Display panel and display device

Abstract

The application provides a display panel and a display device. The display panel has a display area, a light-transmitting area and an isolation area. The display panel comprises a substrate, a dam distributed on one side of the isolation area close to the display area, a partition component distributed on the isolation area, the partition component containing a conductive material and comprising a first isolation part on the side of the dam away from the display area, a blocking part on the side of the dam facing the display area, the blocking part containing an insulating material, and a second electrode layer covering the side of the dam and the partition component away from the substrate, the second electrode layer being separated into a first sub-electrode and a second sub-electrode by the blocking part, the first sub-electrode covering the display area, and the second sub-electrode covering the isolation area. Through the insulating isolation design of the blocking part, the first sub-electrode is electrically separated from the partition component, thereby cutting off the overlapping path of the second electrode layer in the display area and the first isolation part in the isolation area, and eliminating the abnormal negative electric field accumulation in the hole area.

Description

Technical Field

[0001] This application relates to the field of display device technology, and more particularly to a display panel and display device. Background Technology

[0002] Organic light-emitting diode (OLED) display panels and other flat panel display devices using light-emitting diode (LED) devices are widely used in various consumer electronics products such as mobile phones, televisions, personal digital assistants, digital cameras, laptops, and desktop computers due to their advantages such as high image quality, energy saving, thin body and wide range of applications, becoming the mainstream of display devices.

[0003] However, the performance of current OLED products needs to be improved. Summary of the Invention

[0004] This application provides a display panel and display device that can improve the problem of abnormal negative electric field in the isolation area near the hole area.

[0005] In a first aspect, embodiments of this application provide a display panel, which includes a display area, a light-transmitting area, and an isolation area. The isolation area is disposed around the light-transmitting area, and the display area is disposed around the isolation area. The display panel includes: a substrate; a dam located on one side of the substrate and distributed in the isolation area on the side closer to the display area; a partition component disposed on one side of the substrate and distributed in the isolation area, the partition component including a conductive material, and the partition component further including at least a first isolation portion located on the side of the dam away from the display area; a blocking portion disposed on one side of the substrate, and the blocking portion being located on the side of the dam facing the display area, the blocking portion including an insulating material; and a second electrode layer disposed on the side of the dam and the partition component away from the substrate, the second electrode layer including a first sub-electrode and a second sub-electrode that are partially separated and insulated from each other by the blocking portion, at least a portion of the first sub-electrode being located in the display area, and at least a portion of the second sub-electrode being located in the isolation area.

[0006] The display panel of the first aspect embodiment of this application has a blocking part disposed on the side of the dam facing the display area, which connects the first isolation part in the isolation assembly to the second sub-electrode in the second electrode layer. However, the design of the isolation from the first sub-electrode in the second electrode layer effectively solves the problem of abnormal negative electric field in the hole area.

[0007] According to any embodiment of the first aspect of this application, the partition assembly further includes a second isolation portion located on the embankment facing the display area;

[0008] According to any embodiment of the first aspect of this application, the blocking part and the second isolation part are provided at a distance;

[0009] According to any embodiment of the first aspect of this application, the blocking part is located on the side of the second isolation part away from the dam;

[0010] According to any embodiment of the first aspect of this application, the height dimension of the blocking portion is the same as the height dimension of the second isolation portion;

[0011] According to any embodiment of the first aspect of this application, the blocking portion covers at least a portion of the second isolation portion;

[0012] According to any embodiment of the first aspect of this application, the partition component includes at least a first sublayer, a second sublayer and a third sublayer stacked in a direction away from the substrate, wherein the orthographic projection of the second sublayer on the substrate is located within the orthographic projection of the first sublayer and the third sublayer on the substrate, and the blocking portion covers the first sublayer and the second sublayer.

[0013] According to any embodiment of the first aspect of this application, the width of the blocking portion is greater than the width of the third sublayer;

[0014] According to any embodiment of the first aspect of this application, a plurality of blocking grooves are provided on the surface of the blocking portion away from the substrate;

[0015] According to any embodiment of the first aspect of this application, the width of the blocking groove is 0.8 μm to 1 μm.

[0016] According to any embodiment of the first aspect of this application, the display panel further includes an encapsulation layer on the side of the second electrode layer away from the substrate. The encapsulation layer further includes a first encapsulation layer, a second encapsulation layer and a third encapsulation layer stacked in the direction away from the substrate. The second encapsulation layer ends at the side of the dam near the display area, and the first encapsulation layer and the third encapsulation layer cover the dam and extend to the light-transmitting area.

[0017] According to any embodiment of the first aspect of this application, the material of the second encapsulation layer includes an organic material, and the materials of the first encapsulation layer and the third encapsulation layer include inorganic materials;

[0018] According to any embodiment of the first aspect of this application, the first encapsulation layer and the third encapsulation layer cover the blocking portion and extend into the light-transmitting area;

[0019] According to any embodiment of the first aspect of this application, the first encapsulation layer and the third encapsulation layer cover the isolation area;

[0020] According to any embodiment of the first aspect of this application, the display panel further includes a partition groove, which is located on the side of the substrate where the partition component is disposed, and is distributed in the isolation area near the light-transmitting area.

[0021] According to any embodiment of the first aspect of this application, the partition groove is distributed between two adjacent first isolation portions;

[0022] According to any embodiment of the first aspect of this application, the display panel further includes an encapsulation layer on the side of the second electrode layer away from the substrate. The encapsulation layer further includes a first encapsulation layer, a second encapsulation layer and a third encapsulation layer stacked in the direction away from the substrate. The second encapsulation layer ends at the side of the dam near the display area, and the first encapsulation layer and the third encapsulation layer cover the dam and end at the partition groove.

[0023] Secondly, embodiments of this application provide a display device, including the display panel provided in any of the embodiments of the first aspect of this application. Attached Figure Description

[0024] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments of this application will be briefly introduced below. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a schematic diagram of the overall structure of a display panel provided in the first aspect embodiment of this application;

[0026] Figure 2 yes Figure 1 Schematic diagram of the cross-sectional structure along the AA direction;

[0027] Figure 3 yes Figure 2 A magnified structural diagram of region B in the middle;

[0028] Figure 4 yes Figure 1 Another cross-sectional view along the AA direction;

[0029] Figure 5 yes Figure 4 A magnified structural diagram of region C in the middle;

[0030] Figure 6 This is a schematic diagram of the overall structure of a display device provided in the second aspect of this application.

[0031] Marker explanation:

[0032] 100 - Display panel; AA - Display area; NA1 - Isolation area; NA2 - Transmitting area;

[0033] 10-Substrate;

[0034] 20-Dike;

[0035] 30 - Partition assembly; 30a - First sub-layer; 30b - Second sub-layer; 30c - Third sub-layer; 31 - First isolation section; 32 - Second isolation section;

[0036] 40 - Blocking part; 41 - Blocking groove;

[0037] 50 - Second electrode layer; 51 - First sub-electrode; 52 - Second sub-electrode;

[0038] 60-Partition groove;

[0039] 70 - Encapsulation layer; 71 - First encapsulation layer; 72 - Second encapsulation layer; 73 - Third encapsulation layer;

[0040] 200 - Display device; Detailed Implementation

[0041] The features and exemplary embodiments of various aspects of this application will be described in detail below. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain this application and not to limit it. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples.

[0042] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.

[0043] Various modifications and variations can be made to this application without departing from its spirit or scope, which will be apparent to those skilled in the art. Therefore, this application is intended to cover modifications and variations of the invention that fall within the scope of the corresponding claims (the claimed technical solutions) and their equivalents. It should be noted that the embodiments provided in this application can be combined with each other without contradiction.

[0044] In related technologies, the Ti-Al-Ti (titanium-aluminum-titanium) isolation pillar structure is widely used in the isolation area of ​​the display panel hole area design to block water and oxygen. Although the trench structure formed by the metal stack can effectively block water vapor intrusion, it has significant defects in practical applications.

[0045] When the cathode of an organic light-emitting diode (OLED) is formed over the entire surface, it directly overlaps with the trench structure of the metal, causing an abnormal negative electric field to form in the isolation area, which in turn induces the risk of electrostatic discharge (ESD) breakdown.

[0046] The existing structural design fails to balance physical reliability and electrical safety. In particular, in the isolation area surrounding the light-transmitting zone, the electrical connection between the cathode and the metal trench structure leads to the accumulation of negative charges at the interface, forming a local strong electric field and exacerbating ESD risks.

[0047] In order to solve the above-mentioned technical problems, and based on technical considerations and concepts, this application provides a display panel and a display device.

[0048] The following is combined with Figures 1 to 6 The display panel and display device provided in the embodiments of this application will be described in detail.

[0049] Figure 1 This illustrates the overall structure of a display panel 100 provided in the first aspect embodiment of this application. Figure 2 It shows Figure 1 Cross-sectional structure along the AA direction.

[0050] Please see Figure 1 and Figure 2 In a first aspect, embodiments of this application provide a display panel 100, which includes a display area AA, a light-transmitting area NA2, and an isolation area NA1. The isolation area NA1 is disposed around the light-transmitting area NA2, and the display area AA is disposed around the isolation area NA1. The display panel 100 includes a substrate 10, a dam 20, a partition component 30, a blocking portion 40, and a second electrode layer 50.

[0051] The dam 20 is located on one side of the substrate 10 and is distributed on the side of the isolation area NA1 near the display area AA.

[0052] The partition assembly 30 is disposed on one side of the substrate 10 and distributed in the isolation area NA1. The partition assembly 30 includes a conductive material and the partition assembly 30 also includes at least a first isolation portion 31 located on the side of the dam 20 away from the display area AA.

[0053] The blocking part 40 is disposed on one side of the substrate 10, and the blocking part 40 is located on the side of the dam 20 facing the display area AA. The blocking part 40 includes an insulating material.

[0054] The second electrode layer 50 is disposed on the side of the dam 20 and the partition assembly 30 away from the substrate 10. The second electrode layer 50 includes a first sub-electrode 51 and a second sub-electrode 52 that are separated and insulated from each other by the blocking portion 40. At least a portion of the first sub-electrode 51 is located in the display area AA, and at least a portion of the second sub-electrode 52 is located in the isolation area NA1.

[0055] The display panel 100 of the first aspect embodiment of this application is provided with a blocking part 40 on the side of the dam 20 facing the display area AA, and the first isolation part 31 in the isolation assembly 30 is connected to the second sub-electrode 52 in the second electrode layer 50. However, the design of isolating the first sub-electrode 51 in the second electrode layer 50 effectively solves the problem of abnormal negative electric field in the hole area.

[0056] The blocking section 40 is located between the dam 20 and the display area AA. Its insulation properties physically isolate the second electrode layer 50 from the isolation area NA1 and the display area AA, thus dividing the second electrode layer 50 into a first sub-electrode 51 and a second sub-electrode 52 that are mutually insulated. This design cuts off the electrical connection between at least a portion of the first sub-electrode 51 in the second electrode layer 50 located in the display area AA and the first isolation section 31 in the isolation assembly, avoiding the accumulation of abnormal negative electric field in the isolation area NA1 due to electrode overlap, thereby significantly reducing the risk of electrostatic discharge breakdown.

[0057] Meanwhile, the first isolation part 31 of the isolation component 30 is located on the side of the dam 20 away from the display area AA, and it remains connected to the second sub-electrode 52. The insulating material of the blocking part 40 further enhances the isolation effect, separating the second sub-electrode 52 from the first sub-electrode 51, and ensuring that the electric field is concentrated in the display area AA.

[0058] The above structure, through the synergistic effect of physical isolation and electrical partitioning, solves the problem of abnormal negative electric field potential in the hole area while maintaining the negative surface potential of the first sub-electrode 51 of the display area AA, thereby improving the reliability and service life of the display panel 100.

[0059] The substrate 10 serves as a basic support layer, providing space for the array circuitry and basic support for the entire display panel 100.

[0060] The dam 20 is located on one side of the substrate 10 and distributed on the side of the isolation area NA1 close to the display area AA. Its function is to block the diffusion of film layers with strong material flow during the preparation process, such as part of the encapsulation layer 70, into the light-transmitting area NA2, so as to ensure the structural integrity of the display area AA and the light-transmitting area NA2.

[0061] The partition assembly 30 is disposed on one side of the substrate 10 and distributed in the isolation area NA1. It includes a conductive material and at least includes a first isolation portion 31 located on the side of the dam 20 away from the display area AA.

[0062] The isolation component 30 inhibits the intrusion of water and oxygen through the physical barrier effect of the conductive material, thereby improving the sealing performance of the hole area.

[0063] The blocking part 40 is disposed on one side of the substrate 10 and located on the side of the dam 20 facing the display area AA. It is made of insulating material. The core function of the blocking part 40 is to physically separate the second electrode layer 50 into a first sub-electrode 51 and a second sub-electrode 52 that are insulated from each other. At least part of the first sub-electrode 51 covers the display area AA. As the cathode of the light-emitting functional layer, it normally performs the surface negative potential regulation function in the display area AA. At least part of the second sub-electrode 52 covers the isolation area NA1. It is electrically connected to the conductive material through the first isolation part 31 of the isolation component 30, but is electrically isolated from the first sub-electrode 51 due to the insulation characteristics of the blocking part 40.

[0064] The design of the blocking part 40 completely cuts off the connection path between the first sub-electrode 51 of the display area AA and the conductive structure of the blocking component 30 in the isolation area NA1 by breaking the second electrode layer 50. This avoids the accumulation of abnormal negative electric field caused by direct electrode contact at the interface of the isolation area NA1, thereby eliminating the risk of ESD breakdown.

[0065] Meanwhile, the first isolation part 31 of the isolation component 30 is connected to the second sub-electrode 52 in the isolation area NA1 through a conductive material, which not only maintains the necessary ability to guide and distribute the electric field evenly, but also ensures that the dual functions of water and oxygen barrier and electrical isolation do not interfere with each other through the coordinated layout of the blocking part 40 and the dam 20.

[0066] The display area AA, isolation area NA1, and light-transmitting area NA2 are mainly distributed in the working area of ​​the fingerprint recognition area or the under-display optical sensor such as the under-display camera. The light-transmitting area NA2 provides a channel for optical signal transmission. The isolation area NA1, through the combination design of the blocking part 40 and the isolation component 30, physically isolates the material penetration between the display area AA and the light-transmitting area NA2, and electrically blocks the formation of abnormal electric fields, thereby ensuring the performance stability of the optical sensor.

[0067] Furthermore, the insulating material of the blocking part 40 is formed with grooves or fracture structures of a specific depth through photolithography, so as to precisely control the segmentation position of the second electrode layer 50 without affecting the continuity of the chemical vapor deposition (CVD) film formation.

[0068] The conductive material of the isolation component 30, such as a titanium-aluminum-titanium stack, is formed into a Trench structure through an etching process, which not only enhances the water and oxygen barrier capability, but also provides a stable electrical connection interface for the second sub-electrode 52.

[0069] The dam 20 and the partition component 30 complement each other in spatial layout. The side of the dam 20 closest to the display area AA is electrically isolated by the blocking part 40, while the side furthest from the display area AA is protected against water and oxygen by the partition component 30. The cooperation method between the dam 20 and the partition component 30 will be described in further detail in subsequent embodiments.

[0070] Ultimately, the above structure, through the insulating isolation of the blocking part 40, the conductive guidance of the isolation component 30, and the physical barrier of the dam 20, systematically solves the problem of abnormal negative electric field caused by electrode connection in the isolation area NA1 while maintaining the normal cathode function of the display area AA. This significantly improves the reliability and service life of the display panel 100, and provides a highly compatible design solution for the integration of under-display optical sensors.

[0071] Please continue reading. Figure 2 In some embodiments, the partition assembly 30 further includes a second isolation portion 32 located on the dam 20 facing the display area AA.

[0072] In these embodiments, the partition assembly 30 also has a second isolation portion 32 distributed on the side of the dam 20 facing the display area AA.

[0073] The isolation component 30 further enhances the physical protection and electric field control capabilities of the isolation area NA1 by adding a second isolation part 32 located on the side of the dam 20 facing the display area AA, together with the first isolation part 31, forming the isolation components 30 on both sides of the dam 20.

[0074] The second isolation section 32 and the first isolation section 31 are respectively distributed on both sides of the dam 20, both using conductive materials to form a symmetrical trench structure.

[0075] The first isolation section 31 is located on the side of the dam 20 away from the display area AA. It blocks water and oxygen from entering the light-transmitting area NA2 through the layered structure of conductive materials. The second isolation section 32 is located on the side of the dam 20 close to the display area AA. It is arranged adjacent to the blocking section 40. Its conductive properties can guide the electric field distribution at the edge of the display area AA and avoid local charge accumulation.

[0076] The blocking part 40 is sandwiched between the dam 20 and the second isolation part 32, dividing the second electrode layer 50 into a first sub-electrode 51 and a second sub-electrode 52. This ensures that the first sub-electrode 51, as the cathode, only acts on the display area AA, while the second sub-electrode 52 forms an independent circuit through the conductive interface of the second isolation part 32. This avoids contact with the first sub-electrode 51, which is the cathode of the display area AA at a negative potential, and maintains the necessary electrical continuity through the conductive stack.

[0077] Furthermore, the collaborative design of the second isolation section 32 and the first isolation section 31 extends the protection range of the isolation zone NA1. Based on the insulation isolation of the blocking section 40, the active regulation of the electric field distribution within its own distribution area by the first isolation section 31 and the second isolation section 32 reduces the possibility of abnormal accumulation of interface charge.

[0078] Figure 3 yes Figure 2 The enlarged structure of region B in the middle.

[0079] Please see Figure 3 In some embodiments, the blocking part 40 and the second isolation part 32 are spaced apart.

[0080] In these embodiments, the spatial arrangement between the blocking portion 40 and the second isolation portion 32 achieves synergistic optimization of insulation isolation and conductive guidance through precise distance control.

[0081] The blocking part 40 is located on the side of the dam 20 facing the display area AA, and is spaced apart from the second isolation part 32, forming a discontinuous physical break.

[0082] On the one hand, the insulation properties of the blocking part 40 separate the second electrode layer 50 into a first sub-electrode 51 covering the display area AA and a second sub-electrode 52 covering the isolation area NA1, thus completely cutting off the electrical connection path between the first sub-electrode 51 of the display area AA and the conductive structure of the isolation area NA1, and eliminating the accumulation of abnormal negative electric field.

[0083] On the other hand, the second isolation section 32 maintains an electrical connection with the first sub-electrode 51 through the conductive material in the space, forming a local conductive circuit on the NA1 side of the isolation region, guiding the residual charge to be evenly distributed, and avoiding the risk of electrostatic discharge (ESD) breakdown.

[0084] The introduction of the spacing also reduces the process compatibility requirements between the blocking part 40 and the second isolation part 32, avoiding interface stress or film peeling problems that may be caused by direct contact between the insulating material and the conductive stack.

[0085] Meanwhile, the second isolation section 32 at the conductive interface in the interval region can help maintain the integrity of the conductive structure of the isolation area NA1, enhance the barrier capability of the dam 20 near the display area AA against water and oxygen intrusion, and the blocking section 40 further suppresses the electric field diffusion through the insulating material in the interval space, ensuring that the negative potential distribution of the cathode of the display area AA is not disturbed.

[0086] Please continue reading. Figure 3 In some alternative embodiments, the blocking portion 40 is located on the side of the second isolation portion 32 away from the dam 20.

[0087] In these alternative embodiments, the blocking part 40 and the second isolation part 32 form a hierarchical spatial layout, with the second isolation part 32 disposed adjacent to the dam 20, and the blocking part 40 located on the side of the second isolation part 32 away from the dam 20.

[0088] The blocking part 40 is located on the side of the second isolation part 32 away from the dam 20. It further blocks the potential overlap between the first sub-electrode 51 and the second sub-electrode 52 by means of insulating material, ensuring that the negative potential distribution of the cathode of the display area AA is not disturbed.

[0089] In addition, the arrangement of the blocking part 40 can be adapted to more complex film stacking processes. For example, a groove can be reserved on the blocking part 40 to precisely control the division position of the second electrode layer 50, while the physical sealing of the isolation area NA1 near the light-transmitting area NA2 is maintained by the conductive continuity of the second isolation part 32.

[0090] Please continue reading. Figure 3 In some alternative embodiments, the height dimension of the blocking portion 40 is the same as the height dimension of the second isolation portion 32.

[0091] In these alternative embodiments, the height alignment design of the blocking part 40 and the second isolation part 32 achieves synergistic optimization of stress distribution and electric field modulation through structural symmetry.

[0092] The blocking portion 40 and the second isolation portion 32 form a parallel interface layout at the same height. The blocking portion 40 is located outside the second isolation portion 32, and its insulating layer is aligned with the conductive stacked structure of the second isolation portion 32 in the height direction. The height consistency ensures that the dividing interface of the second electrode layer 50, that is, the dividing position between the first sub-electrode 51 and the second sub-electrode 52, remains parallel to the conductive structure of the isolation component 30, so that the second sub-electrode 52 forms a continuous circuit through the conductive interface of the second isolation portion 32, while the first sub-electrode 51 is completely confined within the display area AA due to the height matching of the blocking portion 40, avoiding any potential overlap with the conductive structure of the first isolation portion 31 of the isolation area NA1.

[0093] The layout of the blocking portion 40 and the second isolation portion 32 having the same height also optimizes the stress distribution of the membrane layer. The alignment structure of the blocking portion 40 and the second isolation portion 32 evenly distributes the cutting stress, reducing the risk of interface crack propagation caused by height differences.

[0094] Meanwhile, the seamless connection between the conductive layer of the second isolation section 32 and the insulating layer of the blocking section 40 in the height direction further enhances the water and oxygen barrier effect, preventing water vapor from entering the light-transmitting area NA2 through the micro gaps formed by the height misalignment.

[0095] The high consistency between the blocking portion 40 and the second isolation portion 32 can also optimize the etching accuracy of the separation between the first sub-electrode 51 and the second sub-electrode 52, simplify the manufacturing process and improve the film stacking accuracy.

[0096] Furthermore, the equal height design of the blocking part 40 and the second isolation part 32 ensures the uniformity of the electric field distribution. The isolation part guides the residual charge in the isolation area NA1 to dissipate along a fixed path through conductive material, while the blocking part 40 precisely limits the diffusion range of the cathode electric field in the display area AA through its insulation properties. The blocking part 40 and the second isolation part 32 work together to eliminate the possibility of abnormal accumulation of interface charge.

[0097] Figure 4 It shows Figure 1 Another cross-sectional structure along the AA direction.

[0098] Please see Figure 4 In some embodiments, the blocking portion 40 covers at least a portion of the second isolation portion 32.

[0099] In these embodiments, the layered design of insulating and conductive materials achieves improved electric field isolation and structural stability through interface coupling effects.

[0100] The blocking portion 40 partially covers the second insulating portion 32, and the insulating material of the blocking portion 40 extends along the surface of the second insulating portion 32 to form a stepped or wrapped structure.

[0101] The second electrode layer 50 is divided into a first sub-electrode 51 and a second sub-electrode 52 that are mutually insulated by the coverage area of ​​the blocking part 40. The second sub-electrode 52 is electrically connected to the second isolation part 32 through the conductive interface of the uncovered second isolation part 32, while the first sub-electrode 51 is completely isolated from the second isolation part 32 on the side of the dam 20 by the insulating coverage of the blocking part 40, thereby eliminating the accumulation of abnormal negative electric field at the isolation area NA1.

[0102] The partial coverage of the second isolation portion 32 by the blocking portion 40 also optimizes the stress distribution of the film layer. The edge region of the conductive material stack of the second isolation portion 32 wrapped by the insulating material of the blocking portion 40 can suppress the extension of cutting cracks along the conductive-insulating interface and reduce the risk of film peeling.

[0103] Meanwhile, the conductive area not covered by the second isolation section 32 maintains water and oxygen barrier capabilities, preventing water vapor from entering the light-transmitting area NA2 through the micro-gap between the blocking section 40 and the substrate 10.

[0104] At the process level, the blocking part 40 precisely covers the designated area of ​​the second isolation part 32 through selective deposition or etching processes, which avoids the process complexity caused by the complete wrapping of the insulating material, and achieves a balance between electric field segmentation and structural reinforcement through local coverage.

[0105] In addition, the conductive interface exposed by the second isolation section 32 provides a stable charge dissipation path for the second sub-electrode 52, guides the residual electric field to be distributed along the edge of the isolation region NA1, and limits the lateral diffusion of the cathode electric field in the display region AA.

[0106] Figure 5 It shows Figure 4 The enlarged structure of region C in the middle.

[0107] Please see Figure 5 In some embodiments, the partition component 30 includes at least a first sublayer 30a, a second sublayer 30b, and a third sublayer 30c stacked in a direction away from the substrate 10. The orthographic projection of the second sublayer 30b onto the substrate 10 is located within the orthographic projection of the first sublayer 30a and the third sublayer 30c onto the substrate 10. The blocking portion 40 covers the first sublayer 30a and the second sublayer 30b.

[0108] In these embodiments, the orthographic projection of the second sublayer 30b on the substrate 10 is limited to the orthographic projection range of the first sublayer 30a and the third sublayer 30c, and the blocking portion 40 covers the first sublayer 30a and the second sublayer 30b. The nested structure significantly improves the overall protection performance of the isolation region NA1 through hierarchical isolation and insulation wrapping design.

[0109] The first sublayer 30a, the second sublayer 30b, and the third sublayer 30c of the partition component 30 are stacked in the vertical direction to form a conductive stacked trench structure. The projection inward design of the second sublayer 30b optimizes the water and oxygen barrier path through size constraints, reducing the generation of interface microcracks.

[0110] The blocking portion 40 covers the first sub-layer 30a and the second sub-layer 30b. By partially wrapping the conductive stack with insulating material, the electrical connection between the second electrode layer 50 and the isolation component 30 is cut off in the area covered by the blocking portion 40, so that the second electrode layer 50 is divided into a first sub-electrode 51 covering the display area AA and a second sub-electrode 52 covering the isolation area NA1.

[0111] The insulating wrapping of the blocking part 40 not only prevents the part of the second electrode layer 50 located in the display area AA from directly contacting the conductive stacked structure of the isolation component 30 and eliminating the accumulation of abnormal negative electric field, but also suppresses the transmission of cutting stress along the conductive-insulating interface and reduces the risk of film peeling by physically covering the first and second sub-layers 30b with insulating material.

[0112] For example, the first sublayer 30a, the second sublayer 30b, and the third sublayer 30c are all conductive materials.

[0113] For example, the first sublayer 30a is made of titanium metal, the second sublayer 30b is made of aluminum metal, and the third sublayer 30c is made of titanium metal.

[0114] Please continue reading. Figure 5 In some optional embodiments, the width of the blocking portion 40 is greater than the width of the third sublayer 30c.

[0115] In these embodiments, it can be further ensured that the blocking portion 40 completely separates the second electrode layer 50, and that the second electrode layer 50 does not overlap with the third sub-layer 30c of the second isolation portion 32 to form an additional electrical connection.

[0116] Please continue reading. Figure 5 In some embodiments, the surface of the blocking portion 40 away from the substrate 10 is provided with a plurality of blocking grooves 41.

[0117] In these embodiments, the synergistic effect of electric field isolation and stress dispersion is further enhanced by introducing blocking groove 41 as a breakpoint design of the microstructure.

[0118] The blocking grooves 41 are arranged in parallel or staggered along the surface of the blocking part 40, which not only ensures the continuity of chemical vapor deposition (CVD) film formation, but also refines the segmentation position of the second electrode layer 50 through physical breaks.

[0119] The presence of the blocking groove 41 divides the first sub-electrode 51 and the second sub-electrode 52 covering the blocking part 40 into multiple isolated areas, completely eliminating the potential risk of overlap between the cathode and the blocking assembly 30 caused by local defects in the film layer or process deviations.

[0120] Meanwhile, the microstructure design of the blocking groove 41 extends the extension path of the crack along the surface of the blocking part 40, disperses the concentrated impact of cutting stress on the insulating layer, and reduces the probability of film peeling.

[0121] In terms of electric field control, the blocking groove 41 limits the lateral electric field diffusion range of the first sub-electrode 51 of the display area AA by subdividing the coverage area of ​​the second electrode layer 50, thereby preventing abnormal charges from accumulating at the interface of the isolation area NA1.

[0122] The regular arrangement of the blocking grooves 41 also optimizes the interfacial adhesion between the blocking part 40 and the second electrode layer 50, reducing delamination problems caused by differences in thermal expansion coefficients.

[0123] In some alternative embodiments, the width of the blocking groove 41 is 0.8 μm to 1 μm.

[0124] Please continue reading. Figure 2 or Figure 4In some embodiments, the display panel 100 further includes an encapsulation layer 70 on the side of the second electrode layer 50 away from the substrate 10. The encapsulation layer 70 also includes a first encapsulation layer 71, a second encapsulation layer 72 and a third encapsulation layer 73 stacked in a direction away from the substrate 10. The second encapsulation layer 72 terminates on the side of the dam 20 near the display area AA. The first encapsulation layer 71 and the third encapsulation layer 73 cover the dam 20 and extend toward the light-transmitting area NA2.

[0125] In these embodiments, reliable AA encapsulation of the display area is achieved through a collaborative design of layered cutoff and extended coverage.

[0126] The first encapsulation layer 71 and the third encapsulation layer 73 cover the dam 20 and extend to the light-transmitting area NA2. Through continuous film formation, they ensure complete sealing of the display area AA and the isolation area NA1, while maintaining the light transmittance of the light-transmitting area NA2 to meet the signal transmission requirements of the under-display optical sensor.

[0127] The second encapsulation layer 72 ends at the side of the dam 20 near the display area AA, with its edge aligned with the dam 20. The dam 20 blocks the light-transmitting area NA2, thus reducing the obstruction of the optical path and suppressing stress concentration or film peeling that may be caused by the accumulation of encapsulation material in the light-transmitting area NA2 through the cut-off boundary.

[0128] The dam 20 acts as a physical barrier, limiting the cutoff position of the second encapsulation layer 72 and preventing its material from diffusing into the light-transmitting area NA2. The design of the first encapsulation layer 71 and the third encapsulation layer 73 extending across the dam 20 to the light-transmitting area NA2 ensures the continuity of the seal while strengthening the structural film layer of the isolation area NA1, avoiding interface cracks caused by structural abrupt changes.

[0129] In some alternative embodiments, the material of the second encapsulation layer 72 includes organic materials, while the materials of the first encapsulation layer 71 and the third encapsulation layer 73 include inorganic materials.

[0130] In these alternative embodiments, the first encapsulation layer 71 and the third encapsulation layer 73 are dense inorganic layers formed by chemical vapor deposition (CVD), while the second encapsulation layer 72 is formed by inkjet printing of organic materials.

[0131] Please continue reading. Figure 2 or Figure 4 In some optional embodiments, the first encapsulation layer 71 and the third encapsulation layer 73 cover the blocking portion 40 and extend toward the light-transmitting area NA2.

[0132] In these alternative embodiments, the blocking portion 40 can separate the second electrode layer 50 into the first sub-electrode 51 and the second sub-electrode 52, while avoiding affecting the film formation continuity of the first encapsulation layer 71 and the third encapsulation layer 73 in the encapsulation layer 70, thus meeting the requirements of compatibility with various different processes.

[0133] Please continue reading. Figure 2 or Figure 4 In some optional embodiments, the first encapsulation layer 71 and the third encapsulation layer 73 cover the isolation region NA1.

[0134] In these alternative embodiments, the first encapsulation layer 71 and the third encapsulation layer 73 are continuously formed to achieve continuous coverage of the isolation region NA1.

[0135] Please continue reading. Figure 2 or Figure 4 In some embodiments, the display panel 100 further includes a partition groove 60, which is located on the side of the substrate 10 where the partition component 30 is provided, and is distributed on the side of the isolation area NA1 near the light-transmitting area NA2.

[0136] In these embodiments, by adding a partition groove 60 to the side of the isolation area NA1 near the light-transmitting area NA2, which is located on the side of the substrate 10 where the partition component 30 is set, the crack resistance is improved by optimizing the geometric fracture and depth.

[0137] In the related technologies, in the existing display panel 100 hole area design, the isolation component 30, such as the groove structure formed by titanium-aluminum-titanium stack, has limited ability to block cutting stress due to insufficient height, which makes it easy for cracks to extend along the light-transmitting area NA2 to the isolation area NA1 and the display area AA, causing the risk of film peeling and encapsulation failure.

[0138] The introduction of the partition groove 60 has two effects. First, the depth and width design of the partition groove 60 significantly extends the crack propagation path, forcing the crack to deflect multiple times within the groove, consuming fracture energy, thereby inhibiting the further extension of the crack into the light-transmitting zone NA2.

[0139] Secondly, the groove structure of the partition groove 60 and the partition component 30 forms a stepped layout, which disperses the concentrated distribution of cutting stress in the isolation area NA1 and reduces the stress peak at the interface.

[0140] Meanwhile, the coordinated design of the partition groove 60, the blocking part 40, and the partition assembly 30 takes into account the electric field control requirements. The blocking part 40 divides the second electrode layer 50 into the first sub-electrode 51 of the display area AA and the second sub-electrode 52 of the isolation area NA1. The partition groove 60 further blocks the potential extension of the second sub-electrode 52 to the light-transmitting area NA2 through physical breaks, thereby avoiding abnormal diffusion of the cathode electric field.

[0141] In some alternative embodiments, the partition groove 60 is distributed between two adjacent first isolation portions 31.

[0142] In these alternative embodiments, the partition groove 60 is arranged in a reasonable manner by utilizing the space between adjacent first isolation portions 31.

[0143] Please continue reading. Figure 2 or Figure 4 In some embodiments, the display panel 100 further includes an encapsulation layer 70 on the side of the second electrode layer 50 away from the substrate 10. The encapsulation layer 70 also includes a first encapsulation layer 71, a second encapsulation layer 72 and a third encapsulation layer 73 stacked in the direction away from the substrate 10. The second encapsulation layer 72 ends at the side of the dam 20 near the display area AA. The first encapsulation layer 71 and the third encapsulation layer 73 cover the dam 20 and end at the partition groove 60.

[0144] In these embodiments, multi-dimensional protection is achieved through the layered encapsulation of the encapsulation layer 70 and the collaborative design of the partition groove 60.

[0145] In the related technologies, in the existing packaging design of the display panel 100, the insufficient height of the partition structure leads to stress concentration during cutting, and cracks are prone to extend along the isolation area NA1 to the light-transmitting area NA2. At the same time, a single packaging layer 70 is difficult to take into account both the optical performance of the light-transmitting area NA2 and the sealing requirements of the display area AA.

[0146] The first encapsulation layer 71 and the third encapsulation layer 73 cover the dam 20 and end at the partition groove 60. The sealing ability of the first encapsulation layer 71 is reinforced by rigid materials, while the physical fracture of the partition groove 60 disperses the stress at the edge of the encapsulation layer 70 and inhibits the extension of cracks to the light-transmitting area NA2.

[0147] The isolation groove 60 is located on the side of the isolation area NA1 near the light-transmitting area NA2. Its depth matches the height of the groove structure of the isolation component 30, which forces the crack path to deflect and consumes fracture energy. The cut-off design of the first encapsulation layer 71 and the third encapsulation layer 73 at the isolation groove 60 avoids film peeling caused by interface abruptness through structural complementarity.

[0148] Figure 6 The overall structure of the display device 200 provided in the second aspect embodiment of this application is shown.

[0149] Please see Figure 6 Secondly, embodiments of this application provide a display device 200, including the display panel 100 provided in any of the embodiments of the first aspect of this application.

[0150] The display device 200 provided in the second aspect embodiment of this application has the beneficial effects of the display panel 100 provided in any of the first aspect embodiments, since the display device 200 provided in the second aspect embodiment of this application includes the display panel 100 provided in any of the first aspect embodiments. Therefore, it will not be described again here.

[0151] The display device 200 in this application embodiment includes, but is not limited to, mobile phones, personal digital assistants (PDAs), tablet computers, e-books, televisions, access control systems, smart landline phones, control consoles, and other devices with display functions.

[0152] While the embodiments disclosed in this application are as described above, the content is merely for the purpose of facilitating understanding of this application and is not intended to limit the invention. Any person skilled in the art to which this application pertains may make any modifications and changes in form and detail of the implementation without departing from the spirit and scope disclosed in this application; however, the scope of protection of this application shall still be determined by the scope defined in the appended claims.

[0153] The above description is merely a specific embodiment of this application. Those skilled in the art will clearly understand that, for the sake of convenience and brevity, substitutions for other connection methods described above can be made by referring to the corresponding processes in the foregoing method embodiments, and will not be repeated here. It should be understood that the scope of protection of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the scope of protection of this application.

Claims

1. A display panel, characterized in that, The display panel includes a display area, a light-transmitting area, and an isolation area. The isolation area surrounds the light-transmitting area, and the display area surrounds the isolation area. The display panel includes: substrate; The dam is located on one side of the substrate and distributed in the isolation area on the side near the display area; A partition assembly is disposed on one side of the substrate and distributed in the isolation area. The partition assembly includes a conductive material and further includes at least a first isolation portion located on the side of the dam away from the display area. An blocking portion is disposed on one side of the substrate, and the blocking portion is located on the side of the dam facing the display area, the blocking portion comprising an insulating material; A second electrode layer is disposed on the side of the dam and the isolation assembly facing away from the substrate. The second electrode layer includes a first sub-electrode and a second sub-electrode that are insulated from each other by the blocking portion. At least a portion of the first sub-electrode is located in the display area, and at least a portion of the second sub-electrode is located in the isolation area.

2. The display panel according to claim 1, characterized in that, The partition assembly also includes a second isolation section located on the dam facing the display area.

3. The display panel according to claim 2, characterized in that, The blocking part and the second isolation part are spaced apart; Preferably, the blocking part is located on the side of the second isolation part away from the embankment; Preferably, the height of the blocking portion is the same as the height of the second isolation portion.

4. The display panel according to claim 2, characterized in that, The blocking section covers at least a portion of the second isolation section.

5. The display panel according to claim 4, characterized in that, The partition assembly includes at least a first sublayer, a second sublayer, and a third sublayer stacked along a direction away from the substrate, wherein the orthographic projection of the second sublayer on the substrate is located within the orthographic projections of the first sublayer and the third sublayer on the substrate, and the blocking portion covers the first sublayer and the second sublayer. Preferably, the width of the blocking portion is greater than the width of the third sub-layer.

6. The display panel according to claim 5, characterized in that, The surface of the blocking portion away from the substrate is provided with multiple blocking grooves; Preferably, the width of the blocking groove is 0.8 μm to 1 μm.

7. The display panel according to claim 1, characterized in that, The display panel further includes an encapsulation layer on the side of the second electrode layer away from the substrate. The encapsulation layer further includes a first encapsulation layer, a second encapsulation layer, and a third encapsulation layer stacked in a direction away from the substrate. The second encapsulation layer terminates at the side of the dam near the display area. The first encapsulation layer and the third encapsulation layer cover the dam and extend toward the light-transmitting area. Preferably, the material of the second encapsulation layer includes an organic material, and the materials of the first encapsulation layer and the third encapsulation layer include inorganic materials; Preferably, the first encapsulation layer and the third encapsulation layer cover the blocking portion and extend toward the light-transmitting area; Preferably, the first encapsulation layer and the third encapsulation layer cover the isolation area.

8. The display panel according to claim 1, characterized in that, The display panel also includes a partition groove, which is located on the side of the substrate where the partition component is disposed, and is distributed in the isolation area near the light-transmitting area. Preferably, the partition groove is distributed between two adjacent first isolation sections.

9. The display panel according to claim 8, characterized in that, The display panel further includes an encapsulation layer on the side of the second electrode layer away from the substrate. The encapsulation layer further includes a first encapsulation layer, a second encapsulation layer, and a third encapsulation layer stacked in a direction away from the substrate. The second encapsulation layer terminates at the side of the dam near the display area, and the first encapsulation layer and the third encapsulation layer cover the dam and terminate at the partition groove.

10. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 9.

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