Automatic spraying equipment for semiconductor quartz coating

Abstract

The application discloses a kind of semiconductor quartz coating automatic spraying equipment, belong to semiconductor parts surface coating equipment technical field, gas source cabinet, dichlorodihydrogen silicon source bottle and chemical vapor deposition furnace, the uninterrupted gas source bottle replacement mechanism for replacing dichlorodihydrogen silicon source bottle is installed on the gas source cabinet, the composite gas supply spraying mechanism for the composite gas supply spraying of workpiece is installed on the chemical vapor deposition furnace. Through the above mode, by setting uninterrupted gas source bottle replacement mechanism, rely on double source bottle alternate operation, electric three-way valve time sequence switching is matched with automatic disassembly and assembly component, the whole process of material replacement does not need to stop, with the help of low-temperature nitrogen cooling and pipeline closed recovery structure processing dichlorodihydrogen silicon, composite gas supply spraying mechanism adopts range pre-gas supply and single-point deposition mode, uniform cavity silicon source concentration, eliminate airflow dead angle;Lamp outside cooperates with flow guiding suction nozzle to collect dust, improve coating density purity.

Description

Technical Field

[0001] This invention relates to the field of semiconductor component surface coating equipment technology, specifically to an automatic semiconductor quartz coating spraying equipment. Background Technology

[0002] In high-end processes such as semiconductor etching, deposition, and diffusion, equipment cavities, quartz components, and workpieces are in long-term contact with high temperatures, plasma, and high-purity process gases. Therefore, the requirements for the purity, density, low metal precipitation, and high insulation stability of the workpiece surface are extremely high.

[0003] Chinese patent CN104342631B discloses a chemical vapor deposition furnace, including a furnace body; an upper furnace cover, located on the upper part of the furnace body, sealed to the furnace body and detachably fixed; a lower furnace cover, located on the lower part of the furnace body, sealed to the furnace body and detachably fixed; and a lower furnace cover lifting mechanism, fixedly connected to the lower furnace cover, so that after the lower furnace cover is detached from the fixed furnace body, it lowers to discharge material, and after discharging material, it rises to rejoin the furnace body. The chemical vapor deposition furnace may further include a front-to-back pushing mechanism, located directly below the lower furnace cover, which causes the lower furnace cover lifting mechanism to lower the lower furnace cover onto it and move it back and forth to the periphery for unloading. However, the above patent still has the following problems: In the process of surface coating semiconductor components using chemical vapor deposition, the source bottle containing silicon dichlorosilane is immersed in an oil bath to achieve constant temperature control. When the silicon dichlorosilane in the bottle is exhausted or the temperature control effect of the source bottle decreases, the machine must be stopped and the source bottle replaced manually. Moreover, the material in the bottle is often not completely used up. In addition, due to the special physical and chemical properties of silicon dichlorosilane, manual bottle replacement is difficult. Furthermore, when using a six-axis robotic arm to prepare high-purity silicon dioxide films in situ on the workpiece surface, relying on a single point to complete the deposition operation can easily cause differences in the thickness and uniformity of the silicon dioxide film layer in different parts of the workpiece.

[0004] Based on this, the present invention designs an automatic spraying device for semiconductor quartz coating to solve the above problems. Summary of the Invention

[0005] In view of the above-mentioned shortcomings of the existing technology, the present invention provides an automatic spraying equipment for semiconductor quartz coating.

[0006] To achieve the above objectives, the present invention provides the following technical solution: An automated coating equipment for semiconductor quartz includes a gas source cabinet, a silicon dichlorosilane source bottle, and a chemical vapor deposition furnace; The gas source cabinet is equipped with an uninterrupted gas source cylinder replacement mechanism for replacing the dichlorosilane source cylinder. The chemical vapor deposition furnace is equipped with a composite gas supply spraying mechanism for performing composite gas supply spraying on the workpiece. The uninterrupted gas supply source cylinder replacement mechanism includes an oil bath tank, an opening and closing top cover, a source cylinder support assembly, a source cylinder disassembly assembly, a dichlorosilane connecting pipe, a first nitrogen connecting pipe, a mixed gas outlet pipe, and a waste gas recovery pipe. The top of the oil bath tank is slidably connected to the opening and closing top cover, which is slidably connected to the dichlorosilane connecting pipe, the first nitrogen connecting pipe, the mixed gas outlet pipe, and the waste gas recovery pipe. The bottom of the oil bath tank is connected to the source cylinder support assembly, and the inner wall of the oil bath tank is connected to the source cylinder disassembly assembly. Three sets of electric three-way valves are fixedly connected to the three-way joints of the dichlorosilane connecting pipe, the first nitrogen connecting pipe, and the mixed gas outlet pipe. The ends of the dichlorosilane connecting pipe, the first nitrogen connecting pipe, and the mixed gas outlet pipe are threadedly connected to the connecting joints of two sets of dichlorosilane source cylinders, respectively.

[0007] Furthermore, the chemical vapor deposition furnace includes a deposition furnace body, a lower furnace cover lifting mechanism, a lower furnace cover and a workpiece tray. The bottom of the deposition furnace body is fixedly connected to the lower furnace cover lifting mechanism, the bottom of the deposition furnace body is engaged with the lower furnace cover, and the top of the lower furnace cover is fixedly connected to the workpiece tray.

[0008] Furthermore, the composite gas supply spraying mechanism includes a single-point gas supply spraying component and a range gas supply component, both of which are connected to a chemical vapor deposition furnace.

[0009] Furthermore, the source bottle support assembly includes a first hollow rotating platform, a pneumatic lifting mechanism, a double support, and spring pins. The first hollow rotating platform is fixedly connected to the bottom of the oil bath tank. The output end of the first hollow rotating platform is fixedly connected to the pneumatic lifting mechanism via a connecting plate. The output end of the pneumatic lifting mechanism is fixedly connected to the double support. The interior of the double support is fixedly connected to multiple sets of spring pins.

[0010] Furthermore, the source bottle disassembly assembly includes a first linear module, a second linear module, a source bottle opening and closing assembly, and a pipeline gas recovery assembly. The first linear module is fixedly connected to the top of the inner wall of the oil bath tank. The output end of the first linear module is fixedly connected to the second linear module. The output end of the second linear module is connected to the source bottle opening and closing assembly. The source bottle opening and closing assembly is connected to the pipeline gas recovery assembly.

[0011] Furthermore, the source bottle opening and closing assembly includes a second hollow rotating platform, a servo motor, a monitoring probe, a torsion sleeve, a first cylinder, a floating platform, and an open-end electric wrench. The second hollow rotating platform is fixedly connected to the output end of the second linear module. The output end of the second hollow rotating platform is fixedly connected to the servo motor through a first fixed frame. The output end of the servo motor is fixedly connected to the monitoring probe. The inside of the monitoring probe is fixedly connected to the torsion sleeve. The side of the first fixed frame is fixedly connected to the first cylinder. The output end of the first cylinder is fixedly connected to the floating platform through a connecting plate. The top of the floating platform is fixedly connected to the open-end electric wrench through a second fixed frame.

[0012] Furthermore, the pipeline gas recovery assembly includes a first fixed plate, a first gas guide pipe, a first fixed frame, a C-shaped sleeve, and a low-temperature nitrogen nozzle. The first fixed plate is fixedly connected to the second fixed frame, the inner wall of the first fixed plate is fixedly connected to the first gas guide pipe, the outer surface of the first gas guide pipe is fixedly connected to the first fixed frame, the two ends of the first fixed frame are fixedly connected to two sets of low-temperature nitrogen nozzles, and the first gas guide pipe is fixedly connected to the C-shaped sleeve.

[0013] Furthermore, the end of the cryogenic nitrogen nozzle extends into the interior of the C-shaped sleeve, which engages with the top of the connecting joint to cool the gas drawn into the C-shaped sleeve.

[0014] Furthermore, the single-point gas supply spraying assembly includes a six-axis robotic arm, a second fixed frame, a quartz torch, a second fixed plate, a rotating plate, a flow-guiding suction nozzle, a heat-resistant hydraulic cylinder, an annular gas pipe, and a first nitrogen nozzle. The six-axis robotic arm is fixedly connected to the top of the inner wall of the deposition furnace. The output end of the six-axis robotic arm is fixedly connected to the second fixed frame. The inside of the second fixed frame is fixedly connected to the quartz torch. The outer surface of the quartz torch is fixedly connected to the second fixed plate. The second fixed plate is rotatably connected to two sets of rotating plates. The inside of the two sets of rotating plates is fixedly connected to two sets of flow-guiding suction nozzles. The lower surface of the second fixed frame is rotatably connected to two sets of heat-resistant hydraulic cylinders. The upper surfaces of the two sets of rotating plates are rotatably connected to the output ends of the two sets of heat-resistant hydraulic cylinders. The outer surface of the annular gas pipe is fixedly connected to a third fixed frame. The annular gas pipe is fixedly connected to multiple sets of first nitrogen nozzles, which extend into the interior of the deposition furnace.

[0015] Furthermore, the range gas supply assembly includes a drive motor, a third fixed frame, a first gear ring, a bevel gear ring, multiple sets of bevel gears, multiple sets of mixed gas nozzles, multiple sets of sliding sleeves, and multiple sets of guide columns. The drive motor and the third fixed frame are both fixedly connected to the upper surface of the lower furnace cover lifting mechanism. The top of the third fixed frame is rotatably connected to the first gear ring. A guide groove is provided on the top of the first gear ring. The upper surface of the first gear ring is fixedly connected to the bevel gear ring. The bevel gear ring meshes with the bevel gears. The drive motor meshes with the first gear ring through gears. The bevel gears and the sliding sleeves are slidably connected through keyways and keys. The inner wall of the sliding sleeve is fixedly connected to the mixed gas nozzles. The mixed gas nozzles are slidably connected to the deposition furnace body. The sliding sleeve and the guide columns are rotatably connected through limiting sleeves. The guide columns slide in contact with the guide grooves.

[0016] Compared with the prior art, the beneficial effects of this invention are as follows: 1. By setting up an uninterrupted gas supply cylinder replacement mechanism, relying on the alternating operation of dual source cylinders, the switching of electric three-way valves and the combination of automated disassembly and assembly components, the entire material replacement process does not require machine shutdown. It uses low-temperature nitrogen cooling and a closed pipeline recovery structure to process dichlorosilane. The composite gas supply spraying mechanism adopts range pre-supply and single-point deposition to unify the silicon source concentration in the cavity and eliminate airflow dead zones. The blowtorch is equipped with a guide suction nozzle to collect dust, improving the density and purity of the coating. 2. When disassembling and assembling the source bottle connector, use a low-temperature nitrogen nozzle to cool the pipe opening area, reduce the volatilization rate of dichlorosilane, and inhibit its hydrolysis upon contact with water vapor to generate hydrochloric acid mist and silica dust; at the same time, rely on the C-type sleeve and gas guide pipe to promptly extract and recover residual gas between the valve and the pipeline, avoid the safety hazards of spontaneous combustion and corrosion caused by the leakage of toxic and flammable gases, reduce raw material loss, and also reduce the risk of material replacement. It is compatible with the physical and chemical properties of dichlorosilane, and the material replacement operation is safe and standardized. 3. Before the spraying operation, the gas supply component evenly pre-sprays mixed gas around the workpiece to reduce the concentration difference of dichlorosilane inside the cavity. Then, the silica is precisely oxidized and deposited by the single-point hydrogen-oxygen flame of the quartz torch, which effectively improves the problem of uneven film thickness caused by single spraying. The guide suction nozzles around the torch simultaneously collect free unreacted particles to prevent dust from falling back and contaminating the coating, thereby improving the density and cleanliness of the film layer. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are merely some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without any creative effort.

[0018] Figure 1 A perspective view of an automatic coating equipment for semiconductor quartz; Figure 2 A cross-sectional view of the uninterrupted gas supply cylinder replacement mechanism; Figure 3 for Figure 2 Enlarged view of the structure at point A in the middle; Figure 4 This is a structural sectional view of the source bottle support assembly; Figure 5 A schematic diagram of the disassembly assembly for the source bottle; Figure 6 This is a schematic diagram of the structure of the pipeline gas recovery assembly; Figure 7 This is a structural cross-sectional view of the composite air supply spraying mechanism; Figure 8 for Figure 7 Enlarged view of the structure at point B; Figure 9 for Figure 7 Enlarged view of the structure at point C; Figure 10 A schematic diagram of a single-point air supply spraying assembly; Figure 11 A structural cross-sectional view of the range air supply assembly; Figure 12 Exploded view of the structure of the range gas supply component.

[0019] The labels in the diagram represent: 1. Gas source cabinet; 11. Dichlorosilane pipe; 12. First nitrogen pipe; 13. Second nitrogen pipe; 14. Hydrogen pipe; 15. Oxygen pipe; 2. Dichlorosilane source cylinder; 21. Manual valve; 22. Connecting joint; 3. Uninterrupted gas source cylinder replacement mechanism; 31. Oil bath; 32. Opening and closing top cover; 33. Source cylinder support assembly; 331. First hollow rotating platform; 332. Pneumatic lifting mechanism; 333. Double support; 334. Spring pin; 34. 341. Source bottle disassembly assembly; 342. First linear module; 343. Second linear module; 344. Source bottle opening and closing assembly; 3431. Second hollow rotary platform; 3432. Servo motor; 3433. Monitoring probe; 3434. Torsion sleeve; 3435. First cylinder; 3436. Floating platform; 3437. Open-end electric wrench; 344. Pipeline gas recovery assembly; 3441. First fixing plate; 3442. First gas guide pipe; 3443. The... 1. Fixed frame; 3444. C-type sleeve; 3445. Low-temperature nitrogen nozzle; 35. Dichlorosilane connecting pipe; 36. First nitrogen connecting pipe; 37. Mixed gas outlet pipe; 38. Waste gas recovery pipe; 4. Chemical vapor deposition furnace; 41. Deposition furnace body; 42. Lower furnace cover lifting mechanism; 43. Lower furnace cover; 44. Workpiece tray; 5. Composite gas supply spraying mechanism; 51. Single-point gas supply spraying assembly; 511. Six-axis robotic arm; 512. Second fixed frame; 513. Quartz torch; 514. Second fixed plate; 515. Rotating plate; 516. Guide suction nozzle; 517. Heat-resistant hydraulic cylinder; 518. Annular gas pipe; 519. First nitrogen nozzle; 52. Range gas supply assembly; 521. Drive motor; 522. Third fixed frame; 523. First gear ring; 524. Bevel gear ring; 525. Bevel gear; 526. Guide groove; 527. Mixed gas nozzle; 528. Sliding sleeve; 529. Guide column. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0021] In some embodiments, please refer to the accompanying drawings. Figures 1-12 An automatic coating equipment for semiconductor quartz coating includes a gas source cabinet 1, a silicon dichlorosilane source bottle 2, and a chemical vapor deposition furnace 4. The gas source cabinet 1 is equipped with an uninterrupted gas supply cylinder replacement mechanism 3 for replacing the dichlorosilane source cylinder 2; A composite gas supply spraying mechanism 5 is installed on the chemical vapor deposition furnace 4 for composite gas supply spraying of workpieces; The uninterrupted gas supply cylinder replacement mechanism 3 includes an oil bath tank 31, an opening and closing top cover 32, a cylinder support assembly 33, a cylinder disassembly assembly 34, a dichlorosilane connecting pipe 35, a first nitrogen connecting pipe 36, a mixed gas outlet pipe 37, and a waste gas recovery pipe 38. The opening and closing top cover 32 is slidably connected to the top of the oil bath tank 31. The interior of the opening and closing top cover 32 is connected to the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, the mixed gas outlet pipe 37, and the waste gas recovery pipe 38. The bottom of the oil bath tank 31 is connected to the source bottle support assembly 33 via a sliding connection. The inner side of the oil bath tank 31 is connected to the source bottle disassembly assembly 34. Three sets of electric three-way valves are fixedly connected to the three-way joints of the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, and the mixed gas outlet pipe 37. The ends of the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, and the mixed gas outlet pipe 37 are respectively threadedly connected to the connecting joints 22 of the two sets of dichlorosilane source bottles 2.

[0022] The dichlorosilane tube 11, the first nitrogen tube 12, the second nitrogen tube 13, the hydrogen tube 14, and the oxygen tube 15 inside the gas source cabinet 1 are all equipped with individual high-precision mass flow meters to achieve precise pressure and flow stabilization of micro-volume output.

[0023] The oil bath 31 is equipped with an oil bath constant temperature system. The dichlorosilane source bottle 2 is completely immersed in the oil bath and the temperature is kept constant at 23℃±0.2℃.

[0024] The chemical vapor deposition furnace 4 is equipped with a hot air heating and intelligent temperature and humidity control system to maintain the internal process environment of the chemical vapor deposition furnace 4 at 65℃ and 40%±5% humidity.

[0025] The chemical vapor deposition furnace 4 adopts the chemical vapor deposition furnace structure in patent number CN104342631B. The chemical vapor deposition furnace 4 includes a deposition furnace body 41, a lower furnace cover lifting mechanism 42, a lower furnace cover 43, and a workpiece tray 44. The bottom of the deposition furnace body 41 is fixedly connected to the lower furnace cover lifting mechanism 42, the bottom of the deposition furnace body 41 is snapped into the lower furnace cover 43, and the top of the lower furnace cover 43 is fixedly connected to the workpiece tray 44.

[0026] The composite gas supply spraying mechanism 5 includes a single-point gas supply spraying component 51 and a range gas supply component 52. Both the single-point gas supply spraying component 51 and the range gas supply component 52 are connected to the chemical vapor deposition furnace 4.

[0027] In this embodiment, the second nitrogen pipe 13 inside the gas source cabinet 1 introduces nitrogen into the interior of the deposition furnace 41 through the single-point gas supply spraying assembly 51 to clean the inner wall of the deposition furnace 41. Then, through the hydrogen pipe 14 and the oxygen pipe 15, hydrogen is introduced into the interior of the deposition furnace 41 through the single-point gas supply spraying assembly 51 for ignition. Oxygen is then introduced to control the hydrogen-oxygen ratio at 4:1, forming a stable pure blue flame. After the flame stabilizes, the first nitrogen pipe 12 introduces nitrogen into the dichlorosilane source bottle 2 through the first nitrogen connecting pipe 36. The dichlorosilane source bottle 2 mixes the dichlorosilane with the nitrogen, and the mixed gas is introduced into the deposition furnace 41 through the mixed gas outlet pipe 37. The dichlorosilane can be replenished inside the dichlorosilane source bottle 2 through the dichlorosilane pipe 11 and the dichlorosilane connecting pipe 35. The constant temperature dichlorosilane is carried into the flame reaction zone through the single-point gas supply spraying component 51 and composite gas supply spraying is performed through the composite gas supply spraying mechanism 5. A white high-purity silicon oxide deposition layer is generated on the surface of the workpiece on the workpiece tray 44. After the quartz coating is completed, the mixed gas outlet pipe 37 is closed first through the program interlock, then the oxygen pipe 15 is closed, then the hydrogen pipe 14 is closed, the flame is extinguished, and finally, nitrogen gas is sprayed out again through the second nitrogen pipe 13 to purge the interior of the deposition furnace body 41 to eliminate the hidden dangers of backfire and residual gas. When performing composite gas supply spraying through the composite gas supply spraying mechanism 5, the mixed gas is first introduced around the workpiece inside the chemical vapor deposition furnace 4 through the range gas supply component 52 to make the silicon source concentration around the workpiece more uniform, eliminating dead air zones and concentration differences in the cavity. Then, the single-point gas supply spraying component 51 performs single-point spraying deposition on the surface of the workpiece, thereby avoiding the problem of differences in the thickness and uniformity of the silicon dioxide film layer in different parts of the workpiece that can easily occur by relying on a single point to complete the deposition operation. When the dichlorosilane inside the dichlorosilane source bottle 2 is exhausted or the temperature control effect of the dichlorosilane source bottle 2 decreases, a new dichlorosilane source bottle 2 is inserted into the surface of the source bottle support assembly 33, and the opening and closing top cover 32 is closed, so that the oil bath 31 is sealed with the opening and closing top cover 32. At this time, by opening and closing two sets of electric three-way valves, the nitrogen gas is adjusted so that the first nitrogen connecting pipe 36 on the side where the dichlorosilane source bottle 2 has not been replaced enters the other set of dichlorosilane source bottles 2, and is discharged through the mixed gas outlet pipe 37 on the same side, and then the opening... Close the other set of electric three-way valves, close the dichlorosilane connecting pipe 35 on the side where the dichlorosilane source bottle 2 is being replaced, stop the replenishment of dichlorosilane, and then close the three sets of manual valves 21 through the source bottle disassembly assembly 34 and open the three sets of connecting joints 22 to disconnect the threaded connection between the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, the mixed gas outflow pipe 37 and the connecting joint 22 of the source bottle 2 that needs to be replaced. At the same time, the source bottle disassembly assembly 34 cools and recovers the gas between the electric three-way valve and the pipeline. Then, the two sets of dichlorosilane source bottles 2 located above the source bottle support assembly 33 are moved downwards and rotated, so that the new dichlorosilane source bottle 2 is rotated to below the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, and the mixed gas outlet pipe 37. The source bottle support assembly 33 then lifts the dichlorosilane source bottle 2, while the source bottle disassembly assembly 34 disconnects the connecting joint 22 of the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, the mixed gas outlet pipe 37, and the new dichlorosilane source bottle 2. The new dichlorosilane source bottle 2 is connected to the pipeline via a threaded connection. Then, the replaced dichlorosilane source bottle 2 is connected to the waste gas recovery pipe 38 through the source bottle disassembly assembly 34. The corresponding manual valve 21 is opened to introduce the residual gas of the replaced dichlorosilane source bottle 2 into the waste gas recovery device through the pipeline, so as to achieve uninterrupted gas supply for replacing the dichlorosilane source bottle 2. This avoids the problems of having to stop the machine to replace the source bottle manually, the material in the bottle often not being completely used up, and the difficulty of manual bottle replacement due to the special physical and chemical properties of dichlorosilane.

[0028] In some embodiments, such as Figures 1-12 As shown, in a preferred embodiment of the present invention, the source bottle support assembly 33 includes a first hollow rotating platform 331, a pneumatic lifting mechanism 332, a double support 333, and spring pins 334. The first hollow rotating platform 331 is fixedly connected to the bottom of the oil bath tank 31. The output end of the first hollow rotating platform 331 is fixedly connected to the pneumatic lifting mechanism 332 through a connecting plate. The output end of the pneumatic lifting mechanism 332 is fixedly connected to the double support 333. The interior of the double support 333 is fixedly connected to multiple sets of spring pins 334.

[0029] The pneumatic lifting mechanism 332 adopts a cylinder and guide rod lifting structure. The output end of the cylinder is fixedly connected to the lower surface of the double support 333. The bottom of the guide rod is limited and slidably connected to the connecting plate, and the top of the guide rod is fixedly connected to the lower surface of the double support 333.

[0030] The source bottle disassembly assembly 34 includes a first linear module 341, a second linear module 342, a source bottle opening and closing assembly 343, and a pipeline gas recovery assembly 344. The first linear module 341 is fixedly connected to the top of the inner wall of the oil bath tank 31. The output end of the first linear module 341 is fixedly connected to the second linear module 342. The output end of the second linear module 342 is connected to the source bottle opening and closing assembly 343. The source bottle opening and closing assembly 343 is connected to the pipeline gas recovery assembly 344.

[0031] The source bottle opening and closing assembly 343 includes a second hollow rotating platform 3431, a servo motor 3432, a monitoring probe 3433, a torsion sleeve 3434, a first cylinder 3435, a floating platform 3436, and an open-end electric wrench 3437. The second hollow rotating platform 3431 is fixedly connected to the output end of the second linear module 342. The output end of the second hollow rotating platform 3431 is fixedly connected to the servo motor 3432 through a first fixing frame. The output end of the servo motor 3432 is fixedly connected to the monitoring probe 3433. The inside of the monitoring probe 3433 is fixedly connected to the torsion sleeve 3434. The side of the first fixing frame is fixedly connected to the first cylinder 3435. The output end of the first cylinder 3435 is fixedly connected to the floating platform 3436 through a connecting plate. The top of the floating platform 3436 is fixedly connected to the open-end electric wrench 3437 through a second fixing frame.

[0032] The floating platform 3436 adopts a spring and guide rod floating structure. The floating platform 3436 is limited and slidably connected to the connecting plate through the guide rod, and multiple sets of springs are fixedly connected at equal intervals between the connecting plate and the floating platform 3436.

[0033] The open-end electric wrench 3437 adopts the open-end electric wrench structure in patent number CN202121268356.5.

[0034] The pipeline gas recovery assembly 344 includes a first fixing plate 3441, a first gas guide pipe 3442, a first fixing frame 3443, a C-shaped sleeve 3444, and a cryogenic nitrogen nozzle 3445. The first fixing plate 3441 is fixedly connected to the second fixing frame. The inner wall of the first fixing plate 3441 is fixedly connected to the first gas guide pipe 3442. The outer surface of the first gas guide pipe 3442 is fixedly connected to the first fixing frame 3443. The two ends of the first fixing frame 3443 are fixedly connected to two sets of cryogenic nitrogen nozzles 3445. The first gas guide pipe 3442 is fixedly connected to the C-shaped sleeve 3444.

[0035] The end of the cryogenic nitrogen nozzle 3445 extends into the interior of the C-type sleeve 3444, and the C-type sleeve 3444 is engaged with the top of the connecting joint 22 to cool the gas drawn into the C-type sleeve 3444.

[0036] The cryogenic nitrogen nozzle 3445 is connected to an external cooling device via a pipe, and the pipe extending from the cooling device is connected to the second nitrogen pipe 13.

[0037] The first gas guide pipe 3442 is connected to an external gas recovery pump via a pipeline, and the pipeline extending from the gas recovery pump is connected to the waste gas recovery device.

[0038] In this embodiment, when the dichlorosilane source bottle 2 is depleted or the temperature control effect of the dichlorosilane source bottle 2 decreases, a new dichlorosilane source bottle 2 is inserted into the surface of the double support 333 and fixed by multiple sets of spring pins 334. Then, the top cover 32 is closed to seal the oil bath 31 with the top cover 32. At this time, by opening and closing two sets of electric three-way valves, nitrogen is adjusted to enter the other dichlorosilane source bottle 2 through the first nitrogen connecting pipe 36 on the side where the dichlorosilane source bottle 2 has not been replaced, and is discharged through the mixed gas outlet pipe 37 on the same side. Then, the other set of electric three-way valves is opened and closed to close the dichlorosilane connecting pipe 35 on the side where the dichlorosilane source bottle 2 has been replaced, and the replenishment of dichlorosilane is stopped. Then, the first linear module 341 and the second linear module 342 drive the source bottle opening and closing assembly 343 and the pipeline gas recovery assembly 344 to move. At the same time, the monitoring probe 3433 monitors the position of the manual valve 21, and through the servo rotation of the servo motor 3432, the torsion sleeve 3434 is aligned with the position of the manual valve 21. The first cylinder 3435 pushes the floating platform 3436, so that the position of the open electric wrench 3437 is aligned with the position of the connecting joint 22. Then, the servo motor 3432 rotates to drive the torsion sleeve 3434 to rotate, closing the manual valve 21. The open electric wrench 3437 rotates the connecting joint 22 to open the connecting joint 22, so that the threaded connection between the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, the mixed gas outlet pipe 37 and the connecting joint 22 of the source bottle 2 that needs to be replaced is released. Meanwhile, the C-type sleeve 3444 is located at the interface between the connecting joint 22 and the pipeline, and sprays low-temperature nitrogen through two sets of low-temperature nitrogen nozzles 3445 to cool the gas remaining between the first nitrogen connecting pipe 36 and the valve and flowing out through the pipe opening. The cooled gas is recovered through the C-type sleeve 3444 and the first gas guide pipe 3442. Then, the first linear module 341 and the second linear module 342 drive the source bottle opening and closing assembly 343 and the pipeline gas recovery assembly 344 to move. The second hollow rotating platform 3431 adjusts the position of the torsion sleeve 3434, the open electric wrench 3437 and the C-type sleeve 3444 so that the torsion sleeve 3434, the open electric wrench 3437 and the C-type sleeve 3444 can open and close the three manual valves 21 and open the three sets of connecting joints 22. Then, the pneumatic lifting mechanism 332 drives the two sets of dichlorosilane source bottles 2 located above the double support 333 to move downwards and rotate, so that the new dichlorosilane source bottle 2 rotates to below the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, and the mixed gas outlet pipe 37. The pneumatic lifting mechanism 332 lifts the dichlorosilane source bottle 2, and at the same time, the open-end electric wrench 3437 threads the connecting joint 22 of the dichlorosilane connecting pipe 35, the first nitrogen connecting pipe 36, the mixed gas outlet pipe 37, and the new dichlorosilane source bottle 2, thus placing the new dichlorosilane source bottle 2 into the pneumatic lifting mechanism 332. The dichlorosilane source bottle 2 is connected to the pipeline. Then, the replaced dichlorosilane source bottle 2 is connected to the two sets of waste gas recovery pipes 38 through the torsion sleeve 3434, open electric wrench 3437 and C-type sleeve 3444. The corresponding manual valve 21 is opened to introduce the residual gas of the replaced dichlorosilane source bottle 2 into the waste gas recovery device through the pipeline. This achieves uninterrupted gas supply for replacing the dichlorosilane source bottle 2, thus avoiding the problems of having to stop the machine to replace the source bottle manually, the material in the bottle often not being completely used up, and the difficulty of manual bottle replacement due to the special physical and chemical properties of dichlorosilane.

[0039] In some embodiments, such as Figures 1-12 As shown, in a preferred embodiment of the present invention, the single-point air supply spraying assembly 51 includes a six-axis robotic arm 511, a second fixed frame 512, a quartz torch 513, a second fixed plate 514, a rotating plate 515, a guide suction nozzle 516, a heat-resistant hydraulic cylinder 517, an annular gas pipe 518, and a first nitrogen nozzle 519. The six-axis robotic arm 511 is fixedly connected to the top of the inner wall of the deposition furnace body 41. The output end of the six-axis robotic arm 511 is fixedly connected to the second fixed frame 512. The interior of the second fixed frame 512 is fixedly connected to the quartz torch 513, and the outer surface of the quartz torch 513 is... The second fixed plate 514 is fixedly connected and rotatably connected to two sets of rotating plates 515. The interior of the two sets of rotating plates 515 is fixedly connected to two sets of guide suction nozzles 516. The lower surface of the second fixed frame 512 is rotatably connected to two sets of heat-resistant hydraulic cylinders 517. The upper surface of the two sets of rotating plates 515 is rotatably connected to the output end of the two sets of heat-resistant hydraulic cylinders 517. The outer surface of the annular gas pipe 518 is fixedly connected to the third fixed frame 522. The annular gas pipe 518 is fixedly connected to multiple sets of first nitrogen nozzles 519. The multiple sets of first nitrogen nozzles 519 extend into the interior of the deposition furnace body 41.

[0040] Multiple sets of first nitrogen nozzles 519 are connected to an external nitrogen supply device.

[0041] The quartz torch 513 adopts a multi-layer concentric tube structure, which consists of a central tube, an intermediate annular channel, and an outer annular channel from the inside out. Each layer delivers different gases, which mix and burn at the torch outlet. The side of the quartz torch 513 is fixedly connected to inlet ports for different gases, which are used to introduce a mixture of dichlorosilane and nitrogen, hydrogen and oxygen into the central tube, the intermediate annular channel, and the outer annular channel, respectively.

[0042] The quartz torch 513 emits a mixture of dichlorosilane and nitrogen gas from its central tube, hydrogen gas from its middle annular channel, and oxygen gas from its outer annular channel.

[0043] The range gas supply assembly 52 includes a drive motor 521, a third fixed frame 522, a first gear ring 523, a bevel gear ring 524, multiple sets of bevel gears 525, multiple sets of mixed gas nozzles 527, multiple sets of sliding sleeves 528, and multiple sets of guide columns 529. The drive motor 521 and the third fixed frame 522 are both fixedly connected to the upper surface of the lower furnace cover lifting mechanism 42. The top of the third fixed frame 522 is rotatably connected to the first gear ring 523. The top of the first gear ring 523 has a guide groove 526. The upper surface of 23 is fixedly connected to the bevel gear ring 524. The bevel gear ring 524 meshes with the bevel gear 525. The drive motor 521 meshes with the first gear ring 523 through the gear. The bevel gear 525 and the sliding sleeve 528 are slidably connected through the keyway and key. The inner wall of the sliding sleeve 528 is fixedly connected to the mixed gas nozzle 527. The mixed gas nozzle 527 is slidably connected to the deposition furnace body 41. The sliding sleeve 528 and the guide column 529 are rotatably connected through the limiting sleeve. The guide column 529 is in contact with the guide groove 526 and slides.

[0044] In this embodiment, the second nitrogen pipe 13 inside the gas source cabinet 1 introduces nitrogen gas into the interior of the deposition furnace 41 through the annular gas pipe 518 and the first nitrogen nozzle 519 to clean the inner wall of the deposition furnace 41. Then, through the hydrogen pipe 14 and the oxygen pipe 15, hydrogen gas is introduced into the interior of the deposition furnace 41 through the middle annular channel of the quartz torch 513 for ignition. Oxygen gas is then introduced through the outer annular channel, controlling the hydrogen-oxygen ratio to 4:1 to form a stable pure blue flame. After the flame stabilizes, the first nitrogen pipe 12 introduces nitrogen gas into the dichlorosilane source bottle 2 through the first nitrogen connecting pipe 36, and the dichlorosilane source bottle 2 mixes the dichlorosilane with the nitrogen gas. The gas outlet pipe 37 introduces the mixed gas into the deposition furnace body 41, and can supplement dichlorosilane inside the dichlorosilane source bottle 2 through the dichlorosilane pipe 11 and the dichlorosilane connecting pipe 35. The constant temperature dichlorosilane is carried into the flame reaction zone through the central tube of the quartz torch 513, and the quartz torch 513 is moved by the six-axis robotic arm 511 to perform composite gas supply spraying on the surface of the workpiece. During the spraying deposition, two sets of heat-resistant hydraulic cylinders 517 drive two sets of guide suction nozzles 516 to rotate, so that the guide suction nozzles 516 can suck up the fine quartz coating particles that have not been fully reacted, preventing dust from floating back to adhere to the coating and improving the density of the coating. A white high-purity silica deposition layer is generated on the surface of the workpiece on the workpiece tray 44. After the quartz coating is sprayed and deposited, the mixed gas outlet pipe 37 is closed first through the program interlock, then the oxygen pipe 15 is closed, then the hydrogen pipe 14 is closed, the flame is extinguished, and finally, nitrogen gas is sprayed out again through the second nitrogen pipe 13 to purge the interior of the deposition furnace body 41 to eliminate the hidden dangers of backfire and residual gas. Before the composite gas supply spraying is performed by the quartz torch 513, the drive motor 521 rotates, which drives the first gear ring 523 to rotate through the gear. The first gear ring 523 drives the bevel gear ring 524 to rotate. The bevel gear ring 524 meshes with the bevel gear 525, which drives the bevel gear 525 to rotate. The bevel gear 525 drives the mixed gas nozzle 527 to rotate through the sliding sleeve 528. At the same time, the guide groove 526 cyclically pushes the guide column 529 to extend and retract. The guide column 529 drives the sliding sleeve 528 to extend and retract, so that the mixed gas nozzle 527 extends and retracts inside the deposition furnace body 41 while rotating, spraying mixed gas around the workpiece on the workpiece tray 44, so that the silicon source concentration around the workpiece is more uniform, eliminating dead air zones and concentration differences in the cavity. Then, the six-axis robotic arm 511 drives the quartz torch 513 to perform single-point spraying deposition on the workpiece surface, thereby avoiding the problem of differences in the thickness and uniformity of the silicon dioxide film layer in different parts of the workpiece that can easily occur when relying on a single point to complete the deposition operation.

[0045] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions will not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. An automatic coating equipment for semiconductor quartz, comprising a gas source cabinet (1), a silicon dichlorosilane source bottle (2), and a chemical vapor deposition furnace (4), characterized in that: The gas source cabinet (1) is equipped with an uninterrupted gas source cylinder replacement mechanism (3) for replacing the dichlorosilane source cylinder (2). The chemical vapor deposition furnace (4) is equipped with a composite gas supply spraying mechanism (5) for performing composite gas supply spraying on the workpiece. The uninterrupted gas supply cylinder replacement mechanism (3) includes an oil bath tank (31), an opening and closing top cover (32), a cylinder support assembly (33), a cylinder disassembly assembly (34), a dichlorosilane connecting pipe (35), a first nitrogen connecting pipe (36), a mixed gas outlet pipe (37), and a waste gas recovery pipe (38). The top of the oil bath tank (31) is slidably connected to the opening and closing top cover (32). The interior of the opening and closing top cover (32) is connected to the dichlorosilane connecting pipe (35), the first nitrogen connecting pipe (36), the mixed gas outlet pipe (37), and the waste gas recovery pipe (38). The pipe (38) is slidably connected, the bottom of the oil bath tank (31) is connected to the source bottle support assembly (33), the inner wall side of the oil bath tank (31) is connected to the source bottle disassembly assembly (34), and three sets of electric three-way valves are fixedly connected at the three-way joints of the dichlorosilane connecting pipe (35), the first nitrogen connecting pipe (36) and the mixed gas outlet pipe (37). The ends of the dichlorosilane connecting pipe (35), the first nitrogen connecting pipe (36) and the mixed gas outlet pipe (37) are respectively threadedly connected to the connecting joints (22) of the two sets of dichlorosilane source bottles (2).

2. The automatic semiconductor quartz coating spraying equipment according to claim 1, characterized in that, The chemical vapor deposition furnace (4) includes a deposition furnace body (41), a lower furnace cover lifting mechanism (42), a lower furnace cover (43), and a workpiece tray (44). The bottom of the deposition furnace body (41) is fixedly connected to the lower furnace cover lifting mechanism (42), the bottom of the deposition furnace body (41) is engaged with the lower furnace cover (43), and the top of the lower furnace cover (43) is fixedly connected to the workpiece tray (44).

3. The automatic semiconductor quartz coating spraying equipment according to claim 2, characterized in that, The composite gas supply spraying mechanism (5) includes a single-point gas supply spraying component (51) and a range gas supply component (52), both of which are connected to the chemical vapor deposition furnace (4).

4. The automatic semiconductor quartz coating spraying equipment according to claim 3, characterized in that, The source bottle support assembly (33) includes a first hollow rotating platform (331), a pneumatic lifting mechanism (332), a double support (333), and spring pins (334). The first hollow rotating platform (331) is fixedly connected to the bottom of the oil bath tank (31). The output end of the first hollow rotating platform (331) is fixedly connected to the pneumatic lifting mechanism (332) through a connecting plate. The output end of the pneumatic lifting mechanism (332) is fixedly connected to the double support (333). The interior of the double support (333) is fixedly connected to multiple sets of spring pins (334).

5. The automatic semiconductor quartz coating spraying equipment according to claim 4, characterized in that, The source bottle disassembly assembly (34) includes a first linear module (341), a second linear module (342), a source bottle opening and closing assembly (343), and a pipeline gas recovery assembly (344). The first linear module (341) is fixedly connected to the top of the inner wall of the oil bath tank (31). The output end of the first linear module (341) is fixedly connected to the second linear module (342). The output end of the second linear module (342) is connected to the source bottle opening and closing assembly (343). The source bottle opening and closing assembly (343) is connected to the pipeline gas recovery assembly (344).

6. The automatic semiconductor quartz coating spraying equipment according to claim 5, characterized in that, The source bottle opening and closing assembly (343) includes a second hollow rotating platform (3431), a servo motor (3432), a monitoring probe (3433), a torsion sleeve (3434), a first cylinder (3435), a floating platform (3436), and an open-end electric wrench (3437). The second hollow rotating platform (3431) is fixedly connected to the output end of the second linear module (342). The output end of the second hollow rotating platform (3431) is fixedly connected to the servo motor (3432) through a first fixed frame. The output end of the servo motor (3432) is fixedly connected to the monitoring probe (3433). The inside of the monitoring probe (3433) is fixedly connected to the torsion sleeve (3434). The side of the first fixed frame is fixedly connected to the first cylinder (3435). The output end of the first cylinder (3435) is fixedly connected to the floating platform (3436) through a connecting plate. The top of the floating platform (3436) is fixedly connected to the open-end electric wrench (3437) through a second fixed frame.

7. The automatic semiconductor quartz coating spraying equipment according to claim 6, characterized in that, The pipeline gas recovery assembly (344) includes a first fixed plate (3441), a first gas guide pipe (3442), a first fixed frame (3443), a C-shaped sleeve (3444), and a low-temperature nitrogen nozzle (3445). The first fixed plate (3441) is fixedly connected to the second fixed frame. The inner wall of the first fixed plate (3441) is fixedly connected to the first gas guide pipe (3442). The outer surface of the first gas guide pipe (3442) is fixedly connected to the first fixed frame (3443). The two ends of the first fixed frame (3443) are fixedly connected to two sets of low-temperature nitrogen nozzles (3445). The first gas guide pipe (3442) is fixedly connected to the C-shaped sleeve (3444).

8. The automatic semiconductor quartz coating spraying equipment according to claim 7, characterized in that, The end of the low-temperature nitrogen nozzle (3445) extends into the interior of the C-type sleeve (3444), and the top of the C-type sleeve (3444) is engaged with the top of the connecting joint (22) to cool the gas drawn in by the C-type sleeve (3444).

9. The automatic semiconductor quartz coating spraying equipment according to claim 8, characterized in that, The single-point air supply spraying assembly (51) includes a six-axis robotic arm (511), a second fixed frame (512), a quartz torch (513), a second fixed plate (514), a rotating plate (515), a guide suction nozzle (516), a heat-resistant hydraulic cylinder (517), an annular gas pipe (518), and a first nitrogen nozzle (519). The six-axis robotic arm (511) is fixedly connected to the top of the inner wall of the deposition furnace body (41). The output end of the six-axis robotic arm (511) is fixedly connected to the second fixed frame (512). The interior of the second fixed frame (512) is fixedly connected to the quartz torch (513). The outer surface of the quartz torch (513) is fixedly connected to the second fixed plate. (514) Fixed connection, the second fixed plate (514) is rotatably connected to the two sets of rotating plates (515), the interior of the two sets of rotating plates (515) is fixedly connected to the two sets of guide suction nozzles (516), the lower surface of the second fixed frame (512) is rotatably connected to the two sets of heat-resistant hydraulic cylinders (517), the upper surface of the two sets of rotating plates (515) is rotatably connected to the output end of the two sets of heat-resistant hydraulic cylinders (517), the outer surface of the annular gas pipe (518) is fixedly connected to the third fixed frame (522), the annular gas pipe (518) is fixedly connected to multiple sets of first nitrogen nozzles (519), and the multiple sets of first nitrogen nozzles (519) extend into the interior of the deposition furnace body (41).

10. The automatic semiconductor quartz coating spraying equipment according to claim 9, characterized in that, The range gas supply assembly (52) includes a drive motor (521), a third fixed frame (522), a first gear ring (523), a bevel gear ring (524), multiple sets of bevel gears (525), multiple sets of mixed gas nozzles (527), multiple sets of sliding sleeves (528), and multiple sets of guide columns (529). The drive motor (521) and the third fixed frame (522) are both fixedly connected to the upper surface of the lower furnace cover lifting mechanism (42). The top of the third fixed frame (522) is rotatably connected to the first gear ring (523). The top of the first gear ring (523) is provided with a guide groove (526). The upper surface of the ring (523) is fixedly connected to the bevel gear ring (524), the bevel gear ring (524) meshes with the bevel gear (525), the drive motor (521) meshes with the first gear ring (523) through the gear, the bevel gear (525) and the sliding sleeve (528) are slidably connected through the keyway and the key, the inner wall of the sliding sleeve (528) is fixedly connected to the mixed gas nozzle (527), the mixed gas nozzle (527) is slidably connected to the deposition furnace body (41), the sliding sleeve (528) and the guide column (529) are rotatably connected through the limiting sleeve, and the guide column (529) and the guide groove (526) are in contact and slide together.

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