A cyclone decontamination anti-blocking device and method for thin film evaporator

Abstract

The application discloses a cyclone impurity removal anti-blocking device and method for a thin film evaporator, and relates to the technical field of evaporation separation chemical equipment.The cyclone tube is arranged on the impurity removal box, and further comprises a crushing assembly arranged in the cyclone tube, which is used for crushing large-particle impurities in the raw liquid entering the cyclone tube; and an impurity removal unit arranged in the impurity removal box, which comprises an impurity removal assembly, a slow flow assembly and a cleaning assembly.The application has the advantages that the large-particle caked impurities in the raw liquid can be dispersed by adopting the crushing pretreatment and two-stage cyclone impurity removal mode, the equipment pipeline is prevented from being blocked, the material vortex and bubbles are eliminated by the slow flow assembly, the flow state is homogenized, the uniform film formation of the evaporator is ensured, the automatic cleaning and self-adaptive residue discharge structure are relied on, the operation and maintenance difficulty is reduced, and the anti-blocking and impurity removal effect of the device is continuously ensured.

Description

Technical Field

[0001] This invention relates to the field of evaporation and separation chemical equipment technology, and in particular to a cyclone impurity removal and anti-clogging device and method for thin-film evaporators. Background Technology

[0002] Thin-film evaporators are core equipment used in the pharmaceutical, food, and chemical industries for the evaporation and concentration of heat-sensitive materials. Due to the small gap between the film holes and the scraper, solid particles, crystals, and coke residues mixed in with the material can easily cause blockage, leading to coking on the dry wall and shutdown for cleaning. Therefore, a cyclone separator is usually installed at the feed end for pretreatment to remove suspended solid impurities and ensure stable operation of the evaporator.

[0003] For example, a sewage cyclone impurity removal device with publication number CN214734879U includes a sedimentation tank, a support frame on the lower side of the sedimentation tank, an inlet on the side of the sedimentation tank, an outlet and a sewage discharge port at the upper end, and a filtration mechanism and a cyclone mechanism matched inside the sedimentation tank. The filtration mechanism includes a filter screen and a matching support rod snap-fit ​​structure, and the cyclone mechanism includes a support column, a spiral plate and a bottom stirring blade. Sewage impurity removal is achieved through cyclone sedimentation combined with filter screen filtration.

[0004] Existing cyclone impurity removal devices typically use a single-stage cyclone plus filter screen filtration method to achieve solid-liquid separation. This impurity removal method has limited effect on removing fine particulate impurities and cannot meet the requirements of thin film evaporators for feed purification accuracy. In addition, the filter screen is prone to clogging after long-term use, requiring frequent shutdowns for replacement, which affects continuous production efficiency. For example, the aforementioned prior art uses a single-stage cyclone combined with a filter screen to remove impurities from wastewater. This method can only remove larger particles of impurities and is difficult to effectively capture fine particles that easily clog the membrane pores. Furthermore, the filter screen is complex to replace and maintain after clogging. In addition, the discharge fluid has a rotating vortex, which cannot be directly connected to the membrane distribution device of the thin-film evaporator, which can easily cause membrane flow deviation and uneven film formation. Moreover, it lacks automatic cleaning and adaptive slag discharge functions, and large particles of impurities can easily cause pipeline blockage. Overall, its anti-clogging ability and ease of operation and maintenance are insufficient, which has certain limitations.

[0005] Therefore, there is an urgent need to design a cyclone impurity removal and anti-clogging device and method for thin-film evaporators to solve the above problems. Summary of the Invention

[0006] To address the shortcomings of existing technologies, this invention provides a cyclone impurity removal and anti-clogging device and method for thin-film evaporators, which solves the problems mentioned in the background art.

[0007] To achieve the above objectives, the present invention provides the following technical solution: a cyclone impurity removal and anti-clogging device for a thin-film evaporator, comprising a cyclone tube on a impurity removal box, and further comprising: The crushing component is located inside the hydrocyclone tube and is used to crush large particles of impurities in the raw liquid entering the hydrocyclone tube. The impurity removal unit is located inside the impurity removal box and includes an impurity removal component, a flow slowing component, and a cleaning component. The impurity removal component is used to remove impurities contained in the raw solution, the slowing flow component is used to slow down the flow rate of the raw solution, and the cleaning component is used to clean up residual impurities.

[0008] Preferably, a controller is fixedly installed on the impurity removal box, a PLC controller is fixedly connected to the controller, a control panel is fixedly connected to the PLC controller, and the control panel and the PLC controller are electrically connected. The control panel controls the start-up, shutdown, and operation status of the crushing component and the impurity removal unit via a PLC controller.

[0009] Preferably, the crushing assembly includes an impeller rotatably connected inside a cyclone tube, a fixed crushing rod fixedly installed inside the cyclone tube, and rotating crushing rods rotatably connected above and below the fixed crushing rod inside the cyclone tube. A first transmission chamber is fixedly installed on the cyclone tube, one end of each of the two rotating crushing rods extends into the first transmission chamber, one end of the impeller extends into the first transmission chamber, and the two rotating crushing rods are connected to the impeller by a transmission belt.

[0010] Preferably, the impurity removal component includes an outer hydrocyclone fixedly installed inside the impurity removal box, an inner hydrocyclone fixedly installed inside the outer hydrocyclone, the outer hydrocyclone being connected to the liquid outlet of the hydrocyclone tube, a spiral guide strip for guiding the flow of the original liquid being fixedly installed on the outer hydrocyclone, and a first delivery pipe being fixedly connected to the liquid outlet of the inner hydrocyclone.

[0011] Preferably, the flow-regulating assembly includes a processing chamber fixedly installed inside a cleaning box. A support plate is fixedly installed inside the processing chamber, and several flow-rectifying blades are fixedly installed on the support plate. A first transmission rod is rotatably connected inside the processing chamber. A cross transmission rod is fixedly installed at one end of the first transmission rod. A float is slidably sleeved on the cross transmission rod, and several demisting blades are fixedly installed on the float. Each demisting blade is provided with several tips for piercing bubbles. Several flow-stabilizing plates are fixedly installed at one end of the cross transmission rod.

[0012] Preferably, the cleaning component includes annular slide rails formed on the outer cyclone separator and the inner cyclone separator, a rotating ring slidably connected to each annular slide rail, a plurality of nozzles fixedly installed on each rotating ring, and each nozzle located inside the outer cyclone separator and the inner cyclone separator. A plurality of high-pressure nozzles are fixedly connected to each nozzle, and the direction of the high-pressure nozzles is the same as the direction of the original liquid swirling inside the outer cyclone separator and the inner cyclone separator. Each nozzle is fixedly connected to a rotating pipe. The processing chamber is equipped with a power mechanism, and the impurity removal box is equipped with a collection mechanism for collecting particulate impurities.

[0013] Preferably, the power mechanism includes a second transmission chamber fixedly installed on the processing chamber, one end of the rotating tube extends into the second transmission chamber, a first one-way bearing is fixedly installed on the rotating tube, and the inner ring of the first one-way bearing is fixedly installed on the rotating tube, one end of the first transmission rod extends into the second transmission chamber, a second one-way bearing is fixedly installed on the first transmission rod, and the inner ring of the second one-way bearing is fixedly installed on the first transmission rod. Both the first one-way bearing and the second one-way bearing have sprockets fixedly mounted on their outer rings. The sprockets are driven by a chain. A rotary motor is fixedly mounted on the second transmission chamber. The drive end of the rotary motor is fixedly connected to the outer ring of the second one-way bearing. The liquid outlet of the treatment chamber is equipped with a booster pump, and the liquid outlet of the booster pump is fixedly connected to a second infusion pipe. A three-way solenoid valve is installed on the second infusion pipe, and a third infusion pipe is fixedly connected to the three-way solenoid valve. One end of the third infusion pipe is rotatably connected to a rotary tube.

[0014] Preferably, the collection mechanism includes two slide rails fixedly installed on the impurity removal box, two collection boxes slidably connected on the two slide rails, a sleeve fixedly installed between the two slide rails, a sealing plug slidably connected on the sleeve, the sealing plug being used to block the impurity discharge port of the external cyclone separator, and the sealing plug being axially slidable relative to the impurity discharge port, and a sealing spring fixedly installed between the sleeve and the sealing plug.

[0015] This invention also provides a cyclone impurity removal and anti-clogging method for thin-film evaporators, used in the aforementioned cyclone impurity removal and anti-clogging device for thin-film evaporators, comprising the following steps: S1. The raw solution containing particulate impurities is continuously injected into the cyclone tube installed in the impurity removal box; S2. Start the crushing component inside the hydrocyclone to crush and disperse large particles of impurities in the raw liquid entering the hydrocyclone for pretreatment. S3. The raw liquid after crushing and pretreatment is transported to the impurity removal unit inside the impurity removal box. The solid impurities mixed in the raw liquid are removed by cyclone removal through the impurity removal components in the impurity removal unit. S4. After the impurity removal is completed, the raw liquid flows through the slow-flow component inside the impurity removal unit. The slow-flow component slows down and stabilizes the flow of the high-speed flowing raw liquid. S5. During the operation of the device, the cleaning components inside the impurity removal unit are activated periodically to automatically clean the impurities attached to the inner wall of the impurity removal components, thereby maintaining the device's anti-clogging and impurity removal effect.

[0016] This invention provides a cyclone impurity removal and anti-clogging device and method for thin-film evaporators. It has the following beneficial effects: 1. During the cyclone impurity removal process, this device uses a crushing component inside the cyclone tube. Through the coordinated transmission of the impeller, fixed crushing rod, and rotating crushing rod, it performs high-speed shearing and crushing of large particle clumps and hard impurities inside the raw liquid. This breaks up the agglomerated materials in advance, preventing large particle impurities from clogging the subsequent cyclone structure and pipelines. This effectively solves the equipment blockage problem caused by the agglomeration of impurities in the raw liquid and ensures the continuity of material conveying.

[0017] 2. During the cyclone impurity removal process, this device uses the combination of internal and external double cyclones within the impurity removal unit to perform two-stage fine cyclone impurity removal on the crushed raw liquid. This efficiently separates suspended solid impurities from the raw liquid, significantly improving the material purification accuracy. The purified liquid after impurity removal can be stably supplied to the thin-film evaporator, preventing uneven film distribution and localized coking on the dry wall of the evaporator from the source.

[0018] 3. During the cyclone impurity removal process, this device, through the coordinated operation of the rectifier blades, defoaming blades, and flow stabilizer plate inside the slow-flow component, can actively deswirl, defoam, and homogenize the high-speed swirling purified liquid. It breaks up material bubbles, eliminates fluid vortices and flow velocity fluctuations, and transforms the turbulent flow into a uniform laminar flow, ensuring uniform film formation in the subsequent thin-film evaporator and improving the stability of evaporation and concentration.

[0019] 4. During the cyclone cleaning process, this device achieves automated high-pressure flushing and descaling of the inner wall of the hydrocyclone through the coordinated work of the cleaning components, power mechanism, and collection mechanism. At the same time, it achieves adaptive automatic slag discharge by relying on the weight of the slag and the sealing spring, eliminating the need for manual disassembly and cleaning, greatly reducing the difficulty of operation and maintenance, and enhancing the anti-clogging performance of the equipment.

[0020] In summary, this invention, by employing a combination of crushing pretreatment and two-stage cyclone impurity removal, can break up large particle agglomerates in the raw liquid, preventing blockage of equipment pipelines. The slow-flow component eliminates material eddies and bubbles, homogenizes the flow pattern, and ensures uniform film formation in the evaporator. At the same time, relying on the automatic cleaning and adaptive slag discharge structure, it reduces the difficulty of operation and maintenance, and continuously ensures the anti-clogging and impurity removal effect of the device.

[0021] Other features and advantages of the invention will be set forth in the description which follows, and will be apparent in part from the description, or may be learned by practicing the invention. The objects and other advantages of the invention may be realized and obtained by means of the structures particularly pointed out in the written description and the accompanying drawings. Attached Figure Description

[0022] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, wherein: Figure 1This is a schematic diagram of the structure of a cyclone impurity removal and anti-clogging device for a thin-film evaporator proposed in this invention; Figure 2 for Figure 1 A schematic diagram of the structure after rotation at a certain angle; Figure 3 for Figure 1 Schematic diagram of the internal structure of the impurity removal box; Figure 4 for Figure 3 A schematic diagram of the structure after rotation at a certain angle; Figure 5 for Figure 3 Schematic diagram of the internal structure of the vortex tube; Figure 6 for Figure 5 Schematic diagram of the structure of the medium crushing component; Figure 7 for Figure 3 Schematic diagram of the internal structure of the outer and inner cyclones; Figure 8 for Figure 3 Schematic diagram of the internal structure of the intermediate processing room; Figure 9 for Figure 8 Schematic diagram of the middle cross transmission rod; Figure 10 for Figure 3 Schematic diagram of the internal structure of the second transmission chamber; Figure 11 for Figure 1 A schematic diagram of the collection mechanism.

[0023] In the diagram: 1. Impurity removal box; 2. Controller; 3. Cyclone tube; 4. Impeller; 5. Fixed crushing rod; 6. Rotating crushing rod; 7. First transmission chamber; 8. Outer cyclone; 9. Inner cyclone; 10. Spiral guide bar; 11. First infusion pipe; 12. Treatment chamber; 13. Support plate; 14. Rectifying blade; 15. First transmission rod; 16. Cross transmission rod; 17. Float; 18. Demisting blade; 19. Flow stabilizer; 20. Booster pump; 21. Second infusion pipe; 22. Rotating ring; 23. Rotating pipe; 24. Second transmission chamber; 25. First one-way bearing; 26. Sprocket; 27. Chain; 28. Rotating motor; 29. ​​Three-way solenoid valve; 30. Third infusion pipe; 31. Slide rail; 32. Collection box; 33. Sleeve; 34. Sealing plug; 35. Sealing spring; 36. Nozzle; 37. Second one-way bearing. Detailed Implementation

[0024] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0025] Example 1: Refer to Figures 1-4 A cyclone impurity removal and anti-clogging device for a thin-film evaporator includes a cyclone tube 3 installed on an impurity removal box 1. The impurity removal box 1 is the overall supporting shell of the device, which integrates functional modules such as crushing, cyclone impurity removal, slow flow stabilization, and cleaning slag discharge into the same box. The structure is compact, reduces the number of external pipeline connection points, reduces the risk of leakage, and facilitates overall installation and maintenance. The cyclone tube 3 is the pretreatment channel for the raw liquid to enter the device, which disperses large particles of impurities in advance and avoids large impurities directly impacting the cyclone and causing wear or blockage, thus playing a pre-protection role. In this article, the raw liquid refers to the original liquid to be evaporated before being transported to the thin-film evaporator for impurity removal pretreatment. It is a mixed liquid phase material produced by the pharmaceutical, food, fine chemical, and environmental protection industries. It contains dissolved effective solutes, but also contains various impurities such as solid crystals, coke chips, fibers, hard lumps, and suspended fine particles. When the raw liquid is directly fed into the thin-film evaporator, the internal particles are very likely to clog the membrane holes and the narrow gaps of the scraper. Therefore, it needs to be passed through this device first, and after crushing, two-stage cyclone impurity removal, and flow stabilization treatment, the solid phase impurities are removed and it is transformed into a purified liquid before being sent to the thin-film evaporator to complete the low-temperature concentration and solvent removal processes.

[0026] This impurity removal device also includes: The crushing component is located inside the hydrocyclone 3 and is used to crush large particles of impurities in the raw liquid entering the hydrocyclone 3. The impurity removal unit is located inside the impurity removal box 1 and includes an impurity removal component, a flow slowing component, and a cleaning component; The impurity removal component is used to remove impurities contained in the raw solution, the slowing flow component is used to slow down the flow rate of the raw solution, and the cleaning component is used to clean up residual impurities.

[0027] A controller 2 is fixedly installed on the impurity removal box 1. A PLC controller is fixedly connected to the controller 2. A control panel is fixedly connected to the PLC controller. The control panel and the PLC controller are electrically connected. The control panel controls the start-up, shutdown, and operation status of the crushing and impurity removal units via a PLC controller.

[0028] Example 2: Refer to Figures 3-9 The technical solution that differs from that of Embodiment 1 is as follows: the crushing component includes an impeller 4 rotatably connected inside the cyclone tube 3, a fixed crushing rod 5 is fixedly installed inside the cyclone tube 3, and rotating crushing rods 6 are rotatably connected inside the cyclone tube 3 above and below the fixed crushing rod 5. A first transmission chamber 7 is fixedly installed on the cyclone tube 3. The first transmission chamber 7 provides a sealed protective space for the transmission components to prevent the material liquid from entering and corroding the transmission components. One end of each of the two rotating crushing rods 6 extends into the first transmission chamber 7, and one end of the impeller 4 extends into the first transmission chamber 7. The two rotating crushing rods 6 and the impeller 4 are connected by a transmission belt. The impeller 4 is driven to rotate by the flow pressure of the raw liquid feed. One end extends into the first transmission chamber 7 and drives the rotating crushing rod 6 to rotate synchronously through the transmission belt, providing power to the crushing component. The speed of the impeller 4 can adapt to the feed flow rate. The larger the flow rate, the stronger the crushing. To match different working conditions, the fixed crushing rod 5 and the rotating crushing rod 6 are arranged alternately as fixed cutters for shearing and crushing. They form a shearing gap with the rotating crushing rod 6 to shear and crush large particles of impurities. The upper and lower sets of rotating crushing rods 6, together with the middle fixed crushing rod 5, form a double-layer shearing structure. The material undergoes multiple shearing and crushing processes as it passes through, ensuring that large particles of impurities are fully dispersed. The crushed particles have a uniform particle size, which is beneficial for subsequent cyclone separation.

[0029] In a further embodiment, the impurity removal component includes an outer cyclone separator 8 fixedly installed in the impurity removal box 1, an inner cyclone separator 9 fixedly installed inside the outer cyclone separator 8, the outer cyclone separator 8 being connected to the liquid outlet of the cyclone tube 3, a spiral guide strip 10 for guiding the flow of the original liquid being fixedly installed on the outer cyclone separator 8, and a first liquid delivery pipe 11 being fixedly connected to the liquid outlet of the inner cyclone separator 9. The outer hydrocyclone 8 is the first-stage hydrocyclone separation unit, which efficiently removes solid impurities with larger particle sizes and reduces the processing load of the subsequent inner hydrocyclone 9. The inner hydrocyclone 9 is used to further refine the cyclone impurity removal of the material liquid after the first-stage separation, removing fine particulate suspended impurities. The nested structure of the inner and outer double hydrocyclones realizes two-stage graded impurity removal. A single device can complete coarse separation and fine separation. Compared with two hydrocyclones in series, it occupies less space, has lower pressure loss, and significantly improves the fine particle capture efficiency, resulting in higher discharge purification accuracy. The spiral guide strip 10 is arranged spirally along the axial direction to guide the raw liquid entering the external cyclone separator 8 to flow along a set trajectory, forming a stable and orderly cyclone field, avoiding interference from feed turbulence with the cyclone effect, and improving the sedimentation and separation efficiency of large particle impurities. It is especially suitable for the cyclone separation of high viscosity materials. The first liquid delivery pipe 11 is used to transport the purified liquid after the two-stage cyclone impurity removal to the slow flow component for subsequent anti-cyclone and flow stabilization treatment.

[0030] In a further embodiment, the flow control assembly includes a processing chamber 12 fixedly installed inside the impurity removal box 1. A support plate 13 is fixedly installed inside the processing chamber 12. Several flow straightening blades 14 are fixedly installed on the support plate 13. A first transmission rod 15 is rotatably connected inside the processing chamber 12. A cross transmission rod 16 is fixedly installed at one end of the first transmission rod 15. A float 17 is slidably sleeved on the cross transmission rod 16. Several demisting blades 18 are fixedly installed on the float 17. Each demisting blade 18 is provided with several tips for puncturing bubbles. Several flow stabilizing plates 19 are fixedly installed at one end of the cross transmission rod 16. The processing chamber 12 is used to provide a processing space for the purified liquid to deswirl, demister, and stabilize the flow. The high-speed vortex of the swirling discharge is rectified and homogenized in the closed cavity, and the turbulent rotating flow is transformed into a stable laminar flow before being output. It is directly connected to the film distribution device of the thin film evaporator to ensure uniform film formation. The support plate 13 is used to support the installation of the rectifier blades 14. The blade direction of the rectifier blades 14 is orthogonal to the swirling direction of the liquid. It guides and rectifies the high-speed rotating liquid, converts the circumferential swirling kinetic energy into axial flow, eliminates the swirling vortex, and fundamentally solves the problem of film distribution deviation caused by the swirling discharge. The cross-shaped transmission rod 16 has a cross-shaped cross section structure, which provides a sliding guide track for the float 17 and transmits torque to drive the float 17 and the demister blade 18 to rotate synchronously. The cross structure can transmit torque and realize the axial sliding of the float 17, so that the demister blade 18 can adaptively rise and fall with the liquid level and always maintain the best demister position on the liquid surface to adapt to the flow fluctuation conditions. The float 17 relies on buoyancy to slide up and down along the cross transmission rod 16 according to the liquid level in the treatment chamber 12, so as to realize the liquid level adaptive tracking of the demister blade 18. Regardless of the feed flow rate or the liquid level, the demister blade 18 is always near the liquid surface and works efficiently, avoiding idling when the liquid level is low or submerged and failing when the liquid level is high, and the demister stability is good. When the defoaming blades 18 rotate, they cut and break the foam on the liquid surface, eliminating air bubbles in the liquid and preventing them from entering the thin film evaporator and causing flow interruption in the film pores and coking on the dry wall. This improves the quality of evaporation and film formation and operational stability. The flow stabilizing plate 19 further agitates the liquid after passing through the rectifier blades 14, eliminating local flow velocity differences, making the discharge flow velocity uniform and stable, reducing discharge pulsation, providing a stable feed velocity for the thin film evaporator, and ensuring uniform film thickness.

[0031] Example 3: Refer to Figures 7-8 as well as Figures 10-11 The difference between this embodiment and embodiment two is that the cleaning component includes annular slide rails opened on the outer cyclone 8 and the inner cyclone 9. A rotating ring 22 is slidably connected on each annular slide rail. A plurality of nozzles 36 are fixedly installed on each rotating ring 22. Each nozzle 36 is located inside the outer cyclone 8 and the inner cyclone 9. A plurality of high-pressure nozzles are fixedly connected to each nozzle 36. The direction of the high-pressure nozzles is the same as the direction of the original liquid swirling in the outer cyclone 8 and the inner cyclone 9. Each nozzle 36 is fixedly connected to a rotating pipe 23. The rotating ring 22 rotates on the annular slide rails on the outer hydrocyclone 8 and the inner hydrocyclone 9, driving the nozzle 36 to rotate circumferentially along the annular slide rails. This allows the high-pressure flushing nozzle to rotate circumferentially along the inner wall of the hydrocyclone, resulting in a wider flushing coverage area with no dead corners. This ensures that impurities attached to all parts of the inner wall of the hydrocyclone can be effectively flushed away. The nozzle 36 is equipped with several high-pressure nozzles, with the direction of the high-pressure nozzles being the same as the direction of the original liquid swirling. After the liquid is supplied by the rotating pipe 23, high-pressure water is sprayed to flush the inner wall of the hydrocyclone. The high-pressure nozzles spray in the direction of the swirling flow, and the flushing water flow and the swirling field are superimposed in the same direction, resulting in a stronger flushing force. This effectively removes stubborn impurities and scale attached to the cavity wall, resulting in thorough cleaning without residue. The rotating pipe 23 is used to realize the rotational transport and distribution of the flushing liquid. While transporting the high-pressure flushing liquid, it rotates itself to drive the nozzle 36 to rotate.

[0032] In a further embodiment, a power mechanism is provided on the processing chamber 12. The power mechanism includes a second transmission chamber 24 fixedly installed on the processing chamber 12. The second transmission chamber 24 is used to provide a sealed installation space for the shared transmission system of the cleaning component and the slow-flow component. One end of the rotating pipe 23 extends into the second transmission chamber 24. A first one-way bearing 25 is fixedly installed on the rotating pipe 23, and the inner ring of the first one-way bearing 25 is fixedly installed on the rotating pipe 23. One end of the first transmission rod 15 extends into the second transmission chamber 24. A second one-way bearing 37 is fixedly installed on the first transmission rod 15, and the inner ring of the second one-way bearing 37 is fixedly installed on the first transmission rod 15. Both the outer rings of the first one-way bearing 25 and the second one-way bearing 37 are fixedly mounted with sprockets 26. The sprockets 26 are driven by a chain 27. A rotary motor 28 is fixedly mounted on the second transmission chamber 24. The drive end of the rotary motor 28 is fixedly connected to the outer ring of the second one-way bearing 37. When the rotating motor 28 is running in the forward direction, the power drives the outer ring of the second one-way bearing 37 to rotate synchronously in the forward direction, while the inner ring of the second one-way bearing 37 rotates idly and does not drive the first transmission rod 15 to rotate. The power is transmitted to the outer ring of the first one-way bearing 25 through the sprocket 26 and the chain 27. The inner ring of the first one-way bearing 25 rotates synchronously with the outer ring, thereby driving the rotating tube 23, the rotating ring 22 and the nozzle 36 to rotate circumferentially, completing the automatic flushing operation of the inner wall of the hydrocyclone. When the rotating motor 28 runs in reverse, the outer ring of the second one-way bearing 37 rotates in the opposite direction and locks the inner ring, driving the first transmission rod 15 and the cross transmission rod 16 to run synchronously, realizing the active flow stabilization and desmearing of the defoaming blades 18 and the flow stabilizer 19. At this time, the outer ring of the first one-way bearing 25 rotates synchronously with the chain 27, its inner ring spins freely, the rotating tube 23 remains stationary, and the cleaning components do not work. The two mechanisms rely on the one-way locking characteristics of the two sets of one-way bearings to share the rotating motor 28 and run independently in a time-sharing manner, without the need to configure two independent drive sources.

[0033] A booster pump 20 is installed at the outlet of the treatment chamber 12. The outlet of the booster pump 20 is fixedly connected to a second infusion pipe 21. A three-way solenoid valve 29 is installed on the second infusion pipe 21. A third infusion pipe 30 is fixedly connected to the three-way solenoid valve 29. One end of the third infusion pipe 30 is rotatably connected to the rotating pipe 23. The booster pump 20 pressurizes and delivers the purified liquid after slow-flow treatment, ensuring stable discharge pressure and meeting the feed pressure requirements of the thin-film evaporator. It compensates for pressure loss during the swirling and slow-flowing process, ensuring stable and controllable discharge pressure. This avoids insufficient feed to the evaporator and uneven film distribution due to insufficient pressure loss, thus improving the overall operational stability of the system. The second liquid delivery pipe 21 is the main output pipe for the purified liquid, delivering the treated purified liquid to the feed end of the thin-film evaporator. The three-way solenoid valve 29 is controlled by the controller 2 to switch on and off. During normal discharge, the main passage of the second liquid delivery pipe 21 is opened. During cleaning operations, the third liquid delivery pipe 30 is switched on to introduce the purified liquid into the third liquid delivery pipe 30. The third liquid delivery pipe 30 serves as the flushing liquid delivery pipe during cleaning operations, delivering the high-pressure flushing liquid to the rotating tube 23 and then distributing it to each spray nozzle 36.

[0034] In a further embodiment, the impurity removal box 1 is provided with a collection mechanism for collecting particulate impurities. The collection mechanism includes two slide rails 31 fixedly installed on the impurity removal box 1. Two collection boxes 32 are slidably connected on the two slide rails 31. A sleeve 33 is fixedly installed between the two slide rails 31. A sealing plug 34 is slidably connected on the sleeve 33. The sealing plug 34 is used to block the discharge port of the external cyclone separator 8. The sealing plug 34 can slide axially relative to the discharge port. A sealing spring 35 is fixedly installed between the sleeve 33 and the sealing plug 34. The slide rail 31 provides a sliding mounting track for the collection box 32, allowing the collection box 32 to be pulled out and pushed in along the slide rail 31 for easy cleaning of collected impurities. The collection box 32 is located below the discharge port of the outer hydrocyclone 8 and the inner hydrocyclone 9, and is used to receive and collect solid impurities and slurry discharged from the bottom of the hydrocyclone. The sleeve 33 is used to provide a sliding guide and mounting base for the sealing plug 34. The sealing plug 34 is used to block the discharge port of the outer hydrocyclone 8 and can slide axially relative to the discharge port. When the slurry at the bottom accumulates to a certain amount and the pressure exceeds the elastic force of the sealing spring 35, the sealing plug 34 is pushed open to automatically discharge the slag.

[0035] The specific working principle of this impurity removal device is as follows: The raw liquid is continuously injected from the upper inlet of the hydrocyclone tube 3. Relying on the flow pressure of the feed itself, it impacts the impeller 4, driving the impeller 4 to rotate at high speed. One end of the impeller 4 extends into the first transmission chamber 7, and drives the upper and lower rotating crushing rods 6 to rotate synchronously through the transmission belt. The rotating crushing rods 6 and the fixed crushing rods 5 installed in the middle are arranged alternately to form a multi-layer shearing gap. When the raw liquid flows downward through the crushing area, the large particles, hard impurities, fiber clumps and other impurities mixed in are repeatedly sheared, impacted and dispersed by the rotating crushing rods 6 and the stationary fixed crushing rods 5, breaking the large agglomerates into fine particles. The structure of the upper and lower double-layer rotating crushing rods 6 and the middle fixed crushing rods 5 makes the material undergo multiple shearings when it passes through, ensuring that large particles of impurities are fully crushed to the appropriate particle size range for hydrocyclone separation, and avoiding large impurities from directly entering the hydrocyclone and causing wear or blockage of the slag discharge port. The pre-treated raw liquid enters the outer hydrocyclone 8 from the lower end of the hydrocyclone tube 3. It spirals downwards along the spiral guide strips 10 on the inner wall of the outer hydrocyclone 8, forming a stable primary swirling field. Under centrifugal force, large, dense solid particles are thrown towards the cavity wall and spiral downwards to the bottom collection area of ​​the outer hydrocyclone 8. Meanwhile, the relatively clear liquid converges towards the center and rises. The spiral guide strips 10 effectively regulate the feed flow, preventing turbulent flow from interfering with the swirling field. This is especially effective for high-viscosity materials, maintaining a stable centrifugal force field. The outer hydrocyclone 8 is used to ensure efficient separation of large particles. The liquid after primary coarse separation enters the inner hydrocyclone 9 nested inside from the central area of ​​the outer hydrocyclone 8. A secondary cyclone field is formed in the inner hydrocyclone 9 to further refine the separation of fine suspended impurities that could not be removed by the primary separation. Under the action of the stronger centrifugal force field in the secondary stage, the fine particles continue to settle to the bottom of the inner hydrocyclone 9 and fall into the collection area below through the bottom discharge port. The deeply purified liquid flows out from the top outlet of the inner hydrocyclone 9 and is transported to the slow flow component through the first liquid delivery pipe 11. After the purified liquid is removed by the two-stage cyclone, it enters the treatment chamber 12 through the first liquid delivery pipe 11. It first flows through the rectifier blades 14 arranged in an array on the support plate 13. The blade direction of the rectifier blades 14 is orthogonal to the cyclone direction of the liquid, which gradually converts the circumferential cyclone kinetic energy of the high-speed rotating fluid into axial flow kinetic energy, passively eliminates the cyclone, and rectifies the turbulent cyclone state into axial laminar flow, fundamentally solving the problem of film distribution deviation caused by the cyclone in the discharge zone. During normal operation, the rotating motor 28 is in reverse. Power is transmitted to the first transmission rod 15 via the second one-way bearing 37, which drives the cross transmission rod 16, float 17, demister blades 18 and flow stabilizer 19 to rotate synchronously at low speed. The float 17 slides up and down along the cross transmission rod 16 according to the liquid level in the treatment chamber 12, so that the demister blades 18 fixed on the float 17 are always in the optimal working position near the liquid surface. When the demister blades 18 rotate, the tips on the blades continuously cut and puncture the foam on the liquid surface, effectively eliminating the bubbles generated during the swirling and conveying process of the liquid, and preventing the bubbles from entering the evaporator and causing the membrane holes to be cut off and the dry wall to coke. The flow stabilizer 19 at the lower end of the cross transmission rod 16 rotates synchronously at low speed, further uniformly stirring the liquid after the initial rectification by the rectifier blades 14, eliminating local flow velocity differences, reducing discharge pulsation, and making the final discharge flow velocity uniform and stable. After being treated by deswirl, defoaming, and flow stabilization, the purified liquid flows out from the bottom outlet of the treatment chamber 12 and enters the booster pump 20. The booster pump 20 pressurizes the liquid to compensate for the pressure loss during the swirling separation and slow flow treatment, ensuring that the discharge pressure is stable and controllable and meets the feed pressure requirements of the thin film evaporator. The pressurized purified liquid is output to the outside through the second delivery pipe 21. At this time, the three-way solenoid valve 29 opens the main passage, and the purified liquid is directly delivered to the feed film distribution device of the thin film evaporator, providing the evaporator with a clean, uniform flow rate, no bubbles, and no swirling stable feed, ensuring that the evaporator forms a uniform film and operates stably. When the device needs cleaning, the three-way solenoid valve 29 switches to connect the third infusion tube 30, and simultaneously the motor 28 rotates in the forward direction. The outer ring of the second one-way bearing 37 rotates in the forward direction, but the inner ring spins freely. The first transmission rod 15 remains stationary, the slow-flow component does not work, and the power is transmitted through the sprocket 26 and chain 27 to the outer ring of the first one-way bearing 25. The first one-way bearing 25 locks and drives the inner ring and the rotating tube 23 to rotate synchronously. The rotating tube 23 drives the rotating ring 22 to rotate along the rings on the outer cyclone separator 8 and the inner cyclone separator 9. The circumferential rotation of the slide rail drives each nozzle 36 to rotate along the hydrocyclone. At this time, the high-pressure purified liquid output by the booster pump 20 enters the rotating tube 23 through the third liquid delivery pipe 30, and is then distributed to each nozzle 36. It is sprayed out from the high-pressure nozzle on the nozzle 36 in the direction of the swirling flow. The high-pressure jet and the swirling flow field are superimposed in the same direction, resulting in a stronger scouring force. Combined with the circumferential rotation of the nozzle 36, the inner wall of the hydrocyclone is subjected to all-round, no dead angle high-pressure flushing, which removes the stubborn impurities and scale attached to the cavity wall. Solid impurities separated by the outer hydrocyclone 8 and the inner hydrocyclone 9 continuously settle to the bottom discharge port. During normal operation, the elastic force of the sealing spring 35 pushes the sealing plug 34 to tightly seal the discharge port, maintaining the stability of the internal pressure field of the hydrocyclone and ensuring the hydrocyclone separation effect. As the slurry at the bottom continues to accumulate, the pressure of the slurry column gradually increases. When the slurry pressure exceeds the pre-tightening force of the sealing spring 35, the slurry thrust pushes the sealing plug 34 to slide outward along the sleeve 33 axially, opening the discharge port and automatically discharging the concentrated slurry. After discharge, the bottom pressure decreases, and the sealing spring 35 pushes the sealing plug 34 to reset, resealing the discharge port. The discharged slurry falls into the collection box 32 below for centralized collection. During cleaning, simply pull out the collection box 32 along the slide rail 31 and empty it.

[0036] This invention also provides a cyclone impurity removal and anti-clogging method for thin-film evaporators, used in the aforementioned cyclone impurity removal and anti-clogging device for thin-film evaporators, comprising the following steps: S1. The raw liquid to be treated containing particulate impurities is continuously injected into the cyclone tube 3 installed in the impurity removal box 1; S2. Start the crushing component inside the hydrocyclone 3 to crush and disperse large particles of impurities in the raw liquid entering the hydrocyclone 3 for pretreatment. S3. The raw liquid after crushing and pretreatment is transported to the impurity removal unit inside the impurity removal box 1. The solid impurities mixed in the raw liquid are removed by cyclone removal through the impurity removal components in the impurity removal unit. S4. After the impurity removal is completed, the raw liquid flows through the slow-flow component inside the impurity removal unit. The slow-flow component slows down and stabilizes the flow of the high-speed flowing raw liquid. S5. During the operation of the device, the cleaning components inside the impurity removal unit are activated periodically to automatically clean the impurities attached to the inner wall of the impurity removal components, thereby maintaining the device's anti-clogging and impurity removal effect.

[0037] The above are merely preferred embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A cyclone impurity removal and anti-clogging device for a thin-film evaporator, comprising a cyclone tube (3) disposed on an impurity removal box (1), characterized in that, Also includes: The crushing component is installed inside the cyclone tube (3). The crushing component is used to crush large particles of impurities in the raw liquid entering the cyclone tube (3). The impurity removal unit is located inside the impurity removal box (1) and includes an impurity removal component, a flow control component and a cleaning component; The impurity removal component is used to remove impurities contained in the raw solution, the slowing flow component is used to slow down the flow rate of the raw solution, and the cleaning component is used to clean up residual impurities.

2. The cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 1, characterized in that, A controller (2) is fixedly installed on the impurity removal box (1), a PLC controller is fixedly connected to the controller (2), a control panel is fixedly connected to the PLC controller, and the control panel and the PLC controller are electrically connected. The control panel controls the start-up, shutdown, and operation status of the crushing component and the impurity removal unit via a PLC controller.

3. The cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 1, characterized in that, The crushing assembly includes an impeller (4) rotatably connected inside a cyclone tube (3). A fixed crushing rod (5) is fixedly installed inside the cyclone tube (3). Rotating crushing rods (6) are rotatably connected inside the cyclone tube (3) and above and below the fixed crushing rod (5). A first transmission chamber (7) is fixedly installed on the cyclone tube (3). One end of each of the two rotating crushing rods (6) extends into the first transmission chamber (7). One end of the impeller (4) extends into the first transmission chamber (7). The two rotating crushing rods (6) and the impeller (4) are connected by a transmission belt.

4. The cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 3, characterized in that, The impurity removal assembly includes an outer cyclone (8) fixedly installed in the impurity removal box (1), an inner cyclone (9) fixedly installed inside the outer cyclone (8), the outer cyclone (8) being connected to the outlet of the cyclone tube (3), a spiral guide strip (10) for guiding the flow of the original liquid being fixedly installed on the outer cyclone (8), and a first delivery pipe (11) being fixedly connected to the outlet of the inner cyclone (9).

5. A cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 4, characterized in that, The slow-flow assembly includes a processing chamber (12) fixedly installed inside a cleaning box (1). A support plate (13) is fixedly installed inside the processing chamber (12). Several flow straighteners (14) are fixedly installed on the support plate (13). A first transmission rod (15) is rotatably connected inside the processing chamber (12). A cross transmission rod (16) is fixedly installed at one end of the first transmission rod (15). A float (17) is slidably sleeved on the cross transmission rod (16). Several demisting blades (18) are fixedly installed on the float (17). Each demisting blade (18) is provided with several tips for piercing bubbles. Several flow stabilizers (19) are fixedly installed at one end of the cross transmission rod (16).

6. The cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 5, characterized in that, The cleaning assembly includes annular slide rails on the outer cyclone separator (8) and the inner cyclone separator (9). A rotating ring (22) is slidably connected to each annular slide rail. Several nozzles (36) are fixedly installed on each rotating ring (22). Each nozzle (36) is located inside the outer cyclone separator (8) and the inner cyclone separator (9). Several high-pressure nozzles are fixedly connected to each nozzle (36). The direction of the high-pressure nozzles is the same as the direction of the original liquid swirling inside the outer cyclone separator (8) and the inner cyclone separator (9). Each nozzle (36) is fixedly connected to a rotating pipe (23). The processing chamber (12) is equipped with a power mechanism, and the impurity removal box (1) is equipped with a collection mechanism for collecting particulate impurities.

7. A cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 6, characterized in that, The power mechanism includes a second transmission chamber (24) fixedly installed on the processing chamber (12), one end of the rotating tube (23) extending into the second transmission chamber (24), a first one-way bearing (25) fixedly installed on the rotating tube (23), and the inner ring of the first one-way bearing (25) fixedly installed on the rotating tube (23), one end of the first transmission rod (15) extending into the second transmission chamber (24), a second one-way bearing (37) fixedly installed on the first transmission rod (15), and the inner ring of the second one-way bearing (37) fixedly installed on the first transmission rod (15); Both the first one-way bearing (25) and the second one-way bearing (37) have sprockets (26) fixedly installed on their outer rings. The sprockets (26) are driven by a chain (27). A rotary motor (28) is fixedly installed on the second transmission chamber (24). The drive end of the rotary motor (28) is fixedly connected to the outer ring of the second one-way bearing (37). The processing chamber (12) is equipped with a booster pump (20) at its outlet. The outlet of the booster pump (20) is fixedly connected to a second infusion pipe (21). A three-way solenoid valve (29) is installed on the second infusion pipe (21). A third infusion pipe (30) is fixedly connected to the three-way solenoid valve (29). One end of the third infusion pipe (30) is rotatably connected to the rotating pipe (23).

8. A cyclone impurity removal and anti-clogging device for a thin-film evaporator according to claim 6, characterized in that, The collection mechanism includes two slide rails (31) fixedly installed on the impurity removal box (1). Two collection boxes (32) are slidably connected on the two slide rails (31). A sleeve (33) is fixedly installed between the two slide rails (31). A sealing plug (34) is slidably connected on the sleeve (33). The sealing plug (34) is used to block the discharge port of the external cyclone separator (8), and the sealing plug (34) can slide axially relative to the discharge port. A sealing spring (35) is fixedly installed between the sleeve (33) and the sealing plug (34).

9. A cyclone impurity removal and anti-clogging method for a thin-film evaporator, used in the cyclone impurity removal and anti-clogging device for a thin-film evaporator as described in any one of claims 1-8, characterized in that, Includes the following steps: S1. The raw liquid containing particulate impurities is continuously injected into the cyclone tube (3) set in the impurity removal box (1); S2. Start the crushing component inside the cyclone tube (3) to crush and disperse large particles of impurities in the raw liquid entering the cyclone tube (3) for pretreatment. S3. The raw liquid after crushing and pretreatment is transported to the impurity removal unit inside the impurity removal box (1). The solid impurities mixed in the raw liquid are removed by swirling through the impurity removal components in the impurity removal unit. S4. After the impurity removal is completed, the raw liquid flows through the slow-flow component inside the impurity removal unit. The slow-flow component slows down and stabilizes the flow of the high-speed flowing raw liquid. S5. During the operation of the device, the cleaning components inside the impurity removal unit are activated periodically to automatically clean the impurities attached to the inner wall of the impurity removal components, thereby maintaining the device's anti-clogging and impurity removal effect.

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