A method for preparing chlorosilanes from hydrosilanes

Abstract

The application provides a method for preparing chlorosilane from hydrosilane, comprising: using iodide and / or elemental iodine as a catalyst, hydrosilane and N-chlorosuccinimide are reacted in an organic solvent to obtain chlorosilane; the iodide is at least one selected from NaI, KI and CuI. The application uses N-chlorosuccinimide as a chlorine source, simultaneously uses iodide and / or elemental iodine as a catalyst, can efficiently drive the chlorination conversion of hydrosilane under room temperature or even low temperature conditions, the method has excellent chemical selectivity in the reaction process, the catalyst system can accurately activate the Si-H bond, and excessive chlorination is avoided, so that the generation of multi-chlorinated products is effectively avoided, and the product separation and purification steps are significantly simplified. The preparation process of the application is simple, the conditions are mild, the raw material cost is low, the by-product (succinimide) is easy to recover, the yield of the target chlorosilane can reach an excellent level, and the application has economy and practicability, and is suitable for large-scale popularization and application.

Description

Technical Field

[0001] This invention relates to the field of chlorosilane synthesis technology, and more particularly to a method for preparing chlorosilanes from hydrosilanes. Background Technology

[0002] Chlorosilanes are key synthetic intermediates in organosilicon fine chemicals and semiconductor electronic materials. Traditional chlorosilanes are mostly prepared by high-temperature chlorination of metallic silicon, which requires harsh reaction conditions, results in products with simple structures, and makes it difficult to synthesize diverse functionalized fine chlorosilanes in a targeted manner.

[0003] Hydrosilanes, containing active Si-H bonds, can be converted into corresponding chlorosilanes through chlorination, making them ideal raw materials for preparing structured chlorosilanes. Existing hydrosilane chlorination processes generally suffer from the following problems: high cost of chlorine source materials, significant and difficult-to-treat reaction byproducts, or the use of HCl gas as the chlorine source, which is highly corrosive, toxic, and poses significant safety hazards, making it unsuitable for large-scale synthesis; and low product yields.

[0004] Currently, there is a lack of a preparation process that is suitable for hydrosilanes, has a mild reaction, and allows for controllable high chemoselectivity. Summary of the Invention

[0005] This invention aims to at least partially address one of the technical problems in the prior art. Therefore, one objective of this invention is to provide a method for preparing chlorosilanes from hydrosilanes, thereby solving the problems of high chlorine source cost, harsh reaction conditions, high energy consumption, low yield, and poor chemical selectivity in existing processes.

[0006] This invention proposes a method for preparing chlorosilanes from hydrosilanes, comprising: Using iodide and / or elemental iodine as catalysts, hydrosilane and N-chlorosuccinimide react in an organic solvent to yield chlorosilane; wherein the iodide is selected from at least one of NaI, KI, and CuI.

[0007] The present invention provides a process for preparing chlorosilanes. The inventors discovered that, using N-chlorosuccinimide as the chlorine source and iodide and / or elemental iodine as catalysts, hydrosilanes can undergo chlorination reactions at room temperature or low temperature, successfully preparing chlorosilanes in high yields. Furthermore, the selective preparation of monochlorosilanes, dichlorosilanes, and trichlorosilanes is achieved without relying on the amount of catalyst used; only by adjusting the equivalent of N-chlorosuccinimide (NCS), one or more Si-H bonds can be selectively chlorinated. The process of the present invention is simple to operate, has mild reaction conditions, readily available raw materials, low cost, few byproducts, and high yield of the target product, with a chlorosilane yield greater than 80%.

[0008] In some embodiments of the present invention, the hydrosilane is selected from at least one of R1SiH3, R2R3SiH2, and R4R5R6SiH1.

[0009] Furthermore, R1, R2, R3, R4, R5, and R6 each independently include one of the following: aryl, alkyl, alkenyl, and alkynyl groups.

[0010] Furthermore, the alkyl group has 1 to 18 carbon atoms, preferably selected from primary and secondary alkyl groups.

[0011] The alkenyl group is selected from vinyl or cyclohexene.

[0012] The alkynyl group is selected from one of acetylenol, phenylacetylenol, and trimethylsilylalkynol.

[0013] The aryl group is selected from phenyl.

[0014] In some embodiments of the present invention, the amount of catalyst used is 2-10% of the molar amount of the hydrosilane, preferably 10%. For example, the amount of catalyst used is 2%, 3%, 4%, 5%, 6%, 7%, 8%, 9%, 10% of the molar amount of the hydrosilane, or any range between any two of the above values. The present invention uses relatively little catalyst and, under the action of a specific N-chlorosuccinimide as a chlorinating agent, can achieve the chlorination reaction of hydrosilanes.

[0015] In some embodiments of the present invention, the molar ratio of the hydrosilane to the N-chlorosuccinimide is 1:(1-3). For example, the molar ratio is 1:1, 1:2, 1:3, etc. By adjusting the N-chlorosuccinimide (NCS) equivalent, one, two, or three Si-H bonds can be selectively chlorinated.

[0016] For example, RSiH3 + 1.0eq NCS → RSiH2Cl; RSiH3 + 2.0eq NCS → RSiHCl2; RSiH3 + 3.0eq NCS → RSiCl3.

[0017] In some embodiments of the present invention, the reaction temperature between the hydrosilane and the N-chlorosuccinimide is -78 to 35°C, preferably 25°C. For example, the reaction temperature can be -60°C, -20°C, -10°C, 0°C, 10°C, 20°C, 30°C, or any range between any two of these values. The present invention achieves a smooth chlorination reaction at the aforementioned lower temperatures, reducing energy consumption and simplifying operation. Furthermore, the reaction temperature can be appropriately reduced depending on the exothermic nature of the reaction.

[0018] In some embodiments of the present invention, the reaction time between the hydrosilane and the N-chlorosuccinimide is 10-20 hours. For example, the reaction time is 10 hours, 12 hours, 14 hours, 16 hours, 18 hours, 20 hours, or any range between the above values. The reaction time can be appropriately extended depending on the scale of the reaction.

[0019] In some embodiments of the present invention, the organic solvent used in the present invention is selected from inert organic solvents, including but not limited to one or more of diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, methyl tert-butyl ether, dipentyl ether, and hexyl ether.

[0020] The present invention has at least the following technical effects: This invention is the first to use inexpensive, air-stable, and non-toxic iodides (NaI, KI, CuI) or elemental iodine as the main catalyst for the chlorination reaction of hydrosilanes; solid NCS is used as the chlorine source. Compared with HCl gas as the chlorine source, NCS is safe, easy to weigh, and stable in storage, requiring no special equipment. Compared with CuCl2 as the chlorine source, NCS is low in cost and highly economical, and the byproduct succinimide is easy to separate and recover.

[0021] The preparation process of this invention has mild reaction conditions, and the reaction can occur at room temperature or low temperature. It does not require high temperature and high pressure, is simple to operate, has low energy consumption, and has a high product yield. The selective preparation of monochlorosilanes, dichlorosilanes, and trichlorosilanes can be achieved by simply adjusting the molar ratio of NCS to hydrosilane without changing the amount of catalyst, solvent, or reaction temperature. This "equivalent control" method of the present invention is far more intuitive, precise, and easy to scale up than the control method of catalyst loading or HCl concentration in the prior art. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in this invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0023] Figure 1 This is the NMR spectrum of the chlorosilane prepared in Example 1 of this invention; Figure 2 This is the NMR spectrum of the chlorosilane prepared in Example 7 of this invention; Figure 3 This is the NMR spectrum of the chlorosilane prepared in Example 8 of this invention; Figure 4 This is the NMR spectrum of the chlorosilane prepared in Example 9 of this invention; Figure 5This is the NMR spectrum of the chlorosilane prepared in Example 10 of this invention; Figure 6 This is the NMR spectrum of the chlorosilane prepared in Example 11 of this invention. Detailed Implementation

[0024] Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without inventive effort are within the scope of protection of this invention. The invention will now be described with reference to specific embodiments. It should be noted that these embodiments are merely descriptive and do not limit the invention in any way.

[0025] Example 1 In an argon-atmospheric glove box, 7.5 mg of sodium iodide (NaI) (approximately 0.05 mmol), 66.8 mg of N-chlorosuccinimide (NCS, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Tris(methoxybenzene) was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyl dihydrochlorosilane (PhSiH2Cl), was 99%.

[0026] The specific reaction process is as follows:

[0027] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 1 is shown in [reference needed]. Figure 1 , Figure 1 It can be seen that, 1 H NMR (600 MHz, CDCl3): δ 7.70 (d, J = 6.6 Hz, 2H), 7.51 (t, J = 7.5 Hz, 1H), 7.45 (t, J =7.3 Hz, 2H), 5.25 (s, 2H) ppm. Example 2 In an argon-atmospheric glove box, 8.3 mg of potassium iodide (KI) (approximately 0.05 mmol), 66.8 mg of N-chlorosuccinimide (NCS, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Tris(methoxybenzene) was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyl dihydrochlorosilane (PhSiH2Cl), was 99%.

[0028] The specific reaction process is as follows:

[0029] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 2 and Figure 1 same.

[0030] Example 3 In an argon-atmospheric glove box, 9.5 mg of cuprous iodide (CuI) (approximately 0.05 mmol), 66.8 mg of N-chlorosuccinimide (NCS, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Tris(methoxybenzene) was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyl dihydrochlorosilane (PhSiH2Cl), was 99%.

[0031] The specific reaction process is as follows:

[0032] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 3 and Figure 1 same.

[0033] Example 4 In an argon-atmospheric glove box, 12.7 mg (approximately 0.05 mmol) of elemental iodine (I₂), 66.8 mg (approximately 0.5 mmol) of N-chlorosuccinimide (NCS), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg (approximately 0.5 mmol) of phenylsilane (PhSiH₂Cl). The mixture was stirred at room temperature for 10 minutes. Trimethoxybenzene was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyl dihydrochlorosilane (PhSiH₂Cl), was 88%.

[0034] The specific reaction process is as follows:

[0035] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 4 and Figure 1 same.

[0036] Example 5 In a dry 200 mL Schlenk flask, 0.3 g (approximately 0.002 mol) of sodium iodide (NaI) and 13.4 g (approximately 0.1 mol) of N-chlorosuccinimide (NCS) were added. The mixture was purged with argon three times using a double-row tube, followed by the addition of 50 mL of diethyl ether. The flask was then placed in a -78°C cold trap and cooled for 10 minutes. Under an argon atmosphere, 10.8 g (approximately 0.1 mol) of phenylsilane (PhSiH3) was slowly added dropwise. The reaction mixture was slowly heated to room temperature (25 °C) and stirred for 12 hours. The mixture was filtered under argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. The product, phenyl dichlorosilane (PhSiH2Cl), was obtained by fractional distillation under reduced pressure, yielding 12.2 g of phenyl dichlorosilane (PhSiH2Cl), with a yield of 86% and a purity of 99%.

[0037] The specific reaction process is as follows:

[0038] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 5 and Figure 1 same.

[0039] Example 6 In a dry 200 mL Schlenk flask, 0.38 g (approximately 0.002 mol) of cuprous iodide (CuI) and 13.4 g (approximately 0.1 mol) of N-chlorosuccinimide (NCS) were added. The mixture was purged with argon three times using a double-row tube, followed by the addition of 50 mL of diethyl ether. The flask was then placed in a -78°C cold trap for 10 minutes to cool. Under an argon atmosphere, 10.8 g (approximately 0.1 mol) of phenylsilane (PhSiH3) was slowly added dropwise. The reaction system was slowly heated to room temperature (25 °C) and stirred for 12 hours. The mixture was filtered under argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. The product, phenyl dichlorosilane (PhSiH2Cl), was obtained by fractional distillation under reduced pressure, yielding 11.7 g (81% yield, 99.9% purity).

[0040] The specific reaction process is as follows:

[0041] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 6 and Figure 1 same.

[0042] Example 7 Add 0.15 g (approximately 1 mmol) of sodium iodide (NaI) and 1.34 g (approximately 10 mmol) of N-chlorosuccinimide (NCS) to a dry 100 mL Schlenk flask. Purge the flask three times with argon gas using a double-row tube. Then add 20 mL of diethyl ether and place the flask in a 0°C cold trap to cool for 10 minutes. Slowly add octadecylsilane (C...) dropwise under an argon atmosphere. 18 H 372.81 g (approximately 10 mmol) of SiH3 was added. The reaction system was slowly heated to room temperature (25 °C) and stirred for 1 hour. The mixture was filtered under an argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. After removing the solvent by rotary evaporation, the product phenyl dihydrochlorosilane (C6H3) was obtained. 18 H 37 2.74 g of SiH2Cl, yield 86%, purity 80%.

[0043] The specific reaction process is as follows:

[0044] The NMR spectrum of the phenyl dihydrochlorosilane prepared in Example 7 is shown in [reference needed]. Figure 2 , Figure 2 It can be seen that, 1 H NMR (400 MHz, CDCl3): δ 4.69 (t, J = 2.9 Hz, 2H), 1.26 (s, 32H), 0.88 (t, J = 6.7 Hz, 3H),0.80-0.73 (m, 2H) ppm.

[0045] Example 8 In a dry 100 mL Schlenk flask, 0.60 g (approximately 4 mmol) of sodium iodide (NaI) and 5.3 g (approximately 40 mmol) of N-chlorosuccinimide (NCS) were added. The mixture was purged with argon three times using a double-row tube, followed by the addition of 40 mL of diethyl ether. The flask was then placed in a -78°C cold trap and cooled for 10 minutes. Under an argon atmosphere, 4.33 g (approximately 40 mmol) of phenylmethylsilane (PhMeSiH2) was slowly added dropwise. The reaction mixture was slowly heated to room temperature (25 °C) and stirred for 1 hour. The mixture was filtered under an argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. The solvent was removed by rotary evaporation to obtain 5.2 g of the product phenylmethylchlorosilane (PhMeSiHCl), with a yield of 83% and a purity of 99%.

[0046] The specific reaction process is as follows:

[0047] The NMR spectrum of the phenylmethyl-hydrochlorosilane prepared in Example 8 is shown in [reference needed]. Figure 3 , Figure 3 It can be seen that, 1 H NMR (400MHz, CDCl3): δ 7.72-7.62 (m, 2H), 7.53-7.38 (m, 3H), 5.34 (p, J = 3.0 Hz, 1H), 0.78 (d, J= 3.0 Hz, 3H) ppm.

[0048] Example 9 In a dry 100 mL Schlenk flask, 0.60 g (approximately 4 mmol) of sodium iodide (NaI) and 5.3 g (approximately 40 mmol) of N-chlorosuccinimide (NCS) were added. The mixture was purged with argon three times using a double-row tube, followed by the addition of 40 mL of diethyl ether. The flask was then placed in a -78°C cold trap and cooled for 10 minutes. Under an argon atmosphere, 7.3 g (approximately 40 mmol) of diphenylsilane (Ph₂SiH₂) was slowly added dropwise. The reaction mixture was slowly heated to room temperature (25 °C) and stirred for 1 hour. The mixture was filtered under an argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. The solvent was removed by rotary evaporation to obtain 7.17 g of the product, diphenylchlorosilane (Ph₂SiHCl), with a yield of 82% and a purity of 99%.

[0049] The specific reaction process is as follows:

[0050] The NMR spectrum of the phenylmethyl-hydrochlorosilane prepared in Example 9 is shown in [reference needed]. Figure 4 , Figure 4 It can be seen that, 1 H NMR (400MHz, CDCl3): δ 7.68-7.61 (m, 4H), 7.47-7.42 (m, 2H), 7.41-7.36 (m, 4H), 5.75-5.70 (m, 1H) ppm.

[0051] Example 10 In a dry 100 mL Schlenk flask, 0.29 g (approximately 1.5 mmol) of cuprous iodide (CuI) and 2.01 g of N-chlorosuccinimide (NCS, approximately 15 mmol) were added. The mixture was purged with argon three times using a double-row tube, followed by the addition of 30 mL of diethyl ether. The flask was then placed in a 0°C cold trap and cooled for 10 minutes. Under an argon atmosphere, 3.27 g (15 mmol) of phenylmethyltrimethylsilynylsilane was slowly added dropwise. The reaction mixture was slowly heated to room temperature (25°C) and stirred for 1 hour. The mixture was filtered under an argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. The solvent was removed by rotary evaporation to obtain 3.45 g of the product phenylmethyltrimethylsilynylchlorosilane, with a yield of 91% and a purity of 99%.

[0052] The specific reaction process is as follows:

[0053] The NMR spectrum of the phenylmethylchlorosilane prepared in Example 10 is shown in [reference needed]. Figure 5 , Figure 5 It can be seen that,1 H NMR (400MHz, CDCl3): δ 7.68-7.62 (m, 2H), 7.38-7.30 (m, 3H), 0.72 (s, 3H), 0.15 (s,9H) ppm.

[0054] Example 11 In a dry 100 mL Schlenk flask, 0.11 g (approximately 0.6 mmol) of cuprous iodide (CuI) and 0.8 g of N-chlorosuccinimide (NCS, approximately 6 mmol) were added. The mixture was purged with argon three times using a double-row tube, followed by the addition of 10 mL of diethyl ether. The flask was then placed in a 0°C cold trap and cooled for 10 minutes. Under an argon atmosphere, 1.33 g (6 mmol) of phenylmethylphenylethynylsilane was slowly added dropwise. The reaction mixture was slowly heated to room temperature (25°C) and stirred for 1 hour. The mixture was filtered under an argon atmosphere, and the residual solid was washed three times with diethyl ether. The filtrates were combined. The solvent was removed by rotary evaporation to obtain 1.46 g of the product phenylmethylphenylethynylchlorosilane, with a yield of 95% and a purity of 99%.

[0055] The specific reaction process is as follows:

[0056] The NMR spectrum of the phenylmethyl-hydrochlorosilane prepared in Example 11 is shown in [reference needed]. Figure 6 , Figure 6 It can be seen that, 1 H NMR (400MHz, CDCl3): δ 7.76-7.65 (m, 2H), 7.51-7.41 (m, 2H), 7.39-7.32 (m, 3H), 7.28-7.17 (m, 3H), 0.79 (s, 3H) ppm.

[0057] Comparative Example 1 In an argon-atmospheric glove box, 7.5 mg of sodium iodide (NaI) (approximately 0.05 mmol), 81.2 mg of iodine chloride (ICl, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave-safe tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Tris(methoxybenzene) was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyldihydrochlorosilane (PhSiH2Cl), was 55%.

[0058] Comparative Example 2 In an argon-atmospheric glove box, 7.5 mg of sodium iodide (NaI) (approximately 0.05 mmol), 76.9 mg of carbon tetrachloride (CCl4, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Trimethoxybenzene was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyl dihydrochlorosilane (PhSiH2Cl), was 0%.

[0059] Comparative Example 3 In an argon-atmospheric glove box, 7.5 mg of sodium iodide (NaI) (approximately 0.05 mmol), 29.2 mg of sodium chloride (NaCl, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Trimethoxybenzene was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product phenyl dihydrochlorosilane (PhSiH2Cl) was 0%.

[0060] Comparative Example 4 In an argon-atmospheric glove box, 7.1 mg of methyl iodoforme (MeI) (approximately 0.05 mmol), 66.8 mg of N-chlorosuccinimide (NCS, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Trimethoxybenzene was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product phenyl dihydrochlorosilane (PhSiH2Cl) was 0%.

[0061] Comparative Example 5 In an argon-atmospheric glove box, 7.5 mg of sodium iodide (NaI) (approximately 0.05 mmol), 67.2 mg of copper chloride (CuCl2, approximately 0.5 mmol), and 2 mL of diethyl ether were added to a dry 10 mL microwave tube, followed by 54.1 mg of phenylsilane (PhSiH3) (approximately 0.5 mmol). The mixture was stirred at room temperature for 10 minutes. Tris(methoxybenzene) was added to the reaction mixture as an internal standard, and a sample was taken for NMR analysis. The NMR yield of the product, phenyldihydrochlorosilane (PhSiH2Cl), was 5%.

[0062] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for preparing chlorosilanes from hydrosilanes, characterized in that, include: Using iodide and / or elemental iodine as catalysts, hydrosilane and N-chlorosuccinimide react in an organic solvent to yield chlorosilane; The iodide is selected from at least one of NaI, KI, and CuI.

2. The method according to claim 1, characterized in that, The hydrosilane is selected from at least one of R1SiH3, R2R3SiH2, and R4R5R6SiH1.

3. The method according to claim 2, characterized in that, R1, R2, R3, R4, R5, and R6 each independently include one of the following: aryl, alkyl, alkenyl, and alkynyl groups.

4. The method according to claim 3, characterized in that, The alkyl group has 4 to 18 carbon atoms, and preferably the alkyl group is selected from primary alkyl and secondary alkyl groups; The alkenyl group is selected from vinyl or cyclohexene; The alkynyl group is selected from one of acetylenol, phenylacetylenol, and trimethylsilylalkynol; The aryl group is selected from phenyl.

5. The method according to claim 1, characterized in that, The amount of catalyst used is 1-10% of the molar amount of the hydrosilane, preferably 2-6%.

6. The method according to any one of claims 1-5, characterized in that, The molar ratio of the hydrosilane to the N-chlorosuccinimide is 1:(1-3).

7. The method according to any one of claims 1-5, characterized in that, The reaction temperature between the hydrosilane and the N-chlorosuccinimide is -78 to 35°C, preferably 0 to 30°C.

8. The method according to any one of claims 1-5, characterized in that, The reaction time between the hydrosilane and the N-chlorosuccinimide is 10-20 h.

9. The method according to any one of claims 1-5, characterized in that, The organic solvent includes one or more of the following: diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, methyl tert-butyl ether, dipentyl ether, hexyl ether, n-pentane, n-hexane, and n-heptane.

10. The method according to any one of claims 1-5, characterized in that, The chlorosilanes include monochlorosilanes, dichlorosilanes, or trichlorosilanes; And / or, the yield of the chlorosilane is greater than 80%.

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