Optical lens for cleaning end-point detection device, method of manufacture and detection device

CN122984100APending Publication Date: 2026-10-27SHANGHAI CHEYITIAN TECH CO LTD
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Patent Information

Application Number
CN202611469977.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-09-21
Publication Date
2026-10-27

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Abstract

The application relates to the technical field of semiconductor detection, and discloses an optical lens for cleaning endpoint detection devices, a preparation method and a detection device, which comprise a transparent base layer, a first ion implantation modification layer formed on the working surface of the transparent base layer in contact with a semiconductor process gas through an ion implantation process, a compensation layer comprising a plurality of first periodic film layers arranged in stacks, the refractive index of a first material layer in the first periodic film layers being greater than the refractive index of a second material layer, a plurality of second ion implantation modification layers formed in the compensation layer, and a thermal actuation adjustment layer also arranged in the compensation layer, the thermal actuation adjustment layer comprising a plurality of second periodic film layers arranged in stacks, the second periodic film layers comprising a third material layer and a fourth material layer, the thermal expansion coefficient of the third material layer being greater than the thermal expansion coefficient of the fourth material layer. The application can improve the adhesion of the coating, the corrosion resistance of the optical lens, the transmission uniformity and effectively avoid stress cracking.
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