ICP plasma cleaning apparatus

Abstract

The application belongs to the technical field of plasma etching and ion implantation, and particularly relates to an ICP plasma cleaning device. The application is characterized in that a transverse plasma is fixed inside a bearing drum, and the plasma can directively spray a plasma beam, so that the plasma can directly act on the bulk workpiece without penetrating the micropores of the bearing drum, thereby greatly improving the utilization rate of the plasma beam. Meanwhile, a plurality of material ribs are circumferentially and equidistantly distributed on the inner wall of the bearing drum, the material ribs can lift the bulk workpiece to the spraying area of the plasma, and the positive and negative rotation reciprocating swing of the bearing drum can realize multi-angle turning of the bulk workpiece, so as to eliminate the processing blind area to the greatest extent, thereby significantly improving the etching uniformity of the plasma and the ion implantation depth, and meeting the surface modification and cleaning requirements of the precision bulk workpiece.

Description

Technical Field

[0001] This invention belongs to the field of plasma etching and ion implantation technology, specifically relating to ICP plasma cleaning equipment. Background Technology

[0002] ICP plasma cleaning equipment is a type of low-temperature vacuum processing equipment. It uses radio frequency coil electromagnetic induction to generate high-density plasma within a sealed vacuum chamber to clean workpieces, offering advantages such as no electrode contamination, uniform plasma, and low-temperature processing. Since ordinary ICP plasma cleaning equipment can only handle large, fixed workpieces, the industry has developed drum-type plasma cleaning equipment to meet the batch processing needs of small, scattered workpieces. This equipment uses drums to carry the workpieces, enabling batch processing of small, scattered workpieces.

[0003] In related technologies, drum-type plasma cleaning equipment mainly consists of a frame shell, a vacuum chamber, an ICP discharge mechanism, a vacuum pump, gas path components, and a transmission mechanism. The drum, housed within the vacuum chamber via the transmission mechanism, has multiple through-holes and serves as a support for loose workpieces. In practical use, after placing the workpieces inside the drum, the vacuum pump evacuates the chamber, then introduces process gas and ionizes it to generate plasma, thus cleaning the workpieces. Simultaneously, the transmission mechanism drives the drum and the workpieces inside to rotate synchronously, achieving comprehensive cleaning.

[0004] However, since plasma needs to pass through the screen holes of the drum to enter its interior in order to contact the loose workpieces, there are problems such as low plasma utilization, poor etching uniformity, and uncontrollable ion implantation depth. This can easily lead to blind spots on the surface of the loose workpieces and result in poor cleaning and modification effects. Summary of the Invention

[0005] The purpose of this invention is to provide an ICP plasma cleaning device to solve the problems of low plasma utilization, poor etching uniformity, and uncontrollable ion implantation depth in related ICP plasma cleaning devices.

[0006] The specific technical solution adopted by this invention is as follows: ICP plasma cleaning equipment includes a vacuum supply assembly, a plasma generation assembly, a process gas path assembly, and an electrical control assembly, and also includes: The shell contains a vacuum chamber, and the outer wall of the vacuum chamber is hinged and sealed with a door, which is connected to the vacuum supply assembly, the process gas path assembly and the plasma generation assembly respectively. The bearing roller is rotatably mounted inside the vacuum chamber via a transmission mechanism. It has a feed port at its first end and several material-carrying ribs evenly distributed around its inner wall, each of which extends axially. The bearing roller also has a clearance hole at its second end, which extends circumferentially. The plasma is fixedly placed horizontally inside the support roller, and its jetting end extends into the interior of the support roller through the clearance hole; the plasma is connected to the plasma generating assembly and is used to output plasma to achieve workpiece surface cleaning, plasma etching and ion implantation modification.

[0007] In some possible implementations, a limiting ring is fixed at the second end of the bearing roller. The limiting ring is coaxially arranged with the cylinder body of the bearing roller and welded together by a fixed arm. The two together form the clearance hole. The plasma also includes a flange and a connecting rod. The flange is fixedly disposed on the inner wall of the housing, and the connecting rod passes through the clearance hole and is fixedly connected to the flange, and is located on the side of the transmission mechanism to realize the suspension and horizontal fixation of the plasma.

[0008] In some possible implementations, the transmission mechanism includes a drive motor, a coupling, a driving gear, and a driven gear; The drive motor is fixedly installed inside the housing, and its output end is connected to the drive gear through a coupling. The driven gear is rotatably installed on the inner wall of the vacuum chamber and meshes with the drive gear. It is fixedly connected to the second end of the bearing roller through four main shafts, so as to drive the bearing roller to swing back and forth along the clearance hole under the forward and reverse rotation of the drive motor.

[0009] In some possible implementations, two sets of rollers are symmetrically arranged on the bottom plate inside the vacuum chamber. Each set of rollers includes a bearing seat and a roller body. The roller body supports the bottom sides of the bearing roller to achieve stable rotational support for the bearing roller.

[0010] In some possible implementations, the plasma includes a plasma cavity and a plurality of spray guns, the plasma cavity being connected to the plasma generating assembly, and the plurality of spray guns being fixed at intervals to the sidewalls of the plasma cavity and facing the interior of the support roller, for directional jetting of plasma beams.

[0011] Among some possible implementation methods, a pusher plate is also included; The pusher plate is a non-circular arc-shaped plate structure with a circumferential angle of less than 360°. The pusher plate is slidably assembled inside the bearing roller, and its circumferential edge is slidably engaged with the material strip rib. Its radial dimension does not exceed the inner edge of the clearance hole. It is used to push loose workpieces out along the axial direction.

[0012] In some possible implementations, each of the material strip ribs is a hollow structure with an axial groove at its bottom; The bottom edge of the pusher plate is circumferentially fixed with a T-shaped part that is adapted to the axial groove. The T-shaped part is slidably embedded in the axial groove to achieve axial guidance of the pusher plate.

[0013] In some possible implementations, each of the material-carrying ribs is equipped with a traction rope, one end of which is fixedly connected to the T-shaped piece, and the other end extends to the outside of the bearing roller, for pulling the pusher plate to slide axially to push the loose workpiece out of the material.

[0014] In some possible implementations, the inner wall of the groove of each of the material-carrying ribs is a mirror-polished surface, and the pusher plate and the T-shaped part are wrapped with a graphite copper sleeve or a PTFE polytetrafluoroethylene bushing, which achieve low-friction sliding assembly through clearance fit.

[0015] In some possible implementations, the height of each of the material strip ribs is 1 / 5 to 1 / 8 of the radius of the bearing roller, and its axial length is consistent with the length of the bearing roller.

[0016] The technical effects achieved by this invention are as follows: This invention utilizes a horizontally fixed plasma chamber inside a support roller, allowing for directional plasma beam injection. This enables the plasma to act directly on the workpiece without penetrating the micropores of the support roller, significantly improving the utilization rate of the plasma beam. Simultaneously, several circumferentially spaced ribs on the inner wall of the support roller elevate the workpiece to the plasma injection area. These ribs, combined with the reciprocating oscillation of the support roller, enable multi-angle rotation of the workpiece, minimizing processing blind spots and significantly improving the uniformity of plasma etching and ion implantation depth. This meets the surface modification and cleaning requirements of precision workpieces. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of the ICP plasma cleaning equipment provided by the present invention; Figure 2 yes Figure 1 A side structural sectional view; Figure 3 yes Figure 1 Schematic diagram of the drive mechanism; Figure 4 yes Figure 3 A schematic diagram of the front structure of the load-bearing roller; Figure 5 This is a schematic diagram of the assembly of the passive gear and the bearing roller in the ICP plasma cleaning equipment provided by the present invention; Figure 6 yes Figure 5 Exploded view of the driven gear and the load-bearing roller; Figure 7 yes Figure 5 A schematic diagram of the second end of the middle bearing roller and its assembly with the plasma; Figure 8 yes Figure 7 A schematic diagram of the plasma assembly; Figure 9 This is a schematic diagram of the structure of the rib with material in another embodiment of the present invention; Figure 10 This is an assembly diagram of the pusher plate in another embodiment of the present invention; Figure 11 yes Figure 10 A schematic diagram of the structure of the pusher plate.

[0018] The attached diagram lists the components represented by each number as follows: 100. Shell; 110. Vacuum chamber; 120. Door; 200, Carrying roller; 210, Feed inlet; 220, Main shaft; 230, Limiting ring; 240, Clearance hole; 250, Fixed arm; 300. Ribs with material attached; 310. Slide groove; 400, Plasma; 410, Spray gun; 420, Flange; 430, Connecting rod; 500. Drive motor; 510. Coupling; 520. Drive gear; 530. Driven gear; 600. Idler roller; 610. Bearing housing; 700. Push plate; 710. T-shaped part; 800. Towing rope. Detailed Implementation

[0019] To make the objectives and advantages of this invention clearer, the invention will be specifically described below with reference to embodiments. It should be understood that the following text is merely used to describe one or more specific embodiments of the invention and does not strictly limit the scope of protection specifically claimed by the invention.

[0020] like Figure 1-8As shown, this invention provides an ICP plasma cleaning device, which mainly consists of a housing 100, a vacuum chamber 110, a carrying roller 200, a plasma jetting assembly, a vacuum supply assembly, a plasma generating assembly, a process gas path, and an electrical measurement and control assembly. The overall structure is a cabinet. The housing 100 is a rectangular sealed cabinet made of metal, possessing electromagnetic shielding and vacuum sealing capabilities. Its interior is divided into a vacuum zone, a power transmission zone, and a control zone. The vacuum zone of the housing 100 contains the vacuum chamber 110. A door 120 is hinged to the side wall of the vacuum chamber 110, and a fluororubber sealing ring can be embedded in the edge of the door 120 to ensure the airtightness of the vacuum chamber 110 when closed. The top of the vacuum chamber 110 is connected to the vacuum pipeline of the vacuum supply assembly and the inlet pipe of the process gas path assembly. The outer wall is surrounded by the induction coil of the plasma generating assembly, forming the excitation chamber of the vacuum plasma 400.

[0021] The vacuum supply assembly consists of a mechanical pump, vacuum piping, and a Pirani vacuum gauge. The mechanical pump is connected to the vacuum chamber 110 via the vacuum piping, and the vacuum gauge monitors the vacuum level in real time, maintaining the pressure inside the vacuum chamber 110 at 1~10 Pa. The plasma generation assembly consists of a 13.56MHz radio frequency power supply, an induction coil, and a matching device. The induction coil surrounds the outer wall of the vacuum chamber 110, and the radio frequency power supply outputs radio frequency energy, which excites the process gas inside the vacuum chamber 110 through electromagnetic induction to form a high-density plasma 400. The process gas path assembly consists of three inlet pipes for oxygen, argon, and nitrogen, a mass flow meter, and a solenoid valve, which can precisely control the flow rate and ratio of the process gas. The electrical measurement and control assembly consists of a PLC controller, a touch panel, pressure sensors, and position sensors, used to achieve fully automated control of the entire process of equipment vacuuming, gas supply, plasma excitation, and rotation of the carrying roller 200.

[0022] The basic structure and composition of the ICP plasma cleaning equipment are well known to those skilled in the art, and will not be described in detail here.

[0023] The support roller 200 is a cylindrical porous cylinder with uniformly distributed micropores of 2-5 mm in diameter to prevent workpiece leakage and ensure that the plasma beam 400 can penetrate. The support roller 200 is laterally rotatably arranged inside the vacuum chamber 110. Its first end is provided with a feed port 210 for workpiece loading, and an arc-shaped guide clearance hole 240 is formed at its first end, which provides clearance space for the plasma 400.

[0024] like Figures 5-8As shown, a number of material-carrying ribs 300 are fixedly and equidistantly arranged on the inner wall of the carrying roller 200. Each material-carrying rib 300 is an axially extending elongated structure, and its axial length can be consistent with the length of the carrying roller 200. The material-carrying ribs 300 can lift loose workpieces inside the carrying roller 200 to the plasma spraying area. Specifically, the height of each material-carrying rib 300 is 1 / 5 to 1 / 8 of the radius of the carrying roller 200, and its axial length is consistent with the length of the carrying roller 200. This not only stably lifts the loose workpieces to the plasma spraying area but also avoids jamming and accumulation of the loose workpieces, thus ensuring smooth workpiece tumbling. Simultaneously, it also improves the contact efficiency between the plasma 400 and the loose workpieces, adapting to the batch processing needs of small loose workpieces of different sizes.

[0025] In this embodiment, the plasma 400 is suspended horizontally inside the support roller 200. Preferably, one end of the plasma 400 is fixedly connected to a connecting rod 430, which laterally passes through an avoidance hole 240, and its end is fixedly connected to the inner wall of the vacuum chamber 110 via a flange 420. The plasma 400 includes a plasma 400 chamber and several spray guns 410. The plasma 400 chamber is connected to a plasma generating assembly, and the several spray guns 410 are fixedly spaced on the sidewall of the plasma 400 chamber and face the interior of the support roller 200, and are used to directionally spray a plasma 400 beam.

[0026] The following is combined with Figures 1-8 The working principle and process of the ICP plasma cleaning equipment provided by this invention are described.

[0027] 1. Working principle: This invention is based on the principle of radio frequency inductively coupled plasma 400 excitation, the physical sputtering and chemical reaction mechanism of plasma 400, and the principle of directional plasma etching and controllable ion implantation. By exciting high-density low-temperature plasma 400 in a vacuum environment, the workpiece is lifted by the material rib 300, the plasma jet assembly is used for directional jetting, and the drum swings back and forth, so as to achieve the removal of oil and residual adhesive on the workpiece surface, plasma etching, and ion implantation modification, thus realizing efficient, uniform and precise surface treatment of batch workpieces.

[0028] 2. Work process: Open the hatch 120 and load multiple loose workpieces into the inside of the bearing roller 200 through the feed port 210. Then close and seal the hatch 120, start the vacuum supply assembly, and the mechanical pump evacuates the vacuum chamber 110. The vacuum gauge monitors the vacuum level in real time until the pressure inside the vacuum chamber 110 reaches the process vacuum environment of 1~5Pa.

[0029] Start the process gas circuit assembly and introduce oxygen, argon, or nitrogen (or a mixture of gases) according to process requirements. The mass flow meter controls the gas flow rate to be stable. Start the plasma generation assembly. The 13.56MHz radio frequency power supply outputs radio frequency energy, which, through the electromagnetic induction of the induction coil, excites the process gas in the vacuum chamber 110 to ionize, forming a high-density low-temperature plasma 400. The plasma 400 is then directionally sprayed into the interior of the carrying roller 200 through the spray gun 410 of the plasma jet assembly.

[0030] The transmission mechanism is activated so that the drive motor 500 can operate alternately in forward and reverse directions, driving the carrying roller 200 to reciprocate along the clearance hole 240 through gear meshing. As the carrying roller 200 rotates, the material-carrying ribs 300 gradually lift the internal loose workpieces to the top. After the loose workpieces are lifted to the plasma 400 spray area, the plasma 400 beam sprayed by the spray gun 410 directly acts on the surface of the loose workpieces, removing micro-particle impurities through physical sputtering (high-energy ion bombardment), removing surface oxides through plasma etching (active ion etching), and achieving surface modification through ion implantation (high-energy ion implantation). The processed loose workpieces will fall naturally with the rotation of the carrying roller 200, thus completing one cycle. Simultaneously, the continuous reciprocating oscillation of the carrying roller 200 causes the loose workpieces to rotate at multiple angles, minimizing processing blind spots.

[0031] This invention utilizes a plasma 400 fixed horizontally inside a support roller 200, which can directionally spray a plasma beam. This allows the plasma 400 to act directly on the workpiece without penetrating the micropores of the support roller 200, thus greatly improving the utilization rate of the plasma beam. Simultaneously, several material-carrying ribs 300 are evenly distributed circumferentially on the inner wall of the support roller 200. These ribs 300 lift the workpiece to the plasma 400 spray area and, in conjunction with the reciprocating oscillation of the support roller 200, enable multi-angle flipping of the workpiece, minimizing processing blind spots. This significantly improves the uniformity of plasma etching and ion implantation depth, meeting the surface modification and cleaning requirements of precision workpieces.

[0032] In some embodiments, such as Figure 6 and Figure 7 As shown, a limiting ring 230 is fixedly provided at the second end of the bearing roller 200. The limiting ring 230 is coaxially arranged with the cylinder body of the bearing roller 200 and welded together through a fixing arm 250. The two together form a clearance hole 240. The plasma 400 also includes a flange 420 and a connecting rod 430. The flange 420 is fixedly arranged on the inner wall of the housing 100. The connecting rod passes through the clearance hole 240 and is fixedly connected to the flange 420, and is located beside the transmission mechanism to realize the suspended horizontal fixation of the plasma 400.

[0033] By utilizing the limiting ring 230 and the fixing arm 250 to form an avoidance hole 240, and then combining it with the structure of flange 420 and connecting rod 430, the plasma jetting assembly is suspended and fixed. This structure has high stability and can completely avoid motion interference when the bearing roller 200 reciprocates, thereby ensuring a constant jetting path of the plasma beam 400 and significantly improving the stability and reliability of the plasma etching and ion implantation processes.

[0034] In some embodiments, such as Figure 3 As shown, the transmission mechanism is fixedly installed on the outside of the vacuum chamber 110. The transmission mechanism includes a drive motor 500, a coupling 510, a driving gear 520, and a driven gear 530. The drive motor 500 is a reversible servo motor, and its output end is connected to the driving gear 520 via the coupling 510. The driven gear 530 is coaxially mounted on the inner wall of the vacuum chamber 110 and meshes with the driving gear 520. It is fixedly connected to the second end of the carrying roller 200 via four main shafts 220. In actual use, the drive motor 500 can receive control signals from the electrical measurement and control components to achieve alternating forward and reverse operation, and synchronously drive the carrying roller 200 to reciprocate along the clearance hole 240, thereby achieving multi-angle flipping of several loose workpieces.

[0035] In some embodiments, such as Figure 4 As shown, two sets of support rollers 600 are symmetrically arranged on the bottom plate inside the vacuum chamber 110. Each set of support rollers 600 includes a bearing seat 610 and a roller body. The roller body supports the bottom sides of the carrying roller 200 to achieve stable rotational support for the carrying roller 200. The support roller 600 structure can reduce the radial runout and vibration of the carrying roller 200 during rotation, thereby reducing the wear between the carrying roller 200 and the transmission components, and extending the service life of the ICP plasma cleaning equipment. At the same time, it can also ensure the coaxiality of the rotation of the carrying roller 200, improving the stability of the plasma treatment process.

[0036] In some embodiments, such as Figure 9 and Figure 10 As shown, it also includes a pusher plate 700. The pusher plate 700 is a non-circular arc-shaped plate structure with a circumferential angle of less than 360°. The circumferential edge of the pusher plate 700 mates with the corresponding position of the strip rib 300. A T-shaped piece 710 is fixedly provided on its circumferential edge. The T-shaped piece 710 is slidably embedded in the groove 310 of the strip rib 300. A PTFE bushing may be wrapped around the T-shaped piece 710 to achieve a low-friction sliding fit with the strip rib 300.

[0037] The radial dimension of the axial pusher plate 700 is smaller than the inner radius of the clearance hole 240 to avoid interference with the connecting rod 430 inside the clearance hole 240. A traction rope 800 is threaded through the inside of the material-carrying rib 300. One end of the traction rope 800 is fixedly connected to the T-shaped piece 710, and the other end extends to the outside of the bearing roller 200. This allows the axial pusher plate 700 to slide axially along the material-carrying rib 300 simultaneously when the traction rope 800 is pulled, thus pushing the loose workpieces out of the feed port 210.

[0038] In this embodiment, through the integrated design of the non-circular arc-shaped pusher plate 700, the axial groove 310 of the hollow material-carrying rib 300, the sliding fit of the T-shaped part, the external traction rope 800, and the low-friction wear-resistant sliding pair, the pusher plate 700 can precisely fit the internal space of the carrying roller 200 and completely avoid the plasma 400 and the internal fixing parts of the clearance hole 240, thereby achieving interference-free axial sliding material discharge. At the same time, relying on the precise guiding fit of the groove 310 of the material-carrying rib 300 and the T-shaped part, the axial sliding of the pusher plate 700 can be guaranteed to be smooth and synchronous with the rotation of the carrying roller 200, without affecting the workpiece flipping and the plasma cleaning, etching, and ion implantation processes.

[0039] Furthermore, the pusher plate 700 is moved by an external traction rope 800, allowing operation to be completed without disrupting the sealed environment of the vacuum chamber 110. This not only offers convenience and efficiency but also effectively avoids secondary contamination caused by manual intervention. The subsequent low-friction clearance fit between the mirror-polished slide groove 310 and the graphite copper sleeve or PTFE bushing significantly reduces sliding resistance and minimizes component wear, thereby eliminating jamming during the discharge process and ensuring long-term stable and reliable pushing action. This greatly enhances the equipment's automated discharge capability and batch processing adaptability, making it suitable for industrial-grade vacuum plasma precision processing scenarios.

[0040] The above description is merely a preferred embodiment of the present invention. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention. Structures, devices, and operating methods not specifically described or explained in this invention are implemented according to conventional methods in the art unless otherwise specified or limited.

Claims

1. An ICP plasma cleaning equipment, comprising a vacuum supply assembly, a plasma generation assembly, a process gas path assembly, and an electrical measurement and control assembly, characterized in that, Also includes: The shell contains a vacuum chamber, and the outer wall of the vacuum chamber is hinged and sealed with a door, which is connected to the vacuum supply assembly, the process gas path assembly and the plasma generation assembly respectively. The bearing roller is rotatably mounted inside the vacuum chamber via a transmission mechanism. It has a feed port at its first end and several material-carrying ribs evenly distributed around its inner wall, each of which extends axially. The bearing roller also has a clearance hole at its second end, which extends circumferentially. The plasma is fixedly placed horizontally inside the support roller, and its jetting end extends into the interior of the support roller through the clearance hole; the plasma is connected to the plasma generating assembly and is used to output plasma to achieve workpiece surface cleaning, plasma etching and ion implantation modification.

2. The ICP plasma cleaning equipment according to claim 1, characterized in that: The second end of the bearing roller is fixedly provided with a limiting ring. The limiting ring is coaxially arranged with the cylinder body of the bearing roller and is welded together by a fixed arm. The two together form the clearance hole. The plasma also includes a flange and a connecting rod. The flange is fixedly disposed on the inner wall of the housing, and the connecting rod passes through the clearance hole and is fixedly connected to the flange, and is located on the side of the transmission mechanism to realize the suspension and horizontal fixation of the plasma.

3. The ICP plasma cleaning equipment according to claim 2, characterized in that: The transmission mechanism includes a drive motor, a coupling, a driving gear, and a driven gear; The drive motor is fixedly installed inside the housing, and its output end is connected to the drive gear through a coupling. The driven gear is rotatably installed on the inner wall of the vacuum chamber and meshes with the drive gear. It is fixedly connected to the second end of the bearing roller through four main shafts, so as to drive the bearing roller to swing back and forth along the clearance hole under the forward and reverse rotation of the drive motor.

4. The ICP plasma cleaning equipment according to claim 3, characterized in that: Two sets of rollers are symmetrically arranged on the bottom plate inside the vacuum chamber. Each set of rollers includes a bearing seat and a roller body. The roller body supports the bottom sides of the bearing roller to achieve stable rotation support for the bearing roller.

5. The ICP plasma cleaning equipment according to claim 1, characterized in that: The plasma includes a plasma cavity and several spray guns. The plasma cavity is connected to the plasma generating assembly. The several spray guns are fixed at intervals to the sidewall of the plasma cavity and face the interior of the support roller, and are used to directionally spray plasma beams.

6. The ICP plasma cleaning equipment according to claim 1, characterized in that: It also includes a pusher plate; The pusher plate is a non-circular arc-shaped plate structure with a circumferential angle of less than 360°. The pusher plate is slidably assembled inside the bearing roller, and its circumferential edge is slidably engaged with the material strip rib. Its radial dimension does not exceed the inner edge of the clearance hole. It is used to push loose workpieces out along the axial direction.

7. The ICP plasma cleaning equipment according to claim 6, characterized in that: Each of the aforementioned strip ribs is a hollow structure with an axial groove at its bottom; The bottom edge of the pusher plate is circumferentially fixed with a T-shaped part that is adapted to the axial groove. The T-shaped part is slidably embedded in the axial groove to achieve axial guidance of the pusher plate.

8. The ICP plasma cleaning equipment according to claim 7, characterized in that: Each of the material-carrying ribs is equipped with a traction rope inside. One end of the traction rope is fixedly connected to the T-shaped piece, and the other end extends to the outside of the bearing roller. It is used to pull the pusher plate to slide axially to push the loose workpiece out of the material.

9. The ICP plasma cleaning equipment according to claim 6, characterized in that: The inner wall of the groove of each of the material-carrying ribs is a mirror-polished surface. The pusher plate and the T-shaped part are wrapped with graphite copper sleeves or PTFE polytetrafluoroethylene bushings. The two are fitted with a clearance to achieve low-friction sliding assembly.

10. The ICP plasma cleaning equipment according to claim 1, characterized in that: The height of each of the material-carrying ribs is 1 / 5 to 1 / 8 of the radius of the bearing roller, and its axial length is consistent with the length of the bearing roller.

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