Reticle support for reducing wear in a reticle container

Abstract

A photomask support for use in a photomask container is provided for wear reduction. The photomask support has a proximal end received in a base plate. A photomask contact area at the distal end of the photomask support body contacts the photomask to suspend the photomask from the base plate. The photomask support body allows the distal end of the photomask support body to move laterally relative to the base plate together with the photomask to prevent the photomask contact area of ​​the photomask support from sliding on the photomask surface and scratching the photomask surface.

Description

Technical Field

[0001] This disclosure relates to a photomask support for use in a photomask container and a photomask container, such as a photomask box, containing such a photomask support. Background Technology

[0002] A photomask (e.g., a photomask used for extreme ultraviolet (EUV) lithography) can be held within a photomask container by a contact member. Abrasion can occur at the contact interface between the support member and the photomask. When abrasion affects the contact interface, the photomask surface can be scratched (e.g., at least part of the photomask's coating can be damaged) and particulate material can be generated, which can further contaminate or damage the photomask. Summary of the Invention

[0003] This disclosure relates to a photomask support for use in a photomask container and a photomask container, such as a photomask housing, including such photomask contacts. Particulate contamination and / or damage to the surface of the photomask can be suppressed by reducing wear at the interface between the photomask housed within the photomask container and the photomask support.

[0004] In one embodiment, a device includes a photomask housing. The photomask housing has a base plate and one or more photomask supports. At least one of the photomask supports includes a photomask support body extending vertically from its proximal end to its distal end, and a photomask contact area at the distal end of the photomask support body. The proximal end is received in the base plate. The distal end of the photomask support body protrudes from the base plate, and the photomask support body is configured to allow the photomask support body to move relative to the base plate in a direction coplanar with the base plate within a range from about 10 micrometers to about 100 micrometers.

[0005] In one embodiment, a method is provided for accommodating a photomask using a photomask cassette. The photomask cassette includes a base plate and a cover for receiving the photomask. The method includes providing one or more photomask supports. At least one of the photomask supports includes a photomask support body extending vertically from its proximal end to its distal end. The proximal end is received in the base plate. The method further includes causing a photomask contact area at the distal end of the photomask support body to contact the surface of the photomask to suspend the photomask from the base plate when pressure is applied. The distal end of the photomask support body protrudes from the base plate, and the photomask support body is configured to allow the distal end of the photomask support body, together with the photomask, to move relative to the base plate in a direction coplanar with the base plate within a range from about 10 micrometers to about 100 micrometers to prevent the photomask contact area of ​​the photomask support from sliding on the photomask surface and scratching the surface of the photomask when pressure is applied.

[0006] In one embodiment, the photomask support body is configured to allow the distal end of the photomask support body to move relative to the base plate in a direction coplanar with the base plate within a range of about 20 micrometers to about 50 micrometers to prevent the photomask contact area of ​​the photomask support from sliding on the photomask surface and scratching the surface of the photomask when the pressure is applied.

[0007] In one embodiment, the base plate includes an aperture for receiving the proximal end of the photomask support body. In another embodiment, the proximal end of the photomask support body forms a pivot joint with the bottom surface of the aperture. In yet another embodiment, a sealing mechanism is disposed at the opening of the aperture to surround the distal end of the photomask support body.

[0008] In one embodiment, the photomask support body has a first dimension along a first direction coplanar with the base plate and a second dimension along a second direction coplanar with the base plate, wherein the first dimension is larger than the second dimension.

[0009] In one embodiment, the photomask support body includes a middle portion having a dimension along a direction coplanar with the base plate, the dimension of the middle portion being smaller than the dimension of the distal end.

[0010] In an embodiment, the one or more photomask supports include one or more relatively flexible pins having a first dimension in a direction coplanar with the base plate and one or more relatively rigid pins having a second dimension in a direction coplanar with the base plate, the second dimension being larger than the first dimension. Attached Figure Description

[0011] Figure 1A A photomask container according to an embodiment is shown.

[0012] Figure 1B yes Figure 1A A top view of the bottom plate of the photomask container.

[0013] Figure 2 A cross-sectional view of a photomask support member received in the base plate of a photomask box according to an embodiment is shown.

[0014] Figure 3 A cross-sectional view of a photomask support member received in the base plate of a photomask box according to an embodiment is shown.

[0015] Figure 4 A cross-sectional view of a photomask support member received in the base plate of a photomask box according to an embodiment is shown.

[0016] Figure 5 Demonstration according to some embodiments Figures 2 to 4 Top view of the photomask support. Detailed Implementation

[0017] This disclosure relates to photomask contacts for use in photomask containers and photomask containers, such as photomask boxes, containing such photomask contacts.

[0018] As used herein, a “photomask contact area” is an area of ​​a photomask contact configured to face the photomask when the photomask is placed in a photomask container containing the photomask contact. As used herein, at least some of the photomask contact areas are accessible to the photomask when the photomask container is closed and the photomask is housed therein.

[0019] As used in this article, “generally vertical” means horizontal, generally horizontal, or a relative angular orientation of 60° to 120°.

[0020] As used herein, a "wear reduction feature" refers to a feature provided on and / or disposed in the photomask contact surface, the wear reduction feature being configured to reduce the incidence of wear caused by contact between the photomask contact surface and the photomask. For example, the wear reduction feature may be any of the embodiments provided herein.

[0021] Figure 1A A photomask container or box 100 according to an embodiment is shown. The photomask box 100 includes an outer box 102, which includes a box top 104 and a box door 106. The photomask box 100 further includes an inner box 108, which includes a cover 110 and a base plate 112. One or more photomask supports 114 are disposed in the base plate 112. One or more photomask contacts 118 are disposed in the cover 110.

[0022] At least some of the photomask contacts 118 include flexible mounting bases 119, such as springs at the interface between the photomask contact 118 and the cover 110. In an embodiment, the photomask contact 118 attached to the flexible mounting base 119 may be disposed on the cover 110. In an embodiment, the photomask contact 118 attached to the flexible mounting base 119 may include springs attached to the photomask contact 118. The flexible mounting base 119 may allow the associated photomask contact 118 to be vertically movable (e.g., along the z-axis in the xyz rectangular coordinate system of FIG. 1), such as a vertically movable photomask column as in U.S. Patent No. 8,613,359, the entire contents of which are incorporated herein by reference.

[0023] The photomask 116 can be housed within the photomask housing 100. When the photomask housing 100 is assembled and the photomask 116 is housed within the photomask housing 100, the photomask support 114 and the photomask contact 118 can respectively contact the opposing surfaces 115 and 117 of the photomask 116 to suspend the photomask 116 from the base plate 112 and the cover 110.

[0024] Photomask cassette 100 is configured to house photomask 116, for example, for transporting or storing photomask 116. Photomask 116 can be any suitable photomask that can be housed within photomask cassette 100, such as a photolithographic mask. In an embodiment, photomask 116 is a photomask for extreme ultraviolet (EUV) lithography. Photomask 116 includes opposing surfaces 115 and 117 that are contacted by photomask support 114 and photomask contact 118, respectively, when photomask 116 is housed within inner casing 108 of photomask cassette 100.

[0025] The outer box 102 forms the exterior of the photomask box 100 when the photomask box 100 is fully assembled. The outer box 102 is configured to form an internal space 105 capable of receiving or accommodating the inner box 108. The outer box 102 is formed by a box top 104 and a box door 106. The box top 104 and the box door 106 may be configured to be connected to each other, for example, using a latching mechanism (not shown) or any other suitable mechanism. The box top 104 and the box door 106 may be configured such that the inner box 108 is held within the internal space 105 defined by the box top 104 and the box door 106.

[0026] The inner box 108 is a box configured to house or contain the photomask 116. The inner box 108 includes a cover 110 and a base plate 112. The inner box 108 is configured to fit within the internal space 105 of the outer box 102. When the top of the box 104 and the door 106 are connected to receive the inner box 108, pressure (e.g., from clamping force) can be applied to the inner box 108.

[0027] Each photomask support 114 is configured to attach to the base plate 112. The photomask support 114 is configured to contact the photomask 116 to hold the photomask 116 within the inner housing 108. According to some embodiments described herein, the photomask support 114 is configured to absorb at least a portion of the relative movement between the photomask 116 and the base plate 112 to reduce wear, for example, by preventing the photomask support 114 from sliding on and scratching the surface 115 of the photomask 116.

[0028] Relative movement between the photomask 116 and the base plate 112 can occur during the assembly, transport, storage, or other operations of the photomask 116 within the inner box 118 and / or the photomask housing 100. For example, when the inner box 118 is received in the outer box 102, pressure from clamping forces can be applied to the inner box 118 to cause the base plate 112 to deflect or deform. This deflection / deformation of the base plate 112 can cause relative movement between the photomask 116 and the base plate 112. The main portion of the relative movement may be coplanar with the base plate 112 (e.g., in the xy plane). It should be understood that the photomask support 14 is sufficiently rigid in the vertical direction (e.g., along the z-axis) to maintain the vertical position and / or height of the photomask 116 relative to the base plate 112. When relative movement occurs between the photomask 116 and the base plate 112, the photomask contact / support surfaces in contact with the photomask surface may slide or scratch the photomask surface and produce abrasion marks on the photomask surface.

[0029] In an embodiment, the photomask support 114 may extend from its proximal end to its distal end and is configured to allow its distal end to contact the photomask surface 115 to move with the photomask 116 after relative movement between the photomask 116 and the base plate 112 to reduce wear. For example, the photomask support 114 may have its proximal end attached to the base plate 112 and is configured to allow its distal end to move with the photomask 116 within a range in a direction generally coplanar with the base plate 112, for example, at least 10 micrometers or greater, at least 20 micrometers or greater, from about 10 micrometers to about 100 micrometers, from about 20 micrometers to about 100 micrometers, or from about 20 micrometers to about 50 micrometers.

[0030] The photomask support 114 can be made of any suitable material based on cleanliness, compatibility, toughness, and the like. According to some embodiments described herein, suitable materials can be used such that the photomask support meets at least some of the requirements described below.

[0031] Suitable materials for the photomask support may have specific material properties to minimize or reduce wear at the interface between the photomask and the photomask support housed within the photomask container. The photomask support may have a configuration (e.g., material and / or wear-reducing features) at its distal end to prevent the photomask support from sliding on and / or scratching the photomask surface. The distal end of the photomask support in contact with the photomask surface may have a coefficient of friction high enough to prevent sliding. In embodiments, the coefficient of friction between the photomask support and the photomask surface may be within a range, for example, not less than 0.2, not less than 0.25, not less than 0.3, from about 0.2 to about 1.0, from about 0.25 to about 1.0, or from about 0.3 to about 1.0.

[0032] The suitable material of the photomask support may have specific material properties to maintain the position and height of the photomask relative to the base plate. In an embodiment, when the photomask is housed within the photomask housing and in contact with the photomask support, at least one of the photomask supports may have an absolute change in its height (i.e., its length along the z-axis) of no more than 0.015 mm, no more than 0.01 mm, or no more than 0.005 mm, or a relative change of no more than 10%, no more than 8%, no more than 5%, no more than 3%, or no more than 1%.

[0033] Suitable materials for photomask supports may have specific stiffness and resistance to deflection. In embodiments, at least one of the photomask supports may have a Young's modulus within a certain range, for example, from about 3.0 GPa to about 4.5 GPa, from about 3.5 GPa to about 4.5 GPa, or from about 3.6 GPa to about 4.0 GPa.

[0034] Suitable materials for photomask supports may possess specific resistance to cracking / fracture / deformation under tension to prevent material failure and / or particle or particulate contamination. In embodiments, at least one of the photomask supports may have a tensile strength within a certain range, for example, from about 70 MPa to about 100 MPa, from about 80 MPa to about 100 MPa, or from about 90 MPa to about 100 MPa.

[0035] Non-limiting examples of materials suitable for the photomask support described herein are polyetheretherketone (PEEK) materials. Other suitable materials may include, but are not limited to, polyethyleneimine (PEI) or polyaziridinium and polyamide-imides available under the trademark Torlon from Solvay Specialty Polymers (Brussels, Belgium).

[0036] Figure 1B yes Figure 1A A top view of the base plate 112 of the photomask box 100. Figure 1B The top surface 113 of the base plate 112, which has a generally rectangular shape, is shown. Figure 1A The cover 110 is configured to rest on the top surface 113 of the base plate 112. The base plate 112 includes a plurality of photomask supports 114 attached to its top surface 113. The base plate 112 may include a sealing surface (not shown) formed on the top surface 113 and extending along the entire periphery of the base plate 112 to reduce wear between the base plate 112 and the cover 110 when the photomask housing 100 is closed. An exemplary sealing surface is described in U.S. Patent Application No. 17 / 973,170, the entire contents of which are incorporated herein by reference. Figure 1BIn the embodiments depicted herein, four photomask supports 114 are arranged adjacent to the four corners of the base plate 112. It should be understood that the embodiments described and enumerated herein are not limited to the number described. That is, the number described and enumerated herein is for descriptive purposes only and is not intended to be limiting. Examples of photomask supports 114 are shown in... Figures 2 to 5 This will be shown in further detail and described below.

[0037] Figure 2 A cross-sectional view of a photomask support 200 according to an embodiment is shown. The photomask support 200 includes a photomask support body 210 extending vertically (e.g., along the ±z-axis) from its proximal end 212 to its distal end 214. The proximal end 212 is configured to be received in a hole 202 in a base plate 112. In the depicted embodiment, the hole 202 is a through-hole for receiving the photomask support body 210. It should be understood that the hole 202 may be a recess, channel, depression, opening, or the like. The proximal end 212 may be attached to the bottom portion of the hole 202 such that the photomask support 200 is held to the base plate 112.

[0038] The photomask support 200 further includes a photomask contact area 220 at the distal end 214 of the photomask support body 210. The distal end 214 of the photomask support body 210 protrudes from the base plate 112. The photomask contact area 220 at the distal end 214 of the photomask support body 210 contacts the surface 115 of the photomask 116 to suspend the photomask 116 from the base plate 116 when the photomask 116 is received within the photomask housing and pressed against the photomask support 200 with a pressure (e.g., from a clamping force) applied to the photomask 116. After the pressure is applied, the photomask support 200 can maintain its height (i.e., its length along the z-axis) within a predetermined range, such that the vertical position and / or height of the photomask 116 relative to the base plate 112 can be maintained. That is, the photomask support body 210 can be configured such that the photomask contact area 220 is positioned at a desired location, such as a desired height, a desired position relative to the photomask 116, or the like.

[0039] The photomask support body 210 is configured to allow the distal end 214 of the photomask support body 210 to move laterally relative to the base plate 112 together with the photomask 116 to prevent the photomask contact area 220 of the photomask support 200 from sliding on and / or scratching the surface 115 of the photomask 116. When relative movement occurs between the photomask 116 and the base plate 112, the distal end 214 of the photomask support body 210 can move together with the photomask 116 in a direction that is generally coplanar with the base plate 112 (e.g., generally in the xy plane) within a certain range, for example, from about 10 micrometers to about 100 micrometers.

[0040] exist Figure 2In the embodiment depicted, the photomask support body 210 includes a central portion 216 having a lateral dimension along a direction coplanar with the base plate 112. The dimension of the central portion 216 is smaller than the dimension of the distal end 214. In other words, the photomask support body 210 includes a relatively thin central portion 216, which allows the photomask support body 210 to flex laterally within a predetermined range (e.g., laterally conforming to the photomask 116 in the xy plane) while still maintaining its rigidity vertically (e.g., along the z-axis). In embodiments, the thinner central portion 216 may have a diameter, for example, about 20% to about 80% of the diameter of the distal end 214. In embodiments, the thinner central portion 216 may have a length, for example, about 20% to about 80% of the total length of the photomask support body 210.

[0041] A sealing mechanism 230 is positioned at the opening 201 of the aperture 202 to surround the distal end 214 of the photomask support body 210. The sealing mechanism 230 is flexible and / or compressible to allow lateral movement of the distal end 214 of the photomask support body 210 relative to the base plate 112. The sealing mechanism 230 can be made of any suitable material based on cleanliness, compatibility, toughness, and the like. A non-limiting example of the sealing mechanism 230 is an O-ring. The sealing mechanism 230 prevents particles or particulate material from falling into the aperture 202. The sealing mechanism 230 may have suitable flexibility and / or compressibility to allow lateral movement of the distal end 214 together with the photomask 116 and limit this lateral movement to a range, for example, from about 10 micrometers to about 100 micrometers.

[0042] Photomask contact area 220 is the portion of photomask contact 200 configured to face photomask surface 115 when photomask support 200 is mounted in base plate 112 and photomask 116 is received within photomask container. At least some of photomask contact areas 220 are accessible to photomask surface 115 when photomask container is closed and photomask is received within. Wear-reducing features (not shown) may be provided on photomask contact areas 220 for wear reduction. Wear-reducing features may include annular protrusions or one or more elongated arcuate protrusions from photomask contact areas, one or more gaps (e.g., annular grooves) provided in photomask contact areas, or one or more gaps provided by a relatively thin region having photomask contact areas. Exemplary wear-reducing features are described in U.S. Provisional Patent Application No. 63 / 539,978, the entire contents of which are incorporated herein by reference.

[0043] Figure 3A cross-sectional view of a photomask support 300 according to an embodiment is shown. The photomask support 300 includes a photomask support body 310 extending vertically (e.g., along the ±z-axis) from its proximal end 312 to its distal end 314. The proximal end 312 is configured to be received in a hole 302 in a base plate 112. In the depicted embodiment, the hole 302 is formed in a surface 113 of the base plate 112 to receive the photomask support body 310. It should be understood that the hole 302 may be a recess, channel, recess, opening, or the like. The proximal end 312 of the photomask support 300 is attached to the bottom surface 303 of the hole 302 such that the photomask support 300 is held in place by the base plate 112.

[0044] The photomask support 300 further includes a photomask contact area 320 at the distal end 314 of the photomask support body 310. The distal end 314 of the photomask support body 310 protrudes from the base plate 112. The photomask contact area 320 at the distal end 314 of the photomask support body 310 contacts the surface 115 of the photomask 116 to suspend the photomask 116 from the base plate 116 when the photomask 116 is received within the photomask housing and pressurized against the photomask support 200. After pressure is applied, the photomask support 300 can maintain its height within a predetermined range, thereby maintaining the vertical position and / or height of the photomask 116 relative to the base plate 112. That is, the photomask support body 310 can be configured such that the photomask contact area 320 is positioned at a desired location, such as a desired height, a desired position relative to the photomask 116, or the like.

[0045] The photomask support body 310 is configured to allow the distal end 314 of the photomask support body 310 to move laterally relative to the base plate 112 to prevent the photomask contact area 320 of the photomask support 300 from sliding on and / or scratching the surface 115 of the photomask 116. When relative movement occurs between the photomask 116 and the base plate 112, the distal end 314 of the photomask support body 310 can move together with the photomask 116 in a direction that is generally coplanar with the base plate 112 (e.g., generally in the xy plane) within a certain range, for example, from about 10 micrometers to about 100 micrometers.

[0046] exist Figure 3In the illustrated embodiment, the proximal end 312 of the photomask support body 310 forms a pivot joint 313 with the bottom surface 303 of the aperture 302 to allow controlled rotational movement of the photomask support body 310 relative to the base plate 112. This controlled rotational movement allows the distal end 314 of the photomask support body 310 to move together with the photomask 116 in a direction generally coplanar with the base plate 112. In other words, the pivot joint 313 allows the photomask support body 310 to flex laterally within a predetermined range (e.g., laterally conforming to the photomask 116 in the xy plane) while remaining vertical (e.g., along the z-axis) and maintaining its rigidity. In the illustrated embodiment, the pivot joint 313 is formed by engaging a convex surface at the proximal end 312 of the photomask support body 310 and a concave surface on the bottom surface 303 of the aperture 302. It should be understood that the pivot joint 313 can be formed by any suitable mechanism (e.g., a bearing, bushing, or hole structure on the bottom surface 303) to engage with the proximal end 312 of the photomask support body 310.

[0047] A sealing mechanism 330 is positioned at the opening 301 of the aperture 302 to surround the distal end 314 of the photomask support body 310. The sealing mechanism 330 is flexible to allow lateral movement of the distal end 314 of the photomask support body 310 relative to the base plate 112. The sealing mechanism 330 can be made of any suitable material based on cleanliness, compatibility, toughness, and the like. A non-limiting example of a sealing mechanism is an O-ring. The sealing mechanism 330 prevents particles or particulate material from falling into the aperture 302. The sealing mechanism 330 may have suitable flexibility and / or compressibility to allow the photomask support body 310 to rotate about the pivot joint 313 and the distal end 314 to move laterally together with the photomask 116, limiting this lateral movement to a range, for example, from about 10 micrometers to about 100 micrometers.

[0048] The photomask contact area 320 is the portion of the photomask contact 300 configured to face the photomask surface 115 when the photomask support 300 is mounted in the base plate 112 and the photomask 116 is housed within the photomask container. At least some of the photomask contact areas 320 are accessible to the photomask surface 115 when the photomask container is closed and the photomask is housed within it. Wear-reducing features (not shown) may be provided on the photomask contact areas 320 for wear reduction.

[0049] Figure 4A cross-sectional view of a photomask support 400 according to an embodiment is shown. The photomask support 400 includes a photomask support body 410 extending from its proximal end 412 to its distal end 414 in a vertical direction (e.g., along the ±z direction). The photomask support body 410 includes a base 415 at its proximal end 412, which is configured to be received in a hole 402 in a base plate 112. The photomask support body 410 further includes a pin 417 at its distal end 414, which protrudes from an opening 401 in the hole 402. The pin 417 is connected to the base 415 of the photomask support body 410, together forming an inverted "T" shape in cross-section. In the depicted embodiment, the hole 402 is formed in a surface 113 of the base plate 112 to receive the photomask support body 410. The base 415 at the proximal end 412 of the photomask support 400 is attached to the bottom surface 403 of the hole 402, such that the photomask support 200 is held in place by the base plate 112.

[0050] The photomask support 400 further includes a photomask contact area 420 at the distal end 414 of the photomask support body 410. The distal end 414 of the photomask support body 410 protrudes from the base plate 112. The photomask contact area 420 at the distal end 414 of the photomask support body 410 contacts the surface 115 of the photomask 116 to suspend the photomask 116 from the base plate 116 when the photomask 116 is received within the photomask housing and pressed against the photomask support 200. After pressure is applied, the photomask support 400 can maintain its height within a predetermined range, thereby maintaining the position and height of the photomask 116 relative to the base plate 112. That is, the photomask support body 410 can be configured such that the photomask contact area 420 is positioned at a desired location, such as a desired height, a desired position relative to the photomask 116, or the like.

[0051] The photomask support body 410 is configured to allow the distal end 414 of the photomask support body 410 to move laterally relative to the base plate 112 to prevent the photomask contact area 420 of the photomask support 400 from sliding on and / or scratching the surface 115 of the photomask 116. When relative movement occurs between the photomask 116 and the base plate 112, the distal end 414 of the photomask support body 410 can move together with the photomask 116 in a direction that is generally coplanar with the base plate 112 (e.g., generally in the xy plane) within a certain range, for example, from about 10 micrometers to about 100 micrometers.

[0052] exist Figure 4In the embodiment depicted, the base 415 at the proximal end 412 of the photomask support body 410 includes a sliding surface 413 that engages with the bottom surface 403 of the aperture 402 to allow controlled sliding movement of the photomask support body 410 relative to the base plate 112. This controlled sliding movement allows the distal end 414 of the photomask support body 410 to move together with the photomask 116 in a direction generally coplanar with the base plate 112. In other words, the sliding engagement allows the photomask support body 410 to flex laterally within a predetermined range (e.g., laterally conforming to the photomask 116 in the xy plane) while remaining vertical (e.g., along the z-axis) and maintaining its rigidity. In embodiments, a film or coating may be provided at the interface between the sliding surface 413 and the bottom surface 403 of the aperture 402 to facilitate sliding movement. It should be understood that the sliding engagement can be facilitated by any suitable mechanism (e.g., rails or guides, sliders or tracks, or other sliding components).

[0053] A sealing mechanism 430 is provided at the opening 401 of the aperture 402 to surround the distal end 414 of the photomask support body 410 via a pin 417. The sealing mechanism 430 is flexible to allow the photomask support body 410 to slide relative to the base plate 112. The sealing mechanism 430 can be made of any suitable material based on cleanliness, compatibility, toughness, and the like. A non-limiting example of a sealing mechanism is an O-ring. The sealing mechanism 430 prevents particles or particulate material from falling into the aperture 402. The sealing mechanism 430 may have suitable flexibility and / or compressibility to allow the distal end 414 to move laterally with the photomask 116 and to limit this lateral movement within a certain range, for example, from about 10 micrometers to about 100 micrometers.

[0054] The photomask contact area 420 is the portion of the photomask contact 400 configured to face the photomask surface 115 when the photomask support 400 is mounted in the base plate 112 and the photomask 116 is housed within the photomask container. At least some of the photomask contact areas 420 are accessible to the photomask surface 115 when the photomask container is closed and the photomask is housed within it. Wear-reducing features (not shown) may be provided on the photomask contact areas 420 for wear reduction.

[0055] Figure 5 Demonstration according to some embodiments Figures 1A to 4 A top view of a photomask support. The photomask support described herein (e.g., [example]) Figure 1A Photomask support 114 to B Figure 2 Photomask support 200 Figure 3 Photomask support 300 and Figure 4 Photomask support 400) may include Figure 5The photomask support body (e.g., pin) 510, 520, or 530 described herein refers to one or more of these. Photomask support body 510 has a first lateral dimension D1 in a direction coplanar with the base plate (e.g., in the xy plane). Photomask support body 530 has a second lateral dimension D2 in a direction coplanar with the base plate (e.g., in the xy plane). The first lateral dimension D1 is larger than the second lateral dimension D2, such that photomask support body 510 is relatively more rigid in the lateral direction coplanar with the base plate than photomask support body 530. In other words, photomask support body 510 can be laterally rigid in the direction coplanar with the base plate, and photomask support body 530 is laterally flexible in the same direction. Photomask support body 520 has a first lateral dimension D1' in a first direction coplanar with the base plate (e.g., along the y-axis) and a second lateral dimension D2' in a second direction coplanar with the base plate (e.g., along the x-axis). The first lateral dimension D1' is larger than the second lateral dimension D2' (e.g., at least 1, 1.5, 2, 3, 4 or more), making the photomask support body 520 relatively more rigid along the second direction (e.g., along the x-axis) than along the first direction (e.g., along the y-axis).

[0056] aspect:

[0057] Aspect 1. An apparatus including a photomask box, the photomask box having:

[0058] Base plate; and

[0059] One or more photomask supports, at least one of which comprises:

[0060] A photomask support body extending vertically from its proximal end to its distal end, the proximal end being configured to be received in the base plate; and

[0061] The photomask contact area at the distal end of the photomask support body.

[0062] The distal end of the photomask support body protrudes from the base plate, and the photomask support body is configured to allow the distal end of the photomask support body to move relative to the base plate in a direction coplanar with the base plate in a range from about 10 micrometers to about 100 micrometers.

[0063] Aspect 2. The device according to aspect 1, wherein the range is from about 20 micrometers to about 50 micrometers.

[0064] Aspect 3. The device according to aspect 1, wherein the base plate includes a hole for receiving the proximal end of the photomask support body.

[0065] Aspect 4. The device according to aspect 3, wherein the proximal end of the photomask support body forms a pivot joint with the bottom surface of the hole.

[0066] Aspect 5. The device according to aspect 3, further comprising a sealing mechanism at the opening of the hole to surround the distal end of the photomask support body.

[0067] Aspect 6. The device according to aspect 5, wherein the sealing mechanism is flexible to allow the distal end of the photomask support body to move relative to the base plate.

[0068] Aspect 7. The device according to aspect 1, wherein the photomask support body has a first dimension along a first direction coplanar with the base plate and a second dimension along a second direction coplanar with the base plate, the first dimension being larger than the second dimension.

[0069] Aspect 8. The device according to aspect 1, wherein the photomask support body includes a middle portion having a dimension along a direction coplanar with the base plate, the dimension of the middle portion being smaller than the dimension of the distal end.

[0070] Aspect 9. The device according to aspect 1, wherein the one or more photomask supports include one or more relatively flexible pins having a first dimension in a direction coplanar with the base plate and one or more relatively rigid pins having a second dimension in a direction coplanar with the base plate, the second dimension being larger than the first dimension.

[0071] Aspect 10. The device according to aspect 1, wherein the photomask support body comprises one or more polymer materials.

[0072] Aspect 11. The device according to aspect 1, wherein the photomask contact area further includes abrasion reduction features.

[0073] Aspect 12. The device according to aspect 1, wherein the photomask box further includes a cover that can be attached to the base plate to receive the photomask.

[0074] Aspect 13. The device according to aspect 12, wherein the cover further comprises:

[0075] One or more photomask contacts that contact the photomask from the side of the cover; and

[0076] A flexible mounting base that allows the one or more photomask contacts to move relative to the cover in the vertical direction when the flexible mounting base deforms.

[0077] Aspect 14. The device according to aspect 12 further includes an outer box top and an outer box door, the outer box top and the outer box door being configured to receive the base plate and the cover within the outer box top when the outer box door is attached to the outer box top.

[0078] Aspect 15. A method of accommodating a photomask using a photomask cassette, the photomask cassette comprising a base plate and a cover for receiving the photomask, the method comprising:

[0079] One or more photomask supports are provided, at least one of which includes a photomask support body extending vertically from its proximal end to its distal end, the proximal end being configured to be received in the base plate; and

[0080] The photomask contact area at the distal end of the photomask support body contacts the surface of the photomask to suspend the photomask from the base plate when pressure is applied.

[0081] The distal end of the photomask support body protrudes from the base plate, and the photomask support body is configured to allow the distal end of the photomask support body to move relative to the base plate in a direction coplanar with the base plate in a range from about 10 micrometers to about 100 micrometers to prevent the photomask contact area of ​​the photomask support from sliding on the photomask surface and scratching the surface of the photomask when the pressure is applied.

[0082] Aspect 16. The method according to aspect 15, wherein the range is from about 20 micrometers to about 50 micrometers.

[0083] Aspect 17. The method according to aspect 15, wherein the base plate includes a hole for receiving the proximal end of the photomask support body.

[0084] Aspect 18. The method according to aspect 17, wherein the proximal end of the photomask support body forms a pivot joint with the bottom surface of the hole.

[0085] Aspect 19. The method according to aspect 17, further comprising providing a sealing mechanism at the opening of the hole to surround the distal end of the photomask support body.

[0086] Aspect 20. The method according to aspect 15, wherein the photomask support body has a first dimension along a first direction coplanar with the base plate and a second dimension along a second direction coplanar with the base plate, the first dimension being larger than the second dimension.

[0087] The examples of photolithography used in this application should be considered illustrative rather than limiting in all respects. The scope of the invention is indicated by the appended claims rather than the foregoing description; and all modifications within the equivalent meaning and scope of the claims are intended to be included therein.

Claims

1. An apparatus including a photomask box, the photomask box having: Base plate; and One or more photomask supports, at least one of which comprises: A photomask support body extending vertically from its proximal end to its distal end, the proximal end being configured to be received in the base plate; and The photomask contact area at the distal end of the photomask support body. The distal end of the photomask support body protrudes from the base plate, and the photomask support body is configured to allow the distal end of the photomask support body to move relative to the base plate in a direction coplanar with the base plate in a range from about 5 micrometers to about 100 micrometers.

2. The device of claim 1, wherein the range is from about 20 micrometers to about 50 micrometers.

3. The device of claim 1, wherein the base plate includes a hole for receiving the proximal end of the photomask support body.

4. The device according to claim 3, wherein the proximal end of the photomask support body forms a pivot joint with the bottom surface of the hole.

5. The device of claim 3, further comprising a sealing mechanism at the opening of the hole to surround the distal end of the photomask support body.

6. The device of claim 5, wherein the sealing mechanism is flexible to allow the distal end of the photomask support body to move relative to the base plate.

7. The device according to claim 1, wherein the photomask support body has a first dimension along a first direction coplanar with the base plate and a second dimension along a second direction coplanar with the base plate, the first dimension being larger than the second dimension.

8. The device according to claim 1, wherein the photomask support body includes a middle portion having a dimension along a direction coplanar with the base plate, the dimension of the middle portion being smaller than the dimension of the distal end.

9. The device according to claim 1, wherein the one or more photomask supports include one or more relatively flexible pins having a first dimension in a direction coplanar with the base plate and one or more relatively rigid pins having a second dimension in a direction coplanar with the base plate, the second dimension being larger than the first dimension.

10. The device according to claim 1, wherein the photomask support body comprises one or more polymer materials.

11. The device of claim 1, wherein the photomask contact area further includes a wear reduction feature.

12. The device of claim 1, wherein the photomask housing further includes a cover that can be attached to the base plate to receive the photomask.

13. The device of claim 12, wherein the cover further comprises: One or more photomask contacts that contact the photomask from the side of the cover; and A flexible mounting base that allows the one or more photomask contacts to move relative to the cover in the vertical direction when the flexible mounting base deforms.

14. The device of claim 12, further comprising an outer box top and an outer box door, the outer box top and the outer box door being configured to receive the base plate and the cover within the outer box top when the outer box door is attached to the outer box top.

15. A method of accommodating a photomask using a photomask cassette, the photomask cassette comprising a base plate and a cover for receiving the photomask, the method comprising: One or more photomask supports are provided, at least one of which includes a photomask support body extending vertically from its proximal end to its distal end, the proximal end being configured to be received in the base plate; and The photomask contact area at the distal end of the photomask support body contacts the surface of the photomask to suspend the photomask from the base plate when pressure is applied. The distal end of the photomask support body protrudes from the base plate, and the photomask support body is configured to allow the distal end of the photomask support body to move with the photomask relative to the base plate in a direction coplanar with the base plate in a range from about 5 micrometers to about 100 micrometers to prevent the photomask contact area of ​​the photomask support from sliding on the photomask surface and scratching the surface of the photomask when the pressure is applied.

16. The method of claim 15, wherein the range is from about 20 micrometers to about 50 micrometers.

17. The method of claim 15, wherein the base plate includes a hole for receiving the proximal end of the photomask support body.

18. The method of claim 17, wherein the proximal end of the photomask support body forms a pivot joint with the bottom surface of the hole.

19. The method of claim 17, further comprising providing a sealing mechanism at the opening of the hole to surround the distal end of the photomask support body.

20. The method of claim 15, wherein the photomask support body has a first dimension along a first direction coplanar with the base plate and a second dimension along a second direction coplanar with the base plate, the first dimension being larger than the second dimension.

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