Mask and mask for evaporation, and evaporation apparatus

Abstract

The application provides a mask and a mask for evaporation, and an evaporation device. The mask provided by the application comprises a mask body, a plurality of non-pattern regions and a plurality of pattern regions. The non-pattern regions and the pattern regions extend along a first direction and are alternately arranged along a second direction. The pattern regions comprise a plurality of evaporation regions arranged along the first direction. Each evaporation region corresponds to a display region of a display panel. Each evaporation region is provided with a plurality of first mask openings. Each non-pattern region is provided with a plurality of second mask openings. The second mask openings arranged in the non-pattern regions are beneficial to reducing wrinkles of the mask and improving flatness of the mask. Meanwhile, the size of the second mask openings is smaller than the size of the first mask openings, which is beneficial to improving the strength of the mask and reducing the risk of damage of the mask.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a photomask, a photomask for vapor deposition, and vapor deposition equipment. Background Technology

[0002] OLED (Organic Light-Emitting Diode) is an active light-emitting device with a sandwich structure consisting of multiple organic layers and electrodes on both sides. Currently, AMOLED (Active-Matrix Organic Light-Emitting Diode) based displays have been commercialized in fields such as smartphones, watches, and laptops.

[0003] In the process of manufacturing OLED display panels, the required patterns need to be formed on the substrate using FMM (Fine Metal Mask) through vapor deposition.

[0004] However, current photomasks are prone to damage. Summary of the Invention

[0005] In view of this, the purpose of this application is to propose a photomask that improves the strength of the photomask and reduces the risk of photomask damage.

[0006] For the purposes described above, this application provides a photomask comprising:

[0007] The mask body includes multiple non-graphic regions and multiple graphic regions, the non-graphic regions and the graphic regions extending along a first direction and alternately arranged along a second direction; the graphic regions include multiple vapor-deposited regions arranged along the first direction, each vapor-deposited region corresponding to a display area of ​​a display panel;

[0008] Each of the vapor deposition areas is provided with multiple first mask openings, and each of the non-patterned areas is provided with multiple second mask openings. The multiple second mask openings are arranged along the first direction, and the size of the second mask opening is smaller than the size of the first mask opening; the first direction and the second direction intersect.

[0009] In one embodiment, a mask frame is further included, the mask frame including a first border, a second border, a third border and a fourth border connected in sequence, the second border and the fourth border extending along the first direction and arranged along the second direction, the first border and the third border extending along the second direction and arranged along the first direction; the two ends of the mask body along the first direction are fixedly connected to the first border and the third border respectively.

[0010] Preferably, along the first direction, the distance between two adjacent second mask openings is greater than the distance between two adjacent first mask openings.

[0011] In one embodiment, the non-graphical region includes a first non-graphical region adjacent to the fourth border and a second non-graphical region adjacent to the second border;

[0012] Multiple second mask openings are simultaneously arranged along the first direction and the second direction within the first non-graphic region;

[0013] Preferably, within the first non-graphic area, the size of the plurality of second mask openings gradually decreases from the second border to the fourth border.

[0014] Within the second non-graphic area, the size of the plurality of second mask openings gradually decreases from the fourth border to the second border direction;

[0015] Preferably, along the second direction, the center of each row of second mask openings and the center of the corresponding first mask opening are located on the same straight line;

[0016] Preferably, the shape of the first mask opening includes one or more of a circle and a chamfered rectangle;

[0017] And / or, the shape of the second mask opening includes one or more of a circle and a chamfered rectangle.

[0018] In one embodiment, the non-graphical area includes a third non-graphical area located between two adjacent graphic areas. The third non-graphical area includes a first sub-area, a second sub-area, and a third sub-area. The first sub-area, the second sub-area, and the third sub-area are arranged along the second direction. The first sub-area is located on the side of the second sub-area closer to the fourth border, and the third sub-area is located on the side of the second sub-area closer to the second border.

[0019] The size of the second mask opening in the second sub-region is larger than the size of the second mask opening in the first sub-region and the size of the second mask opening in the third sub-region.

[0020] Based on the same inventive concept, this application also discloses a photomask, which includes:

[0021] A mask frame; the mask frame includes a first border, a second border, a third border and a fourth border connected in sequence, the second border and the fourth border extending along a first direction and arranged along a second direction, the first border and the third border extending along the second direction and arranged along the first direction;

[0022] A mask body is connected to the first frame and the third frame at both ends along a first direction, respectively. The mask body includes a non-graphic area and a graphic area. The non-graphic area includes a first non-graphic area adjacent to the fourth frame and a second non-graphic area adjacent to the second frame. The graphic area is located between the first non-graphic area and the second non-graphic area. The graphic area includes a plurality of vapor-deposited areas arranged along the first direction, and each vapor-deposited area corresponds to a display area of ​​a display panel.

[0023] Each of the vapor deposition areas is provided with multiple first mask openings, and each of the non-patterned areas is provided with multiple second mask openings. The multiple second mask openings are arranged along the first direction, and the size of the second mask opening is smaller than the size of the first mask opening; the first direction and the second direction intersect.

[0024] In one embodiment, a plurality of second mask openings are arranged simultaneously along the first direction and the second direction within the second non-graphic region;

[0025] Within the first non-graphic area, the size of the plurality of second mask openings gradually decreases from the second border to the fourth border.

[0026] Within the second non-graphic area, the size of the plurality of second mask openings gradually decreases from the fourth border to the second border.

[0027] Based on the same inventive concept, this application also discloses a vapor deposition mask for fabricating a display panel motherboard. The display panel motherboard includes multiple panel groups, each panel group including multiple display panels arranged along a first direction. The multiple panel groups are arranged along a second direction, and a gap is formed between adjacent panel groups, which includes:

[0028] A mask body includes multiple non-graphic regions and multiple graphic regions, the non-graphic regions and the graphic regions extending along a first direction and alternately arranged along a second direction; each graphic region corresponds to a panel group, each non-graphic region corresponds to a spacing area, and the graphic region includes multiple vapor-deposited regions arranged along the first direction, each vapor-deposited region corresponding to a display area of ​​a display panel;

[0029] Each of the vapor deposition areas is provided with multiple first mask openings, and each of the non-patterned areas is provided with multiple second mask openings. The multiple second mask openings are arranged along the first direction, and the size of the second mask opening is smaller than the size of the first mask opening; the first direction and the second direction intersect.

[0030] In one embodiment, a mask frame is further included, the mask frame including a first border, a second border, a third border and a fourth border connected in sequence, the second border and the fourth border extending along the first direction and arranged along the second direction, the first border and the third border extending along the second direction and arranged along the first direction; the two ends of the mask body along the first direction are fixedly connected to the first border and the third border respectively.

[0031] Preferably, along the first direction, the distance between two adjacent second mask openings is greater than the distance between two adjacent first mask openings;

[0032] Preferably, the non-graphic area includes a third non-graphic area located between two adjacent graphic areas. The third non-graphic area includes a first sub-area, a second sub-area, and a third sub-area. The first sub-area, the second sub-area, and the third sub-area are arranged along the second direction. The first sub-area is located on the side of the second sub-area closer to the fourth border, and the third sub-area is located on the side of the second sub-area closer to the second border.

[0033] The size of the second mask opening in the second sub-region is larger than the size of the second mask opening in the first sub-region and the size of the second mask opening in the third sub-region.

[0034] In one embodiment, the non-graphical region includes a first non-graphical region adjacent to the fourth border and a second non-graphical region adjacent to the second border;

[0035] Multiple second mask openings are simultaneously arranged along the first direction and the second direction within the first non-graphic region;

[0036] Preferably, within the first non-graphic area, the size of the plurality of second mask openings gradually decreases from the second border to the fourth border.

[0037] Within the second non-graphic area, the size of the plurality of second mask openings gradually decreases from the fourth border to the second border direction;

[0038] Preferably, along the second direction, the center of each row of second mask openings and the center of the corresponding first mask opening are located on the same straight line;

[0039] Preferably, the shape of the first mask opening includes one or more of a circle and a chamfered rectangle;

[0040] And / or, the shape of the second mask opening includes one or more of a circle and a chamfered rectangle.

[0041] Based on the same inventive concept, this application also discloses a vapor deposition apparatus, which includes the mask or vapor deposition mask described in any of the above-mentioned claims.

[0042] Compared with the prior art, the photomask provided in this application includes multiple non-graphical areas and multiple graphic areas. The non-graphical areas and graphic areas extend along a first direction and are alternately arranged along a second direction. The graphic areas include multiple vapor deposition areas arranged along the first direction, each vapor deposition area corresponding to a display area of ​​a display panel. Each vapor deposition area is provided with multiple first mask openings, and each non-graphical area is provided with multiple second mask openings. Providing second mask openings in the non-graphical areas helps reduce mask wrinkles and improve the flatness of the mask. Simultaneously, the size of the second mask openings is smaller than the size of the first mask openings, which helps improve the strength of the mask and reduce the risk of damage. Attached Figure Description

[0043] To more clearly illustrate the technical solutions in this application or related technologies, the drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0044] Figure 1 A schematic diagram of a photomask provided in an embodiment of this application;

[0045] Figure 2 A schematic diagram of a photomask provided for another embodiment of this application;

[0046] Figure 3 A schematic diagram of a photomask provided for another embodiment of this application;

[0047] Figure 4 A schematic diagram of a photomask provided for another embodiment of this application;

[0048] Figure 5 A schematic diagram of a photomask provided for another embodiment of this application;

[0049] Figure 6A schematic diagram illustrating the fabrication of a display panel motherboard using a vapor deposition mask provided in another embodiment of this application;

[0050] Figure 7 A schematic diagram of a display panel motherboard provided in another embodiment of this application;

[0051] Figure 8 This is a schematic diagram of the structure of a vapor deposition apparatus provided in another embodiment of this application.

[0052] Marker explanation:

[0053] 100. Photomask; 200. Photomask for vapor deposition; 400. Vapor deposition equipment; 410. Vapor deposition chamber; 420. Evaporation source; 300. Display panel motherboard; 310. Display panel; 311. Pixel unit; 320. Spacing area;

[0054] 10. Mask frame; 11. First border; 12. Second border; 13. Third border; 14. Fourth border;

[0055] 20. Mask body; 21. Non-patterned area; 211. Second mask opening; 212. First non-patterned area; 213. Second non-patterned area; 214. Third non-patterned area; 215. First sub-region; 216. Second sub-region; 217. Third sub-region; 22. Patterned area; 221. Evaporation area; 222. First mask opening. Detailed Implementation

[0056] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with specific embodiments and the accompanying drawings.

[0057] It should be noted that, unless otherwise defined, the technical or scientific terms used in the embodiments of this application should have the ordinary meaning understood by one of ordinary skill in the art to which this application pertains. The terms "first," "second," and similar terms used in the embodiments of this application do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are only used to indicate relative positional relationships; when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0058] In OLED display panel fabrication, the photomask is a crucial fixture in the vapor deposition process, and using a photomask for vapor deposition is a key process for forming pixel patterns. OLED display panel vapor deposition is primarily based on the principle of physical vapor deposition, as detailed below:

[0059] Heating evaporation: In a high-vacuum evaporation chamber, organic or metallic materials in the evaporation source are heated. Common heating methods include resistance heating, electron beam heating, and laser heating. For example, resistance heating uses an electric current passing through a resistance wire to generate heat, raising the temperature of the material inside the evaporation boat; electron beam heating uses a high-energy electron beam to bombard the material, converting the kinetic energy of the electrons into thermal energy. When the material reaches a certain temperature, it transforms from a solid to a gaseous state, forming atoms or molecules of the evaporated material.

[0060] Molecular motion: Under high vacuum conditions, the atoms or molecules of the vapor-deposited material have a long path of freedom, enabling them to diffuse in all directions from the evaporation source in a linear motion. Because there are very few gas molecules in a vacuum environment, collisions between the vapor-deposited material atoms or molecules and other gas molecules are reduced, thus ensuring that they can directly reach the substrate surface.

[0061] Pattern Forming: A mask with fine openings corresponding to the OLED pixel pattern is placed between the evaporation source and the substrate. Only atoms or molecules of the evaporated material that pass through the openings in the mask can reach the substrate surface and be deposited; atoms or molecules in other directions are blocked by the mask. In this way, a thin film pattern consistent with the opening pattern of the mask is formed on the substrate, achieving precise pixel patterning.

[0062] Thin film growth: Upon reaching the substrate surface, evaporated material atoms or molecules adsorb, diffuse, and aggregate on the substrate surface. As the evaporation time increases, material continues to deposit, and atoms or molecules gradually accumulate to form a thin film. By precisely controlling parameters such as evaporation time, evaporation rate, and substrate temperature, the thickness and quality of the thin film can be controlled, ensuring uniform performance for each pixel.

[0063] The inventors discovered that the photomask is easily damaged due to the thinness of the substrate itself and its special internal structure.

[0064] Therefore, the purpose of this application is to provide a mask to solve the above problems.

[0065] Please refer to Figure 1As shown, a mask 100 provided in an embodiment of this application includes a mask body 20, which includes a plurality of non-graphic regions 21 and a plurality of graphic regions 22. The non-graphic regions 21 and graphic regions 22 extend along a first direction (X direction in the figure) and are alternately arranged along a second direction (Y direction in the figure). The graphic regions 22 include a plurality of vapor-deposited regions 221 arranged along the first direction, and each vapor-deposited region 221 corresponds to a display area of ​​a display panel.

[0066] Each vapor deposition area 221 is provided with multiple first mask openings 222, and each non-pattern area 21 is provided with multiple second mask openings 211. The multiple second mask openings 211 are arranged along a first direction, and the size of the second mask opening 211 is smaller than the size of the first mask opening 222. The first direction and the second direction intersect.

[0067] The mask 100 provided in this embodiment includes a mask body 20 comprising multiple non-graphic regions 21 and multiple graphic regions 22. The non-graphic regions 21 and graphic regions 22 extend along a first direction and are alternately arranged along a second direction. The graphic regions 22 include multiple vapor deposition regions 221 arranged along the first direction. Each vapor deposition region 221 corresponds to a display area of ​​a display panel. Each vapor deposition region 221 is provided with multiple first mask openings 222, and each non-graphic region 21 is provided with multiple second mask openings 211. Providing second mask openings 211 in the non-graphic regions 21 helps reduce mask wrinkles and improve the flatness of the mask. Simultaneously, the size of the second mask openings 211 is smaller than the size of the first mask openings 222, which helps improve the strength of the mask and reduce the risk of mask damage.

[0068] Specifically, when the mask body 20 is stretched onto the mask frame 10, the presence of the first mask opening 222 within the patterned area 22 causes uneven stress distribution between the non-patterned area 21 and the patterned area 22, resulting in wrinkles in the mask body 20. In this embodiment, by providing a second mask opening 211 in the non-patterned area 21, with the size of the second mask opening 211 being smaller than the size of the first mask opening 222, the uneven stress distribution between the non-patterned area 21 and the patterned area 22 can be improved, achieving a smooth transition of force between the two areas, thereby reducing mask wrinkles and improving the flatness of the mask.

[0069] Specifically, the vapor-deposited display panel motherboard needs to be cut into smaller display panels. During vapor deposition, the vapor deposition material is deposited onto the corresponding display area of ​​each display panel through the first mask opening 222 of each vapor deposition area 221.

[0070] Each vapor deposition area 221 is provided with multiple first mask openings 222, each first mask opening 222 being used to form a predetermined pixel pattern. The size of the first mask opening 222 is typically very small, only tens of micrometers. Its shape can be customized according to the pixel design requirements, commonly including rectangles, circles, triangles, etc. Furthermore, the arrangement of the openings corresponds to the pixel arrangement on the display panel to ensure that organic materials can be accurately deposited at each pixel location.

[0071] The mask openings are typically fabricated on a metal mask using high-precision processes such as laser processing and etching. Laser processing achieves extremely high precision and resolution, enabling the creation of tiny and complex-shaped openings. Etching, on the other hand, removes unwanted metal portions from the mask using chemical or physical methods, forming a precise opening pattern. During manufacturing, process parameters must be strictly controlled to ensure the size, shape, and position of the openings meet design requirements. Simultaneously, the edge quality of the openings must be guaranteed, avoiding burrs, roughness, and other defects that could negatively impact the vapor deposition effect.

[0072] In one embodiment, the mask 100 further includes a mask frame 10, which includes a first border 11, a second border 12, a third border 13, and a fourth border 14 connected in sequence. The second border 12 and the fourth border 14 extend along a first direction and are arranged along a second direction, while the first border 11 and the third border 13 extend along the second direction and are arranged along the first direction. The two ends of the mask body 20 along the first direction are fixedly connected to the first border 11 and the third border 13, respectively, so as to stretch the mask body 20 onto the mask frame 10.

[0073] In one embodiment, the shape of the first mask opening 222 includes one or more of a circle and a chamfered rectangle, and the shape of the second mask opening 211 includes one or more of a circle and a chamfered rectangle. The second mask opening 211 may have the same or different shape as the first mask opening 222.

[0074] From an optical perspective, the symmetry of a circle facilitates the deposition of organic material molecules at a more uniform angle onto the pixel location during the evaporation process, thereby improving the uniformity of pixel emission to a certain extent. In terms of manufacturing processes, methods such as laser processing can easily produce high-precision circular openings with easily controllable edge smoothness, meeting micron-level and even nanometer-level precision requirements. Furthermore, the design and manufacturing of circular openings are relatively easy to control in terms of size and positioning, which helps improve the manufacturing efficiency and quality of the photomask.

[0075] Chamfered rectangular apertures better accommodate the rectangular arrangement of pixels, making fuller use of space and increasing the pixel fill factor within the same pixel area. This is highly beneficial for improving the resolution and aperture ratio of display panels, contributing to higher pixel density and better display performance. For example, in some high-resolution OLED display panels, chamfered rectangular apertures can achieve more effective light-emitting area within a limited pixel region, thereby improving screen brightness and color saturation.

[0076] The chamfered rectangular design effectively reduces electric field concentration at pixel edges. During display device operation, the uniformity of the electric field distribution significantly impacts pixel luminous performance and lifespan. By employing chamfered rectangular openings, the electric field can be distributed more evenly at pixel edges, reducing problems such as decreased luminous efficiency and shortened lifespan caused by excessively high electric fields at pixel edges, thus improving the stability and reliability of the display device.

[0077] To verify the effectiveness of the mask 100 in this embodiment, simulations were performed on the mask 100, as shown in Table 1. Scheme Two uses the mask 100 from the above embodiment, with the first mask opening 222 being a chamfered rectangle with a side length of 39 micrometers. The difference between Scheme One and Scheme Two is that the first mask opening 222 is a chamfered rectangle with a side length of 40 micrometers. The results show that, under the same deformation, Scheme Two can withstand a significantly increased maximum tensile force; compared to Scheme One, the strength of the mask 100 in Scheme Two is increased by approximately 5%.

[0078] Table 1

[0079] Deformation Tensile strength Option 1 0.01％ 3.74 Option 2 0.01％ 3.92

[0080] Reference Figure 2 As shown, in one embodiment, the non-graphic region 21 includes a first non-graphic region 212 adjacent to the fourth border 14 and a second non-graphic region 213 adjacent to the second border 12; a plurality of second mask openings 211 are arranged simultaneously along the first direction and the second direction in the first non-graphic region 212, and a plurality of second mask openings 211 are arranged simultaneously along the first direction and the second direction in the second non-graphic region 213, which is beneficial to further improve the uneven force distribution between the non-graphic region 21 and the graphic region 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0081] Reference Figure 3As shown, in one embodiment, within the first non-graphic region 212, the size of a plurality of second mask openings 211 gradually decreases from the second border 12 to the fourth border 14; within the second non-graphic region 213, the size of a plurality of second mask openings 211 gradually decreases from the fourth border 14 to the second border 12. This is beneficial for further improving the uneven force distribution between the non-graphic region 21 and the graphic region 22, achieving a smooth transition of force between the non-graphic region 21 and the graphic region 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0082] Reference Figure 4 As shown, in one embodiment, the non-graphic region 21 includes a third non-graphic region 214 located between two adjacent graphic regions 22. The third non-graphic region 214 includes a first sub-region 215, a second sub-region 216, and a third sub-region 217. The first sub-region 215, the second sub-region 216, and the third sub-region 217 are arranged along a second direction. The first sub-region 215 is located on the side of the second sub-region 216 near the fourth border 14, and the third sub-region 217 is located on the side of the second sub-region 216 near the second border 12. The size of the second mask opening 211 in the second sub-region 216 is larger than the size of the second mask opening 211 in the first sub-region 215 and the size of the second mask opening 211 in the third sub-region 217, thereby achieving a smooth transition of force between two adjacent graphic regions 22 and improving the flatness of the mask.

[0083] Specifically, within the third non-graphic region 214, along the second direction, the size of different second mask openings 211 first decreases and then increases, thereby achieving a smooth transition of force, reducing mask wrinkles, and improving the strength of the mask.

[0084] Furthermore, the non-graphic region 21 includes a plurality of third non-graphic regions 214, each of which is located between two adjacent graphic regions 22.

[0085] Please continue to refer to Figure 2 As shown, in one embodiment, along the second direction, the center of each row of second mask openings 211 and the center of the corresponding first mask opening 222 are located on the same straight line M, which helps to further improve the uneven force distribution between the non-graphic area 21 and the graphic area 22, realize the smooth transition of force between the non-graphic area 21 and the graphic area 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0086] Please continue to refer to Figure 2As shown, in one embodiment, along the first direction, the distance between two adjacent second mask openings 211 is greater than the distance between two adjacent first mask openings 222, which helps to improve the strength of the non-graphic area 21, thereby improving the strength of the mask and reducing the risk of mask damage.

[0087] Specifically, the distance between two adjacent second mask openings 211 is d1, and the distance between two adjacent first mask openings 222 is d2, satisfying d1>d2.

[0088] Reference Figure 5 As shown, based on the same inventive concept, another embodiment of this application also discloses a mask 100, which includes a mask frame 10 and a mask body 20. The mask frame 10 includes a first border 11, a second border 12, a third border 13 and a fourth border 14 connected in sequence. The second border 12 and the fourth border 14 extend along a first direction and are arranged along a second direction. The first border 11 and the third border 13 extend along the second direction and are arranged along the first direction.

[0089] The mask body 20 is connected to the first frame 11 and the third frame 13 at both ends along the first direction. The mask body 20 includes a non-graphic area 21 and a graphic area 22. The non-graphic area 21 includes a first non-graphic area 212 adjacent to the fourth frame 14 and a second non-graphic area 213 adjacent to the second frame 12. The graphic area 22 is located between the first non-graphic area 212 and the second non-graphic area 213. The graphic area 22 includes a plurality of vapor deposition areas 221 arranged along the first direction. Each vapor deposition area 221 corresponds to a display area of ​​a display panel.

[0090] Each vapor deposition area 221 is provided with multiple first mask openings 222, and each non-pattern area 21 is provided with multiple second mask openings 211. The multiple second mask openings 211 are arranged along a first direction, and the size of the second mask opening 211 is smaller than the size of the first mask opening 222. The first direction and the second direction intersect.

[0091] The mask 100 provided in this embodiment, by providing a second mask opening 211 in the non-graphic area 21, helps to reduce mask wrinkles and improve the flatness of the mask. At the same time, the size of the second mask opening 211 is smaller than the size of the first mask opening 222, which helps to improve the strength of the mask and reduce the risk of mask damage.

[0092] Please continue to refer to Figure 5As shown, in one embodiment, a plurality of second mask openings 211 are arranged simultaneously along a first direction and a second direction within a second non-graphic region 213; within a first non-graphic region 212, the size of the plurality of second mask openings 211 gradually decreases from the second border 12 to the fourth border 14; within a second non-graphic region 213, the size of the plurality of second mask openings 211 gradually decreases from the fourth border 14 to the second border 12. This is beneficial for further improving the uneven force distribution between the non-graphic region 21 and the graphic region 22, achieving a smooth transition of force between the non-graphic region 21 and the graphic region 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0093] In one embodiment, the shape of the first mask opening 222 includes one or more of a circle and a chamfered rectangle, and the shape of the second mask opening 211 includes one or more of a circle and a chamfered rectangle. The second mask opening 211 may have the same or different shape as the first mask opening 222.

[0094] In one embodiment, along the first direction, the distance between two adjacent second mask openings 211 is greater than the distance between two adjacent first mask openings 222, which helps to improve the strength of the non-graphic area 21, thereby improving the strength of the mask and reducing the risk of damage to the mask.

[0095] In one embodiment, along the second direction, the center of each row of second mask openings 211 and the center of the corresponding first mask opening 222 are located on the same straight line, which helps to further improve the uneven force distribution between the non-graphic area 21 and the graphic area 22, realize the smooth transition of force between the non-graphic area 21 and the graphic area 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0096] Reference Figure 1 , 6 As shown in Figure 7, based on the same inventive concept, another embodiment of this application also discloses a vapor deposition mask 200 for fabricating a display panel motherboard 300. The display panel motherboard 300 includes multiple panel groups, each panel group including multiple display panels 310 arranged along a first direction (X direction in the figure), the multiple panel groups are arranged along a second direction (Y direction in the figure), and a gap area 320 is formed between adjacent panel groups. The vapor deposition mask 200 has a mask body 20, which includes multiple non-graphic regions 21 and multiple graphic regions 22. The non-graphic regions 21 and graphic regions 22 extend along the first direction and are arranged alternately along the second direction. Each graphic region 22 corresponds to a panel group, each non-graphic region 21 corresponds to a gap area 320, and the graphic region 22 includes multiple vapor deposition regions 221 arranged along the first direction. Each vapor deposition region 221 corresponds to a display area of ​​a display panel 310.

[0097] Each vapor deposition region 221 is provided with multiple first mask openings 222, and each non-patterned region 21 is provided with multiple second mask openings 211. The multiple second mask openings 211 are arranged along a first direction, and the size of the second mask opening 211 is smaller than the size of the first mask opening 222; the first direction and the second direction intersect. In one embodiment, the first mask opening 222 is correspondingly provided with a pixel unit 311 for forming the pixel unit 311. In other embodiments, the first mask opening 222 is correspondingly provided with an encapsulation layer or pixel definition layer, etc., for forming an encapsulation layer or pixel definition layer, etc.

[0098] The vapor deposition mask 200 provided in this embodiment includes a mask body 20 comprising multiple non-patterned regions 21 and multiple patterned regions 22. The non-patterned regions 21 and patterned regions 22 extend along a first direction and are alternately arranged along a second direction. The patterned regions 22 include multiple vapor deposition regions 221 arranged along the first direction. Each vapor deposition region 221 corresponds to a display area of ​​a display panel. Each vapor deposition region 221 is provided with multiple first mask openings 222, and each non-patterned region 21 is provided with multiple second mask openings 211. Providing second mask openings 211 in the non-patterned regions 21 helps reduce mask wrinkles and improve the flatness of the mask. Simultaneously, the size of the second mask openings 211 is smaller than the size of the first mask openings 222, which helps improve the strength of the mask and reduce the risk of mask damage.

[0099] In one embodiment, the mask frame 10 includes a first border 11, a second border 12, a third border 13, and a fourth border 14 connected in sequence. The second border 12 and the fourth border 14 extend along a first direction and are arranged along a second direction. The first border 11 and the third border 13 extend along the second direction and are arranged along the first direction. The two ends of the mask body 20 along the first direction are fixedly connected to the first border 11 and the third border 13, respectively, so as to stretch the mask body 20 onto the mask frame 10.

[0100] In one embodiment, the shape of the first mask opening 222 includes one or more of a circle and a chamfered rectangle, and the shape of the second mask opening 211 includes one or more of a circle and a chamfered rectangle. The second mask opening 211 may have the same or different shape as the first mask opening 222.

[0101] Reference Figure 2As shown, in one embodiment, the non-graphic region 21 includes a first non-graphic region 212 adjacent to the fourth border 14 and a second non-graphic region 213 adjacent to the second border 12; a plurality of second mask openings 211 are arranged simultaneously along the first direction and the second direction in the first non-graphic region 212, and a plurality of second mask openings 211 are arranged simultaneously along the first direction and the second direction in the second non-graphic region 213, which is beneficial to further improve the uneven force distribution between the non-graphic region 21 and the graphic region 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0102] Reference Figure 3 As shown, in one embodiment, within the first non-graphic region 212, the size of a plurality of second mask openings 211 gradually decreases from the second border 12 to the fourth border 14; within the second non-graphic region 213, the size of a plurality of second mask openings 211 gradually decreases from the fourth border 14 to the second border 12. This is beneficial for further improving the uneven force distribution between the non-graphic region 21 and the graphic region 22, achieving a smooth transition of force between the non-graphic region 21 and the graphic region 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0103] Reference Figure 4 As shown, in one embodiment, the non-graphic region 21 includes a third non-graphic region 214 located between two adjacent graphic regions 22. The third non-graphic region 214 includes a first sub-region 215, a second sub-region 216, and a third sub-region 217. The first sub-region 215, the second sub-region 216, and the third sub-region 217 are arranged along a second direction. The first sub-region 215 is located on the side of the second sub-region 216 near the fourth border 14, and the third sub-region 217 is located on the side of the second sub-region 216 near the second border 12. The size of the second mask opening 211 in the second sub-region 216 is larger than the size of the second mask opening 211 in the first sub-region 215 and the size of the second mask opening 211 in the third sub-region 217, thereby achieving a smooth transition of force between two adjacent graphic regions 22 and improving the flatness of the mask.

[0104] Please continue to refer to Figure 2 As shown, in one embodiment, along the second direction, the center of each row of second mask openings 211 and the center of the corresponding first mask opening 222 are located on the same straight line M, which helps to further improve the uneven force distribution between the non-graphic area 21 and the graphic area 22, realize the smooth transition of force between the non-graphic area 21 and the graphic area 22, thereby reducing mask wrinkles and improving the flatness of the mask.

[0105] Please continue to refer to Figure 2As shown, in one embodiment, along the first direction, the distance between two adjacent second mask openings 211 is greater than the distance between two adjacent first mask openings 222, which helps to improve the strength of the non-graphic area 21, thereby improving the strength of the mask and reducing the risk of mask damage.

[0106] Reference Figure 8 As shown, based on the same inventive concept, another embodiment of this application also discloses a vapor deposition apparatus 400, including the mask 100 in the above embodiment.

[0107] The vapor deposition equipment 400 provided in this embodiment has a second mask opening 211 in the non-patterned area 21 of its mask 100. This helps to reduce mask wrinkles and improve the flatness of the mask. At the same time, the size of the second mask opening 211 is smaller than the size of the first mask opening 222, which helps to increase the strength of the mask, reduce the risk of mask damage, and improve the performance of the vapor deposition equipment 400.

[0108] In one embodiment, the vapor deposition apparatus 400 further includes a vapor deposition chamber 410 and an evaporation source 420. The evaporation source 420 is disposed in the vapor deposition chamber 410 and located below the mask 100. The evaporation source 420 is used to vapor deposit the vapor deposition material onto the surface of the display panel motherboard 300 through the mask 100.

[0109] Optionally, the evaporation source 420 can be a point-type evaporation source or a linear evaporation source. A point-type evaporation source has a macroscopic point shape. Its advantage is its relatively simple structure, making it suitable for small-area evaporation deposition scenarios or those where extremely high precision is not required. A linear evaporation source has a linear structure. It is more commonly used in large-scale OLED production because it can improve evaporation deposition efficiency and uniformity to a certain extent.

[0110] In one embodiment, the evaporation source 420 includes a crucible, a heating device, and a nozzle. The crucible is used to hold the vapor deposition material; the heating device is used to heat the crucible so that the vapor deposition material in the crucible is heated and evaporated; the nozzle is connected to the crucible and is used to deposit the heated and evaporated material vapor onto the surface of the display panel motherboard 300.

[0111] In this process, under high vacuum, the vapor-deposited material in the crucible is heated to above its sublimation or boiling point using a heating device. The material then transforms directly from a solid to a gaseous state (sublimation) or from a liquid to a gaseous state (evaporation). Due to the large mean free path of gas molecules in a vacuum environment, the evaporated material vapor is ejected from the nozzle in a linear motion and deposited on the surface of the display panel motherboard 300, forming a uniform thin film layer. By precisely controlling parameters such as heating temperature, evaporation rate, nozzle design, and vacuum environment, the thickness, uniformity, and composition of the vapor-deposited film can be precisely controlled, thus meeting the fabrication requirements of different functional layers in OLED display panels. For example, for the organic light-emitting layer, precise control of the vapor deposition thickness and uniformity of the organic material is required to achieve good luminous performance and display effects; for the metal electrode layer, the vapor deposition quality of the metal material must be ensured to provide good conductivity and stability.

[0112] Optionally, the crucible is made of a material with high temperature resistance and good chemical stability, such as boron nitride. To precisely control the evaporation process, the shape, size, and material of the crucible are designed according to different evaporation materials and process requirements. For example, for organic materials, a smaller crucible may be used to achieve precise dosage control; for metallic materials, the crucible may need to have higher temperature resistance.

[0113] Optionally, the heating method of the heating device can be resistance heating, electron beam heating, or laser heating. Taking resistance heating as an example, heating elements, such as heating wires or heating plates, are generally placed around or on the bottom wall of the crucible. When current passes through these heating elements, heat is generated, which in turn raises the temperature of the vapor-deposited material inside the crucible and causes it to evaporate. Furthermore, the heating device is also equipped with a temperature control system to precisely control the heating temperature and rate, ensuring that the vapor-deposited material can evaporate at a stable rate.

[0114] Optionally, the nozzle is located at the top of the evaporation source, and the material vapor after heating and evaporation is ejected through the nozzle and deposited in the direction of the display panel motherboard 300. The design of the nozzle affects the steam injection angle, speed and distribution uniformity, and is usually optimized according to the size, shape and vapor deposition process requirements of the display panel motherboard 300.

[0115] Furthermore, the evaporation source 420 also includes a cooling device. This cooling device prevents the evaporation source 420 from overheating during operation and avoids condensation of the vapor-deposited material in unintended areas. The cooling device can consist of cooling pipes or heat sinks, etc., and uses circulating cooling water or other cooling media to remove heat, maintaining the temperature of the evaporation source within a suitable range.

[0116] Furthermore, the evaporation source 420 also includes a cover plate and a sealing structure. The cover plate is used to cover components such as the crucible and heating device, which on the one hand prevents external impurities from entering the interior of the evaporation source 420 and affecting the purity of the vapor-deposited material; on the other hand, it also helps to maintain the stability of the temperature and atmosphere inside the evaporation source 420. The sealing structure ensures that the evaporation source 420 is in a sealed state during operation, avoiding vapor leakage and improving vapor deposition efficiency and quality.

[0117] In one embodiment, the vapor deposition apparatus 400 further includes a vacuum pump assembly connected to the vapor deposition chamber 410 for evacuating the vapor deposition chamber 410 to provide a vacuum environment for vapor deposition.

[0118] In one embodiment, the vacuum pump assembly comprises a vacuum pump, a motor, a vacuum gauge, piping, and valves, among other parts. The following is a detailed description of each part:

[0119] Vacuum pumps are the core components, their function being to extract gas from a sealed space through various physical mechanisms to reduce gas pressure and create a vacuum. Common types of vacuum pumps include rotary vane vacuum pumps, reciprocating vacuum pumps, Roots vacuum pumps, and molecular pumps. Different types of vacuum pumps are suitable for different vacuum ranges and applications. For example, rotary vane vacuum pumps have a simple structure and are easy to maintain, suitable for low to medium vacuum ranges, and are commonly used in laboratories, electronics manufacturing, and other fields; molecular pumps, on the other hand, can achieve extremely high vacuum levels and are mainly used in semiconductor manufacturing, aerospace, and other fields with extremely high vacuum requirements.

[0120] Motor: Provides power for the operation of the vacuum pump. A suitable motor is selected based on the type of vacuum pump and its power requirements. The motor's speed, torque, and other parameters need to be matched with the vacuum pump to ensure its normal and efficient operation. Typically, the motor is connected to the vacuum pump via a coupling or belt drive, transmitting the motor's rotational motion to the pump's rotor or piston and other moving parts.

[0121] Vacuum gauges are used to measure the pressure in a vacuum system to monitor the vacuum level. Common types of vacuum gauges include thermocouple vacuum gauges, ionization vacuum gauges, and capacitive thin-film vacuum gauges. Thermocouple vacuum gauges are suitable for measuring low vacuum ranges; ionization vacuum gauges can measure high and ultra-high vacuums; and capacitive thin-film vacuum gauges offer advantages such as high precision and a wide measuring range, enabling accurate measurements over a broad vacuum range. Real-time measurement data from vacuum gauges allows operators to understand the operating status of the vacuum system, promptly identify problems, and make adjustments.

[0122] Piping: Used to connect vacuum pumps to equipment or systems requiring vacuuming, forming a channel for gas flow. The material of the piping is typically selected based on the application and requirements. For example, stainless steel piping offers good corrosion resistance and high strength, making it suitable for most industrial applications; glass piping, on the other hand, offers high transparency and good chemical stability, and is often used in specialized laboratory experiments. The inner diameter of the piping affects the gas flow rate and pumping efficiency, requiring careful design based on the vacuum pump's pumping speed and the system's gas flow rate.

[0123] Valves play a crucial role in vacuum systems by controlling gas flow and isolating different parts of the system. Common valves include vacuum butterfly valves, vacuum ball valves, and angle seat valves. Vacuum butterfly valves are simple in structure and easy to operate, suitable for flow control in large-diameter pipelines; vacuum ball valves offer good sealing performance and can withstand high pressure differentials, often used in vacuum systems requiring strict sealing; angle seat valves feature low flow resistance and fast response, suitable for applications with high gas flow control requirements. By opening and closing valves, different operating stages of the vacuum system can be controlled. For example, a large-diameter valve can be opened at the initial stage of evacuation to quickly extract a large amount of gas, while a small-diameter valve can be used for fine adjustment as the desired vacuum level approaches.

[0124] Although this application has been described in conjunction with specific embodiments thereof, many substitutions, modifications and variations of these embodiments will be apparent to those skilled in the art from the foregoing description.

[0125] It should be noted that the above description describes some embodiments of this application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in a different order than that shown in the above embodiments and still achieve the desired result. Furthermore, the processes depicted in the drawings do not necessarily require a specific or sequential order to achieve the desired result. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0126] The embodiments of this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the embodiments of this application should be included within the protection scope of this application.

Claims

1. A photomask, characterized in that, include: The mask body includes multiple non-graphic regions and multiple graphic regions, the non-graphic regions and the graphic regions extending along a first direction and alternately arranged along a second direction; the graphic regions include multiple vapor-deposited regions arranged along the first direction, each vapor-deposited region corresponding to a display area of ​​a display panel; Each of the vapor deposition areas is provided with a plurality of first mask openings, and each of the non-patterned areas is provided with a plurality of second mask openings. The plurality of second mask openings are arranged along the first direction, and the size of the second mask opening is smaller than the size of the first mask opening. The first direction and the second direction intersect.

2. The photomask according to claim 1, characterized in that, It also includes a mask frame, which includes a first frame, a second frame, a third frame and a fourth frame connected in sequence. The second frame and the fourth frame extend along the first direction and are arranged along the second direction. The first frame and the third frame extend along the second direction and are arranged along the first direction. The two ends of the mask body along the first direction are fixedly connected to the first frame and the third frame, respectively. Preferably, along the first direction, the distance between two adjacent second mask openings is greater than the distance between two adjacent first mask openings.

3. The photomask according to claim 2, characterized in that, The non-graphic area includes a first non-graphic area adjacent to the fourth border and a second non-graphic area adjacent to the second border; Multiple second mask openings are simultaneously arranged along the first direction and the second direction within the first non-graphic region; Preferably, within the first non-graphic area, the size of the plurality of second mask openings gradually decreases from the second border to the fourth border. Within the second non-graphic area, the size of the plurality of second mask openings gradually decreases from the fourth border to the second border direction; Preferably, along the second direction, the center of each row of second mask openings and the center of the corresponding first mask opening are located on the same straight line; Preferably, the shape of the first mask opening includes one or more of a circle and a chamfered rectangle; And / or, the shape of the second mask opening includes one or more of a circle and a chamfered rectangle.

4. The photomask according to claim 2, characterized in that, The non-graphic area includes a third non-graphic area located between two adjacent graphic areas. The third non-graphic area includes a first sub-area, a second sub-area, and a third sub-area. The first sub-area, the second sub-area, and the third sub-area are arranged along the second direction. The first sub-area is located on the side of the second sub-area closer to the fourth border, and the third sub-area is located on the side of the second sub-area closer to the second border. The size of the second mask opening in the second sub-region is larger than the size of the second mask opening in the first sub-region and the size of the second mask opening in the third sub-region.

5. A photomask, characterized in that, include: Mask frame; The mask frame includes a first frame, a second frame, a third frame, and a fourth frame connected in sequence. The second frame and the fourth frame extend along a first direction and are arranged along a second direction. The first frame and the third frame extend along the second direction and are arranged along the first direction. A mask body is connected to the first frame and the third frame at both ends along a first direction, respectively. The mask body includes a non-graphic area and a graphic area. The non-graphic area includes a first non-graphic area adjacent to the fourth frame and a second non-graphic area adjacent to the second frame. The graphic area is located between the first non-graphic area and the second non-graphic area. The graphic area includes a plurality of vapor-deposited areas arranged along the first direction, and each vapor-deposited area corresponds to a display area of ​​a display panel. Each of the vapor deposition areas is provided with a plurality of first mask openings, and each of the non-patterned areas is provided with a plurality of second mask openings. The plurality of second mask openings are arranged along the first direction, and the size of the second mask opening is smaller than the size of the first mask opening. The first direction and the second direction intersect.

6. The photomask according to claim 5, characterized in that, Multiple second mask openings are simultaneously arranged along the first direction and the second direction within the second non-graphic region; Within the first non-graphic area, the size of the plurality of second mask openings gradually decreases from the second border to the fourth border. Within the second non-graphic area, the size of the plurality of second mask openings gradually decreases from the fourth border to the second border.

7. A vapor deposition mask for fabricating a display panel motherboard, the display panel motherboard comprising a plurality of panel groups, each panel group comprising a plurality of display panels arranged along a first direction, the plurality of panel groups being arranged along a second direction, and an interval region being formed between adjacent panel groups, characterized in that... include: A mask body includes multiple non-graphic regions and multiple graphic regions, the non-graphic regions and the graphic regions extending along a first direction and alternately arranged along a second direction; each graphic region corresponds to a panel group, each non-graphic region corresponds to a spacing area, and the graphic region includes multiple vapor-deposited regions arranged along the first direction, each vapor-deposited region corresponding to a display area of ​​a display panel; Each of the vapor deposition areas is provided with a plurality of first mask openings, and each of the non-patterned areas is provided with a plurality of second mask openings. The plurality of second mask openings are arranged along the first direction, and the size of the second mask opening is smaller than the size of the first mask opening. The first direction and the second direction intersect.

8. The evaporation mask according to claim 7, characterized in that, It also includes a mask frame, which includes a first frame, a second frame, a third frame and a fourth frame connected in sequence. The second frame and the fourth frame extend along the first direction and are arranged along the second direction. The first frame and the third frame extend along the second direction and are arranged along the first direction. The two ends of the mask body along the first direction are fixedly connected to the first frame and the third frame, respectively. Preferably, along the first direction, the distance between two adjacent second mask openings is greater than the distance between two adjacent first mask openings; Preferably, the non-graphic area includes a third non-graphic area located between two adjacent graphic areas. The third non-graphic area includes a first sub-area, a second sub-area, and a third sub-area. The first sub-area, the second sub-area, and the third sub-area are arranged along the second direction. The first sub-area is located on the side of the second sub-area closer to the fourth border, and the third sub-area is located on the side of the second sub-area closer to the second border. The size of the second mask opening in the second sub-region is larger than the size of the second mask opening in the first sub-region and the size of the second mask opening in the third sub-region.

9. The evaporation mask according to claim 8, characterized in that, The non-graphic area includes a first non-graphic area adjacent to the fourth border and a second non-graphic area adjacent to the second border; Multiple second mask openings are simultaneously arranged along the first direction and the second direction within the first non-graphic region; Preferably, within the first non-graphic area, the size of the plurality of second mask openings gradually decreases from the second border to the fourth border. Within the second non-graphic area, the size of the plurality of second mask openings gradually decreases from the fourth border to the second border direction; Preferably, along the second direction, the center of each row of second mask openings and the center of the corresponding first mask opening are located on the same straight line; Preferably, the shape of the first mask opening includes one or more of a circle and a chamfered rectangle; And / or, the shape of the second mask opening includes one or more of a circle and a chamfered rectangle.

10. A vapor deposition apparatus, characterized in that, This includes the mask as described in any one of claims 1-7, or the mask for vapor deposition as described in any one of claims 8-9.

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