Substrate film forming apparatus

Abstract

The application discloses a substrate film forming device, which is provided with a purification tank and a gas guide pump between a gasification tank and an evaporation box, the purification tank is connected with the gasification tank through a first pipeline, the purification tank is connected with the gas guide pump through a second pipeline, the gas guide pump is connected with the evaporation box through a third pipeline, the stirring column is arranged at the central position of the end of the connecting rod, the stirring needles are distributed in a ring shape at equal intervals with the stirring column as the center, the third stirring rods are distributed at equal intervals, the outer wall of the third stirring rod is oppositely provided with stirring blocks and stirring plates with a wave shape structure, and the stirring blocks and the stirring plates are both arranged in an inclined mode; and the active carbon adsorption layer, the fine filter screen and the coarse filter screen are arranged between the partition plate and the arc-shaped plate. The application improves the filtering effect, greatly reduces the impurity content in the evaporation material, and improves the quality of the evaporation material.

Description

Technical Field

[0001] This invention relates to the field of film-forming technology, and more particularly to a substrate film-forming device. Background Technology

[0002] In a vacuum deposition apparatus, sheet-like substrates are continuously fed from the feed rollers of a substrate feeding device within a vacuum chamber (main chamber) capable of creating a vacuum atmosphere. These substrates are wound onto cooling rollers, and deposition materials are deposited onto these rollers by deposition units spaced at predetermined intervals along their radial direction. The deposited sheet-like substrates are then wound up by the take-up rollers of the substrate feeding device. The vacuum chamber is divided into two chambers by partitions surrounding the rollers. The substrate feeding device is located in one chamber (deposition chamber), and deposition units are located in the other chamber (adjacent chamber). Heating causes the deposition material contained in the crucible to sublimate or vaporize, causing the sublimated or vaporized deposition particles to adhere and accumulate on portions of the sheet-like substrate wound on the rollers, where they are deposited (film formed).

[0003] A search revealed that Chinese patent CN112368413B discloses a "vacuum evaporation device" that, when evaporating a portion of a sheet-like substrate wound on a roller, ensures atmosphere separation between the evaporation chamber containing the evaporation unit and the adjacent main chamber. It comprises: a main chamber (1) having a substrate traveling device and a roller (2); and an evaporation unit (Vu) for evaporating a portion of the sheet-like substrate (Sw) wound on the roller. The main chamber also has a first partition wall (75) and a second partition wall (7a, 7b). The first partition wall (75) divides the vapor deposition chamber into which the vapor deposition unit is housed. The second partition wall (7a, 7b) is connected to the first partition wall and is separated by a first gap (Gp1) with the curvature described above, covering the outer cylinder portion of the roller located on both sides of the circumferential side of the vapor deposition unit. The vapor deposition chamber (Vs) and the adjacent chamber (As) in the main chamber adjacent to the vapor deposition chamber are connected to each other by the first gap. The second partition wall determines the electrical conductivity between the vapor deposition chamber and the adjacent chamber.

[0004] However, when the above-mentioned material is sublimated or vaporized, it is not mixed evenly, and the sublimated or vaporized particles cannot be evenly piled on the roll, resulting in poor quality and effect of vaporization and reducing the vaporization effect of the vaporization device. Summary of the Invention

[0005] The purpose of this invention is to provide a substrate film-forming device that can uniformly mix the vapor-deposited material multiple times and filter the vapor-deposited material multiple times, effectively improving the mixing effect of the vapor-deposited material and the consistency of the vapor-deposited particles, thereby improving the vapor deposition quality of the device.

[0006] To achieve the above objectives, the technical solution adopted by the present invention is as follows: a substrate film forming device, comprising: a base plate, characterized in that: a vapor deposition box is provided above the base plate, a vaporization tank containing vapor deposition material is fixedly installed on the top of the vapor deposition box, a purification box and a gas pump are provided between the vaporization tank and the vapor deposition box, the purification box and the vaporization tank are connected by a first conduit, the purification box and the air inlet of the gas pump are connected by a second conduit, the air outlet of the gas pump is connected to the vapor deposition box by a third conduit, a support rod is provided at each of the four corners of the top outer wall of the base plate, and a support plate is provided between the outer walls of the four support rods, and the vapor deposition box is fixedly installed on the top of the support plate; A second rotating rod is rotatably installed inside the gasification tank. Several wave-shaped second stirring rods are arranged on the outer wall of the second rotating rod along its length. The several second stirring rods are staggered and arranged in a staggered manner. A connecting rod with stirring needles and stirring columns is provided at the end of the second stirring rod. The stirring columns are located at the center of the end of the connecting rod. The stirring needles are distributed in a ring at equal intervals with the stirring columns as the center. A filter plate with several filter holes is elastically installed inside the gasification tank and above the second rotating rod. A third rotating rod is rotatably installed on one side of the interior of the purification chamber. The outer wall of the third rotating rod is provided with several arc-shaped third stirring rods, which are evenly spaced. Stirring blocks and wave-shaped stirring plates are arranged opposite each other on the outer wall of the third stirring rods, and both the stirring blocks and stirring plates are inclined. On the other side of the interior of the purification chamber, perpendicular to the third rotating rod, is a connecting shaft with several rotating plates. The evenly spaced rotating plates are movably connected to the outer wall of the connecting shaft. Inside the purification chamber, there are partitions with a first ventilation slot at the bottom and arc-shaped plates with a second ventilation slot at the top. An activated carbon adsorption layer, a fine filter, and a coarse filter are arranged between the partitions and the arc-shaped plates, and these are distributed sequentially from top to bottom. The top inner wall of the vapor deposition box is provided with a first vapor deposition plate and a second vapor deposition plate, which are arranged opposite to each other and have opposite inclination directions; the inner wall of the vapor deposition box is provided with a second drive roller that is arranged vertically and alternately. A first drive roller is movably connected between two support rods on one side, and a take-up roller is movably connected between two support rods on the other side. A stirring groove is formed on the outer wall of the second stirring rod.

[0007] The following are further improvements to the above technical solution: 1. In the above scheme, a ventilation frame is provided above the activated carbon adsorption layer, and the interior of the ventilation frame is filled with several volcanic rocks.

[0008] 2. In the above scheme, a third motor is provided on the outer wall of the purification box, and the output shaft of the third motor is connected to the third rotating rod through a coupling.

[0009] 3. In the above scheme, a motor frame with a second motor installed on the inner wall of one side of the gasification tank is provided. This motor frame is fixedly connected to the fixed rod, and the output end of the second motor is connected to the second rotating rod through a coupling.

[0010] Due to the application of the above technical solution, the present invention has the following advantages compared with the prior art: 1. The substrate film-forming equipment of the present invention has a second rotating rod with several wave-shaped second stirring rods, which are staggered and arranged in a staggered manner. Each stirring rod has a connecting rod with stirring needles and stirring columns at its end. The stirring needles are distributed in a ring at equal intervals around the stirring columns. Inside the vaporization tank and above the second rotating rod, a filter plate with several filter holes is elastically installed. The rotation of the second stirring rod generates a large vortex, which facilitates uniform mixing of the vapor-deposited material. The filter plate can filter agglomerated vapor-deposited material, improving the uniformity of the vapor-deposited particles. Simultaneously, the filter plate is elastically connected to the inner wall of the main body. The vortex drives the filter plate to vibrate elastically, greatly reducing filter plate clogging and thus improving the adhesion of the vapor-deposited material. The uniformity is further enhanced by the fact that the third stirring rod, which has an arc-shaped structure, is equidistantly distributed on the outer wall of the third rotating rod. The outer wall of the third stirring rod is provided with stirring blocks and stirring plates with a wave-shaped structure. The stirring blocks and stirring plates are inclined. On the other side of the purification chamber and perpendicular to the third rotating rod, there is a connecting shaft with several rotating plates. The rotating plates, which are equidistantly distributed, are movably connected to the outer wall of the connecting shaft. Based on the mixing and filtration of the vaporized material in the vaporization tube, the third rotating rod rotates, thereby driving the third stirring rod, stirring blocks and stirring plates to rotate, and the vaporized material is mixed uniformly again. The stirring blocks and stirring plates are inclined and have different shapes, which can generate vortices of different sizes and angles, further improving the mixing effect of the vaporized material.

[0011] 2. The substrate film-forming equipment of the present invention has a purification chamber with an internal partition plate having a first ventilation slot at the bottom and an arc-shaped plate having a second ventilation slot at the top. An activated carbon adsorption layer, a fine filter screen, and a coarse filter screen are arranged between the partition plate and the arc-shaped plate, and the activated carbon adsorption layer, the fine filter screen, and the coarse filter screen are distributed sequentially from top to bottom. By setting the activated carbon adsorption layer, the fine filter screen, and the coarse filter screen, the sublimated and vaporized vaporized material is effectively filtered and adsorbed through the coarse filter screen, the fine filter screen, and the activated carbon adsorption layer, thereby improving the filtration effect, greatly reducing the impurity content in the vaporized material, and improving the quality of the vaporized material. Attached Figure Description

[0012] Appendix Figure 1 This is a schematic diagram of the overall structure of the substrate film-forming equipment of the present invention; Appendix Figure 2 This is a schematic diagram of the internal structure of the substrate film-forming equipment of the present invention; Appendix Figure 3 This is a schematic diagram of the internal structure of the vaporization tank in the substrate film-forming equipment of the present invention; Appendix Figure 4 This is a partial structural schematic diagram of the vaporization tank in the substrate film-forming equipment of the present invention; Appendix Figure 5 This is a schematic diagram of the filter plate in the substrate film forming equipment of the present invention; Appendix Figure 6 This is a schematic diagram of the internal structure of the purification chamber in the substrate film-forming equipment of the present invention; Appendix Figure 7 Appendix to this invention Figure 6 Enlarged view of point A; Appendix Figure 8 This is a partial structural schematic diagram of the purification chamber in the substrate film-forming equipment of the present invention; Appendix Figure 9 This is a partial structural cross-sectional view of the purification chamber in the substrate film-forming equipment of the present invention.

[0013] In the attached diagrams: 1. Base plate; 2. First motor; 3. Support plate; 4. Support rod; 5. Take-up roller; 7. Horizontal plate; 8. Fixing rod; 9. Motor frame; 10. Second motor; 11. Gasification tank; 12. Shock-absorbing shell; 13. First conduit; 14. Purification box; 15. Second conduit; 16. Third conduit; 17. Air pump; 18. Evaporation box; 19. First evaporation tray; 20. Second evaporation tray; 21. First drive roller; 22. Second drive roller; 23. Filter plate; 24. Second rotating rod; 25. ... 26. Stirring rod; 27. Stirring needle; 28. Stirring tank; 29. ​​Connecting rod; 30. Stirring column; 31. Filter hole; 32. Spring; 33. Third motor; 34. Partition plate; 35. Connecting shaft; 36. Activated carbon adsorption layer; 37. Fine filter screen; 38. Coarse filter screen; 39. Arc plate; 40. Weight reduction tank; 41. Third rotating rod; 42. Rotating plate; 43. Stirring block; 44. Third stirring rod; 45. Stirring plate; 46. First ventilation slot; 47. Ventilation frame; 48. Volcanic rock; 49. Second ventilation slot. Detailed Implementation

[0014] The present patent can be further understood through the specific embodiments given below, but they are not intended to limit the present patent.

[0015] Example: A substrate film forming device includes: a base plate 1, a vapor deposition chamber 18 disposed above the base plate 1, a vaporization tank 11 containing vapor deposition material fixedly installed on the top of the vapor deposition chamber 18, a purification chamber 14 and an air pump 17 disposed between the vaporization tank 11 and the vapor deposition chamber 18, the purification chamber 14 and the vaporization tank 11 being connected by a first conduit 13, the purification chamber 14 being connected by a second conduit 15 to the air inlet of the air pump 17, the air outlet of the air pump 17 being connected by a third conduit 16, a support rod 4 being disposed at each of the four corners of the top outer wall of the base plate 1, and a support plate 3 being disposed between the outer walls of the four support rods 4, the vapor deposition chamber 18 being fixedly installed on the top of the support plate 3; A second rotating rod 24 is rotatably installed inside the gasification tank 11. Several wave-shaped second stirring rods 25 are arranged on the outer wall of the second rotating rod 24 along its length. The several second stirring rods 25 are staggered and arranged in a staggered manner. A connecting rod 28 with stirring needles 26 and stirring columns 29 is provided at the end of the second stirring rod 25. The stirring columns 29 are located at the center of the end of the connecting rod 28. The stirring needles 26 are arranged in a ring with the stirring columns 29 as the center. A filter plate 23 with several filter holes 30 is elastically installed inside the gasification tank 11 and above the second rotating rod 24. The rotation of the second stirring rod generates a large vortex, which is beneficial for the uniform mixing of the vapor-deposited material. The filter plate can filter out agglomerated vapor-deposited materials, improving the consistency of vapor-deposited particles. At the same time, the filter plate is elastically connected to the inner wall of the main body. The vortex drives the filter plate to vibrate elastically, which greatly reduces the clogging of the filter plate, thereby improving the uniformity of vapor-deposited material adhesion. A third rotating rod 40 is rotatably installed on one side inside the purification box 14. The outer wall of the third rotating rod 40 is provided with a plurality of arc-shaped third stirring rods 43. The third stirring rods 43 are evenly spaced, and the outer wall of the third stirring rods 43 is provided with stirring blocks 42 and stirring plates 44 with wave-shaped structures. The stirring blocks 42 and stirring plates 44 are both inclined. On the other side inside the purification box 14 and perpendicular to the third rotating rod 40, there is a connecting shaft 34 with several rotating plates 41. The rotating plates 41, which are evenly distributed, are movably connected to the outer wall of the connecting shaft 34. The third rotating rod rotates, which in turn drives the third stirring rod, stirring block and stirring plate to rotate, so as to uniformly mix the vapor-deposited material. The stirring block and stirring plate are inclined and have different shapes, which can generate vortices of different sizes and angles, effectively improving the mixing effect of the vapor-deposited material.

[0016] Inside the purification box 14, there are partitions 33 with a first ventilation slot 45 at the bottom and arc-shaped plates 38 with a second ventilation slot 48 at the top. An activated carbon adsorption layer 35, a fine filter screen 36 and a coarse filter screen 37 are arranged between the partitions 33 and the arc-shaped plates 38, and the activated carbon adsorption layer 35, the fine filter screen 36 and the coarse filter screen 37 are distributed from top to bottom. Both the stirring block and the stirring plate are inclined and have different shapes to generate vortices of different sizes and angles, which effectively filter and adsorb the sublimated and vaporized vaporized material through a coarse filter screen, a fine filter screen, and an activated carbon adsorption layer.

[0017] A ventilation frame 46 is provided above the activated carbon adsorption layer 35, and the interior of the ventilation frame 46 is filled with several volcanic rocks 47. The filtration effect of vapor-deposited particles is further improved by incorporating a ventilation frame and volcanic rock.

[0018] A spring 31 is provided between each of the four corners of the filter plate 23 and the inner wall of the gasification tank 11.

[0019] A third motor 32 is provided on the outer wall of the purification box 14, and the output shaft of the third motor 32 is connected to the third rotating rod 40 through a coupling.

[0020] A horizontal plate 7 is provided between the tops of the two support rods 4 located on the same side. A fixing rod 8 is installed on the top of one of the horizontal plates 7, and the air pump 17 is installed on the top of the other horizontal plate 7.

[0021] The outer wall of one side of the gasification tank 11 is provided with a motor frame 9, the inner wall of which is provided with a second motor 10. This motor frame 9 is fixedly connected to the fixed rod 8. The output end of the second motor 10 is connected to the second rotating rod 24 through a coupling.

[0022] The top inner wall of the above-mentioned vapor deposition box 18 is provided with a first vapor deposition plate 19 and a second vapor deposition plate 20, and the first vapor deposition plate 19 and the second vapor deposition plate 20 are tilted in opposite directions.

[0023] The inner wall of the vapor deposition box 18 is provided with a second transmission roller 22 that is staggered vertically, and the second transmission roller 22 is used to transport the base fabric.

[0024] A first drive roller 21 is movably connected between two support rods 4 on one side, and a take-up roller 5 is movably connected between two support rods 4 on the other side.

[0025] The outer wall of the second stirring rod 25 is provided with a stirring groove 27.

[0026] The working principle is as follows: When in use, connect the equipment to the power supply and turn on the first motor. The first motor drives the first rotating rod to rotate, which in turn drives the take-up roller to rotate and drive the film to travel. The speed of the film can be adjusted by adjusting the speed of the first motor. By setting the tilt direction of the first and second vapor deposition plates to opposite directions, the film can be quickly transported by the second rotating roller, which can quickly and evenly vapor deposit the outer wall of the film and improve the vapor deposition effect. The second motor is turned on, driving the second rotating rod to rotate, which in turn causes the second stirring rod to rotate. The staggered arrangement of the second stirring rods and stirring needles during rotation ensures thorough mixing of the vapor-deposited material, effectively and evenly discharging the sublimated or vaporized vapor-deposited particles. By activating the gas pump, the vaporized or sublimated vapor-deposited material is quickly introduced into the purification chamber and the vapor deposition chamber. The third motor is turned on, which drives the third rotating rod to rotate. This causes the third stirring rod, stirring block, and stirring plate to all start rotating, allowing for continued uniform mixing of the vapor-deposited material. The stirring block and stirring plate are inclined and have different shapes, which can generate vortices of different sizes and angles. The sublimated and vaporized vapor-deposited material is effectively filtered and adsorbed through a coarse filter, a fine filter, and an activated carbon adsorption layer. The filtration effect of the vapor-deposited particles is further improved by the addition of a ventilation frame and volcanic rock.

[0027] When using the aforementioned substrate film-forming equipment, the rotation of the second stirring rod generates a large vortex, which is beneficial for the uniform mixing of the vapor-deposited material. Furthermore, the filter plate can filter out agglomerated vapor-deposited materials, improving the consistency of the vapor-deposited particles. Simultaneously, the elastic connection between the filter plate and the inner wall of the main body, along with the vortex-driven elastic vibration of the filter plate, significantly reduces filter plate clogging, thereby improving the uniformity of vapor-deposited material adhesion. Further, based on the mixing and filtering of the vapor-deposited material through the vaporization pipe, the rotation of the third rotating rod drives the third stirring rod, stirring block, and stirring plate to rotate, further uniformly mixing the vapor-deposited material. The stirring block and stirring plate are both inclined and of different shapes, generating vortices of different sizes and angles, further enhancing the mixing effect of the vapor-deposited material. Furthermore, the interior of its purification chamber is equipped with a partition with ventilation slots at the bottom. Above the ventilation slots, between the partition and the arc-shaped plate, are an activated carbon adsorption layer, a fine filter, and a coarse filter, arranged sequentially from top to bottom. By incorporating these elements, the sublimated and vaporized vaporized material is effectively filtered and adsorbed through the coarse and fine filters and the activated carbon adsorption layer, improving the filtration effect, significantly reducing the impurity content in the vaporized material, and enhancing its quality.

[0028] The above embodiments are only for illustrating the technical concept and features of the present invention, and are intended to enable those skilled in the art to understand the content of the present invention and implement it accordingly. They should not be construed as limiting the scope of protection of the present invention. All equivalent changes or modifications made in accordance with the spirit and essence of the present invention should be covered within the scope of protection of the present invention.

Claims

1. A substrate film-forming apparatus, comprising: The base plate (1) is characterized in that: a vapor deposition box (18) is provided above the base plate (1), and a vaporization tank (11) containing vapor deposition material is fixedly installed on the top of the vapor deposition box (18). A purification box (14) and a gas pump (17) are provided between the vaporization tank (11) and the vapor deposition box (18). The purification box (14) and the vaporization tank (11) are connected by a first conduit (13). The purification box (14) and the air inlet of the gas pump (17) are connected by a second conduit (15). The air outlet of the gas pump (17) and the vapor deposition box (18) are connected by a third conduit (16). A support rod (4) is provided at each of the four corners of the top outer wall of the base plate (1), and a support plate (3) is provided between the outer walls of the four support rods (4). The vapor deposition box (18) is fixedly installed on the top of the support plate (3). A second rotating rod (24) is rotatably installed inside the gasification tank (11). Several second stirring rods (25) with a wave-shaped structure are arranged on the outer wall of the second rotating rod (24) along its length. The several second stirring rods (25) are staggered and arranged in a staggered manner. A connecting rod (28) with stirring needles (26) and stirring columns (29) is provided at the end of the second stirring rod (25). The stirring columns (29) are located at the center of the end of the connecting rod (28). The stirring needles (26) are arranged in a ring with the stirring columns (29) as the center. A filter plate (23) with several filter holes (30) is elastically installed inside the gasification tank (11) and above the second rotating rod (24). A third rotating rod (40) is rotatably installed on one side inside the purification box (14). The outer wall of the third rotating rod (40) is provided with a number of arc-shaped third stirring rods (43). The third stirring rods (43) are distributed at equal intervals, and the outer wall of the third stirring rods (43) is provided with stirring blocks (42) and stirring plates (44) with wave-shaped structures. The stirring blocks (42) and stirring plates (44) are both inclined. On the other side of the interior of the purification box (14) and perpendicular to the third rotating rod (40), there is a connecting shaft (34) with several rotating plates (41). The rotating plates (41) distributed at equal intervals are movably connected to the outer wall of the connecting shaft (34). Inside the purification box (14), there are partitions (33) with a first ventilation groove (45) at the bottom and arc-shaped plates (38) with a second ventilation groove (48) at the top. An activated carbon adsorption layer (35), a fine filter (36) and a coarse filter (37) are arranged between the partition (33) and the arc-shaped plate (38), and the activated carbon adsorption layer (35), the fine filter (36) and the coarse filter (37) are distributed from top to bottom. The top inner wall of the vapor deposition box (18) is provided with a first vapor deposition plate (19) and a second vapor deposition plate (20) facing each other, and the first vapor deposition plate (19) and the second vapor deposition plate (20) are inclined in opposite directions; the inner wall of the vapor deposition box (18) is provided with a second transmission roller (22) that is staggered vertically. A first transmission roller (21) is movably connected between two support rods (4) on one side, and a winding roller (5) is movably connected between two support rods (4) on the other side. A stirring groove (27) is provided on the outer wall of the second stirring rod (25).

2. The substrate film-forming equipment according to claim 1, characterized in that: A ventilation frame (46) is provided above the activated carbon adsorption layer (35), and the interior of the ventilation frame (46) is filled with several volcanic rocks (47).

3. The substrate film-forming equipment according to claim 1, characterized in that: A third motor (32) is provided on the outer wall of the purification box (14), and the output shaft of the third motor (32) is connected to the third rotating rod (40) through a coupling.

4. The substrate film-forming equipment according to claim 1, characterized in that: The outer wall of one side of the gasification tank (11) is provided with a motor frame (9) with a second motor (10) on the inner wall. The motor frame (9) is fixedly connected to the fixed rod (8). The output end of the second motor (10) is connected to the second rotating rod (24) through a coupling.

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