Display panel and manufacturing method thereof
Patent Information
- Application Number
- CN202510549983.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-28
- Publication Date
- 2026-10-30
AI Technical Summary
[0031]区别于现有技术,本申请的有益效果是:本申请显示面板的包括基板、第一电极、像素定义层、隔离柱、第一共同层、发光层和第二电极。像素定义层中设有像素开口。本申请的隔离柱位于像素定义层背离基板的一侧,隔离柱位于像素开口的外围;其中,隔离柱包括在沿远离基板方向上依次层叠设置的第一隔离部和第二隔离部,一方面,在远离基板的方向上,第一隔离部的宽度增大,从而使得隔离柱对第一共同层进行隔断,另一方面,在远离基板的方向上,第二隔离部的宽度减小,从而减少对大视角光线的阻挡,从而提升显示面板的显示品质。
Smart Images

Figure CN123022073A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of display technology, and in particular to a display panel and a method for manufacturing the display panel. Background Technology
[0002] Active-matrix organic light-emitting diode (AMOLED) displays have gradually gained dominance in the high-end mobile phone market due to their unparalleled advantages over liquid crystal displays (LCDs) in terms of color saturation, power consumption, and foldability. Unlike LCDs, AMOLEDs use current-driven control circuits, where the light-emitting current flowing through the AMOLED is controlled by a driving thin-film transistor (TFT).
[0003] However, due to the limitations of existing vapor deposition processes, there is a common layer in the light-emitting pixels, which causes crosstalk between light-emitting pixels of different colors, thereby reducing the display quality of the display panel. Summary of the Invention
[0004] This application provides a display panel and a method for manufacturing the display panel, which can improve the display quality of the display panel.
[0005] This application provides a display panel, the display panel comprising: a substrate; first electrodes, a plurality of first electrodes being disposed at intervals on one side of the substrate; a pixel defining layer located on the side of the first electrodes facing away from the substrate, the pixel defining layer having pixel openings spaced apart and exposing the first electrodes; isolation pillars located on the side of the pixel defining layer facing away from the substrate, the isolation pillars being located around the pixel openings; wherein, the isolation pillars include a first isolation portion and a second isolation portion sequentially stacked in a direction away from the substrate, the width of the first isolation portion increasing and the width of the second isolation portion decreasing in the direction away from the substrate; a first common layer located on the side of the first electrodes, the pixel defining layer and the isolation pillars facing away from the substrate, and the first common layer being separated by the isolation pillars; a light-emitting layer located on the side of the first electrodes facing away from the substrate, and the light-emitting layer being located in the pixel openings; and a second electrode located on the side of the light-emitting layer facing away from the substrate.
[0006] In one embodiment, the cross-section of the second isolation portion perpendicular to the substrate is triangular.
[0007] Preferably, the cross-section of the first isolation portion perpendicular to the substrate is trapezoidal.
[0008] Preferably, the first isolation portion and the second isolation portion are integrally formed.
[0009] Preferably, the included angle between the sidewalls of the adjacent first isolation portion and the sidewalls of the second isolation portion is between 60 degrees and 150 degrees.
[0010] In one embodiment, the display panel further includes a support pad located on the side of the pixel definition layer opposite to the substrate, and at least a portion of the isolation pillars are located between the support pad and the pixel opening.
[0011] Preferably, at least a portion of the isolation pillar is located at the midpoint between the support pad and the pixel opening.
[0012] In one embodiment, the height of the isolation column is greater than or equal to 1 micrometer.
[0013] Preferably, the height of the isolation column is less than or equal to 2 micrometers.
[0014] In one embodiment, the material of the isolation column includes an insulating material.
[0015] Preferably, the insulating material includes photoresist.
[0016] Preferably, the pixel definition layer is made of the same material as the isolation pillar.
[0017] In one embodiment, the isolation pillar includes a plurality of isolation portions disposed around the pixel opening, with adjacent isolation portions spaced apart.
[0018] Preferably, the pixel opening has a rectangular shape, and the isolation pillar includes four isolation portions arranged around the pixel opening, with each isolation portion corresponding to each side of the pixel opening.
[0019] Preferably, each of the isolation portions is arranged parallel to the side adjacent to the pixel opening.
[0020] Preferably, the distance between each isolation portion and the side of the corresponding pixel opening is equal.
[0021] In one embodiment, the pixel definition layer is provided with a plurality of pixel openings corresponding to different emission colors, and the side of the pixel opening of different emission colors is equidistant from the adjacent isolation portion.
[0022] In one embodiment, the display panel further includes a second common layer located between the second electrode and the light-emitting layer.
[0023] Preferably, there are two light-emitting layers, which are stacked on top of each other, and a third common layer is provided between the two light-emitting layers, which is separated by the isolation column.
[0024] Preferably, the third common layer includes a charge generation layer.
[0025] Preferably, the first electrode includes an anode, and the second electrode includes a cathode; the first common layer includes at least one of a hole injection layer, a hole transport layer, and an electron blocking layer; the second common layer includes at least one of an electron injection layer, an electron transport layer, and a hole blocking layer.
[0026] In one embodiment, the pixel definition layer has an isolation groove on the side opposite to the substrate, and the isolation groove is disposed around the pixel opening.
[0027] Preferably, the width of the isolation groove increases along the direction approaching the substrate.
[0028] Preferably, the isolation groove includes a first groove wall and a second groove wall, and the isolation column includes a first side wall and a second side wall. The first groove wall is connected to the first side wall, and the first groove wall is located between the second groove wall and the second side wall.
[0029] Preferably, the first groove wall and the first side wall are coplanar.
[0030] A second aspect of this application provides a method for manufacturing a display panel, the method comprising: forming a first electrode on one side of a substrate; forming a full-surface pixel definition layer on the side of the first electrode away from the substrate; forming an isolation pillar on the side of the pixel definition layer away from the substrate, wherein the isolation pillar is located around the pixel opening, and the isolation pillar includes a first isolation portion and a second isolation portion sequentially stacked in a direction away from the substrate, wherein the width of the first isolation portion increases and the width of the second isolation portion decreases in the direction away from the substrate; patterning the pixel definition layer to form a pixel opening exposing the first electrode; forming a full-surface first common layer on the side of the first electrode away from the substrate; forming a light-emitting layer on the side of the first electrode away from the substrate; and forming a second electrode on the side of the light-emitting layer away from the substrate.
[0031] Unlike existing technologies, the beneficial effects of this application are as follows: The display panel of this application includes a substrate, a first electrode, a pixel definition layer, isolation pillars, a first common layer, a light-emitting layer, and a second electrode. The pixel definition layer has pixel openings. The isolation pillars of this application are located on the side of the pixel definition layer facing away from the substrate, and are located around the pixel openings. The isolation pillars include a first isolation portion and a second isolation portion sequentially stacked along a direction away from the substrate. On the one hand, the width of the first isolation portion increases in the direction away from the substrate, thereby allowing the isolation pillar to block the first common layer. On the other hand, the width of the second isolation portion decreases in the direction away from the substrate, thereby reducing the obstruction of light from wide viewing angles and improving the display quality of the display panel. Attached Figure Description
[0032] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein:
[0033] Figure 1 This is a schematic diagram of a film layer stacking structure in a display area of a display panel in the prior art;
[0034] Figure 2 This is a schematic diagram of one embodiment of the display panel of this application;
[0035] Figure 3 yes Figure 2 A schematic diagram of the cross-sectional membrane structure of the first embodiment in the middle region M to N;
[0036] Figure 4 yes Figure 2 An enlarged schematic diagram of one embodiment of the central region Q;
[0037] Figure 5 yes Figure 2 A schematic diagram of the cross-sectional membrane structure of the second embodiment in the middle regions M to N;
[0038] Figure 6 yes Figure 2 A schematic diagram of the cross-sectional membrane structure of the third embodiment in the middle regions M to N;
[0039] Figure 7 yes Figure 2 A schematic diagram of the cross-sectional membrane structure of the fourth embodiment in the middle regions M to N;
[0040] Figure 8 yes Figure 2 A schematic diagram of the cross-sectional membrane structure of one embodiment in the middle region U to V;
[0041] Figure 9 This is a flowchart illustrating one embodiment of the method for manufacturing the display panel of this application. Detailed Implementation
[0042] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.
[0043] It should be noted that the terms "first" and "second" in this application are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products, or apparatuses.
[0044] In this document, the term "implementation" means that a specific feature, structure, or characteristic described in connection with an implementation may be included in at least one implementation of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same implementation, nor is it a separate or alternative embodiment mutually exclusive with other implementations. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.
[0045] In the description of the embodiments in this application, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.
[0046] In the description of the embodiments of this application, the term "multiple" refers to two or more (including two), similarly, "multiple sets" refers to two or more (including two sets), and "multiple pieces" refers to two or more (including two pieces).
[0047] In the prior art, see [reference] Figure 1 , Figure 1This is a schematic diagram of a film layer stacking structure in the display area of a display panel in the prior art. The display panel 10 includes a substrate 100, a first electrode 210, a pixel definition layer 300, a first common layer 410, a light-emitting layer 500, a second common layer 420, and a second electrode 220. The light-emitting layer 500 is disposed in the pixel opening K of the pixel definition layer 300. The first electrode 210 is electrically connected to the pixel driving circuit (not shown) in the substrate 100. The second electrode 220 is formed over the entire surface and connected to a common potential. The first electrode 210 and the second electrode 220 together provide voltage to the light-emitting layer 500. The first common layer 410 and the second common layer 420 are both film layers formed over the entire surface. The first common layer 410 and the second common layer 420 are both film layers related to carrier migration. The first common layer 410 is located between the first electrode 210 and the light-emitting layer 500, and the second common layer 420 is located between the second electrode 220 and the light-emitting layer 500. The functions of the first common layer 410 and the second common layer 420 include one of carrier injection, carrier transport, and carrier blocking. Since both the first common layer 410 and the second common layer 420 are film layers formed on the entire surface, when charge carriers migrate from the first electrode 210 to the light-emitting layer 500 in the pixel opening K, they will also migrate laterally along the first common layer 410. This will also cause the charge carriers to flow to the light-emitting layers 500 in the adjacent pixel opening K. Since the light-emitting layers 500 in the adjacent pixel opening K usually emit different colors, this leads to crosstalk between the light-emitting layers 500 in the adjacent pixel opening K. They affect each other when emitting light, which reduces the display quality of the display panel 10.
[0048] See Figure 2 and Figure 3 , Figure 2 This is a schematic diagram of one embodiment of the display panel of this application. Figure 3 yes Figure 2 A cross-sectional film structure diagram of the first embodiment of the middle region M to N. The first aspect of this application provides a display panel 10. The display area of the display panel 10 is provided with a plurality of light-emitting pixels P. The display panel 10 includes a substrate 100, a first electrode 210, a pixel definition layer 300, an isolation pillar 600, a light-emitting layer 500, and a second electrode 220.
[0049] Multiple first electrodes 210 are spaced apart on one side of the substrate 100.
[0050] Specifically, the first electrode 210 can be either a cathode or an anode. Multiple first electrodes 210 are spaced apart, thus the first electrode 210 is electrically connected to the light-emitting pixel P one-to-one. The substrate 100 is provided with a pixel driving circuit, which is electrically connected to the first electrode 210. The pixel driving circuit includes different circuits such as 2T1C, 6T1C, 7T1C, and 8T2C.
[0051] The pixel definition layer 300 is located on the side of the first electrode 210 away from the substrate 100, and the pixel definition layer 300 has pixel openings K that are spaced apart and expose the first electrode 210.
[0052] Specifically, the pixel definition layer 300 is provided with a through hole that penetrates the pixel definition layer 300 along the direction close to the substrate 100. The through hole is... Figure 3 The pixel opening K is used to set the light-emitting pixel P. The position of the first electrode 210 corresponds to the position of the pixel opening K. The bottom of the through hole exposes the surface of the first electrode 210, so that the light-emitting pixel P and the first electrode 210 are directly electrically connected.
[0053] The light-emitting layer 500 is located on the side of the first electrode 210 away from the substrate 100, and the light-emitting layer 500 is located in the pixel opening K.
[0054] Specifically, the material of the light-emitting layer 500 is a light-emitting material, and its main function is to emit light. The material of the light-emitting layer 500 includes a light-emitting material of at least one color, which includes at least one of red, green, blue, and white. The light-emitting layer 500 is disposed in the pixel opening K and corresponds to the pixel opening K. The light-emitting layer 500 is a discontinuous film layer.
[0055] The first common layer 410 is located on the side of the first electrode 210, the pixel definition layer 300 and the isolation pillar 600 away from the substrate 100, and the first common layer 410 is separated by the isolation pillar 600.
[0056] Specifically, the first common layer 410 is a film layer related to carrier migration. The first common layer 410 is a film layer formed over the entire surface. It not only covers the pixel opening K of the pixel definition layer 300, but also covers the side of the pixel definition layer 300 away from the substrate 100. Carriers injected from the first electrode 210 will migrate laterally through the first common layer 410. This application can block the lateral migration path of carriers through the isolation pillar 600, as detailed below.
[0057] The second electrode 220 is located on the side of the light-emitting layer 500 away from the substrate 100.
[0058] Specifically, the second electrode 220 can be either a cathode or an anode. When the first electrode 210 is an anode, the second electrode 220 is a cathode; when the first electrode 210 is a cathode, the second electrode 220 is an anode. The first electrode 210 and the second electrode 220 are electrically connected to the two ends of the light-emitting layer 500 to provide voltage to the light-emitting layer 500 and drive the light-emitting layer 500 to emit light. The second electrode 220 is a film layer formed over its entire surface.
[0059] The isolation pillar 600 is located on the side of the pixel definition layer 300 away from the substrate 100, and the isolation pillar 600 is located on the periphery of the pixel opening K; wherein, the isolation pillar 600 includes a first isolation portion 610 and a second isolation portion 620 stacked sequentially in the direction away from the substrate 100, and the width of the first isolation portion 610 increases and the width of the second isolation portion 620 decreases in the direction away from the substrate 100.
[0060] Specifically, the isolation pillar 600 is disposed around the pixel opening K, that is, around the light-emitting pixel P, and does not block light. The isolation pillar 600 includes two isolation portions: a first isolation portion 610 and a second isolation portion 620. The widths of the first isolation portion 610 and the second isolation portion 620 vary in the direction away from the substrate 100, and the trends of the changes are opposite. In this case, the width of the first isolation portion 610 increases in the direction away from the substrate 100. That is, the width of the first isolation portion 610 decreases as it approaches the pixel definition layer 300. The first common layer 410 is deposited on the surface of the light-emitting layer 500, the pixel definition layer 300, and the isolation pillar 600 away from the substrate 100 by vapor deposition. Since the first isolation portion 610 has an inward structure, the side of the first isolation portion 610 away from the substrate 100 can block the vapor deposition, making it difficult for material of the first common layer 410 to be deposited near the side of the first isolation portion 610 close to the pixel definition layer 300. Combined with the height of the isolation pillar 600 itself, it is difficult for the first common layer 410 to be continuous at the isolation pillar 600. Therefore, the first common layer 410 will be interrupted at the isolation pillar 600, thus blocking the migration path of carriers in the lateral direction. Meanwhile, in the direction away from the substrate 100, the width of the second isolation portion 620 is reduced. On the one hand, the second isolation portion 620 further increases the height of the isolation pillar 600, improving the blocking effect of the isolation pillar 600. On the other hand, the reduced width of the second isolation portion 620 can reduce the obstruction of the isolation pillar 600 to the light emitted by the light-emitting pixel P from a wide viewing angle, ensuring sufficient display brightness at a wide viewing angle.
[0061] It should be noted that the isolation pillar 600 is mainly used to isolate the first common layer 410. Since the second electrode 220 is located on the side of the first common layer 410 away from the substrate 100, it is not easy to isolate it. It is acceptable for the second electrode 220 to be isolated or not isolated at the isolation pillar 600.
[0062] Unlike existing technologies, the display panel 10 of this application includes a substrate 100, a first electrode 210, a pixel definition layer 300, an isolation pillar 600, a first common layer 410, a light-emitting layer 500, and a second electrode 220. The pixel definition layer 300 has a pixel opening K. The isolation pillar 600 of this application is located on the side of the pixel definition layer 300 facing away from the substrate 100, and is located around the pixel opening K. The isolation pillar 600 includes a first isolation portion 610 and a second isolation portion 620 sequentially stacked along a direction away from the substrate 100. On the one hand, the width of the first isolation portion 610 increases in the direction away from the substrate 100, thereby separating the first common layer 410. On the other hand, the width of the second isolation portion 620 decreases in the direction away from the substrate 100, thereby reducing the obstruction of light from wide viewing angles and improving the display quality of the display panel 10.
[0063] In one embodiment, see Figure 3 The cross-section of the second isolation portion 620 perpendicular to the substrate 100 is triangular. The triangular structure means that the width of the second isolation portion 620 decreases uniformly in the direction away from the substrate 100, which reduces the problem of brightness abruptness caused by uneven light blocking. In addition, the width of the end of the second isolation portion 620 away from the substrate 100 is 0, which can minimize the obstruction of light from the second isolation portion 620 to a wide viewing angle.
[0064] In some other embodiments, the cross-section of the second isolation portion perpendicular to the substrate may also be trapezoidal.
[0065] In one embodiment, see Figure 3 The first isolation portion 610 has a trapezoidal cross section perpendicular to the substrate 100.
[0066] Specifically, the trapezoidal structure means that the width of the first isolation portion 610 increases uniformly in the direction close to the substrate 100. In other words, the sidewall of the first isolation portion 610 is linear, which can reduce the difficulty of fabricating the first isolation portion 610.
[0067] In some other embodiments, the cross-section of the sidewall of the first isolation portion 610 perpendicular to the substrate 100 may also be arc-shaped.
[0068] In one embodiment, the first isolation portion 610 and the second isolation portion 620 are integrally formed. That is, the first isolation portion 610 and the second isolation portion 620 are made of the same material and are manufactured through the same process, which can improve the manufacturing effect and simplify the process steps.
[0069] In one embodiment, the included angle between the sidewalls of the adjacent first isolation portion 610 and the sidewalls of the second isolation portion 620 is between 60 degrees and 150 degrees.
[0070] Specifically, the included angle can be 60 degrees, 80 degrees, 100 degrees, 120 degrees, 130 degrees, or 150 degrees, etc., and this application does not limit the specific value. On the one hand, the included angle should not be too large, as an excessively large included angle will reduce the isolation effect of the isolation column 600 on the first common layer 410, thus failing to guarantee the isolation effect on the first common layer 410. On the other hand, the included angle should not be too small, as an excessively small included angle will increase the difficulty of preparation. Increased difficulty will make it impossible to guarantee that the prepared isolation column 600 can achieve the designed shape, which will correspondingly reduce the isolation effect of the isolation column 600 on the first common layer 410, thus failing to guarantee the isolation effect on the first common layer 410.
[0071] In one embodiment, the height of the isolation pillar 600 is greater than or equal to 1 micrometer. Preferably, the height of the isolation pillar 600 is less than or equal to 2 micrometers. For example, the height of the isolation pillar 600 can be 1 micrometer, 1.2 micrometers, 1.5 micrometers, 1.8 micrometers, or 2 micrometers, etc. This application does not limit the specific value of the height of the isolation pillar 600. On the one hand, the height of the isolation pillar 600 cannot be too small, as a height that is too small will not have a significant blocking effect on the first common layer 410. On the other hand, the height of the isolation pillar 600 cannot be too large, as a height that is too large will easily block the light from the light-emitting pixel P from a wide viewing angle, and will waste materials and increase costs.
[0072] In one embodiment, the material of the isolation pillar 600 includes an insulating material. The insulating material prevents the first common layer 410, which is separated by the isolation pillar 600, from becoming conductive through contact with the isolation pillar 600, thus avoiding the possibility of the first common layer 410 on both sides of the isolation pillar 600 being electrically connected through the isolation pillar 600, thereby completely blocking the lateral migration path of charge carriers.
[0073] In one embodiment, the insulating material includes photoresist. The photoresist includes positive photoresist and negative photoresist, so that the isolation pillar 600 can be fabricated using a photolithography process, thereby ensuring control over its morphology.
[0074] In one embodiment, the pixel definition layer 300 and the isolation pillar 600 are made of the same material. On the one hand, using the same material for the pixel definition layer 300 and the isolation pillar 600 can save the cost of manufacturing the display panel 10. On the other hand, it can also save manufacturing steps and improve the manufacturing efficiency of the display panel 10.
[0075] In one embodiment, see Figure 3 and Figure 4 , Figure 4 yes Figure 2 An enlarged schematic diagram of one embodiment of the central region Q shows that the isolation pillar 600 includes a plurality of isolation portions 601 disposed around the pixel opening K, with adjacent isolation portions 601 spaced apart.
[0076] Specifically, a pixel opening K is surrounded by multiple isolation portions 601 to isolate the first common layer 410 near multiple sides of the light-emitting pixel P, thereby improving the crosstalk problem between adjacent light-emitting pixels P. Furthermore, adjacent isolation portions 601 are spaced apart, meaning they do not form a ring structure around the pixel opening K. This is primarily to avoid the possibility of isolating the second electrode 220 while isolating the first common layer 410, which would affect the conductivity of the second electrode 220. Therefore, the space between adjacent isolation portions 601 does not contain an isolation portion 601; it only contains the pixel definition layer 300. Thus, the first common layer 410 is not isolated at this point, nor is the second electrode 220. Therefore, the spaced isolation portions 601 simultaneously improve the crosstalk problem between adjacent light-emitting pixels P and ensure the electrical connection performance of the second electrode 220.
[0077] In one embodiment, the distance between two adjacent isolation portions 601 is greater than or equal to 1 micrometer. For example, the value of this distance can be 1 micrometer, 3 micrometers or 5 micrometers, etc. This application does not limit the specific value of this distance.
[0078] In one embodiment, see Figure 4 The pixel opening K has a rectangular shape, and the isolation pillar 600 includes four isolation parts 601 arranged around the pixel opening K, with each isolation part 601 corresponding to each side of the pixel opening K.
[0079] Specifically, the four isolation sections 601 correspond to the four sides of the pixel opening K, and respectively isolate the first common layer 410 near the four sides. It can be understood that the isolation sections 601 provided along the sides of the pixel opening K can isolate most of the first common layer 410. Therefore, it has a significant improvement effect on the crosstalk problem between adjacent light-emitting pixels P. The isolation section 601 is not provided at the corner position to ensure the electrical connection effect of the second electrode 220.
[0080] Furthermore, each isolation section 601 is arranged parallel to the side adjacent to the pixel opening K. This design ensures that the brightness of the light emitted by the light-emitting pixels P at different positions on the display panel 10 is consistent across a wide viewing angle, perpendicular to the side direction. Specifically, since the isolation section 601 is arranged parallel to the side adjacent to the pixel opening K, the isolation section 601 is also arranged parallel to the side adjacent to the light-emitting pixel P in the pixel opening K. The angle at which the light emitted by the light-emitting pixel P at a wide viewing angle can be blocked by the isolation section 601 is the same, thus helping to improve the problem of uneven display brightness at a wide viewing angle.
[0081] Furthermore, the distance between each isolation section 601 and the side of the corresponding pixel opening K is equal. This design ensures that the light from the light-emitting pixel P in all four directions is uniformly blocked from a wide viewing angle, thus avoiding the problem of inconsistent light emission brightness of the light-emitting pixel P in multiple directions.
[0082] In one embodiment, see Figure 4 The pixel definition layer 300 is provided with a plurality of pixel openings K corresponding to different light emission colors, and the side of the pixel opening K of different light emission colors is equidistant from the adjacent isolation part 601.
[0083] Specifically, in the prior art, multiple light-emitting pixels P of different colors are arranged adjacently to achieve a multi-color display. In this embodiment, multiple pixel openings K corresponding to different light-emitting colors are provided with a first light-emitting pixel P1, a second light-emitting pixel P2, and a third light-emitting pixel P3. Each of the first light-emitting pixel P1, the second light-emitting pixel P2, and the third light-emitting pixel P3 has an isolation portion 601 around its periphery to separate the first common layer 410. The isolation portion 601 is equidistant from the side of its corresponding pixel opening K, thus ensuring the consistency of display brightness for different light-emitting colors at wide viewing angles.
[0084] It should be noted that this application does not impose specific limitations on the size, shape, and arrangement of the pixel opening K. In different embodiments, as long as the isolation column 600 is adjusted accordingly based on the size, shape, and arrangement of the pixel opening K, it is within the protection scope of this application.
[0085] In one embodiment, see Figure 5 , Figure 5 yes Figure 2 A cross-sectional film structure diagram of the second embodiment in the middle region M to N. The display panel 10 also includes a second common layer 420, which is located between the second electrode 220 and the light-emitting layer 500.
[0086] Specifically, the second common layer 420 is used for carrier migration between the first electrode 210 and the light-emitting layer 500. The second common layer 420 and the first common layer 410 are typically designed for different types of carriers. Optionally, the second common layer 420 can be isolated by the isolation pillar 600, or it can be left unisolated by the isolation pillar 600. Of course, if it is left unisolated by the isolation pillar 600, in actual fabrication, the second common layer 420 can also prevent the second electrode 220 from being isolated by the isolation pillar 600.
[0087] Furthermore, the first electrode 210 includes an anode, and the second electrode 220 includes a cathode; the first common layer 410 includes at least one of a hole injection layer, a hole transport layer, and an electron blocking layer; the second common layer 420 includes at least one of an electron injection layer, an electron transport layer, and a hole blocking layer.
[0088] Specifically, the hole injection layer is used to inject holes from the anode into the light-emitting layer 500, the hole transport layer is used to transport holes from the anode to the light-emitting layer 500, and the electron blocking layer is used to prevent electrons in the light-emitting layer 500 from migrating to the anode. The first common layer 410 can be any one or more of the above-mentioned film layers. The electron injection layer is used to inject electrons from the cathode into the light-emitting layer 500, the electron transport layer is used to transport electrons from the cathode to the light-emitting layer 500, and the hole blocking layer is used to prevent holes in the light-emitting layer 500 from migrating to the cathode. The second common layer 420 can be any one or more of the above-mentioned film layers.
[0089] Of course, in some other embodiments, the first common layer 410 and the second common layer 420 can also be other membrane layers, as long as their function is related to carrier migration.
[0090] In one embodiment, see Figure 6 , Figure 6 yes Figure 2 A schematic diagram of the cross-sectional film structure of the third embodiment in the middle region M to N shows that there are two light-emitting layers 500, which are stacked together, and a third common layer 430 is provided between the two light-emitting layers 500.
[0091] Specifically, the stacked arrangement of two light-emitting layers 500 allows two independent sets of sub-pixels to emit light simultaneously at the same location, improving the luminous efficiency and brightness of the display panel 10. A third common layer 430 is provided between the two light-emitting layers 500, including a charge generation layer. The charge generation layer generates charge carriers to provide electrons and holes to the light-emitting layers 500 on both sides, and the charge carriers provided on each side are different. Since the third common layer 430 is also a film layer formed over the entire surface, it covers not only the surface of the light-emitting layer 500 closest to the substrate 100, but also the surface of the pixel definition layer 300 and the side of the isolation pillar 600 facing away from the substrate 100. The isolation pillar 600 isolates the third common layer 430 to improve crosstalk between adjacent light-emitting pixels P. Optionally, the second common layer 420 may not be isolated by the isolation pillar 600, or the second common layer 420 may be isolated by the isolation pillar 600. Optionally, the second electrode 220 may not be isolated by the isolation post 600, or the second electrode 220 may be isolated by the isolation post 600.
[0092] In one embodiment, see Figure 7 , Figure 7 yes Figure 2 A cross-sectional film structure diagram of the fourth embodiment of the middle regions M to N is shown. The pixel definition layer 300 has an isolation groove C on the side opposite to the substrate 100. The isolation groove C is disposed around the pixel opening K.
[0093] Specifically, the isolation trench C is recessed along the pixel definition layer 300 towards the substrate 100 and is disposed around the isolation pillar 600 to enhance the isolation effect of the first common layer 410. The depth of the isolation trench C is greater than or equal to the thickness of the first common layer 410 to improve the isolation effect on the first common layer 410. Optionally, the depth of the isolation trench C can also be greater than the sum of the thicknesses of the first common layer 410 and the second common layer 420 and less than the sum of the thicknesses of the first common layer 410, the second common layer 420 and the second electrode 220, so as to isolate both the first common layer 410 and the second common layer 420 without isolating the second electrode 220. Alternatively, the depth can be greater than the sum of the thicknesses of the first common layer 410, the second common layer 420 and the second electrode 220, so as to isolate both the first common layer 410, the second common layer 420 and the second electrode 220.
[0094] Furthermore, the width of the isolation trench C increases in the direction approaching the substrate 100. Specifically, the increased width means that the opening size of the isolation trench C is minimized, and the deeper it is, the larger the size of the trench. In this way, when forming the first common layer 410, the first common layer 410 can be prevented from accumulating on the trench wall of the isolation trench C, and the first common layer 410 can only accumulate at the bottom of the isolation trench C.
[0095] Furthermore, the isolation groove C includes a first groove wall C1 and a second groove wall C2, and the isolation column 600 includes a first side wall B1 and a second side wall B2. The first groove wall C1 is connected to the first side wall B1, the first groove wall C1 is located between the second groove wall C2 and the second side wall B2, and the first side wall B1 is located between the second groove wall C2 and the second side wall B2.
[0096] Specifically, the first groove wall C1 is connected to the first side wall B1, so that the isolation pillar 600 and the isolation groove C are in contact rather than spaced apart. This increases the height of the isolation pillar 600 from the pixel definition layer 300. At the same time, when the first common layer 410 is formed near the isolation pillar 600, it will fall directly into the isolation groove C, so that the first common layer 410 cannot accumulate near the side wall of the isolation pillar 600, completely blocking the first common layer 410.
[0097] Furthermore, the first trench wall C1 and the first sidewall B1 are coplanar. This design allows the etching of the first isolation portion 610 and the isolation trench C to be completed in one step when using photolithography, saving fabrication time.
[0098] In one embodiment, see Figure 8 , Figure 8 yes Figure 2 A schematic diagram of the cross-sectional film structure of one embodiment of the central region U to V. The display panel 10 also includes a support pad 800, which is located on the side of the pixel definition layer 300 away from the substrate 100. At least a portion of the isolation pillars 600 are located between the support pad 800 and the pixel opening K.
[0099] Specifically, the support pads 800 are only partially present in the display area of the display panel 10, and their number is less than the number of light-emitting pixels P. The support pads 800 are used to support the display panel 10, which can prevent damage caused by the user pressing the display panel 10. Therefore, the isolation post 600 is located between the support pads 800 and the pixel opening K, which can reduce the possibility of the user pressing the isolation post 600.
[0100] Furthermore, at least part of the isolation pillar 600 is located in the middle position between the support pad 800 and the pixel opening K. The middle position can reduce the possibility of the user pressing the isolation pillar 600, and avoid the isolation pillar 600 blocking too much light from a wide viewing angle.
[0101] Combination Figure 2 , Figure 3 and Figure 9 , Figure 9 This is a flowchart illustrating one embodiment of the method for manufacturing a display panel according to this application; a second aspect of this application also provides a method for manufacturing a display panel 10, the method of which includes:
[0102] S100: A first electrode 210 is formed on one side of the substrate 100.
[0103] Specifically, a first electrode layer is formed on the substrate 100, and a plurality of first electrodes 210 spaced apart are fabricated by a patterning process. The patterning process in this application includes photolithography and laser etching processes, etc.
[0104] S200: A full-surface pixel definition layer 300 is formed on the side of the first electrode 210 away from the substrate 100.
[0105] Specifically, a pixel definition layer 300 is formed over the entire surface using a coating process, and covers the first electrode 210.
[0106] S300: An isolation pillar 600 is formed on the side of the pixel definition layer 300 away from the substrate 100. The isolation pillar 600 is located on the periphery of the pixel opening K. The isolation pillar 600 includes a first isolation portion 610 and a second isolation portion 620 that are sequentially stacked in the direction away from the substrate 100. In the direction away from the substrate 100, the width of the first isolation portion 610 increases and the width of the second isolation portion 620 decreases.
[0107] Specifically, an isolation layer can be formed across the entire surface using a coating process, and then etched using a patterning process to obtain the first isolation portion 610 and the second isolation portion 620. Since the sidewalls of the first isolation portion 610 and the second isolation portion 620 have an included angle, the first isolation portion 610 and the second isolation portion 620 can be etched in two steps. Specifically, a photolithography process can be used to adjust the angle between the light source irradiation direction and the substrate 100 to form the inclined sidewalls of the first isolation portion 610 and the second isolation portion 620, or a laser etching process can be used to adjust the angle between the laser irradiation direction and the substrate 100 to form the inclined sidewalls of the first isolation portion 610 and the second isolation portion 620.
[0108] S400: The patterned pixel definition layer 300 forms a pixel opening K that exposes the first electrode 210.
[0109] Specifically, a portion of the pixel definition layer 300 is removed through a patterning process to obtain a pixel opening K, which requires the first electrode 210 to be exposed.
[0110] S500: A first common layer 410 is formed on the side of the first electrode 210 away from the substrate 100.
[0111] Specifically, the first common layer 410 is deposited on the entire surface by vapor deposition process, so that the first common layer 410 covers the first electrode 210, the pixel definition layer 300 and the side of the isolation pillar 600 away from the substrate 100.
[0112] S600: A light-emitting layer 500 is formed on the side of the first electrode 210 away from the substrate 100.
[0113] Specifically, an emitting layer 500 is formed by vapor deposition and masking with a fine metal mask. The emitting layer 500 is deposited only in the pixel opening K.
[0114] S700: A second electrode 220 is formed on the side of the light-emitting layer 500 away from the substrate 100.
[0115] Specifically, the second electrode 220 is formed on the entire surface by a vapor deposition process. The second electrode 220 is located on the side of the light-emitting layer 500 and the first common layer 410 away from the substrate 100.
[0116] It should be understood that the implementation effect of the display panel 10 preparation method provided in this application is exactly the same as the implementation effect of the structure described above, and will not be repeated here.
[0117] The above are merely embodiments of this application and do not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.
Claims
1. A display panel, characterized in that, The display panel includes: substrate; First electrode, a plurality of first electrodes are disposed at intervals on one side of the substrate; A pixel definition layer is located on the side of the first electrode away from the substrate, and the pixel definition layer has pixel openings that are spaced apart and expose the first electrode; An isolation pillar is located on the side of the pixel definition layer facing away from the substrate, and the isolation pillar is located around the pixel opening; wherein, the isolation pillar includes a first isolation portion and a second isolation portion that are sequentially stacked in a direction away from the substrate, and in the direction away from the substrate, the width of the first isolation portion increases and the width of the second isolation portion decreases; The first common layer is located on the side of the first electrode, the pixel definition layer and the isolation pillar away from the substrate, and the first common layer is separated by the isolation pillar; A light-emitting layer is located on the side of the first electrode opposite to the substrate, and the light-emitting layer is located in the pixel opening; The second electrode is located on the side of the light-emitting layer that is away from the substrate.
2. The display panel according to claim 1, characterized in that, The cross-section of the second isolation portion perpendicular to the substrate is triangular; Preferably, the cross-section of the first isolation portion perpendicular to the substrate is trapezoidal; Preferably, the first isolation portion and the second isolation portion are integrally formed; Preferably, the included angle between the sidewalls of the adjacent first isolation portion and the sidewalls of the second isolation portion is between 60 degrees and 150 degrees.
3. The display panel according to claim 1, characterized in that, The display panel also includes: A support pad is located on the side of the pixel definition layer opposite to the substrate, and at least a portion of the isolation pillars are located between the support pad and the pixel opening; Preferably, at least a portion of the isolation pillar is located at the midpoint between the support pad and the pixel opening.
4. The display panel according to claim 1, characterized in that, The height of the isolation column is greater than or equal to 1 micrometer; Preferably, the height of the isolation column is less than or equal to 2 micrometers.
5. The display panel according to claim 1, characterized in that, The material of the isolation column includes insulating material; Preferably, the insulating material includes photoresist; Preferably, the pixel definition layer is made of the same material as the isolation pillar.
6. The display panel according to claim 1, characterized in that, The isolation pillar includes a plurality of isolation portions arranged around the pixel opening, with adjacent isolation portions spaced apart. Preferably, the pixel opening has a rectangular shape, and the isolation pillar includes four isolation portions arranged around the pixel opening, with each isolation portion corresponding to each side of the pixel opening. Preferably, each of the isolation portions is arranged parallel to the side adjacent to the pixel opening; Preferably, the distance between each isolation portion and the side of the corresponding pixel opening is equal.
7. The display panel according to claim 6, characterized in that, The pixel definition layer has a plurality of pixel openings corresponding to different emission colors, which are spaced apart. The side of the pixel opening of different emission colors is equidistant from the adjacent isolation portion.
8. The display panel according to claim 1, characterized in that, The display panel also includes: A second common layer is located between the second electrode and the light-emitting layer; Preferably, there are two light-emitting layers, which are stacked on top of each other, and a third common layer is provided between the two light-emitting layers, which is separated by the isolation column; Preferably, the third common layer includes a charge generation layer; Preferably, the first electrode includes an anode, and the second electrode includes a cathode; the first common layer includes at least one of a hole injection layer, a hole transport layer, and an electron blocking layer; the second common layer includes at least one of an electron injection layer, an electron transport layer, and a hole blocking layer.
9. The display panel according to claim 1, characterized in that, The pixel definition layer has an isolation groove on the side opposite to the substrate, and the isolation groove is disposed around the pixel opening; Preferably, the width of the isolation groove increases along the direction approaching the substrate; Preferably, the isolation groove includes a first groove wall and a second groove wall, and the isolation column includes a first side wall and a second side wall. The first groove wall is connected to the first side wall, and the first groove wall is located between the second groove wall and the second side wall. Preferably, the first groove wall and the first side wall are coplanar.
10. A method for manufacturing a display panel, characterized in that, The method includes: A first electrode is formed on one side of the substrate; A full-surface pixel definition layer is formed on the side of the first electrode facing away from the substrate; An isolation pillar is formed on the side of the pixel definition layer away from the substrate. The isolation pillar is located around the pixel opening. The isolation pillar includes a first isolation portion and a second isolation portion that are sequentially stacked in a direction away from the substrate. In the direction away from the substrate, the width of the first isolation portion increases and the width of the second isolation portion decreases. The pixel definition layer is patterned to form pixel openings that expose the first electrode; A first common layer is formed on the side of the first electrode opposite to the substrate; A light-emitting layer is formed on the side of the first electrode opposite to the substrate; A second electrode is formed on the side of the light-emitting layer opposite to the substrate.