A shutter opening and closing mechanism of a large-diameter sputtering cathode and a vacuum coating device

Abstract

The application discloses a shutter opening and closing mechanism of a large-diameter sputtering cathode and a vacuum coating device. The shutter opening and closing mechanism comprises a cathode, one end of the cathode is connected with a driving assembly, and the other end of the cathode is connected with a rotating assembly. The driving assembly comprises inner and outer magnetic wheels which are movably sleeved, a plurality of electromagnets are mounted on the outer periphery of the inner magnetic wheel, at least one permanent magnet is mounted on the inner ring of the outer magnetic wheel, the plurality of electromagnets are sequentially and alternately electrified and magnetized to form a magnetic coupling effect with the outer magnetic wheel, so as to drive the outer magnetic wheel to rotate. The rotating assembly comprises a fixed frame, a limiting plate and a rotating rod which is movably connected between the fixed frame and the limiting plate. The limiting plate is movably sleeved on the outer periphery of the outer magnetic wheel and rotates with the outer magnetic wheel, so that the sputtering shutter rotates through the rotating rod to realize opening and closing movement. The application utilizes the inner magnetic wheel to generate an alternating electromagnetic field to drive the outer magnetic wheel to rotate, so as to drive the sputtering shutter to rotate to realize opening and closing. Non-contact magnetic transmission is realized, vacuum leakage is reduced, and the shielding consistency of the shutter to the target surface is improved.

Description

Technical Field

[0001] This invention relates to the field of magnetron sputtering technology, and in particular to a baffle opening and closing mechanism for a large-diameter sputtering cathode and a vacuum coating apparatus. Background Technology

[0002] In the field of magnetron sputtering coating technology, vacuum magnetron sputtering coating equipment includes a vacuum chamber, sputtering cathode, target material, substrate stage, vacuum pumping system, sputtering baffle, etc. The sputtering cathode (referred to as the cathode) is installed on the inner wall of the vacuum chamber, and the target material is fixed on the cathode. The sputtering baffle (also called the target baffle, cathode baffle, or baffle) is placed inside the vacuum chamber, between the sputtering surface of the sputtering cathode target and the substrate to be coated. It is used to prevent contaminants on the target surface or particles from initial sputtering unevenness from depositing onto the substrate, achieving pre-sputtering isolation. It also prevents cross-contamination from multiple cathodes and protects the vacuum chamber. Therefore, the reliable opening and closing of the sputtering baffle is crucial to ensuring coating quality and reducing target contamination.

[0003] For 8-inch and 12-inch large-diameter cathodes, due to the large target diameter and wide sputtering area, the corresponding sputtering baffle is also large, and the protection requirements for its opening and closing are higher.

[0004] Currently, sputtering baffles used in large-diameter magnetron sputtering coating equipment are mainly divided into two structural forms: fixed split type and external cylinder-driven flip type. The fixed split type baffle typically consists of multiple independent baffle components fixed to the periphery of the target or the inner wall of the vacuum chamber by screws or other means. Because the baffle position is fixed, it cannot be dynamically opened and closed during the coating process, resulting in poor process adaptability. Furthermore, during long-term sputtering, this type of fixed split baffle is prone to thermal deformation due to high-temperature heating. For large-diameter cathodes, the baffle span is large, and the cumulative thermal expansion is more significant. Deformation can easily lead to the baffle being too close to the target or cathode, potentially causing serious safety accidents such as arcing or short circuits.

[0005] Externally driven cylinder-driven tilting baffles use external driving components such as cylinders to transmit power to the baffles inside the vacuum chamber via a vacuum dynamic seal structure, enabling the baffles to tilt and open. However, the cylinders and their associated transmission mechanisms are located on the outside of the vacuum chamber, requiring significant external space. Furthermore, power transmission relies on a dynamic seal structure (such as a magnetohydrodynamic seal or sealing ring) that penetrates the vacuum chamber; this dynamic seal is susceptible to failure during long-term reciprocating motion, posing a risk of vacuum leakage. Finally, for large-diameter cathode baffles, using multiple sets of cylinders for separate driving can easily lead to asynchronous opening and closing actions between the baffles, affecting the consistency of the baffles' shielding of the target surface. Summary of the Invention

[0006] To address the aforementioned technical problems, this invention aims to provide a baffle opening and closing mechanism for a large-diameter sputtering cathode and a vacuum coating device, which enables the opening and closing operation of a large-diameter sputtering baffle without arranging an external drive mechanism and a vacuum dynamic sealing structure.

[0007] The technical solution of the present invention is as follows: A baffle opening and closing mechanism for a large-diameter sputtering cathode includes a cathode and a sputtering baffle. One end of the cathode is connected to a driving component and the other end is connected to a rotating component. The driving component includes a movable inner magnetic wheel and an outer magnetic wheel. Several electromagnets are installed on the outer periphery of the inner magnetic wheel, and at least one permanent magnet is installed on the inner ring of the outer magnetic wheel. The several electromagnets are sequentially and alternately energized to form a magnetic coupling with the outer magnetic wheel, thereby driving the outer magnetic wheel to rotate. The rotating assembly includes a fixed frame and a limiting plate arranged opposite to each other. A rotating rod is movably connected between the fixed frame and the limiting plate. One end of the rotating rod is slidably connected to the limiting plate, and the other end moves through the fixed frame and is fixedly connected to the sputtering baffle. The limiting plate is fixedly sleeved on the outer circumference of the outer magnetic wheel and rotates with the outer magnetic wheel, thereby causing the sputtering baffle to rotate through the rotating rod to perform opening and closing movements.

[0008] In a further embodiment, M electromagnets are fixedly mounted at equal intervals along the circumference of the inner magnetic wheel; N permanent magnets are equally spaced along the circumference of the inner sidewall of the outer magnetic wheel, where M is an integer multiple of N, i.e., M=K. N; The M electromagnets are divided into K groups in circumferential order. Each group contains N electromagnets, and the distribution of the N electromagnets in each group in the circumferential direction corresponds one-to-one with the N permanent magnets. The angle between two adjacent electromagnets in the same group in the circumferential direction is 360° / N.

[0009] In a further embodiment, the K groups of electromagnets are sequentially energized, and all electromagnets maintain the same magnetic polarity facing the permanent magnet when energized.

[0010] In a further proposed scheme, the energization of adjacent groups of electromagnets overlaps during this overlap period. During this overlap period, the excitation current of the previous group of electromagnets is gradually reduced to 0, while the excitation current of the next group of electromagnets is gradually increased to the rated value. This causes the position of the maximum attraction force of the combined magnetic field to shift circumferentially to the next group of electromagnets, thereby ensuring that the permanent magnet on the outer magnetic wheel always follows the position of the maximum attraction force and rotates synchronously under the action of magnetic attraction.

[0011] In a further embodiment, the cathode is housed within a space enclosed by a fixing frame, a limiting plate, and a rotating rod, with one end of the cathode fixedly connected to the end of the inner magnetic wheel and the other end fixedly connected to the fixing frame.

[0012] In a further embodiment, a sliding cover plate is fixedly sleeved on the outer periphery of the inner magnetic wheel, and at least one sliding post is fixedly provided on the side of the sliding cover plate near the limiting plate, and the sliding post is slidably connected to the limiting plate.

[0013] Preferably, the limiting plate is provided with a guide arc groove for accommodating the sliding column. When the limiting plate rotates, the guide arc groove moves relative to the sliding column and constrains the rotation range of the limiting plate.

[0014] In a further embodiment, the limiting plate is provided with an eccentric arc-shaped groove for accommodating the rotating rod. One end of the rotating rod is movably inserted into the eccentric arc-shaped groove and is axially limited by an axial limiting component. The other end of the rotating rod is rotatably connected to a bearing fixed on a fixed frame, and the rotating rod located at the outer end of the bearing is fixedly connected to the sputtering baffle. When the limiting plate rotates, the eccentric arc-shaped groove moves relative to the rotating rod, and the rotating rod, driven by the eccentric arc-shaped groove, rotates together with the sputtering baffle within a certain range.

[0015] In a further embodiment, the sputtering baffle is composed of six petal-shaped blocks, each of which can completely block the sputtering area of ​​the cathode when closed; the number of rotating rods is the same as that of the blocks and they are connected one-to-one, thereby driving each block to rotate to achieve the open and closed states.

[0016] In a further embodiment, the cathode is also connected to a support assembly for adjusting its sputtering angle; The support assembly includes a connecting flange connected to the cathode and a fixed support base. The connecting flange is connected to a rotating support base. One end of the rotating support base is rotatably connected to the fixed support base, and the other end is telescopically connected to the fixed support base through an adjustment mechanism, so as to adjust the sputtering angle of the cathode vertically.

[0017] In a further embodiment, the adjustment mechanism includes an adjustment shaft 1 movably mounted on a rotating support and an adjustment shaft 2 movably mounted on a fixed support. Screw 1 and Screw 2 are respectively fixedly connected to the middle portions of opposite sides of the adjustment shaft 1 and adjustment shaft 2. The threaded sections of screw 1 and screw 2 are threadedly connected to an adjustment nut. The distance between the adjustment shaft 1 and adjustment shaft 2 is adjusted by rotating the adjustment nut, allowing the rotating support to adjust the angle of the cathode.

[0018] To prevent the adjusting nut from rotating during operation, the adjusting nut is connected to the rotating support via a fixing block, which limits the rotation of the adjusting nut.

[0019] The second objective of this application is to provide a vacuum coating apparatus, including a vacuum chamber, in which the aforementioned baffle opening and closing mechanism is installed. The top of the connecting flange is connected to one end of a connecting pipe via a bellows, and the other end of the connecting pipe is fixedly connected to a CF flange. The CF flange is installed on the vacuum chamber for sealing the vacuum chamber, and a power supply device is connected to the CF flange located outside the vacuum chamber.

[0020] This application utilizes an inner magnetic wheel to generate an alternating electromagnetic field to drive an outer magnetic wheel to rotate, thereby rotating the sputtering baffle to achieve its opening and closing states. This enables the opening and closing motion of the sputtering baffle to achieve contactless magnetic transmission, and eliminates the need for external drive components and vacuum dynamic sealing structures. This solves the problems of easy wear and leakage of seals, transmission jamming, and high failure rate of traditional external cylinder-driven tilting baffles.

[0021] Meanwhile, in this application, all drive components are built into the true cavity, occupying very little space, effectively avoiding interference from multi-cathode arrangement structures, and greatly improving the utilization rate of cavity space and the stability of equipment vacuum operation.

[0022] This application features guide arc-shaped grooves on the limiting plate for the movement of the sliding column. These grooves mechanically limit the rotation range of the limiting plate, precisely controlling the movement trajectory of the sputtering baffle or individual blocks to achieve a fully open or fully closed state. Simultaneously, the limiting plate also features an eccentric arc-shaped groove to accommodate the rotating rod. When the limiting plate rotates, the rotating rod remains within the eccentric arc-shaped groove, which provides a driving force for rotation, allowing the rod to rotate within a certain angle, limited by the guide arc-shaped grooves. For example, a 60-degree reciprocating oscillation can be achieved, thus rotating the sputtering baffle to open and close.

[0023] In this application, the sputtering baffle is designed as six petal-shaped baffles of the same shape and size, which can accommodate the pre-sputtering isolation of large-diameter cathodes and reduce sparking or short-circuit accidents caused by thermal deformation. Furthermore, one end of each baffle is fixedly connected to the top of a rotating rod, so that when the rotating rod rotates, it synchronously rotates the baffle. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the structure of the present invention; Figure 2 This is a schematic diagram of the assembly of the driving component and the limiting plate in this invention; Figure 3 This is a schematic diagram of the electromagnet mounted on the inner magnetic wheel in this invention; Figure 4 This is a schematic diagram of the rotating component in this invention; Figure 5 This is a schematic diagram of the supporting component in this invention; Figure 6 This is a schematic diagram of the baffle closing in this invention; Figure 7 This is a schematic diagram of the baffle opening in this invention; Figure 8 This is a schematic diagram of the rotation of the outer magnetic wheel of the driving component in this invention.

[0025] In the picture: Drive assembly 1, electromagnet 11, inner magnetic wheel 12, permanent magnet 13, outer magnetic wheel 14, sliding cover plate 17, sliding column 18; Rotating component 2, stop block 21, bearing with seat 22, fixed frame 23, rotating rod 24, limiting plate 25, guide arc groove 26, eccentric arc groove 27; Support assembly 3, adjusting shaft 1 301, screw 1 302, fixing block 303, adjusting nut 304, screw 2 305, adjusting shaft 2 306, connecting pipe 307, connecting flange 308, rotating support seat 309, fixed support seat 310, bellows 311; CF flange 4, water-cooled power feeder 5, cathode 6. Detailed Implementation

[0026] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0027] Existing vacuum magnetron sputtering coating equipment includes a vacuum chamber, sputtering cathode, target material, substrate stage, vacuum pumping system, sputtering baffle, etc. This application only improves the sputtering baffle and its opening and closing performance. This application does not involve improvements to the structure or connection relationship of other components, and therefore will not describe them in detail in this application. The vacuum chamber, sputtering cathode, target material, substrate stage, vacuum pumping system, etc., can all be directly adopted from existing vacuum magnetron sputtering coating equipment.

[0028] Example 1: See Figure 1-8 This embodiment provides a baffle opening and closing mechanism for a large-diameter sputtering cathode, including a cathode 6 and a sputtering baffle. One end of the cathode 6 is connected to a driving component 1 and the other end is connected to a rotating component 2. The driving component 1 includes an inner magnetic wheel 12 and an outer magnetic wheel 14 that are movably sleeved. A plurality of electromagnets 11 are installed on the outer periphery of the inner magnetic wheel 12, and at least one permanent magnet 13 is installed on the inner ring of the outer magnetic wheel 14. The plurality of electromagnets 11 are sequentially and alternately energized to form a magnetic coupling with the outer magnetic wheel 14, thereby driving the outer magnetic wheel 14 to rotate. The rotating assembly 2 includes a fixed frame 23 and a limiting plate 25 arranged opposite to each other. A rotating rod 24 is movably connected between the fixed frame 23 and the limiting plate 25. One end of the rotating rod 24 is slidably connected to the limiting plate 25, and the other end moves through the fixed frame 23 and is fixedly connected to the sputtering baffle. The limiting plate 25 is fixedly sleeved on the outer periphery of the outer magnetic wheel 14 and rotates together with the outer magnetic wheel 14, thereby opening and closing the sputtering baffle by rotating the rotating rod 24.

[0029] In this embodiment, the cathode is mounted on the inner wall of the vacuum chamber and a sputtering target is fixed thereon.

[0030] This application utilizes an inner magnetic wheel to generate an alternating electromagnetic field to drive an outer magnetic wheel to rotate, thereby rotating a sputtering baffle to achieve an open and closed state. This enables the opening and closing motion of the sputtering baffle to achieve contactless magnetic transmission, eliminating the need for external drive components and vacuum dynamic sealing structures. This solves the problems of easy wear and leakage of seals, transmission jamming, and high failure rate of traditional external cylinder-driven tilting baffles.

[0031] Meanwhile, in this application, all drive components are built into the true cavity, occupying very little space, effectively avoiding interference from multi-cathode arrangement structures, and greatly improving the utilization rate of cavity space and the stability of equipment vacuum operation.

[0032] This application relies on the magnetic driving force of inner and outer magnetic wheels to realize the autonomous opening and closing of multiple blocks, achieving automatic switching inside the vacuum chamber. It can stably complete pre-sputtering isolation, prevent cathode cross-contamination, etc., and significantly improve the yield of the coating process.

[0033] When the sputtering baffle is opened, it allows the cathode 6 to be opened for sputtering of the substrate. When the sputtering baffle is closed, it provides shielding to prevent contaminants on the target surface or particles from uneven initial sputtering from being deposited on the substrate. It also prevents cross-contamination from multiple cathodes and protects the vacuum chamber.

[0034] like Figure 4 As shown, one end of the rotating rod 24 has a shoulder and an external thread. The threaded section passes through the limiting plate 25 and connects to the first nut, thus the limiting plate 25 is clamped between the shoulder and the first nut for vertical positioning. The other end of the rotating rod 24 passes through the seated bearing 22 fixed to the outside of the fixing frame 23 and is fixedly connected to the baffle 21, which can be locked with the second nut. The rotating rod 24 achieves rolling support through the seated bearing 22, enabling rotation, and thus allowing the baffle 21 to rotate synchronously.

[0035] like Figure 2 , 3 As shown, M electromagnets 11 are fixedly arranged at equal intervals along the circumference of the inner magnetic wheel 12; N permanent magnets 13 are arranged at equal intervals along the circumference on the inner sidewall of the outer magnetic wheel 14, where M is an integer multiple of N, i.e., M=K. N; The M electromagnets 11 are divided into K groups in circumferential order. Each group contains N electromagnets, and the distribution positions of the N electromagnets in each group in the circumferential direction correspond one-to-one with the N permanent magnets. The angle between two adjacent electromagnets in the same group in the circumferential direction is 360° / N.

[0036] The specific implementation scheme is that the K groups of electromagnets 11 are energized sequentially, and all electromagnets maintain the same magnetic polarity towards the permanent magnet 13 when energized.

[0037] To improve the smoothness of rotation, the energization of adjacent groups of electromagnets 11 overlaps for a period of time. During this overlap, the excitation current of the previous group of electromagnets is gradually reduced to 0, and the excitation current of the next group of electromagnets is gradually increased to the rated value. This causes the position of the maximum attraction force of the combined magnetic field to shift circumferentially to the next group of electromagnets, so that the permanent magnet on the outer magnetic wheel 14 always follows the position of the maximum attraction force and rotates synchronously under the action of magnetic attraction force.

[0038] like Figure 1 , 4 As shown, the cathode 6 is housed within a space enclosed by the fixing frame 23, the limiting plate 25, and the rotating rod 24. One end of the cathode 6 is fixedly connected to the end of the inner magnetic wheel 12, and the other end is fixedly connected to the fixing frame 23. The rotating rod 24 is located on the outer periphery of the cathode 6 and rotates without interfering with it.

[0039] like Figure 2 As shown, a sliding cover plate 17 is fixedly sleeved on the outer periphery of the inner magnetic wheel 12. At least one sliding post 18 is fixedly provided on the side of the sliding cover plate 17 near the limiting plate 25. The sliding post 18 is slidably connected to the limiting plate 25.

[0040] In this embodiment, the optimal number of sliding pins 18 is two, and they are arranged symmetrically on the sliding cover plate 17.

[0041] Preferably, the limiting plate 25 is provided with a guide arc groove 26 for accommodating the sliding column 18. When the limiting plate 25 rotates, the guide arc groove 26 moves relative to the sliding column 18 and constrains the rotation range of the limiting plate.

[0042] The limiting plate 25 has an eccentric arc-shaped groove 27 for accommodating the rotating rod 24, that is, the center of the eccentric arc-shaped groove is not on the center of the bearing 22. One end of the rotating rod 24 is movably inserted into the eccentric arc-shaped groove 27 and is axially limited by an axial limiting member. The other end of the rotating rod 24 is rotatably connected to the bearing 22 fixed on the fixed frame 23, and the rotating rod located at the outer end of the bearing 22 is fixedly connected to the sputtering baffle. When the limiting plate 25 rotates, the eccentric arc-shaped groove 27 moves relative to the rotating rod 24, and the rotating rod 24 rotates together with the sputtering baffle within a certain range under the push of the eccentric arc-shaped groove 27.

[0043] The shape, length, and curvature of the guide arc groove 26 and the eccentric arc groove 27 can be designed according to the actual situation such as the rotation angle of the sputtering baffle.

[0044] The sliding column 18 passes through the guide arc groove 26 on the limiting plate 25 and moves relative to the guide arc groove 26. The two ends of the guide arc groove 26 mechanically limit the rotation range of the limiting plate 25, so as to accurately control the movement trajectory of the sputtering baffle or each block, so that it can achieve the perfect fully open or fully closed state.

[0045] Similarly, the rotating rod 24 passes through the eccentric arc groove 27. When the limiting plate 25 rotates, the rotating rod 24 is always located in the eccentric arc groove 27. Driven by the tangential component force of the groove wall of the eccentric arc groove 27, the rotating rod swings back and forth around the bearing 22 at a certain angle. The swing angle can be designed according to the rotation angle of the sputtering baffle. The dimensions of the eccentric arc groove 27, such as arc length, arc, and eccentricity, can be determined.

[0046] To accommodate large-diameter cathodes, the sputtering baffle is composed of six petal-shaped baffles 21. Each baffle can completely block the sputtering area of ​​the cathode 6 when closed. The number of rotating rods 24 is the same as that of the baffles 21 and they are connected one-to-one, thereby driving each baffle to rotate to achieve the open and closed states.

[0047] Then the rotating rod 24 should also be set to 6 rods, each of which drives a stop block 21 to rotate, so as to open and close.

[0048] This application utilizes the coordinated rotation of six rotating rods 24 to drive the synchronous rotation of six petal-shaped stops 21, achieving opening and closing. Compared to the traditional single-piece baffle flipping structure, this application adopts a multi-point synchronous linkage structure, resulting in high consistency in opening and closing and uniform stroke, which can adapt to the needs of large-diameter cathode operations. Furthermore, the sputtering baffle is composed of six stops, which can adapt to the pre-sputtering isolation of large-diameter cathodes and reduce sparking or short-circuit accidents caused by thermal deformation.

[0049] In one specific embodiment, 18 electromagnets 11 and 3 permanent magnets 13 are used as an example for illustration: Eighteen electromagnets are evenly spaced and fixed to the outer periphery of the inner magnetic wheel 12, with an angle of 20° between adjacent electromagnets. Three permanent magnets 13 are evenly spaced and fixed to the inner sidewall of the outer magnetic wheel, with an angle of 120° between adjacent permanent magnets.

[0050] Then press the 18 electromagnets together. Figure 8 As shown, they are divided into 6 groups in a counterclockwise direction, with 3 in each group. The 3 in the same group are also equally spaced, with an adjacent angle of 120°, and are arranged opposite to the 3 permanent magnets 13 that are equally spaced on the inner side wall of the outer magnetic wheel 14.

[0051] The 18 electromagnets are numbered as follows: #1, #7, and #13 form the first group; #2, #8, and #14 form the second group; #3, #9, and #15 form the third group; and so on.

[0052] When energized, the excitation polarity direction of each electromagnet should be kept constant (e.g., Figure 8 As shown, all electromagnets are arranged counterclockwise (SN poles). Each group of electromagnets is energized sequentially, and the permanent magnet 13 moves counterclockwise in a circular direction following each group of electromagnets due to magnetic attraction. That is, when the first group of electromagnets is energized, electromagnets #1, #7, and #13 attract three permanent magnets 13 to move closer to each other (e.g., ...). Figure 8 (a) As shown. When the second set of electromagnets is energized, electromagnets #2, #8, and #14 attract three permanent magnets 13 to approach each other (as shown in the image). Figure 8 (b) shows that the outer magnetic wheel 14 moves counterclockwise. When the third set of electromagnets is energized, electromagnets #3, #9, and #15 attract three permanent magnets 13 to move closer to each other (as shown in the image). Figure 8 As shown in (c), the outer magnetic wheel 14 continues to move counterclockwise. This continues, with the outer magnetic wheel 14 moving counterclockwise. Consequently, the outer magnetic wheel 14 rotates along with the limiting plate 25. At this time, the limiting plate 25 is connected to the fixed sliding column 18 via the guide arc groove 26 on it, thus limiting the rotation angle of the limiting plate 25.

[0053] When the limiting plate 25 rotates, its rotational force drives the rotating rod 24 to rotate within a certain angle. Specifically, the horizontal section of the rotating rod 24 rotates in the eccentric arc groove 27, and the vertical section rotates through the bearing 22, thereby causing the sputtering baffle fixed to the end of the rotating rod 24 to rotate together, thus realizing opening and closing. The rotating rod 24 is always in the eccentric arc groove 27, and the eccentric arc groove 27 moves relative to the rotating rod 24.

[0054] In this embodiment, to reduce space occupation and facilitate installation, the rotating rod 24 has an L-shaped structure. A connecting rod is vertically fixed to the end of its horizontal section. A shoulder is fixed on the connecting rod, and an external thread is provided at the end of the connecting rod. The threaded section passes through the eccentric arc-shaped groove 27 on the limiting plate 25 and connects to the first nut. The limiting plate 25 is then clamped between the shoulder and the first nut for vertical positioning. The vertical section of the rotating rod 24 passes through the seated bearing 22 fixed to the outside of the fixing frame 23 and is fixedly connected to the baffle 21, which can be locked with a second nut.

[0055] In another embodiment, when adjacent sets of electromagnets switch, the previous set of electromagnets remains energized while the next set begins to be energized. Subsequently, the current in the previous set of electromagnets is gradually reduced to zero, while the current in the next set is gradually increased to its rated value. This causes the position of maximum attraction of the combined magnetic field to shift circumferentially to the next set of electromagnets. During this process, the three permanent magnets always follow the position of maximum attraction under the action of magnetic attraction, thereby achieving smooth and synchronous rotation of the outer magnetic wheel and the limiting plate.

[0056] The following explanation uses the switching between the first and second groups of electromagnets as an example; the switching between other groups is exactly the same: Before the equipment is started, all electromagnets 11 are de-energized. Without external excitation interference, the three permanent magnets 13 on the outer magnetic wheel 14 generate a slight magnetic reluctance positioning force with the iron core of the inner magnetic wheel 12 by relying on their own residual magnetism, so that the limit plate 25 is stably kept in the initial preset position, such as the fully open position.

[0057] The first set of electromagnets (#1, #7, #13) are energized, causing the end facing the permanent magnet 13 to generate the S pole. The three permanent magnets 13 on the outer magnetic wheel 14 all have their N poles facing the inner magnetic wheel. According to the principle of opposite poles attracting, the three permanent magnets are firmly attracted to their corresponding positions, and the limiting plate 25 is stabilized at this position.

[0058] Without cutting off the current to the first set of electromagnets, an additional current in the same direction is applied to the second set of electromagnets (#2, #8, #14), causing them to generate an S pole at the end facing the permanent magnets. Under the influence of magnetic attraction, the outer magnetic wheel rotates towards the second set of electromagnets. At this point, the current to the second set of electromagnets is gradually increased while the current to the first set of electromagnets is simultaneously decreased, further causing the outer magnetic wheel to rotate towards the second set of electromagnets. When the current to the first set of electromagnets drops to 0 (the magnetic field disappears) and the current to the second set of electromagnets reaches its rated value, the three permanent magnets are stably attracted to the second set of electromagnets, corresponding to the positions of #2, #8, and #14. At this point, the outer magnetic wheel 14 has precisely rotated 20° relative to its initial position. This cycle repeats sequentially for the first set, the second set, and so on, completing the continuous rotation range of the outer magnetic wheel. The fully open stop is rotated to the closed state as follows: Figure 6 As shown.

[0059] Similarly, when the stop is in the closed position, reverse current flows through it, and it can be opened as follows: Figure 7 As shown.

[0060] Example 2: Similar to Embodiment 1, the difference is that it also includes a support component 3 for adjusting its sputtering angle; the support component 3 is connected to the cathode 6 to adjust the angle of the cathode so that the sputtering direction is accurate.

[0061] like Figure 5 As shown, the support assembly 3 includes a connecting flange 308 connected to the cathode 6 and a fixed support base 310. Specifically, the fixed support base 310 is fixedly installed on the inner wall of the vacuum chamber via a connecting rod. The connecting flange 308 is connected to a rotating support base 309. One end of the rotating support base 309 is rotatably connected to the fixed support base 310 via a pin, and the other end is telescopically connected to the fixed support base 310 via an adjustment mechanism. That is, the rotating support base 309 rotates within a certain range around the pin, thereby adjusting the sputtering angle of the cathode 6 vertically.

[0062] In another specific embodiment, the adjustment mechanism includes an adjustment shaft 301 movably mounted on a rotating support 309 and an adjustment shaft 306 movably mounted on a fixed support 310. Screws 302 and 305 are fixedly connected to the middle portions of opposite sides of the adjustment shafts 301 and 306, respectively. The threaded sections of both screws 302 and 305 are threadedly connected to an adjustment nut 304. The distance between the adjustment shafts 301 and 306 is adjusted by rotating the adjustment nut 304, allowing the rotating support 309 to adjust the angle of the cathode 6.

[0063] Screw 1 (302) and Screw 2 (305) have the same structure. Taking Screw 1 (302) as an example, one end of Screw 1 (302) is a smooth rod, which is fixedly connected to Adjusting Shaft 1 (301). The other end of Screw 1 (302) has an external thread, which meshes with the internal thread of Adjusting Nut 304. Screw 1 (302) and Adjusting Nut 304 form a lead screw pair. Rotating Adjusting Nut 304 will cause Adjusting Shaft 1 (301) to move closer to or away from Adjusting Shaft 2 (306).

[0064] To prevent the adjusting nut 304 from rotating during operation, after the angle adjustment is completed, the adjusting nut 304 is fixedly connected to the rotating support 309 via the fixing block 303. This limits the rotation of the adjusting nut 304, preventing it from rotating during operation and affecting the angle of the cathode 6. The fixing block 303 is a detachable structure, with a groove on its lower end face that matches the shape of the adjusting nut 304. When limiting the rotation, the groove is engaged above the adjusting nut 304, and then a long screw is used to fix both ends of the fixing block 303 to the rotating support 309.

[0065] Specifically, both ends of the adjusting shaft 301 are rotatably connected to the rotating support 309, and the middle threaded hole of the adjusting shaft 301 is threadedly connected to the screw 302; both ends of the adjusting shaft 306 are rotatably connected to the fixed support 310, and the middle threaded hole of the adjusting shaft 306 is threadedly connected to the screw 305; the other ends of both the screw 302 and the screw 305 are threadedly connected to the adjusting nut 304.

[0066] Screw 1 302 and screw 2 305 are located at both ends of the adjusting nut 304 and are threaded together through the same or different threaded holes of the adjusting nut 304. When screw 1 302 or screw 2 305 is rotated, the rotating support 309 is driven to rotate up and down around the pin, causing a change in the distance between adjusting shaft 1 301 and adjusting shaft 2 306. This causes the cathode 6, which is connected to the rotating support 309 via the connecting flange 308, to rotate up and down together, ultimately adjusting the sputtering angle of the cathode.

[0067] Example 3: A vacuum coating apparatus includes a vacuum chamber, in which the aforementioned baffle opening and closing mechanism is installed. The top of the connecting flange 308 is connected to one end of the connecting pipe 307 via a bellows 311. The other end of the connecting pipe 307 is fixedly connected to a CF flange 4. The CF flange 4 is installed on the vacuum chamber for sealing the vacuum chamber. A power supply device 5 is connected to the CF flange 4 located outside the vacuum chamber.

[0068] Among them, the power supply device 5 is a known device in the art, and its purpose is to safely and efficiently transmit the power from outside the vacuum chamber to the internal cathode electromagnet and cathode. It generally includes a connector located outside the vacuum chamber, and a conductor that passes through the CF flange 4 and is responsible for vacuum sealing and power transmission.

[0069] In addition, the power supply device 5 can also integrate water-cooling pipes to forcibly cool the cathode 6 and the target material through circulating cooling water, removing the enormous heat generated during the sputtering process and ensuring stable equipment operation. Because the bombardment of the target material by high-energy particles generates a large amount of heat, if it is not removed in time, it can lead to overheating, deformation, or even damage of the target material.

[0070] The CF flange 4 is also a known device in this field. It is a standard metal sealing flange used in ultra-high vacuum environments. It features a metal CF sealing knife-edge structure for connection to a vacuum chamber. The CF sealing knife-edge structure indicates a sealing interface standard specifically designed for ultra-high vacuum systems, commonly found in high-vacuum and ultra-high-vacuum piping connections. A metal oxygen-free copper gasket is used for compression sealing between the two interfaces. This provides excellent sealing performance and can withstand high-temperature baking, and is now widely used in thin-film deposition equipment.

[0071] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of protection of the claims.

Claims

1. A baffle opening and closing mechanism for a large-diameter sputtering cathode, comprising a cathode (6) and a sputtering baffle, characterized in that: One end of the cathode (6) is connected to a drive assembly (1), and the other end is connected to a rotating assembly (2). The drive assembly (1) includes an inner magnetic wheel (12) and an outer magnetic wheel (14) that are movably sleeved. Several electromagnets (11) are installed on the outer periphery of the inner magnetic wheel (12), and at least one permanent magnet (13) is installed on the inner ring of the outer magnetic wheel (14). Several electromagnets (11) are sequentially and alternately energized to form a magnetic coupling with the outer magnetic wheel (14), thereby driving the outer magnetic wheel (14) to rotate. The rotating assembly (2) includes a fixed frame (23) and a limiting plate (25) arranged opposite to each other. A rotating rod (24) is movably connected between the fixed frame (23) and the limiting plate (25). One end of the rotating rod (24) is slidably connected to the limiting plate (25), and the other end moves through the fixed frame (23) and is fixedly connected to the sputtering baffle. The limiting plate (25) is fixedly sleeved on the outer periphery of the outer magnetic wheel (14) and rotates with the outer magnetic wheel (14), thereby rotating the sputtering baffle to perform opening and closing movements through the rotating rod (24).

2. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 1, characterized in that: M electromagnets (11) are fixed at equal intervals along the circumference of the inner magnetic wheel (12); N permanent magnets (13) are arranged at equal intervals along the circumference on the inner sidewall of the outer magnetic wheel (14), where M is an integer multiple of N, i.e., M=K. N; The M electromagnets (11) are divided into K groups in circumferential order. Each group contains N electromagnets, and the distribution positions of the N electromagnets in each group in the circumferential direction correspond one-to-one with the N permanent magnets. The angle between two adjacent electromagnets in the same group in the circumferential direction is 360° / N.

3. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 2, characterized in that: The K groups of electromagnets (11) are energized sequentially, and all electromagnets maintain the same magnetic polarity toward the permanent magnet (13) when energized.

4. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 2, characterized in that: The energization of adjacent electromagnets (11) overlaps for a period of time. During this overlap, the excitation current of the previous electromagnet is gradually reduced to 0, and the excitation current of the next electromagnet is gradually increased to the rated value. This causes the position of the maximum attraction force of the combined magnetic field to shift circumferentially to the next electromagnet, so that the permanent magnet on the outer magnetic wheel (14) always follows the position of the maximum attraction force and rotates synchronously under the action of magnetic attraction force.

5. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 1, characterized in that: The cathode (6) is housed within a space enclosed by a fixed frame (23), a limiting plate (25), and a rotating rod (24), with one end of the cathode (6) fixedly connected to the end of the inner magnetic wheel (12) and the other end fixedly connected to the fixed frame (23).

6. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 1, characterized in that: The inner magnetic wheel (12) is fixedly fitted with a sliding cover plate (17) on its outer periphery. At least one sliding column (18) is fixedly provided on the side of the sliding cover plate (17) near the limiting plate (25). The sliding column (18) is slidably connected to the limiting plate (25).

7. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 6, characterized in that: The limiting plate (25) is provided with guide arc grooves (26) for accommodating the sliding column (18). When the limiting plate (25) rotates, the guide arc grooves (26) move relative to the sliding column (18) and constrain the rotation range of the limiting plate.

8. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 1, characterized in that: The limiting plate (25) has an eccentric arc groove (27) for accommodating the rotating rod (24). One end of the rotating rod (24) is movably inserted into the eccentric arc groove (27) and is axially limited by an axial limiting member. The other end of the rotating rod (24) is rotatably connected to a seated bearing (22) fixed on a fixed frame (23), and the rotating rod located at the outer end of the seated bearing (22) is fixedly connected to the sputtering baffle. When the limiting plate (25) rotates, the eccentric arc groove (27) moves relative to the rotating rod (24), and the rotating rod (24) rotates within a certain range along with the sputtering baffle under the push of the eccentric arc groove (27).

9. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 1, characterized in that: The sputtering baffle is composed of six petal-shaped baffles (21), each baffle can completely block the sputtering area of ​​the cathode (6) when closed; the number of the rotating rods (24) is the same as that of the baffles (21) and they are connected one by one, thereby driving each baffle to rotate to achieve the open and closed state.

10. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 1, characterized in that: The cathode (6) is also connected to a support assembly (3) for adjusting its sputtering angle. The support assembly (3) includes a connecting flange (308) connected to the cathode (6) and a fixed support base (310). The connecting flange (308) is connected to a rotating support base (309). One end of the rotating support base (309) is rotatably connected to the fixed support base (310), and the other end is telescopically connected to the fixed support base (310) through an adjustment mechanism, so as to adjust the sputtering angle of the cathode (6) vertically.

11. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 10, characterized in that: The adjustment mechanism includes an adjustment shaft 1 (301) movably mounted on a rotating support (309) and an adjustment shaft 2 (306) movably mounted on a fixed support (310). The middle parts of the opposite sides of the adjustment shaft 1 (301) and the adjustment shaft 2 (306) are respectively fixedly connected to screw 1 (302) and screw 2 (305). The threaded sections of screw 1 (302) and screw 2 (305) are threadedly connected to the adjustment nut (304). The distance between the adjustment shaft 1 (301) and the adjustment shaft 2 (306) is adjusted by rotating the adjustment nut (304), so that the rotating support (309) can adjust the angle of the cathode (6).

12. The baffle opening and closing mechanism for a large-diameter sputtering cathode according to claim 11, characterized in that: The adjusting nut (304) is connected to the rotating support (309) via the fixing block (303) and is used to limit the rotation of the adjusting nut (304).

13. A vacuum coating apparatus, comprising a vacuum chamber, characterized in that: The vacuum chamber is equipped with a baffle opening and closing mechanism as described in claim 11. The top of the connecting flange (308) is connected to one end of the pipe (307) through a bellows (311). The other end of the pipe (307) is fixedly connected to the CF flange (4). The CF flange (4) is installed on the vacuum chamber for sealing the vacuum chamber. A power supply device (5) is connected to the CF flange (4) located outside the vacuum chamber.

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