A hybrid photolithography template

Abstract

This invention relates to the fields of micro / nano fabrication and photolithography, and discloses a hybrid photolithography template, including a body, a light-transmitting elastic deformation region disposed on the body, and a nanoimprint pattern region and a mask region disposed on the light-transmitting elastic deformation region. The out-of-plane bending stiffness of the light-transmitting elastic deformation region is less than the out-of-plane bending stiffness of the body region adjacent to the light-transmitting elastic deformation region, and the light-transmitting elastic deformation region can undergo out-of-plane deformation under the action of a driving load. With this structure, the nanoimprint pattern region and the mask region are integrated within the same light-transmitting elastic deformation region, and by utilizing the stiffness difference between the light-transmitting elastic deformation region and the surrounding body, the nanoimprint pattern region and the mask region can form different working states according to the out-of-plane deformation of the light-transmitting elastic deformation region. This provides a unified template structure for both nanoimprinting and mask lithography pattern transfer methods, which helps to reduce the switching between different templates and improves the process integration and processing efficiency of photolithography.

Description

Technical Field

[0001] This invention relates to the fields of micro-nano fabrication and photolithography, and in particular to a hybrid photolithography template based on elastic deformation to achieve nanoimprint pattern transfer and mask exposure pattern transfer. Background Technology

[0002] Nanoimprint lithography transfers micro- and nanostructures from a template to a target substrate through contact between the template and the target substrate. It features high resolution, relatively simple process flow, and suitability for large-area pattern replication.

[0003] On the other hand, mask lithography techniques such as contact lithography and proximity lithography typically utilize a mask structure with light-blocking and light-transmitting areas to transfer a predetermined pattern to a target substrate through exposure.

[0004] Existing nanoimprint stencils and photomask stencils are typically designed for different pattern transfer methods. Nanoimprint stencils mainly feature raised patterns for forming micro / nano structures, while photomask stencils mainly feature mask patterns consisting of light-blocking and light-transmitting areas. When the same processing requires both nanoimprinting and photomask exposure pattern transfer, different stencils or different processing stations are usually required, which greatly increases the complexity of equipment structure, stencil switching, and process technology.

[0005] To reduce the switching between different templates, it is also possible to integrate the nanoimprint pattern and the mask pattern onto the same transparent template to form a hybrid lithography template that simultaneously performs nanoimprinting and mask exposure functions. However, if a traditional rigid transparent template structure is used, the template as a whole and its pattern-bearing area usually have high out-of-plane bending stiffness, making it difficult to change the spatial positional relationship and contact state between different pattern areas and the target substrate through local deformation of the template itself during processing. When the nanoimprint pattern area and the mask area have different requirements for the working state between the template and the target substrate, it is difficult to meet the working requirements of different pattern areas by adjusting the shape of the same template, thus limiting the application of hybrid lithography templates in different pattern transfer modes. Summary of the Invention

[0006] The present invention aims to provide a hybrid photolithography template to solve the problem that existing rigid transparent templates, when accommodating both nanoimprint pattern transfer and mask exposure pattern transfer, are unable to adjust the spatial positional relationship and working state between different pattern regions and the target substrate through local morphological changes of the template itself.

[0007] To achieve the above objectives, the present invention adopts the following technical solution: A hybrid photolithography template includes a body, a light-transmitting elastic deformation region disposed on the body, and a nanoimprint pattern region and a mask region disposed on the light-transmitting elastic deformation region; the out-of-plane bending stiffness of the light-transmitting elastic deformation region is less than the out-of-plane bending stiffness of the body region adjacent to the light-transmitting elastic deformation region, and the light-transmitting elastic deformation region undergoes out-of-plane deformation under the action of an external driving load.

[0008] When the light-transmitting elastic deformation region undergoes out-of-plane deformation to varying degrees, the contact state and / or working distance between the nanoimprinted pattern region and the mask region relative to the target substrate changes.

[0009] The nanoimprinted pattern area includes a nanoscale protrusion structure disposed on the surface of the light-transmitting elastic deformation area, and the mask area includes a light-shielding layer disposed on the light-transmitting elastic deformation area.

[0010] The light-transmitting elastic deformation zone is formed by locally thinning the body.

[0011] The light-transmitting elastic deformation zone is a light-transmitting elastic film installed on the main body.

[0012] The main body has a through hole, and the light-transmitting elastic film covers one end of the through hole, with the edge of the light-transmitting elastic film fixedly connected to the main body.

[0013] The light-transmitting elastic film includes a light-transmitting elastic base film and a functional film layer disposed on at least one side of the light-transmitting elastic base film.

[0014] The functional film layer includes at least one of a metal film layer, a dielectric film layer, a stress-regulating film layer, and a protective film layer.

[0015] The body includes a boundary constraint structure that is disposed around and connected to the light-transmitting elastic deformation zone.

[0016] The boundary constraint structure includes an annular rigid transition zone surrounding the light-transmitting elastic deformation zone, wherein the out-of-plane bending stiffness of the annular rigid transition zone is greater than the out-of-plane bending stiffness of the light-transmitting elastic deformation zone.

[0017] In summary, this application contains at least one of the following beneficial technical effects: 1. By setting the nanoimprint pattern area and the mask area in the same light-transmitting elastic deformation area, the same template can simultaneously have a pattern structure for both nanoimprint pattern transfer and mask exposure pattern transfer. This provides a unified template carrier for the two pattern transfer methods, which helps to reduce the switching between different templates and improve the process integration and processing efficiency of photolithography.

[0018] 2. The out-of-plane bending stiffness of the light-transmitting elastic deformation zone is less than that of the body region adjacent to the light-transmitting elastic deformation zone. It can generate out-of-plane deformation under the action of driving load, thereby adjusting the spatial position relationship and / or contact state of the nanoimprint pattern area and the mask area relative to the target substrate, providing a structural basis for forming the corresponding pattern transfer working state according to different processing requirements.

[0019] 3. The light-transmitting elastic deformation zone is supported by the outer body, and its edges can be constrained by the outer body. This helps to reduce the undesirable in-plane displacement generated during the out-of-plane deformation of the light-transmitting elastic deformation zone, thereby helping to maintain the positional relationship between the nanoimprint pattern area and the mask area and improve the positional consistency of the pattern transfer. Attached Figure Description

[0020] Figure 1a This is a schematic diagram of the hybrid photolithography template structure in Embodiment 1 of this application.

[0021] Figure 1b for Figure 1a A schematic diagram of the bottom surface.

[0022] Figure 1c for Figure 1a A schematic diagram of the structure when the light-transmitting elastic deformation zone undergoes out-of-plane deformation.

[0023] Figure 2a This is a schematic diagram of the structure of the light-transmitting elastic deformation zone before it comes into contact with the anti-corrosion layer in Embodiment 1 of this application.

[0024] Figure 2b for Figure 2a A schematic diagram of the structure when the light-transmitting elastic deformation zone is partially bonded to the anti-corrosion layer.

[0025] Figure 2c for Figure 2b A schematic diagram of the structure when the light-transmitting elastic deformation zone is completely bonded to the anti-corrosion layer.

[0026] Figure 2d This is a schematic diagram of the structure under proximity lithography in Embodiment 1 of this application.

[0027] Figure 3a This is a schematic diagram of the hybrid photolithography template structure in Embodiment 2 of this application.

[0028] Figure 3b for Figure 3a A schematic diagram of the bottom surface.

[0029] Figure 3c for Figure 3a A schematic diagram of the structure when the light-transmitting elastic deformation zone undergoes out-of-plane deformation.

[0030] Figure 4aThis is a schematic diagram of the hybrid photolithography template structure in Embodiment 3 of this application.

[0031] Figure 4b for Figure 4a A schematic diagram of the bottom surface.

[0032] Figure 4c for Figure 4a A schematic diagram of the structure when the light-transmitting elastic deformation zone comes into contact with the anti-corrosion layer.

[0033] Figure 4d This is a schematic diagram of another embodiment in Embodiment 3 of this application.

[0034] Figure 4e for Figure 4d A schematic diagram of the structure when the driver is circumferentially mounted. Detailed Implementation

[0035] The present invention will be further described below with reference to the accompanying drawings and embodiments. It should be noted that in the description of the present invention, terms such as "upper," "lower," "left," "right," "inner," and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are used only for the convenience of describing the present invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific manner. Therefore, they should not be construed as limitations on the present invention. Terms such as "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0036] Example 1

[0037] Combination Figures 1a to 2c As shown, the present invention provides a hybrid photolithography template, which includes a body 11, a light-transmitting elastic deformation region 12 disposed on the body 11, and a nanoimprint pattern region 121 and a mask region 122 disposed on the light-transmitting elastic deformation region 12. The out-of-plane bending stiffness of the light-transmitting elastic deformation region 12 is less than the out-of-plane bending stiffness of the body adjacent to the light-transmitting elastic deformation region 12, and the light-transmitting elastic deformation region 12 can generate out-of-plane deformation under the action of driving load.

[0038] The hybrid photolithography template designed with this structure has a nanoimprint pattern area 121 and a mask area 122 located within the same light-transmitting elastic deformation area 12. Since the out-of-plane bending stiffness of the light-transmitting elastic deformation area 12 is less than that of the body 11 adjacent to the light-transmitting elastic deformation area 12, the stiffness difference between the light-transmitting elastic deformation area 12 and the surrounding body 11 can be used to drive the elastic deformation area to undergo out-of-plane deformation through the driving load. This allows the nanoimprint pattern area 121 and the mask area 122 located in the elastic deformation area to form different working states as the light-transmitting elastic deformation area 12 undergoes out-of-plane deformation. This provides a unified template carrier for the two pattern transfer methods, which helps to reduce the switching between different templates and improves the process integration and processing efficiency of photolithography.

[0039] The aforementioned body 11 can be made of quartz glass, ultra-low expansion glass, or other light-transmitting materials suitable for photolithography. In this embodiment, the body 11 is preferably made of quartz glass, and the aforementioned light-transmitting elastic deformation region 12 is formed by locally thinning the middle part of the body 11. Since the body 11 region surrounding the light-transmitting elastic deformation region 12 has a large thickness and high out-of-plane bending stiffness, when the light-transmitting elastic deformation region 12 undergoes out-of-plane deformation, its outer body can form a boundary constraint effect on the edge of the light-transmitting elastic deformation region 12, thereby suppressing the in-plane displacement of the light-transmitting elastic deformation region 12 and effectively limiting the undesirable in-plane displacement of the light-transmitting elastic deformation region 12 and its nanoimprinted pattern region 121 and mask region 122.

[0040] As a supplement, the aforementioned driving load can be applied by a driving mechanism disposed outside the hybrid lithography template to drive the elastic deformation zone to produce out-of-plane deformation. The specific form of the aforementioned driving mechanism can be set according to the actual equipment structure, and this embodiment does not impose specific limitations on it.

[0041] Furthermore, the nanoimprinted pattern area 121 and mask area 122 disposed in the elastic deformation region 12 can be processed by etching, deposition, patterning, etc., to form micro-nano-scale protrusions 1211 in the nanoimprinted pattern area 121. The light-shielding layer 1221 can be disposed on the surface of the light-transmitting elastic deformation region 12, and according to the specific pattern design, it can be located in the area surrounding the nanoimprinted pattern area 121, adjacent to the nanoimprinted pattern area 121, or cover the end face of the protrusions 1211 in the nanoimprinted pattern area 121 to form a corresponding mask pattern. With the above settings, the resist layer 22 on the target substrate 21 can be selectively exposed using the mask area 122, and the pattern transfer of the predetermined area can be achieved by combining subsequent development, etching, and other processes.

[0042] Furthermore, this embodiment takes the spacing of the nanoimprinted pattern area 121 and the mask area 122 as an example. By presetting the surface positions of the nanoimprinted pattern area 121 and the mask area 122, when the light-transmitting elastic deformation area 12 undergoes out-of-plane deformation under the action of the driving load, the nanoimprinted pattern area 121 and the mask area 122 form different contact states relative to the target substrate 21.

[0043] Specifically, in combination Figures 2a to 2c As shown, in one embodiment, the nanoimprinted pattern area 121 is disposed in the middle of the light-transmitting elastic deformation area 12, and the mask area 122 is disposed adjacent to the nanoimprinted pattern area 121 and located on the same working surface of the light-transmitting elastic deformation area 12. The nanoimprinted pattern area 121 is formed by a nanoscale protrusion structure 1211 disposed on the working surface, and the mask area 122 is formed by a light-shielding layer 1221 disposed on the working surface.

[0044] When the light-transmitting elastic deformation region 12 undergoes out-of-plane deformation toward the target substrate 21 under the action of the driving load, the pattern structure of the nanoimprint pattern region 121 first contacts the resist layer 22 on the target substrate 21. By further adjusting the driving load, the nanoimprint pattern region 121 and the resist layer 22 form a contact state suitable for imprint pattern transfer. Subsequently, by continuing to adjust the out-of-plane deformation state of the light-transmitting elastic deformation region 12, the mask region 122 gradually approaches the target substrate 21 and forms a contact working state with the target substrate 21, thereby realizing the nanoimprint pattern transfer and the mask exposure pattern transfer respectively.

[0045] Similarly, it can also be like Figure 2d As shown, when the light-transmitting elastic deformation region 12 and the resist layer 22 on the target substrate 21 below are in a parallel state, the lower resist layer 22 is subjected to proximity lithography by adjusting the distance t between the mask region 122 and the resist layer 22.

[0046] It should be understood that the contact sequence and specific working state of the nanoimprint pattern area 121 and the mask area 122 can be adjusted according to their surface positions, pattern structures and the deformation direction of the light-transmitting elastic deformation area 12. This embodiment does not impose specific limitations on this.

[0047] With the above structure, the out-of-plane deformation of the light-transmitting elastic deformation region 12 can be used to adjust the working state of the nanoimprint pattern region 121 and the mask region 122 relative to the target substrate 21 in the same template structure, so that the nanoimprint pattern transfer and the mask exposure pattern transfer can be realized on the same hybrid lithography template.

[0048] Compared with using separate nanoimprint templates and masks, this method reduces the operational process of template replacement and repositioning, and improves the positional consistency and process integration between different pattern transfer processes.

[0049] Meanwhile, by constraining the edges of the translucent elastic deformation region 12 by the body 11 surrounding it, the unwanted in-plane displacement generated by the translucent elastic deformation region 12 during out-of-plane deformation can be suppressed, which is beneficial to maintaining the relative positional stability of the nanoimprint pattern region 121 and the mask region 122.

[0050] Example 2

[0051] Combination Figures 3a to 3c As shown, unlike the above embodiments, the light-transmitting elastic deformation zone in this embodiment is formed by a light-transmitting elastic film 22 independently disposed on the body 21. The light-transmitting elastic film 22 includes a light-transmitting elastic base film and a functional film layer disposed on at least one side of the light-transmitting elastic base film. The functional film layer includes at least one of a metal film layer, a dielectric film layer, a stress-adjusting film layer, and a protective film layer.

[0052] The body 21 is provided with a through hole 211 corresponding to the light-transmitting elastic diaphragm 22. The light-transmitting elastic diaphragm 22 covers one end of the through hole 211 and is connected or fixed to the body 21 through its edge. In one embodiment, the edge of the light-transmitting elastic diaphragm 22 can be fixed to the body 21. Specifically, it can be fixed by a pressure ring, a clamping member, a snap-fit ​​structure, an adhesive structure or other connection structures suitable for achieving edge fixation.

[0053] Since the out-of-plane bending stiffness of the light-transmitting elastic diaphragm 22 is less than that of the body 21, when the driving load is applied to the light-transmitting elastic diaphragm 22, the light-transmitting elastic diaphragm 22 can produce out-of-plane elastic deformation. The body 21 is mainly used to maintain the overall structural stability of the template and to provide support and constraint for the edge of the light-transmitting elastic diaphragm 22, so that the main deformation area of ​​the light-transmitting elastic diaphragm 22 is located in the area corresponding to the through hole 211 of the body 21.

[0054] The through-hole 211 can be circular, rectangular, elliptical, or other shapes depending on the shape of the light-transmitting elastic diaphragm 22 and the arrangement of the nanoimprint pattern area 221 and the mask area 222. The edge fixing structure of the light-transmitting elastic diaphragm 22 can constrain the in-plane displacement of the light-transmitting elastic diaphragm 22, while allowing the light-transmitting elastic diaphragm 22 to undergo elastic deformation in the out-of-plane direction.

[0055] Functional layers can be configured according to the optical, mechanical, and technological performance requirements of the light-transmitting elastic film 22. For example, metallic layers can be used to form a light-shielding structure and / or adjust the mechanical and thermal properties of the film; dielectric layers can be used to adjust optical transmittance, reflection, or insulation properties; stress-adjusting layers can be used to adjust the residual stress and initial surface shape of the light-transmitting elastic film 22; and protective layers can be used to improve the wear resistance, corrosion resistance, and environmental stability of the light-transmitting elastic film 22. Functional layers can be disposed on the side of the light-transmitting elastic base film facing the target substrate, the side facing away from the target substrate, or both sides of the light-transmitting elastic base film.

[0056] The aforementioned functional film layers can be set individually or in combination as needed. The material, thickness, number of layers, and arrangement of each functional film layer can be adjusted according to the specific application requirements of the light-transmitting elastic film 22. This embodiment does not impose specific limitations on these aspects. The specific structure of the functional film layers is not limited to the examples described above; any structure that meets the corresponding optical, mechanical, thermal, or technological performance requirements of the light-transmitting elastic film 22 can be used.

[0057] The nanoimprinted pattern area 221 and the mask area 222 are disposed on the working side of the light-transmitting elastic film 22 and can undergo out-of-plane deformation with the light-transmitting elastic film 22. The nanoimprinted pattern area 221 can be formed on the surface of the light-transmitting elastic base film or on the surface of the functional film layer, and includes nanoscale protrusion structures; the mask area 222 can be formed by a light-shielding layer disposed on the surface of the light-transmitting elastic base film and / or the functional film layer.

[0058] When the light-transmitting elastic film 22 undergoes out-of-plane deformation under the driving load, the nanoimprint pattern area 221 and the mask area 222 disposed on it undergo corresponding out-of-plane displacement and morphological changes with the light-transmitting elastic film 22, thereby forming different contact states relative to the target substrate, and are respectively used for nanoimprint pattern transfer and mask exposure pattern transfer.

[0059] By employing the above structure, and setting the light-transmitting elastic deformation zone as an independent light-transmitting elastic film 22, and using the body 21 with through holes 211 to clamp and fix the edge of the light-transmitting elastic film 22, an independent elastic deformation zone can be provided for the light-transmitting elastic film 22 while maintaining the overall rigidity of the body 21. This allows the light-transmitting elastic film 22 to undergo out-of-plane deformation under driving loads. This structure facilitates the selection of materials, thicknesses, and structural parameters of the light-transmitting elastic film 22 and the body 21 according to actual processing requirements, thereby improving the structural design flexibility and manufacturing adaptability of the hybrid photolithography template.

[0060] Example 3

[0061] Combination Figures 4a to 4cAs shown, unlike the above embodiments, this embodiment provides an annular rigid transition zone 32 around the light-transmitting elastic deformation zone 33 to further constrain the boundary of the light-transmitting elastic deformation zone 33.

[0062] The hybrid photolithography template of this embodiment includes a body 31, a light-transmitting elastic deformation region 33 disposed on the body 31, a nanoimprint pattern region 331 and a mask region 332 disposed on the light-transmitting elastic deformation region 33, and a boundary constraint structure disposed around the light-transmitting elastic deformation region 33. The edge of the light-transmitting elastic deformation region 33 is connected to the boundary constraint structure.

[0063] In this embodiment, the boundary constraint structure includes an annular rigid transition region 32 surrounding the light-transmitting elastic deformation region 33. The annular rigid transition region 32 is located around the light-transmitting elastic deformation region 33 and is connected to the outer body 31. The out-of-plane bending stiffness of the annular rigid transition region 32 is greater than that of the light-transmitting elastic deformation region 33, thereby forming an annular structural region with higher out-of-plane bending stiffness between the light-transmitting elastic deformation region 33 and the outer body 31.

[0064] The annular rigid transition zone 32 can be integrally formed with the light-transmitting elastic deformation zone 33 and the main body 31, or it can be a separate annular structural component set around the light-transmitting elastic deformation zone 33 and connected to adjacent structures by bonding, bonding, mechanical connection or other appropriate connection methods. The annular rigid transition zone 32 can be formed of the same or different materials as the light-transmitting elastic deformation zone 33, and its specific width, thickness and structural form can be set according to the size of the light-transmitting elastic deformation zone 33 and the expected deformation state.

[0065] When a driving load is applied to the translucent elastic deformation zone 33, because the out-of-plane bending stiffness of the translucent elastic deformation zone 33 is less than that of the annular rigid transition zone 32, the translucent elastic deformation zone 33 can undergo out-of-plane deformation under the driving load. The annular rigid transition zone 32 provides circumferential support to the edge of the translucent elastic deformation zone 33. Compared to a structure where the translucent elastic deformation zone 33 is directly connected to the outer body 31, by setting the annular rigid transition zone 32, a boundary region with a predetermined structural stiffness can be added between the translucent elastic deformation zone 33 and the outer body 31, thereby providing further structural adjustment space for the boundary constraint of the translucent elastic deformation zone 33.

[0066] In this embodiment, both the nanoimprinted pattern region 331 and the mask region 332 are disposed within the light-transmitting elastic deformation region 33. When the light-transmitting elastic deformation region 33 undergoes out-of-plane deformation, the nanoimprinted pattern region 331 and the mask region 332 change their spatial positions accordingly, forming different contact states relative to the target substrate 21. The annular rigid transition region 32 provides circumferential support to the edge of the light-transmitting elastic deformation region 33, which helps maintain the structural stability of the boundary of the light-transmitting elastic deformation region 33 and helps reduce the impact of undesirable in-plane displacement during out-of-plane deformation on the relative positions of the nanoimprinted pattern region 331 and the mask region 332.

[0067] Therefore, this embodiment establishes a designable structural relationship between the out-of-plane deformation capability of the light-transmitting elastic deformation region 33 and its boundary constraints by setting an annular rigid transition region 32 between the light-transmitting elastic deformation region 33 and the outer body 31. This enables the light-transmitting elastic deformation region 33 to maintain the required out-of-plane deformation while improving its boundary support stability, thereby providing a structural basis for maintaining the predetermined relative positional relationship between the nanoimprint pattern region 331 and the mask region 332 under different working conditions.

[0068] Furthermore, combining Figures 4d to 4e As shown, in another preferred embodiment, in order to further adjust the constraint state of the annular rigid transition zone 32 on the edge region of the light-transmitting elastic deformation zone 33, and thus adjust the out-of-plane deformation shape of the light-transmitting elastic deformation zone 33, multiple actuators 34 can be arranged circumferentially between the body 31 and the annular rigid transition zone 32.

[0069] The actuator 34 is connected to the annular rigid transition zone 32 and is used to apply an adjustable driving force to the annular rigid transition zone 32, thereby changing the constraint state of the annular rigid transition zone 32 and thus changing the boundary constraint effect of the annular rigid transition zone 32 on the edge region of the light-transmitting elastic deformation zone 33.

[0070] The actuator 34 may include a piezoelectric actuator, a micro-displacement actuator, an electromagnetic actuator, or other drive structures capable of generating controllable displacement and / or driving force. In one embodiment, a plurality of actuators 34 are arranged circumferentially along the annular rigid transition region 32 and are respectively connected to different circumferential positions of the annular rigid transition region 32; by adjusting the driving amount of the actuators 34 at different positions, the constraint state of different regions of the annular rigid transition region 32 can be changed.

[0071] When multiple actuators 34 drive synchronously, the annular rigid transition zone 32 can form a basically uniform boundary adjustment effect, and the light-transmitting elastic deformation zone 33 can produce a relatively symmetrical out-of-plane deformation. When different actuators 34 in different positions use different driving amounts, the constraint conditions of different edge areas of the light-transmitting elastic deformation zone 33 can be adjusted, thereby adjusting the out-of-plane deformation shape of the light-transmitting elastic deformation zone 33.

[0072] With the above settings, the deformation state of the light-transmitting elastic deformation region 33 can be actively adjusted according to the working requirements of the nanoimprinted pattern region 331 and the mask region 332, so that the nanoimprinted pattern region 331 and the mask region 332 form a predetermined contact state and / or working distance relative to the target substrate.

[0073] The preferred embodiments of the present invention have been described in detail above. It should be understood that those skilled in the art can make numerous modifications and variations based on the concept of the present invention without creative effort. Therefore, all technical solutions that can be obtained by those skilled in the art based on the concept of the present invention through logical analysis, reasoning, or limited experimentation on the basis of existing technology should be within the scope of protection defined by the claims.

Claims

1. A hybrid photolithography template, characterized in that, It includes a body, a light-transmitting elastic deformation region disposed on the body, and a nanoimprinted pattern region and a mask region disposed on the light-transmitting elastic deformation region; the out-of-plane bending stiffness of the light-transmitting elastic deformation region is less than the out-of-plane bending stiffness of the body region adjacent to the light-transmitting elastic deformation region, and the light-transmitting elastic deformation region undergoes out-of-plane deformation under the action of an external driving load.

2. The hybrid photolithography template according to claim 1, characterized in that, When the light-transmitting elastic deformation region undergoes out-of-plane deformation to varying degrees, the contact state and / or working distance between the nanoimprinted pattern region and the mask region and the target substrate change.

3. The hybrid photolithography template according to claim 1, characterized in that, The nanoimprinted pattern area includes a nanoscale protrusion structure disposed on the surface of the light-transmitting elastic deformation area, and the mask area includes a light-shielding layer disposed on the light-transmitting elastic deformation area.

4. A hybrid photolithography template according to claim 1, characterized in that, The light-transmitting elastic deformation zone is formed by locally thinning the body.

5. A hybrid photolithography template according to claim 1, characterized in that, The light-transmitting elastic deformation zone is a light-transmitting elastic membrane installed on the main body.

6. A hybrid photolithography template according to claim 5, characterized in that, The main body has a through hole, and the light-transmitting elastic film covers one end of the through hole, with the edge of the light-transmitting elastic film fixedly connected to the main body.

7. A hybrid photolithography template according to claim 5, characterized in that, The light-transmitting elastic film includes a light-transmitting elastic base film and a functional film layer disposed on at least one side of the light-transmitting elastic base film.

8. A hybrid photolithography template according to claim 7, characterized in that, The functional film layer includes at least one of a metal film layer, a dielectric film layer, a stress-regulating film layer, and a protective film layer.

9. A hybrid photolithography template according to claim 1, characterized in that, The body includes a boundary constraint structure that is disposed around and connected to the light-transmitting elastic deformation zone.

10. A hybrid photolithography template according to claim 9, characterized in that, The boundary constraint structure includes an annular rigid transition zone surrounding the light-transmitting elastic deformation zone, wherein the out-of-plane bending stiffness of the annular rigid transition zone is greater than the out-of-plane bending stiffness of the light-transmitting elastic deformation zone.

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