terminal device

Abstract

The present disclosure relates to a terminal device. The terminal device comprises a metal contact structure, the metal contact structure comprising at least: a metal substrate; a non-sensitizing contact layer disposed on the metal substrate, and the non-sensitizing contact layer forming a part of an outer surface of the terminal device; the metal contact structure further comprising: a porous layer formed on at least one side of the metal substrate, the porous layer comprising a plurality of micropores; a coloring layer disposed within the plurality of micropores; a sealing layer disposed within the sealing pores, and the sealing layer covering the coloring layer; the non-sensitizing contact layer is disposed within the micropores and covers the sealing layer; the non-sensitizing contact layer comprises a compound of cerium formed by placing the metal substrate on which the sealing layer is formed into a second tank solution, and the second tank solution comprises a cerium salt, ammonium persulfate and potassium permanganate.

Description

[0001] This application is a divisional application of the invention patent application filed on May 17, 2021, with application number 2021105290937 and title "Terminal Equipment". Technical Field

[0002] This disclosure relates to the field of terminal technology, and in particular to a terminal device. Background Technology

[0003] With the continuous development of electronic science and technology, various terminal devices for different functions have emerged. For example, users can communicate by holding a mobile phone, or wear wearable devices to monitor body parameters or exercise. Understandably, whether holding or wearing a terminal device, the user needs to directly contact its surface. Therefore, whether the material of the device's surface is allergenic will directly affect the user experience. Summary of the Invention

[0004] This disclosure provides a terminal device to address the shortcomings of related technologies.

[0005] According to embodiments of this disclosure, a terminal device is provided, including a metal contact structure, the metal contact structure comprising at least: Metal substrate; A non-allergenic contact layer is disposed on the metal substrate and forms part of the outer surface of the terminal device; the metal contact structure further includes: A porous layer is formed on at least one side of the metal substrate, the porous layer comprising a plurality of micropores; A coloring layer is disposed within the plurality of micropores; A sealing layer is disposed within the sealing pores and covers the coloring layer; a non-sensitizing contact layer is disposed within the micropores and covers the sealing layer. The non-sensitizing contact layer includes a cerium compound formed by placing the metal substrate for which the sealing layer is formed in a second bath solution, the second bath solution including cerium salt, ammonium persulfate and potassium permanganate.

[0006] Optionally, the bonding strength between the sealing layer and the inner wall of the micropore is greater than the bonding strength between the non-sensitizing contact layer and the inner wall of the micropore.

[0007] Optionally, the sealing layer is made of nickel, nickel-based compounds, or non-nickel-based compounds.

[0008] Optionally, the thickness of the sealing layer is greater than or equal to 6 micrometers.

[0009] Optionally, the sealing layer includes a nickel hydroxide layer.

[0010] Optionally, the thickness of the non-sensitized contact layer is greater than or equal to 3 micrometers.

[0011] Optionally, the diameter of the micropores is greater than or equal to 10 nanometers.

[0012] Optionally, the metal contact structure further includes: A barrier layer is disposed on the surface of the metal substrate, and a porous layer is disposed on the surface of the barrier layer opposite to the metal substrate; The density of the barrier layer is greater than that of the porous layer.

[0013] Optionally, the metal substrate may include an aluminum alloy substrate, an aluminum substrate, a magnesium alloy substrate, or a titanium alloy substrate.

[0014] Optionally, the terminal device is a watch or a bracelet, and one or more of the terminal device's housing, frame, buckle, magnetic interface, and strap include a metal contact structure.

[0015] Optionally, the terminal device includes: a mobile phone, a watch, or a wristband.

[0016] The technical solutions provided by the embodiments of this disclosure may include the following beneficial effects: As can be seen from the above embodiments, the non-allergenic contact layer in this disclosure forms the outer surface of the metal contact structure. Therefore, when the user holds or wears the terminal device, the non-allergenic contact layer comes into direct contact with the user's skin, which can prevent the user from having allergies. This is beneficial for expanding the target audience of the terminal device, improving the user experience, and increasing the market share of the terminal device.

[0017] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit this disclosure. Attached Figure Description

[0018] The accompanying drawings, which are incorporated in and form a part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure.

[0019] Figure 1 This is a schematic diagram of the structure of a terminal device according to an exemplary embodiment.

[0020] Figure 2 This is a cross-sectional schematic diagram of a metal contact structure according to an exemplary embodiment.

[0021] Figure 3 This is a cross-sectional schematic diagram of another metal contact structure according to an exemplary embodiment.

[0022] Figure 4 This is a cross-sectional schematic diagram of another metal contact structure according to an exemplary embodiment.

[0023] Figure 5 This is a schematic diagram of the structure of another terminal device according to an exemplary embodiment. Detailed Implementation

[0024] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numerals in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this disclosure. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this disclosure as detailed in the appended claims.

[0025] The terminology used in this disclosure is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. The singular forms “a,” “the,” and “the” as used in this disclosure and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used herein refers to and includes any and all possible combinations of one or more of the associated listed items.

[0026] It should be understood that although the terms first, second, third, etc., may be used in this disclosure to describe various information, such information should not be limited to these terms. These terms are used only to distinguish information of the same type from one another. For example, without departing from the scope of this disclosure, first information may also be referred to as second information, and similarly, second information may also be referred to as first information. Depending on the context, the word "if" as used herein may be interpreted as "when," "when," or "in response to determination."

[0027] To improve the user experience, the following terminal devices include, for example... Figure 1 Taking the wristband 100 shown as an example, the technical solution of this disclosure is explained in detail.

[0028] like Figure 1 and Figure 2As shown, the bracelet 100 may include a metal contact structure 1, which can form an entire shell of the bracelet 100. Therefore, when a user wears the bracelet 100, the metal contact structure 1 will directly contact the user's skin. To improve the user experience, the metal contact structure 1 may include a metal substrate 11 and a non-allergenic contact layer 12. The non-allergenic contact layer 12 may be disposed on the side of the metal substrate 11 facing the outside of the bracelet 100, and the non-allergenic contact layer 12 may form part of the outer surface of the terminal device. Based on this, when a user wears the bracelet 100, the non-allergenic contact layer 12 of the metal contact structure 1 can directly contact the user's skin, preventing allergies, which helps to broaden the target audience of the bracelet 100, improve the user experience, and increase the market share of the terminal device. The metal substrate may include an aluminum substrate or an aluminum alloy substrate, which helps to achieve lightweight metal shells and reduce the weight of the terminal device.

[0029] In this description, only the metal contact structure 1 is used as an example of a complete housing. In some other embodiments, the housing of the bracelet 100 may include a body and the metal contact structure 1, which is connected to the body. Thus, the metal contact structure 1 is only part of the terminal device housing. For example, the metal contact structure 1 can be embedded in the body by welding, or connected to the edge of the body. This disclosure does not limit this. In the above embodiments, only the relationship between the metal contact structure and the bracelet housing is described. In other embodiments, the bracelet 100 may also include a strap, a frame, a buckle, a magnetic interface, and a metal backing plate assembled on the side opposite to the dial. One or more of the housing, strap, frame, buckle, magnetic interface, and metal backing plate may include the metal contact structure 1. The metal structure 1 may be an entire structure, or the metal contact structure 1 may be a part of any of the above structures. For example, they may be connected by welding. This disclosure does not limit this.

[0030] The metal contact structure 1 can form multiple components in the bracelet 100, where each component can be entirely or partially composed of the metal contact structure 1; this disclosure does not impose any limitations on this. For example, if the watch or bracelet uses wireless charging, the watch or bracelet also includes a magnetic interface for connecting to an external charging device. This magnetic interface faces away from the watch face of the watch or bracelet. When the user wears the watch, the magnetic interface will also come into contact with the user's skin. To solve the problem of magnetic interface sensitization, the watch's magnetic interface can include the metal contact structure 1. The magnetic interface can be located in any area of ​​the metal base or casing of the bracelet or watch, or in other locations; this disclosure does not impose any limitations on this.

[0031] In one embodiment, since the metal contact structure 1 can form the outer surface of the terminal device, in order to improve the aesthetics of the metal contact structure, this disclosure provides a method such as... Figure 3 The metal contact structure 1 shown is... Figure 3 This is a schematic cross-sectional view of metal contact structure 1. (Example) Figure 3 As shown, the metal contact structure 1 may include a metal substrate 11, a barrier layer 13, a porous layer 14, a coloring layer 15, a sealing layer 16, and a non-sensitizing contact layer 12. The barrier layer 13 is formed on the surface of the metal substrate 11, and the porous layer 14 is formed on the surface of the barrier layer 13. The porous layer 14 includes multiple micropores, and the opening direction of the micropores faces away from the metal substrate 11. The coloring layer 15 is formed on the surface of the porous layer 14 and fills the micropores 141 included in the porous layer 14, thereby decorating the metal contact structure 1 and improving its aesthetics.

[0032] Since the coloring layer 15 is disposed within the micropores 141 of the porous layer 14, a sealing process can be performed on the metal substrate 11 to which the coloring layer 15 is formed, in order to prevent discoloration. Specifically, the metal substrate 11 can be placed in a first sealed tank containing a first bath solution to perform a first-stage sealing treatment, thereby depositing a sealing layer 16 covering the coloring layer 15 within the micropores 141. Then, the metal substrate 11 is placed in a second sealed tank containing a second bath solution to perform a second-stage sealing treatment, thereby depositing a non-allergenic contact layer 12 covering the sealing layer 16 within the micropores 141. Based on this, a sealing layer 16 covering the coloring layer 15 can be formed within the micropores. The combination of the sealing layer 16 and the inner wall of the micropores protects the coloring layer 15, preventing discoloration or color bleeding during the sealing process. By forming a non-allergenic contact layer 12 covering the sealing layer 16 within the micropores 141, the exudation of the sealing material of the sealing layer can be prevented, and allergic reactions can be avoided when the user holds the metal contact structure 1, thus improving the user experience. The bonding strength between the sealing layer 16 and the inner wall of the micropore 141 is greater than the bonding strength between the non-allergenic contact layer 12 and the inner wall of the micropore 141. Therefore, compared to the nickel-free sealing process used in related technologies, this strengthens the protection of the coloring layer 15, especially reducing color flow during the sealing process. The diameter of the micropore 141 can be greater than or equal to 10 nanometers, preferably greater than or equal to 80 nanometers, within which subsequent deposition of the coloring layer 15 can be achieved. The non-allergenic contact layer 12 mainly refers to the fact that it is made of a material that is not easily sensitive to the human body.

[0033] In this embodiment, the metal substrate includes an aluminum alloy substrate, an aluminum substrate, a magnesium alloy substrate, or a titanium alloy substrate. The metal substrate 11 can be obtained by machining the raw material, for example, through one or more processes such as CNC machining, polishing, sandblasting, and wire drawing. The machined metal substrate 11 can then be cleaned with pure water and dried for further processing. Regarding the barrier layer 13 and the porous layer 14, both can be formed simultaneously by anodizing the metal substrate 11. The barrier layer 13 is disposed on the surface of the metal substrate 11 and is located between the metal substrate 11 and the porous layer 14. The density of the barrier layer 13 is greater than that of the porous layer 14, thereby blocking the coloring layer 15 to a certain extent. The metal substrate can be oxidized in an anodizing electrolyte to form the barrier layer 13 and the porous layer 14 on its surface. The electrolyte in this anodizing process can include one or more solutions of oxalic acid, sulfuric acid, chromic acid, and phosphoric acid. For example, the electrolyte may include sulfuric acid, wherein the concentration of sulfuric acid in the electrolyte may be greater than or equal to 150 g / L and less than or equal to 220 g / L, the concentration of aluminum alloy may be greater than or equal to 5 mg / L and less than or equal to 15 mg / L, the oxidation voltage may be 12.5 V, the temperature of the electrolyte may be greater than or equal to 10 °C and less than or equal to 14 °C, and the oxidation time may be 30-60 minutes. In this embodiment, by treating the surface of the metal substrate 11 through this anodizing process, a barrier layer 13 and a porous layer 14 can be formed on the surface of the metal substrate 11, which can improve the wear resistance and hardness of the subsequent metal contact structure. Of course, in other embodiments, the porous layer 14 may be formed by etching or other corrosion processes on the surface of the metal substrate 11. The porous layer 14 may be formed directly on the surface of the metal substrate, and this disclosure does not limit this.

[0034] The first bath solution may include a nickel salt solution, such as a nickel acetate solution. The metal substrate 11, after being colored to form a color layer, is placed in a first sealed bath containing the nickel salt solution to perform a first-stage sealing process. This first-stage sealing process deposits a sealing layer 16 covering the color layer 15 within the micropores. The material of the sealing layer 16 is related to the first bath solution. When the first bath solution is a nickel salt solution, the sealing layer 16 can be made of nickel or a nickel-based compound. When the first bath solution is another metal salt solution, the sealing layer 16 can be made of the corresponding metal, such as a non-nickel-based compound. In particular, when the sealing layer 16 is made of nickel or a nickel-based compound, the strong adhesion between the sealing layer 16 and the inner wall of the micropores prevents the sealing layer 16 from falling off, thus protecting the color layer 15 and improving the corrosion resistance of the metal contact structure after molding. This description uses only nickel salt solution including nickel acetate as an example. In other embodiments, the nickel salt solution may also include nickel acetate or nickel chromate solutions, etc. This disclosure does not limit the scope of the invention.

[0035] In the first-stage sealing process, the pH value of the nickel salt solution can be greater than or equal to 5.5 and less than or equal to 6. Within this pH range, the formation of "powder bloom" or pitting corrosion on the film surface after sealing can be avoided, which helps to ensure sealing quality and provides good corrosion resistance and wear resistance. The nickel salt concentration in the nickel salt solution can be greater than or equal to 8 g / L and less than or equal to 15 g / L. For example, when the nickel salt solution includes nickel acetate solution, the nickel salt concentration is greater than or equal to 8 g / L and less than or equal to 15 g / L, to ensure the concentration of nickel ions in the nickel salt solution and guarantee sealing quality. Furthermore, the temperature of the first bath can be greater than or equal to 93℃ and less than or equal to 98℃. The sealing layer 16 formed at this temperature has strong corrosion resistance. For the first-stage sealing process, the shell to be sealed can be immersed in a first bath solution for a first duration, which can be greater than or equal to ten minutes, preferably less than or equal to thirty minutes. By controlling the first duration, the thickness of the sealing layer 16 can be adjusted. Within this duration, the thickness of the sealing layer 16 within the micropores 141 can be effectively controlled, thereby leaving a certain space within the micropores 141 for subsequent deposition of the non-sensitized contact layer 12. More preferably, the first duration can be greater than or equal to fifteen minutes and less than or equal to twenty minutes, which can form a sealing layer with a thickness greater than or equal to 6 micrometers. Preferably, the thickness of the sealing layer can be less than or equal to 8 micrometers. Within this duration, the thickness requirement of the nickel compound layer while maintaining a certain degree of corrosion resistance can be taken into account, while also allowing space for the deposition of the non-sensitized contact layer 12.

[0036] In the above embodiments, the second bath solution may include at least one of a cerium salt solution and a lithium salt solution. For example, the second bath solution may include a cerium sulfate tetrahydrate solution. The metal substrate 11 with the sealing layer 16 formed can be immersed in the cerium sulfate tetrahydrate solution for a second time to form a non-allergenic contact layer. The second time may be greater than or equal to eight minutes and less than or equal to thirty minutes. The concentration of cerium sulfate tetrahydrate in the second bath solution is less than or equal to 2.5 g / L. A non-allergenic contact layer 12 covering the sealing layer 16 can be deposited in the micropores 141. The non-allergenic contact layer 12 can form the surface of the metal contact structure 1, avoiding user allergies and improving the user experience. Of course, in the embodiments of this disclosure, the second bath solution includes at least one of a cerium salt solution and a lithium salt solution to form a non-allergenic contact layer as an example. In other embodiments, the second bath solution may also include a compound solution of salts of other non-allergenic materials. This disclosure does not limit this.

[0037] The temperature of the second bath solution can be greater than or equal to 80°C and less than or equal to 98°C, so as to form a non-allergenic contact layer 12 with good corrosion resistance at this temperature. More preferably, the immersion time of the metal substrate 11 in the second bath solution can be greater than or equal to eight minutes, and more preferably, the second immersion time can be less than or equal to thirty minutes. By adjusting the immersion time, the thickness of the deposited non-allergenic contact layer 12 can be adjusted to maintain it within a reasonable thickness range. For example, the thickness of the non-allergenic contact layer 12 can be greater than or equal to 3 micrometers, and more preferably, the thickness of the non-allergenic contact layer can be less than or equal to 4 micrometers. This avoids the non-allergenic contact layer 12 being too thin, resulting in weak bonding strength with the inner wall of the micropore 141 and causing it to fall off. It also avoids the non-allergenic contact layer 12 being too thick, causing it to protrude from the micropore 141 and affect the appearance and feel.

[0038] In this embodiment, to improve the corrosion resistance of the non-sensitizing contact layer, the second bath solution may include cerium salt, ammonium persulfate, and potassium permanganate. The ammonium persulfate and potassium permanganate promote the conversion of trivalent cerium ions to tetravalent cerium ions, thereby precipitating a cerium compound with better corrosion resistance within the micropores 141. This cerium compound may include a combination layer of cerium hydroxide and cerium dioxide, further improving the corrosion resistance of the non-sensitizing contact layer 12. The concentration of ammonium persulfate in the second bath solution is less than or equal to 2.5 g / L; the concentration of potassium permanganate can be greater than or equal to 0.2 g / L and less than or equal to 5 g / L. By controlling the concentrations of ammonium persulfate and potassium permanganate, the thickness of the deposited cerium compound layer can be adjusted to a reasonable range. In this case, the cerium compound layer constitutes the non-sensitizing contact layer 12. In other embodiments, the non-sensitizing contact layer 12 may also include a cerium hydroxide layer or a cerium dioxide layer. This description uses an example where the second bath solution includes cerium salt, ammonium persulfate, and potassium permanganate. In other embodiments, the second bath solution may also include cerium salt and ammonium persulfate, or cerium salt and potassium permanganate; this disclosure does not impose any limitations on this. In still some embodiments, it may be a mixed solution of a metal salt compound of other non-sensitizing materials with at least one of ammonium persulfate and potassium permanganate. The above description uses an example where the non-sensitizing contact layer 12 includes a cerium compound layer. In other embodiments, by adjusting the second bath solution, the non-sensitizing contact layer 12 may also include a lithium compound or a sodium compound, or the non-sensitizing contact layer 12 may include multiple compounds of cerium, lithium, and sodium; this disclosure does not impose any limitations on this.

[0039] In the above embodiments, to achieve color display of the metal contact structure 1, a coloring layer 15 can be formed within the micropores 141, and the coloring layer 15 can be deposited within each micropore 141. For example, metal or metal oxide particles can be deposited at the bottom of the micropores 141 through an electrolytic coloring process. Due to the light scattering effect, the metal contact structure 1 can exhibit different colors, and the number of deposited particles can be adjusted by regulating the coloring time and applied voltage of the electrolytic coloring process, thereby achieving the purpose of adjusting the color depth. In another embodiment, the porous layer 14 can be colored through a dyeing process. Specifically, the metal substrate 11 with the porous layer 14 formed can be placed in a solution containing dye, and the micropores 141 can adsorb the dye to form the coloring layer 15.

[0040] This disclosure also provides a method such as Figure 4 The metal contact structure 1 shown enhances the aesthetics of the bracelet 10000. For example... Figure 4As shown, the non-allergenic contact layer 12 may include a non-allergenic color decorative layer 18. The metal contact structure 1 may include a metal substrate 11, a barrier layer 13, a porous layer 14, an adhesion layer 17, and the non-allergenic color decorative layer 18. The barrier layer 13 is disposed on the surface of the metal substrate 11, the porous layer 14 is disposed on the surface of the barrier layer 13, the adhesion layer 17 may be disposed on the surface of the porous layer 14 away from the metal substrate 11, and the adhesion layer 17 may fill the micropores 141 included in the porous layer 14. The non-allergenic color decorative layer 18 may be disposed on the surface of the adhesion layer 17, and the non-allergenic color decorative layer 18 is located on the side of the adhesion layer 17 away from the porous layer 14. Based on this, in the technical solution disclosed herein, a porous layer 14 can be formed first on the surface of the metal substrate 11, and then an adhesion layer 17 can be formed on the surface of the porous layer 14. The adhesion layer 17 improves the adhesion strength of the non-allergenic color decorative layer 18, preventing it from falling off. Moreover, the non-allergenic color decorative layer 18 can also play a color decoration role, enhancing the user experience. The opening direction of the micropores 141 of the porous layer 14 faces the side away from the metal substrate 11.

[0041] In this embodiment, the metal substrate 11 includes an aluminum alloy substrate, an aluminum substrate, a magnesium alloy substrate, or a titanium alloy substrate. The metal substrate 11 can be obtained from machined raw materials, for example, through one or more processes such as CNC machining, polishing, sandblasting, and wire drawing. The machined metal substrate 11 can then be cleaned with pure water and dried for further processing. Regarding the barrier layer 13 and the porous layer 14, the barrier layer 13 and the porous layer 14 can be formed simultaneously by anodizing the metal substrate 11. The barrier layer 13 is disposed on the surface of the metal substrate 11 and is located between the metal substrate 11 and the porous layer 14. The density of the barrier layer 13 is greater than that of the porous layer 14, thereby blocking the adhesion layer 17 to a certain extent. The metal substrate can be oxidized in an anodizing electrolyte to form the barrier layer 13 and the porous layer 14 on the surface of the metal substrate. The electrolyte in the anodizing process can include one or more solutions of oxalic acid, sulfuric acid, chromic acid, and phosphoric acid. For example, the electrolyte may include sulfuric acid, wherein the concentration of sulfuric acid in the electrolyte may be greater than or equal to 150 g / L and less than or equal to 220 g / L, the concentration of aluminum alloy may be greater than or equal to 5 mg / L and less than or equal to 15 mg / L, the oxidation voltage may be 12.5 V, the temperature of the electrolyte may be greater than or equal to 10 °C and less than or equal to 14 °C, and the oxidation time may be 30-60 minutes. In this embodiment, by treating the surface of the metal substrate 11 through this anodizing process, a barrier layer 13 and a porous layer 14 can be formed on the surface of the metal substrate 11, which can improve the wear resistance and hardness of the subsequent metal contact structure. Of course, in other embodiments, the porous layer 14 may be formed by etching or other corrosion processes on the surface of the metal substrate 11. The porous layer 14 may be formed directly on the surface of the metal substrate 11, and this disclosure does not limit this. The diameter of the micropores 141 included in the porous layer 14 can be greater than or equal to 10 nanometers. Preferably, the diameter of the micropores can be less than or equal to 80 nanometers. Within this diameter range, it is beneficial to achieve the subsequent deposition of the attachment layer 17.

[0042] In one embodiment, for the adhesion layer 17, a nitriding precursor can be deposited on the surface of the porous layer 14 to fill the micropores 141 of the porous layer 14. Then, the nitriding precursor is subjected to nitriding or carbonitriding treatment to obtain the adhesion layer 17. The adhesion layer 17 may include a metal nitride layer or a metal carbonitride layer. Utilizing the good wear resistance and corrosion resistance of metal nitrides or metal carbonitrides, the corrosion resistance of the adhesion layer 17 can be improved, thereby enhancing the wear resistance and corrosion resistance of the metal contact structure 1. Nitriding or carbonitriding treatment can be performed in a temperature environment of 380℃-460℃ to obtain a well-dense adhesion layer 17. The thickness of the adhesion layer 17 is greater than or equal to 1 nanometer and less than or equal to 200 nanometers to avoid poor adhesion due to excessive thickness and to avoid increasing the overall thickness of the metal contact structure 1 due to excessive thickness.

[0043] A nitriding precursor can be formed on the surface of the porous layer 14 using a vacuum coating method, and the nitriding precursor can be deposited simultaneously using a plasma-assisted deposition method, thereby obtaining a dense and continuous nitriding precursor on the surface of the porous layer 14, which can improve the strength and density of the subsequently formed adhesion layer 17. In order to improve the efficiency of nitriding and the bonding ability of the adhesion layer 17, nitrogen gas can be introduced into the vacuum chamber during the vacuum coating process. The nitrogen gas flow rate can be greater than or equal to 10 standard milliliters per minute and less than or equal to 30 standard milliliters per minute. The introduced nitrogen gas combines with the metal ions sputtered from the metal target, thereby forming a metal nitride film on the surface of the porous layer 14. The metal nitride film can then be subjected to nitriding treatment. Compared with the conventional process of directly nitriding metal materials in related technologies, the adhesion layer 17 formed in this disclosure has a higher film-substrate bonding degree and a higher film density, which can improve the bonding strength between the adhesion layer 17 and the porous layer 14 and the non-sensitized color decorative layer 18, while improving the wear resistance and corrosion resistance of the metal contact structure 1. In this embodiment, the formation of a metal nitride film on the surface of the porous layer 14 is used as an example for illustration. In other embodiments, the formation of a combination layer of metal nitride and elemental metal on the surface of the porous layer 14 may be an example of a single elemental metal layer. This disclosure does not limit the scope of the invention.

[0044] The material of the nitriding precursor varies depending on the metal target used in the vacuum coating process. For example, the metal target may include metallic chromium. By bombarding metallic chromium in a vacuum chamber while simultaneously introducing nitrogen gas, a chromium nitride coating can be formed on the surface of the porous layer 14. Simultaneously, plasma-assisted deposition can be used to deposit this chromium nitride coating to improve its density. Subsequent nitriding or carbonitriding treatments on the chromium nitride layer can form a chromium nitride layer or a chromium carbonitride layer as the adhesion layer 17. This description only uses the example of a chromium nitride coating as the nitriding precursor. In other embodiments, the nitriding precursor may also include a chromium coating, or it may include a chromium and chromium nitride combined coating; this disclosure does not impose any limitations on this. Using metallic chromium as the metal target leverages the high hardness of chromium itself to increase the hardness of the adhesion layer 17 formed by nitriding or carbonitriding. In the process of vacuum coating in a vacuum chamber, the power of bombarding the metal target can be greater than or equal to 45 kilowatts and less than or equal to 2000 kilowatts. More preferably, the power of bombarding the metal target can be greater than or equal to 60 kilowatts and less than or equal to 80 kilowatts.

[0045] In the above embodiments, to improve the density of the adhesion layer 17, the nitriding precursor is simultaneously deposited using plasma-assisted deposition (PALD) while vacuum-depositing the nitriding precursor. During the PALD process, argon gas can be introduced, with a flow rate greater than or equal to 10 standard milliliters per minute and less than or equal to 100 standard milliliters per minute. Argon gas within this range achieves good deposition results. The background vacuum level in the PALD process is greater than or equal to 0.001 Pa and less than or equal to 0.1 Pa.

[0046] For the non-allergenic color decorative layer 18 of the metal contact structure 1, the non-allergenic color decorative layer 18 can be made of a non-allergenic material, thereby avoiding user allergies. Specifically, the non-allergenic color decorative layer 18 can be formed on the surface of the adhesion layer 17 using physical vapor deposition. The non-allergenic color decorative layer 18 can use different metal elements according to the color requirements of the metal contact structure 1. For example, if the metal contact structure 1 needs to be gold, a titanium compound layer can be deposited on the adhesion layer 17 by bombarding titanium palladium; if the metal contact structure 1 needs to be blue, a tungsten compound layer can be deposited on the adhesion layer 17 by bombarding tungsten palladium; and if the metal contact structure 1 needs to be black, a chromium compound layer can be deposited on the adhesion layer 17 by bombarding chromium palladium. In other embodiments, the non-allergenic color decorative layer 18 may also include a tungsten compound layer or a titanium compound layer. In some other embodiments, the non-sensitizing color decorative layer 18 may also include multiple layers of titanium, titanium compound, tungsten, tungsten compound, chromium, or chromium compound, and this disclosure does not limit this.

[0047] Of course, in addition to the two specific embodiments described above, in some other cases, the non-sensitizing contact layer 12 may also be directly formed on the surface of the metal substrate, or may be disposed on the metal substrate 11 through other layer structures that improve adhesion. This disclosure does not limit this.

[0048] In the above embodiments, a wristband is used as an example of the terminal device for illustration. In other embodiments, the terminal device may also include other wearable devices besides the wristband, such as a watch, a neck and shoulder massager, or smart headphones. Of course, in addition to wearable devices, the terminal device may also include... Figure 5 The mobile network communication terminal shown may include mobile phone terminals, tablet terminals, and e-readers, etc., and this disclosure does not impose any limitations on them.

[0049] Other embodiments of this disclosure will readily occur to those skilled in the art upon consideration of the specification and practice of the disclosure herein. This disclosure is intended to cover any variations, uses, or adaptations of this disclosure that follow the general principles of this disclosure and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this disclosure are indicated by the following claims.

[0050] It should be understood that this disclosure is not limited to the precise structures described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of this disclosure is limited only by the appended claims.

Claims

1. A terminal device, characterized in that, The metal contact structure includes at least: Metal substrate; A non-allergenic contact layer is disposed on the metal substrate and forms part of the outer surface of the terminal device; the metal contact structure further includes: A porous layer is formed on at least one side of the metal substrate, the porous layer comprising a plurality of micropores; A coloring layer is disposed within the plurality of micropores; A sealing layer is disposed within the sealing pores and covers the coloring layer; a non-sensitizing contact layer is disposed within the micropores and covers the sealing layer. The non-sensitizing contact layer includes a cerium compound formed by placing the metal substrate for which the sealing layer is formed in a second bath solution, the second bath solution including cerium salt, ammonium persulfate and potassium permanganate.

2. The terminal device according to claim 1, characterized in that, The bonding strength between the sealing layer and the inner wall of the micropore is greater than the bonding strength between the non-sensitizing contact layer and the inner wall of the micropore.

3. The terminal device according to claim 1, characterized in that, The sealing layer is made of nickel, nickel-based compounds, or non-nickel-based compounds.

4. The terminal device according to claim 1, characterized in that, The thickness of the sealing layer is greater than or equal to 6 micrometers.

5. The terminal device according to claim 1, characterized in that, The sealing layer includes a nickel hydroxide layer.

6. The terminal device according to claim 1, characterized in that, The thickness of the non-sensitized contact layer is greater than or equal to 3 micrometers.

7. The terminal device according to claim 1, characterized in that, The diameter of the micropore is greater than or equal to 10 nanometers.

8. The terminal device according to claim 1, characterized in that, The metal contact structure further includes: A barrier layer is disposed on the surface of the metal substrate, and a porous layer is disposed on the surface of the barrier layer opposite to the metal substrate; The density of the barrier layer is greater than that of the porous layer.

9. The terminal device according to claim 1, characterized in that, The metal substrate includes aluminum alloy substrate, aluminum substrate, magnesium alloy substrate or titanium alloy substrate.

10. The terminal device according to claim 1, characterized in that, The terminal device is a watch or a bracelet, and one or more of the terminal device’s housing, frame, buckle, magnetic interface and strap include a metal contact structure.

11. The terminal device according to claim 1, characterized in that, The terminal devices include: mobile phones, watches, or wristbands.

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