Device for detecting wafer residue

Abstract

The utility model provides a device for detecting wafer residues. The device comprises a projection part, a receiving part and an adjusting part, the projection part is used for projecting a detection light beam on a wafer to be detected along a preset projection direction; the adjusting part is located in the preset reflection direction of the detection light beam and used for adjusting the angle of the received reflected light beam so that the reflected light beam can be received by the receiving part. According to the device, the angle of the light beam reflected by the wafer can be changed by using the adjusting part, so that the distance between the receiving part and the projection part is shortened, the structure of the detection device is more compact, and the occupied area of the device on a wet groove is reduced.

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