Drought-resistant double-ridge double-row farmland ridge type and construction method thereof

Abstract

This invention discloses a double-ridge, double-row drought-resistant and drainage-prone dryland ridge type and its construction method, aiming to solve the problems of insufficient drought resistance and drainage capacity, poor ventilation and light penetration, and unsuitability for medium and large-scale agricultural machinery operations in existing dryland ridge types. The ridge type includes repeating ridge units, each ridge unit having a planting ridge area, two planting ridge surfaces, and a first furrow between them. Drainage ditches and drainage channels are provided between adjacent ridge units, and the soil obtained from excavating the drainage ditches is backfilled to form a mound layer. This structure is beneficial for improving ridge surface area, centralized drainage, seedling protection and moisture retention, improved light penetration, and adaptability to mechanized operations.

Description

Technical Field

[0001] This invention relates to the field of dryland planting ridges and farmland preparation technology, specifically to a double-ridge, double-row drought-resistant and drainage dryland ridge type and its construction method, which is suitable for dryland crop planting, drought resistance and drainage, and medium and large-scale agricultural machinery operations. Background Technology

[0002] In dryland crop cultivation, the ridge structure directly affects soil water retention, drainage, crop ventilation and light penetration, and the adaptability to agricultural machinery operations. Taking areas such as Kezuohou Banner in Inner Mongolia as examples, the local terrain is characterized by alternating plains and hills, with significant elevation changes in different areas, making drought and flood variations highly influential on crop growth. Therefore, dryland ridge structures not only need to possess a certain capacity for moisture retention and drought resistance, but also need to be able to drain water promptly during periods of concentrated rainfall or waterlogging in low-lying areas, and be adaptable to continuous operation by medium and large agricultural machinery along the field direction.

[0003] Among existing dryland ridge types, the most common is the traditional ridge type with approximately 60cm between ridges. While this type of ridge is convenient for conventional planting, the narrow ridge spacing limits the ridge's water retention and drainage capacity. This makes it unsuitable for maintaining moisture in the crop root zone during droughts, and prone to poor drainage in areas with abundant rainfall or low elevations. Furthermore, densely planted crops suffer from insufficient ventilation and light penetration due to the narrow ridge spacing, affecting crop photosynthesis. In addition, the traditional ridge type has poor compatibility with the width of the furrows, wheel track, and working width of agricultural machinery, hindering the stable and efficient operation of medium and large-sized agricultural machinery.

[0004] In recent years, some high-standard dryland ridge types, such as the 40cm×80cm ridge type, have been promoted. While these have improved planting row spacing and mechanized operation conditions to some extent, they still mainly focus on conventional ridge layouts and have failed to fully consider the synergy between adapting to the terrain for drainage, forming larger drainage ditches, using the excavated soil to raise the planting ridge surface, and facilitating the operation of medium and large agricultural machinery. Therefore, there is still room for improvement in terms of drought resistance, flood control, seedling protection, ventilation and light penetration, and agricultural machinery compatibility.

[0005] To address the aforementioned issues, it is necessary to propose a new dryland ridge structure that forms repeating planting ridges and drainage ditches along the width of the field. This involves setting up a double-ridge, double-row planting structure within the planting ridges and constructing wider and deeper drainage ditches between adjacent ridge units. Simultaneously, the soil excavated from the drainage ditches is backfilled onto the planting ridge surface to increase the ridge height. This approach simultaneously meets the needs for drought resistance, flood control, seedling protection, improved sunlight exposure, and adaptation to medium and large-scale agricultural machinery operations. Summary of the Invention

[0006] In view of the shortcomings of the prior art, the purpose of this invention is to provide a double-ridge, double-row drought-resistant and flood-drainage dryland ridge type and its construction method to solve the problems mentioned in the background art.

[0007] To achieve the above objectives, a specific embodiment of the present invention provides a double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields, comprising multiple ridge units extending along the length of the field and repeatedly arranged along the width of the field; each ridge unit includes a planting ridge area with a total lateral width of 240cm, within which two planting ridge surfaces are formed at intervals along the width of the field, and a first furrow located between the two planting ridge surfaces, the first furrow having a lateral width of 60cm; a drainage ditch is provided between two adjacent ridge units, the total lateral width of the drainage ditch being 100cm; a drainage channel is formed within the drainage channel, the lateral width of the drainage ditch being greater than the lateral width of the first furrow; a soil layer formed by excavating the drainage ditch is provided on the planting ridge surface, making the planting ridge surface higher than the bottom of the first furrow and the bottom of the drainage ditch.

[0008] In addition, the double-ridge, double-row drought-resistant and flood-drainage dryland ridge type and its construction method proposed in this application may also have the following additional technical features: In one embodiment of this application, the bottom width of the drainage ditch is 80cm and the depth of the drainage ditch is 40cm.

[0009] In one embodiment of this application, the lateral width of each planting ridge is 40 cm.

[0010] In one embodiment of this application, the planting ridge surface is provided with ridge slopes on the side, the ridge slopes on both sides of the first ridge furrow extend inclinedly towards the bottom of the first ridge furrow, and the ridge slopes on both sides of the drainage ditch extend inclinedly towards the bottom of the drainage ditch.

[0011] In one embodiment of this application, the drainage ditch extends continuously along the length of the field and is connected to the field head drainage ditch.

[0012] In one embodiment of this application, a water pipe is provided in the first furrow, and the water pipe is arranged along the extension direction of the planting ridge surface.

[0013] In one embodiment of this application, a plurality of the ridge units and a plurality of the drainage ditches are arranged alternately along the width of the field to form a ridge-ditch combination structure suitable for medium and large agricultural machinery to operate along the length of the field.

[0014] A method for constructing a double-ridge, double-row drought-resistant and flood-drained ridge pattern for dryland fields includes the following steps: Determine the ridge direction along the length of the field; Divide the field into multiple repeating ridge units along the width of the field, so that each ridge unit forms a planting ridge area with a total lateral width of 240cm, and within the planting ridge area, form two planting ridge surfaces arranged at intervals along the width of the field. A first furrow with a transverse ditch width of 60cm is formed between the two planting ridges; A drainage ditch with a total transverse width of 100cm is formed between two adjacent ridge units; Excavate a drainage ditch within the drainage channel, ensuring that the transverse width of the drainage ditch is greater than the transverse width of the first furrow. At least part of the soil obtained from excavating the drainage ditch is backfilled and laid on the planting ridge to form a soil mound, so that the planting ridge is higher than the bottom of the first ditch and the bottom of the drainage ditch.

[0015] In one embodiment of this application, a drainage ditch with a bottom width of 80cm and a depth of 40cm is excavated in the drainage ditch, and the drainage ditch is made to extend continuously along the length of the field and to connect with the field head drainage ditch.

[0016] The advantages of this invention compared to existing technologies are: (1) The present invention sets up two planting ridges and a first furrow between the two planting ridges in a planting ridge area with a total horizontal width of 240cm, which can form a double-ridge double-row planting structure, which is conducive to improving the ventilation and light transmission conditions of crops and improving the photosynthetic effect of crops.

[0017] (2) The present invention sets up a drainage ditch with a total width of 100cm between adjacent ridge units, and forms a drainage ditch with a width greater than that of the first ridge ditch in the drainage ditch, which is conducive to concentrated drainage along the length of the field and improves the drainage capacity of dry fields under low-lying or concentrated rainfall conditions.

[0018] (3) The present invention backfills the soil obtained from the excavation of drainage ditches onto the planting ridge to form a soil layer, so that the planting ridge is higher than the bottom of the first ridge and drainage ditch. This can not only increase the height of the ridge and enhance the root zone's ability to resist waterlogging, but also improve the ridge's ability to retain moisture and protect seedlings during drought.

[0019] (4) The multiple ridge units and drainage ditches of the present invention are arranged alternately along the width of the field, which can form a continuous ridge-ditch combination structure according to the terrain of the field. At the same time, it is beneficial for medium and large agricultural machinery to operate along the length of the field, thereby improving the adaptability of agricultural machinery operation and the efficiency of field management.

[0020] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the structure of a double-ridge, double-row drought-resistant and flood-draining dryland ridge type in one embodiment of the present invention; Figure 2 A schematic diagram of the ridge spacing for the existing nationally promoted dryland farming ridge type; Figure 3 This is a schematic diagram of the ridge spacing for traditional 60cm ridge spacing dryland planting. Detailed Implementation

[0023] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0024] Example 1 like Figures 1 to 3 As shown, this embodiment provides a double-ridge, double-row drought-resistant and drainage dryland ridge type, which is suitable for dryland crop planting, especially for plain dryland plots that need to take into account drought resistance, drainage, and medium and large-scale agricultural machinery operations.

[0025] The double-ridge, double-row drought-resistant and flood-draining dryland ridge type consists of multiple ridge units that extend along the length of the field and are repeated along the width of the field. The length of the field is the ridge direction, which is also the main direction of travel for agricultural machinery along the ridge; the width of the field is the direction in which the multiple ridge units are arranged laterally.

[0026] Each ridge unit comprises a planting ridge area with a total transverse width of 240 cm. Within this planting ridge area, two planting ridge surfaces are formed, spaced apart along the width of the field and extending continuously along its length. Each planting ridge surface is used to form a crop planting row, thus creating a double-ridge, double-row planting structure within a single planting ridge area.

[0027] A first furrow is constructed between the two planting ridges, extending along the length of the field. The first furrow is 60cm wide laterally. Located between the two planting ridges, this first furrow serves two purposes: it acts as a buffer between the two ridges and it creates a channel space within the planting ridge area for irrigation, rainwater runoff, or farm management. Because of the 60cm first furrow between the two planting ridges, there is a larger spacing between adjacent planting rows after crop planting, which is beneficial for improving ventilation and light penetration.

[0028] Drainage ditches are provided between two adjacent ridge units, extending along the length of the field, with a total lateral width of 100cm. Within each drainage ditch, a further drainage channel extends along the length of the field. The lateral width of the drainage channel is greater than that of the first ridge furrow, giving the drainage channel a larger cross-sectional area and catchment space compared to the first ridge furrow.

[0029] A soil mound layer is installed on the planting ridge, formed from the soil excavated from the drainage ditch. During construction, after the drainage ditch is excavated, at least part of the excavated soil is backfilled and laid on the planting ridge, making the planting ridge surface higher than the bottom of the first furrow and the drainage ditch. The soil mound layer is installed in close contact with the original planting ridge surface and together they form the soil layer on the ridge surface for crop root growth. Through this structure, rainwater or field water can flow from the higher planting ridge surface towards the first furrow and drainage ditch, reducing the possibility of crop roots being in a waterlogged environment for a long time; at the same time, the soil mound layer increases the thickness of the soil layer on the planting ridge, which is beneficial for seedling protection and moisture retention.

[0030] The working process of this embodiment is as follows: When rainfall or waterlogging occurs, the planting ridge surface is relatively high due to the presence of a soil layer, allowing water to flow along the side of the planting ridge surface towards the first furrow or drainage ditch. The first furrow, located within the planting ridge area, can receive part of the water flow between two planting ridge surfaces; the drainage ditch, located between adjacent ridge units, is wider than the first furrow and can undertake the main drainage function. The drainage ditch extends along the length of the field, allowing the collected water to drain along the ridge direction. Under drought conditions, the higher planting ridge surface and the soil layer formed by excavation can increase the soil thickness around the crop roots, improving seedling protection and moisture retention.

[0031] When multiple ridge units are arranged repeatedly along the width of the field, drainage ditches are set between adjacent ridge units, forming a ridge-ditch combination structure in the field with alternating arrangements of "planting ridges, drainage ditches, planting ridges, and drainage ditches". This ridge-ditch combination structure can not only follow the terrain of the field for longitudinal drainage, but also provide a relatively stable travel and working space for medium and large agricultural machinery to operate along the length of the field.

[0032] Example 2 This embodiment is basically the same as embodiment 1 in structure and working principle, except that the preferred dimensions of the drainage ditch and planting ridge are further defined.

[0033] In this embodiment, the drainage ditch has a bottom width of 80cm and a depth of 40cm. The drainage ditch is located within a drainage channel with a total transverse width of 100cm, with space reserved for the drainage ditch and its side slopes or edges. The bottom width of the drainage ditch is set at 80cm, significantly larger than the 60cm transverse width of the first furrow, thus forming a larger drainage channel relative to the first furrow. The depth of the drainage ditch is set at 40cm, ensuring that the bottom of the drainage ditch is lower than the planting ridge surface and the bottom of the first furrow, facilitating the flow of field water into the drainage ditch.

[0034] Each planting ridge is 40cm wide. Two planting ridges are located on either side of the first furrow and extend along the length of the field. Crops can be planted on the corresponding planting ridges. The 40cm wide planting ridges provide planting space for the crop roots and, together with the 60cm wide first furrow, form a double-ridge, double-row structure. This structure differs from the conventional narrow-ridge continuous arrangement, maintaining a more significant furrow spacing between planting rows, which is beneficial for ventilation and light penetration in densely planted crops.

[0035] In actual construction, after the drainage ditch is excavated, the soil excavated from the ditch is backfilled onto the planting ridges to form a mound layer. Because the drainage ditch has a bottom width of 80cm and a depth of 40cm, the excavated soil can be used to raise the two planting ridges, creating a higher planting position for the crops relative to the first ridge and the drainage ditch. Therefore, in low-lying areas or during periods of concentrated rainfall, the crop roots on the planting ridges are less likely to be directly soaked by water; during droughts, the mound layer increases the soil volume on the ridges, which is beneficial for protecting seedlings and retaining moisture in the root zone.

[0036] Example 3 This embodiment is basically the same as embodiment 1 in structure and working principle, the difference being that the ridge slope structure of the planting ridge and the connection relationship of the drainage ditch are further defined.

[0037] In this embodiment, the sides of the planting ridges are provided with ridge slopes. The ridge slopes on both sides of the first furrow extend slopingly towards the bottom of the first furrow, that is, the sides of the two planting ridges facing the first furrow are respectively connected to the bottom or side of the first furrow through the ridge slopes. The ridge slopes on both sides of the drainage ditch extend slopingly towards the bottom of the drainage ditch, that is, the sides of the planting ridges near the drainage ditch transition towards the drainage ditch through the ridge slopes.

[0038] The aforementioned ridge structure creates a continuous gradient between the planting ridge, the first furrow, and the drainage ditch. During rainfall, water falling on the planting ridge flows along the ridge slope towards the bottom of the furrow, preventing it from stagnating on the ridge for extended periods. Water flowing between two planting ridges enters the first furrow, while water flowing outside the planting ridge area enters the drainage ditch. Because the drainage ditch is wider than the first furrow and its bottom is lower than the planting ridge, it effectively concentrates and discharges water between adjacent ridge units.

[0039] Furthermore, the drainage ditches extend continuously along the length of the field and connect with the field-end drainage ditches. The field-end drainage ditches can be existing or constructed transverse drainage ditches at the ends of the field. After the drainage ditches connect with the field-end drainage ditches, accumulated water in the field can first flow along the length of the field along each drainage ditch before converging into the field-end drainage ditches and being discharged from the field. This connection is suitable for dryland areas with undulating terrain, utilizing the natural slope of the field or the slope of the land preparation to achieve drainage along the terrain.

[0040] Example 4 This embodiment is basically the same as embodiment 1 in structure and working principle, the difference being that: a water pipe is installed in the first furrow, and the cooperation relationship between the water pipe and the double-ridge double-row structure is further explained.

[0041] In this embodiment, a water pipe is installed in the first furrow, and the water pipe is arranged along the extension direction of the planting ridge. Since the first furrow is located between two planting ridges, the water pipe, when installed in the first furrow, can be positioned in the middle between the two planting ridges. When water supply is needed, the water pipe transports water along the ridge direction, so that the water can be distributed along the direction between the two planting ridges, facilitating water supply to the crops on both sides of the planting ridge.

[0042] Water pipes can be laid at or near the bottom of the first furrow, or they can be fixed or positioned along the direction of the first furrow according to field management needs. The first furrow provides space for the water pipes, ensuring that they do not encroach on the crop planting area of ​​the planting ridges or affect the growth of crops on adjacent planting ridges. When medium to large-sized agricultural machinery operates along the length of the field, the water pipes are located within the first furrow, which helps to reduce interference with the planting ridges and the machinery's operating path.

[0043] In this embodiment, multiple ridge units and multiple drainage ditches are arranged alternately along the width of the field. Since the total lateral width of the drainage ditches is 100cm and the total lateral width of the planting ridges is 240cm, relatively regular repeating units are formed along the width of the field. Agricultural machinery can perform sowing, fertilization, field management, or harvesting operations along the length of the field. The regular ridge-ditch combination structure helps the agricultural machinery maintain its direction of travel and reduces operational deviation caused by irregular ridge spacing.

[0044] Example 5 This embodiment provides a method for constructing a double-ridge, double-row drought-resistant and flood-drainage dryland ridge pattern, which is used to form a double-ridge, double-row drought-resistant and flood-drainage dryland ridge pattern in any of the embodiments 1 to 4.

[0045] The construction method includes the following steps: First, determine the ridge direction along the length of the field. When determining the ridge direction, you can take into account the topography of the field, the location of the drainage ditch at the edge of the field, and the main operating direction of medium and large agricultural machinery, so that the ridge direction is compatible with the field drainage direction and the direction of agricultural machinery travel.

[0046] Secondly, the field is divided into multiple repeating ridge units along its width, so that each ridge unit forms a planting ridge area with a total lateral width of 240cm. When dividing, the field width is used as the lateral reference, and the planting ridge areas are arranged with a width of 240cm, and the planting ridge areas extend continuously along the length of the field.

[0047] Next, within each planting ridge area, two planting ridges are formed at intervals along the width of the field, and a first furrow is formed between the two planting ridges. The first furrow has a transverse width of 60 cm and extends along the length of the field. Preferably, the transverse width of each planting ridge is 40 cm, and the two planting ridges are located on either side of the first furrow.

[0048] Then, a drainage ditch with a total transverse width of 100cm is formed between two adjacent ridge units, and a drainage ditch is excavated within the drainage ditch. When excavating the drainage ditch, the transverse width of the drainage ditch is made greater than the transverse width of the first ridge furrow. Preferably, a drainage ditch with a bottom width of 80cm and a depth of 40cm is excavated within the drainage ditch, and the drainage ditch extends continuously along the length of the field and connects with the field head drainage ditch.

[0049] Finally, at least part of the soil obtained from excavating the drainage ditch is backfilled onto the planting ridges to form a mound layer. During backfilling, the excavated soil is spread on both planting ridges and shaped into ridges suitable for crop planting, ensuring that the planting ridges are higher than the bottom of the first furrow and the drainage ditch. During shaping, ridge slopes are simultaneously formed on the sides of the planting ridges, with the slopes on either side of the first furrow extending towards the bottom of the first furrow, and the slopes on either side of the drainage ditch extending towards the bottom of the drainage ditch.

[0050] Using the above construction method, a ridge-ditch combination structure with multiple planting ridges and multiple drainage ditches arranged alternately along the width of the field can be formed. In this structure, two planting ridges are used to form double-row planting, the first ridge ditch is used to separate the two planting ridges and can accommodate water pipes, the drainage ditches are used for centralized drainage along the length of the field, and the soil layer is used to increase the height of the planting ridges. Thus, those skilled in the art can implement this double-ridge, double-row drought-resistant and flood-drainage dryland ridge type in dryland fields according to the above steps.

[0051] Obviously, the above-described embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention also intends to include these modifications and variations.

Claims

1. A double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields, characterized in that, The system comprises multiple ridge units extending along the length of the field and repeating along the width of the field. Each ridge unit includes a planting ridge area with a total lateral width of 240 cm. Within the planting ridge area, two planting ridge surfaces are formed at intervals along the width of the field, and a first furrow is located between the two planting ridge surfaces. The first furrow has a lateral width of 60 cm. A drainage ditch is provided between two adjacent ridge units, and the total lateral width of the drainage ditch is 100 cm. A drainage channel is formed within the drainage channel, and the lateral width of the drainage channel is greater than the lateral width of the first furrow. A soil layer formed by excavating the drainage channel is provided on the planting ridge surface, so that the planting ridge surface is higher than the bottom of the first furrow and the bottom of the drainage channel.

2. The double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields according to claim 1, characterized in that, The drainage ditch has a bottom width of 80cm and a depth of 40cm.

3. The double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields according to claim 1, characterized in that, The transverse width of each planting ridge is 40cm.

4. The double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields according to claim 1, characterized in that, The planting ridge surface is provided with ridge slopes on the sides. The ridge slopes on both sides of the first ridge furrow extend slopingly towards the bottom of the first ridge furrow, and the ridge slopes on both sides of the drainage ditch extend slopingly towards the bottom of the drainage ditch.

5. A double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields according to claim 1, characterized in that, The drainage ditch extends continuously along the length of the field and connects with the field head drainage ditch.

6. The double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields according to claim 1, characterized in that, A water pipe is installed in the first furrow, and the water pipe is arranged along the extension direction of the planting ridge surface.

7. A double-ridge, double-row drought-resistant and flood-drainage ridge type for dryland fields according to claim 1, characterized in that, Multiple ridge units and multiple drainage ditches are arranged alternately along the width of the field to form a ridge-ditch combination structure suitable for medium and large agricultural machinery to operate along the length of the field.

8. A method for constructing a double-ridge, double-row drought-resistant and flood-drainage ridge pattern for dryland fields, characterized in that, Includes the following steps: Determine the ridge direction along the length of the field; Divide the field into multiple repeating ridge units along the width of the field, so that each ridge unit forms a planting ridge area with a total lateral width of 240cm, and within the planting ridge area, form two planting ridge surfaces arranged at intervals along the width of the field. A first furrow with a transverse ditch width of 60cm is formed between the two planting ridges; A drainage ditch with a total transverse width of 100cm is formed between two adjacent ridge units; Excavate a drainage ditch within the drainage channel, ensuring that the transverse width of the drainage ditch is greater than the transverse width of the first furrow. At least part of the soil obtained from excavating the drainage ditch is backfilled and laid on the planting ridge to form a soil mound, so that the planting ridge is higher than the bottom of the first ditch and the bottom of the drainage ditch.

9. The method for constructing a double-ridge, double-row drought-resistant and flood-drainage dryland ridge type according to claim 8, characterized in that, The drainage ditch, with a bottom width of 80cm and a depth of 40cm, is excavated within the drainage channel and extends continuously along the length of the field, connecting with the field head drainage ditch.

Images