Display panel, method for manufacturing display panel, and display device

Abstract

The application relates to a display panel, a preparation method of the display panel and a display device. The display panel comprises a substrate, an isolation structure and a light-emitting device. The isolation structure comprises a first isolation layer and a second isolation layer, and the material of the first isolation layer comprises a conductive material. The isolation structure is surrounded by a plurality of isolation openings, and the isolation opening has a first side and a second side which are oppositely arranged in a first direction. Corresponding to the same isolation opening, the first isolation layer located on the first side exceeds the second isolation layer towards the isolation opening, and in the first direction, the distance between the edge of the first isolation layer located on the second side and the center of the isolation opening is greater than the distance between the edge of the first isolation layer located on the first side and the center of the isolation opening, and the first direction is parallel to the substrate. The light-emitting device comprises a light-emitting functional layer and a first electrode. The light-emitting functional layer is arranged towards the second side, and the first electrode exceeds the light-emitting functional layer towards the first side in the first direction and is connected with the first isolation layer. The application can improve the problem of poor picture quality.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display panel, a method for manufacturing the display panel, and a display device. Background Technology

[0002] With the development of display technology, a self-aligning pixelation technology without metal masks has emerged. This technology achieves pixel patterning through photolithography, which can effectively improve the pixel density and aperture ratio of display panels. Patents CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A, and CN118660589A describe relevant content of the technology without fine metal masks, for reference.

[0003] However, the performance of display panels formed without fine metal mask technology still needs to be optimized. Summary of the Invention

[0004] Therefore, it is necessary to provide a display panel, a method for manufacturing the display panel, and a display device that can improve the problem of poor image quality, in order to address the aforementioned technical issues.

[0005] A display panel, comprising:

[0006] substrate;

[0007] An isolation structure, located on one side of the substrate, includes a first isolation layer and a second isolation layer sequentially disposed on the substrate. The first isolation layer is made of a conductive material. The isolation structure encloses a plurality of isolation openings. Each isolation opening has a first side and a second side disposed opposite to each other in a first direction. Corresponding to the same isolation opening, the first isolation layer on the first side extends beyond the second isolation layer toward the isolation opening. In the first direction, the distance between the edge of the first isolation layer on the second side and the centroid of the isolation opening is d1, and the distance between the edge of the first isolation layer on the first side and the centroid of the isolation opening is d2, where d1 is greater than d2. The first direction is parallel to the substrate.

[0008] A light-emitting device includes a light-emitting functional layer and a first electrode sequentially disposed on the substrate, wherein the light-emitting functional layer and the first electrode are located within the area defined by the isolation opening; corresponding to the same isolation opening, in the first direction, the light-emitting functional layer is disposed biased towards the second side, the centroid of the light-emitting functional layer is offset from the centroid of the isolation opening towards the second side, and the first electrode extends beyond the light-emitting functional layer in the first direction towards the first side and is connected to the first isolation layer.

[0009] In one embodiment, the first isolation layer located on the second side of the isolation opening does not extend beyond the second isolation layer toward the isolation opening.

[0010] In one embodiment, the first isolation layer located on the second side of the isolation opening is recessed into the second isolation layer away from the isolation opening;

[0011] Optionally, the first isolation layers located on both sides of the isolation opening in the second direction are recessed into the second isolation layer away from the isolation opening, the second direction being parallel to the substrate and perpendicular to the first direction.

[0012] In one embodiment, the isolation structure further includes a first insulating layer located on the sidewall of the second isolation layer;

[0013] Optionally, the first insulating layer includes an oxide of the second insulating layer;

[0014] Optionally, the material of the second insulating layer includes aluminum, and the material of the first insulating layer includes aluminum oxide;

[0015] Optionally, the material of the first insulating layer includes molybdenum.

[0016] In one embodiment, the material of the second insulating layer includes an insulating material.

[0017] In one embodiment, the light-emitting functional layer extends beyond the first electrode toward the second side in the first direction.

[0018] In one embodiment, the plurality of isolation openings includes a first opening, a second opening, and a third opening, and the display panel includes a plurality of light-emitting devices of different colors, the plurality of light-emitting devices of different colors including a first color device, a second color device, and a third color device, the first color device corresponding to the first opening, the second color device corresponding to the second opening, and the third color device corresponding to the third opening;

[0019] Within the area defined by the first opening and the area defined by the second opening, the first isolation layer extends beyond the second isolation layer in opposite directions;

[0020] Optionally, the display panel further includes a pixel definition layer located between the isolation structure and the substrate, the pixel definition layer forming a pixel opening, and the pixel opening communicating with the isolation opening;

[0021] Optionally, the light-emitting device further includes a second electrode located between the pixel definition layer and the substrate, with the pixel opening exposing the second electrode.

[0022] In one embodiment, within the area defined by the third opening and the area defined by the first opening, the first isolation layer extends beyond the second isolation layer in the same direction.

[0023] In one embodiment, within the area defined by the third opening and the area defined by the second opening, the first isolation layer extends beyond the second isolation layer in the same direction.

[0024] In one embodiment, the isolation structure includes a first isolation substructure located between the first opening and the second opening, wherein the first isolation layer of the first isolation substructure is recessed into the second isolation layer at both ends in the first direction.

[0025] In one embodiment, the isolation structure includes a first isolation substructure located between the first opening and the second opening, wherein the first isolation layer of the first isolation substructure extends beyond the second isolation layer at both ends in the first direction.

[0026] In one embodiment, corresponding to the same isolation opening, the light-emitting functional layer is spaced apart from the first isolation layer that extends beyond the second isolation layer in the first direction.

[0027] In one embodiment, the isolation structure further includes a third isolation layer located on the side of the second isolation layer away from the first isolation layer, wherein the orthographic projection of the second isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate.

[0028] For the same isolation opening, the orthographic projection of the light-emitting functional layer on the substrate does not overlap with the orthographic projection of the third isolation layer on the substrate near the first side of the isolation opening;

[0029] Optionally, the orthographic projection of the first isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate.

[0030] In one embodiment, corresponding to the same isolation opening, in the first direction, the first electrode is disposed biased toward the first side, and the centroid of the first electrode is directed toward the first side and offset from the centroid of the isolation opening.

[0031] In one embodiment, the isolation structure further includes a third isolation layer located on the side of the second isolation layer away from the first isolation layer, wherein the orthographic projection of the second isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate.

[0032] The orthographic projection of the first electrode on the substrate does not overlap with the orthographic projection of the third isolation layer on the substrate near the second side of the isolation opening;

[0033] Optionally, the orthographic projection of the first isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate.

[0034] A method for manufacturing a display panel, the method comprising:

[0035] Provide substrate;

[0036] A first isolation layer having a first mesh is formed on the substrate;

[0037] A second isolation layer with a second mesh is formed on the first isolation layer to form an isolation structure. The isolation structure includes the second isolation layer and the first isolation layer. The material of the first isolation layer includes a conductive material. The isolation structure surrounds a plurality of isolation openings. The isolation openings have a first side and a second side disposed opposite to each other in a first direction. Corresponding to the same isolation opening, the first isolation layer located on the first side extends the second isolation layer toward the isolation opening. In the first direction, the distance between the edge of the first isolation layer located on the second side and the centroid of the isolation opening is d1, and the distance between the edge of the first isolation layer located on the first side and the centroid of the isolation opening is d2. d1 is greater than d2. The first direction is parallel to the substrate.

[0038] A light-emitting functional material layer of the target color is deposited on the first target side in the first direction, biased towards the isolation opening, so that the centroid of the light-emitting functional material layer in each isolation opening is offset from the centroid of the isolation opening towards the first target side; for the isolation opening corresponding to the target color, the first target side is the second side of the isolation opening;

[0039] A first electrode material layer is deposited on the light-emitting functional material layer;

[0040] The first electrode material layer and the light-emitting functional material layer are patterned to form a first electrode and a light-emitting functional layer in the isolation opening corresponding to the target color, so as to form a light-emitting device of the target color; corresponding to the same isolation opening, in the first direction, the light-emitting functional layer is disposed biased towards the second side, and the centroid of the light-emitting functional layer is offset from the centroid of the isolation opening towards the second side; the first electrode extends beyond the light-emitting functional layer in the first direction towards the first side and connects to the first isolation layer.

[0041] In one embodiment, before depositing the luminescent material layer of the target color on the first target side biased toward the isolation opening in the first direction, the method further includes:

[0042] A first insulating layer is formed on the sidewall of the second insulating layer;

[0043] Optionally, forming a first insulating layer on the sidewall of the second insulating layer includes:

[0044] The sidewall of the second isolation layer is subjected to oxidation treatment;

[0045] Optionally, the oxidation treatment method includes oxygen plasma treatment.

[0046] In one embodiment, the deposition of the first electrode material layer on the light-emitting functional material layer includes:

[0047] The first electrode material layer is deposited on the second target side in the first direction, biased towards the isolation opening, such that the centroid of the first electrode material layer in each isolation opening is offset from the centroid of the isolation opening towards the second target side; the second target side is disposed opposite to the first target side, and for the isolation opening corresponding to the target color, the second target side is the first side of the isolation opening.

[0048] In one embodiment, the luminescent material layer of the target color, deposited on the first target side of the isolation opening in the first direction, includes:

[0049] The first vapor deposition source of the target color is rotated toward the first target side so that the first vapor deposition source is tilted toward the first target side;

[0050] Adjust the evaporation angle of the first evaporation source of the target color so that the first evaporation source deposits the luminescent functional material layer toward the first target side;

[0051] The deposition of the first electrode material layer on the second target side biased towards the isolation opening in the first direction includes:

[0052] Rotate the second vapor deposition source toward the second target side so that the second vapor deposition source tilts toward the second target side;

[0053] Adjust the evaporation angle of the second evaporation source so that the second evaporation source deposits the first electrode material layer toward the second target side.

[0054] A display device includes a display panel as described above or a display panel prepared according to the method for preparing the display panel described above.

[0055] In the aforementioned display panel, display panel manufacturing method, and display device, the distance between the edge of the first isolation layer on the second side and the centroid of the isolation opening is greater than the distance between the edge of the first isolation layer on the first side and the centroid of the isolation opening, thereby changing the structural form of the isolation structure. Simultaneously, the light-emitting functional layer is offset towards the second side.

[0056] Therefore, the coverage of the light-emitting functional layer on the first isolation layer on the first side can be effectively reduced. Simultaneously, the first isolation layer on the second side is further away from the centroid of the isolation opening compared to the first isolation layer on the first side. Therefore, even though the light-emitting functional layer is biased towards the second side, it can cover little or no of the first isolation layer on the second side. Thus, the total coverage of the light-emitting functional layer on both sides of the isolation opening in the first direction can be effectively reduced, thereby reducing the risk of leakage between the light-emitting functional layer and the isolation structure and improving image quality.

[0057] Meanwhile, because the light-emitting functional layer is offset to the second side, the coverage of the light-emitting functional layer on the first insulating layer on the first side is effectively reduced. Therefore, the overlap area of ​​the first electrode extending beyond the light-emitting functional layer onto the first insulating layer can be effectively increased. Thus, a sufficiently small overlap impedance can be effectively ensured between the first electrode and the isolation structure.

[0058] A display panel, comprising:

[0059] substrate;

[0060] An isolation structure is located on one side of the substrate and surrounds a plurality of isolation openings. The isolation openings have a first side and a second side disposed opposite to each other in a first direction. The isolation structure includes a second insulating layer, which is located on the second side of the isolation opening.

[0061] A light-emitting device includes a light-emitting functional layer and a first electrode sequentially disposed on the substrate. The light-emitting functional layer and the first electrode are located within the area defined by the isolation opening. The light-emitting functional layer is disposed biased towards the second side and connected to the second insulating layer. The first electrode extends beyond the light-emitting functional layer toward the first side in the first direction and is connected to the isolation structure.

[0062] In one embodiment, corresponding to the same isolation opening, in the first direction, the first electrode is disposed biased toward the first side, and the centroid of the first electrode is offset toward the first side from the centroid of the isolation opening.

[0063] In one embodiment, the second insulating layer includes an oxide layer.

[0064] A display device includes a display panel as described above.

[0065] In the aforementioned display panel and display device, the light-emitting functional layer is disposed biased towards the second side. Therefore, the amount of coverage of the light-emitting functional layer on the first insulating layer on the first side can be effectively reduced. Simultaneously, the insulating structure includes a second insulating layer located on the second side of the insulating opening. The light-emitting functional layer is connected to the second insulating layer on the second side. Therefore, even though the light-emitting functional layer is biased towards the second side, it does not conduct electricity with the insulating structure, thus preventing leakage. Therefore, this application can effectively reduce the risk of leakage between the light-emitting functional layer and the insulating structure, thereby improving the problem of poor image quality.

[0066] Meanwhile, because the light-emitting functional layer is offset to the second side, the coverage of the light-emitting functional layer on the first insulating layer on the first side is effectively reduced. Therefore, the overlap area of ​​the first electrode extending beyond the light-emitting functional layer onto the first insulating layer can be effectively increased. Thus, a sufficiently small overlap impedance can be effectively ensured between the first electrode and the isolation structure.

[0067] A display panel, comprising:

[0068] substrate;

[0069] An isolation structure, located on one side of the substrate, includes a first isolation layer and a second isolation layer sequentially disposed on the substrate. The material of the first isolation layer includes a conductive material. The isolation structure surrounds a plurality of isolation openings. The isolation openings have a first side and a second side disposed opposite to each other in a first direction. Corresponding to the same isolation opening, the first isolation layer located on the first side extends beyond the second isolation layer toward the isolation opening.

[0070] A light-emitting device includes a light-emitting functional layer and a first electrode sequentially disposed on the substrate, wherein the light-emitting functional layer and the first electrode are located within the area defined by the isolation opening; corresponding to the same isolation opening, the light-emitting functional layer is spaced apart from the first isolation layer located on the first side and spaced apart from the first isolation layer located on the second side.

[0071] A display device includes a display panel as described above.

[0072] In the aforementioned display panel and display device, corresponding to the same isolation opening, the light-emitting functional layer and the first isolation layer located on the first side are spaced apart, and the first isolation layer located on the second side is also spaced apart. That is, corresponding to the same isolation opening, the light-emitting functional layer does not overlap with the first isolation layer on the first side or the second side, thereby effectively preventing leakage between the light-emitting functional layer and the first isolation layer, and thus effectively improving the problem of poor image quality. Attached Figure Description

[0073] To more clearly illustrate the technical solutions in the embodiments of this application or the conventional technology, the drawings used in the description of the embodiments or the conventional technology will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0074] Figure 1 This is a partial cross-sectional schematic diagram of the display panel in the self-alignment pixelation technology without a metal mask.

[0075] Figure 2 for Figure 1 The equivalent circuit diagram of the leakage path of the display panel in the image;

[0076] Figure 3 This is a partial cross-sectional schematic diagram of a display panel in one embodiment of this application;

[0077] Figure 4 This is a partial planar schematic diagram of the isolation structure of the display panel in one embodiment of this application, wherein (a) is a partial planar schematic diagram of the first opening and (b) is a partial planar schematic diagram of the second opening;

[0078] Figure 5 This is a partial cross-sectional schematic diagram of the display panel in another embodiment of this application;

[0079] Figure 6 This is a partial cross-sectional schematic diagram of the first encapsulation material layer after its formation in one embodiment of this application;

[0080] Figure 7 This is a partial cross-sectional schematic diagram of the etching process of the first encapsulation material layer in one embodiment of this application;

[0081] Figure 8 This is a partial cross-sectional schematic diagram of the third opening undergoing a second etching of the first encapsulation material layer in one embodiment of this application;

[0082] Figure 9 This is a partial cross-sectional schematic diagram of the isolation structure in one embodiment of this application;

[0083] Figure 10 This is a partial cross-sectional schematic diagram of the isolation structure in another embodiment of this application;

[0084] Figure 11 This is a schematic diagram of the manufacturing process of the display panel in one embodiment of this application;

[0085] Figure 12 This is a partial cross-sectional schematic diagram of the light-emitting functional material layer of the first color device being vapor-deposited in the first opening in one embodiment of this application;

[0086] Figure 13 This is a partial cross-sectional schematic diagram of the first electrode material layer of the first color device being vapor-deposited in the first opening in one embodiment of this application;

[0087] Figure 14 This is a partial cross-sectional schematic diagram of the light-emitting functional material layer of the second color device being vapor-deposited in the second opening in one embodiment of this application;

[0088] Figure 15 This is a partial cross-sectional schematic diagram of the first electrode material layer of the second color device being vapor-deposited in the second opening in one embodiment of this application;

[0089] Figure 16 This is a partial cross-sectional schematic diagram of the display panel in another embodiment of this application;

[0090] Figure 17 This is a partial cross-sectional schematic diagram of the display panel in another embodiment of this application;

[0091] Figure 18 This is a partial cross-sectional schematic diagram of the display panel in yet another embodiment of this application.

[0092] Explanation of reference numerals in the attached figures:

[0093] 100 - Substrate, 200 - Isolation structure, 210 - First isolation layer, 220 - Second isolation layer, 230 - Third isolation layer, 240 - First insulating layer, 250 - Second insulating layer, 300 - Light-emitting device, 310 - Light-emitting functional layer, 3101 - Light-emitting functional material layer, 320 - First electrode, 3201 - First electrode material layer, 330 - Second electrode, 400 - Pixel definition layer, 500 - First encapsulation layer, 5001 - First encapsulation material layer, 610 - First evaporation source, 620 - Second evaporation source, 700 - Patterned photoresist, S1 - First side, S2 - Second side, D1 - First direction, D2 - Second direction, 10 - Isolation opening, 11 - First opening, 12 - Second opening, 13 - Third opening. Detailed Implementation

[0094] To facilitate understanding of this application, a more complete description will be provided below with reference to the accompanying drawings. Preferred embodiments of this application are shown in the drawings. However, this application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of this application.

[0095] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0096] It should be noted that when a component is said to be "fixed to" another component, it can be directly attached to the other component or there may be an intervening component. When a component is said to be "connected to" another component, it can be directly connected to the other component or there may be an intervening component. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0097] In the accompanying drawings, the dimensions of layers and regions may be exaggerated for clarity. It is understood that when a layer or element is referred to as "on" another layer or substrate, the layer or element may be directly on said other layer or substrate, or there may be intermediate layers. Furthermore, it is understood that when a layer is referred to as "between" two layers, the layer may be the only layer between said two layers, or there may be one or more intermediate layers. Additionally, the same reference numerals always denote the same elements.

[0098] In the following embodiments, when a layer, region, or element is “connected,” it can be interpreted as the layer, region, or element being connected not only directly but also through other constituent elements placed therebetween. For example, when a layer, region, element, etc., is described as being connected or electrically connected, the layer, region, element, etc., can not only be directly connected or directly electrically connected, but can also be connected or electrically connected through another layer, region, element, etc., placed therebetween.

[0099] In the following text, although terms such as “first” and “second” may be used to describe various components, these components are not necessarily limited to the terms above. The terms above are only used to distinguish one component from another. It will also be understood that expressions used in the singular form include plural expressions, unless the singular form has a distinctly different meaning in the context.

[0100] When a phrase such as “at least one of…” follows a list of elements, it modifies the entire list of elements, not individual elements within that list. The term “and / or” as used herein includes any and all combinations of one or more of the associated listed items. As used in the application documents, the term “and / or” includes any and all combinations of one or more of the associated listed items. It should also be understood that terms such as “comprising / including” or “having” specify the presence of the stated feature, whole, step, operation, component, part, or combination thereof, but do not preclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts, or combinations thereof.

[0101] As mentioned in the background section, the performance of display panels formed without fine metal masks still needs optimization. The inventors' research has revealed that in certain situations (such as low brightness), the self-alignment pixelation technology without metal masks can result in poor image quality. The reason for this problem is as follows:

[0102] Please see Figure 1 In the self-alignment pixelation technique without a metal mask, it is usually necessary to first form an isolation structure 200. The isolation structure 200 surrounds an isolation opening 10. Then, the light-emitting functional layer 310 of various color light-emitting devices 300 and the first electrode 320 (such as a cathode) are formed within different isolation openings 10. The first electrode 320 overlaps with the isolation structure 200, thereby making the first electrodes 320 of each light-emitting device 300 electrically connected.

[0103] Meanwhile, the isolation structure 200 typically includes a first isolation layer 210 and a second isolation layer 220 stacked sequentially. The orthographic projection of the second isolation layer 220 onto the substrate 100 is typically within the orthographic projection of the first isolation layer 210 onto the substrate 100. That is, the first isolation layer 210 typically extends beyond the second isolation layer 220 in the direction toward the isolation opening 10.

[0104] In this case, the light-emitting functional layers 310, such as the hole injection layer and hole transport layer, may overlap with the first isolation layer 210, thus creating a leakage path: second electrode 330 (e.g., anode) → light-emitting functional layers 310 (e.g., hole injection layer and hole transport layer) → isolation structure 200. The isolation structure 200 is then connected to the first electrode 320 (e.g., cathode) of the light-emitting device 300. Therefore, please refer to... Figure 2 Once this leakage path is created, it is equivalent to generating a resistor Rs in parallel with the light-emitting device 300. Therefore, in some cases (such as at low brightness), some current will flow through this leakage path, resulting in poor image quality.

[0105] For the reasons mentioned above, this application provides a display panel, a method for manufacturing the display panel, and a display device.

[0106] In one embodiment, a display panel is provided. See also... Figure 3 The display panel includes a substrate 100, an isolation structure 200, and a light-emitting device 300.

[0107] The substrate 100 may include a substrate. The substrate may be a flexible substrate or a rigid substrate. Exemplarily, the substrate 100 may also include pixel circuits and a planarization layer located on the substrate.

[0108] The isolation structure 200 is located on one side of the substrate 100 and includes a first isolation layer 210 and a second isolation layer 220 sequentially disposed on the substrate 100. The material of the first isolation layer 210 includes a conductive material. For example, the material of the first isolation layer 210 may include molybdenum or the like. The material of the second isolation layer 220 may include a conductive material or an insulating material, and there is no limitation on this.

[0109] The isolation structure 200 is enclosed by multiple isolation openings 10.

[0110] For example, the isolation structure 200 further includes a third isolation layer 230. The third isolation layer 230 is located on the side of the second isolation layer 220 away from the first isolation layer 210. The orthographic projection of the second isolation layer 220 on the substrate 100 lies within the orthographic projection of the third isolation layer 230 on the substrate 100.

[0111] By way of example, the second isolation layer 220 may be configured such that its orthographic projection on the substrate 100 gradually decreases from the direction away from the substrate 100 to the direction closer to the substrate 100. The longitudinal section of the portion of the third isolation layer 230 between adjacent isolation openings 10 may be in the form of an inverted trapezoid or the like. In this case, the isolation structure 200 may also not include the third isolation layer 230.

[0112] The isolation opening 10 has a first side S1 and a second side S2 disposed opposite to each other in a first direction D1. The first direction D1 is parallel to the substrate 100.

[0113] Corresponding to the same isolation opening 10, the first isolation layer 210 located on the first side S1 extends beyond the second isolation layer 220 toward the isolation opening 10, that is, the first isolation layer 210 located on the first side S1 extends from the second isolation layer 220 toward the isolation opening 10.

[0114] Furthermore, corresponding to the same isolation opening 10, in the first direction D1, the distance between the edge of the first isolation layer 210 located on the second side S2 and the centroid of the isolation opening 10 is d1, and the distance between the edge of the first isolation layer 210 located on the first side S1 and the centroid of the isolation opening 10 is d2, where d1 is greater than d2. That is, corresponding to the same isolation opening 10, the first isolation layer 210 located on the second side S2 is further away from the centroid of the isolation opening 10 than the first isolation layer 210 located on the first side S1.

[0115] The light-emitting device 300 includes a light-emitting functional layer 310 and a first electrode 320 sequentially disposed on a substrate 100. The light-emitting functional layer 310 and the first electrode 320 are located within the area defined by the isolation opening 10.

[0116] The light-emitting functional layer 310 is offset towards the second side S2. At this time, corresponding to the same isolation opening 10, in the first direction D1, the centroid of the light-emitting functional layer 310 is offset from the centroid of the isolation opening 10 towards the second side S2; that is, the centroid of the light-emitting functional layer 310 is closer to the second side S2. Exemplarily, the light-emitting functional layer 310 includes at least one of a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an electron injection layer.

[0117] The first electrode 320 extends beyond the light-emitting functional layer 310 and connects to the first insulating layer 210 in the first direction D1, facing the first side S1. At this time, the first electrode 320 can overlap with the insulating structure 200 on the first side S1 of the insulating opening 10. Meanwhile, the first electrode 320 can be either not overlapped with the insulating structure 200 on the second side S2 of the insulating opening 10, or it can overlap with the insulating structure 200; there is no restriction on this.

[0118] The first electrodes 320 corresponding to different isolation openings 10 can be electrically connected through the first isolation layer 210. For example, the first electrode 320 can be a cathode. Alternatively, the first electrode 320 can also be an anode.

[0119] The first light-emitting layer and the first electrode 320 can be formed by processes such as vapor deposition. During the vapor deposition process, the vapor deposition direction can be tilted towards the positive direction of the first direction D1 and / or the negative direction of the first direction D1.

[0120] In this embodiment, unlike the traditional arrangement where the first isolation layers 210 on both sides of the isolation opening 10 are symmetrically arranged on both sides of the centroid of the isolation opening 10, the distance between the edge of the first isolation layer 210 located on the second side S2 and the centroid of the isolation opening 10 is greater than the distance between the edge of the first isolation layer 210 located on the first side S1 and the centroid of the isolation opening 10, thereby changing the structural form of the isolation structure 200. Simultaneously, the light-emitting functional layer 310 is positioned biased towards the second side S2.

[0121] Therefore, the coverage of the light-emitting functional layer 310 over the first isolation layer 210 on the first side S1 can be effectively reduced. Simultaneously, the first isolation layer 210 located on the second side S2 is further away from the centroid of the isolation opening 10 compared to the first isolation layer 210 located on the first side S1. Therefore, even though the light-emitting functional layer 310 is biased towards the second side S2, it can cover little or no of the first isolation layer 210 located on the second side S2. Thus, the total coverage of the light-emitting functional layer 310 on both sides of the isolation opening 10 in the first direction D1 can be effectively reduced, thereby reducing the risk of leakage between the light-emitting functional layer 310 and the isolation structure 200, and improving the problem of poor image quality.

[0122] Meanwhile, since the light-emitting functional layer 310 is biased towards the second side S2, the coverage of the light-emitting functional layer 310 on the first isolation layer 210 on the first side S1 is effectively reduced. Therefore, the overlap area of ​​the first electrode 320 extending beyond the light-emitting functional layer 310 onto the first isolation layer 210 can be effectively increased. Thus, it is also possible to effectively ensure that there is a sufficiently small overlap impedance between the first electrode 320 and the isolation structure 200.

[0123] In one embodiment, the first isolation layer 210 located on the second side S2 of the isolation opening 10 does not extend beyond the second isolation layer 220 toward the isolation opening 10. That is, the first isolation layer 210 located on the second side S2 does not extend from the second isolation layer 220 toward the isolation opening 10.

[0124] At this time, with the light-emitting functional layer 310 biased towards the second side S2, it is possible to better achieve that the light-emitting functional layer 310 does not cover the first isolation layer 210 or covers less of the first isolation layer 210 located on the second side S2, thereby more effectively reducing the risk of leakage between the light-emitting functional layer 310 and the first isolation layer 210.

[0125] In one embodiment, see Figure 3 The first isolation layer 210, located on the second side S2 of the isolation opening 10, is recessed into the second isolation layer 220 away from the isolation opening 10.

[0126] At this time, it can be ensured that the light-emitting functional layer 310 does not cover the first isolation layer 210 on the second side S2 separated by the opening.

[0127] For example, the first isolation layer 210 on both sides of the isolation opening 10 in the second direction D2 is recessed into the second isolation layer 220 away from the isolation opening 10. The second direction D2 is parallel to the substrate 100 and perpendicular to the first direction D1.

[0128] That is, please refer to Figure 3 as well as Figure 4In Figure (a), the first isolation layer 210 extends from the second isolation layer 220 only on one of the four sides of the isolation opening 10 (the first side S1). On the other three sides of the isolation opening 10, the first isolation layer 210 is recessed within the second isolation layer 220. This makes it easier to prevent the light-emitting functional layer 310 from overlapping with the first isolation layer 210.

[0129] For example, please refer to Figure 4 In Figures (a) and (b), the multiple isolation openings 10 may include a first opening 11 and a second opening 12. For both the first opening 11 and the second opening 12, the first isolation layer 210 may extend from the second isolation layer 220 only on one of the four sides of the isolation opening 10 (first side S1). On the other three sides of the isolation opening 10, the first isolation layer 210 is recessed within the second isolation layer 220. Furthermore, the first side S1 of the first opening 11 and the second opening 12 may be located on opposite sides.

[0130] During the vapor deposition process of forming the light-emitting functional layer 310, the vapor deposition direction can be tilted towards the positive direction of the first direction D1 and / or the negative direction of the first direction D1, but not towards the second direction D2. Therefore, the first isolation layer 210 located on both sides of the isolation opening 10 in the second direction D2 can also be recessed into the second isolation layer 220, which can be set according to actual needs.

[0131] Alternatively, please see Figure 5 In other embodiments, the first isolation layer 210 located on the second side S2 of the isolation opening 10 may also neither extend beyond the second isolation layer 220 nor be recessed within the second isolation layer 220.

[0132] In one embodiment, see Figure 3 or Figure 5 The isolation structure 200 also includes a first insulating layer 240, which is located on the sidewall of the second isolation layer 220.

[0133] At this time, even if the evaporation length towards the second side S2 of the isolation opening 10 is large during the evaporation process of forming the light-emitting functional layer 310, the light-emitting functional layer 310 will only overlap with the first insulating layer 240 and will not overlap with the second isolation layer 220. Therefore, when the material of the second isolation layer 220 is a conductive material, there will be no leakage between the light-emitting functional layer 310 and the second isolation layer 220.

[0134] For example, the first insulating layer 240 includes an oxide of the second insulating layer 220, so that the first insulating layer 240 can be formed by oxidizing the second insulating layer 220, thereby making the preparation process of the first insulating layer 240 simpler and easier.

[0135] For example, the material of the second insulating layer 220 includes aluminum, and the material of the first insulating layer 240 includes aluminum oxide.

[0136] In other embodiments, the material of the second isolation layer 220 may include an insulating material. In this case, even if the evaporation length toward the second side S2 of the isolation opening 10 is large during the evaporation process of forming the light-emitting functional layer 310, causing the light-emitting functional layer 310 to overlap with the second isolation layer 220, there will be no electrical conductivity between the two.

[0137] In one embodiment, see Figure 3 The light-emitting functional layer 310 extends beyond the first electrode 320 toward the second side S2 in the first direction D1.

[0138] At this time, the deviation of the light-emitting functional layer 310 from the second side S2 can be greater, which makes it easier for the light-emitting functional layer 310 not to cover the first isolation layer 210 on the first side S1 of the isolation opening 10, thereby reducing the risk of leakage and increasing the overlap area between the first electrode 320 and the first isolation layer 210.

[0139] In one embodiment, see Figure 6 The multiple isolation openings 10 include a first opening 11, a second opening 12 and a third opening 13.

[0140] The display panel includes multiple light-emitting devices 300 of different colors. These multiple light-emitting devices 300 include a first color device, a second color device, and a third color device. For example, the first color device, the second color device, and the third color device may be a blue light-emitting device 300, a green light-emitting device 300, and a red light-emitting device 300, respectively.

[0141] The first color device corresponds to the first opening 11. The light-emitting functional layer 310 and the first electrode 320 of the first color device are located within the area defined by the first opening 11. The second color device corresponds to the second opening 12. The light-emitting functional layer 310 and the first electrode 320 of the second color device are located within the area defined by the second opening 12. The third color device corresponds to the third opening 13. The light-emitting functional layer 310 and the first electrode 320 of the third color device are located within the area defined by the third opening 13.

[0142] Within the regions defined by the first opening 11 and the second opening 12, the first insulating layer 210 extends beyond the second insulating layer 220 in opposite directions. Correspondingly, the first side S1 of the first opening 11 and the first side S1 and the second side S2 of the second opening 12 are also located in different directions. Within the regions defined by the first opening 11 and the second opening 12, the light-emitting functional layer 310 also extends beyond the first electrode 320 in the opposite direction to the first direction D1.

[0143] For example, the first direction D1 is the left-right direction. The first side S1 of the first opening 11 is the left side, and the second side S2 is the right side. Within the area defined by the first opening 11, the light-emitting functional layer 310 extends to the right beyond the first electrode 320, and the first insulating layer 210 extends to the right beyond the second insulating layer 220. The first side S1 of the second opening 12 is the right side, and the second side S2 is the left side. Within the area defined by the second opening 12, the light-emitting functional layer 310 extends to the left beyond the first electrode 320, and the first insulating layer 210 extends to the left beyond the second insulating layer 220.

[0144] For example, please refer to Figure 9 The isolation structure 200 includes a first isolation substructure 200a. The first isolation substructure 200a is located between the first opening 11 and the second opening 12. The first isolation layer 210 of the first isolation substructure 200a is recessed into the second isolation layer 220 at both ends in the first direction D1.

[0145] For example, please refer to Figure 10 The isolation structure 200 includes a first isolation substructure 200a, which is located between the first opening 11 and the second opening 12. The first isolation layer 210 of the first isolation substructure 200a extends beyond the second isolation layer 220 at both ends in the first direction D1.

[0146] In the process of manufacturing the display panel, the light-emitting functional layer 310 of the first color device and the first electrode 320 can be formed first in the area defined by the first opening 11, then the light-emitting functional layer 310 of the second color device and the first electrode 320 can be formed in the area defined by the second opening 12, and finally the light-emitting functional layer 310 of the third color device and the first electrode 320 can be formed in the area defined by the third opening 13.

[0147] At this time, within the regions defined by the first opening 11 and the second opening 12, the first isolation layer 210 extends beyond the second isolation layer 220 in opposite directions, and the light-emitting functional layer 310 extends beyond the first electrode 320 in the opposite direction of the first direction D1. This allows the etching damage to the structure within the region defined by the third opening 13 to occur on different sides of the third opening 13 during the fabrication process of the light-emitting functional layer 310 and the first electrode 320 of the first and second color devices, thereby effectively protecting the structure within the region defined by the third opening 13.

[0148] For example, the display panel further includes a pixel definition layer 400 located between the isolation structure 200 and the substrate 100. The pixel definition layer 400 surrounds a pixel opening. The pixel opening communicates with the isolation opening 10.

[0149] Exemplarily, the light-emitting device 300 further includes a second electrode 330. The second electrode 330 is located between the pixel definition layer 400 and the substrate 100. The second electrode 330 is exposed by a pixel opening. Exemplarily, the second electrode 330 is an anode and the first electrode 320 is a cathode. Alternatively, the second electrode 330 may be a cathode and the first electrode 320 may be an anode.

[0150] For example, please refer to Figure 6 The fabrication process of the first color device based on the first opening 11 may include:

[0151] First, a light-emitting functional material layer 3101 of a first color can be deposited biased towards the second side S2 of the first opening 11. Then, a first electrode material layer 3201 is deposited. For example, the first electrode material layer 3201 can be deposited biased towards the first side S1 of the first opening 11. Afterward, a first encapsulation material layer 5001 covering the first electrode material layer 3201 and the isolation structure 200 can be formed by chemical vapor deposition. In this process, the light-emitting functional material layer 3101, the first electrode material layer 3201, and the first encapsulation material layer 5001 are formed not only in the area defined by the first opening 11, but also in the area defined by the second opening 12 and the area defined by the third opening 13. In the areas defined by the first opening 11, the second opening 12, and the third opening 13, the light-emitting functional material layer 3101 extends beyond the first electrode material layer 3201 in the same direction and is not covered by the first electrode material layer 3201.

[0152] Then, please see Figure 7 A patterned photoresist 700 can be formed, and based on the patterned photoresist 700, a dry etching process is performed on the first encapsulation material layer 5001 to remove the first encapsulation material layer 5001 outside the first opening 11 corresponding to the first color, thereby forming a first encapsulation layer 500 covering the first color device. This removal process includes removing the first encapsulation material layer 5001 within the area defined by the second opening 12 and the area defined by the third opening 13. During this process, the portion of the light-emitting functional material layer 3101 not covered by the first electrode material layer 3201 within the area defined by the second opening 12 and the third opening 13 is easily etched through; furthermore, the pixel definition layer 400 located under the light-emitting functional material layer 3101 may also be damaged.

[0153] Subsequently, a wet etching process is used to remove the first electrode material layer 3201 and the light-emitting functional material layer 3101 outside the first opening 11 corresponding to the first color, in order to form the first electrode 320 and the light-emitting functional layer 310 of the first color device. At this time, the pixel definition layer 400 located under the light-emitting functional material layer 3101 may also be damaged in the area defined by the second opening 12 and the area defined by the third opening 13.

[0154] After fabricating the first color device based on the first opening 11, the second color device can be fabricated based on the second opening 12.

[0155] The fabrication process of the second color device is similar to that of the first color device. During the fabrication of the second color device, the pixel definition layer 400 may also be damaged by etching within the area defined by the third opening 13.

[0156] At this time, if the first isolation layer 210 extends beyond the second isolation layer 220 in the same direction as the area defined by the first opening 11 and the area defined by the second opening 12, then the vapor-deposited first and second color luminescent material layers 3101 extend beyond the first electrode material layer 3201 in the same direction as the first direction D1. Please refer to [link to relevant documentation]. Figure 8 During the etching process of the first encapsulation material layer, the first electrode material layer, and the light-emitting functional material layer of the first and second colors, the pixel definition layer 400 may be etched and damaged twice on the same side of the first direction D1 of the third opening 13, thus resulting in a greater risk or degree of damage.

[0157] In this embodiment, the first isolation layer 210 extends beyond the second isolation layer 220 in the region defined by the first opening 11 and the region defined by the second opening 12, and the light-emitting functional layer 310 extends beyond the first electrode 320 in the opposite direction to the first direction D1. During the fabrication of the display panel, in different processes of depositing the vapor deposition material layer (light-emitting functional material layer 3101 and first electrode material layer 3201) of the first color device and depositing the vapor deposition material layer (light-emitting functional material layer 3101 and first electrode material layer 3201) of the second color device, the portion of the light-emitting functional material layer 3101 exposed by the first electrode material layer 3201 in the region defined by the third opening 13 can be located on different sides of the third opening 13.

[0158] Therefore, the etching damage to the pixel definition layer 400 within the area defined by the third opening 13 occurs on different sides of the third opening 13 during the fabrication process of the light-emitting functional layer 310 of the first color device and the second color device and the first electrode 320, thereby effectively protecting the pixel definition layer 400 within the area defined by the third opening 13.

[0159] For example, please refer to Figure 3The display panel may also include a second encapsulation layer 800 and a third encapsulation layer 900. After the fabrication of the light-emitting devices 300 of all colors and the first encapsulation layer 500 is completed, a second encapsulation layer 800 covering the isolation structure 200 and the first encapsulation layer 500 is formed, and then the third encapsulation layer 900 is formed on the second encapsulation layer 800. Both the first encapsulation layer 500 and the third encapsulation layer 900 can be inorganic encapsulation layers. The second encapsulation layer 800 can be an organic encapsulation layer.

[0160] Meanwhile, in this embodiment, within the area defined by the third opening 13, the direction in which the first isolation layer 210 extends beyond the second isolation layer 220 is not limited, and correspondingly, the direction in which the light-emitting functional layer 310 extends beyond the first electrode 320 is not limited. Accordingly, the setting of the first side S1 and the second side S2 of the third opening 13 is not limited.

[0161] For example, please refer to Figure 9 or Figure 10 It can be set in the area defined by the third opening 13 and the area defined by the first opening 11, with the first isolation layer 210 extending beyond the second isolation layer 220 in the same direction.

[0162] For example, the first isolation layer 210 may extend beyond the second isolation layer 220 in the same direction as the area defined by the third opening 13 and the area defined by the second opening 12.

[0163] In other embodiments, the first insulating layer 210 may extend beyond the second insulating layer 220 in the same direction within the areas defined by the first opening 11 and the second opening 12. In this case, the leakage problem between the light-emitting functional layer 310 and the first insulating layer 210 can still be improved.

[0164] In one embodiment, see Figure 3 Corresponding to the same isolation opening 10, the light-emitting functional layer 310 is spaced apart from the first isolation layer 210 extending beyond the second isolation layer 220 in the first direction D1. Therefore, on the first side S1 of the isolation opening 10, the light-emitting functional layer 310 and the first isolation layer 210 are not in contact at all, so that on the one hand, there will be no leakage, and on the other hand, the contact area between the first electrode 320 and the first isolation layer 210 can be effectively increased.

[0165] In one embodiment, the isolation structure 200 further includes a third isolation layer 230. The third isolation layer 230 is located on the side of the second isolation layer 220 away from the first isolation layer 210. The orthographic projection of the second isolation layer 220 on the substrate 100 lies within the orthographic projection of the third isolation layer 230 on the substrate 100. The portion of the third isolation layer 230 extending beyond the second isolation layer 220 in the first direction D1 can serve as an eaves. During the evaporation of the light-emitting functional material layer 3101 and the first electrode material layer 3201 of the light-emitting device 300, the eaves can effectively isolate the light-emitting functional material layer 3101 and the first electrode material layer 3201 inside and outside the isolation opening 10.

[0166] For example, the orthographic projection of the first isolation layer 210 on the substrate 100 is located within the orthographic projection of the third isolation layer 230 on the substrate 100.

[0167] Corresponding to the same isolation opening 10, the orthographic projection of the light-emitting functional layer 310 on the substrate 100 does not overlap with the orthographic projection of the third isolation layer 230 on the first side S1 near the isolation opening 10 on the substrate 100.

[0168] At this time, when depositing the light-emitting functional material layer 3101, the rotation angle of the evaporation source and the deposition angle can be controlled so that the light-emitting functional material layer 3101 is deposited only towards the second side S2 of the corresponding isolation opening 10, and does not fall under the eaves of the first side S1 of the isolation opening 10.

[0169] In this embodiment, the light-emitting functional layer 310 corresponding to the same isolation opening 10 can be effectively positioned at a distance from the first isolation layer 210 that extends beyond the second isolation layer 220 in the first direction D1.

[0170] In one embodiment, corresponding to the same isolation opening 10, in the first direction D1, the first electrode 320 is biased toward the first side S1, and the centroid of the first electrode 320 is offset from the centroid of the isolation opening 10 toward the first side S1, that is, the centroid of the first electrode 320 is closer to the first side S1, thereby effectively increasing the overlap area between the first electrode 320 and the first isolation layer 210 on the first side S1 of the isolation opening 10.

[0171] In one embodiment, the isolation structure 200 further includes a third isolation layer 230. The third isolation layer 230 is located on the side of the second isolation layer 220 away from the first isolation layer 210. The orthographic projection of the second isolation layer 220 on the substrate 100 lies within the orthographic projection of the third isolation layer 230 on the substrate 100.

[0172] For example, the orthographic projection of the first isolation layer 210 on the substrate 100 is located within the orthographic projection of the third isolation layer 230 on the substrate 100.

[0173] The orthographic projection of the first electrode 320 on the substrate 100 does not overlap with the orthographic projection of the third isolation layer 230 on the substrate 100 near the second side S2 of the isolation opening 10.

[0174] At this time, when the first electrode material layer 3201 is deposited by vapor deposition, the rotation angle of the evaporation source and the deposition angle can be controlled so that the first electrode material layer 3201 is deposited only towards the first side S1 of the corresponding isolation opening 10, and does not fall under the eaves of the second side S2 of the isolation opening 10.

[0175] In this embodiment, the first electrode 320 can be effectively positioned biased toward the first side S1, which can effectively increase the overlap area between the first electrode 320 and the first isolation layer 210.

[0176] Of course, in some embodiments, the first electrode 320 may not be biased towards the first side S1. Corresponding to the same isolation opening 10, in the first direction D1, the centroid of the first electrode 320 may also be located at the centroid of the isolation opening 10. In this case, when depositing the first electrode material layer 3201, it can be deposited symmetrically towards the second side S2 and the first side S1 of the isolation opening 10.

[0177] In one embodiment, see Figure 11 The invention also provides a method for manufacturing a display panel, comprising:

[0178] Step S10: Provide substrate 100;

[0179] Step S20: A first isolation layer 210 having a first mesh is formed on the substrate 100;

[0180] Step S30: A second isolation layer 220 with a second mesh is formed on the first isolation layer 210 to form an isolation structure 200. The isolation structure 200 includes the second isolation layer 220 and the first isolation layer 210. The material of the first isolation layer 210 includes a conductive material. The isolation structure 200 surrounds a plurality of isolation openings 10. The isolation openings 10 have a first side S1 and a second side S2 that are disposed opposite to each other in a first direction D1. For the same isolation opening 10, the first isolation layer 210 located on the first side S1 extends beyond the second isolation layer 220 toward the isolation opening 10. In the first direction D1, the distance between the edge of the first isolation layer 210 located on the second side S2 and the centroid of the isolation opening 10 is d1, and the distance between the edge of the first isolation layer 210 located on the first side S1 and the centroid of the isolation opening 10 is d2. d1 is greater than d2. The first direction D1 is parallel to the substrate 100.

[0181] In step S50, a light-emitting functional material layer 3101 of the target color is deposited on the first target side of the isolation opening 10 in the first direction D1, so that the centroid of the light-emitting functional material layer 3101 in each isolation opening 10 is offset from the centroid of the isolation opening 10 towards the first target side; for the isolation opening 10 corresponding to the target color, the first target side is the second side S2 of the isolation opening 10.

[0182] Step S60: Deposit the first electrode material layer 3201 on the light-emitting functional material layer 3101 by vapor deposition;

[0183] In step S70, the first electrode material layer 3201 and the light-emitting functional material layer 3101 of the target color are patterned to form the first electrode 320 and the light-emitting functional layer 310 in the isolation opening 10 corresponding to the target color, so as to form the light-emitting device 300 of the target color; corresponding to the same isolation opening 10, in the first direction D1, the light-emitting functional layer 310 is biased towards the second side S2, and the centroid of the light-emitting functional layer 310 is offset from the centroid of the isolation opening 10 towards the second side S2. The first electrode 320 extends beyond the light-emitting functional layer 310 towards the first side S1 in the first direction D1 and connects to the first isolation layer 210.

[0184] In step S10, the substrate 100 may include a substrate. The substrate may be a flexible substrate or a rigid substrate. Exemplarily, the substrate 100 may also include pixel circuits and a planarization layer located on the substrate.

[0185] In step S20, a first isolation material layer can first be formed by a deposition process or the like. Then, the first isolation material layer is patterned to form the first isolation layer 210.

[0186] In step S30, a second isolation material layer can first be formed by a deposition process or the like. Then, the second isolation material layer is patterned to form the second isolation layer 220.

[0187] By stepwise deposition and patterning of the first and second isolation material layers, the first isolation layer 210 and the second isolation layer 220 are formed in steps, so that the second isolation layer 220 and the first isolation layer 210 at different positions of the same isolation opening 10 have different positional relationships, thereby achieving "in the first direction D1, the distance between the edge of the first isolation layer 210 located on the second side S2 and the centroid of the isolation opening 10 is greater than the distance between the edge of the first isolation layer 210 located on the first side S1 and the centroid of the isolation opening 10".

[0188] For example, the first isolation layer 210 located on the second side S2 of the isolation opening 10 does not extend beyond the second isolation layer 220 toward the isolation opening 10.

[0189] For example, the first isolation layer 210 located on the second side S2 of the isolation opening 10 is recessed into the second isolation layer 220 away from the isolation opening 10.

[0190] Of course, the first isolation layer 210 located on the second side S2 of the isolation opening 10 can also extend beyond the second isolation layer 220 toward the isolation opening 10, but the extension length is small.

[0191] In step S50, the target color is the color currently being processed.

[0192] Please see Figure 6 When depositing the luminescent functional material layer 3101 of the target color, the normal of the deposition source can be made more biased towards the first target side in the first direction D1. This causes the luminescent functional material layer 3101 within the isolation opening 10 corresponding to the target color to be biased towards the second side S2, meaning the centroid of the luminescent functional material layer 3101 within the isolation opening 10 corresponding to the target color is offset from the centroid of the isolation opening 10 towards the second side S2. Furthermore, the deposition is performed across the entire surface. Therefore, within the area defined by each isolation opening 10, the centroid of the luminescent functional material layer 3101 is more biased towards the first target side.

[0193] For example, the target color is a first color. The first direction D1 is the left-right direction. The first target side is the right side. Then, within the area defined by each isolation opening 10, the centroid of the light-emitting functional material layer 3101 is more biased towards the right side of the isolation opening 10.

[0194] In step S60, the first electrode material layer 3201 can be vapor-deposited over the entire surface.

[0195] For example, after the first electrode material layer 3201 is deposited by vapor deposition, a first encapsulation material layer 5001 can be deposited over the entire surface by chemical vapor deposition. The material of the first encapsulation material layer 5001 may include inorganic materials.

[0196] In step S70, a patterned photoresist 700 can first be formed using a photolithography process. Then, based on a wet etching process, the first electrode material layer 3201 and the light-emitting functional material layer 3101 outside the isolation opening 10 corresponding to the target color are removed. The first electrode material layer 3201 remaining within the isolation opening 10 corresponding to the target color forms the first electrode 320. The light-emitting functional material layer 3101 remaining within the isolation opening 10 corresponding to the target color forms the light-emitting functional layer 310, therefore the light-emitting functional layer 310 is biased towards the second side S2 of the isolation opening 10.

[0197] For example, please refer to Figure 7When the first electrode material layer 3201 is deposited and the first encapsulation material layer 5001 is also deposited, after the patterned photoresist 700 is formed and before the first electrode material layer 3201 and the light-emitting functional material layer 3101 of the target color are etched, the first encapsulation material layer 5001 can be dry etched to remove the first encapsulation material layer 5001 located outside the isolation port corresponding to the target color, thereby forming the first encapsulation layer 500 of the target color.

[0198] For example, the patterned photoresist 700 can cover a portion of the upper surface of the isolation structure 200 near the isolation opening 10, so that when the first encapsulation material layer 5001 located outside the isolation opening corresponding to the target color is removed, the first encapsulation material layer 5001 located outside the isolation opening corresponding to the target color is partially removed, thereby allowing the first encapsulation layer 500 to cover a portion of the upper surface of the isolation structure 200 near the isolation opening 10.

[0199] In this embodiment, by distributing and patterning the first and second isolation material layers, the second isolation layer 220 and the first isolation layer 210 at different locations within the same isolation opening 10 can have different positional relationships. For example, the second isolation layer 220 and the first isolation layer 210 can also have different positional relationships within different isolation openings 10.

[0200] In this embodiment, the first isolation layer 210 and the second isolation layer 220 are formed in steps, so that the second isolation layer 220 and the first isolation layer 210 at different positions of the same isolation opening 10 have different positional relationships, thereby realizing that "in the first direction D1, the distance between the edge of the first isolation layer 210 located on the second side S2 and the centroid of the isolation opening 10 is greater than the distance between the edge of the first isolation layer 210 located on the first side S1 and the centroid of the isolation opening 10".

[0201] At the same time, by depositing the light-emitting functional material layer 3101 of the target color on the second side S2 of the isolation opening 10 corresponding to the target color, the light-emitting functional layer 310 is set to be biased towards the second side S2.

[0202] Therefore, the coverage of the light-emitting functional layer 310 over the first isolation layer 210 on the first side S1 can be effectively reduced. Simultaneously, the first isolation layer 210 located on the second side S2 is further away from the centroid of the isolation opening 10 compared to the first isolation layer 210 located on the first side S1. Therefore, even though the light-emitting functional layer 310 is biased towards the second side S2, it can cover little or no of the first isolation layer 210 located on the second side S2. Thus, the total coverage of the light-emitting functional layer 310 on both sides of the isolation opening 10 in the first direction D1 can be effectively reduced, thereby reducing the risk of leakage between the light-emitting functional layer 310 and the isolation structure 200, and improving the problem of poor image quality.

[0203] Meanwhile, since the light-emitting functional layer 310 is biased towards the second side S2, the coverage of the light-emitting functional layer 310 on the first isolation layer 210 on the first side S1 is effectively reduced. Therefore, the overlap area of ​​the first electrode 320 extending beyond the light-emitting functional layer 310 onto the first isolation layer 210 can be effectively increased. Thus, it is also possible to effectively ensure that there is a sufficiently small overlap impedance between the first electrode 320 and the isolation structure 200.

[0204] In one embodiment, prior to step S50, the method further includes:

[0205] In step S40, a first insulating layer 240 is formed on the sidewall of the second insulating layer 220.

[0206] For example, step S40 may include:

[0207] Step S41: Oxidize the sidewall of the second isolation layer 220.

[0208] For example, the oxidation treatment method includes oxygen plasma treatment.

[0209] Of course, the formation of the first insulating layer 240 is not limited to this. For example, the first insulating layer 240 can be formed by first depositing a first insulating material layer and then etching the first insulating material layer to remove the first insulating material layer outside the sidewall of the second insulating layer 220.

[0210] In step S50, when depositing the light-emitting functional material layer 3101 of the target color towards the second side S2 of the isolation opening 10 corresponding to the target color, it is easy for the deposition length of the light-emitting functional layer 310 towards the second side S2 of the isolation opening 10 to be large, which makes it easy for the light-emitting functional layer 310 to overlap with the sidewall of the second isolation layer 220.

[0211] In this embodiment, by forming a first insulating layer 240 on the sidewall of the second insulating layer 220, even if the evaporation length of the light-emitting functional material layer 3101 towards the second side S2 of the isolation opening 10 is large, the light-emitting functional layer 310 will only overlap with the first insulating layer 240 and not with the second insulating layer 220. Therefore, when the material of the second insulating layer 220 is a conductive material, there will be no leakage between the light-emitting functional layer 310 and the second insulating layer 220.

[0212] Of course, in other embodiments, the material of the second isolation layer 220 may include insulating material.

[0213] In one embodiment, step S60 includes:

[0214] In step S60a, a first electrode material layer 3201 is deposited on the second target side of the isolation opening 10 in the first direction D1, such that the centroid of the first electrode material layer 3201 in each isolation opening 10 is offset from the centroid of the isolation opening 10 towards the second target side; the second target side is set opposite to the first target side, and for the isolation opening 10 corresponding to the target color, the second target side is the first side S1 of the isolation opening.

[0215] When depositing the first electrode material layer 3201, the normal of the deposition source can be made more biased towards the second target side in the first direction D1. This causes the first electrode material layer 3201 within the isolation opening 10 corresponding to the target color to be biased towards the first side S1, meaning the centroid of the first electrode material layer 3201 within the isolation opening 10 corresponding to the target color is offset from the centroid of the isolation opening 10 towards the first side S1. Furthermore, the deposition is performed across the entire surface. Therefore, within the area defined by each isolation opening 10, the centroid of the first electrode material layer 3201 is more biased towards the second target side.

[0216] For example, the target color is a first color. The first direction is left-right. The second target side is the left side. Then, within the area defined by each isolation opening 10, the centroid of the first electrode material layer 3201 is more biased towards the left side of the isolation opening 10.

[0217] In this embodiment, the first electrode material layer 3201 is deposited on the first side S1 of the isolation opening 10 corresponding to the target color, so that the first electrode 320 is set on the first side S1, thereby better overlapping with the first isolation layer 210.

[0218] In one embodiment, see Figure 12 Step S50 includes:

[0219] Step S51: Rotate the first vapor deposition source 610 of the target color toward the first target side so that the first vapor deposition source 610 is tilted toward the first target side;

[0220] Step S52: Adjust the evaporation angle of the first evaporation source 610 of the target color so that the first evaporation source 610 is evaporating the luminescent functional material layer 3101 toward the first target side.

[0221] In step S51, the first vapor deposition source 610 is in its default state with its normal pointing vertically downwards. After rotating the first vapor deposition source 610 in a first clockwise direction (counterclockwise or clockwise), the normal of the first vapor deposition source 610 can be tilted towards the first target side. For example, the rotation angle of the first vapor deposition source 610 can be between 5° and 10° (e.g., 8°).

[0222] In step S52, the deposition angle of the first deposition source 610 can be the angle α between the deposition direction on both sides of the edge of the deposition range of the first deposition source 610 and the normal of the first deposition source 610. The deposition angle can be adjusted by adjusting an angle limiting plate or the like. For example, the deposition angle of the first deposition source 610 can be between 15° and 25° (e.g., 20°).

[0223] By adjusting the deposition angle of the first deposition source 610, the deposition directions on both sides of the edge of the deposition range of the first deposition source 610 can be biased towards the second side S2 of the isolation opening 10, thereby allowing the first deposition source 610 to deposit the light-emitting functional material layer 3101 only towards the first target side. It can be understood that when depositing the light-emitting functional material layer 3101, the first deposition source 610 can move along the first direction D1.

[0224] At this time, the eaves of the first side S1 of the isolation opening 10 corresponding to the target color can completely block the light-emitting functional material layer 3101. That is, the light-emitting functional material layer 3101 will not fall under the eaves of the first side S1, and thus will not overlap with the first isolation layer 210 on the first side S1. Therefore, after etching the light-emitting functional material layer 3101, the formed light-emitting functional layer 310 will not overlap with the first isolation layer 210 on the first side S1, thus preventing leakage.

[0225] Please see Figure 13 Step S60a includes:

[0226] Step S61: Rotate the second vapor deposition source 620 toward the second target side so that the second vapor deposition source 620 is tilted toward the second target side;

[0227] Step S62: Adjust the evaporation angle of the second evaporation source 620 so that the second evaporation source 620 evaporates the first electrode material layer 3201 toward the second target side.

[0228] In step S61, the second vapor deposition source 620 is in its default state with its normal pointing vertically downwards. After rotating the second vapor deposition source 620 in a second clockwise direction (clockwise or counterclockwise), the normal of the second vapor deposition source 620 can be tilted towards the second target side. For example, the rotation angle of the second vapor deposition source 620 can be between 5° and 10° (e.g., 8°).

[0229] In step S62, the deposition angle of the second deposition source 620 can be the angle b between the deposition direction on both sides of the edge of the deposition range of the second deposition source 620 and the normal of the second deposition source 620. The deposition angle can be adjusted by adjusting an angle limiting plate or the like. For example, the deposition angle of the second deposition source 620 can be between 15° and 25° (e.g., 20°).

[0230] By adjusting the deposition angle of the second deposition source 620, the deposition directions on both sides of the edge of the deposition range of the second deposition source 620 can be biased towards the first side S1 of the isolation opening 10, thereby allowing the second deposition source 620 to deposit the first electrode material layer 3201 only towards the second target side. It can be understood that during the deposition of the first electrode material layer 3201, the second deposition source 620 can move along the first direction D1.

[0231] At this time, the eaves of the second side S2 of the isolation opening 10 corresponding to the target color can completely cover the first electrode material layer 3201. That is, the first electrode material layer 3201 will not fall under the eaves of the second side S2. Therefore, after etching the first electrode material layer 3201, the formed first electrode 320 can overlap more with the isolation structure 200 on the first side S1, thereby reducing the overlap resistance.

[0232] In one embodiment, the plurality of isolation openings 10 include a first opening 11, a second opening 12, and a third opening 13. The display panel includes multiple light-emitting devices 300 of different colors. The multiple light-emitting devices 300 of different colors include a first color device, a second color device, and a third color device. The first color device corresponds to the first opening 11, the second color device corresponds to the second opening 12, and the third color device corresponds to the third opening 13.

[0233] Within the area defined by the first opening 11 and the area defined by the second opening 12, the first isolation layer 210 extends beyond the second isolation layer 220 in opposite directions.

[0234] The light-emitting functional layer 310 and the first electrode 320 of the first color device can be formed first in the area defined by the first opening 11, then the light-emitting functional layer 310 and the first electrode 320 of the second color device can be formed in the area defined by the second opening 12, and finally the light-emitting functional layer 310 and the first electrode 320 of the third color device can be formed in the area defined by the third opening 13.

[0235] For example, please refer to Figures 12 to 14 The first direction D1 is the left-right direction. The first side S1 of the first opening 11 is located on the left, and the second side S2 is located on the right. The first side S1 of the second opening 12 is located on the right, and the second side S2 is located on the left. Within the area defined by the first opening 11, the first isolation layer 210 extends beyond the second isolation layer 220 to the right. Within the area defined by the second opening 12, the first isolation layer 210 extends beyond the second isolation layer 220 to the left.

[0236] When forming the light-emitting functional layer 310 of the first color device and the first electrode 320 within the area defined by the first opening 11, it may include:

[0237] Please see Figure 12 The first vapor deposition source 610 of the first color is rotated counterclockwise so that the first vapor deposition source 610 of the first color is tilted to the right. The vapor deposition angle of the first vapor deposition source 610 of the first color is adjusted so that the first vapor deposition source 610 of the first color vapor deposition only vapor deposits the light-emitting functional material layer 3101 to the right.

[0238] Please see Figure 13 The second vapor deposition source 620 is rotated clockwise so that it tilts to the left and the vapor deposition angle of the second vapor deposition source 620 is adjusted so that the second vapor deposition source 620 only vapor deposits the first electrode material layer 3201 to the left.

[0239] The first electrode material layer 3201 and the light-emitting functional material layer 3101 are etched, and the first electrode 320 and the light-emitting functional layer 310 are formed in the first opening 11.

[0240] When forming the light-emitting functional layer 310 of the second color device and the first electrode 320 within the area defined by the second opening 12, it may include:

[0241] Please see Figure 14 The first vapor deposition source 610 of the second color is rotated clockwise so that the first vapor deposition source 610 of the second color is tilted to the left. The vapor deposition angle of the first vapor deposition source 610 of the second color is adjusted so that the second vapor deposition source 620 of the second color vapor deposition only vapor deposits the light-emitting functional material layer 3101 to the left.

[0242] Please see Figure 15 The second vapor deposition source 620 is rotated counterclockwise so that the second vapor deposition source 620 tilts to the right and the vapor deposition angle of the second vapor deposition source 620 is adjusted so that the second vapor deposition source 620 only vapor deposits the first electrode material layer 3201 to the right.

[0243] The first electrode material layer 3201 and the light-emitting functional material layer 3101 are etched, and the first electrode 320 and the light-emitting functional layer 310 are formed in the second opening 12.

[0244] It should be understood that although the steps in the flowcharts of the accompanying drawings are shown sequentially as indicated by the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some of the steps in the accompanying drawings may include multiple steps or stages, which are not necessarily completed at the same time, but may be executed at different times, and the execution order of these steps or stages is not necessarily sequential, but may be performed alternately or in turn with other steps or at least some of the steps or stages of other steps.

[0245] In one embodiment, a display panel is also provided, including a substrate 100, an isolation structure 200, and a light-emitting device 300.

[0246] The substrate 100 may include a substrate. The substrate may be a flexible substrate or a rigid substrate. Exemplarily, the substrate 100 may also include pixel circuits and a planarization layer located on the substrate.

[0247] An isolation structure 200 is located on one side of the substrate 100 and forms a plurality of isolation openings 10. Each isolation opening 10 has a first side S1 and a second side S2 disposed opposite to each other in a first direction D1. The isolation structure 200 includes a second insulating layer 250. The second insulating layer 250 is located on the second side S2 of the isolation opening 10.

[0248] The isolation structure 200 may include a first isolation layer 210 and a second isolation layer 220 sequentially disposed on the substrate 100.

[0249] For example, please refer to Figure 3 A first insulating layer 210 located on the first side S1 extends beyond the second insulating layer 220 towards the insulating opening 10. Furthermore, in the first direction D1, the distance between the edge of the first insulating layer 210 located on the second side S2 and the centroid of the insulating opening 10 is greater than the distance between the edge of the first insulating layer 210 located on the first side S1 and the centroid of the insulating opening 10. The first direction D1 is parallel to the substrate 100. In this case, the second insulating layer 250 can be located on the sidewall of the second insulating layer 220.

[0250] For example, the first isolation layer 210 located on the second side S2 of the isolation opening 10 does not extend beyond the second isolation layer 220 toward the isolation opening 10.

[0251] For example, the first isolation layer 210 located on the second side S2 of the isolation opening 10 is recessed into the second isolation layer 220 away from the isolation opening 10.

[0252] As another example, please refer to Figures 16 to 18 Alternatively, the orthographic projection of the second isolation layer 220 on the substrate 100 can be positioned within the orthographic projection of the first isolation layer 210 on the substrate 100. The relationship between the distance between the edge of the first isolation layer 210 on the second side S2 and the centroid of the isolation opening 10, and the distance between the edge of the first isolation layer 210 on the first side S1 and the centroid of the isolation opening 10, is not limited. In this case, please refer to... Figure 16 The second insulating layer 250 may be located on the sidewall of the first insulating layer 210 on the second side S2. Alternatively, please refer to... Figure 17 The second insulating layer 250 may be located on the sidewall of the first insulating layer 210 on the second side S2 and extend beyond the upper surface of the first insulating layer 210. The material of the first insulating layer 210 may be, for example, a material that is easily oxidized. Alternatively, please refer to... Figure 18 The second insulating layer 250 includes a first sub-layer and a second sub-layer. The first sub-layer is located on the sidewall of the first insulating layer 210 on the second side S2 and extends beyond the upper surface of the first insulating layer 210. The second sub-layer is located on the sidewall of the second insulating layer 220 on the second side S2.

[0253] For example, the second insulating layer 250 includes an oxide layer, such as the oxide of the first insulating layer 210 and / or the oxide of the second insulating layer 220.

[0254] The light-emitting device 300 includes a light-emitting functional layer 310 and a first electrode 320 sequentially disposed on a substrate 100. The light-emitting functional layer 310 and the first electrode 320 are located within the area defined by the isolation opening 10. The light-emitting functional layer 310 is disposed biased towards the second side S2 and is connected to the second insulating layer 250. The first electrode 320 extends beyond the light-emitting functional layer 310 in the first direction D1 towards the first side S1 and is connected to the isolation structure 200.

[0255] In this embodiment, the light-emitting functional layer 310 is positioned biased towards the second side S2. Therefore, the coverage of the light-emitting functional layer 310 over the first isolation layer 210 on the first side S1 can be effectively reduced. Simultaneously, the isolation structure 200 includes a second insulating layer 250 located on the second side S2 of the isolation opening 10. The light-emitting functional layer 310 is connected to the second insulating layer 250 on the second side S2. Therefore, even though the light-emitting functional layer 310 is biased towards the second side S2, it will not conduct electricity with the isolation structure 200, thus preventing leakage. Therefore, this embodiment can effectively reduce the risk of leakage between the light-emitting functional layer 310 and the isolation structure 200, thereby improving the problem of poor image quality.

[0256] Meanwhile, since the light-emitting functional layer 310 is biased towards the second side S2, the coverage of the light-emitting functional layer 310 on the first isolation layer 210 on the first side S1 is effectively reduced. Therefore, the overlap area of ​​the first electrode 320 extending beyond the light-emitting functional layer 310 onto the first isolation layer 210 can be effectively increased. Thus, it is also possible to effectively ensure that there is a sufficiently small overlap impedance between the first electrode 320 and the isolation structure 200.

[0257] In one embodiment, corresponding to the same isolation opening 10, in the first direction D1, the first electrode 320 is biased toward the first side S1, and the centroid of the first electrode 320 is offset from the centroid of the isolation opening 10 toward the first side S1, that is, the centroid of the first electrode 320 is closer to the first side S1, thereby effectively increasing the overlap area between the first electrode 320 and the first isolation layer 210 on the first side S1 of the isolation opening 10.

[0258] In one embodiment, a display panel is also provided, including a substrate 100, an isolation structure 200, and a light-emitting device 300.

[0259] The isolation structure 200 is located on one side of the substrate 100 and includes a first isolation layer 210 and a second isolation layer 220 sequentially disposed on the substrate. The material of the first isolation layer 210 includes a conductive material. The isolation structure 200 forms a plurality of isolation openings 10, which are separated by having a first side S1 and a second side S2 disposed opposite to each other in a first direction.

[0260] Corresponding to the same isolation opening 10, the first isolation layer 210 located on the first side S1 extends beyond the second isolation layer 220 towards the isolation opening 10, while the specific arrangement of the first isolation layer 210 located on the second side S1 is not limited.

[0261] The light-emitting device 300 includes a light-emitting functional layer 310 and a first electrode 320 sequentially disposed on a substrate. The light-emitting functional layer 310 and the first electrode 320 are located within the area defined by the isolation opening 10.

[0262] For the same isolation opening, the light-emitting functional layer 310 is spaced apart from the first isolation layer 310 located on the first side S1, and the first isolation layer 210 located on the second side S2 is also spaced apart. That is, for the same isolation opening 10, the light-emitting functional layer 310 does not overlap with the first isolation layer 210 on both the first side S1 and the second side S2, thereby effectively preventing leakage between the light-emitting functional layer 310 and the first isolation layer 210, and thus effectively improving the problem of poor image quality.

[0263] It is understood that in this embodiment, there is no requirement for the centroid of the light-emitting functional layer 310 to deviate from the centroid of the isolation opening 10. Furthermore, the relationship between the distance between the edge of the first isolation layer 210 on the second side S2 and the centroid of the isolation opening 10 corresponding to the same isolation opening 10, and the distance between the edge of the first isolation layer 210 on the first side S1 and the centroid of the isolation opening 10, is also not limited.

[0264] Based on the same inventive concept, this application also provides a display device (not shown), which includes the display panel in the above embodiments.

[0265] It is understood that the display device in the embodiments of this application can be any product or component with display function, such as OLED display device, QLED display device, electronic paper, mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, navigator, wearable device, Internet of Things device, etc., and the embodiments disclosed in this application do not limit this.

[0266] In the description of this specification, references to terms such as "some embodiments," "other embodiments," and "ideal embodiments" indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, the illustrative descriptions of the above terms do not necessarily refer to the same embodiments or examples.

[0267] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0268] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A display panel, characterized in that, include: substrate; An isolation structure, located on one side of the substrate, includes a first isolation layer and a second isolation layer sequentially disposed on the substrate. The material of the first isolation layer includes a conductive material. The isolation structure is configured to form a plurality of isolation openings, and the isolation openings have a first side and a second side disposed opposite to each other in a first direction. Corresponding to the same isolation opening, the first isolation layer located on the first side extends beyond the second isolation layer towards the isolation opening, and in the first direction, the distance between the edge of the first isolation layer located on the second side and the centroid of the isolation opening is d1, and the distance between the edge of the first isolation layer located on the first side and the centroid of the isolation opening is d2, where d1 is greater than d2, and the first direction is parallel to the substrate. A light-emitting device includes a light-emitting functional layer and a first electrode sequentially disposed on the substrate, wherein the light-emitting functional layer and the first electrode are located within the area defined by the isolation opening; corresponding to the same isolation opening, in the first direction, the light-emitting functional layer is disposed biased towards the second side, the centroid of the light-emitting functional layer is offset from the centroid of the isolation opening towards the second side, and the first electrode extends beyond the light-emitting functional layer in the first direction towards the first side and is connected to the first isolation layer.

2. The display panel according to claim 1, characterized in that, The first isolation layer located on the second side of the isolation opening does not extend beyond the second isolation layer towards the isolation opening.

3. The display panel according to claim 2, characterized in that, The first isolation layer located on the second side of the isolation opening is recessed into the second isolation layer away from the isolation opening; Optionally, the first isolation layers located on both sides of the isolation opening in the second direction are recessed into the second isolation layer away from the isolation opening, the second direction being parallel to the substrate and perpendicular to the first direction.

4. The display panel according to claim 2 or 3, characterized in that, The isolation structure further includes a first insulating layer, which is located on the sidewall of the second isolation layer; Optionally, the first insulating layer includes an oxide of the second insulating layer; Optionally, the material of the second insulating layer includes aluminum, and the material of the first insulating layer includes aluminum oxide; Optionally, the material of the first insulating layer includes molybdenum.

5. The display panel according to claim 3, characterized in that, The material of the second insulating layer includes insulating material.

6. The display panel according to claim 1, characterized in that, The light-emitting functional layer extends beyond the first electrode toward the second side in the first direction.

7. The display panel according to claim 6, characterized in that, The plurality of isolation openings include a first opening, a second opening, and a third opening. The display panel includes a plurality of light-emitting devices of different colors, including a first color device, a second color device, and a third color device. The first color device corresponds to the first opening, the second color device corresponds to the second opening, and the third color device corresponds to the third opening. Within the area defined by the first opening and the area defined by the second opening, the first isolation layer extends beyond the second isolation layer in opposite directions; Optionally, the display panel further includes a pixel definition layer located between the isolation structure and the substrate, the pixel definition layer forming a pixel opening, and the pixel opening communicating with the isolation opening; Optionally, the light-emitting device further includes a second electrode located between the pixel definition layer and the substrate, with the pixel opening exposing the second electrode.

8. The display panel according to claim 7, characterized in that, Within the area defined by the third opening and the area defined by the first opening, the first isolation layer extends beyond the second isolation layer in the same direction.

9. The display panel according to claim 7, characterized in that, Within the area defined by the third opening and the area defined by the second opening, the first isolation layer extends beyond the second isolation layer in the same direction.

10. The display panel according to claim 7, characterized in that, The isolation structure includes a first isolation substructure, which is located between the first opening and the second opening. The first isolation layer of the first isolation substructure is recessed into the second isolation layer at both ends in the first direction.

11. The display panel according to claim 7, characterized in that, The isolation structure includes a first isolation substructure located between the first opening and the second opening, wherein the first isolation layer of the first isolation substructure extends beyond the second isolation layer at both ends in the first direction.

12. The display panel according to claim 1 or 6, characterized in that, Corresponding to the same isolation opening, the light-emitting functional layer is spaced apart from the first isolation layer that extends beyond the second isolation layer in the first direction.

13. The display panel according to claim 12, characterized in that, The isolation structure further includes a third isolation layer, which is located on the side of the second isolation layer away from the first isolation layer, and the orthographic projection of the second isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate. For the same isolation opening, the orthographic projection of the light-emitting functional layer on the substrate does not overlap with the orthographic projection of the third isolation layer on the substrate near the first side of the isolation opening; Optionally, the orthographic projection of the first isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate.

14. The display panel according to claim 1, characterized in that, Corresponding to the same isolation opening, in the first direction, the first electrode is disposed biased towards the first side, and the centroid of the first electrode is offset from the centroid of the isolation opening towards the first side.

15. The display panel according to claim 14, characterized in that, The isolation structure further includes a third isolation layer, which is located on the side of the second isolation layer away from the first isolation layer, and the orthographic projection of the second isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate. The orthographic projection of the first electrode on the substrate does not overlap with the orthographic projection of the third isolation layer on the substrate near the second side of the isolation opening; Optionally, the orthographic projection of the first isolation layer on the substrate lies within the orthographic projection of the third isolation layer on the substrate.

16. A display panel, characterized in that, include: substrate; An isolation structure is located on one side of the substrate and surrounds a plurality of isolation openings. The isolation openings have a first side and a second side disposed opposite to each other in a first direction. The isolation structure includes a second insulating layer, which is located on the second side of the isolation opening. A light-emitting device includes a light-emitting functional layer and a first electrode sequentially disposed on the substrate. The light-emitting functional layer and the first electrode are located within the area defined by the isolation opening. The light-emitting functional layer is disposed biased towards the second side and connected to the second insulating layer. The first electrode extends beyond the light-emitting functional layer toward the first side in the first direction and is connected to the isolation structure.

17. The display panel according to claim 16, characterized in that, Corresponding to the same isolation opening, in the first direction, the first electrode is disposed biased towards the first side, and the centroid of the first electrode is offset from the centroid of the isolation opening towards the first side.

18. The display panel according to claim 16, characterized in that, The second insulating layer includes an oxide layer.

19. A display panel, characterized in that, include: substrate; An isolation structure, located on one side of the substrate, includes a first isolation layer and a second isolation layer sequentially disposed on the substrate. The material of the first isolation layer includes a conductive material. The isolation structure surrounds a plurality of isolation openings. The isolation openings have a first side and a second side disposed opposite to each other in a first direction. Corresponding to the same isolation opening, the first isolation layer located on the first side extends beyond the second isolation layer toward the isolation opening. A light-emitting device includes a light-emitting functional layer and a first electrode sequentially disposed on the substrate, wherein the light-emitting functional layer and the first electrode are located within the area defined by the isolation opening; corresponding to the same isolation opening, the light-emitting functional layer is spaced apart from the first isolation layer located on the first side and spaced apart from the first isolation layer located on the second side.

20. A method for manufacturing a display panel, characterized in that, The method includes: Provide substrate; A first isolation layer having a first mesh is formed on the substrate; A second isolation layer with a second mesh is formed on the first isolation layer to form an isolation structure. The isolation structure includes the second isolation layer and the first isolation layer. The material of the first isolation layer includes a conductive material. The isolation structure surrounds a plurality of isolation openings. The isolation openings have a first side and a second side disposed opposite to each other in a first direction. Corresponding to the same isolation opening, the first isolation layer located on the first side extends the second isolation layer toward the isolation opening. In the first direction, the distance between the edge of the first isolation layer located on the second side and the centroid of the isolation opening is d1, and the distance between the edge of the first isolation layer located on the first side and the centroid of the isolation opening is d2. d1 is greater than d2. The first direction is parallel to the substrate. A light-emitting functional material layer of the target color is deposited on the first target side in the first direction, biased towards the isolation opening, so that the centroid of the light-emitting functional material layer in each isolation opening is offset from the centroid of the isolation opening towards the first target side; for the isolation opening corresponding to the target color, the first target side is the second side of the isolation opening; A first electrode material layer is deposited on the light-emitting functional material layer; The first electrode material layer and the light-emitting functional material layer are patterned to form a first electrode and a light-emitting functional layer in the isolation opening corresponding to the target color, so as to form a light-emitting device of the target color; corresponding to the same isolation opening, in the first direction, the light-emitting functional layer is disposed biased towards the second side, and the centroid of the light-emitting functional layer is offset from the centroid of the isolation opening towards the second side; the first electrode extends beyond the light-emitting functional layer in the first direction towards the first side and connects to the first isolation layer.

21. The method for manufacturing a display panel according to claim 20, characterized in that, Before depositing the luminescent material layer of the target color on the first target side in the first direction, which is biased towards the isolation opening, the method further includes: A first insulating layer is formed on the sidewall of the second insulating layer; Optionally, forming a first insulating layer on the sidewall of the second insulating layer includes: The sidewall of the second isolation layer is subjected to oxidation treatment; Optionally, the oxidation treatment method includes oxygen plasma treatment.

22. The method for manufacturing a display panel according to claim 20, characterized in that, The first electrode material layer deposited on the light-emitting functional material layer includes: The first electrode material layer is deposited on the second target side in the first direction, biased towards the isolation opening, such that the centroid of the first electrode material layer in each isolation opening is offset from the centroid of the isolation opening towards the second target side; the second target side is disposed opposite to the first target side, and for the isolation opening corresponding to the target color, the second target side is the first side of the isolation opening.

23. The method for manufacturing a display panel according to claim 22, characterized in that, The first target side of the isolation opening in the first direction, on which the luminescent material layer of the target color is deposited, includes: The first vapor deposition source of the target color is rotated toward the first target side so that the first vapor deposition source is tilted toward the first target side; Adjust the evaporation angle of the first evaporation source of the target color so that the first evaporation source deposits the luminescent functional material layer toward the first target side; The deposition of the first electrode material layer on the second target side biased towards the isolation opening in the first direction includes: Rotate the second vapor deposition source toward the second target side so that the second vapor deposition source tilts toward the second target side; Adjust the evaporation angle of the second evaporation source so that the second evaporation source deposits the first electrode material layer toward the second target side.

24. A display device, characterized in that, The display panel includes the display panel as described in any one of claims 1-19 or the display panel prepared by the method of preparing the display panel according to any one of claims 20-23.

Images