A display panel, a preparation method of the display panel, and a display device

By introducing a light emission viewing angle adjustment layer into the display panel and utilizing the flush design of the light absorption structure and the flat structure, the problems of large thickness and low light emission efficiency caused by traditional non-polarizing films are solved, achieving a display effect with high brightness and thinness.

CN123056547APending Publication Date: 2026-11-06EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
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Patent Information

Application Number
CN202611266219.5
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-08-19
Publication Date
2026-11-06

AI Technical Summary

Technical Problem

Traditional non-polarized filter components require multiple layers of film stacking, resulting in a thicker display panel and low light extraction efficiency.

Method used

A light emission angle adjustment layer is adopted, including a light absorption structure and a flat structure. An angle adjustment opening is formed between adjacent light absorption structures. The pixel opening and the angle adjustment opening partially overlap. The flat structure is set flush with the light absorption structure, eliminating the need for a black matrix and increasing the effective light transmission area of ​​the color resist unit.

Benefits of technology

Without sacrificing the seamless black effect, the light emission efficiency and front brightness of the display panel were improved, the overall thickness was reduced, the manufacturing process was simplified, and the manufacturing yield was increased.

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Abstract

This invention discloses a display panel, a method for manufacturing the display panel, and a display device, comprising: a substrate and a display functional layer, an encapsulation layer, a light emission viewing angle adjustment layer, and a color resist layer sequentially stacked on the substrate; the display functional layer includes a pixel definition layer, which includes a pixel opening; the light emission viewing angle adjustment layer includes a light-absorbing structure and a planarization structure, with a viewing angle adjustment opening formed between adjacent light-absorbing structures; the pixel opening and the viewing angle adjustment opening are correspondingly arranged in a direction perpendicular to the substrate; the vertical projection of the viewing angle adjustment opening on the substrate and the vertical projection of the pixel opening on the substrate at least partially overlap; the planarization structure is located within the viewing angle adjustment opening; the surfaces of the light-absorbing structure and the planarization structure away from the substrate are flush. Without sacrificing the overall black effect, this invention improves the light emission efficiency and front brightness of the display panel, and reduces the overall thickness of the display panel.
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Description

Technical Field

[0001] This invention relates to the field of display technology, and more particularly to a display panel, a method for manufacturing the display panel, and a display device. Background Technology

[0002] As consumer electronics terminals continue to evolve towards narrow bezels, ultra-thin designs, and high flexibility, the polarizer-free architecture, with its high light transmittance and thinness, has become the mainstream technology solution for flexible OLED display panels.

[0003] However, traditional non-polarized filter components require multiple layers of film stacking, resulting in a large overall thickness and low light extraction efficiency. Summary of the Invention

[0004] This invention provides a display panel, a method for manufacturing the display panel, and a display device, which improves the light emission efficiency and front brightness of the display panel and reduces the overall thickness of the display panel without sacrificing the seamless black effect.

[0005] In a first aspect, embodiments of the present invention provide a display panel, comprising: a substrate and a display function layer, an encapsulation layer, a light emission angle adjustment layer and a color resist layer sequentially stacked on the substrate; The display function layer includes a pixel definition layer, and the pixel definition layer includes pixel openings; The light emission angle adjustment layer includes a light-absorbing structure and a flat structure, with an angle adjustment opening formed between adjacent light-absorbing structures; the pixel opening and the angle adjustment opening are correspondingly arranged in a direction perpendicular to the substrate; the vertical projection of the angle adjustment opening on the substrate and the vertical projection of the pixel opening on the substrate at least partially overlap; the flat structure is located within the angle adjustment opening; the surfaces of the light-absorbing structure and the flat structure away from the substrate are flush.

[0006] Optionally, the vertical projection of the viewing angle adjustment opening on the substrate at least covers the vertical projection of the pixel opening on the substrate.

[0007] Optionally, the thickness of the light emission angle adjustment layer ranges from 1 μm to 1.5 μm.

[0008] Optionally, the display panel further includes a touch layer, which is located between the light emission viewing angle adjustment layer and the encapsulation layer, or the touch layer is located between the light emission viewing angle adjustment layer and the color resist layer.

[0009] Optionally, the display panel further includes a planarization layer located on the side of the color resist layer away from the substrate.

[0010] Optionally, the thickness of the planarization layer ranges from 0.3 μm to 0.5 μm.

[0011] Optionally, the color resist layer includes color resist units, which are arranged adjacent to each other, and the vertical projection of the color resist units on the substrate at least covers the vertical projection of the viewing angle adjustment opening on the substrate.

[0012] Secondly, embodiments of the present invention provide a method for manufacturing a display panel, comprising: Provide substrate; A display functional layer is formed on the substrate; the display functional layer includes a pixel definition layer, and the pixel definition layer includes pixel openings; An encapsulation layer is formed on the display function layer; A light emission viewing angle adjustment layer is formed on the encapsulation layer; the light emission viewing angle adjustment layer includes a light-absorbing structure and a planarization structure, and a viewing angle adjustment opening is formed between adjacent light-absorbing structures; the pixel opening and the viewing angle adjustment opening are correspondingly arranged in a direction perpendicular to the substrate; the vertical projection of the viewing angle adjustment opening on the substrate and the vertical projection of the pixel opening on the substrate at least partially overlap; the planarization structure is located within the viewing angle adjustment opening; the surfaces of the light-absorbing structure and the planarization structure away from the substrate are flush; A color resist layer is formed on the light emission angle adjustment layer.

[0013] Optionally, an optical viewing angle adjustment layer is formed on the encapsulation layer, comprising: A flat structural layer is formed on the side of the encapsulation layer away from the substrate; A first opening is formed on the flat structure layer; the remaining flat structure layers constitute the flat structure. The light-absorbing structure is formed within the first opening, and the light-absorbing structure and the flat structure are flush with the side surface away from the substrate.

[0014] Thirdly, embodiments of the present invention provide a display device, including the display panel described in any embodiment of the present invention.

[0015] The display panel provided in this embodiment of the invention emits light from the light-emitting sub-units in the display functional layer under the control of the driving circuit, with the light emanating from the pixel openings. The emitted light passes through the viewing angle adjustment openings of the light emission viewing angle adjustment layer and reaches the color resist layer. After color filtering, it forms a high-brightness, positive viewing angle display image. Since the light has already completed viewing angle convergence before entering the color resist layer, more light energy is concentrated in the positive viewing angle direction. Therefore, there is no need to set a traditional black matrix on the color resist layer to block lateral light leakage. After eliminating the black matrix, the area originally occupied by the black matrix in the color resist layer can be completely converted into the effective light-transmitting area of ​​the color resist unit, increasing the setting area of ​​each color resist unit, thereby improving the light emission efficiency and front brightness of the display panel without sacrificing the overall black effect. Furthermore, the flush design of the flat structure and the light-absorbing structure also provides a flat base for the subsequent coating or deposition of the color resist layer, avoiding problems such as uneven color resist thickness caused by surface undulations. This eliminates the need for a thicker flattening layer in the color resist layer, thereby reducing the overall thickness of the display panel. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of a display panel provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of another display panel provided in an embodiment of the present invention; Figure 3 This is a schematic diagram of another display panel provided in an embodiment of the present invention; Figure 4 A schematic flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present invention; Figures 5-6 This is a schematic diagram of an intermediate structure for the fabrication of a display panel, provided in an embodiment of the present invention. Detailed Implementation

[0017] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0018] Figure 1 This is a schematic diagram of the structure of a display panel provided in an embodiment of the present invention. See also: Figure 1 It includes: a substrate 110 and a display function layer 120, an encapsulation layer 130, a light emission angle adjustment layer 140 and a color resist layer 150 sequentially stacked on the substrate 110; the display function layer 120 includes a pixel definition layer 121, and the pixel definition layer 121 includes a pixel opening D1. The light emission angle adjustment layer 140 includes a light absorption structure 141 and a flat structure 142, with an angle adjustment opening D2 formed between adjacent light absorption structures 141; pixel openings D1 and angle adjustment openings D2 are set correspondingly. The vertical projection of the viewing angle adjustment opening D2 on the substrate 110 at least partially overlaps with the vertical projection of the pixel opening D1 on the substrate 110; the flat structure 142 is located inside the viewing angle adjustment opening D2; the light-absorbing structure 141 and the flat structure 142 are flush with the side surfaces away from the substrate 110.

[0019] Specifically, the substrate 110 is used to support the display functional layer 120. The substrate 110 can be a rigid glass substrate 110 or a flexible substrate 110, such as a single-layer or double-layer polyimide (PI) substrate 110.

[0020] The display functional layer 120 may include a pixel circuit layer 122, such as an LTPS or LTPO TFT array, and an anode layer 123, a light-emitting layer 124, and a cathode layer 125 stacked sequentially. The light-emitting layer 124 has multiple light-emitting units, each including at least a first-color light-emitting sub-unit, a second-color light-emitting sub-unit, and a third-color light-emitting sub-unit. For example, the first color, second color, and third color may be red, green, and blue, respectively. The display functional layer 120 also includes a pixel definition layer 121, where the position of each light-emitting sub-unit can be defined by a pixel opening D1, and patterned arrangement can be achieved through vapor deposition or inkjet printing. Light emitted by the light-emitting sub-units is transmitted to the light-emitting side through the pixel opening D1. The cathode layer, as a common electrode, covers each light-emitting sub-unit, forming a complete light-emitting unit structure. The shape of the pixel opening D1 can be circular, elliptical, polygonal, or other irregular shapes.

[0021] The encapsulation layer 130 is located on the side of the display functional layer 120 away from the substrate 110, and is used to prevent water and oxygen from entering to protect the light-emitting units in the display functional layer 120. The light emission viewing angle adjustment layer 140 is disposed on the side of the encapsulation layer 130 away from the substrate 110. The color resist layer 150 is located on the side of the light emission viewing angle adjustment layer 140 away from the substrate 110. The color resist layer 150 includes multiple color resist units of different colors, such as red, green, and blue color resist units. Each color resist unit is correspondingly disposed with respect to the pixel opening D1 in a direction perpendicular to the substrate 110, and is used to filter the monochromatic light emitted by the light-emitting sub-units to achieve color display.

[0022] The light-emitting angle adjustment layer 140 includes a light-absorbing structure 141 and a planar structure 142. In this embodiment of the invention, the light-absorbing structure 141 can be a black matrix (BM), and the black matrix material may include black resin, black photoresist, carbon nanotube composite material, or metal oxide, etc. The light-absorbing structures 141 are spaced apart, and an angle adjustment opening D2 is defined between adjacent light-absorbing structures 141. The boundary of the light-absorbing structure 141 can be correspondingly set with the boundary of the pixel opening D1 in the vertical projection direction, that is, the vertical projection of the light-absorbing structure 141 on the substrate 110 at least partially covers the vertical projection of the area surrounding the pixel opening D1 in the pixel definition layer 121 on the substrate 110, thereby effectively blocking light leakage and large-angle stray light at the edge of the pixel opening D1.

[0023] The viewing angle adjustment opening D2 is defined by the interval between adjacent light-absorbing structures 141, and corresponds one-to-one with the pixel opening D1. The vertical projection of the viewing angle adjustment opening D2 on the substrate 110 at least partially overlaps with the vertical projection of the pixel opening D1 on the substrate 110, so as to ensure that the positive viewing angle light emitted by the light-emitting sub-unit can pass through smoothly. At the same time, the sidewalls of the light-absorbing structure 141 are used to selectively absorb or block the large-angle emitted light.

[0024] The flat structure 142 is located within the viewing angle adjustment opening D2. The flat structure 142 is made of a transparent material, such as transparent resin, photocurable adhesive, silicon oxide, or nitride, which are optically transparent media. The surface of the flat structure 142 away from the substrate 110 is flush with the surface of the light-absorbing structure 141 away from the substrate 110, meaning they are coplanar. This flush design provides a flat substrate for the subsequent coating or deposition of the color resist layer 150, avoiding problems such as uneven color resist thickness caused by surface undulations.

[0025] When the display panel provided in this embodiment of the invention is in operation, the light-emitting sub-units in the display functional layer 120 emit light under the control of the driving circuit, and the light is emitted from the pixel opening D1. The emitted light passes through the viewing angle adjustment opening D2 of the light emission viewing angle adjustment layer 140 and reaches the color resist layer 150. After color filtering, a high-brightness positive viewing angle display image is formed. Since the light has completed viewing angle convergence before entering the color resist layer 150, more light energy is concentrated in the positive viewing angle direction. Therefore, there is no need to set a traditional black matrix between the color resist units on the color resist layer 150 to block lateral light leakage. After eliminating the black matrix, the area originally occupied by the black matrix in the color resist layer 150 can be completely converted into the effective light-transmitting area of ​​the color resist unit, increasing the setting area of ​​each color resist unit, thereby improving the light emission efficiency and front brightness of the display panel without sacrificing the overall black effect. Furthermore, the flush design of the flat structure 142 and the light-absorbing structure 141 provides a flat base for the subsequent coating or deposition of the color resist layer 150, avoiding problems such as uneven color resist thickness caused by surface undulations. This eliminates the need for a thicker flat layer to be set again for the color resist layer 150, thereby reducing the overall thickness of the display panel.

[0026] Optionally, the vertical projection of the viewing angle adjustment opening D2 onto the substrate 110 at least covers the vertical projection of the pixel opening D1 onto the substrate 110. That is, in a direction perpendicular to the substrate 110, the viewing angle adjustment opening D2 is located on the light-emitting side of the pixel opening D1, and the opening size of the viewing angle adjustment opening D2 can be greater than or equal to the opening size of the pixel opening D1. Since the projection of the viewing angle adjustment opening D2 completely covers the projection of the pixel opening D1, light rays emitted from any position within the pixel opening D1 in the near-normal direction will not encounter the obstruction of the light-absorbing structure 141 on their propagation path. This maximizes the retention of luminous flux at the positive viewing angle, avoiding brightness loss at the positive viewing angle due to an excessively small viewing angle adjustment opening D2. Simultaneously, for light rays emitted at large angles from the edge of the pixel opening D1, the light-absorbing structure 141 can block large-angle light rays, thereby reducing the influence of stray light and crosstalk to adjacent light-emitting sub-units.

[0027] Figure 2 This is a schematic diagram of another display panel provided in an embodiment of the present invention. See also... Figure 2 In some embodiments, the opening size of the viewing angle adjustment opening D2 may also be smaller than the opening size of the pixel opening D1. In this case, the viewing angle adjustment opening D2 can act as a spatial filter for the emitted light, further narrowing the divergence angle of the emitted light beam, thereby enhancing the focusing effect on the emitted light and improving the brightness concentration and contrast in the positive viewing angle direction.

[0028] Optionally, the thickness of the light emission angle adjustment layer 140 ranges from 1 μm to 1.5 μm. If the thickness of the light emission angle adjustment layer 140 is too thin, the sidewall height of the light-absorbing structure 141 will be insufficient, and large-angle light rays will easily pass through the top of the light-absorbing structure 141, causing light leakage. If the thickness of the light emission angle adjustment layer 140 is too thick, it will increase the sidewall reflection loss of light at the positive viewing angle, and may cause void defects due to incomplete filling during fabrication caused by the high aspect ratio of the light-absorbing structure 141.

[0029] Optionally, the display panel also includes a touch layer 160, which is located between the light emission viewing angle adjustment layer 140 and the encapsulation layer 130. Specifically, the touch layer 160 can be a capacitive or resistive structure, typically composed of materials such as metal mesh, indium tin oxide (ITO), or silver nanowires. In this embodiment, the touch layer 160 is disposed between the light emission viewing angle adjustment layer 140 and the encapsulation layer 130. Light emitted from the display functional layer 120 passes sequentially through the encapsulation layer 130, the touch layer 160, and the light emission viewing angle adjustment layer 140 before entering the color resist layer 150. In other embodiments, the touch layer 160 may also be located between the light emission viewing angle adjustment layer 140 and the color resist layer 150. By adjusting the relative distance between the light emission viewing angle adjustment layer 140 and each light-emitting sub-unit in a direction perpendicular to the substrate 110, the incident conditions of light entering the light emission viewing angle adjustment layer 140 can be changed, thereby dynamically adjusting the light emission viewing angle distribution to meet different display requirements.

[0030] Figure 3 This is a schematic diagram of another display panel provided in an embodiment of the present invention. See also... Figure 3 The display panel also includes a planarization layer 170, which is located on the side of the color resist layer 150 away from the substrate 110. Since the light emission viewing angle adjustment layer 140 has good flatness, the color resist layer 150 can be formed on the light emission viewing angle adjustment layer 140. To further improve the reliability of the flatness of the color resist layer 150 surface, a planarization layer 170 can be formed on the color resist layer 150. The planarization layer 170 can be a transparent material, such as transparent resin, photocurable adhesive, silicon oxide, or optically transparent media like nitrides, to fill the microscopic steps on the surface of the color resist layer 150, providing a highly flat substrate for the subsequent film layer fabrication.

[0031] Optionally, the thickness of the planarization layer 170 ranges from 0.3 μm to 0.5 μm. Compared to conventional planarization layers used in traditional display panels to fill the gaps in color resist, the planarization layer 170 in this embodiment can be thinner. This is because the light emission angle adjustment layer 140 has good flatness, allowing the planarization layer 170 to achieve the desired flatness by only compensating for the surface undulations of the color resist layer 150 itself. Furthermore, the planarization layer 170 is located on the light-emitting side of the entire color resist layer 150, which also serves to protect the color resist layer 150 and the underlying light emission angle adjustment layer 140.

[0032] Optionally, the color resist layer 150 includes a plurality of color resist units 151, which are arranged adjacent to each other, and the vertical projection of the color resist unit 151 on the substrate 110 at least covers the vertical projection of the viewing angle adjustment opening D2 on the substrate 110.

[0033] Specifically, each color resist unit 151 corresponds to a pixel opening D1. In terms of position, the vertical projection of the color resist unit 151 on the substrate 110 at least covers the vertical projection of the viewing angle adjustment opening D2 on the substrate 110. Therefore, all effective light emitted from the viewing angle adjustment opening D2 can be received by the corresponding color resist unit 151 when entering the color resist layer 150.

[0034] Each color resist unit 151 can be arranged adjacently, eliminating the need to create an additional black matrix between adjacent color resist units 151. In this embodiment of the invention, the light-absorbing structure 141 in the light emission angle adjustment layer 140 can block stray light between light-emitting units. Therefore, the color resist units 151 can be arranged in a seamless splicing or micro-overlapping manner, completely eliminating the photolithography, development, and baking processes for the black matrix. This also eliminates the alignment misalignment problem between the black matrix and the color resist units 151, improving the panel fabrication yield.

[0035] Furthermore, the side surface of the light emission angle adjustment layer 140 away from the substrate 110 has high flatness due to the flush design of the light absorption structure 141 and the flat structure 142. The color resist layer 150 can be directly coated on this flat surface without the need to add an additional planarization layer below or above the color resist layer 150 to fill the step difference, thus simplifying the process steps.

[0036] Figure 4 This is a schematic flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present invention. (See attached diagram.) Figure 4 ,include: S110, Provide substrate 110; wherein, substrate 110 is used to carry display functional layer 120, substrate 110 can be rigid glass substrate 110 or flexible substrate 110, such as single-layer or double-layer polyimide (PI) substrate 110.

[0037] S120, A display functional layer 120 is formed on the substrate 110; the display functional layer 120 includes a pixel definition layer 121, and the pixel definition layer 121 includes a pixel opening D1. Specifically, the display functional layer 120 may include a pixel circuit layer, such as an LTPS or LTPO TFT array, and an anode layer, a light-emitting layer 124, and a cathode layer stacked sequentially. The light-emitting layer 124 contains multiple light-emitting units, each including at least a first-color light-emitting sub-unit, a second-color light-emitting sub-unit, and a third-color light-emitting sub-unit. For example, the first color, second color, and third color may be red, green, and blue, respectively. The display functional layer 120 also includes a pixel definition layer 121, where the position of each light-emitting sub-unit can be defined by a pixel opening D1, and patterned arrangement can be achieved through vapor deposition or inkjet printing. Light emitted by the light-emitting sub-units is transmitted to the light-emitting side through the pixel opening D1. The cathode layer, as a common electrode, covers each light-emitting sub-unit, forming a complete light-emitting unit structure. The shape of the pixel opening D1 can be circular, elliptical, polygonal, or other irregular shapes.

[0038] S130, An encapsulation layer 130 is formed on the display function layer 120; S140, An emission angle adjustment layer 140 is formed on the encapsulation layer 130; Specifically, the light-emitting angle adjustment layer 140 includes a light-absorbing structure 141 and a planar structure 142. In this embodiment of the invention, the light-absorbing structure 141 can be a black matrix (BM), and the black matrix material may include black resin, black photoresist, carbon nanotube composite material, or metal oxide, etc. The light-absorbing structures 141 are spaced apart, and an angle adjustment opening D2 is defined between adjacent light-absorbing structures 141. The boundary of the light-absorbing structure 141 can be correspondingly set with the boundary of the pixel opening D1 in the vertical projection direction, that is, the vertical projection of the light-absorbing structure 141 on the substrate 110 at least partially covers the vertical projection of the area surrounding the pixel opening D1 in the pixel definition layer 121 on the substrate 110, thereby effectively blocking light leakage and large-angle stray light at the edge of the pixel opening D1.

[0039] The viewing angle adjustment opening D2 is defined by the interval between adjacent light-absorbing structures 141, and corresponds one-to-one with the pixel opening D1. The vertical projection of the viewing angle adjustment opening D2 on the substrate 110 at least partially overlaps with the vertical projection of the pixel opening D1 on the substrate 110, so as to ensure that the positive viewing angle light emitted by the light-emitting sub-unit can pass through smoothly. At the same time, the sidewalls of the light-absorbing structure 141 are used to selectively absorb or block the large-angle emitted light.

[0040] The flat structure 142 is located within the viewing angle adjustment opening D2. The flat structure 142 is made of a transparent material, such as transparent resin, photocurable adhesive, silicon oxide, or nitride, which are optically transparent media. The surface of the flat structure 142 away from the substrate 110 is flush with the surface of the light-absorbing structure 141 away from the substrate 110, meaning they are coplanar. This flush design provides a flat substrate for the subsequent coating or deposition of the color resist layer 150, avoiding problems such as uneven color resist thickness caused by surface undulations.

[0041] S150, a color resist layer 150 is formed on the light emission angle adjustment layer 140.

[0042] Specifically, the color resist layer 150 is located on the side of the light emission viewing angle adjustment layer 140 away from the substrate 110. The color resist layer 150 includes multiple color resist units 151 of different colors, such as red color resist unit 151, green color resist unit 151, and blue color resist unit 151. Each color resist unit 151 is correspondingly arranged with the pixel opening D1 in a direction perpendicular to the substrate 110, and is used to filter the monochromatic light emitted by the light-emitting sub-unit to achieve color display.

[0043] Each color resist unit 151 corresponds to a pixel opening D1. In terms of position, the vertical projection of the color resist unit 151 on the substrate 110 at least covers the vertical projection of the viewing angle adjustment opening D2 on the substrate 110. Therefore, the effective light emitted from the viewing angle adjustment opening D2 can be received by the corresponding color resist unit 151 when it enters the color resist layer 150.

[0044] Each color resist unit 151 can be arranged adjacently, eliminating the need to create an additional black matrix between adjacent color resist units 151. In this embodiment of the invention, the light-absorbing structure 141 in the light emission angle adjustment layer 140 can block stray light between light-emitting units. Therefore, the color resist units 151 can be arranged in a seamless splicing or micro-overlapping manner, completely eliminating the photolithography, development, and baking processes for the black matrix. This also eliminates the alignment misalignment problem between the black matrix and the color resist units 151, improving the panel fabrication yield.

[0045] Furthermore, the side surface of the light emission angle adjustment layer 140 away from the substrate 110 has high flatness due to the flush design of the light absorption structure 141 and the flat structure 142. The color resist layer 150 can be directly coated on this flat surface without the need to add an additional planarization layer below or above the color resist layer 150 to fill the step difference, thus simplifying the process steps.

[0046] Figures 5-6 This is a schematic diagram of an intermediate structure for fabricating a display panel according to an embodiment of the present invention. See also: Figure 5 and Figure 6 An optical viewing angle adjustment layer 140 is formed on the encapsulation layer 130, comprising: A flat structure layer 210 is formed on the side of the encapsulation layer 130 away from the substrate 110; A first opening 220 is formed on the flat structure layer 210; the remaining flat structure layers 210 constitute the flat structure 142. A light-absorbing structure 141 is formed within the first opening 220, and the light-absorbing structure 141 and the flat structure 142 are flush with the side surface away from the substrate 110.

[0047] Specifically, on the side of the encapsulation layer 130 away from the substrate 110, a planar structure layer material of uniform thickness is formed through a coating process, forming a planar structure layer 210. The thickness of the planar structure layer 210 ranges from 1.0 μm to 1.5 μm. The planar structure layer 210 is patterned and exposed using photolithography, or a first opening 220 is formed on the planar structure layer 210 using dry or wet etching processes. The first opening 220 can be positioned corresponding to the boundary of the pixel opening D1 in the vertical projection direction to ensure that the subsequently formed light-absorbing structure 141 can be aligned with the boundary of the pixel opening D1, thereby blocking the light leakage area at the edge of the light-emitting subunit. After etching or development, the remaining planar structure layer 210 that has not been removed constitutes the planar structure 142. Its structure is as follows... Figure 5 As shown.

[0048] Light-absorbing material is filled into the first opening 220. This can be achieved through spin coating, inkjet printing, or vacuum filling to ensure complete filling without voids or defects. Subsequently, grinding, etching, or chemical mechanical polishing is performed to make the upper surface of the light-absorbing structure 141 flush with the upper surface of the flat structure 142. Its structure is as follows: Figure 6 As shown. Subsequently, color resist material can be directly coated on the flush light-absorbing structure 141 and the flat structure 142 to form each color resist unit 151. Since the substrate already has flatness, there is no need to coat an additional planarization layer during color resist coating to complete the preparation of the color resist layer 150.

[0049] This invention also provides a display device, including a display panel according to any embodiment of the invention, thereby having the same beneficial effects, which will not be described again here. The display device can be applied to display scenarios such as smartphones, foldable tablets, automotive displays, and smart wearable devices.

[0050] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A display panel, characterized in that, include: A substrate and a display functional layer, an encapsulation layer, a light emission angle adjustment layer and a color resist layer are sequentially stacked on the substrate; The display function layer includes a pixel definition layer, and the pixel definition layer includes pixel openings; The light emission angle adjustment layer includes a light-absorbing structure and a flat structure, with an angle adjustment opening formed between adjacent light-absorbing structures; The pixel opening and the viewing angle adjustment opening are respectively arranged in a direction perpendicular to the substrate; The vertical projection of the viewing angle adjustment opening on the substrate and the vertical projection of the pixel opening on the substrate at least partially overlap; the flat structure is located within the viewing angle adjustment opening; the light-absorbing structure and the flat structure are flush with the side surface away from the substrate.

2. The display panel according to claim 1, characterized in that, The vertical projection of the viewing angle adjustment opening on the substrate at least covers the vertical projection of the pixel opening on the substrate.

3. The display panel according to claim 1, characterized in that, The thickness of the light emission angle adjustment layer ranges from 1 μm to 1.5 μm.

4. The display panel according to claim 1, characterized in that, It also includes a touch layer, which is located between the light emission angle adjustment layer and the encapsulation layer, or the touch layer is located between the light emission angle adjustment layer and the color resist layer.

5. The display panel according to any one of claims 1-4, characterized in that, It also includes a planarization layer located on the side of the color resist layer away from the substrate.

6. The display panel according to claim 5, characterized in that, The thickness of the planarization layer ranges from 0.3 μm to 0.5 μm.

7. The display panel according to claim 1, characterized in that, The color resist layer includes color resist units, which are arranged adjacent to each other, and the vertical projection of the color resist units on the substrate at least covers the vertical projection of the viewing angle adjustment opening on the substrate.

8. A method for manufacturing a display panel, characterized in that, include: Provide substrate; A display functional layer is formed on the substrate; the display functional layer includes a pixel definition layer, and the pixel definition layer includes pixel openings; An encapsulation layer is formed on the display function layer; A light emission angle adjustment layer is formed on the encapsulation layer; the light emission angle adjustment layer includes a light absorption structure and a planar structure, and an angle adjustment opening is formed between adjacent light absorption structures; The pixel opening and the viewing angle adjustment opening are respectively arranged in a direction perpendicular to the substrate; The vertical projection of the viewing angle adjustment opening on the substrate and the vertical projection of the pixel opening on the substrate at least partially overlap; The flat structure is located within the viewing angle adjustment opening; the light-absorbing structure and the flat structure are flush with each other on the side of the flat structure away from the substrate; A color resist layer is formed on the light emission angle adjustment layer.

9. The method for manufacturing a display panel according to claim 8, characterized in that, An optical viewing angle adjustment layer is formed on the encapsulation layer, comprising: A flat structural layer is formed on the side of the encapsulation layer away from the substrate; A first opening is formed on the flat structure layer; the remaining flat structure layers constitute the flat structure. The light-absorbing structure is formed within the first opening, and the light-absorbing structure and the flat structure are flush with the side surface away from the substrate.

10. A display device, characterized in that, Includes the display panel as described in any one of claims 1-7.