A galvanometer module and a relative coordinate synchronization method and system of a motion platform

Abstract

The application provides a relative coordinate synchronization method and system of a galvanometer module and a motion platform, and relates to the technical field of semiconductor chip equipment. The relative coordinate synchronization method disclosed in the specification comprises the following steps: controlling the motion platform to move to a first preset position based on a first sensor; obtaining the actual position of the motion platform after the motion platform moves to the first preset position based on a second sensor, the positioning accuracy of the second sensor being higher than that of the first sensor; obtaining the target position of the motion platform based on a galvanometer module; and adjusting the motion platform based on the target position, so that the position deviation between the actual position of the adjusted motion platform and the target position is less than a preset error window.

Description

Technical Field

[0001] This specification relates to the technical field of semiconductor chip devices, and in particular to a method, system, and computer program product for synchronizing the relative coordinates of a galvanometer module and a motion platform. Background Technology

[0002] In the field of semiconductor chip manufacturing equipment, high-end laser processing and precision measurement equipment can employ a composite motion structure combining a galvanometer module and a motion platform. In applications utilizing laser scanning to fabricate chip microbumps, the galvanometer module can be mounted above the motion platform, with a metal film placed between them. During operation, the galvanometer module leverages its inherent characteristics to achieve a small-range, high-response laser beam deflection scan, applying the laser to the surface of the donor metal film. The metal film, heated by the laser, forms molten metal droplets that fall onto the silicon wafer surface mounted on the motion platform, thus completing the fabrication of the chip microbumps. In actual production, to ensure overall processing accuracy and efficiency, the optical axis of the galvanometer module and the motion axis of the motion platform must maintain strict spatial coaxiality. After prolonged operation, due to factors such as mechanical wear, temperature changes, and stress release, the initial coaxial relationship between the galvanometer and the motion platform may drift, leading to a decrease in processing accuracy. Summary of the Invention

[0003] One or more embodiments of this specification provide a method for synchronizing the relative coordinates of a galvanometer module and a motion platform, comprising: controlling the motion platform to move to a first preset position based on a first sensor; acquiring the actual position of the motion platform after moving to the first preset position based on a second sensor, wherein the positioning accuracy of the second sensor is higher than that of the first sensor; acquiring the target position of the motion platform based on the galvanometer module; and adjusting the motion platform based on the target position so that the positional deviation between the adjusted actual position of the motion platform and the target position is less than a preset error window.

[0004] In some embodiments, the relative coordinate synchronization method further includes: obtaining the first preset position based on the initial position of the galvanometer module.

[0005] In some embodiments, obtaining the first preset position based on the initial position of the galvanometer module includes: determining the initial zero position of the motion platform based on the initial position of the galvanometer module; controlling the motion platform to move to the initial zero position; and taking the actual position of the motion platform after moving to the initial zero position as the first preset position.

[0006] In some embodiments, controlling the motion platform to move to a first preset position based on the first sensor includes: acquiring the current position information of the motion platform through the first sensor; processing the current position information of the motion platform and the first position information corresponding to the first preset position through a position PID loop to obtain first speed information; processing the current speed information of the motion platform and the first speed information through a speed PID loop to obtain first current information; processing the current current information of the motion platform and the first current information through a current PID loop to obtain a first control signal; and controlling the motion platform based on the first control signal to move it to the first preset position.

[0007] In some embodiments, adjusting the motion platform based on the target position includes: obtaining a position deviation value based on the actual position of the motion platform after it moves to the first preset position and the target position; obtaining a cumulative deviation value based on the position deviation value; obtaining displacement information based on the position deviation value and the cumulative deviation value; and adjusting the motion platform based on the displacement information.

[0008] In some embodiments, adjusting the motion platform based on the displacement information includes: obtaining second speed information based on the displacement information; processing the current speed information of the motion platform and the second speed information through a speed PID loop to obtain second current information; processing the current current information of the motion platform and the second current information through a current PID loop to obtain a second control signal; and controlling the motion platform to perform adjustments based on the second control signal.

[0009] In some embodiments, the cumulative deviation value is the sum of the position deviation value and the cumulative deviation value after the previous adjustment of the motion platform; the displacement information is the sum of the position deviation value multiplied by a proportional coefficient and the cumulative deviation value multiplied by an integral coefficient.

[0010] In some embodiments, the scaling factor is 0.1 to 1; the integral factor is 0.05 to 0.15 times the scaling factor.

[0011] In some embodiments, adjusting the motion platform based on the target position includes: obtaining a position deviation value based on the actual position of the motion platform after it has moved to the first preset position and the target position; controlling the motion platform to move in a preset direction based on the absolute value of the position deviation value; or, controlling the motion direction and movement distance of the motion platform based on the magnitude of the absolute value of the position deviation value and the absolute value of the position deviation value after the previous adjustment of the motion platform; or, controlling the motion direction of the motion platform based on the positive or negative attribute of the position deviation value and controlling the movement distance of the motion platform based on the numerical value of the position deviation value.

[0012] In some embodiments, obtaining the target position of the motion platform based on the galvanometer module includes: obtaining the current position of the galvanometer module based on a third sensor; determining the current zero position of the motion platform based on the current position of the galvanometer module, and using the current zero position as the target position of the motion platform.

[0013] In some embodiments, the first sensor is a grating ruler; the second sensor and the third sensor are both interferometers, and the second sensor and the third sensor use the same light source.

[0014] In some embodiments, the second sensor includes a first interferometer and a second interferometer; the third sensor includes a third interferometer and a fourth interferometer; the light beam provided by the light source is divided into a first light beam and a second light beam by a first beam splitter; the first light beam is divided into a first sub-beam for providing to the first interferometer and a second sub-beam for providing to the third interferometer by a second beam splitter; the second light beam is divided into a third sub-beam for providing to the second interferometer and a fourth sub-beam for providing to the fourth interferometer by a third beam splitter.

[0015] In some embodiments, controlling the motion platform to move to a first preset position based on a first sensor includes: obtaining the current position information of the driven end of the motion platform through the first sensor; controlling the motion platform to move to the first preset position based on the current position information of the driven end; obtaining the actual position of the motion platform after moving to the first preset position based on a second sensor includes: obtaining the actual position of the end of the motion platform after moving to the first preset position through the second sensor.

[0016] This specification provides one or more embodiments of a relative coordinate synchronization system between a galvanometer module and a motion platform, comprising: a control module for controlling the motion platform to move to a first preset position based on a first sensor; an actual position acquisition module for acquiring the actual position of the motion platform after moving to the first preset position based on a second sensor, wherein the positioning accuracy of the second sensor is higher than that of the first sensor; a target position acquisition module for acquiring the target position of the motion platform based on the galvanometer module; and an adjustment module for adjusting the motion platform based on the target position, such that the positional deviation between the adjusted actual position of the motion platform and the target position is less than a preset error window.

[0017] This specification provides one or more embodiments of a computer program product, including computer instructions or computer code, which, when at least a portion of the computer instructions or computer code is executed by a processor, enables the relative coordinate synchronization method between the galvanometer module and the motion platform as described in any of the preceding claims.

[0018] The beneficial effects that the embodiments of this specification may bring include, but are not limited to: (1) the motion platform is controlled to move quickly to the first preset position based on the first sensor, and the absolute spatial position of the galvanometer module is sensed in real time by the second sensor, and the relative position deviation between the motion platform and the galvanometer module is detected in real time. When the position of the galvanometer module changes, the position of the motion platform can be compensated; (2) there is no need for traditional manual intervention by stopping the machine with external instruments such as microscopes and CCDs, and online and automated real-time correction can be achieved; (3) it has a coarse motion mode provided by the first sensor closed loop and a micro motion mode provided by the second sensor closed loop, taking into account both large-range movement and accurate positioning accuracy; (4) it provides a closed-loop correction, that is, it detects the relative deviation between the motion platform and the galvanometer module. When the deviation value exceeds the set error window, the motion platform can compensate in micro motion mode to achieve position correction. It should be noted that different embodiments may produce different beneficial effects. In different embodiments, the beneficial effects may be any one or a combination of the above, or any other possible beneficial effects. The above only lists the beneficial effects of some embodiments of this specification. More beneficial effects of the technical features of the embodiments of this specification can be found in the relevant descriptions of the corresponding embodiments, and will not be listed here. Attached Figure Description

[0019] This specification will be further described by way of exemplary embodiments, which will be described in detail with reference to the accompanying drawings. The same numbers in the drawings denote the same structures or steps.

[0020] Figure 1 This is a flowchart illustrating a relative coordinate synchronization method according to some embodiments of this specification.

[0021] Figure 2 This is a flowchart illustrating the process of obtaining a first preset position using a relative coordinate synchronization method according to some embodiments of this specification.

[0022] Figure 3 This is a schematic diagram illustrating the process of controlling a motion platform to move to a first preset position using a relative coordinate synchronization method according to some embodiments of this specification.

[0023] Figure 4 This is a logic diagram of a PID loop for controlling a motion platform to move to a first preset position using a relative coordinate synchronization method shown in some embodiments of this specification.

[0024] Figure 5 This is a flowchart illustrating a relative coordinate synchronization method based on a target position for adjusting a motion platform, according to some embodiments of this specification.

[0025] Figure 6 This is a flowchart illustrating the relative coordinate synchronization method according to some embodiments of this specification, which adjusts the motion platform based on displacement information.

[0026] Figure 7 This is a logic diagram of the PID loop of the motion platform adjusted based on displacement information in a relative coordinate synchronization method according to some embodiments of this specification.

[0027] Figure 8 This is a flowchart illustrating the adjustment of the motion platform based on displacement information according to other embodiments of the relative coordinate synchronization method shown in this specification.

[0028] Figure 9 This is a flowchart illustrating the process of obtaining the target position of a motion platform using a relative coordinate synchronization method according to some embodiments of this specification.

[0029] Figure 10 This is a schematic diagram of the relative coordinate synchronization system shown in some embodiments of this specification.

[0030] Figure 11 This is a schematic diagram of the optical paths of the second and third sensors of the relative coordinate synchronization method shown in some embodiments of this specification. Detailed Implementation

[0031] To more clearly illustrate the technical solutions of the embodiments in this specification, the embodiments will be described in detail below with reference to the accompanying drawings. Obviously, the content described below are some examples or embodiments of this specification. For those skilled in the art, without creative effort, the technical solutions or means disclosed in this specification can be applied to other scenarios based on this technical content.

[0032] It should be understood that the terms "system," "device," "unit," and / or "module" used in this specification are a method of distinguishing different components, elements, parts, sections, or assemblies at different levels. However, if other terms can achieve the same purpose, they may be replaced by other expressions.

[0033] Unless otherwise specified, the technical terms used to describe components, elements, etc. in this specification are not singular but may include plural. Generally speaking, terms such as "comprising" or "including" only indicate that explicitly identified steps, elements, or components are included, and these steps, elements, and components do not constitute an exclusive list, as the described method or apparatus may also include other steps or components.

[0034] This specification uses flowcharts to illustrate the operational steps performed by the apparatus or system of related embodiments. However, unless otherwise specified, the order in which these steps are described should not be construed as a limitation on the order of execution. Those skilled in the art can adjust the order of these steps based on the knowledge and information conveyed by the embodiments in this specification. Such adjustments include, but are not limited to, reversing the order of steps, merging multiple steps, and splitting a step.

[0035] In the field of semiconductor chip manufacturing equipment, high-end laser processing and precision measurement equipment can employ a composite motion structure combining a galvanometer module and a motion platform. In applications where laser scanning is used to fabricate chip microbumps, the galvanometer module can be mounted above the motion platform, with a metal film placed between them. During operation, the galvanometer module utilizes its own characteristics to achieve a small-range, high-response-speed laser beam deflection scan, applying the laser to the surface of the metal film, which serves as the donor. The metal film is heated by the laser, forming molten metal droplets that fall onto the silicon wafer surface mounted on the motion platform, thus completing the fabrication of chip microbumps.

[0036] In this application scenario, motion platforms such as XY displacement stages are primarily responsible for large-scale, high-precision workpiece positioning. They can work in conjunction with laser scanning to achieve large-scale printing of micro-bumps on silicon wafers, ensuring the positioning accuracy of each micro-bump and effectively controlling the spacing error between adjacent micro-bumps. In actual production, to ensure the overall processing accuracy and efficiency of the equipment, the optical axis of the galvanometer module and the motion axis of the motion platform, especially the zero-point position of the motion platform, must maintain strict spatial coaxiality, ensuring they are unified within the same relative coordinate system. This is a crucial prerequisite for stable equipment operation and the production of qualified products.

[0037] In some applications, after prolonged operation, the initial coaxial relationship between the galvanometer and the motion platform may drift due to factors such as mechanical wear, temperature changes, and stress release, resulting in a decrease in machining accuracy.

[0038] Based on this, one or more embodiments of this specification provide a method for synchronizing the relative coordinates of a galvanometer module and a motion platform, enabling the galvanometer module and the motion platform to be in the same relative coordinate system.

[0039] Figure 1 This is a flowchart illustrating a relative coordinate synchronization method according to some embodiments of this specification. In some embodiments, Figure 1 The illustrated process 100 can be implemented by a relative coordinate synchronization system 800. See also... Figure 1 As shown, the method for synchronizing the relative coordinates of the galvanometer module and the motion platform provided in one or more embodiments of this specification may include the following steps.

[0040] Step 110: Control the motion platform to move to the first preset position based on the first sensor.

[0041] In one or more embodiments of this specification, the galvanometer module may be located above the motion platform. The galvanometer module is mechanically fixed in a horizontal or substantially horizontal first direction X and / or second direction Y, and is configured to be displaceable in a third direction Z perpendicular to the first direction X and the second direction Y. It should be noted that although the galvanometer module is mechanically fixed in its initial position, its position in the first direction X and / or second direction Y may shift due to vibrations caused by the overall movement of the galvanometer module in the third direction or by vibrations caused by the operation of its internal deflection motor during operation. This results in the current position of the galvanometer module differing from its initial position.

[0042] In some embodiments, the position of the galvanometer module (e.g., the initial position of the galvanometer module, the current position of the galvanometer module) may include the position of the optical axis of the galvanometer module. In some embodiments, the position of the optical axis of the galvanometer module may include a first direction coordinate in the first direction X and a second direction coordinate in the second direction Y.

[0043] In some embodiments, the motion platform can move below the galvanometer module along a horizontal or substantially horizontal first direction X and / or a second direction Y. In some embodiments, the motion platform is used to carry an object to be processed, such as a silicon wafer. In some embodiments, the motion platform may have a motion axis. Exemplarily, the motion axis of the motion platform may include the center of the motion platform, such as the geometric center of the upper surface of the motion platform. In some embodiments, the position of the motion platform may include the position of the motion axis of the motion platform. In some embodiments, the position of the motion axis of the motion platform may include a first direction coordinate in the first direction X and a second direction coordinate in the second direction Y.

[0044] In some application scenarios, if the motion axis of the motion platform and the optical axis of the galvanometer module can maintain a strict spatial coaxial state at the start of a production task, then the production task can have good machining accuracy.

[0045] In other application scenarios, after prolonged operation, the motion axis of the galvanometer module and the motion platform may drift relative to the optical axis of the galvanometer module due to factors such as mechanical wear, temperature changes, and stress release. If production tasks are started directly under these conditions, it may lead to a decrease in machining accuracy. By implementing the relative coordinate synchronization method in one or more embodiments of this specification, the galvanometer module and the motion platform can be unified within the same relative coordinate system. For example, by restoring the motion axis of the motion platform to a strictly spatially coaxial state with the optical axis of the galvanometer module, machining accuracy can be improved.

[0046] In some embodiments, in step 110, the first preset position may include a position close to the initial position of the galvanometer module. In some embodiments, the position corresponding to the initial position of the galvanometer module may include the projection position of the initial position of the galvanometer module (e.g., the optical axis of the galvanometer module) onto the plane where the motion platform is located. In other embodiments, the position corresponding to the initial position of the galvanometer module may include the position of the light spot projected by the laser along the third direction Z when the galvanometer module is operating in its initial position on the plane where the motion platform is located. For example, the initial position of the galvanometer module may be (X, Y, Z), the position corresponding to the initial position of the galvanometer module may be (X, Y), and the first preset position may include a position close to (X, Y).

[0047] Since the galvanometer module is mechanically fixed in the first direction X and the second direction Y, after long-term operation, the displacement of the galvanometer module relative to its initial position is small (e.g., on the order of hundreds of nanometers or tens of nanometers). Therefore, controlling the motion platform to move to a first preset position close to the initial position of the galvanometer module can quickly approach the current position of the galvanometer module, so as to quickly complete the spatial coaxial adjustment between the motion axis of the motion platform and the optical axis of the galvanometer module.

[0048] In some embodiments, the first sensor may be a grating ruler. In some embodiments, the accuracy of the first sensor may be at the micrometer level.

[0049] Figure 3 This is a flowchart illustrating the process of controlling a motion platform to move to a first preset position using a relative coordinate synchronization method according to some embodiments of this specification. Figure 4 This is a logic diagram of a PID loop controlling the motion platform to move to a first preset position according to some embodiments of the relative coordinate synchronization method shown in this specification. See also Figure 3 , Figure 4 As shown, in one or more embodiments of this specification, step 110 may be performed according to... Figure 3 The process 300 is implemented in the control module 810 in some embodiments. In some embodiments, the process 300 may include the following steps.

[0050] Step 310: Obtain the current position information of the motion platform through the first sensor.

[0051] Step 320: The current position information of the motion platform and the first position information corresponding to the first preset position are processed by the position PID loop to obtain the first speed information.

[0052] Step 330: The current speed information of the motion platform and the first speed information are processed by the speed PID loop to obtain the first current information.

[0053] Step 340: The current current information and the first current information of the motion platform are processed by the current PID loop to obtain the first control signal.

[0054] Step 350: Control the motion platform based on the first control signal to move it to the first preset position.

[0055] In one or more embodiments of this specification, process 300 employs a three-loop cascaded PID control, consisting of a position loop, a speed loop, and a current loop from the outside in. The outer loop output serves as the target setpoint for the inner loop, which corrects deviations in real time. Through layer-by-layer constraints, the final output is a first control signal to drive the motion platform, achieving high-precision motion control.

[0056] In some embodiments, in step 310, acquiring the current position information of the motion platform through the first sensor includes: acquiring the current position information of the motion platform through a grating ruler.

[0057] In some embodiments, in step 310, acquiring the current position information of the motion platform through the first sensor includes: acquiring the current position information of the driven end of the motion platform through the first sensor. In some embodiments, the driven end of the motion platform may include: the connection between the drive mechanism that drives the motion platform and the motion platform.

[0058] In some embodiments, in step 310, the current position information of the motion platform may include the position information of the motion axis center of the motion platform at the current position. In some embodiments, the position information of the motion axis center of the motion platform at the current position may include the coordinates of the motion axis center of the motion platform at the current position. For example, it may specifically include the coordinates of the motion axis center of the motion platform at the current position in a first direction X and / or the coordinates in a second direction Y, such as (X... 运动平台当前位置 Y 运动平台当前位置 ).

[0059] In some embodiments, in step 320, the first position information corresponding to the first preset position may include the coordinates corresponding to the first preset position. For example, it may specifically include the coordinates of the first preset position in the first direction X and / or the coordinates in the second direction Y, for example (X... 第一预设位置 Y 第一预设位置 ).

[0060] In some embodiments, in step 320, the current position information of the motion platform and the first position information corresponding to the first preset position are processed by the position PID loop to obtain the first speed information, including: calculating the first position deviation value based on the current position information of the motion platform and the first position information corresponding to the first preset position, and outputting the first speed information based on the first position deviation value.

[0061] In some embodiments, the first position deviation value may include a position deviation value in the first direction X and a position deviation value in the second direction Y. For example, it may specifically include the difference between the coordinates of the motion axis center at the current position of the motion platform in the first direction X and the coordinates corresponding to the first preset position, and the difference between the coordinates of the motion axis center at the current position of the motion platform in the second direction Y and the coordinates corresponding to the first preset position, for example (ΔX). 第一位置偏差值 ΔY 第一位置偏差值 ), where ΔX 第一位置偏差值 =X 第一预设位置 -X 运动平台当前位置 ΔY 第一位置偏差值 =Y 第一预设位置 -Y 运动平台当前位置 .

[0062] In some embodiments, a first speed information is output based on a first position deviation value, wherein the larger the absolute value of the first position deviation value, the faster the speed provided by the output first speed information, so that the motion platform can quickly approach the first preset position and slow down when approaching the first preset position to prevent overshoot and impact.

[0063] In some embodiments, in step 330, the current speed information of the motion platform can be obtained through a speed sensor.

[0064] In some embodiments, in step 330, the current speed information and the first speed information of the motion platform are processed by the speed PID loop to obtain the first current information, including: calculating the first speed deviation value based on the current speed information and the first speed information of the motion platform, and outputting the first current information based on the first speed deviation value.

[0065] In some embodiments, the first velocity deviation value may include a velocity deviation value ΔV in the first direction X. X The velocity deviation ΔV in the second direction Y Y For example, the speed deviation value ΔV X The velocity deviation value ΔV can be the difference between the velocity in the first direction X provided by the current velocity information of the motion platform and the velocity in the first direction Y provided by the first velocity information. Y It can be the difference between the velocity in the second direction Y provided by the current velocity information of the motion platform and the velocity in the second direction Y provided by the first velocity information.

[0066] In some embodiments, the speed PID loop dynamically corrects the deviation, suppressing speed fluctuations and jitters of the motion platform, ensuring that the motion platform moves smoothly at the speed required by the position PID loop, and avoiding start-stop jerking and unstable speed.

[0067] In some embodiments, in step 340, the current current information of the motion platform can be obtained through a current sensor.

[0068] In some embodiments, in step 340, the current current information and the first current information of the motion platform are processed by the current PID loop to obtain the first control signal, including: calculating the first current deviation value based on the current current information and the first current information of the motion platform, and outputting the first control signal based on the first current deviation value.

[0069] In some embodiments, the first current deviation value may include a current deviation value ΔI for driving the drive mechanism in the first direction X. X and the current deviation value ΔI used to drive the drive mechanism in the second direction Y Y For example, the current deviation value ΔI XThe difference between the current current of the drive mechanism in the first direction X, provided by the current current information of the motion platform, and the current used to drive the drive mechanism in the first direction X, provided by the first current information, is the current deviation value ΔI. Y The difference between the current current of the drive mechanism in the second direction Y provided by the current current information of the motion platform and the current used to drive the drive mechanism in the second direction Y provided by the first current information.

[0070] In some embodiments, the output torque driving the motion platform is directly controlled by a current PID loop, which can quickly respond to torque changes and improve the system's dynamic response capability.

[0071] Step 120: Based on the second sensor, the actual position of the motion platform after it has moved to the first preset position is obtained. The positioning accuracy of the second sensor is higher than that of the first sensor.

[0072] In some embodiments, step 120 can be implemented by the actual location acquisition module 820.

[0073] In some embodiments, in step 120, obtaining the actual position of the motion platform after it has moved to the first preset position based on the second sensor includes: obtaining the actual position of the motion platform after it has moved to the first preset position based on an interferometer, wherein the positioning accuracy of the interferometer is higher than that of the grating ruler.

[0074] In some embodiments, in step 120, obtaining the actual position of the motion platform after it has moved to the first preset position based on the second sensor includes: obtaining the actual position of the end of the motion platform after it has moved to the first preset position using the second sensor. In some embodiments, the end of the motion platform includes: the surface of the motion platform, the center of the surface of the motion platform, the end of a component mounted on the motion platform, etc.

[0075] In some embodiments, due to the low accuracy of the first sensor, when the first sensor reports that the motion platform has moved to the first preset position, the actual position of the motion platform at this time may deviate from the first preset position. In some use cases, this deviation may be less than the accuracy of the first sensor. In some embodiments, a second sensor with higher accuracy can be used to detect the actual position of the motion platform after it has moved to the first preset position, and subsequent processes can be executed based on the detection result (e.g., more accurate actual position coordinates).

[0076] For example, the first preset position is (0, 0). After the motion platform moves to the first preset position, the first sensor (e.g., a grating ruler) reports that the position of the motion platform at this time is (0, 0). However, the actual position of the motion platform at this time is (0.1, 0.2). The second sensor obtains the position of the motion platform at this time, and the second sensor reports that the actual position is (0.1, 0.2).

[0077] In some embodiments, during the process of the motion platform moving to the first preset position, the main purpose of this process is to make the motion platform quickly approach the first preset position and facilitate subsequent precise calibration. Therefore, in this process, detection by a first sensor with lower precision and detection of the driven end of the motion platform are sufficient to meet the requirements. After the motion platform moves to the first preset position, if further precise calibration is required, detection by a second sensor with higher precision and detection of the end of the motion platform (the end of the motion platform may vibrate relative to the driven end of the motion platform, and the displacement error will be amplified at the end of the motion platform, while the actual position control is mainly between the end of the motion platform and the optical axis center of the galvanometer module) can achieve more precise position feedback and position control.

[0078] Step 130: Obtain the target position of the motion platform based on the galvanometer module.

[0079] In some embodiments, in step 130, in order to achieve, maintain, or restore a strictly spatially coaxial state between the motion platform and the galvanometer module (e.g., the motion axis of the motion platform and the optical axis of the galvanometer module), when the relative coordinate synchronization method is executed to synchronize the coordinates of the motion platform and the galvanometer module, the target position of the motion platform should correspond to the actual position of the galvanometer module.

[0080] In some embodiments, in step 130, obtaining the target position of the motion platform based on the galvanometer module includes: obtaining the target position of the motion platform based on the current position of the galvanometer module.

[0081] It should be noted that the order of steps 120 and 130 can be selected according to actual needs.

[0082] Figure 9 This is a flowchart illustrating the process of obtaining the target position of a motion platform using a relative coordinate synchronization method according to some embodiments of this specification. See also... Figure 9 As shown, in one or more embodiments of this specification, step 130 may be performed according to... Figure 9 The process 700 is implemented in the above-mentioned method. In some embodiments, process 700 may be implemented by target location acquisition module 830. In some embodiments, process 700 may include the following steps.

[0083] Step 710: Obtain the current position of the galvanometer module based on the third sensor.

[0084] Step 720: Determine the current zero position of the motion platform based on the current position of the galvanometer module, and use the current zero position as the target position of the motion platform.

[0085] In some embodiments, in step 710, the third sensor may be the same as the second sensor. In some embodiments, both the second and third sensors may be interferometers. In some embodiments, the second and third sensors use the same light source, i.e., the two interferometers use the same light source, to eliminate differences in light source coherence, unify the measurement reference of the two interferometers, and ensure consistent measurement values. In some embodiments, light source fluctuations can simultaneously affect the two interferometers. The error generated by these light source fluctuations is a common-mode error, which can be directly canceled out during subsequent difference and comparison calculations, thereby improving the synchronization and comparison accuracy of the two sets of measurement data.

[0086] In some further embodiments, the second sensor may include two or more interferometers, and the third sensor may include two or more interferometers, wherein the multiple interferometers of the second sensor and the multiple interferometers of the third sensor all use the same light source.

[0087] In some embodiments, see Figure 11 As shown, the second sensor includes a first interferometer l1 and a second interferometer l2; the third sensor includes a third interferometer l3 and a fourth interferometer l4. In some embodiments, the first interferometer l1 is used to measure the position of the motion platform 1 in the first direction X, and the second interferometer l2 is used to measure the position of the motion platform 1 in the second direction Y. In some embodiments, the third interferometer l3 is used to measure the position of the galvanometer module 2 in the first direction X, and the fourth interferometer l4 is used to measure the position of the galvanometer module 2 in the second direction Y.

[0088] In some embodiments, the light beam provided by the light source L is divided into a first beam and a second beam by a first beam splitter B1. In some embodiments, the first beam is divided into a first sub-beam for supplying to a first interferometer l1 and a second sub-beam for supplying to a third interferometer l3 by a second beam splitter B2. In some embodiments, the second beam is divided into a third sub-beam for supplying to a second interferometer l2 and a fourth sub-beam for supplying to a fourth interferometer l4 by a third beam splitter B3.

[0089] For example, the first beam is reflected by the first mirror R1 and the second mirror R2, changing its optical path and being provided to the second beam splitter B2. For example, the first beam is split by the second beam splitter B2 to form a first sub-beam and a second sub-beam, wherein the first sub-beam is directly provided to the first interferometer l1, and the second sub-beam is split by the third mirror R3 and then provided to the third interferometer l3. For example, the second beam is split by the third beam splitter B3 to form a third sub-beam and a fourth sub-beam, the third sub-beam is directly provided to the interferometer l2, and the fourth sub-beam is split by the fourth mirror R4 and the fifth mirror R5 and then provided to the fourth interferometer l4.

[0090] In some embodiments, elongated mirrors are mounted on the surfaces of the motion platform 1 in the first direction X and the second direction Y, respectively, to provide reflected light beams to the first interferometer l1 and the second interferometer l2. In some embodiments, elongated mirrors are mounted on the surfaces of the galvanometer module 2 in the first direction X and the second direction Y, respectively, to provide reflected light beams to the third interferometer l3 and the fourth interferometer l4.

[0091] In some embodiments, in step 720, the current zero position can be a position where the motion platform can maintain a strictly spatial coaxial state with the galvanometer module at the current position. In some embodiments, the current zero position is taken as the target position of the motion platform. When the motion platform moves to the target position, it is considered that the motion platform has maintained a strictly spatial coaxial state with the galvanometer module at the current position.

[0092] In some embodiments, in step 720, determining the current zero position of the motion platform based on the current position of the galvanometer module includes: determining the current zero position of the motion platform based on the position of the galvanometer module in the first direction X and the position in the second direction Y, wherein the current zero position includes the position of the galvanometer module in the first direction X and the position in the second direction Y.

[0093] In some embodiments, the position of the motion platform's current zero point in the first direction X is the position of the galvanometer module's current position in the first direction X, and the position of the motion platform's current zero point in the second direction Y is the position of the galvanometer module's current position in the second direction Y. For example, the current position of the galvanometer module can be (0.1, -0.1, 10), the current zero point of the motion platform is determined to be (0.1, -0.1), and the target position of the motion platform is (0.1, -0.1).

[0094] Step 140: Adjust the motion platform based on the target position so that the positional deviation between the actual position of the adjusted motion platform and the target position is less than a preset error window.

[0095] In some embodiments, step 140, adjusting the motion platform based on the target position, includes: adjusting the motion platform to bring it closer to the target position. When the positional deviation between the actual position of the adjusted motion platform and the target position is less than a preset error window, the motion platform can maintain a strictly spatial coaxial state with the galvanometer module at the current position. In some embodiments, the accuracy of the spatial coaxial state can be adjusted through the preset error window.

[0096] Figure 5 This is a flowchart illustrating the relative coordinate synchronization method according to some embodiments of this specification, where a motion platform is adjusted based on a target position. See also... Figure 5 As shown, in one or more embodiments of this specification, adjusting the motion platform based on the target position in step 140 can be performed according to... Figure 5 The process 400 is implemented in the above-mentioned system. In some embodiments, process 400 may be implemented by adjustment module 840. In some embodiments, process 400 may include the following steps.

[0097] Step 410: Based on the actual position of the motion platform after it moves to the first preset position and the target position, obtain the position deviation value.

[0098] Step 420: Obtain the cumulative deviation value based on the position deviation value.

[0099] Step 430: Obtain displacement information based on position deviation value and cumulative deviation value.

[0100] Step 440: Adjust the motion platform based on the displacement information.

[0101] In some embodiments, in step 410, the position deviation value can be the difference between the actual position of the motion platform after it has moved to the first preset position and the target position. For example, the position deviation value ΔFPOS = (FPOS1 - FPOS2), where FPOS1 is the target position (e.g., the feedback value of the third sensor) and FPOS2 is the actual position of the motion platform (e.g., the feedback value of the second sensor).

[0102] In some embodiments, in step 420, the cumulative deviation value is the sum of the position deviation value and the cumulative deviation value after the previous adjustment of the motion platform. For example, the cumulative deviation value PE = PE' + ΔFPOS, where PE' is the cumulative deviation value after the previous adjustment of the motion platform, and ΔFPOS is the position deviation value.

[0103] In some embodiments, in step 430, the displacement information may include the displacement that the motion platform needs to move in this motion. In some embodiments, the displacement information may be the sum of the position deviation value multiplied by a proportional coefficient and the cumulative deviation value multiplied by an integral coefficient. For example, the displacement information TPOS = Kp * ΔFPOS + Ki * PE, where ΔFPOS is the position deviation value, PE is the cumulative deviation value, Kp is the proportional coefficient, and Ki is the integral coefficient. In some embodiments, the proportional coefficient is 0.1 to 1. In some embodiments, the integral coefficient is 0.05 to 0.15 times the proportional coefficient. In some further embodiments, the integral coefficient may be 0.1 times the proportional coefficient. The above-mentioned proportional coefficient and integral coefficient provide a moderate response speed while reducing oscillations during adjustment, and can more thoroughly eliminate steady-state error. For example, the proportional coefficient is 0.1 and the integral coefficient is 0.01. For example, the proportional coefficient is 0.5 and the integral coefficient is 0.05. For example, the proportional coefficient is 0.5 and the integral coefficient is 0.075. For example, the proportional coefficient is 1 and the integral coefficient is 0.1.

[0104] In some embodiments, in steps 430 and 440, the displacement information may include first displacement information in the first direction X and second displacement information in the second direction Y, and the motion platform is adjusted based on the first displacement information and the second displacement information. In some embodiments, correspondingly, in steps 410 and 420, the position deviation value includes the position deviation value in the first direction X and the position deviation value in the second direction Y, and the cumulative deviation value includes the cumulative deviation value in the first direction X and the cumulative deviation value in the second direction Y. In some embodiments, the first displacement information and the second displacement information are calculated independently, thereby driving the motion platform independently in the first direction X and the second direction Y, respectively.

[0105] It should be noted that, in addition to the actual position FPOS2 of the motion platform (e.g., the feedback value of the third sensor in the first direction X and / or the feedback value of the third sensor in the second direction Y) potentially changing after an adjustment (or remaining unchanged in a certain direction), the target position (e.g., the feedback value of the third sensor) may also change due to the vibration of the galvanometer module. Therefore, the target position involved in steps 130, 710, 720, and 410 is the target position updated in real time.

[0106] Figure 6 This is a flowchart illustrating the relative coordinate synchronization method based on displacement information for adjusting the motion platform according to some embodiments of this specification. Figure 7 This is a logic diagram of the PID loop of the motion platform adjusted based on displacement information, according to some embodiments of the relative coordinate synchronization method shown in this specification. See also Figure 6 , Figure 7 As shown, in one or more embodiments of this specification, step 440 may be performed according to... Figure 6 The process 500 is implemented in the above-mentioned system. In some embodiments, process 500 may be implemented by adjustment module 840. In some embodiments, process 500 may include the following steps.

[0107] Step 510: Based on the displacement information, obtain the second velocity information.

[0108] Step 520: The current speed information and the second speed information of the motion platform are processed by the speed PID loop to obtain the second current information.

[0109] Step 530: The current current information and the second current information of the motion platform are processed by the current PID loop to obtain the second control signal.

[0110] Step 540: Adjust the motion platform based on the second control signal.

[0111] In one or more embodiments of this specification, process 500 employs a three-loop cascaded PID control, consisting of a position loop, a speed loop, and a current loop, from the outside in. The outer loop output serves as the target setpoint for the inner loop, which corrects deviations in real time. Through layer-by-layer constraints, a second control signal is ultimately output to drive the motion platform, achieving high-precision motion control.

[0112] In some embodiments, in step 510, second velocity information is obtained based on displacement information, wherein the larger the absolute value of displacement information, the faster the velocity provided by the output second velocity information.

[0113] In some embodiments, in step 520, the current speed information of the motion platform can be obtained through a speed sensor.

[0114] In some embodiments, in step 520, the current speed information and the second speed information of the motion platform are processed by the speed PID loop to obtain the second current information, including: calculating the second speed deviation value based on the current speed information and the second speed information of the motion platform, and outputting the second current information based on the second speed deviation value.

[0115] In some embodiments, the method for calculating the second speed deviation value and outputting the second current information is similar to the method for calculating the first speed deviation value and outputting the first current information, so it will not be described again.

[0116] In some embodiments, the speed PID loop dynamically corrects the deviation, suppressing speed fluctuations and jitters of the motion platform, ensuring that the motion platform moves smoothly at the speed required by the position PID loop, and avoiding start-stop jerking and unstable speed.

[0117] In some embodiments, in step 530, the current current information of the motion platform can be obtained through a current sensor.

[0118] In some embodiments, in step 530, the current current information and the second current information of the motion platform are processed by the current PID loop to obtain the second control signal, including: calculating the second current deviation value based on the current current information and the second current information of the motion platform, and outputting the second control signal based on the second current deviation value.

[0119] In some embodiments, the method for calculating the second current deviation value and the method for outputting the second control signal are similar to the method for calculating the first current deviation value and the method for outputting the first control signal, and therefore will not be described in detail.

[0120] In some embodiments, the output torque driving the motion platform is directly controlled by a current PID loop, which can quickly respond to torque changes and improve the system's dynamic response capability.

[0121] Figure 8 This is a flowchart illustrating the adjustment of the motion platform based on displacement information using a relative coordinate synchronization method according to other embodiments of this specification. See also... Figure 8 As shown, in one or more embodiments of this specification, adjusting the motion platform based on the target position in step 140 can be performed according to... Figure 8 The process 600 is implemented in the above-mentioned system. In some embodiments, process 600 may be implemented by adjustment module 840. In some embodiments, process 600 may include the following steps.

[0122] Step 610: Based on the actual position of the motion platform after it moves to the first preset position and the target position, obtain the position deviation value.

[0123] Step 620: Based on the absolute value of the position deviation, control the motion platform to move in a preset direction.

[0124] Step 630: Based on the absolute value of the position deviation and the magnitude of the absolute value of the position deviation after the previous adjustment of the motion platform, control the motion direction and motion distance of the motion platform.

[0125] In some embodiments, step 610 is similar to step 410, so it will not be described again.

[0126] In some embodiments, in step 610, the position deviation value ΔFPOSa is obtained; in step 620, the absolute value of the position deviation value ΔFPOSa, |ΔFPOSa|, is calculated, and the motion platform is controlled to move in a preset direction, |ΔFPOSa|.

[0127] In some embodiments, in step 630, the current position deviation value ΔFPOSb is obtained, and the absolute value |ΔFPOSb| of the current position deviation value ΔFPOSb is calculated. In some embodiments, in step 630, the absolute value of the position deviation value after the previous adjustment of the motion platform is |ΔFPOSa|.

[0128] In some embodiments, controlling the movement direction of the motion platform based on the absolute value of the position deviation and the absolute value of the position deviation after the previous adjustment of the motion platform includes: comparing the absolute value of the current position deviation |ΔFPOSb| with the absolute value of the position deviation after the previous adjustment |ΔFPOSa|; if |ΔFPOSb| < |ΔFPOSa|, then the preset direction is the direction closer to the target position, and the direction of the next adjustment of the motion platform is still the preset direction; if |ΔFPOSb| > |ΔFPOSa|, then the preset direction is the direction away from the target position, and the direction of the next adjustment of the motion platform is the opposite direction of the preset direction.

[0129] In some embodiments, controlling the movement distance of the motion platform based on the absolute value of the position deviation value and the absolute value of the position deviation value after the previous adjustment of the motion platform includes: the movement distance of the motion platform is the absolute value of the current position deviation value |ΔFPOSb|.

[0130] In some embodiments, step 630 is repeated until the positional deviation between the actual position of the motion platform after adjustment and the target position is less than a preset error window.

[0131] In some embodiments, process 600 may further include the following steps.

[0132] Step 640: Based on the positive or negative attribute of the position deviation value, control the movement direction of the motion platform; based on the value of the position deviation value, control the movement distance of the motion platform.

[0133] In some embodiments, step 640 may be executed after step 610 is performed.

[0134] In some embodiments, in step 610, the position deviation value ΔFPOSc is obtained, where ΔFPOSc = (FPOS1 - FPOS2), FPOS1 is the target position (e.g., the feedback value of the third sensor), and FPOS2 is the actual position of the motion platform (e.g., the feedback value of the second sensor).

[0135] In some embodiments, in step 640, controlling the movement direction of the motion platform based on the positive or negative attribute of the position deviation value includes: if the position deviation value ΔFPOSc is positive, it indicates that the motion platform has not yet moved to the correct position, and the movement direction of the motion platform next time is the same as the movement direction of the current motion platform; if the position deviation value ΔFPOSc is negative, it indicates that the motion platform has already moved to the correct position, and the movement direction of the motion platform next time is opposite to the movement direction of the current motion platform.

[0136] In some embodiments, in step 640, controlling the movement distance of the motion platform based on the numerical value of the position deviation value includes: the movement distance of the motion platform is the absolute value of the current position deviation value |ΔFPOSc|.

[0137] In some embodiments, step 640 is repeated until the positional deviation between the actual position of the motion platform after adjustment and the target position is less than a preset error window.

[0138] In some embodiments, see Figure 1 As shown, the method for synchronizing the relative coordinates of the galvanometer module and the motion platform provided in one or more embodiments of this specification may further include the following steps.

[0139] Step 150: Obtain the first preset position based on the initial position of the galvanometer module.

[0140] It should be noted that step 150 is optional. In some use cases, step 150 can be placed before step 110.

[0141] Figure 2 This is a schematic flowchart illustrating the process of obtaining a first preset position using a relative coordinate synchronization method according to some embodiments of this specification. See also... Figure 2 As shown, in one or more embodiments of this specification, step 150 may be performed according to... Figure 2 The process 200 is implemented in some embodiments. In some embodiments, process 200 may include the following steps.

[0142] Step 210: Determine the initial zero position of the motion platform based on the initial position of the galvanometer module.

[0143] Step 220: Control the motion platform to move to the initial zero position, and take the actual position of the motion platform after moving to the initial zero position as the first preset position.

[0144] In some embodiments, in step 210, the initial position of the galvanometer module can be its installation position or its position after installation and calibration. In some embodiments, the initial position of the galvanometer module can include its position in the first direction X, its position in the second direction Y, and its position in the third direction Z.

[0145] In some embodiments, in step 210, the initial zero position of the motion platform can be the position corresponding to the initial position of the galvanometer module, such as the projection position of the initial position of the galvanometer module on the plane where the motion platform is located, or, for example, the position of the light spot projected by the laser along the third direction Z when the galvanometer module is working on the plane where the motion platform is located. In some embodiments, the initial zero position of the motion platform can be the position of the galvanometer module in the first direction X and its position in the second direction Y.

[0146] In some embodiments, step 220, controlling the motion platform to move to the initial zero position, includes: controlling the motion platform to move to the initial zero position based on feedback from a first sensor. In some embodiments, the first sensor is a grating ruler. In some embodiments, the actual position of the motion platform after moving to the initial zero position is used as the first preset position, which conforms to the motion accuracy feedback from the grating ruler and can ensure that the motion platform can quickly reach this position and perform further precise displacement during subsequent coordinate synchronization.

[0147] In one or more embodiments of this specification, the unit of coordinates may be μm.

[0148] Figure 10 This is a schematic diagram of a relative coordinate synchronization system according to some embodiments of this specification. See also Figure 10 As shown, in some embodiments, the relative coordinate synchronization system 800 between the galvanometer module and the motion platform may include: a control module 810, an actual position acquisition module 820, a target position acquisition module 830, and an adjustment module 840.

[0149] The control module 810 can be used to control the motion platform. In some embodiments, the control module 810 can control the motion platform to move to a first preset position based on the first sensor.

[0150] The actual position acquisition module 820 can be used to acquire the actual position of the motion platform. In some embodiments, the actual position acquisition module 820 can acquire the actual position of the motion platform after it has moved to a first preset position based on a second sensor, wherein the positioning accuracy of the second sensor is higher than that of the first sensor.

[0151] The target position acquisition module 830 can be used to acquire the target position of the motion platform. In some embodiments, the target position acquisition module 830 can acquire the target position of the motion platform based on the galvanometer module.

[0152] The adjustment module 840 can be used to adjust the motion platform. In some embodiments, the adjustment module 840 can adjust the motion platform based on the target position so that the positional deviation between the actual position of the adjusted motion platform and the target position is less than a preset error window.

[0153] For more information on each module, please refer to [link / reference]. Figures 1-9 The relevant explanations will not be repeated here. It should be understood that... Figure 10 The systems and modules shown can be implemented in various ways. For example, in some embodiments, the systems and modules can be implemented by hardware, software, or a combination of both. The hardware portion can be implemented using dedicated logic; the software portion can be stored in memory and executed by an appropriate instruction execution system, such as a microprocessor or dedicated-design hardware. Those skilled in the art will understand that the methods and systems described above can be implemented using computer-executable instructions and / or included in the control code of a processor, such as on a media such as a disk, CD, or DVD-ROM, or in the memory of a programmable device. The systems and modules of this specification can be implemented not only by hardware circuits such as very large-scale integrated circuits or gate arrays, semiconductors such as logic chips and transistors, or programmable hardware devices such as field-programmable gate arrays and programmable logic devices, but also by software, for example, executed by various types of processors, or by a combination of the aforementioned hardware circuits and software (e.g., firmware).

[0154] It should be noted that the above description of the system and its modules is for convenience only and should not be construed as limiting this specification to the embodiments described. It is understood that those skilled in the art, after understanding the principles of this system, may arbitrarily combine the various modules without departing from these principles to form subsystems connected to other modules. Alternatively, some modules may be split to obtain more modules or multiple units under a single module. Such modifications are all within the scope of this specification.

[0155] In one or more embodiments of this specification, a computer program product is also provided, including computer instructions or computer code, which, when at least a portion of the computer instructions or computer code is executed by a processor, enables the implementation of the aforementioned method for synchronizing the relative coordinates of the galvanometer module and the motion platform. In some embodiments, the computer program product may involve only computer instructions or computer code, and may be carried on a storage medium or processing device. In other embodiments, the computer program product may also be a storage medium or processing device containing the aforementioned computer instructions or computer code. The processing device may include one or more processors, and a storage medium.

[0156] In some embodiments, the processor may be a combination of one or more of the following processors: central processing unit (CPU), application-specific integrated circuit (ASIC), application-specific instruction set processor (ASIP), graphics processing unit (GPU), physical processing unit (PPU), digital signal processor (DSP), field-programmable gate array (FPGA), programmable logic device (PLD), programmable logic controller (PLC), reduced instruction set computer (RISC), and microprocessor.

[0157] In some embodiments, the storage medium may include one or more combinations of the following: mass storage, removable storage, volatile read-write memory, and read-only memory (ROM). Exemplary mass storage may include disks, optical disks, solid-state drives, etc. Exemplary removable storage may include flash drives, floppy disks, optical disks, memory cards, compressed hard disks, magnetic tapes, etc. Exemplary volatile read-write memory may include random access memory (RAM). Exemplary RAM may include dynamic random access memory (DRAM), dual data rate synchronous dynamic random access memory (DDRSDRAM), static random access memory (SRAM), silicon controlled retrieval memory (T-RAM), and zero-capacitance memory (Z-RAM), etc. Exemplary read-only memory may include masked read-only memory (MROM), programmable read-only memory (PROM), erasable programmable read-only memory (EPROM), electrically erasable programmable read-only memory (EEPROM), compressed hard disk read-only memory (CD-ROM), and digital multifunction hard disk read-only memory, etc.

[0158] The basic concepts have been described above. It is obvious that the detailed disclosure above is merely illustrative and does not constitute a limitation of this specification. Although not explicitly stated herein, various modifications, improvements, and corrections may be made to this specification by those skilled in the art. Such modifications, improvements, and corrections are taught in this specification and therefore remain within the spirit and scope of the exemplary embodiments described herein.

Claims

1. A method for synchronizing the relative coordinates of a galvanometer module and a motion platform, characterized in that, include: The motion platform is controlled to move to a first preset position based on the first sensor; The actual position of the motion platform after it moves to the first preset position is obtained based on the second sensor, and the positioning accuracy of the second sensor is higher than that of the first sensor. The target position of the motion platform is obtained based on the galvanometer module; The motion platform is adjusted based on the target position so that the positional deviation between the actual position of the adjusted motion platform and the target position is less than a preset error window.

2. The relative coordinate synchronization method according to claim 1, characterized in that, Also includes: The first preset position is obtained based on the initial position of the galvanometer module.

3. The relative coordinate synchronization method according to claim 2, characterized in that, The step of obtaining the first preset position based on the initial position of the galvanometer module includes: The initial zero position of the motion platform is determined based on the initial position of the galvanometer module; The motion platform is controlled to move to the initial zero position, and the actual position of the motion platform after moving to the initial zero position is taken as the first preset position.

4. The relative coordinate synchronization method according to claim 1, characterized in that, The step of controlling the motion platform to move to the first preset position based on the first sensor includes: The current position information of the motion platform is obtained through the first sensor; The first velocity information is obtained by processing the current position information of the motion platform and the first position information corresponding to the first preset position through the position PID loop; The first current information is obtained by processing the current speed information of the motion platform and the first speed information through a speed PID loop; The current current information of the motion platform and the first current information are processed by a current PID loop to obtain a first control signal; The motion platform is controlled based on the first control signal to move to the first preset position.

5. The relative coordinate synchronization method according to any one of claims 1 to 4, characterized in that, Adjusting the motion platform based on the target position includes: Based on the actual position of the motion platform after it moves to the first preset position and the target position, a position deviation value is obtained; Based on the positional deviation value, obtain the cumulative deviation value; Based on the position deviation value and the cumulative deviation value, the displacement information is obtained; The motion platform is adjusted based on the displacement information.

6. The relative coordinate synchronization method according to claim 5, characterized in that, The step of adjusting the motion platform based on the displacement information includes: Based on the displacement information, the second velocity information is obtained; The current speed information of the motion platform and the second speed information are processed by a speed PID loop to obtain the second current information; The current current information of the motion platform and the second current information are processed by a current PID loop to obtain a second control signal; The motion platform is adjusted based on the second control signal.

7. The relative coordinate synchronization method according to claim 5, characterized in that, The cumulative deviation value is the sum of the positional deviation value and the cumulative deviation value after the previous adjustment of the motion platform; The displacement information is the sum of the position deviation value multiplied by a proportional coefficient and the cumulative deviation value multiplied by an integral coefficient.

8. The relative coordinate synchronization method according to claim 7, characterized in that, The proportionality coefficient is 0.1 to 1; the integral coefficient is 0.05 to 0.15 times the proportionality coefficient.

9. The relative coordinate synchronization method according to any one of claims 1 to 4, characterized in that, Adjusting the motion platform based on the target position includes: Based on the actual position of the motion platform after it moves to the first preset position and the target position, a position deviation value is obtained; Based on the absolute value of the position deviation, the motion platform is controlled to move in a preset direction; or... Based on the absolute value of the position deviation and the magnitude of the absolute value of the position deviation after the previous adjustment of the motion platform, the movement direction and distance of the motion platform are controlled; or... The direction of motion of the motion platform is controlled based on the positive or negative attribute of the position deviation value, and the distance of motion of the motion platform is controlled based on the value of the position deviation value.

10. The relative coordinate synchronization method according to any one of claims 1 to 4, characterized in that, The step of obtaining the target position of the motion platform based on the galvanometer module includes: The current position of the galvanometer module is obtained based on the third sensor; The current zero position of the motion platform is determined based on the current position of the galvanometer module, and the current zero position is used as the target position of the motion platform.

11. The relative coordinate synchronization method according to claim 10, characterized in that, The first sensor is a grating ruler; Both the second sensor and the third sensor are interferometers, and both use the same light source.

12. The relative coordinate synchronization method according to claim 11, characterized in that, The second sensor includes a first interferometer and a second interferometer; the third sensor includes a third interferometer and a fourth interferometer. The light beam provided by the light source is divided into a first beam and a second beam by a first beam splitter; The first beam is formed by a second beam splitter into a first sub-beam for supplying to the first interferometer and a second sub-beam for supplying to the third interferometer; The second beam is split by a third beam splitter to form a third sub-beam for supplying to the second interferometer and a fourth sub-beam for supplying to the fourth interferometer.

13. The relative coordinate synchronization method according to any one of claims 1 to 4, characterized in that, The step of controlling the motion platform to move to the first preset position based on the first sensor includes: The current position information of the driven end of the motion platform is obtained through the first sensor; Based on the current position information of the driven end, the motion platform is controlled to move to the first preset position; The step of obtaining the actual position of the motion platform after it has moved to the first preset position based on the second sensor includes: The second sensor acquires the actual position of the end of the motion platform after it has moved to the first preset position.

14. A relative coordinate synchronization system between a galvanometer module and a motion platform, characterized in that, include: The control module is used to control the motion platform to move to a first preset position based on the first sensor; The actual position acquisition module is used to acquire the actual position of the motion platform after it has moved to the first preset position based on the second sensor, wherein the positioning accuracy of the second sensor is higher than that of the first sensor; The target position acquisition module is used to acquire the target position of the motion platform based on the galvanometer module. The adjustment module is used to adjust the motion platform based on the target position, so that the positional deviation between the actual position of the motion platform after adjustment and the target position is less than a preset error window.

15. A computer program product comprising computer instructions or computer code, which, when at least a portion of the computer instructions or computer code is executed by a processor, enables a method for synchronizing the relative coordinates of a galvanometer module and a motion platform as described in any one of claims 1 to 13.

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