A treatment method for improving wear and corrosion resistance of aluminum alloy

CN122959683APending Publication Date: 2026-10-23GUANGZHOU GRANDTECH CO LTD
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Patent Information

Application Number
CN202611111525.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-07-24
Publication Date
2026-10-23

AI Technical Summary

Technical Problem

[0004]本发明的目的是提供一种提高铝合金耐磨耐蚀性的处理方法,解决了当前离子氮化铝合金技术中存在的铝合金基体对AlN支撑能力弱、离子氮化获得AlN需要高温条件、外观色彩无法调制等的问题

Benefits of technology

[0045]本发明在低温度、低电压下实现铝合金表面氮化,避免了铝合金基体自身性能的恶化;仅需AlN层能连续地覆盖工件表面,无需使AlN层达到微米级厚度,从而大幅度地节省了铝合金的氮化时间;再配合氮化后的导电化处理,既合理发挥AlN绝缘层对处理体系的贡献,又为后续气相制备顶层涂层奠定基础。

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Abstract

The application discloses a treatment method for improving wear resistance and corrosion resistance of aluminum alloy, and steps include: pre-cleaning treatment of workpiece surface, heating workpiece and etching activation, low-temperature ion implantation, aluminum alloy surface nitriding, sputtering metal layer and nitriding, and preparation of vapor deposition coating on the surface. The application realizes aluminum alloy surface nitriding at low temperature and low voltage, avoids deterioration of aluminum alloy substrate performance, only needs continuous AlN layer to cover the workpiece surface, and does not need to make the AlN layer reach micron-level thickness, thereby greatly saving the aluminum alloy nitriding time; and in combination with the conductive treatment after nitriding, the AlN insulating layer contributes to the treatment system, and lays a foundation for subsequent vapor preparation of top coating. The application takes into account the appearance, wear resistance and corrosion resistance of the aluminum alloy surface, and is suitable for application in high-end aluminum alloy products.
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Description

Technical Field

[0001] This invention relates to the field of aluminum alloy processing technology, and in particular to a processing method for improving the wear and corrosion resistance of aluminum alloys. Background Technology

[0002] Aluminum alloys are currently the most widely used lightweight metal materials, playing a crucial role not only in lightweighting and energy conservation but also in the increasingly widespread application of various electronic products. However, the poor wear and corrosion resistance of aluminum alloys has always been a significant factor limiting their application. Although substantial progress has been made through surface treatment and modification technologies such as coating, anodizing, and ion implantation, surface treatment technologies that combine aesthetics, wear resistance, and corrosion resistance still have enormous potential for development and market application.

[0003] Forming an AlN layer on the surface of aluminum alloys can undoubtedly improve both corrosion resistance and wear resistance, as AlN is an insulating material and has a hardness of 1400 HV. Currently, there are patent reports on obtaining the desired AlN layer on aluminum alloy surfaces through ion nitriding. For example, Chinese invention patent applications CN101570846A and CN115821198A use ion nitriding technology to prepare an AlN solar energy absorption layer on aluminum alloy surfaces and an AlN layer on 7075 aluminum alloy surfaces, respectively. However, based on current domestic and international reports, the processing temperature for ion nitriding aluminum alloys is typically close to 500℃, the processing time usually exceeds 10 hours, and the gas pressure exceeds 100 Pa. The aging strengthening treatment temperature for industrial profile-grade aluminum alloys is below 220℃, because prolonged high-temperature nitriding severely affects the performance of the aluminum alloy matrix and may even lead to the melting / softening of the low-temperature phases during processing. Even if existing ion nitriding technologies successfully form an AlN layer of a certain thickness on the aluminum alloy surface, the low support capacity of the soft substrate inevitably leads to premature peeling and failure of the layer. In aluminum alloy products used in wearable electronics and consumer electronics, not only are wear-resistant and corrosion-resistant properties required, but there is also a strong demand for a rich variety of colors and textures, which is currently difficult to achieve with single-ion nitriding technology. Summary of the Invention

[0004] The purpose of this invention is to provide a treatment method to improve the wear and corrosion resistance of aluminum alloys, which solves the problems existing in the current ion nitriding aluminum alloy technology, such as the weak support of the aluminum alloy matrix for AlN, the need for high temperature conditions to obtain AlN by ion nitriding, and the inability to adjust the appearance and color.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] This invention provides a method for improving the wear and corrosion resistance of aluminum alloys, comprising the following steps:

[0007] S1. Pre-cleaning treatment of the workpiece surface: After ultrasonic cleaning, the aluminum alloy workpiece is dried at 60℃~80℃ for 0.5h~3h;

[0008] S2. Heating and Etching Activation of the Workpiece: The aluminum alloy workpiece treated in step S1 is placed in the vacuum chamber of the vacuum coating apparatus. The vacuum chamber is evacuated to below 0.01 Pa, and then a mixed gas containing argon and hydrogen is introduced to bring the pressure inside the vacuum chamber to 1 Pa to 3 Pa. A bias voltage of -150 V to -250 V is then applied, so that the bias current density flowing through the aluminum alloy workpiece is 0.5 A / m. 2 ~1.5A / m 2 Etching for 30-90 minutes;

[0009] S3. Low-temperature ion implantation: Turn off hydrogen gas, adjust argon gas to make the pressure in the vacuum chamber less than 0.1 Pa, turn on the metal arc target, apply bias voltage, and turn off the metal arc target and bias power supply after 20 min to 40 min of ion implantation.

[0010] S4. Nitriding of aluminum alloy surface: Adjust the working gas to a mixture of nitrogen, hydrogen and argon, introduce the mixed working gas into the vacuum chamber and make the pressure in the vacuum chamber reach 3Pa~6Pa; then apply a bias voltage and maintain it for 60min~120min;

[0011] S5. Sputtering and Nitriding Metal Layer: After step S4 is completed, only argon gas is retained to make the vacuum chamber pressure 0.3Pa~0.6Pa. First, the metal magnetron target is turned on to deposit and prepare a metal layer on the surface of the aluminum alloy workpiece. Then, the metal magnetron target is turned off and the metal layer is nitrided for 20min~40min according to the operation of step S4.

[0012] S6. Then, prepare a vapor-deposited coating on the surface as needed.

[0013] This invention overcomes the limitations of existing ion nitriding technology through the synergistic cooperation of the following aspects, achieving the goal of combining appearance, wear resistance, and corrosion resistance after aluminum alloy surface treatment. Specifically, it is manifested in:

[0014] (1) Ion nitriding pretreatment, low-energy low-temperature ion shallow layer implantation, improves the surface strength and hardness of aluminum alloy, and provides a solid foundation for supporting AlN nitriding layer;

[0015] (2) Nitrogen-containing high-energy flux density ions are used to achieve short-time nitriding treatment of the surface below 220℃, avoiding the serious negative impact on the substrate caused by high temperature / long time;

[0016] (3) A conductive layer, such as a (Zr, Ti, TiAl alloy) layer, is established on the AlN layer by using a composite nitriding treatment;

[0017] (4) Using traditional physical vapor deposition, a surface coating with high adhesion and rich colors is obtained.

[0018] Because titanium ions can be implanted into aluminum alloys at low energy levels, the implanted titanium ions exist in different forms depending on the temperature, such as solid solution or intermetallic compounds. Even at low temperatures, supersaturated solid solution titanium can strengthen the aluminum alloy surface. Ti incorporation can reduce the nucleation and incubation time of AlN, while bombardment by high-energy nitrogen-containing ions can promote the formation of a continuous AlN capping layer on the surface. The insulation obtained by this continuous capping layer is key to improving the corrosion resistance of aluminum alloys. However, once the AlN insulating layer is formed, it has an adverse effect on subsequent physical vapor deposition. Therefore, to solve this adverse effect, this invention inserts a metal layer during the nitriding process and nitrids it to form a conductive layer that is tightly attached to AlN.

[0019] In some specific technical solutions of the present invention, in step S1, a non-aqueous solvent is used to perform ultrasonic cleaning on the aluminum alloy workpiece. As an example, the non-aqueous solvent can be HQ-135S aluminum-specific cleaning agent from Dongguan Haoquan Chemical Co., Ltd.

[0020] In some specific technical solutions of the present invention, in step S1, after ultrasonic cleaning, the aluminum alloy workpiece is first dried with oil-free compressed air, and then dried.

[0021] As an example, in step S1, the drying temperature can be set to any one of 60°C, 65°C, 70°C, 75°C, or 80°C.

[0022] As an example, in step S1, the drying time can be set to any one of the following time values: 0.5h, 1h, 1.5h, 2h, 2.5h, and 3h.

[0023] In some specific technical solutions of the present invention, in step S2, the volume ratio of argon to hydrogen in the mixed gas is 1:(2~5).

[0024] As an example, in step S2, the volume ratio of argon to hydrogen in the mixed gas can be set to any one of 1:2, 1:3, 1:4, or 1:5.

[0025] In some specific technical solutions of the present invention, in step S2, the etching temperature in the vacuum chamber is set to 140℃~160℃.

[0026] As an example, in step S2, the etching temperature in the vacuum chamber can be set to any one of 140°C, 145°C, 150°C, 155°C, and 160°C.

[0027] As an example, in step S2, the bias voltage applied to the aluminum alloy workpiece can be set to any one of -150V, -200V, or -250V; the bias current density flowing through the aluminum alloy workpiece can be set to 0.5A / m. 2 1A / m 2 1.5A / m 2 Any current density value in it.

[0028] As an example, in step S2, the etching activation time is any one of 30 min, 40 min, 50 min, 60 min, 80 min, or 90 min.

[0029] In some specific technical solutions of the present invention, in step S3, the temperature for ion implantation is 140°C to 160°C, and the bias voltage applied to the aluminum alloy workpiece is -650V to -800V.

[0030] As an example, in step S3, the implementation temperature of ion implantation can be set to any one of 140°C, 145°C, 150°C, 155°C, and 160°C; the bias voltage applied to the aluminum alloy workpiece can be set to any one of -650V, -700V, -750V, and -800V.

[0031] In some specific technical solutions of the present invention, in step S3, the target material of the metal arc target is titanium.

[0032] As an example, in step S3, the ion implantation time can be set to any one of the following time values: 20 min, 25 min, 30 min, 35 min, and 40 min.

[0033] In some specific technical solutions of the present invention, in step S4, argon gas accounts for 10% of the total volume in the mixed gas, and the volume fraction ratio of nitrogen gas to hydrogen gas is 0.25~1.

[0034] As an example, in step S4, the volume fraction ratio of nitrogen to hydrogen can be set to any one of 1:4, 1:3, 3:4, or 1:1.

[0035] In some specific technical solutions of the present invention, in step S4, the bias voltage applied to the aluminum alloy workpiece is in the range of -100V to -250V, and the bias current density flowing through the aluminum alloy workpiece is 1.0A / m. 2 ~3.0A / m 2 .

[0036] As an example, in step S4, the bias voltage applied to the aluminum alloy workpiece can be set to any one of -100V, -200V, or -250V; the bias current density flowing through the aluminum alloy workpiece can be set to 1.0A / m. 2 1.5A / m 2 2.1A / m 2 3.0A / m 2 Any current density value in it.

[0037] In some specific technical solutions of the present invention, in step S4, the temperature at which the aluminum alloy surface is nitrided is less than 220°C.

[0038] As an example, in step S4, the temperature at which the aluminum alloy surface is nitrided can be set to any one of 150°C, 160°C, 170°C, or 200°C.

[0039] As an example, in step S4, the time for performing the nitriding treatment on the aluminum alloy surface can be set to any one of the following time values: 60 min, 65 min, 70 min, 80 min, 90 min, 100 min, 110 min, and 120 min.

[0040] In some specific technical solutions of the present invention, in step S5, the target material of the metal magnetron target is any one of titanium, zirconium, and titanium-aluminum alloy.

[0041] As an example, the titanium-aluminum alloy is Ti50Al50 alloy.

[0042] In some specific technical solutions of the present invention, in step S5, the deposition thickness of the metal layer is 100~300 nanometers.

[0043] As an example, in step S5, the nitriding time for the formed metal layer can be set to any one of 20 min, 25 min, 30 min, 35 min, or 40 min.

[0044] Compared with the prior art, the present invention provides a treatment method for improving the wear and corrosion resistance of aluminum alloys, which has the following beneficial effects:

[0045] This invention achieves aluminum alloy surface nitriding at low temperature and low voltage, avoiding the deterioration of the aluminum alloy substrate's own properties; it only requires the AlN layer to continuously cover the workpiece surface, without needing the AlN layer to reach a micron-level thickness, thus significantly saving the nitriding time of the aluminum alloy; combined with the conductive treatment after nitriding, it not only makes reasonable use of the contribution of the AlN insulating layer to the treatment system, but also lays the foundation for the subsequent vapor phase preparation of the top coating.

[0046] This invention is a surface treatment technology for aluminum alloys that takes into account appearance, wear resistance, and corrosion resistance, and is suitable for application in high-end aluminum alloy products. Detailed Implementation

[0047] The technical solution of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0048] Unless otherwise specified, the experimental methods used in the examples are conventional methods, and the materials and reagents used are commercially available unless otherwise specified.

[0049] This invention provides a method for improving the wear and corrosion resistance of aluminum alloys, comprising the following steps:

[0050] S1. Pre-cleaning treatment of workpiece surface: Ultrasonic cleaning of aluminum alloy workpiece with non-aqueous solvent, drying of surface water traces with oil-free compressed air, and drying treatment at 60℃~80℃ for 0.5h~3h.

[0051] S2. Heating and Etching Activation of the Workpiece: The aluminum alloy workpiece treated in step S1 is placed in the vacuum chamber of the vacuum coating apparatus. The vacuum chamber is evacuated to below 0.01 Pa to reduce the content of impurity gases. Then, a mixed gas containing argon and hydrogen is introduced, with a volume ratio of argon to hydrogen of 1:(2~5), so that the pressure in the vacuum chamber reaches 1Pa~3Pa. Within 30 minutes, the etching temperature in the vacuum chamber reaches 140℃~160℃. Afterward, the ion source and bias power supply of the vacuum coating apparatus are turned on and adjusted, and a bias voltage of -150V~-250V is applied to the aluminum alloy workpiece, so that the bias current density flowing through the aluminum alloy workpiece is 0.5A / m. 2 ~1.5A / m 2 After etching and activation for 30-90 minutes, the ion source and bias power supply are turned off. This step removes oxides and residual impurities from the surface of the aluminum alloy workpiece, resulting in a clean and activated workpiece surface.

[0052] S3. Low-temperature ion implantation: Turn off hydrogen gas, adjust argon gas to make the pressure in the vacuum chamber less than 0.1 Pa, set the implementation temperature of ion implantation to 140℃~160℃, turn on the metal arc target, apply a bias voltage of -650V~-800V to the aluminum alloy workpiece, and turn off the metal arc target and bias power supply after 20min~40min of ion implantation.

[0053] S4. Nitriding of Aluminum Alloy Surface: The working gas is adjusted to a mixture of nitrogen, hydrogen, and argon, with argon comprising 10% of the total volume and the volume ratio of nitrogen to hydrogen controlled between 0.25 and 1. The mixed working gas is introduced into the vacuum chamber, and the pressure inside the chamber is adjusted to 3 Pa to 6 Pa. The temperature for nitriding the aluminum alloy surface is set to be less than 220°C. Then, the ion source and bias power supply of the vacuum coating device are turned on and adjusted to apply a bias voltage of -100V to -250V to the aluminum alloy workpiece, so that the bias current density flowing through the aluminum alloy workpiece is 1.0 A / m. 2 ~3.0A / m 2 and maintain for 60 to 120 minutes;

[0054] S5. Sputtering and Nitriding Metal Layer: After step S4, only argon gas is retained, and the vacuum chamber pressure is 0.3 Pa to 0.6 Pa. First, the metal magnetron target is turned on to deposit a metal layer with a thickness of 100 to 300 nanometers on the surface of the aluminum alloy workpiece. Then, the metal magnetron target is turned off. Then, the mixed working gas in the vacuum chamber is adjusted according to the operation of step S4, and the formed metal layer is nitrided for 20 min to 40 min.

[0055] S6. Then, prepare a vapor-deposited coating on the surface as needed.

[0056] Preferably, in step S1, the non-aqueous solvent is HQ-135S aluminum-specific cleaning agent from Dongguan Haoquan Chemical Co., Ltd.; in step S3, the target material of the metal arc target is titanium; and in step S5, the target material of the metal magnetron target is any one of titanium, zirconium, or titanium-aluminum alloy.

[0057] The present invention will be further described in detail below through detailed embodiments.

[0058] Example 1

[0059] This embodiment provides a method for improving the wear and corrosion resistance of aluminum alloys by treating the surface of 2024Al alloy to obtain a TiN coating.

[0060] Specifically, the processing method includes the following steps:

[0061] S1. Pre-cleaning treatment of the workpiece surface: The 2024Al aluminum alloy workpiece is ultrasonically cleaned using a non-aqueous solvent (commercially available product, HQ-135S aluminum-specific cleaning agent from Dongguan Haoquan Chemical Co., Ltd.), and then dried at 70℃ for 2 hours after blowing off the surface water with oil-free compressed air.

[0062] S2. Heating and Etching Activation of the Workpiece: The 2024Al aluminum alloy workpiece treated in step S1 is placed in the vacuum chamber of a vacuum coating apparatus (model HZ-850). This apparatus has an ion source to assist in the ionization of the working gas within the vacuum chamber and an auxiliary heating system to control the temperature inside the vacuum chamber. The vacuum chamber is evacuated to 0.003 Pa to reduce the content of impurity gases. Then, a mixed gas containing argon and hydrogen (argon to hydrogen volume ratio 1:3) is introduced to bring the pressure inside the vacuum chamber to 1.1 Pa. The etching temperature inside the vacuum chamber reaches 150°C within 30 minutes. Afterward, the ion source and bias power supply of the vacuum coating apparatus are turned on and adjusted, and a bias voltage of -200V is applied to the 2024Al aluminum alloy workpiece, so that the bias current density flowing through the 2024Al aluminum alloy workpiece is 1 A / m. 2 After etching and activation for 60 minutes, the ion source and bias power supply are turned off. This step removes oxides and residual impurities from the surface of the aluminum alloy workpiece, resulting in a clean and activated workpiece surface.

[0063] S3. Low-temperature ion implantation: Turn off hydrogen gas, adjust argon gas to make the pressure in the vacuum chamber 0.05Pa, set the implementation temperature of implanted ions to 150℃, turn on Ti metal arc target, apply bias voltage -650V to 2024Al aluminum alloy workpiece, and turn off Ti metal arc target and bias power supply after 30min of ion implantation.

[0064] S4. Nitriding of Aluminum Alloy Surface: The working gas is adjusted to a mixture of nitrogen, hydrogen, and argon, with argon comprising 10% of the total volume and the volume ratio of nitrogen to hydrogen controlled at 1:3. The mixed working gas is introduced into the vacuum chamber and the pressure inside the chamber is increased to 3 Pa. The temperature for nitriding the aluminum alloy surface is set to 150℃. Then, the ion source and bias power supply of the vacuum coating device are turned on and adjusted to apply a bias voltage of -100V to the 2024Al aluminum alloy workpiece, so that the bias current density flowing through the 2024Al aluminum alloy workpiece is 1.0 A / m. 2 and keep it for 90 minutes;

[0065] S5. Sputtering and Nitriding Metal Layer: After step S4, only argon gas is retained to make the vacuum chamber pressure 0.3 Pa. First, the pure Ti metal magnetron target is turned on to deposit a Ti metal layer with a thickness of 100~300 nm on the surface of the 2024Al aluminum alloy workpiece. Then, the pure Ti metal magnetron target is turned off. Then, the mixed working gas in the vacuum chamber is adjusted according to the operation of step S4, and the Ti metal layer is nitrided for 30 min.

[0066] S6. Then, as needed, a TiN coating is prepared on the surface using the conventional physical vapor deposition method.

[0067] Example 2

[0068] This embodiment provides a treatment method to improve the wear and corrosion resistance of aluminum alloys by treating the surface of 6061Al alloy to obtain a multicolored Ti-O coating.

[0069] Specifically, the processing method includes the following steps:

[0070] S1. Pre-cleaning treatment of the workpiece surface: The 6061Al aluminum alloy workpiece is ultrasonically cleaned using a non-aqueous solvent (commercially available product, HQ-135S aluminum-specific cleaning agent from Dongguan Haoquan Chemical Co., Ltd.), and then dried at 70℃ for 2 hours after blowing off the surface water with oil-free compressed air.

[0071] S2. Heating and Etching Activation of the Workpiece: The 6061Al aluminum alloy workpiece treated in step S1 is placed in the vacuum chamber of a vacuum coating apparatus (model HZ-850). This apparatus has an ion source to assist in the ionization of the working gas within the vacuum chamber and an auxiliary heating system to control the temperature inside the vacuum chamber. The vacuum chamber is evacuated to 0.005 Pa to reduce the content of impurity gases. Then, a mixed gas containing argon and hydrogen (argon to hydrogen volume ratio 1:3) is introduced to bring the pressure inside the vacuum chamber to 1.9 Pa. The etching temperature inside the vacuum chamber reaches 150°C within 30 minutes. Afterward, the ion source and bias power supply of the vacuum coating apparatus are turned on and adjusted, and a bias voltage of -200V is applied to the 6061Al aluminum alloy workpiece, so that the bias current density flowing through the 6061Al aluminum alloy workpiece is 1 A / m. 2 After etching and activation for 60 minutes, the ion source and bias power supply are turned off. This step removes oxides and residual impurities from the surface of the aluminum alloy workpiece, resulting in a clean and activated workpiece surface.

[0072] S3. Low-temperature ion implantation: Turn off hydrogen, adjust argon to make the pressure in the vacuum chamber 0.04Pa, set the implementation temperature of implanted ions to 150℃, turn on the Ti metal arc target, apply a bias voltage of -700V to the 6061Al aluminum alloy workpiece, and turn off the Ti metal arc target and bias power supply after 30min of ion implantation.

[0073] S4. Nitriding of Aluminum Alloy Surface: The working gas is adjusted to a mixture of nitrogen, hydrogen, and argon, with argon accounting for 10% of the total volume and the volume ratio of nitrogen to hydrogen controlled at 3:4. The mixed working gas is introduced into the vacuum chamber and the pressure inside the vacuum chamber is increased to 5 Pa. The temperature for nitriding the aluminum alloy surface is set to 170℃. Then, the ion source and bias power supply of the vacuum coating device are turned on and adjusted to apply a bias voltage of -200V to the 6061Al aluminum alloy workpiece, so that the bias current density flowing through the 6061Al aluminum alloy workpiece is 2.1A / m. 2 and keep it for 90 minutes;

[0074] S5. Sputtering and Nitriding Metal Layer: After step S4, only argon gas is retained to make the vacuum chamber pressure 0.4 Pa. First, the pure Zr metal magnetron target is turned on to deposit a Zr metal layer with a thickness of 100~300 nm on the surface of the 6061Al aluminum alloy workpiece. Then, the pure Zr metal magnetron target is turned off. Then, the mixed working gas in the vacuum chamber is adjusted according to the operation of step S4, and the Zr metal layer is nitrided for 30 min.

[0075] S6. Subsequently, a multicolored Ti-O coating is prepared on the surface using the conventional physical vapor deposition method as needed.

[0076] Example 3

[0077] This embodiment provides a method for improving the wear and corrosion resistance of aluminum alloys by treating the surface of 7075Al alloy to obtain a multi-color DLC coating.

[0078] Specifically, the processing method includes the following steps:

[0079] S1. Pre-cleaning treatment of workpiece surface: Use non-aqueous solvent (commercially available product, HQ-135S aluminum special cleaning agent from Dongguan Haoquan Chemical Co., Ltd.) to ultrasonically clean the 7075Al aluminum alloy workpiece, blow dry the surface water with oil-free compressed air, and then dry it at 70℃ for 2 hours.

[0080] S2. Heating and Etching Activation of the Workpiece: The 7075Al aluminum alloy workpiece treated in step S1 is placed in the vacuum chamber of a vacuum coating apparatus (model HZ-850). This apparatus has an ion source to assist in the ionization of the working gas within the vacuum chamber and an auxiliary heating system to control the temperature inside the vacuum chamber. The vacuum chamber is evacuated to 0.01 Pa to reduce the content of impurity gases. Then, a mixed gas containing argon and hydrogen (argon to hydrogen volume ratio 1:3) is introduced to bring the pressure inside the vacuum chamber to 2.9 Pa. The etching temperature inside the vacuum chamber reaches 150°C within 30 minutes. Afterward, the ion source and bias power supply of the vacuum coating apparatus are turned on and adjusted, and a bias voltage of -200V is applied to the 7075Al aluminum alloy workpiece, so that the bias current density flowing through the 7075Al aluminum alloy workpiece is 1 A / m. 2 After etching and activation for 60 minutes, the ion source and bias power supply are turned off. This step removes oxides and residual impurities from the surface of the aluminum alloy workpiece, resulting in a clean and activated workpiece surface.

[0081] S3. Low-temperature ion implantation: Turn off hydrogen gas, adjust argon gas to make the pressure in the vacuum chamber less than 0.06Pa, set the implementation temperature of implanted ions to 150℃, turn on the Ti metal arc target, apply a bias voltage of -800V to the 7075Al aluminum alloy workpiece, and turn off the Ti metal arc target and bias power supply after 30 minutes of ion implantation.

[0082] S4. Nitriding of Aluminum Alloy Surface: The working gas is adjusted to a mixture of nitrogen, hydrogen, and argon, with argon accounting for 10% of the total volume and the volume ratio of nitrogen to hydrogen controlled at 1:1. The mixed working gas is introduced into the vacuum chamber and the pressure inside the vacuum chamber is brought to 6 Pa. The temperature for nitriding the aluminum alloy surface is set to 200℃. Then, the ion source and bias power supply of the vacuum coating device are turned on and adjusted to apply a bias voltage of -250V to the 7075Al aluminum alloy workpiece, so that the bias current density flowing through the 7075Al aluminum alloy workpiece is 3.0 A / m. 2 and keep it for 90 minutes;

[0083] S5. Sputtering and Nitriding Metal Layer: After step S4, only argon gas is retained to make the vacuum chamber pressure 0.6 Pa. First, the Ti50Al50 alloy magnetron target is turned on to deposit an alloy layer with a thickness of 100~300 nm on the surface of the 7075Al aluminum alloy workpiece. Then, the Ti50Al50 alloy magnetron target is turned off. Then, the mixed working gas in the vacuum chamber is adjusted according to the operation of step S4, and the formed alloy layer is nitrided for 30 min.

[0084] S6. Subsequently, a multi-color DLC coating is prepared on the surface using a conventional physical vapor deposition method as needed.

[0085] The above embodiments are merely illustrative of the concept and technical solution of the present invention and are not intended to limit the present invention. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in the present invention should still be covered by the claims of the present invention.

[0086] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A method for improving the wear and corrosion resistance of aluminum alloys, characterized in that, Includes the following steps: S1. Pre-cleaning treatment of the workpiece surface: After ultrasonic cleaning, the aluminum alloy workpiece is dried at 60℃~80℃ for 0.5h~3h; S2. Heating and Etching Activation of the Workpiece: The aluminum alloy workpiece treated in step S1 is placed in the vacuum chamber of the vacuum coating apparatus. The vacuum chamber is evacuated to below 0.01 Pa, and then a mixed gas containing argon and hydrogen is introduced to bring the pressure inside the vacuum chamber to 1 Pa to 3 Pa. A bias voltage of -150 V to -250 V is then applied, so that the bias current density flowing through the aluminum alloy workpiece is 0.5 A / m. 2 ~1.5A / m 2 Etching for 30-90 minutes; S3. Low-temperature ion implantation: Turn off hydrogen gas, adjust argon gas to make the pressure in the vacuum chamber less than 0.1 Pa, turn on the metal arc target, apply bias voltage, and turn off the metal arc target and bias power supply after 20 min to 40 min of ion implantation. S4. Nitriding of aluminum alloy surface: Adjust the working gas to a mixture of nitrogen, hydrogen and argon, introduce the mixed working gas into the vacuum chamber and make the pressure in the vacuum chamber reach 3Pa~6Pa; then apply a bias voltage and maintain it for 60min~120min; S5. Sputtering and Nitriding Metal Layer: After step S4 is completed, only argon gas is retained to make the vacuum chamber pressure 0.3Pa~0.6Pa. First, the metal magnetron target is turned on to deposit and prepare a metal layer on the surface of the aluminum alloy workpiece. Then, the metal magnetron target is turned off and the metal layer is nitrided for 20min~40min according to the operation of step S4. S6. Then, prepare a vapor-deposited coating on the surface as needed.

2. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S2, the volume ratio of argon to hydrogen in the mixed gas is 1:(2~5).

3. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S2, the etching temperature in the vacuum chamber is set to 140℃~160℃.

4. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S3, the ion implantation temperature is 140℃~160℃, and the bias voltage applied to the aluminum alloy workpiece is -650V~-800V.

5. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S3, the target material of the metal arc target is titanium.

6. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S4, argon accounts for 10% of the total volume in the mixed gas, and the volume fraction ratio of nitrogen to hydrogen is 0.25~1.

7. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S4, the bias voltage applied to the aluminum alloy workpiece ranges from -100V to -250V, and the bias current density flowing through the aluminum alloy workpiece is 1.0A / m. 2 ~3.0A / m 2 .

8. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S4, the temperature at which the aluminum alloy surface is nitrided is less than 220°C.

9. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S5, the target material of the metal magnetron target is any one of titanium, zirconium, or titanium-aluminum alloy.

10. The method for improving the wear and corrosion resistance of aluminum alloys according to claim 1, characterized in that, In step S5, the thickness of the deposited metal layer is 100~300 nanometers.

Citation Information

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