Composition, protective layer and display device

Abstract

The present application relates to a composition, a protective layer, and a display device. Embodiments of the present disclosure can provide a composition including a colorant, a first monomer including an acrylate group, a second monomer including an oxygen ring group, and a third monomer including an oxygen ring group. Thereby, embodiments of the present disclosure can provide a composition, and a protective layer and a display device including the same, which can prevent physical damage and defects of the display device and ensure long-term stability and reliability by improving adhesion and enhancing durability against external impact and scratches.

Description

Technical Field

[0001] This disclosure relates to a composition, a protective layer, and a display device. Background Technology

[0002] Display devices are a collection of cutting-edge technologies that provide high resolution and precise color reproduction, and have evolved in various forms such as organic light-emitting diode (OLED) displays and liquid crystal displays (LCDs). These display devices are highly susceptible to damage from external environmental factors, thus increasing the importance of protective layers. Physical factors such as dust, moisture, and scratches can cause performance degradation in display devices, requiring protective layers to prevent this.

[0003] The protective layer of a display device can prevent minor damage that may occur during the manufacturing process, maintain structural stability, and provide durability against external impacts. Summary of the Invention

[0004] The problem to be solved Embodiments of this disclosure may provide a composition that can prevent damage and defects that may occur during the manufacture and use of a display device, and effectively protect the display device from external environmental factors.

[0005] Embodiments of this disclosure provide compositions that maintain stable properties even under high-temperature conditions, thereby improving durability and reliability.

[0006] Embodiments of this disclosure can provide a protective layer and a display device comprising a composition that effectively protects the display device from physical damage and external environmental factors that may occur during the manufacture and use of the display device.

[0007] Embodiments of this disclosure may provide a protective layer comprising a composition having high adhesive strength and excellent hardness, thereby exhibiting excellent adhesion to a display panel and durability against external impacts and scratches.

[0008] The problems of the embodiments of this disclosure are not limited to those mentioned in this disclosure, and other problems not mentioned can be clearly understood from the following description.

[0009] Problem-solving methods The composition according to embodiments of this disclosure may include a colorant, a first monomer containing an acrylate group, a second monomer containing an oxygen-containing cyclic group, and a third monomer containing an oxygen-containing cyclic group.

[0010] The first monomer containing an acrylate group can be a compound represented by the following chemical formula 1.

[0011] [Chemical Formula 1] The second monomer containing an oxygen-containing cyclic group can be a compound represented by chemical formula 2 below. The second monomer may include an epoxy group.

[0012] [Chemical Formula 2] The third monomer containing an oxygen-containing cyclic group can be a compound represented by chemical formula 3 below. The third monomer may include an oxehane butyl group.

[0013] [Chemical Formula 3] The protective layer according to embodiments of this disclosure may include a composition comprising a colorant, a first monomer, a second monomer, and a third monomer.

[0014] The display device according to embodiments of the present disclosure may include a display panel having a pixel forming layer and a protective layer located on the underside of a substrate.

[0015] Invention Effects According to embodiments of the present disclosure, a composition can be provided that can prevent damage and defects that may occur during the manufacture and use of a display device, and effectively protect the display device from external environmental factors.

[0016] According to embodiments of this disclosure, durability and reliability are improved, and compositions that maintain stable properties even under high-temperature conditions can be provided.

[0017] According to embodiments of the present disclosure, a protective layer comprising a composition and a display device can be provided, the composition being able to effectively protect the display device from physical damage and external environmental factors that may occur during the manufacture and use of the display device.

[0018] According to embodiments of the present disclosure, a protective layer can be provided comprising a composition having high adhesive strength and excellent hardness, thereby exhibiting excellent adhesion to a display panel and durability against external impacts and scratches.

[0019] According to embodiments of this disclosure, an environmentally friendly display device capable of driving low power consumption can be provided by improving the performance and lifespan of the display device.

[0020] According to embodiments of this disclosure, an environmentally friendly protective layer composition can be provided, which is suitable for the manufacture of large-area display devices and can optimize the process by reducing energy consumption and improving production efficiency.

[0021] The effects of the embodiments disclosed herein are not limited to those mentioned above, and other effects not mentioned can be clearly understood from the following description. Attached Figure Description

[0022] This disclosure can be more fully understood through the detailed description and accompanying drawings provided below, which are provided for illustrative purposes only and do not limit the content of this disclosure.

[0023] Figure 1 This is a schematic cross-sectional view of an exemplary display device according to an embodiment of the present disclosure.

[0024] Figure 2 It is magnification Figure 1 An exemplary cross-sectional view of region A shown.

[0025] Figure 3a and Figure 3b This is a diagram illustrating the optical path of a display device according to an embodiment of the present disclosure and a display device according to a comparative example.

[0026] Figures 4a to 4d This is a schematic illustration of exemplary process diagrams showing the manufacturing steps of a display device according to embodiments of the present disclosure. Detailed Implementation

[0027] Some embodiments of this disclosure are described in detail below with reference to the exemplary accompanying drawings. When attaching reference numerals to the constituent elements of each drawing, the same constituent elements may be represented by the same numerals as much as possible, even if they are shown in different drawings.

[0028] In describing this disclosure, if a detailed description of a relevant known structure or function would obscure the essence of this disclosure, such detailed description may be omitted. Where terms such as "comprising," "including," "having," or "constituting" are used in this disclosure, additional parts may be added unless only "merely" is used. When a constituent element is expressed in the singular, a plural form may be included unless otherwise expressly stated.

[0029] Furthermore, in describing the constituent elements of this disclosure, terms such as first, second, A, B, (a), and (b) may be used. These terms are merely for distinguishing one constituent element from the other constituent elements and do not limit the nature, order, sequence, or quantity of the constituent elements.

[0030] The description of the positional relationship of the constituent elements should be understood as follows: if two or more constituent elements are described as "connected," "combined," or "linked," then the two or more constituent elements can be directly "connected," "combined," or "linked," but they can also be further "intervened" with other constituent elements to be "connected," "combined," or "linked." Here, other constituent elements can also be included in one or more of the two or more constituent elements that are mutually "connected," "combined," or "linked."

[0031] Furthermore, it should be understood that when a component such as a layer, membrane, region, or plate is "above" or "on" other components, it can include not only components "directly on" the other components, but also components with other components in between. Conversely, if a component is "directly on" other parts, it should be understood that there are no other parts in between.

[0032] When describing the temporal sequence of elements, actions, or production methods, for example, using phrases like "~after", "~next", "~before", etc. to indicate the chronological or procedural sequence, discontinuous cases are included unless "right then" or "directly" is used.

[0033] On the other hand, if the numerical values ​​of the constituent elements or their corresponding information are involved, then even without separate explicit description, the numerical values ​​or their corresponding information can be interpreted as including the range of errors that may be caused by various factors (such as process factors, internal or external impacts, noise, etc.).

[0034] Unless otherwise stated, the terminology used in this disclosure and its appended claims is as follows, without departing from the spirit of this disclosure.

[0035] Unless otherwise stated, the term “halogen” or “halogen” as used in this disclosure includes fluorine (F), chlorine (Cl), bromine (Br) and iodine (I).

[0036] Unless otherwise stated, the term "alkane" or "alkyl" as used in this disclosure refers to a radical having 1 to 60 carbons bonded by single bonds, including straight-chain alkyl, branched alkyl, cycloalkyl (alicyclic) alkyl, alkyl-substituted cycloalkyl, and cycloalkyl-substituted alkyl.

[0037] As used in this disclosure, the terms “haloalkyl” or “halogenated alkyl” refer to alkyl groups in which halogens have been substituted, unless otherwise stated.

[0038] Unless otherwise stated, the terms “alkenyl” or “alkynyl” as used in this disclosure have double or triple bonds, including straight or branched groups having 2 to 60 carbon atoms, but not limited thereto.

[0039] Unless otherwise stated, the term "cycloalkyl" as used in this disclosure refers to, but is not limited to, an alkyl group that forms a ring having 3 to 60 carbon atoms.

[0040] As used in this disclosure, the terms "alkoxy" or "alkyloxy" refer to an alkyl group bonded with an oxygen radical, and unless otherwise stated, have a carbon number of 1 to 60, but are not limited thereto.

[0041] As used in this disclosure, the term "olefinic" or "olefinic hydrocarbonic" refers to an olefinic group having an oxygen radical, and unless otherwise stated, has a carbon number of 2 to 60, but is not limited thereto.

[0042] Unless otherwise stated, the terms "arylgroup" or "arylenegroup" as used in this disclosure have, but are not limited to, a number of carbon atoms from 6 to 60. In this disclosure, aryl or arylenegroups include monocyclic compounds, cyclic aggregates, and conjoined cyclic compounds. For example, aryl groups may include monovalent functional groups of phenyl, biphenyl, naphthalene, fluorenyl, or substituted fluorenyl groups, and arylenegroups may include filamentyl or substituted filamentyl groups.

[0043] As used in this disclosure, the term "ring assemblies" refers to two or more cyclic systems (monocyclic or conjoined cyclic systems) directly connected to each other by single or double bonds, and the number of such direct connections between rings is one less than the total number of cyclic systems in the compound. Ring assemblies can be formed by directly connecting the same or different cyclic systems to each other by single or double bonds.

[0044] In this disclosure, the aryl group comprises a cyclic aggregate, and therefore the aryl group comprises a benzene ring, which is a single aromatic ring, linked by a single bond to a diphenyl or terpene group. Additionally, the aryl group also comprises compounds in which an aromatic ring system is bonded to an aromatic monocyclic ring, linked by a single bond to an aromatic ring system, i.e., fluorene, which is a single aromatic ring.

[0045] As used in this disclosure, the term "fused cyclic system" refers to a fused ring state having at least two atoms, including a fused state of two or more hydrocarbon ring systems and a fused state of a heterocyclic system containing at least one heteroatom. These fused cyclic systems can be aromatic rings, heteroaromatic rings, aliphatic rings, or combinations of these rings. For example, in the case of aryl groups, they can be naphthyl, phenanthryl, fluorenyl, etc., but are not limited thereto.

[0046] As used in this disclosure, the term "spiral compound" refers to a "spiro union," which is a connection formed by two rings sharing only one atom. In this case, the covalent atoms of the two rings are called "spiral atoms," and depending on the number of spiral atoms in a compound, they are respectively called "single-helix," "double-helix," and "triple-helix" compounds.

[0047] Unless otherwise stated, the terms "fluorenyl", "fluorenyl", and "fluorenyl" as used in this disclosure refer to R in the following structures. 1 R 2 R 3 and R4 These are all monovalent, divalent, or trivalent functional groups of hydrogen. "Substituted fluorenyl," "substituted fluorenyl," or "substituted fluorenylyl" refers to the substituent R. 1 R 2 R 3 R 4 At least one of them is a substituent other than hydrogen, including R and R 1 The case where they bond to each other and the carbon atoms bonded to them form helical compounds. In this specification, regardless of whether they are monovalent, divalent, or trivalent, fluorenyl, fenenyl, or fluorenyl groups can all be named fluorenyl.

[0048] In addition, substituent R 1 R 2 R 3 and R 4 The groups can be independently alkyl groups having 1 to 20 carbon atoms, alkenyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, or heterocyclic groups having 2 to 30 carbon atoms. For example, the aryl group can be benzene, biphenyl, naphthalene, anthracene, or phenanthrene, and the heterocyclic group can be pyrrole, furan, thiophene, pyrazole, imidazolyl, triazole, pyridine, pyrimidine, pyrazine, triazine, indole, benzofuran, quinazoline, or quinoxaline. For example, the substituted fluorene and filamentyl groups can be monovalent or divalent functional groups of 9,9-dimethylfluorene, 9,9-diphenylfluorene, and 9,9'-helical [9H-fluorene], respectively.

[0049] Unless otherwise stated, the term "heterocyclic group" as used in this disclosure includes not only aromatic rings, such as "heteroaryl" or "heteroarylene," but also non-aromatic rings, which are rings containing one or more heteroatoms and having a carbon number of 2 to 60, but are not limited thereto. Unless otherwise stated, the term "heteroatom" as used in this disclosure refers to oxygen (O), nitrogen (N), sulfur (S), silicon (Si), or phosphorus (P), and a heterocyclic group refers to a monocyclic ring, cyclic polymer, a series of linked cyclic systems, a helical compound, etc., containing a heteroatom.

[0050] For example, "heterocyclic group" can also replace the carbon that forms the ring and include compounds containing heteroatomic groups such as SO2 and P=O.

[0051] As used in this disclosure, the term "ring" includes monocyclic and polycyclic rings, including hydrocarbon rings and heterocyclic rings containing at least one heteroatom, including aromatic and non-aromatic rings.

[0052] As used in this disclosure, the term "polycyclic" includes cyclic aggregates such as diphenyl, terpenoid, etc., fused multiple cyclic and helical compounds, including not only aromatic but also non-aromatic compounds, and not only hydrocarbon rings but also heterocycles with at least one heteroatom.

[0053] As used in this disclosure, the term "alicylic ring" refers to cyclic hydrocarbons, excluding aromatic hydrocarbons, including monocyclic, cyclic aggregates, conjugated polycyclic, and spirocyclic compounds, etc., and unless otherwise stated, refers to a ring with 3 to 60 carbon atoms, but is not limited thereto. For example, when benzene, which is an aromatic ring, is fused with cyclohexane, which is a non-aromatic ring, it also belongs to an alicylic ring.

[0054] Additionally, if the prefixes are named consecutively, it means that the substituents are arranged in the order described above. For example, arylalkoxy refers to an aryl-substituted alkoxy group, alkoxycarbonyl refers to an alkoxy-substituted carbonyl group, and arylcarbonylalkenyl refers to an arylcarbonyl-substituted alkenyl group, where arylcarbonyl refers to an aryl-substituted carbonyl group.

[0055] Furthermore, unless otherwise expressly stated, the term "substituted or unsubstituted" as used in this disclosure refers to a group selected from deuterium, halogen, hydroxyl (-OH), nitrile (-CN), nitro (-NO2), carbonyl (-C(=O)-), ether (-O-), ester (-C(=O)O-), C1-C 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, C6-C 30 Aryloxy group, C6-C 30 arylamine, C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl, and C2-C of at least one heteroatom selected from the group consisting of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 One or more substituents in the group consisting of heterocyclic groups are substituted, but not limited to these substituents.

[0056] As used in this disclosure, the term "substitution" can include cases where the substituent is further substituted by at least one substituent selected from the aforementioned substituents. For example, the substituted substituent may be further substituted by one or more substituents selected from the aforementioned substituents, and may include cases where the further substituted substituent is also substituted by more than one substituent selected from the aforementioned substituents.

[0057] Examples of each symbol and its substituent in this disclosure include aryl, aryl, heterocyclic, etc. The corresponding "functional group name" can specify the "functional group name reflecting the valence" or the "parent compound name". For example, "phenanthryl", as a type of aryl, is "phenanthryl" for monovalent and "phenanthrene" for divalent. The name of the group can be recorded according to the valence, but it can also be recorded using the parent compound name "phenanthrene" regardless of the valence.

[0058] Similarly, for pyrimidine, it can also be written as "pyrimidine" regardless of its valence, or as pyrimidine(yl) if it is monovalent, and as the corresponding "group name" if it is divalent. Therefore, in this disclosure, when describing the type of substituent by the name of the parent compound, it can represent an n-valent "group" in which the hydrogen atom bonded to the carbon atom and / or heteroatom of the parent compound is separated.

[0059] Furthermore, in this disclosure, when listing the names of compounds or substituents, numbers or letters indicating positions may be omitted. For example, pyridine[4,3-d]pyrimidine can be listed as pyridinepyrimidine, benzofuran[2,3-d]pyrimidine can be listed as benzofuranpyrimidine, and 9,9-dimethyl-9H-fluorene can be listed as dimethylfluorene, etc. Therefore, benzo[g]quinoxaline or benzo[f]quinoxaline can both be called benzo[g]quinoxaline.

[0060] Unless otherwise expressly stated, the chemical formulas used in this disclosure are the same as the definitions of indexes and substituents in the following chemical formulas.

[0061] Where, when a is an integer of 0, the substituent R 1 This indicates that the substance does not exist; that is, when a is 0, all hydrogen atoms are combined with the carbon atoms forming the benzene ring. In this case, the labeling of the hydrogen atoms combined with the carbon atoms can be omitted, and the chemical formula or compound can be listed. Additionally, when a is an integer of 1, a substituent R... 1 It can combine with any of the carbons forming the benzene ring. When a is an integer of 2 or 3, it can combine in the following way, for example. When a is an integer from 4 to 6, it can combine with the carbons of the benzene ring in a similar way. When a is an integer greater than 2, R 1They can be the same as or different from each other.

[0062] In this disclosure, unless otherwise stated, ring formation refers to the bonding of adjacent groups to form a monocyclic ring or multiple conjoined rings. Monocyclic rings and multiple conjoined rings include hydrocarbon rings and heterocyclic rings containing at least one heteroatom, which may include aromatic and non-aromatic rings.

[0063] In addition, unless otherwise stated in this disclosure, when referring to condensed rings, the number in "numerical-condensed ring" indicates the number of condensed rings. For example, the condensed form of three rings such as anthracene, phenanthrene, and benzoquinoline can be labeled as a 3-condensed ring.

[0064] On the other hand, as used in this disclosure, the term "bridged bicyclic compound" refers to a compound in which two rings share three or more atoms to form a ring, unless otherwise stated. In this case, the shared atoms may contain carbon atoms or heteroatoms.

[0065] In this disclosure, the display device can be implemented in various forms, specifically including organic light-emitting diode (OLED) displays, liquid crystal displays (LCDs), electronic ink displays, micro LED displays, and quantum dot (QD) displays. Furthermore, this display device can provide not only flat screens but also curved, flexible, foldable, and rollable displays. In addition, it can also include special-purpose displays such as small displays for wearable devices, head-up displays (HUDs) for vehicles, head-up displays (HMDs) for augmented reality (AR) and virtual reality (VR) applications, and transparent displays.

[0066] Furthermore, the electronic device disclosed herein may refer to a panel that includes the aforementioned display device, or may include both the panel and circuitry. This may include, for example, personal electronic devices such as smartphones, tablets, laptops, and desktop computers, as well as large display devices such as televisions, monitors, and digital signage. Additionally, it may include in-vehicle electronic devices such as head-up displays (HUDs) and dashboard displays, wearable devices (e.g., smartwatches), head-up displays (HMDs) for virtual reality (VR) and augmented reality (AR) devices, medical displays, and industrial control panels, among other special-purpose electronic devices.

[0067] Embodiments of this disclosure are described in detail below. However, these are presented by way of example and are therefore not intended to be limiting; rather, this disclosure is defined solely by the scope of the claims described below.

[0068] The composition according to embodiments of this disclosure can be applied to a protective layer of a display device. For example, the protective layer can be disposed on the underside of a substrate included in a display panel.

[0069] Ideally, the protective layer should maintain transparency without compromising the optical performance of the display device, while also meeting various physical properties such as adhesion and hardness. In particular, materials that maintain stable properties even at high temperatures are required.

[0070] The compositions used in the protective layer of a display device can be designed to meet these requirements.

[0071] The compositions according to embodiments of this disclosure may include colorants, monomers containing acrylate groups, and monomers containing oxygen cyclic groups.

[0072] The composition according to embodiments of this disclosure may include a colorant, a first monomer containing an acrylate group, a second monomer containing an oxygen-containing cyclic group, and a third monomer containing an oxygen-containing cyclic group.

[0073] The second monomer may include an epoxy group, and the third monomer may include an oxobutyric group.

[0074] The following is a detailed explanation of each element.

[0075] 1. Composition The composition according to embodiments of this disclosure may include a colorant, a first monomer containing an acrylate group, a second monomer containing an oxygen-containing cyclic group, and a third monomer containing an oxygen-containing cyclic group.

[0076] The composition according to embodiments of this disclosure can be included in the protective layer of a display device.

[0077] For example, the protective layer may be disposed beneath the substrate included in the display panel. As another example, the protective layer may be contained within the display panel itself.

[0078] The protective layer can effectively protect the display panel and display device from external impacts, scratches and environmental factors, and can improve the panel's durability and reliability by simultaneously improving adhesion and hardness.

[0079] The compositions according to embodiments of this disclosure may each independently comprise the compositions described below.

[0080] (1) Coloring agent In embodiments of this disclosure, the composition may include a colorant.

[0081] At this point, black pigment can be used as the colorant.

[0082] Examples of black pigments include lactam black, aniline black, polyethylene black, titanium black, and carbon black.

[0083] Black pigments can be used in combination with color-protecting agents such as anthraquinone pigments, perliene pigments, phthalic anhydride pigments, and azo pigments.

[0084] Furthermore, the colorant in the composition according to the embodiments may further contain a dye. For example, the dye may contain phthalic anhydride compounds.

[0085] Pigments and dyes can be used alone or in combination of two or more, but are not limited to this.

[0086] To disperse pigments into the composition, dispersants can be used simultaneously. For example, pigments can be pre-treated as a dispersant surface treatment, or a dispersant can be added together with the pigment during the manufacture of the composition.

[0087] Dispersants can be nonionic, anionic, cationic, etc. Specific examples of dispersants include polyolefins and their esters, polyoxyethylene, polyol ester ethylene oxide adducts, alcohol ethylene oxide adducts, sulfonates, sulfonates, carboxylic esters, carboxylates, alkylamide ethylene oxide adducts, alkylamines, etc., which can be used alone or in combination of two or more.

[0088] Commercially available dispersants include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, and DISPERBYK-2001; EFKA Chemicals' EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, and EFKA-450; and Zeneca's Solsperse. 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc.; or Ajinomoto's PB711, PB821, etc.

[0089] The dispersant may be contained in the composition from 0.1% to 15% by weight relative to the total amount of the composition. When the dispersant is contained within the above range, the composition exhibits excellent dispersibility, and therefore excellent stability, developability, and patternability when manufacturing a light-shielding layer.

[0090] Pigments can also be used after pretreatment with water-soluble inorganic salts and wetting agents. Pretreatment of pigments before use can refine their average particle size.

[0091] Pretreatment can be performed by kneading the pigment with water-soluble inorganic salts and wetting agents, and by filtering and rinsing the pigment obtained in the kneading step.

[0092] Kneading can be carried out at temperatures ranging from 40°C to 100°C. Filtration and washing can be performed by washing the inorganic brine with water and then filtering.

[0093] Examples of water-soluble inorganic salts include, but are not limited to, sodium chloride and potassium chloride.

[0094] Wetting agents can act as carriers, enabling pigments to mix evenly with water-soluble inorganic salts and facilitating pigment pulverization. Examples of wetting agents include alkyl glycol monoalkyl ethers, such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and diethylene glycol monomethyl ether; and alcohols, such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, and glycerol polyethylene glycol, which can be used alone or in mixtures of two or more.

[0095] Pigments that have undergone a kneading process can have an average particle size of 20 nm to 110 nm. When the average particle size of the pigment is within this range, it can effectively form fine patterns while exhibiting good heat resistance and lightfastness.

[0096] The pigment may comprise 1 to 40% by weight relative to the total amount of the composition, and more specifically, 2 to 30% by weight, 3 to 20% by weight, 5 to 15% by weight, 7 to 12% by weight, or 7 to 10% by weight. When the pigment is contained within the above ranges, the color reproduction is excellent, and the curing and adhesion of the pattern are excellent.

[0097] (2) First monomer In embodiments of this disclosure, the composition may comprise a first monomer containing an acrylate group.

[0098] The first monomer can be a compound represented by the following chemical formula 1.

[0099] [Chemical Formula 1] The symbols recorded in chemical formula 1 can be defined as follows.

[0100] a can be an integer from 1 to 4.

[0101] R 1 You can choose free hydrogen; deuterium; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Ether group; C1-C 30 Ketone group; C1-C 30 Ester group; C1-C 30 Alkyl group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 In the group consisting of aryloxy groups; hydroxyl groups; and combinations thereof.

[0102] L 1 You can select a free single key; C1-C 30 Alkylene; C 2- C 30 alkenyl group; C2-C 30 etymynyl; C3-C 30 Cycloalkylene; C1-C 30 Ether group; C1-C 30 Ketone group; C1-C 30 Ester group; C1-C 30 alkeneoxy group; C6-C 30 arylene; a C2-C group containing at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy groups; and combinations thereof.

[0103] R 1 and L 1 In this context, alkyl, alkenyl, alkynyl, cycloalkyl, ether, ketone, ester, alkoxy, aryl, heterocyclic, and aryloxy groups can be independently selected from deuterium, halogen, hydroxyl, nitrile, nitro, carbonyl, ether, ester, C1-C... 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, C6-C 30Aryloxy group, C6-C 30 arylamine, C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl, and C2-C atoms selected from at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 One or more substituents in the group consisting of heterocyclic groups are further substituted.

[0104] The compound described in Formula 1 may be one or more of the following compounds.

[0105] The first monomer can be one or more of the compounds shown in the following chemical formulas P-1-1 to P-1-36.

[0106] The first monomer may comprise 1 to 40% by weight, or 1 to 30% by weight, or 1 to 25% by weight, or 5 to 25% by weight, or 5 to 24.5% by weight, or 23 to 24% by weight, or 24 to 25% by weight, or 25 to 26% by weight, or 26 to 27% by weight, relative to the total amount of the composition.

[0107] When the composition according to the embodiments of this disclosure is formed containing the first monomer described above, the performance of the protective layer containing it can be improved.

[0108] For example, compositions containing the first monomer described above can provide excellent adhesion to enhance the adhesion between the display panel and the protective layer.

[0109] For example, compositions containing the first monomer have increased flexibility due to the properties of the acrylate groups, thus making them suitable for use in flexible display devices.

[0110] For example, due to the optical transparency of acrylate polymers, compositions containing the first monomer can perform effective protection functions without affecting the image quality of the display device.

[0111] In addition, due to the heat and moisture resistance of acrylate polymers, compositions containing the first monomer can maintain stable performance even in high temperature and high humidity environments, thereby improving the lifespan and reliability of display devices.

[0112] (3) Second monomer In embodiments of this disclosure, the composition may include a second monomer containing an oxygen-containing cyclic group. The second monomer may include an epoxy group.

[0113] The second monomer can be a compound represented by the following chemical formula 2.

[0114] [Chemical Formula 2] The symbols recorded in chemical formula 2 can be defined as follows.

[0115] b can be an integer from 1 to 4.

[0116] R 2 and R 3 They can be independently selected from hydrogen; deuterium; C1-C. 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkoxy group; C1-C 30 Alkylamine group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 The group consisting of arylamine, hydroxyl, and combinations thereof.

[0117] R 4 You can choose free hydrogen; deuterium; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C30 Alkoxy group; C1-C 30 Alkylamine group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 The group consisting of arylamine, hydroxyl, and combinations thereof.

[0118] L 2 You can select a free single key; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkylene; C2-C 30 alkenyl group; C2-C 30 etymynyl; C3-C 30 Cycloalkylene; C3-C 30 Cycloalkenyl; C1-C 30 alkeneoxy group; C1-C 30 Alkylamine group; C6-C 30 arylene; a C2-C group containing at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 Arylamine groups; and combinations thereof.

[0119] Composition of R 2 The atoms and constituent L 2 The atoms can bond with each other to form a ring.

[0120] R 2 To R 4 and L 2 In this context, alkyl, alkenyl, alkynyl, cycloalkyl, alkoxy, alkylamino, aryl, heterocyclic, aryloxy, arylamino, alkylene, alkenyl, alkyne, cycloalkylene, cycloalkenyl, alkoxy, and arylene can each be independently selected from deuterium, halogen, hydroxyl, nitrile, nitro, C1-C 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30Aryl, C6-C 30 Aryloxy group, C6-C 30 arylamine, C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl and C2-C 30 The substituent is replaced by one or more substituents in the group consisting of heterocyclic groups, and the substituted substituent may be further replaced by one or more substituents selected from the above substituents.

[0121] The compound represented by chemical formula 2 can be one or more of the following compounds.

[0122] The second monomer can be one or more of the compounds shown below, from P-2-1 to P-2-140.

[0123] The second monomer may comprise 1 to 40% by weight, or 1 to 30% by weight, or 1 to 25% by weight, or 5 to 25% by weight, relative to the total amount of the composition.

[0124] When a protective layer is formed using a composition containing a second monomer with an oxygen-containing ring group, the properties of the oxygen-containing ring structure during the curing process can greatly improve the physical and chemical properties of the protective layer.

[0125] For example, oxygen-containing ring structures form a high-density three-dimensional network during curing, enhancing the mechanical strength of the protective layer and expressing high hardness, thereby providing resistance to external impacts, scratches, and wear.

[0126] Therefore, it can effectively protect sensitive electronic components such as display panels from external stimuli.

[0127] (4) Third monomer In embodiments of this disclosure, the composition may include a third monomer containing an oxygen-containing cyclic group.

[0128] The third monomer can be a compound represented by the following chemical formula 3.

[0129] [Chemical Formula 3] The symbols recorded in chemical formula 3 can be defined as follows.

[0130] c can be an integer from 1 to 4.

[0131] p can be an integer from 0 to 5.

[0132] R 5 and R 6 Each can be independently selected from hydrogen; deuterium; nitrile group; C1-C. 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkyl group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C1-C 30 Alkylamine group; C1-C 30 arylamine group; hydroxyl group; C1-C 30 Acrylate groups; -N(R')(R”); and combinations thereof constitute the group.

[0133] Where p is 2 or more, R 5 They are the same or different.

[0134] When p is 0, L in chemical formula 3 3 It can bond with cyclic double bonds.

[0135] L 3 You can select a free single key; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkylene; C2-C 30 alkenyl group; C2-C 30 etymynyl; C3-C 30 Cycloalkylene; C3-C 30 Cycloalkenyl; C1-C 30 alkeneoxy group; C1-C 30 Amine group; C6-C 30 arylene; a C2-C group containing at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 Arylamine groups; and combinations thereof.

[0136] R' and R" can be independently selected from hydrogen; deuterium; hydroxyl group; acrylate group; carbonyl group; ether group; ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkoxy group; C1-C 30 Alkylamine group; C6-C 30 Aryl; C2-C containing at least one heteroatom from O, N, S, Si, and P. 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 Arylamine groups; and combinations thereof.

[0137] R 5 R 6 、R'、R” and L 3 In this context, alkyl, alkenyl, alkynyl, cycloalkyl, alkoxy, alkylamino, aryl, heterocyclic, aryloxy, arylamino, alkylene, alkenyl, alkyne, cycloalkylene, cycloalkenyl, alkoxy, and arylene can each be independently selected from deuterium, halogen, hydroxyl, nitrile, nitro, C1-C 30 Alkyl, C1-C30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, C6-C 30 Aryloxy group, C6-C 30 arylamine group, -N(R')(R”) (where R' and R” in -N(R')(R”) can be defined as the same as those defined above), C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl and C2-C 30 The substituent is replaced by one or more substituents in the group consisting of heterocyclic groups, and the substituted substituent may be further replaced by one or more substituents selected from the above substituents.

[0138] The chemical formula 3 can be represented by either chemical formula 3-1 or chemical formula 3-2.

[0139] [Chemical Formula 3-1] [Chemical Formula 3-2] The symbols recorded in chemical formulas 3-1 and 3-2 can be defined as follows.

[0140] c, R 5 R 6 and L 3 It can be used with c and R as defined in chemical formula 3 5 R 6 and L 3 The definition is the same as the definition.

[0141] p1 and p2 can be 0 or 1 respectively.

[0142] When p is 0, L in chemical formula 3-1 3 It can bond with cyclic double bonds.

[0143] When p is 0, L in chemical formula 3-2 3 It can bond with cyclic double bonds.

[0144] The compound represented by chemical formula 3 can be one or more of the following compounds.

[0145] The third monomer may be one or more of the compounds shown below, from P-3-1 to P-3-68.

[0146] The third monomer may comprise 1 to 40% by weight, or 1 to 30% by weight, or 1 to 25% by weight, or 5 to 25% by weight, relative to the total amount of the composition.

[0147] When a protective layer is formed using a composition containing monomers with oxygen-containing ring groups, the properties of the oxygen-containing ring structure during the curing process can greatly improve the physical and chemical properties of the protective layer.

[0148] For example, oxygen-containing ring structures form a high-density three-dimensional network during curing, enhancing the mechanical strength of the protective layer and expressing high hardness, thereby providing resistance to external impacts, scratches, and wear.

[0149] Therefore, it can effectively protect sensitive electronic components such as display panels from external stimuli.

[0150] (5) Initiator In embodiments of this disclosure, the composition may include an initiator.

[0151] Initiators are photoinitiators used in UV (Ultraviolet light) curing. They can initiate the polymerization reaction of monomers or oligomers by absorbing UV or visible light.

[0152] Photopolymerization initiators are commonly used in compositions; typical examples are free radical initiators and cationic initiators.

[0153] For free radical initiators, acetophenone compounds, benzophenone compounds, thioxanone compounds, phenylphosphine compounds, triazine compounds, oxime compounds, phosphooxy compounds, or mixtures thereof can be used. For example, free radical initiators can initiate free radical reactions of acrylate monomers.

[0154] Examples of acetophenone compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylacetone, p-butyltrichloroacetophenone, p-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-oxyacetophenone, 2-methyl-1-(4-methylthio)phenyl-2-morpholine antisense oligonucleotide propane-1-one, and 2-benzyl-2-dimethylamino-1-(4-morpholine antisense oligonucleotide phenyl)-butane-1-one.

[0155] Examples of benzophenone compounds include benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, methyl benzoyl acrylate, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, and 3,3'-dimethyl-2-methoxybenzophenone.

[0156] Examples of thiooxazone compounds include thiooxazone, 2-chlorothiooxazone, 2-methylthiooxazone, isopropylthiooxazone, 2,4-diethylthiooxazone, 2,4-diisopropylthiooxazone, and 2-chlorooxazone.

[0157] Examples of phenylphosphine compounds include benzo[a]phosphide, benzo[a]phosphide methyl ether, benzo[a]phosphide ethyl ether, benzo[a]phosphide isopropyl ether, benzo[a]phosphide isobutyl ether, benzyl dimethyl ether, etc.

[0158] Examples of triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyrene)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthalene)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine. 2-Biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-trichloromethyl(piperyl)-6-triazine, 2-4-trichloromethyl(4'-methoxystyryl)-6-triazine, etc.

[0159] Examples of oxime compounds include 2-(phthalic anhydride)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(o-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl] ethyl ketone, and (E)-1(((3-cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl) enoyl)amino)oxy) ethane-1-one (PBG-304, manufactured by Trony Chemicals), etc.

[0160] Examples of phosphate oxy compounds include diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide (TPO), phenethyl(2,4,6-trimethylbenzoyl)phosphinate (TPO-L), and methyl acrylate phosphine oxide.

[0161] In addition to the aforementioned compounds, photoinitiators can also include carbazole compounds, diketone compounds, borosonyl compounds, diazo compounds, imidazole compounds, and non-imidazole compounds.

[0162] In photoinitiators, peroxide compounds, azo compounds, etc., can be used as free radical polymerization initiators.

[0163] Examples of peroxide compounds include peroxide ketones, such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methyl cyclohexanone peroxide, and acetylacetone peroxide; peroxide diacyl groups, such as isobutyl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides, such as 2,4,4'-trimethylpentyl-2-hydroperoxide, diisopropylbenzene peroxide, isopropylbenzene hydroperoxide, and n-butyl peroxide; and peroxide dialkyl groups, such as bisstearoyl peroxide and 2,5-dimethyl... -2,5-Di(t-butylperoxy)hexane, 1,3-bis(t-butoxyisopropyl)benzene, n-butylperoxyvalerate, etc.; alkyl esters, such as 2,4,4-trimethylpentylperoxyphenoxyacetic acid, α-neodecanoate isopropylphenyl ester, t-peroxybenzoate butyl ester, di-t-peroxytrimethyl adipate, etc.; percarbonates, such as di-3-methoxybutylperoxydicarbonate, di-2-ethylhexylperoxydicarbonate, bis-4-t-butylcyclohexylperoxydicarbonate, diisopropylperoxydicarbonate, acetylcyclohexylsulfonyl peroxide, t-butylperoxyaryl carbonate, etc.

[0164] Examples of azo compounds include 1,1'-azobiscyclohexane-1-carbonyl nitrile, 2,2'-azobis(2,4-dimethylpentanonitrile), 2,2'-azobis(methyl isobutyrate), 2,2'-azobis(4-methoxy-2,4-dimethylpentanonitrile), α,α'-azobis(isobutylnitrile), and 4,4'-azobis(4-cyanovaleric acid).

[0165] Cationic initiators can generate cations through UV or visible light irradiation, thus initiating polymerization, especially in the polymerization of monomers such as epoxy and vinyl ether, where they can initiate free radical reactions. For example, onium salt initiators and non-onium salt initiators can be used in monomer polymerization.

[0166] Examples of onium salt initiators include diaryliodophosphate, triarylsulfonate, selenite, sulfohexafluoroantimony salt, and sulfohexafluorophosphate.

[0167] Non-onium salt initiators include trifluoromethane sulfonate, tetraphenylborate, sulfone iron, and N-hydroxynaphthylamide triplate (NIT).

[0168] Free radical initiators and cationic initiators can be classified into primary initiators and secondary initiators according to their function.

[0169] Primary initiators can directly absorb light to generate free radicals or cations, thereby inducing their own initiation reaction. Specific examples of primary initiators include acetophenones and triazine initiators.

[0170] For example, acetophenone initiators include, but are not limited to, acetophenone, 2-hydroxy-2-methylpropanone, 1-hydroxycyclohexylacetone, 2,2-dimethoxyacetophenone, etc.

[0171] For example, triazine initiators include 2,4,6-triphenyloxazolyl-1,3,5-triazine, hexamethoxymethyltriazine, bis(4-dimethylaminophenyl)-1,3,5-triazine, 2,4,6-triphenyl-1,3,5-triazine, etc., but are not limited to these.

[0172] Secondary initiators can increase the sensitivity of primary initiators or act as an aid in activation at longer wavelengths, thereby inducing uniform hardening of the coating surface. Examples of secondary initiators include anthracene, thiophene, and coumarin photosensitizers.

[0173] Examples of anthracene initiators include 9,10-diphenylanthracene, 1-chloro-9,10-bis(phenylacetonitrile)anthracene, and 2-ethylanthracene, but are not limited to these.

[0174] Examples of thiophene initiators include isopropyl titanium dioxide, ethyl 2-chloroacetate, and 2,4-diethyl titanium dioxide, but are not limited to these.

[0175] Examples of coumarin photosensitizers include 6,4-methyl-7-diethylaminocoumarin and 3-phenylcoumarin.

[0176] Photoinitiators can also be used in conjunction with photosensitizers, which are excited after absorbing light and then transfer energy to induce a chemical reaction. Examples of photosensitizers include tetraethylene glycol bis-3-mercaptopropionate, pentanetriol propionate-3-mercaptopropionate, and pentaerythritol tetramer-3-propionate mercapto.

[0177] The photoinitiator may comprise 1 to 40 wt%, 1 to 30 wt%, 1 to 25 wt%, 5 to 40 wt%, 5 to 30 wt%, or 5 to 25 wt% relative to the total composition. When the photoinitiator is contained within the above range, the monomers are fully cross-linked during the formation of the protective layer, thereby achieving excellent and reliable protective effects.

[0178] (6) Other additives In the embodiments of this disclosure, the composition may include other additives.

[0179] For example, acrylate additives, adhesives, balancing agents, and antistatic agents may be further applied during the preparation of the compositions disclosed herein.

[0180] Compositions containing acrylate additives and / or adhesive aids can improve adhesion to the substrate when forming a protective layer.

[0181] Equalizing agents can improve surface smoothness. For example, they can help the composition diffuse evenly on a substrate and can prevent excessive diffusion or shrinkage of the composition by adjusting surface tension.

[0182] In addition, it can improve the flowability and processability of ink on the inkjet printer head.

[0183] Balancing agents may include silicon-based compounds.

[0184] The molecular weight of silicon-based compounds can range from 5000 g / mol to 15000 g / mol.

[0185] The molecular weight of silicon-based compounds can range from 5000 g / mol to 10000 g / mol.

[0186] The viscosity of silicon-based compounds can be 100,000 mm. 2 / s to 500000mm 2 / s.

[0187] When determining the viscosity of a mixture of 50 wt% silicon-based compound and 50 wt% propylene glycol methyl ether acetate at 20°C, it can be 10 mm. 2 / s to 40mm 2 / s.

[0188] The viscosity of a mixture containing silicon-based compounds can be 10 mm.2 / s to 30mm 2 / s.

[0189] Silicon-based compounds may include those selected from C1-C 40 Alkyl; C1-C 40 alkenyl; C1-C 40 Alkyne group; C1-C 40 Alkyl group; C6-C 40 Aryloxy group; C1-C 40 Substituents in the group consisting of alkoxycarbonyl; carbonyl; ether; ester; carboxyl or combinations thereof.

[0190] Antistatic agents can suppress the generation of static electricity by adjusting the surface resistance of the protective layer according to embodiments of the present invention, thereby preventing dust adhesion and maintaining electrical stability.

[0191] For example, as antistatic agents, examples include polymeric antistatic agents, ionic antistatic agents, semiconductor fillers, inorganic antistatic agents, and organometallic composite antistatic agents.

[0192] Examples of polymeric antistatic agents include polyethylene glycol, polyoxyethylene, polyvinylpyrrolidone, and polyethyleneimine, but these are not limited to these.

[0193] Ionic antistatic agents are classified into cationic and anionic types. Cationic antistatic agents include quaternary ammonium salts, imidazole salts, and pyridine salts, while anionic antistatic agents include sulfonates and carboxylates, but are not limited to these.

[0194] Semiconductor fillers include carbon black, carbon nanotubes, silver nanowires, etc., but are not limited to these.

[0195] Inorganic antistatic agents include indium tin oxide, zinc oxide, titanium oxide, silicon oxide, etc., but are not limited to these.

[0196] Organometallic composite antistatic agents include conductive polymer mixtures (PEDOT:PSS), silver nanoparticle composites, copper oxide nanocomposites, graphene-metal composites, etc., but are not limited to these.

[0197] additive Other additives may be contained in amounts of 1 to 10 by weight relative to the total amount of the composition.

[0198] According to embodiments of this disclosure, a composition comprising the above-described colorant, first monomer, second monomer, and third monomer can be provided.

[0199] According to embodiments of this disclosure, a protective layer comprising the above-described composition can be provided.

[0200] According to embodiments of this disclosure, a display device comprising the above-described composition can be provided.

[0201] Various embodiments of this disclosure will be described in detail below with reference to the accompanying drawings.

[0202] Figure 1 This is a schematic illustration of an exemplary cross-sectional view of a display device according to an embodiment of the present disclosure.

[0203] Figure 2 It is magnification Figure 1 An exemplary cross-sectional view of region A shown.

[0204] See Figure 1 and Figure 2 The display device may include a protective layer 100, a substrate 210, and a pixel forming layer 220. The display device may be a display element, a display panel, or an electronic device. The pixel forming layer 220 may include a pixel circuit layer 310, a pixel element layer 330, and an encapsulation layer 350.

[0205] The protective layer 100 may be disposed on the lower part of the substrate 210. The protective layer 100 may also be disposed on another surface of the substrate 210 opposite to one surface of the substrate 210 on which the pixel forming layer 220 is disposed. As described above, the protective layer 100 may comprise a composition containing a colorant, a monomer, and an adhesive aid.

[0206] The protective layer 100, by including a colorant, minimizes light reflection caused by internal light from the underside of the display panel, thereby preventing color interference and electrode oxidation. The protective layer 100, by including a first monomer, a second monomer, and a third monomer, enhances resistance to external impacts, scratches, and wear, effectively protecting sensitive electronic components such as the display from external stimuli.

[0207] The substrate 210 may be disposed on the protective layer 100. The substrate 210 may be disposed in direct contact with the protective layer 100. The substrate 210 is used to support various components of the display device and may include a light-emitting area and a non-light-emitting area surrounding the light-emitting area. The substrate 210 may be formed of an insulating material such as a glass substrate or a plastic substrate.

[0208] A pixel circuit layer 310 can be disposed on the substrate 210. The pixel circuit layer 310 may include various insulating layers 311, 312, 313, 314, 315 and thin film transistors 320.

[0209] A buffer layer 311 can be disposed on the substrate 210. The buffer layer 311 can be a single layer or multiple layers. The buffer layer 311 can delay the diffusion of moisture and / or oxygen that has penetrated into the substrate 210.

[0210] A thin-film transistor 320 can be disposed on the buffer layer 311. The thin-film transistor 320 may include an active layer 321, a gate electrode 322, a source electrode 323, and a drain electrode 324.

[0211] The active layer 321 can be disposed on the buffer layer 311. The active layer 321 can be made of silicon semiconductor, oxide semiconductor or organic semiconductor.

[0212] A gate insulating layer 312 may be disposed on a portion of the upper surface and the side surface of the active layer 321. The gate insulating layer 312 may be disposed on the buffer layer 311. The gate insulating layer 312 may be formed of an inorganic insulating material.

[0213] A gate electrode 322 can be disposed on the gate insulating layer 312. The gate electrode 322 can comprise various conductive materials. For example, the gate electrode 322 can comprise a metal or alloy, or it can comprise a transparent conductive material. The gate electrode 322 can be a single-layer or multi-layer structure.

[0214] The region where the active layer 321 overlaps with the gate electrode 322 can be the channel region of the thin-film transistor 320, and the region where the active layer 321 and the gate electrode 322 do not overlap can be the conductive region.

[0215] An interlayer insulating layer 313 may be disposed on the gate electrode 322. The interlayer insulating layer 313 may be disposed on the gate insulating layer 312. The interlayer insulating layer 313 may be formed of an inorganic insulating material.

[0216] A source electrode 323 and a drain electrode 324 can be disposed on the interlayer insulating layer 313. The source electrode 323 and the drain electrode 324 can be electrically and physically connected to the conductive region of the active layer 321.

[0217] The source electrode 323 and the drain electrode 324 can be electrically and physically connected to the conductive region of the active layer 321 through contact holes passing through the gate insulating layer 312 and the interlayer insulating layer 313, respectively.

[0218] Figure 2 The drain electrode 324 is connected to the anode electrode 341 of the light-emitting element 340, but the source electrode 323 can also be connected to the anode electrode 341.

[0219] The source electrode 323 and drain electrode 324 can each comprise various conductive materials. For example, the source electrode 323 and drain electrode 324 can comprise metals or alloys, or they can comprise transparent conductive materials. The source electrode 323 and drain electrode 324 can be a single-layer or multi-layer structure.

[0220] A passivation layer 314 for insulating the thin-film transistor 320 may be disposed on the source electrode 323 and the drain electrode 324. The passivation layer 314 may also be disposed on the interlayer insulating layer 313. The passivation layer 314 may be formed of an inorganic insulating material.

[0221] A planarization layer 315 may be disposed on the passivation layer 314. The planarization layer 315 may be formed of an organic insulating material. The planarization layer 315 may be a single layer or a multilayer structure.

[0222] A pixel element layer 330 can be disposed on the planarization layer 315. The pixel element layer 330 may include a light-emitting element 340 and a pixel definition layer 331. The light-emitting element 340 may include an anode electrode 341, a light-emitting layer 342, and a cathode electrode 343.

[0223] The anode electrode 341 can be disposed on the planarization layer 315.

[0224] The anode electrode 341 can be electrically and physically connected to the drain electrode 324 of the thin-film transistor 320 through a contact hole passing through the planarization layer 315 and the passivation layer 314.

[0225] A pixel definition layer 331 can be formed on the boundary of a sub-pixel region. The pixel definition layer 331 can be formed in the planarization layer 315 to cover the edge of the anode electrode 341 to delineate the sub-pixel region. The pixel definition layer 331 can be formed of an organic insulating material. The pixel definition layer 331 may include a black substance. When the pixel definition layer 331 contains a black substance, it can block both internal and external light.

[0226] A light-emitting layer 342 can be formed on the anode electrode 341 and the pixel definition layer 331. The light-emitting layer 342 can cover the pixel definition layer 331 and the anode electrode 341 that is not covered by the pixel definition layer 331.

[0227] The light-emitting layer 342 can emit any type of light, including red, green, blue, and white light. The light-emitting layer 342 can be, for example, a white light-emitting layer that emits white light. The light-emitting layer 342 can be formed as a tandem structure with two or more stacks.

[0228] The anode electrode 341 may be a reflective electrode comprising a metallic material having a low work function and excellent reflection efficiency. The anode electrode 341 may include a reflective electrode and a transparent electrode disposed on the reflective electrode.

[0229] A cathode electrode 343 can be formed on the light-emitting layer 342. The cathode electrode 343 can be a transmissive electrode. Alternatively, the cathode electrode 343 can be a semi-transmissive electrode. The cathode electrode 343 can be made of a thin metal film with semi-transparent properties.

[0230] Although not shown, a covering layer may be provided on the cathode electrode 343.

[0231] An encapsulation layer 350 can be set on the pixel element layer 330.

[0232] The encapsulation layer 350 can be disposed on the cathode electrode 343. The encapsulation layer can be a single layer or a multilayer structure. The encapsulation layer 350 can be formed by alternately stacking multiple inorganic and organic films.

[0233] Figure 3a and Figure 3b This is a diagram illustrating the optical path of a display device according to an embodiment of the present disclosure and a display device according to a comparative example. Figure 3a The optical paths of external light and internal light of the display device according to embodiments of the present disclosure are shown. Figure 3b The light paths of the external and internal light of the display device are shown in the comparative example.

[0234] See Figure 3a The first external light L1 incident on the pixel definition layer 331 EX A portion of it can be reflected onto the metal layer constituting the thin-film transistor 320 and emit light to the outside L1'. EX Additionally, the second external light L2 incident on the light-emitting layer 342 EX A portion of the light can be reflected by the anode electrode 341 and anode electrode 343 and emitted to the outside L2'. EX .

[0235] In the case of top-emitting mode, the internal light emitted by the light-emitting layer 342 can be reflected from the anode electrode 341 and emitted in the opposite direction to the substrate 210, i.e., the front direction of the display device. On the other hand, some internal light L1 IN L2 IN It can travel in the direction of substrate 210. In this case, the first internal light L1 IN Second internal light L2 IN The light can be blocked or absorbed by the protective layer 100 disposed beneath the substrate 210. The internal light L1 is blocked or absorbed by the protective layer 100. IN L2 IN It will not emit light outside the substrate 210, nor will it reflect light onto the light-emitting layer 342, thus easily preventing color interference and electrode oxidation.

[0236] Conversely, see Figure 3b Some internal light L1 emits light from the light-emitting layer 342 and travels along the substrate 210. IN L2 IN It can be reflected below the substrate 210 and travel towards the light-emitting layer 342. This emitted light L1' IN L2' INAs light travels towards the light-emitting layer 342, it interferes with the light emitted from the light-emitting layer 342, resulting in color interference. In addition, due to the light incident from the lower part of the substrate 210, electrode oxidation may occur.

[0237] According to embodiments of the present invention, the protective layer, comprising a colorant, a first monomer, a second monomer, and a third monomer, can possess high adhesion and light-shielding properties. Therefore, color interference and electrode oxidation caused by internal and external light can be prevented, thereby improving the reliability of the display device.

[0238] In addition, the protective layer can improve the durability and reliability of the display device by enhancing adhesion, thereby preventing performance degradation.

[0239] Figures 4a to 4d This is a schematic illustration of exemplary process diagrams showing the manufacturing steps of a display device according to embodiments of the present disclosure.

[0240] The protective layer according to embodiments of the present disclosure can be formed by processing a composition as a UV-curable ink composition using an inkjet printing method. The method for preparing the protective layer according to embodiments of the present disclosure may include the steps of preparing a display panel or substrate; applying an ink composition comprising the composition prepared in step 1; and curing the coating.

[0241] See Figure 4a The process may begin with preparing a substrate 210. The substrate 210 may undergo surface treatment to facilitate coating of the composition. By surface treating the substrate 210 according to its surface energy, coating performance can be improved. For example, the substrate 210 may be surface treated using cleaning, UV ozone, or plasma. Alternatively, the substrate 210 may be prepared as a display panel in which a pixel forming layer 220 is formed on one surface of the substrate 210.

[0242] See Figure 4b The coating 100a can be formed by applying an ink composition onto the substrate 210. The coating 100a can be formed on another surface of the substrate 210 where the pixel forming layer 220 is not provided.

[0243] The coating 100a can be formed using inkjet printing. An ink composition comprising the composition disclosed herein is prepared and supplied to an inkjet printer head, allowing the ink composition to be ejected such that the coating thickness is 1 to 100 μm. In this case, to ensure stable ejection of the ink composition from the inkjet printer head, the ink composition can have a low viscosity of approximately 35 cP.

[0244] See Figure 4cA protective layer can be formed by exposing the coating 100a to ultraviolet (UV) light and subjecting it to a curing process. UV light can be applied using a UV-LED lamp. Considering the diffusion properties of the ink composition, the UV curing process can be performed immediately after applying the ink composition.

[0245] For example, the distance between the UV-LED lamp and the coating is approximately 10 cm, with an accumulated light intensity of approximately 3 J / cm². 2 The UV curing process can be carried out under wavelength conditions of 250~400nm.

[0246] See Figure 4d The substrate 210, which has a protective layer 100 formed on its lower part, can be cut into units. The substrate 210 can be cut into multiple units. The cutting process can be performed using a wheel or a laser.

[0247] The embodiments according to this disclosure are described in detail below, but this disclosure is not limited thereto.

[0248] [Synthesis example] The compounds represented by chemical formula 2 according to the present invention can be synthesized by the following reaction formulas 1 to 14, but the compounds represented by chemical formula 2 according to the present disclosure are not limited to those generated by such reaction formulas.

[0249] <Reaction Formula 1> Sub-2-1-1 (3.78 g, 21.5 mmol) was dissolved in a round-bottom flask using THF. Sub-2-1-2 (4.41 g, 21 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.29 g, 60 mmol), and water were then added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. The solution was concentrated, and the resulting compound was recrystallized from a silica gel column to give 3.65 g of the product.

[0250] <Reaction 2> Sub-2-2-1 (2.72 g, 20 mmol) was dissolved in a round-bottom flask using THF. Then, Sub-2-2-2 (3.12 g, 20 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.29 g, 60 mmol), and water were added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. After concentration, the resulting compound was recrystallized from silica gel using a silica gel column to give 2.65 g of product.

[0251] <Reaction Formula 3> Sub-2-3-1 (5.36 g, 44 mmol) was dissolved in a round-bottom flask using THF. Then, Sub-2-3-2 (5.72 g, 20 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.29 g, 60 mmol), and water were added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. After concentration, the resulting compound was recrystallized from silica gel using a silica gel column to give 4.51 g of product.

[0252] <Reaction Formula 4> Sub-2-4-1 (2.56 g, 21 mmol) was dissolved in a round-bottom flask using THF. Sub-2-4-2 (5.63 g, 20.2 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.29 g, 60 mmol), and water were then added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. The solution was concentrated, and the resulting compound was recrystallized from silica gel column chromatography to give 4.43 g of product.

[0253] <Reaction Formula 5> Sub-2-5-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-5-2. The molar ratio of distilled water to Si was maintained between 1.0 and 1.2. Subsequently, Ti(OBu)4 and methanol (MeOH) were added to Sub-2-5-2 and Sub-2-5-1, respectively, to obtain the final product.

[0254] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0255] <Reaction Formula 6> Sub-2-5-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-5-2. The molar ratio of distilled water to Si was maintained between 0.5 and 0.7. Subsequently, methanol (MeOH) was added to Sub-2-5-2 and Sub-2-5-1 to obtain the final product.

[0256] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0257] <Reaction Formula 7> Sub-2-6-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0–5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-6-2. The molar ratio of distilled water to Si was maintained between 1.0 and 1.2. Subsequently, Ti(OBu)4 and methanol (MeOH) were added to Sub-2-6-2 and Sub-2-6-1, respectively, to obtain the final product.

[0258] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0259] <Reaction Formula 8> Sub-2-7-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-7-2. The molar ratio of distilled water to Si was maintained between 0.5 and 0.7. Subsequently, methanol (MeOH) was added to Sub-2-7-2 and Sub-2-7-1 to obtain the final product.

[0260] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0261] <Reaction Formula 9> Sub-2-8-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-8-2. The molar ratio of distilled water to Si was maintained between 1.0 and 1.2. Subsequently, Ti(OBu)4 and methanol (MeOH) were added to Sub-2-8-2 and Sub-2-8-1, respectively, to obtain the final product.

[0262] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0263] <Reaction Formula 10> Sub-2-9-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-9-2. The molar ratio of distilled water to Si was maintained between 0.5 and 0.7. Subsequently, methanol (MeOH) was added to Sub-2-9-2 and Sub-2-9-1 to obtain the final product.

[0264] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0265] <Reaction Formula 11> Sub-2-10-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-10-2. The molar ratio of distilled water to Si was maintained between 1.0 and 1.2. Subsequently, Ti(OBu)4 and methanol (MeOH) were added to Sub-2-10-2 and Sub-2-10-1, respectively, to obtain the final product.

[0266] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0267] <Reaction Formula 12> Sub-2-11-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0-5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-11-2. The molar ratio of distilled water to Si was maintained between 0.5 and 0.7. Subsequently, methanol (MeOH) was added to Sub-2-11-2 and Sub-2-11-1 to obtain the final product.

[0268] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0269] <Reaction Formula 13> Sub-2-12-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0–5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-12-2. The molar ratio of distilled water to Si was maintained between 1.0 and 1.2. Subsequently, Ti(OBu)4 and methanol (MeOH) were added to Sub-2-12-2 and Sub-2-12-1, respectively, to obtain the final product.

[0270] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0271] <Reaction Formula 14> Sub-2-13-1 was dissolved in distilled water, and acetic acid was added dropwise while maintaining a low temperature of 0–5°C. The mixture was then stirred and distilled under reduced pressure below 30°C to obtain the intermediate product Sub-2-13-2. The molar ratio of distilled water to Si was maintained between 0.5 and 0.7. Subsequently, methanol (MeOH) was added to Sub-2-13-2 and Sub-2-13-1 to obtain the final product.

[0272] The degree of polymerization (n) of the product can be adjusted by changing the molar ratio of water to Si or by adding a catalyst.

[0273] The compounds shown in Formula 3 of this disclosure are synthesized by reactions according to Formulas 15 to 20 below, but the compounds shown in Formula 3 of this disclosure are not limited to being synthesized by such reactions.

[0274] <Reaction Formula 15> Sub-3-1-1 (3.32 g, 20 mmol) was dissolved in a round-bottom flask using THF. Then, Sub-3-1-2 (1.52 g, 20 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.29 g, 60 mmol), and water were added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. After concentration, the resulting compound was recrystallized from silica gel using a silica gel column to give 1.95 g of product.

[0275] <Reaction Formula 16> Sub-3-2-1 (3.44 g, 21 mmol) was dissolved in a round-bottom flask using THF. Sub-3-2-2 (2.71 g, 20.2 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.29 g, 60 mmol), and water were then added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. The solution was concentrated, and the resulting compound was recrystallized from silica gel column chromatography to give 2.91 g of product.

[0276] <Reaction Formula 17> Sub-3-3-1 (3.4 g, 25 mmol) was dissolved in toluene in a round-bottom flask, followed by the addition of Sub-3-3-2 (3.75 g, 50 mmol), Pd2(dba)3 (0.7 g, 0.8 mmol), and 50% P( t -Bu)3 (1ml, 2mmol), NaO t -Bu (7.34 g, 76.3 mmol) was stirred at 40°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried with MgSO4. After concentration, the resulting compound was recrystallized from silica gel column to give 2.23 g of product.

[0277] <Reaction Formula 18> Sub-3-4-1 (6.2 g, 20 mmol) was dissolved in a round-bottom flask using THF. Sub-3-4-2 (7.65 g, 44 mmol), Pd(PPh3)4 (0.69 g, 0.6 mmol), K2CO3 (8.28 g, 59.9 mmol), and water were then added, and the mixture was stirred at 80°C. After the reaction was complete, the mixture was extracted with CH2Cl2 and water, and the organic layer was dried over MgSO4. The solution was concentrated, and the resulting compound was recrystallized from silica gel column chromatography to give 6.15 g of product.

[0278] <Reaction Formula 19> In a reactor purged with N2 gas, 25 ml of tetrahydrofuran (THF) and 725 mg of NaH were added and cooled to 0°C. Sub-3-5-1 (5 g, 27.47 mmol) was diluted with 10 ml of THF and added dropwise while maintaining the temperature at 0°C with stirring for 1 hour to form an enolate. Sub-3-5-2 (1.98 g, 27.5 mmol) was dissolved in THF, and the enolate solution was slowly added. The temperature was raised to 20–25°C, and the mixture was stirred for 1 hour. Then, NH4Cl was added at 0°C to remove NaH. The product was purified with ethyl acetate and distilled under reduced pressure to obtain 2.94 g of the product.

[0279] <Reaction Formula 20> Sub-3-6-1 (3.13 g, 27 mmol) was dissolved in toluene in a round-bottom flask, and the mixture was heated to 100°C. Sub-3-6-2 (3.98 g, 29.7 mmol) and 30 wt% NaOH aqueous solution (3.24 mL) were then added dropwise, and the mixture was kept at this temperature for 3 hours. After the reaction was complete, the mixture was washed with water, toluene was recovered under reduced pressure, and the mixture was distilled to give 4.34 g of the product.

[0280] [Example] Preparation Example 1: Preparation of Black Colorant 15g of carbon black W-7016 (manufactured by Basf), 8.5g of Disperbyk 163 (manufactured by BYK), and 6.5g of SR-3613 (manufactured by SMS) were dispersed together with 70g of propylene glycol methyl ether acetate in a paint shaker (manufactured by Asada) containing 100g of zirconia beads (manufactured by Toray) with a diameter of 0.5mm for 10 hours to obtain a dispersion.

[0281] 1. Preparation of the composition The composition was prepared with the composition (wt%) shown in Table 1 below.

[0282] [Table 1] 2. Preparation of the protective layer (1) Preparation steps of the substrate Prepare a 100x100mm bare glass substrate, perform UV ozone treatment and plasma treatment, and clean the substrate.

[0283] (2) Coating steps of the ink composition The P-1 to P-184 compositions prepared in Table 1 are supplied to the KM 1024 inkjet printer head of Konica Minolta to discharge the protective layer composition so that the film coating thickness reaches 1 to 100 μm, thereby forming a coating.

[0284] (3) Exposure steps The ink composition coated on the substrate was illuminated using a Phoseon Technology UV-LED lamp at a wavelength of 250 to 400 nm, with a distance of approximately 10 cm between the lamp and the ink coating, resulting in a light accumulation of approximately 3 J / cm. 2 Under certain conditions, a UV curing process is carried out to manufacture a protective layer.

[0285] 3. Evaluation of substrate adhesion strength The protective layer prepared in step 2 is evaluated using a cross-cut test according to ASTM D3359. The coating surface is scratched at 1.5 mm intervals (11 cuts), and then tape is applied to the grid surface and peeled off. The degree of peeling on the coating surface is then priced according to the following cross-cut evaluation criteria (ASTM D3359).

[0286] The adhesion strength preferably meets 5B, and the results are summarized in Table 2.

[0287] <Cross-cut evaluation criteria (ASTM D3359)> 5B: 0% of the stripped grid area 4B: The stripped area is within 5% 3B: The stripped area is within 5% to 15%. 2B: The stripped area is within 15% to 35%. 1B: The stripped area is between 35% and 65%. 0B: More than 65% of the stripped grid area has been removed. 4. Hardness Measurement The hardness of the protective layer was assessed using the pencil hardness test method (KS M ISO 15184 test standard). A pencil to be tested was selected, held vertically at a right angle, and smoothed with sandpaper. The pencil was then fixed in place using a pencil hardness tester. 2. After the prepared protective layer was fixed on the stage, the pencil to be tested was fixed at a 45-degree angle. A cone weighing of 750g was measured, and the rotation speed was set to 100mm / min. While observing the sample surface, the pencil hardness was increased repeatedly until scratch damage occurred on the surface.

[0288] Therefore, the hardness of each protective layer was evaluated and summarized in Table 2.

[0289] <Hardness evaluation criteria> Low hardness B < HB < 1H < 2H High hardness, preferably satisfying a hardness of 1H or higher.

[0290] [Table 2] The compositions of Examples 1 to 181 each include a first monomer containing an acrylate group, a second monomer having an oxygen-containing cyclic group, and a third monomer having an oxygen-containing cyclic group, thus exhibiting excellent adhesion and hardness as a protective layer.

[0291] In particular, in all the examples, the adhesion reached the highest grades of 4B to 5B, which is because the acrylate group as the first monomer has the effect of significantly improving the bonding force between the panel and the protective layer.

[0292] In addition, in the examples, the hardness is 1H or 2H depending on the composition of the composition, which is because the second monomer and the third monomer having oxygen-containing cyclic groups contribute to enhancing the hardness of the composition.

[0293] In particular, in Examples such as Examples 7 and 9, the hardness was measured as 2H, which indicates that the ratio or combination of the second and third monomers in the composition was optimized, thereby increasing the hardness.

[0294] In contrast, in the comparative examples, since a specific monomer among the first monomer, the second monomer and the third monomer is excluded, the performance in terms of adhesion and hardness decreases more significantly.

[0295] Comparative Example 1 does not contain the first monomer, and the measured adhesion was at the lowest level of 0B. This is probably because the acrylate group plays a key role in forming the bonding force between the protective layer and the panel.

[0296] The acrylate group can provide adhesion, and in particular, enables the protective layer to be stably attached to the substrate through strong intermolecular interactions. In addition, the flexible property of the acrylate group can increase the initial adhesion of the protective layer and help it maintain the bonding force under external impact.

[0297] Comparative Example 2 contains no oxygen-containing cyclic group, in which the second monomer containing an epoxy group is not included, and the hardness is reduced to HB compared with the examples. This is probably because the epoxy group forms a high crosslink density and plays a major role in enhancing the strength of the protective layer and providing resistance to external impact. In the absence of epoxy groups, the molecular bonds inside the protective layer may be weakened, making it susceptible to physical damage.

[0298] Comparative Example 3, which does not contain oxygen-containing cyclic groups (i.e., no third monomer with oxetane groups), showed a lower level of B in hardness measurement compared to the examples. This is likely because oxetane forms a polymer network through rapid polymerization, and its low shrinkage and high reactivity play a crucial role in improving the surface hardness and durability of the protective layer. Without oxetane, it is difficult to form a uniform structure in the protective layer, resulting in a significant reduction in hardness and durability.

[0299] In addition, due to the interaction between the epoxy group and the oxobutyric group in the oxygen-containing ring group, a high crosslinking density and uniform polymer network are formed, which can enhance the durability against external impacts and scratches.

[0300] Compared to the comparative example, the excellent adhesion and hardness observed in the examples are because the acrylate groups and oxygen-containing cyclic groups contribute to and complement each other in terms of adhesion and hardness, respectively. In the comparative example, the performance was reduced due to the exclusion of one of these monomers.

[0301] As shown in the experimental results of the embodiments, the embodiments of this disclosure can simultaneously improve the adhesion and hardness of the protective layer including the composition by providing a composition comprising a first monomer, a second monomer, and a third monomer.

[0302] This disclosure is not limited to the above embodiments, but can be manufactured in various different forms.

[0303] The above description is merely an exemplary description of this disclosure, and those skilled in the art can make various modifications without departing from the basic characteristics of this disclosure.

[0304] Therefore, the embodiments disclosed herein are not intended to limit the invention, but rather to illustrate that these embodiments do not limit the spirit and scope of this disclosure. The scope of protection of this disclosure should be interpreted by the claims, and all technologies within the same scope should be interpreted as being included within the scope of the rights of this disclosure.

Claims

1. A composition comprising: Colorant; The first monomer containing an acrylate group; The second monomer containing an oxygen-containing cyclic group; as well as The third monomer containing an oxygen-containing cyclic group.

2. The composition according to claim 1, wherein, The second monomer contains an epoxy group. The third monomer contains an oxocyclic butyl group.

3. The composition according to claim 1, wherein, The first monomer is a compound represented by the following chemical formula 1. [Chemical Formula 1] In the chemical formula 1, R 1 Choose from hydrogen; deuterium; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Ether group; C1-C 30 Ketone group; C1-C 30 Ester group; C1-C 30 Alkyl group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 In the group consisting of aryloxy groups; hydroxyl groups; and combinations thereof, L 1 Select free single key; C1-C 30 Alkylene; C 2- C 30 alkenyl group; C2-C 30 etymynyl; C3-C 30 Cycloalkylene; C1-C 30 Ether group; C1-C 30 Ketone group; C1-C 30 Ester group; C1-C 30 alkeneoxy group; C6-C 30 arylene; a C2-C group containing at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 aryl groups; and combinations thereof, R of chemical formula 1 1 and L 1 In this context, alkyl, alkenyl, alkynyl, cycloalkyl, ether, ketone, ester, alkoxy, aryl, heterocyclic, and aryloxy groups can be independently selected from deuterium, halogen, hydroxyl, nitrile, nitro, carbonyl, ether, ester, and C1-C groups. 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, C6-C 30 Aryloxy group, C6-C 30 arylamine, C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl, and C2-C atoms selected from at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 One or more substituents in the group consisting of heterocyclic groups are further substituted. a is an integer from 1 to 4.

4. The composition according to claim 1, wherein, The first monomer is one or more of the compounds shown in chemical formulas P-1-1 to P-1-36 below. 。 5. The composition according to claim 1, wherein, The second monomer is a compound represented by the following chemical formula 2. [Chemical Formula 2] In the chemical formula 2, R 2 and R 3 Each is independently selected from hydrogen; deuterium; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkoxy group; C1-C 30 Alkylamine group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 In the group consisting of arylamine groups; hydroxyl groups; and combinations thereof, R 4 Choose from hydrogen; deuterium; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkoxy group; C1-C 30 Alkylamine group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 In the group consisting of arylamine groups; hydroxyl groups; and combinations thereof, L 2 Select free single key; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkylene; C2-C 30 alkenyl group; C2-C 30 etymynyl; C3-C 30 Cycloalkylene; C3-C 30 Cycloalkenyl; C1-C 30 alkeneoxy group; C1-C 30 Alkylamine group; C6-C 30 arylene; a C2-C group containing at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 Arylamine groups; and combinations thereof, The R 2 and L 2 They can bond together to form a ring. The R 2 To R 4 and L 2 In this context, alkyl, alkenyl, alkynyl, cycloalkyl, alkoxy, alkylamino, aryl, heterocyclic, aryloxy, arylamino, alkylene, alkenyl, alkyneyl, cycloalkylene, cycloalkenyl, alkoxy, and arylene can be independently selected from deuterium, halogen, hydroxyl, nitrile, nitro, and C1-C. 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, C6-C 30 Aryloxy group, C6-C 30 arylamine, C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl and C2-C 30 The substituent is substituted by one or more substituents in the group consisting of heterocyclic groups, and the substituted substituent can be further substituted by one or more substituents selected from the above substituents. b is an integer from 1 to 4.

6. The composition according to claim 1, wherein, The second monomer is represented by the following chemical formulas P-2-1 to P-2-140. 。 7. The composition according to claim 1, wherein, The third monomer is represented by the following chemical formula 3. [Chemical Formula 3] In the chemical formula 3 R 5 and R 6 Each is independently selected from hydrogen; deuterium; nitrile group; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkyl group; C6-C 30 aryl; a C2-C group containing at least one heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C1-C 30 Alkylamine group; C1-C 30 arylamine group; hydroxyl group; C1-C 30 The group consisting of acrylate groups; -N(R')(R”); and combinations thereof, L 3 Select free single key; C1-C 30 carbonyl group; C1-C 30 Ether group; C1-C 30 Ester group; C1-C 30 Alkylene; C2-C 30 alkenyl group; C2-C 30 etymynyl; C3-C 30 Cycloalkylene; C3-C 30 Cycloalkenyl; C1-C 30 alkeneoxy group; C1-C 30 Amine group; C6-C 30 arylene; a C2-C group containing at least one heteroatom of oxygen (O), nitrogen (N), sulfur (S), silicon (Si), and phosphorus (P). 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 Arylamine groups; and combinations thereof, R' and R” are each independently selected from hydrogen; deuterium; hydroxyl group; acrylate group; carbonyl group; ether group; ester group; C1-C 30 Alkyl; C2-C 30 Alkenyl; C2-C 30 Alkyne group; C3-C 30 cycloalkyl; C1-C 30 Alkoxy group; C1-C 30 Alkylamine group; C6-C 30 Aryl; C2-C containing at least one heteroatom from O, N, S, Si, and P. 30 Heterocyclic group; C6-C 30 Aryloxy group; C6-C 30 Arylamine groups; and combinations thereof, The R 5 R 6 、R'、R” and L 3 In this context, alkyl, alkenyl, alkynyl, cycloalkyl, alkoxy, alkylamino, aryl, heterocyclic, aryloxy, arylamino, alkylene, alkenyl, alkyneyl, cycloalkylene, cycloalkenyl, alkoxy, and arylene can be independently selected from deuterium, halogen, hydroxyl, nitrile, nitro, and C1-C. 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkylsilyl, C1-C 30 Alkylthiophene group, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, C6-C 30 Aryloxy group, C6-C 30 Arylamine group, -N(R')(R”), C6-C 30 Arylsilane, C6-C 30 arylthiophene group, deuterated C6-C 30 Aryl, C7-C 30 Arylalkyl, C8-C 30 Arylalkenyl, silyl, siloxane, boronyl, thiolyl, germanyl and C2-C 30 In the group consisting of heterocyclic groups, where one or more substituents are substituted, the substituted substituent can be further substituted by one or more substituents selected from the above substituents, wherein R' and R” in -N(R')(R”) can be defined as the same as those defined above. c is an integer from 1 to 4. p is an integer between 0 and 5. When p is 2 or higher, R 5 They are the same or different.

8. The composition according to claim 7, wherein, The third monomer is a compound represented by any one of the following chemical formulas 3-1 and 3-2. [Chemical Formula 3-1] [Chemical Formula 3-2] In chemical formulas 3-1 and 3-2, c, R 5 R 6 and L 3 Defined as c, R as defined in the chemical formula 3 5 R 6 and L 3 The definitions are the same. p1 and p2 are each 0 or 1.

9. The composition according to claim 1, wherein, The third monomer is one or more of the compounds shown below, from P-3-1 to P-3-68. 。 10. The composition according to claim 1, wherein, The colorant includes black pigment.

11. The composition according to claim 1, further comprising an initiator.

12. The composition according to claim 11, wherein, The initiator is selected from the group consisting of free radical initiators, cationic initiators, and combinations thereof.

13. A protective layer comprising the composition of claim 1.

14. A display device, comprising: substrate; The pixel forming layer on the substrate; as well as A protective layer located on the underside of the substrate, comprising the composition of claim 1.

15. The display device according to claim 14, wherein, The protective layer is configured to contact the substrate.

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