heating lamps 121 of the heating assembly 12 are arranged in a circumferential array facing the side of the bearing plate 223 away from the roller 222. As the bearing plate 223 rotates through each lamp position, it sequentially heats the back of the lamp. The heat radiation is superimposed along the revolution trajectory, so that the substrate is continuously and uniformly heated throughout the entire rotation cycle. Thus, the equipment completes rotary vapor deposition with a statically set tilt angle and radius.
[0062] Example 2
[0063] Please see Figure 5 The difference between this embodiment and embodiment 1 is that, while retaining the basic working mechanism, the shape of the track and the connection method have been improved to achieve dynamic follow-up adjustment.
[0064] Please see Figure 6-7Specifically, the rotating frame 211 has multiple sliding grooves 2112, each extending radially along the rotating frame 211. The mounting base 231 is slidably connected to the sliding grooves 2112, allowing the mounting base 231 to slide in the radial direction. The top surface of the annular track 221 is undulating, and multiple protrusions 2211 are spaced apart along its circumference. The number of protrusions 2211 is equal to the number of rollers 222, and both the protrusions 2211 and the rollers 222 are evenly distributed along the circumference of the annular track 221. During equipment operation, the rotating frame 211 drives the mounting base 231 to rotate, and the roller 222 rolls on the annular track 221 with the protrusion 2211. When the roller 222 passes the protrusion 2211, the roller 222 passively generates undulating displacement. Relying on the structure of the connecting plate 232 rotating at one end and hinged at the other end, this undulating displacement is transformed into the continuous periodic up and down swing of the bearing plate 223 under the cooperation of the mounting base 231 sliding along the slide groove 2112. This causes the substrate to face the evaporation source 13 at a continuously changing angle, reducing the dead angle of evaporation during three-dimensional surface processing and improving the step coverage of the film layer on the complex three-dimensional structure substrate.
[0065] The angle adjustment assembly 23 also includes multiple reset seats 235, each corresponding to a multiple rollers 222. Each reset seat 235 includes a seat body 2351, an elastic element 2352, a telescopic element 2353, and a pressure sensor 2354. The reset seat 235 is fixed to the rotating frame 211. One end of the elastic element 2352 is fixed to the rotating frame 211, and the other end is fixed to the mounting base 231. The elastic element 2352 extends along the length of the slide groove 2112 and is a spring with elastic recovery capability. The elastic element 2352 applies a continuous tension and compression feedback force to the mounting base 231 sliding inside the slide groove 2112 along the length of the slide groove 2112. This ensures that the rollers 222 rolling along the annular track 221 always maintain a pressure against the track surface when encountering protrusions 2211, preventing the rollers 222 from jumping off the track due to inertia and hard contact impacts caused by the high rotation speed of the rotating frame 211.
[0066] In this application, the telescopic component 2353 and the pressure sensor 2354 are both arranged on the heat source-averse side of the support plate 223 (i.e., the side away from the evaporation source 13), and a metal heat insulation cover is provided around the base 2351. The surface of the heat insulation cover facing the evaporation source 13 is coated with an infrared reflective coating to block and reflect the direct heat radiation conducted from the evaporation source 13. Secondly, in terms of structural heat conduction interruption, alumina ceramic heat insulation pads are provided at the mounting interface between the telescopic component 2353 and the base 2351, and at the contact point between the pressure sensor 2354 and the elastic component 2352. Because the thermal conductivity of the ceramic material is extremely low, the path of heat conduction from the heated metal mechanical parts to the interior of the electrical components is cut off.
[0067] The telescopic component 2353 is a vacuum electric actuator fixed to the base 2351. The telescopic end of the telescopic component 2353 faces the pressure sensor 2354 and is used to extend or retract according to a control signal to adjust the clamping force on the elastic component 2352. To adapt to the high-temperature vacuum environment inside the coating chamber 11, the telescopic component 2353 is a high-temperature resistant vacuum electric actuator with a lead screw self-locking function. Its internal motor has a stator coil wound with high-temperature resistant polyimide enameled wire, and the rotor uses a high-temperature demagnetizing samarium cobalt permanent magnet. It also employs a solid self-lubricating agent for vacuum environments. The two ends of the pressure sensor 2354 abut against the actuator of the telescopic component 2353 and the elastic component 2352, respectively. The pressure sensor 2354 is a metal foil strain gauge or ceramic piezoresistive high-temperature vacuum pressure sensor that converts the sensed pressure signal into an electrical signal output.
[0068] The aforementioned vapor deposition mechanism 1 also includes a power regulator 14 electrically connected to the evaporation source 13. The power regulator 14 is a silicon controlled rectifier used to regulate the evaporation power of the evaporation source 13. The vacuum evaporation equipment also includes a control unit 3 located outside the coating chamber 11. Since the rotating frame 211 is in a continuous rotating state inside the coating chamber 11, the drive assembly 21 also includes a vacuum conductive slip ring sleeved at the rotation center of the rotating frame 211. The power supply harness of the telescopic component 2353 and the signal communication harness of the pressure sensor 2354 are laid along the rotating frame 211 and connected to the rotor end of the vacuum conductive slip ring. The power supply harness and the signal communication harness are both made of polytetrafluoroethylene high-temperature resistant wire with an outer glass fiber braided layer. The stator end of the vacuum conductive slip ring is led out of the chamber through a vacuum-sealed connection terminal pre-embedded in the wall of the coating chamber 11, so that the pressure sensor 2354 and the telescopic component 2353 can establish a stable electrical signal transmission path with the external control unit 3. The pressure sensor 2354 obtains the compressive deformation force of the elastic component 2352 in real time and transmits it to the control unit 3.
[0069] The implementation principle of this embodiment is as follows: When the equipment is working, the rotating frame 211 drives the mounting base 231 and the roller 222 to revolve, and the roller 222 rolls along the undulating annular track 221. Since the track is provided with multiple protrusions 2211 at intervals along its circumference, the roller 222 is lifted once along the normal direction of the track every time it rolls over a protrusion 2211, and then falls back, generating periodic undulating displacement.
[0070] The lower end of the connecting plate 232 is rotatably connected to the roller 222, and the upper end is hinged to the mounting base 231. When the roller 222 is lifted, the connecting plate 232 swings around the hinge point, which on the one hand pushes the mounting base 231 to slide radially along the slide groove 2112, and on the other hand drives the bearing plate 223, which is coaxial with the roller 222, to swing around the hinge point, so that the angle of attack of the bearing plate 223 changes periodically and continuously with the undulation of the roller 222, and the base faces the evaporation source 13 with a constantly changing incident angle. To ensure that the roller 222 remains pressed against the track and does not jump off during revolution and undulation, one end of the elastic element 2352 is fixed to the rotating frame 211, and the other end is connected to the mounting base 231 and arranged along the direction of the slide groove 2112. When the roller 222 is lifted, the mounting base 231 moves inward and the elastic element 2352 is compressed and stores energy. When the roller 222 falls back, the elastic element 2352 releases its elastic force and pushes the mounting base 231 outward, so that the roller 222 always receives a pressure against the track and fits against the track.
[0071] The push rod of the telescopic component 2353 abuts against one end of the elastic component 2352. The pressure sensor 2354 is sandwiched between the telescopic component 2353 and the elastic component 2352. The deformation force of the elastic component 2352 caused by the undulation of the roller 222 is converted into an electrical signal by the pressure sensor 2354. This signal is then transmitted to the vacuum conductive slip ring that rotates with the frame via a high-temperature resistant cable laid along the rotating frame 211. The signal is then led out of the cavity through the stator end of the slip ring and the vacuum sealing terminal and sent to the control unit 3. At the same time, the command from the control unit 3 is transmitted back to the telescopic component 2353 via the slip ring, driving the push rod to extend or retract to change the preload on the elastic component 2352. During this process, the infrared reflective coating on the side of the heat shield facing the evaporation source 13 blocks the radiant heat from the evaporation source 13. The ceramic heat insulation pad cuts off the heat conduction path from the metal mechanical parts to the electrical parts, keeping the telescopic component 2353 and the pressure sensor 2354 in a vacuum, non-convection environment at a working temperature. This allows for a stable output of force signals and execution of actions while the bearing plate 223 continues to oscillate.
[0072] Example 3
[0073] S1. The control unit 3 performs clamping force compensation control based on the pressure value collected by the pressure sensor 2354, so as to control the telescopic member 2353 to apply clamping force to the elastic member 2352. The clamping force compensation control specifically includes:
[0074] S11. Control unit 3 obtains a preset safety threshold for the clamping force. The safety threshold is preset according to the design of the equipment and the actual operating conditions, and represents the minimum clamping force required for the elastic element 2352 to work normally.
[0075] S12. The control unit 3 uses the minimum pressure value within a single rotation cycle of the rotating frame 211 as the comparison value, and compares the comparison value with the safety threshold.
[0076] S13. When the comparison value is lower than the safety threshold, the control unit 3 controls the push rod motor of the telescopic member 2353 to rotate forward, driving the push rod to extend towards the elastic member 2352 to increase the clamping force until the comparison value reaches the safety threshold.
[0077] S14. When the comparison value reaches the safety threshold, the control unit 3 controls the push rod motor of the telescopic component 2353 to stop rotating, and relies on the self-locking of the lead screw nut to maintain the current state of the push rod.
[0078] The above control method realizes automatic intervention on the elastic decay of the underlying mechanical structure of the equipment, avoiding failure of the elastic component 2352 due to long-term high temperature and high frequency fatigue deformation of the cavity, thereby preventing the risk of mechanical jamming caused by insufficient elastic force leading to the roller 222 leaving the circular track 221 during normal speed operation.
[0079] S2. Control unit 3 determines the vertical distance from the bearing plate 223 to the evaporation source 13 based on the real-time collected pressure value (and by subtracting it from the minimum pressure value within a single cycle to obtain the relative fluctuation pressure difference unaffected by the reference pre-pressure). Since there is a clear mechanical transmission relationship between the relative fluctuation pressure difference and the distance value, the determination is based on the following:
[0080] First, the elastic element 2352 satisfies Hooke's Law, which states that the relative fluctuation pressure difference F is directly proportional to the compression deformation x of the spring (F = k·x, where k is the stiffness coefficient of the spring, which is a known fixed value). Therefore, after the control unit 3 extracts the above-mentioned relative fluctuation pressure difference F, it can back-calculate the radial deformation x of the mounting base 231 compressed along the slide groove 2112.
[0081] Secondly, the radial deformation x of the mounting base 231 directly corresponds to the undulation height of the roller 222 being lifted by the protrusion 2211 on the annular track 221, that is, the current position of the roller 222 at the crest or trough. The undulation position of the roller 222 relative to the mounting base 231 corresponds to the tilt angle θ of the bearing plate 223 deflected around the hinge point through the lever hinge structure of the connecting plate 232. The sinusoidal geometric relationship of this angle θ directly determines the vertical distance H from the substrate on the surface of the bearing plate 223 to the evaporation source 13.
[0082] Based on the above continuous transmission logic, the control unit 3 has a pre-stored mapping table of relative fluctuation pressure difference F and distance H: during the equipment assembly and debugging stage, the equipment is run at the actual working speed, and the relative fluctuation pressure difference F fed back by the pressure sensor 2354 and the actual distance H from the bearing plate 223 to the evaporation source 13 measured by the distance measuring tool are recorded at the same time, so as to calibrate and generate a one-to-one corresponding data mapping table.
[0083] S3. The control unit 3 determines the target evaporation power based on the determined vertical distance from the carrier plate 223 to the evaporation source 13. The target evaporation power increases with increasing distance and decreases with decreasing distance. The greater the distance, the more vapor molecules are lost during transport, resulting in less vapor reaching the substrate surface. This is addressed by increasing the evaporation power to ensure sufficient vapor quantity. Conversely, the smaller the distance, the less vapor molecules are lost, thus reducing the evaporation power.
[0084] S4. Control unit 3 controls power regulator 14 to adjust the evaporation power of evaporation source 13 to the target evaporation power. Through the above adjustment, the influence of spatial distance changes caused by the undulation and sway of the support plate 223 on the density of the vaporized material received on the substrate surface is compensated in real time, avoiding local film thickness differences caused by undulation distance changes, and maintaining the stability of the overall deposition rate during dynamic movement.
[0085] The implementation principle of this embodiment is as follows: During equipment operation, the control unit 3 continuously receives the force signal of the elastic element 2352 transmitted back by the pressure sensor 2354 through the vacuum conductive slip ring. The control unit 3 takes the minimum pressure value within a single rotation cycle of the rotating frame 211 as the comparison value—this minimum value corresponds to the resistance force when the roller 222 falls to the trough and the elastic element 2352 is fully released, which best reflects whether the elastic element 2352 has deteriorated due to high temperature and high frequency fatigue; it is compared with a preset safety threshold. If it is lower than the threshold, it indicates that the elastic element 2352 is not providing enough force and the roller 222 is at risk of derailment. The control unit 3 then causes the push rod of the telescopic element 2353 to extend towards the elastic element 2352, increasing the preload to make up for the comparison value back to the threshold. After reaching the threshold, it stops and the push rod maintains its length, thereby automatically compensating for the resistance force when the performance of the elastic element 2352 deteriorates.
[0086] Since the real-time pressure value during operation uniquely corresponds to the undulation height of the roller 222 on the circular track 221, and is mapped to the tilt angle of the bearing plate 223 and its vertical distance to the evaporation source 13 through the hinge structure of the connecting plate 232, the control unit 3 substitutes the real-time pressure value into the pressure-distance lookup table pre-calibrated during the commissioning phase, finds the current distance between the bearing plate 223 and the evaporation source 13, and then determines the target evaporation power based on the corresponding relationship that the target evaporation power increases with the increase of the distance and decreases with the decrease of the distance, and controls the power regulator 14 to adjust the evaporation power of the evaporation source 13 to the target evaporation power.
[0087] In this way, the distance change caused by each undulation of the bearing disk 223 is synchronously calculated and compensated by power adjustment, so that the steam flux received by the substrate surface under different tilt angles and distances tends to be consistent, and the deposition rate is stabilized during dynamic oscillation.
[0088] The specific embodiments described above do not constitute a limitation on the scope of protection of this application. Any other corresponding changes and modifications made based on the technical concept of this application should be included within the scope of protection of this application.
Claims
1. A vacuum evaporation deposition apparatus, characterized in that, include: The vapor deposition mechanism (1) includes a coating chamber (11), a heating component (12) and an evaporation source (13), wherein the heating component (12) and the evaporation source (13) are housed in the coating chamber (11); as well as The support mechanism (2) includes a drive assembly (21), a support assembly (22) and multiple angle adjustment assemblies (23). The drive assembly (21) includes a rotating frame (211) and a drive member (212) for driving the rotating frame (211) to rotate. The drive member (212) is fixed in the coating cavity (11). The bearing assembly (22) includes an annular track (221), multiple rollers (222) and multiple bearing disks (223). The annular track (221) is fixed in the coating cavity (11). The rollers (222) are in rolling cooperation with the annular track (221). Each bearing disk (223) is coaxially fixed with the corresponding roller (222). Multiple angle adjustment components (23) are provided in a one-to-one correspondence with multiple rollers (222). Each angle adjustment component (23) includes a mounting base (231) and a connecting plate (232). One end of the connecting plate (232) is rotatably connected to the roller (222), and the other end is hinged to the mounting base (231). The mounting base (231) is mounted on the rotating frame (211).
2. The vacuum evaporation equipment according to claim 1, characterized in that, The drive assembly (21) further includes an adjustment frame (213), which includes a connecting frame (2131) and a plurality of telescopic rods (2132) fixed to the connecting frame (2131). One end of the telescopic rod (2132) away from the connecting frame (2131) is fixed to the rotating frame (211).
3. The vacuum evaporation equipment according to claim 2, characterized in that, The rotating frame (211) has multiple mounting slots (2111), each mounting slot (2111) extending radially along the rotating frame (211). Each angle adjustment component (23) also includes a first fastener (233). The bottom surface of each mounting base (231) has a first threaded hole (2311), and the first fastener (233) passes through the mounting slot (2111) and engages with the first threaded hole (2311).
4. The vacuum evaporation equipment according to claim 3, characterized in that, The mounting base (231) has an arc-shaped groove (2312) centered at the hinge point with the connecting plate (232) on its side wall. Each angle adjustment component (23) also includes a second fastener (234). The side of the connecting plate (232) has a second threaded hole (2321) that is threaded with the second fastener (234). The second fastener (234) passes through the arc-shaped groove (2312) and is screwed into the second threaded hole (2321).
5. The vacuum evaporation equipment according to claim 1, characterized in that, The heating assembly (12) includes a plurality of heating lamps (121), which are arranged in a circular array along the rotation direction of the rotating frame (211), and each heating lamp (121) faces the side of the support plate (223) away from the roller (222).
6. The vacuum evaporation equipment according to claim 1, characterized in that, The rotating frame (211) has multiple sliding grooves (2112), each of which extends radially along the rotating frame (211). The mounting base (231) is slidably connected to the sliding grooves (2112). The top surface of the annular track (221) is undulating, and multiple protrusions (2211) are spaced apart along its circumference. The number of protrusions (2211) is equal to the number of rollers (222), and both the protrusions (2211) and the rollers (222) are evenly distributed along the circumference of the annular track (221).
7. The vacuum evaporation equipment according to claim 6, characterized in that, Each of the angle adjustment components (23) further includes multiple reset seats (235), and the multiple reset seats (235) are arranged one-to-one with the multiple rollers (222). Each reset seat (235) includes a seat body (2351) and an elastic element (2352). The reset seat (235) is fixed to the rotating frame (211). One end of the elastic element (2352) is fixed to the rotating frame (211), and the other end is fixed to the mounting base (231). The elastic element (2352) extends along the length direction of the slide groove (2112).
8. The vacuum evaporation equipment according to claim 7, characterized in that, The reset seat (235) also includes a telescopic member (2353) and a pressure sensor (2354). The telescopic member (2353) is located on the seat body (2351). The two ends of the pressure sensor (2354) abut against the telescopic end of the telescopic member (2353) and the elastic member (2352), respectively. The vapor deposition mechanism (1) also includes a power regulator (14) electrically connected to the evaporation source (13). The vacuum vapor deposition equipment also includes a control unit (3) located outside the coating chamber (11). The pressure sensor (2354), the telescopic member (2353) and the power regulator (14) are all electrically connected to the control unit (3).
9. A control method for a vacuum evaporation deposition equipment, used to control the vacuum evaporation deposition equipment as described in claim 8, characterized in that, Includes the following steps: S1. The control unit (3) performs clamping force compensation control based on the pressure value collected by the pressure sensor (2354) to control the telescopic member (2353) to apply clamping force to the elastic member (2352); S2. The control unit (3) calls the pre-established mapping relationship between pressure value and vertical distance to convert the real-time collected pressure value into the vertical distance from the bearing plate (223) to the evaporation source (13); S3. The control unit (3) determines the target evaporation power based on the calculated distance from the carrier plate (223) to the evaporation source (13), wherein the target evaporation power increases as the distance increases and decreases as the distance decreases; S4. The control unit (3) controls the power regulator (14) to adjust the evaporation power of the evaporation source (13) to the target evaporation power.
10. The control method for the vacuum evaporation equipment according to claim 9, characterized in that, In step S1, the clamping force compensation control specifically includes: S11. The control unit (3) acquires the preset safety threshold of the clamping force; S12. The control unit (3) uses the minimum value of the pressure value in a single rotation cycle of the rotating frame (211) as the comparison value, and compares the comparison value with the safety threshold. S13. When the comparison value is lower than the safety threshold, the control unit (3) controls the telescopic member (2353) to extend towards the elastic member (2352) to increase the clamping force until the comparison value reaches the safety threshold; S14. When the comparison value reaches the safety threshold, the control unit (3) controls the telescopic member (2353) to maintain the current state.