Wafer heating device with leveling mechanism
Patent Information
- Application Number
- CN202611166813.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-08-03
- Publication Date
- 2026-10-30
AI Technical Summary
[0006]本发明的目的是提供一种带调平机构的晶圆加热装置,解决了现有晶圆加热装置的盘面高度调节依赖操作人员在设备底部仰视旋动调节螺柱,因螺纹旋向与盘面升降方向相反且标记易被遮挡或褪色,极易发生方向误判,导致盘面水平度偏差扩大并引发整体调节混乱的技术问题
[0029](1)相对于上述背景技术,本发明提供的一种带调平机构的晶圆加热装置通过在每个调节螺柱内部设置包含主动旋转部件、上咬合件及下咬合件的机械咬合件,并将触发部与主动旋转部件连接,改变了传统调节方式中对操作人员空间感知能力和经验判断的依赖。操作人员仅需根据盘面升降需求,通过直观的上提或下压触发部动作,即可使主动旋转部件选择性地与上咬合件或下咬合件咬合,从而锁定调节螺柱的唯一允许旋转方向。将原本在仰视条件下极易混淆的螺纹旋向判断,转化为符合人体直觉的上提即升、下压即降操作模式,同时保留螺纹调节的精度,无需任何额外标记或方向推理,降低了操作门槛,消除了因视角颠倒或标记辨识困难而导致的方向误判风险。
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Figure CN123022165A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of wafer heating technology, and in particular to a wafer heating device with a leveling mechanism. Background Technology
[0002] In semiconductor manufacturing processes, wafers typically undergo preheating or isothermal heating before photolithography, deposition, and etching to ensure the uniformity and stability of the process temperature. The levelness of the heating pads directly affects the temperature distribution on the wafer surface. Uneven spacing between the heating pads and the cover plate can lead to excessive local temperature differences on the wafer, thus affecting film quality, pattern accuracy, and even chip yield. Therefore, precisely leveling the heating pads to maintain a uniform spacing with the cover plate is a crucial step in ensuring the quality of the wafer heating process.
[0003] There are already some improved solutions for heating plate leveling in the prior art. For example, Chinese invention patent CN119812042A discloses a leveling device and a heating plate leveling method for a semiconductor heating plate. The leveling device includes a leveling base, a fixing base, a fixing connection assembly, and leveling components. Each leveling component includes a leveling screw, a locking nut, and a graduated nut. The levelness of the heating plate can be adjusted by rotating the leveling screw.
[0004] However, this type of solution still mainly relies on operators manually rotating the adjusting screws to achieve leveling. In actual operation, operators need to crouch under the equipment and look upwards. Since the direction of the thread rotation is opposite to the direction of the disc's rise and fall from this angle, it is very easy to misjudge the direction. Although rotation direction markings can be marked on the nut or nearby structure to assist in identification, the visibility of the markings is significantly reduced under upward viewing conditions. In addition, oil stains, dust, and high temperatures can easily cover or fade the markings, making them ineffective as a warning. Once the rotation direction is incorrect, because the disc's adjustment range is extremely small, the operator cannot directly observe the actual rise and fall direction of the disc with the naked eye, making it difficult to detect the error in time. Instead, the disc's levelness deviates from the target, interfering with the judgment of other adjustment points and ultimately causing chaos in the overall leveling process.
[0005] Therefore, there are still shortcomings and deficiencies in the existing technology. How to provide a heating device with an intuitive and reliable leveling mechanism that avoids operator misjudgment of direction is a technical problem that urgently needs to be solved by those skilled in the art. Summary of the Invention
[0006] The purpose of this invention is to provide a wafer heating device with a leveling mechanism, which solves the technical problem that the existing wafer heating device relies on the operator looking up at the bottom of the device and rotating the adjusting stud to adjust the height of the wafer. Because the direction of the thread is opposite to the direction of the wafer's rise and fall, and the markings are easily obscured or faded, it is easy to misjudge the direction, which leads to an increase in the deviation of the wafer's level and causes overall adjustment chaos.
[0007] To achieve the above objectives, the present invention provides a wafer heating device with a leveling mechanism, comprising a heating plate, a frame, a pad rod, and an adjustment assembly. The heating plate is installed inside the frame, and the pad rod is located at the bottom of the frame, arranged along the circumferential edge of the heating plate and located below the heating plate. The adjustment assembly includes a plurality of adjustment studs, each of which is threadedly connected to the bottom plate of the frame, and its top end abuts against the pad rod.
[0008] Each adjusting stud has a mechanical engagement component inside, which includes an inner hole, an engagement part, and a trigger part. The inner hole is opened inside the adjusting stud and is concentric with it.
[0009] The biting part is located inside the inner hole and includes an active rotating component, an upper biting component, and a lower biting component;
[0010] The active rotating component is movably and height-adjustable within the inner hole for connection with an external wrench; the upper and lower engaging components are used to engage with the active rotating component.
[0011] The trigger part is connected to the active rotating component and is used to drive the active rotating component to rise and fall, so that the active rotating component selectively engages with the upper and lower engaging components.
[0012] Preferably, the active rotating component includes an outer ring, an inner turntable, an upper active component, and a lower active component;
[0013] The outer ring is fitted onto the outside of the inner turntable and the two are concentrically set, allowing the inner turntable to rotate independently relative to the outer ring;
[0014] The upper driving member is located above the inner turntable and is used to engage with the upper engaging member; the lower driving member is located below the inner turntable and is used to engage with the lower engaging member.
[0015] Preferably, the upper driving member, the upper engaging member, the lower driving member, and the lower engaging member each include a ring body and a ring of engaging blocks arranged along the circumferential direction of the ring body surface; the engaging blocks are triangular in shape, with their bottom surface fixedly connected to the surface of the ring body, and their upper end surface being an inclined surface, wherein the lower end smoothly transitions with the ring body, and the higher end connects with the ring body along the longitudinal straight surface to form a straight wall step.
[0016] Preferably, the upper driving member and the lower driving member are longitudinally raised and lowered to the inner turntable via elastic connecting members;
[0017] The elastic connector includes a slide rod, a return spring, and a limiting plate; the slide rod is arranged equidistantly along the circumference of the inner turntable, with one end fixed to the surface of the inner turntable and the other end moving through the ring and fixed to the limiting plate; the return spring is sleeved on the outside of the slide rod and located between the inner turntable and the ring.
[0018] Preferably, the triggering part includes a column fixedly disposed below the inner turntable, the bottom end of the column extending into the clearance hole of the frame base plate, and an end cap fixed at one end of the column located in the clearance hole, the lower end face of the end cap having an internal hexagonal groove.
[0019] Preferably, the outer circumference of the outer ring is longitudinally slidingly engaged with the inner wall of the inner hole of the adjusting stud through a limiting strip;
[0020] The limiting strip is fixed at equal intervals along the inner wall of the inner hole, and the outer wall of the outer ring is provided with a keyway that engages with the limiting strip.
[0021] Preferably, the upper and lower sides of the outer ring are provided with support springs, which are used to keep the outer ring and the inner turntable in the middle position between the upper and lower engagement parts under normal conditions.
[0022] Preferably, it also includes a limiting member, which is arranged radially along the outer ring and is used to limit the longitudinal position of the outer ring after the active rotating component engages with the upper and lower engaging components.
[0023] Preferably, the limiting component includes an insert block, a square groove, a locking block, a compression spring, and an insert rod;
[0024] The insert is fixed inside the outer ring, and a square groove is provided inside it;
[0025] The locking block is slidably inserted into the square slot, the insertion rod is fixed to the back of the locking block, and the compression spring is sleeved on the outside of the insertion rod and is used to elastically push the locking block toward the inner wall of the adjusting stud.
[0026] A limit groove is provided on the inner wall of the adjusting stud, and the locking block is inserted into the limit groove.
[0027] Preferably, it also includes a connecting rope, one end of which is fixedly connected to the slide bar, and the other end extends along the L-shaped channel inside the insert block to the clearance hole in the frame base plate, for pulling the block apart from the limiting groove under external force.
[0028] The present invention has the following advantages:
[0029] (1) Compared with the above-mentioned background technology, the wafer heating device with leveling mechanism provided by the present invention changes the reliance on the operator's spatial perception and experience judgment in the traditional adjustment method by setting a mechanical engagement member containing an active rotating component, an upper engagement member and a lower engagement member inside each adjusting stud, and connecting the trigger part to the active rotating component. The operator only needs to lift or press the trigger part intuitively according to the lifting and lowering requirements of the disc, so that the active rotating component can selectively engage with the upper engagement member or the lower engagement member, thereby locking the only allowable rotation direction of the adjusting stud. The screw direction judgment, which is originally very easy to confuse under the upward view, is transformed into an operation mode that conforms to human intuition: lifting up raises and pressing down lowers. At the same time, the accuracy of screw adjustment is preserved. No additional marking or direction reasoning is required, which lowers the operation threshold and eliminates the risk of direction misjudgment caused by the inverted view or the difficulty of marking identification.
[0030] (2) Compared with the above-mentioned background technology, the wafer heating device with a leveling mechanism provided by the present invention achieves a triple error prevention mechanism of mechanical self-locking, free-spinning protection, and audible feedback through the triangular inclined surface and straight-wall stepped structure of the biting block, combined with the cooperation of the elastic connector and the return spring. When the trigger direction set by the operator is inconsistent with the actual rotation direction, the inclined surface of the biting block cannot transmit torque, and the adjusting stud is in a free-spinning state, avoiding the possibility of reverse rotation; at the same time, the longitudinal component force generated by the inclined surface forces the active component to compress the return spring, and when the biting block is re-aligned, the spring rebounds instantly to produce a crisp collision sound, providing a clear audible signal to prompt the operator to correct the direction in time. This improves the accuracy and efficiency of the leveling operation of the wafer heating device. Attached Figure Description
[0031] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.
[0032] Figure 1 This is a schematic diagram of the overall appearance and structure of the present invention;
[0033] Figure 2 This is a partial cross-sectional view of the heating device of the present invention;
[0034] Figure 3 This is a schematic diagram of the bottom structure of the heating device of the present invention;
[0035] Figure 4 For the present invention Figure 2 A magnified schematic diagram of the structure at point A;
[0036] Figure 5 For the present invention Figure 4 A magnified schematic diagram of the structure at point B;
[0037] Figure 6 This is a schematic diagram of the adjustment component structure of the present invention;
[0038] Figure 7 For the present invention Figure 6 A magnified schematic diagram of the structure at point C;
[0039] Figure 8 This is a schematic cross-sectional view of the adjusting stud of the present invention;
[0040] Figure 9 This is a schematic diagram of the active rotating component structure of the present invention;
[0041] Figure 10 This is a schematic cross-sectional view of the outer ring structure of the present invention;
[0042] Figure 11 For the present invention Figure 8 A magnified schematic diagram of the structure at point D;
[0043] Figure 12 This is a schematic diagram of the interlocking component structure of the present invention;
[0044] Figure 13 For the present invention Figure 9 A magnified schematic diagram of the structure at point E;
[0045] Figure 14 For the present invention Figure 11 A magnified schematic diagram of the structure at point F.
[0046] In the diagram: 1. Heating plate body; 2. Frame; 3. Pad rod; 4. Adjustment component; 5. Heating wire; 6. Top cover; 7. Annular groove; 8. Snap ring; 9. Ring body; 10. Engaging block; 11. Elastic connector; 12. Clearance hole; 13. Limiting strip; 14. Support spring; 15. Limiting component; 16. Limiting groove; 201. Base plate; 401. Adjusting stud; 402. Connecting flange; 403. Mechanical engaging component; 4031. Inner hole; 4032. Engaging part; 4033. Trigger part; 43 21. Active rotating component; 4322. Upper engaging component; 4323. Lower engaging component; 4301. Outer ring; 4302. Inner turntable; 4303. Upper active component; 4304. Lower active component; 1101. Slide rod; 1102. Return spring; 1103. Limiting plate; 4331. Column; 4332. End cap; 4333. Socket; 1501. Insertion block; 1502. Square groove; 1503. Locking block; 1504. Compression spring; 1505. Insertion rod; 1506. Connecting rope. Detailed Implementation
[0047] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0048] To enable those skilled in the art to better understand the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
[0049] This invention provides a wafer heating device with a leveling mechanism. By setting up a mechanical interlocking component, the adjustment operation is transformed into an intuitive action of lifting up and pressing down. Combined with a triple error prevention mechanism of mechanical self-locking, idle protection and audible feedback, it avoids the risk of misjudgment of direction, significantly improving the reliability, convenience and accuracy of the leveling operation. It can also solve the problem that the existing wafer heating device relies on the operator to look up at the bottom of the device and rotate the adjusting stud to adjust the plate height. Because the direction of the thread is opposite to the direction of plate lifting and lowering and the marking is easily obscured or faded, it is easy to misjudge the direction, which leads to the expansion of the plate level deviation and causes the overall adjustment chaos.
[0050] Please refer to this as well. Figures 1 to 3 The present invention provides a wafer heating device with a leveling mechanism, comprising a heating plate 1, a frame 2, a support rod 3, and an adjustment assembly 4. The heating plate 1 is the core heating component of the heating unit. Its base can be made of aluminum alloy or a composite structure with an embedded ceramic pressure-bearing surface. Heating wires 5 are arranged inside the plate, and multiple ceramic pins are evenly distributed above the plate surface to support the wafer and maintain a process clearance between the wafer and the plate surface, facilitating loading and unloading by an external robotic arm. A temperature sensor and an over-temperature protector are also embedded inside the plate, and a cover 6 can be mounted on top of the plate.
[0051] Frame 2 serves as the supporting skeleton for heating plate 1, which is installed inside frame 2 via locking or snap-fit. Support rods 3 are located at the bottom of frame 2, equidistantly arranged along the circumferential edge of heating plate 1, and positioned below heating plate 1. The function of support rods 3 is to transmit the point-like adjustment force from the lower adjustment component 4 to the heating plate 1, thereby adjusting the distance between the plate surface and the upper cover 6.
[0052] The height of the heating plate 1 is adjusted by the adjustment component 4, which includes multiple adjustment studs 401. Each adjustment stud 401 is threaded to the base plate 201 of the frame 2, with its top end abutting against the corresponding fulcrum on the pad rod 3. By rotating the adjustment stud 401, the pad rod 3 can be pushed up or lowered, causing the corresponding position of the heating plate 1 to rise or fall, so that the distance between the plate surface and the upper cover 6 reaches the uniformity required by the process.
[0053] In actual operation, if the height of the heating plate 1 needs to be adjusted, the operator must squat at the bottom of the equipment, looking upwards and rotating the adjusting stud 401. However, since the direction of the thread rotation is exactly opposite to the direction of the plate's rise and fall from this angle, the operator is very prone to misjudging the direction. Although the rotation direction can be marked on the nut or nearby structure to help identify it, the visibility of the markings is significantly reduced when looking upwards from below the equipment. Especially for novice operators, the inverted perspective often leads to misreading the direction of the markings. In addition, the markings are easily covered or faded due to long-term exposure to oil, dust, and high temperatures, further reducing their indicative effect. Even experienced operators sometimes operate directly by feel or habit without checking the markings, which also carries the risk of turning the plate in the wrong direction. Once the rotation direction is incorrect, because the adjustment range of the heating plate 1 is extremely small, the operator can only estimate the adjustment amount based on the number of rotations and cannot directly observe the actual direction of the plate's rise and fall with the naked eye. Therefore, if the nut at a certain adjustment point is turned in the wrong direction, the operator will find it difficult to notice and correct it in time. Instead, it will cause the level of that side of the disc to deviate from the target, resulting in an increase in the uniformity error around the disc surface. This will interfere with the judgment and correction of other adjustment points, and ultimately cause chaos in the overall adjustment process.
[0054] Therefore, please refer to them together. Figures 2 to 6 In this embodiment, each adjusting stud 401 is specifically designed to have a directional locking feature. Specifically, each adjusting stud 401 is threadedly connected to the base plate 201 of the frame 2 via a connecting flange 402. More specifically, the connecting flange 402 is fixed to the base plate 201 of the frame 2 with screws, and has a threaded hole at its center. A clearance hole 12 is provided on the base plate 201 opposite to this threaded hole. The outer circumference of the adjusting stud 401 has external threads that mate with the threaded hole, allowing the adjusting stud 401 to rotate and move up and down within the threaded hole of the connecting flange 402. The bottom end of the pad rod 3 directly abuts against the upper surface of the adjusting stud 401. Thus, by rotating the adjusting stud 401, the height of the corresponding disc surface can be adjusted via the pad rod 3.
[0055] To prevent operator error when rotating the adjusting stud 401, this embodiment incorporates a mechanical engagement member 403 inside the adjusting stud 401 to easily distinguish between vertical and horizontal rotation directions. By providing this mechanical engagement member 403, when adjusting the disc height, the operator can simply trigger the engagement by moving it vertically to lock the adjusting stud 401 in its current rotation direction. In other words, when rotating the adjusting stud 401 upwards, the operator first lifts the trigger part 4033 of the mechanical engagement member 403 and then rotates the adjusting stud 401. In this state, if the stud is rotated in the opposite direction, it will spin freely and cannot rotate, only allowing rotation in the upward direction. Conversely, when downward adjustment is required, the trigger part 4033 of the mechanical engagement member 403 is moved vertically downwards, and then the adjusting stud 401 is rotated, allowing the adjusting stud 401 to rotate only in the downward direction. This intuitive rotation triggering method effectively avoids confusion in dial height adjustment caused by incorrect adjustment direction due to accidental operation.
[0056] Specifically, please refer to the following: Figures 4 to 8 The mechanical engagement component 403 includes an inner hole 4031, an engagement portion 4032, and a trigger portion 4033. The adjusting stud 401 has an inner hole 4031 concentric with the stud, extending through the lower end face of the adjusting stud 401. The engagement portion 4032 is disposed inside the inner hole 4031. More specifically, the engagement portion 4032 includes an active rotating component 4321, an upper engagement component 4322, and a lower engagement component 4323. The active rotating component 4321 is vertically and movably disposed within the inner hole 4031, and its main function is to connect with an external wrench to achieve rotational operation. The upper engagement component 4322 and the lower engagement component 4323 are used to selectively engage with the active rotating component 4321, thereby achieving rotation of the stud in two different directions. Under normal conditions, the active rotating component 4321 is positioned between the upper engaging component 4322 and the lower engaging component 4323, meaning that the active rotating component 4321 is disengaged from both the upper engaging component 4322 and the lower engaging component 4323. This disengagement effectively prevents novice operators from directly rotating the active rotating component 4321 and causing misoperation. Only when the active rotating component 4321 is triggered to move up or down via the trigger unit 4033, engaging with either the upper engaging component 4322 or the lower engaging component 4323, can the purpose of rotating the adjusting stud 401 be achieved.
[0057] Please refer to this as well. Figures 9 to 11The active rotating component 4321 includes an outer ring 4301, an inner turntable 4302, an upper active component 4303, and a lower active component 4304. The inner ring of the outer ring 4301 has a concave annular groove 7, and the outer ring 4301 is fitted onto the outside of the inner turntable 4302. The outer ring of the inner turntable 4302 has a retaining ring 8 that mates with the annular groove 7. The retaining ring 8 is movably inserted into the annular groove 7, thereby enabling the inner turntable 4302 to rotate independently relative to the outer ring 4301. It should be noted that the inner turntable 4302 and the outer ring 4301 are concentrically arranged. In addition, the outer ring 4301 is detachably connected by two rings, while the inner turntable 4302 is provided with an upper active member 4303 and a lower active member 4304 at the top and bottom respectively. The upper active member 4303 is used to engage with the upper engaging member 4322, and the lower active member 4304 is used to engage with the lower engaging member 4323.
[0058] Please refer to this as well. Figure 12 The upper driving member 4303, upper engaging member 4322, lower driving member 4304, and lower engaging member 4323 are all configured to consist of a ring body 9 and a ring of engaging blocks 10 arranged circumferentially along the surface of the ring body 9. The engaging blocks 10 are equidistantly arranged along the circumference of the ring body 9 and are triangular in shape. Their bottom surface is fixedly connected to the surface of the ring body 9, and their upper end surface is inclined. The lower end smoothly transitions to the plane of the ring body 9, while the higher end connects to the ring body 9 along a longitudinal straight surface, forming a straight wall step. Under normal conditions, the upper driving member 4303 and the upper engaging member 4322 are in a separated state. When the upper driving member 4303 and the upper engaging member 4322 come into contact, they rotate in the direction of the straight wall step at one end of the engaging block 10, thereby driving the stud to rotate through the engagement of the upper driving member 4303 and the upper engaging member 4322. Conversely, if the rotation is reversed, the inclined surface of the engagement block 10 prevents the upper driving member 4303 and the upper engagement member 4322 from forming an effective engagement transmission. The component force generated by the inclined surface forces the upper driving member 4303 to move longitudinally, thus preventing circumferential transmission. The engagement principle of the lower driving member 4304 and the lower engagement member 4323 is the same, also achieving circumferential transmission through the straight surface engagement of the engagement block 10.
[0059] In addition, to achieve the unidirectional free-spinning function between the upper driving member 4303 and the upper engaging member 4322, or between the lower driving member 4304 and the lower engaging member 4323, please refer to the following: Figure 9 , Figure 13In this embodiment, the upper active member 4303 and the lower active member 4304 are respectively configured to be longitudinally and vertically connected to the inner turntable 4302 via the elastic connector 11. Specifically, the elastic connector 11 includes a slide rod 1101, a return spring 1102, and a limiting plate 1103. At least three slide rods 1101 are arranged equidistantly along the circumference of the inner turntable 4302. One end of the slide rod 1101 is fixed to the surface of the inner turntable 4302, and the other end moves through the ring 9. The limiting plate 1103 for limiting is fixed to the end of the slide rod 1101 that passes through the ring 9. The return spring 1102 is also sleeved on the outside of the slide rod 1101. The return spring 1102 is located between the inner turntable 4302 and the ring 9 to provide elastic support.
[0060] The ring 9 of the upper engagement member 4322 is directly fixed to the top wall of the inner hole 4031 by a detachable means such as screws, while the ring 9 of the lower engagement member 4323 is detachably connected to the inner wall of the inner hole 4031 of the adjusting stud 401 by screws.
[0061] Please refer to this as well. Figures 4 to 8 To facilitate rotation of the inner turntable 4302, the triggering part 4033 includes a column 4331 fixedly disposed below the inner turntable 4302. The bottom end of the column 4331 extends into the clearance hole 12 of the base plate 201 of the frame 2, and an end cap 4332 is fixed to the end of the column 4331 inside the clearance hole 12. The lower end face of the end cap 4332 has an internal hexagonal groove 4333, which facilitates the operator to use a wrench to rotate the inner turntable 4302. In addition, it should be noted that the outer diameter of the column 4331 is smaller than the inner diameter of the ring body 9 of the lower driving member 4304 and the lower engaging member 4323. At the same time, by setting the end cap 4332, the operator can pull down or lift the column 4331 to move the inner turntable 4302 up and down, thereby achieving selective engagement with the upper engaging member 4322 or the lower engaging member 4323.
[0062] With the above settings, when the height of a certain point on the dial needs to be adjusted, the trigger part 4033 of the corresponding stud is first raised or lowered. If the height needs to be increased, the trigger part 4033 is lifted, causing the outer ring 4301 and the inner turntable 4302 to rise together, thereby engaging the upper driving member 4303 with the upper engaging member 4322. Then, by rotating the inner turntable 4302 with a wrench, a rigid connection is achieved between the upper driving member 4303 and the upper engaging member 4322 through the straight-face engagement of the engaging block 10. This rotation of the upper engaging member 4322 then drives the adjusting stud 401 to rotate. In this case, if the operator rotates in the opposite direction, torque can only be transmitted through the inclined surface of the engaging block 10, and a rigid connection cannot be formed to drive the stud to rotate. Furthermore, due to the inclined surface, when the operating direction is incorrect, the upper driving member 4303 will be pressed down and compress the return spring 1102. When the upper engaging member 4322 and the engaging block 10 of the upper driving member 4303 are realigned, the rebound force of the return spring 1102 will cause the upper driving member 4303 to quickly strike the upper engaging member 4322, producing a collision sound to alert the operator of the incorrect direction. Conversely, the principle is the same when adjusting downwards.
[0063] This approach avoids problems caused by misjudgment of direction when adjusting stud 401. Firstly, this design changes the operator's judgment method, transforming the traditional inference method based on the visual relationship between the thread direction and the disc's upward and downward movement under a downward viewing condition into an intuitive up-and-down trigger action: lifting represents rising, and pressing down represents falling. This aligns with intuitive cognition, requiring no additional directional reasoning or reference marks, lowering the operational threshold. Even operators new to the equipment can quickly master the correct operating method.
[0064] Secondly, this embodiment, through the built-in mechanical engagement member 403, ensures that when the trigger direction set by the operator is inconsistent with the actual rotation direction, the stud will be in a free-spinning state and unable to transmit torque, physically eliminating the possibility of reverse rotation. This mechanical self-locking mechanism does not rely on the operator's attention, experience, or eyesight, nor is it affected by ambient light, oil, dust, or high temperatures, exhibiting extremely high reliability. Thirdly, when the operating direction is incorrect, the inclined engagement of the engagement block 10 not only prevents power transmission but also forces the upper driving member 4303 to compress the return spring 1102. When the engagement block 10 realigns, the return spring 1102 rebounds, emitting a crisp collision sound. This auditory feedback allows the operator to realize that the operating direction is incorrect and correct it promptly.
[0065] In addition, please refer to the following: Figure 8 and Figure 11The outer circumference of the outer ring 4301 is longitudinally slidably engaged with the inner wall of the inner hole 4031 of the adjusting stud 401 via limiting strips 13. Multiple limiting strips 13 are fixed at equal intervals along the inner wall of the inner hole 4031. Correspondingly, the outer circumference of the outer ring 4301 is provided with corresponding keyways along the circumference. The limiting strips 13 are inserted into the keyways, thereby limiting the circumference of the outer ring 4301 without affecting its longitudinal movement. Support springs 14 are also provided on the upper and lower sides of the outer ring 4301. Under normal conditions, the force of the support springs 14 keeps the outer ring 4301 and the inner turntable 4302 in the middle position between the upper engagement member 4322 and the lower engagement member 4323, maintaining the disconnected state. When it needs to move up or down, the outer ring 4301 compresses the corresponding support spring 14. After engagement, the longitudinal position of the outer ring 4301 is limited by a limiting member 15. After adjustment, the outer ring 4301 automatically resets under the action of the support spring 14 by unlocking the limiting member 15.
[0066] Please refer to this as well. Figure 8 , Figure 11 as well as Figure 14The limiting member 15 is radially fixed inside the outer ring 4301. Specifically, the limiting member 15 includes an insert block 1501, a square groove 1502, a locking block 1503, a compression spring 1504, an insert rod 1505, and a connecting rope 1506. The insert block 1501 is radially fixed inside the outer ring 4301, and one end of the insert block 1501 smoothly transitions to the outer circumference of the outer ring 4301. A square groove 1502 is formed inside the insert block 1501, specifically configured as a horizontally convex shape, with its small end penetrating the outer wall of the insert block 1501. A locking block 1503 is slidably inserted into the square groove 1502, also configured as a horizontally convex shape, with its large end located inside the large end of the square groove 1502. The block 1503 can slide radially along the outer ring 4301, and its small end is inserted into the small end of the square groove 1502; a plug rod 1505 is also fixed on the back of the block 1503, and a compression spring 1504 is sleeved on the outside of the plug rod 1505. The compression spring 1504 is used to elastically push the block 1503 toward the small end; correspondingly, limit grooves 16 are opened vertically and vertically on the inner wall of the inner hole 4031 of the adjusting stud 401, and the small end of the block 1503 is inserted into the limit groove 16. When the inner turntable 4302 moves downward, after the lower driving member 4304 engages with the lower engaging member 4323, the locking block 1503 moves to a position aligned with the lower limiting groove 16 of the inner hole 4031, and the small end of the locking block 1503 is then inserted into the limiting groove 16 to achieve limiting. Conversely, when the inner turntable 4302 moves upward, it is also limited by the insertion of the locking block 1503 into the upper limiting groove 16 of the inner hole 4031. In addition, a connecting rope 1506 is fixed to the other end of the slide rod 1101. One end of the connecting rope 1506 extends through an L-shaped channel through the bottom wall of the insert block 1501 to the interior of the clearance hole 12 of the base plate 201. When unlocking is required, the operator only needs to pull the connecting rope 1506 to retract the locking block 1503 and separate it from the limiting groove 16, thereby releasing the height limit on the inner turntable 4302. After that, the outer ring 4301 and the inner turntable 4302 will automatically reset under the action of the support spring 14.
[0067] In this embodiment, during operation: if the disc needs to be raised, the end cap 4332 of the column 4331 is lifted, causing the outer ring 4301 and the inner turntable 4302 to rise together, so that the upper driving member 4303 and the engagement block 10 of the upper engagement member 4322 make direct contact and lock. At this time, rotating the inner turntable 4302 with a wrench will drive the stud to rotate forward through rigid engagement, thus achieving the upward movement. If the disc needs to be lowered, the trigger part 4033 is pressed down, causing the lower driving member 4304 to engage with the lower engagement member 4323, thus achieving the downward movement through reverse rotation. When the operation direction is incorrect, the inclined surface of the engagement block 10 forces the driving member to compress the return spring 1102, preventing the transmission of torque. The stud is in a free-spinning state, and when the engagement block 10 is realigned, the spring rebounds and produces a collision sound, prompting the operator to correct the error in time. During adjustment, the outer ring 4301 slides against the inner hole 4031 wall via the limiting strip 13, and is longitudinally positioned by the radially arranged locking block 1503 engaging with the limiting groove 16 on the inner hole 4031 wall, ensuring stable engagement. After adjustment, pulling the connecting rope 1506 causes the locking block 1503 to retract and disengage from the limiting groove 16, and the outer ring 4301 automatically resets to the intermediate disconnected state under the action of the support spring 14. This allows the operator to complete precise leveling with only intuitive actions of lifting up and pressing down. At the same time, the triple mechanism of mechanical self-locking, free-spinning protection, and audible feedback eliminates the risk of misjudgment of direction, is unaffected by environmental factors, and improves the reliability and convenience of operation.
[0068] It should be noted that in this specification, relational terms such as first and second are used only to distinguish one entity from several other entities, and do not necessarily require or imply any such actual relationship or order between these entities.
[0069] This article uses specific examples to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. It should be noted that those skilled in the art can make several improvements and modifications to the present invention without departing from the principles of the present invention, and these improvements and modifications also fall within the protection scope of the present invention.
Claims
1. A wafer heating device with leveling mechanism, comprising a heating disc body (1), a frame (2), a cushion rod (3) and an adjusting assembly (4), characterized in that, The heating plate (1) is installed inside the frame (2), and the pad rod (3) is located at the bottom inside the frame (2), arranged along the circumferential edge of the heating plate (1), and located below the heating plate (1); the adjustment assembly (4) includes a plurality of adjustment studs (401), each of the adjustment studs (401) being threadedly connected to the bottom plate (201) of the frame (2), and its top end abutting against the pad rod (3); Each of the adjusting studs (401) is provided with a mechanical engagement member (403), the mechanical engagement member (403) includes an inner hole (4031), an engagement part (4032) and a trigger part (4033), the inner hole (4031) is opened inside the adjusting stud (401) and is concentric with it; The biting part (4032) is disposed inside the inner hole (4031), and includes an active rotating component (4321), an upper biting component (4322) and a lower biting component (4323). The active rotating component (4321) is movably and vertically disposed within the inner hole (4031) for connecting with an external wrench. The upper engaging component (4322) and the lower engaging component (4323) are used to engage with the active rotating component (4321) on one of them. The trigger part (4033) is connected to the active rotating part (4321) and is used to drive the active rotating part (4321) to rise and fall, so that the active rotating part (4321) selectively engages with the upper engaging part (4322) and the lower engaging part (4323).
2. The wafer heating device with a leveling mechanism according to claim 1, characterized in that, The active rotating component (4321) includes an outer ring (4301), an inner turntable (4302), an upper active component (4303), and a lower active component (4304). The outer ring (4301) is sleeved on the outside of the inner turntable (4302) and the two are concentrically arranged. The inner turntable (4302) can rotate independently relative to the outer ring (4301). The upper active member (4303) is located above the inner turntable (4302) and is used to engage with the upper engaging member (4322); the lower active member (4304) is located below the inner turntable (4302) and is used to engage with the lower engaging member (4323).
3. A wafer heating device with a leveling mechanism according to claim 2, characterized in that, The upper active member (4303), upper engaging member (4322), lower active member (4304) and lower engaging member (4323) each include a ring body (9) and a ring of engaging blocks (10) arranged along the circumferential direction of the surface of the ring body (9); the engaging block (10) is triangular in shape, its bottom surface is fixedly connected to the surface of the ring body (9), and its upper end surface is a slope, wherein the lower end smoothly transitions with the ring body (9), and the higher end is connected to the ring body (9) along the longitudinal straight surface to form a straight wall step.
4. A wafer heating device with a leveling mechanism according to claim 3, characterized in that, The upper active component (4303) and the lower active component (4304) are respectively longitudinally raised and lowered to the inner turntable (4302) through elastic connectors (11). The elastic connector (11) includes a slide rod (1101), a return spring (1102), and a limiting plate (1103); the slide rod (1101) is arranged equidistantly along the circumference of the inner turntable (4302), one end of which is fixed to the surface of the inner turntable (4302), and the other end moves through the ring (9) and is fixed to the limiting plate (1103); the return spring (1102) is sleeved on the outside of the slide rod (1101) and is located between the inner turntable (4302) and the ring (9).
5. A wafer heating device with a leveling mechanism according to claim 4, characterized in that, The trigger part (4033) includes a column (4331) fixedly disposed below the inner turntable (4302). The bottom end of the column (4331) extends into the clearance hole (12) of the bottom plate (201) of the frame (2). An end cap (4332) is fixed at one end of the column (4331) located in the clearance hole (12). The lower end face of the end cap (4332) is provided with an internal hexagonal groove (4333).
6. A wafer heating device with a leveling mechanism according to claim 2, characterized in that, The outer circumference of the outer ring (4301) is longitudinally slidingly engaged with the inner wall of the inner hole (4031) of the adjusting stud (401) through the limiting strip (13); The limiting strip (13) is fixed at equal intervals along the inner wall of the inner hole (4031), and the outer wall of the outer ring (4301) is provided with a keyway that is inserted and matched with the limiting strip (13).
7. A wafer heating device with a leveling mechanism according to claim 2, characterized in that, The outer ring (4301) is provided with support springs (14) on the upper and lower sides, which are used to keep the outer ring (4301) driving the inner turntable (4302) in the middle position between the upper engagement member (4322) and the lower engagement member (4323) under normal conditions.
8. A wafer heating device with a leveling mechanism according to claim 7, characterized in that, It also includes a limiting member (15), which is radially arranged along the outer ring (4301) and is used to limit the longitudinal position of the outer ring (4301) after the active rotating component (4321) engages with the upper engaging member (4322) and the lower engaging member (4323).
9. A wafer heating device with a leveling mechanism according to claim 8, characterized in that, The limiting component (15) includes an insert block (1501), a square groove (1502), a locking block (1503), a compression spring (1504), and an insert rod (1505); The insert (1501) is fixed inside the outer ring (4301), and a square groove (1502) is provided inside it. The locking block (1503) is slidably inserted into the square groove (1502), the insert rod (1505) is fixed to the back of the locking block (1503), and the compression spring (1504) is sleeved on the outside of the insert rod (1505) and is used to elastically push the locking block (1503) toward the inner wall of the inner hole (4031) of the adjusting stud (401); A limiting groove (16) is correspondingly provided on the inner wall of the inner hole (4031) of the adjusting stud (401), and the locking block (1503) is inserted into the limiting groove (16).
10. A wafer heating device with a leveling mechanism according to claim 9, characterized in that, It also includes a connecting rope (1506), one end of which is fixedly connected to the slide rod (1101), and the other end extends along the L-shaped channel inside the insert (1501) to the clearance hole (12) inside the bottom plate (201) of the frame (2), for pulling the locking block (1503) and the limiting groove (16) apart under the action of external force.
Citation Information
Patent Citations
Leveling device for semiconductor heating plate and heating plate leveling method
CN119812042A
