A method and system for controlling coating of a glass article
Patent Information
- Application Number
- CN202611370113.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-09-04
- Publication Date
- 2026-10-20
AI Technical Summary
上述因素共同作用,使钢化处理前后玻璃基板的反射色度参数产生一定程度的漂移,对产品的外观一致性与交付质量产生影响
[0011]相较于现有技术,本发明的有益效果如下:(1)本发明通过构建关联函数,依据目标色坐标变化量计算并输出含氢气体流量比与沉积时长来调节反应气路流量和沉积时间,解决了膜层结构确定后工艺参数波动难以被定量响应的问题,实现了在固定膜层结构下对介质层工艺参数的动态调节,使含氢气体流量比和沉积时长对色度漂移的影响可被定量表征。
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Abstract
Description
Technical Field
[0001] This invention belongs to the field of glass coating technology and relates to a method and system for controlling the coating of glass products. Background Technology
[0002] With increasingly stringent requirements for building energy conservation, coated glass, especially low-emissivity coated glass with metallic functional coatings, is becoming increasingly widely used. In the pre-coating and post-tempering process, the high-temperature environment of tempering causes changes in the microstructure of the coating. Based on magnetron sputtering, during the high-temperature tempering process of temperable coated glass, hydrogen elements in the hydrogen-containing dielectric coating escape upon heating, leading to changes in the refractive index of the dielectric layer. Simultaneously, the metallic functional coating exhibits varying degrees of oxidation at high temperatures. These factors combined cause a shift in the reflectance chromaticity parameters of the glass substrate before and after tempering, affecting the product's appearance consistency and delivery quality.
[0003] To address the issue of color changes before and after tempering, current practices mainly employ two types of measures: First, adding a color-correcting layer or optimizing the dielectric layer thickness during the film system design phase to improve color stability after tempering. However, this approach has limited adaptability to process fluctuations after the film structure is fixed. Second, adjusting parameters such as sputtering power or gas flow rate based on experience during the coating production process, and approximating the target color value through multiple trial coatings and tempering tests. However, this method relies on manual experience, and the consistency of coating control between batches fluctuates. Furthermore, some methods remove defective products by performing colorimetric testing on the finished product after tempering. This method is a post-screening process and does not transmit the test information back to the coating process for parameter correction, thus having limited effect on improving the batch-to-batch control accuracy of the coating process. Summary of the Invention
[0004] In view of this, in order to solve the problems mentioned in the background art, a method and system for controlling the coating of glass products is proposed.
[0005] The first aspect of the present invention provides a method for controlling the coating of glass products, comprising: S1, obtaining multiple glass substrates, and sequentially depositing a first dielectric layer, a silver functional layer and a second dielectric layer on each glass substrate to obtain multiple calibration samples; measuring the reflectance color coordinates of each calibration sample before and after tempering, extracting the change in the first color coordinate and the change in the second color coordinate, and constructing a correlation function between the two color coordinate changes and the hydrogen gas flow rate ratio and the deposition time.
[0006] S2. Obtain the change in target color coordinates before and after tempering the target glass, input the change in target color coordinates into the correlation function, calculate and output the hydrogen gas flow rate ratio of the first dielectric layer and the second dielectric layer and the deposition time; adjust the flow rate of the reaction gas path according to the hydrogen gas flow rate ratio, adjust the deposition time according to the deposition time, and deposit the first dielectric layer, the silver functional layer and the second dielectric layer on the glass substrate in sequence.
[0007] S3. Measure the chromatic coordinates of the glass substrate before tempering after deposition and input them into the tempering furnace for tempering treatment; collect the surface reflectance spectrum of the tempered glass substrate, combine it with the chromatic coordinates before tempering to convert it into a change quantity and feed it back to the correlation function to iteratively correct the hydrogen gas flow rate ratio and deposition time.
[0008] A second aspect of the present invention provides a glass product coating control system, comprising: an association construction module: acquiring multiple glass substrates and sequentially depositing a first dielectric layer, a silver functional layer, and a second dielectric layer on each glass substrate to obtain multiple calibration samples; measuring the reflectance chromaticity coordinates of each calibration sample before and after tempering, extracting the change in the first chromaticity coordinates and the change in the second chromaticity coordinates, and constructing a correlation function between the two chromaticity coordinate changes and the hydrogen gas flow rate ratio and the deposition time.
[0009] Deposition control module: acquires the change in target color coordinates before and after tempering of the target glass, inputs the change in target color coordinates into the correlation function, calculates and outputs the hydrogen gas flow rate ratio of the first dielectric layer and the second dielectric layer and the deposition time; adjusts the flow rate of the reaction gas path according to the hydrogen gas flow rate ratio, and adjusts the deposition time according to the deposition time, and sequentially deposits the first dielectric layer, the silver functional layer and the second dielectric layer on the glass substrate.
[0010] Feedback correction module: Measure the pre-tempering chromatic coordinates of the glass substrate after deposition and input them into the tempering furnace for tempering treatment; collect the surface reflectance spectrum of the tempered glass substrate, combine it with the pre-tempering chromatic coordinates to convert it into a change value and feed it back to the correlation function to iteratively correct the hydrogen gas flow rate ratio and deposition time.
[0011] Compared with the prior art, the beneficial effects of the present invention are as follows: (1) The present invention constructs a correlation function, calculates and outputs the hydrogen gas flow ratio and deposition time based on the target color coordinate change, and adjusts the reaction gas flow and deposition time. This solves the problem that the fluctuation of process parameters after the film structure is determined is difficult to be quantitatively responded to, and realizes the dynamic adjustment of the process parameters of the medium layer under a fixed film structure, so that the influence of the hydrogen gas flow ratio and deposition time on color drift can be quantitatively characterized.
[0012] (2) This invention calculates the hydrogen gas flow rate ratio and deposition time of the first and second dielectric layers by inputting the target color coordinate change into the correlation function, and adjusts the reaction gas flow rate and deposition time accordingly. This solves the problem that the parameter setting between batches is not uniform due to repeated trial plating to approximate the target color value based on experience. It realizes the quantitative calculation and control of the reaction gas flow rate and deposition time through mathematical model, reduces the influence of human intervention, and ensures the consistency of deposition parameters between batches.
[0013] (3) This invention collects the reflection spectrum of the tempered glass substrate surface, combines the color coordinates before tempering into a change quantity and feeds it back to the correlation function, and iteratively corrects the hydrogen gas flow ratio and deposition time. This solves the problem that the test results after tempering are only used as a qualified judgment and do not form a closed-loop correction of parameters in the coating process. It realizes the closed-loop transmission of the color change information of the reflection spectrum after tempering back to the coating process, and iteratively corrects the hydrogen gas flow ratio and deposition time of subsequent batches, thereby improving the control accuracy between batches. Attached Figure Description
[0014] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0015] Figure 1 This is a flowchart of a glass product coating control method according to the present invention;
[0016] Figure 2 This is a heat map showing the mapping relationship between the hydrogen gas flow rate ratio of the first dielectric layer and the deposition time on the change of the first color coordinates in this invention.
[0017] Figure 3 This is a convergence trend diagram of the color coordinate deviation during the iterative correction process in this invention;
[0018] Figure 4 This is a schematic diagram showing the connections of various modules in a glass product coating control system according to the present invention. Detailed Implementation
[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0020] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains.
[0021] The following description, in conjunction with the accompanying drawings, details a specific scheme for a glass product coating control method and system provided by the present invention.
[0022] Example 1
[0023] Please see Figure 1 As shown, the present invention provides a method for controlling the coating of glass products, including steps S1 to S3.
[0024] To address the problem in existing glass coating processes where the tempering process causes uncontrollable shifts in the reflective chromaticity coordinates of the coating layer, making it difficult for the color of the tempered product to match the target requirements, this invention constructs a quantitative relationship between the change in chromaticity coordinates before and after tempering and the coating process parameters. This method performs calibration modeling and parameter optimization to achieve accurate prediction and control of the coating process parameters.
[0025] Specifically, the change in reflectance chromaticity coordinates of the calibrated sample before and after tempering is first obtained. This change is then used as the dependent variable to perform a multiple regression fitting with the hydrogen gas flow rate ratio and deposition time of the dielectric layer, constructing a correlation function model. Subsequently, the change in target chromaticity coordinates is input into this model, and the corresponding hydrogen gas flow rate ratio and deposition time are solved using an optimization algorithm. Finally, based on the solved parameters, the reaction gas path mass flow meter and the sputtering power supply timer are adjusted to complete the deposition of each film layer.
[0026] Unlike existing technologies that rely on experience-based adjustments, this invention establishes a closed-loop feedback mechanism guided by changes in color coordinates. This involves collecting the reflectance spectra before and after tempering, converting them into changes, comparing them with target changes to calculate the deviation, and feeding this deviation back to the correlation function to recalculate and correct process parameters for the next batch of production. This closed-loop technology effectively eliminates the random influence of the tempering process on the reflected color, improving the consistency of the reflected color and the yield rate of tempered glass products.
[0027] S1. Obtain multiple glass substrates and sequentially deposit a first dielectric layer, a silver functional layer, and a second dielectric layer on each glass substrate to obtain multiple calibration samples; measure the reflectance color coordinates of each calibration sample before and after tempering, extract the changes in the first and second color coordinates, and construct the correlation function between the two color coordinate changes and the hydrogen gas flow rate ratio and deposition time.
[0028] After glass coating, it usually needs to undergo high-temperature tempering. During tempering, the film layer undergoes microstructure rearrangement and interface diffusion under high temperature, which causes irreversible shift in the reflectance color coordinates. Moreover, there is a nonlinear coupling relationship between this shift and the flow rate ratio of hydrogen-containing gas and the deposition duration during the dielectric layer deposition process. If the process parameters are set based solely on experience or the absolute value of the color coordinates after tempering is used as the control target, it is impossible to decouple the interaction between multiple variables or eliminate the systematic errors introduced by the differences in the underlying optical properties of different batches of glass substrates. It is difficult to achieve precise control of the coating process parameters.
[0029] Therefore, this step eliminates the interference of substrate background differences on control accuracy by using the change in color coordinates before and after tempering as the modeling object, and establishes a quantitative correlation function by using the hydrogen gas flow rate ratio and deposition time as adjustable process variables, thus providing a mathematical model basis for subsequent parameter inverse solution.
[0030] In one specific embodiment, after obtaining multiple glass substrates, the base vacuum level and working gas pressure are set in a vacuum chamber according to the requirements of the magnetron sputtering deposition process. During the calibration process, the hydrogen gas flow rate ratio and deposition time of one of the first dielectric layer and the second dielectric layer are kept constant, while multiple different hydrogen gas flow rates are set for the other, and multiple different deposition times are set under each set of hydrogen gas flow rates, resulting in multiple sets of calibration process parameters that only change the parameters of the first dielectric layer. Specifically, the hydrogen gas flow rate ratio and deposition time of the second dielectric layer are first fixed as the calibration center value, multiple different hydrogen gas flow rates are set for the first dielectric layer, and multiple different deposition times are set under each set of hydrogen gas flow rates, resulting in multiple sets of calibration process parameters that only change the parameters of the first dielectric layer.
[0031] Subsequently, the hydrogen gas flow rate ratio and deposition time of the first dielectric layer were fixed as the calibration center values. The same value selection method and level setting were used for the second dielectric layer to obtain multiple sets of calibration process parameters that only changed the parameters of the second dielectric layer. In addition, in order to obtain the interaction data when the parameters of the two dielectric layers change simultaneously, multiple levels of the hydrogen gas flow rate ratio and deposition time of the first and second dielectric layers were taken and cross-combined at all levels to obtain multiple sets of calibration process parameters that change the parameters of both dielectric layers simultaneously. The value of the hydrogen gas flow rate ratio was determined based on the adjustable range of the flow ratio of the reactive gas Ar and the hydrogen gas H2 in the magnetron sputtering process, and the value of the deposition time was determined based on the sputtering rate corresponding to the design target of the dielectric layer film thickness.
[0032] According to the calibration process parameters, a first dielectric layer, a silver functional layer, and a second dielectric layer are sequentially deposited on the corresponding glass substrate to obtain multiple calibration samples.
[0033] The first dielectric layer is located between the glass substrate and the silver functional layer, and the second dielectric layer is located above the silver functional layer. Since variations in the deposition parameters of the silver functional layer independently introduce additional fluctuations in the reflectance chromaticity coordinates, if the silver functional layer parameters are changed simultaneously during calibration, the change in reflectance chromaticity coordinates cannot be attributed solely to the influence of the hydrogen gas flow rate ratio and deposition time in the dielectric layer. Therefore, the same deposition parameters are used for the silver functional layer in multiple calibration samples; that is, the sputtering power, argon flow rate, and deposition time of the silver functional layer are kept consistent across all calibration samples. This eliminates the interference of variations in the silver functional layer parameters on the chromaticity coordinate changes, ensuring that the calibration results only reflect the mapping relationship between the dielectric layer process parameters and the chromaticity coordinate changes.
[0034] After completing the preparation of the above-mentioned calibration samples, it is necessary to further obtain the changes in reflectance chromaticity coordinates of each calibration sample before and after tempering in order to establish a quantitative mapping relationship between the changes in chromaticity coordinates and the process parameters of the dielectric layer. Therefore, a correlation function is constructed with the hydrogen gas flow rate ratio of the first dielectric layer, the deposition time of the first dielectric layer, the hydrogen gas flow rate ratio of the second dielectric layer, and the deposition time of the second dielectric layer as independent variables, and the changes in the first and second chromaticity coordinates as dependent variables. The specific content is as follows: The reflectance spectra of the calibration samples before tempering are collected in the visible light wavelength range using a spectrophotometer. According to the tristimulus value calculation method in the CIE standard colorimetric system, the reflectance data of each wavelength point are combined with the relative power distribution of the D65 standard light source and the standard observer spectral tristimulus value function for weighted integration to obtain the tristimulus values. , , Then, the chromaticity coordinates are calculated and transformed to the CIELAB uniform color space to extract... The component is the first front coordinate component in the tempered glass front reflection chromaticity coordinate system. The component is used as the second front coordinate component in the pre-tempered reflective chromaticity coordinates.
[0035] The calibrated sample was fed into a tempering furnace for tempering. The heating zone temperature and time were set according to the tempering process requirements specified in the tempered glass standard. Subsequently, it was rapidly cooled to room temperature in a cooling zone to complete the tempering process. The reflectance spectrum after tempering was collected using a spectrophotometer under the same wavelength range and acquisition conditions as before tempering. The spectrum was then converted to the CIELAB uniform color space using the same colorimetric calculation method as before tempering to obtain the reflectance color coordinates after tempering. The component is the first rear coordinate component in the reflected color coordinates after tempering. The component is the second rear coordinate component in the reflective chromaticity coordinates after tempering.
[0036] It should be noted that the first and second front coordinate components, as well as the first and second rear coordinate components, are two orthogonal dimensional components constituting the reflectance chromaticity coordinates before and after tempering, respectively corresponding to the CIELAB uniform color space. Components and Components, of which The component reflects the degree of shift in red and green hues in the reflected light. The component reflects the degree of shift in the yellow and blue hues of the reflected light. Together, they characterize the chromaticity coordinates of the reflected colors of the coating before and after tempering, and are used to quantify the two-dimensional chromaticity shift of the reflected colors of the coated glass caused by the tempering process.
[0037] The change in the first color coordinate is calculated by subtracting the first front coordinate component from the first back coordinate component.
[0038] The change in the second color coordinate is calculated by subtracting the second front coordinate component from the second back coordinate component.
[0039] The hydrogen gas flow rate ratio of the first medium layer, the deposition time of the first medium layer, the hydrogen gas flow rate ratio of the second medium layer, and the deposition time of the second medium layer are used as independent variables, and the changes in the first and second color coordinates are used as dependent variables. A second-order polynomial is used to perform multiple regression fitting on each set of calibration process parameters and the corresponding color coordinate changes. The coefficients of each order are solved by the least squares method, and the correlation function is output.
[0040] The mathematical expression for the correlation function is:
[0041] .
[0042] in, This represents the dependent variable (i.e., the change in the first color coordinate or the change in the second color coordinate). The hydrogen gas flow rate ratio of the first dielectric layer, The deposition time of the first dielectric layer, The hydrogen gas flow rate ratio of the second dielectric layer, The deposition time of the second dielectric layer, to Let be the constant coefficients obtained by fitting using the least squares method, when The fitted values of the constant coefficients are independently calibrated for different dependent variables. This function represents the nonlinear mapping relationship between the hydrogen gas flow rate ratio in the medium layer and the deposition time on the changes in reflectance coordinates before and after tempering.
[0043] As shown in Table 1, with the process parameters of the second medium layer fixed at the calibration center value, the hydrogen gas flow rate ratio and deposition time of the first medium layer were calibrated in five-level and five-level comprehensive combination. A total of 25 sets of color coordinate change data of calibration samples were obtained. Table 1 lists the measured results corresponding to five representative combinations.
[0044] Table 1 Comparison of process parameters and color coordinate changes of the first dielectric layer
[0045]
[0046] As shown in Table 1, when the hydrogen gas flow rate ratio increased from 5% to 25% and the deposition time increased from 30s to 90s, the changes in the first and second chromatic coordinates increased from 0.197 to 1.582 and from 0.282 to 1.598, respectively, representing increases of approximately 8.0 times and 5.7 times. The superlinear growth of the dependent variable indicates that the two process parameters have a nonlinear superposition effect on the changes in chromatic coordinates.
[0047] like Figure 2 As shown in the figure, the horizontal axis represents the hydrogen gas flow rate ratio (%) of the first medium layer, and the vertical axis represents the deposition time (s) of the first medium layer. The gradient of the background color from light blue to soft orange represents the relative magnitude of the change in the first color coordinate. It can be seen that the change in the first color coordinate exhibits a non-linear growth trend with the increase of the hydrogen gas flow rate ratio and the deposition time; that is, the change in the first color coordinate is smallest in the upper left region (hydrogen gas flow rate ratio 5%, deposition time 30s), and largest in the lower right region (hydrogen gas flow rate ratio 25%, deposition time 90s). This figure intuitively reflects the two-dimensional non-linear mapping relationship between the hydrogen gas flow rate ratio and the deposition time of the first medium layer and the change in the color coordinate, as described by the correlation function, laying the foundation for subsequent inverse parameter solving.
[0048] S2. Obtain the change in target color coordinates before and after tempering the target glass, input the change in target color coordinates into the correlation function, calculate and output the hydrogen gas flow rate ratio of the first dielectric layer and the second dielectric layer and the deposition time; adjust the flow rate of the reaction gas path according to the hydrogen gas flow rate ratio, adjust the deposition time according to the deposition time, and deposit the first dielectric layer, the silver functional layer and the second dielectric layer on the glass substrate in sequence.
[0049] Considering that actual production requires determining coating process parameters in reverse based on the target color requirements of the tempered glass, and that the hydrogen gas flow ratio and deposition time output by the correlation function are only mathematical solutions, they need to be further converted into executable commands recognizable by the mass flow meter and sputtering power supply timer in the vacuum chamber. Simultaneously, the total flow rate of the reaction gas path is constrained by the sputtering power supply power, and the precise distribution of the hydrogen-containing and non-hydrogen-containing gas ratios and the deposition time at each target site must be executed to ensure the accuracy of the film thickness and composition. Therefore, this step uses the target color coordinate change as a known dependent variable to perform joint optimization on multiple unknown process independent variables in the correlation function, and converts the solution into executable control commands for the mass flow meter and sputtering power supply timer, achieving a complete mapping from optical performance targets to process execution parameters.
[0050] In one specific embodiment, a first target change and a second target change are received before and after the target glass is expected to be tempered. The first target change and the second target change correspond to the target glass before and after tempering, respectively. Expected change of components and The expected change in a component.
[0051] The calculation method for the first target change is as follows: take The average of the upper and lower limits of the allowable range is used as the target after tempering. Value, after the target is hardened Value minus the substrate background before tempering The difference between the statistical mean of the components is the first target change.
[0052] The calculation method for the change in the second objective is as follows: Take... The average of the upper and lower limits of the allowable range is used as the target after tempering. Value, after the target is hardened Value minus the substrate background before tempering The statistical mean of the components, and the resulting difference, is the second target change. The upper and lower limits of the allowable range are determined by the color reflection of the tempered coated glass. , The delivery specifications for each component are determined.
[0053] Substituting the first and second target changes into the correlation function as known dependent variables, the system of equations is optimized using a grid search algorithm. Specifically, within the range of values of each process independent variable during the calibration phase, all combinations of independent variables are traversed point by point with a fixed step size. The sum of squared residuals between the predicted value of the dependent variable after substituting it into the correlation function and the target change is calculated. The combination with the smallest sum of squared residuals is selected as the optimal solution, and the hydrogen gas flow rate ratio of the first medium layer, the deposition time of the first medium layer, the hydrogen gas flow rate ratio of the second medium layer, and the deposition time of the second medium layer are output.
[0054] The sputtering power of the first and second dielectric layers in the vacuum chamber is obtained. Based on the correspondence between the sputtering power and the total flow rate of the reactant gas established during the calibration phase, the first total flow rate value of the reactant gas path of the first dielectric layer and the second total flow rate value of the reactant gas path of the second dielectric layer are calculated respectively. The correspondence is determined by regression fitting using the least squares method based on the sputtering power and total flow rate data of the reactant gas measured and recorded under different sputtering power setting values.
[0055] Multiply the hydrogen-containing gas flow rate ratio of the first medium layer by the first total flow rate value to obtain the target flow rate of the hydrogen-containing gas in the first medium layer. Subtract the target flow rate of the hydrogen-containing gas in the first medium layer from the first total flow rate value to obtain the target flow rate of the non-hydrogen-containing gas in the first medium layer.
[0056] Multiply the hydrogen-containing gas flow rate ratio of the second medium layer by the second total flow rate value to obtain the target flow rate of the hydrogen-containing gas in the second medium layer. Subtract the target flow rate of the hydrogen-containing gas in the second medium layer from the second total flow rate value to obtain the target flow rate of the non-hydrogen-containing gas in the second medium layer.
[0057] Subsequently, the hydrogen gas flow rate ratio and deposition time obtained from the above calculations are further converted into executable control commands for the mass flow meter and sputtering power timer in the vacuum chamber to drive the actual deposition process. Therefore, based on the calculated target flow rates of hydrogen-containing gas and non-hydrogen-containing gas for each medium layer, as well as the deposition time for each medium layer, control commands are sent to the corresponding mass flow meter and sputtering power timer, as follows: the valves of the hydrogen-containing gas source and the non-hydrogen-containing gas source are opened, and electrical signals are sent to the mass flow meters of the first and second medium layer reaction gas paths to adjust the flow rates of each mass flow meter to the corresponding target flow rates; the sputtering power supply in the vacuum chamber is turned on, and the deposition times of the first and second medium layers are input to the sputtering power timers of the corresponding targets, respectively.
[0058] The glass substrate is conveyed into the vacuum chamber and passes sequentially through the first dielectric layer target, the silver functional layer target, and the second dielectric layer target. The on and off of the sputtering power supply at each target is controlled according to the corresponding deposition time, and the first dielectric layer, the silver functional layer, and the second dielectric layer are sequentially deposited on the surface of the glass substrate.
[0059] S3. Measure the chromatic coordinates of the glass substrate before tempering after deposition and input them into the tempering furnace for tempering treatment; collect the surface reflectance spectrum of the tempered glass substrate, combine it with the chromatic coordinates before tempering to convert it into a change quantity and feed it back to the correlation function to iteratively correct the hydrogen gas flow rate ratio and deposition time.
[0060] In actual production, factors such as vacuum fluctuations in the vacuum chamber, target material loss, changes in gas purity, and uneven temperature distribution in the tempering furnace can all cause the actual color coordinate change to deviate from the predicted value of the correlation function. If only single-cycle open-loop control is implemented without actual measurement feedback correction, the accumulated deviation will cause the optical performance of subsequent batches of products to gradually deviate from the target range. Therefore, this step involves measuring the color coordinates of the same glass substrate before and after tempering after each batch of deposition, calculating the deviation between the actual color coordinate change and the target change, and feeding this deviation back to the correlation function for iterative correction of process parameters. This forms a batch-by-batch convergent closed-loop control, ensuring the stability of the coating's optical performance in long-term production.
[0061] In one specific embodiment, because the process parameters obtained by solving based on the correlation function are affected by factors such as vacuum fluctuations in the vacuum chamber, target material loss, changes in gas purity, and non-uniformity of the tempering furnace temperature field during the actual deposition process, there is a deviation between the actual change in chromatic coordinates and the predicted value of the correlation function. Therefore, after deposition and before tempering, a spectrophotometer is used to collect the pre-tempering reflectance spectrum of the same glass substrate in the visible light wavelength range. Following the same chromaticity calculation method as the calibrated sample in S1, i.e., weighted integration is performed based on the CIE standard chromaticity observer spectral tristimulus value function and the relative power distribution data of the D65 standard light source, and then converted to the CIELAB uniform chromaticity space to obtain the actual pre-tempering reflectance chromatic coordinates. The component is used as the actual first coordinate component before tempering. The component is used as the actual second coordinate component before tempering.
[0062] Subsequently, the deposited glass substrate is transferred to the tempering furnace heating zone, where the temperature and heating time are set according to the tempering process requirements specified in the tempered glass standard. After that, it is transferred to the cooling zone for rapid cooling to room temperature to complete the tempering process.
[0063] The tempered glass substrate was placed on a spectrophotometer stage. The reflectance spectrum of the tempered substrate was collected using the same wavelength range and acquisition conditions as before tempering. Following the same colorimetric calculation method as before tempering, the actual reflectance color coordinates of the tempered substrate were obtained, and the reflectance was extracted. The component is used as the actual first coordinate component after tempering. The component serves as the actual second coordinate component after tempering.
[0064] The actual change in the first color coordinate is calculated by subtracting the actual first coordinate component before tempering from the actual first coordinate component after tempering; the actual change in the second color coordinate is calculated by subtracting the actual second coordinate component before tempering from the actual second coordinate component after tempering.
[0065] The first deviation is obtained by subtracting the actual change in the first color coordinate from the change in the first target; the second deviation is obtained by subtracting the actual change in the second color coordinate from the change in the second target; the first deviation and the second deviation represent the error between the predicted value and the actual measured value of the correlation function.
[0066] The first correction target value is obtained by subtracting the first deviation value from the first target change value, and the second correction target value is obtained by subtracting the second deviation value from the second target change value. When the actual change value of the first color coordinate is greater than the change value of the first target, the first deviation value is positive, and the first correction target value is reduced accordingly, so that the process parameters of the next batch are reduced. The influence range of the component is used to compensate for the deviation; when the actual change in the first color coordinate is less than the change in the first target, the first deviation is negative, and the first correction target is increased accordingly, causing the process parameters of the next batch to increase their impact. The influence range of the component; similarly, the relationship between the second deviation and the second correction target is determined independently based on the relationship between the actual change in the second color coordinates and the change in the second target.
[0067] Substitute the first and second correction target values into the constructed correlation function, and re-solve using the grid search algorithm to output the corrected hydrogen gas flow rate ratio of the first dielectric layer and the deposition time of the second dielectric layer. Use the corrected hydrogen gas flow rate ratio and deposition time to replace the process parameters used in the current batch as input parameters for the deposition control of the glass substrate in the next batch, so as to achieve batch-by-batch iterative correction.
[0068] When the change in the hydrogen gas flow ratio obtained from two consecutive iterations is less than or equal to the minimum flow resolution of the mass flow meter, and the change in deposition time is less than or equal to the minimum time resolution of the sputtering power supply timer, it indicates that the change in process parameters of adjacent batches is within the resolution range of the equipment's execution accuracy. Therefore, the iterative correction is stopped, and the current process parameters are used as the standard deposition parameters for subsequent batches.
[0069] like Figure 3As shown in the figure, the horizontal axis represents the number of iteration batches, and the vertical axis represents the color coordinate deviation. The dark blue solid line (circular marker) indicates the trend of the first deviation with each batch, and the dark red solid line (square marker) indicates the trend of the second deviation with each batch. The light-colored filled area below is used to enhance the visual contrast of the attenuation magnitude of the two types of deviations. It can be seen that both types of deviations show a monotonically decreasing trend with the increase of iteration batches, and the rate of decrease is fastest and the slope of the curve is largest in the early stage of iteration, i.e., the first 3 batches; in the middle stage of iteration, i.e., the 4th to 5th batches, the deviations have attenuated to below 0.12 and 0.06; in the later stage of iteration, i.e., the 6th to 8th batches, the deviations tend to stabilize and gradually approach zero. This convergence trend verifies the effectiveness of the closed-loop correction mechanism of process parameters based on the feedback of the post-tempered reflectance spectrum to the correlation function, indicating that the feedback correction method proposed in this invention can eliminate the random influence of the tempering process on the reflectance color and effectively suppress the inter-batch color drift.
[0070] Example 2
[0071] Please see Figure 4 As shown, the present invention provides a glass product coating control system, including: an association construction module, a control deposition module, and a feedback correction module. The connection relationship between the modules is as follows: the association construction module and the control deposition module are connected, and the control deposition module and the feedback correction module are connected.
[0072] Correlation construction module: Obtain multiple glass substrates, and sequentially deposit a first dielectric layer, a silver functional layer, and a second dielectric layer on each glass substrate to obtain multiple calibration samples; measure the reflectance color coordinates of each calibration sample before and after tempering, extract the changes in the first color coordinates and the changes in the second color coordinates, and construct the correlation function between the two color coordinate changes and the hydrogen gas flow rate ratio and the deposition time.
[0073] Deposition control module: acquires the change in target color coordinates before and after tempering of the target glass, inputs the change in target color coordinates into the correlation function, calculates and outputs the hydrogen gas flow rate ratio of the first dielectric layer and the second dielectric layer and the deposition time; adjusts the flow rate of the reaction gas path according to the hydrogen gas flow rate ratio, and adjusts the deposition time according to the deposition time, and sequentially deposits the first dielectric layer, the silver functional layer and the second dielectric layer on the glass substrate.
[0074] Feedback correction module: Measure the pre-tempering chromatic coordinates of the glass substrate after deposition and input them into the tempering furnace for tempering treatment; collect the surface reflectance spectrum of the tempered glass substrate, combine it with the pre-tempering chromatic coordinates to convert it into a change value and feed it back to the correlation function to iteratively correct the hydrogen gas flow rate ratio and deposition time.
[0075] The above embodiments can be implemented, in whole or in part, by software, hardware, firmware, or any other combination thereof. When implemented using software, the above embodiments can be implemented, in whole or in part, in the form of a computer program product.
[0076] Those skilled in the art will recognize that the algorithmic steps of the various examples described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, or a combination of computer software and electronic hardware. Whether these functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementations should not be considered beyond the scope of this application.
[0077] In addition, the functional modules in the various embodiments of this application can be integrated into one processing module, or each module can exist physically separately, or two or more modules can be integrated into one module.
[0078] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.
[0079] Finally, the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.
Claims
1. A method for controlling the coating of glass products, characterized in that, include: S1. Obtain multiple glass substrates, and sequentially deposit a first dielectric layer, a silver functional layer, and a second dielectric layer on each glass substrate to obtain multiple calibration samples; The reflectance chromatic coordinates of each calibration sample before and after tempering were measured. The changes in the first and second chromatic coordinates were extracted, and a correlation function was constructed between the two chromatic coordinate changes and the hydrogen gas flow rate ratio and the deposition time. S2. Obtain the change in target color coordinates before and after tempering the target glass, input the change in target color coordinates into the correlation function, calculate and output the hydrogen gas flow rate ratio of the first dielectric layer and the second dielectric layer and the deposition time; adjust the flow rate of the reaction gas path according to the hydrogen gas flow rate ratio, adjust the deposition time according to the deposition time, and deposit the first dielectric layer, the silver functional layer and the second dielectric layer on the glass substrate in sequence. S3. Measure the chromatic coordinates of the glass substrate before tempering after deposition and input them into the tempering furnace for tempering treatment; collect the surface reflectance spectrum of the tempered glass substrate, combine it with the chromatic coordinates before tempering to convert it into a change quantity and feed it back to the correlation function to iteratively correct the hydrogen gas flow rate ratio and deposition time.
2. The method for controlling the coating of glass products as described in claim 1, characterized in that, The method for obtaining the calibration sample includes: Obtain multiple glass substrates; In the vacuum chamber, the hydrogen gas flow rate ratio and deposition time of one of the first dielectric layer and the second dielectric layer are kept constant, while multiple different hydrogen gas flow rates are set for the other layer, and multiple different deposition times are set under each hydrogen gas flow rate ratio, so as to obtain multiple sets of calibration process parameters that only change the parameters of the layer. According to the calibration process parameters, a first dielectric layer, a silver functional layer, and a second dielectric layer are sequentially deposited on the corresponding glass substrate to obtain multiple calibration samples.
3. The method for controlling the coating of glass products as described in claim 1, characterized in that, The first dielectric layer is located between the glass substrate and the silver functional layer, and the second dielectric layer is located above the silver functional layer.
4. The method for controlling the coating of glass products as described in claim 1, characterized in that, The method for constructing the correlation function includes: The reflectance spectrum of the calibrated sample before tempering was measured using a spectrophotometer, and the colorimetric integral was calculated to obtain the reflectance color coordinates before tempering. The first and second front coordinate components were then extracted from the reflectance color coordinates before tempering. The calibration sample is fed into the tempering furnace for tempering treatment. The reflectance spectrum after tempering is measured using a spectrophotometer. Colorimetric integration is performed to obtain the reflectance color coordinates after tempering. The first and second back coordinate components are extracted from the reflectance color coordinates after tempering. The change in the first color coordinate is calculated by subtracting the first front coordinate component from the first back coordinate component. Subtract the second front coordinate component from the second back coordinate component to calculate the change in the second color coordinate. Using the hydrogen gas flow rate ratio of the first medium layer, the deposition time of the first medium layer, the hydrogen gas flow rate ratio of the second medium layer, and the deposition time of the second medium layer as independent variables, and the changes in the first and second color coordinates as dependent variables, a multiple regression fitting is performed to output the correlation function.
5. The method for controlling the coating of glass products as described in claim 4, characterized in that, The first front coordinate component and the second front coordinate component, as well as the first rear coordinate component and the second rear coordinate component, are two orthogonal dimensional components that constitute the reflective chromaticity coordinates before and after tempering.
6. The method for controlling the coating of glass products as described in claim 1, characterized in that, Step S2 includes: Receive the expected changes in the first and second targets of the target glass before and after tempering; Substitute the changes of the first and second objectives into the correlation function as known dependent variables, and use the optimization algorithm to find the solution for the unknown independent variables, outputting the hydrogen gas flow rate ratio of the first medium layer, the deposition time of the first medium layer, the hydrogen gas flow rate ratio of the second medium layer, and the deposition time of the second medium layer. Obtain the first total flow rate value of the first dielectric layer reaction gas path and the second total flow rate value of the second dielectric layer reaction gas path in the vacuum chamber; Multiply the hydrogen-containing gas flow rate ratio of the first medium layer by the first total flow rate value to obtain the target flow rate of the hydrogen-containing gas in the first medium layer. Subtract the target flow rate of the hydrogen-containing gas in the first medium layer from the first total flow rate value to obtain the target flow rate of the non-hydrogen-containing gas in the first medium layer. Multiply the hydrogen-containing gas flow rate ratio of the second medium layer by the second total flow rate value to obtain the target flow rate of hydrogen-containing gas in the second medium layer. Subtract the target flow rate of hydrogen-containing gas in the second medium layer from the second total flow rate value to obtain the target flow rate of non-hydrogen-containing gas in the second medium layer. Open the valves of the hydrogen-containing gas source and the non-hydrogen-containing gas source, and send electrical signals to the mass flow meters of the first medium layer reaction gas path and the second medium layer reaction gas path to adjust the flow rate of each mass flow meter to the corresponding target flow rate. Turn on the sputtering power supply in the vacuum chamber and input the deposition time of the first dielectric layer and the deposition time of the second dielectric layer to the sputtering power supply timer of the corresponding target position, respectively. The glass substrate is conveyed into the vacuum chamber and passes sequentially through the first dielectric layer target, the silver functional layer target, and the second dielectric layer target. The on and off of the sputtering power supply at each target is controlled according to the corresponding deposition time, and the first dielectric layer, the silver functional layer, and the second dielectric layer are sequentially deposited on the surface of the glass substrate.
7. The method for controlling the coating of glass products as described in claim 6, characterized in that, The methods for obtaining the first total flow value and the second total flow value include: Obtain the sputtering power of the first and second dielectric layers in the vacuum chamber; Based on the correspondence between sputtering power and total flow rate of reaction gas established during the calibration phase, the first total flow rate value of the first dielectric layer reaction gas path and the second total flow rate value of the second dielectric layer reaction gas path are calculated respectively.
8. The method for controlling the coating of glass products as described in claim 1, characterized in that, Step S3 includes: After deposition and before tempering, the reflectance spectrum of the same glass substrate before tempering was collected using a spectrophotometer, and the colorimetric integral was calculated to obtain the actual reflectance color coordinates before tempering. The deposited glass substrate is transferred to the heating zone of the tempering furnace for heating, and then transferred to the cooling zone for rapid cooling to complete the tempering process. After tempering, the glass substrate is placed on the spectrophotometer detection stage. The spectrophotometer light source is turned on to emit incident light onto the surface of the glass substrate. The spectrophotometer sensor is used to receive the reflected light and collect the reflection spectrum. Extract the wavelength and corresponding light intensity data from the reflectance spectrum, perform integration calculations by combining the CIE standard colorimetric observer spectral tristimulus values, and output the actual reflectance color coordinates after tempering. Subtract the actual reflected color coordinates after tempering from the corresponding coordinate values of the actual reflected color coordinates before tempering to calculate the actual change in the first color coordinate and the actual change in the second color coordinate. Subtract the actual change in the first color coordinates from the change in the first target to obtain the first deviation; subtract the actual change in the second color coordinates from the change in the second target to obtain the second deviation. The first corrected target amount is obtained by subtracting the first deviation amount from the first target change amount; the second corrected target amount is obtained by subtracting the second deviation amount from the second target change amount. Substitute the first and second correction target values into the correlation function and solve again to output the corrected hydrogen gas flow rate ratio of the first and second medium layers and the deposition time. The corrected hydrogen gas flow rate ratio and deposition time are used to replace the independent variable values in the current correlation function for deposition control of the next batch of glass substrates.
9. The method for controlling the coating of glass products as described in claim 8, characterized in that, The termination conditions for iteratively correcting the hydrogen gas flow ratio and deposition time in step S3 include: If the change in the hydrogen gas flow ratio and deposition time obtained from iterative solutions of adjacent batches is less than or equal to the device execution accuracy of the mass flow meter and sputtering power supply timer, then the iterative correction will stop.
10. A glass product coating control system, characterized in that, include: Correlation construction module: Obtain multiple glass substrates and sequentially deposit a first dielectric layer, a silver functional layer, and a second dielectric layer on each glass substrate to obtain multiple calibration samples; measure the reflectance color coordinates of each calibration sample before and after tempering, extract the changes in the first color coordinates and the changes in the second color coordinates, and construct the correlation function between the two color coordinate changes and the hydrogen gas flow rate ratio and the deposition time. The control deposition module acquires the change in target color coordinates before and after tempering the target glass, inputs the change in target color coordinates into the correlation function, calculates and outputs the hydrogen gas flow rate ratio between the first dielectric layer and the second dielectric layer and the deposition time; adjusts the flow rate of the reaction gas path according to the hydrogen gas flow rate ratio, and adjusts the deposition time according to the deposition time, and sequentially deposits the first dielectric layer, the silver functional layer and the second dielectric layer on the glass substrate. Feedback correction module: Measure the pre-tempering chromatic coordinates of the glass substrate after deposition and input them into the tempering furnace for tempering treatment; collect the surface reflectance spectrum of the tempered glass substrate, combine it with the pre-tempering chromatic coordinates to convert it into a change value and feed it back to the correlation function to iteratively correct the hydrogen gas flow rate ratio and deposition time.