An embossed wearable armor data generation method, system, storage medium and device

Abstract

The application discloses a kind of relief wearing nail data generation method, system, storage medium and equipment, belong to wearing nail digitization manufacturing field.The application does not need real person nail full nail scanning, discard the separate process of UV file after 3D printing forming, rely on nail template library, plane design library builds unified curved surface parameter domain;2.5D micro-relief height field is generated by combining wearing, manufacturing, inkjet constraint.Combined with the same source data, two types of data are generated simultaneously: one is the data of the micro-relief nail embryo model formed integrally;Two is the UV stacking, deposition, curing type data for making local relief of prefabricated nail piece, and a general alignment reference is built simultaneously.All data are packaged into standardized data packets with quality inspection fields, and quality inspection information can be backfilled to realize parameter closed-loop iteration.The relief printing misplacement problem caused by separate processing is alleviated, and the individual customization and mass production needs of micro-relief wearing nail are met.

Description

Technical Field

[0001] This invention relates to the field of computer-aided design and additive manufacturing technology, specifically to a method, system, storage medium, and device for generating data for embossed wearable nails, applicable to the digital mass production of personalized nail products. Background Technology

[0002] With the increasing adoption of 3D printing technology in the consumer goods sector, digital nail art is gradually becoming an important alternative to traditional manual nail art. Existing digital nail art technologies typically use 3D scanning to obtain the shape of the user's nails, and then combine this with 3D printing technology to create a nail tip base that closely adheres to the nail, thus solving the problems of discomfort and easy detachment associated with traditional nail tips.

[0003] For example, Chinese Patent Publication No. CN111080793B discloses a method for manufacturing digital nail tips and the nail tips produced therein. This method acquires nail point cloud data through structured light scanning, generates a digital model of the nail tip that fits the nail surface through topological deformation, and then uses 3D printing technology to achieve one-time molding of the nail tip. This technical solution significantly improves the matching degree between the nail tip and the human nail, enabling repeated wear of the nail tip. However, this existing technology still has significant limitations in practical applications, mainly in the following aspects:

[0004] The pain point of "misalignment" between patterns and embossing: Current digital nail art production processes typically treat "3D modeling (shaping)" and "2D inkjet printing (coloring)" as two completely independent steps. When producing wearable nails with micro-embossed effects, due to the lack of a unified digital benchmark, the raised positions of the embossed areas generated by 3D printing often cannot be precisely aligned with the pattern layer printed subsequently by UV inkjet printing. This results in defective products with "embossing but no pattern" or "pattern printed on the edge of the embossing," severely reducing product yield, visual quality, and extending production time.

[0005] The fragmented and inefficient production process: While existing technologies focus on solving the "fit" between nail tips and nails, complex micro-relief decorative designs on the nail tip surface still typically rely on manual layering or simple planar mapping. This approach cannot achieve fully automated data conversion from planar design drawings to "shape and color in harmony" micro-relief nail tips, which is not only time-consuming and labor-intensive but also difficult to adapt to the modern beauty market's demand for rapid style iteration.

[0006] UV ink spraying lacks a layered intelligent control mechanism. Existing solutions generally adopt a rough ink application mode of spraying white ink all over the nail and applying varnish all over the surface, which results in serious waste of materials and the finished nail pieces are thick and hard. High gloss and fine tactile texture can only be achieved by thickening solid relief, which requires a lot of resin and the carved structure is prone to breakage.

[0007] The lack of balance between comfort and aesthetics: Although existing technology has solved the problem of overall nail fitting, when dealing with local micro-embossing of nail tips (such as water droplets, petals, etc.), there is often a lack of restraint mechanisms for wearing comfort, which can easily lead to problems such as sharp edges that hurt the hand or side protrusions that scratch the hair.

[0008] The lack of quantitative constraints on the embossed height of different zones and the absence of a closed-loop optimization logic for production, as well as the absence of upper limits on the embossed height for areas prone to skin friction such as the nail root and sides, results in finished products with excessively high embossed details that can scratch the skin, snag hair, and cause poor wearing comfort. At the same time, quality inspection data such as alignment deviations, color differences, and gloss varnish defects from the production end cannot be fed back to correct the original design parameters. Production defects can only be addressed by adjusting the machine on-site temporarily, and optimization experience cannot be incorporated into the design documents, leading to repeated occurrences of similar defects.

[0009] Therefore, this solution addresses several industry pain points, including the poor fit of traditional injection-molded nail art, reliance on manual trimming for personalized modifications, and the high hardware costs, misalignment issues, wasteful ink application, fragmented and unstandardized production documentation, and lack of zoned height control and production loop optimization inherent in digital manufacturing processes that rely on full-nail scanning of real nails, point cloud topology modeling, and separate UV printing artwork after 3D printing. This solution aims to improve comfort through zoned constraints while ensuring aesthetics, ultimately achieving high-precision, low-cost automated production of nail art products that deliver a "what you see is what you get" experience. Summary of the Invention

[0010] This application provides a method, system, storage medium, and device for generating data for embossed wearable armor, in order to solve the following defects in the prior art: the scanning armor making scheme relies on expensive scanning equipment; the modeling and inkjet printing processes are separated and prone to pattern misalignment; the production process relies on manual labor and cannot be automatically converted; it only focuses on the fitting of the armor pieces and cannot automatically generate integrated shape and color data from a planar drawing; the embossing lacks partitioning and height limits and is prone to skin abrasion; various production documents are messy and lack a unified data package; there is no quality inspection closed-loop optimization; and similar production defects occur repeatedly.

[0011] To achieve the above objectives, the technical solution adopted by the present invention is as follows:

[0012] One aspect of this application provides a method for generating data for embossed armor, comprising the following steps:

[0013] S100: Pre-set nail template library and flat nail art design library;

[0014] S200: Obtain the target surface parameter domain of the armor plate: Retrieve an armor plate from the preset armor plate template library to generate the surface parameter domain of the armor plate, wherein the surface parameter domain of the armor plate includes:

[0015] The outer surface of the armor plate, Souter(u,v), forms the three-dimensional shape data of the bottom layer of the armor plate, describing the original curvature, curve and basic shape of the armor plate. This data is the basis of all subsequent operations. The subsequent embossing (raised) and UV inkjet (color) must be attached to this surface.

[0016] The parameter field Wnail(u,v) of the apron forms a two-dimensional mathematical coordinate system (u,v), which "flattens" the complex three-dimensional surface into a two-dimensional map. Designers do not need to calculate complex three-dimensional spatial coordinates. They only need to draw on this two-dimensional map and design the relief height, and the system will automatically "paste" it back onto the apron.

[0017] The effective area of ​​the armor plate, Mmask(u,v), forms a binary image (black and white image). The white area represents the part of the armor plate with material (the part that needs to be made), and the black area represents the edge, root gap or part that does not need to be made.

[0018] The nail plate zoning diagram Zzone(u,v) forms a zoned map, dividing the nail plate into different functional areas: the root area (close to the finger), the side area, the central area, and the leading edge area. Different areas have different processing requirements. The root area requires a smoother surface (for wearing comfort) and should not have excessive relief; while the leading edge area can be more elaborate and have a higher protrusion. This zoning allows the system to apply different height restrictions and processing strategies to different areas.

[0019] S300: Retrieve a flat nail design from the preset flat nail design library, adapt the flat nail design to the boundary of the effective area Mmask(u,v) of the nail piece, and crop or fill the adapted flat nail design to remove redundant pixels outside the effective area of ​​the nail piece, thus obtaining the cropped flat nail design.

[0020] S400: Perform image semantic decomposition and pattern layer analysis on the adapted flat nail art design drawing to obtain multiple sets of pattern semantic layers, wherein the pattern semantic layers can be independent layers that do not overlap with each other;

[0021] It can also perform fusion calculations within the same area using transparency, rendering priority, height weight, or channel information;

[0022] The pattern layering analysis results are used as the core data source for height field generation, regardless of whether the pixels overlap or not, thus abandoning the method of modeling by relying solely on image grayscale values ​​or manually editing relief parameters one by one.

[0023] It needs to be explained that the pattern semantic layer is set to pixel overlap:

[0024] When multiple layers overlap pixels at the same coordinates (u, v), the system performs an emboss height blending operation. This operation consists of three independent logic categories that can be combined and used in combination:

[0025] First-class priority occlusion calculation: Based on the layer rendering priority, only the emboss height of the highest priority layer is retained in the overlapping area, and the bottom layer is not included in the calculation;

[0026] The second type of transparency decay operation: the lower the transparency of the upper layer, the lower the contribution of the lower layer to the final emboss height. When the upper layer is completely opaque, the contribution of the lower layer to the emboss is zero, thus avoiding the unlimited stacking of multiple emboss layers.

[0027] The third type of height weighting operation: all overlapping layers calculate the emboss height by weighting and normalizing their respective height weights and transparency, which is suitable for multi-layer texture coexistence scenarios; in the preferred embodiment, the system first filters the top and second-top layers by layer priority, and then performs a composite fusion operation by combining transparency and height weights to output the height field mapping function of the unified layer height data input step S500.

[0028] In step S400, there are two settings for each of the pattern semantic layers: the first is that the pixels do not overlap, and the second is a fusion method that combines pixel overlap with three types of operations. The adapted planar nail art design image undergoes image semantic decomposition and pattern layer analysis, resulting in multiple independent pattern semantic layers Li. These pattern semantic layers can be set to have non-overlapping pixels in coordinates (u,v). When pixel overlap exists, layer fusion is achieved through at least one of the following methods: layer transparency αi(u,v), rendering priority Pi, and height weight Wi. The pattern layer analysis result serves as the core data source for height field generation, abandoning the method of relying solely on image grayscale values ​​or manually editing embossing parameters one by one for modeling.

[0029] At this point, one or more of the following factors are used for the fusion operation: transparency αi(u,v), rendering priority Pi, and height weight Wi. The specific situation of pixel overlap is as follows:

[0030] Occlusion blending based on rendering priority Pi: Only the layer height corresponding to the highest rendering priority Pi is retained in the overlapping area, and the lower layer is not included in the calculation;

[0031] Attenuation blending based on transparency αi(u,v): When two layers overlap, the blending height is calculated using the formula: Hlayer(u,v)=αi(u,v)⋅h1(u,v)+(1−αi(u,v))⋅h2(u,v), where: αi(u,v) is the transparency of the upper layer, and h1(u,v) and h2(u,v) are the base emboss heights of the upper and lower layers, respectively; the lower the transparency of the upper layer, the smaller the contribution of the lower layer to the height.

[0032] Where: (u,v) are the unified two-dimensional pixel coordinates of the surface parameter domain of the plate; the subscript i is the layer number, used to distinguish different pattern semantic layers; αi(u,v) is the transparency of the i-th layer at the corresponding coordinates; Pi is the rendering priority of the i-th layer; Wi is the height weight of the i-th layer; Hlayer(u,v): the final emboss height at coordinates (u,v) after layer fusion;

[0033] αi(u,v): The opacity of the upper layer at coordinates (u,v);

[0034] h1(u,v): The base emboss height of the upper layer at coordinates (u,v);

[0035] h2(u,v): The base emboss height of the lower layer at coordinates (u,v). Under this condition, the lower the opacity of the upper layer, the smaller the contribution of the lower layer to the final height, which can effectively suppress the problem of excessive emboss height caused by multiple layers stacking.

[0036] (3) Weighted fusion based on height weight Wi: When multiple layers overlap, normalized weighted calculation is performed by combining transparency and height weight to avoid infinite stacking of relief height. In practical applications, the three methods can be used in combination, and the final relief height Hlayer(u,v) after fusion is used as the input data for generating the 2.5D micro-relief height field H(u,v) in step S500.

[0037] Furthermore, the calculation formula and explanation for multi-layer weighted fusion (N-layer overlay): For a scene where N layers overlap at the same coordinate (u,v), the normalized weighted fusion formula is as follows: ;

[0038] Left-hand output: Hlayer(u,v): After the fusion operation, the final emboss height of the multi-layer stack at coordinate (u,v) is obtained. This value will be used as input to the mapping function to generate the 2.5D micro-emboss height field H(u,v). The (u,v) in parentheses represents the change of this height value with the two-dimensional coordinate position;

[0039] Coordinate variables: (u,v): Unified two-dimensional pixel coordinates within the surface parameter domain of the plate, which are the common reference for all design, relief, and printing data of this invention; value range: u∈[0,1], v∈[0,1];

[0040] Summation of subscripts and superscripts The summation operator means: for all overlapping layers, the index i is cyclically added from layer 1 to layer N;

[0041] N: The total number of pattern semantic layers that overlap pixels at the same (u,v) coordinate point;

[0042] i: Layer index number, used to distinguish different independent pattern semantic layers (i=1, 2, 3...N);

[0043] The internal variable αi(u,v) of the molecule is the transparency of the i-th pattern semantic layer at coordinates (u,v); the value range is [0,1]: αi=1 represents that the layer is completely opaque, and αi=0 represents that the layer is completely transparent; the lower the transparency, the smaller the contribution of the layer to the final relief height.

[0044] Internal variable Wi: The height weight of the i-th pattern semantic layer, a dimensionless fixed constant; the larger the weight value, the higher the emboss effect generated by this layer under the same conditions. Example: Water droplet layer, highlight layer Wi > petal main layer Wi > background layer Wi;

[0045] Internal variable HBase: Global baseline height coefficient, a system-preset fixed process parameter, in mm; the base relief height of all layers is calculated based on this value.

[0046] Molecular as a whole:

[0047] ;

[0048] The sum of the effective emboss heights of all overlapping layers; the effective height of a single layer = layer opacity × layer height weight × global baseline height, then sum the values ​​of all overlapping layers;

[0049] The denominator as a whole: ;

[0050] The sum of the transparency values ​​of all overlapping layers is used as the normalized denominator; its function is to offset the height expansion caused by the number of layers. No matter how many layers are stacked, the final emboss height will not increase indefinitely with the number of layers, thus satisfying the "maximum emboss height limit" requirement in the manufacturing constraints.

[0051] In the formula: N is the total number of overlapping layers; Hbase is the system's preset global baseline height coefficient; the denominator is the normalization term, used to limit the emboss height and avoid exceeding the limit for multiple layers;

[0052] In practical applications, the three methods can be used individually or in combination. The final relief height Hlayer(u,v) obtained after fusion will be used as input data in step S500 to generate the global 2.5D micro-relief height field H(u,v);

[0053] S500: Using all semantic layers, the surface parameter domain of the armor plate, and preset constraints as input variables, a 2.5D micro-relief height field H(u,v) shared by the entire domain is generated in the unified parameter domain Ω through numerical calculation of the mapping function H(u,v)=F(Layers,Zones,Constraints);

[0054] S600, based on the homologous fundamental surface Souter(u,v) and the 2.5D height field H(u,v), generates micro-relief structure manufacturing data by offsetting each grid vertex along the outer normal of the reference surface of the armor plate; the micro-relief structure manufacturing data includes two types of data, which can be set selectively or configured simultaneously:

[0055] The first category is three-dimensional model data used for 3D additive manufacturing of one-piece micro-relief prototypes;

[0056] The second category is UV processing data used to form local micro-relief textures on the surface of prefabricated carapaces or base carapaces. The UV processing data is selected from at least one of UV curable material stacking data, transparent texture layer data, material deposition layer data, curing parameter layer data, and local texture deposition path data.

[0057] S700 reuses the same source-based basic surface Souter(u,v), the same source-based 2.5D height field H(u,v), and the micro-relief structure manufacturing data to synchronously generate UV multi-layer data that is aligned with the micro-relief structure manufacturing data; the UV multi-layer data includes a basic layer and extended process data;

[0058] The base layer is selected from at least one of the following: white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v);

[0059] The extended process data is selected from at least one of the following: transparent texture layer, material deposition layer, mask layer, curing parameter layer, layer thickness control parameter, number of printing times parameter, and printing path data;

[0060] S800: Generates 3D model and 2D printing universal alignment reference data R based on the outline of the apron, partition edges, and pattern feature points; the apron outline comes from the effective area Mmask(u,v) of the apron, the boundary of the white area is the apron outline, defining the printing range and preventing it from going out of bounds; the partition edges come from the apron partition map Zzone(u,v), restricting the relief area (the root is not bulging), the dividing line between different colors is the partition edge; the pattern feature points come from the same source 2.5D height field H(u,v) data, H(u,v) is a height map, the extreme points (highest point, lowest point) or geometric center in the map are the pattern feature points, the strong correlation anchor points between 3D entities and 2D printing;

[0061] Highest point: the very tip of the water droplet, the highest point of the petal.

[0062] Geometric center: The central point of the petal shape.

[0063] In step S800, the system calculates the gradient of H(u,v) and finds the place where the change is most drastic (i.e., the center of the bulge).

[0064] These can serve as anchor points for precise alignment, enabling UV inkjet equipment to determine the corresponding varnish printing area based on the position of the protrusion.

[0065] S900 integrates 3D printing parameters, ink curing parameters, and tooling slot information to form process parameters P. Following a preset eight-field specification, it encapsulates surface parameter domain information, planar nail art design drawing information, 2.5D micro-relief height field, micro-relief structure manufacturing data information, UV printing layer data information, alignment reference data R, process parameters P, and reserved empty fields. The reserved empty fields serve as quality inspection feedback fields. The preset eight-field specification is then packaged into a standardized manufacturing data package. The micro-relief structure manufacturing data information includes the two types of data from step S600.

[0066] S1000, the standardized manufacturing data package is retrieved by the units involved in the above-mentioned eight pre-defined field specifications. Feedback data from the production or quality inspection stages in the units involved in the eight field specifications is backfilled into the quality inspection feedback field of the standardized manufacturing data package. The corresponding parameters are corrected according to the defect type to achieve iterative optimization of the data package.

[0067] Furthermore, the surface parameter domain of the plate in step S100 is derived from the plate template library, which contains at least any one of the following types of data:

[0068] The original scan data of the nail plate, or the point cloud data of the physical nail plate or real nail obtained by 3D scanning equipment;

[0069] Standardized parametric data for armor plates, based on a geometric model generated from standard curvature levels and size matrices;

[0070] The correction data for the lens process is a correction model obtained by compensating for tolerances or optimizing the wearing experience based on feedback data from historical production or quality inspection processes.

[0071] The A-plate has validated production data, a specific version model with historical yield records precipitated from the manufacturing data package.

[0072] Furthermore, the planar nail art design in step S100 is derived from a planar nail art design library, which contains at least one of the following types of data:

[0073] Original data for generating flat nail art designs, which are flat patterns containing multiple layers of semantic information provided by AI algorithms or designers;

[0074] Flat nail art design drawings are based on standard process data, and preset patterns that conform to the rules for generating micro-relief height fields are selected.

[0075] The data for revising and optimizing flat nail art designs is the manufacturable design obtained by adjusting the line width, color value, or texture density of the original design based on quality inspection feedback.

[0076] Flat nail art designs have been validated with production data; these are specific versions of designs with yield records, extracted from manufacturing data packages.

[0077] The planar nail art design includes layer semantic information, which is used to define the height weight of different pattern areas in the 2.5D micro-relief height field;

[0078] In the adaptation process in step S300: based on the boundary of the effective area Mmask(u,v) of the nail piece in step S200, the planar nail design drawing is matched and cropped with the boundary of the effective area Mmask(u,v) of the nail piece. Before cropping, any one or more image processing operations can be performed on the planar nail design drawing, such as scaling, cropping, perspective correction, skew correction, and style unification.

[0079] Furthermore, in S400: visual elements in the planar nail art design are identified, and the visual elements are classified into different pattern semantic layers; the pattern semantic layers include at least one or more of the following: background layer, main decoration layer, line layer, teardrop layer, pearl layer, French edge layer, highlight layer, and metallic line layer;

[0080] Each of the pattern semantic layers carries corresponding process semantic information, which includes at least height weight, transparency attribute, and layer category.

[0081] The pattern semantic layers can be non-overlapping at the pixel level, or they can be blended through transparency channels, priority, or weight.

[0082] The image semantic decomposition does not rely on the grayscale values ​​of the image to infer the relief height, nor does it rely on manually editing the relief parameters one by one. Instead, it automatically assigns initial height weights based on the layer category.

[0083] The main decorative layer corresponds to the main visual elements on the armor plate and is given the first height weight;

[0084] The water droplet layer or highlight layer corresponds to the local raised decoration on the armor plate and is given a second height weight.

[0085] The second height weight is greater than the first height weight, so that the water droplet layer or highlight layer exhibits a higher convexity than the main decorative layer in the generated 2.5D micro-relief height field.

[0086] When the transparency of the upper pattern semantic layer is lower than the preset threshold, the contribution of the lower pattern semantic layer in the overlapping area is reduced during the calculation of the 2.5D micro-relief height field, so as to avoid unnecessary process accumulation caused by the covered micro-relief structure.

[0087] Furthermore, in step S500, the preset constraints include: wearing constraints, manufacturing constraints, and inkjet constraints;

[0088] The height field is used to describe the local micro-protrusions along the normal direction on the outer curved surface of the armor plate;

[0089] The mapping function H(u,v)=F(Layers(u,v),Zones(u,v),Constraints,ProcessProfile);

[0090] Where Layers represents the set of pattern layers, Zones represents the plate partitions, Constraints represents wearing constraints, manufacturing constraints, and inkjet constraints, and ProcessProfile represents the specific process configuration.

[0091] Wearing restrictions: Height is limited in the root and side areas to avoid stepping at the root, scratching hands, snagging hair, and creating a false visual effect;

[0092] Manufacturing constraints: Limit maximum height, minimum line width, maximum slope, minimum printable area, isolated islands, and sharp edges;

[0093] Inkjet constraints: Adjust color and varnish layer according to slope, grooves, and obstruction; avoid printing critical color information in areas that cannot be printed.

[0094] Furthermore, in step S600, the 2.5D micro-relief height field H(u,v) relies on all semantic layers, the nail plate surface parameter domain, and preset constraints as input variables. All semantic layers rely on the cropped planar nail design drawing, and both the cropped planar nail design drawing and the nail plate surface parameter domain rely on the outer base surface Souter(u,v) of the nail plate. Therefore, the outer base surface Souter(u,v) of the nail plate is the same source base surface of the 2.5D height field H(u,v) in S600.

[0095] Another aspect of this application provides a data generation system for embossed wearable nails. The system comprises nine interconnected functional units, namely: a surface parameter domain acquisition unit, a nail design drawing acquisition unit, a pattern layer analysis unit, a height field generation unit, a micro-relief structure manufacturing data generation unit, a UV multi-layer and surface treatment data generation unit, a alignment reference generation unit, a manufacturing data package encapsulation unit, and a feedback update unit. The functions of each unit are as follows:

[0096] Surface parameter domain acquisition module: Connects to the A-type template library, imports various A-type data, completes the parameterization processing of the A-type surface, and generates a complete A-type surface parameter domain including the basic surface Souter(u,v) on the outer side of the A-type, the parameter domain Wnail(u,v) of the A-type, the effective area Mmask(u,v) of the A-type, and the partition map Zzone(u,v) of the A-type.

[0097] Design image acquisition module: Connects to the flat nail art design image library, imports various flat design images, and combines the effective area Mmask(u,v) of the nail piece to complete image adaptation, correction, and cropping processing, and outputs compliant cropped flat nail art design images;

[0098] Pattern layer parsing module: performs image semantic decomposition and layering on the cut design drawing, divides it into multiple types of pattern semantic layers, and parses the process semantic information such as height weight and transparency of each layer;

[0099] Height field generation module: Taking pattern semantic layer, armor plate partition, three types of constraints (wearing / manufacturing / inkjet) and process configuration as input, it generates a 2.5D micro-relief height field H(u,v) through extended mapping function operation;

[0100] Micro-relief structure manufacturing data generation module: Based on the same source base surface Souter(u,v) and 2.5D height field H(u,v), the grid vertices are offset along the surface normal to generate micro-relief structure manufacturing data that can be used for additive manufacturing;

[0101] UV multi-layer generation module: Reuses the same source basic surface Souter(u,v) and height field H(u,v) to simultaneously generate three types of UV printing layer data: white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v).

[0102] Alignment reference generation module: extracts the effective area boundary of the axle as the axle outline, extracts the partition map edge line as the partition edge line, extracts the extreme points and gradient change points of the height field H(u,v) as pattern feature points, and integrates them to generate alignment reference data R shared by the 3D model and 2D printing;

[0103] Manufacturing data package encapsulation module: collects surface parameter domain information, design drawing information, height field, micro-relief structure manufacturing data, UV layer, alignment reference R, process parameter P, and quality inspection feedback fields, and encapsulates them into a standardized manufacturing data package according to the eight major field specifications. The data package is configured with a general external data interface, which can be connected to wearable armor SaaS design tools, back-end production management and control platforms, and mass production equipment back-end.

[0104] Feedback Update Module: Collects feedback data from production and quality inspection processes and backfills it into the quality inspection feedback field of the data package. Based on the defect type, it corrects the layer parameters, alignment reference parameters, height field parameters, and process parameters in the data package accordingly. The nine units work together to execute the above-mentioned method for synchronously generating 2.5D height field and UV multi-layer data packages.

[0105] Furthermore, the height field generation unit incorporates a semantic segmentation unit, a height weight matching unit, and an edge smoothing filtering unit. The semantic segmentation unit receives the pattern layer parsing results, the height weight matching unit combines layer height weights, plate partitioning, and three types of constraints to complete the height assignment, and the edge smoothing filtering unit performs anti-aliasing processing on the height field edges. The module completes full calculation based on the extended mapping function and outputs a smooth and burr-free 2.5D micro-relief height field H(u,v).

[0106] The micro-relief structure manufacturing data generation module and the UV multi-layer generation module share the same source basic surface Souter(u,v) and source 2.5D height field H(u,v) data source. The two modules operate in parallel and output micro-relief structure manufacturing data and three-layer UV printing data of white ink, colored ink and varnish in a synchronous manner, and maintain the same coordinate system throughout the process.

[0107] The point extraction rules of the alignment reference generation module are as follows: the outline of the A-piece is completely taken from the binary map boundary of the effective area Mmask(u,v) of the A-piece; the partition edge line is completely taken from the area dividing line of the partition map Zzone(u,v) of the A-piece; the pattern feature points are extracted as precise anchor points by calculating the gradient value of the 2.5D height field H(u,v); the alignment reference data R generated by the combination of the three types of positioning elements is adapted to the coordinate calibration of 3D printing equipment, UV inkjet equipment, and production line tooling slots.

[0108] The standardized manufacturing data package output by the manufacturing data package encapsulation module adopts JSON format and is fixedly divided into eight fields: surface parameter field, planar design drawing field, 2.5D height field, micro-relief structure manufacturing data field, UV printing layer field, alignment reference field, process parameter field, and quality inspection feedback field. The data package has an open standardized data interface and can be directly used as a general data interaction carrier for wearable armor SaaS tools, production management platforms, and mass production equipment backends, supporting one-way retrieval and two-way data return from external systems.

[0109] The feedback update module includes a defect analysis subunit and a parameter rewriting subunit. The defect analysis subunit automatically identifies and categorizes four types of defects: alignment error, color difference, varnish defects, and relief anomalies. The parameter rewriting subunit modifies the corresponding fields in the data package according to the defect type: for alignment anomalies, it corrects the alignment reference field; for ink defects, it adjusts the process parameter field; and for relief anomalies, it corrects the height field and layer weight field. After parameter modification, the update status is marked in the quality inspection feedback field, and the optimized data is permanently stored in the data package.

[0110] In another aspect, this application provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the above-described method for generating data for embossed armor.

[0111] Another aspect of this application provides a mass production device for embossed wearable armor, including a 3D photopolymer printer and a UV inkjet printer. The device has a built-in dedicated controller, which can read the standardized manufacturing data package with eight fields as defined in claim 9. The controller uses the alignment reference data R in the data package to complete the unified coordinate calibration of the 3D device, UV device, and tooling slot. The controller retrieves the micro-relief structure manufacturing data field data to drive the 3D photopolymer printer to complete the micro-relief armor blank forming, and then retrieves the UV printing layer field data to control the UV inkjet printer to print and cure layer by layer in the order of white ink, colored ink, and varnish. The controller connects to an external SaaS design platform and production management backend through the data package interface to synchronously receive design data and quality inspection feedback data.

[0112] The beneficial effects of this invention due to the use of the above technical solutions are as follows:

[0113] This invention uses a single armor plate surface parameter domain as a unified coordinate reference for the entire process. The 2.5D micro-relief height field, micro-relief structure manufacturing data, and UV multi-layer data are all generated synchronously from the same source data, and are accompanied by dedicated alignment reference data to link the entity and printing coordinates. This completely abandons the existing technology's separate data mode of "creating a separate UV printing file after 3D printing", avoiding pattern offset and color misalignment problems caused by two independent data sources, and significantly reducing product defect rate and rework costs.

[0114] 2. This invention abandons the outdated method of relying on image grayscale and manually editing relief parameters point by point. It generates a 2.5D height field based on the semantic layering of the pattern, allowing for differentiated allocation of relief height for different visual elements such as petals, water droplets, highlights, and backgrounds, accurately reproducing the designer's layered and three-dimensional creative intent. Simultaneously, it incorporates three types of constraints—wearing, manufacturing, and inkjet printing—in the height field generation stage. This proactively limits the relief height in areas such as the nail root and sides to prevent scratching and hair snagging; it limits parameters such as carving slope and minimum line width to prevent 3D printing collapse; and it plans the inkjet printing area based on curved surface features, solving the problem of poor ink adhesion and significantly reducing the number of product prototypes and trial-and-error costs.

[0115] 3. This invention encapsulates surface parameter domains, height fields, micro-relief structure manufacturing data, UV multi-layer data, alignment references, and process parameters into a unified structured manufacturing data package. The file format is universal and easy to access. When changing product styles on the production line, technicians no longer need to manually enter parameters into multiple machines; configuration can be completed simply by importing the data package. Simultaneously, the data package integrates alignment references shared by all workstations, eliminating the need for repeated manual calibration, effectively shortening the time required for style change and debugging, and reducing reliance on experienced machine operators.

[0116] 4. The same manufacturing data package can be adapted to nail templates of the same style, different sizes, and different curvatures. The system can adaptively generate matching height fields, UV layers, and process parameters in different parameter domains to ensure that the relief shape, color, and gloss effect of products in the same batch and across batches are highly consistent, solving the problem of inconsistent quality in mass production of traditional processes and meeting the needs of large-scale mass production.

[0117] 5. The manufacturing data package has a built-in dedicated feedback field that can automatically collect and archive quality inspection data such as alignment errors, color differences, varnish defects, and embossing anomalies during the production process. The system then corrects height field parameters, alignment references, UV layer rules, or production process parameters based on the defect type, permanently embedding production experience into the data package. This forms a closed-loop mechanism of design, production, quality inspection, and optimization, continuously reducing the incidence of similar defects and steadily improving mass production yield.

[0118] 6. The standardized manufacturing data package can serve as a universal data exchange interface for wearable nail SaaS design tools, backend production management platforms, 3D printers, UV inkjet printers, and other devices, enabling seamless data flow between the design, production, and management ends. The solution does not require a complete replacement of existing production lines; it can be modularly upgraded and adapted to various application scenarios, including small and medium-sized factories, online design platforms, and offline nail salons, offering greater scalability and practicality.

[0119] 7. This invention does not require structured light scanning of real nails, point cloud acquisition, and mesh topology modeling as necessary processes. The surface parameters of the nail piece can be directly retrieved from the standard nail shape library, parametric templates, or sparse dimensions. Offline nail salons and small processing plants can carry out personalized customization services without purchasing expensive 3D scanning hardware, which greatly reduces equipment investment and operating costs.

[0120] 8. UV white ink and varnish layers are generated at specific points based on the height field and pattern features, abandoning the traditional extensive mode of full-body ink spraying. Ink is only applied to dark areas, high-relief embossing, and high-gloss positions, effectively reducing ink consumption. At the same time, it avoids the heavy and less flexible nail plates caused by overall ink accumulation. The water droplet and petal glossy texture can be achieved by relying on local varnish. The UV multi-layer data can also include transparent texture layers, material deposition layers, or curing parameter layers. This allows the same height field to drive the 3D integrated micro-relief nail blank forming, or to output process parameters to drive the local UV material stacking texture on the surface of the pre-made nail blank, simultaneously covering two relief forming processes. This optimizes the appearance and user experience of the finished product while controlling ink costs. Attached Figure Description

[0121] Figure 1 This is a schematic diagram of the overall process for manufacturing data packets according to the present invention;

[0122] Figure 2 This is a schematic diagram of the surface parameter domain of the axle of the present invention;

[0123] Figure 3 This is a schematic diagram illustrating the pattern layer analysis of the present invention;

[0124] Figure 4 This is a schematic diagram of the 2.5D micro-relief height field generation of the present invention;

[0125] Figure 5 This is a schematic diagram illustrating the homogeneous generation of the embryo model and UV multilayers in this invention;

[0126] Figure 6 This is a schematic diagram of the standardized manufacturing data packet structure of this invention;

[0127] Figure 7 This is a flowchart of the quality inspection feedback and data packet closed-loop iteration process of the present invention;

[0128] Figure 8 This is a schematic diagram of the parameter domain of the target surface of the A-plate of the present invention. Detailed Implementation

[0129] To make the technical means, inventive features, objectives and effects of the invention easier to understand, the invention is further described below in conjunction with specific embodiments.

[0130] The overall process logic of the method of the present invention is completed sequentially from step S100 to S900: preset the model / design library, obtain the surface parameter domain of the model, adapt and cut the planar design drawing, analyze the pattern layer, generate a 2.5D micro-relief height field, generate a micro-relief model, simultaneously generate UV white ink / color ink / varnish layer, generate alignment reference, data, integrate process parameters, feedback fields, and finally encapsulate into a standardized manufacturing data package; all data in the whole process share the same surface parameter domain of the model.

[0131] like Figure 1 The schematic diagram of the overall manufacturing data package illustrates how a nail plate surface parameter domain serves as a unified coordinate system. It converts a planar nail design into multiple pattern layers and generates a 2.5D micro-relief height field within this parameter domain. Then, based on the same height field, a 3D nail blank model and multiple UV inkjet layers are simultaneously generated, establishing a correspondence between "where to raise, where to apply white ink, where to spray color, and where to apply gloss varnish" during the design phase. Furthermore, this data is encapsulated into a manufacturing data package, which can be accessed by the 3D printing station, UV inkjet station, alignment inspection station, and quality control station.

[0132] In this Figure 1 As shown, this invention provides a full data flow logic from design input to manufacturing data packet output. Figure 1 The diagram shows a unified coordinate system based on the surface parameter domain of the plate, sequentially connecting the core links (planar / AI design drawing, pattern layer analysis, and 2.5D micro-relief height field). The height field is output in two parallel paths: the left branch generates the micro-relief plate blank model M from the 2.5D micro-relief height field, and the right branch simultaneously generates three types of UV printing layers (white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v)) from the 2.5D micro-relief height field. The alignment reference data, process parameters, and quality inspection feedback fields are then integrated to finally form a manufacturing data package. Figure 1 The text specifically notes "synchronous generation under the same surface parameter domain," which intuitively reflects the core innovation of this invention: the data of shape and color are of the same origin and the process data is interconnected. This is completely consistent with the technical concept of "unified coordinate basis and integrated data flow" in the specification.

[0133] Figure 2 This is a schematic diagram of the surface parameter domain of the armor plate of the present invention, which shows the effect of a one-to-one correspondence between the "three-dimensional solid of the armor plate" and the "two-dimensional coordinates on the plane".

[0134] The left-to-right upward arc in the middle "maps (u,v)" flattening the three-dimensional plate surface on the left into a two-dimensional square coordinate system on the right, just like unfolding the curved surface of a globe into a flat map.

[0135] The right-to-left downward arc in the middle is "inversely mapped (u,v)", which reverses the process and accurately "pastes" the pattern and relief height we drew on the two-dimensional map on the right back onto the three-dimensional armor plate surface on the left.

[0136] Therefore, in step S200, the target surface parameter domain of the armor plate is obtained: an armor plate is retrieved from the preset armor plate template library to generate the surface parameter domain of the armor plate, which includes:

[0137] The outer surface of the nail plate, Souter(u,v), forms the bottom layer of the nail plate's three-dimensional shape data, describing the original curvature, curves, and basic shape of the nail plate. This data is the basis for all subsequent operations; the embossing (raised areas) and UV inkjet (color) must conform to this surface. Otherwise, the problem of "the pattern and the nail plate's curvature not matching" will occur.

[0138] The parameter domain Wnail(u,v) of the armor plate forms a two-dimensional mathematical coordinate system (u,v), which "flattens" the complex three-dimensional surface into a two-dimensional map. Designers do not need to calculate complex three-dimensional spatial coordinates; they only need to draw and design the relief height on this two-dimensional map, and the system will automatically "paste" it back onto the armor plate. The horizontal axis of the square is u, and the vertical axis is v, both ranging from [0,1], which is the "two-dimensional mathematical coordinate system" mentioned in the patent. It can be understood as taking a "front view after unfolding" of the armor plate. Designers and AI algorithms only need to draw and design the relief height on this plane, without worrying about complex three-dimensional calculations. The system will automatically paste the design onto the armor plate through mapping.

[0139] The effective area of ​​the nail tip, Mmask(u,v), forms a binary image (black and white). The white areas represent the parts of the nail tip with material (the parts that need to be processed), and the black areas represent the edges, root gaps, or parts that do not need to be processed. Inside the dashed box: the parts of the nail tip with material that need to be processed; outside the dashed box: the edges, root gaps, and other parts that do not need to be processed. Subsequent trimming of the flat nail art design is done using this dashed line as the boundary, removing all redundant pixels outside to prevent the design from exceeding the nail tip's area.

[0140] The nail plate zoning diagram Zzone(u,v) forms a zoning mark, dividing the nail plate into different functional areas: the root area (near the finger), the side area, the central area, and the leading edge area. Different areas have different processing requirements. The root area requires a smoother surface (for wearing comfort) and should not have too much relief; while the leading edge area can be more elaborate and have a higher protrusion. This zoning allows the system to apply different height restrictions and processing strategies to different areas. The area within the dashed box is divided into four regions, corresponding to the root area (near the finger), the side area, the central area, and the leading edge area.

[0141] When the area is at the root and the position is at the top (close to v=1), the corresponding process requirements are: it should be attached to the root of the nail, with a forced height limit, and the relief should not be too high to avoid scratching the hand, snagging the hair, or creating a step-like feeling when wearing it.

[0142] When the area is at the front edge and located at the bottom (close to v=0), the corresponding process requirements are: the front end of the nail plate is far from the skin, so a higher and more elaborate relief can be made, such as water droplets or high-gloss raised areas;

[0143] When the area is on the side, and the position is on the left and right sides, the corresponding process requirements are: close to the sides of the nail, the relief height is also limited to avoid scratching the hand or snagging the hair;

[0144] When the area is in the central zone, the corresponding craft requirements are: it is the main decorative area with the fewest craft restrictions, and complex petals, lines, and gradient reliefs can be made.

[0145] It is important to note that: (u,v)∈[0,1]×[0,1]; the region map Zzone(u,v) is defined within the effective region Mmask(u,v) of the card. "The region map Zzone(u,v) is defined within the effective region Mmask(u,v) of the card" means that these four regions are all within the effective range of the dashed box and will not exceed the card body.

[0146] By unifying the coordinate reference, the misalignment problem is solved. In the subsequent steps, the 2.5D relief height field, 3D prototype model, UV white ink, colored ink, and varnish layer are all defined in this (u,v) coordinate system. Therefore, the coordinates of 3D printing and UV inkjet printing are completely aligned, which solves the problem of "relief and pattern misalignment" in traditional processes from the root.

[0147] Pre-installed constraints prevent rework. Height limits are set for different areas directly in the parameter domain. When generating the relief height field later, the system will automatically "reduce the height" of the relief at the root and side areas, eliminating the need for manual adjustments and preventing rework issues such as "the relief is too high and scratches your hand".

[0148] Lowering the design threshold and adapting to non-professional scenarios means designers don't need to know 3D modeling; they only need to draw in a 2D coordinate system. Offline nail salons and small factories also don't need to buy expensive 3D scanning equipment; they can directly use this set of standard parametric nail shapes to make customizations, which corresponds to the beneficial effect of "significantly reducing equipment investment" in your patent.

[0149] like Figure 3The diagram shown is a schematic diagram of the pattern layer analysis of the present invention. The diagram shows the layered effect of the original planar nail art design after semantic decomposition. The original pattern is split into multiple types of pattern semantic layers that are independent of each other and do not overlap pixels. Specifically, these include background layer, petal layer, leaf layer, line layer, water droplet layer, and highlight layer. Each semantic layer independently stores process information and height weight. After multiple layers are superimposed, the original design pattern can be restored. At the same time, it provides a data source for subsequent 2.5D height field differential assignment.

[0150] like Figure 4 The diagram shown is a schematic of the 2.5D micro-relief height field generation of this invention. The diagram illustrates the generation logic and constraint rules of the height field H(u,v). The left side shows the various input pattern layer elements, and the right side shows the continuous height field distribution output, along with a lateral profile height diagram. The system assigns differentiated height values ​​according to different pattern layers; the water droplet and petal layers have higher corresponding protrusion heights, while the line and background layers have the lowest heights. Simultaneously, wearing constraints, manufacturing constraints, and inkjet constraints are superimposed to enforce height limits on the root and side areas of the nail plate, preventing excessive relief from causing hand scratching or hair snagging. Edge areas are smoothed to meet 3D printing process requirements.

[0151] like Figure 5 The diagram illustrates the shared generation of the model and UV multi-layers in this invention. It visually demonstrates the principle of parallel output of shared data, using the same 2.5D micro-relief height field H(u,v) as the sole data source. On one hand, it generates micro-relief structure manufacturing data by offsetting along the basic surface normal; on the other hand, it simultaneously calculates and generates three types of UV printing layers: white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v). The 3D model and the 2D printing layers share a common coordinate system, fundamentally eliminating the misalignment problem between relief and printing.

[0152] Figure 6 This is a schematic diagram of the standardized manufacturing data package structure of the present invention. The diagram shows the hierarchical structure of the standardized data package with eight fields. The data package is divided into eight core fields: surface parameter domain, design drawing, height field, prototype model, UV layer, alignment reference, process parameters, and quality inspection feedback. Each field independently stores corresponding data, and the fields are interconnected. The data package also integrates process execution information, quality feedback, and iterative update information, and can be connected to various equipment and systems at the design, production, and quality inspection ends.

[0153] Figure 7This is a flowchart illustrating the closed-loop iteration process of quality inspection feedback and data packets in this invention. The flowchart shows the closed-loop optimization process of production-quality inspection-data update: standardized manufacturing data packets are sequentially transferred to the 3D printing station and the UV inkjet station to complete product processing, and the finished products enter the quality inspection station for inspection. When defects such as inkjet offset, color difference, missing varnish, and abnormal relief are detected, the defect data is filled back into the quality inspection feedback field of the data packet. The system automatically identifies the defect type and corrects the alignment reference, color parameters, varnish mask, height field weight, etc., and generates a new version of the data packet to achieve continuous optimization of similar production problems.

[0154] The overall technical solution of this invention includes four major modules: a data packet synchronous generation method, a data generation system, a computer-readable storage medium, and a micro-relief wearable armor mass production equipment. The entire process uses the armor plate surface parameter domain as a unified coordinate reference and executes steps S100 to S1000 to achieve fully automated flow of planar design drawings, 2.5D height field, 3D armor blank model, UV multi-layer, standardized data packet, and quality inspection closed-loop iteration.

[0155] In a specific embodiment of the present invention, Example 1: Milk tea nude pink micro-relief petal-shaped wearable nail.

[0156] This embodiment uses the method of the present invention to produce mainstream nude pink petal micro-relief wearable nails. The overall height of the micro-relief is controlled between 0.18 and 0.35 mm, making it suitable for daily wear. The complete execution of steps S100 to S1000 is as follows:

[0157] Step S100: Pre-build a basic database of nail templates and flat nail art design images in advance: The nail template library uses standard nail shapes with medium curvature and regular size matrix; the flat nail art design image library is entered with flat design images of milk tea nude pink petal style created by designers.

[0158] like Figure 2 As shown, step S200: Obtain the surface parameter domain of the apron. Retrieve a standard medium-curvature apron from the apron template library to generate a complete surface parameter domain, including the outer basic surface Souter(u,v), the two-dimensional parametric coordinate system Wnail(u,v), the binary map Mmask(u,v) of the effective area of ​​the apron, and the four-zone marker map Zzone(u,v); Set parameters according to wearing constraints: the maximum relief height of the root area is limited to 0 to 0.15mm, the maximum relief height of the side area is limited to 0 to 0.20mm, and there is no mandatory height limit for the central area and the leading edge area. Figure 8 As shown, the data source is as follows: the left arrow indicates that the A-type data is retrieved from the preset A-type template library and uniformly output to the A-type target surface parameter domain main module; the main module is divided into four groups of source sub-data, all sharing the same (u,v) two-dimensional parametric coordinate system:

[0159] Top left: Souter(u,v) is the outer basic surface of the armor plate, which is the three-dimensional mesh outline of the armor plate base and supports the overall three-dimensional shape; Top right: Wnail(u,v) is the parameter domain of the armor plate, which is a unified two-dimensional (u,v) mesh coordinate reference for the entire domain. All layers and surfaces share this coordinate system.

[0160] Bottom left: The effective area of ​​the armor plate, Mmask(u,v), is a black and white binary mask. The white area is the processable area, and the black area is the non-processable area such as edges and gaps.

[0161] Bottom right: Zzone(u,v) of the plate partitioning diagram, which divides the same grid into four functional areas: root area, side area, central area and leading edge area, for subsequent partitioning to set relief height constraints;

[0162] Let me explain. Figure 8 Based on Figure 2 Based on this, it involves identifying the display status of the processing area and the non-processing area.

[0163] Step S300: Adaptation of the planar design drawing. The nude pink petal design drawing of the milk tea is retrieved. Based on the Mmask(u,v) boundary, the image is scaled, perspective is corrected, and the edges are cropped. Redundant pixels outside the effective area of ​​the nail piece are removed so that the design drawing and the outline of the nail piece are completely matched.

[0164] For reference Figure 3 As shown, in step S400: the pattern semantic layering analysis system performs semantic decomposition on the cropped design drawing, resulting in six independent semantic layers: background layer, French border layer, petal layer, leaf layer, water droplet layer, and highlight layer. The pixels of each layer do not overlap, and the system automatically assigns height weights: the petal layer has the highest weight, the water droplet / highlight layer has the second highest weight (higher weight), the leaf layer has a lower weight than the petal layer, and the background layer has the lowest weight. This embodiment does not rely on image grayscale or manual editing parameters; it is entirely based on automatic assignment of values ​​according to the layer category.

[0165] For reference Figure 4 As shown, step S500: Generate the 2.5D micro-relief height field and call the mapping function;

[0166] H(u,v)=F(Layers,Zones,Constraints,ProcessProfile) generates a height field using semantic layers, plate partitions, and three types of constraints as input:

[0167] Wearing restraint: The base and side areas automatically lower the height to prevent skin irritation;

[0168] Manufacturing constraints: Maximum relief height is limited to 0.35mm and minimum line width to 0.05mm to prevent 3D printed structures from collapsing;

[0169] Inkjet constraints: The inkjet strategy is optimized for the sloping areas of the petals to ensure good ink adhesion. This ultimately generates a continuous, smooth-edged global 2.5D micro-relief height field H(u,v).

[0170] For reference Figure 5 As shown, step S600: Generate micro-relief structure manufacturing data using the same source base surface Souter(u,v) and height field H(u,v) as data sources, offset mesh vertices along the outer normal of the surface, and output a photocurable printable prototype model M in 3MF format. The model shape corresponds one-to-one with the relief height field. In an optional embodiment, the 2.5D height field can also be used to generate local texture stacking data corresponding to the micro-relief structure.

[0171] The micro-relief structure manufacturing data explained here includes both the three-dimensional solid model data of the one-piece molded micro-relief shell and the manufacturing parameter data of the micro-relief texture formed by the local stacking, deposition and curing of UV curable materials on the surface of the pre-made shell or base shell.

[0172] Step S700: Simultaneously generate UV three-type printing layers, reuse source data to generate UV base layer and extended process data in parallel: the base layer is selected from at least one of white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v);

[0173] White ink layer Lw(u,v): Only generated at fixed points in the petals and French edge areas, enhancing the color rendering of nude pink and abandoning the full-nails spray mode;

[0174] Color ink layer Lc(u,v): Reproduces the nude pink, milky white, and light green petal patterns and gradient effects;

[0175] Gloss layer Lv(u,v): Only covers the top surface of the petals and the raised area of ​​the water droplets to create a localized watery texture.

[0176] The extended process data is selected from at least one of the following: transparent texture layer, material deposition layer, mask layer, curing parameter layer, layer thickness control parameter, number of printing times parameter, and printing path data;

[0177] Step S800: Generate general alignment reference data R. Extract three types of positioning elements to form an alignment reference: use the Mmask(u,v) boundary as the outline of the armor piece, use the Zzone(u,v) dividing line as the partition edge, and use the extreme points of the height field H(u,v) (the highest point of the petal, the apex of the water droplet) as the pattern feature anchor points; this reference is also compatible with the coordinate calibration of 3D printers and UV inkjet printers.

[0178] Step S900: Package the standardized manufacturing data package, integrating process parameters P such as 3D printing layer thickness, UV curing parameters, and tooling slot number. Package the manufacturing data package in JSON format according to the eight-field specification, and reserve empty fields for quality inspection feedback. The data package is bound to a unique product number and tooling slot, and each type of armor piece corresponds to an independent data package.

[0179] Step S1000: Preliminary quality inspection and data backfilling. After the finished product is off the production line, the initial inspection is completed. This batch of products has no obvious deviation, color difference, or varnish defects. The feedback field is marked as "qualified" and the data package is directly archived for use in subsequent production of the same style.

[0180] In a specific embodiment of the present invention, Example 2: Featured Style Example, Icy Translucent Jelly Water Drop Aurora Wearable Armor.

[0181] A high-radius A-type template is selected to generate a curved surface parameter domain, while retaining the height constraints of the root and side areas; light blue and light purple translucent jelly-style planar design drawings are retrieved to complete image adaptation and cropping.

[0182] Pattern layer analysis: It is divided into four semantic layers: water ripple layer, shell texture layer, water droplet layer, and aurora highlight layer; among them, the water droplet layer and aurora highlight layer are assigned the highest height weight, while the water ripple layer and shell texture layer are low-amplitude bas-relief.

[0183] Height field generation: The water wave layer is set as a continuous low-amplitude undulating relief, the shell texture is generated as a fine shallow relief, and the water droplet layer adopts a dome-shaped local protrusion; combined with inkjet constraints, the overall coverage of the white ink layer is reduced for transparent materials, and white ink is only applied in dark texture areas.

[0184] Homogeneous generation of morphological model and UV layer: The morphological model retains a transparent and thin structure; the ink layer retains color gradient and light transmission effect, without solid color filling; the varnish layer greatly enhances the coverage of the water droplets and the top surface of the shell, highlighting the texture of water and aurora.

[0185] The alignment reference, process parameters, and packaging process are the same as in Example 1; due to the high recognizability of the embossed feature points (water droplet apex), the alignment error of this model can be controlled within 0.10~0.15mm, and the alignment accuracy is better than that of conventional models.

[0186] After the data packet is encapsulated, it is directly sent to the production line for small-batch trial production.

[0187] In a specific embodiment of the present invention, Example 3: Mass production example, large-scale production of nail plates of the same style in multiple sizes and curvatures.

[0188] Based on the unified design library, the same petal design is retrieved, and parametric nail shapes of different sizes and curvatures are retrieved from the nail shape template library in turn, generating independent nail plate surface parameter domains respectively.

[0189] The system automatically performs pattern layer analysis and height field calculation for each nail design, and adaptively adjusts the relief ratio and layer distribution according to the nail size and surface curvature to ensure that the visual style and three-dimensional effect of nail pieces of different sizes are completely consistent.

[0190] Each nail plate generates an independent micro-relief nail blank model, UV layer and alignment reference data, and all data packages are uniformly bound to style number, production batch and tooling slot.

[0191] Production line station calling rules: The 3D printing station reads the corresponding blank model and printing parameters in batches to complete the printing of the entire blank; the UV inkjet station automatically calibrates the coordinates according to the alignment reference in the data package, and prints and cures layer by layer in the order of "white ink → color ink → varnish".

[0192] This embodiment relies on standardized data packages to achieve data unification across multiple devices and workstations, completely solving the problem of inconsistent relief height, pattern position, and gloss effect during mass production using traditional processes, resulting in a significant improvement in mass production yield.

[0193] In a specific embodiment of the present invention, Example 4: Quality Inspection Closed-Loop Optimization Example, Production Defect Identification and Data Packet Iterative Update.

[0194] This embodiment simulates typical production defects during mass production to verify the closed-loop capability of the present invention in quality inspection feedback, parameter correction, and data packet iteration. Three common defects were simulated: lateral inkjet offset, insufficient varnish coverage in the water droplet area, and excessively high relief at the base of the nail plate.

[0195] The initial version data package (V1.0) was put into mass production. The quality inspection station found three types of defects: 1. The UV layer has a systematic lateral offset of 0.12mm; 2. The water droplet area is missing varnish and lacks texture; 3. The relief in the root area exceeds the height limit, resulting in a noticeable step when worn.

[0196] Quality inspectors enter the defect type and error value into the quality inspection feedback field of the data packet, and the feedback data is automatically filled back into the original data packet.

[0197] Analysis of startup defects in the system's built-in feedback update module:

[0198] To address inkjet offset: Add a reverse offset compensation parameter to the alignment reference field to correct the device coordinate mapping relationship;

[0199] To address the lack of varnish: expand the mask area of ​​the varnish layer corresponding to the water droplet layer to improve the ink coverage in that area;

[0200] For cases where the relief at the base is too high: tighten the maximum limit of the height field in the base area to strengthen the wearing constraint.

[0201] The system automatically generates a new version data package (V1.1) after the iteration, updates the status flag in the feedback field, and permanently retains the optimized parameters.

[0202] Using the V1.1 version data package for subsequent batch production, similar defects were largely eliminated, enabling the accumulation of production experience and continuous optimization.

[0203] In a specific embodiment of the present invention, Example 5: System Device Example, Nine-Unit Cooperative Operation System

[0204] This embodiment describes the 2.5D height field and UV multi-layer data packet synchronous generation system of the present invention. The system consists of nine data-interoperable functional units working collaboratively to fully execute the method of the present invention.

[0205] Surface parameter domain acquisition unit: Connects to the Type A template library, imports standard parameterized Type A and historical correction models, and generates a complete parameter domain including Souter(u,v), Wnail(u,v), Mmask(u,v), and Zzone(u,v).

[0206] Nail Art Design Acquisition Unit: Import AI-generated images and designer artwork, combine them with masks to complete image correction and cropping, and output compliant design images.

[0207] Pattern layer parsing unit: Completes image semantic layering and parses process information such as height weight and transparency of each layer.

[0208] Height field generation unit: It has built-in semantic segmentation, height weight matching, and edge smoothing filtering sub-units, which combine three types of constraint operations to generate a smooth and jagged 2.5D height field.

[0209] Micro-relief structure manufacturing data generation unit: Based on the same source surface and height field, offset mesh vertices generate printable 3D models.

[0210] UV multi-layer and surface treatment data generation unit: operates in parallel with the micro-relief structure manufacturing data generation unit, and synchronously outputs three types of layers: white ink, colored ink, and varnish, with unified coordinates throughout the process.

[0211] Alignment reference generation unit: Extracts contours, partition edges, height field extreme points / gradient abrupt change points to generate a universal alignment reference for multiple devices.

[0212] Data packet encapsulation unit: Encapsulates JSON format data packets according to eight fields, with open standardized interfaces that can connect to SaaS design platforms and production management backends.

[0213] Feedback Update Unit: Identifies four types of defects: alignment error, color difference, varnish defects, and relief abnormalities, and rewrites the corresponding parameters in the data package accordingly to complete the version iteration.

[0214] The nine units can be serially linked in parallel and can be independently deployed on design and production servers, supporting both standalone and cloud cluster operation.

[0215] In a specific embodiment of the present invention, Embodiment Six: A computer-readable storage medium embodiment;

[0216] This embodiment illustrates the application of the computer-readable storage medium of the present invention: This storage medium can be a general-purpose storage device such as a USB flash drive, solid-state drive, optical disc, or cloud server hard drive, and stores a computer-executable program within it. When this program is loaded and executed by a terminal processor, industrial control computer, or cloud server, it automatically runs the 2.5D height field and UV multi-layer data packet synchronous generation method described in claims 1 to 6 of the present invention, sequentially completing the entire process of obtaining surface parameter domains, adapting design drawings, layering patterns, generating height fields, outputting model and UV layers from the same source, generating alignment references, encapsulating data packets, and feedback iteration. This storage medium can be sold as a standalone product or integrated into design software or production equipment controllers for use in conjunction with other products.

[0217] In a specific embodiment of the present invention, Example 7: Embodiment of a mass production equipment for relief-engraved wearable armor;

[0218] This embodiment describes the mass production equipment for the embossed wearable armor of the present invention. The main body of the equipment consists of a 3D photopolymer printer, a UV inkjet printer, and a dedicated controller.

[0219] The device has a built-in dedicated controller that can directly read the standardized manufacturing data package containing the eight fields of this invention.

[0220] Coordinate calibration stage: The controller retrieves the alignment reference data R from the data package and uniformly completes the coordinate calibration of the 3D photopolymer printer, UV inkjet printer, and production line tooling slots.

[0221] 3D printing stage: The controller calls the embryo model field and printing process parameters in the data package to drive the 3D photopolymer printer to form layer by layer and create a micro-relief embryo.

[0222] In the UV printing stage: the controller retrieves UV printing layer data according to the preset order of the data package, including white ink, colored ink, and varnish, and controls the inkjet printer to print and cure each layer of UV ink in turn. The printing follows the layering order of white ink, colored ink, and varnish, and each layer is cured sequentially: the white ink base coat covers the base color of the nail polish, enhances color saturation, and smooths the base; the colored ink carries the pattern and color, and can only be accurately displayed when placed on top of the white ink; the varnish coats the surface, protecting the ink from scratches and color fading, while also enhancing the glossy texture of the embossed design. Each layer is cured with UV ink immediately after printing to prevent ink smudging and color mixing, adapting to the varying heights and curves of the micro-embossed surface, and preventing ink buildup and blurring in the grooves. This patented data is aligned from the same source, and the standardized printing sequence ensures precise matching between embossing and printing, resulting in consistent color and gloss effects in mass production.

[0223] During the data interaction phase, the controller connects bidirectionally to the external SaaS design platform and production management backend via a data packet interface. It receives new design data in real time, issues production instructions, and simultaneously transmits on-site quality inspection data, forming a closed loop at the equipment end. This mass production equipment requires no additional 3D scanning hardware; it can complete customized production solely based on a standard nail template library, making it suitable for small and medium-sized processing plants and the upgrading of offline nail salons.

[0224] In a specific embodiment of the present invention, Example 8: Figure 7 As shown,

[0225] This embodiment provides a mass production device for embossed wearable armor, mainly used to realize the digital and continuous manufacturing of micro-relief wearable armor according to a standardized manufacturing data package. The device includes one or both of a structural forming station and a surface treatment station, and has a built-in dedicated controller. The controller can read the standardized manufacturing data package defined in the aforementioned method embodiment to obtain information such as product ID, 3D model data, UV multi-layer data, alignment reference data R, and quality inspection feedback fields.

[0226] In actual production, the controller relies on the alignment reference data R in the data package to perform unified coordinate calibration on the structure forming station, UV inkjet station, UV material stacking station and tooling slot, so that different stations share the same coordinate reference and avoid misalignment between the relief structure and the printed pattern due to separate data production or equipment alignment deviation.

[0227] The controller can select different processing methods based on the micro-relief structure manufacturing data in the data package. For example, the controller can drive a 3D photopolymerization printing device to integrally form a micro-relief shell; it can also drive a UV curable material stacking device to create local micro-relief textures on the surface of a pre-made shell or base shell. Furthermore, the controller can also retrieve UV multi-layer data and complete the layer-by-layer printing and curing of basic layers such as white ink, colored ink, and varnish according to a preset process sequence. Combined with data on transparent texture layers, material deposition layers, and curing parameter layers, it can achieve surface texture stacking and precise curing control.

[0228] After processing is completed, the equipment can detect defects such as printing offset, color difference, and missing varnish through the quality inspection station, and feed the quality inspection results back to the standardized manufacturing data package to update relevant fields, thereby realizing closed-loop optimization of production parameters.

[0229] In summary, this invention discloses a method, system, storage medium, and device for generating data for embossed wearable nails. This invention breaks away from the traditional industry model of "separate 3D printing and UV inkjet printing processes, with independent data production" in micro-relief wearable nails. It abandons the technical path that relies on 3D scanning of real nails and point cloud topological deformation. Using a standardized nail plate surface parameter domain as a unified coordinate reference for the entire process, it first performs semantic layering analysis on the planar nail design drawing, then combines wearing constraints, manufacturing constraints, and inkjet constraints to generate a 2.5D micro-relief height field. Based on the same source data, it synchronously generates micro-relief structure manufacturing data, white ink layer, colored ink layer, and varnish layer—three types of UV printing layers—in parallel, and constructs universal alignment reference data adaptable to multiple devices. Finally, it encapsulates eight categories of data—surface parameter domain, design information, height field, 3D model, UV layer, alignment reference, process parameters, and quality inspection feedback—into a standardized manufacturing data package. Simultaneously, it utilizes feedback data from production and quality inspection processes to iterate the data package parameters, forming a closed-loop data process encompassing design, production, quality inspection, and optimization.

[0230] This invention achieves coordinate unification between the micro-relief structure and the printed pattern from the data source, completely solving the problems of misalignment between relief and color, and high scrap rate in existing products. By combining pattern semantic layering with partition height restriction rules, it accurately reproduces the designer's three-dimensional creative effect while effectively avoiding discomfort such as scratching hands and snagging hair caused by excessive relief at the base and sides of the nail tip. UV ink is applied at fixed points according to the relief shape and pattern characteristics, abandoning the crude mode of full-coverage spraying, significantly reducing ink consumption, and improving the defects of thick and inflexible nail tips. The standardized manufacturing data package has a universal data interface, which can seamlessly connect to various equipment such as wearable nail SaaS design platforms, production management systems, 3D light curing printers, and UV inkjet printers. Production line changes and parameter configurations do not require manual debugging, effectively reducing labor costs and production debugging time. At the same time, this solution relies on a pre-set nail template library for production, allowing small and medium-sized processing plants and offline nail salons to carry out personalized customization business without purchasing expensive 3D scanning equipment, with low hardware investment threshold and strong implementation. The same technology system can be adapted to different styles, sizes and curvatures of wearable nail products. During mass production, it can ensure that the appearance, three-dimensional effect and gloss texture of the products are highly consistent, fully meeting the dual needs of personalized customization and large-scale mass production.

[0231] The specific embodiments of the invention have been described above. It should be understood that the invention is not limited to the specific embodiments described above, and the devices and structures not described in detail should be understood to be implemented in a manner common to the art; those skilled in the art can make various modifications or alterations within the scope of the claims, and make several simple deductions, variations or substitutions, which do not affect the substantive content of the invention.

Claims

1. A method for generating data for embossed armor, characterized in that, Includes the following steps: S100: Pre-set nail template library and flat nail art design library respectively; S200: Obtain the target surface parameter domain of the armor plate: Retrieve an armor plate from the preset armor plate template library to generate the surface parameter domain of the armor plate, wherein the surface parameter domain of the armor plate includes: The outer surface of the armor plate, Souter(u,v), forms the three-dimensional shape data of the bottom layer of the armor plate; The parameter domain Wnail(u,v) of the plate forms a two-dimensional mathematical coordinate system (u,v); The effective area of ​​the armor plate Mmask(u,v) forms a binary image (black and white image). The white area represents the part of the armor plate with material (the part that needs to be made), and the black area represents the edge, root gap or part that does not need to be made. The nail plate partitioning diagram Zzone(u,v) forms a partitioning map that divides the nail plate into different functional areas: the root area (near the finger), the lateral area, the central area, and the leading edge area. S300: Retrieve a flat nail design from the preset flat nail design library and adapt the flat nail design to the boundary of the effective area Mmask(u,v) of the nail piece; S400: Perform image semantic decomposition and pattern layer analysis on the adapted flat nail art design drawing to obtain multiple sets of pattern semantic layers, wherein the pattern semantic layers can be independent layers that do not overlap with each other; It can also perform fusion calculations within the same area using transparency, rendering priority, height weight, or channel information; S500: Using all semantic layers, the surface parameter domain of the armor plate, and preset constraints as input variables, a 2.5D micro-relief height field H(u,v) shared by the entire domain is generated in the unified parameter domain Ω through numerical calculation of the mapping function H(u,v)=F(Layers,Zones,Constraints); S600, based on the homologous fundamental surface Souter(u,v) and the 2.5D height field H(u,v), generates micro-relief structure manufacturing data by offsetting each grid vertex along the outer normal of the reference surface of the armor plate; the micro-relief structure manufacturing data includes two types of data, which can be set selectively or configured simultaneously: The first category is three-dimensional model data used for 3D additive manufacturing of one-piece micro-relief prototypes; The second category is UV processing data used to form local micro-relief textures on the surface of prefabricated carapaces or base carapaces. The UV processing data is selected from at least one of UV curable material stacking data, transparent texture layer data, material deposition layer data, curing parameter layer data, and local texture deposition path data. S700 reuses the same source-based basic surface Souter(u,v), the same source-based 2.5D height field H(u,v), and the micro-relief structure manufacturing data to synchronously generate UV multi-layer data that is aligned with the micro-relief structure manufacturing data; the UV multi-layer data includes a basic layer and extended process data; The base layer is selected from at least one of the following: white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v); The extended process data is selected from at least one of the following: transparent texture layer, material deposition layer, mask layer, curing parameter layer, layer thickness control parameter, number of printing times parameter, and printing path data; S800: Based on the outline of the card plate, the partition edges, and the pattern feature points, a 3D model and a general alignment reference data R for 2D printing are generated; the card plate outline comes from the effective area Mmask(u,v) of the card plate, and the boundary of the white area is the card plate outline; the partition edges come from the card plate partition map Zzone(u,v), and the dividing line between different colors is the partition edge line; the pattern feature points come from the same source 2.5D height field H(u,v) data, where H(u,v) is a height map; S900 integrates 3D printing parameters, ink curing parameters, and tooling slot information to form process parameters P. According to the preset eight field specifications, it encapsulates surface parameter field information, planar nail art design drawing information, 2.5D micro-relief height field, micro-relief structure manufacturing data information, UV printing layer data information, alignment reference data R, process parameters P, and reserved empty fields. The reserved empty fields are used as quality inspection feedback fields. The preset eight field specifications are encapsulated into a standardized manufacturing data package. S1000, the standardized manufacturing data package is retrieved by the units involved in the above-mentioned eight pre-defined field specifications. Feedback data from the production or quality inspection stages in the units involved in the eight field specifications is backfilled into the quality inspection feedback field of the standardized manufacturing data package. The corresponding parameters are corrected according to the defect type to achieve iterative optimization of the data package.

2. The generation method according to claim 1, characterized in that, The surface parameter domain of the plate in step S100 is derived from the plate template library, which contains at least one of the following types of data: The original scan data of the nail plate, or the point cloud data of the physical nail plate or real nail obtained by 3D scanning equipment; Standardized parametric data for armor plates, based on a geometric model generated from standard curvature levels and size matrices; The correction data for the lens process is a correction model obtained by compensating for tolerances or optimizing the wearing experience based on feedback data from historical production or quality inspection processes. The A-plate has validated production data, a specific version model with historical yield records precipitated from the manufacturing data package.

3. The generation method according to claim 2, characterized in that, The flat nail art design in step S100 is derived from a flat nail art design library, which contains at least one of the following types of data: Original data for generating flat nail art designs, which are flat patterns containing multiple layers of semantic information provided by AI algorithms or designers; Flat nail art design drawings are based on standard process data, and preset patterns that conform to the rules for generating micro-relief height fields are selected. The data for revising and optimizing flat nail art designs is the manufacturable design obtained by adjusting the line width, color value, or texture density of the original design based on quality inspection feedback. Flat nail art design drawings have been verified with production data; specific versions of the design drawings with yield records are extracted from the manufacturing data package. The planar nail art design includes layer semantic information, which is used to define the height weight of different pattern areas in the 2.5D micro-relief height field; In the adaptation process in step S300: based on the boundary of the effective area Mmask(u,v) of the nail piece in step S200, the planar nail design drawing is matched and cropped with the boundary of the effective area Mmask(u,v) of the nail piece. Before cropping, any one or more image processing operations can be performed on the planar nail design drawing, such as scaling, cropping, perspective correction, skew correction, and style unification.

4. The generation method according to claim 1, characterized in that, In S400: Identify the visual elements in the planar nail art design drawing and classify the visual elements into different pattern semantic layers; the pattern semantic layers include at least one or more of the following: background layer, main decoration layer, line layer, teardrop layer, pearl layer, French edge layer, highlight layer, and metallic line layer; Each pattern semantic layer carries corresponding process semantic information, which includes at least height weight, opacity or coverage weight, and layer category. The pattern semantic layer pixels can be non-overlapping. When the layer pixels overlap, a fusion operation is performed by layer opacity or cover weight, rendering priority, height weight or channel information. The image semantic decomposition process does not require relying on the grayscale value of the image to infer the relief height, nor does it require manual editing of the relief parameters one by one. The system automatically assigns the initial height weight based on the layer category. The main decorative layer features the core visual pattern of the nail plate and is assigned the highest weight. The water droplet layer and the highlight layer are localized raised decorations, and are assigned a second height weight; The second height weight is greater than the first height weight, so that the water droplet layer and the highlight layer form a relief protrusion higher than the main decorative layer within the 2.5D micro-relief height field.

5. The generation method according to claim 1, characterized in that, In step S500, the preset constraints include: wearing constraints, manufacturing constraints, and inkjet constraints; The mapping function H(u,v)=F(Layers(u,v),Zones(u,v),Constraints,ProcessProfile); Where Layers represents the set of pattern layers, Zones represents the nail plate partitions, Constraints represents wearing constraints, manufacturing constraints, and inkjet constraints, and ProcessProfile represents the specific process configuration; Wearing constraints: Height restrictions apply to the root and side areas; Manufacturing constraints: Limit maximum height, minimum line width, maximum slope, minimum printable area, isolated islands, and sharp edges; Inkjet constraints: Adjust the color and varnish layer according to the slope, grooves, and occlusion.

6. The generation method according to claim 1, characterized in that, In step S600, the 2.5D micro-relief height field H(u,v) relies on all semantic layers, the nail plate surface parameter domain, and preset constraints as input variables. All semantic layers rely on the cropped planar nail design drawing, and both the cropped planar nail design drawing and the nail plate surface parameter domain rely on the outer base surface Souter(u,v) of the nail plate. Therefore, the outer base surface Souter(u,v) of the nail plate is the same source base surface of the 2.5D height field H(u,v) in S600.

7. A data generation system for embossed armor, characterized in that, The system consists of nine interconnected functional units, namely: surface parameter domain acquisition unit, nail art design drawing acquisition unit, pattern layer analysis unit, height field generation unit, micro-relief structure manufacturing data generation unit, UV multi-layer and surface treatment data generation unit, alignment reference generation unit, manufacturing data package encapsulation unit, and feedback update unit; the functions of each unit are as follows: Surface parameter domain acquisition module: Connects to the A-type template library, imports various A-type data, completes the parameterization processing of the A-type surface, and generates a complete A-type surface parameter domain including the basic surface Souter(u,v) on the outer side of the A-type, the parameter domain Wnail(u,v) of the A-type, the effective area Mmask(u,v) of the A-type, and the partition map Zzone(u,v) of the A-type. Design image acquisition module: Connects to the flat nail art design image library, imports various flat design images, and combines the effective area Mmask(u,v) of the nail piece to complete image adaptation, correction, and cropping processing, and outputs compliant cropped flat nail art design images; Pattern layer parsing module: performs image semantic decomposition and layering on the cut design drawing, divides it into multiple types of pattern semantic layers, and parses the process semantic information such as height weight and transparency of each layer; Height field generation module: Taking pattern semantic layer, armor plate partition, three types of constraints (wearing / manufacturing / inkjet) and process configuration as input, it generates a 2.5D micro-relief height field H(u,v) through extended mapping function operation; The micro-relief structure manufacturing data generation module generates micro-relief structure manufacturing data based on the same basic surface Souter(u,v) and the 2.5D height field H(u,v). This data includes a 3D model data module and a UV processing data module. These two types of data can be generated separately or simultaneously. The 3D model data module contains the 3D model data for the 3D additive manufacturing of one-piece micro-relief blanks; The UV processing data module is UV processing data used to form local micro-relief textures on the surface of pre-made carapaces or base carapaces. The UV processing data is selected from at least one of UV curable material stacking data, transparent texture layer data, material deposition layer data, curing parameter layer data, and local texture deposition path data. Based on the common basic surface Souter(u,v) and the 2.5D height field H(u,v), the mesh vertices are offset along the surface normal to generate a micro-relief prototype solid model M that can be used for additive manufacturing; The UV multi-layer and surface treatment data generation module reuses the same source base surface Souter(u,v), height field H(u,v), and micro-relief structure manufacturing data to synchronously generate UV multi-layer data that is precisely aligned with the structure data. The UV multi-layer data is divided into a base printing layer module and an extended process control data module. The base layer module is selected from at least one of the following: white ink layer Lw(u,v), colored ink layer Lc(u,v), and varnish layer Lv(u,v); The extended process data module is selected from at least one of the following: transparent texture layer, material deposition layer, mask layer, curing parameter layer, layer thickness control parameter, number of printing times parameter, and printing path data; Alignment reference generation module: extracts the effective area boundary of the axle as the axle outline, extracts the partition map edge line as the partition edge line, extracts the extreme points and gradient change points of the height field H(u,v) as pattern feature points, and integrates them to generate alignment reference data R shared by the 3D model and 2D printing; Manufacturing data package encapsulation module: collects surface parameter domain information, design drawing information, height field, micro-relief structure manufacturing data, UV layer, alignment reference R, process parameter P, and quality inspection feedback fields, and encapsulates them into a standardized manufacturing data package according to the eight major field specifications. The data package is configured with a general external data interface, which can be connected to wearable armor SaaS design tools, back-end production management and control platforms, and mass production equipment back-end. Feedback update module: collects feedback data from production and quality inspection processes and backfills it into the quality inspection feedback field of the data packet; it corrects the layer parameters, alignment reference parameters, height field parameters, and process parameters in the data packet according to the defect type; the nine units work together to execute the method for synchronously generating 2.5D height field and UV multi-layer data packets as described in any one of claims 1 to 6.

8. The generation system according to claim 7, characterized in that, The height field generation unit has a built-in semantic segmentation unit, height weight matching unit, and edge smoothing filtering unit. The semantic segmentation unit receives the pattern layer parsing result, the height weight matching unit combines the layer height weight, the plate partition, and three types of constraints to complete the height assignment, and the edge smoothing filtering unit performs anti-aliasing processing on the height field edge. The micro-relief structure manufacturing data generation module and the UV multi-layer generation module share the same source basic surface Souter(u,v) and source 2.5D height field H(u,v) data source. The two modules operate in parallel and output micro-relief structure manufacturing data and UV multi-layer data synchronously, maintaining a unified coordinate system throughout the process. The point extraction rules of the alignment reference generation module are as follows: the outline of the A-piece is completely taken from the binary map boundary of the effective area Mmask(u,v) of the A-piece; the partition edge line is completely taken from the area dividing line of the partition map Zzone(u,v) of the A-piece; the pattern feature points are extracted as precise anchor points by calculating the gradient value of the 2.5D height field H(u,v); the alignment reference data R generated by the combination of the three types of positioning elements is adapted to the coordinate calibration of 3D printing equipment, UV inkjet equipment, and production line tooling slots. The standardized manufacturing data package output by the manufacturing data package encapsulation module adopts JSON format and is fixedly divided into eight fields: surface parameter field, planar design drawing field, 2.5D height field, micro-relief structure manufacturing data field, UV printing layer field, alignment reference field, process parameter field, and quality inspection feedback field. The data package has an open standardized data interface and can be directly used as a general data interaction carrier for wearable armor SaaS tools, production management platforms, and mass production equipment backends, supporting one-way retrieval and two-way data return from external systems. The feedback update module includes a built-in defect analysis subunit and a parameter rewriting subunit. The defect analysis subunit automatically identifies and categorizes four types of defects: alignment error, color difference, varnish defects, and relief anomalies. The parameter rewriting subunit modifies the corresponding fields in the data package according to the defect type: for alignment anomalies, it corrects the alignment reference field; for ink defects, it adjusts the process parameter field; and for relief anomalies, it corrects the height field and layer weight field. After parameter modification, the update status is marked in the quality inspection feedback field, and the optimized data is permanently stored in the data package.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements the relief armor data generation method according to any one of claims 1 to 6.

10. A mass production equipment for embossed wearable armor, comprising one or both of a structural forming station and a surface treatment station, characterized in that, The equipment has a built-in dedicated controller that can read the standardized manufacturing data package as defined in the aforementioned method claims; the controller relies on the alignment reference data R in the data package to complete the unified coordinate calibration of the structure forming station, UV inkjet station, UV material stacking station, and tooling slot. The controller retrieves the micro-relief structure manufacturing data from the data packet and executes one or both of the following two processing methods: one is to drive the 3D photopolymerization printing equipment to integrally form the micro-relief shell, and the other is to drive the UV curable material stacking equipment to create local micro-relief textures on the surface of the pre-made shell or base shell. The controller also retrieves UV multi-layer data from the data package and performs processing according to the preset process sequence: it completes the layer-by-layer printing and layer-by-layer curing of white ink, colored ink and varnish on the base layer, and at the same time, it completes the surface texture stacking and precise curing by relying on the transparent texture layer, material deposition layer and curing parameter layer. The controller retrieves the micro-relief structure manufacturing data field data to drive the 3D photopolymerization printer to complete the micro-relief blank forming, and then retrieves the UV printing layer field data to control the UV inkjet printer to print and cure layer by layer in the order of white ink, colored ink, and varnish. The controller connects to external SaaS design platforms and production management backends via data packets to synchronously receive design data and quality inspection feedback data.

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