Mask support and mask assembly

Abstract

Embodiments of the present application provide a mask support frame and a mask assembly. The mask support frame of the embodiments of the present application comprises a frame body and an inner support body. The inner support body is arranged in the frame body, and the inner support body and the frame body form a plurality of placing openings, the orthographic projection of the placing openings can cover the pixel arrangement area of a to-be-evaporated substrate, a part of the inner support body has a plurality of shielding portions protruding towards the inside of the placing openings, the shielding portions are arranged correspondingly to the placing openings, and the orthographic projection of each shielding portion can cover the component to be shielded in the to-be-evaporated substrate. A plurality of magnetic force reducing portions are arranged on the inner support body, the magnetic force reducing portions can weaken the magnetic attraction force with the magnet element, the wrinkles in the magnetic force reducing portion area can smoothly expand to the edge and avoid wrinkle accumulation. Therefore, the mask support frame of the embodiments of the present application has the advantages of improving the pattern accuracy and clarity of the manufactured display screen.

Description

Technical Field

[0001] This invention relates to the field of display technology, and more specifically to a mask support frame and a mask assembly having the mask support frame. Background Technology

[0002] When using a metal mask to deposit material onto a substrate, a mask support frame is needed to support the metal mask and ensure close contact between the metal mask and the substrate. The mask support frame not only provides support for the mask but also ensures precise positioning and stability during the photolithography process. During deposition, a magnetic element located on the other side of the substrate attracts the metal mask, ensuring a tight bond between them. The deposition material passes through corresponding openings in the metal mask and deposits onto the substrate, thus forming the desired pattern.

[0003] To avoid affecting the display of the head area of ​​the screen, a shielding area is set on the internal support to block the head area. The internal support of the mask support frame is thin and wide. Under the magnetic field adsorption, the support part and shielding area of ​​the internal support frame cannot be flattened well, resulting in wrinkles. The wrinkles will create gaps between the mask support frame and the substrate to be vapor-deposited. As a result, during vapor deposition, the wrinkles will cause vapor deposition shadows and color mixing in the corresponding areas of the substrate to be vapor-deposited, thus causing product defects. Summary of the Invention

[0004] In view of this, embodiments of the present invention aim to provide a mask support frame and a mask assembly to solve the problem in the prior art where wrinkles in the mask support frame cause gaps between the mask support frame and the substrate to be vapor-deposited, resulting in color mixing during vapor deposition and reduced display screen clarity.

[0005] One aspect of this invention is a mask support frame.

[0006] Another aspect of the present invention provides a mask assembly.

[0007] The mask support frame of this invention includes a frame body and an internal support body. It is used to support the mask plate on which a common film layer is prepared on the substrate to be deposited.

[0008] Each of the frame and the internal support is made of a metal material that can be attracted by a magnet. The internal support is disposed within the frame and forms multiple placement openings with the frame for placing a mask. The shape and size of the placement openings can match the mask. The orthographic projection of the placement opening can cover the pixel setting area of ​​the substrate to be vapor-deposited. A portion of the internal support has multiple shielding portions protruding toward the interior of the placement openings. The multiple shielding portions are correspondingly disposed with the multiple placement openings, and the orthographic projection of each shielding portion can cover the component in the substrate to be vapor-deposited that needs to be shielded. The internal support with the shielding portions is provided with multiple anti-magnetic attraction portions.

[0009] The mask support frame of this invention features a demagnetizing suction part located near the shielding portion of the internal support. Before vapor deposition, a magnetic field is applied to the mask plate, allowing the internal support to adhere to the substrate to be vapor-deposited. The shielding portion of the internal support has a relatively strong magnetic force, while the demagnetizing suction part weakens the magnetic attraction of the magnetic element in the magnetic field. This allows wrinkles in the demagnetizing suction part area to extend smoothly to the edge, preventing wrinkle accumulation and thus avoiding wrinkles or accumulation in the internal support. When the mask plate is flat, organic material can be precisely deposited in the predetermined area according to design requirements, ensuring that each pixel is accurately aligned with the target position. Without wrinkles or accumulation, the vapor-deposited organic material can be deposited more evenly on the substrate, forming a clear and defect-free sub-pixel structure. Therefore, the mask support frame of this invention improves the image accuracy and clarity of the manufactured display screen.

[0010] Therefore, the mask support frame of the present invention has the advantage of improving pattern accuracy and clarity.

[0011] In one embodiment, the internal support includes a transverse support bar and a longitudinal support bar, which are arranged crisscrossingly within the frame to form a plurality of placement openings, and each of the demagnetizing suction part and the shielding part is disposed on the transverse support bar or the longitudinal support bar.

[0012] In one embodiment, the internal support body has multiple matrix-arranged placement openings, and horizontal support bars and vertical support bars are formed on the internal support body, with each of the demagnetizing suction part and the shielding part disposed on the horizontal support bar or the vertical support bar.

[0013] In one embodiment, each of the placement openings is provided with a shielding portion.

[0014] In one embodiment, the width of the transverse support bar is 8mm-15mm.

[0015] In one embodiment, the demagnetizing suction portion is an opening and / or a first thinning groove formed on the internal support.

[0016] In one embodiment, the demagnetizing part and the blocking part are arranged facing each other in the direction in which the blocking part protrudes from the internal support.

[0017] In one embodiment, the internal support body shown has the opening, and the first thinning groove on the side wall of the opening forms the demagnetizing part.

[0018] In one embodiment, the thickness of the internal support is 88um-122um, and the depth of the first thinning groove is 0.42-0.62 times the thickness of the internal support.

[0019] In one embodiment, the first thinning groove is filled with a first magnetic isolation layer.

[0020] In one embodiment, the cross-section of the opening is 0.8 to 1.2 times the area of ​​the shielding portion.

[0021] In one embodiment, the minimum distance between the opening and the edge of the internal support is 2mm-3mm.

[0022] In one embodiment, the edge of the shielding portion is provided with a second thinning groove on the side facing the substrate to be vapor-deposited, and a second magnetic isolation layer is provided in the second thinning groove.

[0023] In one embodiment, the depth of the second thinning groove increases from the inside out, the thickness of the second magnetic isolation layer increases from the inside out, the thickness of the second magnetic isolation layer is greater than or equal to the depth of the second thinning groove, and the portion from the area where the second thinning groove is disposed to one of the edges is formed as a plane.

[0024] The mask assembly of the present invention includes a mask plate and a mask support frame according to any one of the above-mentioned methods, wherein the mask plate rests on the internal support and / or the frame body, and the mask plate is disposed corresponding to the placement opening.

[0025] In one embodiment, the mask includes a mask body and a third magnetic isolation layer. The mask is made of a metal material that can be attracted by a magnet, and the third magnetic isolation layer is made of a material that cannot be attracted by a magnet. The mask has a plurality of evaporation holes to form an evaporation zone. A third thinning groove is provided between the edge of the evaporation zone and the area where the evaporation holes are located. The magnetic isolation layer is located between the edge of the mask body and the placement port area, and at least partially fills the third thinning groove. Attached Figure Description

[0026] Figure 1 The image shown is a top view of the mask support frame according to an embodiment of the present invention.

[0027] Figure 2 for Figure 1 An enlarged view of a style at point A in the middle.

[0028] Figure 3 for Figure 1 An enlarged view of another style at point A in the middle.

[0029] Figure 4 for Figure 1 Another enlarged view of the same style at point A.

[0030] Figure 5 for Figure 1 Here's another enlarged view of the style at point A.

[0031] Figure 6 This is a cross-sectional view of the shielding part in its thickness direction.

[0032] Explanation of reference numerals in the attached figures:

[0033] Mask support frame 100;

[0034] Frame 1;

[0035] Internal support 2;

[0036] Horizontal support bar 21;

[0037] Shielding part 211; Second magnetic isolation layer 2111;

[0038] Opening 212; First thinning groove 213;

[0039] Longitudinal support bar 22;

[0040] Place port 3. Detailed Implementation

[0041] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0042] Specifically, the functional component area of ​​the display screen contains functional components, such as an earpiece, a front-facing camera, and sensors. The shape of the functional component area is the same as the orthographic projection shape of the functional components within it on the display plane, and the area of ​​the functional component area is equal to or slightly larger than the orthographic projection area of ​​the functional components within it on the display plane; however, this area is not normally displayed, which is commonly known as a "notch screen," where the regular display area surrounds or partially surrounds the functional component area. The mask support 100 provided in this embodiment can be used for the evaporation of various functional film layers of the light-emitting devices in an OLED display device. For example, electron injection layer, electron transport layer, hole injection layer, hole transport layer, and cathode layer. The evaporation materials required for these functional film layers can be collectively referred to as EL materials. In conventional designs, these functional film layers are usually a single, continuous thin film.

[0043] The following is for reference. Figures 1-6 The mask support frame 100 and mask assembly of the present invention will be described by way of example.

[0044] The mask support frame 100 of this embodiment of the invention is used to support the mask plate used in preparing the substrate to be vapor-deposited.

[0045] The mask support 100 includes a frame body 1 and an inner support body 2. Each of the frame body 1 and the inner support body 2 is made of a metal material that can be attracted by a magnet. The inner support body 2 is disposed inside the frame body 1, and the inner support body 2 and the frame body 1 form a plurality of placement openings 3 for placing the mask. The shape and size of the placement openings 3 can match the mask, and the orthogonal projection of the placement openings 3 can cover the pixel setting area of ​​the substrate to be vapor-deposited. A portion of the inner support body 2 has a plurality of shielding parts 211 protruding toward the interior of the placement openings 3. The plurality of shielding parts 211 are correspondingly disposed with the plurality of placement openings 3, and the orthogonal projection of each shielding part 211 on the formed display plane can cover the component in the substrate to be vapor-deposited that needs to be shielded. The inner support body 2 with shielding parts 211 is provided with a plurality of anti-magnetic attraction parts. It can be understood that a portion of the inner support body 2 extends outward relative to another portion to form a plurality of shielding parts 211, and the inner support body 2 with shielding parts 211 is provided with anti-magnetic attraction parts.

[0046] The mask support frame 100 of this invention provides a demagnetizing part in the area of ​​the shielding part 211 of the inner support 2. The demagnetizing part is located close to the shielding part 211. Before vapor deposition, a magnetic field needs to be applied so that the mask plate can adhere to the substrate to be vapor deposited under the action of the magnetic field. The area of ​​the inner support 2 with the shielding part 211 has a relatively large magnetic attraction, and the demagnetizing part can weaken the magnetic attraction of the magnetic element with the magnetic field. Therefore, the wrinkles in the demagnetizing part area can smoothly extend to the edge, avoiding wrinkle accumulation. This avoids the problem of wrinkles or accumulation in the inner support 2. When the mask plate is flat, the organic material can be accurately deposited in the predetermined area according to the design requirements, thereby ensuring that each pixel can be accurately aligned with the target position. Without wrinkles and accumulation, the vapor-deposited organic material can be deposited more evenly on the substrate, thereby forming a clear and defect-free sub-pixel structure. Thus, the mask support frame 100 of this invention improves the image accuracy and clarity of the manufactured display screen.

[0047] Therefore, the mask support frame 100 of the present invention has the advantage of improving pattern accuracy and clarity.

[0048] Optionally, the edge of the internal support 2 and the frame 1 can be fixed by adhesive or welding. In this embodiment, welding is preferred to connect and fix the internal support 2 and the frame 1. The internal support 2 and the frame 1 are preferably made of the same metal material, and preferably a material with appropriate strength and low density. The internal support 2 and the frame 1 can be aluminum alloy or Invar alloy. For example, if both the internal support 2 and the frame 1 are made of Invar alloy, this material has a relatively low coefficient of thermal expansion, making it particularly suitable for high-precision applications, such as the fine metal mask (FMM) in the vapor deposition process of OLED displays. This can effectively reduce the dimensional changes of the mask support frame 100 caused by temperature changes, while also reducing weight while maintaining rigidity. This application is not limited to this; the internal support 2 and the frame 1 can also be made of aluminum alloy or stainless steel.

[0049] Furthermore, to improve corrosion resistance and reduce particulate contamination, anodizing, spray coating, or polishing can be performed on the surfaces of the internal support 2 and frame 1. Polishing or coating the mask support 100 improves its wear and corrosion resistance, thereby extending the service life of the entire mask assembly. Polishing the internal support 2 and frame 1 reduces friction with the substrate to be deposited, allowing wrinkles in the demagnetizing area to extend more smoothly to the edges, preventing wrinkle accumulation and further avoiding wrinkles or accumulation on the internal support 2 and frame 1.

[0050] Furthermore, the thickness of the internal support 2 is 88um-122um.

[0051] The internal support 2 provided in the mask support frame 100 of this embodiment of the invention enhances the overall rigidity and stability of the mask support frame 100 and divides the frame body 1 into multiple placement openings 3 for placing multiple substrates to be vapor-deposited. To ensure that the internal support 2 does not bend or deform during the vapor deposition process, the thickness of the internal support 2 determines to a certain extent the rigidity and load-bearing capacity of the entire mask support frame 100.

[0052] The mask support frame 100 of this embodiment of the invention, by limiting the thickness range of the internal support 2, avoids the situation where the thickness of the internal support 2 is too large, which would significantly increase the weight of the entire mask support frame 100. This would not only increase the difficulty of handling and operation, but also potentially place an additional burden on the production equipment. Moreover, an excessively thick internal support 2 is more prone to large thermal expansion or contraction during temperature changes, which may lead to local deformation of the mask plate, thereby affecting the accuracy of pattern transfer. Therefore, the mask support frame 100 of this embodiment of the invention has the advantages of good portability and high vapor deposition accuracy.

[0053] On the other hand, it avoids the problem of insufficient rigidity of the internal support 2 due to its thinness. Insufficient rigidity of the internal support 2 can easily lead to bending or deformation during handling, installation, or high-temperature vapor deposition, failing to effectively support the mask. This can also result in inaccurate pattern transfer. Moreover, an excessively thin internal support 2 may not be able to withstand the mechanical stress of long-term use, especially in high-precision applications such as fine metal masks (FMM) in OLED display manufacturing, easily leading to uneven material deposition. Furthermore, an internal support 2 that is too thin is more prone to damage, and it is more difficult to achieve ideal flatness and parallelism during processing, potentially resulting in uneven contact surfaces on the mask, further affecting the accuracy of pattern transfer. Therefore, the mask support frame 100 of this embodiment of the invention has the advantage of ensuring service life while improving vapor deposition accuracy.

[0054] Therefore, the mask support frame 100 of the present invention combines the advantages of good portability, high evaporation accuracy and high structural strength by setting the internal support 2 to a suitable thickness range.

[0055] Optionally, the thickness of the internal support 2 is 88um, 89um, 90um, 91um, 92um, 93um, 94um, 95um, 96um, 97um, 98um, 99um, 100um, 101um, 102um, 103um, 104um, 105um, 106um, 107um, 108um, 109um, 110um, 111um, 112um, 113um, 114um, 115um, 116um, 117um, 118um, 119um, and 120um. In specific design dimensions, the thickness of the internal support 2 determines its rigidity and load-bearing capacity, and the specific thickness of the internal support 2 can be set according to the circumstances.

[0056] like Figure 1 As shown, the internal support 2 includes transverse support bars 21 (e.g., Figure 1 The left-right extending support strips shown) and the longitudinal support strips 22 (e.g., Figure 1 As shown in the diagram, horizontal support bars 21 and vertical support bars 22 are staggered within the frame 1 to form multiple placement openings 3. A magnetic suction portion and a shielding portion 211 are provided in the non-overlapping areas of the horizontal support bars 21 and the vertical support bars 22. For example, the shielding portion 211 extends from a portion of the horizontal support bar 21 along... Figure 1 The vertical extension protrusion is shown. Each horizontal support bar 21 is provided with multiple blocking portions 211, which are spaced apart along the length extension direction of the horizontal support bar 21. Furthermore, the multiple blocking portions 211 of each horizontal support bar 21 are located on the same side of the horizontal support bar 21. For example, the multiple blocking portions 211 all protrude upward along one side of the upper end of the horizontal support bar 21.

[0057] The mask support frame 100 of this invention forms multiple placement openings 3 by alternately arranging the transverse support bars 21 and longitudinal support bars 22 of the internal support body 2 within the frame body 1. Both the antimagnetic suction part and the shielding part 211 are formed on the transverse support bars 21. The shielding part 211 can shield components such as the earpiece, front-facing camera, and various sensors including a proximity sensor. The antimagnetic suction part and the shielding part 211 are positioned in the non-overlapping area of ​​the transverse support bars 21 and the longitudinal support bars 22, because the non-overlapping area generally corresponds to the corner of the substrate to be vapor-deposited. Therefore, the position of the shielding part 211 is more in line with user requirements, and the resulting display screen has a higher aesthetic appeal.

[0058] Furthermore, there can be multiple transverse support bars 21 and multiple longitudinal support bars 22. The multiple transverse support bars 21 extend parallel to the width direction of the frame 1, and the multiple longitudinal support bars 22 also extend parallel to the length direction of the frame 1. For example, Figure 1 As shown, there are two horizontal support bars 21 and two vertical support bars 22. The two horizontal support bars 21, the vertical support bars 22, and the frame body 1 form nine rectangular placement openings 3 for placing nine photomasks. Each photomask corresponds to nine pixel setting areas for evaporation. When arranging the horizontal support bars 21 and the vertical support bars 22, they should be evenly distributed and appropriately spaced to provide sufficient support while avoiding obstruction of the effective area. It is generally recommended that the distance between the support bars be determined based on the photomask size and the required rigidity.

[0059] The present invention is not limited thereto. In other embodiments, a plurality of matrix-arranged placement openings 3 are formed on the internal support body 2, and horizontal support bars 21 and vertical support bars 22 are formed on the internal support body 2. Each of the anti-magnetic suction part and the shielding part 211 is provided on the horizontal support bar 21 or the vertical support bar 22. It can be understood that the internal support body 2 is relatively integrated. Therefore, it has good structural integrity and avoids the problem of uneven thickness caused by the intersection area of ​​the horizontal support bar 21 and the vertical support bar 22.

[0060] Each placement port 3 is provided with a shielding part 211. Furthermore, multiple shielding parts 211 are provided in a one-to-one correspondence with multiple placement ports 3. It is understood that each substrate to be vapor-deposited can be provided with a shielding part 211. The shape of the shielding part 211 can be designed to match the "notch" design of the display screen.

[0061] like Figures 1 to 5 As shown, each of the magnetic attraction part and the shielding part 211 is provided in the horizontal support bar 21, and the width of the horizontal support bar 21 is selected only in the range of 8mm-15mm.

[0062] The mask support frame 100 in this embodiment of the invention, by limiting the width range of the transverse support strip 21, avoids the problem that setting the width of the transverse support strip 21 too large might block part of the effective area of ​​the mask, thus preventing the organic material or other materials to be deposited from uniformly covering the entire target area. Especially in high-precision vapor deposition processes, this blocking effect will seriously affect the accuracy of pattern transfer. Moreover, because part of the effective area is blocked, the usable area on the substrate to be vapor-deposited is reduced, thereby reducing the vapor deposition efficiency, and consequently reducing the utilization rate of vapor deposition materials and the vapor deposition efficiency.

[0063] On the other hand, it avoids the problem of the transverse support strip 21 being too narrow, because an excessively narrow support strip itself lacks rigidity and is prone to bending or deformation during handling, installation, or high-temperature evaporation, failing to effectively support the mask and leading to inaccurate pattern transfer. At the same time, a mask lacking sufficient support can cause micro-displacement or wrinkles during photolithography or evaporation, affecting the quality of the final product. This is especially true in high-precision applications, such as fine metal masks (FMMs) in OLED display manufacturing, which can easily lead to uneven material deposition. Therefore, the mask support frame 100 of this embodiment of the invention has the advantage of ensuring service life while also improving evaporation accuracy.

[0064] Therefore, the mask support frame 100 of this embodiment of the invention determines the optimal width by calculation and experiment by limiting the width range of the transverse support strip 21, so as to ensure that it can provide sufficient support without excessively blocking the effective area.

[0065] Furthermore, the width of the transverse support strip 21 is greater than the width of the longitudinal support strip 22. Because the transverse support strip 21 requires a magnetic attraction section and thus higher structural strength, making its width greater than the longitudinal support strip 22 ensures sufficient support for the mask while reducing the overall mass of the internal support 2 to some extent. Optionally, the width of the transverse support strip 21 can be 8mm, 9mm, 10mm, 11mm, 12mm, 13mm, 14mm, and 15mm. For example, the width of the transverse support strip 21 can be set to 10mm, and the width of the longitudinal support strip 22 can be set to 7mm.

[0066] like Figures 1 to 5 As shown, the magnetic attraction portion is an opening 212 and / or a first thinning groove 213 formed on the inner support 2. In other words, the magnetic attraction portion is an opening 212 formed on the inner support 2; or the magnetic attraction portion is a first thinning groove 213 formed on the inner support 2 (e.g., Figures 2 to 4 (as shown); or, the demagnetizing part is formed by an opening 212 on the internal support 2, and a first thinning groove 213 is also provided (for example, Figure 5 (As shown).

[0067] The mask support 100 of this embodiment of the invention, by setting the demagnetizing part as the opening 212 and / or the first thinning groove 213 on the internal support body 2, can reduce the magnetic attraction force in the area where the opening 212 and / or the first thinning groove 213 are set, so that the wrinkles in this area can smoothly extend to the edge, avoiding the problem of wrinkle accumulation in this area. Therefore, the mask support 100 of this embodiment of the invention further improves the uniformity of organic material deposition on the substrate.

[0068] Figure 5As shown, when an opening 212 and a first thinning groove 213 are provided in the area corresponding to the blocking part 211 on the transverse support bar 21, the magnetic attraction force of the magnetic element with the magnetic field is weakened by the design of the opening 212 on the transverse support bar 21. At the same time, without excessively weakening the mechanical support force of this part, the first thinning groove 213 can be further provided to further weaken the magnetic attraction force of the magnetic element with the magnetic field. The combination of the two further weakens the magnetic attraction force while ensuring the overall mechanical support force. This allows the wrinkles in the magnetic attraction area to extend smoothly to the edge, avoiding wrinkle accumulation, thereby avoiding the problem of wrinkles or accumulation in the internal support body 2.

[0069] Optionally, the first thinning groove 213 can be either a direct reduction of this portion or a hollowed-out area. The shape of the opening 212 can be rectangular, triangular, or circular. Preferably, the opening 212 is circular to avoid wrinkles at the corners corresponding to the opening 212. The first thinning groove 213 can be a blind hole structure, or it can be a hollowed-out structure.

[0070] For example, Figures 2 to 4 As shown, the internal support 2 has an opening 212 and a first thinning groove 213 on the side wall of the opening 212. The opening 212 and the first thinning groove 213 form a magnetic attraction part.

[0071] The mask support frame 100 of this embodiment can reduce the magnetic attraction force at the location by both the demagnetizing part and the first thinning groove 213. In this way, the wrinkles in the opening 212 area can smoothly extend to the edge, avoiding the accumulation of wrinkles, thereby avoiding the problem of wrinkles in the internal support 2. Compared with the setting area of ​​the opening 212, the magnetic attraction force per unit area in the edge area is greater than the magnetic attraction force per unit area in the setting area of ​​the opening 212.

[0072] Furthermore, because the opening 212 is too large, it would reduce the load-bearing capacity of the internal support 2. The first thinning groove 213 can improve the load-bearing capacity at this point to a certain extent, thus mitigating the problem of insufficient load-bearing capacity caused by the excessive size of the opening 212. In this way, the load-bearing capacity of the internal support 2 is ensured while avoiding the problem of wrinkle accumulation.

[0073] like Figure 5 As shown, the first thinning groove 213 is filled with a first magnetic isolation layer.

[0074] The mask support frame 100 of this embodiment of the invention, by filling the first thinning groove 213 with a first magnetic isolation layer, ensures that the first magnetic isolation layer fills the entire first thinning groove 213, thereby ensuring that the exposed surface of the first magnetic isolation layer can be located on the same plane as the opening 212 setting area.

[0075] Optionally, the first magnetic isolation layer is made of a material that cannot be attracted by a magnet, and can be made of a material with a low coefficient of friction. For example, it can be made of polytetrafluoroethylene (PTFE), which not only provides magnetic shielding but also has stable properties, a low coefficient of thermal expansion, and good heat resistance. Moreover, setting the first magnetic isolation layer to have a lower coefficient of friction can reduce the friction between it and the substrate to be vapor-deposited, thereby further assisting the wrinkles to extend towards the edges.

[0076] Furthermore, the first magnetic isolation layer is disposed in a closed groove structure on the peripheral wall of the opening 212.

[0077] The thickness of the internal support 2 is 88um-122um, the depth of the first thinning groove 213 is 0.42-0.62 times the thickness of the internal support 2, and the first magnetic isolation layer is filled in the first thinning groove 213.

[0078] The mask support frame 100 of this embodiment of the invention, by limiting the relationship between the depth of the first thinning groove 213 and the thickness of the internal support 2, avoids the first thinning groove 213 being too deep, which would significantly weaken the overall rigidity and structural strength of the support strip. Moreover, after filling the first magnetic isolation layer, the internal support 2 at this point will not be able to fit with the display screen to be manufactured, resulting in a gap between the two. Consequently, during the vapor deposition process, the wrinkles will generate vapor deposition shadows in the corresponding areas of the substrate to be vapor deposited, causing color mixing.

[0079] On the other hand, it avoids the problem that if the depth of the first thinning groove 213 is too small, the magnetic shielding effect at this point will be small and wrinkles will easily accumulate, thus failing to prevent wrinkles from appearing in the internal support 2.

[0080] Therefore, the mask support frame 100 of the present invention combines the advantages of high vapor deposition accuracy by setting the first thinning groove 213 to a suitable depth range.

[0081] Optionally, the depth of the first thinning groove 213 is 0.42 times, 0.43 times, 0.44 times, 0.45 times, 0.48 times, 0.50 times, 0.52 times, 0.53 times, 0.54 times, 0.55 times, 0.56 times, 0.57 times, 0.58 times, 0.59 times, 0.60 times, 0.61 times, or 0.62 times the thickness of the internal support 2.

[0082] The cross-section of the opening 212 is 0.8 to 1.2 times the area of ​​the shielding part 211.

[0083] The mask support frame 100 of this embodiment of the invention limits the ratio of the cross-section of the opening 212 to the area of ​​the blocking portion 211. On the one hand, it avoids the problem that if the opening 212 is too large, the mechanical strength of the opening 212 area will be low, making it easy to deform and unable to effectively support the mask, resulting in inaccurate pattern transfer. On the other hand, it avoids the problem that if the opening 212 is too small, the wrinkles that appear in the area forming the opening cannot smoothly extend to the edge, avoiding the accumulation of wrinkles. This avoids the problem of mask wrinkles and ensures that each pixel can be accurately aligned with the target position.

[0084] Therefore, the mask support frame 100 of the present invention combines the advantages of good portability, high vapor deposition accuracy and high structural strength by reasonably setting the ratio between the cross-section of the opening 212 and the area of ​​the shielding part 211.

[0085] Optionally, the cross-section of the opening 212 is 0.8, 0.9, 1.0, 1.1, and 1.2 times the area of ​​the shielding portion 211.

[0086] Furthermore, the distance between the opening 212 and the edge of the internal support 2 is 2mm-3mm.

[0087] The mask support frame 100 of this embodiment of the invention avoids excessively low edge width by adjusting the distance between the opening 212 and the edge of the internal support body 2. If the opening 212 is too close to the edge of the support strip, it will significantly weaken the edge strength of the support strip, making it more prone to bending or deformation and easily forming wrinkles in the edge area. It also increases the risk of cracking because the opening 212 near the edge is prone to becoming a stress concentration point. During frequent loading and unloading or long-term use, these areas are more likely to develop fatigue cracks, ultimately leading to support strip failure, affecting production continuity and product quality. Furthermore, stress concentration in the edge area may cause local deformation, thereby affecting the flatness of the mask and the accuracy of pattern transfer.

[0088] On the other hand, if the opening 212 is too far from the edge of the support strip, the weight reduction effect brought by the opening 212 cannot be fully utilized, and the overall weight remains high, which is not conducive to handling and operation, and also increases the load on the equipment. If the opening 212 is too far away, it may not be able to effectively distribute stress, thus failing to completely avoid wrinkling and accumulation problems, affecting the flatness of the mask and the accuracy of pattern transfer.

[0089] Therefore, the mask support frame 100 of the present invention combines the advantages of high vapor deposition accuracy and high structural strength by reasonably setting the distance between the opening 212 and the support strip where it is located.

[0090] Optionally, positioning protrusions may be provided on the masking part to position the mask plate.

[0091] In the actual production process, the distance between the edge of the opening 212 and the edge of the support strip should be kept within a reasonable range. For example, the distance between the edge of the opening 212 and the edge of the transverse support strip 21 should be at least 3 to 6 times the thickness of the transverse support strip 21.

[0092] Optionally, the distance between the opening 212 and the edge of the inner support 2 is 2.1mm, 2.1mm, 2.2mm, 2.3mm, 2.4mm, 2.5mm, 2.6mm, 2.7mm, 2.8mm, 2.9mm, 3.0mm, 3.1mm, 3.2mm, 3.3mm, 3.4mm, 3.5mm, 3.6mm, 3.7mm, 3.8mm, 3.9mm, and 4.0mm.

[0093] like Figure 6 As shown, the edge of the shielding part 211 is provided with a second thinning groove on the side facing the display screen, and a second magnetic isolation layer 2111 is provided in the second thinning groove.

[0094] The mask support frame 100 of this invention has a second thinning groove on the side facing the display screen provided by the edge of the shielding part 211. The second thinning groove is provided with a second magnetic isolation layer 2111. When the shielding part 211 is attached to the substrate, the area of ​​the shielding part 211 has a relatively large magnetic force. The provided second magnetic isolation layer 2111 is sufficient to isolate the magnetic elements that generate the magnetic field, avoiding the accumulation of wrinkles. This avoids the problem of mask wrinkles, thereby ensuring that each pixel can be accurately aligned with the target position. Without wrinkles and accumulation, organic materials can be deposited more uniformly on the substrate to form a clear and defect-free sub-pixel structure.

[0095] The depth of the second thinning groove increases from the inside to the outside, and the thickness of the second magnetic isolation layer 2111 increases from the inside to the outside. The thickness of the second magnetic isolation layer 2111 is greater than or equal to the depth of the second thinning groove. A plane is formed from the area where the second thinning groove is set to the edge of the shielding part 211 to achieve a flat and smooth fit of the vapor-deposited substrate and avoid gap problems.

[0096] The mask support frame 100 of this embodiment of the invention reduces the magnetic adsorption force by providing a second thinning groove that increases in the direction from the inside to the outside and providing a second magnetic isolation layer 2111 in the second thinning groove. This allows the wrinkles that appear on the masking part 211 to extend smoothly to the edge, avoiding wrinkle accumulation and thus preventing wrinkles from appearing in the internal support body 2.

[0097] The frame body 1 is a rectangular frame body 1. The rectangular frame design is conducive to dividing the frame body 1 to realize multiple effective placement openings 3.

[0098] Furthermore, the dimensions of frame 1 need to match the dimensions of these photomasks, which are available in sizes such as 6 inches, 9 inches, and 12 inches. The thickness of frame 1 is generally between a few millimeters and a dozen millimeters, depending on the materials and design requirements. The internal support 2 is made of a paramagnetic metal or alloy.

[0099] Meanwhile, precise positioning holes or marks can be provided on the frame body 1 to cooperate with the corresponding structure on the photolithography equipment to achieve precise alignment at the micron or even nanometer level.

[0100] The mask assembly of this invention includes a mask plate and a mask support frame 100 according to any one of the above. The mask plate rests on the internal support 2 and / or the frame 1, and the mask plate is correspondingly disposed with the placement opening 3. The mask plate is provided with a plurality of evaporation holes, so that during evaporation, the material evaporated by the evaporation source passes through the plurality of evaporation holes on the mask plate and is deposited on the substrate to be evaporated.

[0101] Therefore, the mask assembly of the present invention has the advantage of improving the pattern accuracy and clarity of the display screen obtained by vapor deposition.

[0102] The mask includes a mask body and a third magnetic isolation layer. The mask is made of a metal material that can be attracted by a magnet, and the third magnetic isolation layer is made of a material that cannot be attracted by a magnet. The mask body has multiple evaporation holes to form an evaporation zone. A third thinning groove is provided between the edge of the evaporation zone and the area where the evaporation holes are located. The third magnetic isolation layer is located between the edge of the mask body and the area where the placement port 3 is located, and is at least partially filled in the third thinning groove.

[0103] The mask support 100 of this embodiment of the invention, by providing a third thinning groove at the edge of the mask plate body and filling the third thinning groove with a third magnetic isolation layer, allows the wrinkles in the opening 212 area to smoothly extend towards the edge, avoiding wrinkle accumulation and thus avoiding the problem of mask plate wrinkles. This ensures that each pixel can be accurately aligned with the target position, and without wrinkles and accumulation, organic material can be deposited more uniformly on the substrate, forming a clear, defect-free sub-pixel structure. Therefore, the mask support 100 of this embodiment of the invention further improves pattern accuracy and clarity.

[0104] The vapor deposition method of this invention includes the following steps:

[0105] A mask is provided and its surface is attached to the substrate to be vapor-deposited. A magnetic field is applied so that the mask support frame 100 and the mask are attached to the substrate to be vapor-deposited under the action of the magnetic field.

[0106] An evaporation source is provided, and the material evaporated by the evaporation source passes through multiple evaporation holes on a mask plate and is deposited on the substrate to be evaporated.

[0107] Therefore, the display screen made from the substrate to be vapor-deposited by the vapor deposition method of the present invention has the advantages of improving pattern accuracy and clarity.

[0108] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications or equivalent substitutions made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

[0109] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0110] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0111] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0112] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0113] In this invention, the terms "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0114] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A mask support frame, characterized in that, A mask plate used to support the substrate to be deposited during the preparation of the mask; the mask support frame includes: The system comprises a frame and an internal support, each made of a metal material that can be attracted by a magnet. The internal support is disposed within the frame and forms multiple placement openings with the frame for placing a mask. The shape and size of the placement openings are matched to the shape and size of the mask. The orthographic projection of the placement openings can cover the pixel setting area of ​​the substrate to be vapor-deposited. A portion of the internal support has multiple shielding portions protruding into the placement openings. The multiple shielding portions are correspondingly disposed with the multiple placement openings, and the orthographic projection of each shielding portion can cover the component in the substrate to be vapor-deposited that needs to be shielded. The internal support with the shielding portions is provided with multiple anti-magnetic attraction portions.

2. The mask support frame according to claim 1, characterized in that, The internal support includes horizontal support bars and vertical support bars, which are arranged in a crisscross pattern within the frame to form a plurality of placement openings. Each of the demagnetizing suction part and the shielding part is provided on the horizontal support bar or the vertical support bar. Alternatively, the internal support body may have multiple matrix-arranged placement openings, and horizontal and vertical support bars may be formed on the internal support body, with each of the demagnetizing suction part and the shielding part disposed on the horizontal or vertical support bar.

3. The mask support frame according to claim 2, characterized in that, Each of the placement openings is provided with a shielding part; And / or, the width of the transverse support strip is 8mm-15mm.

4. The mask support frame according to claim 1, characterized in that, The demagnetizing suction part is an opening and / or a first thinning groove formed on the internal support; And / or, the demagnetizing part and the blocking part are arranged opposite each other in the direction in which the blocking part protrudes from the internal support.

5. The mask support frame according to claim 4, characterized in that, The internal support shown has the opening, and the first thinning groove on the side wall of the opening forms the demagnetizing part.

6. The mask support frame according to claim 5, characterized in that, The thickness of the internal support is 88um-122um, and the depth of the first thinning groove is 0.42-0.62 times the thickness of the internal support. And / or, the first thinning groove is filled with a first magnetic isolation layer; And / or, the cross-section of the opening is 0.8 to 1.2 times the area of ​​the shielding portion; And / or, the minimum distance between the opening and the edge of the internal support is 2mm-3mm.

7. The mask support frame according to any one of claims 1-6, characterized in that, The edge of the shielding portion is provided with a second thinning groove on the side facing the substrate to be vaporized, and a second magnetic isolation layer is provided in the second thinning groove.

8. The mask support frame according to claim 7, characterized in that, The depth of the second thinning groove increases from the inside to the outside, the thickness of the second magnetic isolation layer increases from the inside to the outside, the thickness of the second magnetic isolation layer is greater than or equal to the depth of the second thinning groove, and the portion from the area where the second thinning groove is disposed to one of the edges is formed as a plane.

9. A mask assembly, characterized in that, It includes a mask plate and a mask support frame according to any one of claims 1-8, wherein the mask plate rests on the internal support body and / or the frame body, and the mask plate is disposed corresponding to the placement opening.

10. The mask assembly according to claim 9, characterized in that, The mask plate includes a mask plate body and a third magnetic isolation layer. The mask plate is made of a metal material that can be attracted by a magnet, and the third magnetic isolation layer is made of a material that cannot be attracted by a magnet. The mask plate body is provided with a plurality of evaporation holes to form an evaporation zone. A third thinning groove is provided between the edge of the evaporation zone and the area where the evaporation holes are located. The third magnetic isolation layer is located between the edge of the mask plate body and the area where the placement port is located, and at least partially fills the third thinning groove.

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