Microwave plasma chemical vapor deposition resonant cavity sealing device

Abstract

The utility model discloses a microwave plasma chemical vapor deposition resonant cavity sealing device which solves the problems that in the prior art, the sealing performance of the two ends of a quartz window is reduced, and air permeates into a deposition cavity. The device comprises a bottom plate, a shell arranged on the bottom plate, an annular quartz window arranged on the bottom plate and a deposition table arranged on the annular quartz window and used for diamond growth, a first sealing mechanism is arranged between the bottom plate and the shell, and a second sealing mechanism used for being sealed with the deposition table is arranged at the top end of the annular quartz window. A third sealing mechanism is arranged between the bottom end of the annular quartz window and the bottom plate, and the first sealing mechanism, the second sealing mechanism and the third sealing mechanism are respectively connected with an external vacuum pump. According to the vacuum pump, the first sealing mechanism, the second sealing mechanism and the third sealing mechanism can be subjected to vacuum treatment, and external air is prevented from entering the shell, so that the growth of diamonds is prevented from being polluted, and the quality of the diamonds is prevented from being influenced.

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